TWI729448B - 電漿去除有害排氣的裝置 - Google Patents

電漿去除有害排氣的裝置 Download PDF

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Publication number
TWI729448B
TWI729448B TW108127985A TW108127985A TWI729448B TW I729448 B TWI729448 B TW I729448B TW 108127985 A TW108127985 A TW 108127985A TW 108127985 A TW108127985 A TW 108127985A TW I729448 B TWI729448 B TW I729448B
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TW
Taiwan
Prior art keywords
exhaust gas
plasma jet
plasma
point
water
Prior art date
Application number
TW108127985A
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English (en)
Chinese (zh)
Other versions
TW202027843A (zh
Inventor
池奥哲也
Original Assignee
日商康肯環保設備有限公司
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Application filed by 日商康肯環保設備有限公司 filed Critical 日商康肯環保設備有限公司
Publication of TW202027843A publication Critical patent/TW202027843A/zh
Application granted granted Critical
Publication of TWI729448B publication Critical patent/TWI729448B/zh

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/68—Halogens or halogen compounds
    • B01D53/70—Organic halogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2258/00—Sources of waste gases
    • B01D2258/02—Other waste gases
    • B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2259/00—Type of treatment
    • B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
    • B01D2259/818—Employing electrical discharges or the generation of a plasma
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00—Capture or disposal of greenhouse gases
    • Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Biomedical Technology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Organic Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Treating Waste Gases (AREA)
  • Plasma Technology (AREA)
TW108127985A 2018-12-14 2019-08-07 電漿去除有害排氣的裝置 TWI729448B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018-234623 2018-12-14
JP2018234623A JP6791510B2 (ja) 2018-12-14 2018-12-14 排ガスのプラズマ除害方法とその装置

Publications (2)

Publication Number Publication Date
TW202027843A TW202027843A (zh) 2020-08-01
TWI729448B true TWI729448B (zh) 2021-06-01

Family

ID=71076545

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108127985A TWI729448B (zh) 2018-12-14 2019-08-07 電漿去除有害排氣的裝置

Country Status (5)

Country Link
JP (1) JP6791510B2 (ja)
KR (1) KR102523224B1 (ja)
CN (1) CN112839730B (ja)
TW (1) TWI729448B (ja)
WO (1) WO2020121587A1 (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20230417410A1 (en) * 2020-11-10 2023-12-28 Kanken Techno Co., Ltd. Gas processing furnace and exhaust gas processing device in which same is used
KR102546997B1 (ko) * 2022-12-02 2023-06-23 이상주 반도체 배기가스 처리장치
CN115823619B (zh) * 2023-02-08 2023-06-02 中国人民解放军战略支援部队航天工程大学 等离子体射流对撞喷嘴装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200831178A (en) * 2006-12-01 2008-08-01 Kanken Techno Co Ltd Device for detoxicating semiconductor production exhaust gas

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4063449B2 (ja) * 1999-06-04 2008-03-19 精一 森田 廃棄物焼却ガスの改質方法、焼却ガスの改質装置
JP2005205330A (ja) * 2004-01-23 2005-08-04 Kanken Techno Co Ltd パーフルオロコンパウンド排ガスのプラズマ分解処理方法および該方法を利用したプラズマ分解処理装置並びにこのプラズマ分解処理装置を搭載した排ガス処理システム
JP4658506B2 (ja) * 2004-03-31 2011-03-23 浩史 滝川 パルスアークプラズマ生成用電源回路及びパルスアークプラズマ処理装置
JP5307556B2 (ja) * 2007-01-30 2013-10-02 カンケンテクノ株式会社 ガス処理装置
CN102478242A (zh) * 2010-11-25 2012-05-30 王守国 三喷头等离子体医疗垃圾焚烧系统
WO2016056036A1 (ja) * 2014-10-06 2016-04-14 カンケンテクノ株式会社 排ガス処理装置
KR101623339B1 (ko) * 2015-04-22 2016-05-24 주식회사 라이트브릿지 플라즈마 탈취 시스템
KR101804013B1 (ko) * 2015-06-08 2017-12-01 한국기초과학지원연구원 소각 및 가스화 공정 배가스의 플라즈마 처리 장치
CN105289442B (zh) * 2015-11-16 2018-11-06 新疆兵团现代绿色氯碱化工工程研究中心(有限公司) 一种等离子体裂解煤制乙炔反应装置
CN206912254U (zh) * 2017-05-10 2018-01-23 江苏天楹环保能源成套设备有限公司 一种新型的等离子体雾化制备球型粉末系统
CN107281912B (zh) * 2017-07-19 2019-12-27 浙江全世科技有限公司 一种多源斜插式等离子体气体处理装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200831178A (en) * 2006-12-01 2008-08-01 Kanken Techno Co Ltd Device for detoxicating semiconductor production exhaust gas

Also Published As

Publication number Publication date
CN112839730A (zh) 2021-05-25
CN112839730B (zh) 2022-09-23
TW202027843A (zh) 2020-08-01
KR20210088648A (ko) 2021-07-14
KR102523224B1 (ko) 2023-04-20
JP6791510B2 (ja) 2020-11-25
WO2020121587A1 (ja) 2020-06-18
JP2020093237A (ja) 2020-06-18

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