TWI736770B - Apparatus and method of producing hydrogen water - Google Patents
Apparatus and method of producing hydrogen water Download PDFInfo
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- TWI736770B TWI736770B TW107118504A TW107118504A TWI736770B TW I736770 B TWI736770 B TW I736770B TW 107118504 A TW107118504 A TW 107118504A TW 107118504 A TW107118504 A TW 107118504A TW I736770 B TWI736770 B TW I736770B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F21/00—Dissolving
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/68—Treatment of water, waste water, or sewage by addition of specified substances, e.g. trace elements, for ameliorating potable water
Abstract
Description
本發明係關於一種氫水的製造裝置以及製造方法。 The present invention relates to a hydrogen water manufacturing device and manufacturing method.
近年來,就有效地促進健康等方面而言,氫水受到關注。作為製造此種氫水的方法,已提出有各種方法。例如,於專利文獻1及專利文獻2中記載有以下方法:使藉由將水電解所生成之氫溶解於水,藉此製造氫水。 In recent years, hydrogen water has attracted attention in terms of effective health promotion. As a method of producing such hydrogen water, various methods have been proposed. For example, Patent Document 1 and
[先前技術文獻] [Prior Technical Literature]
[專利文獻] [Patent Literature]
專利文獻1:日本特開2016-101585號公報。 Patent Document 1: Japanese Patent Application Laid-Open No. 2016-101585.
專利文獻2:日本實用新型登記第3204432號公報。 Patent Document 2: Japanese Utility Model Registration No. 3204432.
最近,正在開發使普通消費者可簡便地攝取氫水的小型伺服器(server)。另一方面,小型伺服器之情形時,僅可 設置小型的水電解單元(cell)或氫儲罐,故而有可供給之氫量有限,難以獲得高濃度之氫水的問題。 Recently, a small server that allows ordinary consumers to easily consume hydrogen water is being developed. On the other hand, in the case of a small server, only small water electrolysis cells or hydrogen storage tanks can be installed. Therefore, the amount of hydrogen that can be supplied is limited and it is difficult to obtain high-concentration hydrogen water.
鑒於以上般之情況,本發明之目的在於提供一種可獲得高濃度之氫水的氫水的製造裝置以及製造方法。 In view of the above-mentioned circumstances, the object of the present invention is to provide a hydrogen water production device and a production method that can obtain high-concentration hydrogen water.
為了達成上述目的,本發明之一形態之氫水的製造裝置係具備:溶解部,具有:框體,形成有供給口及排出口;及凹部,配置於上述框體內且朝向上述供給口開放;水供給部,可自上述供給口向上述框體內供給水;氫供給部,可自上述供給口向上述框體內供給氫;以及控制部,控制上述水供給部及上述氫供給部,藉此向被水填充之上述框體內供給氫而使氫蓄留於上述凹部內後,向上述框體內供給水及氫之混合體。 In order to achieve the above-mentioned object, a hydrogen water production apparatus according to an aspect of the present invention includes: a dissolving part having: a frame body with a supply port and a discharge port formed thereon; and a recessed part disposed in the frame body and open toward the supply port; A water supply unit that can supply water into the frame from the supply port; a hydrogen supply unit that can supply hydrogen into the frame from the supply port; and a control unit that controls the water supply unit and the hydrogen supply unit to thereby After hydrogen is supplied to the housing filled with water and the hydrogen is stored in the recessed portion, a mixture of water and hydrogen is supplied to the housing.
藉由該構成,可使氫預先蓄留於溶解部之凹部。藉此,可於向溶解部供給水及氫之混合體時,使蓄留於凹部之氫與混合體接觸,而使蓄留於凹部之氫溶解於混合體。藉此,可獲得高濃度之氫水。 With this configuration, hydrogen can be stored in the recesses of the dissolving part in advance. Thereby, when the mixture of water and hydrogen is supplied to the dissolving part, the hydrogen stored in the recess can be brought into contact with the mixture, and the hydrogen stored in the recess can be dissolved in the mixture. In this way, high-concentration hydrogen water can be obtained.
上述控制部亦可一邊保持於上述凹部蓄留有氫之狀態,一邊向上述框體內供給上述混合體。 The control unit may supply the mixture into the housing while maintaining a state in which hydrogen is stored in the recess.
藉此,維持氫容易溶解於混合體之狀態,可更容易地獲得高濃度之氫水。 In this way, the state that hydrogen is easily dissolved in the mixture is maintained, and high-concentration hydrogen water can be obtained more easily.
為了達成上述目的,本發明之一形態之氫水的製造方法係自溶解器之供給口供給水,藉此以水將上述溶解器之框體內填充,上述溶解器具有:上述框體,形成有上述供給口及排出口;及凹部,配置於上述框體內且朝向上述供給口開放;自上述供給口向被水填充之上述框體內供給氫,藉此使氫蓄留於上述凹部;使氫蓄留於上述凹部之後,一邊自上述供給口向上述框體供給水及氫之混合體,一邊自上述排出口回收氫水。 In order to achieve the above-mentioned object, the method for producing hydrogen water in one aspect of the present invention is to supply water from the supply port of a dissolver to fill the frame of the dissolver with water. The dissolver has: the frame is formed with The supply port and the discharge port; and the concave portion are arranged in the frame and open toward the supply port; supply hydrogen from the supply port into the frame filled with water, thereby accumulating hydrogen in the concave portion; and accumulate hydrogen After being left in the recess, while supplying a mixture of water and hydrogen to the housing from the supply port, the hydrogen water is recovered from the discharge port.
上述氫水的製造方法亦可一邊保持於上述凹部蓄留有氫之狀態,一邊向上述框體內供給前述混合體。 The manufacturing method of the said hydrogen water may supply the said mixture into the said housing|casing while maintaining the state which stored hydrogen in the said recessed part.
可提供一種可獲得高濃度之氫水的氫水的製造裝置及製造方法。 It is possible to provide a hydrogen water manufacturing device and a manufacturing method that can obtain high-concentration hydrogen water.
10‧‧‧氫供給部 10‧‧‧Hydrogen Supply Department
11‧‧‧水電解單元 11‧‧‧Water Electrolysis Unit
11a‧‧‧陽極側空間 11a‧‧‧Anode side space
11b‧‧‧陰極側空間 11b‧‧‧Cathode side space
12‧‧‧第一泵 12‧‧‧First pump
13‧‧‧第一箱 13‧‧‧The first box
13a、21a‧‧‧供水口 13a, 21a‧‧‧Water supply port
13b‧‧‧氧排出口 13b‧‧‧Oxygen outlet
14‧‧‧膜電極接合體 14‧‧‧Membrane electrode assembly
14a‧‧‧陽極 14a‧‧‧Anode
14b‧‧‧陰極 14b‧‧‧Cathode
14c‧‧‧固體高分子膜 14c‧‧‧Solid polymer membrane
20‧‧‧水供給部 20‧‧‧Water Supply Department
21‧‧‧第二箱 21‧‧‧The second box
22‧‧‧第二泵 22‧‧‧Second pump
30‧‧‧溶解部 30‧‧‧Dissolution Department
31‧‧‧溶解器 31‧‧‧Dissolver
40‧‧‧搬送部 40‧‧‧Transportation Department
50‧‧‧控制部 50‧‧‧Control Department
100‧‧‧氫水製造裝置 100‧‧‧Hydrogen Water Manufacturing Device
311‧‧‧框體 311‧‧‧Frame
321‧‧‧筒狀構件 321‧‧‧Cylinder-shaped member
331‧‧‧供給口 331‧‧‧Supply Port
341‧‧‧排出口 341‧‧‧Exhaust outlet
F1、F2‧‧‧濾網 F1, F2‧‧‧Filter
P‧‧‧電源 P‧‧‧Power
P1、P2、P3、P4、P5、P6、P7‧‧‧流路 P1, P2, P3, P4, P5, P6, P7‧‧‧Flow path
S01、S02、03‧‧‧步驟 S01, S02, 03‧‧‧Step
S1、S2‧‧‧內部空間 S1, S2‧‧‧Internal space
V1、V2、V3‧‧‧閥 V1, V2, V3‧‧‧Valve
X‧‧‧儲氫 X‧‧‧Hydrogen storage
圖1為示意性地表示本發明之一實施形態之氫水製造裝置之構成的配管系統圖。 Fig. 1 is a piping system diagram schematically showing the configuration of a hydrogen water production apparatus according to an embodiment of the present invention.
圖2為表示上述氫水製造裝置之水電解單元之構成的示意圖。 Fig. 2 is a schematic diagram showing the structure of a water electrolysis unit of the above-mentioned hydrogen water production device.
圖3中之(A)及(B)為上述氫水製造裝置之溶解器之剖面圖。 (A) and (B) in FIG. 3 are cross-sectional views of the dissolver of the above-mentioned hydrogen water production device.
圖4為表示利用上述氫水製造裝置之氫水製造方法的流程圖。 Fig. 4 is a flowchart showing a hydrogen water production method using the above-mentioned hydrogen water production device.
圖5為表示上述氫水製造方法之製造過程的圖。 Fig. 5 is a diagram showing the manufacturing process of the above-mentioned hydrogen water manufacturing method.
圖6為表示上述氫水製造方法之製造過程的圖。 Fig. 6 is a diagram showing the manufacturing process of the above-mentioned hydrogen water manufacturing method.
圖7為表示上述氫水製造方法之製造過程的圖。 Fig. 7 is a diagram showing the manufacturing process of the above-mentioned hydrogen water manufacturing method.
以下,一邊參照圖式一邊對本發明之實施形態進行說明。 Hereinafter, embodiments of the present invention will be described with reference to the drawings.
[氫水製造裝置100之構成] [Configuration of Hydrogen Water Production Device 100]
圖1為示意性地表示本發明之一實施形態之氫水製造裝置100之構成的配管系統圖。如圖1所示,氫水製造裝置100具有氫供給部10、水供給部20、溶解部30、搬送部40及控制部50。 Fig. 1 is a piping system diagram schematically showing the configuration of a hydrogen
(氫供給部10) (Hydrogen supply unit 10)
氫供給部10具有水電解單元11、第一泵12、第一箱13及閥V1。氫供給部10經由搬送部40而連接於溶解部30。氫供給部10經由搬送部40向溶解部30供給氫。 The
如圖1所示,水電解單元11經由流路P2而連接於第 一泵12,且經由流路P3而連接於第一箱13。另外,水電解單元11經由流路P4而亦連接於搬送部40。 As shown in Fig. 1, the
圖2為表示水電解單元11之構成的示意圖。本實施形態之水電解單元11為PEM(Proton Exchange Membrane;質子交換膜)型。 FIG. 2 is a schematic diagram showing the structure of the
如圖2所示,水電解單元11具有陽極側空間11a、陰極側空間11b及膜電極接合體14。陽極側空間11a係連接於流路P2、P3,陰極側空間11b係連接於流路P4。 As shown in FIG. 2, the
如圖2所示,膜電極接合體14具有陽極14a及陰極14b與固體高分子膜14c。固體高分子膜14c為設於陽極14a與陰極14b之間,容許離子(質子)自陽極14a向陰極14b移動之離子(質子)交換膜。固體高分子膜14c之種類並無特別限定,例如可設為Nafion(註冊商標)膜。 As shown in FIG. 2, the
陽極14a及陰極14b為附著於固體高分子膜14c之表面的電極。具體而言係由附著於固體高分子膜14c之表面的鈦基體、及擔載於該鈦基體之金屬觸媒所構成。作為該金屬觸媒,例如為由含有鎳(Ni)、銅(Cu)、鈀(Pd)、鉑(Pt)、銀(Ag)、金(Au)或該等之合金的金屬材料等所構成之金屬觸媒,典型而言為鉑觸媒。鈦基體之形狀並無特別限定,較佳為多孔質狀或網狀。 The
如圖2所示,水電解單元11中可包含電源P,亦可外接。 As shown in FIG. 2, the
於水電解單元11之電源P採用直流電源。於採用直流電源之情形時,例如可將施加電壓設為1.7V至10V,將施加電流設為0.1A至30A。 The power source P of the
另外,例如亦可採用脈波電源。關於該脈波電源,作為一例,可採用脈波之產生方式為直接切換(direct switch)方式、線型(line type)方式、感應(induction)方式或馬克斯(Marx)方式等之脈波電源。 In addition, for example, a pulse wave power supply may also be used. Regarding the pulse wave power supply, as an example, the pulse wave generation method can be a direct switch method, a line type method, an induction method, or a Marx method.
於採用脈波電源之情形時,例如可將脈波頻率設為1Hz至1000Hz,將施加電壓設為1.7V至10V,將施加電流設為0.1A至30A。 In the case of using a pulse wave power supply, for example, the pulse wave frequency can be set to 1 Hz to 1000 Hz, the applied voltage can be set to 1.7V to 10V, and the applied current can be set to 0.1A to 30A.
於水電解單元11中,藉由將供給於陽極側空間11a之水電解,而於陰極14b以微細氣泡之形式產生氫。與此同時,於陽極14a產生氧。 In the
氫係一分鐘自陰極14b產生20ml至200ml。氫之微細氣泡之粒徑例如較佳為幾百微米(μm)至幾毫米(mm)左右,進而佳為幾微米至幾十微米左右。另外,氫含有於電解時與氫離子一同透過固體高分子膜14c的微量之水。 The hydrogen system generates 20 ml to 200 ml from the
所產生之氧溶解於被供給於陽極側空間11a之水而成 為氧水。氧水係經由流路P3而被搬送至第一箱13。 The generated oxygen is dissolved in the water supplied to the
如圖1所示,第一箱13經由流路P1而連接於第一泵12。第一箱13為具有蓄積水之功能的蓄水箱。第一箱13之容量並無特別限定,例如可設為0.05L至1L。 As shown in Fig. 1, the
第一箱13之材料亦無特別限定,例如可由合成樹脂或金屬材料等所構成。 The material of the
另外,本實施形態之第一箱13具有供水口13a及氧排出口13b。如圖1所示,於供水口13a安裝有濾網F1。 In addition, the
氧排出口13b將自陽極空間11a經由流路P3搬送之氧排出。 The
濾網F1之種類並無特別限定,例如可製成由預濾網與主濾網所構成之過濾膜,上述預濾網係由活性炭所構成,上述主濾網為RO(Reverse Osmosis;逆滲透)膜、NF(Nano Filtration;奈米過濾)膜、UF(Ultrafiltration;超濾)膜或MF(Microfiltration;微濾)膜、離子交換膜等。再者,濾網F1視需要亦可省略。藉由如此般使用預濾網及主濾網將自供水口13a供給之水以二階段過濾,可製成純水。 The type of filter F1 is not particularly limited. For example, it can be made into a filter membrane composed of a pre-filter and a main filter. The pre-filter is composed of activated carbon, and the main filter is RO (Reverse Osmosis; reverse osmosis). ) Membrane, NF (Nano Filtration; nanofiltration) membrane, UF (Ultrafiltration; ultrafiltration) membrane or MF (Microfiltration; microfiltration) membrane, ion exchange membrane, etc. Furthermore, the filter F1 can be omitted if necessary. By using the pre-filter and the main filter to filter the water supplied from the
第一泵12為供水泵,具有使自第一箱13內經由流路 P1抽吸之水經過流路P2、水電解單元11及流路P3而向第一箱13壓送之功能。 The
具體而言,第一泵12將第一箱13內之水壓送至陽極側空間11a。 Specifically, the
另外,第一泵12將陽極側空間11a之氧水壓送至第一箱13。第一泵12使氧水於陽極側空間11a、第一箱13、第一泵12之間循環。另外,氫供給部10只要可使流體循環,則亦可設為不具備第一泵12之構成。例如,亦可利用所產生之氧上升時產生的流動而使流體自然循環。 In addition, the
關於第一泵12,例如採用可壓送水之隔膜泵或增壓泵(booster pump)。藉此,可達成氫水製造裝置100之裝置構成,而且實現精簡化及低成本化。 Regarding the
關於第一泵12,不僅可採用隔膜泵或增壓泵,例如亦可採用柱塞泵、齒輪泵、乾泵、油旋泵或噴射泵等。另外,關於第一泵12,亦可採用幾乎不施加壓力之磁力泵等。 Regarding the
閥V1係設於流路P4。閥V1藉由該閥V1之開閉而調整自氫供給部10經由搬送部40向溶解部30之氫供給。 The valve V1 is provided in the flow path P4. The valve V1 adjusts the supply of hydrogen from the
閥V1典型而言為可開閉流路P4之電磁閥,但不限定於此。閥V1例如亦可為可調整流量之針閥等球形閥(global valve),亦可為球閥(ball valve)、蝴蝶閥、閘閥或隔膜閥等。氫供給部10亦可設為不具備閥V1之構成。 The valve V1 is typically a solenoid valve that can open and close the flow path P4, but it is not limited to this. The valve V1 may be, for example, a global valve such as a needle valve with adjustable flow rate, or a ball valve, butterfly valve, gate valve, or diaphragm valve. The
例如,上述實施形態之氫供給部10之水電解單元11藉由PEM水電解而產生氫,但不限於此,亦可藉由鹼水電解或高溫水蒸氣電解而產生氫。 For example, the
另外,上述實施形態之氫供給部10藉由水電解單元11而供給氫,但不限定於此,亦可使用氫儲罐供給氫。 In addition, the
(水供給部20) (Water supply part 20)
水供給部20具有第二箱21、第二泵22及閥V2。水供給部20經由搬送部40向溶解部30供給水。 The
如圖1所示,第二箱21經由流路P5而連接於第二泵22。第二箱21典型而言具有與第一箱13相同之構成,但亦可為與第一箱13不同種類之箱。 As shown in FIG. 1, the
安裝於第二箱21之供水口21a的濾網F2係可為與濾網F1相同種類之濾網,亦可為不同種類之濾網。 The filter F2 installed at the
如圖1所示,第二泵22經由流路P6而連接於搬送部40。第二泵22具有使自第二箱21內經由流路P5抽吸之水經過流路P6及搬送部40而向溶解部30壓送之功能。 As shown in FIG. 1, the
第二泵22典型而言係採用可壓送水之隔膜泵或增壓 泵等,但不限定於此。 The
閥V2係設於流路P6。閥V2調整自水供給部20經由搬送部40供給於溶解部30之水供給量。 The valve V2 is provided in the flow path P6. The valve V2 adjusts the amount of water supplied from the
閥V2典型而言為針閥等球形閥,但不限於此,亦可為球閥、蝴蝶閥、閘閥或隔膜閥等。對於後述閥V3而言亦相同。 The valve V2 is typically a spherical valve such as a needle valve, but is not limited to this, and may also be a ball valve, butterfly valve, gate valve, or diaphragm valve. The same applies to the valve V3 described later.
(溶解部30) (Dissolving part 30)
如圖1所示,溶解部30具有溶解器31及閥V3。 As shown in FIG. 1, the dissolving
如圖1所示,溶解器31經由搬送部40而連接於氫供給部10及水供給部20。另外,自溶解器31排出之流體係經由流路P7而排出至外部。溶解器31具有對自氫供給部10及水供給部20經由搬送部40搬送而來之流體進行攪拌之功能。 As shown in FIG. 1, the
圖3中的(A)為溶解器31之剖面圖。圖3中的(B)為沿著圖3中的(A)之A-A'線之剖面圖。再者,於以下之圖中,X軸方向、Y軸方向及Z軸方向為相互正交之三軸方向。Z軸朝向鉛垂方向。 (A) in FIG. 3 is a cross-sectional view of the
如圖3中的(A)所示,溶解器31具有框體311、筒狀構件321、供給口331及排出口341。 As shown in FIG. 3(A), the
如圖3中的(B)所示,溶解器31係於中空之框體311內部配置有筒狀構件321,具有套管構造。溶解器31內部係藉由筒狀構件321而劃分,具有形成於筒狀構件321之內側的內部空間S1、及形成於框體311與筒狀構件321之間的內部空間S2。 As shown in FIG. 3(B), the
框體311具有Z軸方向上側之上壁、Z軸方向下側之下壁、及將上壁與下壁連結且於Z軸方向延伸之側壁。 The
框體311之形狀典型而言為圓筒形狀,但不限於此,可設為三角柱狀、矩形柱狀等任意形狀。構成框體311之材料亦無特別限定,可自公知之合成樹脂或金屬材料等中任意選擇。 The shape of the
框體311之內徑及Z軸方向之尺寸(高度)並無特別限定。 The inner diameter of the
供給口331係設於框體311之下壁。 The
供給口331係連接於搬送部40,自供給口331供給流體。 The
排出口341係靠近框體311之側壁之上壁側而設置。 The
排出口341係連接於流路P7,自排出口341將流體排出至流路P7。自排出口341排出之流體係自流路P7而被回收於外部。 The
如圖3中的(A)所示,筒狀構件321為使Z軸方向之下側端部朝向溶解器31之供給口331開放的筒狀之構件。筒狀構件321之上側端部係藉由與框體311之上壁一體地形成而封閉。 As shown in (A) in FIG. 3, the
筒狀構件321之內徑及Z軸方向之尺寸(高度)可根據框體311之大小而適當決定。另外,筒狀構件321之形狀典型而言為圓筒形狀,但不限定於此,亦可為矩形狀等任意形狀。進而,筒狀構件321亦可由與框體311相同或不同之材料所構成。 The inner diameter of the
藉由以上之構成,溶解器31作為碰撞式之溶解器發揮功能。作為溶解器31,例如可將0.8L型者用於小型伺服器用。 With the above configuration, the
閥V3係設於流路P7。閥V3藉由與閥V2一併進行調整而可調整供給口331之壓力及排出口341之壓力。 The valve V3 is provided in the flow path P7. The valve V3 can be adjusted together with the valve V2 to adjust the pressure of the
(搬送部40) (Transportation Department 40)
搬送部40係連接於氫供給部10、水供給部20及溶解部30。 The
藉由該構成,氫供給部10可經由搬送部40向溶解部30供給氫。另外,水供給部20可經由搬送部40向溶解部30供給水。 With this configuration, the
(控制部50) (Control Unit 50)
控制部50係連接於氫供給部10、水供給部20及溶解部30。 The
控制部50控制氫供給部10、水供給部20及溶解部30。 The
例如,控制部50藉由閥V1之開閉而調整自氫供給部10向溶解部30之氫供給。另外,控制部50可藉由閥V1之開閉而防止水自搬送部40向氫供給部10逆流。 For example, the
另外,控制部50藉由調整電源P之施加電壓、施加電流,可控制氫產生量及氫供給時間。另外,控制部50藉由調整第一泵12之水之壓送量,可控制氫產生量。 In addition, the
進而,控制部50可藉由閥V2而控制水供給量。另外,控制部50亦可藉由調整第二泵22之水之壓送量而控制水供給量。 Furthermore, the
此外,控制部50可藉由閥V2、V3而控制供給口331之壓力、排出口341之壓力。 In addition, the
除此以外,控制部50亦可控制蓄積於第一箱13及第二箱21之水之溫度或內壓等。 In addition to this, the
[氫水製造方法] [Method of producing hydrogen water]
圖4為表示利用氫水製造裝置100之氫水製造方法的流程圖。以下,依照圖4對利用氫水製造裝置100之氫水製造方法進行說明。藉由該氫水製造方法,可獲得高濃度之氫水。 FIG. 4 is a flowchart showing a hydrogen water production method using the hydrogen
(步驟S01:水供給) (Step S01: Water supply)
於步驟S01中,藉由水供給部20將水供給於溶解部30。藉此,如圖5所示,溶解器31係被水填充。 In step S01, the
更詳細而言,首先對第二箱21供給水。此時,藉由在第二箱21之供水口21a安裝濾網F2,而將向第二箱21供給之水過濾,將該水所含之雜質或臭氧等去除。 In more detail, first, water is supplied to the
另外,於步驟S01中,亦可將使用具有濾網F2之過濾器進行了純化之水供給於第二箱21。於後述步驟S02中,於對第一箱13供給水時亦相同。 In addition, in step S01, water purified using a filter with a filter mesh F2 may be supplied to the
例如,為了獲得純化水,亦可使用如下淨水器將自來水純化,上述淨水器具備具有活性炭濾網(美國KX Technologies公司之MATRIKX)及逆滲透膜濾網(Dow-Chemical公司之FILMTEC)之過濾膜。 For example, in order to obtain purified water, the following water purifiers can also be used to purify tap water. The above-mentioned water purifiers are equipped with an activated carbon filter (MATRIKX of KX Technologies in the United States) and a reverse osmosis membrane filter (FILMTEC of Dow-Chemical). Filter membrane.
向第二箱21供給之水典型而言為自來水,但不限於此,亦可為脫氣水、蒸餾水、純水或超純水、礦泉水等。另外,向第二箱21供給之水之水溫例如較佳為20℃以下。 於後述步驟S02中,於對第一箱13供給水時亦相同。 The water supplied to the
繼而,第二泵22抽吸第二箱21內之水,並壓送所抽吸之水。 Then, the
自第二泵22壓送之水係藉由關閉閥V1且打開閥V2,而搬送至溶解器31。藉此,溶解器31被水填充。另外,閥V3係釋放至大氣壓。 The water pressure-fed from the
(步驟S02:氫供給) (Step S02: Hydrogen supply)
於步驟S02中,藉由氫供給部10向於步驟S01中被水填充之溶解器31供給氫。 In step S02, the
來自氫供給部10之氫係藉由關閉閥V2且打開閥V1而經由搬送部40供給於溶解器31。氫供給量例如係設為20ml/min至100ml/min。供給氫之時間例如係設為5秒鐘至30秒鐘。 The hydrogen from the
被供給於溶解器31之氫自供給口331流入至框體311,自筒狀構件321之開放之下側端部向內部空間S1流動。繼而,該氫沿著筒狀構件321自Z軸方向下側向上側流動。結果,於內部空間S1之Z軸方向上側蓄留氫,如圖6所示般形成有儲氫X。 The hydrogen supplied to the
(步驟S03:混合體供給) (Step S03: Mixture supply)
於步驟S03中,向於步驟S02中形成有儲氫X之溶解 器31供給氫及水之混合體。 In step S03, a mixture of hydrogen and water is supplied to the
更詳細而言,首先藉由打開閥V1、V2而將氫及水分別供給於搬送部40。 In more detail, first, by opening the valves V1 and V2, hydrogen and water are respectively supplied to the conveying
繼而,氫及水於搬送部40內混合,形成混合體。於該混合體中,氫以微細氣泡之形式混合於水。另外,該混合氣體中,微細氣泡(氫)於搬送過程受到加壓,少量溶解於水。 Then, hydrogen and water are mixed in the
於將混合體之體積設為100%之情形時,該混合體之氫濃度例如為4vol%至20vol%。上述氫濃度係藉由水供給量及氫供給量之平衡而調整。例如,水供給量可設為0.2L/min至2.0L/min,氫供給量可設為20ml/min至100ml/min。 When the volume of the mixture is set to 100%, the hydrogen concentration of the mixture is, for example, 4 vol% to 20 vol%. The above-mentioned hydrogen concentration is adjusted by the balance of the water supply amount and the hydrogen supply amount. For example, the water supply amount can be set to 0.2L/min to 2.0L/min, and the hydrogen supply amount can be set to 20ml/min to 100ml/min.
然後,將於搬送部40內形成之混合體供給於溶解器31。 Then, the mixture formed in the conveying
為了將混合體供給於溶解部30,供給口331之壓力係以大於排出口341之壓力之方式設定。 In order to supply the mixture to the dissolving
例如,較佳為以供給口331之壓力為0.2MPa以上0.35MPa以下,且排出口341之壓力成為0.1MPa以上0.25MPa以下(其中,供給口331之壓力>排出口341之壓 力)之方式調整。 For example, it is preferable to adjust so that the pressure of the
為了調整上述供給口331之壓力及排出口341之壓力,不僅可藉由調整閥V2、V3而實現,例如亦可藉由調整流路P7或搬送部40之內徑而實現。另外,亦可藉由在流路P7中插入細管或靜態混合器等,而調整排出口341之壓力。此時,閥V2、V3亦可為可開閉流路P6、P7之電磁閥。 In order to adjust the pressure of the
圖7為表示於溶解器31內混合體正被攪拌之狀態之圖。再者,圖7所示之粗箭頭示意性地表示於溶解器31內流動之混合體之軌跡。 FIG. 7 is a diagram showing a state where the mixed body in the
藉由混合體於溶解器31內部流動,混合體中之氫之微細氣泡溶解於水。 As the mixture flows inside the
具體而言,混合體於藉由筒狀構件321所形成之流路中流動。如圖7所示,自供給口331供給而流入至內部空間S1,向Z軸方向上側上升後,於筒狀構件321之上側端部附近折回,向Z軸方向下側流動。然後,混合體於筒狀構件321之下側端部附近折回,流動至內部空間S2,向Z軸方向上側上升後,自排出口341排出。如此,混合體於在碰撞式之溶解器31內部複雜地流動之過程中,反復與框體311或筒狀構件321碰撞,由此被攪拌,混合體中之氫之微細氣泡溶解於水。 Specifically, the mixture flows in the flow path formed by the
另外,混合體於在溶解器31內部流動之過程中,與儲氫X接觸,由此儲氫X中之氫溶解於混合體。 In addition, the mixed body is in contact with the hydrogen storage X in the process of flowing inside the
具體而言,如圖7所示,混合體於溶解器31之內部空間S1中朝向Z軸方向之上側流動,與儲氫X接觸。此時,水中之溶存氧或溶存氮之分壓變小,溶存氧或溶存氮被釋出至儲氫X。可認為與此同時,包含高濃度之氫的儲氫X中之氫向混合體擴散,儲氫X中之氫溶解於混合體。藉此,可獲得以高濃度溶解有氫之氫水。 Specifically, as shown in FIG. 7, the mixture flows toward the upper side in the Z-axis direction in the internal space S1 of the
如以上般,上述氫水的製造方法中,除了由碰撞式之溶解器所得的氫溶解效果以外,還可獲得由儲氫X所得的氫溶解效果。藉此,利用上述氫水之製造方法可獲得1.6ppm至2.0ppm之高濃度之氫水。 As described above, in the above-mentioned hydrogen water production method, in addition to the hydrogen dissolving effect obtained by the collision type dissolver, the hydrogen dissolving effect obtained by the hydrogen storage X can also be obtained. Thereby, high-concentration hydrogen water of 1.6 ppm to 2.0 ppm can be obtained by using the above-mentioned method for producing hydrogen water.
尤其於小型伺服器之情形時,可供給氫之量有限,故而氫濃度從開始製造氫水起逐漸增加,直至達到一定濃度需要時間。 Especially in the case of a small server, the amount of hydrogen that can be supplied is limited, so the hydrogen concentration gradually increases from the beginning of the production of hydrogen water until it takes time to reach a certain concentration.
另一方面,本實施形態之氫水的製造方法中,氫濃度於短時間達到一定濃度。 On the other hand, in the method of producing hydrogen water of this embodiment, the hydrogen concentration reaches a certain concentration in a short time.
例如,對於在未形成儲氫X之情況下製造之氫水而言,一分鐘後之氫濃度相對於三分鐘後之氫濃度低50%左右。相對於此,對於利用本實施形態之氫水的製造方法所 製造之氫水而言,一分鐘後之氫濃度相對於三分鐘後之氫濃度低18%左右,氫濃度之降低程度被抑制。 For example, for hydrogen water produced without the formation of hydrogen storage X, the hydrogen concentration after one minute is about 50% lower than the hydrogen concentration after three minutes. In contrast, for the hydrogen water produced by the hydrogen water production method of this embodiment, the hydrogen concentration after one minute is about 18% lower than the hydrogen concentration after three minutes, and the reduction in the hydrogen concentration is suppressed.
另外,本實施形態之氫水的製造方法中,在氫濃度達到一定濃度之前的階段中,若形成有儲氫X,則可獲得高濃度之氫水。然而,較佳為在氫濃度達到一定濃度後,亦使儲氫X不消失而得以維持。藉此,於氫濃度達到一定濃度後,亦維持由儲氫X所得的使氫濃度提高之效果。藉由調整氫供給量及水供給量,可保持蓄留有氫之狀態,可使儲氫X不消失而得以維持。 In addition, in the method for producing hydrogen water of the present embodiment, in the stage before the hydrogen concentration reaches a certain concentration, if hydrogen storage X is formed, high-concentration hydrogen water can be obtained. However, it is preferable to maintain the hydrogen storage X without disappearing after the hydrogen concentration reaches a certain concentration. In this way, after the hydrogen concentration reaches a certain concentration, the effect of increasing the hydrogen concentration obtained by the hydrogen storage X is also maintained. By adjusting the hydrogen supply amount and the water supply amount, the state of storing hydrogen can be maintained, and the hydrogen storage X can be maintained without disappearing.
[其他實施形態] [Other embodiments]
以上,對本發明之實施形態進行了說明,但本發明並非僅限定於上述實施形態,當然可加以各種變更。 As mentioned above, the embodiment of the present invention has been described, but the present invention is not limited to the above-mentioned embodiment, of course, various modifications can be made.
例如,上述實施形態之溶解部30不限定於此,可對溶解器31之構成加以各種變更。 For example, the dissolving
作為一例,上述實施形態之溶解器31之筒狀構件321之形狀為圖3所示般之一端封閉的筒狀,但不限定於此,亦可為簡單的凹形狀。即,筒狀構件321只要為以可蓄留氫之方式具有朝向供給口331開放之凹部的構成即可,凹部之形狀亦可為U字狀、V字狀等。 As an example, the shape of the
另外,上述實施形態之溶解部30為具有一個溶解器31之構成,但不限於此,亦可為具有兩個以上之溶解器31之構成,亦可為進而具有與溶解器31不同之溶解器之構成。可使用靜態混合器等靜止型流體混合式溶解器、碰撞式、渦流方式、噴射方式、加壓溶解式或孔蝕(cavitation)方式等之溶解器作為與溶解器31不同之溶解器。 In addition, the dissolving
另外,上述實施形態之氫供給部10之第一箱13亦可為與第二箱21共同之構成。此時,亦可適當設置用以自共同之箱對氫供給部10供給水之閥。 In addition, the
10‧‧‧氫供給部 10‧‧‧Hydrogen Supply Department
11‧‧‧水電解單元 11‧‧‧Water Electrolysis Unit
12‧‧‧第一泵 12‧‧‧First pump
13‧‧‧第一箱 13‧‧‧The first box
13a、21a‧‧‧供水口 13a, 21a‧‧‧Water supply port
13b‧‧‧氧排出口 13b‧‧‧Oxygen outlet
20‧‧‧水供給部 20‧‧‧Water Supply Department
21‧‧‧第二箱 21‧‧‧The second box
22‧‧‧第二泵 22‧‧‧Second pump
30‧‧‧溶解部 30‧‧‧Dissolution Department
31‧‧‧溶解器 31‧‧‧Dissolver
40‧‧‧搬送部 40‧‧‧Transportation Department
50‧‧‧控制部 50‧‧‧Control Department
100‧‧‧氫水製造裝置 100‧‧‧Hydrogen Water Manufacturing Device
F1、F2‧‧‧濾網 F1, F2‧‧‧Filter
P1、P2、P3、P4、P5、P6、P7‧‧‧流路 P1, P2, P3, P4, P5, P6, P7‧‧‧Flow path
V1、V2、V3‧‧‧閥 V1, V2, V3‧‧‧Valve
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TW201716339A (en) * | 2015-11-13 | 2017-05-16 | 夏普股份有限公司 | Hydrogen-containing water generating apparatus and method for generating hydrogen-containing water |
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JP2000296899A (en) * | 1999-04-12 | 2000-10-24 | Japan Organo Co Ltd | Method for storing gas dissolved water and its storing device |
JP2009248048A (en) * | 2008-04-09 | 2009-10-29 | Shori:Kk | Gas/liquid-mixed water generating apparatus |
TW201716339A (en) * | 2015-11-13 | 2017-05-16 | 夏普股份有限公司 | Hydrogen-containing water generating apparatus and method for generating hydrogen-containing water |
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