TWI732947B - Electronic circuit package using composite magnetic sealing material - Google Patents

Electronic circuit package using composite magnetic sealing material Download PDF

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TWI732947B
TWI732947B TW106133176A TW106133176A TWI732947B TW I732947 B TWI732947 B TW I732947B TW 106133176 A TW106133176 A TW 106133176A TW 106133176 A TW106133176 A TW 106133176A TW I732947 B TWI732947 B TW I732947B
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magnetic
electronic circuit
substrate
circuit package
filler
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TW201807719A (en
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川畑賢一
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日商Tdk股份有限公司
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/293Organic, e.g. plastic
    • H01L23/295Organic, e.g. plastic containing a filler
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/552Protection against radiation, e.g. light or electromagnetic waves
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/93Batch processes
    • H01L2224/95Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
    • H01L2224/97Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15313Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a land array, e.g. LGA
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/19Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
    • H01L2924/191Disposition
    • H01L2924/19101Disposition of discrete passive components
    • H01L2924/19105Disposition of discrete passive components in a side-by-side arrangement on a common die mounting substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/301Electrical effects
    • H01L2924/3025Electromagnetic shielding

Abstract

Disclosed herein is an electronic circuit package includes a substrate, an electronic component mounted on a surface of the substrate, and a magnetic mold resin covering the surface of the substrate so as to embed therein the electronic component. The magnetic mold resin includes a resin material and a filler blended in the resin material in a blended ratio of 30 vol.% or more to 85 vol.% or less. The filler includes a magnetic filler containing Fe and 32 wt.% or more and 39 wt.% or less of a metal material contained mainly of Ni, thereby a thermal expansion coefficient of the magnetic mold resin is 15 ppm/℃ or less.

Description

使用複合磁性密封材料之電子電路封裝 Electronic circuit packaging using composite magnetic sealing materials

本發明係關於電子電路封裝,特別係關於使用複合磁性材料作為塑膜材料的電子電路封裝。 The present invention relates to electronic circuit packaging, in particular to electronic circuit packaging using composite magnetic materials as plastic film materials.

近年,智慧手機等電子機器係採用高性能無線通訊電路與數位式晶片,所使用半導體IC的動作頻率亦有上升的傾向。又,具有將複數半導體IC利用最短佈線連接之2.5D構造或3D構造的系統級封裝(SIP)化正加速中,預測今後電源系電路的模組化亦會增加。又,預測由多數電子零件(電感器、電容器、電阻、濾波器等被動零件;電晶體、二極體等主動零件;半導體IC等積體電路零件;以及其他電子電路構成所必要的零件之統稱)模組化的電子電路模組今後亦將越形增加,該等統稱的電子電路封裝將因智慧手機等電子機器的高機能化及小型化、薄型化,而有高密度安裝的傾向。該等傾向顯示單方面因雜訊造成的錯誤動作與電磁干擾(electromagnetic interference)趨於明顯,習知的雜訊對策較難防止錯誤動作或電磁干擾。所以,近年有朝電子電路封裝的自屏蔽化演進,有提案利用導電性糊膏、或鍍敷、濺鍍法施行電磁屏蔽,且已 然實用化,今後將要求更高的屏蔽特性。 In recent years, electronic devices such as smartphones have adopted high-performance wireless communication circuits and digital chips, and the operating frequency of semiconductor ICs used has also tended to increase. In addition, system-in-package (SIP) with a 2.5D structure or a 3D structure that connects plural semiconductor ICs with the shortest wiring is accelerating, and it is predicted that the modularization of power supply circuits will increase in the future. In addition, it is predicted that most electronic parts (passive parts such as inductors, capacitors, resistors, filters, etc.; active parts such as transistors and diodes; integrated circuit parts such as semiconductor ICs; and other parts necessary for the construction of electronic circuits are collectively called ) Modularized electronic circuit modules will also increase in the future. These collectively referred to as electronic circuit packages will tend to be mounted in high density due to the high performance, miniaturization, and thinning of electronic devices such as smartphones. These tendencies show that unilateral misoperations and electromagnetic interference caused by noise tend to be more obvious. The conventional noise countermeasures are more difficult to prevent misoperations or electromagnetic interference. Therefore, in recent years, there has been an evolution towards self-shielding of electronic circuit packaging, and there have been proposals to use conductive paste, plating, or sputtering to perform electromagnetic shielding. However, practical application will require higher shielding characteristics in the future.

為實現此項要求,近年有提案使塑模材料自體具有磁屏蔽特性的電子電路封裝。例如專利文獻1所揭示的電子電路封裝用塑模材料,係添加具氧化被膜之軟磁性體粉末的複合磁性密封材料。 In order to achieve this requirement, there have been proposals in recent years for electronic circuit packaging in which the molding material itself has magnetic shielding characteristics. For example, the molding material for electronic circuit packaging disclosed in Patent Document 1 is a composite magnetic sealing material to which soft magnetic powder with an oxide film is added.

然而,習知複合磁性密封材料會有熱膨脹係數偏大的問題。所以,在複合磁性密封材料與封裝基板或電子零件之間會發生熱膨脹係數失配情形,結果在塑模成形後依具條帶形狀集合基板的狀態發生大翹曲、或經個片化後的電子電路封裝在安裝迴焊時會出現連接性構成問題程度的較大翹曲。以下,針對此現象進行說明。 However, the conventional composite magnetic sealing material has the problem of large thermal expansion coefficient. Therefore, a thermal expansion coefficient mismatch will occur between the composite magnetic sealing material and the packaging substrate or electronic parts. As a result, the substrate will be assembled in a strip shape after molding and large warpage or individual pieces will occur. When the electronic circuit package is installed and reflowed, a large degree of warpage is caused by the connectivity problem. The following describes this phenomenon.

近年,針對半導體封裝或電子零件模組有提案各種構造體且已然實用化,目前主流一般採用在有機多層基板上安裝半導體IC等電子零件,再將其上部與周圍利用樹脂密封材料施行塑模成形的構造。具有此種構造的半導體封裝或電子零件模組,依集合基板的狀態施行塑模成形後,再利用晶割等施行個片化處理而製作。 In recent years, various structures have been proposed for semiconductor packages or electronic component modules and have been put into practical use. At present, the mainstream generally adopts mounting electronic components such as semiconductor ICs on organic multilayer substrates, and then molding the upper and surrounding areas with resin sealing materials.的结构。 The structure. The semiconductor package or electronic component module with such a structure is manufactured by performing plastic molding according to the state of the assembled substrate, and then performing individual chip processing using crystal cutting or the like.

此項構造因為係由不同物性的有機多層基板與樹脂密封材料構成所謂的「雙金屬」,因而會因熱膨脹係數差、玻璃轉移、塑模材料硬化收縮等要因發生翹曲。為抑制此現象,必需儘可能使熱膨脹係數等物性一致。近年,半導體封裝或電子電路模組所使用的有機多層基板因要求低輪廓,而有日益朝薄板化及多層化進展的傾向。為能在達成此項要求的狀態下,實現供確保薄基板操作性的高 剛性與低熱膨脹化,一般係使用玻璃轉移溫度較高的基板材料、在基板材料中添加低熱膨脹率的填料、使用更低熱膨脹係數的玻璃纖維布。 Since this structure is a so-called "bimetal" composed of organic multilayer substrates with different physical properties and resin sealing materials, it will warp due to factors such as poor thermal expansion coefficient, glass transfer, and curing and shrinkage of the mold material. To suppress this phenomenon, it is necessary to match the physical properties such as thermal expansion coefficient as much as possible. In recent years, organic multilayer substrates used in semiconductor packages or electronic circuit modules have a tendency to be thinner and multilayered due to their low profile requirements. In order to achieve high operability for thin substrates while meeting this requirement For rigidity and low thermal expansion, generally use substrate materials with a higher glass transition temperature, add fillers with a low thermal expansion coefficient to the substrate materials, and use glass fiber cloth with a lower thermal expansion coefficient.

另一方面,因基板上所搭載的半導體IC及電子零件、與塑模材料間之物性差亦會生成應力,因而會造成塑模材界面剝離、電子零件或塑模材龜裂等各種問題。半導體IC係使用矽,矽的熱膨脹係數係3.5ppm/℃,而陶瓷電容器、電感器等煅燒式晶片零件的熱膨脹係數係10ppm/℃左右。 On the other hand, due to the poor physical properties between the semiconductor IC and electronic components mounted on the substrate and the molding material, stress will also be generated, which will cause various problems such as peeling of the interface of the molding material, cracking of the electronic components or the molding material. Semiconductor IC uses silicon. The thermal expansion coefficient of silicon is 3.5 ppm/℃, while the thermal expansion coefficient of calcined chip parts such as ceramic capacitors and inductors is about 10 ppm/℃.

所以,塑模材料亦要求低熱膨脹化,市售有低至10ppm/℃的材料。將塑模材料施行低熱膨脹化的手法,當然係採用低熱膨脹的環氧樹脂,將0.5ppm/℃與熱膨脹係數非常低的熔融二氧化矽,依高填充率調配於密封樹脂中的手法。 Therefore, molding materials also require low thermal expansion, and materials as low as 10 ppm/°C are commercially available. The method of low thermal expansion of the molding material is, of course, a low thermal expansion epoxy resin, 0.5ppm/℃ and a very low thermal expansion coefficient of fused silica, and a high filling rate is mixed into the sealing resin.

[先前技術文獻] [Prior Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本專利特開平10-64714號公報 [Patent Document 1] Japanese Patent Laid-Open No. 10-64714

另一方面,一般磁性材料的熱膨脹係數偏高。所以,如專利文獻1所記載,在塑模樹脂中添加一般軟磁性體粉末的複合磁性密封材料,會有無法達成目標低熱膨脹係數的問題。 On the other hand, the thermal expansion coefficient of general magnetic materials is relatively high. Therefore, as described in Patent Document 1, a composite magnetic sealing material in which a general soft magnetic body powder is added to a mold resin may not achieve the target low thermal expansion coefficient.

所以,本發明目的在於提供:將低熱膨脹係數的複合磁性密封材料使用作為塑模材料的電子電路封裝。 Therefore, the object of the present invention is to provide an electronic circuit package using a composite magnetic sealing material with a low thermal expansion coefficient as a molding material.

本發明的電子電路封裝,係具備有:基板、搭載於上述基板表面上的電子零件、以及覆蓋上述基板之上述表面而嵌入上述電子零件的磁性塑模樹脂;其中,上述磁性塑模樹脂係具備有:樹脂材料、以及調配於上述樹脂材料中且調配比為30~85體積%的填料;上述填料係包含在Fe中含有以Ni為主成分之金屬材料32~39重量%的磁性填料,藉此上述磁性塑模樹脂之熱膨脹係數為15ppm/℃以下。 The electronic circuit package of the present invention is provided with a substrate, electronic components mounted on the surface of the substrate, and a magnetic molding resin that covers the surface of the substrate and embeds the electronic components; wherein the magnetic molding resin includes There are: resin materials, and fillers blended in the above resin materials with a blending ratio of 30 to 85% by volume; the above fillers include magnetic fillers containing 32 to 39 wt% of metallic materials with Ni as the main component in Fe. The thermal expansion coefficient of the above-mentioned magnetic molding resin is 15 ppm/°C or less.

根據本發明,因為使用熱膨脹係數較低的磁性填料,因而可將由複合磁性密封材料所構成磁性塑模樹脂的熱膨脹係數設為15ppm/℃以下。因此,可防止基板翹曲、塑模材界面剝離、塑模材龜裂等情形。 According to the present invention, since a magnetic filler with a low thermal expansion coefficient is used, the thermal expansion coefficient of the magnetic molding resin composed of the composite magnetic sealing material can be set to 15 ppm/°C or less. Therefore, it is possible to prevent the warpage of the substrate, the peeling of the mold material interface, and the cracking of the mold material.

本發明中,上述金屬材料相對於上述磁性填料全體,亦可更進一步含有0.1~8重量%的Co。依此的話,便可更加降低由複合磁性密封材料所構成磁性塑模樹脂的熱膨脹係數。 In the present invention, the metal material may further contain 0.1 to 8% by weight of Co with respect to the entire magnetic filler. In this way, the thermal expansion coefficient of the magnetic molding resin composed of the composite magnetic sealing material can be further reduced.

本發明中,上述填料亦可更進一步含有非磁性填料。依此的話,可更加降低由複合磁性密封材料所構成磁性塑模樹脂的熱膨脹係數。此情況,上述非磁性填料的量相對於上述磁性填料與上述非 磁性填料的合計,較佳係1~40體積%。依此的話,可在確保充分磁特性的狀態下,更加降低由複合磁性密封材料所構成磁性塑模樹脂的熱膨脹係數。此情況,上述非磁性填料較佳係含有從SiO2、ZrW2O8、(ZrO)2P2O7、KZr2(PO4)3及Zr2(WO4)(PO4)2所構成群組中選擇至少一材料。因為該等材料的熱膨脹係數非常低、或具有負值,因而可更加降低由複合磁性密封材料所構成磁性塑模樹脂的熱膨脹係數。 In the present invention, the above-mentioned filler may further contain a non-magnetic filler. In this way, the thermal expansion coefficient of the magnetic molding resin composed of the composite magnetic sealing material can be further reduced. In this case, the amount of the non-magnetic filler is preferably 1 to 40% by volume relative to the total of the magnetic filler and the non-magnetic filler. In this way, the thermal expansion coefficient of the magnetic molding resin composed of the composite magnetic sealing material can be further reduced while ensuring sufficient magnetic properties. In this case, the above-mentioned non-magnetic filler is preferably composed of SiO 2 , ZrW 2 O 8 , (ZrO) 2 P 2 O 7 , KZr 2 (PO 4 ) 3 and Zr 2 (WO 4 )(PO 4 ) 2 Select at least one material in the group. Because the thermal expansion coefficient of these materials is very low or has a negative value, the thermal expansion coefficient of the magnetic molding resin composed of the composite magnetic sealing material can be further reduced.

本發明中,上述磁性填料的形狀較佳係略球狀。依此的話,可提高複合磁性密封材料中的磁性填料比例。 In the present invention, the shape of the above-mentioned magnetic filler is preferably approximately spherical. In this way, the proportion of magnetic fillers in the composite magnetic sealing material can be increased.

本發明中,上述磁性填料的表面較佳係施行絕緣塗層,更佳係上述絕緣塗層的膜厚為10nm以上。依此的話,可將由複合磁性密封材料所構成磁性塑模樹脂的體積電阻率提高至例如1010Ω‧cm以上,便可確保電子電路封裝用塑模材料所要求的絕緣特性。 In the present invention, the surface of the magnetic filler is preferably provided with an insulating coating, and more preferably, the thickness of the insulating coating is 10 nm or more. In this way, the volume resistivity of the magnetic molding resin composed of the composite magnetic sealing material can be increased to, for example, 10 10 Ω·cm or more, and the insulating properties required by the molding material for electronic circuit packaging can be ensured.

本發明中,上述樹脂材料較佳係熱硬化性樹脂材料,而上述熱硬化性樹脂材料較佳係含有從環氧樹脂、酚樹脂、氨酯樹脂、聚矽氧樹脂及醯亞胺樹脂所構成群組中選擇至少一材料。 In the present invention, the above-mentioned resin material is preferably a thermosetting resin material, and the above-mentioned thermosetting resin material is preferably composed of epoxy resin, phenol resin, urethane resin, silicone resin, and imide resin Select at least one material in the group.

本發明的電子電路封裝亦可更進一步具備有在上述電子零件與上述磁性塑模樹脂之間設置的非磁性構件。依此的話,可抑制因電子零件與磁性塑模樹脂相靠近而造成的電子零件特性變動等。 The electronic circuit package of the present invention may further include a non-magnetic member provided between the electronic component and the magnetic mold resin. In this way, it is possible to suppress changes in the characteristics of the electronic parts caused by the proximity of the electronic parts and the magnetic mold resin.

本發明的電子電路封裝較佳係更進一步具備有連接於上述基板上所設置之電源圖案,且覆蓋上述磁性塑模樹脂的金屬膜。依此的話,可獲得能合併具有電磁屏蔽機能與磁屏蔽機能的複合屏蔽構造。 The electronic circuit package of the present invention preferably further includes a metal film connected to the power supply pattern provided on the substrate and covering the magnetic mold resin. In this way, a composite shielding structure that can combine electromagnetic shielding functions and magnetic shielding functions can be obtained.

此情況,上述金屬膜較佳係以從Au、Ag、Cu及Al所構成群組中選擇至少1種金屬為主成分,較佳係上述金屬膜的表面由抗氧化被覆所覆蓋著。又,較佳係上述電源圖案露出於上述基板的側面,而上述金屬膜鄰接於在上述基板的上述側面露出之上述電源圖案。依此的話,可輕易且確實地將金屬膜連接於電源圖案。 In this case, the metal film is preferably made of at least one metal selected from the group consisting of Au, Ag, Cu, and Al as the main component, and the surface of the metal film is preferably covered with an anti-oxidation coating. Furthermore, it is preferable that the power supply pattern is exposed on the side surface of the substrate, and the metal film is adjacent to the power supply pattern exposed on the side surface of the substrate. According to this, the metal film can be easily and reliably connected to the power supply pattern.

依此,因為本發明電子電路封裝係將熱膨脹係數較小的磁性塑模樹脂使用為塑模材料,因而在確保磁屏特性的狀態下,可防止基板翹曲、塑模材界面剝離、塑模材龜裂等情形。 Accordingly, because the electronic circuit package of the present invention uses a magnetic molding resin with a small thermal expansion coefficient as a molding material, it can prevent substrate warpage, peeling of the molding material interface, and mold while ensuring the characteristics of the magnetic screen. Wood cracks and other situations.

2‧‧‧複合磁性密封材料 2‧‧‧Composite magnetic sealing material

4‧‧‧樹脂材料 4‧‧‧Resin material

6‧‧‧磁性填料 6‧‧‧Magnetic filler

7‧‧‧絕緣塗層 7‧‧‧Insulation coating

8‧‧‧非磁性填料 8‧‧‧Non-magnetic filler

11A、11B、12A、13A~13E、14A‧‧‧電子電路封裝 11A, 11B, 12A, 13A~13E, 14A‧‧‧Electronic circuit packaging

20‧‧‧基板 20‧‧‧Substrate

20A‧‧‧集合基板 20A‧‧‧Assembly substrate

21‧‧‧基板表面 21‧‧‧Substrate surface

22‧‧‧基板背面 22‧‧‧The back of the substrate

23‧‧‧焊盤圖案 23‧‧‧Land Pattern

24‧‧‧焊料 24‧‧‧Solder

25‧‧‧內部佈線 25‧‧‧Internal wiring

25G‧‧‧電源圖案 25G‧‧‧Power pattern

26‧‧‧外部端子 26‧‧‧External terminal

27‧‧‧基板之側面 27‧‧‧The side of the substrate

27a‧‧‧基板之側面上部 27a‧‧‧The upper side of the base plate

27b‧‧‧基板之側面下部 27b‧‧‧The lower part of the side of the base plate

27c‧‧‧基板之段差部分 27c‧‧‧The step part of the substrate

28G‧‧‧電源圖案 28G‧‧‧Power pattern

31、32‧‧‧電子零件 31、32‧‧‧Electronic parts

40‧‧‧磁性塑模樹脂 40‧‧‧Magnetic plastic molding resin

41‧‧‧磁性塑模樹脂之上面 41‧‧‧On top of magnetic plastic molding resin

42‧‧‧磁性塑模樹脂之側面 42‧‧‧The side of the magnetic plastic molding resin

43‧‧‧溝 43‧‧‧ditch

50‧‧‧非磁性構件 50‧‧‧Non-magnetic components

60‧‧‧金屬膜 60‧‧‧Metal Film

70‧‧‧絕緣膜 70‧‧‧Insulation film

80‧‧‧模具 80‧‧‧Mould

81‧‧‧流路 81‧‧‧Flow Path

圖1係表示本發明第1實施形態的電子電路封裝構成之剖視圖。 Fig. 1 is a cross-sectional view showing the structure of an electronic circuit package according to a first embodiment of the present invention.

圖2係表示第1實施形態變化例的電子電路封裝構成之剖視圖。 Fig. 2 is a cross-sectional view showing the configuration of an electronic circuit package according to a modification of the first embodiment.

圖3係用於說明圖1所示電子電路封裝之製造方法的步驟圖。 FIG. 3 is a step diagram for explaining the manufacturing method of the electronic circuit package shown in FIG. 1. FIG.

圖4係用於說明圖1所示電子電路封裝之製造方法的步驟圖。 FIG. 4 is a step diagram for explaining the manufacturing method of the electronic circuit package shown in FIG. 1. FIG.

圖5係用於說明圖1所示電子電路封裝之製造方法的步驟圖。 FIG. 5 is a step diagram for explaining the manufacturing method of the electronic circuit package shown in FIG. 1. FIG.

圖6係用於說明複合磁性密封材料構成的示意圖。 Fig. 6 is a schematic diagram for explaining the composition of the composite magnetic sealing material.

圖7係表示磁性填料的Ni比率、與複合磁性密封材料的熱膨脹係數及導磁率間之關係圖。 Fig. 7 is a graph showing the relationship between the Ni ratio of the magnetic filler and the thermal expansion coefficient and magnetic permeability of the composite magnetic sealing material.

圖8係表示磁性填料的Ni比率、與複合磁性密封材料的熱膨脹係數間之關係圖。 Fig. 8 is a graph showing the relationship between the Ni ratio of the magnetic filler and the thermal expansion coefficient of the composite magnetic sealing material.

圖9係表示磁性填料的Ni比率、與複合磁性密封材料的導磁率間之關係圖。 Fig. 9 is a graph showing the relationship between the Ni ratio of the magnetic filler and the magnetic permeability of the composite magnetic sealing material.

圖10係表示磁性填料的Co比率、與複合磁性密封材料的熱膨脹係數及導磁率間之關係圖。 Fig. 10 is a graph showing the relationship between the Co ratio of the magnetic filler and the thermal expansion coefficient and magnetic permeability of the composite magnetic sealing material.

圖11係表示非磁性填料的添加比率、與複合磁性密封材料的熱膨脹係數間之關係圖。 Fig. 11 is a graph showing the relationship between the addition ratio of the non-magnetic filler and the thermal expansion coefficient of the composite magnetic sealing material.

圖12係表示在磁性填料表面上有無形成絕緣塗層、與體積電阻率間之關係圖。 Figure 12 is a graph showing the relationship between the presence or absence of an insulating coating formed on the surface of the magnetic filler and the volume resistivity.

圖13係表示在磁性填料表面上所形成絕緣塗層的膜厚、與體積電阻率間之關係圖。 Fig. 13 is a graph showing the relationship between the film thickness of the insulating coating formed on the surface of the magnetic filler and the volume resistivity.

圖14係表示磁性填料的體積電阻率、與複合磁性密封材料的體積電阻率間之關係圖。 Fig. 14 is a graph showing the relationship between the volume resistivity of the magnetic filler and the volume resistivity of the composite magnetic sealing material.

圖15係表示本發明第2實施形態的電子電路封裝構成之剖視圖。 Fig. 15 is a cross-sectional view showing the structure of an electronic circuit package according to a second embodiment of the present invention.

圖16係用於說明圖15所示電子電路封裝之製造方法的步驟圖。 FIG. 16 is a step diagram for explaining the manufacturing method of the electronic circuit package shown in FIG. 15.

圖17係用於說明圖15所示電子電路封裝之製造方法的步驟圖。 FIG. 17 is a step diagram for explaining the manufacturing method of the electronic circuit package shown in FIG. 15.

圖18係用於說明圖15所示電子電路封裝之製造方法的步驟 圖。 Figure 18 is used to illustrate the steps of the method of manufacturing the electronic circuit package shown in Figure 15 picture.

圖19係表示本發明第3實施形態的電子電路封裝構成之剖視圖。 Fig. 19 is a cross-sectional view showing the structure of an electronic circuit package according to a third embodiment of the present invention.

圖20係表示第3實施形態的第1變化例之電子電路封裝構成的剖視圖。 20 is a cross-sectional view showing the structure of an electronic circuit package according to a first modification of the third embodiment.

圖21係表示第3實施形態的第2變化例之電子電路封裝構成的剖視圖。 Fig. 21 is a cross-sectional view showing the configuration of an electronic circuit package according to a second modification of the third embodiment.

圖22係表示第3實施形態的第3變化例之電子電路封裝構成的剖視圖。 Fig. 22 is a cross-sectional view showing the configuration of an electronic circuit package according to a third modification of the third embodiment.

圖23係表示第3實施形態的第4變化例之電子電路封裝構成的剖視圖。 Fig. 23 is a cross-sectional view showing the configuration of an electronic circuit package according to a fourth modification of the third embodiment.

圖24係表示圖19所示電子電路封裝雜訊衰減量的圖。 Fig. 24 is a graph showing the amount of noise attenuation of the electronic circuit package shown in Fig. 19;

圖25係表示圖19所示電子電路封裝所含金屬膜的膜厚、與雜訊衰減量間之關係圖。 FIG. 25 is a graph showing the relationship between the film thickness of the metal film contained in the electronic circuit package shown in FIG. 19 and the amount of noise attenuation.

圖26係表示圖19所示電子電路封裝所含金屬膜的膜厚、與雜訊衰減量間之關係圖。 FIG. 26 is a graph showing the relationship between the film thickness of the metal film contained in the electronic circuit package shown in FIG. 19 and the amount of noise attenuation.

圖27係表示圖19所示電子電路封裝所含金屬膜的膜厚、與雜訊衰減量間之關係圖。 FIG. 27 is a graph showing the relationship between the film thickness of the metal film contained in the electronic circuit package shown in FIG. 19 and the amount of noise attenuation.

圖28係表示圖1及圖19所示電子電路封裝,在升溫及降溫時基板翹曲量的圖。 Fig. 28 is a graph showing the amount of substrate warpage of the electronic circuit package shown in Figs. 1 and 19 when the temperature is raised and lowered.

圖29係表示比較例的電子電路封裝,在升溫及降溫時基板翹曲量的圖。 FIG. 29 is a graph showing the amount of substrate warpage in the electronic circuit package of the comparative example when the temperature is raised and lowered.

圖30係表示本發明第4實施形態的電子電路封裝構成之剖視圖。 Fig. 30 is a cross-sectional view showing the structure of an electronic circuit package according to a fourth embodiment of the present invention.

圖31係用於說明圖30所示電子電路封裝之製造方法的步驟圖。 FIG. 31 is a step diagram for explaining the manufacturing method of the electronic circuit package shown in FIG. 30.

圖32係用於說明圖30所示電子電路封裝之製造方法的步驟圖。 FIG. 32 is a step diagram for explaining the manufacturing method of the electronic circuit package shown in FIG. 30. FIG.

圖33係表示組成1~組成3之表。 Fig. 33 is a table showing composition 1 to composition 3.

圖34係表示實施例測定結果之表。 Fig. 34 is a table showing the measurement results of the examples.

圖35係表示實施例測定結果之表。 Fig. 35 is a table showing the measurement results of the examples.

以下,參照所附圖式,針對本發明較佳實施形態進行詳細說明。 Hereinafter, the preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

<第1實施形態> <First Embodiment>

圖1所示係本發明第1實施形態的電子電路封裝11A之構成剖視圖。 Fig. 1 is a cross-sectional view showing the structure of an electronic circuit package 11A according to the first embodiment of the present invention.

如圖1所示,本實施形態的電子電路封裝11A係具備有:基板20、搭載於基板20上的複數電子零件31、32、以及將電子零件31、32依嵌入的方式覆蓋基板20之表面21的磁性塑模樹脂40。 As shown in FIG. 1, the electronic circuit package 11A of this embodiment is provided with a substrate 20, a plurality of electronic components 31, 32 mounted on the substrate 20, and the electronic components 31, 32 are embedded to cover the surface of the substrate 20 21 of the magnetic molding resin 40.

關於本實施形態電子電路封裝11A的種類並無特別的限定,可舉例如:處置高頻信號的高頻模組、施行電源控制的電源模組、具2.5D構造或3D構造的系統級封裝(SIP)、無線通訊用或數位電路用半導體封裝等。圖1中僅圖示2個電子零件31、32,但實際上內建有更多的電子零件。 There is no particular limitation on the type of the electronic circuit package 11A of this embodiment. Examples include: a high-frequency module that handles high-frequency signals, a power module that implements power control, and a system-in-package (SIP) with a 2.5D structure or a 3D structure. , Semiconductor packages for wireless communications or digital circuits, etc. In FIG. 1, only two electronic components 31 and 32 are shown, but there are actually more electronic components built-in.

基板20係具有內部嵌入多數佈線的雙面及多層佈線構造,可為:FR-4、FR-5、BT、氰酸酯、酚、醯亞胺等熱硬化性樹脂基材之有機基板;液晶高分子等熱可塑性樹脂基材之有機基板;LTCC基板、HTCC基板、可撓性基板等,無關種類。本實施形態的基板20係4層構造,具有:在基板20的表面21與背面22所形成的佈線層、以及嵌入內部的2層佈線層。在基板20的表面21上形成複數焊盤圖案23。焊盤圖案23係用於與電子零件31、32連接的內部電極,二者係經由焊料24(或導電性糊膏)呈電氣式且機械式連接。作為一例係有電子零件31為控制器等半導體晶片,而電子零件32為電容器或線圈等被動零件。電子零件的一部分(例如薄型化半導體晶片等)亦可嵌入基板20中。 The substrate 20 has a double-sided and multilayer wiring structure with a large number of wiring embedded therein, and can be an organic substrate with a thermosetting resin base material such as FR-4, FR-5, BT, cyanate ester, phenol, and amide; liquid crystal; Organic substrates such as polymers and other thermoplastic resin substrates; LTCC substrates, HTCC substrates, flexible substrates, etc., regardless of type. The substrate 20 of this embodiment has a four-layer structure, and has a wiring layer formed on the front surface 21 and the back surface 22 of the substrate 20 and a two-layer wiring layer embedded in the inside. A plurality of land patterns 23 are formed on the surface 21 of the substrate 20. The land pattern 23 is an internal electrode for connecting with the electronic components 31 and 32, and the two are electrically and mechanically connected via the solder 24 (or conductive paste). As an example, the electronic component 31 is a semiconductor chip such as a controller, and the electronic component 32 is a passive component such as a capacitor or a coil. A part of the electronic component (for example, a thinned semiconductor wafer, etc.) may be embedded in the substrate 20.

焊盤圖案23係經由在基板20內部所形成的內部佈線25,連接於在基板20的背面22所形成的外部端子26。實際使用時,電子電路封裝11A被安裝於未圖示的母板等之上,再將母板上的焊盤圖案與電子電路封裝11A的外部端子26進行電氣式連接。構成焊盤圖案23、內部佈線25及外部端子26的導體材料,係可為銅、銀、金、鎳、鉻、鋁、鈀、銦等金屬、或其金屬合金,亦可為將樹脂或玻璃作為黏結劑的導電材料,當基板20係有機基板或可撓性基板的情況,就成本或導電率等觀點而言,較佳係使用銅、銀。該等導電材料的形成方法係可使用:印刷、電鍍、箔積層、濺鍍、蒸鍍、噴墨等方法。 The land pattern 23 is connected to the external terminal 26 formed on the back surface 22 of the substrate 20 via the internal wiring 25 formed inside the substrate 20. In actual use, the electronic circuit package 11A is mounted on a mother board or the like not shown, and then the land pattern on the mother board is electrically connected to the external terminal 26 of the electronic circuit package 11A. The conductor material constituting the land pattern 23, the internal wiring 25 and the external terminal 26 can be copper, silver, gold, nickel, chromium, aluminum, palladium, indium and other metals, or metal alloys thereof, or a combination of resin or glass As the conductive material of the adhesive, when the substrate 20 is an organic substrate or a flexible substrate, it is preferable to use copper or silver from the viewpoint of cost, conductivity, and the like. The formation methods of these conductive materials can be used: printing, electroplating, foil lamination, sputtering, vapor deposition, inkjet and other methods.

磁性塑模樹脂40係將電子零件31、32依嵌入的方式覆蓋基板 20的表面21而設置。磁性塑模樹脂40係屬於塑模構件,且亦具有磁屏蔽的機能。本實施形態中,磁性塑模樹脂40的側面42與基板20的側面27係構成同一平面。關於磁性塑模樹脂40的詳細內容後有詳述,相較於習知磁性塑模樹脂之下,利用熱膨脹係數非常小(例如15ppm/℃以下)的複合磁性密封材料構成。因為磁性塑模樹脂40鄰接於電子零件31、32或焊盤圖案23,因而其體積電阻率必需充分高,具體而言較佳係1010Ω‧cm以上。 The magnetic mold resin 40 is provided by covering the surface 21 of the substrate 20 with the electronic components 31 and 32 in an embedded manner. The magnetic molding resin 40 is a molding member and also has a function of magnetic shielding. In this embodiment, the side surface 42 of the magnetic mold resin 40 and the side surface 27 of the substrate 20 form the same plane. The details of the magnetic molding resin 40 will be described later. Compared with the conventional magnetic molding resin, it is composed of a composite magnetic sealing material with a very small thermal expansion coefficient (for example, 15 ppm/°C or less). Since the magnetic mold resin 40 is adjacent to the electronic components 31, 32 or the land pattern 23, its volume resistivity must be sufficiently high, and specifically, it is preferably 10 10 Ω·cm or more.

再者,高頻電感器等電子零件若與磁性塑模樹脂40間之距離過於靠近,則會有導致電感值等特性從設計值變動的情況。此情況下,藉由該電子零件之一部分或全部利用非磁性構件覆蓋,便可減輕特性的變動。圖2所示係變化例的電子電路封裝11B之構成剖視圖,就電子零件32係利用非磁性構件50覆蓋之處,不同於圖1所示電子電路封裝11A。非磁性構件50係可使用一般的樹脂。若使此種非磁性構件50介設於電子零件32與磁性塑模樹脂40之間,因為電子零件32與磁性塑模樹脂40間之距離分開,故而可減輕電感值等特性的變動。 Furthermore, if the distance between electronic components such as a high-frequency inductor and the magnetic mold resin 40 is too close, the characteristics such as the inductance value may vary from the design value. In this case, by covering part or all of the electronic components with non-magnetic members, the variation in characteristics can be reduced. The cross-sectional view of the configuration of the electronic circuit package 11B of the modified example shown in FIG. 2 is different from the electronic circuit package 11A shown in FIG. 1 in that the electronic component 32 is covered with the non-magnetic member 50. For the non-magnetic member 50, general resins can be used. If such a non-magnetic member 50 is interposed between the electronic component 32 and the magnetic molding resin 40, since the distance between the electronic component 32 and the magnetic molding resin 40 is separated, the variation in characteristics such as inductance value can be reduced.

其次,針對本實施形態電子電路封裝11A之製造方法進行說明。 Next, the method of manufacturing the electronic circuit package 11A of this embodiment will be described.

圖3~圖5係用於說明電子電路封裝11A的製造方法之步驟圖。 3 to 5 are diagrams for explaining the steps of the manufacturing method of the electronic circuit package 11A.

首先,如圖3所示,準備具有多層佈線構造的集合基板20A。在集合基板20A的表面21形成複數焊盤圖案23,在集合基板20A 的背面22形成複數外部端子26。又,在集合基板20A的內層形成複數內部佈線25。另外,圖3所示虛線a係爾後在晶割步驟中應被切斷的部分。 First, as shown in FIG. 3, a collective substrate 20A having a multilayer wiring structure is prepared. A plurality of land patterns 23 are formed on the surface 21 of the collective substrate 20A, and the collective substrate 20A A plurality of external terminals 26 are formed on the back surface 22 of the device. In addition, a plurality of internal wirings 25 are formed in the inner layer of the collective substrate 20A. In addition, the dotted line a shown in FIG. 3 is a part to be cut in the crystal cutting step later.

其次,如圖3所示,依連接於焊盤圖案23的方式,在集合基板20A的表面21上搭載複數電子零件31、32。具體而言,只要在焊盤圖案23上供應焊料24之後,搭載電子零件31、32,藉由施行迴焊將電子零件31、32連接於焊盤圖案23便可。 Next, as shown in FIG. 3, a plurality of electronic components 31 and 32 are mounted on the surface 21 of the collective substrate 20A in a manner of being connected to the land pattern 23. Specifically, after the solder 24 is supplied to the land pattern 23, the electronic components 31 and 32 are mounted, and the electronic components 31 and 32 are connected to the land pattern 23 by performing reflow.

其次,如圖4所示,將電子零件31、32依嵌入的方式,利用磁性塑模樹脂40覆蓋集合基板20A的表面21。磁性塑模樹脂40的形成方法係可採取利用:轉印成形、壓縮成形、射出成形、注模、真空注模、點膠、狹縫噴嘴施行的方法等。 Next, as shown in FIG. 4, the surface 21 of the assembly substrate 20A is covered with the magnetic molding resin 40 with the electronic components 31 and 32 embedded in it. The formation method of the magnetic mold resin 40 can be used: transfer molding, compression molding, injection molding, injection molding, vacuum injection molding, glue dispensing, slit nozzle application, and the like.

然後,如圖5所示,若沿虛線a切斷集合基板20A將基板20個片化,便完成本實施形態的電子電路封裝11A。 Then, as shown in FIG. 5, when the collective substrate 20A is cut along the broken line a to form the substrate 20 into pieces, the electronic circuit package 11A of this embodiment is completed.

其次,針對構成磁性塑模樹脂40的複合磁性密封材料進行詳細說明。 Next, the composite magnetic sealing material constituting the magnetic mold resin 40 will be described in detail.

圖6係用於說明構成磁性塑模樹脂40的複合磁性密封材料之構成示意圖。 FIG. 6 is a schematic diagram for explaining the structure of the composite magnetic sealing material constituting the magnetic mold resin 40.

如圖6所示,構成磁性塑模樹脂40的複合磁性密封材料2,係 由:樹脂材料4、以及調配於樹脂材料4中的磁性填料6與非磁性填料8構成。雖無特別的限定,但樹脂材料4較佳係以熱硬化性樹脂材料為主成分。具體而言,較佳係以環氧樹脂、酚樹脂、胺酯樹脂、聚矽氧樹脂或醯亞胺樹脂為主成分,更佳係使用環氧樹脂或酚樹脂系半導體密封材料所用的主劑與硬化劑。 As shown in Figure 6, the composite magnetic sealing material 2 constituting the magnetic molding resin 40 is It is composed of a resin material 4 and a magnetic filler 6 and a non-magnetic filler 8 blended in the resin material 4. Although there is no particular limitation, the resin material 4 preferably contains a thermosetting resin material as a main component. Specifically, it is preferable to use epoxy resin, phenol resin, urethane resin, polysiloxane resin or amide resin as the main component, and more preferably to use epoxy resin or phenol resin as the main ingredient for semiconductor sealing materials With hardener.

最佳係利用末端具反應性環氧基的環氧樹脂,與各種硬化劑及硬化促進劑進行組合。環氧樹脂之例係可舉例如:雙酚A型、雙酚F型、苯氧基、萘、多官能型(雙環戊二烯型等)、聯苯型(雙官能)及特殊構造型,能低熱膨脹化的聯苯、萘、雙環戊二烯型等較為有用。硬化劑或硬化促進劑之例係可舉例如:胺系化合物脂環族二胺、芳香族二胺、其他的胺系(咪唑、三級胺)、酸酐系化合物(主要為高溫硬化劑)、酚樹脂(酚醛清漆型、甲酚酚醛清漆型等)、胺樹脂、雙氰胺、路易士酸錯合物。材料的混練方法係可適當使用:捏和機或三輥機、混合器等公知方法。 The best is to use epoxy resin with reactive epoxy groups at the end, combined with various hardeners and hardening accelerators. Examples of epoxy resins include: bisphenol A type, bisphenol F type, phenoxy, naphthalene, polyfunctional (dicyclopentadiene, etc.), biphenyl (bifunctional) and special structural types, Biphenyl, naphthalene, and dicyclopentadiene types that can be expanded with low thermal expansion are more useful. Examples of hardeners or hardening accelerators include, for example, amine compounds, alicyclic diamines, aromatic diamines, other amines (imidazole, tertiary amines), acid anhydride compounds (mainly high-temperature hardeners), Phenolic resin (novolak type, cresol novolak type, etc.), amine resin, dicyandiamide, Lewis acid complex. The kneading method of the material can be appropriately used: known methods such as a kneader, three-roller, and mixer.

磁性填料6係由Fe-Ni系材料構成,以Ni為主成分的金屬材料係含有32重量%以上且39重量%以下。其餘佔61~68重量%的元素係Fe。磁性填料6的調配比相對於複合磁性密封材料2全體係30體積%以上且85體積%以下。其理由係若磁性填料6的調配比未滿30體積%,則較難獲得充分的磁特性,而若磁性填料6的調配比超過85體積%,則較難確保流動性等密封材料所必要的諸項特性。 The magnetic filler 6 is composed of an Fe—Ni-based material, and the metallic material containing Ni as a main component contains 32% by weight or more and 39% by weight or less. The remaining element is Fe, which accounts for 61 to 68% by weight. The mixing ratio of the magnetic filler 6 is 30% by volume or more and 85% by volume or less with respect to the entire composite magnetic sealing material 2 system. The reason is that if the blending ratio of the magnetic filler 6 is less than 30% by volume, it is more difficult to obtain sufficient magnetic properties, and if the blending ratio of the magnetic filler 6 exceeds 85% by volume, it is more difficult to ensure fluidity and other necessary sealing materials. Various characteristics.

以Ni為主成分的金屬材料亦可含有少量Co。即,Ni的一部分亦可利用Co進行取代。依此的話,可更加降低複合磁性密封材料2的熱膨脹係數。Co的添加量相對於磁性填料6全體,較佳係0.1重量%以上且8重量%以下。 The metal material mainly composed of Ni may also contain a small amount of Co. That is, a part of Ni may be substituted with Co. In this way, the thermal expansion coefficient of the composite magnetic sealing material 2 can be further reduced. The addition amount of Co is preferably 0.1% by weight or more and 8% by weight or less with respect to the entire magnetic filler 6.

關於磁性填料6的形狀並無特別的限定,為施行高填充化亦可設為球狀,且依成為最密填充的方式,摻合、調配複數粒度分佈的填料。又,若將磁性填料6設為略球形,亦可減輕對電子零件施行塑模時的損傷。特別係為達最密填充化或高填充化,磁性填料6的形狀較佳係正球。磁性填料6較佳係振實密度高、粉末比表面積小。磁性填料6的形成方法係有:水霧化法、氣體霧化法、離心盤式噴霧法等方法,其中,最佳係能獲得高振實密度、且能縮小比表面積的氣體霧化法。 The shape of the magnetic filler 6 is not particularly limited, and it may be made into a spherical shape for high filling, and a filler with a plurality of particle size distributions may be blended and blended in a manner that becomes the densest filling. In addition, if the magnetic filler 6 is made into a substantially spherical shape, it is also possible to reduce damage when molding electronic parts. In particular, in order to achieve the densest packing or high packing, the shape of the magnetic filler 6 is preferably a sphere. The magnetic filler 6 preferably has a high tap density and a small specific surface area of the powder. The formation methods of the magnetic filler 6 include: water atomization method, gas atomization method, centrifugal disc spray method, etc. Among them, the best is the gas atomization method that can obtain high tap density and can reduce the specific surface area.

雖無特別的限定,針對磁性填料6的表面為能提升流動性、密接性、絕緣性,便利用由Si、Al、Ti、Mg等金屬的氧化物、或有機材料構成的絕緣塗層7被覆。為充分提高複合磁性密封材料2的體積電阻率,較佳係將絕緣塗層7的膜厚設為10nm以上。絕緣塗層7係可在磁性填料6的表面上,藉由施行熱硬化性材料的塗佈處理、或者四乙氧基矽烷或四甲氧基矽烷的金屬烷氧化物之脫水反應而形成氧化膜,最佳係施行氧化矽的塗佈被膜形成。又,更適宜係在其上面更進一步施行有機官能性偶合處理。 Although there is no particular limitation, the surface of the magnetic filler 6 can improve fluidity, adhesion, and insulation, and is conveniently coated with an insulating coating 7 made of metal oxides such as Si, Al, Ti, Mg, or organic materials. . In order to sufficiently increase the volume resistivity of the composite magnetic sealing material 2, it is preferable to set the film thickness of the insulating coating layer 7 to 10 nm or more. The insulating coating 7 can form an oxide film on the surface of the magnetic filler 6 by applying a thermosetting material coating treatment, or the dehydration reaction of a metal alkoxide of tetraethoxysilane or tetramethoxysilane , The best system is to form a coating film of silicon oxide. Moreover, it is more suitable to further perform organofunctional coupling treatment on it.

本實施形態的複合磁性密封材料2係含有非磁性填料8。非磁 性填料8較佳係使用SiO2、ZrW2O8、(ZrO)2P2O7、KZr2(PO4)3或Zr2(WO4)(PO4)2等,具有熱膨脹係數較小於磁性填料6的材料、或熱膨脹係數為負值的材料。若將此種非磁性填料8添加於複合磁性密封材料2中,便可更加降低熱膨脹係數。又,亦可添加氧化鋁、氧化鎂之類的難燃劑;用於著色的碳黑、顏料或染料;用於提升滑順性、流動性、分散‧混練性而經粒徑100nm以下之表面處理的奈米二氧化矽;用於提升脫模性的蠟成分等。其中,本發明中構成磁性塑模樹脂40的複合磁性密封材料並非必需含有非磁性填料。 The composite magnetic sealing material 2 of this embodiment contains a non-magnetic filler 8. The non-magnetic filler 8 preferably uses SiO 2 , ZrW 2 O 8 , (ZrO) 2 P 2 O 7 , KZr 2 (PO 4 ) 3 or Zr 2 (WO 4 )(PO 4 ) 2, etc., and has a relatively high thermal expansion coefficient. A material smaller than the magnetic filler 6, or a material with a negative thermal expansion coefficient. If such a non-magnetic filler 8 is added to the composite magnetic sealing material 2, the thermal expansion coefficient can be further reduced. In addition, flame retardants such as alumina and magnesia can also be added; carbon black, pigments or dyes used for coloring; used to improve the smoothness, fluidity, dispersion and kneading properties of the surface with a particle size of 100nm or less Treated nano-silica; wax components used to improve mold release properties, etc. Among them, the composite magnetic sealing material constituting the magnetic molding resin 40 in the present invention does not necessarily contain a non-magnetic filler.

再者,為提升密接性或流動性,亦可對磁性填料6或非磁性填料8的表面施行有機官能性偶合處理。有機官能性偶合處理係只要利用公知的濕式或乾式實施便可,亦可為整體摻合法。又,為提升濕潤性等,亦可將磁性填料6或非磁性填料8的表面利用熱硬化性樹脂施行塗佈。 Furthermore, in order to improve the adhesion or fluidity, the surface of the magnetic filler 6 or the non-magnetic filler 8 may also be subjected to an organic functional coupling treatment. The organic functional coupling treatment may be performed by a known wet method or dry method, and it may also be a bulk blending method. In addition, in order to improve wettability, etc., the surface of the magnetic filler 6 or the non-magnetic filler 8 may be coated with a thermosetting resin.

添加非磁性填料8的情況,非磁性填料8的量相對於磁性填料6與非磁性填料8的合計,較佳係1體積%以上且40體積%以下。換言之,磁性填料6的1體積%以上且40體積%以下可利用非磁性填料8取代。其理由係若非磁性填料8的添加量未滿1體積%,便幾乎無法獲得添加非磁性填料8的效果,而若非磁性填料8的添加量超過40體積%,則磁性填料6的量過少,較難確保充分的磁特性。 When the non-magnetic filler 8 is added, the amount of the non-magnetic filler 8 relative to the total of the magnetic filler 6 and the non-magnetic filler 8 is preferably 1% by volume or more and 40% by volume or less. In other words, 1% by volume or more and 40% by volume or less of the magnetic filler 6 can be replaced with the non-magnetic filler 8. The reason is that if the addition amount of the non-magnetic filler 8 is less than 1% by volume, the effect of adding the non-magnetic filler 8 can hardly be obtained, and if the addition amount of the non-magnetic filler 8 exceeds 40% by volume, the amount of the magnetic filler 6 is too small, which is relatively low. It is difficult to ensure sufficient magnetic characteristics.

複合磁性密封材料2的形態係可任意為液態狀及固態狀,依照配合成形方法所選擇的主劑與硬化劑會有不同的形態。固態狀複合 磁性密封材料2係若屬於轉印成形用便可形成為錠劑形狀,若屬於射出成形用或壓縮成形用便可形成為顆粒狀。又,關於使用複合磁性密封材料2的塑模成形方法,係有利用轉印成形、壓縮成形、射出成形、注模、真空注模、真空印刷、印刷、點膠、狹縫噴嘴施行的方法等,可適當選擇。成形條件係只要依照所使用主劑、硬化劑、硬化促進材的組合再行適當選擇便可,經成形後視需要亦可施行後硬化。 The shape of the composite magnetic sealing material 2 can be arbitrarily liquid or solid, and the main agent and hardening agent selected according to the molding method may have different shapes. Solid state composite The magnetic sealing material 2 can be formed into a tablet shape if it is used for transfer molding, and can be formed into a pellet shape if it is used for injection molding or compression molding. Also, regarding the molding method using the composite magnetic sealing material 2, there are methods using transfer molding, compression molding, injection molding, injection molding, vacuum injection molding, vacuum printing, printing, glue dispensing, slit nozzles, etc. , Can be selected appropriately. The molding conditions can be appropriately selected according to the combination of the main agent, hardener, and hardening accelerating material used, and post-curing may be performed as needed after molding.

圖7所示係磁性填料6的Ni比率、與複合磁性密封材料2的熱膨脹係數及導磁率間之關係圖。圖7所示圖係磁性填料6實質上僅由Fe與Ni構成時,磁性填料6的添加量相對於複合磁性密封材料2全體為70體積%,且表示在複合磁性密封材料2中沒有添加非磁性填料8的情況。 FIG. 7 shows the relationship between the Ni ratio of the magnetic filler 6 and the thermal expansion coefficient and magnetic permeability of the composite magnetic sealing material 2. When the magnetic filler 6 is substantially composed of Fe and Ni in the graph shown in FIG. 7, the amount of the magnetic filler 6 added is 70% by volume relative to the entire composite magnetic sealing material 2, and it means that no non-additive is added to the composite magnetic sealing material 2. The case of magnetic filler 8.

如圖7所示,當磁性填料6的Ni比率係32重量%以上且39重量%以下的情況,複合磁性密封材料2的熱膨脹係數會特異地降低,依照條件會成為10ppm/℃以下。在本條件下,Ni比率為約35重量%時能獲得最低的熱膨脹係數(約9.3ppm/℃)。另一方面,關於導磁率係與Ni比率間之相關較小,圖7所示Ni比率範圍係μ=12~13。 As shown in FIG. 7, when the Ni ratio of the magnetic filler 6 is 32% by weight or more and 39% by weight or less, the thermal expansion coefficient of the composite magnetic sealing material 2 specifically decreases, and becomes 10 ppm/°C or less depending on the conditions. Under these conditions, the lowest coefficient of thermal expansion (about 9.3ppm/°C) can be obtained when the Ni ratio is about 35% by weight. On the other hand, the correlation between the permeability system and the Ni ratio is relatively small, and the range of the Ni ratio shown in Fig. 7 is μ=12-13.

其理由係當為能獲得此種特性,而使Ni比率在上述範圍時,會顯現出因熱膨脹與磁應變所造成體積變化相抵消的恆範鋼特性。此種材料稱為「恆範鋼材」(invar),已知係作為要求高精度的 模具材料,並非使用作為在複合磁性密封材料中所調配磁性填料的材料。本發明等著眼於恆範鋼材所具有的磁特性及低熱膨脹係數,藉由將其使用作為磁性填料的材料,便實現具磁屏蔽性、且熱膨脹係數較小的複合磁性密封材料2。 The reason is that in order to obtain such characteristics, when the Ni ratio is in the above-mentioned range, a constant steel characteristic that cancels the volume change caused by thermal expansion and magnetic strain will appear. This kind of material is called "Invar" (invar), and it is known as a high-precision material The mold material is not the material used as the magnetic filler formulated in the composite magnetic sealing material. The present invention focuses on the magnetic properties and low thermal expansion coefficient of Hengfan steel, and by using it as a magnetic filler material, a composite magnetic sealing material 2 with magnetic shielding properties and a small thermal expansion coefficient is realized.

圖8所示係磁性填料6的Ni比率、與複合磁性密封材料2的熱膨脹係數間之關係圖。圖8所示圖係磁性填料6實質上僅由Fe與Ni構成時,磁性填料6的添加量相對於複合磁性密封材料2全體為50體積%、60體積%或70體積%,且表示在複合磁性密封材料2中並沒有添加非磁性填料8的情況。 FIG. 8 shows the relationship between the Ni ratio of the magnetic filler 6 and the thermal expansion coefficient of the composite magnetic sealing material 2. The graph shown in Fig. 8 shows that when the magnetic filler 6 is substantially composed of Fe and Ni, the addition amount of the magnetic filler 6 is 50% by volume, 60% by volume, or 70% by volume relative to the total composite magnetic sealing material 2, and indicates that the composite The non-magnetic filler 8 is not added to the magnetic sealing material 2.

如圖8所示,得知即便磁性填料6的添加量為50體積%、60體積%及70體積%中之任一者,當磁性填料6的Ni比率為32重量%以上且39重量%以下的情況,複合磁性密封材料2的熱膨脹係數會特異地降低。熱膨脹係數的值係磁性填料6的添加量越多則越低。所以,當磁性填料6的添加量較少時(例如為30體積%時),只要藉由更進一步添加由熔融二氧化矽等構成的非磁性填料8,將複合磁性密封材料2的熱膨脹係數設為15ppm/℃以下便可。具體而言,若將磁性填料6與非磁性填料8的合計添加量設為全體的50體積%以上且85體積%以下,便可使複合磁性密封材料2的熱膨脹係數充分變小(例如15ppm/℃以下)。 As shown in FIG. 8, even if the addition amount of the magnetic filler 6 is any of 50% by volume, 60% by volume, and 70% by volume, when the Ni ratio of the magnetic filler 6 is 32% by weight or more and 39% by weight or less In the case of, the thermal expansion coefficient of the composite magnetic sealing material 2 will be specifically reduced. The value of the coefficient of thermal expansion is that the greater the amount of the magnetic filler 6 added, the lower. Therefore, when the addition amount of the magnetic filler 6 is small (for example, when it is 30% by volume), the thermal expansion coefficient of the composite magnetic sealing material 2 can be set by further adding a non-magnetic filler 8 composed of fused silica or the like. It should be less than 15ppm/℃. Specifically, if the total addition amount of the magnetic filler 6 and the non-magnetic filler 8 is 50% by volume or more and 85% by volume or less of the whole, the thermal expansion coefficient of the composite magnetic sealing material 2 can be sufficiently reduced (for example, 15ppm/ ℃ below).

圖9所示係磁性填料6的Ni比率、與複合磁性密封材料2的導磁率間之關係圖。圖9所示圖係與圖8所示圖同樣,當磁性填料 6實質上僅由Fe與Ni構成的情況,磁性填料6的添加量相對於複合磁性密封材料2全體為50體積%、60體積%或70體積%,且表示在複合磁性密封材料2中並沒有添加非磁性填料8的情況。 FIG. 9 shows the relationship between the Ni ratio of the magnetic filler 6 and the magnetic permeability of the composite magnetic sealing material 2. The picture shown in Fig. 9 is the same as the picture shown in Fig. 8, when the magnetic filler 6 In the case of essentially consisting of Fe and Ni, the addition amount of the magnetic filler 6 is 50% by volume, 60% by volume, or 70% by volume relative to the total composite magnetic sealing material 2, and it means that there is no composite magnetic sealing material 2 The case of adding non-magnetic filler 8.

如圖9所示,得知即便磁性填料6的添加量為50體積%、60體積%及70體積%中之任一者,Ni比率與導磁率的相關較小。導磁率之值係磁性填料6的添加量越多則越高。 As shown in FIG. 9, even if the addition amount of the magnetic filler 6 is any of 50 vol %, 60 vol %, and 70 vol %, the correlation between the Ni ratio and the magnetic permeability is small. The value of the magnetic permeability is that the more the amount of the magnetic filler 6 added, the higher.

圖10所示係磁性填料6的Co比率、與複合磁性密封材料2的熱膨脹係數及導磁率間之關係圖。圖10所示圖係磁性填料6中所含Ni與Co的和為37重量%,磁性填料6的添加量相對於複合磁性密封材料2全體為70體積%,且表示在複合磁性密封材料2中並沒有添加非磁性填料8的情況。 FIG. 10 shows the relationship between the Co ratio of the magnetic filler 6 and the thermal expansion coefficient and magnetic permeability of the composite magnetic sealing material 2. The graph shown in FIG. 10 shows that the sum of Ni and Co contained in the magnetic filler 6 is 37% by weight, and the addition amount of the magnetic filler 6 is 70% by volume relative to the entire composite magnetic sealing material 2, and it is shown in the composite magnetic sealing material 2 No non-magnetic filler 8 was added.

如圖10所示,得知相較於磁性填料6中未含Co(Co=0重量%)的情況下,當構成磁性填料6的Ni被8重量%以下的Co所取代時,可更加降低複合磁性密封材料2的熱膨脹係數。但,若利用Co進行的取代量係10重量%,則反會導致熱膨脹係數提高。所以,Co的添加量相對於磁性填料6全體較佳係0.1重量%以上且8重量%以下。 As shown in Fig. 10, it can be seen that when the Ni constituting the magnetic filler 6 is replaced by Co at 8% by weight or less compared to the case where Co is not contained in the magnetic filler 6 (Co=0% by weight), the reduction can be further reduced. The thermal expansion coefficient of the composite magnetic sealing material 2. However, if the substitution amount with Co is 10% by weight, the coefficient of thermal expansion will increase on the contrary. Therefore, the amount of Co added is preferably 0.1% by weight or more and 8% by weight or less with respect to the entire magnetic filler 6.

圖11所示係非磁性填料8的添加比率、與複合磁性密封材料2的熱膨脹係數間之關係圖。圖11所示圖係磁性填料6與非磁性填料8的和為全體之70體積%,且表示磁性填料6係由64重量%的 Fe與36重量%的Ni構成,而非磁性填料8係由SiO2構成的情況。 FIG. 11 shows the relationship between the addition ratio of the non-magnetic filler 8 and the thermal expansion coefficient of the composite magnetic sealing material 2. The graph shown in Fig. 11 shows that the sum of the magnetic filler 6 and the non-magnetic filler 8 is 70% by volume of the whole, and shows that the magnetic filler 6 is composed of 64% by weight of Fe and 36% by weight of Ni, and the non-magnetic filler 8 is composed of In the case of SiO 2 composition.

如圖11所示,若非磁性填料8的比例增加則熱膨脹係數會變小,但該比例若相對於磁性填料60體積%,超過非磁性填料40體積%,則熱膨脹係數的降低效果幾乎達飽和。所以,非磁性填料8的量相對於磁性填料6與非磁性填料8的合計,較佳係1體積%以上且40體積%以下。 As shown in FIG. 11, if the ratio of the non-magnetic filler 8 increases, the coefficient of thermal expansion decreases. However, if the ratio exceeds 40% by volume of the non-magnetic filler relative to 60% by volume of the magnetic filler, the effect of reducing the coefficient of thermal expansion is almost saturated. Therefore, the amount of the non-magnetic filler 8 relative to the total of the magnetic filler 6 and the non-magnetic filler 8 is preferably 1% by volume or more and 40% by volume or less.

圖12所示係在磁性填料6的表面上有無形成絕緣塗層7、與體積電阻率間之關係圖。磁性填料6的材料係有組成A(Fe=64重量%、Ni=36重量%)、與組成B(Fe=63重量%、Ni=32重量%、Co=5重量%)之2種,絕緣塗層7係厚度40nm的SiO2。任一磁性填料6亦係截取直徑為32μm、粒徑D50為20μm。 FIG. 12 shows the relationship between the presence or absence of the insulating coating 7 on the surface of the magnetic filler 6 and the volume resistivity. The material of the magnetic filler 6 has two types of composition A (Fe=64% by weight, Ni=36% by weight) and composition B (Fe=63% by weight, Ni=32% by weight, and Co=5% by weight), insulating The coating 7 is SiO 2 with a thickness of 40 nm. Any magnetic filler 6 also has a cut-off diameter of 32 μm and a particle size D50 of 20 μm.

如圖12所示,得知組成A及組成B之任一者均係藉由利用絕緣塗層7被覆,而大幅增加磁性填料6的體積電阻率。又,得知若利用絕緣塗層7施行被覆,測定時的壓力依存性亦會降低。 As shown in FIG. 12, it is known that both the composition A and the composition B are covered by the insulating coating 7, which greatly increases the volume resistivity of the magnetic filler 6. In addition, it was found that if the insulating coating 7 is used for coating, the pressure dependence during the measurement is also reduced.

圖13所示係在磁性填料6之表面所形成絕緣塗層7的膜厚、與體積電阻率間之關係圖。圖13所示圖係表示磁性填料6由64重量%之Fe與36重量%之Ni構成的情況。磁性填料6的粒徑係與圖12的粒徑同樣。 FIG. 13 is a graph showing the relationship between the film thickness of the insulating coating 7 formed on the surface of the magnetic filler 6 and the volume resistivity. The graph shown in FIG. 13 shows a case where the magnetic filler 6 is composed of 64% by weight of Fe and 36% by weight of Ni. The particle size of the magnetic filler 6 is the same as that of FIG. 12.

如圖13所示,得知藉由將磁性填料6利用10nm以上的絕緣塗 層7被覆,便大幅增加磁性填料6的體積電阻率。特別係得知若將磁性填料6利用30nm以上的絕緣塗層7被覆,則無關測定時的壓力如何,均可獲得非常高的體積電阻率。 As shown in Figure 13, it is known that by using the magnetic filler 6 with an insulating coating of 10 nm or more The coating of the layer 7 greatly increases the volume resistivity of the magnetic filler 6. In particular, it is known that if the magnetic filler 6 is coated with an insulating coating 7 having a thickness of 30 nm or more, a very high volume resistivity can be obtained regardless of the pressure during the measurement.

圖14所示係磁性填料6的體積電阻率、與複合磁性密封材料2的體積電阻率間之關係圖。 FIG. 14 shows the relationship between the volume resistivity of the magnetic filler 6 and the volume resistivity of the composite magnetic sealing material 2.

如圖14所示,得知磁性填料6的體積電阻率、與複合磁性密封材料2的體積電阻率係具有比例關係。特別係若磁性填料6的體積電阻率為105Ω‧cm以上,便可將複合磁性密封材料2的體積電阻率設為1010Ω‧cm以上。若複合磁性密封材料2的體積電阻率為1010Ω‧cm以上,當使用作為電子電路封裝用塑模材料時,便可確保充分的絕緣性。 As shown in FIG. 14, it is found that the volume resistivity of the magnetic filler 6 and the volume resistivity of the composite magnetic sealing material 2 have a proportional relationship. In particular, if the volume resistivity of the magnetic filler 6 is 10 5 Ω·cm or more, the volume resistivity of the composite magnetic sealing material 2 can be set to 10 10 Ω·cm or more. If the volume resistivity of the composite magnetic sealing material 2 is 10 10 Ω·cm or more, when it is used as a molding material for electronic circuit packaging, sufficient insulation can be ensured.

依如上說明,本實施形態的電子電路封裝11A、11B,因為磁性塑模樹脂40的材料係使用熱膨脹係數非常小的複合磁性密封材料2,因而可具有磁屏蔽特性,且防止因溫度變化所造成的基板翹曲、塑模材的界面剝離、塑模材龜裂等。 As explained above, the electronic circuit packages 11A and 11B of this embodiment use the composite magnetic sealing material 2 with a very small thermal expansion coefficient as the material of the magnetic molding resin 40, so that it has magnetic shielding properties and prevents temperature changes. The substrate warping, the interface peeling of the plastic molding material, the cracking of the plastic molding material, etc.

<第2實施形態> <Second Embodiment>

圖15所示係本發明第2實施形態的電子電路封裝12A之構成剖視圖。 Fig. 15 is a cross-sectional view showing the structure of an electronic circuit package 12A according to the second embodiment of the present invention.

如圖15所示,本實施形態的電子電路封裝12A係就磁性塑模 樹脂40的平面尺寸略小於基板20的平面尺寸,藉此使基板20的表面21外周部露出於磁性塑模樹脂40之處,不同於圖1所示第1實施形態的電子電路封裝11A。因為其餘的構成均與第1實施形態的電子電路封裝11A相同,所以對相同要件賦予相同符號,並省略重複說明。 As shown in FIG. 15, the electronic circuit package 12A of this embodiment is a magnetic mold The plane size of the resin 40 is slightly smaller than the plane size of the substrate 20, thereby exposing the outer periphery of the surface 21 of the substrate 20 to the magnetic mold resin 40, which is different from the electronic circuit package 11A of the first embodiment shown in FIG. Since the rest of the configuration is the same as the electronic circuit package 11A of the first embodiment, the same reference numerals are given to the same elements, and repeated descriptions are omitted.

如本實施形態的電子電路封裝12A所例示,本發明中,磁性塑模樹脂40的側面42並非必需與基板20的側面27構成同一平面,亦可使磁性塑模樹脂40較小。 As exemplified by the electronic circuit package 12A of this embodiment, in the present invention, the side surface 42 of the magnetic molding resin 40 does not necessarily have to form the same plane as the side surface 27 of the substrate 20, and the magnetic molding resin 40 may be made smaller.

圖16~圖18係用於說明電子電路封裝12A的製造方法之步驟圖。 16 to 18 are diagrams for explaining the steps of the manufacturing method of the electronic circuit package 12A.

首先,如圖16所示,準備預先切斷的基板20,再依連接於其表面21的焊盤圖案23之方式,搭載複數電子零件31、32。具體而言,只要在焊盤圖案23上供應焊料24之後,搭載電子零件31、32並施行迴焊,藉此將電子零件31、32連接於焊盤圖案23便可。 First, as shown in FIG. 16, a pre-cut substrate 20 is prepared, and then a plurality of electronic components 31 and 32 are mounted in accordance with the land pattern 23 connected to the surface 21 thereof. Specifically, after the solder 24 is supplied to the land pattern 23, the electronic components 31 and 32 are mounted and reflow is performed to connect the electronic components 31 and 32 to the land pattern 23.

其次,如圖17所示,將電子零件31、32所搭載的基板20安裝於模具80。然後,如圖18所示,從模具80的流路81注入屬於磁性塑模樹脂40之材料的複合磁性材料,施行加壓及加熱。藉此,完成本實施形態的電子電路封裝12A。 Next, as shown in FIG. 17, the substrate 20 on which the electronic components 31 and 32 are mounted is mounted on the mold 80. Then, as shown in FIG. 18, a composite magnetic material, which is a material of the magnetic mold resin 40, is injected from the flow path 81 of the mold 80, and pressurized and heated. In this way, the electronic circuit package 12A of this embodiment is completed.

依此,亦可在先將基板20個片化之後,才形成磁性塑模樹脂 40。 According to this, it is also possible to form the magnetic mold resin after the 20 substrates are first sliced 40.

<第3實施形態> <The third embodiment>

圖19所示係本發明第3實施形態的電子電路封裝13A之構成剖視圖。 Fig. 19 is a cross-sectional view showing the structure of the electronic circuit package 13A according to the third embodiment of the present invention.

如圖19所示,本實施形態的電子電路封裝13A係就更進一步具備有覆蓋磁性塑模樹脂40之上面41及側面42、以及基板20之側面27的金屬膜60之處,不同於圖1所示第1實施形態的電子電路封裝11A。又,內部佈線25中,符號末端附加G的內部佈線25係電源圖案,其一部分露出於基板20的側面27。電源圖案25G係典型地賦予接地電位的焊盤圖案,只要屬於被賦予固定電位(constant potential)的圖案,並不侷限於焊盤圖案。因為其餘的構成均與第1實施形態的電子電路封裝11A相同,所以對相同要件賦予相同符號,並省略重複說明。 As shown in FIG. 19, the electronic circuit package 13A of this embodiment is further provided with a metal film 60 covering the upper surface 41 and side surface 42 of the magnetic mold resin 40 and the side surface 27 of the substrate 20, which differs from that shown in FIG. The electronic circuit package 11A of the first embodiment is shown. In the internal wiring 25, the internal wiring 25 with a G appended to the end of the symbol is a power supply pattern, and a part of the internal wiring 25 is exposed on the side surface 27 of the substrate 20. The power supply pattern 25G is typically a land pattern to which a ground potential is provided, and as long as it belongs to a pattern to which a constant potential is provided, it is not limited to the land pattern. Since the rest of the configuration is the same as the electronic circuit package 11A of the first embodiment, the same reference numerals are given to the same elements, and repeated descriptions are omitted.

金屬膜60係電磁屏蔽,較佳係以從Au、Ag、Cu及Al所構成群組中選擇至少1種金屬為主成分。金屬膜60較佳係盡可能低電阻,若鑒於成本等,最佳係使用Cu。又,金屬膜60的外側表面較佳係利用:SUS、Ni、Cr、Ti、黃銅(brass)等防蝕性金屬、或者環氧、酚、醯亞胺、胺酯、聚矽氧等樹脂所構成的抗氧化被覆覆蓋。此係為防止金屬膜60因熱、濕度等外部環境而遭氧化劣化,為抑制及防止此情形,較佳係施行上述處理。金屬膜60的形成方法係可適時選擇濺鍍法、蒸鍍法、無電解電鍍法、電解電鍍法等公知方 法,亦可在形成金屬膜60之前,便施行屬於提升密接性前處理的電漿處理、偶合處理、噴砂處理、蝕刻處理等。又,亦可事先薄薄地形成鈦、鉻、SUS等高密接性金屬膜,作為金屬膜60的底層。 The metal film 60 is electromagnetic shielding, and it is preferable to use at least one metal selected from the group consisting of Au, Ag, Cu, and Al as the main component. The metal film 60 preferably has as low resistance as possible, and in view of cost and the like, it is best to use Cu. In addition, the outer surface of the metal film 60 is preferably made of corrosion-resistant metals such as SUS, Ni, Cr, Ti, and brass, or resins such as epoxy, phenol, imide, urethane, and silicone. It is covered by an anti-oxidant coating. This is to prevent the metal film 60 from being oxidized and degraded due to the external environment such as heat and humidity. In order to suppress and prevent this, it is preferable to perform the above-mentioned treatment. The method of forming the metal film 60 can be selected from well-known methods such as sputtering, vapor deposition, electroless plating, and electrolytic plating. Method, before forming the metal film 60, plasma treatment, coupling treatment, sandblasting treatment, etching treatment, etc., which are pretreatments for improving adhesion, may be performed. In addition, a high-adhesive metal film such as titanium, chromium, SUS, or the like may be thinly formed in advance as the base layer of the metal film 60.

如圖19所示,藉由先在基板20的側面27露出電源圖案25G,金屬膜60覆蓋基板20的側面27,而連接於電源圖案25G。 As shown in FIG. 19, by first exposing the power supply pattern 25G on the side surface 27 of the substrate 20, the metal film 60 covers the side surface 27 of the substrate 20 and is connected to the power supply pattern 25G.

金屬膜60與磁性塑模樹脂40界面處的電阻值,較佳係106Ω以上。依此的話,因電磁波雜訊入射於金屬膜60而生成的渦電流幾乎不會流入於磁性塑模樹脂40,因而可防止因渦電流流入而導致磁性塑模樹脂40的磁特性降低。金屬膜60與磁性塑模樹脂40界面處的電阻值,係當二者直接接觸時便指磁性塑模樹脂40的表面電阻,當二者間存在有絕緣膜時便指絕緣膜的表面電阻。又,金屬膜60與磁性塑模樹脂40界面處的電阻值,較佳係橫跨全面均為106Ω以上,但亦可部分性存在有電阻值未滿106Ω的區域。 The resistance value at the interface between the metal film 60 and the magnetic mold resin 40 is preferably 10 6 Ω or more. In this way, the eddy current generated by the electromagnetic noise incident on the metal film 60 hardly flows into the magnetic molding resin 40, and thus it is possible to prevent the magnetic characteristics of the magnetic molding resin 40 from degrading due to the inflow of the eddy current. The resistance value at the interface between the metal film 60 and the magnetic molding resin 40 refers to the surface resistance of the magnetic molding resin 40 when the two are in direct contact, and refers to the surface resistance of the insulating film when there is an insulating film between the two. In addition, the resistance value at the interface between the metal film 60 and the magnetic mold resin 40 is preferably 10 6 Ω or more across the entire surface, but there may be regions with a resistance value of less than 10 6 Ω.

磁性塑模樹脂40的表面電阻值,基本上係大約與磁性塑模樹脂40的體積電阻率一致。所以,若磁性塑模樹脂40的體積電阻率為1010Ω‧cm以上,基本上,磁性塑模樹脂40的表面電阻值亦為1010Ω以上。然而,如使用圖5所說明,因為磁性塑模樹脂40在製造時會被晶割,因而在切斷面(即側面42)會露出磁性填料6,此情況,若比較體積電阻率,則側面42的表面電阻值會有降低的可能性。同樣的,在低輪廓或粗面化之目的下,將磁性塑模樹脂40的上面41施行研削時,上面41亦會露出由軟磁性金屬構成的磁性填 料6,此情況,若比較體積電阻率,則上面41的表面電阻值會有降低的可能性。其結果,即便磁性塑模樹脂40的體積電阻率為1010Ω‧cm以上,磁性塑模樹脂40的表面電阻值仍未滿1010Ω,即便此情況,若磁性塑模樹脂40的表面電阻值為106Ω以上,便可防止渦電流流入。 The surface resistance value of the magnetic molding resin 40 is basically approximately the same as the volume resistivity of the magnetic molding resin 40. Therefore, if the volume resistivity of the magnetic resin mold 40 is at least 10 10 Ω‧cm, substantially, the resistance value of the magnetic surface of the mold resin 40 is also more than 10 10 Ω. However, as explained using FIG. 5, because the magnetic molding resin 40 is crystal cut during manufacture, the magnetic filler 6 will be exposed on the cut surface (ie side 42). In this case, if the volume resistivity is compared, the side The surface resistance of 42 may decrease. Similarly, for the purpose of low profile or roughening, when the upper surface 41 of the magnetic molding resin 40 is ground, the upper surface 41 will also expose the magnetic filler 6 made of soft magnetic metal. In this case, if the volume resistivity is compared , Then the surface resistance value of the upper 41 will be reduced. As a result, even if the volume resistivity of the magnetic molding resin 40 is 10 10 Ω·cm or more, the surface resistance value of the magnetic molding resin 40 is still less than 10 10 Ω. Even in this case, if the surface resistance of the magnetic molding resin 40 is If the value is 10 6 Ω or more, the inflow of eddy current can be prevented.

再者,當磁性塑模樹脂40的上面41或側面42之表面電阻值降低至未滿106Ω時,只要在磁性塑模樹脂40的上面41或側面42形成薄絕緣材料便可。圖20所示係第1變化例的電子電路封裝13B之構成剖視圖,就在磁性塑模樹脂40的上面41及側面42、與金屬膜60之間介設薄絕緣膜70之處,不同於圖19所示電子電路封裝13A。若介設此種絕緣膜70,即便磁性塑模樹脂40的上面41或側面42之表面電阻值降低至未滿106Ω的情況,仍可使金屬膜60與磁性塑模樹脂40的界面處之電阻值為106Ω以上,可防止因渦電流造成的磁特性降低。 Furthermore, when the surface resistance value of the upper surface 41 or the side surface 42 of the magnetic molding resin 40 is reduced to less than 10 6 Ω, it is only necessary to form a thin insulating material on the upper surface 41 or the side surface 42 of the magnetic molding resin 40. FIG. 20 shows a cross-sectional view of the structure of the electronic circuit package 13B of the first modification. It is different from the figure where the thin insulating film 70 is interposed between the upper surface 41 and the side surface 42 of the magnetic mold resin 40 and the metal film 60. 19 shows the electronic circuit package 13A. If such an insulating film 70 is interposed, even if the surface resistance value of the upper surface 41 or the side surface 42 of the magnetic molding resin 40 is reduced to less than 10 6 Ω, the interface between the metal film 60 and the magnetic molding resin 40 can still be The resistance value is 10 6 Ω or more, which can prevent the magnetic properties from being degraded due to eddy currents.

圖21所示係本實施形態第2變化例的電子電路封裝13C之構成剖視圖。 Fig. 21 is a cross-sectional view showing the structure of an electronic circuit package 13C according to a second modification of this embodiment.

如圖21所示,本實施形態的第2變化例之電子電路封裝13C,係就磁性塑模樹脂40的平面尺寸略小於基板20的平面尺寸,藉此基板20的表面21外周部露出於磁性塑模樹脂40之處,不同於圖19所示電子電路封裝13A。因為其餘的構成均與圖19所示電子電路封裝13A相同,所以對相同要件賦予相同符號,並省略重複說明。 As shown in FIG. 21, the electronic circuit package 13C of the second modified example of this embodiment is based on the fact that the plane size of the magnetic mold resin 40 is slightly smaller than the plane size of the substrate 20, whereby the outer peripheral portion of the surface 21 of the substrate 20 is exposed to the magnetic The place where the resin 40 is molded is different from the electronic circuit package 13A shown in FIG. 19. Since the rest of the configuration is the same as that of the electronic circuit package 13A shown in FIG. 19, the same reference numerals are given to the same elements, and repeated descriptions are omitted.

如本變化例的電子電路封裝13C所例示,本發明中,磁性塑模樹脂40的側面42並不需要與基板20的側面27構成同一平面,亦可磁性塑模樹脂40較小。 As illustrated by the electronic circuit package 13C of this modification, in the present invention, the side surface 42 of the magnetic molding resin 40 does not need to form the same plane as the side surface 27 of the substrate 20, and the magnetic molding resin 40 may be smaller.

再者,如第3變化例的圖22所示電子電路封裝13D所示,金屬膜60亦可為未覆蓋基板20之側面27的構造。此情況,基板20的表面21中,在從磁性塑模樹脂40露出的外周部設有電源圖案28G,該電源圖案28G鄰接於金屬膜60。藉此,金屬膜60便被賦予接地電位等固定電位。 Furthermore, as shown in the electronic circuit package 13D shown in FIG. 22 of the third modification example, the metal film 60 may also have a structure that does not cover the side surface 27 of the substrate 20. In this case, on the surface 21 of the substrate 20, a power supply pattern 28G is provided in the outer peripheral portion exposed from the magnetic mold resin 40, and the power supply pattern 28G is adjacent to the metal film 60. Thereby, the metal film 60 is given a fixed potential such as a ground potential.

圖23所示係本實施形態第4變化例的電子電路封裝13E之構成剖視圖。 FIG. 23 is a cross-sectional view showing the structure of an electronic circuit package 13E according to a fourth modification of this embodiment.

如圖23所示,本實施形態第4變化例的電子電路封裝13E,係就磁性塑模樹脂40的平面尺寸略大於基板20的平面尺寸之處,不同於圖19所示電子電路封裝13A。因為其餘的構成均與圖19所示電子電路封裝13A相同,所以對相同要件賦予相同符號,並省略重複說明。 As shown in FIG. 23, the electronic circuit package 13E of the fourth modification of this embodiment is different from the electronic circuit package 13A shown in FIG. 19 in that the planar size of the magnetic mold resin 40 is slightly larger than the planar size of the substrate 20. Since the rest of the configuration is the same as that of the electronic circuit package 13A shown in FIG. 19, the same reference numerals are given to the same elements, and repeated descriptions are omitted.

如本變化例的電子電路封裝13E所例示,本發明中磁性塑模樹脂40亦可較基板20具有更大的平面尺寸。 As exemplified by the electronic circuit package 13E of this modified example, the magnetic molding resin 40 in the present invention may also have a larger plane size than the substrate 20.

依此,因為本實施形態的電子電路封裝13A~13E係使用磁性 塑模樹脂40,且其表面覆蓋著金屬膜60,因而可獲得複合屏蔽構造。藉此,可在實現低輪廓的狀態下,有效地遮蔽從電子零件31、32所放射的電磁波雜訊、或從外部入射於電子零件31、32的電磁波雜訊。特別係本實施形態的電子電路封裝13A~13E可更有效地遮蔽從電子零件31、32所放射的電磁波雜訊。其理由係從電子零件31、32生成的電磁波雜訊在通過磁性塑模樹脂40時,其一部分會被吸收,而未被吸收的電磁波雜訊之一部分利用金屬膜60反射,並再度通過磁性塑模樹脂40。依此,因為磁性塑模樹脂40二度對所入射電磁波雜訊產生作用,因而可有效地遮蔽從電子零件31、32所放射的電磁波雜訊。 Accordingly, because the electronic circuit packages 13A~13E of this embodiment use magnetic The resin 40 is molded, and its surface is covered with the metal film 60, so that a composite shielding structure can be obtained. With this, it is possible to effectively block electromagnetic noise emitted from the electronic components 31 and 32 or incident on the electronic components 31 and 32 from the outside while realizing a low profile. In particular, the electronic circuit packages 13A to 13E of this embodiment can more effectively shield the electromagnetic noise emitted from the electronic components 31 and 32. The reason is that when the electromagnetic noise generated from the electronic parts 31 and 32 passes through the magnetic molding resin 40, part of the electromagnetic noise is absorbed, and part of the electromagnetic noise that is not absorbed is reflected by the metal film 60 and passes through the magnetic plastic again. Mold resin 40. Accordingly, since the magnetic molding resin 40 has an effect on the incident electromagnetic wave noise twice, it can effectively shield the electromagnetic wave noise emitted from the electronic components 31 and 32.

再者,本實施形態的電子電路封裝13A~13E中,若將磁性塑模樹脂40的體積電阻率設為1010Ω‧cm以上,便可確保塑模構件所要求的充分絕緣性。且,若將磁性塑模樹脂40與金屬膜60的界面處之電阻值設為106Ω以上,則因電磁波雜訊入射於金屬膜60所生成的渦電流幾乎不會流入於磁性塑模樹脂40中。所以,可防止因渦電流流入而造成之磁性塑模樹脂40的磁特性降低。 Furthermore, in the electronic circuit packages 13A to 13E of the present embodiment, if the volume resistivity of the magnetic mold resin 40 is set to 10 10 Ω·cm or more, sufficient insulation required for the mold member can be ensured. Moreover, if the resistance value at the interface between the magnetic molding resin 40 and the metal film 60 is set to 10 6 Ω or more, the eddy current generated by the electromagnetic noise incident on the metal film 60 hardly flows into the magnetic molding resin. 40 in. Therefore, it is possible to prevent the decrease in the magnetic characteristics of the magnetic molding resin 40 caused by the inflow of eddy current.

圖24所示係電子電路封裝13A的雜訊衰減量圖,顯示基板20的厚度係0.25mm,磁性塑模樹脂40的厚度係0.50mm之情況。關於金屬膜60係設為Cu與Ni的積層膜,針對Cu膜厚不同的2種金屬膜60進行評價。具體而言,樣品A的金屬膜60係具有由4μm之Cu與2μm之Ni積層的構成,而樣品B的金屬膜60係具有由7μm之Cu與2μm之Ni積層的構成。為求比較,亦顯示使用未含磁性 填料6之塑模材料的樣品C、D值。樣品C的金屬膜60係具有由4μm之Cu、與2μm之Ni積層的構成,而樣品D的金屬膜60係具有由7μm之Cu、與2μm之Ni積層的構成。 FIG. 24 is a diagram showing the amount of noise attenuation of the electronic circuit package 13A, showing that the thickness of the substrate 20 is 0.25 mm, and the thickness of the magnetic molding resin 40 is 0.50 mm. Regarding the metal film 60 as a laminated film of Cu and Ni, two types of metal films 60 having different Cu film thicknesses were evaluated. Specifically, the metal film 60 of the sample A has a laminated structure of 4 μm Cu and 2 μm of Ni, and the metal film 60 of the sample B has a laminated structure of 7 μm Cu and 2 μm of Ni. For comparison, it also shows the use of non-magnetic Sample C and D values of the molding material of filler 6. The metal film 60 of the sample C has a laminated structure of Cu of 4 μm and Ni of 2 μm, and the metal film 60 of the sample D has a laminated structure of Cu of 7 μm and Ni of 2 μm.

如圖24所示,相較於使用未含磁性填料6之塑模材料的情況下,得知若使用含有磁性填料6的複合磁性密封材料2,特別係在100MHz以下頻段的雜訊衰減量獲提高。又,關於金屬膜60,厚度越厚則能獲得越高的雜訊衰減特性。 As shown in Fig. 24, compared with the case of using a molding material that does not contain a magnetic filler 6, it is known that if a composite magnetic sealing material 2 containing a magnetic filler 6 is used, the noise attenuation in the frequency band below 100MHz can be obtained. improve. Also, regarding the metal film 60, the thicker the thickness, the higher the noise attenuation characteristics can be obtained.

圖25~圖27所示係電子電路封裝13A中所含金屬膜60的膜厚、與雜訊衰減量間之關係圖。圖25所示係20MHz的雜訊衰減量,圖26所示係50MHz的雜訊衰減量,圖27所示係100MHz的雜訊衰減量。為求比較,亦顯示使用未含磁性填料6之塑模材料時的值。 25 to 27 show the relationship between the film thickness of the metal film 60 contained in the electronic circuit package 13A and the amount of noise attenuation. Figure 25 shows the 20MHz noise attenuation, Figure 26 shows the 50MHz noise attenuation, and Figure 27 shows the 100MHz noise attenuation. For comparison, the value when using a molding material that does not contain the magnetic filler 6 is also shown.

如圖25~圖27所示,得知任一頻段均係金屬膜60的厚度越厚便能獲得越高的雜訊衰減特性。又,得知任一頻段均係相較於使用未含磁性填料6之塑模材料的情況下,藉由使用含有磁性填料6的複合磁性密封材料2,便可獲得較高的雜訊衰減特性。 As shown in FIGS. 25-27, it is known that the thicker the thickness of the metal film 60 in any frequency band, the higher the noise attenuation characteristics can be obtained. In addition, it is known that any frequency band is compared with the case of using a molding material that does not contain a magnetic filler 6. By using a composite magnetic sealing material 2 containing a magnetic filler 6, a higher noise attenuation characteristic can be obtained. .

圖28所示係電子電路封裝11A(無金屬膜)與電子電路封裝13A(有金屬膜),在升溫及降溫時的基板20之翹曲量圖。為求比較,圖29所示係將磁性填料6利用由SiO2所構成的非磁性填料取代時的值。 FIG. 28 is a graph showing the amount of warpage of the substrate 20 when the electronic circuit package 11A (without metal film) and the electronic circuit package 13A (with metal film) are heated and cooled. For comparison, FIG. 29 shows the value when the magnetic filler 6 is replaced with a non-magnetic filler composed of SiO 2.

如圖28所示,得知設有金屬膜60的電子電路封裝13A,相較於未設金屬膜60的電子電路封裝11A之下,因溫度變化所造成之基板20的翹曲較小。又,由圖28與圖29的比較得知,使用含磁性填料6之複合磁性密封材料2的電子電路封裝11A、13A之翹曲特性,係幾乎與使用由SiO2所構成非磁性填料的塑模材料時同等。 As shown in FIG. 28, it is known that the electronic circuit package 13A provided with the metal film 60 has less warpage of the substrate 20 due to temperature changes compared to the electronic circuit package 11A without the metal film 60. Also, from the comparison between FIG. 28 and FIG. 29, the warpage characteristics of the electronic circuit packages 11A and 13A using the composite magnetic sealing material 2 containing the magnetic filler 6 are almost the same as those of the plastic using the non-magnetic filler composed of SiO 2 Same as the mold material.

<第4實施形態> <Fourth Embodiment>

圖30所示係本發明第4實施形態的電子電路封裝14A之構成剖視圖。 FIG. 30 is a cross-sectional view showing the structure of the electronic circuit package 14A according to the fourth embodiment of the present invention.

如圖30所示,本實施形態的電子電路封裝14A係除基板20及金屬膜60的形狀不同之處外,其餘均與圖19所示第3實施形態的電子電路封裝13A相同。故,對相同要件賦予相同符號,並省略重複說明。 As shown in FIG. 30, the electronic circuit package 14A of this embodiment is the same as the electronic circuit package 13A of the third embodiment shown in FIG. 19 except for the difference in the shapes of the substrate 20 and the metal film 60. Therefore, the same symbols are assigned to the same elements, and repeated descriptions are omitted.

本實施形態中,基板20的側面27呈階梯狀。具體而言,具有側面下部27b較側面上部27a更突出的形狀。所以,金屬膜60並非形成於基板20的側面全體,而是依覆蓋側面上部27a與段差部分27c的方式設置,側面下部27b並未被金屬膜60覆蓋。本實施形態亦是在基板20的側面上部27a露出電源圖案25G,因而經由該部分使金屬膜60連接於電源圖案25G。 In this embodiment, the side surface 27 of the substrate 20 has a stepped shape. Specifically, it has a shape in which the lower side surface 27b protrudes more than the upper side surface 27a. Therefore, the metal film 60 is not formed on the entire side surface of the substrate 20, but is provided so as to cover the upper side surface 27a and the stepped portion 27c, and the lower side surface 27b is not covered by the metal film 60. In the present embodiment, the power supply pattern 25G is exposed on the upper side 27a of the substrate 20, so the metal film 60 is connected to the power supply pattern 25G via this portion.

圖31及圖32係用於說明電子電路封裝14A的製造方法之步驟圖。 31 and 32 are diagrams for explaining the steps of the method of manufacturing the electronic circuit package 14A.

首先,利用使用圖3與圖4所說明的方法,在集合基板20A的表面21上形成磁性塑模樹脂40之後,如圖31所示,沿表示晶割位置的虛線a形成溝43。本實施形態中,因為電源圖案25G橫切屬於晶割位置的虛線a,因而若沿虛線a切斷集合基板20A,便從基板20的側面27露出電源圖案25G。溝43係設為完全切斷磁性塑模樹脂40,且不會完全切斷集合基板20A的深度。藉此,形成在溝43的內部露出磁性塑模樹脂40的側面42、與基板20的側面上部27a及段差部分27c。此處,側面上部27a的深度係至少必需設定為露出電源圖案25G的深度。 First, after the magnetic molding resin 40 is formed on the surface 21 of the assembly substrate 20A by the method described using FIGS. 3 and 4, as shown in FIG. 31, a groove 43 is formed along the dotted line a indicating the position of the crystal cut. In this embodiment, since the power supply pattern 25G crosses the broken line a belonging to the crystal cutting position, if the aggregate substrate 20A is cut along the broken line a, the power supply pattern 25G is exposed from the side surface 27 of the substrate 20. The groove 43 is set to a depth that completely cuts the magnetic mold resin 40 and does not completely cut the assembly substrate 20A. Thereby, the side surface 42 of the magnetic mold resin 40, the upper side surface 27a and the step portion 27c of the substrate 20 are exposed in the groove 43. Here, the depth of the upper part 27a of the side surface must be set to at least the depth at which the power supply pattern 25G is exposed.

其次,如圖32所示,使用濺鍍法、蒸鍍法、無電解電鍍法、電解電鍍法等形成金屬膜60。藉此,磁性塑模樹脂40的上面41及溝43的內部均被金屬膜60覆蓋。此時,在基板20的側面上部27a露出之電源圖案25G,形成連接於金屬膜60的狀態。 Next, as shown in FIG. 32, the metal film 60 is formed using a sputtering method, a vapor deposition method, an electroless plating method, an electrolytic plating method, or the like. Thereby, both the upper surface 41 of the magnetic mold resin 40 and the inside of the groove 43 are covered by the metal film 60. At this time, the power supply pattern 25G exposed on the upper side 27a of the substrate 20 is connected to the metal film 60.

然後,若藉由沿虛線a切斷集合基板20A而將基板20個片化,便完成本實施形態的電子電路封裝14A。 Then, by cutting the assembly substrate 20A along the broken line a to divide the substrate 20 into pieces, the electronic circuit package 14A of this embodiment is completed.

依此,根據本實施形態的電子電路封裝14A之製造方法,因為形成溝43,而可在集合基板20A個片化之前,形成金屬膜60,可輕易且確實地形成金屬膜60。 Accordingly, according to the manufacturing method of the electronic circuit package 14A of this embodiment, since the groove 43 is formed, the metal film 60 can be formed before the collective substrate 20A is sliced, and the metal film 60 can be easily and reliably formed.

以上,針對本發明較佳實施形態進行說明,惟本發明並不侷限 於上述實施形態,在不致脫逸本發明主旨之範圍內可進行各種變更,當然該等亦涵蓋於本發明範疇內。 Above, the preferred embodiments of the present invention are described, but the present invention is not limited In the above-mentioned embodiments, various changes can be made within the scope of not deviating from the spirit of the present invention, and of course these are also included in the scope of the present invention.

[實施例] [Example] <複合磁性密封材料之製成> <Production of Composite Magnetic Sealing Material>

主劑係使用DIC公司製830S(雙酚A型環氧樹脂),硬化劑係使用相對於主劑為0.5當量的NIPPON CARBIDE工業公司製DicyDD(雙氰胺),硬化促進劑係使用相對於主劑為1wt%的四國化成工業公司製C11Z-CN(咪唑),而製備樹脂材料。 The main agent is 830S (bisphenol A epoxy resin) manufactured by DIC, and the hardening agent is 0.5 equivalent of DicyDD (dicyandiamide) manufactured by NIPPON CARBIDE Industry Co. The agent was C11Z-CN (imidazole) manufactured by Shikoku Chemical Industry Co., Ltd. at 1% by weight, and a resin material was prepared.

在上述樹脂材料中,添加具圖33所示組成的磁性填料50體積%、60體積%或70體積%,經充分混練而獲得糊膏。另外,當無法糊膏化時便適時添加丁基卡必醇醋酸酯。將該糊膏塗佈成厚度約300μm的狀態,分別依序依100℃下施行1小時、130℃下施行1小時、150℃下施行1小時、180℃下施行1小時的熱硬化,便獲得硬化物薄片。組成1(比較例)係一般通稱「PB透磁合金」(permalloy)的磁性材料。 In the above resin material, 50% by volume, 60% by volume, or 70% by volume of the magnetic filler having the composition shown in FIG. 33 is added, and the paste is obtained by sufficiently kneading. In addition, butyl carbitol acetate is added in due course when it cannot be pasted. Apply the paste to a thickness of about 300μm, and heat curing at 100°C for 1 hour, 130°C for 1 hour, 150°C for 1 hour, and 180°C for 1 hour in order to obtain Hardened material flakes. Composition 1 (comparative example) is a magnetic material generally called "PB permalloy".

<熱膨脹係數之測定> <Measurement of Thermal Expansion Coefficient>

將上述硬化物薄片裁剪為長12mm、寬5mm,使用TMA依5℃/分從室溫升溫至200℃,從較玻璃轉移溫度低50℃~100℃溫度範圍內的膨脹量,計算出熱膨脹係數。測定結果示於圖34。圖34中亦顯示取代磁性填料,改為使用由SiO2所構成之非磁性填料時的結果。 Cut the above-mentioned hardened material sheet into a length of 12mm and a width of 5mm. Use TMA to increase the temperature from room temperature to 200°C at 5°C/min, and calculate the thermal expansion coefficient from the expansion in the temperature range of 50°C to 100°C lower than the glass transition temperature. . The measurement results are shown in Figure 34. Fig. 34 also shows the result of replacing the magnetic filler with a non-magnetic filler made of SiO 2.

如圖34所示,使用組成2與組成3之磁性填料的情況,相較於使用組成1之磁性填料(比較例)的情況之下,熱膨脹係數大幅減小。特別係添加量為60體積%以上時,可獲得與使用由SiO2所構成之非磁性填料時同等的熱膨脹係數,當添加量為70體積%時,熱膨脹係數在10ppm/℃以下。 As shown in FIG. 34, the case of using the magnetic fillers of composition 2 and composition 3, the thermal expansion coefficient is greatly reduced compared with the case of using the magnetic filler of composition 1 (comparative example). In particular, when the addition amount is 60% by volume or more, the same thermal expansion coefficient as when a non-magnetic filler composed of SiO 2 is used can be obtained. When the addition amount is 70% by volume, the thermal expansion coefficient is 10 ppm/°C or less.

<導磁率之測定> <Measurement of Magnetic Permeability>

將上述硬化物薄片裁剪為外徑7.9mm、內徑3.1mm的環形狀,使用Agilent公司製阻抗分析儀E4991之材料分析儀機能,測定10MHz的實效導磁率(μ')。測定結果示於圖35。 The hardened product sheet was cut into a ring shape with an outer diameter of 7.9 mm and an inner diameter of 3.1 mm, and the material analyzer function of the impedance analyzer E4991 manufactured by Agilent was used to measure the effective permeability (μ') of 10 MHz. The measurement results are shown in Fig. 35.

如圖35所示,使用組成2與組成3之磁性填料時所獲得的導磁率,係幾乎與使用組成1之磁性填料(比較例)時所獲得的導磁率同等。 As shown in FIG. 35, the permeability obtained when the magnetic fillers of composition 2 and 3 are used is almost the same as that obtained when the magnetic filler of composition 1 (comparative example) is used.

<考察> <Review>

由將組成2與組成3之磁性填料添加於樹脂材料中而構成的複合磁性密封材料,係可獲得與使用由SiO2所構成之非磁性填料時同等的熱膨脹係數,且可獲得與使用由PB透磁合金所構成之磁性填料時同等的導磁率。所以,若將組成2或組成3之磁性填料添加於樹脂材料中而構成的複合磁性密封材料,使用作為電子電路封裝用密封材,便可在防止基板翹曲、塑模材界面剝離、塑模材龜裂等情況下,獲得高磁屏蔽特性。 The composite magnetic sealing material composed of the magnetic filler of composition 2 and composition 3 added to the resin material can obtain the same thermal expansion coefficient as when the non-magnetic filler composed of SiO 2 is used, and it can be obtained and used by PB The magnetic filler made of Permalloy has the same permeability. Therefore, if the composite magnetic sealing material composed of the magnetic filler of composition 2 or composition 3 is added to the resin material, it can be used as a sealing material for electronic circuit packaging to prevent substrate warpage, peeling of the mold material interface, and mold In the case of material cracks, etc., high magnetic shielding characteristics are obtained.

11A‧‧‧電子電路封裝 11A‧‧‧Electronic circuit packaging

20‧‧‧基板 20‧‧‧Substrate

21‧‧‧基板表面 21‧‧‧Substrate surface

22‧‧‧基板背面 22‧‧‧The back of the substrate

23‧‧‧焊盤圖案 23‧‧‧Land Pattern

24‧‧‧焊料 24‧‧‧Solder

25‧‧‧內部佈線 25‧‧‧Internal wiring

26‧‧‧外部端子 26‧‧‧External terminal

27‧‧‧基板之側面 27‧‧‧The side of the substrate

31、32‧‧‧電子零件 31、32‧‧‧Electronic parts

40‧‧‧磁性塑模樹脂 40‧‧‧Magnetic plastic molding resin

42‧‧‧磁性塑模樹脂之側面 42‧‧‧The side of the magnetic plastic molding resin

Claims (5)

一種電子電路封裝,係具備有:基板;電子零件,其係搭載於上述基板表面上;以及磁性塑模樹脂,其係覆蓋上述基板之上述表面而嵌入上述電子零件;其中,上述磁性塑模樹脂係具備有:樹脂材料;以及磁性填料,其係調配於上述樹脂材料中,在Fe中含有以Ni為主成分之金屬材料32~39重量%。 An electronic circuit package is provided with: a substrate; an electronic component mounted on the surface of the substrate; and a magnetic mold resin that covers the surface of the substrate and is embedded in the electronic component; wherein the magnetic mold resin The system is equipped with: a resin material; and a magnetic filler, which is blended in the above-mentioned resin material, and contains 32 to 39% by weight of a metallic material mainly composed of Ni in Fe. 如請求項1之電子電路封裝,其中,上述金屬材料係相對於上述磁性填料全體,更進一步含有0.1~8重量%的Co。 The electronic circuit package of claim 1, wherein the metal material further contains 0.1 to 8% by weight of Co relative to the entire magnetic filler. 如請求項1之電子電路封裝,其中,上述填料係更進一步含有非磁性填料。 The electronic circuit package of claim 1, wherein the filler system further contains a non-magnetic filler. 如請求項3之電子電路封裝,其中,上述非磁性填料的量相對於上述磁性填料與上述非磁性填料的合計係1~40體積%。 The electronic circuit package of claim 3, wherein the amount of the non-magnetic filler is 1-40% by volume relative to the total of the magnetic filler and the non-magnetic filler. 如請求項3或4之電子電路封裝,其中,上述磁性塑模樹脂中上述磁性填料與上述非磁性填料的合計調配量係50~85體積%。 The electronic circuit package of claim 3 or 4, wherein the total blending amount of the magnetic filler and the non-magnetic filler in the magnetic molding resin is 50 to 85% by volume.
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