TWI719955B - Three-layer film, method for forming three-layer film, laminated sheet, and printed circuit board - Google Patents

Three-layer film, method for forming three-layer film, laminated sheet, and printed circuit board Download PDF

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TWI719955B
TWI719955B TW104140330A TW104140330A TWI719955B TW I719955 B TWI719955 B TW I719955B TW 104140330 A TW104140330 A TW 104140330A TW 104140330 A TW104140330 A TW 104140330A TW I719955 B TWI719955 B TW I719955B
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liquid crystal
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crystal polymer
liquid composition
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TW201643043A (en
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伊藤豊誠
杉山貴之
根津秀明
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日商住友化學股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/06Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/04Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/28Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42
    • B32B27/281Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42 comprising polyimides
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B37/00Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
    • B32B37/06Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the heating method
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B37/00Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
    • B32B37/14Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers
    • B32B37/24Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers with at least one layer not being coherent before laminating, e.g. made up from granular material sprinkled onto a substrate
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B38/00Ancillary operations in connection with laminating processes
    • B32B38/16Drying; Softening; Cleaning
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B9/00Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B37/00Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
    • B32B37/14Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers
    • B32B37/24Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers with at least one layer not being coherent before laminating, e.g. made up from granular material sprinkled onto a substrate
    • B32B2037/243Coating
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B38/00Ancillary operations in connection with laminating processes
    • B32B38/16Drying; Softening; Cleaning
    • B32B38/164Drying
    • B32B2038/168Removing solvent

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Laminated Bodies (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)

Abstract

A three-layer film includes a polyimide resin film and liquid crystal polymer layers which include a hydroxycarboxlic acid as a mesogenic group and are laminated on both surfaces of the polyimide resin film. A thickness of the polyimide resin film (T1) and thicknesses of the liquid crystal polymer layers which include the hydroxycarboxlic acid as the mesogenic group (T2) satisfy the following relational expressions (a) and (b), where two T2s are independent from each other and may be the same or different.
(a) 20 μm≦T1≦50 μm
(b)0.3≦T2/T1≦1.5

Description

三層薄膜、三層薄膜之製造方法、層合板及印刷電路基板 Three-layer film, manufacturing method of three-layer film, laminated board and printed circuit board

本發明係關於三層薄膜、三層薄膜之製造方法、層合板及印刷電路基板。 The present invention relates to a three-layer film, a method for manufacturing a three-layer film, a laminate and a printed circuit board.

於裝入行動電話、個人電腦、數位家電等電子機器之印刷配線板(印刷基板、印刷電路基板),係使用於絕緣層上設置有金屬層的層合體。作為如此之層合體,例如已知有層合由金屬箔等之導體所成之層、與作為絕緣層之由聚醯亞胺樹脂薄膜所成之層而得的層合體(例如專利文獻1~2)。又,專利文獻3中,記載了採用銅箔作為金屬層,且層合液晶聚酯樹脂層作為絕緣層的層合體。 Printed wiring boards (printed circuit boards, printed circuit boards) used in electronic devices such as mobile phones, personal computers, and digital home appliances are used in laminates with a metal layer on the insulating layer. As such a laminate, for example, a laminate obtained by laminating a layer made of a conductor such as a metal foil and a layer made of a polyimide resin film as an insulating layer is known (for example, Patent Document 1~ 2). In addition, Patent Document 3 describes a laminate in which a copper foil is used as a metal layer and a liquid crystal polyester resin layer is laminated as an insulating layer.

聚醯亞胺樹脂具有吸水性,耐濕性不佳。又,由於為非熱可塑性樹脂,故無法直接層合金屬箔。因而例如專利文獻4~5中,記載了採用液晶聚合物薄膜與聚醯亞胺樹脂 之層合體作為絕緣層。作為液晶聚合物薄膜,可列舉專利文獻6~9記載者。聚醯亞胺樹脂之吸水作用對印刷配線基板之電特性會造成大影響,因此液晶聚合物薄膜之採用方法,對於使印刷配線基板之電特性成為良好而言,係重要的。 Polyimide resin has water absorption and poor moisture resistance. In addition, since it is a non-thermoplastic resin, it is impossible to directly laminate the metal foil. Therefore, for example, Patent Documents 4 to 5 describe the use of liquid crystal polymer films and polyimide resins. The laminate is used as an insulating layer. As the liquid crystal polymer film, those described in Patent Documents 6 to 9 can be cited. The water absorption of the polyimide resin will have a great impact on the electrical properties of the printed wiring board. Therefore, the method of using the liquid crystal polymer film is important for making the electrical properties of the printed wiring board good.

〔先前技術文獻〕 [Prior technical literature] 〔專利文獻〕 〔Patent Literature〕

[專利文獻1]日本特開2006-008976號公報 [Patent Document 1] JP 2006-008976 A

[專利文獻2]日本特開2013-032532號公報 [Patent Document 2] JP 2013-032532 A

[專利文獻3]日本特開2007-106107號公報 [Patent Document 3] JP 2007-106107 A

[專利文獻4]日本特開2008-290424號公報 [Patent Document 4] JP 2008-290424 A

[專利文獻5]日本特開2008-290425號公報 [Patent Document 5] JP 2008-290425 A

[專利文獻6]日本特開2013-189535號公報 [Patent Document 6] JP 2013-189535 A

[專利文獻7]日本特開2004-315678號公報 [Patent Document 7] JP 2004-315678 A

[專利文獻8]日本特開2007-238915號公報 [Patent Document 8] JP 2007-238915 A

[專利文獻9]日本特開2013-001902號公報 [Patent Document 9] JP 2013-001902 A

但是,對印刷配線基板所要求的特性愈加增高,於印刷配線基板所用的層合體,尚有改良的餘地。 However, the characteristics required for printed wiring boards are increasing, and there is still room for improvement in laminates used for printed wiring boards.

本發明係有鑑於上述實情而為者,其課題為提供使用於印刷配線基板用之層合體時,尺寸安定性與電特性優良 之三層薄膜、及該三層薄膜之製造方法。 The present invention has been made in view of the above-mentioned facts, and its subject is to provide a laminate for use in printed wiring boards with excellent dimensional stability and electrical properties The three-layer film and the manufacturing method of the three-layer film.

本發明之第一態樣,係一種三層薄膜,其係於聚醯亞胺樹脂薄膜之兩面,層合有以羥基羧酸為液晶原基之液晶聚合物層,且前述聚醯亞胺樹脂薄膜之厚度(T1)與前述以羥基羧酸為液晶原基之液晶聚合物層之厚度(T2),滿足以下之關係式(a)及(b)(惟,2個T2係互相獨立,可為相同、亦可為相異)。 The first aspect of the present invention is a three-layer film, which is laminated on both sides of a polyimide resin film with a liquid crystal polymer layer using hydroxycarboxylic acid as the mesogen, and the aforementioned polyimide resin The thickness (T1) of the film and the thickness (T2) of the liquid crystal polymer layer with hydroxycarboxylic acid as the mesogen mentioned above satisfy the following relational formulas (a) and (b) (However, the two T2 are independent of each other. It can be the same or different).

(a)20μm≦T1≦50μm (a) 20 μ m≦T1≦50 μ m

(b)0.3≦T2/T1≦1.5 (b) 0.3≦T2/T1≦1.5

本發明之第一態樣中,以羥基羧酸為液晶原基之液晶聚合物層較佳為含有來自2-羥基安息香酸或2-羥基-6-萘甲酸之構造單位。 In the first aspect of the present invention, the liquid crystal polymer layer using hydroxycarboxylic acid as the mesogen group preferably contains structural units derived from 2-hydroxybenzoic acid or 2-hydroxy-6-naphthoic acid.

本發明之第一態樣中,以羥基羧酸為液晶原基之液晶聚合物層較佳為進一步含有以下之構造單位(1)及(2)。 In the first aspect of the present invention, the liquid crystal polymer layer using hydroxycarboxylic acid as the mesogen group preferably further contains the following structural units (1) and (2).

(1)-CO-Ar1-CO- (1)-CO-Ar 1 -CO-

(2)-X-Ar2-Y- (2)-X-Ar 2 -Y-

(式中,Ar1及Ar2係分別獨立地表示伸苯基、伸萘基、聯伸苯基或下述式(3)表示之基。X及Y係分別獨立地表示氧原子或亞胺基。Ar1、或Ar2表示之前述基中之氫原子,亦可各自獨立地被鹵素原子、烷基或芳基取代)。 (In the formula, Ar 1 and Ar 2 each independently represent a phenylene group, a naphthylene group, a biphenylene group or a group represented by the following formula (3). X and Y each independently represent an oxygen atom or an imine The hydrogen atom in the aforementioned group represented by Ar 1 or Ar 2 may be independently substituted with a halogen atom, an alkyl group, or an aryl group).

(3)-Ar3-Z-Ar4- (3)-Ar 3 -Z-Ar 4-

(Ar3及Ar4係分別獨立地表示伸苯基或伸萘基。Z係表示氧原子、硫原子、羰基、磺醯基或亞烷基)。 (Ar 3 and Ar 4 each independently represent a phenylene group or a naphthylene group. Z represents an oxygen atom, a sulfur atom, a carbonyl group, a sulfonyl group, or an alkylene group).

本發明之第二態樣,係前述第一態樣之三層薄膜被使用作為絕緣層,且於該絕緣層之至少單面形成有金屬層的層合板。 The second aspect of the present invention is a laminate in which the three-layer film of the aforementioned first aspect is used as an insulating layer, and a metal layer is formed on at least one side of the insulating layer.

本發明之第二態樣中,前述金屬層之最大高度(Rz)較佳係以0.5~2.5μm形成。 In the second aspect of the present invention, the maximum height (Rz) of the aforementioned metal layer is preferably formed at 0.5-2.5 μm.

本發明之第二態樣中,前述金屬層較佳為含有銅。 In the second aspect of the present invention, the aforementioned metal layer preferably contains copper.

本發明之第三態樣,係使用前述第五態樣之層合板的印刷電路基板。 The third aspect of the present invention is a printed circuit board using the laminate of the aforementioned fifth aspect.

本發明之第四態樣,係一種三層薄膜之製造方法,其係包含將含有溶劑與液晶聚合物之液狀組成物塗佈於聚醯亞胺樹脂薄膜上,以前述液狀組成物被覆前述聚醯亞胺樹脂薄膜之液狀組成物塗佈步驟、將前述液狀組成物中之溶劑去除之溶劑去除步驟、與加熱處理步驟之三層薄膜之製造方法,其中作為前述液晶聚合物,係含有來自2-羥基安息香酸或2-羥基-6-萘甲酸之構造單位、與以下之構造單位(1)及(2)。 The fourth aspect of the present invention is a method for manufacturing a three-layer film, which includes coating a polyimide resin film with a liquid composition containing a solvent and a liquid crystal polymer, and coating the liquid composition with the liquid composition The method for manufacturing a three-layer film of the liquid composition coating step of the aforementioned polyimide resin film, the solvent removal step of removing the solvent in the aforementioned liquid composition, and the heat treatment step, wherein as the aforementioned liquid crystal polymer, It contains structural units derived from 2-hydroxybenzoic acid or 2-hydroxy-6-naphthoic acid, and the following structural units (1) and (2).

(1)-CO-Ar1-CO- (1)-CO-Ar 1 -CO-

(2)-X-Ar2-Y- (2)-X-Ar 2 -Y-

(式中,Ar1及Ar2係分別獨立地表示伸苯基、伸萘基、聯伸苯基或下述式(3)表示之基。X及Y係分別獨立地表示氧原子或亞胺基。Ar1、或Ar2表示之前述基中 之氫原子,亦可各自獨立地被鹵素原子、烷基或芳基取代)。 (In the formula, Ar 1 and Ar 2 each independently represent a phenylene group, a naphthylene group, a biphenylene group or a group represented by the following formula (3). X and Y each independently represent an oxygen atom or an imine The hydrogen atom in the aforementioned group represented by Ar 1 or Ar 2 may be independently substituted with a halogen atom, an alkyl group, or an aryl group).

(3)-Ar3-Z-Ar4- (3)-Ar 3 -Z-Ar 4-

(Ar3及Ar4係分別獨立地表示伸苯基或伸萘基。Z係表示氧原子、硫原子、羰基、磺醯基或亞烷基)。 (Ar 3 and Ar 4 each independently represent a phenylene group or a naphthylene group. Z represents an oxygen atom, a sulfur atom, a carbonyl group, a sulfonyl group, or an alkylene group).

本發明之第五態樣,係一種三層薄膜之製造方法,其係包含於含有溶劑與液晶聚合物之液狀組成物中含浸聚醯亞胺樹脂薄膜,以前述液狀組成物被覆前述聚醯亞胺樹脂薄膜之含浸步驟、將前述液狀組成物中之溶劑去除之溶劑去除步驟、與加熱處理步驟之三層薄膜之製造方法,其中作為前述液晶聚合物,係含有來自2-羥基安息香酸或2-羥基-6-萘甲酸之構造單位、與以下之構造單位(1)及(2)。 The fifth aspect of the present invention is a method for manufacturing a three-layer film, which comprises impregnating a polyimide resin film in a liquid composition containing a solvent and a liquid crystal polymer, and coating the polyimide resin film with the liquid composition. The method for producing a three-layer film of the impregnation step of the imine resin film, the solvent removal step of removing the solvent in the aforementioned liquid composition, and the heat treatment step, wherein the liquid crystal polymer contains 2-hydroxybenzoin as the aforementioned liquid crystal polymer The structural unit of acid or 2-hydroxy-6-naphthoic acid, and the following structural units (1) and (2).

(1)-CO-Ar1-CO- (1)-CO-Ar 1 -CO-

(2)-X-Ar2-Y- (2)-X-Ar 2 -Y-

(式中,Ar1及Ar2係分別獨立地表示伸苯基、伸萘基、聯伸苯基或下述式(3)表示之基。X及Y係分別獨立地表示氧原子或亞胺基。Ar1、或Ar2表示之前述基中之氫原子,亦可各自獨立地被鹵素原子、烷基或芳基取代)。 (In the formula, Ar 1 and Ar 2 each independently represent a phenylene group, a naphthylene group, a biphenylene group or a group represented by the following formula (3). X and Y each independently represent an oxygen atom or an imine The hydrogen atom in the aforementioned group represented by Ar 1 or Ar 2 may be independently substituted with a halogen atom, an alkyl group, or an aryl group).

(3)-Ar3-Z-Ar4- (3)-Ar 3 -Z-Ar 4-

(Ar3及Ar4係分別獨立地表示伸苯基或伸萘基。Z係表示氧原子、硫原子、羰基、磺醯基或亞烷基)。 (Ar 3 and Ar 4 each independently represent a phenylene group or a naphthylene group. Z represents an oxygen atom, a sulfur atom, a carbonyl group, a sulfonyl group, or an alkylene group).

本發明之第六態樣,係一種三層薄膜之製造 方法,其係包含準備含有溶劑與液晶聚合物之液狀組成物、與聚醯亞胺樹脂之前驅物的聚醯胺酸樹脂液狀組成物之步驟;於支撐體上依序將前述液狀組成物、前述聚醯胺酸樹脂液狀組成物、與前述液狀組成物塗佈為三層之步驟;將前述三層之液狀組成物中的溶劑去除之溶劑去除步驟;與三層薄膜形成步驟之三層薄膜之製造方法,其中作為前述液晶聚合物,係含有來自2-羥基安息香酸或2-羥基-6-萘甲酸之構造單位、與以下之構造單位(1)及(2)。 The sixth aspect of the present invention is the manufacture of a three-layer film The method includes the steps of preparing a liquid composition containing a solvent and a liquid crystal polymer, and a polyimide resin liquid composition that is a precursor of the polyimide resin; and sequentially depositing the liquid composition on a support The step of coating the composition, the aforementioned polyamide resin liquid composition, and the aforementioned liquid composition into three layers; the solvent removal step of removing the solvent in the aforementioned three-layer liquid composition; and the three-layer film The method for producing a three-layer film in the forming step, wherein as the aforementioned liquid crystal polymer, it contains a structural unit derived from 2-hydroxybenzoic acid or 2-hydroxy-6-naphthoic acid, and the following structural units (1) and (2) .

(1)-CO-Ar1-CO- (1)-CO-Ar 1 -CO-

(2)-X-Ar2-Y- (2)-X-Ar 2 -Y-

(式中,Ar1及Ar2係分別獨立地表示伸苯基、伸萘基、聯伸苯基或下述式(3)表示之基。X及Y係分別獨立地表示氧原子或亞胺基。Ar1、或Ar2表示之前述基中之氫原子,亦可各自獨立地被鹵素原子、烷基或芳基取代)。 (In the formula, Ar 1 and Ar 2 each independently represent a phenylene group, a naphthylene group, a biphenylene group or a group represented by the following formula (3). X and Y each independently represent an oxygen atom or an imine The hydrogen atom in the aforementioned group represented by Ar 1 or Ar 2 may be independently substituted with a halogen atom, an alkyl group, or an aryl group).

(3)-Ar3-Z-Ar4- (3)-Ar 3 -Z-Ar 4-

(Ar3及Ar4係分別獨立地表示伸苯基或伸萘基。Z係表示氧原子、硫原子、羰基、磺醯基或亞烷基)。 (Ar 3 and Ar 4 each independently represent a phenylene group or a naphthylene group. Z represents an oxygen atom, a sulfur atom, a carbonyl group, a sulfonyl group, or an alkylene group).

依照本發明,可提供使用於印刷配線基板用之層合體時,尺寸安定性與電特性優良的三層薄膜、及該三層薄膜之製造方法。 According to the present invention, it is possible to provide a three-layer film with excellent dimensional stability and electrical characteristics when used in a laminate for a printed wiring board, and a method for manufacturing the three-layer film.

20‧‧‧三層薄膜 20‧‧‧Three-layer film

21‧‧‧聚醯亞胺樹脂薄膜 21‧‧‧Polyimide resin film

22a、22b‧‧‧液晶聚合物層 22a, 22b‧‧‧Liquid crystal polymer layer

30a、30b‧‧‧金屬層 30a, 30b‧‧‧Metal layer

3‧‧‧浸漬槽 3‧‧‧Dipping tank

4‧‧‧導引輥 4‧‧‧Guide roller

5‧‧‧擠壓輥 5‧‧‧Squeeze roller

5A、5B‧‧‧輥 5A、5B‧‧‧roller

10‧‧‧聚醯亞胺樹脂薄膜 10‧‧‧Polyimide resin film

11‧‧‧剛含浸液狀組成物後之聚醯亞胺樹脂薄膜 11‧‧‧Polyimide resin film just after being impregnated with liquid composition

12‧‧‧液狀組成物含浸聚醯亞胺樹脂薄膜 12‧‧‧Liquid composition impregnated with polyimide resin film

W‧‧‧液狀組成物 W‧‧‧Liquid composition

G1‧‧‧導引輥 G 1 ‧‧‧Guide roller

[圖1]用以說明本發明之三層薄膜之示意圖。 [Figure 1] A schematic diagram for explaining the three-layer film of the present invention.

[圖2]用以說明使用本發明之三層薄膜的層合體之示意圖。 [Figure 2] A schematic diagram for explaining a laminate using the three-layer film of the present invention.

[圖3]用以說明本發明之第三態樣的三層薄膜之製造方法的概略圖。 [Fig. 3] A schematic diagram for explaining the manufacturing method of the three-layer film of the third aspect of the present invention.

≪三層薄膜≫ ≪Three-layer film≫

首先,使用圖1來說明本發明之第一態樣的三層薄膜。 First, the three-layer film of the first aspect of the present invention is explained using FIG. 1.

圖1中顯示本發明之三層薄膜20。三層薄膜20,係於聚醯亞胺樹脂薄膜21之兩面,層合有以羥基羧酸為液晶原基之液晶聚合物層22a及22b。換言之,三層薄膜20,係包含以羥基羧酸為液晶原基之液晶聚合物層22a及22b、與夾於前述液晶聚合物層22a及22b之中的聚醯亞胺樹脂薄膜21。 Fig. 1 shows a three-layer film 20 of the present invention. The three-layer film 20 is on both sides of the polyimide resin film 21, and is laminated with liquid crystal polymer layers 22a and 22b using hydroxycarboxylic acid as the mesogen. In other words, the three-layer film 20 includes liquid crystal polymer layers 22a and 22b with hydroxycarboxylic acid as mesogen, and a polyimide resin film 21 sandwiched between the liquid crystal polymer layers 22a and 22b.

三層薄膜20,其聚醯亞胺樹脂薄膜21之厚度(T1)與以羥基羧酸為液晶原基之液晶聚合物層22a及22b各自的厚度(T2),係滿足以下之關係式(a)及(b),且2個T2(圖1中之T2a及T2b)係互相獨立,可為相同、 亦可為相異。 For the three-layer film 20, the thickness (T1) of the polyimide resin film 21 and the respective thickness (T2) of the liquid crystal polymer layers 22a and 22b with hydroxycarboxylic acid as the mesogen, satisfy the following relational formula (a ) And (b), and the two T2s (T2a and T2b in Figure 1) are independent of each other and can be the same, It can also be different.

(a)20μm≦T1≦50μm (a) 20 μ m≦T1≦50 μ m

(b)0.3≦T2/T1≦1.5 (b) 0.3≦T2/T1≦1.5

〔聚醯亞胺樹脂薄膜〕 〔Polyimide resin film〕

聚醯亞胺樹脂,為以二胺類與四羧酸二酐為起始原料,藉由聚縮合而得到之縮合型聚醯亞胺。作為二胺類並無特殊限制,可使用通常使用於聚醯亞胺之合成的芳香族二胺類、脂環式二胺類、脂肪族二胺類等。二胺類可單獨使用、亦可合併使用2種以上。 Polyimide resin is a condensation type polyimide obtained by polycondensation using diamines and tetracarboxylic dianhydride as starting materials. There are no particular restrictions on the diamines, and aromatic diamines, alicyclic diamines, aliphatic diamines, etc., which are generally used in the synthesis of polyimides, can be used. The diamines may be used alone, or two or more of them may be used in combination.

又,作為四羧酸二酐,可使用芳香族四羧酸二酐、脂環式四羧酸二酐、脂肪族四羧酸二酐等,並無特殊限制。四羧酸二酐可單獨使用、亦可合併使用2種以上。 Moreover, as the tetracarboxylic dianhydride, aromatic tetracarboxylic dianhydride, alicyclic tetracarboxylic dianhydride, aliphatic tetracarboxylic dianhydride, etc. can be used, and it does not specifically limit. Tetracarboxylic dianhydride may be used alone or in combination of two or more kinds.

又,於上述二胺類及四羧酸二酐之至少任一方,亦可具有1個或複數個之選自由氟基或三氟甲基、羥基、碸基、羰基、雜環、長鏈烷基等所成之群的至少1種官能基。 In addition, at least any one of the above-mentioned diamines and tetracarboxylic dianhydrides may have one or more selected from the group consisting of fluoro or trifluoromethyl, hydroxyl, carbonyl, heterocyclic, and long-chain alkane. At least one kind of functional group of a group such as a group.

如此之聚醯亞胺之中,由形成聚醯亞胺樹脂薄膜21時的機械強度、彎曲性之觀點而言,作為四羧酸二酐,尤以使用芳香族四羧酸二酐較佳。 Among such polyimides, from the viewpoint of mechanical strength and flexibility when forming the polyimide resin film 21, it is particularly preferable to use aromatic tetracarboxylic dianhydrides as the tetracarboxylic dianhydride.

關於二胺類,可單獨使用芳香族二胺類、脂環式二胺類、脂肪族二胺類,亦可合併使用2種以上。 Regarding the diamines, aromatic diamines, alicyclic diamines, and aliphatic diamines may be used alone, or two or more of them may be used in combination.

又,由形成聚醯亞胺樹脂薄膜21時的機械強度、彎曲性之觀點而言,作為二胺,較佳為芳香族二胺。 In addition, from the viewpoint of mechanical strength and flexibility when forming the polyimide resin film 21, the diamine is preferably an aromatic diamine.

作為聚醯亞胺樹脂薄膜,可使用市售之聚醯亞胺樹脂(PI)薄膜,可列舉例如宇部興產(股)製PI薄膜(U-PILEX S、U-PILEX R)、東麗杜邦製PI薄膜(Kapton)、SKC Kolon PI公司製PI薄膜(IF30、IF70、LV300)。 As the polyimide resin film, commercially available polyimide resin (PI) films can be used. Examples include PI films (U-PILEX S, U-PILEX R) manufactured by Ube Industries Co., Ltd., Toray DuPont PI film (Kapton), PI film (IF30, IF70, LV300) manufactured by SKC Kolon PI.

本發明中,聚醯亞胺樹脂薄膜之厚度(T1),係滿足下述(a)之式。 In the present invention, the thickness (T1) of the polyimide resin film satisfies the following formula (a).

(a)20μm≦T1≦50μm (a) 20 μ m≦T1≦50 μ m

此處,聚醯亞胺樹脂薄膜之厚度,係於聚醯亞胺樹脂薄膜之任意5個部位,以接觸式厚度計測定厚度而得的以平均表示之值。再者,測定聚醯亞胺樹脂薄膜之厚度時,難以直接應用接觸式厚度計時,亦可於疊合有液晶聚合物層22a及22b等之其他層的狀態下,與上述同樣地測定全體之厚度,藉由取與所疊合的其他層之厚度(以與上述相同之方法所測定者)的差分來算出。 Here, the thickness of the polyimide resin film is an average value obtained by measuring the thickness with a contact thickness meter at any 5 locations of the polyimide resin film. In addition, when measuring the thickness of a polyimide resin film, it is difficult to directly apply a contact thickness meter. It is also possible to measure the entirety in the same manner as the above in a state where other layers such as liquid crystal polymer layers 22a and 22b are laminated. The thickness is calculated by taking the difference between the thickness (measured by the same method as the above) of the other layer to be laminated.

本發明中,由獲得容易的觀點而言,聚醯亞胺樹脂薄膜之厚度,較佳為20μm≦T1≦40μm、更佳為20μm≦T1≦30μm。 In the present invention, from the viewpoint of easy availability, the thickness of the polyimide resin film is preferably 20 μm≦T1≦40 μm, more preferably 20 μm≦T1≦30 μm.

聚醯亞胺樹脂薄膜之厚度為上述下限值以上時,可確保三層薄膜之絕緣特性與姿勢保持功能,為上述上限值以下時,可確保適度的柔軟性。 When the thickness of the polyimide resin film is more than the above lower limit, the insulating properties and posture retention function of the three-layer film can be ensured, and when the thickness is below the above upper limit, moderate flexibility can be ensured.

〔液晶聚合物〕 〔Liquid Crystal Polymer〕

本發明之三層薄膜之液晶聚合物層所用的液晶聚合 物,係以羥基羧酸為液晶原基之液晶聚合物。作為典型的例子,可列舉使單獨或複數種之芳香族羥基羧酸聚合而成者;使單獨或複數種之芳香族羥基羧酸與選自由芳香族二羧酸、芳香族二醇、芳香族羥基胺及芳香族二胺所成之群的至少1種化合物聚合(聚縮合)而成者;及使聚對苯二甲酸乙二酯等之聚酯與芳香族羥基羧酸聚合而成者。 Liquid crystal polymerization used in the liquid crystal polymer layer of the three-layer film of the present invention It is a liquid crystal polymer with hydroxycarboxylic acid as the mesogen. As a typical example, it can be exemplified by polymerization of singly or plural kinds of aromatic hydroxycarboxylic acids; singly or plural kinds of aromatic hydroxycarboxylic acids and selected from aromatic dicarboxylic acids, aromatic diols, aromatics Those obtained by polymerizing at least one compound of the group of hydroxylamine and aromatic diamine (polycondensation); and those obtained by polymerizing polyester such as polyethylene terephthalate and aromatic hydroxycarboxylic acid.

來自羥基羧酸之液晶原基,並無特殊限定,較佳為含有來自2-羥基安息香酸或2-羥基-6-萘甲酸之構造單位。此處,液晶原基,係指液晶分子中所含之分子形狀為棒狀或板狀且沿著分子之長鏈之剛性為高的分子鏈。液晶原基可存在於液晶聚合物之主鏈或側鏈之任一方或兩方,但若要求高耐熱性則以存在於主鏈較佳。 The mesogenic group derived from hydroxycarboxylic acid is not particularly limited, and preferably contains a structural unit derived from 2-hydroxybenzoic acid or 2-hydroxy-6-naphthoic acid. Here, the mesogen group refers to a molecular chain contained in a liquid crystal molecule that is rod-shaped or plate-shaped and has high rigidity along the long chain of the molecule. The mesogenic group may exist in either or both of the main chain or the side chain of the liquid crystal polymer, but it is preferable to exist in the main chain if high heat resistance is required.

本發明中,液晶聚合物較佳為含有來自2-羥基安息香酸或2-羥基-6-萘甲酸之構造單位。 In the present invention, the liquid crystal polymer preferably contains structural units derived from 2-hydroxybenzoic acid or 2-hydroxy-6-naphthoic acid.

液晶聚合物較佳為具有下述(1)表示之重複單位(以下有稱為「重複單位(1)」者),更佳為具有重複單位(1)、與下述式(2)表示之重複單位(以下有稱為「重複單位(2)」者)。 The liquid crystal polymer preferably has a repeating unit represented by the following (1) (hereinafter referred to as "repeating unit (1)"), and more preferably has a repeating unit (1), which is represented by the following formula (2) Repeating unit (hereinafter referred to as "repeating unit (2)").

(1)-CO-Ar1-CO- (1)-CO-Ar 1 -CO-

(2)-X-Ar2-Y- (2)-X-Ar 2 -Y-

(式中,Ar1及Ar2係分別獨立地表示伸苯基、伸萘基、聯伸苯基或下述式(3)表示之基。X及Y係分別獨立地表示氧原子或亞胺基。Ar1、或Ar2表示之前述基中 之氫原子,亦可各自獨立地被鹵素原子、烷基或芳基取代)。 (In the formula, Ar 1 and Ar 2 each independently represent a phenylene group, a naphthylene group, a biphenylene group or a group represented by the following formula (3). X and Y each independently represent an oxygen atom or an imine The hydrogen atom in the aforementioned group represented by Ar 1 or Ar 2 may be independently substituted with a halogen atom, an alkyl group, or an aryl group).

(3)-Ar3-Z-Ar4- (3)-Ar 3 -Z-Ar 4-

(Ar3及Ar4係分別獨立地表示伸苯基或伸萘基。Z係表示氧原子、硫原子、羰基、磺醯基或亞烷基)。 (Ar 3 and Ar 4 each independently represent a phenylene group or a naphthylene group. Z represents an oxygen atom, a sulfur atom, a carbonyl group, a sulfonyl group, or an alkylene group).

前述鹵素原子,可列舉氟原子、氯原子、溴原子及碘原子。 The aforementioned halogen atom includes a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.

前述烷基之例子,可列舉甲基、乙基、n-丙基、異丙基、n-丁基、異丁基、s-丁基、t-丁基、n-己基、2-乙基己基、n-辛基及n-癸基,其碳數較佳為1~10。 Examples of the aforementioned alkyl groups include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, s-butyl, t-butyl, n-hexyl, 2-ethyl The hexyl group, n-octyl group and n-decyl group preferably have a carbon number of 1-10.

前述芳基之例子,可列舉苯基、o-甲苯基、m-甲苯基、p-甲苯基、1-萘基及2-萘基,其碳數較佳為6~20。 Examples of the aforementioned aryl group include phenyl, o-tolyl, m-tolyl, p-tolyl, 1-naphthyl, and 2-naphthyl, and the carbon number is preferably 6-20.

以Ar1~Ar4表示之前述基中之氫原子被此等之基取代時,其數目為每個以Ar1~Ar4表示之前述基而言,分別獨立地較佳為2個以下、更佳為1個。 When the hydrogen atoms in the aforementioned groups represented by Ar 1 to Ar 4 are substituted by these groups, the number is preferably 2 or less for each of the aforementioned groups represented by Ar 1 to Ar 4, More preferably, it is one.

前述亞烷基之例子,可列舉亞甲基、亞乙基、異亞丙基、n-亞丁基及2-乙基亞己基,其碳數較佳為1~10。 Examples of the aforementioned alkylene group include methylene, ethylene, isopropylene, n-butylene, and 2-ethylhexylene, and the number of carbon atoms is preferably 1-10.

重複單位(1),為來自特定之芳香族二羧酸的重複單位。作為重複單位(1),較佳為Ar1為p-伸苯基者(來自對苯二甲酸之重複單位)、Ar1為m-伸苯基者(來自間苯二甲酸之重複單位)、Ar1為2,6-伸萘基者(來自2,6-萘二羧酸之重複單位)、及Ar1為二苯基醚-4,4’-二基者(來自二苯基醚-4,4’-二羧酸之重複單位)。 The repeating unit (1) is a repeating unit derived from a specific aromatic dicarboxylic acid. As the repeating unit (1), preferably Ar 1 is p-phenylene (repeating unit derived from terephthalic acid), Ar 1 is m-phenylene (repeating unit derived from isophthalic acid), Ar 1 is 2,6-naphthylene (from the repeating unit of 2,6-naphthalenedicarboxylic acid), and Ar 1 is diphenyl ether-4,4'-diyl (from diphenyl ether- 4,4'-repeating unit of dicarboxylic acid).

重複單位(2),為來自特定之芳香族二醇、芳香族羥基胺或芳香族二胺之重複單位。作為重複單位(2),較佳為Ar2為p-伸苯基者(來自氫醌、p-胺基酚或p-苯二胺之重複單位)、及Ar2為4,4’-聯伸苯基者(來自4,4’-二羥基聯苯、4-胺基-4’-羥基聯苯或4,4’-二胺基聯苯之重複單位)。 The repeating unit (2) is a repeating unit derived from a specific aromatic diol, aromatic hydroxylamine or aromatic diamine. As the repeating unit (2), preferably Ar 2 is p-phenylene (repeating unit derived from hydroquinone, p-aminophenol or p-phenylenediamine), and Ar 2 is 4,4'-linked Phenylene (from the repeating unit of 4,4'-dihydroxybiphenyl, 4-amino-4'-hydroxybiphenyl or 4,4'-diaminobiphenyl).

重複單位(1)之含量,相對於全部重複單位之合計量(藉由將構成液晶聚合物之各重複單位的質量除以該各重複單位之式量,求得各重複單位之物質量相當量(莫耳),且將該等合計之值)而言,較佳為40莫耳%以下、更佳為10莫耳%以上且37.5莫耳%以下、又更佳為20莫耳%以上且37.5莫耳%以下、又再更佳為25莫耳%以上且37.5莫耳%以下。 The content of the repeating unit (1) is relative to the total amount of all repeating units (by dividing the mass of each repeating unit constituting the liquid crystal polymer by the formula weight of each repeating unit, the equivalent amount of substance of each repeating unit is obtained (Mole), and the total value) is preferably 40 mol% or less, more preferably 10 mol% or more and 37.5 mol% or less, still more preferably 20 mol% or more, and 37.5 mol% or less, and still more preferably 25 mol% or more and 37.5 mol% or less.

同樣地,重複單位(2)之含量,相對於全部重複單位之合計量而言,較佳為40莫耳%以下、更佳為10莫耳%以上且37.5莫耳%以下、又更佳為20莫耳%以上且37.5莫耳%以下、又再更佳為25莫耳%以上且37.5莫耳%以下。 Similarly, the content of the repeating unit (2) relative to the total amount of all repeating units is preferably 40 mol% or less, more preferably 10 mol% or more and 37.5 mol% or less, and still more preferably 20 mol% or more and 37.5 mol% or less, and still more preferably 25 mol% or more and 37.5 mol% or less.

以羥基羧酸為來源的液晶原基之含量,相對於全部重複單位之合計量而言,較佳為55莫耳%以下、更佳為20莫耳%以上且50莫耳%以下、又更佳為25莫耳%以上且45莫耳%以下、又再更佳為30莫耳%以上且45莫耳%以下。液晶聚合物中,以羥基羧酸為來源的液晶原基之含量高於55莫耳%時,所得之液晶聚合物係有難溶 於後述之溶劑的傾向,因此係有不易得到液晶聚合物層之傾向。 The content of mesogen group derived from hydroxycarboxylic acid is preferably 55 mol% or less, more preferably 20 mol% or more and 50 mol% or less, relative to the total amount of all repeating units. It is preferably 25 mol% or more and 45 mol% or less, and still more preferably 30 mol% or more and 45 mol% or less. In the liquid crystal polymer, when the content of mesogen groups derived from hydroxycarboxylic acid is higher than 55 mol%, the resulting liquid crystal polymer is insoluble The solvent tends to be described later, so it tends to be difficult to obtain a liquid crystal polymer layer.

重複單位(1)之含量與重複單位(2)之含量的比例,以[重複單位(1)之含量]/[重複單位(2)之含量](莫耳/莫耳)表示,較佳為0.9/1~1/0.9、更佳為0.95/1~1/0.95、又更佳為0.98/1~1/0.98。 The ratio of the content of the repeating unit (1) to the content of the repeating unit (2) is expressed by [the content of the repeating unit (1)]/[the content of the repeating unit (2)] (mole/mole), preferably 0.9/1~1/0.9, more preferably 0.95/1~1/0.95, still more preferably 0.98/1~1/0.98.

再者,液晶聚合物,可分別獨立地具有2種以上之重複單位(1)~(2)。又,液晶聚合物亦可具有重複單位(1)~(2)以外之重複單位,其含量相對於全部重複單位之合計量而言,較佳為多於0莫耳%且10莫耳%以下、更佳為多於0莫耳%且5莫耳%以下。 Furthermore, the liquid crystal polymer may each independently have two or more repeating units (1) to (2). In addition, the liquid crystal polymer may have repeating units other than repeating units (1) to (2), and its content is preferably more than 0 mol% and 10 mol% relative to the total amount of all repeating units. , More preferably, it is more than 0 mol% and 5 mol% or less.

液晶聚合物,若具有X與Y之任一者或兩者為亞胺基者作為重複單位(2),亦即,具有來自特定之芳香族羥基胺之重複單位、與來自芳香族二胺之重複單位的任一者或兩者時,則對溶劑之溶解性優良,故較佳,若僅具有X與Y之任一者或兩者為亞胺基者作為重複單位(2)時,則更佳。 Liquid crystal polymer, if one or both of X and Y are imine groups as the repeating unit (2), that is, it has repeating units derived from a specific aromatic hydroxylamine, and a repeating unit derived from an aromatic diamine When either or both of the repeating units are excellent in solvent solubility, it is preferred. When only one or both of X and Y are imino groups as the repeating unit (2), then Better.

液晶聚合物,可為以羥基羧酸為來源的液晶原基、與重複單位(1)~(2)進行隨機地結合者,只要係顯示液晶性,則亦可為嵌段共聚物。 The liquid crystal polymer may be a mesogen group derived from a hydroxycarboxylic acid and a random combination with the repeating units (1) to (2). As long as it exhibits liquid crystallinity, it may also be a block copolymer.

液晶聚合物較佳為藉由使對應於構成其之重複單位的原料單體熔融聚合,且使所得到之聚合物(預聚物)固相聚合而製造。藉此,可操作性良好地製造耐熱性或強度/剛性高之高分子量的液晶聚合物。熔融聚合亦可 在觸媒之存在下進行,該觸媒之例子,可列舉乙酸鎂、乙酸錫(II)、四丁氧化鈦、乙酸鉛、乙酸鈉、乙酸鉀、三氧化銻等之金屬化合物,或4-(二甲基胺基)吡啶、1-甲基咪唑等之含氮雜環式化合物,較佳使用含氮雜環式化合物。 The liquid crystal polymer is preferably produced by melt-polymerizing raw material monomers corresponding to the repeating unit constituting it, and solid-phase polymerization of the resulting polymer (prepolymer). Thereby, high-molecular-weight liquid crystal polymers with high heat resistance or high strength/rigidity can be produced with good operability. Melt polymerization is also possible It is carried out in the presence of a catalyst. Examples of the catalyst include metal compounds such as magnesium acetate, tin (II) acetate, titanium tetrabutoxide, lead acetate, sodium acetate, potassium acetate, and antimony trioxide, or 4- Nitrogen-containing heterocyclic compounds such as (dimethylamino)pyridine and 1-methylimidazole are preferably nitrogen-containing heterocyclic compounds.

液晶聚合物,其流動起始溫度,較佳為250℃以上、更佳為250℃以上且350℃以下、又更佳為260℃以上且330℃以下。流動起始溫度越高,耐熱性或強度/剛性越容易提高,但太高時,對有機溶劑之溶解性容易變低、或溶液之黏度容易變高。 The flow initiation temperature of the liquid crystal polymer is preferably 250°C or higher, more preferably 250°C or higher and 350°C or lower, and still more preferably 260°C or higher and 330°C or lower. The higher the flow initiation temperature, the easier it is to improve the heat resistance or strength/rigidity, but when it is too high, the solubility to organic solvents is likely to decrease, or the viscosity of the solution is likely to increase.

再者,流動起始溫度,亦稱為流溫或流動溫度,其係使用毛細管流變計,於9.8MPa(100kgf/cm2)之荷重下,一邊以4℃/分之速度昇溫,同時使液晶聚合物熔融,於自內徑1mm及長度10mm之噴嘴擠出時,顯示4800Pa.s(48000poise)之黏度的溫度,其為作為液晶聚合物之分子量的標準者(參照小出直之編,「液晶聚合物-合成.成形.應用-」、CMC股份有限公司、1987年6月5日、p.95)。 Furthermore, the flow start temperature, also called flow temperature or flow temperature, is based on a capillary rheometer. Under a load of 9.8MPa (100kgf/cm 2 ), the temperature rises at a rate of 4°C/min while simultaneously increasing The liquid crystal polymer melts, and when extruded from a nozzle with an inner diameter of 1mm and a length of 10mm, it shows 4800Pa. The viscosity temperature of s(48000poise), which is the standard for the molecular weight of liquid crystal polymers (see Koide Naoyi, "Liquid Crystal Polymer-Synthesis, Forming, Application -", CMC Co., Ltd., June 5, 1987 Day, p.95).

本發明中,液晶聚合物層,可藉由含有如前述之液晶聚合物與溶劑的液狀組成物來形成。作為溶劑,較佳為有機溶劑,有機溶劑係適當選擇可溶解所用之液晶聚合物者來使用,具體而言係於50℃能夠以1質量%以上之濃度([液晶聚合物]/[液晶聚合物+有機溶劑])來溶解者。 In the present invention, the liquid crystal polymer layer can be formed by a liquid composition containing the aforementioned liquid crystal polymer and a solvent. The solvent is preferably an organic solvent. The organic solvent is suitably selected to dissolve the liquid crystal polymer used. Specifically, it can be used at a concentration of 1% by mass or more at 50°C ([Liquid Crystal Polymer]/[Liquid Crystal Polymer]物+Organic solvent]) to dissolve the person.

有機溶劑之例子,可列舉二氯甲烷、氯仿、1,2-二氯乙烷、1,1,2,2-四氯乙烷、o-二氯苯等之鹵化烴;p-氯酚、五氯酚、五氟酚等之鹵化酚;二乙基醚、四氫呋喃、1,4-二噁烷等之醚;丙酮、環己酮等之酮;乙酸乙酯、γ-丁內酯等之酯;碳酸伸乙酯、碳酸伸丙酯等之碳酸酯;三乙基胺等之胺;吡啶等之含氮雜環芳香族化合物;乙腈、琥珀腈等之腈;N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基吡咯啶酮等之醯胺系溶劑(分子內具有醯胺鍵之有機溶劑);四甲基脲等之脲化合物;硝基甲烷、硝基苯等之硝基化合物;二甲基亞碸、環丁碸等之硫化合物;及六甲基磷酸醯胺、三n-丁基磷酸等之磷化合物。又,亦可組合此等有機溶劑當中之2種以上的有機溶劑來使用。 Examples of organic solvents include dichloromethane, chloroform, 1,2-dichloroethane, 1,1,2,2-tetrachloroethane, o-dichlorobenzene and other halogenated hydrocarbons; p-chlorophenol, Halogenated phenols such as pentachlorophenol and pentafluorophenol; ethers such as diethyl ether, tetrahydrofuran, 1,4-dioxane, etc.; ketones such as acetone and cyclohexanone; ethyl acetate, γ-butyrolactone, etc. Esters; carbonates such as ethylene carbonate and propylene carbonate; amines such as triethylamine; nitrogen-containing heterocyclic aromatic compounds such as pyridine; nitriles such as acetonitrile and succinonitrile; N,N-dimethyl Amine-based solvents such as formamide, N,N-dimethylacetamide, and N-methylpyrrolidone (organic solvents with amide bonds in the molecule); urea compounds such as tetramethylurea; nitrate Nitro compounds such as methyl methane and nitrobenzene; sulfur compounds such as dimethyl sulfoxide and cyclobutane; and phosphorus compounds such as hexamethyl amide and tri-n-butyl phosphoric acid. In addition, two or more organic solvents among these organic solvents can also be used in combination.

作為有機溶劑,就腐蝕性低、操作容易而言,較佳為以非質子性化合物為主成分之溶劑(非質子性溶劑)、特別是以不具有鹵素原子之非質子性化合物為主成分之溶劑。作為該非質子性化合物,就容易溶解液晶聚合物而言,較佳為使用N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基吡咯啶酮等之醯胺系溶劑。又,有機溶劑全體中所佔之非質子性化合物的比例,較佳為50質量%以上且100質量%以下、更佳為70質量%以上且100質量%以下、又更佳為90質量%以上且100質量%以下。 As the organic solvent, in terms of low corrosiveness and easy handling, a solvent mainly composed of aprotic compounds (aprotic solvent) is preferred, especially a solvent mainly composed of aprotic compounds without halogen atoms. Solvent. As the aprotic compound, it is preferable to use N,N-dimethylformamide, N,N-dimethylacetamide, N-methylpyrrolidone, etc., in terms of easily dissolving the liquid crystal polymer. Amide-based solvents. In addition, the proportion of the aprotic compound in the entire organic solvent is preferably 50% by mass or more and 100% by mass or less, more preferably 70% by mass or more and 100% by mass or less, and still more preferably 90% by mass or more And 100% by mass or less.

又,作為有機溶劑,就容易溶解液晶聚合物而言,較佳為以偶極矩為3~5(單位:德拜)之化合物為 主成分的溶劑、更佳為使用上述之非質子性化合物,且偶極矩為3~5之化合物。 In addition, as an organic solvent, it is preferable to use a compound having a dipole moment of 3 to 5 (unit: Debye) in terms of easily dissolving the liquid crystal polymer As the main component solvent, it is more preferable to use the above-mentioned aprotic compound with a dipole moment of 3~5.

又,有機溶劑全體中所佔之偶極矩為3~5之化合物的比例,較佳為50質量%以上且100質量%以下、更佳為70質量%以上且100質量%以下、又更佳為90質量%以上且100質量%以下。 In addition, the proportion of the compound having a dipole moment of 3 to 5 in the entire organic solvent is preferably 50% by mass or more and 100% by mass or less, more preferably 70% by mass or more and 100% by mass or less, and still more preferably It is 90% by mass or more and 100% by mass or less.

非質子性化合物,且偶極矩為3~5之化合物,可例示二甲基亞碸(偶極矩:4.1德拜)、N,N-二甲基乙醯胺(3.7德拜)、N,N-二甲基甲醯胺(3.9德拜)、N-甲基吡咯啶酮(4.1德拜)。 Aprotic compounds and compounds with a dipole moment of 3 to 5, such as dimethyl sulfoxide (dipole moment: 4.1 Debye), N,N-dimethylacetamide (3.7 Debye), N , N-Dimethylformamide (3.9 Debye), N-Methylpyrrolidone (4.1 Debye).

又,作為有機溶劑,就容易去除而言,較佳為以於1大氣壓之沸點為220℃以下的化合物為主成分之溶劑、更佳為使用上述非質子性化合物,且於1大氣壓之沸點為220℃以下的化合物。又,有機溶劑全體中所佔之於1大氣壓之沸點為220℃以下的化合物之比例,較佳為50質量%以上且100質量%以下、更佳為70質量%以上且100質量%以下、又更佳為90質量%以上且100質量%以下。 Moreover, as an organic solvent, in terms of easy removal, it is preferably a solvent mainly composed of a compound having a boiling point of 220°C or less at 1 atm, and it is more preferable to use the above-mentioned aprotic compound, and the boiling point at 1 atm is Compounds below 220°C. In addition, the ratio of the compound having a boiling point of 220°C or less at 1 atmosphere in the total organic solvent is preferably 50% by mass or more and 100% by mass or less, more preferably 70% by mass or more and 100% by mass or less, and More preferably, it is 90% by mass or more and 100% by mass or less.

作為非質子性化合物,且於1大氣壓之沸點為220℃以下的化合物,可例示N,N-二甲基乙醯胺(沸點:160℃)、N,N-二甲基甲醯胺(沸點:153℃)、N-甲基吡咯啶酮(沸點:202℃)。 As an aprotic compound, a compound having a boiling point of 220°C or lower at 1 atmosphere pressure can be exemplified by N,N-dimethylacetamide (boiling point: 160°C), N,N-dimethylformamide (boiling point) : 153°C), N-methylpyrrolidone (boiling point: 202°C).

(液狀組成物) (Liquid composition)

液狀組成物中之液晶聚合物之含量,相對於液晶聚合物及有機溶劑之合計量而言,較佳為5質量%以上且60質量%以下、更佳為10質量%以上50質量%以下、又更佳為15質量%以上且45質量%以下,係依可得到所期望黏度之液狀組成物的方式來適當調整。 The content of the liquid crystal polymer in the liquid composition, relative to the total amount of the liquid crystal polymer and the organic solvent, is preferably 5 mass% or more and 60 mass% or less, more preferably 10 mass% or more and 50 mass% or less , It is more preferably 15% by mass or more and 45% by mass or less, and it is appropriately adjusted according to the way that a liquid composition of the desired viscosity can be obtained.

又,液狀組成物,在不損及本發明之三層薄膜之效果的範圍,亦可含有1種以上之填充材、添加劑、液晶聚合物以外之樹脂等之成分。 In addition, the liquid composition may contain one or more fillers, additives, resins other than the liquid crystal polymer, and other components within a range that does not impair the effects of the three-layer film of the present invention.

填充材之例子,可列舉二氧化矽、氧化鋁、氧化鈦、鈦酸鋇、鈦酸鍶、氫氧化鋁、碳酸鈣等之無機填充材;及調平劑、硬化環氧樹脂、交聯苯并胍胺樹脂、交聯丙烯酸樹脂等之有機填充材,其含量,相對於液晶聚合物100質量份而言,較佳為0質量份以上且100質量份以下。 Examples of fillers include inorganic fillers such as silica, alumina, titanium oxide, barium titanate, strontium titanate, aluminum hydroxide, calcium carbonate, etc.; and leveling agents, hardened epoxy resins, and cross-linked benzene The content of organic fillers such as guanamine resins and crosslinked acrylic resins is preferably 0 parts by mass or more and 100 parts by mass or less relative to 100 parts by mass of the liquid crystal polymer.

添加劑之例子,可列舉調平劑、消泡劑、抗氧化劑、紫外線吸收劑、難燃劑及著色劑,其含量,相對於液晶聚合物100質量份而言,較佳為0質量份以上且5質量份以下。 Examples of additives include leveling agents, defoamers, antioxidants, ultraviolet absorbers, flame retardants, and coloring agents. The content thereof is preferably 0 parts by mass or more relative to 100 parts by mass of the liquid crystal polymer. 5 parts by mass or less.

液晶聚合物以外之樹脂之例子,可列舉聚丙烯、聚醯胺、聚酯、聚苯硫醚、聚醚酮、聚碳酸酯、聚醚碸、聚苯醚及其改質物、聚醚醯亞胺等之液晶聚合物以外之熱可塑性樹脂;甲基丙烯酸環氧丙酯與聚乙烯之共聚物等之彈性體;及酚樹脂、環氧樹脂、氰酸酯樹脂等之熱硬化性樹脂,其含量,相對於液晶聚合物100質量份而言, 較佳為0質量份以上且20質量份以下。 Examples of resins other than liquid crystal polymers include polypropylene, polyamide, polyester, polyphenylene sulfide, polyether ketone, polycarbonate, polyether sulfide, polyphenylene ether and its modifications, and polyether sulfide Thermoplastic resins other than liquid crystal polymers such as amines; elastomers such as copolymers of glycidyl methacrylate and polyethylene; and thermosetting resins such as phenol resins, epoxy resins, and cyanate resins. Content, relative to 100 parts by mass of liquid crystal polymer, Preferably it is 0 part by mass or more and 20 parts by mass or less.

液狀組成物,可藉由將液晶聚合物、有機溶劑、及依需要使用之其他成分,一起或以適當順序混合來配製。使用填充材作為其他成分的情況時,較佳為藉由將液晶聚合物溶解於有機溶劑,得到液狀組成物後,使填充材分散於該液狀組成物中來配製。 The liquid composition can be prepared by mixing the liquid crystal polymer, organic solvent, and other components used as needed together or in an appropriate order. When a filler is used as another component, it is preferably prepared by dissolving a liquid crystal polymer in an organic solvent to obtain a liquid composition, and then dispersing the filler in the liquid composition.

本發明中,液晶聚合物層之厚度(T2),於與前述聚醯亞胺樹脂薄膜之厚度(T1)的關係中,係滿足下述式(b)。 In the present invention, the thickness (T2) of the liquid crystal polymer layer satisfies the following formula (b) in relation to the thickness (T1) of the aforementioned polyimide resin film.

(b)0.3≦T2/T1≦1.5 (b) 0.3≦T2/T1≦1.5

本發明中,「液晶聚合物層之厚度」,意指層合於聚醯亞胺樹脂薄膜之兩面的液晶聚合物層的各自之厚度。具體而言,圖1中之T2a及T2b各自係滿足上述式(b)。 In the present invention, the "thickness of the liquid crystal polymer layer" means the respective thickness of the liquid crystal polymer layer laminated on both sides of the polyimide resin film. Specifically, T2a and T2b in FIG. 1 each satisfy the above-mentioned formula (b).

此處,液晶聚合物層之厚度,係於液晶聚合物層之任意5個部位,以接觸式厚度計測定厚度而得的以平均表示之值。再者,測定液晶聚合物層之厚度時,難以直接應用接觸式厚度計時,亦可於疊合有聚醯亞胺樹脂薄膜等之其他層的狀態下,與上述同樣地測定全體之厚度,藉由取與所疊合的其他層之厚度(以與上述相同之方法所測定者)的差分來算出。 Here, the thickness of the liquid crystal polymer layer is an average value obtained by measuring the thickness with a contact thickness meter at any 5 locations of the liquid crystal polymer layer. Furthermore, when measuring the thickness of the liquid crystal polymer layer, it is difficult to directly apply the contact thickness meter. It is also possible to measure the overall thickness in the same manner as above in the state where other layers such as polyimide resin film are laminated. It is calculated by taking the difference between the thickness (measured by the same method as above) of the other layer to be laminated.

本發明中,液晶聚合物層之厚度(T2),與前述聚醯亞胺薄膜樹脂薄膜之厚度(T1)的關係較佳為0.35≦T2/T1≦1.4之範圍、特佳為0.4≦T2/T1≦1.3之範 圍。 In the present invention, the relationship between the thickness (T2) of the liquid crystal polymer layer and the thickness (T1) of the aforementioned polyimide film resin film is preferably in the range of 0.35≦T2/T1≦1.4, particularly preferably 0.4≦T2/ T1≦1.3 range Surrounding.

本發明之三層薄膜中,例如採用厚度25μm之聚醯亞胺樹脂薄膜時,液晶聚合物層之厚度,較佳為7.5μm~50μm、更佳為8μm~40μm、特佳為9μm~35μm。 In the three-layer film of the present invention, for example, when a polyimide resin film with a thickness of 25 μm is used, the thickness of the liquid crystal polymer layer is preferably 7.5 μm-50 μm, more preferably 8 μm-40 μm, particularly preferably 9 μm-35 μm.

本發明之三層薄膜中,液晶聚合物層之厚度(圖1中之T2a及T2b),係互相獨立,可為相同、亦可為相異。本發明中,較佳為相同,但只要係發揮本發明之效果,且三層薄膜不產生翹曲之範圍,則可適當調整/變更。 In the three-layer film of the present invention, the thickness of the liquid crystal polymer layer (T2a and T2b in FIG. 1) are independent of each other, and may be the same or different. In the present invention, they are preferably the same, but as long as the effects of the present invention are exerted and the three-layer film does not warp in the range, it can be adjusted/changed appropriately.

例如,聚醯亞胺樹脂薄膜具有可防止翹曲之程度的硬度時,於液晶聚合物層之厚度(圖1中之T2a及T2b)亦可具有差異。 For example, when the polyimide resin film has a degree of hardness that can prevent warpage, the thickness of the liquid crystal polymer layer (T2a and T2b in FIG. 1) may also be different.

使液晶聚合物層之厚度(圖1中之T2a及T2b)為不同者時,例如T2a之厚度與T2b之厚度的差,較佳為±10%以內、更佳為±5%以內、特佳為±3%以內。 When the thickness of the liquid crystal polymer layer (T2a and T2b in FIG. 1) is different, for example, the difference between the thickness of T2a and the thickness of T2b is preferably within ±10%, more preferably within ±5%, especially preferred Within ±3%.

液晶聚合物,係具有優良的低吸濕性、絕緣性、機械強度等,因此藉由將液晶聚合物層層合於聚醯亞胺樹脂薄膜兩面,可將具有吸濕性之聚醯亞胺樹脂薄膜的吸濕作用高度抑制。因此,即使為將使金屬層合於本發明之三層薄膜而得的印刷電路基板等放置於多濕環境時、或浸漬於水中的情況時,亦可高度抑制起因於聚醯亞胺樹脂薄膜之吸濕性的電特性劣化。 Liquid crystal polymer has excellent low hygroscopicity, insulation, mechanical strength, etc. Therefore, by laminating the liquid crystal polymer layer on both sides of the polyimide resin film, the hygroscopic polyimide can be made The moisture absorption of the resin film is highly suppressed. Therefore, even when a printed circuit board or the like obtained by laminating a metal on the three-layer film of the present invention is placed in a humid environment or immersed in water, the polyimide resin film can be highly suppressed. The electrical characteristics of the hygroscopicity are deteriorated.

又,液晶聚合物層之厚度(T2),於與聚醯亞胺樹脂薄膜之厚度(T1)的關係中,藉由成為上述特定 之上限值以下,使金屬層合於本發明之三層薄膜的情況時,可使該金屬層合體之尺寸安定性成為良好者。 In addition, the thickness (T2) of the liquid crystal polymer layer is in relation to the thickness (T1) of the polyimide resin film, by becoming the above-mentioned specific Below the upper limit, when a metal is laminated on the three-layer film of the present invention, the dimensional stability of the metal laminate can be improved.

進一步地,液晶聚合物層之厚度(T2),於與聚醯亞胺樹脂薄膜之厚度(T1)的關係中,藉由成為上述特定之下限值以上,可高度抑制聚醯亞胺樹脂薄膜之吸濕作用。因此,使金屬層合於本發明之三層薄膜的情況時,可高度展現降低該金屬層合體之傳輸損失的作用。本發明之三層薄膜,當於該三層薄膜之兩面層合金屬層時,特別地可展現高度的尺寸安定性及傳輸損失降低作用。因此,本發明之三層薄膜,較佳為使用於將金屬層層合於該三層薄膜的兩面所得到之層合體。 Furthermore, the thickness (T2) of the liquid crystal polymer layer, in relation to the thickness (T1) of the polyimide resin film, becomes higher than the above-mentioned specific lower limit, which can highly suppress the polyimide resin film The moisture absorption effect. Therefore, when a metal is laminated on the three-layer film of the present invention, the effect of reducing the transmission loss of the metal laminate can be highly exhibited. The three-layer film of the present invention, when a metal layer is laminated on both sides of the three-layer film, can particularly exhibit a high degree of dimensional stability and transmission loss reduction effects. Therefore, the three-layer film of the present invention is preferably used in a laminate obtained by laminating a metal layer on both sides of the three-layer film.

可適合地使用本發明之三層薄膜的層合體,例如如圖2所示,可列舉於本發明之三層薄膜20之兩面,層合有金屬層30a、30b者。亦即,層合體係包含金屬層30a及30b、與夾於金屬層30a及30b中的三層薄膜20。 A laminate of the three-layer film of the present invention can be suitably used. For example, as shown in FIG. 2, a metal layer 30a, 30b is laminated on both sides of the three-layer film 20 of the present invention. That is, the laminated system includes the metal layers 30a and 30b, and the three-layer film 20 sandwiched between the metal layers 30a and 30b.

作為金屬層,較佳為含有銅、鋁、銀或由此等中選擇之一種以上的金屬之合金。其中就具有更優良導電性的觀點而言,尤以銅或銅合金為佳。此外,金屬層就材料之操作容易、可簡便地形成、經濟性亦優良的觀點而言,較佳為由金屬箔所形成者、更佳為由銅箔所形成者。將金屬層設於三層薄膜之兩面時,此等金屬層之材質可為相同、亦可相異。 The metal layer is preferably an alloy containing copper, aluminum, silver, or one or more metals selected from these. Among them, copper or copper alloys are particularly preferred from the viewpoint of having better electrical conductivity. In addition, the metal layer is preferably formed of metal foil, more preferably formed of copper foil, from the viewpoints of easy material handling, simple formation, and excellent economic efficiency. When the metal layers are provided on both sides of the three-layer film, the materials of these metal layers can be the same or different.

金屬層之厚度,較佳為1~50μm、更佳為3~35μm、又 更佳為5~20μm。 The thickness of the metal layer is preferably 1~50μm, more preferably 3~35μm, and More preferably, it is 5-20 μm.

此處,金屬層之厚度,係於金屬層之任意5個部位,以接觸式厚度計測定厚度而得的以平均表示之值。再者測定金屬層之厚度時,難以直接應用接觸式厚度計時,亦可於疊合有液晶聚合物層等之其他層的狀態下,與上述同樣地測定全體之厚度,藉由取與所疊合的其他層之厚度(以與上述相同之方法所測定者)的差分來算出。 Here, the thickness of the metal layer is an average value obtained by measuring the thickness with a contact thickness meter at any 5 locations of the metal layer. Furthermore, when measuring the thickness of the metal layer, it is difficult to directly apply the contact thickness meter. It is also possible to measure the overall thickness in the same way as the above in a state where other layers such as a liquid crystal polymer layer are laminated, by taking and superimposing the thickness. Calculate the difference between the thicknesses of the other layers (measured by the same method as above).

≪三層薄膜之製造方法1≫ ≪Method of manufacturing three-layer film 1≫

本發明之第二態樣,為本發明之第一態樣之三層薄膜之製造方法,其係包含將含有溶劑與液晶聚合物之液狀組成物塗佈於聚醯亞胺樹脂薄膜上,以前述液狀組成物被覆前述聚醯亞胺樹脂薄膜之液狀組成物塗佈步驟、將前述液狀組成物中之溶劑去除之溶劑去除步驟、與加熱處理步驟的本發明之第一態樣之三層薄膜之製造方法,其中作為前述液晶聚合物,係含有來自2-羥基安息香酸或2-羥基-6-萘甲酸之構造單位、與以下之構造單位(1)~(2)。 The second aspect of the present invention is the manufacturing method of the three-layer film of the first aspect of the present invention, which includes coating a liquid composition containing a solvent and a liquid crystal polymer on a polyimide resin film, The first aspect of the present invention of the liquid composition coating step of covering the polyimide resin film with the liquid composition, the solvent removal step of removing the solvent in the liquid composition, and the heat treatment step The method for producing a three-layer film, wherein as the aforementioned liquid crystal polymer, it contains a structural unit derived from 2-hydroxybenzoic acid or 2-hydroxy-6-naphthoic acid, and the following structural units (1) to (2).

(1)-CO-Ar1-CO- (1)-CO-Ar 1 -CO-

(2)-X-Ar2-Y- (2)-X-Ar 2 -Y-

(式中,Ar1及Ar2係分別獨立地表示伸苯基、伸萘基、聯伸苯基或下述式(3)表示之基。X及Y係分別獨立地表示氧原子或亞胺基。Ar1、或Ar2表示之前述基中之氫原子,亦可各自獨立地被鹵素原子、烷基或芳基取代)。 (In the formula, Ar 1 and Ar 2 each independently represent a phenylene group, a naphthylene group, a biphenylene group or a group represented by the following formula (3). X and Y each independently represent an oxygen atom or an imine The hydrogen atom in the aforementioned group represented by Ar 1 or Ar 2 may be independently substituted with a halogen atom, an alkyl group, or an aryl group).

(3)-Ar3-Z-Ar4- (3)-Ar 3 -Z-Ar 4-

(Ar3及Ar4係分別獨立地表示伸苯基或伸萘基。Z係表示氧原子、硫原子、羰基、磺醯基或亞烷基)。 (Ar 3 and Ar 4 each independently represent a phenylene group or a naphthylene group. Z represents an oxygen atom, a sulfur atom, a carbonyl group, a sulfonyl group, or an alkylene group).

〔液狀組成物塗佈步驟〕 [Liquid composition coating step]

本發明之三層薄膜之製造方法,具有將含有溶劑與液晶聚合物之液狀組成物塗佈於聚醯亞胺樹脂薄膜上,以前述液狀組成物被覆前述聚醯亞胺樹脂薄膜之液狀組成物塗佈步驟。 The method for producing a three-layer film of the present invention includes coating a liquid composition containing a solvent and a liquid crystal polymer on a polyimide resin film, and coating the polyimide resin film with the liquid composition. -Like composition coating step.

關於含有溶劑與液晶聚合物之液狀組成物及聚醯亞胺樹脂薄膜的說明,係與前述本發明之三層薄膜中之說明相同。 The description of the liquid composition containing the solvent and the liquid crystal polymer and the polyimide resin film is the same as the description in the aforementioned three-layer film of the present invention.

將前述之液狀組成物塗佈於聚醯亞胺樹脂薄膜上之方法,可列舉例如輥塗佈法、浸漬塗佈法、噴霧塗佈法、淋幕塗佈法、狹縫式塗佈法、網版印刷法等之各種手段。塗佈時之溫度較佳為10~40℃。 The method of coating the aforementioned liquid composition on the polyimide resin film includes, for example, roll coating, dip coating, spray coating, curtain coating, and slit coating. , Screen printing and other methods. The temperature during coating is preferably 10-40°C.

本發明中,係藉由上述塗佈方法,於聚醯亞胺樹脂薄膜之兩面塗佈液狀組成物。此時,係以液晶聚合物層成為前述特定之厚度的方式,來調整液狀組成物之塗佈量。 In the present invention, the liquid composition is coated on both sides of the polyimide resin film by the above-mentioned coating method. At this time, the coating amount of the liquid composition is adjusted so that the liquid crystal polymer layer has the aforementioned specific thickness.

〔溶劑去除步驟〕 [Solvent removal step]

前述[液狀組成物塗佈步驟]之後,將前述液狀組成物中之溶劑去除。 After the aforementioned [liquid composition coating step], the solvent in the aforementioned liquid composition is removed.

此處,溶劑之去除方法並無特殊限定,較佳為藉由溶劑之蒸發來進行。使該溶劑蒸發之方法,可列舉加熱、減壓、通風等之方法,其中就生產效率、操作性之觀點而言,尤以加熱蒸發較佳、更佳為一邊通風一邊加熱使其蒸發。 Here, the method for removing the solvent is not particularly limited, and it is preferably performed by evaporation of the solvent. The method for evaporating the solvent includes heating, decompression, ventilation, etc. Among them, from the viewpoint of production efficiency and operability, heating and evaporation are particularly preferred, and it is more preferred to heat and evaporate while ventilating.

溶劑去除步驟中之加熱處理,只要依溶液組成物所應用之溶劑來適當選擇即可,只要於60~200℃加熱處理60~600秒即可、較佳為120~600秒。藉由為下限值以上,會充分去除溶劑,於所得之三層薄膜中,黏連受到抑制。 The heat treatment in the solvent removal step can be appropriately selected according to the solvent used in the solution composition, and heat treatment at 60 to 200°C for 60 to 600 seconds, preferably 120 to 600 seconds. By being above the lower limit, the solvent is sufficiently removed, and the adhesion is suppressed in the obtained three-layer film.

又,[溶劑去除步驟]中之溶劑去除不需完全,亦可於之後的[加熱處理步驟]中去除殘存溶劑。由防止液晶聚合物層之表面粗糙的觀點而言,較佳為藉由本[溶劑去除步驟]先去除溶劑。 In addition, the solvent removal in the [solvent removal step] does not need to be complete, and the remaining solvent may be removed in the subsequent [heat treatment step]. From the viewpoint of preventing the surface roughness of the liquid crystal polymer layer, it is preferable to remove the solvent first in this [solvent removal step].

〔加熱處理步驟〕 〔Steps of heating treatment〕

前述[溶劑去除步驟]之後,進行加熱處理。加熱處理可採用例如於惰性氣體環境下對三層薄膜施加熱以進行加熱之方法。加熱處理條件只要依所採用之液狀組成物來適當調整即可,例如於250℃至400℃之範圍進行1分鐘至4小時即可。 After the aforementioned [solvent removal step], heat treatment is performed. The heating treatment may be a method of applying heat to the three-layer film under an inert gas environment for heating. The heat treatment conditions may be appropriately adjusted according to the liquid composition to be used, and for example, it may be performed in the range of 250°C to 400°C for 1 minute to 4 hours.

本發明之第二態樣的三層薄膜之製造方法中,首先,於聚醯亞胺樹脂薄膜之單面塗佈液狀組成物,且將前述液狀組成物中之溶劑去除。接著,於另一面亦重 複進行該操作,最後進行加熱處理,藉此可得到本發明之第一態樣之三層薄膜。 In the method for producing a three-layer film of the second aspect of the present invention, first, a liquid composition is applied to one side of the polyimide resin film, and the solvent in the liquid composition is removed. Then, on the other side also This operation is repeated, and finally the heat treatment is performed, whereby the three-layer film of the first aspect of the present invention can be obtained.

≪三層薄膜之製造方法2≫ ≪Method for manufacturing three-layer film 2≫

本發明之第三態樣,為本發明之第一態樣之三層薄膜之製造方法,其係包含於含有溶劑與液晶聚合物之液狀組成物中含浸聚醯亞胺樹脂薄膜,以前述液狀組成物被覆前述聚醯亞胺樹脂薄膜之含浸步驟、將前述液狀組成物中之溶劑去除之溶劑去除步驟、與加熱處理步驟之製造方法,其中作為前述液晶聚合物,係含有來自2-羥基安息香酸或2-羥基-6-萘甲酸之構造單位、與以下之構造單位。 The third aspect of the present invention is the manufacturing method of the three-layer film of the first aspect of the present invention, which comprises impregnating a polyimide resin film in a liquid composition containing a solvent and a liquid crystal polymer, as described above The liquid composition is covered with the polyimide resin film impregnation step, the solvent removal step to remove the solvent in the liquid composition, and the heat treatment step. -The structural unit of hydroxybenzoic acid or 2-hydroxy-6-naphthoic acid, and the following structural units.

(1)-CO-Ar1-CO- (1)-CO-Ar 1 -CO-

(2)-X-Ar2-Y- (2)-X-Ar 2 -Y-

(式中,Ar1及Ar2係分別獨立地表示伸苯基、伸萘基、聯伸苯基或下述式(3)表示之基。X及Y係分別獨立地表示氧原子或亞胺基。Ar1、或Ar2表示之前述基中之氫原子,亦可各自獨立地被鹵素原子、烷基或芳基取代)。 (In the formula, Ar 1 and Ar 2 each independently represent a phenylene group, a naphthylene group, a biphenylene group or a group represented by the following formula (3). X and Y each independently represent an oxygen atom or an imine The hydrogen atom in the aforementioned group represented by Ar 1 or Ar 2 may be independently substituted with a halogen atom, an alkyl group, or an aryl group).

(3)-Ar3-Z-Ar4- (3)-Ar 3 -Z-Ar 4-

(Ar3及Ar4係分別獨立地表示伸苯基或伸萘基。Z係表示氧原子、硫原子、羰基、磺醯基或亞烷基)。 (Ar 3 and Ar 4 each independently represent a phenylene group or a naphthylene group. Z represents an oxygen atom, a sulfur atom, a carbonyl group, a sulfonyl group, or an alkylene group).

〔含浸步驟〕 〔Steps of impregnation〕

含浸步驟中,係於含有溶劑與液晶聚合物之液狀組成 物中含浸聚醯亞胺樹脂薄膜。含浸時間較佳為30秒至5分鐘。含浸時之溫度較佳為10~40℃。 In the impregnation step, it is a liquid composition containing solvent and liquid crystal polymer The material is impregnated with a polyimide resin film. The impregnation time is preferably 30 seconds to 5 minutes. The temperature during impregnation is preferably 10-40°C.

關於含有溶劑與液晶聚合物之液狀組成物及聚醯亞胺樹脂薄膜的說明,係與前述本發明之三層薄膜中的說明相同。 The description of the liquid composition containing the solvent and the liquid crystal polymer and the polyimide resin film is the same as the description in the aforementioned three-layer film of the present invention.

含浸步驟後,係使經含浸液狀組成物之聚醯亞胺樹脂薄膜,通過間隔較其厚度更窄的一對輥間。藉由本步驟,可去除過剩地附著於聚醯亞胺樹脂薄膜之表面的液狀組成物。 After the impregnation step, the polyimide resin film impregnated with the liquid composition is passed between a pair of rollers whose interval is narrower than its thickness. By this step, the excessive liquid composition adhering to the surface of the polyimide resin film can be removed.

圖3係用以說明使用長形之聚醯亞胺樹脂薄膜,連續地進行含浸步驟及輥通過步驟之方法的概略圖。惟,此處所示者為一例,本發明中之含浸步驟,不限定於此處所示者。 Fig. 3 is a schematic diagram for explaining a method of continuously performing an impregnation step and a roll passing step using a long polyimide resin film. However, what is shown here is an example, and the impregnation step in the present invention is not limited to what is shown here.

聚醯亞胺樹脂薄膜10,係被導引輥4及導引輥G1誘導而於箭頭方向移動,於浸漬槽3中浸漬於液狀組成物W,接著,剛含浸液狀組成物後之聚醯亞胺樹脂薄膜11,係由浸漬槽3被拉起,送至具備一對輥5A及5B之擠壓輥5。一對輥5A及5B,係對向配置為夾住前述聚醯亞胺樹脂薄膜11,此等之間隔,係被調整為至少較前述聚醯亞胺樹脂薄膜11之厚度(包含聚醯亞胺樹脂薄膜10與含浸於其之液狀組成物W的合計厚度)更窄。前述聚醯亞胺樹脂薄膜11,藉由通過如此之一對輥5A及5B間而被擠壓,去除多餘的液狀組成物,而且成為液狀組成物充分含浸於內部的液狀組成物含浸聚醯亞胺樹脂薄膜12。 After the polyimide resin film 10, guide roller guide roller train is induced to move in the G direction of arrow 1 and 4, in immersion tank immersed in a liquid composition 3 W, and then, just impregnated liquid composition The polyimide resin film 11 is pulled up from the dipping tank 3 and sent to the squeeze roll 5 provided with a pair of rolls 5A and 5B. A pair of rollers 5A and 5B are arranged oppositely to sandwich the polyimide resin film 11, and these intervals are adjusted to be at least larger than the thickness of the polyimide resin film 11 (including the polyimide resin film 11). The total thickness of the resin film 10 and the liquid composition W impregnated therein is narrower. The aforementioned polyimide resin film 11 is squeezed by passing between such a pair of rollers 5A and 5B to remove excess liquid composition and become a liquid composition that is fully impregnated inside. Polyimide resin film 12.

一對輥5A及5B,可為自我旋轉(自旋轉)者、亦可為伴隨剛含浸液狀組成物後之聚醯亞胺樹脂薄膜11的移動而旋轉者。一對輥5A及5B為自旋轉的情況時,可容易地調整液狀組成物含浸聚醯亞胺樹脂薄膜12中液狀組成物的附著量,又,作為目標之液狀組成物含浸聚醯亞胺樹脂薄膜的表面亦充分被平滑化,表面之平滑性提高。 The pair of rollers 5A and 5B may be self-rotating (self-rotating), or may be rotated following the movement of the polyimide resin film 11 immediately after being impregnated with the liquid composition. When the pair of rollers 5A and 5B are self-rotating, the adhesion amount of the liquid composition in the liquid composition-impregnated polyimide resin film 12 can be easily adjusted, and the target liquid composition is impregnated with polyamide The surface of the imine resin film is also sufficiently smoothed, and the smoothness of the surface is improved.

液晶聚合物層之膜厚,可藉由調整由浸漬槽3之拉起速度、或於擠壓輥5中,一對輥5A及5B間之間隔,而得到調整為特定之膜厚的三層薄膜。 The film thickness of the liquid crystal polymer layer can be adjusted to a specific film thickness by adjusting the pulling speed from the dipping tank 3 or the interval between the pair of rolls 5A and 5B in the squeeze roll 5 film.

關於本發明之第三態樣中之[溶劑去除步驟]及[加熱步驟]的說明,係與前述本發明之第二態樣中之說明相同。 The description of the [solvent removal step] and the [heating step] in the third aspect of the present invention is the same as the description in the aforementioned second aspect of the present invention.

具體而言,作為[溶劑去除步驟],只要將通過輥5A及5B間之前述液狀組成物含浸聚醯亞胺樹脂薄膜,於60~200℃加熱處理60~600秒即可,較佳為120~600秒。 Specifically, as the [solvent removal step], the liquid composition passing between the rolls 5A and 5B is impregnated with a polyimide resin film, and heat-treated at 60 to 200°C for 60 to 600 seconds, preferably 120~600 seconds.

藉由該加熱處理,含浸於液狀組成物含浸聚醯亞胺樹脂薄膜之液狀組成物的溶劑係蒸發而被去除,可得到目標之三層薄膜。 By this heat treatment, the solvent of the liquid composition impregnated with the polyimide resin film in the liquid composition is evaporated and removed, and the desired three-layer film can be obtained.

而作為[加熱步驟],例如只要於250℃至400℃之範圍進行1分鐘至4小時加熱處理即可。藉由如此地設定加熱處理之溫度及時間,可穩定地得到減低了孔隙之三層薄膜。 As for the [heating step], for example, the heat treatment may be performed in the range of 250°C to 400°C for 1 minute to 4 hours. By setting the temperature and time of the heat treatment in this way, a three-layer film with reduced porosity can be stably obtained.

≪三層薄膜之製造方法3≫ ≪Method for manufacturing three-layer film 3≫

本發明之第四態樣,為本發明之第一態樣之三層薄膜之製造方法,其係包含準備含有溶劑與液晶聚合物之液狀組成物、與聚醯亞胺樹脂之前驅物的聚醯胺酸樹脂液狀組成物之步驟;於支撐體上依序將前述液狀組成物、前述聚醯胺酸樹脂液狀組成物、與前述液狀組成物塗佈為三層之步驟;將前述三層之液狀組成物中的溶劑去除之溶劑去除步驟;與加熱處理步驟之製造方法,其中作為前述液晶聚合物,係含有來自2-羥基安息香酸或2-羥基-6-萘甲酸之構造單位、與以下之構造單位。 The fourth aspect of the present invention is the manufacturing method of the three-layer film of the first aspect of the present invention, which includes preparing a liquid composition containing a solvent and a liquid crystal polymer, and a polyimide resin precursor The step of polyamide acid resin liquid composition; the step of sequentially coating the aforementioned liquid composition, the aforementioned polyamide acid resin liquid composition, and the aforementioned liquid composition into three layers on the support; The solvent removal step of removing the solvent in the aforementioned three-layer liquid composition; and the manufacturing method of the heat treatment step, wherein as the aforementioned liquid crystal polymer, it contains 2-hydroxybenzoic acid or 2-hydroxy-6-naphthoic acid The structural unit and the following structural units.

(1)-CO-Ar1-CO- (1)-CO-Ar 1 -CO-

(2)-X-Ar2-Y- (2)-X-Ar 2 -Y-

(式中,Ar1及Ar2係分別獨立地表示伸苯基、伸萘基、聯伸苯基或下述式(3)表示之基。X及Y係分別獨立地表示氧原子或亞胺基。Ar1、或Ar2表示之前述基中之氫原子,亦可各自獨立地被鹵素原子、烷基或芳基取代)。 (In the formula, Ar 1 and Ar 2 each independently represent a phenylene group, a naphthylene group, a biphenylene group or a group represented by the following formula (3). X and Y each independently represent an oxygen atom or an imine The hydrogen atom in the aforementioned group represented by Ar 1 or Ar 2 may be independently substituted with a halogen atom, an alkyl group, or an aryl group).

(3)-Ar3-Z-Ar4- (3)-Ar 3 -Z-Ar 4-

(Ar3及Ar4係分別獨立地表示伸苯基或伸萘基。Z係表示氧原子、硫原子、羰基、磺醯基或亞烷基)。 (Ar 3 and Ar 4 each independently represent a phenylene group or a naphthylene group. Z represents an oxygen atom, a sulfur atom, a carbonyl group, a sulfonyl group, or an alkylene group).

〔聚醯胺酸樹脂液狀組成物〕 〔Polyamide resin liquid composition〕

聚醯亞胺樹脂,係藉由自聚醯亞胺之前驅物即聚醯胺酸進行脫水轉化反應而得到。進行該轉化反應之方法,已 知有僅以熱進行之熱硬化法、與使用化學脫水劑之化學硬化法2個方法。 Polyimide resin is obtained by dehydration conversion reaction from polyimide precursor, namely polyimide acid. The method of carrying out this conversion reaction has been Two methods are known: the thermal hardening method using only heat, and the chemical hardening method using a chemical dehydrating agent.

聚醯胺酸,例如如專利文獻1所記載般,可藉由以四羧酸二酐與二胺為原料進行聚合而得到。藉由將聚醯胺酸以200℃以上之加熱(熱硬化法)或化學閉環劑進行處理(化學硬化法),可進行脫水/環化反應,得到聚醯亞胺樹脂。 Polyamide acid can be obtained by polymerizing tetracarboxylic dianhydride and diamine as raw materials as described in Patent Document 1, for example. By heating the polyamide acid at 200°C or higher (thermal curing method) or chemical ring-closing agent (chemical curing method), dehydration/cyclization reaction can be carried out to obtain polyimide resin.

〔於支撐體上依序將含有溶劑與液晶聚合物之液狀組成物、聚醯胺酸樹脂液狀組成物、含有溶劑與液晶聚合物之液狀組成物塗佈為三層之步驟〕 [Steps of sequentially coating the liquid composition containing the solvent and the liquid crystal polymer, the polyamide resin liquid composition, and the liquid composition containing the solvent and the liquid crystal polymer on the support into three layers]

本步驟中,作為支撐體,通常係使用玻璃等,但亦可使用導體。作為該導體,可列舉金、銀、銅、鋁、鎳、不鏽鋼等之金屬板或金屬箔。 In this step, as a support, glass or the like is usually used, but a conductor may also be used. Examples of the conductor include metal plates or metal foils such as gold, silver, copper, aluminum, nickel, and stainless steel.

將含有溶劑與液晶聚合物之液狀組成物及聚醯胺酸樹脂液狀組成物於支撐體上流延之方法,係將前述含有溶劑與液晶聚合物之液狀組成物或聚醯胺酸樹脂液狀組成物,依需要以濾器等過濾,將含有溶劑與液晶聚合物之液狀組成物及聚醯胺酸樹脂液狀組成物中所含的異物去除後,於支撐體上藉由輥塗佈法、浸漬塗佈法、噴霧塗佈法、旋轉塗佈法、淋幕塗佈法、狹縫式塗佈法、網版印刷法等之各種手段,表面平滑且均勻地流延,之後,藉由去除溶劑而可得到。 The method of casting a liquid composition containing a solvent and a liquid crystal polymer and a polyamide resin liquid composition on a support is to cast the aforementioned liquid composition containing a solvent and a liquid crystal polymer or polyamide resin The liquid composition is filtered with a filter or the like as needed, and the liquid composition containing the solvent and the liquid crystal polymer and the foreign matter contained in the polyamide resin liquid composition are removed, and then applied to the support by roller coating Various methods such as cloth method, dip coating method, spray coating method, spin coating method, curtain coating method, slit coating method, screen printing method, etc., the surface is smoothly and uniformly cast, and then, It can be obtained by removing the solvent.

於支撐體上,將含有溶劑與液晶聚合物之液狀組成 物、聚醯胺酸樹脂液狀組成物、含有溶劑與液晶聚合物之液狀組成物依此順序塗佈為三層。此時,係以液晶聚合物層成為前述特定之厚度的方式,調整含有溶劑與液晶聚合物之液狀組成物的塗佈量。 On the support, the liquid composition containing solvent and liquid crystal polymer The compound, the polyamide resin liquid composition, and the liquid composition containing the solvent and the liquid crystal polymer are coated in this order into three layers. At this time, the coating amount of the liquid composition containing the solvent and the liquid crystal polymer is adjusted so that the liquid crystal polymer layer has the aforementioned specific thickness.

關於本發明之第四態樣中之[溶劑去除步驟]的說明,係與前述本發明之第二態樣中之說明相同。 The description of the [solvent removal step] in the fourth aspect of the present invention is the same as the description in the aforementioned second aspect of the present invention.

〔三層薄膜形成步驟〕 〔Steps of forming three-layer thin film〕

接著加熱處理,將支撐體剝離,可得到三層薄膜。此處,亦可藉由化學閉環劑處理,以取代加熱處理。此時之化學閉環劑,可使用由聚醯胺酸得到聚醯亞胺所使用者,例如可使用吡啶、乙酸酐、安息香酸等。加熱處理時,係於氮環境下,250~400℃之溫度範圍即可。 Then heat treatment, the support is peeled off, and a three-layer film can be obtained. Here, it is also possible to treat with a chemical ring-closing agent instead of the heat treatment. At this time, the chemical ring-closing agent can be used to obtain polyimine from polyamide acid. For example, pyridine, acetic anhydride, benzoic acid, etc. can be used. During the heat treatment, the temperature range of 250~400℃ is sufficient in a nitrogen environment.

本發明之第四態樣之三層薄膜之製造方法中,係於支撐體上,首先塗佈含有溶劑與液晶聚合物之液狀組成物,且將前述液狀組成物中之溶劑去除。接著,塗佈聚醯胺酸樹脂液狀組成物,將前述聚醯胺酸樹脂液狀組成物之溶劑去除。進一步地,塗佈含有溶劑與液晶聚合物之液狀組成物,且將前述液狀組成物中之溶劑去除。最後藉由加熱處理或化學閉環劑進行處理,由支撐體剝離,藉此可得到三層薄膜。 In the method for manufacturing a three-layer film of the fourth aspect of the present invention, a liquid composition containing a solvent and a liquid crystal polymer is first coated on the support, and the solvent in the liquid composition is removed. Next, the polyamide resin liquid composition is applied, and the solvent of the polyamide resin liquid composition is removed. Further, a liquid composition containing a solvent and a liquid crystal polymer is applied, and the solvent in the liquid composition is removed. Finally, heat treatment or chemical ring-closing agent is used to peel off the support, thereby obtaining a three-layer film.

又,本發明之第四態樣之三層薄膜之製造方法中,於支撐體上,依序塗佈含有溶劑與液晶聚合物之液狀組成物、聚醯胺酸樹脂液狀組成物及含有溶劑與液晶聚合物之 液狀組成物,且將前述液狀組成物中之溶劑去除。最後藉由加熱處理或化學閉環劑進行處理,由支撐體剝離,藉此亦可得到三層薄膜。 In addition, in the method for producing a three-layer film of the fourth aspect of the present invention, a liquid composition containing a solvent and a liquid crystal polymer, a polyamide resin liquid composition, and a liquid composition containing a solvent and a liquid crystal polymer are sequentially coated on the support. Solvent and liquid crystal polymer Liquid composition, and remove the solvent in the aforementioned liquid composition. Finally, heat treatment or chemical ring-closing agent is used to peel off the support, thereby obtaining a three-layer film.

≪層合板≫ ≪Laminates≫

本發明之第五態樣,係將由前述第二~四態樣所得到之三層薄膜作為絕緣層使用,且於該絕緣層之至少單面形成有金屬層之層合板。 The fifth aspect of the present invention uses the three-layer film obtained from the second to fourth aspects as an insulating layer, and a laminate with a metal layer formed on at least one side of the insulating layer.

本發明之層合板,只要係於前述三層薄膜之至少單面形成有金屬層即可,但較佳為於兩面層合有金屬層。亦即,層合板較佳為含有第1及第2金屬層、與夾於第1及第2金屬層之中的三層薄膜。作為於前述三層薄膜之兩面層合有金屬層的層合板,更具體而言,係圖2所示之層合體,且圖2中之30a及30b為金屬層之層合板。 The laminate of the present invention only needs to have a metal layer formed on at least one side of the aforementioned three-layer film, but it is preferable to laminate a metal layer on both sides. That is, the laminate preferably includes the first and second metal layers, and a three-layer thin film sandwiched between the first and second metal layers. As a laminate with metal layers laminated on both sides of the aforementioned three-layer film, more specifically, it is the laminate shown in FIG. 2, and 30a and 30b in FIG. 2 are laminates with metal layers.

說明層合於上述三層薄膜之金屬層。 The metal layer laminated on the above three-layer film is described.

本發明之層合板中之金屬層,係於300℃熱處理後之拉伸彈性率為60GPa以下、且斷裂點應力為150MPa以下之銅箔。關於該拉伸彈性率之下限,實用的範圍係10GPa以上、較佳為20GPa以上。關於該斷裂點應力之下限,實用的範圍較佳係20MPa以上、特佳為30MPa以上。本發明所用之金屬層的種類,係藉由電解所形成之層、藉由壓延所形成之層均可,作為上述特性之金屬層的一例,為了得到銅箔,可由本領域中眾所周知之作為High Temperature Elongation(高溫高延伸銅箔,以下略稱為 「HTE銅箔」)或壓延銅箔所市售之銅箔中,以JIS C2151規定之手法求得拉伸彈性率與斷裂點應力來選擇。 The metal layer in the laminate of the present invention is a copper foil with a tensile elastic modulus of 60 GPa or less and a breaking point stress of 150 MPa or less after heat treatment at 300°C. Regarding the lower limit of the tensile modulus, the practical range is 10 GPa or more, preferably 20 GPa or more. Regarding the lower limit of the breaking point stress, the practical range is preferably 20 MPa or more, particularly preferably 30 MPa or more. The type of metal layer used in the present invention can be a layer formed by electrolysis or a layer formed by rolling. As an example of a metal layer with the above characteristics, in order to obtain copper foil, it can be known as High Temperature Elongation (high temperature and high elongation copper foil, hereinafter referred to as "HTE copper foil") or rolled copper foil commercially available, select the tensile modulus of elasticity and breaking point stress using the method specified in JIS C2151.

本發明之層合板所用的金屬層之厚度,較佳為超過5μm且35μm以下之範圍。特佳為9~28μm之範圍。金屬層之厚度為上述範圍時,於層合板之製造時,金屬層之張力調整容易,且所得層合板之彎曲性更加提高,故較佳。 The thickness of the metal layer used in the laminate of the present invention is preferably in the range of more than 5 μm and 35 μm or less. Particularly preferred is the range of 9-28μm. When the thickness of the metal layer is in the above range, the tension of the metal layer is easy to adjust during the manufacture of the laminate, and the flexibility of the obtained laminate is improved, which is preferable.

此處,金屬層之厚度,係於金屬層之任意5個部位,以接觸式厚度計測定厚度而得的以平均表示之值。再者測定金屬層之厚度時,難以直接應用接觸式厚度計時,亦可於疊合有三層薄膜等其他層之狀態下,與上述同樣地測定全體之厚度,藉由取與所疊合的其他層之厚度(以與上述相同之方法所測定者)的差分來算出。 Here, the thickness of the metal layer is an average value obtained by measuring the thickness with a contact thickness meter at any 5 locations of the metal layer. In addition, when measuring the thickness of the metal layer, it is difficult to directly apply the contact thickness meter. It is also possible to measure the overall thickness in the same way as the above in the state where three layers of films are superimposed. It is calculated by the difference of the thickness of the layer (measured by the same method as above).

又,層合板中之金屬層的最大高度(Rz),較佳為0.5~2.5μm之範圍內、更佳為0.6~2.4μm之範圍內、特佳為0.6~2.2μm之範圍內。 In addition, the maximum height (Rz) of the metal layer in the laminate is preferably in the range of 0.5 to 2.5 μm, more preferably in the range of 0.6 to 2.4 μm, particularly preferably in the range of 0.6 to 2.2 μm.

具體例示作為本發明所應用之金屬層的較佳者時,較佳為銅箔,其中作為HTE銅箔尤可列舉例如SQ-HTE銅箔(三井金屬礦業公司製)、3EC-M3S-HTE銅箔(三井金屬礦業公司製)、NS-HTE銅箔(三井金屬礦業公司製)、3EC-HTE銅箔(三井金屬礦業公司製)、F2-WS銅箔(古河電工公司製)、HLB(日本電解公司製)、CF-T4X-DS-SVR(福田金屬箔粉公司製)等;作為壓延銅箔可列舉例如RCF-T5B-HPC(福田金屬箔粉公司製)、 BHY-22B-T(JX日礦日石金屬公司製)、BHY-22B-HA(JX日礦日石金屬公司製)、BHYA-T(JX日礦日石金屬公司製)、BHYA-HA(JX日礦日石金屬公司製)等。此等銅箔可容易地由市場獲得。 Specifically exemplified as the preferred metal layer to which the present invention is applied, copper foil is preferred. Among them, as HTE copper foil, SQ-HTE copper foil (manufactured by Mitsui Mining & Mining Co., Ltd.), 3EC-M3S-HTE copper Foil (manufactured by Mitsui Metal Mining Co., Ltd.), NS-HTE copper foil (manufactured by Mitsui Metal Mining Co., Ltd.), 3EC-HTE copper foil (manufactured by Mitsui Mining Co., Ltd.), F2-WS copper foil (manufactured by Furukawa Electric Co., Ltd.), HLB (Japan) Electrolysis company), CF-T4X-DS-SVR (Fukuda Metal Foil Powder Co., Ltd.), etc.; as rolled copper foil, for example, RCF-T5B-HPC (Fukuda Metal Foil Powder Co., Ltd.), BHY-22B-T (manufactured by JX Nippon Oil & Metal Co., Ltd.), BHY-22B-HA (manufactured by JX Nippon Oil & Metal Co., Ltd.), BHYA-T (manufactured by JX Nippon Oil & Metal Co., Ltd.), BHYA-HA ( JX Nippon Steel Co., Ltd.), etc. These copper foils are easily available on the market.

藉由使用具有上述特性之銅箔於本發明之層合板,可實現金屬層與樹脂層之密合性優,柔軟性及耐折性亦良好之層合板。 By using the copper foil with the above-mentioned characteristics in the laminate of the present invention, a laminate with excellent adhesion between the metal layer and the resin layer, flexibility and folding resistance can be realized.

作為使前述三層薄膜與金屬層一體化之方法,可適合使用將金屬層與三層薄膜熱壓合之方法。例如,可列舉使用常用之壓合機,於200~350℃、3~10MPa之壓力,保持10分鐘~60分鐘來進行熱壓合之方法。 As a method of integrating the aforementioned three-layer film and the metal layer, a method of thermally pressing the metal layer and the three-layer film can be suitably used. For example, a commonly used pressing machine can be used for heat pressing at 200-350°C and a pressure of 3-10 MPa and holding for 10 minutes to 60 minutes.

如此方式所得之本發明之液晶聚合物層合板,由於尺寸安定性、低吸濕性等之優良特性,可適合使用於藉由近年來受注目之增層工法等所得到之半導體封裝或母板用之多層印刷基板、可撓式印刷配線基板、捲帶式自動接合(tape-automated bonding)用薄膜等。 The liquid crystal polymer laminate of the present invention obtained in this way, due to its excellent characteristics such as dimensional stability, low moisture absorption, etc., can be suitably used for semiconductor packages or motherboards obtained by the build-up method that has attracted attention in recent years. Multilayer printed circuit boards, flexible printed circuit boards, tape-automated bonding films, etc. are used.

<印刷電路基板> <Printed Circuit Board>

本發明之第六態樣,係使用前述三層薄膜作為絕緣層之印刷電路基板。本發明之印刷電路基板,除了使用前述三層薄膜作為絕緣層以外,可為與公知之印刷電路基板相同之構成,可以同樣方法製造。亦即,印刷電路基板,係包含含有三層薄膜之絕緣層、與位於前述三層薄膜上之電路圖型。換言之,印刷電路基板,係包含含有至少一個三 層薄膜之絕緣層、與形成於絕緣層之至少第1面與第2面之一方的電路圖型。絕緣層可由一個三層薄膜構成、亦可層合複數個三層薄膜。電路圖型可僅位於第1面,亦可為第1電路圖型位於第1面、第2電路圖型位於第2面。 The sixth aspect of the present invention is a printed circuit board using the aforementioned three-layer film as an insulating layer. The printed circuit board of the present invention may have the same structure as a known printed circuit board, except that the aforementioned three-layer film is used as an insulating layer, and can be manufactured in the same way. That is, the printed circuit board includes an insulating layer containing three-layer films and a circuit pattern on the three-layer film. In other words, the printed circuit board contains at least one three An insulating layer of a thin film and a circuit pattern formed on at least one of the first surface and the second surface of the insulating layer. The insulating layer can be composed of one three-layer film, or a plurality of three-layer films can be laminated. The circuit pattern may be located only on the first surface, or the first circuit pattern may be located on the first surface and the second circuit pattern may be located on the second surface.

本發明之印刷電路基板,可藉由例如製作於由一枚前述三層薄膜所形成之絕緣層、或層合複數枚前述三層薄膜而成之絕緣層的單面或兩面設置有金屬層的層合體,對該層合體之金屬層藉由蝕刻等而形成特定之電路圖型,且直接以該形成有電路圖型的層合體、或依需要層合二枚以上來製造。本發明之印刷電路基板,較佳為於三層薄膜之兩面層合有金屬層者。換言之,印刷電路基板,較佳為包含三層薄膜、位於三層薄膜之第1面的第1電路圖型、與位於三層薄膜之第2面的第2電路圖型。 The printed circuit board of the present invention can be fabricated by, for example, a metal layer provided on one or both sides of an insulating layer formed by one of the foregoing three-layer films, or an insulating layer formed by laminating a plurality of the foregoing three-layer films. The laminate is formed by etching the metal layer of the laminate to form a specific circuit pattern, and is directly manufactured with the laminate with the circuit pattern formed, or by laminating two or more sheets as required. The printed circuit board of the present invention preferably has a metal layer laminated on both sides of a three-layer film. In other words, the printed circuit board preferably includes a three-layer film, a first circuit pattern on the first surface of the three-layer film, and a second circuit pattern on the second surface of the three-layer film.

層合有複數枚之前述三層薄膜的絕緣層之情況時,此等複數枚之三層薄膜可全部相同、可僅一部分相同、亦可全部相異。又,其枚數只要為2枚以上則無特殊限定。如此之絕緣層可藉由例如將複數枚之三層薄膜於其厚度方向疊合,並加熱壓合使其互相熔合而一體化來製作。 In the case of laminating a plurality of insulating layers of the aforementioned three-layer film, the plurality of three-layer films may be all the same, only a part may be the same, or all of them may be different. In addition, the number of pieces is not particularly limited as long as it is two or more pieces. Such an insulating layer can be integrated by, for example, stacking a plurality of three-layer films in the thickness direction, heating and pressing them to fuse them together.

金屬層之材質,較佳為包含銅、鋁、銀或由此等中選擇之一種以上的金屬之合金。其中就具有更優良之導電性的觀點而言,尤佳為銅或銅合金。此外,金屬層就材料之操作容易、可簡便地形成、經濟性亦優良的觀點而言,較佳為由金屬箔形成者;更佳為由銅箔形成者。將 金屬層設於絕緣層之兩面時,此等金屬層之材質可為相同、亦可為相異。 The material of the metal layer is preferably an alloy containing copper, aluminum, silver, or one or more metals selected from these. Among them, copper or copper alloys are particularly preferred from the viewpoint of having better electrical conductivity. In addition, the metal layer is preferably formed of metal foil, and more preferably formed of copper foil, from the viewpoints of easy material handling, simple formation, and excellent economic efficiency. will When the metal layers are provided on both sides of the insulating layer, the materials of these metal layers can be the same or different.

金屬層之厚度,較佳為1~50μm、更佳為3~35μm、又更佳為5~20μm。 The thickness of the metal layer is preferably 1 to 50 μm, more preferably 3 to 35 μm, and still more preferably 5 to 20 μm.

此處,金屬層之厚度,係於金屬層之任意5個部位,以接觸式厚度計測定厚度而得的以平均表示之值。再者測定金屬層之厚度時,難以直接應用接觸式厚度計時,亦可於疊合有三層薄膜等其他層之狀態下,與上述同樣地測定全體之厚度,藉由取與所疊合的其他層之厚度(以與上述相同之方法所測定者)的差分來算出。 Here, the thickness of the metal layer is an average value obtained by measuring the thickness with a contact thickness meter at any 5 locations of the metal layer. In addition, when measuring the thickness of the metal layer, it is difficult to directly apply the contact thickness meter. It is also possible to measure the overall thickness in the same way as the above in the state where three layers of films are superimposed. It is calculated by the difference of the thickness of the layer (measured by the same method as above).

設置金屬層之方法,可例示使金屬箔熔合於絕緣層表面之方法、以接著劑將金屬箔接著於絕緣層表面之方法、將絕緣層表面藉由鍍敷法、網版印刷法或濺鍍法,以金屬粉或金屬粒子予以被覆之方法。 The method of providing the metal layer can exemplify the method of fusing the metal foil to the surface of the insulating layer, the method of bonding the metal foil to the surface of the insulating layer with an adhesive, and the method of plating the surface of the insulating layer by plating, screen printing or sputtering. Method, the method of coating with metal powder or metal particles.

絕緣層為層合複數枚之前述三層薄膜而成的情況時,可藉由將此等三層薄膜於其厚度方向重疊配置,於位於最外側之一方或兩方的三層薄膜表面,進一步重疊金屬箔,且將此等金屬箔及複數枚之三層薄膜予以加熱壓合,而於形成絕緣層時,於絕緣層之單面或兩面亦同時設置金屬層。 When the insulating layer is formed by laminating a plurality of the aforementioned three-layer films, these three-layer films can be arranged overlapping in the thickness direction on the surface of the three-layer film located on one or both of the outermost sides, and further Overlap the metal foils, and heat and press these metal foils and a plurality of three-layer films, and when forming the insulating layer, a metal layer is also provided on one or both sides of the insulating layer at the same time.

藉由使金屬層圖型化來形成電路圖型。作為形成電路圖型之方法,可例示蝕刻等。關於蝕刻(加工)簡單進行說明。首先,以該金屬層成為特定之電路圖型的方式,進行該金屬層之遮蔽,於經遮蔽之金屬層的部分與 未經遮蔽之金屬層的部分,可藉由將後者之金屬層部分藉由稱為濕式法(藥劑處理)的蝕刻加工予以去除來實施。該蝕刻加工所用之藥劑,可列舉例如氯化鐵(III)水溶液。又,作為該遮蔽,只要使用市售之蝕刻阻劑或乾膜即可。 The circuit pattern is formed by patterning the metal layer. As a method of forming a circuit pattern, etching or the like can be exemplified. The etching (processing) will be briefly described. First, perform the shielding of the metal layer in such a way that the metal layer becomes a specific circuit pattern. The part of the metal layer that is not shielded can be implemented by removing the latter part of the metal layer by an etching process called a wet method (medicament treatment). The agent used in the etching process includes, for example, an aqueous solution of iron (III) chloride. In addition, as the mask, it is sufficient to use a commercially available etching resist or dry film.

接著,由經遮蔽之金屬層部分,以丙酮或氫氧化鈉水溶液去除蝕刻阻劑或乾膜。藉由如此方式地將金屬層圖型化,可形成特定之電路圖型(配線)。 Then, from the masked metal layer part, the etching resist or dry film is removed with acetone or sodium hydroxide aqueous solution. By patterning the metal layer in this way, a specific circuit pattern (wiring) can be formed.

〔實施例〕 [Example]

以下,使用實施例以更具體說明本發明,但本發明不受實施例限定。 Hereinafter, examples are used to describe the present invention more specifically, but the present invention is not limited by the examples.

<製造例1> <Manufacturing Example 1>

於具備攪拌裝置、扭矩計、氮氣導入管、溫度計及回流冷卻器之反應器中,饋入2-羥基-6-萘甲酸(以下記載為「HNA」)677.4g(3.6莫耳)、4-羥基乙醯苯胺(以下記載為「APAP」)332.6g(2.2莫耳)、間苯二甲酸(以下記載為「IPA」)99.7g(0.6莫耳)、二苯基醚-4,4’-二羧酸(以下記載為「DEDA」)413.2g(1.6莫耳)、及乙酸酐673.8g(6.6莫耳)。 In a reactor equipped with a stirring device, a torque meter, a nitrogen introduction tube, a thermometer, and a reflux cooler, 677.4 g (3.6 mol) of 2-hydroxy-6-naphthoic acid (hereinafter referred to as "HNA"), 4- Hydroxyacetaniline (hereinafter referred to as "APAP") 332.6 g (2.2 mol), isophthalic acid (hereinafter referred to as "IPA") 99.7 g (0.6 mol), diphenyl ether-4,4'- 413.2 g (1.6 mol) of dicarboxylic acid (hereinafter referred to as "DEDA") and 673.8 g (6.6 mol) of acetic anhydride.

將反應器內以氮氣充分取代後,於氮氣氣流下花費15分鐘昇溫至150℃,保持溫度回流3小時。 After fully replacing the inside of the reactor with nitrogen, the temperature was raised to 150°C in 15 minutes under a nitrogen stream, and the temperature was kept at reflux for 3 hours.

之後,一邊將餾出之副生乙酸及未反應之乙酸酐予以 餾去,並且花費170分鐘昇溫至320℃,將觀察到扭矩上昇的時間點視為反應結束,取出內容物。將所得之固體成分冷卻至室溫,以粗粉碎機粉碎後,使用偏光顯微鏡(NIKON公司製ECLIPSE LV100POV)進行觀察,藉此確認到於230℃顯示液晶相特有之紋影(schlieren)圖案。進一步地,將粉末狀之液晶聚合物於氮環境下250℃保持3小時,以固相進行聚合反應。將所得之液晶聚合物粉末100g加入N-甲基-2-吡咯啶酮900g,加熱至120℃以完全溶解,得到褐色透明之液晶聚合物溶液組成物(1)。 After that, while distilling out by-product acetic acid and unreacted acetic anhydride It was distilled off, and the temperature was raised to 320° C. in 170 minutes. The time when the torque increase was observed was regarded as the end of the reaction, and the contents were taken out. The obtained solid content was cooled to room temperature, pulverized with a coarse pulverizer, and observed with a polarizing microscope (ECLIPSE LV100POV manufactured by NIKON) to confirm that the schlieren pattern specific to the liquid crystal phase was displayed at 230°C. Further, the powdered liquid crystal polymer was maintained at 250° C. for 3 hours in a nitrogen environment, and the polymerization reaction was carried out in the solid phase. 100 g of the obtained liquid crystal polymer powder was added to 900 g of N-methyl-2-pyrrolidone, and heated to 120° C. for complete dissolution to obtain a brown transparent liquid crystal polymer solution composition (1).

<製造例2> <Manufacturing Example 2>

於具備攪拌裝置、扭矩計、氮氣導入管、溫度計及回流冷卻器之反應器中,饋入4-羥基乙醯苯胺(以下記載為「APAP」)332.6g(2.2莫耳)、間苯二甲酸(以下記載為「IPA」)99.7g(0.6莫耳)、二苯基醚-4,4’-二羧酸(以下記載為「DEDA」)413.2g(1.6莫耳)及乙酸酐269.5(2.6莫耳)。將反應器內以氮氣充分取代後,於氮氣氣流下花費15分鐘昇溫至150℃,保持溫度回流3小時。 In a reactor equipped with a stirring device, a torque meter, a nitrogen inlet pipe, a thermometer, and a reflux cooler, 332.6 g (2.2 mol) of 4-hydroxyacetaniline (hereinafter referred to as "APAP"), isophthalic acid are fed (Hereinafter referred to as "IPA") 99.7g (0.6 mol), diphenyl ether-4,4'-dicarboxylic acid (hereinafter referred to as "DEDA") 413.2g (1.6 mol), and acetic anhydride 269.5 (2.6 Mol). After fully replacing the inside of the reactor with nitrogen, the temperature was raised to 150°C in 15 minutes under a nitrogen stream, and the temperature was kept at reflux for 3 hours.

之後,一邊將餾出之副生乙酸及未反應之乙酸酐予以餾去,並且花費170分鐘昇溫至320℃,將觀察到扭矩上昇的時間點視為反應結束,取出內容物。將所得之固體成分冷卻至室溫,以粗粉碎機粉碎後,一邊由室溫昇溫至 400℃,並且實施偏光顯微鏡觀察,但無法觀察到液晶相特有之紋影圖案。 After that, while distilling off the distilled byproduct acetic acid and unreacted acetic anhydride, the temperature was raised to 320°C in 170 minutes. The time when the torque increase was observed was regarded as the end of the reaction, and the contents were taken out. The solid content obtained was cooled to room temperature, and after being pulverized with a coarse pulverizer, the temperature was raised from room temperature to 400°C and observation with a polarizing microscope, but the schlieren pattern peculiar to the liquid crystal phase could not be observed.

〔實施例1〕 [Example 1]

使用薄膜塗抹器(塗佈厚度100μm)於市售之聚醯亞胺樹脂薄膜的膜厚25μm之Kapton H(東麗杜邦公司製)之上單面塗佈液晶聚合物溶液組成物(1),以熱風乾燥機於100℃加熱去除溶劑,於另一面亦重複進行該操作,以高溫熱風乾燥機於300℃加熱處理,得到三層薄膜(液晶聚合物/聚醯亞胺/液晶聚合物=10μm/25μm/10μm)。 A film applicator (coating thickness 100μm) was used to apply the liquid crystal polymer solution composition (1) on one side of a commercially available polyimide resin film with a film thickness of 25μm Kapton H (manufactured by Toray DuPont), Heat with a hot air dryer at 100°C to remove the solvent, repeat the operation on the other side, heat treatment with a high temperature hot air dryer at 300°C to obtain a three-layer film (liquid crystal polymer/polyimide/liquid crystal polymer=10μm /25μm/10μm).

將上述中得到之三層薄膜作為絕緣層,於其兩面層合銅箔(JX日礦日石金屬(股)製之「BHY-22B-T」(厚度18μm、Rz=0.7μm))。將其藉由高溫真空壓合機(北川精機(股)製之「KVHC-PRESS」、縱300mm、橫300mm),以溫度340℃、壓力5MPa之條件熱壓合20分鐘使其一體化,藉以得到兩面覆銅層合板。 The three-layer film obtained above was used as an insulating layer, and copper foil (“BHY-22B-T” (thickness 18μm, Rz=0.7μm) manufactured by JX Nippon Oil & Metal Co., Ltd. was laminated on both sides of the film. It is integrated with a high-temperature vacuum press machine ("KVHC-PRESS" manufactured by Kitagawa Seiki Co., Ltd., 300mm in length and 300mm in width) at a temperature of 340°C and a pressure of 5MPa for 20 minutes. Obtain a copper-clad laminate on both sides.

對於上述中得到之兩面覆銅層合板,進行TDR測定,以成為50Ω的方式製作印刷電路基板之結果,形成具有地線層之配線寬110μm、長度100mm之電路圖型。 The double-sided copper-clad laminate obtained above was measured by TDR, and a printed circuit board was fabricated so as to become 50Ω. As a result, a circuit pattern with a wiring layer with a ground layer having a wiring width of 110 μm and a length of 100 mm was formed.

<傳輸損失測定> <Measurement of Transmission Loss>

對於形成有電路圖型之印刷電路圖型,使用Agilent Technologies(股)製之測定探針「E8363B」來測定傳輸 損失(S21參數)。於23℃、48小時對水之浸漬前後,測定於頻率5GHz、10GHz、20GHz、40GHz之傳輸損失。 For printed circuit patterns formed with circuit patterns, use the measuring probe "E8363B" manufactured by Agilent Technologies to measure transmission Loss (S21 parameter). Before and after immersion in water at 23°C for 48 hours, the transmission loss at frequencies of 5 GHz, 10 GHz, 20 GHz, and 40 GHz was measured.

對水之浸漬前的於5GHz、10GHz、20GHz、40GHz之傳輸損失示於表3、4。又,23℃×48h浸漬前後之傳輸損失(頻率5GHz)的變化率示於表3、4。 The transmission losses at 5 GHz, 10 GHz, 20 GHz, and 40 GHz before immersion in water are shown in Tables 3 and 4. In addition, the rate of change of transmission loss (frequency 5GHz) before and after immersion at 23°C×48h is shown in Tables 3 and 4.

<尺寸安定性評估> <Dimensional stability evaluation>

使用氯化鐵(III)溶液(木田公司製、40°玻美),由兩面覆銅層合板將銅箔完全去除,根據JIS C6481「印刷配線板用覆銅層合板試驗方法」,使用熱機械分析裝置(Rigaku公司製「Thermo plus TMA8310」),一邊對20mm×50mm之試驗片(絕緣層)施加2.5g之荷重,並且測定於氮氣流下,以5℃/分昇溫至250℃時之面內的熱膨脹係數(溫度範圍50~250℃:1St掃描)。其結果示於表1及2。 Using iron (III) chloride solution (manufactured by Kida Co., 40°Bome), the copper foil is completely removed from the double-sided copper-clad laminate. According to JIS C6481 "Testing methods for copper-clad laminates for printed wiring boards", thermomechanical is used An analysis device ("Thermo plus TMA8310" manufactured by Rigaku Corporation), while applying a load of 2.5 g to a test piece (insulating layer) of 20 mm × 50 mm, and measuring the inside surface when the temperature is raised to 250°C at 5°C/min under a nitrogen flow The coefficient of thermal expansion (temperature range 50~250℃: 1St scan). The results are shown in Tables 1 and 2.

〔實施例2〕 [Example 2]

除了於實施例1中將薄膜塗抹器之塗佈厚度變更為200μm而得到三層薄膜(液晶聚合物/聚醯亞胺/液晶聚合物=20μm/25μm/20μm)以外,係進行同樣的操作,製作覆銅層合板。對於所得到之覆銅層合板,進行TDR測定,以成為50Ω的方式製作印刷電路基板之結果,配線寬成為142μm、長度成為100mm。 Except that the coating thickness of the film applicator was changed to 200μm in Example 1 to obtain a three-layer film (liquid crystal polymer/polyimide/liquid crystal polymer=20μm/25μm/20μm), the same operation was performed. Production of copper clad laminates. The obtained copper clad laminate was measured by TDR, and a printed circuit board was produced so as to be 50 Ω. As a result, the wiring width was 142 μm and the length was 100 mm.

〔實施例3〕 [Example 3]

除了於實施例1中使用市售之聚醯亞胺樹脂薄膜的膜厚25μm之U-PILEX S(宇部興產公司製)以外,係進行同樣的操作,製作覆銅層合板。對於所得到之覆銅層合板,進行TDR測定,以成為50Ω的方式製作印刷電路基板之結果,配線寬為110μm、長度為100mm。 Except for using a commercially available polyimide resin film with a film thickness of 25 μm U-PILEX S (manufactured by Ube Industries Co., Ltd.) in Example 1, the same operation was performed to produce a copper-clad laminate. The obtained copper clad laminate was measured by TDR, and a printed circuit board was produced so as to become 50 Ω. As a result, the wiring width was 110 μm and the length was 100 mm.

〔實施例4〕 [Example 4]

除了於實施例1中,層合銅箔(古河電工(股)製之「F2-WS」(厚度18μm、Rz=2.1μm))以外,係進行同樣的操作,製作覆銅層合板。對於所得到之覆銅層合板,進行TDR測定,以成為50Ω的方式製作印刷電路基板之結果,配線寬成為110μm、長度成為100mm。 Except for laminating copper foil ("F2-WS" (thickness 18 μm, Rz=2.1 μm) manufactured by Furukawa Electric Co., Ltd.) in Example 1, the same operation was performed to produce a copper-clad laminate. The obtained copper clad laminate was measured by TDR, and a printed circuit board was produced so as to be 50 Ω. As a result, the wiring width was 110 μm and the length was 100 mm.

〔實施例5〕 [Example 5]

除了於實施例1中將薄膜塗抹器之塗佈厚度變更為250μm而得到三層薄膜(液晶聚合物/聚醯亞胺/液晶聚合物=25μm/25μm/25μm)以外,係進行同樣的操作,製作覆銅層合板。 Except that the coating thickness of the film applicator was changed to 250μm in Example 1 to obtain a three-layer film (liquid crystal polymer/polyimide/liquid crystal polymer=25μm/25μm/25μm), the same operation was performed. Production of copper clad laminates.

〔實施例6〕 [Example 6]

除了於實施例1中將薄膜塗抹器之塗佈厚度變更為335μm而得到三層薄膜(液晶聚合物/聚醯亞胺/液晶聚合 物=33.5μm/25μm/33.5μm)以外,係進行同樣的操作,製作覆銅層合板。 Except that in Example 1, the coating thickness of the film applicator was changed to 335μm to obtain a three-layer film (liquid crystal polymer/polyimide/liquid crystal polymer Except for the object = 33.5μm/25μm/33.5μm), the same operation was performed to produce a copper-clad laminate.

〔比較例1〕 [Comparative Example 1]

除了於實施例1中將薄膜塗抹器之塗佈厚度變更為50μm而得到三層薄膜(液晶聚合物/聚醯亞胺/液晶聚合物=5μm/25μm/5μm)以外,係進行同樣的操作,製作覆銅層合板。對於所得到之覆銅層合板,進行TDR測定,以成為50Ω的方式製作印刷電路基板之結果,配線寬成為95μm、長度成為100mm。得知水浸漬前後之傳輸損失的變化大到23%。 Except that the coating thickness of the film applicator was changed to 50μm in Example 1 to obtain a three-layer film (liquid crystal polymer/polyimide/liquid crystal polymer=5μm/25μm/5μm), the same operation was performed, Production of copper clad laminates. The obtained copper-clad laminate was measured by TDR and a printed circuit board was produced so as to be 50 Ω. As a result, the wiring width was 95 μm and the length was 100 mm. It is known that the change in transmission loss before and after water immersion is as large as 23%.

〔比較例2〕 [Comparative Example 2]

利用使用了市售之聚醯亞胺樹脂薄膜的覆銅層合板Espanex-MB(新日鐵住金化學公司製、聚醯亞胺膜厚50μm)進行TDR測定,以成為50Ω的方式製作印刷電路基板之結果,配線寬成為110μm、長度成為100mm。 TDR measurement was performed using a copper-clad laminate Espanex-MB (manufactured by Nippon Steel & Sumikin Chemical Co., Ltd., polyimide film thickness: 50μm) using a commercially available polyimide resin film, and a printed circuit board was produced so that it became 50Ω As a result, the wiring width became 110 μm and the length became 100 mm.

接著對於模式樣品,使用Agilent Technologies(股)製之測定探針「E8363B」,測定印刷電路基板之傳輸損失(S21參數)。 Next, for the model sample, the measurement probe "E8363B" manufactured by Agilent Technologies was used to measure the transmission loss of the printed circuit board (S21 parameter).

得知水浸漬前後之傳輸損失的變化大到35%。 It is known that the change in transmission loss before and after water immersion is as large as 35%.

〔比較例3〕 [Comparative Example 3]

於銅箔(JX日礦日石金屬(股)製之「BHY-22B- T」(厚度18μm、Rz=0.7μm))之上使用薄膜塗抹器(塗佈厚度500μm)單面塗佈液晶聚合物溶液組成物(1),使用熱風乾燥機於100℃加熱去除溶劑,以高溫熱風乾燥機於300℃加熱處理,得到單面覆銅層合板(50μm)。 In the copper foil (JX Nippon Steel Nippon Steel Co., Ltd.) production of ``BHY-22B- T" (thickness 18μm, Rz=0.7μm)) was used to coat the liquid crystal polymer solution composition (1) on one side with a film applicator (coat thickness 500μm), and heated at 100°C using a hot air dryer to remove the solvent. The high-temperature hot-air dryer heat-processed at 300°C to obtain a single-sided copper-clad laminate (50 μm).

於上述中得到之單面覆銅層合板之液晶聚合物上進一步層合銅箔(JX日礦日石金屬(股)製之「BHY-22B-T」(厚度18μm、Rz=0.7μm)),藉由高溫真空壓合機(北川精機(股)製之「KVHC-PRESS」、縱300mm、橫300mm),於溫度340℃、壓力5MPa之條件熱壓合20分鐘使其一體化,藉以得到兩面覆銅層合板。 A copper foil is further laminated on the liquid crystal polymer of the single-sided copper clad laminate obtained above ("BHY-22B-T" (thickness 18μm, Rz=0.7μm) manufactured by JX Nippon Oil & Metal Co., Ltd.) , By using a high-temperature vacuum press machine ("KVHC-PRESS" manufactured by Kitagawa Seiki Co., Ltd., 300mm in length and 300mm in width), it is integrated by hot pressing at a temperature of 340℃ and a pressure of 5MPa for 20 minutes to obtain Copper clad laminate on both sides.

使用氯化鐵(III)溶液(木田公司製、40°玻美),由兩面覆銅層合板將銅箔完全去除,根據JIS C6481「印刷配線用覆銅層合板試驗方法」,使用熱機械分析裝置(Rigaku公司製「Thermo plus TMA8310」),一邊對20mm×50mm之試驗片(絕緣層)施加2.5g之荷重,並且測定在氮氣流下,以5℃/分昇溫至250℃時之面內的熱膨脹係數(溫度範圍50~250℃、1St掃描)。相較於三層薄膜,可知大幅膨脹,尺寸變化大。 Using iron (III) chloride solution (manufactured by Kida Co., 40° Bomei), the copper foil is completely removed from the double-sided copper-clad laminate. According to JIS C6481 "Testing methods for copper-clad laminates for printed wiring", thermomechanical analysis is used Device ("Thermo plus TMA8310" manufactured by Rigaku Corporation), while applying a load of 2.5 g to a test piece (insulating layer) of 20 mm × 50 mm, and measuring the in-plane temperature at 5°C/min when heated to 250°C under a nitrogen stream Coefficient of thermal expansion (temperature range 50~250℃, 1St scan). Compared with the three-layer film, it can be seen that it expands greatly and the size changes greatly.

〔比較例4〕 [Comparative Example 4]

將市售之液晶聚合物薄膜(Kuraray公司製Bextor 50μm)作為絕緣層,於其兩面層合銅箔(JX日礦日石金屬(股)製之「BHY-22B-T」(厚度18μm、 Rz=0.7μm))。將其藉由高溫真空壓合機(北川精機(股)製之「KVHC-PRESS」、縱300mm、橫300mm),於溫度340℃、壓力5MPa之條件熱壓合20分鐘使其一體化,藉以得到兩面覆銅層合板。 A commercially available liquid crystal polymer film (Bextor 50μm manufactured by Kuraray) was used as an insulating layer, and copper foil (“BHY-22B-T” (thickness 18μm, 18μm, thickness 18μm, manufactured by JX Nippon Oil & Metal Co., Ltd.) was laminated on both sides of the copper foil. Rz=0.7μm)). It is integrated with a high-temperature vacuum press machine ("KVHC-PRESS" manufactured by Kitagawa Seiki Co., Ltd., 300mm in length and 300mm in width) at a temperature of 340°C and a pressure of 5MPa for 20 minutes. Obtain a copper-clad laminate on both sides.

使用氯化鐵(III)溶液(木田公司製、40°玻美),由兩面覆銅層合板將銅箔完全去除,根據JIS C6481「印刷配線用覆銅層合板試驗方法」,使用熱機械分析裝置(Rigaku公司製「Thermo plus TMA8310」),一邊對20mm×50mm之試驗片(絕緣層)施加2.5g之荷重,並且測定於氮氣流下,以5℃/分昇溫至250℃時之面內的熱膨脹係數(溫度範圍50~250℃、1St掃描)。相較於三層薄膜,可知大幅收縮,尺寸變化大。 Using iron (III) chloride solution (manufactured by Kida Co., 40° Bomei), the copper foil is completely removed from the double-sided copper-clad laminate. According to JIS C6481 "Testing methods for copper-clad laminates for printed wiring", thermomechanical analysis is used Device ("Thermo plus TMA8310" manufactured by Rigaku Corporation), while applying a load of 2.5 g to a test piece (insulating layer) of 20 mm × 50 mm, and measuring the in-plane temperature at a temperature of 5 °C/min to 250 °C under a nitrogen flow Coefficient of thermal expansion (temperature range 50~250℃, 1St scan). Compared with the three-layer film, it can be seen that the shrinkage is large and the size change is large.

Figure 104140330-A0202-12-0042-1
Figure 104140330-A0202-12-0042-1

Figure 104140330-A0202-12-0043-2
Figure 104140330-A0202-12-0043-2

Figure 104140330-A0202-12-0043-3
Figure 104140330-A0202-12-0043-3

Figure 104140330-A0202-12-0043-4
Figure 104140330-A0202-12-0043-4

如上述結果所示,使用了本發明之三層薄膜的實施例1~4之兩面覆銅層合板,相較於比較例1之兩面覆銅層合板而言,水浸漬前後之傳輸損失的變化率低、且尺寸安定性亦良好。 As shown in the above results, the double-sided copper-clad laminates of Examples 1 to 4 using the three-layer film of the present invention are compared with the double-sided copper-clad laminates of Comparative Example 1. The change in transmission loss before and after water immersion The rate is low, and the dimensional stability is also good.

又,即使如實施例5~6般使液晶聚合物層為厚時,尺 寸安定性亦為良好。實施例5~6之三層薄膜,液晶聚合物層為厚,因此使用實施例5~6之三層薄膜來製作印刷電路基板時,可充分發揮該印刷電路基板之傳輸損失的變化率,與實施例1~4同等或較其變更低之效果。 Moreover, even when the liquid crystal polymer layer is made thick as in Examples 5 to 6, the ruler Inch stability is also good. In the three-layer film of Examples 5-6, the liquid crystal polymer layer is thick. Therefore, when the three-layer film of Examples 5-6 is used to make a printed circuit board, the change rate of the transmission loss of the printed circuit board can be fully utilized, and Examples 1 to 4 have the same or lower effect than the modification.

再者,比較例3~4,相較於本發明之三層薄膜而言,尺寸變化大,因此未進行傳輸損失之測定。 Furthermore, in Comparative Examples 3 to 4, compared with the three-layer film of the present invention, the dimensional change is large, so the transmission loss measurement was not performed.

如上所述,於本說明書之實施例中,藉由將含有溶劑與液晶聚合物之液狀組成物塗佈於聚醯亞胺樹脂薄膜上,來製造三層薄膜。三層薄膜,除了該方法以外,於下述<以含浸製造三層薄膜之方法>或<以依序塗佈製造三層薄膜之方法>亦可製造,由該方法所製造之三層薄膜與於上述實施例中製造之三層薄膜,係發揮同樣之效果者。 As described above, in the examples of this specification, a three-layer film is produced by coating a liquid composition containing a solvent and a liquid crystal polymer on a polyimide resin film. In addition to this method, the three-layer film can also be manufactured in the following <Method for manufacturing three-layer film by impregnation> or <Method for manufacturing three-layer film by sequential coating>. The three-layer film manufactured by this method is The three-layer film produced in the above-mentioned embodiment exerts the same effect.

<以含浸製造三層薄膜之方法> <Method of manufacturing three-layer film by impregnation>

於室溫將市售之聚醯亞胺樹脂薄膜Kapton 200H(東麗杜邦公司製;50μm)浸漬於液晶聚合物溶液組成物(1)1分鐘後拉起,為了去掉過剩地附著於表面的液晶聚合物,可藉由於通過一對輥間之後,以熱風乾燥機使溶劑蒸發,進一步地,使用高溫熱風乾燥機進行加熱處理來製作三層薄膜。 A commercially available polyimide resin film Kapton 200H (manufactured by Toray DuPont; 50μm) was immersed in the liquid crystal polymer solution composition (1) at room temperature for 1 minute and then pulled up to remove excessive liquid crystals attached to the surface After the polymer passes through a pair of rollers, the solvent is evaporated by a hot air dryer, and further, a high temperature hot air dryer is used for heat treatment to produce a three-layer film.

此時,亦可藉由調整拉起速度,調整液晶聚合物之膜厚。 At this time, the film thickness of the liquid crystal polymer can also be adjusted by adjusting the pulling up speed.

<以依序塗佈製造三層薄膜之方法> <Method of manufacturing three-layer film by sequential coating>

作為支撐體,於SUS箔上依序塗佈液晶聚合物溶液組成物(1)、聚醯胺酸樹脂液狀組成物、液晶聚合物溶液組成物(1),使用熱風乾燥機於100℃加熱去除溶劑,接著於330℃進行加熱處理,藉由自支撐體剝離可製作三層薄膜。 As a support, a liquid crystal polymer solution composition (1), a polyamide resin liquid composition, and a liquid crystal polymer solution composition (1) were sequentially coated on a SUS foil, and heated at 100°C using a hot air dryer The solvent is removed, followed by heat treatment at 330°C, and a three-layer film can be produced by peeling from the support.

〔產業上之可利用性〕 〔Industrial availability〕

依照本發明,可提供使用於印刷配線基板用之層合體時,尺寸安定性與電特性優良的三層薄膜、及該三層薄膜之製造方法。 According to the present invention, it is possible to provide a three-layer film with excellent dimensional stability and electrical characteristics when used in a laminate for a printed wiring board, and a method for manufacturing the three-layer film.

20‧‧‧三層薄膜 20‧‧‧Three-layer film

21‧‧‧聚醯亞胺樹脂薄膜 21‧‧‧Polyimide resin film

22a、22b‧‧‧液晶聚合物層 22a, 22b‧‧‧Liquid crystal polymer layer

Claims (14)

一種三層薄膜,其係於聚醯亞胺樹脂薄膜之兩面,層合有以羥基羧酸為液晶原基之液晶聚合物層,且前述聚醯亞胺樹脂薄膜之厚度(T1)與前述以羥基羧酸為液晶原基之液晶聚合物層之厚度(T2),係滿足以下之關係式(a)及(b)(惟,2個T2係互相獨立,可為相同、亦可為相異),(a) 20μm≦T1≦50μm (b) 0.3≦T2/T1≦0.8。 A three-layer film, which is on both sides of a polyimide resin film, is laminated with a liquid crystal polymer layer using hydroxycarboxylic acid as the mesogen, and the thickness (T1) of the polyimide resin film is the same as the above The thickness (T2) of the liquid crystal polymer layer in which the hydroxycarboxylic acid is the mesogenic group satisfies the following relational formulas (a) and (b) (However, the two T2 systems are independent of each other and can be the same or different ), (a) 20 μ m≦T1≦50 μ m (b) 0.3≦T2/T1≦0.8. 如請求項1之三層薄膜,其中前述以羥基羧酸為液晶原基之液晶聚合物層,係含有來自2-羥基安息香酸或2-羥基-6-萘甲酸之構造單位。 The three-layer film of claim 1, wherein the aforementioned liquid crystal polymer layer using hydroxycarboxylic acid as the mesogen group contains structural units derived from 2-hydroxybenzoic acid or 2-hydroxy-6-naphthoic acid. 如請求項1或2之三層薄膜,其中進一步地,前述以羥基羧酸為液晶原基之液晶聚合物層係含有以下之構造單位(1)及(2),(1)-CO-Ar1-CO- (2)-X-Ar2-Y-(式中,Ar1及Ar2係分別獨立地表示伸苯基、伸萘基、聯伸苯基或下述式(3)表示之基;X及Y係分別獨立地表示氧原子或亞胺基;Ar1、或Ar2表示之前述基中之氫原子,亦可各自獨立地被鹵素原子、烷基或芳基取代);(3)-Ar3-Z-Ar4-(Ar3及Ar4係分別獨立地表示伸苯基或伸萘基;Z 係表示氧原子、硫原子、羰基、磺醯基或亞烷基)。 The three-layer film of claim 1 or 2, wherein, further, the liquid crystal polymer layer using hydroxycarboxylic acid as the mesogen group contains the following structural units (1) and (2), (1)-CO-Ar 1 -CO- (2)-X-Ar 2 -Y- (wherein Ar 1 and Ar 2 are independently represented by phenylene, naphthylene, biphenylene or represented by the following formula (3) Group; X and Y each independently represent an oxygen atom or an imino group; the hydrogen atom in the aforementioned group represented by Ar 1 or Ar 2 may be independently substituted with a halogen atom, an alkyl group, or an aryl group); 3) -Ar 3 -Z-Ar 4- (Ar 3 and Ar 4 each independently represent a phenylene group or a naphthylene group; Z represents an oxygen atom, a sulfur atom, a carbonyl group, a sulfonyl group, or an alkylene group). 一種層合板,其係使用如請求項1~3中任一項之三層薄膜作為絕緣層,且於該絕緣層之至少單面形成有金屬層。 A laminated board using a three-layer film as in any one of claims 1 to 3 as an insulating layer, and a metal layer is formed on at least one side of the insulating layer. 如請求項4之層合板,其中前述金屬層之最大高度(Rz)為0.5~2.5μm。 Such as the laminate of claim 4, wherein the maximum height (Rz) of the aforementioned metal layer is 0.5~2.5μm. 如請求項4之層合板,其中前述金屬層含有銅。 The laminate of claim 4, wherein the aforementioned metal layer contains copper. 如請求項5之層合板,其中前述金屬層含有銅。 The laminate of claim 5, wherein the aforementioned metal layer contains copper. 一種印刷電路基板,其係使用如請求項4之層合板。 A printed circuit board using a laminate as claimed in claim 4. 一種印刷電路基板,其係使用如請求項5之層合板。 A printed circuit board using a laminate as claimed in claim 5. 一種印刷電路基板,其係使用如請求項6之層合板。 A printed circuit board using a laminate as claimed in claim 6. 一種印刷電路基板,其係使用如請求項7之層合板。 A printed circuit board using a laminate as claimed in claim 7. 一種三層薄膜之製造方法,其係包含將含有溶劑與液晶聚合物之液狀組成物塗佈於聚醯亞胺樹脂薄膜之兩面,以前述液狀組成物被覆前述聚醯亞胺樹脂薄膜之兩面之液狀組成物塗佈步驟、將前述液狀組成物中之溶劑去除之溶劑去除步驟、與加熱處理步驟之三層薄膜之製造方法,其中作為前述液晶聚合物,係含有來自2-羥基安息香酸或 2-羥基-6-萘甲酸之構造單位、與以下之構造單位,(1)-CO-Ar1-CO- (2)-X-Ar2-Y-(式中,Ar1及Ar2係分別獨立地表示伸苯基、伸萘基、聯伸苯基或下述式(3)表示之基;X及Y係分別獨立地表示氧原子或亞胺基;Ar1、或Ar2表示之前述基中之氫原子,亦可各自獨立地被鹵素原子、烷基或芳基取代);(3)-Ar3-Z-Ar4-(Ar3及Ar4係分別獨立地表示伸苯基或伸萘基;Z係表示氧原子、硫原子、羰基、磺醯基或亞烷基),且前述液狀組成物塗佈步驟中,係調整前述液狀組成物之塗佈量,使前述聚醯亞胺樹脂薄膜之厚度(T1)與液晶聚合物層之厚度(T2),滿足以下之關係式(a)及(b),(a) 20μm≦T1≦50μm (b) 0.3≦T2/T1≦0.8(惟,2個T2係互相獨立,可為相同、亦可為相異)。 A method for manufacturing a three-layer film, which includes coating a liquid composition containing a solvent and a liquid crystal polymer on both sides of a polyimide resin film, and coating the polyimide resin film with the liquid composition A method for producing a three-layer film including the coating step of the liquid composition on both sides, the solvent removal step of removing the solvent in the liquid composition, and the heat treatment step. The liquid crystal polymer contains 2-hydroxyl The structural unit of benzoic acid or 2-hydroxy-6-naphthoic acid, and the following structural units, (1)-CO-Ar 1 -CO- (2)-X-Ar 2 -Y- (where, Ar 1 and Ar 2 is each independently a phenylene, naphthylene, biphenylene or a group represented by the following formula (3); X and Y are each independently an oxygen atom or an imino group; Ar 1 , or Ar The hydrogen atom in the aforementioned group represented by 2 may be independently substituted by a halogen atom, an alkyl group or an aryl group); (3)-Ar 3 -Z-Ar 4- (Ar 3 and Ar 4 are each independently represented Phenylene or naphthylene; Z represents an oxygen atom, a sulfur atom, a carbonyl group, a sulfonyl group or an alkylene group), and in the liquid composition coating step, the coating amount of the liquid composition is adjusted , So that the thickness of the polyimide resin film (T1) and the thickness of the liquid crystal polymer layer (T2) satisfy the following relational expressions (a) and (b), (a) 20 μm ≦T1≦50 μm (b) 0.3≦T2/T1≦0.8 (However, the two T2 systems are independent of each other and can be the same or different). 一種三層薄膜之製造方法,其係包含於含有溶劑與液晶聚合物之液狀組成物中含浸聚醯亞胺樹脂薄膜,以前述液狀組成物被覆前述聚醯亞胺樹脂薄膜之兩面之含浸步驟、將前述液狀組成物中之溶劑去除之溶劑去除步驟、與 加熱處理步驟之三層薄膜之製造方法,其中作為前述液晶聚合物,係含有來自2-羥基安息香酸或2-羥基-6-萘甲酸之構造單位、與以下之構造單位(1)及(2),(1)-CO-Ar1-CO- (2)-X-Ar2-Y-(式中,Ar1及Ar2係分別獨立地表示伸苯基、伸萘基、聯伸苯基或下述式(3)表示之基;X及Y係分別獨立地表示氧原子或亞胺基;Ar1、或Ar2表示之前述基中之氫原子,亦可各自獨立地被鹵素原子、烷基或芳基取代);(3)-Ar3-Z-Ar4-(Ar3及Ar4係分別獨立地表示伸苯基或伸萘基;Z係表示氧原子、硫原子、羰基、磺醯基或亞烷基),且前述含浸步驟中,係調整前述聚醯亞胺樹脂薄膜中之前述液狀組成物之附著量,使前述聚醯亞胺樹脂薄膜之厚度(T1)與液晶聚合物層之厚度(T2),滿足以下之關係式(a)及(b),(a) 20μm≦T1≦50μm (b) 0.3≦T2/T1≦0.8(惟,2個T2係互相獨立,可為相同、亦可為相異)。 A method for manufacturing a three-layer film, which comprises impregnating a polyimide resin film in a liquid composition containing a solvent and a liquid crystal polymer, and impregnating both sides of the polyimide resin film with the liquid composition Step, the solvent removal step of removing the solvent in the liquid composition, and the heat treatment step of the three-layer film manufacturing method, wherein the liquid crystal polymer contains 2-hydroxybenzoic acid or 2-hydroxy-6 -The structural unit of naphthoic acid, and the following structural units (1) and (2), (1)-CO-Ar 1 -CO- (2)-X-Ar 2 -Y- (where, Ar 1 and Ar 2 series each independently represent a phenylene group, a naphthylene group, a biphenylene group or a group represented by the following formula (3); X and Y each independently represent an oxygen atom or an imino group; Ar 1 , or Ar 2 The hydrogen atoms in the aforementioned groups may be independently substituted by halogen atoms, alkyl groups or aryl groups); (3)-Ar 3 -Z-Ar 4- (Ar 3 and Ar 4 are each independently representing a Phenyl or naphthylene; Z represents an oxygen atom, sulfur atom, carbonyl group, sulfonyl group or alkylene group), and in the impregnation step, the liquid composition in the polyimide resin film is adjusted The adhesion amount is such that the thickness (T1) of the aforementioned polyimide resin film and the thickness (T2) of the liquid crystal polymer layer satisfy the following relational expressions (a) and (b), (a) 20 μm ≦T1≦50 μ m (b) 0.3≦T2/T1≦0.8 (However, the two T2 systems are independent of each other and can be the same or different). 一種三層薄膜之製造方法,其係包含 準備含有溶劑與液晶聚合物之液狀組成物、與聚醯亞胺樹脂之前驅物的聚醯胺酸樹脂液狀組成物之步驟;於支撐體上依序將前述液狀組成物、前述聚醯胺酸樹脂液狀組成物、前述液狀組成物塗佈為三層之步驟;將前述三層之液狀組成物中的溶劑去除之溶劑去除步驟;與三層薄膜形成步驟之三層薄膜之製造方法,其中作為前述液晶聚合物,係含有來自2-羥基安息香酸或2-羥基-6-萘甲酸之構造單位、與以下之構造單位(1)及(2),(1)-CO-Ar1-CO- (2)-X-Ar2-Y-(式中,Ar1及Ar2係分別獨立地表示伸苯基、伸萘基、聯伸苯基或下述式(3)表示之基;X及Y係分別獨立地表示氧原子或亞胺基;Ar1、或Ar2表示之前述基中之氫原子,亦可各自獨立地被鹵素原子、烷基或芳基取代);(3)-Ar3-Z-Ar4-(Ar3及Ar4係分別獨立地表示伸苯基或伸萘基;Z係表示氧原子、硫原子、羰基、磺醯基或亞烷基),且前述塗佈步驟中,係調整前述含有溶劑與液晶聚合物之液狀組成物之塗佈量,使前述聚醯亞胺樹脂薄膜之厚度(T1)與液晶聚合物層之厚度(T2),滿足以下之關係式 (a)及(b),(a) 20μm≦T1≦50μm (b) 0.3≦T2/T1≦0.8(惟,2個T2係互相獨立,可為相同、亦可為相異)。 A method for manufacturing a three-layer film, which includes the steps of preparing a liquid composition containing a solvent and a liquid crystal polymer, and a polyimide resin liquid composition that is a precursor of the polyimide resin; on a support The step of sequentially coating the aforementioned liquid composition, the aforementioned polyamide resin liquid composition, and the aforementioned liquid composition into three layers; the solvent removal step of removing the solvent in the aforementioned three-layer liquid composition ; A method of manufacturing a three-layer film with a three-layer film forming step, wherein as the aforementioned liquid crystal polymer, the system contains a structural unit derived from 2-hydroxybenzoic acid or 2-hydroxy-6-naphthoic acid, and the following structural unit (1 ) And (2), (1)-CO-Ar 1 -CO- (2)-X-Ar 2 -Y- (where Ar 1 and Ar 2 are independently phenylene, naphthylene, Biphenylene or a group represented by the following formula (3); X and Y each independently represent an oxygen atom or an imino group; the hydrogen atom in the aforementioned group represented by Ar 1 or Ar 2 may also be independently Substituted by a halogen atom, an alkyl group or an aryl group); (3)-Ar 3 -Z-Ar 4- (Ar 3 and Ar 4 each independently represent a phenylene group or a naphthylene group; Z represents an oxygen atom, sulfur Atom, carbonyl group, sulfonyl group or alkylene group), and in the aforementioned coating step, the coating amount of the aforementioned liquid composition containing the solvent and the liquid crystal polymer is adjusted so that the thickness of the aforementioned polyimide resin film ( T1) and the thickness of the liquid crystal polymer layer (T2) satisfy the following relational expressions (a) and (b), (a) 20 μ m≦T1≦50 μ m (b) 0.3≦T2/T1≦0.8 (but , The two T2 systems are independent of each other and can be the same or different).
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