TWI742908B - Ilight-emitting apparatus and method of fabricating the same - Google Patents
Ilight-emitting apparatus and method of fabricating the same Download PDFInfo
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本發明係關於一種發光裝置及其製造方法,並且特別是關於包含至少兩層電路層且在製造上無需鑽孔之發光裝置及其製造方法。The present invention relates to a light-emitting device and a manufacturing method thereof, and particularly to a light-emitting device including at least two circuit layers and without drilling holes in manufacturing, and a manufacturing method thereof.
現行採用發光二極體等發光元件的發光裝置,隨著發光元件的數量增多以及變色、調光等控制上的需求,必須採用至少兩層電路層。Current light-emitting devices using light-emitting elements such as light-emitting diodes must use at least two circuit layers as the number of light-emitting elements increases and control requirements such as color change and dimming are required.
先前技術之發光裝置在製造上,為了電性連接上下相鄰的電路層,需先在介於中間的絕緣層上逐一鑽出貫孔,再將導電材料填滿複數個貫孔以形成導電通孔。然而,逐一鑽出貫孔的步驟相當耗時,並且冠孔的精度不易控制,導致先前技術之發光裝置在製造上耗時且其良率仍有改善的空間。In the manufacture of the prior art light-emitting device, in order to electrically connect the upper and lower adjacent circuit layers, it is necessary to drill through holes one by one in the insulating layer in between, and then fill the plurality of through holes with conductive material to form a conductive connection. hole. However, the step of drilling the through holes one by one is quite time-consuming, and the accuracy of the crown holes is not easy to control, resulting in the time-consuming manufacturing of the prior art light-emitting devices and there is still room for improvement in the yield.
因此,本發明所欲解決之一技術問題在於提供一種包含至少兩層電路層且在製造上無需鑽孔之發光裝置及其製造方法。特別地,本發明之發光裝置其結構不同於先前技術之發光裝置的結構,致使本發明之發光裝置在製造上省時且良率高。Therefore, one of the technical problems to be solved by the present invention is to provide a light-emitting device which includes at least two circuit layers and does not require drilling in manufacturing, and a manufacturing method thereof. In particular, the structure of the light-emitting device of the present invention is different from the structure of the light-emitting device of the prior art, so that the light-emitting device of the present invention is time-saving in manufacturing and has a high yield.
根據本發明之第一較佳具體實施例之發光裝置包含絕緣基材、N層電路層、N層絕緣層、複數個焊墊以及複數個發光元件,其中N係等於或大於2的整數。N層電路層與N層絕緣層係依序且交替堆疊地形成於絕緣基材上。N個電路圖案係提供。每一個電路圖案對應一層電路層。N層電路層中之第一層電路層係根據其對應的電路圖案形成於絕緣基材上。第(i+1)層電路層係根據其對應的電路圖案形成於第i層絕緣層上,其中i係範圍從1至(N-1)中之整數指標。N個開口圖案係提供。每一個開口圖案對應一層絕緣層。第j層絕緣層係形成以覆蓋第j層電路層,並且根據其對應的開口圖案形成複數個開口。第j層電路層係曝露於第j層絕緣層之複數個開口內,其中j係範圍從1至N中之整數指標。每一層電路層包含自個的化學鍍催化層以及自個的且覆蓋化學鍍催化層之金屬層。第(i+1)層電路層之化學鍍催化層係延伸進而覆蓋第i層絕緣層之每一個開口之自個的內壁。第(i+1)層電路層之金屬層係延伸進而覆蓋第i層絕緣層之每一個開口內之化學鍍催化層。第(i+1)層絕緣層並且覆蓋第i層絕緣層之複數個開口。每一個焊墊對應第N層絕緣層之複數個開口之中一個開口,並且係形成以填滿其對應的開口。每一個發光元件對應複數個焊墊中至少兩個焊墊,並且電性接合至其對應的焊墊上。The light-emitting device according to the first preferred embodiment of the present invention includes an insulating substrate, an N-layer circuit layer, an N-layer insulating layer, a plurality of bonding pads, and a plurality of light-emitting elements, where N is an integer equal to or greater than 2. The N-layer circuit layer and the N-layer insulating layer are sequentially and alternately stacked and formed on the insulating substrate. N circuit patterns are provided. Each circuit pattern corresponds to a circuit layer. The first circuit layer in the N-layer circuit layer is formed on the insulating substrate according to its corresponding circuit pattern. The (i+1)th circuit layer is formed on the i-th insulating layer according to its corresponding circuit pattern, where i is an integer index ranging from 1 to (N-1). N opening patterns are provided. Each opening pattern corresponds to an insulating layer. The jth insulating layer is formed to cover the jth circuit layer, and a plurality of openings are formed according to the corresponding opening pattern. The circuit layer of the jth layer is exposed in a plurality of openings of the jth insulating layer, where j is an integer index ranging from 1 to N. Each circuit layer includes its own electroless plating catalyst layer and its own metal layer covering the electroless plating catalyst layer. The electroless plating catalyst layer of the (i+1)th circuit layer extends to cover the inner wall of each opening of the i-th insulating layer. The metal layer of the (i+1)th circuit layer extends to cover the electroless plating catalyst layer in each opening of the i-th insulating layer. The (i+1)th insulating layer covers a plurality of openings of the i-th insulating layer. Each bonding pad corresponds to one of the openings in the Nth insulating layer, and is formed to fill the corresponding opening. Each light-emitting element corresponds to at least two of the plurality of bonding pads, and is electrically connected to its corresponding bonding pad.
根據本發明之第二較佳具體實施例之發光裝置包含絕緣基材、N層電路層、N層絕緣層、複數個焊墊以及複數個發光元件,其中N係等於或大於2的整數。N層電路層與N層絕緣層係依序且交替堆疊地形成於絕緣基材上。N個電路圖案係提供。每一個電路圖案對應一層電路層。N層電路層中之第一層電路層係根據其對應的電路圖案形成於絕緣基材上。第(i+1)層電路層係根據其對應的電路圖案形成於第i層絕緣層上,其中i係範圍從1至(N-1)中之整數指標。N個開口圖案係提供。每一個開口圖案對應一層絕緣層。第j層絕緣層係形成以覆蓋第j層電路層,並且根據其對應的開口圖案形成複數個開口。第j層電路層係曝露於第j層絕緣層之複數個開口內,其中j係範圍從1至N中之整數指標。每一層電路層包含自個的化學鍍催化層以及自個的且覆蓋化學鍍催化層之金屬層。第(i+1)層電路層之化學鍍催化層並且填滿第i層絕緣層之每一個開口。每一個焊墊對應第N層絕緣層之複數個開口之中一個開口,並且係形成以填滿其對應的開口。每一個發光元件對應複數個焊墊中至少兩個焊墊,並且電性接合至其對應的焊墊上。The light-emitting device according to the second preferred embodiment of the present invention includes an insulating substrate, an N-layer circuit layer, an N-layer insulating layer, a plurality of bonding pads, and a plurality of light-emitting elements, where N is an integer equal to or greater than 2. The N-layer circuit layer and the N-layer insulating layer are sequentially and alternately stacked and formed on the insulating substrate. N circuit patterns are provided. Each circuit pattern corresponds to a circuit layer. The first circuit layer in the N-layer circuit layer is formed on the insulating substrate according to its corresponding circuit pattern. The (i+1)th circuit layer is formed on the i-th insulating layer according to its corresponding circuit pattern, where i is an integer index ranging from 1 to (N-1). N opening patterns are provided. Each opening pattern corresponds to an insulating layer. The jth insulating layer is formed to cover the jth circuit layer, and a plurality of openings are formed according to the corresponding opening pattern. The circuit layer of the jth layer is exposed in a plurality of openings of the jth insulating layer, where j is an integer index ranging from 1 to N. Each circuit layer includes its own electroless plating catalyst layer and its own metal layer covering the electroless plating catalyst layer. The electroless plating catalyst layer of the (i+1)th circuit layer fills up each opening of the i-th insulating layer. Each bonding pad corresponds to one of the openings in the Nth insulating layer, and is formed to fill the corresponding opening. Each light-emitting element corresponds to at least two of the plurality of bonding pads, and is electrically connected to its corresponding bonding pad.
根據本發明之第三較佳具體實施例之製造發光裝置的方法所製造的發光裝置包含N層電路層以及與N層電路層交替堆疊之N層絕緣層,其中N係等於或大於2的整數。N個電路圖案係提供。每一個電路圖案對應一層電路層。N個開口圖案係提供。每一個開口圖案對應一層絕緣層。根據本發明之第三較佳具體實施例的方法首先係製備絕緣基材。接著,根據本發明之第三較佳具體實施例的方法係根據對應第一層電路層之第一個電路圖案,形成第一層電路層於絕緣基材上。接著,根據本發明之第三較佳具體實施例的方法係根據對應第(i+1)層電路層之第(i+1)個電路圖案,形成第(i+1)層電路層,其中i係範圍從1至(N-1)中之整數指標。接著,根據本發明之第三較佳具體實施例的方法係形成第j層絕緣層以覆蓋第j層電路層,並且對應第j層絕緣層之第j個開口圖案形成第j層絕緣層之複數個開口,其中第j層電路層係曝露於第j層絕緣層之複數個開口內,j係範圍從1至N中之整數指標。每一層電路層包含自個的化學鍍催化層以及自個的且覆蓋化學鍍催化層之金屬層。第(i+1)層電路層之化學鍍催化層係延伸進而覆蓋第i層絕緣層之每一個開口之自個的內壁。第(i+1)層電路層之金屬層係延伸進而覆蓋第i層絕緣層之每一個開口內之化學鍍催化層。第(i+1)層絕緣層並且覆蓋第i層絕緣層之複數個開口。接著,根據本發明之第三較佳具體實施例的方法係形成複數個焊墊,其中每一個焊墊對應第N層絕緣層之複數個開口之中一個開口,並且係填滿其對應的開口。最後,根據本發明之第三較佳具體實施例的方法係電性接合複數個發光元件至複數個焊墊上,其中每一個發光元件對應複數個焊墊中至少兩個焊墊,並且電性接合至其對應的焊墊上。The light-emitting device manufactured by the method for manufacturing a light-emitting device according to the third preferred embodiment of the present invention includes N circuit layers and N insulating layers alternately stacked with the N circuit layers, where N is an integer equal to or greater than 2 . N circuit patterns are provided. Each circuit pattern corresponds to a circuit layer. N opening patterns are provided. Each opening pattern corresponds to an insulating layer. The method according to the third preferred embodiment of the present invention first prepares an insulating substrate. Next, the method according to the third preferred embodiment of the present invention forms the first circuit layer on the insulating substrate according to the first circuit pattern corresponding to the first circuit layer. Next, the method according to the third preferred embodiment of the present invention forms the (i+1)th circuit layer according to the (i+1)th circuit pattern corresponding to the (i+1)th circuit layer, wherein i is an integer index ranging from 1 to (N-1). Next, the method according to the third preferred embodiment of the present invention is to form a j-th insulating layer to cover the j-th circuit layer, and to form one of the j-th insulating layer corresponding to the j-th opening pattern of the j-th insulating layer A plurality of openings, wherein the circuit layer of the jth layer is exposed in the plurality of openings of the insulating layer of the jth layer, and j is an integer index ranging from 1 to N. Each circuit layer includes its own electroless plating catalyst layer and its own metal layer covering the electroless plating catalyst layer. The electroless plating catalyst layer of the (i+1)th circuit layer extends to cover the inner wall of each opening of the i-th insulating layer. The metal layer of the (i+1)th circuit layer extends to cover the electroless plating catalyst layer in each opening of the i-th insulating layer. The (i+1)th insulating layer covers a plurality of openings of the i-th insulating layer. Next, the method according to the third preferred embodiment of the present invention forms a plurality of solder pads, each of which corresponds to one of the openings of the Nth insulating layer, and fills the corresponding opening . Finally, the method according to the third preferred embodiment of the present invention is to electrically bond a plurality of light-emitting elements to a plurality of bonding pads, wherein each light-emitting element corresponds to at least two bonding pads of the plurality of bonding pads, and is electrically bonded To its corresponding pad.
根據本發明之第四較佳具體實施例之製造發光裝置的方法所製造的發光裝置包含N層電路層以及與N層電路層交替堆疊之N層絕緣層,其中N係等於或大於2的整數。N個電路圖案係提供。每一個電路圖案對應一層電路層。N個開口圖案係提供。每一個開口圖案對應一層絕緣層。根據本發明之第四較佳具體實施例的方法首先係製備絕緣基材。接著,根據本發明之第四較佳具體實施例的方法係根據對應第一層電路層之第一個電路圖案,形成第一層電路層於絕緣基材上。接著,根據本發明之第四較佳具體實施例的方法係根據對應第(i+1)層電路層之第(i+1)個電路圖案,形成第(i+1)層電路層,其中i係範圍從1至(N-1)中之整數指標。接著,根據本發明之第四較佳具體實施例的方法係形成第j層絕緣層以覆蓋第j層電路層,並且對應第j層絕緣層之第j個開口圖案形成第j層絕緣層之複數個開口,其中第j層電路層係曝露於第j層絕緣層之複數個開口內,j係範圍從1至N中之整數指標。每一層電路層包含自個的化學鍍催化層以及自個的且覆蓋化學鍍催化層之金屬層。第(i+1)層電路層之化學鍍催化層並且填滿第i層絕緣層之每一個開口。接著,根據本發明之第四較佳具體實施例的方法係形成複數個焊墊,其中每一個焊墊對應第N層絕緣層之複數個開口之中一個開口,並且係填滿其對應的開口。最後,根據本發明之第四較佳具體實施例的方法係電性接合複數個發光元件至複數個焊墊上,其中每一個發光元件對應複數個焊墊中至少兩個焊墊,並且電性接合至其對應的焊墊上。The light-emitting device manufactured by the method for manufacturing a light-emitting device according to the fourth preferred embodiment of the present invention includes N circuit layers and N insulating layers alternately stacked with the N circuit layers, where N is an integer equal to or greater than 2 . N circuit patterns are provided. Each circuit pattern corresponds to a circuit layer. N opening patterns are provided. Each opening pattern corresponds to an insulating layer. The method according to the fourth preferred embodiment of the present invention first prepares an insulating substrate. Next, the method according to the fourth preferred embodiment of the present invention forms the first circuit layer on the insulating substrate according to the first circuit pattern corresponding to the first circuit layer. Next, the method according to the fourth preferred embodiment of the present invention forms the (i+1)th circuit layer according to the (i+1)th circuit pattern corresponding to the (i+1)th circuit layer, wherein i is an integer index ranging from 1 to (N-1). Next, the method according to the fourth preferred embodiment of the present invention is to form a j-th insulating layer to cover the j-th circuit layer, and to form one of the j-th insulating layer corresponding to the j-th opening pattern of the j-th insulating layer A plurality of openings, wherein the circuit layer of the jth layer is exposed in the plurality of openings of the insulating layer of the jth layer, and j is an integer index ranging from 1 to N. Each circuit layer includes its own electroless plating catalyst layer and its own metal layer covering the electroless plating catalyst layer. The electroless plating catalyst layer of the (i+1)th circuit layer fills up each opening of the i-th insulating layer. Next, the method according to the fourth preferred embodiment of the present invention forms a plurality of bonding pads, each of which corresponds to one of the openings of the Nth insulating layer, and fills the corresponding opening . Finally, the method according to the fourth preferred embodiment of the present invention is to electrically bond a plurality of light-emitting elements to a plurality of bonding pads, wherein each light-emitting element corresponds to at least two bonding pads of the plurality of bonding pads, and is electrically bonded To its corresponding pad.
於一具體實施例中,每一層電路層之化學鍍催化層可以由金屬漿料或化學鍍催化油墨所形成。In a specific embodiment, the electroless plating catalyst layer of each circuit layer may be formed of metal paste or electroless plating catalyst ink.
與先前技術不同,本發明之發光裝置其複數個開口與絕緣層一起形成,無需鑽孔,再將形成電路層的化學鍍催化層與金屬層填滿複數個開口以形成複數個導電通孔,藉此,本發明之發光裝置在製造上省時且良率高。Different from the prior art, the light-emitting device of the present invention has a plurality of openings and an insulating layer formed together without drilling, and then the electroless plating catalytic layer and the metal layer forming the circuit layer are filled with the plurality of openings to form a plurality of conductive vias. Thereby, the light-emitting device of the present invention saves time in manufacturing and has a high yield.
關於本發明之優點與精神可以藉由以下的發明詳述及所附圖式得到進一步的瞭解。The advantages and spirit of the present invention can be further understood from the following detailed description of the invention and the accompanying drawings.
請參閱圖1及圖2,該等圖式示意地描繪本發明之第一較佳具體實施例之發光裝置1。圖1係以頂視圖示意地繪示根據本發明之第一較佳具體實施例的發光裝置1。圖2係圖1中發光裝置1沿A-A線的局部剖面視圖。Please refer to FIGS. 1 and 2, which schematically depict the light-emitting device 1 according to the first preferred embodiment of the present invention. Fig. 1 schematically illustrates a light emitting device 1 according to a first preferred embodiment of the present invention in a top view. Fig. 2 is a partial cross-sectional view of the light-emitting device 1 in Fig. 1 along the line A-A.
如圖1及圖2所示,根據本發明之第一較佳具體實施例之發光裝置1包含絕緣基材10、N層電路層12、N層絕緣層14、複數個焊墊16以及複數個發光元件18,其中N係等於或大於2的整數。As shown in FIGS. 1 and 2, the light-emitting device 1 according to the first preferred embodiment of the present invention includes an insulating
於一具體實施例中,絕緣基材10可以是軟性絕緣基材,但本發明並不以此為限。若絕緣基材10是軟性絕緣基材,絕緣基材10可以由聚對苯二甲酸乙二酯、聚醯亞胺、聚酸甲酯、聚甲基丙烯酸甲酯,或其他類似的商用高分子材料所形成。In a specific embodiment, the insulating
N層電路層12與N層絕緣層14係依序且交替堆疊地形成於絕緣基材10上。於圖2中,僅繪示出三層電路層12與三層絕緣層14做為代表。The N-
N個電路圖案係提供。每一個電路圖案對應一層電路層12。N層電路層12中之第一層電路層12係根據其對應的電路圖案形成於絕緣基材10上。第(i+1)層電路層12係根據其對應的電路圖案形成於第i層絕緣層14上,其中i係範圍從1至(N-1)中之整數指標。N circuit patterns are provided. Each circuit pattern corresponds to a layer of
N個開口圖案係提供。每一個開口圖案對應一層絕緣層14。第j層絕緣層14係形成以覆蓋第j層電路層12,並且根據其對應的開口圖案形成複數個開口142。第j層電路層12係曝露於第j層絕緣層14之複數個開口142內,其中j係範圍從1至N中之整數指標。N opening patterns are provided. Each opening pattern corresponds to an insulating
於一具體實施例中,絕緣層14可以藉由塗佈紫外線硬化樹脂於電路層12上,再行照射紫外光硬化而成,但本發明並不以此為限。絕緣層14可以藉由印刷製程形成,但本發明並不以此為限。在形成絕緣層14之時,複數個開口142也同時隨之形成。在此須強調的是,複數個開口142無需藉由鑽孔製程來形成,其製造上省時並且精度高。In a specific embodiment, the insulating
每一層電路層12包含自個的化學鍍催化層122以及自個的且覆蓋化學鍍催化層122之金屬層124。特別地,第(i+1)層電路層12之化學鍍催化層122係延伸進而覆蓋第i層絕緣層14之每一個開口142之自個的內壁。第(i+1)層電路層12之金屬層124係延伸進而覆蓋第i層絕緣層14之每一個開口142內之化學鍍催化層122。第(i+1)層絕緣層14並且覆蓋第i層絕緣層14之複數個開口142。第(i+1)層電路層12與第i層電路層12即藉由填入第i層絕緣層14之複數個開口142內的化學鍍催化層122與金屬層124達成電性連接。Each
於一具體實施例中,每一層電路層12之化學鍍催化層122可以由金屬漿料(例如,銀漿、銅漿)或化學鍍催化油墨所形成。化學鍍催化層122可以藉由印刷製程形成,但本發明並不以此為限。In a specific embodiment, the electroless
於一具體實施例中,每一層電路層12之金屬層124係藉由化學鍍製程沉積於化學鍍催化層122上。金屬層124可以是單層Cu層、多層Ag/Au層/多層Ag/Au/Sn/Ni層/單層Cu層、單層Sn層/單層Cu層、單層Ag層/單層Cu層、單層Au層/單層Cu層、單層Ag層/單層Ni層/單層Cu層、單層Au層/單層Ni層/單層Cu層、單層Sn層/單層Au層/單層Ag層/單層Ni層/單層Cu層等。In a specific embodiment, the
每一個焊墊16對應第N層絕緣層14之複數個開口142之中一個開口142,並且係形成以填滿其對應的開口142。Each
於一具體實施例中,每一個焊墊16可以是Sn-Bi合金層、Au-Sn-Bi合金層、Sn-Cu合金層、Sn-Bi-Zn合金層、Sn-Bi-Sb合金層等。In a specific embodiment, each
每一個發光元件18對應複數個焊墊16中至少兩個焊墊16,並且電性接合至其對應的焊墊16上。於圖2中,僅繪示一個發光元件18對應兩個焊墊16做為代表。Each light-emitting
於一具體實施例中,單個發光元件18可以是已封裝的發光二極體元件或發光二極體裸晶,但本發明並不以此為限。單個發光元件18可以是從其頂部發出光線的元件,也可以是從其側邊發出光線的元件。In a specific embodiment, the single light-emitting
進一步,同樣如圖2所示,根據本發明之第一較佳具體實施例之發光裝置1還包含透光的樹脂層19。透光的樹脂層19係形成以被覆第N層絕緣層14以及複數個發光元件18。透光的樹脂層19未繪示於圖1中。於一具體實施例中,透光的樹脂層19可以藉由塗佈紫外線硬化樹脂,再行照射紫外光硬化而成,但本發明並不以此為限。Furthermore, as also shown in FIG. 2, the light-emitting device 1 according to the first preferred embodiment of the present invention further includes a light-transmitting
於實際應用中,根據本發明之第一較佳具體實施例的發光裝置1可以用於發光鍵盤、燈具等。請參閱圖3,該圖係以剖面視圖示意地繪示根據本發明之第一較佳具體實施例的發光裝置1用於發光鍵盤3之一範例的架構。如圖3所示,發光鍵盤3包含底座30、複數個按鍵32、薄膜開關34以及根據本發明之第一較佳具體實施例的發光裝置1。複數個按鍵32係能上、下移動地連接於底座30之上方。薄膜開關34係裝設於複數個按鍵32與底座30之間。底座30具有複數個第一通孔300。薄膜開關34具有複數個第二通孔340。每一個第二通孔340對應一個第一通孔300,並且對齊其對應的第一通孔300。薄膜開關34包含複數個開關(未繪示圖3中),每一個按鍵32對應至少一個開關,並且其對應的開關係形成於其對應的第二通孔340的週邊。每一個按鍵32其對應的開關係由每一個按鍵32的剪刀式支撐裝置322致動開啟。根據本發明之第一較佳具體實施例的發光裝置1之每一個發光元件18對應一個按鍵32。發光裝置1係裝設於底座30之下,致使每一個發光元件18置於對應其對應的按鍵32之第一通孔300與第二通孔340內。每一個發光元件18用以發射光線照射其對應的按鍵32。In practical applications, the light-emitting device 1 according to the first preferred embodiment of the present invention can be used for light-emitting keyboards, lamps, and the like. Please refer to FIG. 3, which is a cross-sectional view schematically showing the structure of an example of the light-emitting device 1 used in the light-emitting keyboard 3 according to the first preferred embodiment of the present invention. As shown in FIG. 3, the light-emitting keyboard 3 includes a
請參閱圖4及圖5,該等圖式示意地描繪根據本發明之第二較佳具體實施例之發光裝置2。圖4以頂視圖示意地繪示本發明之第二較佳具體實施例的發光裝置2。圖5係圖4中發光裝置2沿B-B線的局部剖面視圖。Please refer to FIGS. 4 and 5, which schematically depict the light-emitting device 2 according to the second preferred embodiment of the present invention. FIG. 4 schematically illustrates a light-emitting device 2 according to a second preferred embodiment of the present invention in a top view. Fig. 5 is a partial cross-sectional view of the light-emitting device 2 in Fig. 4 along the line B-B.
如圖4及圖5所示,根據本發明之第二較佳具體實施例之發光裝置2包含絕緣基材20、N層電路層22、N層絕緣層24、複數個焊墊26以及複數個發光元件28,其中N係等於或大於2的整數。As shown in FIGS. 4 and 5, the light-emitting device 2 according to the second preferred embodiment of the present invention includes an insulating
於一具體實施例中,絕緣基材20可以是軟性絕緣基材,但本發明並不以此為限。若絕緣基材20是軟性絕緣基材,絕緣基材10可以由聚對苯二甲酸乙二酯、聚醯亞胺、聚酸甲酯、聚甲基丙烯酸甲酯,或其他類似的商用高分子材料所形成。In a specific embodiment, the insulating
N層電路層22與N層絕緣層24係依序且交替堆疊地形成於絕緣基材20上。於圖4中,僅繪示出三層電路層22與三層絕緣層24做為代表。The N-
N個電路圖案係提供。每一個電路圖案對應一層電路層22。N層電路層22中之第一層電路層22係根據其對應的電路圖案形成於絕緣基材20上。第(i+1)層電路層22係根據其對應的電路圖案形成於第i層絕緣層24上,其中i係範圍從1至(N-1)中之整數指標。N circuit patterns are provided. Each circuit pattern corresponds to a layer of
N個開口圖案係提供。每一個開口圖案對應一層絕緣層24。第j層絕緣層24係形成以覆蓋第j層電路層22,並且根據其對應的開口圖案形成複數個開口242。第j層電路層22係曝露於第j層絕緣層24之複數個開口242內,其中j係範圍從1至N中之整數指標。N opening patterns are provided. Each opening pattern corresponds to a layer of insulating
於一具體實施例中,絕緣層24可以藉由塗佈紫外線硬化樹脂於電路層22上,再行照射紫外光硬化而成,但本發明並不以此為限。絕緣層24可以藉由印刷製程形成,但本發明並不以此為限。在形成絕緣層24之時,複數個開口242也同時隨之形成。在此須強調的是,複數個開口242無需藉由鑽孔製程來形成,其製造上省時並且精度高。In a specific embodiment, the insulating
每一層電路層22包含自個的化學鍍催化層222以及自個的且覆蓋化學鍍催化層222之金屬層224。特別地,第(i+1)層電路層22之化學鍍催化層222並且填滿第i層絕緣層24之每一個開口242。第(i+1)層電路層12與第i層電路層12即藉由填入第i層絕緣層14之複數個開口142內的化學鍍催化層122達成電性連接。Each
於一具體實施例中,每一層電路層22之化學鍍催化層222可以由金屬漿料(例如,銀漿、銅漿)或化學鍍催化油墨所形成。化學鍍催化層222可以藉由印刷製程形成,但本發明並不以此為限。In a specific embodiment, the electroless
於一具體實施例中,每一層電路層212之金屬層224係藉由化學鍍製程沉積於化學鍍催化層222上。金屬層224可以是單層Cu層、多層Ag/Au層/多層Ag/Au/Sn/Ni層/單層Cu層、單層Sn層/單層Cu層、單層Ag層/單層Cu層、單層Au層/單層Cu層、單層Ag層/單層Ni層/單層Cu層、單層Au層/單層Ni層/單層Cu層、單層Sn層/單層Au層/單層Ag層/單層Ni層/單層Cu層等。In a specific embodiment, the
每一個焊墊26對應第N層絕緣層24之複數個開口242之中一個開口242,並且係形成以填滿其對應的開口242。Each
於一具體實施例中,每一個焊墊26可以是Sn-Bi合金層、Au-Sn-Bi合金層、Sn-Cu合金層、Sn-Bi-Zn合金層、Sn-Bi-Sb合金層等。In a specific embodiment, each
每一個發光元件28對應複數個焊墊26中至少兩個焊墊26,並且電性接合至其對應的焊墊26上。於圖4中,僅繪示一個發光元件28對應兩個焊墊26做為代表。Each light-emitting
於一具體實施例中,單個發光元件28可以是已封裝的發光二極體元件或發光二極體裸晶,但本發明並不以此為限。單個發光元件28可以是從其頂部發出光線的元件,也可以是從其側邊發出光線的元件。In a specific embodiment, the single light-emitting
進一步,同樣如圖5所示,根據本發明之第二較佳具體實施例之發光裝置2還包含透光的樹脂層29。透光的樹脂層29係形成以被覆第N層絕緣層24以及複數個發光元件28。透光的樹脂層29未繪示於圖4中。於一具體實施例中,透光的樹脂層29可以藉由塗佈紫外線硬化樹脂,再行照射紫外光硬化而成,但本發明並不以此為限。Furthermore, as also shown in FIG. 5, the light-emitting device 2 according to the second preferred embodiment of the present invention further includes a light-transmitting
於實際應用中,根據本發明之第二較佳具體實施例的發光裝置2可以用於發光鍵盤、燈具等。In practical applications, the light-emitting device 2 according to the second preferred embodiment of the present invention can be used for light-emitting keyboards, lamps, and the like.
請參閱圖6、圖7及圖8,該等圖式示意地描繪根據本發明之第三較佳具體實施例之製造如圖2所示的發光裝置1之方法之各階段的結構。發光裝置1包含N層電路層12以及與N層電路層12交替堆疊之N層絕緣層14,其中N係等於或大於2的整數。N個電路圖案係提供。每一個電路圖案對應一層電路層12。N個開口圖案係提供。每一個開口圖案對應一層絕緣層14。Please refer to FIG. 6, FIG. 7 and FIG. 8, which schematically depict the structure of each stage of the method of manufacturing the light-emitting device 1 shown in FIG. 2 according to the third preferred embodiment of the present invention. The light emitting device 1 includes N layers of circuit layers 12 and N layers of insulating
首先,如圖6所示,根據本發明之第三較佳具體實施例的方法係製備絕緣基材10。First, as shown in FIG. 6, the method according to the third preferred embodiment of the present invention is to prepare the insulating
接著,同樣如圖6所示,根據本發明之第三較佳具體實施例的方法係根據對應第一層電路層12之第一個電路圖案,形成第一層電路層12於絕緣基材10上。Next, as shown in FIG. 6, the method according to the third preferred embodiment of the present invention is to form the
接著,如圖7所示,根據本發明之第三較佳具體實施例的方法係形成第j層絕緣層14以覆蓋第j層電路層12,其中j係範圍從1至N中之整數指標。Next, as shown in FIG. 7, the method according to the third preferred embodiment of the present invention is to form a j-
接著,同樣如圖7所示,根據本發明之第三較佳具體實施例的方法係根據對應第(i+1)層電路層12之第(i+1)個電路圖案,形成第(i+1)層電路層12,其中i係範圍從1至(N-1)中之整數指標。Next, as shown in FIG. 7, the method according to the third preferred embodiment of the present invention forms the (i+1)th circuit pattern corresponding to the (i+1)
接著,同樣如圖7所示,根據本發明之第三較佳具體實施例的方法在形成第j層絕緣層14的同時,並且對應第j層絕緣層14之第j個開口圖案形成第j層絕緣層14之複數個開口142,其中第j層電路層12係曝露於第j層絕緣層14之複數個開口142內。Next, as also shown in FIG. 7, the method according to the third preferred embodiment of the present invention forms the jth insulating
於一具體實施例中,絕緣層14可以藉由塗佈紫外線硬化樹脂於電路層12上,再行照射紫外光硬化而成,但本發明並不以此為限。絕緣層14可以藉由印刷製程形成,但本發明並不以此為限。在形成絕緣層14同時複數個開口142也隨之形成。在此須強調的是,複數個開口142無需藉由鑽孔製程來形成,其製造上省時並且精度高。In a specific embodiment, the insulating
特別地,每一層電路層12包含自個的化學鍍催化層122以及自個的且覆蓋化學鍍催化層122之金屬層124。第(i+1)層電路層12之化學鍍催化層122係延伸進而覆蓋第i層絕緣層14之每一個開口142之自個的內壁。第(i+1)層電路層12之金屬層124係延伸進而覆蓋第i層絕緣層14之每一個開口142內之化學鍍催化層122。第(i+1)層絕緣層14並且覆蓋第i層絕緣層14之複數個開口142。再次強調,第(i+1)層電路層12與第i層電路層12即藉由填入第i層絕緣層14之複數個開口142內的化學鍍催化層122與金屬層124達成電性連接。In particular, each
於一具體實施例中,每一層電路層12之化學鍍催化層122可以由金屬漿料(例如,銀漿、銅漿)或化學鍍催化油墨所形成。化學鍍催化層122可以藉由印刷製程形成,但本發明並不以此為限。In a specific embodiment, the electroless
於一具體實施例中,每一層電路層12之金屬層124係藉由化學鍍製程沉積於化學鍍催化層122上。In a specific embodiment, the
接著,如圖8所示,根據本發明之第三較佳具體實施例的方法係形成複數個焊墊16,其中每一個焊墊16對應第N層絕緣層14之複數個開口142之中一個開口142,並且係填滿其對應的開口142。Next, as shown in FIG. 8, the method according to the third preferred embodiment of the present invention is to form a plurality of
最後,根據本發明之第三較佳具體實施例的方法係電性接合複數個發光元件18至複數個焊墊16上,其中每一個發光元件18對應複數個焊墊16中至少兩個焊墊16,並且電性接合至其對應的焊墊16上,即完成如圖2所示的發光裝置1。Finally, the method according to the third preferred embodiment of the present invention is to electrically bond a plurality of light-emitting
進一步,同樣如圖2所示,第三較佳具體實施例的方法係形成透光的樹脂層19以被覆第N層絕緣層14以及複數個發光元件18。於一具體實施例中,透光的樹脂層19可以藉由塗佈紫外線硬化樹脂,再行照射紫外光硬化而成,但本發明並不以此為限。Furthermore, as also shown in FIG. 2, the method of the third preferred embodiment is to form a light-transmitting
請參閱圖9、圖10及圖11,該等圖式示意地描繪根據本發明之第四較佳具體實施例之製造如圖5所示的發光裝置2之方法之各階段的結構。發光裝置2包含N層電路層22以及與N層電路層22交替堆疊之N層絕緣層24,其中N係等於或大於2的整數。Please refer to FIGS. 9, 10 and 11, which schematically depict the structure of each stage of the method of manufacturing the light-emitting device 2 shown in FIG. 5 according to the fourth preferred embodiment of the present invention. The light emitting device 2 includes N layers of circuit layers 22 and N layers of insulating
首先,如圖9所示,根據本發明之第四較佳具體實施例的方法係製備絕緣基材20。First, as shown in FIG. 9, the method according to the fourth preferred embodiment of the present invention is to prepare the insulating
接著,同樣如圖9所示,根據本發明之第四較佳具體實施例的方法係根據對應第一層電路層22之第一個電路圖案,形成第一層電路層22於絕緣基材20上。Next, as shown in FIG. 9, the method according to the fourth preferred embodiment of the present invention is to form the
接著,如圖10所示,根據本發明之第四較佳具體實施例的方法係形成第j層絕緣層24以覆蓋第j層電路層22,其中j係範圍從1至N中之整數指標。Next, as shown in FIG. 10, the method according to the fourth preferred embodiment of the present invention is to form a j-
接著,同樣如圖10所示,根據本發明之第四較佳具體實施例的方法係根據對應第(i+1)層電路層22之第(i+1)個電路圖案,形成第(i+1)層電路層22,其中i係範圍從1至(N-1)中之整數指標。Next, as shown in FIG. 10, the method according to the fourth preferred embodiment of the present invention forms the (i+1)th circuit pattern corresponding to the (i+1)
接著,同樣如圖10所示,根據本發明之第四較佳具體實施例的方法在形成第j層絕緣層24的同時,並且對應第j層絕緣層24之第j個開口圖案形成第j層絕緣層24之複數個開口242,其中第j層電路層22係曝露於第j層絕緣層24之複數個開口242內。Next, as also shown in FIG. 10, the method according to the fourth preferred embodiment of the present invention forms the jth insulating
於一具體實施例中,絕緣層24可以藉由塗佈紫外線硬化樹脂於電路層22上,再行照射紫外光硬化而成,但本發明並不以此為限。絕緣層24可以藉由印刷製程形成,但本發明並不以此為限。在形成絕緣層24同時複數個開口242也隨之形成。在此須強調的是,複數個開口242無需藉由鑽孔製程來形成,其製造上省時並且精度高。In a specific embodiment, the insulating
特別地,每一層電路層22包含自個的化學鍍催化層222以及自個的且覆蓋化學鍍催化層222之金屬層224。第(i+1)層電路層22之化學鍍催化層22並且填滿第i層絕緣層24之每一個開口242。再次強調,第(i+1)層電路層12與第i層電路層12即藉由填入第i層絕緣層14之複數個開口142內的化學鍍催化層122達成電性連接。In particular, each
於一具體實施例中,每一層電路層22之化學鍍催化層222可以由金屬漿料(例如,銀漿、銅漿)或化學鍍催化油墨所形成。化學鍍催化層222可以藉由印刷製程形成,但本發明並不以此為限。In a specific embodiment, the electroless
於一具體實施例中,每一層電路層22之金屬層224係藉由化學鍍製程沉積於化學鍍催化層222上。In a specific embodiment, the
接著,如圖11所示,根據本發明之第四較佳具體實施例的方法係形成複數個焊墊26,其中每一個焊墊26對應第N層絕緣層24之複數個開口242之中一個開口242,並且係填滿其對應的開口242。Next, as shown in FIG. 11, the method according to the fourth preferred embodiment of the present invention is to form a plurality of
最後,根據本發明之第四較佳具體實施例的方法係電性接合複數個發光元件28至複數個焊墊26上,其中每一個發光元件28對應複數個焊墊26中至少兩個焊墊26,並且電性接合至其對應的焊墊26上,即完成如圖5所示的發光裝置2。Finally, the method according to the fourth preferred embodiment of the present invention is to electrically connect a plurality of light-emitting
進一步,同樣如圖5所示,第四較佳具體實施例的方法係形成透光的樹脂層29以被覆第N層絕緣層24以及複數個發光元件28。於一具體實施例中,透光的樹脂層29可以藉由塗佈紫外線硬化樹脂,再行照射紫外光硬化而成,但本發明並不以此為限。Furthermore, as also shown in FIG. 5, the method of the fourth preferred embodiment is to form a light-
與先前技術不同,本發明之發光裝置其複數個開口與絕緣層一起形成,無需鑽孔,再將形成電路層的化學鍍催化層與金屬層填滿複數個開口以形成複數個導電通孔,藉此,本發明之發光裝置在製造上省時且良率高。Different from the prior art, the light-emitting device of the present invention has a plurality of openings and an insulating layer formed together without drilling, and then the electroless plating catalytic layer and the metal layer forming the circuit layer are filled with the plurality of openings to form a plurality of conductive vias. Thereby, the light-emitting device of the present invention saves time in manufacturing and has a high yield.
藉由以上較佳具體實施例之詳述,係希望能更加清楚描述本發明之特徵與精神,而並非以上述所揭露的較佳具體實施例來對本發明之面向加以限制。相反地,其目的是希望能涵蓋各種改變及具相等性的安排於本發明所欲申請之專利範圍的面向內。因此,本發明所申請之專利範圍的面向應該根據上述的說明作最寬廣的解釋,以致使其涵蓋所有可能的改變以及具相等性的安排。Based on the above detailed description of the preferred embodiments, it is hoped that the characteristics and spirit of the present invention can be described more clearly, rather than limiting the aspect of the present invention by the preferred embodiments disclosed above. On the contrary, its purpose is to cover various changes and equivalent arrangements within the scope of the patent for which the present invention is intended. Therefore, the aspect of the patent scope applied for by the present invention should be interpreted in the broadest way based on the above description, so as to cover all possible changes and equivalent arrangements.
1:發光裝置 10:絕緣基材 12:電路層 122:化學鍍催化層 124:金屬層 14:絕緣層 142:開口 16:焊墊 18:發光元件 19:透光的樹脂層 2:發光裝置 20:絕緣基材 22:電路層 222:化學鍍催化層 224:金屬層 24:絕緣層 242:開口 26:焊墊 28:發光元件 29:透光的樹脂層 3:發光鍵盤 30:底座 300:第一通孔 32:按鍵 322: 剪刀式支撐裝置 34:薄膜開關 340:第二通孔1: Light-emitting device 10: Insulating substrate 12: Circuit layer 122: Electroless Plating Catalytic Layer 124: Metal layer 14: Insulation layer 142: Open 16: Solder pad 18: Light-emitting element 19: Light-transmitting resin layer 2: Light-emitting device 20: Insulating base material 22: circuit layer 222: Electroless Plating Catalytic Layer 224: Metal layer 24: Insulation layer 242: open 26: Solder pad 28: Light-emitting element 29: Light-transmitting resin layer 3: illuminated keyboard 30: base 300: first through hole 32: Button 322: Scissor support device 34: Membrane switch 340: second through hole
圖1係根據本發明之第一較佳具體實施例之發光裝置的頂視圖; 圖2係圖1中發光裝置沿A-A線的局部剖面視圖; 圖3係根據本發明之第一較佳具體實施例之發光裝置應用於發光鍵盤之一範例的剖面視圖; 圖4係根據本發明之第二較佳具體實施例之發光裝置的頂視圖; 圖5係圖4中發光裝置沿B-B線的剖面視圖; 圖6、圖7及圖8分別係根據本根據發明之第三較佳具體實施例之製造發光裝置之方法之各階段的結構示意圖; 圖9、圖10及圖11分別係根據本根據發明之第四較佳具體實施例之製造發光裝置之方法之各階段的結構示意圖。 Figure 1 is a top view of a light-emitting device according to a first preferred embodiment of the present invention; Fig. 2 is a partial cross-sectional view of the light-emitting device in Fig. 1 along the line A-A; 3 is a cross-sectional view of an example of the light-emitting device according to the first preferred embodiment of the present invention applied to a light-emitting keyboard; Figure 4 is a top view of a light emitting device according to a second preferred embodiment of the present invention; Fig. 5 is a cross-sectional view of the light-emitting device in Fig. 4 along the line B-B; 6, FIG. 7, and FIG. 8 are schematic diagrams of each stage of the method for manufacturing a light-emitting device according to a third preferred embodiment of the present invention; FIG. 9, FIG. 10, and FIG. 11 are schematic diagrams of each stage of the method for manufacturing a light-emitting device according to the fourth preferred embodiment of the present invention.
1:發光裝置 1: Light-emitting device
10:絕緣基材 10: Insulating substrate
12:電路層 12: Circuit layer
122:化學鍍催化層 122: Electroless Plating Catalytic Layer
124:金屬層 124: Metal layer
14:絕緣層 14: Insulation layer
142:開口 142: Open
16:焊墊 16: Solder pad
18:發光元件 18: Light-emitting element
19:透光的樹脂層 19: Light-transmitting resin layer
Claims (12)
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TW202011439A (en) * | 2018-08-31 | 2020-03-16 | 達方電子股份有限公司 | Light emitting keyboard and lighting board thereof |
CN111063786A (en) * | 2019-12-12 | 2020-04-24 | 北京易美新创科技有限公司 | Chip packaging device |
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TW202011439A (en) * | 2018-08-31 | 2020-03-16 | 達方電子股份有限公司 | Light emitting keyboard and lighting board thereof |
CN111063786A (en) * | 2019-12-12 | 2020-04-24 | 北京易美新创科技有限公司 | Chip packaging device |
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