TWI726098B - Method for manufacturing metal/resin laminate, and electrical and electronic instrument - Google Patents

Method for manufacturing metal/resin laminate, and electrical and electronic instrument Download PDF

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TWI726098B
TWI726098B TW106115286A TW106115286A TWI726098B TW I726098 B TWI726098 B TW I726098B TW 106115286 A TW106115286 A TW 106115286A TW 106115286 A TW106115286 A TW 106115286A TW I726098 B TWI726098 B TW I726098B
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film
resin
release film
manufacturing
polyamide
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TW106115286A
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Chinese (zh)
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TW201811528A (en
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清水勝
志摩健二
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日商三井化學東賽璐股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00Moulds or cores; Details thereof or accessories therefor
    • B29C33/56Coatings, e.g. enameled or galvanised; Releasing, lubricating or separating agents
    • B29C33/68Release sheets
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/04Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/0353Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
    • H05K1/036Multilayers with layers of different types
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2367/00Characterised by the use of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Derivatives of such polymers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2377/00Characterised by the use of polyamides obtained by reactions forming a carboxylic amide link in the main chain; Derivatives of such polymers

Abstract

An object of the present invention is to provide a mold release film for process which can be easily and sufficiently peeled from a metal surface having a high roughness such as a blackened copper foil or the like, even after a process under severe conditions such as a hot pressing under conditions of temperature, pressure or the like higher than conventional ones, or a hot pressing for a longer time. The object is solved by the mold release film for process composed of a thermoplastic resin, and at least one side of which has the following properties: (1) The film resilience value R measured by the nanoindentation method at a test temperature of 180 ℃ is R ≧ 70 (%).

Description

金屬/樹脂積層體之製造方法及電氣電子機器 Manufacturing method of metal/resin laminate and electrical and electronic equipment

本發明係關於製程用離型膜,其從所謂黑化處理銅箔等表面粗糙度高之金屬表面之離型性優異,更具體而言,本發明係關於製程用離型膜、及使用該製程用離型膜之多層印刷配線板等金屬/樹脂積層體之製造方法,該製程用離型膜適合用於製造具有經粗面化處理之銅箔層之多層印刷配線板等金屬/樹脂積層體。 The present invention relates to a release film for the process, which has excellent release properties from a metal surface with high surface roughness such as so-called blackened copper foil. More specifically, the present invention relates to a release film for the process and the use of the release film. Process release film manufacturing method for metal/resin laminates such as multilayer printed wiring boards. The process release film is suitable for manufacturing metal/resin laminates such as multilayer printed wiring boards with roughened copper foil layers. body.

近年來,伴隨電子機器之急速的進步,隨著IC積體度增大,因應對於更高精度、高密度、高可靠性化之要求之目的而常用印刷配線板。 In recent years, with the rapid advancement of electronic equipment and the increase in IC integration, printed wiring boards have been commonly used for the purpose of higher precision, higher density, and higher reliability.

就該印刷配線板而言,有單面印刷配線板、雙面印刷配線板、多層印刷配線板、可撓性印刷配線板。其中,就3層以上之導體中間設置絕緣層並一體化,任意導體彼此及實裝的電子零件可與任意導體層連接之點而言,尤其多層印刷基板(以下,亦稱為「MLB」)之應用領域逐漸變廣。 The printed wiring board includes a single-sided printed wiring board, a double-sided printed wiring board, a multilayer printed wiring board, and a flexible printed wiring board. Among them, in terms of the point where an insulating layer is provided between conductors of more than 3 layers and integrated, any conductors and mounted electronic parts can be connected to any conductor layer, especially a multilayer printed circuit board (hereinafter, also referred to as "MLB") The field of application is gradually expanding.

該MLB,係藉由例如將一對單面敷銅積層板、或一對雙面敷銅積層板作為雙面外裝,於其內側使一層或二層以上之內層電路板隔著預浸體(prepreg)(環氧樹脂等)而交互地積疊,將該等以治具(jig)夾持並隔著墊材而以熱壓板熱壓,使預浸體硬化而形成堅固地一體化之積層體,進行開孔、通孔鍍敷等後,將表面蝕刻而形成。 For this MLB, for example, a pair of single-sided copper-clad laminates or a pair of double-sided copper-clad laminates are used as a double-sided exterior, and one or more inner circuit boards are prepregped on the inside. The prepreg (epoxy resin, etc.) is alternately stacked, and the prepreg is sandwiched by a jig and pressed with a hot plate through a mat material to harden the prepreg to form a solid integration The layered body is formed by etching the surface after opening holes, through-hole plating, etc.

此種製造MLB之製程中,通常在敷銅積層板(外裝板)與治具之間使用離型膜。該製程用離型膜,係使用由4-甲基-1-戊烯共聚物、聚四氟乙烯、聚酯、對排聚苯乙烯等在熱壓時之加熱加壓步驟中不會熔融之高耐熱性樹脂所構成之膜,且剛性、表面平滑性等優異者(例如,參照專利文獻1至專利文獻4等)。 In this manufacturing process of MLB, a release film is usually used between the copper-clad laminate (exterior board) and the fixture. The release film for this process is made of 4-methyl-1-pentene copolymer, polytetrafluoroethylene, polyester, parapolystyrene, etc., which will not melt during the heating and pressing step during hot pressing. A film composed of a highly heat-resistant resin and excellent in rigidity, surface smoothness, etc. (for example, refer to Patent Document 1 to Patent Document 4, etc.).

就貼銅積層板之銅箔而言,經常使用為了提高與環氧樹脂之接著性而將表面氧化、或藉由進行由酸所致之蝕刻處理而使其粗糙之所謂的黑化處理銅箔等表面經粗面化處理之銅箔。此時,上述各製程用離型膜,係有會在熱壓時之加熱加壓步驟中,產生上述銅箔面侵入膜表面,而離型膜變得無法剝離之問題。 For the copper foil of the copper-clad laminate, the so-called blackened copper foil is often used in which the surface is oxidized in order to improve the adhesion with the epoxy resin, or the so-called blackened copper foil is made rough by etching treatment caused by acid. Etc. copper foil whose surface has been roughened. At this time, the release film for each process described above has the problem that the copper foil surface invades the surface of the film during the heating and pressing step during hot pressing, and the release film cannot be peeled off.

對此,已提案使用一種延伸膜,其係將在由4-甲基-1-戊烯(共)聚合物所成且實質上不含蠟或聚矽氧之層(A)之至少一最外層設置聚丙烯及/或聚乙烯之層(B)所形成之薄片單軸延伸至4.3倍以上後,將該薄片之至少一最外層之聚丙烯及/或聚乙烯之層(B)剝離去除而成之膜,其延伸方向之熱收縮率為20%以上(例如,參照專利文獻5)。 In this regard, it has been proposed to use a stretched film, which is made of 4-methyl-1-pentene (co)polymer and is substantially free of wax or silicone on at least one of the layers (A). After the sheet formed by the polypropylene and/or polyethylene layer (B) on the outer layer is uniaxially stretched to more than 4.3 times, peel off at least one outermost polypropylene and/or polyethylene layer (B) of the sheet The resulting film has a thermal shrinkage rate of 20% or more in the extending direction (for example, refer to Patent Document 5).

然而,隨著該技術領域的發展,對於多層印刷配線板用離型膜等製程用離型膜之要求水準係逐年提高,而強烈要求即使在更高溫、高壓之熱壓等嚴苛的製程條件,仍可容易且充分地從粗糙度高之金屬表面剝離之製程用離型膜。僅就提高離型膜之剛性、表面平滑性而言,未必能因應此種要求。 However, with the development of this technical field, the level of requirements for release films for manufacturing processes such as release films for multilayer printed wiring boards has been increasing year by year, and it is strongly demanded even under severe process conditions such as hot pressing at higher temperatures and pressures. , It can still be easily and fully peeled off from the metal surface with high roughness. Only in terms of improving the rigidity and surface smoothness of the release film, it may not be able to meet such requirements.

[先前技術文獻] [Prior Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本特開2004-082717號公報 [Patent Document 1] JP 2004-082717 A

[專利文獻2]日本特開平10-67027號公報 [Patent Document 2] Japanese Patent Application Laid-Open No. 10-67027

[專利文獻3]日本特開2014-8720號公報 [Patent Document 3] JP 2014-8720 A

[專利文獻4]日本特開2001-246635號公報 [Patent Document 4] JP 2001-246635 A

[專利文獻5]日本專利第4489699號說明書 [Patent Document 5] Japanese Patent No. 4489699 Specification

本發明係有鑑於上述情事而成者,並以提供下述製程用離型膜為目的,該製程用離型膜即使在以溫度、壓力等高於以往之條件之熱壓、或更長時間之熱壓等條件嚴苛之製程後,仍可容易且充分地從黑化處理銅箔等粗糙度高之金屬表面剝離。 The present invention is made in view of the above situation, and aims to provide the release film for the following process, even if the release film for the process is hot-pressed or longer than the previous conditions at temperature, pressure, etc. It can still be easily and fully peeled off from blackened copper foil and other high-roughness metal surfaces after severe processing conditions such as hot pressing.

本發明人等為了解決上述課題而重複專心檢討之結果,著眼於在試驗溫度180℃以奈米壓痕法所測 定之膜復原性值R,發現該膜復原性值R為一定值以上時能有效解決上述課題,遂完成本發明。 In order to solve the above-mentioned problems, the inventors of the present invention repeated the results of intensive review. They focused on the film recoverability value R measured by the nanoindentation method at a test temperature of 180°C, and found that the film recoverability value R is more than a certain value. The above-mentioned problems are effectively solved, and the present invention is completed.

亦即,本發明及其各態樣係如下述[1]至[10]所記載。 That is, the present invention and its various aspects are as described in the following [1] to [10].

[1]一種製程用離型膜,其係含有熱塑性樹脂而成者,且其至少一面具有下述特性:(1)在試驗溫度180℃以奈米壓痕法所測定之膜復原性值R為:R≧70(%)。 [1] A release film for manufacturing process, which contains thermoplastic resin and has the following characteristics on at least one side: (1) Film recovery value R measured by nanoindentation at a test temperature of 180°C For: R≧70(%).

[2]如[1]所述之製程用離型膜,其係含有熱塑性樹脂而成者,且其至少一面具有下述特性:(2)在試驗溫度180℃以奈米壓痕法所測定之硬度H為:H≧40(MPa)。 [2] The release film for the manufacturing process as described in [1], which contains a thermoplastic resin and has the following characteristics on at least one side: (2) Measured by the nanoindentation method at a test temperature of 180°C The hardness H is: H≧40 (MPa).

[3]如[2]所述之製程用離型膜,其中,具有前述(1)的特性之至少一面、與具有前述(2)的特性之至少一面為同一面。 [3] The release film for a process as described in [2], wherein at least one side having the characteristics of (1) is the same as at least one side having the characteristics of (2).

[4]如[1]至[3]中任一項所述之製程用離型膜,其係含有聚酯樹脂、及/或聚醯胺樹脂而成者。 [4] The release film for a process according to any one of [1] to [3], which contains a polyester resin and/or a polyamide resin.

[5]如[1]至[4]中任一項所述之製程用離型膜,其係具有延伸或無延伸之聚酯膜層、或者延伸或無延伸之聚醯胺膜層。 [5] The release film for a process as described in any one of [1] to [4], which has a polyester film layer with or without extension, or a polyamide film layer with or without extension.

[6]如[1]至[5]中任一項所述之製程用離型膜,其係用於從經粗面化處理之金屬表面之剝離。 [6] The release film for a process as described in any one of [1] to [5], which is used for peeling from a roughened metal surface.

[7]如[1]至[6]中任一項所述之製程用離型膜,其係用於從表面粗糙度Ra為1.0至6.5μm之金屬表面之剝離。 [7] The release film for a process as described in any one of [1] to [6], which is used for peeling from a metal surface with a surface roughness Ra of 1.0 to 6.5 μm.

[8]一種金屬/樹脂積層體之製造方法,其具備:使[1]至[7]中任一項所述之離型用膜在具有上述(1)的 特性之至少一面與經粗面化處理之金屬箔層接觸,並進行熱壓之步驟;以及將該製程用離型用膜從該金屬箔層剝離之步驟。 [8] A method of manufacturing a metal/resin laminate, comprising: applying the release film according to any one of [1] to [7] on at least one surface having the characteristics of (1) above and a rough surface The step of contacting the metal foil layer of chemical treatment and performing hot pressing; and the step of peeling the release film for the process from the metal foil layer.

[9]如[8]所述之製造方法,其中,前述金屬/樹脂積層體係多層印刷配線板。 [9] The manufacturing method according to [8], wherein the metal/resin laminate system multilayer printed wiring board.

[10]一種電氣電子機器,其具有由[9]所述之製造方法所製造之多層印刷基板。 [10] An electrical and electronic device having a multilayer printed circuit board manufactured by the manufacturing method described in [9].

本發明之製程用離型膜,係實現「即使在以溫度、壓力等高於以往之條件之熱壓、或更長時間之熱壓等條件嚴苛之製程後,不使用離型劑等,並且不需要使用高價且加工困難之高熔點的工程塑膠等,即可容易且充分地從黑化處理銅箔等粗糙度高之金屬表面剝離」之以往技術所未能實現的具高實用價值之技術效果。 The release film for the manufacturing process of the present invention realizes "even after the hot pressing with higher temperature and pressure than the previous conditions, or hot pressing for a longer period of time, etc., without the use of release agents, etc., And without the need to use expensive and difficult-to-process high-melting engineering plastics, etc., it can be easily and fully peeled off from blackened copper foils and other high-roughness metal surfaces." It has a high practical value that cannot be achieved by the prior art. Technical effect.

本發明之使用製程用離型膜之製造方法,可以高自由度且生產性良好地製造多層印刷配線板等具有金屬/樹脂積層構造之電機電子零件。 The manufacturing method using the release film for the process of the present invention can manufacture electrical and electronic parts with a metal/resin laminated structure such as a multilayer printed wiring board with high degree of freedom and good productivity.

1、10‧‧‧玻璃纖維-環氧樹脂複合絕緣體 1, 10‧‧‧Glass fiber-epoxy resin composite insulator

2、3、7、9、11‧‧‧銅箔層 2, 3, 7, 9, 11‧‧‧Copper foil layer

4、5‧‧‧離型膜 4、5‧‧‧Release film

6、8‧‧‧接著預浸體 6, 8‧‧‧Next to prepreg

第1圖係銅箔層在玻璃纖維-環氧樹脂複合絕緣體之雙面積層並硬化之雙面敷銅積層板之示意剖面圖。 Figure 1 is a schematic cross-sectional view of a double-sided copper-clad laminate in which the copper foil is layered on a glass fiber-epoxy composite insulator and hardened.

第2圖係表示將接著預浸體與銅箔層積層在第1圖之雙面敷銅積層板,並在兩表面積層離型膜之狀態之示意剖面圖。 Figure 2 is a schematic cross-sectional view showing a state where the prepreg and copper foil are laminated on the double-sided copper-clad laminate of Figure 1, and the release film is layered on both surfaces.

第3圖係將第2圖之多層積層板加壓成形所得之多層積層板之示意剖面圖。 Fig. 3 is a schematic cross-sectional view of a multilayer laminate obtained by press-forming the multilayer laminate of Fig. 2.

第4圖係表示在第3圖之多層積層板積層接著預浸體與雙面敷銅積層板,並在兩表面積層離型膜之狀態之示意剖面圖。 Fig. 4 is a schematic cross-sectional view showing the state in which the prepreg and the double-sided copper-clad laminate are laminated on the multilayer laminate in Fig. 3, and the release film is laminated on both surface areas.

第5圖係將第4圖之多層積層板加壓成形所得之多層積層板之示意剖面圖。 Fig. 5 is a schematic cross-sectional view of a multilayer laminate obtained by press-forming the multilayer laminate of Fig. 4.

(製程用離型膜) (Release film for process)

本發明之製程用離型膜係含有熱塑性樹脂而成之膜,且其至少一面係具有在試驗溫度180℃以最大壓入負載2mN之奈米壓痕法所測定之膜復原性值R為70(%)以上之特性(特性(1))。 The release film for the process of the present invention is a film made of a thermoplastic resin, and at least one side of the film has a film restorability value R of 70 as measured by the nanoindentation method with a maximum indentation load of 2mN at a test temperature of 180°C (%) above characteristics (characteristic (1)).

藉由使膜復原性值R在上述範圍,從黑化處理銅箔等粗糙度高之金屬表面之剝離變容易,尤其是於以較高溫、高壓、及/或長時間與粗糙度高之金屬表面密接後之剝離變容易。因此,本發明之製程用離型膜,可特別適合用於製造具備具有粗糙度高的表面之金屬層之金屬/樹脂積層體,尤其適合用於製造具有經黑化處理、粗面化處理之銅箔層之多層印刷配線板。 By making the film recoverability value R within the above range, it is easier to peel off from the blackened copper foil and other metal surfaces with high roughness, especially for high temperature, high pressure, and/or long-term and high-roughness metals It becomes easy to peel off after the surface is closely adhered. Therefore, the release film for the process of the present invention can be particularly suitable for the production of metal/resin laminates with a metal layer with a high roughness surface, and is particularly suitable for the production of blackened and roughened products. Multilayer printed wiring board with copper foil layer.

膜復原性值R,係在測定溫度180℃,使用奈米壓痕機將稜間角115°之三角錐金剛石壓頭(Berkovich壓頭)以最大壓入負載2mN壓入膜測定面後卸除負載並進行測定,由 最大壓入負載(2mN)時之壓入深度與卸除負載後(0mN)之壓入深度之比,依下式而計算出。 The film restorability value R is measured at a temperature of 180°C, using a nanoindenter to press a triangular pyramid diamond indenter (Berkovich indenter) with an edge angle of 115° into the measuring surface of the film with a maximum indentation load of 2mN and then remove it. The load is measured and the ratio of the indentation depth at the maximum indentation load (2mN) to the indentation depth after the load is unloaded (0mN) is calculated according to the following formula.

膜復原性值R(%)=(卸除負載後之壓入深度/最大壓入負載時之壓入深度)×100 Film restorability value R(%)=(indentation depth after unloading/indentation depth at maximum indentation load)×100

藉由使膜復原性值R在上述範圍而從黑化處理銅箔表面等粗糙度高之金屬表面之剝離變得容易之機制雖然尚未明朗,且非意欲套用特定理論,但推定與下述者有所關聯:在較高溫、高壓、及/或以長時間與粗糙度高之金屬表面密接並熱壓時,追隨粗糙度高之金屬表面之凹凸圖案而變形之膜表面復原為更平滑之形狀,藉此而與金屬表面之密接有一部分解除。 The mechanism by which the film recoverability value R is within the above-mentioned range makes it easier to peel off from the surface of a metal surface with high roughness, such as a blackened copper foil surface. Although it is not yet clear, and it is not intended to apply a specific theory, it is estimated to be the same as the following Relevant: At higher temperature, high pressure, and/or long-term contact with high-roughness metal surface and hot pressing, the deformed film surface is restored to a smoother shape following the uneven pattern of the high-roughness metal surface , By this, a part of the close contact with the metal surface is released.

膜復原性值R更佳係73%以上,特佳係75%以上。 The film recovery value R is more preferably 73% or more, particularly preferably 75% or more.

從剝離性之觀點來看,膜復原性值R係以越高為越佳,於本發明中雖未特別存在上限,惟從加工性、操作等之觀點來看,較佳係90%以下,特佳係85%以下。 From the standpoint of releasability, the higher the film recovery value R is, the better. Although there is no particular upper limit in the present invention, from the standpoint of workability and handling, it is preferably 90% or less. Especially good line is below 85%.

用以將本發明之離型用膜的膜復原性值R設於上述範圍之樹脂之種類並無特別限定,可從聚酯樹脂、聚醯胺樹脂、含有源自四氟乙烯之構成單元之聚四氟乙烯和乙烯-四氟乙烯共聚物等氟樹脂、胺甲酸酯樹脂、聚苯乙烯樹脂等樹脂中適當地選擇並使用。又,亦可併用該等。 The type of resin used to set the film recovery value R of the release film of the present invention within the above-mentioned range is not particularly limited, and can be selected from polyester resins, polyamide resins, and those containing structural units derived from tetrafluoroethylene. Among resins such as fluororesins such as polytetrafluoroethylene and ethylene-tetrafluoroethylene copolymers, urethane resins, and polystyrene resins, they are appropriately selected and used. Moreover, these can also be used together.

又,可使用之樹脂,可為熱塑性樹脂,亦可使用熱硬化性樹脂和藉由施加紫外線、電子射線等活性能量射線而交聯之活性能量射線硬化性樹脂。 In addition, the usable resin may be a thermoplastic resin, or a thermosetting resin and an active energy ray curable resin that is crosslinked by applying active energy rays such as ultraviolet rays and electron rays.

若欲將本發明之離型用膜之膜復原性值R設為上述範 圍,可藉由下述方法而適當地調整:將前述樹脂高分子量化之方法、使樹脂膜中含有包含環氧基等反應基之交聯劑之方法、藉由延伸定向而使樹脂分子定向整齊之方法、對樹脂膜施以熱處理之方法等。本發明之離型用膜,用以達成該膜復原性值R之其他方法,可列舉例如:對膜表面施以摩擦處理等。欲藉由對離型用膜表面施以摩擦處理而達成前述表面硬度時,摩擦方法無特別限定,例如可使用已知之摩擦裝置。 If it is desired to set the film recoverability value R of the release film of the present invention within the above range, it can be appropriately adjusted by the following method: the method of polymerizing the aforementioned resin and making the resin film contain epoxy groups A method such as a crosslinking agent of a reactive group, a method of aligning the orientation of resin molecules by stretching and orientation, a method of applying heat treatment to the resin film, etc. For the release film of the present invention, other methods for achieving the recovery value R of the film include, for example, applying a rubbing treatment to the surface of the film. When it is desired to achieve the aforementioned surface hardness by applying a rubbing treatment to the surface of the release film, the rubbing method is not particularly limited. For example, a known rubbing device can be used.

本發明之製程用離型膜,較佳係其至少一面具有以試驗溫度180℃以最大壓入負載2mN之奈米壓痕法所測定之硬度H為40(MPa)以上之特性(特性(2))。 The release film used in the process of the present invention preferably has at least one side having a hardness H of 40 (MPa) or more as measured by the nanoindentation method with a test temperature of 180°C and a maximum indentation load of 2 mN (characteristic (2) )).

藉由使硬度H在上述範圍,從粗化處理銅箔表面等粗糙度高之金屬表面之剝離,尤其於較高溫、高壓、及/或長時間與粗糙度高之金屬表面密接後之剝離會變得更為容易。因此,本發明之製程用離型膜之具有上述(2)的特性之態樣,可更適合用於製造具有經黑化處理之銅箔層等粗糙度高之金屬表面之多層印刷配線板等。 By setting the hardness H in the above range, peeling from the roughened copper foil surface and other metal surfaces with high roughness, especially at higher temperature, high pressure, and/or after a long time contact with the metal surface with high roughness It becomes easier. Therefore, the release film of the present invention having the characteristics of (2) above can be more suitable for manufacturing multilayer printed wiring boards with blackened copper foil layers and other metal surfaces with high roughness. .

硬度H,係在測定溫度180℃,由使用奈米壓痕機將稜間角115°之三角錐金剛石壓頭(Berkovich壓頭)以最大壓入負載2mN壓入膜測定面後之卸除負載時之最大壓入負載(Fmax)、壓入深度(hc),依下式而計算出。 Hardness H is measured at a temperature of 180°C, using a nanoindenter to press a triangular pyramid diamond indenter (Berkovich indenter) with an edge angle of 115° into the measuring surface of the film with a maximum indentation load of 2mN, and then unload the load. The maximum press-in load (F max ) and press-in depth (h c ) at the time are calculated according to the following formula.

硬度H=Fmax/(23.96×hc 2) Hardness H=F max /(23.96×h c 2 )

藉由使硬度H在上述範圍而使從黑化處理銅箔表面等粗糙度高之金屬表面之剝離變得更容易之機制 雖然尚未明朗,且非意欲套用特定理論,但推定與下述者有所關聯:即使在以較高溫、高壓、及/或長時間與粗糙度高之金屬表面密接並熱壓時,硬度高之膜表面追隨粗糙度高之金屬表面之凹凸圖案而變形的程度小,與金屬表面之密接程度小。 The mechanism for making the hardness H within the above range makes it easier to peel off from the surface of the blackened copper foil and other metal surfaces with high roughness. Although it is not yet clear, and it is not intended to apply a specific theory, it is assumed to be related to the following Related: Even when the film surface with high hardness follows the uneven pattern of the metal surface with high roughness, the degree of deformation is small even when it is in close contact with the metal surface with high roughness at higher temperature, high pressure, and/or for a long time and hot pressing. The degree of close contact with the metal surface is small.

硬度H更佳係45MPa以上,特佳係55MPa以上。 The hardness H is more preferably 45MPa or more, particularly preferably 55MPa or more.

從剝離性之觀點來看,膜之硬度H以越高為越佳,本發明中雖未特別存在上限,但從加工性、操作等之觀點來看,較佳係130MPa以下,特佳係115MPa以下。 From the standpoint of peelability, the higher the hardness H of the film, the better. Although there is no particular upper limit in the present invention, from the standpoint of workability and handling, it is preferably 130 MPa or less, and particularly preferably 115 MPa the following.

若欲將本發明之離型用膜之硬度H設為上述範圍,可藉由下述方法而適當地調整:將前述樹脂高分子量化之方法、使樹脂膜中含有包含環氧基等反應基之交聯劑之方法、藉由延伸定向而使樹脂分子定向整齊之方法、對樹脂膜施以熱處理之方法等。 If the hardness H of the release film of the present invention is set to the above range, it can be appropriately adjusted by the following method: the method of polymerizing the aforementioned resin, and the resin film containing reactive groups such as epoxy groups The method of cross-linking agent, the method of aligning the orientation of resin molecules by stretching and the method, the method of applying heat treatment to the resin film, etc.

本發明之製程用離型膜之上述態樣中,較佳係具有上述(1)的特性之至少一面與具有上述(2)的特性之至少一面為同一面。亦即,本發明之上述態樣中,較佳係至少一面同時具有上述(1)的特性與上述(2)的特性。 In the above aspect of the release film for the process of the present invention, it is preferable that at least one side having the characteristics of (1) and at least one side having the characteristics of (2) be the same. That is, in the above aspect of the present invention, it is preferable that at least one side has both the above-mentioned (1) characteristic and the above-mentioned (2) characteristic.

藉由使該至少一面同時具有上述(1)的特性與上述(2)的特性,從粗糙度高之金屬表面之剝離變得更容易,故此種面特別適合使用在熱壓等時與如黑化處理銅箔等所謂的表面粗糙度高之金屬表面接觸。 By making the at least one surface have both the characteristics of (1) and the characteristics of (2) above, it becomes easier to peel from the metal surface with high roughness, so this kind of surface is particularly suitable for use in hot pressing and the like. Chemical treatment of copper foil and other so-called metal surface contact with high surface roughness.

本發明之製程用離型膜,較佳係其至少一面(較佳係具有上述(1)的特性之至少一面)之對水的接觸角 為90°至130°。藉由具有此種接觸角,此態樣之製程用離型膜之潤濕性低,從粗糙度高之金屬表面之剝離性優異,尤其從經黑化處理之銅箔表面之剝離性優異,可使多層印刷配線板等成形品之熱壓後之離型更容易。 The release film for the process of the present invention preferably has at least one side (preferably at least one side having the characteristics of (1) above) with a contact angle of 90° to 130° with water. By having such a contact angle, the release film of this aspect has low wettability and excellent peelability from the metal surface with high roughness, especially from the surface of the blackened copper foil. It makes it easier to release molded products such as multilayer printed wiring boards after hot pressing.

上述至少一面之對水的接觸角較佳係95°至120°,更佳係98°至115°,再更佳係100°至110°。 The contact angle of at least one surface to water is preferably 95° to 120°, more preferably 98° to 115°, and still more preferably 100° to 110°.

又,本發明之製程用離型膜,較佳係其在120℃之拉伸彈性模數為75MPa至500MPa、或其在170℃之拉伸彈性模數為75MPa至500MPa。再者,本發明之製程用離型膜,較佳係在120℃之拉伸彈性模數為75MPa至500MPa,且在170℃之拉伸彈性模數為75MPa至500MPa。 In addition, the release film for the manufacturing process of the present invention preferably has a tensile elastic modulus of 75 MPa to 500 MPa at 120°C, or a tensile elastic modulus of 75 MPa to 500 MPa at 170°C. Furthermore, the release film for the manufacturing process of the present invention preferably has a tensile modulus of 75 MPa to 500 MPa at 120°C and a tensile modulus of 75 MPa to 500 MPa at 170°C.

藉由在120℃之拉伸彈性模數為75MPa至500MPa、或在170℃之拉伸彈性模數為75MPa至500MPa,可有效地抑制於熱壓步驟等之中產生皺褶。 By having a tensile elastic modulus of 75 MPa to 500 MPa at 120° C., or a tensile elastic modulus of 75 MPa to 500 MPa at 170° C., wrinkles can be effectively suppressed during the hot pressing step.

本實施形態之製程用離型膜,較佳係在120℃之拉伸彈性模數為80MPa至400MPa,更佳係85MPa至350MPa,再更佳係88MPa至300MPa,特佳係90MPa至280MPa。 The release film for the manufacturing process of this embodiment preferably has a tensile elastic modulus at 120°C of 80 MPa to 400 MPa, more preferably 85 MPa to 350 MPa, still more preferably 88 MPa to 300 MPa, particularly preferably 90 MPa to 280 MPa.

本實施形態之製程用離型膜,較佳係在170℃之拉伸彈性模數為80MPa至400MPa,更佳係85MPa至350MPa,更佳係88MPa至300MPa,更佳係90MPa至280MPa,再更佳係95MPa至200MPa,特佳係105MPa至170MPa。 The release film for the process of this embodiment preferably has a tensile elastic modulus at 170°C of 80 MPa to 400 MPa, more preferably 85 MPa to 350 MPa, more preferably 88 MPa to 300 MPa, more preferably 90 MPa to 280 MPa, and more The best range is from 95MPa to 200MPa, and the particularly best range is from 105MPa to 170MPa.

由於加工時之自由度及用途會變廣,故本實施形態之製程用離型膜特佳係在120℃之拉伸彈性模數、及在170 ℃之拉伸彈性模數皆在上述較佳範圍內。 Since the degree of freedom and use during processing will become wider, the release film for the manufacturing process of this embodiment is particularly preferred to have a tensile modulus of elasticity at 120°C and a tensile modulus of elasticity at 170°C. Within range.

而且,本發明之製程用離型膜,較佳係其TD方向(橫方向)之23℃至120℃之熱尺寸變化率為3%以下,或其TD方向(橫方向)之23℃至170℃之熱尺寸變化率為4%以下。再者,更佳係TD方向(橫方向)之23℃至120℃之熱尺寸變化率為3%以下且TD方向(橫方向)之23℃至170℃之熱尺寸變化率為4%以下。 Moreover, the release film for the process of the present invention preferably has a thermal dimensional change rate of 23°C to 120°C in the TD direction (horizontal direction) of 3% or less, or 23°C to 170 in the TD direction (horizontal direction) The thermal dimensional change rate at ℃ is below 4%. Furthermore, it is more preferable that the thermal dimensional change rate from 23°C to 120°C in the TD direction (horizontal direction) is 3% or less, and the thermal dimensional change rate from 23°C to 170°C in the TD direction (horizontal direction) is 4% or less.

藉由使TD方向(橫方向)之23℃至120℃之熱尺寸變化率為3%以下、或TD方向(橫方向)之23℃至170℃之熱尺寸變化率為4%以下,可更有效地抑制於熱壓步驟等之中產生皺褶。此實施形態中,藉由使用橫(TD)方向之熱尺寸變化率呈上述特定值者而更有效地抑制皺褶的產生之機制雖然尚未明朗,但推定與下述有所關聯:藉由使用熱膨張/收縮較小的膜,因製程時之加熱/冷卻所致之製程用離型膜之熱膨張/收縮係受到抑制。 The thermal dimensional change rate from 23°C to 120°C in the TD direction (horizontal direction) is 3% or less, or the thermal dimensional change rate from 23°C to 170°C in the TD direction (horizontal direction) is 4% or less. Effectively suppress wrinkles during the hot pressing step. In this embodiment, the mechanism for more effectively suppressing the generation of wrinkles by using the thermal dimensional change rate in the transverse (TD) direction at the above-mentioned specific value is not yet clear, but it is presumed to be related to the following: For films with small thermal expansion/shrinkage, the thermal expansion/shrinkage of the release film for the process caused by heating/cooling during the process is suppressed.

本實施形態之製程用離型膜,較佳係其TD方向(橫方向)之23℃至120℃之熱尺寸變化率為2.5%以下,更佳係2.0%以下,再更佳係1.5%以下。另一方面,較佳係其TD方向(橫方向)之23℃至120℃之熱尺寸變化率為-5.0%以上。 For the release film of this embodiment, the thermal dimensional change rate from 23°C to 120°C in the TD direction (transverse direction) is preferably 2.5% or less, more preferably 2.0% or less, and even more preferably 1.5% or less . On the other hand, the thermal dimensional change rate from 23°C to 120°C in the TD direction (transverse direction) is preferably -5.0% or more.

本實施形態之製程用離型膜,較佳係其TD方向(橫方向)之23℃至170℃之熱尺寸變化率為3.5%以下,更佳係3.0%以下,再更佳係2.0%以下。另一方面,較佳係其TD方向(橫方向)之23℃至170℃之熱尺寸變化率為-5.0%以 上。 The release film for the process of this embodiment preferably has a thermal dimensional change rate from 23°C to 170°C in the TD direction (transverse direction) of 3.5% or less, more preferably 3.0% or less, and even more preferably 2.0% or less . On the other hand, it is preferable that the thermal dimensional change rate of 23°C to 170°C in the TD direction (transverse direction) is -5.0% or more.

本發明之製程用離型膜,較佳係其TD方向(橫方向)之熱尺寸變化率與MD方向(製造膜時之長度方向。以下,亦稱為「縱方向」)之熱尺寸變化率的和為特定值以下。 The release film for the process of the present invention preferably has a thermal dimensional change rate in the TD direction (transverse direction) and a thermal dimensional change rate in the MD direction (the longitudinal direction when the film is manufactured. Hereinafter, also referred to as "longitudinal direction") The sum is below the specified value.

亦即,上述製程用離型膜之橫(TD)方向之23℃至120℃之熱尺寸變化率與縱(MD)方向之23℃至120℃之熱尺寸變化率的和,較佳係6%以下;另一方面,其TD方向(橫方向)之23℃至120℃之熱尺寸變化率與縱(MD)方向之23℃至120℃之熱尺寸變化率的和,較佳係-5.0%以上。 That is, the sum of the thermal dimensional change rate of 23°C to 120°C in the transverse (TD) direction and the thermal dimensional change rate of 23°C to 120°C in the longitudinal (MD) direction of the release film for the above process is preferably 6 % Or less; On the other hand, the sum of the thermal dimensional change rate from 23°C to 120°C in the TD direction (transverse direction) and the thermal dimensional change rate from 23°C to 120°C in the longitudinal (MD) direction is preferably -5.0 %the above.

本實施形態之製程用離型膜,藉由使橫(TD)方向之23℃至120℃之熱尺寸變化率與縱(MD)方向之23℃至120℃之熱尺寸變化率的和為6%以下,可更有效地抑制熱壓步驟等中之皺褶的產生。 In the release film for the manufacturing process of this embodiment, the sum of the thermal dimensional change rate from 23°C to 120°C in the transverse (TD) direction and the thermal dimensional change rate from 23°C to 120°C in the longitudinal (MD) direction is 6 % Or less, can more effectively suppress the generation of wrinkles in the hot pressing step, etc.

又,本發明之製程用離型膜之橫(TD)方向之23℃至170℃之熱尺寸變化率與縱(MD)方向之23℃至170℃之熱尺寸變化率的和,較佳係7%以下;另一方面,其TD方向(橫方向)之23℃至170℃之熱尺寸變化率與縱(MD)方向之23℃至170℃之熱尺寸變化率的和較佳係-5.0%以上。 In addition, the thermal dimensional change rate of 23°C to 170°C in the transverse (TD) direction and the thermal dimensional change rate of 23°C to 170°C in the longitudinal (MD) direction of the release film of the present invention is preferably 7% or less; on the other hand, the sum of the thermal dimensional change rate of 23°C to 170°C in the TD direction (transverse direction) and the thermal dimensional change rate of 23°C to 170°C in the longitudinal (MD) direction is preferably -5.0 %the above.

本實施形態之製程用離型膜,藉由使橫(TD)方向之23℃至170℃之熱尺寸變化率與縱(MD)方向之23℃至170℃之熱尺寸變化率的和為7%以下,可更有效地抑制熱壓步驟等中之皺褶的產生。 In the release film for the process of this embodiment, the sum of the thermal dimensional change rate from 23°C to 170°C in the transverse (TD) direction and the thermal dimensional change rate from 23°C to 170°C in the longitudinal (MD) direction is 7 % Or less, can more effectively suppress the generation of wrinkles in the hot pressing step, etc.

本發明之製程用離型膜之厚度,只要在可製成膜且可使用作為離型膜之範圍即無特別限定,惟通常係5至150μm,較佳係15至100μm,更佳係25至80μm。 The thickness of the release film for the process of the present invention is not particularly limited as long as it can be made into a film and can be used as a release film, but it is usually 5 to 150 μm, preferably 15 to 100 μm, and more preferably 25 to 80μm.

本發明之製程用離型膜之上述至少一面,只要滿足特性(1)在試驗溫度180℃以奈米壓痕法所測定之膜復原性值R為R≧70(%)即可,其材質等並無特別限制,惟從可較容易且廉價地實現適當的膜復原性值R而言,宜為含聚酯樹脂及/或聚醯胺樹脂者。 The above-mentioned at least one side of the release film for the process of the present invention, as long as it satisfies the characteristics (1) The film recovery value R measured by the nanoindentation method at a test temperature of 180°C is R≧70(%), and its material There are no particular restrictions on the like, but it is preferably one containing polyester resin and/or polyamide resin in terms of achieving an appropriate film recovery property value R easily and inexpensively.

(聚酯樹脂) (polyester resin)

本發明中,較佳可用之聚酯樹脂,可為同元聚酯,亦可為共聚合聚酯。使用同元聚酯時,較佳係使芳香族二羧酸與脂肪族二醇聚縮合所得者。就芳香族二羧酸而言,可列舉對苯二甲酸、2,6-萘二羧酸等。就脂肪族二醇而言,可列舉乙二醇、二乙二醇、1,4-環己烷二甲醇等。就代表性聚酯而言,可例示如聚對苯二甲酸乙二酯(PET)、聚對苯二甲酸丁二酯(PBT)等。另一方面,就共聚合聚酯所用之二羧酸成分而言,可列舉間苯二甲酸、鄰苯二甲酸、對苯二甲酸、2,6-萘二羧酸、己二酸、癸二酸、羥基羧酸(例如,對羥苯甲酸等)等之一種或二種以上。就二醇成分而言,可列舉乙二醇、二乙二醇、丙二醇、丁烷二醇、1,4-環己烷二甲醇、新戊二醇等之一種或二種以上。 In the present invention, the preferably usable polyester resin may be a homopolyester or a copolymerized polyester. When a homopolyester is used, it is preferably obtained by polycondensation of an aromatic dicarboxylic acid and an aliphatic diol. Examples of aromatic dicarboxylic acids include terephthalic acid and 2,6-naphthalene dicarboxylic acid. As for the aliphatic diol, ethylene glycol, diethylene glycol, 1,4-cyclohexanedimethanol, and the like can be mentioned. As for the representative polyester, polyethylene terephthalate (PET), polybutylene terephthalate (PBT), etc. can be exemplified. On the other hand, the dicarboxylic acid component used in the copolymerized polyester includes isophthalic acid, phthalic acid, terephthalic acid, 2,6-naphthalenedicarboxylic acid, adipic acid, sebacic acid, One or two or more of acids, hydroxycarboxylic acids (for example, p-hydroxybenzoic acid, etc.). The glycol component includes one or two or more of ethylene glycol, diethylene glycol, propylene glycol, butanediol, 1,4-cyclohexanedimethanol, neopentyl glycol, and the like.

本發明中較佳可用之聚酯,可為由熔融聚合反應所得者,惟因為可減少原料中所含之寡聚物量,故 以使用在熔融聚合後將經碎片(chip)化之聚酯進行固相聚合而得之原料為特佳。 The polyester that can be preferably used in the present invention can be obtained by melt polymerization. However, since the amount of oligomers contained in the raw material can be reduced, the polyester that is chipped after melt polymerization is used for the process. The raw material obtained by solid phase polymerization is particularly good.

聚酯中所含之寡聚物量較佳係0.7重量%以下,更佳係0.5重量%以下。該聚酯之寡聚物量少時,能特別高度地減少本發明之製程用離型膜中所含之寡聚物量,甚至於能特別高度地發揮防止寡聚物析出至膜表面之效果。 The amount of oligomer contained in the polyester is preferably 0.7% by weight or less, more preferably 0.5% by weight or less. When the amount of oligomers of the polyester is small, the amount of oligomers contained in the release film for the process of the present invention can be reduced to a particularly high degree, and even the effect of preventing the precipitation of oligomers on the surface of the film can be exerted to a particularly high degree.

製程用離型膜含有聚酯樹脂之態樣中,可以賦予易滑性為主要目的而在含聚酯樹脂之層中調配粒子。調配之粒子之種類,只要為可賦予易滑性之粒子即無特別限定,就具體例而言,可列舉例如:氧化矽、碳酸鈣、碳酸鎂、碳酸鋇、硫酸鈣、磷酸鈣、磷酸鎂、高嶺土、氧化鋁、氧化鈦等之粒子。又,亦可使用日本特公昭59-5216號公報、日本特開昭59-217755號公報等所記載之耐熱性有機粒子。其他耐熱性有機粒子之例,可列舉熱硬化性尿素樹脂、熱硬化性酚樹脂、熱硬化性環氧樹脂、苯并胍胺(benzoguanamine)樹脂等。進一步,在聚酯製造步驟中,亦可使用使觸媒等金屬化合物之一部分沉澱、微分散之析出粒子。 In the case where the release film for the process contains polyester resin, the main purpose is to impart slipperiness, and particles can be blended in the polyester resin-containing layer. The type of particles to be formulated is not particularly limited as long as they are particles that can impart slipperiness. Specific examples include silica, calcium carbonate, magnesium carbonate, barium carbonate, calcium sulfate, calcium phosphate, and magnesium phosphate. , Kaolin, alumina, titanium oxide and other particles. In addition, heat-resistant organic particles described in Japanese Patent Publication No. 59-5216 and Japanese Patent Application Publication No. 59-217755 may also be used. Examples of other heat-resistant organic particles include thermosetting urea resin, thermosetting phenol resin, thermosetting epoxy resin, and benzoguanamine resin. Furthermore, in the polyester manufacturing step, it is also possible to use precipitated particles that partially precipitate and finely disperse a part of a metal compound such as a catalyst.

另一方面,關於使用之粒子之形狀亦無特別限定,可使用球狀、塊狀、棒狀、扁平狀等中之任一種。又,針對其硬度、比重、顏色等亦無特別限制。此等一系列之粒子可因應需要而併用2種以上。 On the other hand, there is no particular limitation on the shape of the particles used, and any of spherical, massive, rod-shaped, flat-shaped, etc. can be used. In addition, there are no particular restrictions on its hardness, specific gravity, color, etc. These series of particles can be used in combination with more than two types according to needs.

又,使用之粒子之平均粒徑通常係0.01至3μm,較佳係0.01至1μm之範圍。平均粒徑為0.01μm以上時, 粒子凝集受到抑制,可容易實現充分的分散性;另一方面,為3μm以下時,膜之表面粗糙度被抑制在實用上適合的一定限度內。 In addition, the average particle size of the particles used is usually 0.01 to 3 μm, preferably 0.01 to 1 μm. When the average particle size is 0.01 μm or more, particle aggregation is suppressed, and sufficient dispersibility can be easily achieved; on the other hand, when the average particle size is 3 μm or less, the surface roughness of the film is suppressed within a certain practical limit.

再者,聚酯層中之粒子含量通常係0.001至5重量%,較佳係0.005至3重量%之範圍。粒子含量為0.001重量%以上時,膜的易滑性充分,另一方面,粒子含量為5重量%以下時,確保充分的膜之透明性。 Furthermore, the content of particles in the polyester layer is usually 0.001 to 5% by weight, preferably in the range of 0.005 to 3% by weight. When the particle content is 0.001% by weight or more, the smoothness of the film is sufficient. On the other hand, when the particle content is 5% by weight or less, sufficient transparency of the film is ensured.

就在聚酯層中添加粒子之方法而言,無特別限定,可採用以往公知之方法。例如,可在任意階段添加製造構成各層之聚酯,但較佳係可在酯化階段、或酯交換反應結束後,進行聚縮合反應。 The method of adding particles to the polyester layer is not particularly limited, and conventionally known methods can be adopted. For example, the polyester constituting each layer can be added at any stage, but it is preferable to perform the polycondensation reaction in the esterification stage or after the transesterification reaction is completed.

又,可使用附通氣孔(vent)之混練擠製機,摻合經分散於乙二醇或水等中之粒子的漿體與聚酯原料之方法,或者使用混練擠製機,摻合經乾燥的粒子與聚酯原料之方法等而進行。 In addition, a kneading extruder with vents can be used to blend the slurry of particles dispersed in ethylene glycol or water with polyester raw materials, or a kneading extruder can be used to blend the material. Dry the particles and polyester raw materials.

(聚醯胺樹脂) (Polyamide resin)

本發明中,較佳可用之聚醯胺樹脂可為脂肪族聚醯胺樹脂,亦可為芳香族聚醯胺樹脂,惟更佳係脂肪族聚醯胺樹脂。 In the present invention, the preferably usable polyamide resin may be an aliphatic polyamide resin or an aromatic polyamide resin, but more preferably an aliphatic polyamide resin.

脂肪族聚醯胺樹脂可藉由內醯胺之開環聚合;脂肪族二胺成分與脂肪族二羧酸成分之聚縮合反應;脂肪族胺基羧酸之聚縮合等而製造。 Aliphatic polyamide resins can be produced by ring-opening polymerization of internal amines; polycondensation reaction of aliphatic diamine components and aliphatic dicarboxylic acid components; polycondensation of aliphatic amino carboxylic acids, etc.

將內醯胺開環聚合所得之脂肪族聚醯胺之 例,包括聚醯胺6、聚醯胺11、聚醯胺12及聚醯胺612等。脂肪族二胺成分與脂肪族二羧酸成分之聚縮合所得之脂肪族聚醯胺之例,包含聚醯胺66、聚醯胺610、聚醯胺46、聚醯胺MXD6、聚醯胺6T、聚醯胺6I及聚醯胺9T等。 Examples of aliphatic polyamides obtained by ring-opening polymerization of internal amides include polyamide 6, polyamide 11, polyamide 12, and polyamide 612. Examples of aliphatic polyamides obtained by polycondensation of aliphatic diamine components and aliphatic dicarboxylic acid components include polyamide 66, polyamide 610, polyamide 46, polyamide MXD6, and polyamide 6T , Polyamide 6I and Polyamide 9T, etc.

其中,較佳係聚醯胺6或聚醯胺66;更佳係聚醯胺66。此係因該等聚醯胺可較容易實現上述特性(1)、為高熔點且高彈性模數、耐熱性及機械特性優異之故。又,因為與其他層之接著性較良好,故構成積層膜時亦有利。 Among them, polyamide 6 or polyamide 66 is preferred; polyamide 66 is more preferred. This is because these polyamides can easily achieve the above-mentioned property (1), have a high melting point, a high modulus of elasticity, and are excellent in heat resistance and mechanical properties. In addition, since the adhesion to other layers is relatively good, it is also advantageous when forming a laminated film.

使用高熔點且高彈性模數、耐熱性及機械特性優異之聚醯胺之膜,因能有效抑制皺褶、破裂等,故從使成形品、壓製裝置保持潔淨之觀點來看,亦為適合。 The use of polyamide film with high melting point, high elastic modulus, excellent heat resistance and mechanical properties, can effectively suppress wrinkles, cracks, etc., so it is also suitable from the viewpoint of keeping the molded product and pressing equipment clean .

脂肪族聚醯胺之以DSC法所測定之熔點,較佳係190℃以上。藉由具有190℃以上之熔點,即使在供給至較高溫之熱壓等製程時,仍可有效抑制皺摺。 The melting point of the aliphatic polyamide measured by the DSC method is preferably 190°C or higher. By having a melting point above 190°C, it can effectively suppress wrinkles even when supplied to processes such as hot pressing at a higher temperature.

(其他樹脂) (Other resins)

上述聚酯樹脂或聚醯胺樹脂,可更含有聚酯樹脂或聚醯胺樹脂以外之其他樹脂。其他樹脂之較佳例,包括:對於在高溫之拉伸應力和壓縮應力之耐潛變性優異之耐熱彈性體、不易應力鬆弛且彈性恢復性高之耐熱彈性體等。 The aforementioned polyester resin or polyamide resin may further contain other resins than polyester resin or polyamide resin. Preferable examples of other resins include: heat-resistant elastomers with excellent creep resistance to tensile stress and compressive stress at high temperatures, heat-resistant elastomers that are resistant to stress relaxation and have high elastic recovery.

就此種耐熱彈性體而言,若考慮到與聚酯樹脂或聚醯胺樹脂之親和性,較佳係熱塑性聚醯胺系彈性體、熱塑性聚酯系彈性體等。 With regard to such heat-resistant elastomers, in consideration of affinity with polyester resins or polyamide resins, thermoplastic polyamide-based elastomers, thermoplastic polyester-based elastomers, and the like are preferred.

熱塑性聚醯胺系彈性體之例,包括:將聚醯胺作為硬鏈段且將聚酯或聚醚作為軟鏈段之嵌段共聚物。構成硬鏈段之聚醯胺之例,包括:聚醯胺6、聚醯胺66、聚醯胺610、聚醯胺612、聚醯胺11等。構成軟鏈段之聚醚之例,包括:聚乙二醇(PEG)、聚丙二醇(PPG)、聚四亞甲基二醇(PTMG)等。 Examples of thermoplastic polyamide-based elastomers include block copolymers in which polyamide is used as the hard segment and polyester or polyether is used as the soft segment. Examples of the polyamide constituting the hard segment include: polyamide 6, polyamide 66, polyamide 610, polyamide 612, polyamide 11, and the like. Examples of the polyether constituting the soft segment include: polyethylene glycol (PEG), polypropylene glycol (PPG), polytetramethylene glycol (PTMG), and the like.

熱塑性聚酯系彈性體之例,包括:將由結晶性芳香族聚酯單元所成之結晶性聚合物作為硬鏈段、且將由聚醚單元或脂肪族聚酯單元所成之非晶性聚合物作為軟鏈段之嵌段共聚物。構成硬鏈段之由結晶性芳香族聚酯單元所成之結晶性聚合物之例,包括:聚對苯二甲酸丁二酯(PBT)、聚萘二甲酸丁二酯(PBN)等。構成軟鏈段之由聚醚單元所成之非晶性聚合物之例,包含聚四亞甲基醚二醇(PTMG)等。構成軟鏈段之由脂肪族聚酯單元所成之非晶性聚合物之例,包括:聚己內酯(PCL)等脂肪族聚酯。 Examples of thermoplastic polyester elastomers include: crystalline polymers composed of crystalline aromatic polyester units as hard segments, and amorphous polymers composed of polyether units or aliphatic polyester units As a soft segment block copolymer. Examples of crystalline polymers composed of crystalline aromatic polyester units constituting the hard segment include: polybutylene terephthalate (PBT), polybutylene naphthalate (PBN), and the like. Examples of amorphous polymers composed of polyether units constituting the soft segment include polytetramethylene ether glycol (PTMG) and the like. Examples of amorphous polymers composed of aliphatic polyester units constituting the soft segment include aliphatic polyesters such as polycaprolactone (PCL).

熱塑性聚酯系彈性體之具體例,包含:聚對苯二甲酸丁二酯(PBT)與聚四亞甲基醚二醇(PTMG)之嵌段共聚物;聚對苯二甲酸丁二酯(PBT)與聚己內酯(PCL)之嵌段共聚物;聚萘二甲酸丁二酯(PBN)與脂肪族聚酯之嵌段共聚物等。 Specific examples of thermoplastic polyester elastomers include: a block copolymer of polybutylene terephthalate (PBT) and polytetramethylene ether glycol (PTMG); polybutylene terephthalate ( PBT) and polycaprolactone (PCL) block copolymer; polybutylene naphthalate (PBN) and aliphatic polyester block copolymer, etc.

熱塑性聚醯胺系彈性體及熱塑性聚酯系彈性體之以DSC法所測定之熔點較佳係190℃以上。再者,即使熱塑性彈性體之熔點未達190℃,仍可藉由交聯劑和交聯助劑而使熱塑性彈性體化學交聯,或者以紫外線和電 子射線、伽瑪射線等使熱塑性彈性體物理交聯,而提升在高溫之耐潛變性、彈性恢復性。 The melting point of the thermoplastic polyamide-based elastomer and the thermoplastic polyester-based elastomer as measured by the DSC method is preferably 190°C or higher. Furthermore, even if the melting point of the thermoplastic elastomer does not reach 190°C, the thermoplastic elastomer can still be chemically crosslinked by crosslinking agents and crosslinking aids, or the thermoplastic elastomer can be chemically crosslinked by ultraviolet rays, electron rays, gamma rays, etc. Physically cross-link to improve creep resistance and elastic recovery at high temperatures.

上述聚酯樹脂或聚醯胺樹脂,可在不損及本發明目的之範圍,進一步含有公知之添加劑。添加劑,可為例如:抗靜電劑、抗氧化劑、含有例如銅化合物系之耐熱安定劑、例如硬脂酸鈣及硬脂酸鋁等滑動劑、熱安定劑、潤滑劑、染料、顏料等公知之添加劑中之任一種或該等之組合。 The above-mentioned polyester resin or polyamide resin may further contain well-known additives within a range that does not impair the purpose of the present invention. The additives may be, for example, antistatic agents, antioxidants, heat-resistant stabilizers containing, for example, copper compounds, sliding agents such as calcium stearate and aluminum stearate, heat stabilizers, lubricants, dyes, pigments, etc. Any one or combination of additives.

(聚酯膜層、及聚醯胺膜層) (Polyester film layer, and polyamide film layer)

本發明中,較佳可用之上述聚酯樹脂或聚醯胺樹脂通常係以延伸或無延伸之膜之形態使用。亦即,本發明之製程用離型膜,較佳係具有延伸或無延伸之聚酯膜層、或者延伸或無延伸之聚醯胺膜層。 In the present invention, the above-mentioned polyester resin or polyamide resin preferably usable is usually used in the form of a stretched or unstretched film. That is, the release film for the process of the present invention preferably has an extended or non-extended polyester film layer, or an extended or non-extended polyamide film layer.

適合構成本發明之製程用離型膜之全部或一部分的聚酯膜層之厚度,只要為可製成膜之範圍即無特別限定,但通常係12至250μm,較佳係25至188μm,更佳係38至125μm之範圍。屬於延伸聚酯膜時,較佳係3至50μm,更佳係5至35μm,又更佳係7至20μm。又,屬於無延伸聚酯膜時,較佳係5至80μm,更佳係8至50μm,特佳係10至35μm。 The thickness of the polyester film layer suitable for forming all or part of the release film for the process of the present invention is not particularly limited as long as it is within the range that can be made into a film, but it is usually 12 to 250 μm, preferably 25 to 188 μm, and more Preferably it is in the range of 38 to 125μm. In the case of a stretched polyester film, it is preferably 3 to 50 μm, more preferably 5 to 35 μm, and still more preferably 7 to 20 μm. In the case of a non-stretched polyester film, it is preferably 5 to 80 μm, more preferably 8 to 50 μm, and particularly preferably 10 to 35 μm.

上述聚酯膜之製造方法無特別限制,可由以往公知之方法而適當地製造,惟屬於延伸聚酯膜時,較佳係例如依據以下記載之指引而製造。 The manufacturing method of the said polyester film is not specifically limited, It can manufacture suitably by a conventionally well-known method, However, when it is a stretched polyester film, it is preferable to manufacture it according to the guidelines described below, for example.

首先,較佳係使用先前所述之聚酯樹脂,將從模具擠壓出之熔融薄片以冷卻輥冷卻固化而得到未延伸薄片之方法。此時,為了提升薄片之平面性,需提高薄片與旋轉冷卻滾筒之密接性,較佳係採用施加靜電密接法及/或液體塗佈密接法。繼而,所得之未延伸薄片較佳係於雙軸方向延伸。逐次雙軸延伸時,係將前述未延伸薄片先於一方向以輥或拉幅式延伸機延伸。延伸溫度通常係70至120℃,較佳係80至110℃,延伸倍率通常係2.5至7倍,較佳係3.0至6倍。再來,可於與第一階段之延伸方向直交的方向延伸。延伸溫度通常係70至170℃,延伸倍率通常係3.0至7倍,較佳係3.5至6倍。然後,繼續在180至270℃之溫度且於緊繃下或於30%以內之鬆弛下進行熱處理,得到雙軸定向膜。上述延伸中,可採用以2個階段以上進行一方向之延伸之方法。此時,較佳係以使兩方向之延伸倍率最終分別成為上述範圍之方式進行。 First of all, it is preferable to use the polyester resin described above, and the molten sheet extruded from the mold is cooled and solidified by a cooling roll to obtain an unstretched sheet. At this time, in order to improve the flatness of the sheet, it is necessary to improve the adhesion between the sheet and the rotating cooling drum, and it is preferable to adopt an electrostatic adhesion method and/or a liquid coating adhesion method. Then, the resulting unstretched sheet is preferably stretched in a biaxial direction. In the successive biaxial stretching, the unstretched sheet is stretched in one direction by a roll or a tenter stretcher. The stretching temperature is usually 70 to 120°C, preferably 80 to 110°C, and the stretching ratio is usually 2.5 to 7 times, preferably 3.0 to 6 times. Furthermore, it can extend in a direction perpendicular to the extension direction of the first stage. The stretching temperature is usually 70 to 170°C, and the stretching ratio is usually 3.0 to 7 times, preferably 3.5 to 6 times. Then, continue the heat treatment at a temperature of 180 to 270°C and under tension or under 30% relaxation to obtain a biaxially oriented film. In the above-mentioned stretching, a method of stretching in one direction in two or more stages can be used. At this time, it is preferable to perform so that the stretching magnifications in the two directions finally fall into the above-mentioned ranges.

又,關於本實施態樣中之聚酯膜製造,亦可採用同時雙軸延伸法。同時雙軸延伸法係將前述未延伸薄片在溫度調控通常為70至120℃、較佳為80至110℃之狀態下同時於機械方向及寬度方向延伸並定向之方法,就延伸倍率而言,通常以面積倍率計為4至50倍,較佳係7至35倍,再更佳係10至25倍。然後,繼續在170至250℃之溫度且於緊繃下或於30%以內之鬆弛下進行熱處理,得到延伸定向膜。關於採用上述延伸方式之同時雙軸延伸裝置,可適當地採用螺桿(screw)方式、縮放儀(pantograph) 方式、線性驅動方式等以往公知之延伸方式。 In addition, regarding the production of the polyester film in this embodiment, the simultaneous biaxial stretching method may also be used. At the same time, the biaxial stretching method is a method in which the aforementioned unstretched sheet is stretched and oriented in the machine direction and the width direction at the same time under a temperature control of usually 70 to 120°C, preferably 80 to 110°C. In terms of stretching magnification, The area magnification is usually 4 to 50 times, preferably 7 to 35 times, and more preferably 10 to 25 times. Then, continue to heat treatment at a temperature of 170 to 250° C. under tension or under 30% relaxation to obtain a stretched oriented film. Regarding the simultaneous biaxial stretching device using the aforementioned stretching method, conventionally known stretching methods such as a screw method, a pantograph method, and a linear drive method can be suitably used.

再者,上述聚酯膜層具有設置在其表面之塗佈層時,上述聚酯膜之延伸步驟中可施以處理膜表面之所謂的塗佈延伸法(產線內塗佈(inline coating))。藉由塗佈延伸法在聚酯膜上設置塗佈層時,可與延伸同時塗佈,且可將塗佈層厚度因應延伸倍率而變薄,可有效率地製造具有所期望之塗佈層之聚酯膜層。 Furthermore, when the polyester film layer has a coating layer provided on its surface, the stretching step of the polyester film may be performed by a so-called coating stretching method (inline coating) that treats the surface of the film. ). When the coating layer is provided on the polyester film by the coating stretching method, the coating can be applied at the same time as the stretching, and the thickness of the coating layer can be thinned according to the stretching ratio, and the desired coating layer can be produced efficiently The polyester film layer.

適合構成全部或一部分的本發明之製程用離型膜之聚醯胺膜之厚度,只要為可製成膜之範圍即無特別限定,惟通常係12至250μm,較佳係25至188μm,更佳係38至125μm之範圍。屬於延伸聚醯胺膜時,較佳係3至50μm,更佳係5至35μm,又更佳係7至20μm。又,屬於無延伸聚醯胺膜時,較佳係5至80μm,更佳係8至50μm,特佳係10至35μm。 The thickness of the polyamide film suitable for forming all or part of the release film for the process of the present invention is not particularly limited as long as the film can be formed, but it is usually 12 to 250 μm, preferably 25 to 188 μm, and more Preferably it is in the range of 38 to 125μm. In the case of a stretched polyamide film, it is preferably 3 to 50 μm, more preferably 5 to 35 μm, and still more preferably 7 to 20 μm. In addition, in the case of a non-extended polyamide film, it is preferably 5 to 80 μm, more preferably 8 to 50 μm, and particularly preferably 10 to 35 μm.

上述聚醯胺膜之製造方法無特別限制,可由以往公知之方法而適當地製造,屬於延伸聚醯胺膜時,較佳係例如依據以下記載而製造。 The manufacturing method of the above-mentioned polyamide film is not particularly limited, and can be suitably manufactured by a conventionally known method. In the case of a stretched polyamide film, it is preferably manufactured according to the following description, for example.

延伸聚醯胺膜,可藉由例如將聚醯胺樹脂擠壓出並成形為膜狀(原胚膜)後,進行延伸而得到。將聚醯胺樹脂擠壓出時,可將聚醯胺樹脂單獨擠壓出,亦可將聚醯胺樹脂與其他樹脂例如熱塑性聚醯胺系彈性體進行乾式摻合而使用,也可使用預先用單軸或雙軸擠製機而熔融混練者。 The stretched polyamide film can be obtained by, for example, extruding a polyamide resin and forming it into a film shape (protoembryo) and then stretching it. When extruding the polyamide resin, the polyamide resin can be extruded separately, or the polyamide resin can be used by dry blending with other resins such as thermoplastic polyamide elastomers. It can also be used in advance. Those who melt and knead with a single-shaft or twin-shaft extruder.

製造雙軸延伸聚醯胺膜時,繼而,較佳係將所得之未延伸膜於雙軸方向延伸。逐次雙軸延伸時,係將前述未延 伸薄片先於一方向藉由輥或拉幅式延伸機進行延伸。延伸溫度通常係30至220℃,較佳係50至210℃,延伸倍率通常係1.5至4.5倍,較佳係2.5至4.0倍。再來,可於與第一階段之延伸方向直交的方向延伸。延伸溫度通常係30至220℃,延伸倍率通常係1.5至4.5倍,較佳係2.5至4.0倍。 When manufacturing a biaxially stretched polyamide film, then, it is preferable to stretch the resulting unstretched film in a biaxial direction. In the sequential biaxial stretching, the unstretched sheet is stretched in one direction by a roll or a tenter stretcher. The stretching temperature is usually 30 to 220°C, preferably 50 to 210°C, and the stretching ratio is usually 1.5 to 4.5 times, preferably 2.5 to 4.0 times. Furthermore, it can extend in a direction perpendicular to the extension direction of the first stage. The stretching temperature is usually 30 to 220°C, and the stretching ratio is usually 1.5 to 4.5 times, preferably 2.5 to 4.0 times.

然後,繼而在190至210℃之溫度進行熱處理,得到雙軸延伸聚醯胺膜。上述延伸中,可採用以2個階段以上進行一方向之延伸之方法。此時,較佳係以使兩方向之延伸倍率最終分別成為上述範圍之方式進行。 Then, heat treatment is performed at a temperature of 190 to 210° C. to obtain a biaxially stretched polyamide film. In the above-mentioned stretching, a method of stretching in one direction in two or more stages can be used. At this time, it is preferable to perform so that the stretching magnifications in the two directions finally fall into the above-mentioned ranges.

又,關於本實施態樣中之聚醯胺膜製造,可採用同時雙軸延伸法。同時雙軸延伸法係將前述未延伸聚醯胺膜通常在溫度調控為30至220℃、較佳為50至210℃之狀態下,同時於機械方向及寬度方向延伸並定向之方法,就延伸倍率而言,通常以面積倍率計時,為1.5至20倍,較佳係5至15倍,更佳係8至12倍。然後,繼續在190至210℃之溫度進行熱處理,得到延伸定向聚醯胺膜。關於採用上述延伸方式之同時雙軸延伸裝置,可適當地採用螺桿方式、縮放儀方式、線性驅動方式等以往公知之延伸方式。 In addition, regarding the production of the polyamide film in this embodiment, the simultaneous biaxial stretching method can be used. At the same time, the biaxial stretching method is a method in which the aforementioned unstretched polyamide film is usually stretched and oriented in the machine direction and the width direction at a temperature of 30 to 220°C, preferably 50 to 210°C, at the same time. As for the magnification, the area magnification is usually measured from 1.5 to 20 times, preferably 5 to 15 times, and more preferably 8 to 12 times. Then, heat treatment is continued at a temperature of 190 to 210° C. to obtain a stretched oriented polyamide film. Regarding the simultaneous biaxial stretching device using the aforementioned stretching method, conventionally known stretching methods such as a screw method, a pantograph method, and a linear drive method can be suitably used.

(多層膜) (Multilayer film)

本發明之製程用者,在不違反本發明之目的時,可為單層、亦可為2層以上之多層膜。 The process of the present invention may be a single-layer film or a multilayer film with two or more layers as long as it does not violate the purpose of the present invention.

屬於2層以上之多層膜時,位於最外層之至少一層之至少一表面係具有下述特性:(1)在試驗溫度180℃以奈米壓痕法所測定之膜復原性值R為R≧70(%)。 In the case of a multilayer film with more than two layers, at least one surface of at least one layer located on the outermost layer has the following characteristics: (1) The film recovery value R measured by the nanoindentation method at a test temperature of 180°C is R≧ 70(%).

構成2層以上之多層膜之各個膜之材質並無特別限制,惟較佳係具有上述(1)在試驗溫度180℃以奈米壓痕法所測定之膜復原性值R為R≧70(%)之特性的至少一層包含聚酯樹脂及/或聚醯胺樹脂。 The material of each film constituting the multilayer film with more than two layers is not particularly limited, but it is preferable to have the above (1) film recovery value R measured by the nanoindentation method at a test temperature of 180°C is R≧70( %) at least one layer contains polyester resin and/or polyamide resin.

具有上述(1)的特性之至少一層以外之層,可為含有聚酯樹脂及/或聚醯胺樹脂而成之層,亦可為含有此種樹脂以外之樹脂之層,例如為含有此種樹脂以外之熱塑性樹脂而成之層。更具體而言,可為含有例如下述者而成之層:聚苯硫醚樹脂(PPS樹脂)、聚碸樹脂(PSF樹脂)、聚醚碸樹脂(PES樹脂)、聚醚醚酮樹脂(PEEK樹脂)、聚醯亞胺樹脂(PI樹脂)、聚醯胺醯亞胺樹脂(PAI樹脂)、聚醚醯亞胺樹脂(PEI樹脂)、聚萘二甲酸乙二酯樹脂(PEN樹脂)、聚縮醛樹脂(POM樹脂)、聚碳酸酯樹脂(PC樹脂)、聚苯醚樹脂(PPE樹脂)、聚對苯二甲酸丁二酯樹脂(PBT樹脂)、聚對苯二甲酸乙二酯樹脂(PET樹脂)、環狀聚烯烴樹脂(COP樹脂)、對排聚苯乙烯樹脂(SPS樹脂)、聚甲基戊烯樹脂(PMP樹脂)、聚甲基丙烯酸甲酯樹脂(PMMA樹脂)、聚乙烯樹脂(PE樹脂)、聚丙烯樹脂(PP樹脂)、聚苯乙烯樹脂(PS樹脂)、聚乙酸乙烯酯樹脂(PVAc樹脂)、丙烯腈丁二烯苯乙烯樹脂(ABS樹脂)或丙烯腈苯乙烯樹脂(AS樹脂)或者該等之組合等。 The layer other than at least one layer having the characteristics of (1) above may be a layer containing polyester resin and/or polyamide resin, or a layer containing resins other than such resins, for example, containing such A layer made of thermoplastic resin other than resin. More specifically, it may be a layer containing, for example, polyphenylene sulfide resin (PPS resin), polysulfide resin (PSF resin), polyether sulfide resin (PES resin), polyether ether ketone resin ( PEEK resin), polyimide resin (PI resin), polyimide imide resin (PAI resin), polyether imide resin (PEI resin), polyethylene naphthalate resin (PEN resin), Polyacetal resin (POM resin), polycarbonate resin (PC resin), polyphenylene ether resin (PPE resin), polybutylene terephthalate resin (PBT resin), polyethylene terephthalate resin (PET resin), cyclic polyolefin resin (COP resin), parallel polystyrene resin (SPS resin), polymethylpentene resin (PMP resin), polymethyl methacrylate resin (PMMA resin), poly Vinyl resin (PE resin), polypropylene resin (PP resin), polystyrene resin (PS resin), polyvinyl acetate resin (PVAc resin), acrylonitrile butadiene styrene resin (ABS resin) or acrylonitrile benzene Vinyl resin (AS resin) or a combination of these, etc.

上述態樣中,積層2層以上之樹脂層之方法無特別限制,可適當地使用以往公知之方法,例如積層含有聚酯樹脂及/或聚醯胺樹脂而成之層與由其他樹脂而成之層時,可將聚酯樹脂及/或聚醯胺樹脂與其他樹脂共擠壓出而得到多層膜(原胚膜),並將其延伸。或者,亦可將分別得到之含有聚酯樹脂及/或聚醯胺樹脂而成之延伸膜與由其他樹脂而成之延伸膜藉由熱壓接合、接著劑、接著層等而積層。欲將聚酯樹脂及/或聚醯胺樹脂與其他樹脂共擠壓出而得到原胚膜時,可使用通常之T模具法、圓筒模具法(吹塑(inflation)法)等製膜法。 In the above aspect, the method of laminating two or more resin layers is not particularly limited, and conventionally known methods can be suitably used, such as laminating layers containing polyester resin and/or polyamide resin and layers made of other resins. In the case of the layer, the polyester resin and/or polyamide resin can be co-extruded with other resins to obtain a multilayer film (original embryo film) and stretch it. Alternatively, a stretched film containing a polyester resin and/or a polyamide resin and a stretched film made of other resins obtained separately may be laminated by thermocompression bonding, an adhesive, an adhesive layer, or the like. When you want to co-extrude polyester resin and/or polyamide resin with other resins to obtain the original embryo film, you can use the usual T-die method, cylindrical die method (inflation method) and other film forming methods .

藉由接著劑、接著層而積層時之接著劑、接著層所用之樹脂,只要為可提升兩層間之接著力之樹脂即可,並無特別限制,可適當地選擇並使用以環氧系化合物、異氰酸酯系化合物、丙烯酸系化合物和胺甲酸酯系化合物為代表之接著劑。又,亦可使用將屬於接著對象之聚酯樹脂、聚醯胺樹脂、或其他樹脂、或者將與前述複數種樹脂相同或類似之樹脂以不飽和羧酸及/或其酸酐而接枝改質之樹脂。 There are no particular restrictions on the adhesive, the adhesive when laminating by the adhesive layer, and the resin used for the adhesive layer, as long as it is a resin that can improve the adhesion between the two layers. Epoxy compounds can be appropriately selected and used. , Isocyanate compounds, acrylic compounds and urethane compounds are representative adhesives. In addition, it is also possible to use polyester resin, polyamide resin, or other resins, or resins the same or similar to the aforementioned plural resins, to be grafted and modified with unsaturated carboxylic acids and/or their anhydrides.之resin.

就可使用來作為接枝單體之不飽和羧酸及/或其酸酐而言,可列舉具有1個以上碳數3至20之羧酸基之不飽和化合物、具有1個以上羧酸酐基之不飽和化合物,就不飽和基而言,可列舉乙烯基、伸乙烯基、不飽和環狀烴基等。具體而言,可列舉:丙烯酸、甲基丙烯酸等不飽和單羧酸;馬來酸、富馬酸、伊康酸、檸康酸、烯丙 基琥珀酸、中康酸、戊烯二酸、納迪克酸TM、甲基納迪克酸、四氫鄰苯二甲酸、甲基六氫鄰苯二甲酸等不飽和二羧酸;馬來酸酐、伊康酸酐、檸康酸酐、烯丙基琥珀酸酐、戊烯二酸酐、納迪克酸酐TM、甲基納迪克酸酐、四氫鄰苯二甲酸酐、甲基四氫鄰苯二甲酸酐等不飽和二羧酸酐等。該等可單獨使用1種或組合2種以上而使用。其中,較佳係馬來酸、馬來酸酐、納迪克酸及納迪克酸酐。 Regarding the unsaturated carboxylic acid and/or its anhydride that can be used as the grafting monomer, examples include unsaturated compounds having at least one carboxylic acid group with 3 to 20 carbon atoms, and those having at least one carboxylic acid anhydride group. As for the unsaturated compound, the unsaturated group includes a vinyl group, an vinylene group, an unsaturated cyclic hydrocarbon group, and the like. Specifically, examples include: unsaturated monocarboxylic acids such as acrylic acid and methacrylic acid; maleic acid, fumaric acid, itaconic acid, citraconic acid, allyl succinic acid, mesaconic acid, glutaconic acid, Nadic acid TM, methyl nadic acid, tetrahydrophthalic acid, methylhexahydrophthalic acid and other unsaturated dicarboxylic acids; maleic anhydride, itaconic anhydride, citraconic anhydride, allyl succinic anhydride , Glutaredic anhydride, Nadic anhydride TM, methyl Nadic anhydride, tetrahydrophthalic anhydride, methyl tetrahydrophthalic anhydride and other unsaturated dicarboxylic acid anhydrides. These can be used individually by 1 type or in combination of 2 or more types. Among them, maleic acid, maleic anhydride, nadic acid and nadic acid anhydride are preferred.

又,接枝率通常係未達20重量%,較佳係0.1至5重量%,更佳係0.5至2重量%。藉由使接枝量在上述範圍,上述接枝改質樹脂可不損及作為樹脂之機械性質、安定性等並且實現充分的接著性。上述接枝改質樹脂可藉由溶液法、熔融混練法等公知之接枝聚合法而製造,其中,較佳係能以溶液形態而得到之溶液法。 In addition, the grafting rate is usually less than 20% by weight, preferably 0.1 to 5% by weight, and more preferably 0.5 to 2% by weight. By making the grafting amount within the above-mentioned range, the above-mentioned graft-modified resin can achieve sufficient adhesiveness without impairing the mechanical properties, stability, etc. of the resin. The graft-modified resin can be produced by a known graft polymerization method such as a solution method and a melt-kneading method. Among them, a solution method that can be obtained in the form of a solution is preferred.

本發明之製程用離型膜,即使在溫度、壓力等高於以往之條件之熱壓、或更長時間之熱壓等嚴苛條件下,仍可容易且充分地從粗糙度高之銅箔等金屬表面剝離,故可適合用於伴隨從表面粗糙度大之金屬表面、經粗面化處理之金屬表面剝離之製程,例如以多層印刷配線板為首之金屬/樹脂積層體之製造製程。 The release film for the manufacturing process of the present invention can be easily and fully removed from the copper foil with high roughness even under severe conditions such as hot pressing with higher temperature and pressure than the previous conditions, or hot pressing for a longer time. It can be used in processes involving peeling from metal surfaces with large surface roughness and roughened metal surfaces, such as the manufacturing process of metal/resin laminates such as multilayer printed wiring boards.

將本發明之製程用離型膜使用於金屬/樹脂積層體之製造製程時,使本發明之製程用離型用膜在其具有(1)在試驗溫度180℃以奈米壓痕法所測定之膜復原性值R為R≧70(%)之特性之至少一面與經粗面化處理之金屬箔層接觸,並進行熱壓加工,繼而將該製程用離型膜從該金屬箔 層剝離。 When the release film for the process of the present invention is used in the manufacturing process of a metal/resin laminate, the release film for the process of the present invention has (1) measured by the nanoindentation method at a test temperature of 180°C The film recoverability value R is R≧70(%). At least one side of the characteristic is in contact with the roughened metal foil layer, and hot-pressed, and then the release film for the process is peeled from the metal foil layer .

成為多層印刷配線板的材料之單面敷銅積層版、雙面敷銅積層版等銅箔層之表面粗糙度,通常Rz為1.0至6.5μm,典型上為1.5至4.0μm,本發明之製程用離型膜特別適合於從具有此種表面粗糙度之銅箔層等之金屬表面之剝離。 The surface roughness of copper foil layers such as single-sided copper-clad laminate plates and double-sided copper-clad laminate plates, which become the material of multilayer printed wiring boards, usually Rz is 1.0 to 6.5 μm, typically 1.5 to 4.0 μm. The process of the present invention The release film is particularly suitable for peeling from the metal surface of the copper foil layer with such surface roughness.

以下,以5層印刷配線板之製造為例,說明多層印刷配線板之製造中本發明之製程用離型膜之使用。 Hereinafter, taking the manufacture of a 5-layer printed wiring board as an example, the use of the release film for the process of the present invention in the manufacture of a multilayer printed wiring board will be described.

在由銅箔層2與銅箔層3及經硬化之玻璃纖維-環氧樹脂複合絕緣體1所構成之雙面敷銅積層板之銅箔層2與銅箔層3形成印刷配線圖案後,對銅箔層2、銅箔層3進行黑化處理、使用有機酸系蝕刻處理劑之蝕刻處理等。該黑化處理等蝕刻處理,係使銅箔表面粗面化之處理,可提升與接著預浸體之接著性。 After the copper foil layer 2 and the copper foil layer 3 of the double-sided copper-clad laminate composed of the copper foil layer 2 and the copper foil layer 3 and the hardened glass fiber-epoxy composite insulator 1 are formed with printed wiring patterns, The copper foil layer 2 and the copper foil layer 3 are subjected to blackening treatment, etching treatment using an organic acid-based etching treatment agent, and the like. The etching treatment such as blackening treatment is a treatment to roughen the surface of the copper foil, which can improve the adhesion with the adhesive prepreg.

繼而,使用接著預浸體6,在上述基板與銅箔層7之間進行第1次的多層積層。此時,在銅箔層2之外側放置相當於本發明之製程用離型膜4,在銅箔層7之外側也同樣放置相當於本發明之製程用離型膜5,在積層面於垂直方向進行由熱壓所致之加熱、加壓(第2圖)。加熱、加壓之條件,較佳係例如設為190℃、壓力30kg/cm2、時間40分鐘。 Then, the adhesive prepreg 6 is used to perform the first multi-layer buildup between the above-mentioned substrate and the copper foil layer 7. At this time, the release film 4 corresponding to the process of the present invention is placed on the outer side of the copper foil layer 2, and the release film 5 corresponding to the process of the present invention is also placed on the outer side of the copper foil layer 7. Heating and pressurizing caused by hot pressing are performed in the direction (Figure 2). The conditions of heating and pressurization are preferably, for example, 190°C, pressure 30 kg/cm 2 , and time 40 minutes.

加熱、加壓後,可容易地將本發明之製程用離型膜4及5剝離,又,亦可有效抑制銅箔層2及7表面產生傷痕(第3圖)。 After heating and pressing, the release films 4 and 5 for the process of the present invention can be easily peeled off, and it is also effective to prevent scratches on the surfaces of the copper foil layers 2 and 7 (Fig. 3).

再來,如第4圖所示,將由銅箔層11與銅箔層9及經硬化之玻璃纖維-環氧樹脂複合絕緣體10所構成之積層板,與先前製作之由銅箔層2、銅箔層3、銅箔層7所構成之3層基板,使用接著預浸體8進行第2次的多層積層。在銅箔層11及銅箔層2之外側放置離型膜5及離型膜4,加熱、加壓,進行積層一體化。加熱、加壓條件較佳係例如設為190℃、壓力30kg/cm2、時間40分鐘。 Furthermore, as shown in Figure 4, the laminated board composed of the copper foil layer 11, the copper foil layer 9 and the hardened glass fiber-epoxy composite insulator 10 will be compared with the previously produced copper foil layer 2, copper A three-layer substrate composed of the foil layer 3 and the copper foil layer 7 is subjected to the second multi-layer lamination using the adhesive prepreg 8. The release film 5 and the release film 4 are placed on the outer side of the copper foil layer 11 and the copper foil layer 2, and they are heated and pressurized to perform lamination integration. The heating and pressurizing conditions are preferably set to, for example, 190°C, pressure 30 kg/cm 2 , and time 40 minutes.

加熱、加壓後,可容易地將本發明之製程用離型膜4及5剝離,又,亦可有效抑制銅箔層2及11表面產生傷痕(第5圖)。 After heating and pressurizing, the release films 4 and 5 for the process of the present invention can be easily peeled off, and it can also effectively suppress the scratches on the surfaces of the copper foil layers 2 and 11 (Figure 5).

以上,雖然以5層印刷配線板之製造為例,以說明多層印刷配線板之製造中的本發明之製程用離型膜之使用,惟本發明之製程用離型膜也適合使用在除此以外的構成之多層印刷配線板之製造中。又,不限於多層印刷配線板,也可活用其優異的從粗面之剝離性而適合使用在金屬/樹脂積層體之製造等之將具有粗糙度高之金屬表面之構件進行加熱、加壓之製造製程中。 Above, although the manufacture of a 5-layer printed wiring board is taken as an example to illustrate the use of the release film for the process of the present invention in the manufacture of a multilayer printed wiring board, the release film for the process of the present invention is also suitable for use in addition to this Manufacturing of multilayer printed wiring boards with other configurations. In addition, it is not limited to multilayer printed wiring boards, but can also utilize its excellent peelability from rough surfaces and is suitable for use in the manufacture of metal/resin laminates, etc., for heating and pressurizing members with high roughness metal surfaces. In the manufacturing process.

藉由使用本發明之製程用離型膜,能以高品質、低成本、且高生產效率製造多層印刷配線板。此種多層印刷配線基板,可適合使用於電子零件之實裝,並適合搭載於情報處理機器、顯示器、通訊機器、運輸機器等所用之電氣電子機器。 By using the release film for the manufacturing process of the present invention, a multilayer printed wiring board can be manufactured with high quality, low cost, and high production efficiency. This kind of multilayer printed wiring board can be suitable for the mounting of electronic parts, and it is suitable for mounting on electrical and electronic equipment used in information processing equipment, displays, communication equipment, and transportation equipment.

(實施例) (Example)

以下,以實施例更詳細說明本發明,但本 發明並不限於此。 Hereinafter, the present invention will be explained in more detail with examples, but the present invention is not limited thereto.

於以下實施例/比較例中,物性/特性之評估係以下述方法進行。 In the following examples/comparative examples, the evaluation of physical properties/characteristics is performed by the following methods.

(在180℃之由奈米壓痕法所得之膜復原性值R) (Film recovery value R obtained by nanoindentation at 180℃)

在測定溫度180℃,使用奈米壓痕機將稜間角115°之三角錐金剛石壓頭(Berkovich壓頭)以最大壓入負載2mN壓入膜測定面後卸除負載,測定最大壓入負載(2mN)時之壓入深度、卸除負載後(0mN)之壓入深度。將依下式而計算之所得之最大壓入負載(2mN)時之壓入深度與卸除負載後(0mN)之壓入深度之比作為膜復原性值R。 At the measurement temperature of 180℃, use a nanoindenter to press a triangular pyramid diamond indenter (Berkovich indenter) with an edge angle of 115° into the film measurement surface with a maximum indentation load of 2mN, and then remove the load to measure the maximum indentation load. (2mN) press-in depth, after unloading (0mN) press-in depth. The ratio of the indentation depth at the maximum indentation load (2mN) to the indentation depth after the load is unloaded (0mN) is calculated according to the following formula as the film restorability value R.

膜復原性值R=卸除負載後之壓入深度/最大壓入負載時之壓入深度 Film restorability value R=Press-in depth after unloading/Press-in depth at maximum press-in load

(在180℃之由奈米壓痕所得之硬度H) (Hardness obtained by nanoindentation at 180℃)

依下式而計算在測定溫度180℃,由使用奈米壓痕機將稜間角115°之三角錐金剛石壓頭(Berkovich壓頭)以最大壓入負載2mN壓入膜測定面後卸除負載時之最大壓入負載(Fmax)、壓入深度(hc)。 Calculate according to the following formula. At a measurement temperature of 180°C, a triangular pyramid diamond indenter (Berkovich indenter) with an edge angle of 115° is pressed into the measuring surface of the film with a maximum indentation load of 2mN using a nanoindenter, and the load is removed The maximum press-in load (F max ) and press-in depth (h c ) at the time.

硬度H=Fmax/(23.96×hc 2) Hardness H=F max /(23.96×h c 2 )

(離型性) (Releasability)

在以熱壓之敷銅積層板之製造中使用製程用離型膜,於解除壓力、冷卻後,以手對製程用離型膜施加張力而嘗試剝離,以下述基準評估剝離性。 The process release film was used in the manufacture of hot-pressed copper-clad laminates. After the pressure was released and cooled, the process release film was subjected to tension by hand to try to peel. The peelability was evaluated based on the following criteria.

○:於解除壓力後施加張力時,製程用離型膜輕易地從銅箔層表面剝離。 ○: When tension is applied after the pressure is released, the release film for the process is easily peeled from the surface of the copper foil layer.

×:製程用離型膜密接於銅箔層表面,無法以手剝離。 ×: The release film for the process is closely attached to the surface of the copper foil layer and cannot be peeled off by hand.

[實施例1] [Example 1]

使用膜厚12μm之雙軸延伸PET(聚對苯二甲酸乙二酯)膜(UNITIKA股份有限公司製,製品名:EMBLET PET12)作為製程用離型膜。 A biaxially stretched PET (polyethylene terephthalate) film (manufactured by UNITIKA Co., Ltd., product name: EMBLET PET12) with a film thickness of 12 μm was used as a release film for the process.

該雙軸延伸PET膜之在試驗溫度180℃以奈米壓痕法所測定之膜復原性值R係70.8%,同樣在試驗溫度180℃以奈米壓痕法所測定之硬度H係111.0MPa。 The recoverability value R of the biaxially stretched PET film measured by the nanoindentation method at a test temperature of 180°C is 70.8%, and the hardness H measured by the nanoindentation method at a test temperature of 180°C is 111.0MPa .

敷銅積層板係使用:使用FR4(玻璃環氧/銅箔18μm雙面,250×200mm×0.2mmt),並利用有機酸系蝕刻劑(MEC股份有限公司製,製品名:MEC V-Bond BO-7790V)以使銅箔表面粗糙度成為Ra:2μm之方式而經蝕刻處理之粗面化敷銅積層板。在該敷銅積層板與敷銅積層板之間,隔著樹脂層(接著預浸體)而重疊,在其最上面與最下面進一步配置製程用離型膜後,以180℃、25kg、60分鐘之條件熱壓,確認膜的從銅箔之剝離性。 Use of copper-clad laminate: FR4 (glass epoxy/copper foil 18μm double-sided, 250×200mm×0.2mmt), and organic acid etchant (manufactured by MEC Co., Ltd., product name: MEC V-Bond BO -7790V) A copper-clad laminate that has been etched so that the surface roughness of the copper foil becomes Ra: 2μm. Between the copper-clad laminated board and the copper-clad laminated board, the resin layer (following the prepreg) is superimposed, and the release film for the process is further arranged on the top and bottom, and the temperature is 180°C, 25kg, 60°C. Hot press in minutes to confirm the peelability of the film from the copper foil.

於解除壓力、冷卻後以手施加張力時,製程用離型膜容易地從銅箔層剝離。 When the pressure is released and tension is applied by hand after cooling, the release film for the process is easily peeled from the copper foil layer.

[實施例2] [Example 2]

使用膜厚15μm之雙軸延伸尼龍膜(興人Film & Chemicals股份有限公司製,製品名:BONYL RX)作為製程 用離型膜。 A biaxially stretched nylon film (manufactured by Xingren Film & Chemicals Co., Ltd., product name: BONYL RX) with a film thickness of 15 µm was used as a release film for the process.

該雙軸延伸尼龍膜之在試驗溫度180℃以奈米壓痕法所測定之膜復原性值R係77.7%,同樣在試驗溫度180℃以奈米壓痕法所測定之硬度H係58.7MPa。 The recoverability value R of the biaxially stretched nylon membrane measured by the nanoindentation method at a test temperature of 180°C is 77.7%, and the hardness H measured by the nanoindentation method at a test temperature of 180°C is 58.7MPa .

以與實施例1同樣之條件使用於積層板之製造製程。 It was used in the manufacturing process of the laminated board under the same conditions as in Example 1.

於解除壓力、冷卻後施加張力時,離型膜容易地從銅箔層剝離。 When the pressure is released and tension is applied after cooling, the release film is easily peeled from the copper foil layer.

[實施例3] [Example 3]

使用市售之PBT(聚對苯二甲酸丁二酯)樹脂(Tm=224℃,IV=1.2,[三菱Engineering-Plastics(股)公司製,商品名:NOVADURAN 5020]),以螺桿徑40mm之擠製機之T-模具膜成形機,在樹脂溫度250℃、冷硬軋輥(chilled roll)溫度80℃、氣室靜壓440mmHG之條件下,製作20μm之無延伸PBT膜,並使用來作為製程用離型膜。 Use commercially available PBT (polybutylene terephthalate) resin (Tm=224°C, IV=1.2, [manufactured by Mitsubishi Engineering-Plastics Co., Ltd., trade name: NOVADURAN 5020]), with a screw diameter of 40 mm The T-die film forming machine of the extruder, under the conditions of resin temperature of 250℃, chilled roll temperature of 80℃, and air chamber static pressure of 440mmHG, produces a 20μm non-stretched PBT film and uses it as a process Use release film.

該無延伸PBT膜之在試驗溫度180℃以奈米壓痕法所測定之膜復原性值R係78.3%,同樣在試驗溫度180℃以奈米壓痕法所測定之硬度H係68.0MPa。 The film recovery value R of the non-stretched PBT film measured by the nanoindentation method at a test temperature of 180°C is 78.3%, and the hardness H measured by the nanoindentation method at the test temperature of 180°C is also 68.0MPa.

以與實施例1同樣之條件使用於積層板之製造製程。 It was used in the manufacturing process of the laminated board under the same conditions as in Example 1.

於解除壓力、冷卻後施加張力時,離型膜容易地從銅箔層剝離。 When the pressure is released and tension is applied after cooling, the release film is easily peeled from the copper foil layer.

[實施例4] [Example 4]

使用膜厚20μm之無延伸尼龍膜(TORAY ADVANCED FILM股份有限公司製,製品名:Rayfan NO1401)作為製程用離型膜。 A non-stretch nylon film (manufactured by TORAY ADVANCED FILM Co., Ltd., product name: Rayfan NO1401) with a film thickness of 20 μm was used as a release film for the process.

該無延伸尼龍膜之在試驗溫度180℃以奈米壓痕法所測定之膜復原性值R係76.6%,同樣在試驗溫度180℃以奈米壓痕法所測定之硬度H係81.9MPa。 The film recovery value R of the non-stretched nylon membrane measured by the nanoindentation method at a test temperature of 180°C is 76.6%, and the hardness H measured by the nanoindentation method at the test temperature of 180°C is also 81.9MPa.

以與實施例1同樣之條件使用於積層板之製造製程。 It was used in the manufacturing process of the laminated board under the same conditions as in Example 1.

於解除壓力後施加張力時,離型膜容易地從銅箔層剝離。 When tension is applied after the pressure is released, the release film is easily peeled from the copper foil layer.

[比較例1] [Comparative Example 1]

使用膜厚16μm之雙軸延伸聚對苯二甲酸乙二酯(PET)膜(TORAY ADVANCED FILM股份有限公司製,製品名:Lumirror F865)作為製程用離型膜。 A biaxially stretched polyethylene terephthalate (PET) film (manufactured by TORAY ADVANCED FILM Co., Ltd., product name: Lumirror F865) with a film thickness of 16 μm was used as a release film for the process.

該雙軸延伸PET膜之在試驗溫度180℃以奈米壓痕法所測定之膜復原性值R係68.5%,同樣在試驗溫度180℃以奈米壓痕法所測定之硬度H係34.7MPa。 The recoverability value R of the biaxially stretched PET film measured by the nanoindentation method at a test temperature of 180°C is 68.5%, and the hardness H measured by the nanoindentation method at a test temperature of 180°C is 34.7MPa .

以與實施例1同樣之條件使用於積層板之製造製程。 It was used in the manufacturing process of the laminated board under the same conditions as in Example 1.

於解除壓力後雖然施加張力,但離型膜密接於銅箔層表面而無法以手剝離。 Although tension was applied after the pressure was released, the release film adhered to the surface of the copper foil layer and could not be peeled off by hand.

將結果彙整於表1。 The results are summarized in Table 1.

(產業上之可利用性) (Industrial availability)

本發明之製程用離型膜,即使在條件嚴苛的製程後,仍可容易且充分地從粗糙度高之金屬表面剝離,因此在產業之各領域,尤其在以多層印刷配線板之製 造為首之電氣電子產業領域中具有高度的可利用性。 The release film for the manufacturing process of the present invention can be easily and fully peeled off from the metal surface with high roughness even after the severe manufacturing process. Therefore, it is used in various fields of industry, especially in the manufacturing of multilayer printed wiring boards. It has a high degree of availability in the electrical and electronic industry.

1、10‧‧‧玻璃纖維-環氧樹脂複合絕緣體 1, 10‧‧‧Glass fiber-epoxy resin composite insulator

2、3、7、9、11‧‧‧銅箔層 2, 3, 7, 9, 11‧‧‧Copper foil layer

4、5‧‧‧離型膜 4、5‧‧‧Release film

6、8‧‧‧接著預浸體 6, 8‧‧‧Next to prepreg

Claims (8)

一種金屬/樹脂積層體之製造方法,其具備:使製程用離型膜在具有下述(1)的特性之至少一面與經粗面化處理之金屬箔層接觸,並進行熱壓之步驟;以及將該製程用離型膜從該金屬箔層剝離之步驟,其中,前述製程用離型膜係含有熱塑性樹脂而成者,且其至少一面具有下述(1)的特性:(1)在試驗溫度180℃以奈米壓痕法所測定之膜復原性值R為:R≧70(%),前述膜復原性值R係使用奈米壓痕機將稜間角115°之三角錐金剛石壓頭以最大壓入負載2mN壓入膜測定面後卸除負載,並由所測定之最大壓入負載(2mN)時之壓入深度與卸除負載後(0mN)之壓入深度之比,依下式而計算出者,膜復原性值R(%)=(卸除負載後之壓入深度/最大壓入負載時之壓入深度)×100。 A method for manufacturing a metal/resin laminate, comprising: contacting a metal foil layer subjected to roughening treatment on at least one side of a release film for the process with the following characteristics (1), and performing hot pressing; And the step of peeling the release film for the process from the metal foil layer, wherein the release film for the process contains a thermoplastic resin, and at least one side has the following (1) characteristics: (1) The film restorability value R measured by the nanoindentation method at a test temperature of 180℃ is: R≧70(%). The aforementioned film restorability value R is a triangular pyramid diamond with an edge angle of 115° using a nanoindenter The indenter is pressed into the measuring surface of the film with a maximum indentation load of 2mN and then the load is removed. The ratio of the indentation depth at the measured maximum indentation load (2mN) to the indentation depth after the load is unloaded (0mN), Calculated according to the following formula, film recovery value R(%)=(indentation depth after unloading/indentation depth at maximum indentation load)×100. 如申請專利範圍第1項所述之製造方法,其中,前述製程用離型膜係含有熱塑性樹脂而成者,且其至少一面具有下述(2)之特性:(2)在試驗溫度180℃以奈米壓痕法所測定之硬度H為:130≧H≧40(MPa),前述硬度H係由使用奈米壓痕機將稜間角115°之三角錐金剛石壓頭以最大壓入負載2mN壓入膜測定面 後之卸除負載時之最大壓入負載(Fmax)、壓入深度(hc),依下式而計算出者,硬度H=Fmax/(23.96×hc 2)。 The manufacturing method described in item 1 of the scope of the patent application, wherein the release film for the manufacturing process contains a thermoplastic resin, and at least one side has the following (2) characteristics: (2) at a test temperature of 180°C The hardness H measured by the nanoindentation method is: 130≧H≧40 (MPa). The aforementioned hardness H is determined by using a nanoindenter to indent a triangular pyramid diamond indenter with an edge angle of 115° at the maximum load. The maximum indentation load (F max ) and the indentation depth (h c ) when the load is unloaded after 2mN is pressed into the measuring surface of the film, calculated according to the following formula, hardness H=F max /(23.96×h c 2 ). 如申請專利範圍第2項所述之製造方法,其中,前述製程用離型膜中,具有前述(1)的特性之至少一面、與具有前述(2)的特性之至少一面為同一面。 According to the manufacturing method described in claim 2, wherein, in the release film for the process, at least one side having the characteristics (1) and at least one side having the characteristics (2) are the same. 如申請專利範圍第1項至第3項中任一項所述之製造方法,其中,前述製程用離型膜係含有聚酯樹脂及/或聚醯胺樹脂而成者。 The manufacturing method according to any one of items 1 to 3 in the scope of the patent application, wherein the release film for the process contains a polyester resin and/or a polyamide resin. 如申請專利範圍第1項至第3項中任一項所述之製造方法,其中,前述製程用離型膜係具有延伸或無延伸之聚酯膜層、或者延伸或無延伸之聚醯胺膜層。 The manufacturing method according to any one of items 1 to 3 in the scope of the patent application, wherein the release film for the process has an extended or non-extended polyester film layer, or an extended or non-extended polyamide膜层。 Film layer. 如申請專利範圍第1項至第3項中任一項所述之製造方法,其中,前述金屬箔層具有表面粗糙度Rz為1.0至6.5μm之金屬表面。 According to the manufacturing method described in any one of items 1 to 3 in the scope of the patent application, the metal foil layer has a metal surface with a surface roughness Rz of 1.0 to 6.5 μm. 如申請專利範圍第1項至第3項中任一項所述之製造方法,其中,前述金屬/樹脂積層體係多層印刷配線板。 The manufacturing method according to any one of items 1 to 3 in the scope of the patent application, wherein the metal/resin laminate system multilayer printed wiring board. 一種電氣電子機器,其具有藉由申請專利範圍第7項所述之製造方法所製造之多層印刷基板。 An electrical and electronic device having a multilayer printed circuit board manufactured by the manufacturing method described in item 7 of the scope of patent application.
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