TWI721210B - A design change spectrometer and a method of manufacturing the design change spectrometer - Google Patents
A design change spectrometer and a method of manufacturing the design change spectrometer Download PDFInfo
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本發明涉及一光學設備配置,尤其涉及一種設變光譜儀和設變光譜儀的製造方法。 The invention relates to an optical device configuration, in particular to a design variable spectrometer and a manufacturing method of the design variable spectrometer.
光譜儀是應用光學原理,將成分複雜的光分解為光譜線的科學儀器,其中對物質的結構和成分進行觀測、分析和處理的基本設備,具有分析精度高、測量範圍大、速度快和樣品用量少等優點。因此,凡舉分子特性的分辨,濃度的量測,物質的鑒定,天體光譜的量測等都需要光譜儀的協助,其中光譜儀更是廣泛地被運用於冶金、地質、石油化工、醫藥衛生、環境保護、資源和水文勘測等各領域。 A spectrometer is a scientific instrument that uses optical principles to decompose complex light into spectral lines. Among them, the basic equipment for observing, analyzing and processing the structure and composition of matter has high analysis accuracy, large measurement range, high speed and sample use. Advantages such as small amount. Therefore, the resolution of molecular characteristics, the measurement of concentration, the identification of substances, and the measurement of celestial spectra require the assistance of spectrometers. Among them, spectrometers are widely used in metallurgy, geology, petrochemical industry, medicine and health, and the environment. Protection, resources and hydrological surveying and other fields.
但是,光譜儀是一種精密的儀器,從開發到製作整個開發時程漫長,特別是對應各種的領域的需求時,光譜儀從光學設計、結構設計以及生產製程的各階段中,不管是那個階段都需經過一些測試、分析或檢驗,其中每個階段都是重要並且耗時的。因此,如何在不影響光譜儀的功能下,縮短開發時程,是各家廠商現今努力的目標。 However, the spectrometer is a precision instrument. The entire development time from development to production is long, especially when it meets the needs of various fields. The spectrometer needs to be from optical design, structural design, and various stages of the production process. After some testing, analysis or inspection, each of these stages is important and time-consuming. Therefore, how to shorten the development time without affecting the function of the spectrometer is the goal of various manufacturers now.
特別地,在一般光譜儀的光路設計和結構設計中,光譜儀的入光元件通常是設置於光譜儀殼體的長邊,但是這樣的設計將使光譜儀在各領域 中難以進行系統整合。特別是在光譜儀規格皆已能被客戶接受的情況下,卻因為入光元件的結構設置位置,無法進行系統整合,使得整個光譜儀必須重新設計,以配合系統整合。但是這樣的重新開發設計光譜儀的過程不只浪費了設計和製造的時間和人力,而且還會影響客戶的後續整合應用的時間。因此,如何在保有現有光譜儀規格下,調整入光元件的位置,並以最少的時間製造一個達到系統整合的需求的新光譜儀是本發明一個重要的目標。 In particular, in the optical path design and structural design of a general spectrometer, the light-incident element of the spectrometer is usually set on the long side of the spectrometer housing, but such a design will make the spectrometer in various fields System integration is difficult to implement. Especially when the spectrometer specifications have been accepted by customers, system integration cannot be performed because of the structural placement of the light-incident element, so the entire spectrometer must be redesigned to match the system integration. However, such a process of re-development and design of the spectrometer not only wastes design and manufacturing time and manpower, but also affects the customer's subsequent integration and application time. Therefore, how to adjust the position of the light-incident element while maintaining the specifications of the existing spectrometer, and to manufacture a new spectrometer that meets the requirements of system integration in the least time is an important goal of the present invention.
本發明之一個目的在於提供一種設變光譜儀的製造方法,其中在最少一項設定規格與參照光譜儀相同下,改變設變光譜儀的設變入光元件設置位置,使設變光譜儀收光側的寬度較窄於參照光譜儀的收光側以利後續系統整合所需空間,並使應用範圍更佳廣泛。 An object of the present invention is to provide a method for manufacturing a variable spectrometer, in which at least one setting specification is the same as the reference spectrometer, and the setting position of the variable input element of the variable spectrometer is changed to make the width of the receiving side of the variable spectrometer It is narrower than the light-receiving side of the reference spectrometer to facilitate the space required for subsequent system integration and make the application range wider.
本發明之一個目的在於提供一種設變光譜儀的製造方法,其中利用既有參照光譜儀的規格,設計並製造出新的設變光譜儀,並使設變光譜儀的收光側更有利於後續系統整合。特別地,這樣的方式將省略大量光學設計的人力成本和減少系統整合時所需的重新確認時間。 An object of the present invention is to provide a method for manufacturing a variable spectrometer, in which a new design variable spectrometer is designed and manufactured using the specifications of an existing reference spectrometer, and the light receiving side of the variable spectrometer is more conducive to subsequent system integration. In particular, such an approach will omit a lot of labor costs for optical design and reduce the reconfirmation time required for system integration.
本發明之一個目的在於提供一種設變光譜儀的製造方法,其中經由至少一設變反射元件的設置,改變設變入光元件到設變凹面光柵的光學路徑,從而增加設變入光元件設置位置的可變性,並使設變光譜儀的應用更加靈活。可以理解的,在另一光譜儀中,設變反射元件可將設置於設變入光元件和設變準直面鏡之間。 An object of the present invention is to provide a method for manufacturing a variable spectrometer, in which the optical path from the variable input element to the variable concave grating is changed through the setting of at least one variable reflection element, thereby increasing the setting position of the variable input element Variability, and make the application of variable spectrometer more flexible. It can be understood that in another spectrometer, the variable reflector element can be arranged between the variable input light element and the variable collimator mirror.
為了達到以上至少一目的,本發明提供一種設變光譜儀的製造方法,包括: 取得一參照光譜儀的多個參照參數與至少一設定規格。 In order to achieve at least one of the above objectives, the present invention provides a method for manufacturing a variable spectrometer, including: Obtain a plurality of reference parameters and at least one setting specification of a reference spectrometer.
整合該參照光譜儀的該些參照參數的至少一必要參數到一設變光譜儀,使該設變光譜儀具有相同於該參照光譜儀的該設定規格。 Integrating at least one necessary parameter of the reference parameters of the reference spectrometer into a set variable spectrometer, so that the set variable spectrometer has the same setting specifications as the reference spectrometer.
依據光柵方程式得到該設變光譜儀的多個自由參數。 According to the grating equation, multiple free parameters of the spectrometer are obtained.
設定該設變光譜儀的一設變入光元件於一設變殼體的一設變收光側,使該設變收光側短於該參照光譜儀的一參照殼體的一參照收光側。 Set a variable light input element of the variable spectrometer on a variable light receiving side of a variable housing so that the variable light receiving side is shorter than a reference light receiving side of a reference housing of the reference spectrometer.
為達到上述至少一目的,本發明還揭露另一種設變光譜儀的製造方法,包括:取得一參照光譜儀的多個參照參數與至少一設定規格,其中該些參照參數包括至少一必要參數以使該參照光譜儀能達到該設定規格。 To achieve at least one of the above objectives, the present invention also discloses another method for manufacturing a variable spectrometer, including: obtaining a plurality of reference parameters and at least one setting specification of a reference spectrometer, wherein the reference parameters include at least one necessary parameter to enable the The reference spectrometer can reach the set specifications.
設定該設變光譜儀具有相同於該參照光譜儀的該必要參數,使該設變光譜儀能達到該設定規格。 The set variable spectrometer is set to have the same necessary parameters as the reference spectrometer, so that the set variable spectrometer can meet the set specifications.
在該設變光譜儀能達到該設定規格下,設定該設變光譜儀的至少一設變參數,包括:設定該設變光譜儀的一設變入光元件位於一設變殼體的一設變收光側,其中該參照光譜儀的一參照入光元件位於一參照殼體的一參照收光側,該設變收光側短於該參照收光側。 Setting at least one variable parameter of the variable spectrometer under the condition that the variable spectrometer can reach the set specification includes: setting a variable light-in element of the variable spectrometer located in a variable light receiving element of a variable casing Side, wherein a reference light-incident element of the reference spectrometer is located on a reference light-receiving side of a reference housing, and the variable light-receiving side is shorter than the reference light-receiving side.
在該設變光譜儀能達到該設定規格數據下,依據光學原理、該必要參數與該設變參數設定該設變光譜儀的多個自由參數。 Under the condition that the set variable spectrometer can reach the set specification data, a plurality of free parameters of the set variable spectrometer are set according to the optical principle, the necessary parameters, and the set variable parameters.
依據該必要參數、該設變參數、該自由參數製作該設變光譜儀。 According to the necessary parameter, the set variable parameter, and the free parameter, the set variable spectrometer is produced.
為達到上述至少一目的,本發明還揭露另一種設變光譜儀的製造方法,包括: 將一參照光譜儀的一參照聚焦面鏡的焦距參照配置到一設變光譜儀的一設變聚焦面鏡的焦距。 In order to achieve at least one of the above objectives, the present invention also discloses another method for manufacturing a variable spectrometer, including: The focal length of a reference focusing mirror of a reference spectrometer is referenced to the focal length of a variable focusing mirror of a variable spectrometer.
將該參照光譜儀的一參照平面光柵到該參照聚焦面鏡之間的光路距離參照配置到該設變光譜儀的一設變平面光柵和該設變聚焦面鏡的光路距離。 The optical path distance between a reference plane grating of the reference spectrometer and the reference focusing mirror is configured with reference to the optical path distance between a variable plane grating of the variable spectrometer and the variable focusing mirror.
將該參照光譜儀的該參照平面光柵條數參照配置到該設變光譜儀的該設變平面光柵條數。 The number of reference plane gratings of the reference spectrometer is referenced to the number of set variable plane gratings of the set variable spectrometer.
將該設變光譜儀的一設變入光元件設置於一設變殼體的設變收光側,其相對參照光譜儀的一參照殼體的參照收光側寬度較窄。 A set variable light input element of the set variable spectrometer is arranged on the set variable light receiving side of a set variable housing, which has a narrower width relative to the reference light receiving side of a reference housing of the reference spectrometer.
為讓本發明之上述特徵、優點和內容更明顯易懂,下文特舉較佳實施例,並配合所附圖式作詳細說明如下。 In order to make the above-mentioned features, advantages and content of the present invention more comprehensible, preferred embodiments are described in detail below in conjunction with the accompanying drawings.
100:參照光譜儀 100: Reference spectrometer
10:參照入光元件 10: Refer to the light component
20:參照準直面鏡 20: Reference collimating mirror
30:參照平面光柵 30: Reference plane grating
40:參照聚焦面鏡 40: Reference focusing mirror
50:參照光接收器 50: Reference optical receiver
70:參照殼體 70: Reference shell
71:參照收光側 71: Refer to the receiving side
711:參照凹槽 711: reference groove
713:傾斜部 713: inclined part
100’:設變光譜儀 100’: Design Variable Spectrometer
10’:設變入光元件 10’: Set variable light component
20’:設變準直面鏡 20’: Design variable collimating mirror
30’:設變平面光柵 30’: Set variable plane grating
40’:設變聚焦面鏡 40’: Set variable focusing mirror
50’:設變光接收器 50’: Set variable light receiver
60’:設變反射元件 60’: Design variable reflective element
61’:第一設變反射元件 61’: The first design variable reflective element
62’:第二設變反射元件 62’: The second design variable reflective element
70’:設變殼體 70’: Design variable shell
71’:設變收光側 71’: Set variable light receiving side
712’:突出部 712’: protrusion
100A:參照光譜儀 100A: Reference spectrometer
10A:參照入光元件 10A: Refer to the light incident element
30A:參照凹面光柵 30A: Reference concave grating
50A:參照光接收器 50A: Reference optical receiver
70A:參照殼體 70A: Reference housing
80A:參照光波導裝置 80A: Reference optical waveguide device
71A:參照收光側 71A: Refer to the receiving side
713A:傾斜部 713A: Inclined part
100A’:設變光譜儀 100A’: Design variable spectrometer
10A’:設變入光元件 10A’: Set the variable light component
30A’:設變凹面光柵 30A’: Set variable concave grating
50A’:設變光接收器 50A’: Set variable light receiver
60A’:設變反射元件 60A’: Design variable reflective element
61A’:第一設變反射元件 61A’: The first design variable reflective element
62A’:第二設變反射元件 62A’: The second design variable reflective element
70A’:設變殼體 70A’: Design variable shell
71A’:設變收光側 71A’: Set variable light receiving side
712A’:突出部 712A’: protrusion
80A’:設變光波導裝置 80A’: Set variable optical waveguide device
S101~S104、S201~S205、S301~S304、S301’~S305’、S401~S403、S401’~S404’:設變光譜儀的製造方法的各實施例的各步驟 S101~S104, S201~S205, S301~S304, S301’~S305’, S401~S403, S401’~S404’: Set the steps of each embodiment of the manufacturing method of the variable spectrometer
第1圖為本發明之第一、第二選擇實施例的設變光譜儀的製造方法之流程圖。 Figure 1 is a flow chart of the manufacturing method of the variable spectrometer according to the first and second alternative embodiments of the present invention.
第2圖為本發明之第一選擇實施例的設變光譜儀的製造方法中第一實施態樣的參照光譜儀光路示意圖。 Figure 2 is a schematic diagram of the optical path of the reference spectrometer in the first embodiment of the method for manufacturing the variable spectrometer of the first alternative embodiment of the present invention.
第3圖為本發明之第一選擇實施例的設變光譜儀的製造方法中第一實施態樣的設變光譜儀光路示意圖。 FIG. 3 is a schematic diagram of the optical path of the designed variable spectrometer in the first embodiment of the method of manufacturing the designed variable spectrometer according to the first alternative embodiment of the present invention.
第4圖為本發明之第一選擇實施例的設變光譜儀的製造方法中第二實施態樣的設變光譜儀光路示意圖。 Fig. 4 is a schematic diagram of the optical path of the design variable spectrometer in the second embodiment of the method of manufacturing the design variable spectrometer according to the first alternative embodiment of the present invention.
第5圖為本發明之第一選擇實施例的設變光譜儀的製造方法中第三實施態樣的設變光譜儀光路示意圖。 Fig. 5 is a schematic diagram of the optical path of the design variable spectrometer in the third embodiment of the method of manufacturing the design variable spectrometer according to the first alternative embodiment of the present invention.
第6圖為本發明之第一選擇實施例的設變光譜儀的製造方法中第四實施態樣的設變光譜儀光路示意圖。 Fig. 6 is a schematic diagram of the optical path of the design variable spectrometer in the fourth embodiment of the method of manufacturing the design variable spectrometer according to the first alternative embodiment of the present invention.
第7圖為本發明之第一選擇實施例的設變光譜儀的製造方法中第五實施態樣的設變光譜儀光路示意圖。 Fig. 7 is a schematic diagram of the optical path of the design variable spectrometer in the fifth embodiment of the manufacturing method of the design variable spectrometer according to the first alternative embodiment of the present invention.
第8圖為本發明之第一選擇實施例的設變光譜儀的製造方法中第六實施態樣的參照光譜儀光路示意圖。 FIG. 8 is a schematic diagram of the optical path of the reference spectrometer in the sixth embodiment of the manufacturing method of the variable spectrometer in the first alternative embodiment of the present invention.
第9圖為本發明之第一選擇實施例的設變光譜儀的製造方法中第六實施態樣的設變光譜儀光路示意圖。 Fig. 9 is a schematic diagram of the optical path of the design variable spectrometer in the sixth embodiment of the manufacturing method of the design variable spectrometer according to the first alternative embodiment of the present invention.
第10圖為本發明之第一選擇實施例的設變光譜儀的製造方法中第七實施態樣的參照光譜儀光路示意圖。 FIG. 10 is a schematic diagram of the optical path of the reference spectrometer in the seventh embodiment of the manufacturing method of the variable spectrometer in the first alternative embodiment of the present invention.
第11圖為本發明之第一選擇實施例的設變光譜儀的製造方法中第七實施態樣的設變光譜儀光路示意圖。 Fig. 11 is a schematic diagram of the optical path of the design variable spectrometer in the seventh embodiment of the manufacturing method of the design variable spectrometer according to the first alternative embodiment of the present invention.
第12圖為本發明之第一選擇實施例的設變光譜儀的製造方法中第八實施態樣的參照光譜儀光路示意圖。 Figure 12 is a schematic diagram of the optical path of the reference spectrometer in the eighth embodiment of the method for manufacturing the variable spectrometer of the first alternative embodiment of the present invention.
第13圖為本發明之第一選擇實施例的設變光譜儀的製造方法中第八實施態樣的設變光譜儀光路示意圖。 Figure 13 is a schematic diagram of the optical path of the eighth implementation aspect of the design variable spectrometer in the manufacturing method of the design variable spectrometer according to the first alternative embodiment of the present invention.
第14圖為本發明之第一選擇實施例的設變光譜儀的製造方法中第九實施態樣的參照光譜儀光路示意圖。 Figure 14 is a schematic diagram of the optical path of the reference spectrometer in the ninth embodiment of the method for manufacturing the variable spectrometer of the first alternative embodiment of the present invention.
第15圖和第16圖為本發明之第一選擇實施例的設變光譜儀的製造方法中第九實施態樣的設變光譜儀光路示意圖。 Figures 15 and 16 are schematic diagrams of the optical path of the design variable spectrometer in the ninth embodiment of the method of manufacturing the design variable spectrometer according to the first alternative embodiment of the present invention.
第17圖為本發明之第一選擇實施例的設變光譜儀的製造方法中第十實施態樣的參照光譜儀光路示意圖。 Figure 17 is a schematic diagram of the optical path of the reference spectrometer in the tenth embodiment of the method for manufacturing the variable spectrometer of the first alternative embodiment of the present invention.
第18圖為本發明之第一選擇實施例的設變光譜儀的製造方法中第十實施態樣的設變光譜儀光路示意圖。 Figure 18 is a schematic diagram of the optical path of the tenth embodiment of the design variable spectrometer in the manufacturing method of the design variable spectrometer according to the first alternative embodiment of the present invention.
第19圖為本發明之第一選擇實施例的設變光譜儀的製造方法中第十一實施態樣的參照光譜儀光路示意圖。 Figure 19 is a schematic diagram of the optical path of the reference spectrometer in the eleventh embodiment of the method for manufacturing the variable spectrometer of the first alternative embodiment of the present invention.
第20圖為本發明之第一選擇實施例的設變光譜儀的製造方法中第十一實施態樣的設變光譜儀光路示意圖。 Figure 20 is a schematic diagram of the optical path of the eleventh implementation aspect of the design variable spectrometer in the manufacturing method of the design variable spectrometer according to the first alternative embodiment of the present invention.
第21圖為本發明之第二選擇實施例的設變光譜儀的製造方法中第一實施態樣的參照光譜儀光路示意圖。 FIG. 21 is a schematic diagram of the optical path of the reference spectrometer in the first embodiment of the method for manufacturing the variable spectrometer according to the second alternative embodiment of the present invention.
第22圖為本發明之第二選擇實施例的設變光譜儀的製造方法中第一實施態樣的設變光譜儀光路示意圖。 FIG. 22 is a schematic diagram of the optical path of the designed variable spectrometer in the first embodiment of the method of manufacturing the designed variable spectrometer according to the second alternative embodiment of the present invention.
第23圖為本發明之第二選擇實施例的設變光譜儀的製造方法中第二實施態樣的參照光譜儀光路示意圖。 FIG. 23 is a schematic diagram of the optical path of the reference spectrometer in the second embodiment of the method for manufacturing the variable spectrometer according to the second alternative embodiment of the present invention.
第24圖為本發明之第二選擇實施例的設變光譜儀的製造方法中第二實施態樣的設變光譜儀光路示意圖。 FIG. 24 is a schematic diagram of the optical path of the designed variable spectrometer in the second embodiment of the method of manufacturing the designed variable spectrometer according to the second alternative embodiment of the present invention.
第25圖為本發明之第二選擇實施例的設變光譜儀的製造方法中第三實施態樣的參照光譜儀光路示意圖。 FIG. 25 is a schematic diagram of the optical path of the reference spectrometer in the third embodiment of the method for manufacturing the variable spectrometer according to the second alternative embodiment of the present invention.
第26圖為本發明之第二選擇實施例的設變光譜儀的製造方法中第三實施態樣的設變光譜儀光路示意圖。 FIG. 26 is a schematic diagram of the optical path of the designed variable spectrometer in the third embodiment of the method of manufacturing the designed variable spectrometer according to the second alternative embodiment of the present invention.
第27圖為本發明之第二選擇實施例的設變光譜儀的製造方法中第四實施態樣的參照光譜儀光路示意圖。 FIG. 27 is a schematic diagram of the optical path of the reference spectrometer in the fourth embodiment of the method of manufacturing the variable spectrometer according to the second alternative embodiment of the present invention.
第28圖為本發明之第二選擇實施例的設變光譜儀的製造方法中第四實施態樣的設變光譜儀光路示意圖。 Fig. 28 is a schematic diagram of the optical path of the design variable spectrometer in the fourth embodiment of the method of manufacturing the design variable spectrometer according to the second alternative embodiment of the present invention.
第29圖為本發明之第二選擇實施例的設變光譜儀的製造方法中第五實施態樣的參照光譜儀光路示意圖。 Figure 29 is a schematic diagram of the optical path of the reference spectrometer in the fifth embodiment of the method for manufacturing the variable spectrometer of the second alternative embodiment of the present invention.
第30圖為本發明之第二選擇實施例的設變光譜儀的製造方法中第五實施態樣的設變光譜儀光路示意圖。 Fig. 30 is a schematic diagram of the optical path of the design variable spectrometer in the fifth embodiment of the method of manufacturing the design variable spectrometer according to the second alternative embodiment of the present invention.
第31圖為本發明之第二選擇實施例的設變光譜儀的製造方法中第六實施態樣的參照光譜儀光路示意圖。 FIG. 31 is a schematic diagram of the optical path of the reference spectrometer in the sixth embodiment of the manufacturing method of the variable spectrometer in the second alternative embodiment of the present invention.
第32圖為本發明之第二選擇實施例的設變光譜儀的製造方法中第六實施態樣的設變光譜儀光路示意圖。 FIG. 32 is a schematic diagram of the optical path of the designed variable spectrometer in the sixth embodiment of the method of manufacturing the designed variable spectrometer according to the second alternative embodiment of the present invention.
第33圖為本發明之第三選擇實施例的設變光譜儀的製造方法之流程圖。 Figure 33 is a flow chart of the manufacturing method of the variable spectrometer according to the third alternative embodiment of the present invention.
第34圖為本發明之第四選擇實施例的設變光譜儀的製造方法之流程圖。 Figure 34 is a flow chart of the manufacturing method of the variable spectrometer according to the fourth alternative embodiment of the present invention.
第35圖為本發明之第四選擇實施例的一變型實施例的設變光譜儀的製造方法之流程圖。 FIG. 35 is a flowchart of a method of manufacturing a variable spectrometer according to a modified embodiment of the fourth alternative embodiment of the present invention.
第36圖為本發明之第五選擇實施例的設變光譜儀的製造方法之流程圖。 Figure 36 is a flow chart of the manufacturing method of the variable spectrometer according to the fifth alternative embodiment of the present invention.
第37圖為本發明之第五選擇實施例的一變型實施例的設變光譜儀的製造方法之流程圖。 FIG. 37 is a flowchart of a manufacturing method of a variable spectrometer according to a modified embodiment of the fifth alternative embodiment of the present invention.
以下描述用於揭露本發明以使本領域技術人員能夠實現本發明。以下描述中的選擇實施例只作為舉例,本領域技術人員可以想到其他顯而易見的變型。在以下描述中界定的本發明的基本原理可以應用於其他實施方 案、變形方案、改進方案、等同方案以及沒有背離本發明的精神和範圍的其他技術方案。 The following description is used to disclose the present invention so that those skilled in the art can implement the present invention. The selected embodiments in the following description are only examples, and those skilled in the art can think of other obvious variations. The basic principles of the present invention defined in the following description can be applied to other implementations Schemes, modified schemes, improved schemes, equivalent schemes and other technical schemes that do not depart from the spirit and scope of the present invention.
本領域技術人員應理解的是,在本發明的揭露中,術語“縱向”、“橫向”、“上”、“下”、“前”、“後”、“左”、“右”、“竪直”、“水準”、“頂”、“底”“內”、“外”等指示的方位或位置關係是基於附圖所示的方位或位置關係,僅是為了便於描述本發明和簡化描述,而不是指示或暗示所指的裝置或元件必須具有特定的方位、以特定的方位構造和操作。術語“相同”是指“實質上相同”,“實質上”通常定義“被特定之內容的大部分但非全部”,例如結構中雖存在公差仍視為實質上相同。所以在本發明所揭露的上述各術語不能理解為對本發明的限制。 Those skilled in the art should understand that, in the disclosure of the present invention, the terms "longitudinal", "lateral", "upper", "lower", "front", "rear", "left", "right", " The orientation or positional relationship indicated by "vertical", "horizontal", "top", "bottom", "inner", "outer", etc. are based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing and simplifying the present invention. The description does not indicate or imply that the pointed device or element must have a specific orientation, be constructed and operated in a specific orientation. The term "same" means "substantially the same", and "substantially" usually defines "most but not all of the specified content", for example, the structure is regarded as substantially the same even though there are tolerances in the structure. Therefore, the above-mentioned terms disclosed in the present invention should not be construed as limiting the present invention.
可以理解的是,術語“一”應理解為“至少一”或“一個或多個”,即在一個實施例中,一個元件的數量可以為一個,而在另外的實施例中,該元件的數量可以為多個,術語“一”不能理解為對數量的限制。 It can be understood that the term "a" should be understood as "at least one" or "one or more", that is, in one embodiment, the number of an element may be one, and in another embodiment, the number of the element The number can be more than one, and the term "one" cannot be understood as a restriction on the number.
特別地,本發明的光學理論可參照“DIFFRACTION GRATING HANDBOOK sixth edition,Christopher Palmer,Newport Corporation,Erwin Loewen(first edition),NEWPORT CORPORATION”。本發明的說明書內將不再多加贅述。 In particular, the optical theory of the present invention can refer to "DIFFRACTION GRATING HANDBOOK sixth edition, Christopher Palmer, Newport Corporation, Erwin Loewen (first edition), NEWPORT CORPORATION". The description of the present invention will not be repeated.
現今在各領域需要用光譜儀進行系統整合時,通常客戶端會提出所需光譜儀的規格,像是光譜範圍或解析度。而光譜儀製造商將依客戶提出規格提供光譜儀,但是客戶端卻常常發現因光譜儀接收端的結構空間太大無法與系統進行整合應用,使得光譜儀製造商需重新設計一款新的光譜儀以供客戶進行系統整合。然而,目前光譜儀的產品開發流程需經過光學設計、機構設 計、製作結構元件和採購光學元件、以及組裝製造以完成光譜儀的製作,在這個過程需耗費相當多的時間和人力。因此,重新設計新的光譜儀等同於需要再次的費時耗力,所以,本發明提供一種設變光譜儀的製造方法以縮短光譜儀的開發時程。 Nowadays, when a spectrometer is needed for system integration in various fields, the client usually proposes the specifications of the required spectrometer, such as the spectral range or resolution. The spectrometer manufacturer will provide the spectrometer according to the customer’s specifications, but the client often finds that the structural space at the receiving end of the spectrometer is too large to be integrated with the system. As a result, the spectrometer manufacturer needs to redesign a new spectrometer for the customer to implement the system. Integration. However, the current product development process of spectrometers needs to go through optical design and mechanical design. Designing, making structural elements, purchasing optical elements, and assembling and manufacturing to complete the production of the spectrometer, this process requires considerable time and manpower. Therefore, redesigning a new spectrometer is equivalent to requiring time and effort again. Therefore, the present invention provides a method for manufacturing a variable spectrometer to shorten the development time of the spectrometer.
請參照第1圖,為本發明的第一選擇實施例的設變光譜儀的製造方法。 Please refer to Fig. 1, which is the manufacturing method of the variable spectrometer according to the first alternative embodiment of the present invention.
本實施例之設變光譜儀的製造方法,包括: 步驟S101取得一參照光譜儀的多個參照參數與至少一設定規格。 The manufacturing method of the variable spectrometer of this embodiment includes: Step S101 obtains a plurality of reference parameters and at least one setting specification of a reference spectrometer.
步驟S102整合該參照光譜儀的該些參照參數的至少一必要參數到一設變光譜儀,使該設變光譜儀具有相同於該參照光譜儀的該設定規格。 Step S102 integrates at least one necessary parameter of the reference parameters of the reference spectrometer into a variable spectrometer, so that the variable spectrometer has the same setting specifications as the reference spectrometer.
步驟S103依據光學原理跟光柵方程式得到該設變光譜儀的多個自由參數。 Step S103 obtains a plurality of free parameters of the variable spectrometer according to the optical principle and the grating equation.
步驟S104設定該設變光譜儀的一設變入光元件於一設變殼體的一設變收光側,使該設變收光側短於該參照光譜儀的一參照殼體的一參照收光側。 Step S104: Set a variable light-receiving element of the variable spectrometer to a variable light receiving side of a variable housing, so that the variable light receiving side is shorter than a reference light receiving of a reference housing of the reference spectrometer side.
在上述方法中,將現有參照光譜儀的必要參數整合到設變光譜儀這個過程中,將可以縮短新的設變光譜儀在光學設計過程中設定規格的時程,從而縮短整體開發時程。 In the above method, integrating the necessary parameters of the existing reference spectrometer into the design variable spectrometer will shorten the time course for the new design variable spectrometer to set specifications in the optical design process, thereby shortening the overall development timeline.
可以理解的,多個參照參數包括至少一必要參數,而該參照光譜儀本身經由必要參數而達到設定規格。然而將必要參數整合到設變光譜儀時,設變光譜儀將具有與參照光譜儀相同的設定規格。同時在這個設定規格 下,將設變入光元件調整至相對參照光譜儀而言較短的收光側,這樣將使新設變光譜儀接收端的結構空間變小,以適用於客戶端的系統整合。明顯的,經由上述方法設計新的設變光譜儀所需的開發時程相對於從頭開始設計一款新的光譜儀而言,開發時程和人力成本都大大的縮減。 It can be understood that the multiple reference parameters include at least one necessary parameter, and the reference spectrometer itself reaches the set specification through the necessary parameters. However, when the necessary parameters are integrated into the design variable spectrometer, the design variable spectrometer will have the same setting specifications as the reference spectrometer. At the same time, set the specifications here Next, adjust the variable input element to the shorter light-receiving side of the reference spectrometer, which will reduce the structural space of the receiving end of the new variable spectrometer, which is suitable for the system integration of the client. Obviously, the development time course required to design a new design variable spectrometer through the above method is greatly reduced compared to the design of a new spectrometer from scratch.
另外,上述方法中,在該設變光譜儀能達到該設定規格下,更包括:設定該設變光譜儀的一設變參數,其包括:設定至少一設變反射元件於該設變入光元件之後。可以理解的,設變反射元件的加入,將改變設變入光元件之後的光路。也就是說,設變反射元件可以進一步地調整設變入光元件的設置位置。 In addition, in the above method, when the set variable spectrometer can reach the set specification, it further includes: setting a set variable parameter of the set variable spectrometer, which includes: setting at least one set variable reflecting element after the set variable light input element . It can be understood that the addition of the variable reflector element will change the optical path after the variable input light element. In other words, the setting position of the variable reflection element can be further adjusted.
在本發明的設變光譜儀的製造方法中,第一實施例的參照光譜儀100除了包括參照入光元件10和用於接收參照光譜儀內部光譜分量的參照光接收器50外,還有多種光譜儀組件設置於光譜儀內部,以使光譜儀達到各種規格,例如:參照準直面鏡20、參照平面光柵30、參照聚焦面鏡40。進一步地說,在這個實施例中參照光譜儀100包括一參照入光元件10,一參照準直面鏡20,一參照平面光柵30,一參照聚焦面鏡40以及一參照光接收器50。換言之,外部待測光將經由參照光譜儀100的參照入光元件10進入參照光譜儀100的自由空間,並且待測光在自由空間裡經過參照準直面鏡20到參照平面光柵30,並經由參照平面光柵30分光後,通過參照聚焦面鏡40聚焦於參照光接收器50。另外,在這個實施例中設變光譜儀100’包括一設變入光元件10’,一設變準直面鏡20’,一設變平面光柵30’,一設變聚焦面鏡40’,以及一設變光接收器50’。同樣地,外部待測光通過設變光譜儀100’的設變入光元件10’直接經由設變準直面鏡
20’反射到設變平面光柵30’,並經由設變平面光柵30’分光後通過設變聚焦面鏡40’聚光至設變光接收器50’。
In the manufacturing method of the variable spectrometer of the present invention, the
在這個實施例中,參照光譜儀100的參照入光元件10到參照準直面鏡20之間的光路距離定義為r1,參照準直面鏡20到參照平面光柵30之間的光路距離定義為r2,參照平面光柵30到參照聚焦面鏡40之間的光路距離定義為r3,參照聚焦面鏡40到參照光接收器50之間的光路距離定義為r4。參照準直面鏡20的焦距定義為fm1。參照聚焦面鏡40的焦距定義為fm2。參照平面光柵30的週期定義為d。參照準直面鏡20的光入射角和反射角定義為θ 1。參照聚焦面鏡40的光入射角和反射角定義為θ 2。參照平面光柵30的光入射角定義為α,繞射角定義為β。另外,設變光譜儀100’的設變入光元件10’到設變準直面鏡20’之間的光路距離定義為r1’,設變準直面鏡20’到設變平面光柵30之間的光路距離定義為r2’,設變平面光柵30’到設變聚焦面鏡40’之間的光路距離定義為r3’,設變聚焦面鏡40’到設變光接收器50’之間的光路距離定義為r4’。設變準直面鏡20’的焦距定義為fm1’。設變聚焦面鏡40’的焦距定義為fm2’。設變平面光柵30’的週期定義為d’。設變準直面鏡20’的光入射角和反射角定義為θ 1’。設變聚焦面鏡40’的光入射角和反射角定義為θ 2’。設變平面光柵30的光入射角定義為α’,繞射角定義為β’。
In this embodiment, the optical path distance between the reference
根據上述方法中參照光譜儀100的設定規格,包括一光譜範圍。
進一步地說,設定設變光譜儀100’具有相同於參照光譜儀100的必要參數,使設變光譜儀100’能達到與參照光譜儀100相同的光譜範圍。在此,參照光譜儀100的必要參數包括參照平面光柵30和參照聚焦面鏡40的光路距離,參照聚焦面鏡40的焦距以及參照平面光柵30條數。也就是說,取得參照光譜儀100的參照平
面光柵30和參照聚焦面鏡40的光路距離r3,參照聚焦面鏡40的焦距fm2以及參照平面光柵30條數的必要參數。將參照光譜儀100的必要參數整合到設變光譜儀100’,使設變光譜儀100’具有與參照光譜儀100相同的光譜範圍。即設變光譜儀100’的設變平面光柵30’和設變聚焦面鏡40’的光路距離r3’等於參照光譜儀100的參照平面光柵30和參照聚焦面鏡40的光路距離r3。設變光譜儀100’的設變聚焦面鏡40的焦距fm2’等於參照光譜儀100的參照聚焦面鏡40的焦距fm2。設變光譜儀100’的設變平面光柵30’條數等於參照光譜儀100的參照平面光柵30條數。
According to the above method, the setting specification of the
另外,參照光譜儀100的設定規格,更包括一解析度。進一步地說,設定設變光譜儀100’具有相同於參照光譜儀100的必要參數,使設變光譜儀100’能達到與參照光譜儀100相同的解析度。參照光譜儀100的必要參數更包括該參照準直面鏡20的焦距fm1。也就是說,取得參照光譜儀100的參照準直面鏡20的焦距fm1。將參照光譜儀100的必要參數整合到設變光譜儀100’,使設變光譜儀100’具有與參照光譜儀100相同的解析度。即設變光譜儀100’的設變準直面鏡20’的焦距fm1’等於參照光譜儀100的參照準直面鏡20的焦距fm1。
In addition, referring to the setting specifications of the
值得一提的,光譜儀組件有多種的設置方案,而這些的設置方案將不影響本發明的設變光譜儀的製造方法。舉例而言,設變準直面鏡20’、設變平面光柵30’,設變聚焦面鏡40’及其組合方式可以是穿透式或是反射式。光譜儀的光路設計經由光譜儀組件的設置將形成M字型、交錯星型、立體摺疊等方式。設變準直面鏡20’、設變平面光柵30’,設變聚焦面鏡40’設置時,其相對角度可依據需求旋轉。設變平面光柵30’的閃耀角可以進行任何變化。依據這些設置方案在以下將進行不同實施態樣的說明。 It is worth mentioning that there are various setting schemes for the spectrometer assembly, and these setting schemes will not affect the manufacturing method of the variable spectrometer of the present invention. For example, the variable collimating mirror 20', the variable planar grating 30', the variable focusing mirror 40' and the combination thereof can be transmissive or reflective. The optical path design of the spectrometer will form an M shape, a staggered star shape, and three-dimensional folding through the setting of the spectrometer components. When the variable collimating mirror 20', the variable plane grating 30' are set, and the variable focusing mirror 40' is set, the relative angle can be rotated according to requirements. The blaze angle of the variable plane grating 30' can be changed in any way. According to these setting schemes, different implementation modes will be explained below.
如第2圖和第3圖所示為第一選擇實施例之方法的第一實施態樣。第2圖為設變光譜儀的製造方法中參照光譜儀光路示意圖。第3圖為設變光譜儀的製造方法中第一實施態樣的設變光譜儀光路示意圖。在這個實施態樣中,參照光譜儀100和設變光譜儀100’的光譜儀組件設置方式,使二者的光路設計皆形成M字型,並且在設定規格的光譜範圍相同。換言之,將參照光譜儀100的必要參數整合到設變光譜儀100’,使設變光譜儀100’的設變平面光柵30和設變聚焦面鏡40’的光路距離r3’等於參照光譜儀100的參照平面光柵30和參照聚焦面鏡40的光路距離r3。設變光譜儀100’的設變聚焦面鏡40’的焦距fm2’等於參照光譜儀100的參照聚焦面鏡40的焦距fm2。設變光譜儀100’的設變平面光柵30’條數等於參照光譜儀100的參照平面光柵30條數。特別地,本實施態樣的設變光譜儀100’的設變入光元件10’和設變準直面鏡20’的光路距離r1’不等於參照光譜儀100的參照入光元件10和參照準直面鏡20的光路距離r1。值得一提的,設變入光元件10’與參照入光元件10採取垂直收光。
Figures 2 and 3 show the first implementation aspect of the method of the first alternative embodiment. Figure 2 is a schematic diagram of the optical path of the reference spectrometer in the manufacturing method of the variable spectrometer. Figure 3 is a schematic diagram of the optical path of the design variable spectrometer in the first embodiment of the manufacturing method of the design variable spectrometer. In this embodiment, referring to the configuration of the spectrometer components of the
舉例來說,本實施態樣的參照光譜儀100的中心波長為600nm,範圍為200-1000nm,θ 1=15度,θ 2=20度,fm1=60mm,fm2=60mm,α=10度,β=-40度,m=-1,d=2um,r1=60mm,r2=50mm,r3=45mm,r4=60mm。依據設變光譜儀的製造方法將參照光譜儀100的r3,fm2,和d的參照參數取得並達到設定規格後,整合到設變光譜儀100’並使設變光譜儀100’能達到設定規格數據下,依據光學原理、必要參數、設變參數與/或光柵方程式sinα+sinβ=mλ/d設定設變光譜儀的多個自由參數,舉例來說設定後的參數例如:設變光譜儀100’的中心波長為600nm,範圍為200-1000nm,θ 1’=15度,θ 2’=20度,
fm1’=70mm,fm2’=60mm,α’=10度,β’=-40度,m’=-1,d’=2um,r1’=70mm,r2’=50mm,r3’=45mm,r4’=60mm。
For example, the center wavelength of the
如第4圖所示為第一選擇實施例之方法的第二實施態樣的設變光譜儀光路示意圖。在這個實施態樣中,參照光譜儀100的光路示意圖與第2圖相同,並且在參照光譜儀100和設變光譜儀100’的設定規格中光譜範圍和解析度皆相同。另外,參照聚焦面鏡40採用反射式。設變聚焦面鏡40’採用穿透式。進一步地說,將參照光譜儀100的必要參數整合到設變光譜儀100’,使設變光譜儀100’的設變平面光柵30和設變聚焦面鏡40’的光路距離r3’等於參照光譜儀100的參照平面光柵30和參照聚焦面鏡40的光路距離r3。設變光譜儀100’的設變聚焦面鏡40’的焦距fm2’等於參照光譜儀100的參照聚焦面鏡40的焦距fm2。設變光譜儀100’的設變平面光柵30’條數等於參照光譜儀100的參照平面光柵30條數。設變光譜儀100’的設變入光元件10’和設變準直面鏡20’的光路距離r1’等於參照光譜儀100的參照入光元件10和參照準直面鏡20的光路距離r1。
Fig. 4 is a schematic diagram of the optical path of the set variable spectrometer of the second implementation aspect of the method of the first alternative embodiment. In this embodiment, the schematic diagram of the optical path of the
舉例來說,本實施態樣的參照光譜儀100的中心波長為600nm,範圍為200-1000nm,θ 1=15度,θ 2=20度,fm1=60mm,fm2=60mm,α=10度,β=-40度,m=-1,d=2um,r1=60mm,r2=50mm,r3=45mm,r4=60mm。依據設變光譜儀的製造方法將參照光譜儀100的r3,fm2,和d的參照參數取得並達到設定規格後,整合到設變光譜儀100’並使設變光譜儀100’能達到設定規格數據下,依據光學原理、必要參數、設變參數與/或光柵方程式sinα+sinβ=mλ/d設定設變光譜儀的多個自由參數,舉例來說設定後的參數例如:設變光譜儀100’的中心波長為600nm,範圍為200-1000nm,θ 1’=15度,θ 2’=20度,
fm1’=60mm,fm2’=60mm,α’=10度,β’=-40度,m’=-1,d’=2um,r1’=60mm,r2’=50mm,r3’=45mm,r4’=60mm。
For example, the center wavelength of the
如第5圖所示為第一選擇實施例之設變光譜儀的製造方法中第三實施態樣的設變光譜儀光路示意圖。在這個實施態樣中,參照光譜儀100的光路示意圖與第2圖相同。參照光譜儀100和設變光譜儀100’的設定規格中光譜範圍和解析度相同。參照光譜儀100的的光譜儀組件設置方式使光路設計形成M字型,而設變光譜儀100’的光譜儀組件設置方式使光路設計形成交錯星型。換言之,參照光譜儀100的必要參數,使設變光譜儀100’能達到與參照光譜儀100相同設定規格,並且依光學原得到該設變光譜儀的多個自由參數,像是參照準直面鏡20的光入射角和反射角θ 1和設變準直面鏡20’的光入射角和反射角θ 1’不相同。參照聚焦面鏡40的光入射角和反射角θ 2和設變聚焦面鏡40’的光入射角和反射角θ 2’不相同。
Fig. 5 is a schematic diagram of the optical path of the design variable spectrometer in the third embodiment of the method of manufacturing the variable spectrometer of the first alternative embodiment. In this embodiment, the schematic diagram of the optical path of the
舉例來說,本實施態樣的參照光譜儀100的中心波長為600nm,範圍為200-1000nm,θ 1=15度,θ 2=20度,fm1=60mm,fm2=60mm,α=10度,β=-40度,m=-1,d=2um,r1=60mm,r2=50mm,r3=45mm,r4=60mm。依據設變光譜儀的製造方法將參照光譜儀100的r3,fm2,和d的參照參數取得並達到設定規格後,整合到設變光譜儀100’並使設變光譜儀100’能達到設定規格數據下,依據光學原理、必要參數、設變參數與/或光柵方程式sinα+sinβ=mλ/d設定設變光譜儀的多個自由參數,舉例來說設定後的參數例如:設變光譜儀100’的中心波長為600nm,範圍為200-1000nm,θ 1’=10度,θ 2’=15度,fm1’=60mm,fm2’=60mm,α’=10度,β’=-40度,m’=-1,d’=2um,r1’=60mm,r2’=50mm,r3’=45mm,r4’=60mm。
For example, the center wavelength of the
如第6圖所示為第一選擇實施例之設變光譜儀的製造方法中第四實施態樣的設變光譜儀光路示意圖。在這個實施態樣中,參照光譜儀100的光路示意圖與第2圖相同。參照光譜儀100和設變光譜儀100’的光譜儀組件設置方式,使二者的光路設計形成不同型態的M字型,並且在設定規格中光譜範圍相同和解析度相同。換言之,在本實施態樣中參照聚焦面鏡40的光入射角和反射角θ 2和設變聚焦面鏡40’的光入射角和反射角θ 2’不相同。
Fig. 6 shows a schematic diagram of the optical path of the design variable spectrometer in the fourth embodiment of the method of manufacturing the variable spectrometer of the first alternative embodiment. In this embodiment, the schematic diagram of the optical path of the
舉例來說,本實施態樣的參照光譜儀100的中心波長為600nm,範圍為200-1000nm,θ 1=15度,θ 2=20度,fm1=60mm,fm2=60mm,α=10度,β=-40度,m=-1,d=2um,r1=60mm,r2=50mm,r3=45mm,r4=60mm。依據設變光譜儀的製造方法將參照光譜儀100的r3,fm2,和d的參照參數取得並達到設定規格後,整合到設變光譜儀100’並使設變光譜儀100’能達到設定規格數據下,依據光學原理、必要參數、設變參數與/或光柵方程式sinα+sinβ=mλ/d設定設變光譜儀的多個自由參數,舉例來說設定後的參數例如:設變光譜儀100’的中心波長為600nm,範圍為200-1000nm,θ 1’=15度,θ 2’=15度,fm1’=60mm,fm2’=60mm,α’=10度,β’=-40度,m’=-1,d’=2um,r1’=60mm,r2’=50mm,r3’=45mm,r4’=60mm。
For example, the center wavelength of the
如第7圖所示為第一選擇實施例之設變光譜儀的製造方法中第五實施態樣的設變光譜儀光路示意圖。在這個實施態樣中,參照光譜儀100的光路示意圖與第2圖相同。參照光譜儀100和設變光譜儀100’的光譜儀組件設置方式,使二者的光路設計形成不同型態的M字型,並且在設定規格中光譜範圍相同和解析度相同。換言之,參照準直面鏡20的光入射角和反射角θ 1和設變準
直面鏡20’的光入射角和反射角θ 1’不相同。參照聚焦面鏡40的光入射角和反射角θ 2和設變聚焦面鏡40’的光入射角和反射角θ 2’不相同。
As shown in FIG. 7, it is a schematic diagram of the optical path of the design variable spectrometer in the fifth embodiment of the method of manufacturing the variable spectrometer of the first alternative embodiment. In this embodiment, the schematic diagram of the optical path of the
舉例來說,本實施態樣的參照光譜儀100的中心波長為600nm,範圍為200-1000nm,θ 1=15度,θ 2=20度,fm1=60mm,fm2=60mm,α=10度,β=-40度,m=-1,d=2um,r1=60mm,r2=50mm,r3=45mm,r4=60mm。依據設變光譜儀的製造方法將參照光譜儀100的r3,fm2,和d的參照參數取得並達到設定規格後,整合到設變光譜儀100’並使設變光譜儀100’能達到設定規格數據下,依據光學原理、必要參數、設變參數與/或光柵方程式sinα+sinβ=mλ/d設定設變光譜儀的多個自由參數,舉例來說設定後的參數例如:設變光譜儀100’的中心波長為600nm,範圍為200-1000nm,θ 1’=10度,θ 2’=15度,fm1’=60mm,fm2’=60mm,α’=10度,β’=-40度,m’=-1,d’=2um,r1’=60mm,r2’=50mm,r3’=45mm,r4’=60mm。
For example, the center wavelength of the
值得一提的,光柵方程式為sinα+sinβ=mλ/d。α為入射角,即入射光束和光柵法線夾角。β為繞射角,即繞射光束和光柵法綫夾角。m為光譜級數。λ為衍射光的波長。d為狹縫之間的間距,亦稱為光柵常數(週期)。特別地,如α和β都在光柵法線同一側,方程取“+”號,如α和β都在光柵法線異側時,方程取“-”號,即α和β可適應調整以避免各元件或光路碰撞。另外,光柵方程對每個不同的m值有相應的光譜,稱為光譜級數。當m取0,1,2...時,分別為0階,1階,2階光譜。相應於各m的負值,有各負階光譜。所謂0階光譜,就是光柵不起色散作用,只起鏡面反射形成的入射狹縫的像。 It is worth mentioning that the grating equation is sinα+sinβ=mλ/d. α is the angle of incidence, that is, the angle between the incident beam and the normal of the grating. β is the angle of diffraction, that is, the angle between the diffracted beam and the normal of the grating. m is the spectral order. λ is the wavelength of diffracted light. d is the distance between the slits, also known as the grating constant (period). In particular, if both α and β are on the same side of the grating normal, the equation takes the "+" sign. If both α and β are on the opposite side of the grating normal, the equation takes the "-" sign, that is, α and β can be adjusted to Avoid collisions of components or light paths. In addition, the grating equation has a corresponding spectrum for each different value of m, which is called the spectrum order. When m is 0, 1, 2..., they are 0-order, 1st-order, and 2nd-order spectra, respectively. Corresponding to each negative value of m, there are various negative-order spectra. The so-called 0-order spectrum means that the grating has no chromatic dispersion effect and only acts as an image of the incident slit formed by specular reflection.
在本實施例中,依據上述設變光譜儀的製造方法將設變入光元件10’設置於相對理想的位置,以利後續設變光譜儀100’進行系統整合。同時依 據上述5個實施態樣,進一步地可延伸出設變入光元件10’設置的各種實施態樣,以下將進一步地進行說明。 In this embodiment, according to the aforementioned manufacturing method of the variable spectrometer, the variable input element 10' is arranged at a relatively ideal position, so as to facilitate the subsequent system integration of the variable spectrometer 100'. At the same time According to the above five implementation aspects, various implementation aspects of the arrangement of the variable-entry light element 10' can be further extended, which will be further described below.
第8圖所示為第一選擇實施例之設變光譜儀的製造方法中第六實施態樣的參照光譜儀光路示意圖。第9圖所示為第一選擇實施例之設變光譜儀的製造方法中第六實施態樣的設變光譜儀光路示意圖。在這個實施態樣中,參照光譜儀100和設變光譜儀100’的設定規格中光譜範圍和解析度皆相同。參照入光元件10和設變入光元件10’的設置位置不同。
FIG. 8 is a schematic diagram of the optical path of the reference spectrometer in the sixth embodiment of the manufacturing method of the variable spectrometer of the first alternative embodiment. Fig. 9 is a schematic diagram of the optical path of the design variable spectrometer in the sixth embodiment of the manufacturing method of the design variable spectrometer of the first alternative embodiment. In this embodiment, the spectral range and resolution in the setting specifications of the
進一步地,根據上述設變光譜儀的製造方法更包括,設定至少一設變反射元件於該設變入光元件之後。換言之,設置至少一設變反射元件60’於設變入光元件10’和設變準直面鏡20’之間。特別地,參照光譜儀100還包括一參照殼體70。參照殼體70包括一參照收光側71。參照入光元件10設置於參照殼體70的參照收光側71。參照光譜儀100的參照入光元件10和參照準直面鏡20的光路距離r1。設變光譜儀100’還包括一設變殼體70’。設變殼體70’包括一設變收光側71’。設變入光元件10’設置於設變殼體70’的設變收光側71’。參照收光側71的寬度較長於設變收光側71’。另外,設變光譜儀100’還包括至少一設變反射元件60’。設變反射元件60’設置於設變入光元件10’和設變準直面鏡20’之間。設變入光元件10’和設變反射元件60’之間的光路距離設定為r5’,設變反射元件60’和設變準直面鏡20’之間的光路距離設定為r6’。參照光譜儀100和設變光譜儀100’的解析度相同,故r1=r5’+r6’。換言之,參照光譜儀100的參照入光元件10和參照準直面鏡20的光路距離r1等於設變光譜儀100’的設變入光元件10’和設變反射元件60’之間的光路距離r5’加上設變光譜儀100’的設變反射元件60’和設變準直面鏡20’之間的光路距離r6’。可以理解的,因為設變反射元件60’的設置,改變
設變入光元件10’和設變準直面鏡20’之間光路的走向,因此可同步調整改變設變入光元件10’的位置。依據系統整合的需求,將設變入光元件10’設置在設變光譜儀100’的設變收光側71’,以使設變光譜儀100’的設變收光側71’相對參照光譜儀100的參照收光側71而言,寬度較小。
Furthermore, according to the manufacturing method of the above-mentioned design variable spectrometer, it further includes setting at least one design variable reflecting element after the design variable light-incoming element. In other words, at least one variable reflective element 60' is provided between the variable light entrance element 10' and the variable collimating mirror 20'. In particular, the
值得一提的,將本實施態樣參照第一實施態樣,在第一實施態樣中參照光譜儀100和設變光譜儀100’的解析度不相同。因此,對照本實施態樣在第一實施態樣中,可將設變入光元件10’設置在設變光譜儀100’的設變收光側71’,設變反射元件60’設置於設變入光元件10’之後,這樣第一實施態樣與本實施態樣不同的是參照光譜儀100的參照入光元件10和參照準直面鏡20的光路距離r1不等於設變光譜儀100’的設變入光元件10’和設變反射元件60’之間的光路距離r5’加上設變光譜儀100’的設變反射元件60’和設變準直面鏡20’之間的光路距離r6’,即r1≠r5’+r6’。
It is worth mentioning that the present embodiment is referred to the first embodiment. In the first embodiment, the resolutions of the
如10圖所示為第一選擇實施例之設變光譜儀的製造方法中第七實施態樣的參照光譜儀光路示意圖。第11圖所示為第一選擇實施例之設變光譜儀的製造方法中第七實施態樣的設變光譜儀光路示意圖。在這個實施態樣中,參照光譜儀100和設變光譜儀100’的設定規格中光譜範圍和解析度皆相同。參照入光元件10和設變入光元件10’的設置位置不同。參照收光側71的寬度較長於設變收光側71’。參照殼體70的參照收光側71具有一參照凹槽711,參照入光元件10設置於參照凹槽711。經由設變光譜儀的製造方法將設變入光元件10’設置於設變光譜儀100’的設變收光側71’,並且參照光譜儀100的參照入光元件10和參照準直面鏡20的光路距離r1等於設變光譜儀100’的設變入光元件10’和設變反射元件60’之間的光路距離r5’加上設變光譜儀100’的設變反射元件60’和設變準直
面鏡20’之間的光路距離r6’。可以理解的,不管參照入光元件10原始的設置位置,通過本發明的方法皆可調整設變入光元件10’的設置位置,並使其位於設變殼體70’的相對短邊。
FIG. 10 shows a schematic diagram of the optical path of the reference spectrometer in the seventh embodiment in the manufacturing method of the variable spectrometer of the first alternative embodiment. Fig. 11 is a schematic diagram of the optical path of the design variable spectrometer in the seventh embodiment of the manufacturing method of the design variable spectrometer of the first alternative embodiment. In this embodiment, the spectral range and resolution in the setting specifications of the
如12圖所示為第一選擇實施例之設變光譜儀的製造方法中第八實施態樣的參照光譜儀光路示意圖。第13圖所示為第一選擇實施例之設變光譜儀的製造方法中第八實施態樣的設變光譜儀光路示意圖。在這個實施態樣中,參照光譜儀100和設變光譜儀100’的光譜範圍相同。參照入光元件10和設變入光元件10’的設置位置不同。設變殼體70’的設變收光側71’具有一突出部712’。參照入光元件10設置於參照收光側71。經由設變光譜儀的製造方法將設變入光元件10’設置於設變光譜儀100’的設變收光側71’的突出部712’。在這個實施態樣中,參照光譜儀100和設變光譜儀100’的解析度可以相同,亦可以不同,依設變光譜儀的製造方法只要參照光譜儀100和設變光譜儀100’的至少一項設定規格相同即可。因此,可以理解地,當參照光譜儀100和設變光譜儀100’的解析度相同時,即r1=r5’+r6’;當參照光譜儀100和設變光譜儀100’的解析度不相同時,即r1≠r5’+r6’,其中並不影響設變入光元件10’的設置。
Fig. 12 is a schematic diagram of the optical path of the reference spectrometer in the eighth embodiment in the manufacturing method of the variable spectrometer of the first alternative embodiment. FIG. 13 is a schematic diagram of the optical path of the eighth implementation aspect of the design variable spectrometer in the manufacturing method of the first alternative embodiment of the design variable spectrometer. In this embodiment, the
如第14圖所示為第一選擇實施例之設變光譜儀的製造方法中第九實施態樣的參照光譜儀光路示意圖。第15圖和第16圖所示為第一選擇實施例之設變光譜儀的製造方法中第九實施態樣的設變光譜儀光路示意圖。在這個實施態樣中,參照光譜儀100和設變光譜儀100’的設定規格中光譜範圍和解析度皆相同。參照入光元件10和設變入光元件10’的設置位置不同。參照殼體70的參照收光側71具有一傾斜部713,參照入光元件10設置於傾斜部713。經由設變光譜儀的製造方法將設變入光元件10’設置於設變光譜儀100’的設變收光側71’。如
第15圖和第16圖所示,設變殼體70’的修改或者不同樣式將不會影響設變入光元件10’的設置。並且不管參照入光元件10原始的設置位置,通過本發明的方法皆可調整設變入光元件10’的設置位置,並使其位於設變殼體70’的相對短邊。另外,設變入光元件10’與設變殼體70’的設置將使外部待測光垂直進入設變光譜儀100’,即設變入光元件10’將採取垂直收光。另外,參照入光元件10亦為垂直收光。
Fig. 14 is a schematic diagram of the optical path of the reference spectrometer in the ninth embodiment of the method for manufacturing the variable spectrometer of the first alternative embodiment. 15 and 16 are schematic diagrams of the optical path of the design variable spectrometer in the ninth embodiment of the manufacturing method of the design variable spectrometer of the first alternative embodiment. In this embodiment, the spectral range and resolution in the setting specifications of the
如第17圖所示為第一選擇實施例之設變光譜儀的製造方法中第十實施態樣的參照光譜儀光路示意圖。第18圖所示為第一選擇實施例之設變光譜儀的製造方法中第十實施態樣的設變光譜儀光路示意圖。在這個實施態樣中,參照光譜儀100和設變光譜儀100’的設定規格中光譜範圍和解析度皆相同。
參照入光元件10和入光元件10’的設置位置不同。
Fig. 17 is a schematic diagram of the optical path of the reference spectrometer in the tenth embodiment of the method for manufacturing the variable spectrometer of the first alternative embodiment. Fig. 18 is a schematic diagram of the optical path of the design variable spectrometer of the tenth embodiment in the method of manufacturing the design variable spectrometer of the first alternative embodiment. In this embodiment, the spectral range and resolution in the setting specifications of the
進一步地,參照光譜儀100還包括一參照殼體70。參照殼體70包括一參照收光側71。參照殼體70的參照收光側71具有一傾斜部713,參照入光元件10設置於傾斜部713。參照光譜儀100的參照入光元件10和參照準直面鏡20的光路距離r1。設變光譜儀100’還包括一設變殼體70’。設變殼體70’包括一設變收光側71’。設變入光元件10’設置於設變殼體70’的設變收光側71’。參照收光側71的寬度較長於設變收光側71’。特別地,在本實施態樣中在設變光譜儀100’增加二設變反射元件60’,其分別設置於設變入光元件10’和設變準直面鏡20’之間。以下為方便說明,將二設變反射元件60’分別定義為第一設變反射元件61’和第二設變反射元件62’。
Furthermore, the
值得一提的,設變入光元件10’和第一設變反射元件61’之間的光路距離設定為r7’,第一設變反射元件61’和第二設變反射元件62’之間的光路距
離設定為r8’,第二設變反射元件62’和設變準直面鏡20’之間的光路距離設定為r9’,其中參照光譜儀100和設變光譜儀100’的解析度相同,故可以理解r1=r7’+r8’+r9’。換言之,參照光譜儀100的參照入光元件10和參照準直面鏡20的光路距離等於設變光譜儀100’的設變入光元件10’和第一設變反射元件61’之間的光路距離加上設變光譜儀100’的第一設變反射元件61’和第二設變反射元件62’之間的光路距離加上設變光譜儀100’的第二設變反射元件62’和設變準直面鏡20’之間的光路距離。可以理解的,因為第一設變反射元件61’和第二設變反射元件62’的設置,將改變設變入光元件10’和設變準直面鏡20’之間光路的走向,因此可同步調整改變設變入光元件10’的設置位置。依據系統整合的需求,將設變入光元件10’設置在設變光譜儀100’的設變收光側71’,以使設變光譜儀100’的設變收光側71’相對參照光譜儀100的參照收光側71而言,寬度較小。
It is worth mentioning that the optical path distance between the variable incident light element 10' and the first variable reflective element 61' is set to r7', and the distance between the first variable reflective element 61' and the second variable reflective element 62' Optical path distance
The distance is set to r8', the optical path distance between the second set variable reflecting element 62' and the set variable collimating mirror 20' is set to r9', where the resolution of the
如第19圖所示為第一選擇實施例之設變光譜儀的製造方法中第十一實施態樣的參照光譜儀光路示意圖。第20圖所示為第一選擇實施例之設變光譜儀的製造方法中第十一實施態樣的設變光譜儀光路示意圖。在這個實施態樣中,參照光譜儀100和設變光譜儀100’的光譜範圍相同。參照入光元件10和設變入光元件10’的設置位置不同。參照光譜儀100還包括一參照殼體70。參照殼體70包括一參照收光側71。參照入光元件10設置於參照殼體70的參照收光側71。設變光譜儀100’包括一設變殼體70’。設變殼體70’包括一設變收光側71’。
設變收光側71’具有一突出部712’。設變入光元件10’設置於設變收光側71’的突出部712’。可以理解的,依據設變光譜儀的製造方法取得參照光譜儀100的光譜範圍,從而使設變光譜儀100’的設變準直面鏡20’,設變平面光柵30’,設變聚焦面鏡40’和設變光接收器50’相對設置後,並將設變入光元件10’設置於設變收
光側71’的突出部712’。特別地,本實施態樣的設變收光側71’和參照收光側71的寬度是相等的。但是,由於是將設變入光元件10’是設置於設變收光側71’的突出部712’,故設變光譜儀100’接收端相對參照光譜儀100而言,亦是具有較小的結構空間尺寸。換言之,在該設變光譜儀100’能達到該設定規格數據下,設變光譜儀100’的設變入光元件10’可依據實際的需求設置於殼體70’的任何一個部位,這不為本發明的限制。
Fig. 19 is a schematic diagram of the optical path of the reference spectrometer in the eleventh embodiment in the method of manufacturing the variable spectrometer of the first alternative embodiment. Figure 20 is a schematic diagram of the optical path of the eleventh embodiment of the method of manufacturing the variable spectrometer of the first alternative embodiment. In this embodiment, the
請參照第1圖,為本發明的第二選擇實施例的一設變光譜儀的製造方法。 Please refer to FIG. 1, which is a manufacturing method of a variable spectrometer according to a second alternative embodiment of the present invention.
本實施例之一設變光譜儀的製造方法,包括: The manufacturing method of a variable spectrometer of this embodiment includes:
步驟S101取得一參照光譜儀的多個參照參數與至少一設定規格。 Step S101 obtains a plurality of reference parameters and at least one setting specification of a reference spectrometer.
步驟S102整合該參照光譜儀的該些參照參數的至少一必要參數到一設變光譜儀,使該設變光譜儀具有相同於該參照光譜儀的該設定規格。 Step S102 integrates at least one necessary parameter of the reference parameters of the reference spectrometer into a variable spectrometer, so that the variable spectrometer has the same setting specifications as the reference spectrometer.
步驟S103依據光柵方程式得到該設變光譜儀的多個自由參數。 Step S103 obtains a plurality of free parameters of the set variable spectrometer according to the grating equation.
步驟S104設定該設變光譜儀的一設變入光元件於一設變殼體的一設變收光側,使該設變收光側短於該參照光譜儀的一參照殼體的一參照收光側。 Step S104: Set a variable light-receiving element of the variable spectrometer to a variable light receiving side of a variable housing, so that the variable light receiving side is shorter than a reference light receiving of a reference housing of the reference spectrometer side.
上述方法中,該些參照參數包括至少一必要參數以使該參照光譜儀能達到該設定規格。 In the above method, the reference parameters include at least one necessary parameter so that the reference spectrometer can reach the set specification.
上述方法中,在該設變光譜儀能達到該設定規格下,更包括:設定至少一設變反射元件於該設變入光元件之後。 In the above method, under the condition that the set variable spectrometer can reach the set specification, it further includes: setting at least one set variable reflective element after the set variable light input element.
依據該設變光譜儀的製造方法,在這個實施例中參照光譜儀100A包括一參照入光元件10A,一參照凹面光柵30A,一參照光接收器50A,以及一參照光波導裝置80A。在外部待測光通過參照入光元件10A進入參照光波導裝置80A,並經由參照凹面光柵30A分光後,參照光接收器50A接收分光的光譜分量。在這個實施例中設變光譜儀100A’包括一設變入光元件10A’,一設變凹面光柵30A’,一設變光接收器50A’,以及一設變光波導裝置80A’,其中外部待測光通過設變入光元件10A’到設變凹面光柵30A’,並且經由設變凹面光柵30A’分光後傳遞至設變光接收器50A’。
According to the manufacturing method of the variable spectrometer, in this embodiment, the
值得一提的,參照光譜儀100A的參照入光元件10到參照凹面光柵30A之間的光路距離定義為R1,參照凹面光柵30A到參照光接收器50A之間的光路距離定義為R2。參照凹面光柵30A的週期定義為d。參照凹面光柵30A的光入射角定義為α,繞射角定義為β。另外,設變光譜儀100A’的設變入光元件10A’到設變凹面光柵30A’之間的光路距離定義為R1’。設變凹面光柵30A’到設變光接收器50’之間的光路距離定義為R2’。設變凹面光柵30A’的週期定義為d’。設變凹面光柵30A’的光入射角定義為α’,繞射角定義為β’。
It is worth mentioning that the optical path distance between the reference
根據該設變光譜儀的製造方法中參照光譜儀100的設定規格,包括一光譜範圍。進一步地說,設定設變光譜儀100’具有相同於參照光譜儀100的必要參數,使設變光譜儀100’能達到與參照光譜儀100相同的光譜範圍。參照光譜儀100的必要參數包括參照凹面光柵30A和參照光接收器50A的光路距離,以及參照凹面光柵30A條數。也就是說,取得參照光譜儀100的參照凹面光柵30A和參照光接收器50A的光路距離R2和參照凹面光柵30A條數的必要參數。將參照光譜儀100的必要參數整合到設變光譜儀100’,使設變光譜儀100’具有與參照
光譜儀100相同的光譜範圍。即參照凹面光柵30A和參照光接收器50A的光路距離R2等於設變凹面光柵30A’到設變光接收器50’之間的光路距離定義為R2’,以及參照凹面光柵30A條數等於設變凹面光柵30A’條數。
According to the setting specification of the
另外,光譜儀組件有多種的設置方案,而這些的設置方案將不影響本發明的設變光譜儀的製造方法。舉例而言,設變凹面光柵30A’可實施為穿透式或反射式。設變光譜儀的光路設計可實施為交錯星型或立體摺疊等。特別地,設變凹面光柵30’的閃耀角還可以進行任何變化。這些將不為本發明的限制,並且依據這些設置方案將在以下進行不同實施態樣的說明。 In addition, the spectrometer component has a variety of setting schemes, and these setting schemes will not affect the manufacturing method of the variable spectrometer of the present invention. For example, the variable concave grating 30A' can be implemented as a transmissive type or a reflective type. The optical path design of the variable spectrometer can be implemented as a staggered star or three-dimensional folding. In particular, the blaze angle of the variable concave grating 30' can also be changed in any way. These are not limitations of the present invention, and different implementation modes will be described below according to these setting schemes.
第21圖為第二選擇實施例之設變光譜儀的製造方法中第一實施態樣的參照光譜儀光路示意圖。第22圖為第二選擇實施例之設變光譜儀的製造方法中第一實施態樣的設變光譜儀光路示意圖。在這個實施態樣中,參照光譜儀100A和設變光譜儀100A’的設定規格中光譜範圍相同。也就是說,設變光譜儀100A’的設變凹面光柵30A’和設變光接收器50A’的光路距離R2’等於參照光譜儀100A的參照凹面光柵30A和參照光接收器50A的光路距離R2。設變光譜儀100A’的設變凹面光柵30A’條數等於參照光譜儀100A的參照凹面光柵30A條數。但是,設變光譜儀100A’的設變入光元件10A’和設變凹面光柵30A’的光路距離R1’不等同參照光譜儀100A的參照入光元件10A和參照凹面光柵30A的光路距離R1。
FIG. 21 is a schematic diagram of the optical path of the reference spectrometer in the first embodiment in the manufacturing method of the design variable spectrometer of the second alternative embodiment. Figure 22 is a schematic diagram of the optical path of the design variable spectrometer in the first embodiment in the method of manufacturing the design variable spectrometer of the second alternative embodiment. In this embodiment, the
舉例來說,本實施態樣的參照光譜儀100A的中心波長為600nm,範圍為200-1000nm,α=10度,β=-40度,m=-1,d=2um,R1=60mm,R2=60mm。依據設變光譜儀的製造方法取得參照光譜儀的必要參數後,整合到設變光譜儀100A’,依據光學原理、必要參數、設變參數與/或光柵方程式
sinα+sinβ=mλ/d設定設變光譜儀的多個自由參數,舉例來說設定後的參數例如:設變光譜儀100’的中心波長為600nm,範圍為200-1000nm,α’=10度,β’=-40度,m’=-1,d’=2um,R1’=70mm,R2’=60mm。
For example, the center wavelength of the
相應地,參照光譜儀100A還包括一參照殼體70A。參照殼體70A包括一參照收光側71A。參照入光元件10A設置於參照殼體70A的參照收光側71A。設變光譜儀100A’還包括一設變殼體70A’。設變殼體70A’包括一設變收光側71A’。參照收光側71A的寬度較長於設變收光側71A’。設變收光側71A’具有一突出部712A’。設變入光元件10A’設置於設變殼體70A’的設變收光側71A’的突出部712A’。
Correspondingly, the
如第23圖所示為第二選擇實施例之設變光譜儀的製造方法中第二實施態樣的參照光譜儀光路示意圖。第24圖所示為第二選擇實施例之設變光譜儀的製造方法中第二實施態樣的設變光譜儀光路示意圖。根據上述設變光譜儀的製造方法還包括,設置至少一設變反射元件60’於設變入光元件10A’和設變凹面光柵30A’之間。換言之,在設變光譜儀100A’的設變入光元件10A’和設變凹面光柵30A’之間增加設置設變反射元件60A’。設變入光元件10A’和設變反射元件60A’之間的光路距離設定為R3’,設變反射元件60A’和設變凹面光柵30A’之間的光路距離設定為R4’。外部待測光通過設變入光元件10A’到設變反射元件60A’,再經設變反射元件60A’反射至設變凹面光柵30A’,且經由設變凹面光柵30A’分光後傳遞至設變光接收器50A’。在這個實施態樣中,參照光譜儀100A和設變光譜儀100A’的光譜範圍相同,解析度相同。
As shown in FIG. 23, it is a schematic diagram of the optical path of the reference spectrometer in the second embodiment of the manufacturing method of the variable spectrometer of the second alternative embodiment. Fig. 24 is a schematic diagram of the optical path of the design variable spectrometer in the second embodiment of the manufacturing method of the design variable spectrometer of the second alternative embodiment. The method for manufacturing the variable spectrometer according to the above further includes: arranging at least one variable reflective element 60' between the variable
也就是說,設變光譜儀100A’的設變凹面光柵30A’和設變光接收器50A’的光路距離R2’等於參照光譜儀100A的參照凹面光柵30A和參照光接收
器50A的距離R2。設變光譜儀100A’的設變凹面光柵30A’條數等於參照光譜儀100A的參照凹面光柵30A條數。設變光譜儀100A’的設變入光元件10A’和設變反射元件60A’的光路距離R3’加上設變反射元件60A’和設變凹面光柵30A’的光路距離R4’等於參照光譜儀100A的參照入光元件10A和參照凹面光柵30A的光路距離R1。
In other words, the optical path distance R2' between the variable concave grating 30A' of the
舉例來說,本實施態樣的參照光譜儀100A的中心波長為600nm,範圍為200-1000nm,α=10度,β=-40度,m=-1,d=2um,R1=60mm,R2=60mm。依據設變光譜儀的製造方法取得參照光譜儀的參照參數後,整合到設變光譜儀100A’,並依據光學原理、必要參數、設變參數與/或光柵方程式sinα+sinβ=mλ/d設定設變光譜儀的多個自由參數,舉例來說設定後的參數例如:設變光譜儀100’的中心波長為600nm,範圍為200-1000nm,α’=10度,β’=-40度,m’=-1,d’=2um,R2’=60mm,R3’=30mm,R4’=30mm。
For example, the center wavelength of the
相應地,參照光譜儀100A還包括一參照殼體70A。參照殼體70A包括一參照收光側71A。參照入光元件10A設置於參照殼體70A的參照收光側71A。設變光譜儀100A’還包括一設變殼體70A’。設變殼體70A’包括一設變收光側71A’。參照收光側71A的寬度較長於設變收光側71A’。設變入光元件10A’設置於設變殼體70A’的設變收光側71A’。
Correspondingly, the
如第25圖所示為第二選擇實施例之設變光譜儀的製造方法中第三實施態樣的參照光譜儀光路示意圖。第26圖所示為第二選擇實施例之設變光譜儀的製造方法中第三實施態樣的設變光譜儀光路示意圖。在設變光譜儀100A’的設變入光元件10A’和設變凹面光柵30A’之間增加設置一反射元件60A’。在這個實施態樣中,參照光譜儀100A和設變光譜儀100A’的光譜範圍相
同,解析度相同。參照殼體70A的參照收光側71A具有一傾斜部713A,參照入光元件10A設置於傾斜部713A。經由設變光譜儀的製造方法將設變入光元件10A’設置於設變殼體70A’的設變收光側71A’。
As shown in FIG. 25, it is a schematic diagram of the optical path of the reference spectrometer in the third embodiment in the manufacturing method of the variable spectrometer of the second alternative embodiment. Fig. 26 is a schematic diagram of the optical path of the design variable spectrometer in the third embodiment of the manufacturing method of the design variable spectrometer of the second alternative embodiment. A
如第27圖所示為第二選擇實施例之設變光譜儀的製造方法中第四實施態樣的參照光譜儀光路示意圖。第28圖所示為第二選擇實施例之設變光譜儀的製造方法中第四實施態樣的設變光譜儀光路示意圖。參照光譜儀100A和設變光譜儀100A’的設定規格中光譜範圍和解析度皆相同。參照入光元件10A和設變入光元件10A’的位置不同。設變光譜儀100A’的設變殼體70A’的設變收光側71A’具有一突出部712A’。參照入光元件10A設置於參照收光側71A。經由設變光譜儀的製造方法將設變入光元件10A’設置於設變光譜儀100A’的設變收光側71A’的突出部712A’。參照收光側71A的寬度較長於設變收光側71A’。設變光譜儀100A’的設變入光元件10A’和設變反射元件60A’的光路距離R3’加上設變反射元件60A’和設變凹面光柵30A’的光路距離R4’等於參照光譜儀100A的參照入光元件10A和參照凹面光柵30A的光路距離R1。
As shown in FIG. 27, it is a schematic diagram of the optical path of the reference spectrometer in the fourth embodiment in the manufacturing method of the variable spectrometer of the second alternative embodiment. Fig. 28 is a schematic diagram of the optical path of the design variable spectrometer in the fourth embodiment of the method of manufacturing the design variable spectrometer of the second alternative embodiment. The spectral range and resolution in the setting specifications of the
如第29圖所示為第二選擇實施例之設變光譜儀的製造方法中第五實施態樣的參照光譜儀光路示意圖。第30圖所示為第二選擇實施例之設變光譜儀的製造方法中第五實施態樣的設變光譜儀光路示意圖。在本實施態樣中參照光譜儀100A和設變光譜儀100A’的設定規格中光譜範圍和解析度皆相同。在設變光譜儀100A’增加二設變反射元件60A’,其分別設置於設變入光元件10A’和設變凹面光柵30A’之間。以下為方便說明,將二設變反射元件60A’分別定義為第一設變反射元件61A’和第二設變反射元件62A’。特別地,設變入光元件10A’和第一設變反射元件61A’之間的光路距離設定為R5’,第一設變反射元件
61A’和第二設變反射元件62A’之間的光路距離設定為R6’,第二設變反射元件62A’和設變凹面光柵30A’之間的光路距離設定為R7’。參照光譜儀100和設變光譜儀100’的解析度相同,故R1=R5’+R6’+R7’。
Fig. 29 is a schematic diagram of the optical path of the reference spectrometer in the fifth embodiment in the manufacturing method of the variable spectrometer of the second alternative embodiment. FIG. 30 is a schematic diagram of the optical path of the design variable spectrometer in the fifth embodiment in the manufacturing method of the second alternative embodiment of the design variable spectrometer. In this embodiment, the spectral range and resolution in the setting specifications of the
如第31圖所示為第二選擇實施例之設變光譜儀的製造方法中第六實施態樣的參照光譜儀光路示意圖。第32圖所示為第二選擇實施例之設變光譜儀的製造方法中第六實施態樣的設變光譜儀光路示意圖。在這個實施態樣中參照光譜儀100A和設變光譜儀100A’的光譜範圍相同。在設變光譜儀100A’增加設變二反射元件60A’,其分別設置於設變入光元件10A’和設變凹面光柵30A’之間。也就是說,設變光譜儀100A’的設變凹面光柵30A’和設變光接收器50A’的光路距離R2’等於參照光譜儀100A的參照凹面光柵30A和參照光接收器50A的光路距離R2。設變光譜儀100A’的設變凹面光柵30A’條數等於參照光譜儀100A的參照凹面光柵30A條數。但是,設變入光元件10A’和第一設變反射元件61A’的光路距離加上第一設變反射元件61’和第二設變反射元件62A’的光路距離加上第二設變反射元件62A’和設變凹面光柵30A’的光路距離不等同參照光譜儀100A的參照入光元件10A和參照凹面光柵30A的光路距離R1。即R1≠R5+R6+R7。另外,參照光譜儀100A還包括一參照殼體70A。參照殼體70A具有一參照收光側71A。設變光譜儀100A’還包括一設變殼體70A’。設變殼體70A’具有一設變收光側71A’。參照入光元件10A設置於參照收光側71A。經由設變光譜儀的製造方法將設變入光元件10A’設置於設變光譜儀100A’的設變收光側71A’。參照收光側71A的寬度較長於設變收光側71A’。
Fig. 31 is a schematic diagram of the optical path of the reference spectrometer in the sixth embodiment in the manufacturing method of the variable spectrometer of the second alternative embodiment. Fig. 32 is a schematic diagram of the optical path of the design variable spectrometer in the sixth embodiment of the manufacturing method of the design variable spectrometer of the second alternative embodiment. In this embodiment, the
請參照第33圖,為本發明的第三選擇實施例的一設變光譜儀的製造方法。 Please refer to FIG. 33, which is a manufacturing method of a variable spectrometer according to a third alternative embodiment of the present invention.
本實施例之設變光譜儀的製造方法,包括: 步驟S201取得一參照光譜儀的多個參照參數與至少一設定規格,其中該些參照參數包括至少一必要參數以使該參照光譜儀能達到該設定規格。 The manufacturing method of the variable spectrometer of this embodiment includes: Step S201 obtains a plurality of reference parameters and at least one setting specification of a reference spectrometer, wherein the reference parameters include at least one necessary parameter so that the reference spectrometer can reach the setting specification.
步驟S202設定該設變光譜儀具有相同於該參照光譜儀的該必要參數,使該設變光譜儀能達到該設定規格。 In step S202, the set variable spectrometer is set to have the necessary parameters that are the same as the reference spectrometer, so that the set variable spectrometer can meet the set specifications.
步驟S203在該設變光譜儀能達到該設定規格下,設定該設變光譜儀的至少一設變參數,包括: 設定該設變光譜儀的一設變入光元件位於一設變殼體的一設變收光側,其中該參照光譜儀的一參照入光元件位於一參照殼體的一參照收光側,該設變收光側短於該參照收光側。 Step S203, when the set variable spectrometer can reach the set specification, setting at least one set variable parameter of the set variable spectrometer includes: It is set that a set variable light input element of the set variable spectrometer is located on a set variable light receiving side of a set variable housing, wherein a reference light input element of the reference spectrometer is located on a reference light receiving side of a reference housing, and the set The variable light receiving side is shorter than the reference light receiving side.
步驟S204在該設變光譜儀能達到該設定規格數據下,依據光學原理、該必要參數與該設變參數設定該設變光譜儀的多個自由參數。 In step S204, when the set variable spectrometer can reach the set specification data, a plurality of free parameters of the set variable spectrometer are set according to the optical principle, the necessary parameter, and the set variable parameter.
步驟S205依據該必要參數、該設變參數、該自由參數製作該設變光譜儀。 Step S205 makes the variable spectrometer according to the necessary parameter, the variable parameter, and the free parameter.
依據上述方法,在該設變光譜儀能達到該設定規格下,設定該設變光譜儀的該設變參數的步驟,更包括: 設定至少一設變反射元件於該設變入光元件之後。 According to the above method, the step of setting the variable parameters of the variable spectrometer under the condition that the variable spectrometer can reach the set specifications further includes: Set at least one design variable reflective element after the design variable light-incoming element.
依據上述設變光譜儀的製造方法,在第三選擇實施例的第一實施態樣,參照光譜儀100包括一參照入光元件10,一參照準直面鏡20,一參照平面光柵30,一參照聚焦面鏡40以及一參照光接收器50。設變光譜儀100’包括
一設變入光元件10’,一設變準直面鏡20’,一設變平面光柵30’,一設變聚焦面鏡40’,以及一設變光接收器50’。
According to the manufacturing method of the variable spectrometer described above, in the first implementation aspect of the third alternative embodiment, the
依據上述設變光譜儀的製造方法,該設定規格包括一光譜範圍,其中必要參數包括該參照聚焦鏡40的焦距、該參照平面光柵30至該參照聚焦鏡40的距離與該參照平面光柵30的條數。
According to the manufacturing method of the variable spectrometer described above, the setting specification includes a spectral range, and the necessary parameters include the focal length of the
依據上述設變光譜儀的製造方法,該設定規格更包括一解析度,其中該必要參數更包括該參照準直鏡20的焦距。
According to the manufacturing method of the variable spectrometer described above, the setting specification further includes a resolution, wherein the necessary parameter further includes the focal length of the
依據上述設變光譜儀的製造方法,該設定規格更包括一雜訊、一動態範圍與一像素數,其中該必要參數更包括該參照入光元件10、該參照準直鏡20、該參照平面光柵30、該參照聚焦鏡40與該參照光感測器50的相對光路及其元件本體規格。
According to the manufacturing method of the variable spectrometer described above, the setting specification further includes a noise, a dynamic range, and a number of pixels, and the necessary parameters further include the reference light-
依據上述設變光譜儀的製造方法,在第三選擇實施例的第二實施態樣,參照光譜儀100A包括一參照入光元件10A,一參照凹面光柵30A,一參照光接收器50A,以及一參照光波導裝置80A。設變光譜儀100A’包括一設變入光元件10A’,一設變凹面光柵30A’,一設變光接收器50A’,以及一設變光波導裝置80A’。
According to the manufacturing method of the variable spectrometer described above, in the second implementation aspect of the third alternative embodiment, the
依據上述設變光譜儀的製造方法,該設定規格包括一光譜範圍,其中該必要參數包括該參照凹面光柵30A至該參照光感測器50A的距離與該參照平面光柵30A的條數。
According to the manufacturing method of the variable spectrometer described above, the setting specification includes a spectral range, and the necessary parameters include the distance from the reference concave grating 30A to the
依據上述設變光譜儀的製造方法,該設定規格包括一解析度,其中該必要參數更包括該參照凹面光柵30A的元件本體規格。 According to the manufacturing method of the variable spectrometer described above, the setting specification includes a resolution, and the necessary parameter further includes the element body specification of the reference concave grating 30A.
依據上述設變光譜儀的製造方法,該設定規格更包括一雜訊、一動態範圍與一像素數,其中該必要參數更包括參照入光元件10A、參照凹面光柵30A與參照光接收器50A的相對光路及其元件本體規格。
According to the manufacturing method of the variable spectrometer described above, the setting specification further includes a noise, a dynamic range, and a number of pixels. The necessary parameters further include the reference light-
請參照第34圖,為本發明的第四選擇實施例的一設變光譜儀的製造方法。 Please refer to FIG. 34, which is a manufacturing method of a variable spectrometer according to a fourth alternative embodiment of the present invention.
本實施例之設變光譜儀的製造方法,包括: 步驟S301將一參照光譜儀的一參照聚焦面鏡的焦距參照配置到一設變光譜儀的一設變聚焦面鏡的焦距。 The manufacturing method of the variable spectrometer of this embodiment includes: Step S301 configures the focal length of a reference focusing mirror of a reference spectrometer to the focal length of a variable focusing mirror of a variable spectrometer.
步驟S302將該參照光譜儀的一參照平面光柵到該參照聚焦面鏡之間的光路距離參照配置到該設變光譜儀的一設變平面光柵和該設變聚焦面鏡的光路距離。 Step S302 configures the optical path distance between a reference plane grating of the reference spectrometer and the reference focusing mirror with reference to the optical path distance between a variable plane grating of the variable spectrometer and the variable focusing mirror.
步驟S303將該參照光譜儀的該參照平面光柵條數參照配置到該設變光譜儀的該設變平面光柵條數。 Step S303 refers to the configuration of the reference plane grating number of the reference spectrometer to the set variable plane grating number of the set variable spectrometer.
步驟S304將該設變光譜儀的一設變入光元件設置於一設變殼體的設變收光側,其相對參照光譜儀的一參照殼體的參照收光側寬度較窄。 In step S304, a variable light receiving element of the variable spectrometer is arranged on the variable light receiving side of a variable housing, which has a narrower width relative to the reference light receiving side of a reference housing of the reference spectrometer.
依據上述設變光譜儀的製造方法,參照光譜儀100包括一參照入光元件10,一參照準直面鏡20,一參照平面光柵30,一參照聚焦面鏡40以及一參照光接收器50。設變光譜儀100’包括一設變入光元件10’,一設變準直面鏡20’,一設變平面光柵30’,一設變聚焦面鏡40’,以及一設變光接收器50’。上述方法中進一步地包括,設置至少一設變反射元件60’於該設變光譜儀100’的該設變入光元件10’和一設變準直面鏡20’之間。
According to the manufacturing method of the variable spectrometer described above, the
特別地,參照光譜儀100A和設變光譜儀100’的解析度相同時,設變入光元件10’和設變反射元件60’的光路距離r5’加上設變反射元件60’和設變準直面鏡20’的光路距離r6’等於參照光譜儀100的參照入光元件10和參照準直面鏡20的光路距離r1,即r1=r5+r6。可以理解的,當參照光譜儀100和設變光譜儀100’的解析度不同時,則r1≠r5+r6。
In particular, when the resolution of the
進一步地,如第35圖所示,第四選擇實施例的一變型實施例的設變光譜儀的製造方法,包括: 步驟S301’將一參照光譜儀的一參照聚焦面鏡的焦距參照配置到一設變光譜儀的一設變聚焦面鏡的焦距。 Further, as shown in FIG. 35, the manufacturing method of the variable spectrometer according to a modified embodiment of the fourth alternative embodiment includes: Step S301' configures the focal length of a reference focusing mirror of a reference spectrometer to the focal length of a variable focusing mirror of a variable spectrometer.
步驟S302’將該參照光譜儀的一參照平面光柵到該參照聚焦面鏡之間的光路距離參照配置到該設變光譜儀的一設變平面光柵和該設變聚焦面鏡的光路距離。 Step S302' configures the optical path distance between a reference plane grating of the reference spectrometer and the reference focusing mirror with reference to the optical path distance between a variable plane grating of the variable spectrometer and the variable focusing mirror.
步驟S303’將該參照光譜儀的該參照平面光柵條數參照配置到該設變光譜儀的該設變平面光柵條數。 Step S303' refers to the configuration of the reference plane grating number of the reference spectrometer to the set variable plane grating number of the set variable spectrometer.
步驟S304’該參照光譜儀的一參照入光元件和一參照準直面鏡的光路距離參照配置到該設變光譜儀的一設變入光元件和一設變準直面鏡的光路距離。 Step S304' The optical path distance of a reference light-incident element and a reference collimating mirror of the reference spectrometer is configured to refer to the optical path distance of a variable light-incident element and a variable collimating mirror of the reference spectrometer.
步驟S305’將該設變光譜儀的一設變入光元件設置於一設變殼體的設變收光側,其相對參照光譜儀的一參照殼體的參照收光側寬度較窄。 In step S305', a set variable light input element of the set variable spectrometer is arranged on the set variable light receiving side of a set variable housing, which has a narrower width relative to the reference light receiving side of a reference housing of the reference spectrometer.
另外,上述方法進一步還包括,設置至少一設變反射元件於該設變光譜儀的該設變入光元件和該設變準直面鏡之間。 In addition, the above method further includes: arranging at least one variable reflection element between the design variable incident light element and the design collimator mirror of the design variable spectrometer.
請參照第36圖,為本發明的第五選擇實施例的一設變光譜儀的製造方法。 Please refer to FIG. 36, which is a manufacturing method of a variable spectrometer according to a fifth alternative embodiment of the present invention.
本實施例之設變光譜儀的製造方法,包括: 步驟S401將一參照光譜儀的一參照凹面光柵和一參照光接收器的光路距離參照配置到一設變光譜儀的一設變凹面光柵和一設變光接收器的光路距離。 The manufacturing method of the variable spectrometer of this embodiment includes: In step S401, the optical path distance of a reference concave grating and a reference optical receiver of a reference spectrometer is configured to the optical path distance of a variable concave grating and a variable optical receiver of a variable spectrometer.
步驟S402將該參照光譜儀的該參照凹面光柵條數參照配置到該設變光譜儀的該設變凹面光柵條數。 Step S402 refers to the configuration of the reference concave grating number of the reference spectrometer to the set variable concave grating number of the set variable spectrometer.
步驟S403將該設變光譜儀的一設變入光元件設置於一設變殼體的設變收光側,其相對參照光譜儀的一參照殼體的參照收光側寬度較窄。 Step S403 is to set a variable light receiving element of the variable spectrometer on the variable light receiving side of a variable housing, which has a narrower width relative to the reference light receiving side of a reference housing of the reference spectrometer.
依據上述設變光譜儀的製造方法,參照光譜儀100A包括一參照入光元件10A,一參照凹面光柵30A,一參照光接收器50A,以及一參照光波導裝置80A。設變光譜儀100A’包括一設變入光元件10A’,一設變凹面光柵30A’,一設變光接收器50A’,以及一設變光波導裝置80A’。
According to the above manufacturing method of the variable spectrometer, the
上述方法進一步地可包括,設置至少一設變反射元件60A’於該設變光譜儀100A’的該設變入光元件10A’和該設變凹面光柵30A’之間。特別地,參照光譜儀100A和設變光譜儀100A’的解析度相同時,設變入光元件10A’和設變反射元件60A’的光路距離R3’加上設變反射元件60A’和設變凹面光柵30A’的光路距離R4’等於參照光譜儀100A的參照入光元件10A和參照凹面光柵30A的距離R1,即R1=R3+R4。另外,當參照光譜儀100A和設變光譜儀100A’的解析度不同時,則R1≠R3+R4。
The above method may further include: arranging at least one variable
可以理解的,當設置二設變反射元件60A’於該設變光譜儀100A’的該設變入光元件10A’和該設變凹面光柵30A’之間時,設變入光元件10A’和第一設變反射元件61A’之間的光路距離設定為R5’,第一設變反射元件61A’和第二設變反射元件62A’之間的光路距離設定為R6’,第二設變反射元件62A’和設變凹面光柵30A’之間的光路距離設定為R7’。那麼參照光譜儀100和設變光譜儀100’的解析度不相同時,則R1≠R5’+R6’+R7’;參照光譜儀100和設變光譜儀100’的解析度相同時,則R1=R5’+R6’+R7’。
It is understandable that when two designed variable
進一步地,如第37圖所示,第五選擇實施例的一變型實施例的設變光譜儀的製造方法,包括: 步驟S401’將一參照光譜儀的一參照凹面光柵和一參照光接收器的光路距離參照配置到一設變光譜儀的一設變凹面光柵和一設變光接收器的光路距離。 Further, as shown in FIG. 37, the manufacturing method of the variable spectrometer according to a modified embodiment of the fifth alternative embodiment includes: Step S401' configures the optical path distance of a reference concave grating and a reference optical receiver of a reference spectrometer to the optical path distance of a variable concave grating and a variable optical receiver of a variable spectrometer.
步驟S402’將該參照光譜儀的該參照凹面光柵條數參照配置到該設變光譜儀100A’的該設變凹面光柵條數。
Step S402' refers to the configuration of the reference concave grating number of the reference spectrometer to the set variable concave grating number of the set
步驟S403’將該參照光譜儀的一參照入光元件和該參照凹面光柵的光路距離參照配置到該設變光譜儀的一設變入光元件和該設變凹面光柵的距離。 Step S403' refers to the configuration of the optical path distance between a reference light incident element of the reference spectrometer and the reference concave grating to the distance between a variable light incident element of the variable spectrometer and the variable concave grating.
步驟S404’將該設變光譜儀的一設變入光元件設置於一設變殼體的設變收光側,其相對參照光譜儀的一參照殼體的參照收光側寬度較窄。 In step S404', a set variable light-receiving element of the set variable spectrometer is arranged on the set variable light receiving side of a set variable housing, which has a narrower width relative to the reference light receiving side of a reference housing of the reference spectrometer.
上述方法進一步地可包括,設置至少一反射元件60A’於該設變光譜儀100A’的該設變入光元件10A’和該設變凹面光柵30A’之間,其中可根據需求設定參照光譜儀100A和設變光譜儀100A’的解析度是否相同。
The above method may further include: arranging at least one
綜上所述,雖然本發明已以較佳實施例揭露如上,然其並非用以限定本發明。本發明所屬技術領域中具有通常知識者,在不脫離本發明之精神和範圍內,所作各種之更動及潤飾的等效替換,仍為本發明專利之保護範圍。因此,前述說明書或圖式之內容自不得作為解釋申請專利範圍之限制,本發明之保護範圍當視後附之申請專利範圍所界定者為準。 In summary, although the present invention has been disclosed as above in preferred embodiments, it is not intended to limit the present invention. Those who have ordinary knowledge in the technical field to which the present invention pertains, without departing from the spirit and scope of the present invention, make various changes and modifications equivalent to substitutions still within the protection scope of the patent for the present invention. Therefore, the content of the foregoing description or drawings shall not be used as an interpretation of the limitation of the scope of patent application, and the scope of protection of the present invention shall be subject to the definition of the scope of patent application attached.
S101~S104:設變光譜儀的製造方法的一實施例的各步驟 S101~S104: The steps of an embodiment of the manufacturing method of the variable spectrometer
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW201423064A (en) * | 2012-10-23 | 2014-06-16 | 蘋果公司 | High accuracy imaging colorimeter by special designed pattern closed-loop calibration assisted by spectrograph |
TWM487431U (en) * | 2010-09-03 | 2014-10-01 | Wang bo sheng | Miniature spectroscope |
TWI485438B (en) * | 2010-05-03 | 2015-05-21 | Oto Photonics Inc | Optical system and reflection type diffraction grating thereof |
JP2015148487A (en) * | 2014-02-05 | 2015-08-20 | 浜松ホトニクス株式会社 | Spectrometer, and method for manufacturing spectrometer |
US20170023407A1 (en) * | 2014-04-03 | 2017-01-26 | Oto Photonics Inc. | Waveguide sheet, fabrication method thereof and spectrometer using the same |
-
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Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI485438B (en) * | 2010-05-03 | 2015-05-21 | Oto Photonics Inc | Optical system and reflection type diffraction grating thereof |
TWM487431U (en) * | 2010-09-03 | 2014-10-01 | Wang bo sheng | Miniature spectroscope |
TW201423064A (en) * | 2012-10-23 | 2014-06-16 | 蘋果公司 | High accuracy imaging colorimeter by special designed pattern closed-loop calibration assisted by spectrograph |
JP2015148487A (en) * | 2014-02-05 | 2015-08-20 | 浜松ホトニクス株式会社 | Spectrometer, and method for manufacturing spectrometer |
US20170023407A1 (en) * | 2014-04-03 | 2017-01-26 | Oto Photonics Inc. | Waveguide sheet, fabrication method thereof and spectrometer using the same |
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