TWI736770B - Apparatus and method of producing hydrogen water - Google Patents

Apparatus and method of producing hydrogen water Download PDF

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TWI736770B
TWI736770B TW107118504A TW107118504A TWI736770B TW I736770 B TWI736770 B TW I736770B TW 107118504 A TW107118504 A TW 107118504A TW 107118504 A TW107118504 A TW 107118504A TW I736770 B TWI736770 B TW I736770B
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hydrogen
water
supply
dissolver
unit
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TW107118504A
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TW201908244A (en
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山野辺進
田村正明
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日商佳里多控股公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F21/00Dissolving
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/68Treatment of water, waste water, or sewage by addition of specified substances, e.g. trace elements, for ameliorating potable water

Abstract

Disclosed are an apparatus and a method of producing hydrogen water which are capable of obtaining high concentration hydrogen water. The apparatus of producing hydrogen water includes a dissolution part disposed with a frame body having a supply port, an exhaust port, and a concave part disposed inside the frame body and facing the supply port; a water supply part configured to supply water to the frame body through the supply port; a hydrogen supply part configured to supply hydrogen to the frame body through the supply port; and a control part configured to control the water supply part and the hydrogen supply part, and that when water is supplied inside the frame body to supply hydrogen thereto and after hydrogen is retained in the concave part, a mixture of water and hydrogen is supplied to the frame body.

Description

氫水的製造裝置以及製造方法 Hydrogen water manufacturing device and manufacturing method

本發明係關於一種氫水的製造裝置以及製造方法。 The present invention relates to a hydrogen water manufacturing device and manufacturing method.

近年來,就有效地促進健康等方面而言,氫水受到關注。作為製造此種氫水的方法,已提出有各種方法。例如,於專利文獻1及專利文獻2中記載有以下方法:使藉由將水電解所生成之氫溶解於水,藉此製造氫水。 In recent years, hydrogen water has attracted attention in terms of effective health promotion. As a method of producing such hydrogen water, various methods have been proposed. For example, Patent Document 1 and Patent Document 2 describe a method of dissolving hydrogen generated by the electrolysis of water in water to produce hydrogen water.

[先前技術文獻] [Prior Technical Literature]

[專利文獻] [Patent Literature]

專利文獻1:日本特開2016-101585號公報。 Patent Document 1: Japanese Patent Application Laid-Open No. 2016-101585.

專利文獻2:日本實用新型登記第3204432號公報。 Patent Document 2: Japanese Utility Model Registration No. 3204432.

最近,正在開發使普通消費者可簡便地攝取氫水的小型伺服器(server)。另一方面,小型伺服器之情形時,僅可 設置小型的水電解單元(cell)或氫儲罐,故而有可供給之氫量有限,難以獲得高濃度之氫水的問題。 Recently, a small server that allows ordinary consumers to easily consume hydrogen water is being developed. On the other hand, in the case of a small server, only small water electrolysis cells or hydrogen storage tanks can be installed. Therefore, the amount of hydrogen that can be supplied is limited and it is difficult to obtain high-concentration hydrogen water.

鑒於以上般之情況,本發明之目的在於提供一種可獲得高濃度之氫水的氫水的製造裝置以及製造方法。 In view of the above-mentioned circumstances, the object of the present invention is to provide a hydrogen water production device and a production method that can obtain high-concentration hydrogen water.

為了達成上述目的,本發明之一形態之氫水的製造裝置係具備:溶解部,具有:框體,形成有供給口及排出口;及凹部,配置於上述框體內且朝向上述供給口開放;水供給部,可自上述供給口向上述框體內供給水;氫供給部,可自上述供給口向上述框體內供給氫;以及控制部,控制上述水供給部及上述氫供給部,藉此向被水填充之上述框體內供給氫而使氫蓄留於上述凹部內後,向上述框體內供給水及氫之混合體。 In order to achieve the above-mentioned object, a hydrogen water production apparatus according to an aspect of the present invention includes: a dissolving part having: a frame body with a supply port and a discharge port formed thereon; and a recessed part disposed in the frame body and open toward the supply port; A water supply unit that can supply water into the frame from the supply port; a hydrogen supply unit that can supply hydrogen into the frame from the supply port; and a control unit that controls the water supply unit and the hydrogen supply unit to thereby After hydrogen is supplied to the housing filled with water and the hydrogen is stored in the recessed portion, a mixture of water and hydrogen is supplied to the housing.

藉由該構成,可使氫預先蓄留於溶解部之凹部。藉此,可於向溶解部供給水及氫之混合體時,使蓄留於凹部之氫與混合體接觸,而使蓄留於凹部之氫溶解於混合體。藉此,可獲得高濃度之氫水。 With this configuration, hydrogen can be stored in the recesses of the dissolving part in advance. Thereby, when the mixture of water and hydrogen is supplied to the dissolving part, the hydrogen stored in the recess can be brought into contact with the mixture, and the hydrogen stored in the recess can be dissolved in the mixture. In this way, high-concentration hydrogen water can be obtained.

上述控制部亦可一邊保持於上述凹部蓄留有氫之狀態,一邊向上述框體內供給上述混合體。 The control unit may supply the mixture into the housing while maintaining a state in which hydrogen is stored in the recess.

藉此,維持氫容易溶解於混合體之狀態,可更容易地獲得高濃度之氫水。 In this way, the state that hydrogen is easily dissolved in the mixture is maintained, and high-concentration hydrogen water can be obtained more easily.

為了達成上述目的,本發明之一形態之氫水的製造方法係自溶解器之供給口供給水,藉此以水將上述溶解器之框體內填充,上述溶解器具有:上述框體,形成有上述供給口及排出口;及凹部,配置於上述框體內且朝向上述供給口開放;自上述供給口向被水填充之上述框體內供給氫,藉此使氫蓄留於上述凹部;使氫蓄留於上述凹部之後,一邊自上述供給口向上述框體供給水及氫之混合體,一邊自上述排出口回收氫水。 In order to achieve the above-mentioned object, the method for producing hydrogen water in one aspect of the present invention is to supply water from the supply port of a dissolver to fill the frame of the dissolver with water. The dissolver has: the frame is formed with The supply port and the discharge port; and the concave portion are arranged in the frame and open toward the supply port; supply hydrogen from the supply port into the frame filled with water, thereby accumulating hydrogen in the concave portion; and accumulate hydrogen After being left in the recess, while supplying a mixture of water and hydrogen to the housing from the supply port, the hydrogen water is recovered from the discharge port.

上述氫水的製造方法亦可一邊保持於上述凹部蓄留有氫之狀態,一邊向上述框體內供給前述混合體。 The manufacturing method of the said hydrogen water may supply the said mixture into the said housing|casing while maintaining the state which stored hydrogen in the said recessed part.

可提供一種可獲得高濃度之氫水的氫水的製造裝置及製造方法。 It is possible to provide a hydrogen water manufacturing device and a manufacturing method that can obtain high-concentration hydrogen water.

10‧‧‧氫供給部 10‧‧‧Hydrogen Supply Department

11‧‧‧水電解單元 11‧‧‧Water Electrolysis Unit

11a‧‧‧陽極側空間 11a‧‧‧Anode side space

11b‧‧‧陰極側空間 11b‧‧‧Cathode side space

12‧‧‧第一泵 12‧‧‧First pump

13‧‧‧第一箱 13‧‧‧The first box

13a、21a‧‧‧供水口 13a, 21a‧‧‧Water supply port

13b‧‧‧氧排出口 13b‧‧‧Oxygen outlet

14‧‧‧膜電極接合體 14‧‧‧Membrane electrode assembly

14a‧‧‧陽極 14a‧‧‧Anode

14b‧‧‧陰極 14b‧‧‧Cathode

14c‧‧‧固體高分子膜 14c‧‧‧Solid polymer membrane

20‧‧‧水供給部 20‧‧‧Water Supply Department

21‧‧‧第二箱 21‧‧‧The second box

22‧‧‧第二泵 22‧‧‧Second pump

30‧‧‧溶解部 30‧‧‧Dissolution Department

31‧‧‧溶解器 31‧‧‧Dissolver

40‧‧‧搬送部 40‧‧‧Transportation Department

50‧‧‧控制部 50‧‧‧Control Department

100‧‧‧氫水製造裝置 100‧‧‧Hydrogen Water Manufacturing Device

311‧‧‧框體 311‧‧‧Frame

321‧‧‧筒狀構件 321‧‧‧Cylinder-shaped member

331‧‧‧供給口 331‧‧‧Supply Port

341‧‧‧排出口 341‧‧‧Exhaust outlet

F1、F2‧‧‧濾網 F1, F2‧‧‧Filter

P‧‧‧電源 P‧‧‧Power

P1、P2、P3、P4、P5、P6、P7‧‧‧流路 P1, P2, P3, P4, P5, P6, P7‧‧‧Flow path

S01、S02、03‧‧‧步驟 S01, S02, 03‧‧‧Step

S1、S2‧‧‧內部空間 S1, S2‧‧‧Internal space

V1、V2、V3‧‧‧閥 V1, V2, V3‧‧‧Valve

X‧‧‧儲氫 X‧‧‧Hydrogen storage

圖1為示意性地表示本發明之一實施形態之氫水製造裝置之構成的配管系統圖。 Fig. 1 is a piping system diagram schematically showing the configuration of a hydrogen water production apparatus according to an embodiment of the present invention.

圖2為表示上述氫水製造裝置之水電解單元之構成的示意圖。 Fig. 2 is a schematic diagram showing the structure of a water electrolysis unit of the above-mentioned hydrogen water production device.

圖3中之(A)及(B)為上述氫水製造裝置之溶解器之剖面圖。 (A) and (B) in FIG. 3 are cross-sectional views of the dissolver of the above-mentioned hydrogen water production device.

圖4為表示利用上述氫水製造裝置之氫水製造方法的流程圖。 Fig. 4 is a flowchart showing a hydrogen water production method using the above-mentioned hydrogen water production device.

圖5為表示上述氫水製造方法之製造過程的圖。 Fig. 5 is a diagram showing the manufacturing process of the above-mentioned hydrogen water manufacturing method.

圖6為表示上述氫水製造方法之製造過程的圖。 Fig. 6 is a diagram showing the manufacturing process of the above-mentioned hydrogen water manufacturing method.

圖7為表示上述氫水製造方法之製造過程的圖。 Fig. 7 is a diagram showing the manufacturing process of the above-mentioned hydrogen water manufacturing method.

以下,一邊參照圖式一邊對本發明之實施形態進行說明。 Hereinafter, embodiments of the present invention will be described with reference to the drawings.

[氫水製造裝置100之構成] [Configuration of Hydrogen Water Production Device 100]

圖1為示意性地表示本發明之一實施形態之氫水製造裝置100之構成的配管系統圖。如圖1所示,氫水製造裝置100具有氫供給部10、水供給部20、溶解部30、搬送部40及控制部50。 Fig. 1 is a piping system diagram schematically showing the configuration of a hydrogen water production apparatus 100 according to an embodiment of the present invention. As shown in FIG. 1, the hydrogen water production device 100 includes a hydrogen supply unit 10, a water supply unit 20, a dissolution unit 30, a transport unit 40, and a control unit 50.

(氫供給部10) (Hydrogen supply unit 10)

氫供給部10具有水電解單元11、第一泵12、第一箱13及閥V1。氫供給部10經由搬送部40而連接於溶解部30。氫供給部10經由搬送部40向溶解部30供給氫。 The hydrogen supply unit 10 has a water electrolysis unit 11, a first pump 12, a first tank 13, and a valve V1. The hydrogen supply unit 10 is connected to the dissolving unit 30 via the conveying unit 40. The hydrogen supply unit 10 supplies hydrogen to the dissolving unit 30 via the transport unit 40.

如圖1所示,水電解單元11經由流路P2而連接於第 一泵12,且經由流路P3而連接於第一箱13。另外,水電解單元11經由流路P4而亦連接於搬送部40。 As shown in Fig. 1, the water electrolysis unit 11 is connected to the first pump 12 via a flow path P2, and is connected to the first tank 13 via a flow path P3. Moreover, the water electrolysis unit 11 is also connected to the conveyance part 40 via the flow path P4.

圖2為表示水電解單元11之構成的示意圖。本實施形態之水電解單元11為PEM(Proton Exchange Membrane;質子交換膜)型。 FIG. 2 is a schematic diagram showing the structure of the water electrolysis unit 11. The water electrolysis unit 11 of this embodiment is a PEM (Proton Exchange Membrane) type.

如圖2所示,水電解單元11具有陽極側空間11a、陰極側空間11b及膜電極接合體14。陽極側空間11a係連接於流路P2、P3,陰極側空間11b係連接於流路P4。 As shown in FIG. 2, the water electrolysis unit 11 has an anode side space 11 a, a cathode side space 11 b, and a membrane electrode assembly 14. The anode side space 11a is connected to the flow paths P2 and P3, and the cathode side space 11b is connected to the flow path P4.

如圖2所示,膜電極接合體14具有陽極14a及陰極14b與固體高分子膜14c。固體高分子膜14c為設於陽極14a與陰極14b之間,容許離子(質子)自陽極14a向陰極14b移動之離子(質子)交換膜。固體高分子膜14c之種類並無特別限定,例如可設為Nafion(註冊商標)膜。 As shown in FIG. 2, the membrane electrode assembly 14 has an anode 14a, a cathode 14b, and a solid polymer film 14c. The solid polymer membrane 14c is an ion (proton) exchange membrane that is provided between the anode 14a and the cathode 14b and allows ions (protons) to move from the anode 14a to the cathode 14b. The type of the solid polymer membrane 14c is not particularly limited, and it can be, for example, a Nafion (registered trademark) membrane.

陽極14a及陰極14b為附著於固體高分子膜14c之表面的電極。具體而言係由附著於固體高分子膜14c之表面的鈦基體、及擔載於該鈦基體之金屬觸媒所構成。作為該金屬觸媒,例如為由含有鎳(Ni)、銅(Cu)、鈀(Pd)、鉑(Pt)、銀(Ag)、金(Au)或該等之合金的金屬材料等所構成之金屬觸媒,典型而言為鉑觸媒。鈦基體之形狀並無特別限定,較佳為多孔質狀或網狀。 The anode 14a and the cathode 14b are electrodes attached to the surface of the solid polymer film 14c. Specifically, it is composed of a titanium substrate attached to the surface of the solid polymer film 14c and a metal catalyst supported on the titanium substrate. As the metal catalyst, for example, it is composed of a metal material containing nickel (Ni), copper (Cu), palladium (Pd), platinum (Pt), silver (Ag), gold (Au) or alloys of these. The metal catalyst is typically platinum catalyst. The shape of the titanium substrate is not particularly limited, but it is preferably porous or mesh.

如圖2所示,水電解單元11中可包含電源P,亦可外接。 As shown in FIG. 2, the water electrolysis unit 11 may include a power source P, or may be externally connected.

於水電解單元11之電源P採用直流電源。於採用直流電源之情形時,例如可將施加電壓設為1.7V至10V,將施加電流設為0.1A至30A。 The power source P of the water electrolysis unit 11 adopts a DC power source. In the case of using a DC power supply, for example, the applied voltage can be set to 1.7V to 10V, and the applied current can be set to 0.1A to 30A.

另外,例如亦可採用脈波電源。關於該脈波電源,作為一例,可採用脈波之產生方式為直接切換(direct switch)方式、線型(line type)方式、感應(induction)方式或馬克斯(Marx)方式等之脈波電源。 In addition, for example, a pulse wave power supply may also be used. Regarding the pulse wave power supply, as an example, the pulse wave generation method can be a direct switch method, a line type method, an induction method, or a Marx method.

於採用脈波電源之情形時,例如可將脈波頻率設為1Hz至1000Hz,將施加電壓設為1.7V至10V,將施加電流設為0.1A至30A。 In the case of using a pulse wave power supply, for example, the pulse wave frequency can be set to 1 Hz to 1000 Hz, the applied voltage can be set to 1.7V to 10V, and the applied current can be set to 0.1A to 30A.

於水電解單元11中,藉由將供給於陽極側空間11a之水電解,而於陰極14b以微細氣泡之形式產生氫。與此同時,於陽極14a產生氧。 In the water electrolysis unit 11, by electrolyzing the water supplied to the anode side space 11a, hydrogen is generated in the form of fine bubbles at the cathode 14b. At the same time, oxygen is generated at the anode 14a.

氫係一分鐘自陰極14b產生20ml至200ml。氫之微細氣泡之粒徑例如較佳為幾百微米(μm)至幾毫米(mm)左右,進而佳為幾微米至幾十微米左右。另外,氫含有於電解時與氫離子一同透過固體高分子膜14c的微量之水。 The hydrogen system generates 20 ml to 200 ml from the cathode 14b in one minute. The particle size of the fine hydrogen bubbles is, for example, preferably several hundreds of micrometers (μm) to several millimeters (mm), and more preferably several micrometers to several tens of micrometers. In addition, hydrogen contains a small amount of water that passes through the solid polymer membrane 14c together with hydrogen ions during electrolysis.

所產生之氧溶解於被供給於陽極側空間11a之水而成 為氧水。氧水係經由流路P3而被搬送至第一箱13。 The generated oxygen is dissolved in the water supplied to the anode side space 11a to become oxygen water. The oxygen water system is conveyed to the first tank 13 via the flow path P3.

如圖1所示,第一箱13經由流路P1而連接於第一泵12。第一箱13為具有蓄積水之功能的蓄水箱。第一箱13之容量並無特別限定,例如可設為0.05L至1L。 As shown in Fig. 1, the first tank 13 is connected to the first pump 12 via the flow path P1. The first tank 13 is a water storage tank with a function of storing water. The capacity of the first tank 13 is not particularly limited, and can be set to 0.05L to 1L, for example.

第一箱13之材料亦無特別限定,例如可由合成樹脂或金屬材料等所構成。 The material of the first tank 13 is also not particularly limited, and may be composed of synthetic resin or metal material, for example.

另外,本實施形態之第一箱13具有供水口13a及氧排出口13b。如圖1所示,於供水口13a安裝有濾網F1。 In addition, the first tank 13 of this embodiment has a water supply port 13a and an oxygen discharge port 13b. As shown in Fig. 1, a strainer F1 is installed at the water supply port 13a.

氧排出口13b將自陽極空間11a經由流路P3搬送之氧排出。 The oxygen discharge port 13b discharges the oxygen transported from the anode space 11a through the flow path P3.

濾網F1之種類並無特別限定,例如可製成由預濾網與主濾網所構成之過濾膜,上述預濾網係由活性炭所構成,上述主濾網為RO(Reverse Osmosis;逆滲透)膜、NF(Nano Filtration;奈米過濾)膜、UF(Ultrafiltration;超濾)膜或MF(Microfiltration;微濾)膜、離子交換膜等。再者,濾網F1視需要亦可省略。藉由如此般使用預濾網及主濾網將自供水口13a供給之水以二階段過濾,可製成純水。 The type of filter F1 is not particularly limited. For example, it can be made into a filter membrane composed of a pre-filter and a main filter. The pre-filter is composed of activated carbon, and the main filter is RO (Reverse Osmosis; reverse osmosis). ) Membrane, NF (Nano Filtration; nanofiltration) membrane, UF (Ultrafiltration; ultrafiltration) membrane or MF (Microfiltration; microfiltration) membrane, ion exchange membrane, etc. Furthermore, the filter F1 can be omitted if necessary. By using the pre-filter and the main filter to filter the water supplied from the water supply port 13a in two stages, pure water can be made.

第一泵12為供水泵,具有使自第一箱13內經由流路 P1抽吸之水經過流路P2、水電解單元11及流路P3而向第一箱13壓送之功能。 The first pump 12 is a water supply pump, and has a function of pressure-feeding the water sucked from the first tank 13 through the flow path P1 to the first tank 13 through the flow path P2, the water electrolysis unit 11, and the flow path P3.

具體而言,第一泵12將第一箱13內之水壓送至陽極側空間11a。 Specifically, the first pump 12 sends the water pressure in the first tank 13 to the anode side space 11a.

另外,第一泵12將陽極側空間11a之氧水壓送至第一箱13。第一泵12使氧水於陽極側空間11a、第一箱13、第一泵12之間循環。另外,氫供給部10只要可使流體循環,則亦可設為不具備第一泵12之構成。例如,亦可利用所產生之氧上升時產生的流動而使流體自然循環。 In addition, the first pump 12 pressure sends the oxygen water in the anode side space 11 a to the first tank 13. The first pump 12 circulates oxygen water between the anode side space 11 a, the first tank 13 and the first pump 12. In addition, the hydrogen supply unit 10 may be configured without the first pump 12 as long as the fluid can circulate. For example, the flow generated when the generated oxygen rises can also be used to circulate the fluid naturally.

關於第一泵12,例如採用可壓送水之隔膜泵或增壓泵(booster pump)。藉此,可達成氫水製造裝置100之裝置構成,而且實現精簡化及低成本化。 Regarding the first pump 12, for example, a diaphragm pump or a booster pump that can send water under pressure is used. Thereby, the device structure of the hydrogen water production device 100 can be achieved, and the simplification and cost reduction can be realized.

關於第一泵12,不僅可採用隔膜泵或增壓泵,例如亦可採用柱塞泵、齒輪泵、乾泵、油旋泵或噴射泵等。另外,關於第一泵12,亦可採用幾乎不施加壓力之磁力泵等。 Regarding the first pump 12, not only a diaphragm pump or a booster pump can be used, for example, a plunger pump, a gear pump, a dry pump, an oil rotary pump, or a jet pump can also be used. In addition, with regard to the first pump 12, a magnetic pump that hardly applies pressure or the like may be used.

閥V1係設於流路P4。閥V1藉由該閥V1之開閉而調整自氫供給部10經由搬送部40向溶解部30之氫供給。 The valve V1 is provided in the flow path P4. The valve V1 adjusts the supply of hydrogen from the hydrogen supply unit 10 to the dissolving unit 30 via the transport unit 40 by opening and closing the valve V1.

閥V1典型而言為可開閉流路P4之電磁閥,但不限定於此。閥V1例如亦可為可調整流量之針閥等球形閥(global valve),亦可為球閥(ball valve)、蝴蝶閥、閘閥或隔膜閥等。氫供給部10亦可設為不具備閥V1之構成。 The valve V1 is typically a solenoid valve that can open and close the flow path P4, but it is not limited to this. The valve V1 may be, for example, a global valve such as a needle valve with adjustable flow rate, or a ball valve, butterfly valve, gate valve, or diaphragm valve. The hydrogen supply unit 10 may be configured without the valve V1.

例如,上述實施形態之氫供給部10之水電解單元11藉由PEM水電解而產生氫,但不限於此,亦可藉由鹼水電解或高溫水蒸氣電解而產生氫。 For example, the water electrolysis unit 11 of the hydrogen supply unit 10 of the above embodiment generates hydrogen by PEM water electrolysis, but it is not limited to this, and hydrogen may be generated by alkaline water electrolysis or high-temperature steam electrolysis.

另外,上述實施形態之氫供給部10藉由水電解單元11而供給氫,但不限定於此,亦可使用氫儲罐供給氫。 In addition, the hydrogen supply unit 10 of the above embodiment supplies hydrogen by the water electrolysis unit 11, but it is not limited to this, and a hydrogen storage tank may be used to supply hydrogen.

(水供給部20) (Water supply part 20)

水供給部20具有第二箱21、第二泵22及閥V2。水供給部20經由搬送部40向溶解部30供給水。 The water supply unit 20 has a second tank 21, a second pump 22, and a valve V2. The water supply unit 20 supplies water to the dissolving unit 30 via the conveying unit 40.

如圖1所示,第二箱21經由流路P5而連接於第二泵22。第二箱21典型而言具有與第一箱13相同之構成,但亦可為與第一箱13不同種類之箱。 As shown in FIG. 1, the second tank 21 is connected to the second pump 22 via the flow path P5. The second tank 21 typically has the same structure as the first tank 13, but it may be a different type of tank from the first tank 13.

安裝於第二箱21之供水口21a的濾網F2係可為與濾網F1相同種類之濾網,亦可為不同種類之濾網。 The filter F2 installed at the water supply port 21a of the second tank 21 can be the same type of filter as the filter F1, or a different type of filter.

如圖1所示,第二泵22經由流路P6而連接於搬送部40。第二泵22具有使自第二箱21內經由流路P5抽吸之水經過流路P6及搬送部40而向溶解部30壓送之功能。 As shown in FIG. 1, the 2nd pump 22 is connected to the conveyance part 40 via the flow path P6. The second pump 22 has a function of pressure-feeding the water sucked from the second tank 21 through the flow path P5 through the flow path P6 and the conveying part 40 to the dissolving part 30.

第二泵22典型而言係採用可壓送水之隔膜泵或增壓 泵等,但不限定於此。 The second pump 22 is typically a diaphragm pump or a booster pump that can send water under pressure, but it is not limited to this.

閥V2係設於流路P6。閥V2調整自水供給部20經由搬送部40供給於溶解部30之水供給量。 The valve V2 is provided in the flow path P6. The valve V2 adjusts the amount of water supplied from the water supply unit 20 to the dissolving unit 30 via the transport unit 40.

閥V2典型而言為針閥等球形閥,但不限於此,亦可為球閥、蝴蝶閥、閘閥或隔膜閥等。對於後述閥V3而言亦相同。 The valve V2 is typically a spherical valve such as a needle valve, but is not limited to this, and may also be a ball valve, butterfly valve, gate valve, or diaphragm valve. The same applies to the valve V3 described later.

(溶解部30) (Dissolving part 30)

如圖1所示,溶解部30具有溶解器31及閥V3。 As shown in FIG. 1, the dissolving part 30 has a dissolver 31 and a valve V3.

如圖1所示,溶解器31經由搬送部40而連接於氫供給部10及水供給部20。另外,自溶解器31排出之流體係經由流路P7而排出至外部。溶解器31具有對自氫供給部10及水供給部20經由搬送部40搬送而來之流體進行攪拌之功能。 As shown in FIG. 1, the dissolver 31 is connected to the hydrogen supply unit 10 and the water supply unit 20 via the transport unit 40. In addition, the flow system discharged from the dissolver 31 is discharged to the outside via the flow path P7. The dissolver 31 has a function of stirring the fluid conveyed from the hydrogen supply part 10 and the water supply part 20 via the conveyance part 40.

圖3中的(A)為溶解器31之剖面圖。圖3中的(B)為沿著圖3中的(A)之A-A'線之剖面圖。再者,於以下之圖中,X軸方向、Y軸方向及Z軸方向為相互正交之三軸方向。Z軸朝向鉛垂方向。 (A) in FIG. 3 is a cross-sectional view of the dissolver 31. (B) in FIG. 3 is a cross-sectional view taken along the line AA' of (A) in FIG. 3. Furthermore, in the following figures, the X-axis direction, the Y-axis direction, and the Z-axis direction are three-axis directions orthogonal to each other. The Z axis faces the vertical direction.

如圖3中的(A)所示,溶解器31具有框體311、筒狀構件321、供給口331及排出口341。 As shown in FIG. 3(A), the dissolver 31 has a frame 311, a cylindrical member 321, a supply port 331, and a discharge port 341.

如圖3中的(B)所示,溶解器31係於中空之框體311內部配置有筒狀構件321,具有套管構造。溶解器31內部係藉由筒狀構件321而劃分,具有形成於筒狀構件321之內側的內部空間S1、及形成於框體311與筒狀構件321之間的內部空間S2。 As shown in FIG. 3(B), the dissolver 31 is provided with a cylindrical member 321 inside a hollow frame 311, and has a sleeve structure. The inside of the dissolver 31 is divided by the cylindrical member 321 and has an internal space S1 formed inside the cylindrical member 321 and an internal space S2 formed between the frame body 311 and the cylindrical member 321.

框體311具有Z軸方向上側之上壁、Z軸方向下側之下壁、及將上壁與下壁連結且於Z軸方向延伸之側壁。 The frame body 311 has an upper wall on the upper side in the Z-axis direction, a lower wall on the lower side in the Z-axis direction, and side walls that connect the upper wall and the lower wall and extend in the Z-axis direction.

框體311之形狀典型而言為圓筒形狀,但不限於此,可設為三角柱狀、矩形柱狀等任意形狀。構成框體311之材料亦無特別限定,可自公知之合成樹脂或金屬材料等中任意選擇。 The shape of the frame body 311 is typically a cylindrical shape, but is not limited to this, and can be any shape such as a triangular column shape and a rectangular column shape. The material constituting the frame body 311 is also not particularly limited, and can be arbitrarily selected from known synthetic resin or metal materials.

框體311之內徑及Z軸方向之尺寸(高度)並無特別限定。 The inner diameter of the frame body 311 and the size (height) in the Z-axis direction are not particularly limited.

供給口331係設於框體311之下壁。 The supply port 331 is provided on the lower wall of the frame body 311.

供給口331係連接於搬送部40,自供給口331供給流體。 The supply port 331 is connected to the conveying unit 40, and fluid is supplied from the supply port 331.

排出口341係靠近框體311之側壁之上壁側而設置。 The discharge port 341 is arranged close to the upper wall side of the side wall of the frame body 311.

排出口341係連接於流路P7,自排出口341將流體排出至流路P7。自排出口341排出之流體係自流路P7而被回收於外部。 The discharge port 341 is connected to the flow path P7, and the fluid is discharged from the discharge port 341 to the flow path P7. The fluid system discharged from the discharge port 341 is recovered to the outside from the flow path P7.

如圖3中的(A)所示,筒狀構件321為使Z軸方向之下側端部朝向溶解器31之供給口331開放的筒狀之構件。筒狀構件321之上側端部係藉由與框體311之上壁一體地形成而封閉。 As shown in (A) in FIG. 3, the cylindrical member 321 is a cylindrical member whose lower end in the Z-axis direction is opened toward the supply port 331 of the dissolver 31. The upper end of the cylindrical member 321 is closed by being formed integrally with the upper wall of the frame body 311.

筒狀構件321之內徑及Z軸方向之尺寸(高度)可根據框體311之大小而適當決定。另外,筒狀構件321之形狀典型而言為圓筒形狀,但不限定於此,亦可為矩形狀等任意形狀。進而,筒狀構件321亦可由與框體311相同或不同之材料所構成。 The inner diameter of the cylindrical member 321 and the size (height) in the Z-axis direction can be appropriately determined according to the size of the frame body 311. In addition, the shape of the cylindrical member 321 is typically a cylindrical shape, but it is not limited to this, and it may be any shape such as a rectangular shape. Furthermore, the cylindrical member 321 may be made of the same or different material as the frame body 311.

藉由以上之構成,溶解器31作為碰撞式之溶解器發揮功能。作為溶解器31,例如可將0.8L型者用於小型伺服器用。 With the above configuration, the dissolver 31 functions as a collision type dissolver. As the dissolver 31, for example, a 0.8L type can be used for a small server.

閥V3係設於流路P7。閥V3藉由與閥V2一併進行調整而可調整供給口331之壓力及排出口341之壓力。 The valve V3 is provided in the flow path P7. The valve V3 can be adjusted together with the valve V2 to adjust the pressure of the supply port 331 and the pressure of the discharge port 341.

(搬送部40) (Transportation Department 40)

搬送部40係連接於氫供給部10、水供給部20及溶解部30。 The transport unit 40 is connected to the hydrogen supply unit 10, the water supply unit 20, and the dissolving unit 30.

藉由該構成,氫供給部10可經由搬送部40向溶解部30供給氫。另外,水供給部20可經由搬送部40向溶解部30供給水。 With this configuration, the hydrogen supply unit 10 can supply hydrogen to the dissolving unit 30 via the transport unit 40. In addition, the water supply unit 20 can supply water to the dissolving unit 30 via the transport unit 40.

(控制部50) (Control Unit 50)

控制部50係連接於氫供給部10、水供給部20及溶解部30。 The control unit 50 is connected to the hydrogen supply unit 10, the water supply unit 20 and the dissolving unit 30.

控制部50控制氫供給部10、水供給部20及溶解部30。 The control unit 50 controls the hydrogen supply unit 10, the water supply unit 20, and the dissolution unit 30.

例如,控制部50藉由閥V1之開閉而調整自氫供給部10向溶解部30之氫供給。另外,控制部50可藉由閥V1之開閉而防止水自搬送部40向氫供給部10逆流。 For example, the control unit 50 adjusts the supply of hydrogen from the hydrogen supply unit 10 to the dissolving unit 30 by opening and closing the valve V1. In addition, the control unit 50 can prevent backflow of water from the transport unit 40 to the hydrogen supply unit 10 by opening and closing the valve V1.

另外,控制部50藉由調整電源P之施加電壓、施加電流,可控制氫產生量及氫供給時間。另外,控制部50藉由調整第一泵12之水之壓送量,可控制氫產生量。 In addition, the control unit 50 can control the amount of hydrogen generation and the hydrogen supply time by adjusting the applied voltage and applied current of the power source P. In addition, the control unit 50 can control the amount of hydrogen produced by adjusting the pressure delivery amount of the water of the first pump 12.

進而,控制部50可藉由閥V2而控制水供給量。另外,控制部50亦可藉由調整第二泵22之水之壓送量而控制水供給量。 Furthermore, the control unit 50 can control the water supply amount by the valve V2. In addition, the control unit 50 may also control the water supply amount by adjusting the water pressure delivery amount of the second pump 22.

此外,控制部50可藉由閥V2、V3而控制供給口331之壓力、排出口341之壓力。 In addition, the control unit 50 can control the pressure of the supply port 331 and the pressure of the discharge port 341 through the valves V2 and V3.

除此以外,控制部50亦可控制蓄積於第一箱13及第二箱21之水之溫度或內壓等。 In addition to this, the control unit 50 may also control the temperature or internal pressure of the water stored in the first tank 13 and the second tank 21.

[氫水製造方法] [Method of producing hydrogen water]

圖4為表示利用氫水製造裝置100之氫水製造方法的流程圖。以下,依照圖4對利用氫水製造裝置100之氫水製造方法進行說明。藉由該氫水製造方法,可獲得高濃度之氫水。 FIG. 4 is a flowchart showing a hydrogen water production method using the hydrogen water production device 100. Hereinafter, a method of producing hydrogen water using the hydrogen water producing device 100 will be described in accordance with FIG. 4. With this hydrogen water production method, high-concentration hydrogen water can be obtained.

(步驟S01:水供給) (Step S01: Water supply)

於步驟S01中,藉由水供給部20將水供給於溶解部30。藉此,如圖5所示,溶解器31係被水填充。 In step S01, the water supply unit 20 supplies water to the dissolving unit 30. Thereby, as shown in FIG. 5, the dissolver 31 is filled with water.

更詳細而言,首先對第二箱21供給水。此時,藉由在第二箱21之供水口21a安裝濾網F2,而將向第二箱21供給之水過濾,將該水所含之雜質或臭氧等去除。 In more detail, first, water is supplied to the second tank 21. At this time, by installing a filter F2 on the water supply port 21a of the second tank 21, the water supplied to the second tank 21 is filtered to remove impurities, ozone, etc. contained in the water.

另外,於步驟S01中,亦可將使用具有濾網F2之過濾器進行了純化之水供給於第二箱21。於後述步驟S02中,於對第一箱13供給水時亦相同。 In addition, in step S01, water purified using a filter with a filter mesh F2 may be supplied to the second tank 21. In step S02 described later, the same applies when water is supplied to the first tank 13.

例如,為了獲得純化水,亦可使用如下淨水器將自來水純化,上述淨水器具備具有活性炭濾網(美國KX Technologies公司之MATRIKX)及逆滲透膜濾網(Dow-Chemical公司之FILMTEC)之過濾膜。 For example, in order to obtain purified water, the following water purifiers can also be used to purify tap water. The above-mentioned water purifiers are equipped with an activated carbon filter (MATRIKX of KX Technologies in the United States) and a reverse osmosis membrane filter (FILMTEC of Dow-Chemical). Filter membrane.

向第二箱21供給之水典型而言為自來水,但不限於此,亦可為脫氣水、蒸餾水、純水或超純水、礦泉水等。另外,向第二箱21供給之水之水溫例如較佳為20℃以下。 於後述步驟S02中,於對第一箱13供給水時亦相同。 The water supplied to the second tank 21 is typically tap water, but is not limited to this, and may also be degassed water, distilled water, pure water or ultrapure water, mineral water, or the like. In addition, the water temperature of the water supplied to the second tank 21 is preferably 20°C or less, for example. In step S02 described later, the same applies when water is supplied to the first tank 13.

繼而,第二泵22抽吸第二箱21內之水,並壓送所抽吸之水。 Then, the second pump 22 sucks the water in the second tank 21 and pressure-feeds the sucked water.

自第二泵22壓送之水係藉由關閉閥V1且打開閥V2,而搬送至溶解器31。藉此,溶解器31被水填充。另外,閥V3係釋放至大氣壓。 The water pressure-fed from the second pump 22 is transferred to the dissolver 31 by closing the valve V1 and opening the valve V2. Thereby, the dissolver 31 is filled with water. In addition, the valve V3 is released to atmospheric pressure.

(步驟S02:氫供給) (Step S02: Hydrogen supply)

於步驟S02中,藉由氫供給部10向於步驟S01中被水填充之溶解器31供給氫。 In step S02, the hydrogen supply unit 10 supplies hydrogen to the dissolver 31 filled with water in step S01.

來自氫供給部10之氫係藉由關閉閥V2且打開閥V1而經由搬送部40供給於溶解器31。氫供給量例如係設為20ml/min至100ml/min。供給氫之時間例如係設為5秒鐘至30秒鐘。 The hydrogen from the hydrogen supply unit 10 is supplied to the dissolver 31 via the transport unit 40 by closing the valve V2 and opening the valve V1. The hydrogen supply amount is set to, for example, 20 ml/min to 100 ml/min. The time for supplying hydrogen is, for example, 5 seconds to 30 seconds.

被供給於溶解器31之氫自供給口331流入至框體311,自筒狀構件321之開放之下側端部向內部空間S1流動。繼而,該氫沿著筒狀構件321自Z軸方向下側向上側流動。結果,於內部空間S1之Z軸方向上側蓄留氫,如圖6所示般形成有儲氫X。 The hydrogen supplied to the dissolver 31 flows into the frame body 311 from the supply port 331, and flows from the open lower end of the cylindrical member 321 into the internal space S1. Then, the hydrogen flows along the cylindrical member 321 from the lower side to the upper side in the Z-axis direction. As a result, hydrogen is stored on the upper side of the Z-axis direction of the internal space S1, and hydrogen storage X is formed as shown in FIG. 6.

(步驟S03:混合體供給) (Step S03: Mixture supply)

於步驟S03中,向於步驟S02中形成有儲氫X之溶解 器31供給氫及水之混合體。 In step S03, a mixture of hydrogen and water is supplied to the dissolver 31 in which the hydrogen storage X is formed in step S02.

更詳細而言,首先藉由打開閥V1、V2而將氫及水分別供給於搬送部40。 In more detail, first, by opening the valves V1 and V2, hydrogen and water are respectively supplied to the conveying unit 40.

繼而,氫及水於搬送部40內混合,形成混合體。於該混合體中,氫以微細氣泡之形式混合於水。另外,該混合氣體中,微細氣泡(氫)於搬送過程受到加壓,少量溶解於水。 Then, hydrogen and water are mixed in the conveyance part 40, and a mixture is formed. In this mixture, hydrogen is mixed with water in the form of fine bubbles. In addition, in this mixed gas, fine bubbles (hydrogen) are pressurized during the transportation process, and a small amount of them are dissolved in water.

於將混合體之體積設為100%之情形時,該混合體之氫濃度例如為4vol%至20vol%。上述氫濃度係藉由水供給量及氫供給量之平衡而調整。例如,水供給量可設為0.2L/min至2.0L/min,氫供給量可設為20ml/min至100ml/min。 When the volume of the mixture is set to 100%, the hydrogen concentration of the mixture is, for example, 4 vol% to 20 vol%. The above-mentioned hydrogen concentration is adjusted by the balance of the water supply amount and the hydrogen supply amount. For example, the water supply amount can be set to 0.2L/min to 2.0L/min, and the hydrogen supply amount can be set to 20ml/min to 100ml/min.

然後,將於搬送部40內形成之混合體供給於溶解器31。 Then, the mixture formed in the conveying unit 40 is supplied to the dissolver 31.

為了將混合體供給於溶解部30,供給口331之壓力係以大於排出口341之壓力之方式設定。 In order to supply the mixture to the dissolving part 30, the pressure of the supply port 331 is set to be greater than the pressure of the discharge port 341.

例如,較佳為以供給口331之壓力為0.2MPa以上0.35MPa以下,且排出口341之壓力成為0.1MPa以上0.25MPa以下(其中,供給口331之壓力>排出口341之壓 力)之方式調整。 For example, it is preferable to adjust so that the pressure of the supply port 331 is 0.2 MPa or more and 0.35 MPa or less, and the pressure of the discharge port 341 is 0.1 MPa or more and 0.25 MPa or less (wherein, the pressure of the supply port 331> the pressure of the discharge port 341) .

為了調整上述供給口331之壓力及排出口341之壓力,不僅可藉由調整閥V2、V3而實現,例如亦可藉由調整流路P7或搬送部40之內徑而實現。另外,亦可藉由在流路P7中插入細管或靜態混合器等,而調整排出口341之壓力。此時,閥V2、V3亦可為可開閉流路P6、P7之電磁閥。 In order to adjust the pressure of the supply port 331 and the pressure of the discharge port 341, it can be achieved not only by adjusting the valves V2, V3, but also by adjusting the inner diameter of the flow path P7 or the conveying part 40, for example. In addition, it is also possible to adjust the pressure of the discharge port 341 by inserting a thin tube, a static mixer, or the like in the flow path P7. At this time, the valves V2 and V3 can also be solenoid valves that can open and close the flow paths P6 and P7.

圖7為表示於溶解器31內混合體正被攪拌之狀態之圖。再者,圖7所示之粗箭頭示意性地表示於溶解器31內流動之混合體之軌跡。 FIG. 7 is a diagram showing a state where the mixed body in the dissolver 31 is being stirred. Furthermore, the thick arrow shown in FIG. 7 schematically represents the trajectory of the mixed body flowing in the dissolver 31.

藉由混合體於溶解器31內部流動,混合體中之氫之微細氣泡溶解於水。 As the mixture flows inside the dissolver 31, the fine bubbles of hydrogen in the mixture are dissolved in water.

具體而言,混合體於藉由筒狀構件321所形成之流路中流動。如圖7所示,自供給口331供給而流入至內部空間S1,向Z軸方向上側上升後,於筒狀構件321之上側端部附近折回,向Z軸方向下側流動。然後,混合體於筒狀構件321之下側端部附近折回,流動至內部空間S2,向Z軸方向上側上升後,自排出口341排出。如此,混合體於在碰撞式之溶解器31內部複雜地流動之過程中,反復與框體311或筒狀構件321碰撞,由此被攪拌,混合體中之氫之微細氣泡溶解於水。 Specifically, the mixture flows in the flow path formed by the cylindrical member 321. As shown in FIG. 7, it is supplied from the supply port 331 and flows into the internal space S1, after ascending upward in the Z-axis direction, it is folded back near the upper end of the cylindrical member 321 and flows downward in the Z-axis direction. Then, the mixture is folded back near the lower end of the cylindrical member 321, flows into the internal space S2, rises to the upper side in the Z-axis direction, and is discharged from the discharge port 341. In this way, the mixture repeatedly collides with the frame body 311 or the cylindrical member 321 during the complicated flow in the collision type dissolver 31, and is thereby stirred, and the fine hydrogen bubbles in the mixture are dissolved in water.

另外,混合體於在溶解器31內部流動之過程中,與儲氫X接觸,由此儲氫X中之氫溶解於混合體。 In addition, the mixed body is in contact with the hydrogen storage X in the process of flowing inside the dissolver 31, so that the hydrogen in the hydrogen storage X is dissolved in the mixed body.

具體而言,如圖7所示,混合體於溶解器31之內部空間S1中朝向Z軸方向之上側流動,與儲氫X接觸。此時,水中之溶存氧或溶存氮之分壓變小,溶存氧或溶存氮被釋出至儲氫X。可認為與此同時,包含高濃度之氫的儲氫X中之氫向混合體擴散,儲氫X中之氫溶解於混合體。藉此,可獲得以高濃度溶解有氫之氫水。 Specifically, as shown in FIG. 7, the mixture flows toward the upper side in the Z-axis direction in the internal space S1 of the dissolver 31 and contacts the hydrogen storage X. At this time, the partial pressure of dissolved oxygen or dissolved nitrogen in the water becomes smaller, and the dissolved oxygen or dissolved nitrogen is released to the hydrogen storage X. It can be considered that at the same time, hydrogen in the hydrogen storage X containing a high concentration of hydrogen diffuses into the mixture, and the hydrogen in the hydrogen storage X dissolves in the mixture. Thereby, hydrogen water in which hydrogen is dissolved in a high concentration can be obtained.

如以上般,上述氫水的製造方法中,除了由碰撞式之溶解器所得的氫溶解效果以外,還可獲得由儲氫X所得的氫溶解效果。藉此,利用上述氫水之製造方法可獲得1.6ppm至2.0ppm之高濃度之氫水。 As described above, in the above-mentioned hydrogen water production method, in addition to the hydrogen dissolving effect obtained by the collision type dissolver, the hydrogen dissolving effect obtained by the hydrogen storage X can also be obtained. Thereby, high-concentration hydrogen water of 1.6 ppm to 2.0 ppm can be obtained by using the above-mentioned method for producing hydrogen water.

尤其於小型伺服器之情形時,可供給氫之量有限,故而氫濃度從開始製造氫水起逐漸增加,直至達到一定濃度需要時間。 Especially in the case of a small server, the amount of hydrogen that can be supplied is limited, so the hydrogen concentration gradually increases from the beginning of the production of hydrogen water until it takes time to reach a certain concentration.

另一方面,本實施形態之氫水的製造方法中,氫濃度於短時間達到一定濃度。 On the other hand, in the method of producing hydrogen water of this embodiment, the hydrogen concentration reaches a certain concentration in a short time.

例如,對於在未形成儲氫X之情況下製造之氫水而言,一分鐘後之氫濃度相對於三分鐘後之氫濃度低50%左右。相對於此,對於利用本實施形態之氫水的製造方法所 製造之氫水而言,一分鐘後之氫濃度相對於三分鐘後之氫濃度低18%左右,氫濃度之降低程度被抑制。 For example, for hydrogen water produced without the formation of hydrogen storage X, the hydrogen concentration after one minute is about 50% lower than the hydrogen concentration after three minutes. In contrast, for the hydrogen water produced by the hydrogen water production method of this embodiment, the hydrogen concentration after one minute is about 18% lower than the hydrogen concentration after three minutes, and the reduction in the hydrogen concentration is suppressed.

另外,本實施形態之氫水的製造方法中,在氫濃度達到一定濃度之前的階段中,若形成有儲氫X,則可獲得高濃度之氫水。然而,較佳為在氫濃度達到一定濃度後,亦使儲氫X不消失而得以維持。藉此,於氫濃度達到一定濃度後,亦維持由儲氫X所得的使氫濃度提高之效果。藉由調整氫供給量及水供給量,可保持蓄留有氫之狀態,可使儲氫X不消失而得以維持。 In addition, in the method for producing hydrogen water of the present embodiment, in the stage before the hydrogen concentration reaches a certain concentration, if hydrogen storage X is formed, high-concentration hydrogen water can be obtained. However, it is preferable to maintain the hydrogen storage X without disappearing after the hydrogen concentration reaches a certain concentration. In this way, after the hydrogen concentration reaches a certain concentration, the effect of increasing the hydrogen concentration obtained by the hydrogen storage X is also maintained. By adjusting the hydrogen supply amount and the water supply amount, the state of storing hydrogen can be maintained, and the hydrogen storage X can be maintained without disappearing.

[其他實施形態] [Other embodiments]

以上,對本發明之實施形態進行了說明,但本發明並非僅限定於上述實施形態,當然可加以各種變更。 As mentioned above, the embodiment of the present invention has been described, but the present invention is not limited to the above-mentioned embodiment, of course, various modifications can be made.

例如,上述實施形態之溶解部30不限定於此,可對溶解器31之構成加以各種變更。 For example, the dissolving part 30 of the above-mentioned embodiment is not limited to this, and the structure of the dissolver 31 can be variously changed.

作為一例,上述實施形態之溶解器31之筒狀構件321之形狀為圖3所示般之一端封閉的筒狀,但不限定於此,亦可為簡單的凹形狀。即,筒狀構件321只要為以可蓄留氫之方式具有朝向供給口331開放之凹部的構成即可,凹部之形狀亦可為U字狀、V字狀等。 As an example, the shape of the cylindrical member 321 of the dissolver 31 of the above embodiment is a cylindrical shape with one end closed as shown in FIG. 3, but it is not limited to this, and may be a simple concave shape. That is, the cylindrical member 321 only needs to have a configuration having a recessed portion that opens toward the supply port 331 so as to store hydrogen, and the shape of the recessed portion may be U-shaped, V-shaped, or the like.

另外,上述實施形態之溶解部30為具有一個溶解器31之構成,但不限於此,亦可為具有兩個以上之溶解器31之構成,亦可為進而具有與溶解器31不同之溶解器之構成。可使用靜態混合器等靜止型流體混合式溶解器、碰撞式、渦流方式、噴射方式、加壓溶解式或孔蝕(cavitation)方式等之溶解器作為與溶解器31不同之溶解器。 In addition, the dissolving part 30 of the above-mentioned embodiment has a configuration with one dissolver 31, but it is not limited to this, and it may also be a configuration with two or more dissolvers 31, or it may further have a dissolver different from the dissolver 31. The composition. As a dissolver different from the dissolver 31, a static fluid mixing dissolver such as a static mixer, an impact dissolver, a vortex mode, a jet dissolver, a pressure dissolving dissolver, or a cavitation dissolver may be used.

另外,上述實施形態之氫供給部10之第一箱13亦可為與第二箱21共同之構成。此時,亦可適當設置用以自共同之箱對氫供給部10供給水之閥。 In addition, the first tank 13 of the hydrogen supply unit 10 of the above-mentioned embodiment may be configured in common with the second tank 21. At this time, a valve for supplying water to the hydrogen supply unit 10 from a common tank may be appropriately provided.

10‧‧‧氫供給部 10‧‧‧Hydrogen Supply Department

11‧‧‧水電解單元 11‧‧‧Water Electrolysis Unit

12‧‧‧第一泵 12‧‧‧First pump

13‧‧‧第一箱 13‧‧‧The first box

13a、21a‧‧‧供水口 13a, 21a‧‧‧Water supply port

13b‧‧‧氧排出口 13b‧‧‧Oxygen outlet

20‧‧‧水供給部 20‧‧‧Water Supply Department

21‧‧‧第二箱 21‧‧‧The second box

22‧‧‧第二泵 22‧‧‧Second pump

30‧‧‧溶解部 30‧‧‧Dissolution Department

31‧‧‧溶解器 31‧‧‧Dissolver

40‧‧‧搬送部 40‧‧‧Transportation Department

50‧‧‧控制部 50‧‧‧Control Department

100‧‧‧氫水製造裝置 100‧‧‧Hydrogen Water Manufacturing Device

F1、F2‧‧‧濾網 F1, F2‧‧‧Filter

P1、P2、P3、P4、P5、P6、P7‧‧‧流路 P1, P2, P3, P4, P5, P6, P7‧‧‧Flow path

V1、V2、V3‧‧‧閥 V1, V2, V3‧‧‧Valve

Claims (4)

一種氫水的製造裝置,係具備:溶解部,具有:框體,形成有供給口及排出口;及凹部,配置於前述框體內且朝向前述供給口開放;水供給部,可自前述供給口向前述框體內供給水;氫供給部,可自前述供給口向前述框體內供給氫;以及控制部,控制前述水供給部及前述氫供給部,藉此向被水填充之前述框體內供給氫而使氫蓄留於前述凹部內後,向前述框體內供給水及氫之混合體。 An apparatus for producing hydrogen water is provided with: a dissolving part having: a frame body with a supply port and a discharge port; and a recessed part arranged in the frame body and open toward the supply port; the water supply part can be from the supply port Supply water into the frame; a hydrogen supply unit that can supply hydrogen to the frame from the supply port; and a control unit that controls the water supply unit and the hydrogen supply unit to supply hydrogen to the frame filled with water After accumulating hydrogen in the recessed portion, a mixture of water and hydrogen is supplied into the housing. 如請求項1所記載之氫水的製造裝置,其中前述控制部一邊保持於前述凹部蓄留有氫之狀態,一邊向前述框體內供給前述混合體。 The apparatus for producing hydrogen water according to claim 1, wherein the control unit supplies the mixture into the housing while maintaining a state in which hydrogen is stored in the recessed portion. 一種氫水的製造方法,係自溶解器之供給口供給水,藉此以水將前述溶解器之框體內填充,前述溶解器具有:前述框體,形成有前述供給口及排出口;及凹部,配置於前述框體內且朝向前述供給口開放;自前述供給口向被水填充之前述框體內供給氫,藉此使氫蓄留於前述凹部;於使氫蓄留於前述凹部之後,一邊自前述供給口向前述框體供給水及氫之混合體,一邊自前述排出口回收氫水。 A method for producing hydrogen water is to supply water from a supply port of a dissolver to fill the frame of the dissolver with water. The dissolver has: the frame is formed with the supply port and the discharge port; and a recessed portion , Arranged in the frame and open to the supply port; supply hydrogen from the supply port to the frame filled with water, thereby accumulating hydrogen in the recess; after accumulating hydrogen in the recess, The supply port supplies a mixture of water and hydrogen to the frame, while recovering hydrogen water from the discharge port. 如請求項3所記載之氫水的製造方法,其中一邊保持於前述凹部蓄留有氫之狀態,一邊向前述框體內供給 前述混合體。 The method for producing hydrogen water as recited in claim 3, wherein the mixture is supplied into the housing while maintaining the state in which hydrogen is stored in the recess.
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000296899A (en) * 1999-04-12 2000-10-24 Japan Organo Co Ltd Method for storing gas dissolved water and its storing device
JP2009248048A (en) * 2008-04-09 2009-10-29 Shori:Kk Gas/liquid-mixed water generating apparatus
TW201716339A (en) * 2015-11-13 2017-05-16 夏普股份有限公司 Hydrogen-containing water generating apparatus and method for generating hydrogen-containing water

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Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000296899A (en) * 1999-04-12 2000-10-24 Japan Organo Co Ltd Method for storing gas dissolved water and its storing device
JP2009248048A (en) * 2008-04-09 2009-10-29 Shori:Kk Gas/liquid-mixed water generating apparatus
TW201716339A (en) * 2015-11-13 2017-05-16 夏普股份有限公司 Hydrogen-containing water generating apparatus and method for generating hydrogen-containing water

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