TWI744437B - 鹵素氣體的去除劑、其製造方法、使用其的鹵素氣體去除方法以及去除鹵素氣體的系統 - Google Patents
鹵素氣體的去除劑、其製造方法、使用其的鹵素氣體去除方法以及去除鹵素氣體的系統 Download PDFInfo
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- TWI744437B TWI744437B TW106142464A TW106142464A TWI744437B TW I744437 B TWI744437 B TW I744437B TW 106142464 A TW106142464 A TW 106142464A TW 106142464 A TW106142464 A TW 106142464A TW I744437 B TWI744437 B TW I744437B
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- halogen gas
- remover
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- B01D53/34—Chemical or biological purification of waste gases
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| Application Number | Priority Date | Filing Date | Title |
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| JP2017-020456 | 2017-02-07 | ||
| JP2017020456A JP6975537B2 (ja) | 2017-02-07 | 2017-02-07 | ハロゲンガスの除去剤、その製造方法、それを用いたハロゲンガス除去方法、及びハロゲンガスを除去するシステム |
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| TW201829049A TW201829049A (zh) | 2018-08-16 |
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| JP2020044474A (ja) | 2018-09-18 | 2020-03-26 | クラリアント触媒株式会社 | 有機ハロゲン化合物の吸収剤、それを用いた炭化水素ガスからの有機ハロゲン化合物の除去方法、その方法を用いたハロゲン化合物の吸収装置、及び炭化水素ガスの製造方法 |
| JP7796339B2 (ja) * | 2021-05-25 | 2026-01-09 | パナソニックＩｐマネジメント株式会社 | 外装体および電池モジュール |
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| CN114159965B (zh) * | 2021-11-24 | 2022-08-16 | 北京科技大学 | 一种选择性脱氯的吸收剂、制备方法及使用方法 |
| KR102442403B1 (ko) * | 2021-12-08 | 2022-09-13 | 주식회사 퓨어스피어 | 공정유체 내의 염소화합물 제거를 위한 흡착제의 제조방법 및 흡착제 |
| CN115178230B (zh) * | 2022-05-20 | 2023-05-23 | 西南科技大学 | 一种全硅沸石限域铜纳米粒子吸附剂的制备方法和应用 |
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| TW200628216A (en) * | 2004-12-13 | 2006-08-16 | Asahi Glass Co Ltd | Method for removing halogen based gas and agent for removing halogen based gas |
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| JP4913271B2 (ja) * | 1999-07-07 | 2012-04-11 | ズードケミー触媒株式会社 | ハロゲンガス用処理剤 |
| AU5883001A (en) * | 2000-05-26 | 2001-12-03 | Showa Denko Kabushiki Kaisha | Harm-removing agent and method for rendering halogen-containing gas harmless anduses thereof |
| JP2004249285A (ja) * | 2003-01-29 | 2004-09-09 | Showa Denko Kk | フッ素化合物の分解方法 |
| EP1587604B1 (en) * | 2003-01-29 | 2006-11-29 | Showa Denko K.K. | Process for decomposing fluorine compounds |
| JP2005177576A (ja) | 2003-12-17 | 2005-07-07 | Yahashi Kogyo Kk | ハロゲン系ガス及び酸性ガスの除害剤 |
| WO2007135823A1 (ja) * | 2006-05-19 | 2007-11-29 | Asahi Glass Company, Limited | ハロゲン系ガスの除去方法及びハロゲン系ガスの除去剤 |
| JP2010131785A (ja) * | 2008-12-02 | 2010-06-17 | Fujifilm Corp | インクジェット記録方法 |
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Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW200628216A (en) * | 2004-12-13 | 2006-08-16 | Asahi Glass Co Ltd | Method for removing halogen based gas and agent for removing halogen based gas |
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| JP2018126679A (ja) | 2018-08-16 |
| TW201829049A (zh) | 2018-08-16 |
| KR20190116291A (ko) | 2019-10-14 |
| US20200023336A1 (en) | 2020-01-23 |
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