TWI720851B - Chip package structure and manufacturing method thereof - Google Patents
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- TWI720851B TWI720851B TW109109300A TW109109300A TWI720851B TW I720851 B TWI720851 B TW I720851B TW 109109300 A TW109109300 A TW 109109300A TW 109109300 A TW109109300 A TW 109109300A TW I720851 B TWI720851 B TW I720851B
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 29
- 239000000758 substrate Substances 0.000 claims abstract description 69
- 229920001187 thermosetting polymer Polymers 0.000 claims abstract description 62
- 239000012790 adhesive layer Substances 0.000 claims description 58
- 239000003292 glue Substances 0.000 claims description 25
- 238000000034 method Methods 0.000 claims description 21
- 229910052751 metal Inorganic materials 0.000 claims description 20
- 239000002184 metal Substances 0.000 claims description 20
- 238000004806 packaging method and process Methods 0.000 claims description 15
- 230000008569 process Effects 0.000 claims description 13
- 239000010410 layer Substances 0.000 claims description 11
- 238000005538 encapsulation Methods 0.000 claims description 4
- 238000007639 printing Methods 0.000 claims description 2
- 239000008393 encapsulating agent Substances 0.000 abstract description 10
- 239000000853 adhesive Substances 0.000 abstract description 9
- 230000001070 adhesive effect Effects 0.000 abstract description 9
- 239000000945 filler Substances 0.000 description 10
- 239000007788 liquid Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 239000000084 colloidal system Substances 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 239000003822 epoxy resin Substances 0.000 description 4
- 238000000465 moulding Methods 0.000 description 4
- 229920000647 polyepoxide Polymers 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000009477 glass transition Effects 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000005292 diamagnetic effect Effects 0.000 description 2
- 229920006336 epoxy molding compound Polymers 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 238000013021 overheating Methods 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 230000005291 magnetic effect Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000001291 vacuum drying Methods 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
- H01L23/3121—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed a substrate forming part of the encapsulation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
- H01L23/3135—Double encapsulation or coating and encapsulation
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
Abstract
Description
本發明是有關於一種封裝結構及其製造方法,且特別是有關於一種晶片封裝結構及其製造方法。The present invention relates to a packaging structure and a manufacturing method thereof, and particularly relates to a chip packaging structure and a manufacturing method thereof.
隨著消費市場的變遷,消費者對於產品輕薄短小的需求也日益增加,尤其是電子產品,往往需要在有限體積內提升晶片封裝的集成度。然而,在提升半導體封裝的集成度時往往無法同時滿足不同功能的電子元件設計上的需求,進而容易降低半導體封裝的可靠度或增加其製造成本。With the changes in the consumer market, consumers' demands for lighter, thinner, shorter products are also increasing. Especially for electronic products, it is often necessary to improve the integration of chip packaging within a limited volume. However, when increasing the integration level of semiconductor packages, it is often impossible to simultaneously meet the design requirements of electronic components with different functions, thereby easily reducing the reliability of the semiconductor package or increasing its manufacturing cost.
舉例而言,由於不同功能的電子元件尺寸上的差異,尺寸較小的電子元件與基板之間的空間相對狹小,因此直接以環氧樹脂模塑料(epoxy molding compound,EMC)填充至前述狹小空間內已經越來越困難。進一步而言,將具有較大尺寸填充物(filler)的環氧樹脂模塑料填充至前述狹小空間內時,容易因填充物堵塞而損壞電子元件或導致環氧樹脂模塑料填充不完全而形成氣泡(void),進而降低半導體封裝的可靠度。若配合前述狹小空間而採用填充物尺寸較小但價格較昂貴的成型底部填充膠(mold underfill,MUF)進行填充,則會導致半導體封裝的製造成本提高。For example, due to the difference in the size of electronic components with different functions, the space between the smaller electronic components and the substrate is relatively narrow, so epoxy molding compound (EMC) is directly used to fill the aforementioned narrow space. It's getting harder and harder inside. Furthermore, when filling an epoxy resin molding compound with a larger size filler into the aforementioned narrow space, it is easy to damage the electronic components due to the filling of the filler, or cause the epoxy resin molding compound to be filled incompletely and form air bubbles. (void), thereby reducing the reliability of the semiconductor package. If the aforementioned narrow space is filled with a smaller but more expensive mold underfill (MUF), the manufacturing cost of the semiconductor package will increase.
本發明提供一種晶片封裝結構及其製造方法,其可以在提升晶片封裝結構的可靠度的同時降低製造成本。The invention provides a chip packaging structure and a manufacturing method thereof, which can reduce the manufacturing cost while improving the reliability of the chip packaging structure.
本發明的晶片封裝結構,其包括線路基板、至少一電子元件與晶片、兩階段熱固性膠層以及封裝膠體。線路基板具有相對的第一表面與第二表面。至少一電子元件與晶片分別位於第一表面上且與線路基板電性連接。至少一電子元件以導電件電性連接線路基板。兩階段熱固性膠層包括相互分隔開的第一部分與第二部分。第一部分完全包覆至少一電子元件且填充至少一電子元件與線路基板之間的空隙。晶片配置於第二部分上且打線接合至線路基板的第一表面或第二表面。第一部分的高度與第二部分的高度實質上相同。封裝膠體覆蓋兩階段熱固性膠層與晶片。The chip packaging structure of the present invention includes a circuit substrate, at least one electronic component and a chip, a two-stage thermosetting adhesive layer, and a packaging glue. The circuit substrate has a first surface and a second surface opposite to each other. At least one electronic component and the chip are respectively located on the first surface and electrically connected to the circuit substrate. At least one electronic component is electrically connected to the circuit substrate with a conductive element. The two-stage thermosetting adhesive layer includes a first part and a second part that are separated from each other. The first part completely covers the at least one electronic component and fills the gap between the at least one electronic component and the circuit substrate. The chip is disposed on the second part and wire-bonded to the first surface or the second surface of the circuit substrate. The height of the first part is substantially the same as the height of the second part. The packaging glue covers the two-stage thermosetting glue layer and the chip.
本發明提供一種晶片封裝結構的製造方法,至少包括以下步驟。提供線路基板,其中線路基板具有相對的第一表面與第二表面。配置至少一電子元件於第一表面上,且至少一電子元件以導電件電性連接線路基板。形成兩階段熱固性膠層於第一表面上。兩階段熱固性膠層包括相互分隔開的第一部分與第二部分。第一部分的高度與第二部分的高度實質上相同。第一部分完全包覆至少一電子元件並填入至少一電子元件與線路基板之間的空隙。配置晶片於第二部分上且晶片打線接合至線路基板的第一表面或第二表面。進行固化製程以使兩階段熱固性膠層完全固化。形成封裝膠體以覆蓋兩階段熱固性膠層與晶片。The present invention provides a method for manufacturing a chip package structure, which includes at least the following steps. A circuit substrate is provided, wherein the circuit substrate has a first surface and a second surface opposite to each other. At least one electronic component is arranged on the first surface, and the at least one electronic component is electrically connected to the circuit substrate by a conductive member. A two-stage thermosetting adhesive layer is formed on the first surface. The two-stage thermosetting adhesive layer includes a first part and a second part that are separated from each other. The height of the first part is substantially the same as the height of the second part. The first part completely covers the at least one electronic component and fills the gap between the at least one electronic component and the circuit substrate. The chip is arranged on the second part and the chip is wire-bonded to the first surface or the second surface of the circuit substrate. Carry out the curing process to completely cure the two-stage thermosetting adhesive layer. The packaging glue is formed to cover the two-stage thermosetting glue layer and the chip.
基於上述,本發明藉由兩階段熱固性膠層中的填充物尺寸較小且流動性較佳的特性使兩階段熱固性膠層的第一部分完全包覆電子元件並填入電子元件與線路基板之間的空隙,因此可以避免封裝膠體中尺寸較大的填充物流入空隙中而造成電子元件損壞的情況發生或導致空隙中的填充膠體填充不完全而具有氣泡的問題,進而可以有效地保護電子元件,降低電子元件的損壞機率並提升晶片封裝結構的可靠度。此外,由於兩階段熱固性膠層的材料成本較成型底部填充膠(MUF)為低,因此可以在提升晶片封裝結構的可靠度的同時降低製造成本。另一方面,本發明的兩階段熱固性膠層的第一部分的高度與第二部分的高度實質上相同,即,可以在配置黏晶膠層(即兩階段熱固性膠層的第二部分)的同時,一併形成完全包覆電子元件的保護膠層(即兩階段熱固性膠層的第一部分),可省略另外針對電子元件個別形成保護層的製程,因此可以簡化製程且進一步降低製造成本。Based on the above, the present invention makes the first part of the two-stage thermosetting adhesive layer completely encapsulate the electronic components and fill between the electronic components and the circuit substrate by virtue of the smaller filler size and better fluidity in the two-stage thermosetting adhesive layer. Therefore, it can prevent the large-sized filler in the encapsulation colloid from flowing into the gap and causing damage to the electronic components or causing the filling colloid in the gap to be incompletely filled and having bubbles, thereby effectively protecting the electronic components. Reduce the probability of damage to electronic components and improve the reliability of the chip package structure. In addition, since the material cost of the two-stage thermosetting adhesive layer is lower than that of the molded underfill (MUF), it can improve the reliability of the chip package structure while reducing the manufacturing cost. On the other hand, the height of the first part of the two-stage thermosetting adhesive layer of the present invention is substantially the same as the height of the second part, that is, the die glue layer (that is, the second part of the two-stage thermosetting adhesive layer) can be configured at the same time By forming a protective adhesive layer that completely covers the electronic components (ie, the first part of the two-stage thermosetting adhesive layer) at the same time, the process of separately forming a protective layer for the electronic components can be omitted, thus simplifying the manufacturing process and further reducing the manufacturing cost.
為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。In order to make the above-mentioned features and advantages of the present invention more comprehensible, the following specific embodiments are described in detail in conjunction with the accompanying drawings.
本文所使用之方向用語(例如,上、下、右、左、前、後、頂部、底部)僅作為參看所繪圖式使用且不意欲暗示絕對定向。The directional terms used herein (for example, up, down, right, left, front, back, top, bottom) are only used as a reference drawing and are not intended to imply absolute orientation.
除非另有明確說明,否則本文所述任何方法絕不意欲被解釋為要求按特定順序執行其步驟。Unless expressly stated otherwise, any method described herein is in no way intended to be construed as requiring its steps to be performed in a specific order.
參照本實施例之圖式以更全面地闡述本發明。然而,本發明亦可以各種不同的形式體現,而不應限於本文中所述之實施例。圖式中的層或區域的厚度、尺寸或大小會為了清楚起見而放大。相同或相似之參考號碼表示相同或相似之元件,以下段落將不再一一贅述。The present invention will be explained more fully with reference to the drawings of this embodiment. However, the present invention can also be embodied in various different forms and should not be limited to the embodiments described herein. The thickness, size, or size of the layers or regions in the drawings will be exaggerated for clarity. The same or similar reference numbers indicate the same or similar elements, and the following paragraphs will not repeat them one by one.
圖1A至圖1D是依照本發明一實施例的一種晶片封裝結構的製造方法的剖面示意圖。在本實施例中,晶片封裝結構100的製造方法可以包括以下步驟。1A to 1D are schematic cross-sectional views of a manufacturing method of a chip package structure according to an embodiment of the present invention. In this embodiment, the manufacturing method of the
請參照圖1A,提供線路基板110,其中線路基板110具有相對的第一表面110a與第二表面110b。線路基板110可以包括多個接墊112,這些接墊112可以是設置於第一表面110a,以用於後續的電性連接。1A, a
在一些實施例中,線路基板110例如是晶圓、玻璃基板、陶瓷基板、印刷電路板或其它適合材料所製作的多層式基板,接墊112例如是銅接墊。在此,本發明不限制線路基板110的種類,只要線路基板110內具有適宜的導電線路可以進行後續設計上所需的電性連接皆屬於本發明的保護範圍。In some embodiments, the
請繼續參照圖1A,於第一表面110a上配置至少一電子元件130,且電子元件130以導電件132電性連接線路基板110。在此,本發明不限制電子元件130的數量,電子元件130的數量可以是一個或多個,圖1A僅示例性的繪示二個電子元件130。舉例而言,電子元件130可以包括第一電子元件1301與第二電子元件1302,第一電子元件1301以第一導電件1321電性連接線路基板110,而第二電子元件1302以第二導電件1322電性連接線路基板110。Please continue to refer to FIG. 1A, at least one
在一些實施例中,電子元件130可以是主動元件、被動元件或其組合。舉例而言,在本實施例中,第一電子元件1301可以是主動元件,而第二電子元件1302可以是被動元件,但本發明不限於此。在未繪示的實施例中,第一電子元件1301與第二電子元件1302可以都是主動元件或者第一電子元件1301與第二電子元件1302可以都是被動元件。在第一電子元件1301是主動元件,而第二電子元件1302是被動元件的情況下,第一電子元件1301例如是以覆晶技術配置於線路基板110上,其中第一導電件1321可以是導電球、導電柱、導電凸塊或其組合,且第二導電件1322例如是導電膏。導電件1321與導電件1322的材料例如是錫,但本發明不限於此。在一實施例中,第一電子元件1301可以例如是磁阻式隨機存取記憶體(MRAM),第二電子元件1302可以是電阻、電容、電感或其他類似者,但本發明不限於此。In some embodiments, the
在本實施例中,電子元件130與線路基板110之間具有空隙G。舉例而言,如圖1A所示,第一電子元件1301與線路基板110之間具有空隙G1,而第二電子元件1302與線路基板110之間具有空隙G2。進一步而言,可以是電性連接電子元件130與線路基板110的導電件132使電子元件130與線路基板110之間維持空隙G。舉例而言,可以是電性連接第一電子元件1301與線路基板110的導電件1321使第一電子元件1301與線路基板110之間維持空隙G1,而電性連接第二電子元件1302與線路基板110的導電件1322使第二電子元件1302與線路基板110之間維持空隙G2。在一些實施例中,空隙G的高度可以是不大於75微米,空隙G的高度在此範圍時,會加劇於空隙G中填膠的困難度,但本發明不限於此。In this embodiment, there is a gap G between the
請參照圖1B,於第一表面110a上形成兩階段熱固性膠層120,兩階段熱固性膠層120包括相互分隔開的第一部分122與第二部分124,其中第一部分122的高度H1與第二部分124的高度H2實質上相同,且第一部分122完全包覆電子元件130並填入電子元件130與線路基板110之間的空隙G,而第二部分124可用於之後的晶片接合製程。換句話說,第一部分122的頂面122a與第二部分124的頂面124a可以是實質上共平面。舉例而言,如圖1B所示,第一部分122可以包括第一部分1221與第一部分1222,第一部分1221完全包覆第一電子元件1301並填入第一電子元件1301與線路基板110之間的空隙G1,第一部分1222完全包覆第二電子元件1302並填入第二電子元件1302與線路基板110之間的空隙G2。1B, a two-stage thermosetting
在本實施例中,兩階段熱固性膠層120是先以A階液態膠形式形成於線路基板110上,藉由A階液態膠的流動性與毛細現象的應用可以降低於空隙G中填膠的困難度,使兩階段熱固性膠層120的第一部分122可以完全包覆電子元件130並填入電子元件130與線路基板110之間的空隙G。由於兩階段熱固性膠層120中的填充物尺寸較環氧樹脂模塑料中的填充物尺寸小且流動性較佳,使得兩階段熱固性膠層120可順利地完整填充電子元件130與線路基板110之間的空隙G,有效地保護電子元件130,避免因填充物過大而無法有效填充的問題,進而降低電子元件130的損壞機率並提升晶片封裝結構100的可靠度。此外,兩階段熱固性膠層120的材料成本較成型底部填充膠(MUF)為低,因此也可以降低晶片封裝結構100的製造成本。In this embodiment, the two-stage thermosetting
請同時參照圖1A與圖1B,兩階段熱固性膠層120可以藉由以下步驟所形成。首先,可以提供具有多個開口OP的模具10,藉由具有多個開口OP的模具10以例如印刷或塗佈的方式形成A階液態膠於第一表面110a上,以於後續形成兩階段熱固性膠層120。在一實施例中,模具10例如是由鋼板所製成,但本發明不限於此。1A and 1B at the same time, the two-stage thermosetting
在本實施例中,多個開口OP可以是分別對應於後續兩階段熱固性膠層120的第一部分122與第二部分124的形成位置。舉例而言,如圖1A的虛線框線所示,多個開口OP可以包括多個開口OP1與開口OP2以分別對應於後續兩階段熱固性膠層120的第一部分122的形成位置R1與第二部分124的形成位置R2。In this embodiment, the plurality of openings OP may respectively correspond to the formation positions of the
應說明的是,本發明不限制前述形成兩階段熱固性膠層120的方法,只要可以於第一表面110a上形成包括相互分隔開的第一部分122與第二部分124的兩階段熱固性膠層120,第一部分122的高度H1與第二部分124的高度H2可以實質上相同,且第一部分122完全包覆電子元件130並填入電子元件130與線路基板110之間的空隙G皆屬於本發明的保護範圍。It should be noted that the present invention does not limit the foregoing method of forming the two-stage thermosetting
請繼續參照圖1B,在第一表面110a上對應於後續兩階段熱固性膠層120的第一部分122與第二部分124的形成位置上形成A階液態膠之後,進行加熱、真空乾燥或紫外線照射等步驟,以去除A階液態膠的溶劑,使得A階液態膠轉變為一乾燥且未完全固化的B階膠。B階膠在溫度低於其玻璃轉化溫度(glass transition temperature,Tg)時為無黏性的乾燥膜,有利於搬運儲放,當B階膠處在高於其玻璃轉化溫度的環境時則呈黏稠流動狀,可供濕潤黏著晶片140或其他元件。Please continue to refer to FIG. 1B, after forming the A-stage liquid glue on the
請參照圖1C,配置晶片140於第二部分124上。在本實施例中,晶片140是以壓合方式配置於第二部分124上,且壓合步驟所提供的溫度是高於兩階段熱固性膠層120於B階膠時的玻璃轉化溫度,使B階膠具有黏性以黏合線路基板110與晶片140。本發明藉由配置黏晶膠層(即兩階段熱固性膠層120的第二部分124)的同時,一併形成完全包覆電子元件130的保護膠層(即兩階段熱固性膠層120的第一部分122),可省略另外針對電子元件130個別形成保護層的製程,因此可以簡化製程且進一步降低製造成本。1C, the
在本實施例中,晶片140可以是打線接合至線路基板110的第一表面110a。換句話說,晶片140可以是以其主動面140a朝上,且相對於主動面140a的背面140b與兩階段熱固性膠層120的第二部分124接合的方式配置。舉例而言,晶片140上的電性接點可以藉由導線L電性連接至第一表面110a上的接墊112。本發明不限制晶片140的種類,可視實際設計上的需求而定。In this embodiment, the
請繼續參照圖1C,在進行後續固化製程以使兩階段熱固性膠層120完全固化之前,為了降低電子元件130因受到電磁干擾影響使用時的穩定性或電子元件130因運作後過熱而損壞電子元件130等情況發生,以進一步提升晶片封裝結構100的可靠度,可以藉由兩階段熱固性膠層120處於B階膠狀態且具有黏性時,於第一部分122上配置金屬片150。在本實施例中,金屬片150可以是僅覆蓋第一部分122的頂面122a,以減少材料的使用,進一步降低製造成本,但本發明不限於此。在未繪示的實施例中,金屬片150可以延伸覆蓋至第一部分122的側壁。Please continue to refer to FIG. 1C, before the subsequent curing process is performed to completely cure the two-stage thermosetting
在一些實施例中,基於電子元件130不同的功能性,金屬片150可以是抗磁金屬片、散熱金屬片或其組合。舉例而言,被第一部分1221完全包覆的第一電子元件1301例如是磁性主動元件,配置於其上的金屬片1501可以是抗磁金屬片(例如是鐵鎳合金),而被第一部分1222完全包覆的第二電子元件1302例如是被動元件,配置於其上的金屬片1502可以是散熱金屬片(例如是銅、鋁)。In some embodiments, based on the different functionality of the
本發明不限制晶片140與金屬片150的配置順序。在一些實施例中,可以先配置晶片140再配置金屬片150。在一些實施例中,可以先配置金屬片150再配置晶片140。在一些實施例中,可以同時配置金屬片150與晶片140。The present invention does not limit the arrangement sequence of the
請參照圖1D,至少配置晶片140之後,進行固化製程以使B階膠狀態的兩階段熱固性膠層120完全固化為C階膠狀態,而呈一穩定的固定膠層。固化製程例如是對B階膠狀態的兩階段熱固性膠層120進行烘烤。此外,更形成封裝膠體160,以覆蓋兩階段熱固性膠層120與晶片140。在本實施例中,封裝膠體160例如是環氧樹脂模塑料。進一步說明,固化製程可以在形成封裝膠體160的步驟中同時進行。於此情況下,兩階段熱固性膠層120在形成封裝膠體160之時仍為B階膠狀態而未完全固化,因此仍然可以適度變形。在形成封裝膠體160的高壓環境下,呈B階膠狀態的兩階段熱固性膠層120被緊密壓迫,使得可能存在的間隙或氣泡被排除掉,因此可有效增加黏晶面積。而在形成封裝膠體160的過程中,同時提供高於兩階段熱固性膠層120的固化溫度的一注膠溫度,使得兩階段熱固性膠層120完全固化。由於兩階段熱固性膠層120的第一部分122已經填入電子元件130與線路基板110之間的空隙G,因此,可以避免封裝膠體160中尺寸較大的填充物流入空隙G中,造成電子元件130損壞的情況發生或導致空隙G中的填充膠體具有氣泡。此外,也不需要選擇填充物尺寸較小但價格較昂貴的成型底部填充膠(MUF)以配合空隙G,進而可以提升晶片封裝結構100的可靠度並降低其製造成本。在本實施例中,封裝膠體160可以是覆蓋兩階段熱固性膠層120、晶片140與金屬片150。經過上述製程後即可大致上完成本實施例之晶片封裝結構100的製作。1D, after at least the
圖2是依照本發明另一實施例的一種晶片封裝結構的剖面示意圖。請參考圖2,本實施例的晶片封裝結構100a類似於上述實施例的晶片封裝結構100,而其差別在於:本實施例的晶片140可以是打線接合至線路基板110的第二表面110b。2 is a schematic cross-sectional view of a chip package structure according to another embodiment of the invention. Please refer to FIG. 2, the
進一步而言,本實施例的線路基板110可以具有由第一表面110a延伸至第二表面110b的貫孔P,且接墊112還可以設置於線路基板110的第二表面110b。晶片140的主動面140a可以面向線路基板110。換句話說,晶片140可以是以其背面140b朝上,且主動面140a與兩階段熱固性膠層120的第二部分124接合的方式配置。在本實施例中,兩階段熱固性膠層120的第二部分124的數量為二個,分別位於貫孔P的兩側,晶片140以其主動面140a上的電性接點對位貫孔P的方式配置於第二部分124上。因此,晶片140的主動面140a上的電性接點可以藉由導線L穿過貫孔P而電性連接至第二表面110b上的接墊112。Furthermore, the
另一方面,為了保護晶片140與第二表面110b之間的導電路徑,封裝膠體160可以進一步填充於二個第二部分124之間以及貫孔P中,並延伸至第二表面110b上,確保封裝膠體160完整包覆導線L,以有效地保護晶片140與線路基板110之間的導電路徑。On the other hand, in order to protect the conductive path between the
綜上所述,本發明藉由兩階段熱固性膠層中的填充物尺寸較小且流動性較佳的特性使兩階段熱固性膠層的第一部分完全包覆電子元件並填入電子元件與線路基板之間的空隙,因此可以避免封裝膠體中尺寸較大的填充物流入空隙中而造成電子元件損壞的情況發生或導致空隙中的填充膠體填充不完全而具有氣泡的問題,進而可以有效地保護電子元件,降低電子元件的損壞機率並提升晶片封裝結構的可靠度。此外,由於兩階段熱固性膠層的材料成本較成型底部填充膠(MUF)為低,因此可以在提升晶片封裝結構的可靠度的同時降低製造成本。另一方面,本發明的兩階段熱固性膠層的第一部分的高度與第二部分的高度實質上相同,即,可以在配置黏晶膠層(即兩階段熱固性膠層的第二部分)的同時,一併形成完全包覆電子元件的保護膠層(即兩階段熱固性膠層的第一部分),可省略另外針對電子元件個別形成保護層的製程,因此可以簡化製程且進一步降低製造成本。此外,於兩階段熱固性膠層的第一部分上還可以配置金屬片,以降低電子元件因受到電磁干擾影響使用時的穩定性或電子元件因運作時過熱而損壞等情況發生,進一步提升晶片封裝結構的可靠度。In summary, the present invention uses the smaller size and better fluidity of the filler in the two-stage thermosetting adhesive layer so that the first part of the two-stage thermosetting adhesive layer completely covers the electronic components and fills the electronic components and the circuit substrate. Therefore, it can prevent the large-sized filler in the packaging colloid from flowing into the gap and causing damage to the electronic components or causing the filling colloid in the gap to be filled incompletely and have bubbles, thereby effectively protecting the electronics Components, reduce the probability of damage to electronic components and improve the reliability of the chip package structure. In addition, since the material cost of the two-stage thermosetting adhesive layer is lower than that of the molded underfill (MUF), it can improve the reliability of the chip package structure while reducing the manufacturing cost. On the other hand, the height of the first part of the two-stage thermosetting adhesive layer of the present invention is substantially the same as the height of the second part, that is, the die glue layer (that is, the second part of the two-stage thermosetting adhesive layer) can be configured at the same time By forming a protective adhesive layer that completely covers the electronic components (ie, the first part of the two-stage thermosetting adhesive layer) at the same time, the process of separately forming a protective layer for the electronic components can be omitted, thus simplifying the manufacturing process and further reducing the manufacturing cost. In addition, a metal sheet can be placed on the first part of the two-stage thermosetting adhesive layer to reduce the stability of electronic components during use due to electromagnetic interference, or damage to electronic components due to overheating during operation, and further improve the chip package structure The reliability.
雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention. Anyone with ordinary knowledge in the relevant technical field can make some changes and modifications without departing from the spirit and scope of the present invention. The scope of protection of the present invention shall be determined by the scope of the attached patent application.
10:模具
100、100a:晶片封裝結構
110:線路基板
110a:第一表面
110b:第二表面
112:接墊
120:兩階段熱固性膠層
122、1221、1222:第一部分
122a:第一部分的頂面
124:第二部分
124a:第二部分的頂面
130、1301、1302:電子元件
132、1321、1322:導電件
140:晶片
140a:主動面
140b:背面
150、1501、1502:金屬片
160:封裝膠體
G、G1、G2:空隙
H1、H2:高度
L:導線
OP、OP1、OP2:開口
P:貫孔
R1、R2:形成位置10:
圖1A至圖1D是依照本發明一實施例的一種晶片封裝結構的製造方法的剖面示意圖。 圖2是依照本發明另一實施例的一種晶片封裝結構的剖面示意圖。 1A to 1D are schematic cross-sectional views of a manufacturing method of a chip package structure according to an embodiment of the present invention. 2 is a schematic cross-sectional view of a chip package structure according to another embodiment of the invention.
100:晶片封裝結構 100: Chip package structure
110:線路基板 110: circuit board
110a:第一表面 110a: first surface
110b:第二表面 110b: second surface
112:接墊 112: pad
120:兩階段熱固性膠層 120: Two-stage thermosetting adhesive layer
122、1221、1222:第一部分 122, 1221, 1222: Part One
124:第二部分 124: Part Two
130、1301、1302:電子元件 130, 1301, 1302: electronic components
140:晶片 140: chip
140a:主動面 140a: active side
140b:背面 140b: back
150、1501、1502:金屬片 150, 1501, 1502: metal sheet
160:封裝膠體 160: Encapsulation gel
L:導線 L: Wire
Claims (10)
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW201311073A (en) * | 2011-08-19 | 2013-03-01 | Unimicron Technology Corp | Semiconductor package structure and fabrication method thereof |
TW201526123A (en) * | 2013-12-19 | 2015-07-01 | 矽品精密工業股份有限公司 | Semiconductor package structure and manufacturing method thereof |
TW201720251A (en) * | 2015-11-26 | 2017-06-01 | 欣興電子股份有限公司 | Manufacturing method for package structure with embedded component |
TW201834167A (en) * | 2016-11-23 | 2018-09-16 | 南韓商三星電子股份有限公司 | Fan-out semiconductor package |
TW201935626A (en) * | 2018-02-05 | 2019-09-01 | 南茂科技股份有限公司 | Semiconductor package structure |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2865054B2 (en) * | 1996-04-03 | 1999-03-08 | サンケン電気株式会社 | Circuit board device and method of manufacturing the same |
KR20060036433A (en) * | 2006-04-10 | 2006-04-28 | 김영선 | Thermal dissipation semiconductor package and fabricating this |
JP2009088351A (en) * | 2007-10-01 | 2009-04-23 | Denso Corp | Production method for electronic circuit device, and electronic circuit device |
TW201234545A (en) * | 2011-02-01 | 2012-08-16 | Taiwan Ic Packaging Corp | Packaging structure and packaging method of portable flash memory storage device |
CN202443968U (en) * | 2012-01-16 | 2012-09-19 | 日月光半导体制造股份有限公司 | Semiconductor packaging structure |
US9640709B2 (en) * | 2013-09-10 | 2017-05-02 | Heptagon Micro Optics Pte. Ltd. | Compact opto-electronic modules and fabrication methods for such modules |
TWI688017B (en) * | 2019-03-15 | 2020-03-11 | 南茂科技股份有限公司 | Chip package structure and manufacturing method thereof |
-
2020
- 2020-03-20 TW TW109109300A patent/TWI720851B/en active
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Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW201311073A (en) * | 2011-08-19 | 2013-03-01 | Unimicron Technology Corp | Semiconductor package structure and fabrication method thereof |
TW201526123A (en) * | 2013-12-19 | 2015-07-01 | 矽品精密工業股份有限公司 | Semiconductor package structure and manufacturing method thereof |
TW201720251A (en) * | 2015-11-26 | 2017-06-01 | 欣興電子股份有限公司 | Manufacturing method for package structure with embedded component |
TW201834167A (en) * | 2016-11-23 | 2018-09-16 | 南韓商三星電子股份有限公司 | Fan-out semiconductor package |
TW201935626A (en) * | 2018-02-05 | 2019-09-01 | 南茂科技股份有限公司 | Semiconductor package structure |
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TW202137425A (en) | 2021-10-01 |
CN113496962A (en) | 2021-10-12 |
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