TWI739379B - Semiconductor device, semiconductor device manufacturing method, and wire bonding device - Google Patents
Semiconductor device, semiconductor device manufacturing method, and wire bonding device Download PDFInfo
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Abstract
本發明提高接合導線的拉力強度。半導體裝置10包括:電路基板11,包含電極墊13;半導體晶片12,包含對電極墊13電性連接的電極墊14;以及導線20,一端連接於電極墊13,另一端連接於電極墊14。導線20具有:第一導線部24,沿著電極墊13延伸,一部分被按壓而與電極墊13電性接合;第二導線部26,以不接觸第一導線部24的方式,沿與電極墊13交叉的方向延伸;第三導線部27,向電極墊14延伸;第一彎曲部28,將第一導線部24連接於第二導線部26;以及第二彎曲部29,將第二導線部26連接於第三導線部27。 The invention improves the tensile strength of the bonding wire. The semiconductor device 10 includes: a circuit substrate 11 including an electrode pad 13; a semiconductor chip 12 including an electrode pad 14 electrically connected to the electrode pad 13; The wire 20 has a first wire portion 24 extending along the electrode pad 13 and a part of it is pressed to be electrically connected to the electrode pad 13; 13 extends in a crossing direction; the third wire portion 27 extends to the electrode pad 14; the first bending portion 28 connects the first wire portion 24 to the second wire portion 26; and the second bending portion 29 connects the second wire portion 26 is connected to the third lead part 27.
Description
本發明是有關於一種半導體裝置、半導體裝置的製造方法以及打線接合裝置。 The invention relates to a semiconductor device, a method of manufacturing a semiconductor device, and a wire bonding device.
設於電路基板的電極、與設於電路基板的半導體晶片的電極藉由金屬製的極細導線而電性連接。此種連接技術被稱為所謂的打線接合。作為打線接合的一種的楔形接合(wedge bonding)於將導線按壓於電極的狀態下賦予熱或超音波等能量,藉此將導線與電極物理及電性連接。例如,專利文獻1、專利文獻2揭示與楔形接合有關的技術。
The electrodes provided on the circuit board and the electrodes of the semiconductor chip provided on the circuit board are electrically connected by metal ultra-fine wires. This type of connection technique is called so-called wire bonding. Wedge bonding, which is a kind of wire bonding, applies energy such as heat or ultrasonic waves while pressing the wire against the electrode, thereby physically and electrically connecting the wire and the electrode. For example,
[現有技術文獻] [Prior Art Literature]
[專利文獻] [Patent Literature]
[專利文獻1]日本專利特開2007-273991號公報 [Patent Document 1] Japanese Patent Laid-Open No. 2007-273991
[專利文獻2]日本專利特開2016-062962號公報 [Patent Document 2] Japanese Patent Laid-Open No. 2016-062962
對於導線,要求維持連接於兩端的電極間的電性連接。例如,於導線被切斷的情形及導線自電極剝離的情形時,無法維 持電性連接。因此,對於經接合的導線,要求被稱為拉力強度的機械強度。所謂拉力強度,為於將兩端連接於電極的導線拉伸的狀態下,產生導線的切斷或導線與電極的剝離的荷重。 For wires, it is required to maintain the electrical connection between the electrodes connected to both ends. For example, when the wire is cut and the wire is peeled from the electrode, it cannot be maintained. Support electrical connection. Therefore, for the bonded wires, mechanical strength called tensile strength is required. The so-called tensile strength is a load that causes cutting of the lead or peeling of the lead from the electrode in a state where the lead connected to the electrode at both ends is stretched.
該技術領域中,期望提高拉力強度。因此,本發明的目的在於提供一種拉力強度經提高的半導體裝置、該半導體裝置的製造方法、以及製造該半導體裝置的打線接合裝置。 In this technical field, it is desired to improve the tensile strength. Therefore, an object of the present invention is to provide a semiconductor device with improved tensile strength, a method of manufacturing the semiconductor device, and a wire bonding device for manufacturing the semiconductor device.
本揭示的一形態的半導體裝置包括:第一電極;第二電極,與第一電極電性連接;以及接合導線,一端接合於第一電極,另一端接合於第二電極,接合導線具有:第一導線部,沿著第一電極的表面延伸,一部分被按壓而與第一電極電性接合;第二導線部,以不接觸第一導線部的方式,沿自第一電極的表面立起的方向延伸;第三導線部,向第二電極延伸,端部被按壓而與第二電極電性接合;第一彎曲部,將第一導線部延伸的方向彎曲成第二導線部延伸的方向;以及第二彎曲部,將第二導線部延伸的方向彎曲成第三導線部延伸的方向。 A semiconductor device of one form of the present disclosure includes: a first electrode; a second electrode electrically connected to the first electrode; and a bonding wire, one end of which is bonded to the first electrode, and the other end to the second electrode, the bonding wire has: A lead part extends along the surface of the first electrode, and a part of it is pressed to be electrically connected to the first electrode; the second lead part, in a way that does not touch the first lead part, extends along the surface of the first electrode Direction extension; the third wire portion extends to the second electrode, and the end portion is pressed to be electrically connected to the second electrode; the first bending portion bends the direction in which the first wire portion extends into the direction in which the second wire portion extends; And the second bending part, which bends the direction in which the second wire part extends to the direction in which the third wire part extends.
接合導線在接合於第一電極的部位與接合於第二電極的部位之間,設有第一導線部的一部分、第二導線部、第一彎曲部以及第二彎曲部。即,在接合於第一電極的部位與接合於第二電極的部位之間,抽出有充分長度的接合導線。而且,接合導線包含第一彎曲部以及第二彎曲部。進而,接合導線具有沿著第一電極延伸的第一導線部。根據該些構成,於拉應力作用於接合導 線時,負荷並未直接作用於接合於第一電極的部位。負荷由第一導線部的一部分、第二導線部、第三導線部、第一彎曲部以及第二彎曲部負擔。該些部位並未如接合於第一電極的部位般受到剖面形狀變化般的加工,故而至少維持接合導線原本具有的強度。因此,接合導線可提高拉力強度。 The bonding wire is provided with a part of the first lead part, the second lead part, the first bending part, and the second bending part between the part joined to the first electrode and the part joined to the second electrode. That is, a bonding wire having a sufficient length is drawn between the part to be bonded to the first electrode and the part to be bonded to the second electrode. Furthermore, the bonding wire includes a first bending portion and a second bending portion. Furthermore, the bonding wire has a first wire portion extending along the first electrode. According to these configurations, tensile stress acts on the bonding guide During the threading, the load does not directly act on the part joined to the first electrode. The load is borne by a part of the first lead part, the second lead part, the third lead part, the first bending part, and the second bending part. These parts are not processed as the cross-sectional shape changes like the parts bonded to the first electrode, so at least the original strength of the bonding wire is maintained. Therefore, the bonding wire can increase the tensile strength.
所述半導體裝置中,亦可為第一導線部含有接合部以及延伸部,所述接合部與第一電極電性接合,所述延伸部與接合部及第二導線部連續,延伸部的長度較接合部的長度更長。根據所述構成,可較佳地提高接合導線的拉力強度。 In the semiconductor device, the first wire portion may also include a bonding portion and an extension portion, the bonding portion is electrically bonded to the first electrode, and the extension portion is continuous with the bonding portion and the second wire portion, and the length of the extension portion It is longer than the length of the joint. According to the above configuration, the tensile strength of the bonding wire can be preferably improved.
所述半導體裝置的第一彎曲部中,第一導線部延伸的第一方向與第二導線部延伸的第二方向所成的角度亦可為90度以下。根據所述構成,可較佳地提高接合導線的拉力強度。 In the first bending portion of the semiconductor device, the angle formed by the first direction in which the first wire portion extends and the second direction in which the second wire portion extends may be 90 degrees or less. According to the above configuration, the tensile strength of the bonding wire can be preferably improved.
所述半導體裝置的第二彎曲部中,第二導線部延伸的第二方向與第三導線部延伸的第三方向所成的角度亦可為90度以上。根據所述構成,可較佳地提高接合導線的拉力強度。 In the second bending portion of the semiconductor device, the angle formed by the second direction in which the second wire portion extends and the third direction in which the third wire portion extends may also be 90 degrees or more. According to the above configuration, the tensile strength of the bonding wire can be preferably improved.
所述半導體裝置的第一彎曲部亦可為接合導線塑性變形而成的部分。根據所述構成,可較佳地提高接合導線的拉力強度。 The first bending part of the semiconductor device may also be a part formed by plastic deformation of a bonding wire. According to the above configuration, the tensile strength of the bonding wire can be preferably improved.
所述半導體裝置的第二彎曲部亦可為接合導線塑性變形而成的部分。根據所述構成,可較佳地提高接合導線的拉力強度。 The second bending part of the semiconductor device may also be a part formed by plastic deformation of a bonding wire. According to the above configuration, the tensile strength of the bonding wire can be preferably improved.
本揭示的另一形態為一種半導體裝置的製造方法,為包 括第一電極、與第一電極電性連接的第二電極、以及一端接合於第一電極且另一端接合於第二電極的半導體裝置的製造方法,包括:第一步驟,使用焊針將接合導線的一端接合於第一電極後,一邊抽出接合導線,一邊使焊針的前端移動至較接合導線的接合部更靠第二電極側且較接合部更靠上方的位置;第二步驟,使焊針的前端向第一電極下降並將接合導線的一部分按壓於第一電極,藉此形成第一彎曲部;第三步驟,一邊抽出接合導線,一邊使焊針的前端移動至較第一彎曲部更靠接合部側且較接合部更靠上方的位置;以及第四步驟,使焊針的前端向第一電極下降,藉此形成第二彎曲部。 Another aspect of the present disclosure is a method of manufacturing a semiconductor device, which is a package The method for manufacturing a semiconductor device including a first electrode, a second electrode electrically connected to the first electrode, and a semiconductor device with one end joined to the first electrode and the other end joined to the second electrode includes: a first step, using solder pins to join After one end of the wire is joined to the first electrode, while pulling out the bonding wire, move the tip of the soldering pin to a position that is closer to the second electrode than the junction of the wire and above the junction; the second step is to make The tip of the soldering pin is lowered to the first electrode and a part of the bonding wire is pressed against the first electrode, thereby forming the first bend; in the third step, the tip of the soldering pin is moved to a more first bend while pulling out the bonding wire The part is closer to the joining part and above the joining part; and in the fourth step, the tip of the soldering pin is lowered toward the first electrode, thereby forming a second bent part.
根據所述製造方法,可形成包含第一彎曲部以及第二彎曲部的接合導線的端部。因此,可提高半導體裝置的接合導線的拉力強度。 According to the manufacturing method, the end portion of the bonding wire including the first bent portion and the second bent portion can be formed. Therefore, the tensile strength of the bonding wire of the semiconductor device can be improved.
於本揭示的另一形態中,第一步驟亦可包含:一邊沿著第一電極的表面的法線方向抽出接合導線,一邊使焊針上升的步驟;以及一邊沿著與第一電極的表面的法線方向交叉的方向朝第二電極側抽出接合導線,一邊使焊針移動的步驟。根據所述步驟,能夠可靠地形成第一導線部。 In another aspect of the present disclosure, the first step may also include: pulling out the bonding wire along the normal direction of the surface of the first electrode while raising the solder pins; and moving along the surface of the first electrode. The step of pulling out the bonding wire toward the second electrode side in a direction crossing the normal direction of, while moving the solder pin. According to the above steps, the first wire portion can be reliably formed.
於本揭示的另一形態中,第三步驟亦可包含:一邊沿著第一電極的表面的法線方向抽出接合導線,一邊使焊針上升的步驟;以及一邊沿著與第一電極的表面的法線方向交叉的方向朝接合部側抽出接合導線,一邊使焊針移動的步驟。根據所述步驟, 能夠可靠地形成第二導線部。 In another aspect of the present disclosure, the third step may also include: pulling out the bonding wire along the normal direction of the surface of the first electrode while raising the solder pins; and moving along the surface of the first electrode. The step of pulling out the bonding wire toward the junction side in a direction crossing the normal direction of the, while moving the solder pin. According to the steps, The second lead part can be formed reliably.
本揭示的另一形態亦可於第四步驟後,更具有:第五步驟,使用焊針將接合導線的另一端接合於第二電極,第五步驟亦可包含:一邊沿著第一電極的表面的法線方向抽出接合導線,一邊使焊針上升的步驟;使焊針的前端移動至第二電極上的位置的步驟;以及將接合導線的另一端接合於第二電極的步驟。根據所述步驟,可形成將第一電極與第二電極連接的接合導線。 Another aspect of the present disclosure may also have after the fourth step: a fifth step, using a solder pin to join the other end of the bonding wire to the second electrode, and the fifth step may also include: one side along the first electrode The step of pulling out the bonding wire in the normal direction of the surface while raising the solder pin; the step of moving the tip of the solder pin to the position on the second electrode; and the step of bonding the other end of the bonding wire to the second electrode. According to the steps, a bonding wire connecting the first electrode and the second electrode can be formed.
本揭示的進而另一形態亦可為一種打線接合裝置,製造包括第一電極、與第一電極電性連接的第二電極、及一端接合於第一電極且另一端接合於第二電極的接合導線的半導體裝置,所述打線接合裝置包括:接合單元,包含可移動地構成的焊針;以及控制單元,控制接合單元的動作,控制單元將下述控制訊號提供給接合單元:第一控制訊號,使用焊針將接合導線的一端接合於第一電極後,一邊抽出接合導線,一邊使焊針的前端移動至較接合導線的接合部更靠第二電極側且較接合部更靠上方的位置;第二控制訊號,使焊針的前端向第一電極下降,將接合導線的一部分按壓於第一電極,藉此形成第一彎曲部;第三控制訊號,一邊抽出接合導線,一邊使焊針的前端移動至較第一彎曲部更靠接合部側且較接合部更靠上方的位置;以及第四控制訊號,使焊針的前端向第一電極下降,藉此形成第二彎曲部。 Yet another aspect of the present disclosure may also be a wire bonding device, which includes a first electrode, a second electrode electrically connected to the first electrode, and a bond having one end connected to the first electrode and the other end connected to the second electrode A wire-bonding semiconductor device, the wire bonding device includes: a bonding unit including a movably configured solder pin; and a control unit that controls the operation of the bonding unit, and the control unit provides the following control signal to the bonding unit: a first control signal , After using a soldering needle to join one end of the bonding wire to the first electrode, while pulling out the bonding wire, move the tip of the soldering needle to a position closer to the second electrode than the bonding part of the bonding wire and above the bonding part ; The second control signal, which makes the tip of the soldering needle descend toward the first electrode, presses a part of the bonding wire to the first electrode, thereby forming the first bend; The front end of the soldering pin moves to a position closer to the joining part than the first bending part and higher than the joining part; and the fourth control signal causes the front end of the welding needle to descend toward the first electrode, thereby forming a second bending part.
根據所述打線接合裝置,可形成包含第一彎曲部以及第二彎曲部的接合導線的端部。因此,可提高半導體裝置的接合導 線的拉力強度。 According to the wire bonding device, the end portion of the bonding wire including the first bending portion and the second bending portion can be formed. Therefore, the bonding conductance of the semiconductor device can be improved. The tensile strength of the wire.
於進而另一形態中,第一控制訊號亦可包含:一邊沿著第一電極的表面的法線方向抽出接合導線,一邊使焊針上升的控制訊號;以及一邊沿著與第一電極的表面的法線方向交叉的方向朝第二電極側抽出接合導線,一邊使焊針移動的控制訊號。根據所述構成,能夠可靠地形成第一導線部。 In yet another aspect, the first control signal may also include: a control signal for raising the solder pin while pulling out the bonding wire along the normal direction of the surface of the first electrode; A control signal for drawing the bonding wire toward the second electrode side in a direction crossing the normal direction of the, while moving the soldering needle. According to the above configuration, the first lead portion can be reliably formed.
於進而另一形態中,第三控制訊號亦可包含:一邊沿著第一電極的表面的法線方向抽出接合導線,一邊使焊針上升的控制訊號;以及一邊沿著與第一電極的表面的法線方向交叉的方向朝接合部側抽出接合導線,一邊使焊針移動的控制訊號。根據所述構成,能夠可靠地形成第二導線部。 In yet another form, the third control signal may also include: a control signal for raising the solder pin while pulling out the bonding wire along the normal direction of the surface of the first electrode; A control signal for pulling out the bonding wire toward the joint side in a direction crossing the normal direction of the wire while moving the soldering needle. According to the above configuration, the second lead portion can be reliably formed.
於進而另一形態中,控制單元亦可進而將第五控制訊號提供給接合單元,所述第五控制訊號使用焊針將接合導線的另一端接合於第二電極,第五控制訊號亦可包含:一邊沿著第一電極的表面的法線方向抽出接合導線,一邊使焊針上升的控制訊號;使焊針的前端移動至第二電極上的位置的控制訊號;以及使接合導線的另一端接合於第二電極的控制訊號。根據所述構成,可形成將第一電極與第二電極連接的接合導線。 In yet another form, the control unit may further provide a fifth control signal to the bonding unit. The fifth control signal uses a solder pin to bond the other end of the bonding wire to the second electrode, and the fifth control signal may also include : A control signal for raising the soldering pin while pulling out the bonding wire along the normal direction of the surface of the first electrode; a control signal for moving the tip of the soldering pin to the position on the second electrode; and the other end of the bonding wire The control signal connected to the second electrode. According to this configuration, a bonding wire connecting the first electrode and the second electrode can be formed.
根據本發明,提供一種拉力強度經提高的半導體裝置、該半導體裝置的製造方法、以及製造該半導體裝置的打線接合裝置。 According to the present invention, a semiconductor device with improved tensile strength, a method of manufacturing the semiconductor device, and a wire bonding device for manufacturing the semiconductor device are provided.
1:打線接合裝置 1: Wire bonding device
2:搬送單元 2: Conveying unit
3:接合單元 3: Joint unit
4:控制單元 4: control unit
6:移動機構 6: Mobile agency
7:接合工具 7: Joining tool
8:焊針 8: Soldering pin
10、110:半導體裝置 10.110: Semiconductor device
11:電路基板(第一電子零件) 11: Circuit board (first electronic part)
11a、12a、13a:主面 11a, 12a, 13a: main surface
12:半導體晶片(第二電子零件) 12: Semiconductor wafer (second electronic part)
13:電極墊(第一電極) 13: Electrode pad (first electrode)
14:電極墊(第二電極) 14: Electrode pad (second electrode)
20:導線(接合導線) 20: Wire (bonding wire)
21:端部(一端) 21: end (one end)
22:端部(另一端) 22: End (the other end)
24:第一導線部 24: The first wire part
24a:接合部 24a: Joint
24b:延伸部 24b: Extension
26:第二導線部 26: The second wire part
27:第三導線部 27: Third wire part
28:第一彎曲部 28: The first bend
29:第二彎曲部 29: second bend
120:導線 120: Wire
113:電極墊 113: Electrode pad
123:接合部 123: Joint
124:導線部 124: Wire part
125:頸部 125: neck
A1、A2:角度 A1, A2: Angle
D1、D2、D3:方向 D1, D2, D3: direction
P1:第一目標點 P1: The first target point
P2:第二目標點 P2: The second target point
P3:第三目標點 P3: Third target point
P4:第四目標點 P4: Fourth target point
P5:第五目標點 P5: Fifth target point
P6:第六目標點 P6: The sixth target point
P7:第七目標點 P7: Seventh target point
P8:第八目標點 P8: Eighth goal point
P9:第九目標點 P9: Ninth target point
S10~S13、S20、S30~S32、S40、S50~S53:步驟 S10~S13, S20, S30~S32, S40, S50~S53: steps
圖1為表示打線接合裝置的構成的圖。 Fig. 1 is a diagram showing the structure of a wire bonding device.
圖2為將半導體裝置的一部分放大表示的圖。 FIG. 2 is an enlarged view showing a part of the semiconductor device.
圖3為將圖2所示的導線的端部放大表示的圖。 Fig. 3 is an enlarged view showing the end of the wire shown in Fig. 2.
圖4為表示導線的形狀及焊針的目標點的圖。 Fig. 4 is a diagram showing the shape of the wire and the target point of the solder pin.
圖5為表示半導體裝置的製造方法的主要步驟的流程圖。 FIG. 5 is a flowchart showing main steps of a method of manufacturing a semiconductor device.
圖6的(a)部分、(b)部分及(c)部分為表示半導體裝置的製造方法的主要步驟的圖。 Parts (a), (b), and (c) of FIG. 6 are diagrams showing main steps of a method of manufacturing a semiconductor device.
圖7的(a)部分、(b)部分及(c)部分為表示半導體裝置的製造方法的繼圖6的(a)部分、(b)部分及(c)部分之後的主要步驟的圖。 Parts (a), (b), and (c) of FIG. 7 are diagrams showing main steps of the method of manufacturing a semiconductor device following parts (a), (b), and (c) of FIG. 6.
圖8的(a)部分及(b)部分為表示半導體裝置的製造方法的繼圖7的(a)部分、(b)部分及(c)部分之後的主要步驟的圖。 Parts (a) and (b) of FIG. 8 are diagrams showing main steps of the method of manufacturing a semiconductor device following parts (a), (b), and (c) of FIG. 7.
圖9為表示半導體裝置的製造方法的繼圖8之後的主要步驟的圖。 FIG. 9 is a diagram showing main steps subsequent to FIG. 8 in the method of manufacturing a semiconductor device.
圖10為將實施例的導線的端部放大拍攝的照片。 Fig. 10 is an enlarged photograph of the end of the wire of the embodiment.
圖11為將比較例的導線的端部放大表示的圖。 Fig. 11 is an enlarged view showing the end of the conductive wire of the comparative example.
以下,一方面參照附圖一方面對本發明的實施形態加以詳細說明。於圖式的說明中對相同要素標註相同符號,省略重複 的說明。 Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings on the one hand. In the description of the drawings, the same elements are marked with the same symbols, and repetitions are omitted instruction of.
[打線接合裝置] [Wire bonding device]
圖1所示的打線接合裝置1例如使用細徑的金屬導線將印刷基板等的電極、與設於該印刷基板的半導體元件的電極電性連接。打線接合裝置1對導線提供熱、超音波或壓力而將導線連接於電極。打線接合裝置1具有搬送單元2、接合單元3以及控制單元4。
The
搬送單元2將作為被處理零件的半導體裝置10搬送至接合區域。接合單元3包含移動機構6、接合工具7以及焊針8。移動機構6使焊針8移動。於接合工具7的前端,可裝卸地設有焊針8。焊針8對導線提供熱、超音波或壓力。控制單元4控制包含接合單元3的動作的、打線接合裝置1整體的動作。控制單元4將若干控制訊號提供給接合單元3。例如,控制訊號包含:用以控制焊針8相對於半導體裝置10的位置的訊號;以及用以開始及停止提供熱、超音波或壓力的訊號。關於控制單元4,將於後述。
The
[半導體裝置] [Semiconductor device]
圖2將圖1所示的半導體裝置10的一部分放大表示。半導體裝置10例如具有電路基板11(第一電子零件)、半導體晶片12(第二電子零件)以及導線20(接合導線)。半導體晶片12藉由固晶等而固定於電路基板11的主面11a。電路基板11具有一個或多個電極墊13(第一電極)。電極墊13設於電路基板11的主面11a。另外,半導體晶片12亦具有一個或多個電極墊14(第二電極)。
電極墊14設於半導體晶片12的主面12a。
FIG. 2 shows an enlarged part of the
導線20將電極墊13電性連接於電極墊14。例如,導線20由金(Au)、銀(Ag)、鋁(Al)、銅(Cu)及該些金屬的合金形成。另外,作為一例,導線20的直徑為20微米。導線20的其中一個端部21(一端)物理及電性連接於電路基板11的電極墊13。導線20的另一個端部22(另一端)物理及電性連接於半導體晶片12的電極墊14。
The
圖3將導線20的端部21放大而示意性地表示。作為一體物的導線20包含基於其形狀及機械性質的若干部分。
FIG. 3 schematically shows the
導線20包含第一導線部24、第二導線部26、第三導線部27、第一彎曲部28以及第二彎曲部29。
The
第一導線部24沿著電極墊13的表面延伸,其一部分被按壓而與電極墊13電性接合。第一導線部24包含與電極墊13電性接合的接合部24a、以及與接合部24a及第二導線部26連續的延伸部24b。
The
接合部24a對電極墊13物理及電性連接。此處所謂物理連接,是指導線20與電極墊13經接合。例如,接合部24a亦可設為產生針對拉伸力的阻力(反作用力)的部分。另外,所謂電性連接,是指導線20與電極墊13之間的電阻極小的狀態。
The
接合部24a由所謂的楔形接合形成。楔形接合於焊針8對電極墊13按壓導線20的狀態下,自焊針8提供能量(熱、超音波等)。其結果為,經按壓的部分被壓扁而變形為扁平狀,藉此
對電極墊13壓接導線20。即,接合部24a亦可設為具有較導線20的直徑更小的厚度的部分。
The joining
延伸部24b為自接合部24a連續地延伸的第一導線部24的一部分。延伸部24b保持導線20的剖面形狀,剖面形狀為大致圓形。延伸部24b沿著電極墊13的主面13a延伸。延伸部24b的長度例如可設為與焊針8的前端徑同等,或較焊針8的前端徑更大。延伸部24b於無需對電極墊13物理及電性連接的方面而言,與接合部24a不同。例如,延伸部24b亦可接觸電極墊13。根據該狀態,能夠視為延伸部24b對電極墊13電性連接。另一方面,延伸部24b無法對朝向主面13a的法線方向的拉伸力進行抵抗,故而不可謂物理連接。然而,延伸部24b並不排除對電極墊13物理連接的狀態,故而延伸部24b亦可對電極墊13物理連接。再者,延伸部24b亦可不對電極墊13進行接觸,而是延伸部24b自電極墊13的主面13a稍許遠離。根據該狀態,延伸部24b對電極墊13並未電性連接,亦未物理連接。
The
第二導線部26經由後述的第一彎曲部28而與第一導線部24的延伸部24b連續,沿與電極墊13的主面13a交叉的方向D2延伸。例如,第二導線部26亦可設為沿主面13a的法線方向延伸。即,第二導線部26為自主面13a豎起的導線20的一部分。第二導線部26延伸的方向D2(第二方向)與第一導線部24的延伸部24b延伸的方向D1(第一方向)所成的角度A1可為直角以下(90度以下)。換言之,方向D1、方向D2所成的角度A1為銳
角。作為一例,角度A1可設為20度以上且60度以下。即,第二導線部26延伸的方向D2包含主面13a的法線方向的成分、以及與第一導線部24的延伸部24b延伸的方向D1為相反方向的成分,相對於主面13a的法線方向而傾斜。另一方面,方向D1、方向D2所成的角度大於0度。即,方向D2相對於方向D1不平行。換言之,第二導線部26不對第一導線部24的延伸部24b進行接觸。第二導線部26的長度例如可設為與第一導線部24的延伸部24b相同程度。第二導線部26與第一導線部24的延伸部24b同樣地保持導線20的剖面形狀,剖面形狀為大致圓形。
The
第三導線部27經由後述的第二彎曲部29而與第二導線部26連續。第三導線部27的端部連接於半導體晶片12的電極墊14。因此,第三導線部27的長度大致對應於自電極墊13至電極墊14為止的距離。第三導線部27的形狀為圓弧狀,故而較自電極墊13至電極墊14為止的直線距離更長。第三導線部27自電路基板11的電極墊13向半導體晶片12的電極墊14延伸。例如,第二導線部26延伸的方向D2與第三導線部27延伸的方向D3(第三方向)所成的角度A2大於直角(90度以上),為鈍角。作為一例,角度A2可設為90度以上且120度以下。第三導線部27除了連接於電極墊14的端部以外,亦與第一導線部24的延伸部24b同樣地保持導線20的剖面形狀,剖面形狀為大致圓形。
The
第一彎曲部28設於第一導線部24與第二導線部26之間。即,第一彎曲部28為使第一導線部24的延伸部24b延伸的
方向D1變化為第二導線部26延伸的方向D2的部分。該第一彎曲部28的形狀為圓弧狀。第一彎曲部28為經實施彎曲加工的導線20的一部分。關於形成第一彎曲部28的彎曲加工的詳細內容,將於後述。該彎曲加工使導線20發生塑性變形。根據該塑性變形,於第一彎曲部28產生加工硬化。因此,第一彎曲部28的強度有時高於原本的導線20所具有的強度。
The
第二彎曲部29設於第二導線部26與第三導線部27之間。即,第二彎曲部29為使第二導線部26延伸的方向D2變化為第三導線部27延伸的方向D3的部分。該第二彎曲部29的形狀與第一彎曲部28同樣地為圓弧狀。第二彎曲部29為經實施彎曲加工的導線20的一部分。關於形成第二彎曲部29的彎曲加工的詳細內容,將於後述。因此,與第一彎曲部28同樣地,第二彎曲部29為發生塑性變形的部位,產生加工硬化。
The
[半導體裝置的製造方法] [Method of Manufacturing Semiconductor Device]
所述半導體裝置10是由打線接合裝置1製造。以下,一方面參照圖3、圖4、圖5以及圖6的(a)部分、(b)部分及(c)部分,一方面對打線接合裝置1的控制單元4的控制動作及半導體裝置10的製造方法進行說明。
The
圖4表示導線20的形狀及焊針8的目標點。控制單元4具有與預先設定的第一目標點P1~第九目標點P9(第九目標點參照圖9)有關的資訊。控制單元4以焊針8依序移動至該些第一目標點P1~第九目標點P9的方式,向接合單元3提供控制訊號。
另外,控制單元4亦將下述控制訊號提供給接合單元3,該控制訊號控制移動中的導線20的抽出的允許與停止。進而,控制單元4亦將下述控制訊號提供給接合單元3,該控制訊號控制自焊針8的超音波等的提供的允許與停止。
FIG. 4 shows the shape of the
第一目標點P1表示將導線20接合於電極墊13的位置。換言之,第一目標點P1為形成接合部24a的位置。於導線20的接合時,將導線20按壓於電極墊13的主面13a。因此,所謂第一目標點P1,設定於電極墊13的主面13a上。更詳細而言,自主面13a至第一目標點P1為止的距離與導線20的直徑同等,或略小於導線20的直徑。
The first target point P1 indicates the position where the
第二目標點P2為用以形成延伸部24b的一部分的位置。第二目標點P2設定於第一目標點P1的正上方。以下的說明中,將沿著主面13a的法線遠離主面13a的方向稱為「上方向」。另外,將沿著法線靠近主面13a的方向稱為「下方向」。第二目標點P2設定於通過第一目標點P1的主面13a的法線上。自主面13a至第二目標點P2為止的距離較自主面13a至第一目標點P1為止的距離更大。自第一目標點P1至第二目標點P2為止的距離例如可基於延伸部24b的長度而決定。
The second target point P2 is a position for forming a part of the
第三目標點P3亦為用以形成延伸部24b的一部分的位置。第三目標點P3設定於相對於第二目標點P2沿著與法線正交的軸線(以下記作「平行軸線」)遠離的位置。以下的說明中,將沿著平行軸線自電極墊13朝向電極墊14的方向稱為「順向」。另
外,將沿著平行軸線自電極墊14朝向電極墊13的方向稱為「逆向」。即,第三目標點P3設定於自第二目標點P2順向遠離既定距離的位置。例如,自第二目標點P2至第三目標點P3為止的距離例如可基於延伸部24b的長度而決定。即,自第二目標點P2至第三目標點P3為止的距離可與自第一目標點P1至第二目標點P2為止的距離同等,或亦可更大,或亦可更短。
The third target point P3 is also a position for forming a part of the
第四目標點P4為用以形成第一彎曲部28的位置。第四目標點P4是以相對於第三目標點P3朝下方向遠離的方式設定。因此,所謂自第三目標點P3向第四目標點P4的移動,是指朝下方向的移動。第四目標點P4是以較第一目標點P1更接近電極墊14的方式設定。第四目標點P4可以含有於主面13a的方式設定,或亦可設定於自主面13a遠離既定距離的位置。自主面13a至第四目標點P4為止的距離亦可與自主面13a至第一目標點P1為止的距離無關地設定。即,自主面13a至第四目標點P4為止的距離可與自主面13a至第一目標點P1為止的距離同等,或亦可更小。自第三目標點P3至第四目標點P4為止的距離例如可基於第二導線部26的長度而決定。
The fourth target point P4 is a position for forming the first
第五目標點P5為用以形成第二導線部26的位置。第五目標點P5位於第四目標點P4的上方向。因此,於法線方向,第三目標點P3、第四目標點P4及第五目標點P5設定於同一線上。即,所謂自第四目標點P4向第五目標點P5的移動,為朝上方向的移動。另外,第五目標點P5設定於較第四目標點P4更靠上方。
例如,自主面13a至第五目標點P5為止的距離較自主面13a至第四目標點P4為止的距離更大。另一方面,圖7的(b)部分例示自主面13a至第五目標點P5為止的距離較自主面13a至第三目標點P3為止的距離更小的情形。自主面13a至第五目標點P5為止的距離可與自主面13a至第三目標點P3為止的距離相同,或亦可更大。自第四目標點P4至第五目標點P5為止的距離例如可基於第二導線部26的長度而決定。
The fifth target point P5 is a position for forming the
第六目標點P6亦為用以形成第二導線部26的位置。第六目標點P6設定於相對於第五目標點P5逆向遠離的位置。即,所謂自第五目標點P5向第六目標點P6的移動,為朝逆向的移動。再者,圖7的(c)部分例示下述情形,即:於水平方向,自第五目標點P5至第六目標點P6為止的距離較自第五目標點P5至第一目標點P1或第二目標點P2為止的距離更大。自第五目標點P5至第六目標點P6為止的距離可與自第五目標點P5至第一目標點P1或第二目標點P2為止的沿著平行軸線的距離相同,或亦可更小。自第五目標點P5至第六目標點P6為止的距離例如可基於第二導線部26的長度而決定。
The sixth target point P6 is also a position for forming the
第七目標點P7為用以形成第二彎曲部29的位置。第七目標點P7是以相對於第六目標點P6朝下方向遠離的方式設定。即,第七目標點P7是以較第六目標點P6更接近電極墊13的方式設定。即,所謂自第六目標點P6向第七目標點P7的移動,為朝下方向的移動。例如,自主面13a至第七目標點P7為止的距離較
自主面13a至第六目標點P6為止的距離小。自第六目標點P6至第七目標點P7為止的距離亦可基於使導線20發生塑性變形所要求的移動量而決定。所謂使所述導線20發生塑性變形所要求的移動量,例如亦可基於導線20的直徑而決定。作為一例,自第六目標點P6至第七目標點P7為止的距離亦可設為導線20的直徑的1.5倍左右。
The seventh target point P7 is a position for forming the second
第八目標點P8為用以形成第三導線部27的位置。第八目標點P8位於第七目標點P7的上方向。因此,於法線方向,第六目標點P6、第七目標點P7及第八目標點P8設定於同一線上。即,所謂自第七目標點P7向第八目標點P8的移動,為朝上方向的移動。另外,第八目標點P8設定於較第七目標點P7更靠上方。例如,自主面13a至第八目標點P8為止的距離較自主面13a至第七目標點P7為止的距離更大。自第七目標點P7至第八目標點P8為止的距離例如可基於第三導線部27的長度而決定。
The eighth target point P8 is a position for forming the
第九目標點P9(參照圖9)亦為用以形成第三導線部27的位置。第九目標點P9設定於半導體晶片12上。更詳細而言,設定於半導體晶片12的電極墊14上。因此,所謂自第八目標點P8向第九目標點P9的移動,為朝順向的移動。
The ninth target point P9 (refer to FIG. 9) is also a position for forming the
<第一步驟> <First Step>
控制單元4將第一控制訊號提供給接合單元3(參照圖5的步驟S10以及圖6的(a)部分、圖6的(b)部分及圖6的(c)部分)。第一控制訊號包含:使焊針8移動至第一目標點P1的動
作、自焊針8以既定期間放射超音波的動作(步驟S11)、使焊針8移動至第二目標點P2的動作(步驟S12)、使焊針8移動至第三目標點P3的動作(步驟S13)、以及允許抽出導線20的動作。
The
接受第一控制訊號的接合單元3首先使焊針8移動至第一目標點P1。此時,焊針8的前端對電極墊13按壓導線20。繼而,接合單元3自焊針8的前端以既定期間放射超音波。於是,被按壓於焊針8的前端的導線20的一部分變形為扁平狀。藉由該變形,導線20對電極墊13進行接合。其結果為,形成接合部24a。
The joining
繼而,接合單元3使焊針8自第一目標點P1移動至第二目標點P2(參照步驟S12、圖6的(b)部分)。進而,接合單元3允許自焊針8抽出導線20。即,接合單元3一邊抽出導線20,一邊使焊針8自第一目標點P1移動至第二目標點P2。此處抽出的導線20構成延伸部24b。
Then, the
繼而,接合單元3使焊針8自第二目標點P2移動至第三目標點P3(參照步驟S13、圖6的(c)部分)。進而,接合單元3允許自焊針8抽出導線20。即,接合單元3一邊抽出導線20,一邊使焊針8自第二目標點P2移動至第三目標點P3。此處抽出的導線20亦構成延伸部24b。
Then, the joining
再者,步驟S12、步驟S13只要可使焊針8自第一目標點P1移動至第三目標點P3即可。例如,作為相當於步驟S12、步驟S13的步驟,亦可自第一目標點P1直接移動至第三目標點P3。換言之,焊針8亦可不經由第二目標點P2。例如,亦可使焊
針8沿著將第一目標點P1與第三目標點P3連結的直線軌跡移動。另外,亦可使焊針8沿著通過第一目標點P1及第三目標點P3的圓弧軌跡移動。
Furthermore, in step S12 and step S13, the
<第二步驟> <Second step>
控制單元4將第二控制訊號提供給接合單元3(參照圖5的步驟S20及圖7的(a)部分)。第二控制訊號包含使焊針8移動至第四目標點P4的動作。
The
接受第二控制訊號的接合單元3使焊針8自第三目標點P3下降至第四目標點P4(步驟S20)。此時,接合單元3亦可禁止自焊針8抽出導線20。此時,存在於焊針8內的導線20的一部分與步驟S12、步驟S13中自焊針8抽出的導線20的另一部分具有既定的彎曲角度而連續。具體而言,存在於焊針8的內部的導線20的一部分與主面13a的法線方向一致。另一方面,自焊針8抽出的導線20的另一部分相對於該法線方向而傾斜。例如,導線20的另一部分可設為沿著將第一目標點P1與第三目標點P3連結的假想線。因此,導線20的一部分與導線20的另一部分的連接部分彎曲。該連接部分於焊針8的前端部分產生。
The joining
若於該狀態下使焊針8下降,則導線20的一部分與導線20的另一部分之間的角度變小。具體而言,導線20的一部分與導線20的另一部分之間的角度逐漸接近直角。即,導線20的一部分與導線20的另一部分的連接部分經實施彎曲加工。而且,若該彎曲的程度變大,則導線20的一部分與導線20的另一部分
的連接部分的變形由彈性變形向塑性變形過渡。若連接部分塑性變形,則連接部維持形狀而不恢復成原本的形狀。亦可謂該狀態為所謂的使導線20帶有「曲度」的狀態。即,由第二控制訊號所致的焊針8的下降為使導線20帶有「曲度」的步驟。而且,包含藉由第二控制訊號所致的焊針8的下降而帶有的「曲度」的部分為本實施形態的第一彎曲部28。
If the
<第三步驟> <The third step>
控制單元4將第三控制訊號提供給接合單元3(參照圖5的步驟S30以及圖7的(b)部分及(c)部分)。第三控制訊號包含:使焊針8移動至第五目標點P5的動作(步驟S31)、使焊針8移動至第六目標點P6的動作(步驟S32)、及允許抽出導線20的動作。
The
接受第三控制訊號的接合單元3使焊針8自第四目標點P4移動至第五目標點P5(參照步驟S31、圖7的(b)部分)。進而,接合單元3允許自焊針8抽出導線20。即,接合單元3一邊抽出導線20,一邊使焊針8自第四目標點P4移動至第五目標點P5。此處抽出的導線20構成第二導線部26。
The joining
繼而,接合單元3使焊針8自第五目標點P5移動至第六目標點P6(參照步驟S32、圖7的(c)部分)。進而,接合單元3允許自焊針8抽出導線20。即,接合單元3一邊抽出導線20,一邊使焊針8自第五目標點P5移動至第六目標點P6。此處抽出的導線20亦構成第二導線部26。
Then, the joining
再者,該步驟S30中,只要可使焊針8自第四目標點P4移動至第六目標點P6即可。例如,步驟S30亦可自第四目標點P4直接移動至第六目標點P6。換言之,於步驟S30中,焊針8亦可不經由第五目標點P5。例如,步驟S30中,亦可使焊針8沿著將第四目標點P4與第六目標點P6連結的直線軌跡移動。
Furthermore, in this step S30, as long as the
<第四步驟> <Fourth step>
控制單元4將第四控制訊號提供給接合單元3(參照圖5的步驟S40及圖8的(a)部分)。第四控制訊號包含使焊針8移動至第七目標點P7的動作。
The
接受第四控制訊號的接合單元3使焊針8自第六目標點P6下降至第七目標點P7(步驟S40)。接合單元3亦可禁止自焊針8抽出導線20。此時,存在於焊針8內的導線20的一部分、與步驟S30中自焊針8抽出的導線20的另一部分具有既定的彎曲角度而連續。即,導線20的一部分與抽出的部分的關係與步驟S20中說明的關係類似。於是,若將焊針8下降,則導線20的一部分、與抽出的部分之間的連接部分的角度變小。而且,若彎曲的程度達到構成導線20的材料所具有的塑性區域,則導線20的一部分、與抽出的部分之間的連接部分發生塑性變形。發生該塑性變形的部分亦與步驟S12、步驟S13同樣地,可稱為帶有「曲度」的部分。因此,導線20的一部分與抽出的部分之間保持經彎曲的形狀。其結果為,於導線20的一部分與抽出的部分之間產生第二彎曲部29。
The joining
<第五步驟> <Fifth Step>
控制單元4將第五控制訊號提供給接合單元3(參照圖5的步驟S50以及圖8的(b)部分及圖9)。第五控制訊號包含:使焊針8移動至第八目標點P8的動作(步驟S51)、使焊針8移動至第九目標點P9的動作(步驟S52)、允許抽出導線20的動作、以及自焊針8以既定期間放射超音波的動作(步驟S53)。
The
接受第五控制訊號的接合單元3使焊針8自第七目標點P7移動至第八目標點P8(參照步驟S51、圖8的(b)部分)。進而,接合單元3允許自焊針8抽出導線20。即,接合單元3一邊抽出導線20,一邊使焊針8自第七目標點P7上升至第八目標點P8。此處抽出的導線20構成第三導線部27的一部分。
The joining
繼而,接合單元3使焊針8自第八目標點P8移動至第九目標點P9(參照步驟S52、圖9)。進而,接合單元3允許自焊針8抽出導線20。即,接合單元3一邊抽出導線20,一邊使焊針8自第八目標點P8移動至第九目標點P9。此處抽出的導線20亦構成第三導線部27的另一部分。
Then, the joining
繼而,接合單元3自焊針8的前端以既定期間放射超音波(參照步驟S52、圖9)。於是,被按壓於焊針8的前端的導線20的一部分變形為扁平狀。藉由該變形,導線20對電極墊14進行接合。
Then, the
根據經過所述步驟形成的導線20,可提高拉力強度。以下,與比較例的半導體裝置110進行比較,並且對本實施形態的
半導體裝置10的作用效果進行說明。
According to the
圖11表示比較例的半導體裝置110所具有的導線120的端部。導線120具有連接於電極墊113的接合部123、以及向另一電極墊延伸的導線部124。即,導線120不具有相當於第一導線部24、第二導線部26、第三導線部27、第一彎曲部28以及第二彎曲部29的部位。若對此種導線120施加拉應力,則其負荷作用於自接合部123向斜上方延伸的部分(所謂的頸部125)。該頸部125包含接合部123的一部分,故而其厚度薄。因此,頸部125的強度變得低於導線120所具有的強度。
FIG. 11 shows the end of the
另一方面,本實施形態的導線20於接合部24a與第三導線部27之間,設有延伸部24b、第二導線部26、第一彎曲部28以及第二彎曲部29。即,於接合部24a與第三導線部27之間,抽出有充分長度的導線。而且,導線20包含產生加工硬化的第一彎曲部28以及第二彎曲部29。進而,導線20具有自接合部24a沿著電極墊13延伸的延伸部24b。根據該些構成,於拉應力作用於導線20時,負荷並未直接作用於接合部24a與延伸部24b的連接部分。負荷由在接合部24a與第三導線部27之間抽出的導線、以及產生加工硬化的第一彎曲部28及第二彎曲部29負擔。該些部位並未如接合部24a般受到剖面形狀變化般的加工,故而至少維持導線20原本所具有的強度,亦可謂第一彎曲部28以及第二彎曲部29中藉由加工硬化而強度進一步提高。因此,導線20可提高拉力強度。
On the other hand, the
作為比較例,將直徑為20微米的導線設為圖11所示般的形狀而架設於電極墊間。另外,導線是以金、銀、鋁、銅分別準備。其結果表明,拉力強度的最低值為1.0gf。繼而,使用實施形態的製造方法將相同的導線架設於電極墊間。圖10表示其一例。其結果表明,拉力強度的最低值為2.5gf。即得知,於使用實施形態的打線接合裝置1進行利用實施形態的製造方法的打線接合的情形時,可使拉力強度提高2.5倍左右。
As a comparative example, a wire with a diameter of 20 micrometers was set in a shape as shown in FIG. 11 and set between electrode pads. In addition, the wires are prepared separately from gold, silver, aluminum, and copper. The result shows that the minimum value of tensile strength is 1.0 gf. Then, using the manufacturing method of the embodiment, the same lead wire is bridged between the electrode pads. Fig. 10 shows an example of this. The result shows that the minimum value of tensile strength is 2.5gf. That is, it is found that when the
以上,對本發明的實施形態進行了說明,但不限定於所述實施形態,亦可以各種形態實施。 As mentioned above, although the embodiment of this invention was described, it is not limited to the said embodiment, It can implement in various forms.
13:電極墊(第一電極) 13: Electrode pad (first electrode)
13a:主面 13a: main side
20:導線(接合導線) 20: Wire (bonding wire)
21:端部(一端) 21: end (one end)
24:第一導線部 24: The first wire part
24a:接合部(接合部) 24a: Joint (joint)
24b:延伸部 24b: Extension
26:第二導線部 26: The second wire part
27:第三導線部 27: Third wire part
28:第一彎曲部 28: The first bend
29:第二彎曲部 29: second bend
A1、A2:角度 A1, A2: Angle
D1、D2、D3:方向 D1, D2, D3: direction
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