TWI741176B - Substrate strip and electronic component package having the same - Google Patents

Substrate strip and electronic component package having the same Download PDF

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Publication number
TWI741176B
TWI741176B TW107114071A TW107114071A TWI741176B TW I741176 B TWI741176 B TW I741176B TW 107114071 A TW107114071 A TW 107114071A TW 107114071 A TW107114071 A TW 107114071A TW I741176 B TWI741176 B TW I741176B
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Taiwan
Prior art keywords
solder resist
resist layer
layer
electronic component
laminated body
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TW107114071A
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Chinese (zh)
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TW201919178A (en
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吳隆
金相勳
高永國
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南韓商三星電機股份有限公司
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/12Mountings, e.g. non-detachable insulating substrates
    • H01L23/13Mountings, e.g. non-detachable insulating substrates characterised by the shape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/482Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body
    • H01L23/485Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body consisting of layered constructions comprising conductive layers and insulating layers, e.g. planar contacts
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/544Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L24/28Structure, shape, material or disposition of the layer connectors prior to the connecting process

Abstract

The present invention relates to a substrate strip comprising: a laminate composed of an insulating layer and a circuit layer; a first solder resist layer formed on the laminate; a reinforcement member formed on the first solder resist layer; and a second solder resist layer formed on the first solder resist layer to cover the reinforcement member, wherein the laminate is divided into a unit area and a dummy area, and wherein the reinforcement member and the second solder resist layer are formed on the dummy area.

Description

基底條與具有其之電子部件封裝Base strip and electronic component packaging with the same

以下說明是有關於一種基底條與具有其之電子部件封裝。 The following description is about a base strip and electronic component packaging with it.

由於半導體封裝技術的發展,封裝基底已變得非常緻密且小型化,因此,需要一種超細印刷電路板。為製作此種超細印刷電路板,確保印刷電路板的剛性非常重要。當剛性不足時,基底會嚴重翹曲且難以進行封裝製程中的正常製程。 Due to the development of semiconductor packaging technology, the packaging substrate has become very dense and miniaturized. Therefore, an ultra-fine printed circuit board is required. In order to make such an ultra-fine printed circuit board, it is very important to ensure the rigidity of the printed circuit board. When the rigidity is insufficient, the substrate will be severely warped and it is difficult to perform the normal process in the packaging process.

日本專利申請案第2009-141121號闡述了一種配線基底的實例。 Japanese Patent Application No. 2009-141121 describes an example of a wiring substrate.

本發明的目的在於提供一種可減少彎曲的基底條(substrate strip)與具有其之電子部件封裝。 The object of the present invention is to provide a substrate strip that can reduce bending and an electronic component package with the substrate strip.

根據本發明的一個態樣,提供一種基底條,所述基底條包括:積層體,由絕緣層及電路層構成;第一阻焊層,形成於所 述積層體上;加強構件,形成於所述第一阻焊層上;以及第二阻焊層,形成於所述第一阻焊層上以覆蓋所述加強構件,其中所述積層體被分成單元區域及虛設區域,且其中所述加強構件及所述第二阻焊層形成於所述虛設區域上。 According to one aspect of the present invention, there is provided a base strip, the base strip comprising: a laminated body composed of an insulating layer and a circuit layer; a first solder resist layer formed on the On the laminated body; a reinforcing member formed on the first solder resist layer; and a second solder resist layer formed on the first solder resist layer to cover the reinforcing member, wherein the laminated body is divided into A unit area and a dummy area, and wherein the reinforcing member and the second solder resist layer are formed on the dummy area.

根據本發明的另一態樣,提供一種電子部件封裝,所述電子部件封裝包括:基底條,被分成單元區域及虛設區域;以及電子部件,安裝於所述單元區域上,其中所述基底條包括:積層體,由絕緣層及電路層構成;第一阻焊層,形成於所述積層體上;加強構件,形成於所述第一阻焊層上;以及第二阻焊層,形成於所述第一阻焊層上以覆蓋所述加強構件,其中所述加強構件及所述第二阻焊層形成於所述虛設區域上。 According to another aspect of the present invention, there is provided an electronic component package. The electronic component package includes: a base strip divided into a unit area and a dummy area; and an electronic component mounted on the unit area, wherein the base strip It includes: a laminated body composed of an insulating layer and a circuit layer; a first solder resist layer formed on the laminated body; a reinforcing member formed on the first solder resist layer; and a second solder resist layer formed on the The first solder resist layer covers the reinforcement member, wherein the reinforcement member and the second solder resist layer are formed on the dummy area.

100:積層體 100: layered body

110:絕緣層 110: Insulation layer

120、121、122:電路層 120, 121, 122: circuit layer

121':端子墊 121': terminal pad

130:通孔 130: Through hole

200:第一阻焊層 200: The first solder mask

200a:上部阻焊層 200a: Upper solder mask

200b:下部阻焊層 200b: Lower solder mask

210:空腔 210: Cavity

220:開口區域 220: open area

300、310、320:加強構件 300, 310, 320: strengthening member

330:基準標記的圖案 330: Pattern of fiducial mark

400:第二阻焊層 400: The second solder mask

410:開口 410: open

420:模製澆口 420: Molded gate

430:模製構件 430: Molded components

500:電子部件 500: electronic components

510:接合構件 510: Joining member

520:底部填充膠 520: underfill glue

B:邊界 B: boundary

D:虛設區域 D: Dummy area

M:圖案遮罩 M: pattern mask

R:阻鍍層 R: Anti-plating layer

S1:金屬箔 S1: Metal foil

S2:晶種層 S2: Seed layer

U:單元區域 U: unit area

U':單元 U': unit

圖1是示出根據本發明實施例的基底條的剖視圖。 Fig. 1 is a cross-sectional view showing a base strip according to an embodiment of the present invention.

圖2是示出根據本發明實施例的基底條的平面圖。 Fig. 2 is a plan view showing a base strip according to an embodiment of the present invention.

圖3是示出根據本發明實施例的電子部件封裝的剖視圖。 FIG. 3 is a cross-sectional view showing an electronic component package according to an embodiment of the present invention.

圖4示出根據本發明實施例的電子部件封裝的模製製程。 Fig. 4 shows a molding process of an electronic component package according to an embodiment of the present invention.

圖5至圖12是示出根據本發明實施例的在製造基底條的方法中所用的製程的剖視圖。 5 to 12 are cross-sectional views showing the manufacturing process used in the method of manufacturing the base strip according to the embodiment of the present invention.

在所有圖中及詳細說明通篇中,相同參考編號指代相同的元件。所述圖式可能未必按比例繪製,且為清晰、說明及方便起見,可誇大圖中的元件的相對大小、比例及描繪。 In all figures and throughout the detailed description, the same reference numbers refer to the same elements. The drawings may not necessarily be drawn to scale, and for clarity, description, and convenience, the relative sizes, proportions, and depictions of the elements in the drawings may be exaggerated.

提供以下詳細說明是為了幫助讀者獲得對本文所述的方法、設備及/或系統的全面理解。然而,本文所述的方法、設備及/或系統的各種變化、修改及等效形式將對此項技術中具有通常知識者顯而易見。本文所述的操作的順序僅為實例,且並非受限於本文所述的順序,而是除了必須按某一次序發生的操作以外,可如將對此項技術中具有通常知識者顯而易見般進行改變。此外,為增加清晰性及簡明性,對此項技術中具有通常知識者眾所習知的功能及構造的說明可被省略。 The following detailed description is provided to help readers gain a comprehensive understanding of the methods, equipment and/or systems described in this article. However, various changes, modifications and equivalent forms of the methods, devices and/or systems described herein will be obvious to those with ordinary knowledge in the art. The order of operations described herein is only an example, and is not limited to the order described herein, but except for operations that must occur in a certain order, it can be performed as will be obvious to those with ordinary knowledge in the art. Change. In addition, in order to increase clarity and conciseness, the description of the functions and structures known to those with ordinary knowledge in this technology may be omitted.

本文所述的特徵可被實施為諸多不同的形式,而不應被視為僅限於本文所述的實例。更確切而言,提供本文所述的實例是為了使本揭露內容將透徹及完整,且將向此項技術中具有通常知識者傳達本揭露的全部範圍。 The features described herein can be implemented in many different forms and should not be regarded as limited to the examples described herein. To be more precise, the examples described herein are provided so that the content of this disclosure will be thorough and complete, and will convey the full scope of the disclosure to those skilled in the art.

除非另外定義,否則本文所使用的包括技術用語及科學用語的所有用語具有與本揭露所屬技術中具有通常知識者對所述用語所通常理解的含義相同的含義。在常用字典中定義的任何用語應被理解為在相關技術的上下文中具有相同的含義,且除非另外明確地定義,否則不應被解釋為具有理想或過於正式的含義。 Unless otherwise defined, all terms used herein including technical terms and scientific terms have the same meaning as those commonly understood by those with ordinary knowledge in the technology to which this disclosure belongs. Any term defined in a commonly used dictionary should be understood as having the same meaning in the context of related technologies, and unless clearly defined otherwise, it should not be interpreted as having an ideal or overly formal meaning.

無論圖編號如何,相同或對應的部件將給出相同的參考編號,且將不再重覆對相同或對應的部件進行任何冗餘說明。本揭露的說明通篇中,當確定闡述某一相關傳統技術來回避本揭露的要點時,將省略相干的詳細說明。在闡述各種部件時可使用例 如「第一」及「第二」等用語,但以上部件不應侷限於以上用語。以上用語僅用於區分各個部件。在附圖中,一些部件可被誇大、省略或簡要說明,且部件的尺寸未必反映該些部件的實際尺寸。 Regardless of the figure number, the same or corresponding parts will be given the same reference numbers, and any redundant description of the same or corresponding parts will not be repeated. Throughout the description of this disclosure, when it is determined that a certain related traditional technology is described to avoid the main points of this disclosure, related detailed descriptions will be omitted. Examples can be used when explaining various components Terms such as "first" and "second", but the above components should not be limited to the above terms. The above terms are only used to distinguish each component. In the drawings, some components may be exaggerated, omitted or briefly described, and the size of the components does not necessarily reflect the actual size of the components.

以下,將參照附圖詳細闡述本揭露的某些實施例。 Hereinafter, certain embodiments of the present disclosure will be described in detail with reference to the accompanying drawings.

圖1是示出根據本發明實施例的基底條的剖視圖,且圖2是示出根據本發明實施例的基底條的平面圖。 FIG. 1 is a cross-sectional view showing a base strip according to an embodiment of the present invention, and FIG. 2 is a plan view showing a base strip according to an embodiment of the present invention.

參照圖1及圖2,根據本發明實施例的基底條包括積層體100、第一阻焊層200、加強構件300以及第二阻焊層400。 1 and 2, the base strip according to the embodiment of the present invention includes a laminated body 100, a first solder resist layer 200, a reinforcing member 300 and a second solder resist layer 400.

積層體100是由絕緣層110及電路層120構成,且具有一個表面及另一表面。此處,除側表面以外,積層體100的所述一個表面與所述另一表面彼此相對。在本發明中,積層體100的一個表面是上面安裝有電子部件500的表面,且另一表面是接合至主板的表面。在圖1中,積層體100的上表面是所述一個表面,且下表面是所述另一表面。 The laminated body 100 is composed of an insulating layer 110 and a circuit layer 120, and has one surface and the other surface. Here, except for the side surface, the one surface and the other surface of the laminated body 100 are opposed to each other. In the present invention, one surface of the laminated body 100 is the surface on which the electronic component 500 is mounted, and the other surface is the surface bonded to the main board. In FIG. 1, the upper surface of the laminated body 100 is the one surface, and the lower surface is the other surface.

積層體100的絕緣層110是由絕緣材料(例如樹脂)形成且為薄板狀。絕緣層110的樹脂可為各種材料,例如熱固性樹脂及熱塑性樹脂,且更具體而言為環氧樹脂、聚醯亞胺等。環氧樹脂的實例包括:萘環氧樹脂、雙酚A型環氧樹脂、雙酚F型環氧樹脂、酚醛清漆環氧樹脂、甲酚酚醛清漆環氧樹脂(cresol novolac epoxy resin)、橡膠改質環氧樹脂、脂環族環氧樹脂、矽系環氧樹脂、氮系環氧樹脂、磷系環氧樹脂等。然而,並非僅限於此。 The insulating layer 110 of the laminated body 100 is formed of an insulating material (for example, resin) and has a thin plate shape. The resin of the insulating layer 110 may be various materials, such as thermosetting resin and thermoplastic resin, and more specifically epoxy resin, polyimide, and the like. Examples of epoxy resins include: naphthalene epoxy resin, bisphenol A type epoxy resin, bisphenol F type epoxy resin, novolac epoxy resin, cresol novolac epoxy resin, rubber modified High-quality epoxy resin, cycloaliphatic epoxy resin, silicon epoxy resin, nitrogen epoxy resin, phosphorous epoxy resin, etc. However, it is not limited to this.

絕緣層110可為在樹脂中包含纖維加強構件300(例如玻璃布)的預浸體(prepreg,PPG)。絕緣層110可為在樹脂中填充無機填料(例如二氧化矽)的構成膜。作為此種構成膜,可使用味之素構成膜(ajinomoto build-up film,ABF)等。 The insulating layer 110 may be a prepreg (PPG) including a fiber reinforcement member 300 (for example, glass cloth) in a resin. The insulating layer 110 may be a constituent film filled with an inorganic filler (for example, silicon dioxide) in a resin. As such a constitution film, an Ajinomoto build-up film (ABF) or the like can be used.

構成膜中所包含的無機填料可為二氧化矽(SiO2)、硫酸鋇(BaSO4)、氧化鋁(Al2O3)、或者前述兩種或更多種的組合。無機填料可更包括:碳酸鈣、碳酸鎂、飛灰、天然二氧化矽、合成二氧化矽、高嶺土、黏土、氧化鈣、氧化鎂、氧化鈦、氧化鋅、氫氧化鈣、氫氧化鋁、氫氧化鎂、滑石、雲母、水滑石、矽酸鋁、矽酸鎂、矽酸鈣、煆燒滑石、矽灰石、鈦酸鉀、硫酸鎂、硫酸鈣或磷酸鎂。然而,並非僅限於此。 The inorganic filler included in the constituent film may be silicon dioxide (SiO 2 ), barium sulfate (BaSO 4 ), aluminum oxide (Al 2 O 3 ), or a combination of two or more of the foregoing. Inorganic fillers may further include: calcium carbonate, magnesium carbonate, fly ash, natural silica, synthetic silica, kaolin, clay, calcium oxide, magnesium oxide, titanium oxide, zinc oxide, calcium hydroxide, aluminum hydroxide, hydrogen Magnesium oxide, talc, mica, hydrotalcite, aluminum silicate, magnesium silicate, calcium silicate, braised talc, wollastonite, potassium titanate, magnesium sulfate, calcium sulfate or magnesium phosphate. However, it is not limited to this.

積層體100可利用積層於彼此上方的多個絕緣層110形成。儘管在圖1中示出了三個絕緣層110,但絕緣層110的數目不受限制。 The laminated body 100 can be formed by using a plurality of insulating layers 110 laminated on top of each other. Although three insulating layers 110 are shown in FIG. 1, the number of insulating layers 110 is not limited.

積層體100的電路層120是被圖案化以傳輸電訊號,被形成為具有預定寬度及厚度,且根據電路設計而成形的導體。考慮到電力傳導的性質,電路層120可由金屬製成,所述金屬例如為銅(Cu)、鈀(Pd)、鋁(Al)、鎳(Ni)、鈦(Ti)、金(Au)、鉑(Pt)或其合金。 The circuit layer 120 of the laminated body 100 is patterned to transmit electrical signals, and is formed as a conductor having a predetermined width and thickness and shaped according to the circuit design. Considering the nature of power conduction, the circuit layer 120 may be made of metal, such as copper (Cu), palladium (Pd), aluminum (Al), nickel (Ni), titanium (Ti), gold (Au), Platinum (Pt) or its alloys.

電路層120形成於絕緣層110中。若形成有多個絕緣層110,則電路層120形成於每一絕緣層110中。電路層120可形成於絕緣層110的一個或兩個表面上且可嵌入於絕緣層110的一個 或兩個表面中。圖1示出三層的絕緣層110。在此種情形中,電路層120可為四層。 The circuit layer 120 is formed in the insulating layer 110. If a plurality of insulating layers 110 are formed, the circuit layer 120 is formed in each insulating layer 110. The circuit layer 120 can be formed on one or both surfaces of the insulating layer 110 and can be embedded in one of the insulating layers 110 Or in both surfaces. Figure 1 shows a three-layer insulating layer 110. In this case, the circuit layer 120 may be four layers.

形成於積層體100的一個表面上的電路層121可被形成為嵌入於絕緣層110中。另外,形成於積層體100的一個表面上的電路層121可包括端子墊121'。端子墊121'是其中欲安裝電子部件500的區。另一方面,形成於積層體100的另一表面上的電路層122可突出超過積層體100的另一表面。 The circuit layer 121 formed on one surface of the laminated body 100 may be formed to be embedded in the insulating layer 110. In addition, the circuit layer 121 formed on one surface of the laminated body 100 may include a terminal pad 121'. The terminal pad 121' is an area where the electronic component 500 is to be mounted. On the other hand, the circuit layer 122 formed on the other surface of the laminated body 100 may protrude beyond the other surface of the laminated body 100.

電路層120可包括金屬箔S1及晶種層S2。除金屬箔S1及晶種層S2外,其餘電路層120可通過晶種層作為引入線的電鍍方法來形成。在此種情形中,電路層120可按金屬箔S1、晶種層S2及電鍍層的次序構成。金屬箔S1及晶種層S2可為藉由改良半加成方法(modified semi-additive process,MSAP)形成的電路層120的結果。因此,在本發明中,電路層120的金屬箔S1及晶種層S2不一定需要一直形成。可根據電路層120的製造方法來決定金屬箔S1及晶種層S2是否存在。例如,若電路層120是藉由減成(例如,覆蓋(tenting))或半加成方法(semi-additive process,SAP)技術形成,則電路層120可僅具有晶種層S2而不具有金屬箔S1。 The circuit layer 120 may include a metal foil S1 and a seed layer S2. Except for the metal foil S1 and the seed layer S2, the remaining circuit layer 120 can be formed by an electroplating method using the seed layer as the lead-in wire. In this case, the circuit layer 120 may be formed in the order of the metal foil S1, the seed layer S2, and the electroplating layer. The metal foil S1 and the seed layer S2 may be the result of the circuit layer 120 formed by a modified semi-additive process (MSAP). Therefore, in the present invention, the metal foil S1 and the seed layer S2 of the circuit layer 120 do not necessarily need to be formed all the time. The existence of the metal foil S1 and the seed layer S2 can be determined according to the manufacturing method of the circuit layer 120. For example, if the circuit layer 120 is formed by subtractive (for example, tenting) or semi-additive process (SAP) technology, the circuit layer 120 may only have the seed layer S2 without metal. Foil S1.

積層體100可更包括通孔130,且通孔130電性連接垂直地間隔開的電路層120。亦即,通孔130形成於不同的絕緣層110中或將絕緣層110的兩個表面上所形成的電路層120加以連接。通孔130亦可由金屬製成,所述金屬例如是與電路層120相 同的金屬。通孔130可更包括晶種層S2。 The laminated body 100 may further include a through hole 130, and the through hole 130 is electrically connected to the vertically spaced circuit layer 120. That is, the through holes 130 are formed in different insulating layers 110 or connect the circuit layers 120 formed on the two surfaces of the insulating layer 110. The through hole 130 can also be made of metal, for example, the metal is the same as the circuit layer 120. The same metal. The through hole 130 may further include a seed layer S2.

積層體100被分成單元區域U及虛設區域D。單元區域U包括多個單元U'且是當基底條在封裝後被切割時充當實際基底的部分。在多個單元U'之間設置有邊界B,且基底條是沿邊界B被切割。虛設區域D是當基底條在封裝後被切割時將被移除的、除單元區域以外的部分。 The laminated body 100 is divided into a unit area U and a dummy area D. The unit area U includes a plurality of units U′ and is a part that serves as an actual substrate when the substrate strip is cut after packaging. A boundary B is provided between the plurality of units U′, and the base strip is cut along the boundary B. The dummy area D is the part other than the unit area that will be removed when the base strip is cut after packaging.

電路層120形成於單元區域U的每一單元U'中且用於安裝電子部件500的端子墊121'亦形成於每一單元U'上。因此,電子部件500安裝於單元區域U的每一單元U'上。 The circuit layer 120 is formed in each unit U'of the unit area U and the terminal pad 121' for mounting the electronic component 500 is also formed on each unit U'. Therefore, the electronic component 500 is mounted on each unit U′ of the unit area U.

如圖2所示,虛設區域D位於單元區域U之外。單元區域U佔據基底條中的大部分,且虛設區域D是沿單元區域U的邊緣被形成為位於基底條的最外部邊緣上。 As shown in FIG. 2, the dummy area D is located outside the unit area U. The unit area U occupies most of the base bar, and the dummy area D is formed along the edge of the unit area U to be located on the outermost edge of the base bar.

第一阻焊層200積層於積層體100上以覆蓋電路層120,且具有感光性樹脂以防止不必要的短路。第一阻焊層200可形成於積層體100的兩個表面上。為方便起見,將積層體100的一個表面上所形成的第一阻焊層200稱作上部阻焊層200a且將積層體100的另一表面上所形成的第一阻焊層200稱作下部阻焊層200b來進行進一步說明。 The first solder resist layer 200 is laminated on the laminated body 100 to cover the circuit layer 120, and has a photosensitive resin to prevent unnecessary short circuits. The first solder resist layer 200 may be formed on both surfaces of the laminated body 100. For convenience, the first solder resist layer 200 formed on one surface of the laminated body 100 is referred to as the upper solder resist layer 200a and the first solder resist layer 200 formed on the other surface of the laminated body 100 is referred to as The lower solder resist layer 200b will be further described.

上部阻焊層200a與積層體100的一個表面以及所嵌入的電路層121(當形成於積層體100的一個表面上的電路層121嵌入於絕緣層110中時)的被暴露表面接觸。上部阻焊層200a可覆蓋端子墊121'。此處,上部阻焊層200a設置有空腔210以暴露 出積層體100的所述一個表面且端子墊121'是經由空腔210而被暴露出。由於端子墊121'形成於單元區域U中,因此空腔210形成於單元區域U上。可在端子墊121'的經由空腔210而被暴露出的表面上形成表面處理層,例如金(Au)或鎳(Ni)。 The upper solder resist layer 200a is in contact with one surface of the laminated body 100 and the exposed surface of the embedded circuit layer 121 (when the circuit layer 121 formed on one surface of the laminated body 100 is embedded in the insulating layer 110). The upper solder resist layer 200a may cover the terminal pad 121'. Here, the upper solder resist layer 200a is provided with a cavity 210 to expose The one surface of the laminated body 100 and the terminal pad 121 ′ are exposed through the cavity 210. Since the terminal pad 121 ′ is formed in the unit area U, the cavity 210 is formed on the unit area U. A surface treatment layer, such as gold (Au) or nickel (Ni), may be formed on the surface of the terminal pad 121' exposed through the cavity 210.

當形成於積層體100的另一表面上的電路層122突出超過積層體100的另一表面時,下部阻焊層200b被形成為與積層體100的另一表面接觸以覆蓋突出的電路層122。下部阻焊層200b可包括用於暴露出突出的電路層122的下表面的開口區域220。當基底條在封裝後按照單元U'來切割並安裝於主板上時,可在電路層122的經由開口區域220而被暴露出的下表面上形成接合構件,例如焊料。 When the circuit layer 122 formed on the other surface of the laminated body 100 protrudes beyond the other surface of the laminated body 100, the lower solder resist layer 200b is formed in contact with the other surface of the laminated body 100 to cover the protruding circuit layer 122 . The lower solder resist layer 200b may include an opening area 220 for exposing the lower surface of the protruding circuit layer 122. When the base strip is cut according to the unit U′ after packaging and mounted on the main board, a bonding member, such as solder, may be formed on the lower surface of the circuit layer 122 exposed through the opening area 220.

當形成於積層體100的一個表面上的電路層121嵌入於絕緣層110中且形成於積層體100的另一表面上的電路層122突出超過積層體100的另一表面時,上部阻焊層200a的厚度可小於下部阻焊層200b的厚度。 When the circuit layer 121 formed on one surface of the laminated body 100 is embedded in the insulating layer 110 and the circuit layer 122 formed on the other surface of the laminated body 100 protrudes beyond the other surface of the laminated body 100, the upper solder resist layer The thickness of 200a may be smaller than the thickness of the lower solder resist layer 200b.

第一阻焊層200形成於積層體100的單元區域U及虛設區域D上。由於電路層120形成於單元區域U上,因此位於單元區域U上的第一阻焊層200保護電路層120且位於虛設區域D上的第一阻焊層200對基底條賦予剛性。另一方面,第一阻焊層200可不形成於位於單元區域U中的多個單元U'之間的邊界B上。 The first solder resist layer 200 is formed on the unit area U and the dummy area D of the multilayer body 100. Since the circuit layer 120 is formed on the unit area U, the first solder resist layer 200 located on the unit area U protects the circuit layer 120 and the first solder resist layer 200 located on the dummy area D imparts rigidity to the base strip. On the other hand, the first solder resist layer 200 may not be formed on the boundary B between the plurality of cells U′ located in the cell region U.

加強構件300形成於虛設區域D上的第一阻焊層200上且對基底條賦予剛性。加強構件300形成於虛設區域D上但不形 成於單元區域U上。因此,加強構件300在基底條封裝後進行切割時被移除,且在封裝製程完成之前對基底條提供剛性。由於加強構件300形成於虛設區域D上的第一阻焊層200上,因此加強構件300被形成為高於積層體100之單元區域U的電路層120。 The reinforcing member 300 is formed on the first solder resist layer 200 on the dummy area D and imparts rigidity to the base strip. The reinforcing member 300 is formed on the dummy area D but not in shape Completed on the unit area U. Therefore, the reinforcing member 300 is removed when cutting the base strip after packaging, and provides rigidity to the base strip before the packaging process is completed. Since the reinforcement member 300 is formed on the first solder resist layer 200 on the dummy region D, the reinforcement member 300 is formed as the circuit layer 120 higher than the unit region U of the laminated body 100.

加強構件300可僅形成於第一阻焊層200的上部阻焊層200a上而不形成於下部阻焊層200b上。然而,並不排除加強構件300形成於上部阻焊層200a及下部阻焊層200b上。 The reinforcing member 300 may be formed only on the upper solder resist layer 200a of the first solder resist layer 200 and not on the lower solder resist layer 200b. However, it is not excluded that the reinforcing member 300 is formed on the upper solder resist layer 200a and the lower solder resist layer 200b.

加強構件300可由金屬形成。例如,加強構件300可由具有較電路層120更大的剛性或模數的金屬製成。剛性意指在受到外力時發生的應變。剛性可被簡單地視為當施予軸向力(垂直應力)時發生的應變。此剛性取決於彈性模數或楊氏模數。可理解,彈性模數或楊氏模數越大,剛性越大。 The reinforcement member 300 may be formed of metal. For example, the reinforcing member 300 may be made of metal having greater rigidity or modulus than the circuit layer 120. Rigidity refers to the strain that occurs when an external force is applied. Rigidity can be simply regarded as the strain that occurs when an axial force (vertical stress) is applied. This stiffness depends on the modulus of elasticity or Young's modulus. It can be understood that the greater the modulus of elasticity or Young's modulus, the greater the rigidity.

此外,加強構件300可由諸如與電路層120相同之金屬的金屬等形成。加強構件300可藉由與形成電路層120的方法相同的方法形成。加強構件300可包括金屬箔S1及晶種層S2。根據如上所述的形成加強構件300的方法,加強構件300亦可僅包括晶種層S2。加強構件300可利用以下方式而非電路形成方法形成:在加強構件300經圖案化後,將經圖案化的加強構件300黏附至第一阻焊層200。形成加強構件的方法並非僅限於此。 In addition, the reinforcing member 300 may be formed of a metal such as the same metal as the circuit layer 120 or the like. The reinforcement member 300 may be formed by the same method as the method of forming the circuit layer 120. The reinforcing member 300 may include a metal foil S1 and a seed layer S2. According to the method of forming the reinforcing member 300 as described above, the reinforcing member 300 may also include only the seed layer S2. The reinforcing member 300 may be formed using the following method instead of a circuit forming method: after the reinforcing member 300 is patterned, the patterned reinforcing member 300 is adhered to the first solder resist layer 200. The method of forming the reinforcing member is not limited to this.

參照圖1及圖2,加強構件300可被形成為各種形狀。加強構件300可沿虛設區域D形成且更具體而言,可沿虛設區域D延伸(參見310)。多個加強構件300可被排列成沿虛設區域D 彼此間隔開或彼此接觸(參見320)。加強構件300的寬度等於或小於虛設區域D的寬度,且加強構件300的厚度可大於電路層120的厚度。然而,並非僅限於此。 1 and 2, the reinforcement member 300 may be formed in various shapes. The reinforcement member 300 may be formed along the dummy area D and, more specifically, may extend along the dummy area D (see 310). A plurality of reinforcing members 300 may be arranged along the dummy area D Spaced apart or touching each other (see 320). The width of the reinforcement member 300 is equal to or less than the width of the dummy area D, and the thickness of the reinforcement member 300 may be greater than the thickness of the circuit layer 120. However, it is not limited to this.

在圖2中,加強構件300被示出為暴露於表面上方。然而,加強構件300被第二阻焊層400覆蓋且因此不被暴露至外部,因此其藉由虛線來指示。 In FIG. 2, the reinforcement member 300 is shown as being exposed above the surface. However, the reinforcing member 300 is covered by the second solder resist layer 400 and therefore is not exposed to the outside, so it is indicated by a dotted line.

第一阻焊層200可設置有基準標記(fiducial mark)的圖案330。基準標記的圖案330是由金屬(例如與加強構件300相同的金屬)製成且可在形成加強構件300時一同製作。在此種情形中,加強構件300被定位在第一阻焊層200的上表面上。基準標記的圖案330可被形成為孔形且並非金屬。基準標記的圖案330可為工作孔或製造孔。在此種情形中,基準標記的圖案330穿透第一阻焊層200。此基準標記的圖案330可用於後處理中的基底條的位置辨識。 The first solder resist layer 200 may be provided with a pattern 330 of fiducial marks. The pattern 330 of the fiducial mark is made of metal (for example, the same metal as the reinforcing member 300) and can be made together when the reinforcing member 300 is formed. In this case, the reinforcement member 300 is positioned on the upper surface of the first solder resist layer 200. The pattern 330 of the fiducial mark may be formed in a hole shape and not metal. The pattern 330 of the fiducial mark may be a working hole or a manufacturing hole. In this case, the pattern 330 of the fiducial mark penetrates the first solder resist layer 200. The pattern 330 of this fiducial mark can be used to identify the position of the base strip in the post-processing.

第二阻焊層400可積層於第一阻焊層200上以覆蓋加強構件300。第二阻焊層400的厚度等於或大於加強構件300的厚度,且加強構件300被第一阻焊層200及第二阻焊層400所環繞。加強構件300不被暴露至外部。亦即,加強構件300是與第一阻焊層200的上表面接觸,且加強構件300的不與第一阻焊層200接觸的表面是與第二阻焊層400接觸。 The second solder resist layer 400 may be laminated on the first solder resist layer 200 to cover the reinforcing member 300. The thickness of the second solder resist layer 400 is equal to or greater than the thickness of the reinforcement member 300, and the reinforcement member 300 is surrounded by the first solder resist layer 200 and the second solder resist layer 400. The reinforcement member 300 is not exposed to the outside. That is, the reinforcing member 300 is in contact with the upper surface of the first solder resist layer 200, and the surface of the reinforcing member 300 that is not in contact with the first solder resist layer 200 is in contact with the second solder resist layer 400.

第二阻焊層400可由與第一阻焊層200相同的材料形成。第二阻焊層400亦可由具有較第一阻焊層200更高的剛性或 模數的材料形成。 The second solder resist layer 400 may be formed of the same material as the first solder resist layer 200. The second solder resist layer 400 may also have a higher rigidity than the first solder resist layer 200 or Modular material is formed.

第二阻焊層400不形成於單元區域U上而僅形成於虛設區域D上,因而使得第二阻焊層400的覆蓋第一阻焊層200的面積可相同於或小於虛設區域D的面積。另外,第二阻焊層400是在基底條封裝後進行切割時被移除,且在封裝製程完成之前對基底條提供剛性。 The second solder resist layer 400 is not formed on the unit area U but only on the dummy area D, so that the area of the second solder resist layer 400 covering the first solder resist layer 200 can be the same as or smaller than the area of the dummy area D . In addition, the second solder resist layer 400 is removed when cutting the base strip after packaging, and provides rigidity to the base strip before the packaging process is completed.

第二阻焊層400設置有側向開口的模製澆口(mold gate)420。模製澆口420是在基底條封裝製程中引入模製構件430的入口。第二阻焊層400形成於除了欲成為模製澆口420區域以外的區域中。 The second solder resist layer 400 is provided with a mold gate 420 that opens laterally. The molded gate 420 is an entrance for introducing the molded component 430 in the substrate strip packaging process. The second solder resist layer 400 is formed in a region other than the region to be the mold gate 420.

模製澆口420的位置及數目不受限定。在圖2中,多個模製澆口420是例示性地示出位於基底條的一個側表面上。然而,本發明並非僅限於此位置及數目。 The position and number of the molded gate 420 are not limited. In FIG. 2, a plurality of molded gates 420 are exemplarily shown on one side surface of the base strip. However, the present invention is not limited to this position and number.

第二阻焊層400設置有朝上開口的開口410且由此基準標記的圖案330經由開口410而暴露。當基準標記的圖案330被形成為孔形時,開口410可被形成為與孔對應。然而,當基準標記的圖案330不需要暴露時,例如當基準標記的圖案330可藉由X射線等而經由第二阻焊層400來辨識時,第二阻焊層400可覆蓋基準標記的圖案330,且上述開口410可為不必要的。 The second solder resist layer 400 is provided with an opening 410 opening upward and thus the pattern 330 of the fiducial mark is exposed through the opening 410. When the pattern 330 of the fiducial mark is formed in a hole shape, the opening 410 may be formed to correspond to the hole. However, when the pattern 330 of the fiducial mark does not need to be exposed, for example, when the pattern 330 of the fiducial mark can be identified through the second solder resist layer 400 by X-rays or the like, the second solder resist layer 400 may cover the pattern of the fiducial mark 330, and the above-mentioned opening 410 may be unnecessary.

圖3是示出根據本發明實施例的電子部件500的封裝的剖視圖。圖4示出根據本發明實施例的電子部件500的封裝的模製製程。 FIG. 3 is a cross-sectional view showing a package of an electronic component 500 according to an embodiment of the present invention. FIG. 4 shows a molding process of a package of an electronic component 500 according to an embodiment of the present invention.

參照圖3,根據本發明實施例的電子部件500的封裝包括:基底條,被分成單元區域U及虛設區域D;以及電子部件500,安裝於單元區域U上。如參照圖1及圖2所述,基底條包括積層體100、第一阻焊層200、加強構件300以及第二阻焊層400。 3, the package of the electronic component 500 according to the embodiment of the present invention includes: a base strip divided into a unit area U and a dummy area D; and an electronic component 500 mounted on the unit area U. As described with reference to FIGS. 1 and 2, the base strip includes a laminated body 100, a first solder resist layer 200, a reinforcement member 300, and a second solder resist layer 400.

對於基底條而言,積層體100、第一阻焊層200、加強構件300以及第二阻焊層400與以上所闡述的該些相同,因此將省略其說明。 Regarding the base strip, the laminated body 100, the first solder resist layer 200, the reinforcement member 300, and the second solder resist layer 400 are the same as those explained above, and therefore the description thereof will be omitted.

電子部件500安裝於基底條上且具體而言是安裝於第一阻焊層200的空腔210中。更具體而言,電子部件500是藉由接合構件510而安裝於經由空腔210而被暴露出的位於積層體100的一個表面上的端子墊121'上。接合構件510可為焊料。電子部件500是藉由接合構件510而與積層體100的一個表面間隔開,且可在電子部件500與積層體100的所述一個表面之間夾置底部填充膠520。然而,除使用接合構件510的倒裝晶片法外,電子部件500亦可藉由打線接合法而安裝於基底條上。 The electronic component 500 is mounted on the base strip and specifically mounted in the cavity 210 of the first solder resist layer 200. More specifically, the electronic component 500 is mounted on the terminal pad 121 ′ on one surface of the laminated body 100 exposed through the cavity 210 by the bonding member 510. The joining member 510 may be solder. The electronic component 500 is spaced apart from one surface of the laminated body 100 by the bonding member 510, and an underfill 520 may be sandwiched between the electronic component 500 and the one surface of the laminated body 100. However, in addition to the flip chip method using the bonding member 510, the electronic component 500 can also be mounted on the base strip by wire bonding.

安裝於基底條上的電子部件500包括各種元件,例如主動元件、被動元件以及積體電路(integrated circuit,IC),且可為例如半導體晶片。可在單元區域U的每一單元U'上安裝一個電子部件500,或可在每一單元U'上安裝多個電子部件500。 The electronic component 500 mounted on the substrate bar includes various components, such as active components, passive components, and integrated circuits (IC), and may be, for example, semiconductor chips. One electronic component 500 may be installed on each unit U′ of the unit area U, or a plurality of electronic components 500 may be installed on each unit U′.

根據本發明實施例的電子部件500的封裝可更包括形成於第一阻焊層200上的模製構件430以覆蓋所安裝的電子部件500。模製構件430可被引入至空腔210中以覆蓋電子部件500。 The package of the electronic component 500 according to the embodiment of the present invention may further include a molding member 430 formed on the first solder resist layer 200 to cover the mounted electronic component 500. The molding member 430 may be introduced into the cavity 210 to cover the electronic part 500.

參照圖4,模製構件430可經由模製澆口420流動至基底條上。模製構件430可藉由採用第二阻焊層400作為擋壩(dam)而形成於第一阻焊層200及電子部件500上。結果,如圖3所示,模製構件430可形成為較第二阻焊層400的高度低的高度。然而,並非僅限於此。 Referring to FIG. 4, the molding member 430 may flow onto the base strip through the molding gate 420. The molding member 430 may be formed on the first solder resist layer 200 and the electronic component 500 by using the second solder resist layer 400 as a dam. As a result, as shown in FIG. 3, the molding member 430 may be formed to a height lower than that of the second solder resist layer 400. However, it is not limited to this.

根據本發明實施例的電子部件500的封裝可在形成模製構件430後按照單元U'來切割。 The package of the electronic component 500 according to the embodiment of the present invention may be cut according to the unit U′ after the molding member 430 is formed.

圖5至圖12是示出根據本發明實施例的在製造基底條的方法中所用的製程的剖視圖。 5 to 12 are cross-sectional views showing the manufacturing process used in the method of manufacturing the base strip according to the embodiment of the present invention.

參照圖5,形成積層體100。積層體100可形成有依序堆疊的多個絕緣層110。可利用載體而以無芯形式形成積層體100。在此種情形中,可將形成於積層體100的一個表面上的電路層121嵌入於絕緣層110中。當形成積層體100時,可藉由各種方法形成電路層120,例如改良半加成方法(MSAP)、半加成方法(SAP)以及覆蓋(tenting)。 Referring to FIG. 5, a laminated body 100 is formed. The laminated body 100 may be formed with a plurality of insulating layers 110 stacked in sequence. The laminated body 100 can be formed in a coreless form using a carrier. In this case, the circuit layer 121 formed on one surface of the laminated body 100 may be embedded in the insulating layer 110. When forming the laminate 100, the circuit layer 120 can be formed by various methods, such as a modified semi-additive method (MSAP), a semi-additive method (SAP), and tenting.

參照圖6,在積層體100上形成第一阻焊層200。將金屬箔S1貼合於第一阻焊層200的一個表面上且使第一阻焊層200的另一表面與積層體100接觸,以使得金屬箔S1位於外側上。 Referring to FIG. 6, a first solder resist layer 200 is formed on the laminated body 100. The metal foil S1 is attached to one surface of the first solder resist layer 200 and the other surface of the first solder resist layer 200 is in contact with the laminated body 100 so that the metal foil S1 is located on the outside.

參照圖7,在第一阻焊層200上形成圖案遮罩M以對第一阻焊層200進行圖案化。此處,圖案遮罩M可為乾膜。當金屬箔S1貼合至第一阻焊層200的一個表面時,圖案遮罩M被定位在金屬箔S1上。 Referring to FIG. 7, a pattern mask M is formed on the first solder resist layer 200 to pattern the first solder resist layer 200. Here, the pattern mask M may be a dry film. When the metal foil S1 is attached to one surface of the first solder resist layer 200, the pattern mask M is positioned on the metal foil S1.

參照圖8,對第一阻焊層200進行圖案化以在上部阻焊層200a中形成空腔210並在下部阻焊層200b中形成開口區域220。在對第一阻焊層200進行圖案化後,將圖案遮罩M剝離。 Referring to FIG. 8, the first solder resist layer 200 is patterned to form a cavity 210 in the upper solder resist layer 200a and an opening area 220 in the lower solder resist layer 200b. After patterning the first solder resist layer 200, the pattern mask M is peeled off.

經由曝光及顯影製程,使得第一阻焊層200可包括空腔210及開口區域220。例如,當第一阻焊層200為負型時,圖案遮罩M覆蓋空腔210及開口區域220,然後對第一阻焊層200進行曝光,並經由顯影製程將未曝光部分移除。另一方面,當第一阻焊層200為正型時,圖案遮罩M開放空腔210及開口區域220,然後對第一阻焊層200進行曝光,且經由顯影製程將被曝光部分移除。在其中金屬箔S1貼合至第一阻焊層200的一個表面的情形中,可在移除與空腔210及開口區域220對應的金屬箔S1後執行曝光及顯影製程。 Through the exposure and development process, the first solder resist layer 200 can include a cavity 210 and an open area 220. For example, when the first solder resist layer 200 is of a negative type, the pattern mask M covers the cavity 210 and the opening area 220, and then the first solder resist layer 200 is exposed, and the unexposed part is removed through a development process. On the other hand, when the first solder resist layer 200 is a positive type, the pattern mask M opens the cavity 210 and the opening area 220, and then exposes the first solder resist layer 200, and the exposed part is removed through a development process . In the case where the metal foil S1 is attached to one surface of the first solder resist layer 200, the exposure and development process may be performed after the metal foil S1 corresponding to the cavity 210 and the opening area 220 is removed.

與此同時,可藉由雷射處理、噴砂處理(blast processing)等形成第一阻焊層200的空腔210及開口區域220。 At the same time, the cavity 210 and the opening area 220 of the first solder resist layer 200 can be formed by laser processing, blast processing, or the like.

參照圖9及圖10,在第一阻焊層200上形成晶種層S2,且在晶種層S2上積層阻鍍層(plating resist)R。使阻鍍層R對欲形成加強構件300的區開口,且經由電鍍而形成加強構件300。可藉由無電鍍覆(electroless plating)來形成晶種層S2。晶種層S2可形成在第一阻焊層200的空腔210的底表面及內壁上。當金屬箔S1貼合至第一阻焊層200時,晶種層S2形成在金屬箔S1上。 9 and 10, a seed layer S2 is formed on the first solder resist layer 200, and a plating resist R is laminated on the seed layer S2. The plating resist layer R is opened to the region where the reinforcing member 300 is to be formed, and the reinforcing member 300 is formed by electroplating. The seed layer S2 can be formed by electroless plating. The seed layer S2 may be formed on the bottom surface and the inner wall of the cavity 210 of the first solder resist layer 200. When the metal foil S1 is attached to the first solder resist layer 200, the seed layer S2 is formed on the metal foil S1.

參照圖11,剝離阻鍍層R,且亦將除加強構件300的區之外的晶種層S2移除。當金屬箔S1貼合至第一阻焊層200時, 除加強構件300的區之外的金屬箔S1及晶種層S2被移除。 11, the plating resist layer R is peeled off, and the seed layer S2 except for the region of the reinforcing member 300 is also removed. When the metal foil S1 is attached to the first solder resist layer 200, The metal foil S1 and the seed layer S2 except for the area of the reinforcing member 300 are removed.

參照圖12,形成第二阻焊層400。第二阻焊層400形成在第一阻焊層200上以環繞加強構件300。第二阻焊層400是藉由以下方式形成:在基底條(單元區域U及虛設區域D兩者)的整個表面上施用阻焊劑,將位於單元區域U上的阻焊劑移除,且保留位於虛設區域D上的阻焊劑。可藉由機械處理(例如曝光/顯影或噴砂)來達成阻焊劑的移除。在此種情形中,當第一阻焊層200及第二阻焊層400均為感光性時,第一阻焊層200與第二阻焊層400可由不同的材料形成,或者可具有與不同的光(例如,不同波長)進行反應的特性,使得當藉由曝光/顯影來形成第二阻焊層400時第一阻焊層200不會受影響。 Referring to FIG. 12, a second solder resist layer 400 is formed. The second solder resist layer 400 is formed on the first solder resist layer 200 to surround the reinforcing member 300. The second solder resist layer 400 is formed by applying a solder resist on the entire surface of the base strip (both the unit area U and the dummy area D), removing the solder resist located on the unit area U, and leaving Solder resist on dummy area D. The removal of solder resist can be achieved by mechanical processing (such as exposure/development or sandblasting). In this case, when the first solder resist layer 200 and the second solder resist layer 400 are both photosensitive, the first solder resist layer 200 and the second solder resist layer 400 may be formed of different materials, or may have different The characteristic of reacting with light (for example, different wavelengths) makes the first solder resist layer 200 unaffected when the second solder resist layer 400 is formed by exposure/development.

儘管本揭露包括具體實例,然而對於此項技術中具有通常知識者而言將顯而易見的是,在不背離申請專利範圍及其等效範圍的精神及範圍的條件下,可對該些實例作出各種形式及細節上的變化。本文所述的實例應被視為僅具有說明性意義而非用於限制。每一實例中的特徵或態樣的說明應被視為可適用於其他實例中的相似的特徵或態樣。若所述的技術以不同次序來執行及/或若所述系統、架構、裝置或電路中的部件以不同的方式進行組合及/或藉由其他部件或其等效形式來替換或補充,則可達成合適的結果。因此,本揭露的範圍並非由詳細說明來界定,而是由申請專利範圍及其等效範圍來界定,且處於申請專利範圍及其等效範圍的範圍內的所有變型應被視為包括在本揭露中。 Although the present disclosure includes specific examples, it will be obvious to those with ordinary knowledge in the art that, without departing from the spirit and scope of the scope of the patent application and its equivalent scope, various examples can be made. Changes in form and details. The examples described herein should be considered as illustrative only and not restrictive. The description of the features or aspects in each example should be regarded as applicable to similar features or aspects in other examples. If the described technologies are executed in a different order and/or if the components in the system, architecture, device or circuit are combined in different ways and/or replaced or supplemented by other components or their equivalent forms, then A suitable result can be achieved. Therefore, the scope of this disclosure is not defined by the detailed description, but by the scope of the patent application and its equivalent scope, and all variants within the scope of the patent application and its equivalent scope shall be deemed to be included in this disclosure. Revealing.

100‧‧‧積層體 100‧‧‧Layered body

110‧‧‧絕緣層 110‧‧‧Insulation layer

120、121、122‧‧‧電路層 120、121、122‧‧‧Circuit layer

121'‧‧‧端子墊 121'‧‧‧Terminal pad

130‧‧‧通孔 130‧‧‧Through hole

200‧‧‧第一阻焊層 200‧‧‧First solder mask

200a‧‧‧上部阻焊層 200a‧‧‧Upper solder mask

200b‧‧‧下部阻焊層 200b‧‧‧Lower solder mask

210‧‧‧空腔 210‧‧‧cavity

220‧‧‧開口區域 220‧‧‧Opening area

300‧‧‧加強構件 300‧‧‧Strengthening member

400‧‧‧第二阻焊層 400‧‧‧Second solder mask

B‧‧‧邊界 B‧‧‧Border

D‧‧‧虛設區域 D‧‧‧Dummy area

S1‧‧‧金屬箔 S1‧‧‧Metal foil

S2‧‧‧晶種層 S2‧‧‧Seed layer

U‧‧‧單元區域 U‧‧‧unit area

U'‧‧‧單元 Unit U'‧‧‧

Claims (21)

一種基底條,包括: 積層體,由絕緣層及電路層構成; 第一阻焊層,形成於所述積層體上; 加強構件,形成於所述第一阻焊層上;以及 第二阻焊層,形成於所述第一阻焊層上以覆蓋所述加強構件, 其中所述積層體被分成單元區域與虛設區域,且 其中所述加強構件及所述第二阻焊層形成於所述虛設區域上。A base strip comprising: a laminated body composed of an insulating layer and a circuit layer; a first solder resist layer formed on the laminated body; a reinforcing member formed on the first solder resist layer; and a second solder resist layer Layer formed on the first solder resist layer to cover the reinforcement member, wherein the laminate is divided into a unit area and a dummy area, and wherein the reinforcement member and the second solder resist layer are formed on the On the dummy area. 如申請專利範圍第1項所述的基底條,其中所述第一阻焊層形成於所述單元區域及所述虛設區域上,且所述加強構件及所述第二阻焊層不形成於所述單元區域上。The base strip according to claim 1, wherein the first solder resist layer is formed on the unit area and the dummy area, and the reinforcing member and the second solder resist layer are not formed on The unit area. 如申請專利範圍第2項所述的基底條,其中在所述第一阻焊層的所述單元區域上形成有空腔,以暴露出所述積層體的一個表面。The base strip as described in item 2 of the scope of patent application, wherein a cavity is formed in the unit region of the first solder resist layer to expose one surface of the laminate. 如申請專利範圍第1項所述的基底條,其中所述第一阻焊層形成於所述積層體的兩個表面上,且所述加強構件形成於位於所述積層體的一個表面上的所述第一阻焊層上,但不形成於在所述積層體的另一表面上所形成的所述第一阻焊層上。The base strip as described in claim 1, wherein the first solder resist layer is formed on both surfaces of the laminated body, and the reinforcing member is formed on one surface of the laminated body On the first solder resist layer, but not on the first solder resist layer formed on the other surface of the laminate. 如申請專利範圍第1項所述的基底條,其中所述加強構件被所述第一阻焊層及所述第二阻焊層所環繞。The base strip according to the first item of the scope of patent application, wherein the reinforcing member is surrounded by the first solder resist layer and the second solder resist layer. 如申請專利範圍第1項所述的基底條,其中所述加強構件是由金屬製成,所述金屬包括與所述電路層相同的金屬。The base strip according to item 1 of the scope of patent application, wherein the reinforcing member is made of metal, and the metal includes the same metal as the circuit layer. 如申請專利範圍第1項所述的基底條,其中形成有多個加強構件,且所述多個加強構件被設置成沿所述虛設區域彼此間隔開或彼此接觸。The base strip as described in claim 1, wherein a plurality of reinforcing members are formed, and the plurality of reinforcing members are arranged to be spaced apart from each other or in contact with each other along the dummy area. 如申請專利範圍第1項所述的基底條,其中所述第二阻焊層設置有向所述第二阻焊層的側表面開口的模製澆口。The base strip according to the first item of the scope of patent application, wherein the second solder resist layer is provided with a mold gate opening to the side surface of the second solder resist layer. 如申請專利範圍第1項所述的基底條,其中在所述第一阻焊層上形成基準標記之圖案,且在所述第二阻焊層上形成有開口以暴露出所述基準標記之圖案的上表面。The base strip as described in item 1 of the scope of patent application, wherein a pattern of a fiducial mark is formed on the first solder resist layer, and an opening is formed on the second solder resist layer to expose the fiducial mark The upper surface of the pattern. 如申請專利範圍第1項所述的基底條,其中所述虛設區域是沿所述單元區域的邊緣形成。The base strip as described in item 1 of the scope of patent application, wherein the dummy area is formed along the edge of the unit area. 一種電子部件封裝,包括: 基底條,被分成單元區域及虛設區域;以及 電子部件,安裝於所述單元區域上, 其中所述基底條包括: 積層體,由絕緣層及電路層構成; 第一阻焊層,形成於所述積層體上; 加強構件,形成於所述第一阻焊層上;以及 第二阻焊層,形成於所述第一阻焊層上以覆蓋所述加強構件, 其中所述加強構件及所述第二阻焊層形成於所述虛設區域上。An electronic component package, comprising: a base strip divided into a unit area and a dummy area; and electronic components mounted on the unit area, wherein the base strip includes: a laminated body composed of an insulating layer and a circuit layer; first A solder resist layer formed on the laminated body; a reinforcement member formed on the first solder resist layer; and a second solder resist layer formed on the first solder resist layer to cover the reinforcement member, The reinforcing member and the second solder resist layer are formed on the dummy area. 如申請專利範圍第11項所述的電子部件封裝,其中所述第一阻焊層形成於所述單元區域及所述虛設區域上,且所述加強構件及所述第二阻焊層不形成於所述單元區域上。The electronic component package according to claim 11, wherein the first solder resist layer is formed on the unit area and the dummy area, and the reinforcing member and the second solder resist layer are not formed On the unit area. 如申請專利範圍第12項所述的電子部件封裝,其中在所述第一阻焊層的所述單元區域上形成有空腔,以暴露出所述積層體的一個表面。The electronic component package according to the 12th patent application, wherein a cavity is formed in the unit area of the first solder resist layer to expose one surface of the laminated body. 如申請專利範圍第11項所述的電子部件封裝,其中所述第一阻焊層形成於所述積層體的兩個表面上,且所述加強構件形成於位於所述積層體的一個表面上的所述第一阻焊層上,但不形成於在所述積層體的另一表面上所形成的所述第一阻焊層上。The electronic component package described in claim 11, wherein the first solder resist layer is formed on both surfaces of the laminated body, and the reinforcing member is formed on one surface of the laminated body On the first solder resist layer, but not on the first solder resist layer formed on the other surface of the laminate. 如申請專利範圍第11項所述的電子部件封裝,其中所述加強構件被所述第一阻焊層及所述第二阻焊層所環繞。The electronic component package according to claim 11, wherein the reinforcing member is surrounded by the first solder resist layer and the second solder resist layer. 如申請專利範圍第11項所述的電子部件封裝,其中所述加強構件是由金屬製成,所述金屬包括與所述電路層相同的金屬。The electronic component package according to the 11th patent application, wherein the reinforcing member is made of metal, and the metal includes the same metal as the circuit layer. 如申請專利範圍第11項所述的電子部件封裝,其中形成有多個加強構件,且所述多個加強構件被設置成沿所述虛設區域彼此間隔開或彼此接觸。The electronic component package as described in claim 11, wherein a plurality of reinforcing members are formed, and the plurality of reinforcing members are arranged to be spaced apart from each other or in contact with each other along the dummy area. 如申請專利範圍第11項所述的電子部件封裝,其中所述第二阻焊層設置有向所述第二阻焊層的側表面開口的模製澆口。The electronic component package according to the 11th patent application, wherein the second solder resist layer is provided with a mold gate opening to the side surface of the second solder resist layer. 如申請專利範圍第11項所述的電子部件封裝,其中在所述第一阻焊層上形成基準標記之圖案,且在所述第二阻焊層上形成有開口以暴露出所述基準標記之圖案的上表面。The electronic component package as described in claim 11, wherein a pattern of a fiducial mark is formed on the first solder resist layer, and an opening is formed on the second solder resist layer to expose the fiducial mark The upper surface of the pattern. 如申請專利範圍第11項所述的電子部件封裝,其中所述虛設區域是沿所述單元區域的邊緣形成。The electronic component package as described in claim 11, wherein the dummy area is formed along the edge of the unit area. 如申請專利範圍第11項所述的電子部件封裝,更包括: 模製構件,位於所述第一阻焊層上以覆蓋所述電子部件。The electronic component package described in item 11 of the scope of the patent application further includes: a molded member located on the first solder resist layer to cover the electronic component.
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