TW201437009A - Laminated plate and method producing the same - Google Patents

Laminated plate and method producing the same Download PDF

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TW201437009A
TW201437009A TW103106428A TW103106428A TW201437009A TW 201437009 A TW201437009 A TW 201437009A TW 103106428 A TW103106428 A TW 103106428A TW 103106428 A TW103106428 A TW 103106428A TW 201437009 A TW201437009 A TW 201437009A
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group
insulating layer
metal plate
liquid crystal
repeating unit
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TW103106428A
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TWI622492B (en
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Takeshi Kondo
Ryo Miyakoshi
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Sumitomo Chemical Co
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/02Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds
    • C08G63/60Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds derived from the reaction of a mixture of hydroxy carboxylic acids, polycarboxylic acids and polyhydroxy compounds
    • C08G63/605Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds derived from the reaction of a mixture of hydroxy carboxylic acids, polycarboxylic acids and polyhydroxy compounds the hydroxy and carboxylic groups being bound to aromatic rings
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/04Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • B32B15/09Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin comprising polyesters
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/18Layered products comprising a layer of synthetic resin characterised by the use of special additives
    • B32B27/20Layered products comprising a layer of synthetic resin characterised by the use of special additives using fillers, pigments, thixotroping agents
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G69/00Macromolecular compounds obtained by reactions forming a carboxylic amide link in the main chain of the macromolecule
    • C08G69/44Polyester-amides
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/05Insulated conductive substrates, e.g. insulated metal substrate
    • H05K1/056Insulated conductive substrates, e.g. insulated metal substrate the metal substrate being covered by an organic insulating layer
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2264/00Composition or properties of particles which form a particulate layer or are present as additives
    • B32B2264/10Inorganic particles
    • B32B2264/102Oxide or hydroxide
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2264/00Composition or properties of particles which form a particulate layer or are present as additives
    • B32B2264/10Inorganic particles
    • B32B2264/104Oxysalt, e.g. carbonate, sulfate, phosphate or nitrate particles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/20Properties of the layers or laminate having particular electrical or magnetic properties, e.g. piezoelectric
    • B32B2307/206Insulating
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/70Other properties
    • B32B2307/704Crystalline
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00Electrical equipment
    • B32B2457/08PCBs, i.e. printed circuit boards
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/02Fillers; Particles; Fibers; Reinforcement materials
    • H05K2201/0203Fillers and particles
    • H05K2201/0206Materials
    • H05K2201/0209Inorganic, non-metallic particles

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Laminated Bodies (AREA)
  • Polyamides (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Insulated Metal Substrates For Printed Circuits (AREA)

Abstract

The present invention provides a metal-based laminated plate having excellent drill workability and bending workability. The present laminated plate comprising: a metal plate obtained by calendering method, an insulating layer provided on the metal plate which includes a resin, and a metal foil provided on the insulating layer. To the metal plate, a Rz(MD), i.e., 10 points mean roughness in a calendering direction, and a Rz(TD), i.e., 10 points means roughness in a direction perpendicular to the calendering direction of a surface in contact with the insulating layer are each independently 4 to 20 μ m, and the ratio of the Rz(TD) to the Rz(MD) (Rz(TD)/Rz(MD)) is 1.5 or less.

Description

積層板及其製造方法 Laminated board and manufacturing method thereof

本發明係關於積層板及其製造方法。 The present invention relates to a laminate and a method of manufacturing the same.

近年來,隨著電氣‧電子機器的小型化、高性能化及高功率化,對於電路基板,係要求從被封裝之元件產生的熱容易逸散,亦即散熱性優異。可應付此要求之電路基板,係正研究一種具有金屬板、設置於其上之絕緣層、以及設置於其上之電路圖案之金屬基底電路基板。該金屬基底電路基板,係可藉由從具有金屬板、設置於其上之絕緣層、以及設置於其上之金屬箔之積層板,使該金屬箔進行圖案化而得到(例如參考專利文獻1至8)。 In recent years, with the miniaturization, high performance, and high power of electric and electronic devices, it is required that the heat generated by the packaged components is easily dissipated in the circuit board, that is, the heat dissipation property is excellent. A circuit board which can cope with this requirement is a metal base circuit board having a metal plate, an insulating layer provided thereon, and a circuit pattern provided thereon. The metal base circuit substrate can be obtained by patterning the metal foil from a laminate having a metal plate, an insulating layer provided thereon, and a metal foil provided thereon (for example, refer to Patent Document 1) To 8).

先前技術文獻 Prior technical literature 專利文獻 Patent literature

專利文獻1:日本特開平5-167212號公報 Patent Document 1: Japanese Patent Laid-Open No. Hei 5-172712

專利文獻2:日本國際公開第2010/117023號 Patent Document 2: Japanese International Publication No. 2010/117023

專利文獻3:日本特開2011-32316號公報 Patent Document 3: Japanese Laid-Open Patent Publication No. 2011-32316

專利文獻4:日本特開2011-77270號公報 Patent Document 4: Japanese Laid-Open Patent Publication No. 2011-77270

專利文獻5:日本特開2011-181833號公報 Patent Document 5: Japanese Laid-Open Patent Publication No. 2011-181833

專利文獻6:日本特開2011-219749號公報 Patent Document 6: Japanese Laid-Open Patent Publication No. 2011-219749

專利文獻7:日本特開2011-249606號公報 Patent Document 7: Japanese Laid-Open Patent Publication No. 2011-249606

專利文獻8:日本特開2012-4323號公報 Patent Document 8: JP-A-2012-4323

前述習知之金屬基底電路基板,於鑿穿加工時,有時容易使絕緣層產生缺損。此外,於彎曲加工時,有時容易使絕緣層從金屬板剝離。因此,本發明之目的在於提供一種鑿穿加工性及彎曲加工性優異之積層板,甚至提供一種鑿穿加工性及彎曲加工性優異之金屬基底電路基板。 In the conventional metal base circuit board described above, it is easy to cause a defect in the insulating layer during the chiseling process. Further, at the time of bending, the insulating layer may be easily peeled off from the metal plate. Therefore, an object of the present invention is to provide a laminated board excellent in chiseling workability and bending workability, and to provide a metal base circuit board excellent in punching workability and bending workability.

為了達成前述目的,本發明係提供一種積層板,其係具有:藉壓延法所得之金屬板、設置在前述金屬板上且含有樹脂之絕緣層、以及設置在前述絕緣層上之金屬箔之積層板,前述金屬板係為:相接於前述絕緣層之面之壓延方向上的十點平均粗糙度Rz(MD)及垂直於前述壓延方向之方向的十點平均粗糙度Rz(TD)分別獨立地為4至20μm,且前述Rz(TD)對前述Rz(MD)之比率(Rz(TD)/Rz(MD))為1.5以下之金屬板。此外,根據本發明,亦提供一種積層板的製造方法,其係前述積層板的製造方法,具有:使藉壓延法所得之原料金屬板之至少一面粗面化,俾得到前述金屬板之步驟。 In order to achieve the above object, the present invention provides a laminate comprising: a metal plate obtained by a calendering method, an insulating layer provided on the metal plate and containing a resin, and a laminate of a metal foil provided on the insulating layer. The plate, the metal plate is: a ten point average roughness Rz (MD) in a rolling direction of a surface of the insulating layer and a ten point average roughness Rz (TD) perpendicular to the direction of the rolling direction are independent The ground is 4 to 20 μm, and the ratio of the aforementioned Rz (TD) to the aforementioned Rz (MD) (Rz (TD) / Rz (MD)) is 1.5 or less. Further, according to the present invention, there is provided a method for producing a laminated board, which is characterized in that the method for producing a laminated board has a step of roughening at least one surface of a raw material metal sheet obtained by a rolling method and obtaining the metal sheet.

本發明之積層板,係鑿穿加工性及彎曲加工性優異,且散熱性亦優異。 The laminated board of the present invention is excellent in chiseling workability and bending workability, and is excellent in heat dissipation.

本發明之積層板,為具有金屬板、設置在其上之絕緣層、以及設置在其上之金屬箔之積層板。 The laminate of the present invention is a laminate having a metal plate, an insulating layer disposed thereon, and a metal foil disposed thereon.

在本發明中,係使用下述金屬板,亦即為藉壓延法所得之金屬板,其至少一面為壓延方向的十點平均粗糙度及垂直於壓延方向之方向的十點平均粗糙度分別獨立地為4至20μm,且垂直於壓延方向之方向的十點平均粗糙度對壓延方向的十點平均粗糙度之比率(垂直於壓延方向之方向的十點平均粗糙度/壓延方向的十點平均粗糙度)為1.5以下之粗面的金屬板,以使該粗面相接於絕緣層之方式積層。亦即,於金屬板之相接於絕緣層之面上,以壓延方向的十點平均粗糙度為Rz(MD),以垂直於壓延方向之方向的十點平均粗糙度為Rz(TD)時,Rz(MD)及Rz(TD)分別獨立地為4至20μm,且Rz(TD)/Rz(MD)為1.5以下。藉此,可得到鑿穿加工性及彎曲加工性優異,且散熱性亦優異之積層板。 In the present invention, the following metal plate is used, that is, the metal plate obtained by the calendering method, wherein at least one side has a ten point average roughness in the rolling direction and a ten point average roughness perpendicular to the direction of the rolling direction are independent. The ground is 4 to 20 μm, and the ratio of the ten-point average roughness perpendicular to the rolling direction to the ten-point average roughness in the rolling direction (the ten-point average roughness in the direction perpendicular to the rolling direction/the ten-point average of the rolling direction) A rough metal plate having a roughness of 1.5 or less is laminated so that the rough surface is in contact with the insulating layer. That is, on the surface of the metal plate that is in contact with the insulating layer, the ten-point average roughness in the rolling direction is Rz (MD), and the ten-point average roughness in the direction perpendicular to the rolling direction is Rz (TD). Rz(MD) and Rz(TD) are each independently 4 to 20 μm, and Rz(TD)/Rz(MD) is 1.5 or less. Thereby, a laminated board which is excellent in the punching workability and the bending workability and which is excellent in heat dissipation properties can be obtained.

金屬板之另一面,亦即與相接於絕緣層之面為相反側的面,係可為鏡面或粗面,為粗面時,可與相接於絕緣層之面相同地,壓延方向的十點平均粗糙度及垂 直於壓延方向之方向的十點平均粗糙度分別獨立地為4至20μm,且垂直於壓延方向之方向的十點平均粗糙度對壓延方向的十點平均粗糙度之比率(垂直於壓延方向之方向的十點平均粗糙度/壓延方向的十點平均粗糙度)為1.5以下之粗面,或是除此之外的粗面。 The other side of the metal plate, that is, the surface opposite to the surface that is in contact with the insulating layer, may be a mirror surface or a rough surface. When it is a rough surface, it may be the same as the surface that is in contact with the insulating layer, and may be rolled in the same direction. Ten point average roughness and vertical The ten-point average roughness in the direction perpendicular to the rolling direction is independently 4 to 20 μm, and the ratio of the ten-point average roughness perpendicular to the rolling direction to the ten-point average roughness in the rolling direction (perpendicular to the rolling direction) The ten-point average roughness in the direction/the ten-point average roughness in the rolling direction is a rough surface of 1.5 or less, or a rough surface other than this.

Rz(MD)及Rz(TD)較佳係分別獨立地為4至10μm,Rz(TD)/Rz(MD)較佳為1.2以下,藉此,可進一步提升積層板的鑿穿加工性或彎曲加工性。 Preferably, Rz (MD) and Rz (TD) are each independently 4 to 10 μm, and Rz(TD)/Rz(MD) is preferably 1.2 or less, whereby the chiseling workability or bending of the laminate can be further improved. Processability.

金屬板之面的十點平均粗糙度,係依據JIS B0601:1994來測定。 The ten-point average roughness of the surface of the metal plate was measured in accordance with JIS B0601:1994.

如此的金屬板,係以成為前述既定粗面之方式,使藉壓延法所得之原料金屬板之至少一面均一且適度地粗面化而得到。粗面化係可對雙面進行或是僅對一面進行,但為了更提升積層板的鑿穿加工性或彎曲加工性,較佳係對雙面進行。 Such a metal plate is obtained by uniformly and appropriately roughening at least one surface of the raw material metal plate obtained by the rolling method so as to be the predetermined rough surface. The roughening may be performed on both sides or on only one side, but in order to further improve the punching workability or bending workability of the laminated board, it is preferable to carry out the double-sided.

粗面化係可藉由噴砂處理、研磨處理等之乾式粗面化方法來進行,或是藉由陽極氧化處理、蝕刻處理等之濕式粗面化方法來進行。其中,較佳藉由噴砂處理來進行粗面化,藉此,可進一步提升積層板的鑿穿加工性或彎曲加工性。噴砂處理,係可藉由空氣壓或離心力將氧化鋁、鋼粒、砂、玻璃珠等研磨劑吹送至金屬板,以使金屬板粗面化之方法。 The roughening can be carried out by a dry roughening method such as sandblasting or polishing, or by a wet roughening method such as anodizing or etching. Among them, it is preferable to perform roughening by sandblasting, whereby the chiseling workability or bending workability of the laminated plate can be further improved. Sand blasting is a method in which an abrasive such as alumina, steel granules, sand, glass beads or the like is blown to a metal plate by air pressure or centrifugal force to roughen the metal plate.

金屬板的材料,例如可列舉出鋁、鐵及銅,亦可為鋁合金或不銹鋼等合金。其中,較佳為銅及鋁合金。 金屬板可含有碳等之非金屬,例如可含有與碳複合化之鋁。金屬板較佳具有高導熱率,該導熱率較佳為60W‧m-1‧K-1以上。 Examples of the material of the metal plate include aluminum, iron, and copper, and may be an alloy such as an aluminum alloy or stainless steel. Among them, copper and aluminum alloy are preferred. The metal plate may contain a non-metal such as carbon, and may, for example, contain aluminum compounded with carbon. The metal plate preferably has a high thermal conductivity, and the thermal conductivity is preferably 60 W‧ m -1 ‧ K -1 or more.

金屬板的厚度一般為0.2mm以上,較佳為0.5mm以上,藉此,可容易提升積層板的散熱性。此外,金屬板的厚度一般為5mm以下,較佳為1.5mm以下,藉此,可容易提升積層板的鑿穿加工性或彎曲加工性。金屬板係可具有可撓性或不具有可撓性。金屬板可具有單層構造或多層構造。 The thickness of the metal plate is generally 0.2 mm or more, preferably 0.5 mm or more, whereby the heat dissipation property of the laminated board can be easily improved. Further, the thickness of the metal plate is generally 5 mm or less, preferably 1.5 mm or less, whereby the chiseling workability or the bending workability of the laminated plate can be easily improved. The metal plate can be flexible or not flexible. The metal plate may have a single layer configuration or a multilayer construction.

絕緣層係設置在金屬板上,且含有樹脂。樹脂可發揮作為黏著金屬板與金屬箔之黏著劑的功能,以及使絕緣層的表面平坦化之功能。 The insulating layer is provided on the metal plate and contains a resin. The resin functions as an adhesive for adhering a metal plate and a metal foil, and a function of flattening the surface of the insulating layer.

樹脂係例如可列舉出聚丙烯、聚醯胺、液晶聚酯以外的聚酯、液晶聚酯、聚苯硫醚、聚醚酮、聚碳酸酯、聚醚碸、聚苯醚、聚醚醯亞胺等之熱塑性樹脂;以及酚樹脂、環氧樹脂、聚醯亞胺樹脂、氰酸酯樹脂等之熱硬化性樹脂,亦可使用此等2種以上。其中,由於耐熱性高且介電損耗低,故較佳為液晶聚酯。 Examples of the resin include polypropylene, polyamide, polyester other than liquid crystal polyester, liquid crystal polyester, polyphenylene sulfide, polyether ketone, polycarbonate, polyether oxime, polyphenylene ether, and polyether oxime. A thermoplastic resin such as an amine or a thermosetting resin such as a phenol resin, an epoxy resin, a polyimide resin, or a cyanate resin may be used. Among them, liquid crystal polyester is preferred because of its high heat resistance and low dielectric loss.

液晶聚酯為在熔融狀態下顯示液晶性之聚酯,較佳為在450℃以下的溫度熔融之液晶聚酯。液晶聚酯可為液晶聚酯醯胺、或液晶聚酯醚、液晶聚酯碳酸酯、液晶聚酯醯亞胺。液晶聚酯較佳為僅使用芳香族化合物作為原料單體之全芳香族液晶聚酯。 The liquid crystal polyester is a polyester which exhibits liquid crystallinity in a molten state, and is preferably a liquid crystal polyester which is melted at a temperature of 450 ° C or lower. The liquid crystal polyester may be a liquid crystal polyester decylamine, or a liquid crystal polyester ether, a liquid crystal polyester carbonate, or a liquid crystal polyester quinone. The liquid crystal polyester is preferably a wholly aromatic liquid crystal polyester using only an aromatic compound as a raw material monomer.

液晶聚酯的典型例,可列舉出:使芳香族 羥基羧酸與芳香族二羧酸與選自由芳香族二醇、芳香族羥基胺及芳香族二胺所組成之群之至少1種化合物聚合(聚縮合)而成之液晶聚酯,使複數種芳香族羥基羧酸聚合而成之液晶聚酯,使芳香族二羧酸與選自由芳香族二醇、芳香族羥基胺及芳香族二胺所組成之群之至少1種化合物聚合而成之液晶聚酯,以及使聚對苯二甲酸乙二酯等之聚酯與芳香族羥基羧酸聚合而成之液晶聚酯。在此,芳香族羥基羧酸、芳香族二羧酸、芳香族二醇、芳香族羥基胺及芳香族二胺,係可分別獨立地使用其可聚合的衍生物來取代其一部分或全部。 Typical examples of the liquid crystal polyester include: making aromatic a liquid crystal polyester obtained by polymerizing (polycondensing) a hydroxycarboxylic acid and an aromatic dicarboxylic acid with at least one compound selected from the group consisting of an aromatic diol, an aromatic hydroxyamine, and an aromatic diamine, and a plurality of A liquid crystal polyester obtained by polymerizing an aromatic hydroxycarboxylic acid, and a liquid crystal obtained by polymerizing an aromatic dicarboxylic acid and at least one compound selected from the group consisting of an aromatic diol, an aromatic hydroxylamine, and an aromatic diamine. A polyester, and a liquid crystal polyester obtained by polymerizing a polyester such as polyethylene terephthalate with an aromatic hydroxycarboxylic acid. Here, the aromatic hydroxycarboxylic acid, the aromatic dicarboxylic acid, the aromatic diol, the aromatic hydroxylamine, and the aromatic diamine may be used in place of a part or all of the polymerizable derivative.

如芳香族羥基羧酸及芳香族二羧酸之具有羧基之化合物的可聚合之衍生物的例子,係可列舉出:將羧基轉換為烷氧羰基或芳氧羰基而成之衍生物(酯)、將羧基轉換為鹵甲醯基而成之衍生物(氧鹵化物)、及羧基轉換為醯氧羰基而成之衍生物(酸酐)。如芳香族羥基羧酸、芳香族二醇及芳香族羥基胺般之具有羥基的化合物之可聚合的衍生物的例子,係可列舉出使羥基醯基化而轉換為醯氧基所成之衍生物(醯化物)。如芳香族羥基胺及芳香族二胺般之具有胺基的化合物之可聚合的衍生物的例子,係可列舉出使胺基醯基化而轉換為醯胺基所成之衍生物(醯化物)。 Examples of the polymerizable derivative of a compound having a carboxyl group of an aromatic hydroxycarboxylic acid and an aromatic dicarboxylic acid include derivatives (esters) obtained by converting a carboxyl group into an alkoxycarbonyl group or an aryloxycarbonyl group. A derivative (oxyhalide) obtained by converting a carboxyl group into a halomethyl group, and a derivative (anhydride) obtained by converting a carboxyl group into a fluorenyloxy group. Examples of the polymerizable derivative of a compound having a hydroxyl group like an aromatic hydroxycarboxylic acid, an aromatic diol, and an aromatic hydroxyamine include a derivative obtained by thiolation of a hydroxy group into a methoxy group. Matter (telluride). Examples of the polymerizable derivative of the compound having an amine group such as an aromatic hydroxylamine and an aromatic diamine include a derivative obtained by hydrazylating an amine group and converting it into a mercapto group. ).

液晶聚酯較佳係具有以下述式(1)表示之重複單位(以下,有時稱為「重複單位(1)」),尤佳係具有重複單位(1)、以下述式(2)表示之重複單位(以下,有時稱為 「重複單位(2)」)、及以下列式(3)表示之重複單位(以下,有時稱為「重複單位(3)」)。 The liquid crystal polyester preferably has a repeating unit represented by the following formula (1) (hereinafter sometimes referred to as "repeating unit (1)"), and particularly preferably has a repeating unit (1) and is represented by the following formula (2) Repeat unit (hereinafter, sometimes referred to as "Repeating unit (2)") and a repeating unit expressed by the following formula (3) (hereinafter, sometimes referred to as "repetitive unit (3)").

(1)-O-Ar1-CO- (1)-O-Ar 1 -CO-

(2)-CO-Ar2-CO- (2)-CO-Ar 2 -CO-

(3)-X-Ar3-Y- (3)-X-Ar 3 -Y-

(Ar1表示伸苯基、伸萘基或伸聯苯基;Ar2及Ar3分別獨立地表示伸苯基、伸萘基、伸聯苯基或以下列式(4)表示之基;X及Y分別獨立地表示氧原子或亞胺基(-NH-);位於以Ar1、Ar2或Ar3表示之前述基之氫原子,係可分別獨立地被鹵素原子、烷基或芳基所取代) (Ar 1 represents a phenyl group, an extended naphthyl group or a biphenyl group; and Ar 2 and Ar 3 each independently represent a phenyl group, a naphthyl group, a phenyl group or a group represented by the following formula (4); And Y each independently represent an oxygen atom or an imido group (-NH-); a hydrogen atom located in the above-mentioned group represented by Ar 1 , Ar 2 or Ar 3 may be independently a halogen atom, an alkyl group or an aryl group, respectively. Replaced by)

(4)-Ar4-Z-Ar6- (4)-Ar 4 -Z-Ar 6 -

(Ar4及Ar6分別獨立地表示伸苯基或伸萘基;Z表示氧原子、硫原子、羰基、磺醯基或亞烷基) (Ar 4 and Ar 6 each independently represent a phenyl or anthracene group; Z represents an oxygen atom, a sulfur atom, a carbonyl group, a sulfonyl group or an alkylene group)

前述鹵素原子係可列舉出氟原子、氯原子、溴原子及碘原子。前述烷基的例子,係可列舉出甲基、乙基、正丙基、異丙基、正丁基、異丁基、二級丁基、三級丁基、正己基、2-乙基己基、正辛基及正癸基,該碳數一般為1至10。前述芳基的例子,可列舉出苯基、鄰甲苯基、間甲苯基、對甲苯基、1-萘基及2-萘基,該碳數一般為6至20。當前述氫原子被此等基所取代時,其數係於以Ar1、Ar2或Ar3表示之前述基的每個基,一般分別獨立地為2個以下,較佳為1個以下。 Examples of the halogen atom system include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. Examples of the alkyl group include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, secondary butyl group, tert-butyl group, n-hexyl group, and 2-ethylhexyl group. , n-octyl and n-decyl, the carbon number is generally from 1 to 10. Examples of the above aryl group include a phenyl group, an o-tolyl group, a m-tolyl group, a p-tolyl group, a 1-naphthyl group and a 2-naphthyl group, and the carbon number is usually from 6 to 20. When the hydrogen atom is substituted by such a group, the number of each of the groups represented by Ar 1 , Ar 2 or Ar 3 is generally 2 or less, preferably 1 or less.

前述亞烷基的例子,可列舉出亞甲基、亞乙基、亞異丙基、亞正丁基及2-乙基亞己基,其碳數一般 為1至10。 Examples of the above alkylene group include a methylene group, an ethylene group, an isopropylidene group, a n-butylene group, and a 2-ethylhexylene group, and the carbon number thereof is generally It is from 1 to 10.

重複單位(1)係來自既定芳香族羥基羧酸之重複單位。重複單位(1)較佳係Ar1為對伸苯基之重複單位(1)(來自對羥基苯甲酸之重複單位)、以及Ar1為2,6-萘基之重複單位(1)(來自6-羥基-2-萘甲酸之重複單位)。 The repeating unit (1) is a repeating unit derived from a predetermined aromatic hydroxycarboxylic acid. Repeating unit (1) is preferably based on the repeat unit Ar 1 is phenylene of (1) (repeating units derived from hydroxybenzoic acid on), and Ar 1 is 2,6-naphthalene group The repeating unit (1) (from Repeat unit of 6-hydroxy-2-naphthoic acid).

重複單位(2)為來自既定芳香族二羧酸之重複單位。重複單位(2)較佳係Ar2為對伸苯基之重複單位(2)(來自對苯二甲酸之重複單位)、Ar2為間伸苯基之重複單位(2)(來自間苯二甲酸之重複單位)、Ar2為對伸苯基之重複單位(2)(來自對苯二甲酸之重複單位)、Ar2為2,6-伸萘基之重複單位(2)(來自2,6-萘二羧酸之重複單位)、以及Ar2為二苯基醚-4,4’-二基之重複單位(2)(來自二苯基醚-4,4’-二羧酸之重複單位)。 The repeating unit (2) is a repeating unit derived from a predetermined aromatic dicarboxylic acid. The repeating unit (2) is preferably Ar 2 is a repeating unit of the pendant phenyl group (2) (repeating unit derived from terephthalic acid), and Ar 2 is a repeating unit of the extended phenyl group (2) (from isophthalic acid) Repeat unit of formic acid), Ar 2 is a repeating unit of phenylene (2) (repeating unit derived from terephthalic acid), and Ar 2 is a repeating unit of 2,6-anthranyl group (2) (from 2, Repeating unit of 6-naphthalenedicarboxylic acid), and Ar 2 is a repeating unit of diphenyl ether-4,4'-diyl (2) (repeated from diphenyl ether-4,4'-dicarboxylic acid) unit).

重複單位(3)為來自既定之芳香族二醇、芳香族羥基胺或芳香族二胺之重複單位。重複單位(3)較佳係Ar3為對伸苯基之重複單位(3)(來自對苯二酚、對胺基酚或對苯二胺之重複單位)。 The repeating unit (3) is a repeating unit derived from a predetermined aromatic diol, an aromatic hydroxylamine or an aromatic diamine. The repeating unit (3) is preferably Ar 3 is a repeating unit (3) of a pendant phenyl group (a repeating unit derived from hydroquinone, p-aminophenol or p-phenylenediamine).

重複單位(1)的含量係相對於全部重複單位的合計量(藉由以其各重複單位的式量除構成液晶聚酯之各重複單位的質量,求取各重複單位的物質量當量(莫耳),並將此等予以合計之值),一般為30莫耳%以上,較佳為30至80莫耳%,尤佳為30至60莫耳%,更佳為30至40莫耳%。重複單位(2)的含量,係相對於全部重複單位的合計量,一般為35莫耳%以上,較佳為10至35莫耳%, 尤佳為20至35莫耳%,更佳為30至35莫耳%。重複單位(3)的含量,相對於全部重複單位的合計量,一般為35莫耳%以上,較佳為10至35莫耳%,尤佳為20至35莫耳%,更佳為30至35莫耳%。重複單位(1)的含量愈多,愈容易提升耐熱性或強度、剛性,若過多,對於溶劑之溶解性容易降低。 The content of the repeating unit (1) is a total amount with respect to all the repeating units (by dividing the mass of each repeating unit constituting the liquid crystal polyester by the formula of each repeating unit, the mass equivalent of each repeating unit is obtained. The ear), and the sum of these values, is generally 30% by mole or more, preferably 30 to 80% by mole, particularly preferably 30 to 60% by mole, more preferably 30 to 40% by mole. . The content of the repeating unit (2) is generally 35 mol% or more, preferably 10 to 35 mol%, based on the total amount of all repeating units. It is preferably 20 to 35 mol%, more preferably 30 to 35 mol%. The content of the repeating unit (3) is generally 35 mol% or more, preferably 10 to 35 mol%, particularly preferably 20 to 35 mol%, more preferably 30 to 30% by mole based on the total of all repeating units. 35 moles %. The more the content of the repeating unit (1), the easier it is to improve heat resistance, strength, and rigidity, and if too much, the solubility in a solvent is liable to lower.

重複單位(2)的含量與重複單位(3)的含量之比率,係以[重複單位(2)的含量]/[重複單位(3)的含量](莫耳/莫耳)表示,一般為0.9/1至1/0.9,較佳為0.95/1至1至0.95,尤佳為0.98/1至1/0.98。 The ratio of the content of the repeating unit (2) to the content of the repeating unit (3) is expressed by [content of repeating unit (2)] / [content of repeating unit (3)] (mol/mole), generally From 0.9/1 to 1/0.9, preferably from 0.95/1 to 1 to 0.95, particularly preferably from 0.98/1 to 1/0.98.

液晶聚酯係可分別獨立地具有重複單位(1)至(3)2種以上。此外,液晶聚酯係亦可具有重複單位(1)至(3)以外的重複單位,該含量係相對於全部重複單位的合計量,一般為10莫耳%以下,較佳為5莫耳%以下。 The liquid crystal polyester system may independently have two or more kinds of repeating units (1) to (3). Further, the liquid crystal polyester may have a repeating unit other than the repeating units (1) to (3), and the content is generally 10 mol% or less, preferably 5 mol%, based on the total amount of all repeating units. the following.

液晶聚酯係具有X及/或Y為亞胺基之重複單位(3)作為重複單位(3)者,亦即,具有來自既定之芳香族羥基胺之重複單位及/或來自芳香族二胺之重複單位者,對於溶劑之溶解性優異,故較佳,尤佳為僅具有X及/或Y為亞胺基之重複單位(3)作為重複單位(3)。 The liquid crystal polyester has a repeating unit (3) in which X and/or Y is an imine group as a repeating unit (3), that is, has a repeating unit derived from a predetermined aromatic hydroxylamine and/or derived from an aromatic diamine. The repeating unit is preferably excellent in solubility in a solvent, and more preferably a repeating unit (3) having only X and/or Y as an imine group as a repeating unit (3).

液晶聚酯較佳係藉由使對應於構成此之重複單位之原料單體熔融聚合,並使所得之聚合物(預聚物)固相聚合而製造。藉此,能夠操作性佳地製造耐熱性或強度、剛性高之高分子量的液晶聚酯。熔融聚合可在觸媒的存在下進行,該觸媒的例子,可列舉出乙酸鎂、乙酸亞錫、 四丁基鈦酸酯、乙酸鉛、乙酸鈉、乙酸鉀、三氧化銻等之金屬化合物,或4-(二甲基胺基)吡啶、1-甲基咪唑等之含氮雜環型化合物,較佳係使用含氮雜環型化合物。 The liquid crystal polyester is preferably produced by melt-polymerizing a raw material monomer corresponding to the repeating unit constituting the liquid crystal, and solid-phase polymerizing the obtained polymer (prepolymer). Thereby, a high molecular weight liquid crystal polyester having high heat resistance, strength, and rigidity can be produced with good operability. The melt polymerization can be carried out in the presence of a catalyst, and examples of the catalyst include magnesium acetate and stannous acetate. a metal compound such as tetrabutyl titanate, lead acetate, sodium acetate, potassium acetate or antimony trioxide, or a nitrogen-containing heterocyclic compound such as 4-(dimethylamino)pyridine or 1-methylimidazole. It is preferred to use a nitrogen-containing heterocyclic compound.

液晶聚酯係其流動起始溫度一般為250℃以上,較佳為250至350℃,尤佳為260至330℃。流動起始溫度愈高,愈容易提升耐熱性或強度、剛性,若過高,對於溶劑之溶解性容易降低,或液狀組成物的黏度容易變高。 The liquid crystal polyester has a flow initiation temperature of usually 250 ° C or higher, preferably 250 to 350 ° C, and particularly preferably 260 to 330 ° C. The higher the flow initiation temperature, the easier it is to improve heat resistance, strength, and rigidity. If it is too high, the solubility in a solvent is liable to lower, or the viscosity of a liquid composition tends to be high.

流動起始溫度亦稱為熔流溫度或流動溫度,使用毛細流變儀,一邊在9.8MPa(100kg/cm2)的荷重下以4℃/分的速度升溫,一邊使液晶聚酯熔融,並從內徑1mm及長度10mm的噴嘴擠壓出時,顯示4800Pa‧s(48000泊)的黏度之溫度,為液晶聚酯的分子量之標準(參考小出直之編,「液晶聚合物-合成、成形及應用-(日文原文:液晶-合成‧成形‧応用-」,CMC股份有限公司,1987年6月5日,p.95)。 The flow initiation temperature is also referred to as a melt flow temperature or a flow temperature, and the liquid crystal polyester is melted while being heated at a rate of 4 ° C/min under a load of 9.8 MPa (100 kg/cm 2 ) using a capillary rheometer. When extruded from a nozzle having an inner diameter of 1 mm and a length of 10 mm, the temperature of the viscosity of 4800 Pa ‧ (48,000 poise) is displayed, which is the standard of the molecular weight of the liquid crystal polyester (refer to the small liquid crystal, synthetic, forming) And application - (Japanese original: LCD - Synthesis, Forming, Application -", CMC Corporation, June 5, 1987, p. 95).

樹脂佔絕緣層之比率,較佳為30至60體積%,尤佳為35至55體積%。若過度降低該比率,絕緣層與金屬板或金屬箔之密著性降低,或絕緣層的表面平坦性降低。此外,若過度增大該比率,積層板的散熱性降低。 The ratio of the resin to the insulating layer is preferably from 30 to 60% by volume, particularly preferably from 35 to 55% by volume. If the ratio is excessively lowered, the adhesion of the insulating layer to the metal plate or the metal foil is lowered, or the surface flatness of the insulating layer is lowered. Further, if the ratio is excessively increased, the heat dissipation property of the laminated board is lowered.

絕緣層較佳係進一步含有選自由氧化鋁、氧化矽、氮化硼及氮化鋁所組成之群的至少1種無機填料。藉由於絕緣層含有前述無機填料,可提升積層板的散熱性。 The insulating layer preferably further contains at least one inorganic filler selected from the group consisting of alumina, cerium oxide, boron nitride, and aluminum nitride. Since the insulating layer contains the inorganic filler, the heat dissipation property of the laminated board can be improved.

前述無機填料的至少一部分,為了提升與樹脂之密著性或於後述樹脂組成物中的分散性,可使用施以表面處理之無機填料。可使用於其表面處理之表面處理劑,例如可列舉出矽烷偶合劑、鈦偶合劑、鋁偶合劑、鋯偶合劑、長鏈脂肪酸、異氰酸酯化合物、及具有環氧基、甲氧基矽烷基、胺基或羥基之高分子。 At least a part of the inorganic filler may be a surface-treated inorganic filler in order to improve the adhesion to the resin or the dispersibility in the resin composition described later. Examples of the surface treatment agent which can be used for the surface treatment thereof include a decane coupling agent, a titanium coupling agent, an aluminum coupling agent, a zirconium coupling agent, a long-chain fatty acid, an isocyanate compound, and an epoxy group or a methoxyalkyl group. A polymer of an amine group or a hydroxyl group.

前述無機填料佔絕緣層之比率,較佳為40至70體積%,尤佳為45至65體積%。若過度降低該比率,積層板的散熱性降低。此外,若過度增大該比率,積層板的鑿穿加工性或彎曲加工性降低。 The ratio of the above inorganic filler to the insulating layer is preferably from 40 to 70% by volume, particularly preferably from 45 to 65% by volume. If the ratio is excessively lowered, the heat dissipation of the laminate is lowered. Further, if the ratio is excessively increased, the chiseling workability or the bending workability of the laminated sheet is lowered.

絕緣層係亦可含有樹脂及前述無機填料以外的成分,例如有機填料或添加劑,佔絕緣層之比率,含有複數種時,該合計一般為0至10體積%。有機填料的例子,可列舉出硬化環氧樹脂、交聯苯并胍胺樹脂及交聯丙烯酸樹脂。添加劑的例子,可列舉出流平劑、消泡劑、抗氧化劑、紫外線吸收劑、難燃劑及著色劑。 The insulating layer may contain a resin and a component other than the inorganic filler, for example, an organic filler or an additive, and the ratio of the insulating layer is generally 0 to 10% by volume. Examples of the organic filler include a hardened epoxy resin, a crosslinked benzoguanamine resin, and a crosslinked acrylic resin. Examples of the additives include a leveling agent, an antifoaming agent, an antioxidant, an ultraviolet absorber, a flame retardant, and a coloring agent.

此外,於絕緣層中,亦可含有氧化鋁、氧化矽、氮化硼及氮化鋁以外的無機填料,佔無機填料之比率,含有複數種時,該合計一般為0至10體積%。 Further, the insulating layer may contain an inorganic filler other than alumina, cerium oxide, boron nitride or aluminum nitride, and when it is contained in a plurality of kinds, the total amount is generally from 0 to 10% by volume.

金屬箔係設置在絕緣層上,並將絕緣層夾持於其間而與金屬板相向。金屬箔的材料,例如可列舉出銅及鋁,亦可為合金。金屬箔的厚度一般為10至500μm。 The metal foil is placed on the insulating layer with the insulating layer interposed therebetween to face the metal plate. Examples of the material of the metal foil include copper and aluminum, and may be an alloy. The thickness of the metal foil is generally from 10 to 500 μm.

本發明之積層板的製造,可藉由(A):首先製作金屬箔與絕緣層之積層中間體,接著,以該絕緣層面 作為貼合面,而藉由熱壓合等將該積層中間體與金屬板的粗面貼合而進行;或(B):首先以金屬板的粗面作為貼合面,製作金屬板與絕緣層之積層中間體,接著,以該絕緣層面作為貼合面,並藉由熱壓合等將該積層中間體與金屬箔貼合而進行;或是(C):首先製造成為絕緣層之絕緣薄膜,接著,以金屬板的粗面作為貼合面,以金屬板與金屬箔夾持該絕緣薄膜並藉由熱壓合等來貼合此等而進行。 The laminate of the present invention can be manufactured by (A): firstly, a laminated intermediate of a metal foil and an insulating layer is formed, and then the insulating layer is used. As a bonding surface, the laminated intermediate body is bonded to the rough surface of the metal plate by thermocompression bonding or the like; or (B): first, the rough surface of the metal plate is used as a bonding surface to form a metal plate and insulation. a laminated intermediate layer, and then the insulating layer is used as a bonding surface, and the laminated intermediate is bonded to the metal foil by thermocompression bonding or the like; or (C): first, insulating layer is formed as an insulating layer In the film, the rough surface of the metal plate is used as a bonding surface, and the insulating film is sandwiched between a metal plate and a metal foil, and bonded by thermal pressing or the like.

絕緣層的形成,較佳係將含有樹脂及溶劑之液狀組成物塗佈於支撐體並將所得之塗膜乾燥(除去溶劑)來進行。此時,藉由使用金屬箔作為支撐體,可製造前述(A)中之金屬箔與絕緣層之積層中間體。此外,藉由使用金屬板作為支撐體,可製造前述(B)中之金屬板與絕緣層之積層中間體。此外,當使用金屬箔及金屬板以外的支撐體,例如聚酯薄膜、聚丙烯薄膜、氟樹脂薄膜、尼龍薄膜、聚甲基戊烯薄膜等之樹脂薄膜作為支撐體時,藉由熱壓合等,將形成於支撐體上之絕緣層從支撐體轉印至金屬箔,藉此,可製造前述(A)中之金屬箔與絕緣層之積層中間體,或是藉由熱壓合等,將形成於支撐體上之絕緣層從支撐體轉印至金屬板,藉此,可製造前述(B)中之金屬板與絕緣層之積層中間體,或是從支撐體將形成於支撐體上之絕緣層剝離,藉此可製造前述(C)中之絕緣薄膜。 The formation of the insulating layer is preferably carried out by applying a liquid composition containing a resin and a solvent to a support and drying the obtained coating film (solvent removal). At this time, by using a metal foil as a support, a laminated intermediate of the metal foil and the insulating layer in the above (A) can be produced. Further, by using a metal plate as a support, a laminated intermediate body of the metal plate and the insulating layer in the above (B) can be produced. Further, when a metal foil and a support other than the metal plate, for example, a resin film such as a polyester film, a polypropylene film, a fluororesin film, a nylon film, or a polymethylpentene film, are used as the support, by thermocompression And the like, the insulating layer formed on the support is transferred from the support to the metal foil, whereby the laminated intermediate of the metal foil and the insulating layer in the above (A) can be manufactured, or by thermocompression bonding or the like, The insulating layer formed on the support is transferred from the support to the metal plate, whereby the laminated intermediate body of the metal plate and the insulating layer in the above (B) can be manufactured, or the support can be formed on the support. The insulating layer is peeled off, whereby the insulating film in the above (C) can be produced.

溶劑係可適當地選擇能夠溶解所使用的樹脂之溶劑,具體而言,能夠於50℃以1質量%以上的濃度([樹脂]/[樹脂+溶劑])溶解之溶劑而使用。 In the solvent, a solvent capable of dissolving the resin to be used can be appropriately selected, and specifically, a solvent which is soluble at a concentration of 1% by mass or more ([resin] / [resin + solvent]) at 50 ° C can be used.

溶劑的例子,可列舉出二氯甲烷、三氯甲烷、1,2-二氯乙烷、1,1,2,2-四氯乙烷、鄰二氯苯等之鹵化烴;對氯酚五氯酚、五氟酚等之鹵化酚;二乙醚、四氫呋喃、1,4-二噁烷等之醚;丙酮、環己酮等之酮;乙酸乙酯、γ-丁內酯等之酯;碳酸乙烯酯、碳酸丙烯酯等之碳酸酯;三乙胺等之胺;吡啶等之含氮雜環芳香族化合物;乙腈、琥珀腈等之腈;N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基吡咯啶酮等之醯胺;四甲基脲等之脲化物;硝基甲烷、硝基苯等之硝基化物;二甲基亞碸、環丁碸等之硫化物;以及六甲基磷酸醯胺、三正丁基磷酸等之磷化物,亦可使用此等2種以上。 Examples of the solvent include halogenated hydrocarbons such as dichloromethane, chloroform, 1,2-dichloroethane, 1,1,2,2-tetrachloroethane, o-dichlorobenzene, and the like; a halogenated phenol such as chlorophenol or pentafluorophenol; an ether such as diethyl ether, tetrahydrofuran or 1,4-dioxane; a ketone such as acetone or cyclohexanone; an ester of ethyl acetate or γ-butyrolactone; a carbonate such as vinyl ester or propylene carbonate; an amine such as triethylamine; a nitrogen-containing heterocyclic aromatic compound such as pyridine; a nitrile such as acetonitrile or succinonitrile; N,N-dimethylformamide, N, a guanamine such as N-dimethylacetamide or N-methylpyrrolidone; a urea compound such as tetramethylurea; a nitro compound such as nitromethane or nitrobenzene; a dimethyl hydrazine or a ring; A sulphide such as butyl sulfonate or a phosphide such as hexamethylene phosphine amide or tri-n-butyl phosphonic acid may be used.

溶劑係由於腐蝕性低且容易處理,故較佳是以非質子性化合物,尤其是不具有鹵素原子之非質子性化合物為主成分之溶劑,非質子性化合物佔溶劑全體之比率,較佳為50至100質量%,尤佳為70至100質量%,更佳為90至100質量%。此外,前述非質子性化合物,由於容易溶解樹脂,故較佳為使用N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基吡咯啶酮等之醯胺。 Since the solvent is low in corrosiveness and easy to handle, it is preferably a solvent which is an aprotic compound, particularly an aprotic compound having no halogen atom, and a ratio of the aprotic compound to the entire solvent, preferably 50 to 100% by mass, particularly preferably 70 to 100% by mass, more preferably 90 to 100% by mass. Further, since the aprotic compound is easily dissolved in the resin, it is preferably N,N-dimethylformamide, N,N-dimethylacetamide or N-methylpyrrolidone. amine.

此外,溶劑係由於容易溶解樹脂,故較佳是以偶極矩為3至5的化合物為主成分之溶劑,偶極矩為3至5的化合物佔溶劑全體之比率,較佳為50至100質量%,尤佳為70至100質量%,更佳為90至100質量%,前述非質子性化合物,較佳係使用偶極矩為3至5的化合物。 Further, since the solvent is easily dissolved in the resin, it is preferably a solvent containing a compound having a dipole moment of 3 to 5 as a main component, and a compound having a dipole moment of 3 to 5 is a ratio of the entire solvent, preferably 50 to 100. The mass %, particularly preferably from 70 to 100% by mass, more preferably from 90 to 100% by mass, is preferably a compound having a dipole moment of from 3 to 5 as the aprotic compound.

此外,溶劑係由於容易除去,故較佳是以1 大氣壓時的沸點為220℃以下之化合物作為主成分之溶劑,1大氣壓時的沸點為220℃以下之化合物佔溶劑全體之比率,較佳為50至100質量%,尤佳為70至100質量%,更佳為90至100質量%,前述非質子性化合物,較佳係使用1大氣壓時的沸點為220℃以下之化合物。 Further, since the solvent is easily removed, it is preferably 1 A solvent having a boiling point of 220 ° C or less at atmospheric pressure as a main component, and a compound having a boiling point of 220 ° C or less at 1 atm. as a whole of the solvent, preferably 50 to 100% by mass, particularly preferably 70 to 100% by mass. More preferably, it is 90 to 100% by mass, and the aprotic compound is preferably a compound having a boiling point of 220 ° C or less at 1 atm.

液狀組成物中之樹脂的含量,相對於樹脂及溶劑的合計量,一般為5至60質量%,較佳為10至50質量%,尤佳為15至45質量%,可適當地調整成可得到期望黏度的液狀組成物。 The content of the resin in the liquid composition is usually from 5 to 60% by mass, preferably from 10 to 50% by mass, particularly preferably from 15 to 45% by mass, based on the total amount of the resin and the solvent, and can be appropriately adjusted. A liquid composition having a desired viscosity can be obtained.

液狀組成物的調製,較佳係藉由將無機填料及依需要的其他成分,分散於在溶劑中溶解有樹脂及依需要的其他成分所成之溶液中而進行。無機填料係可藉由球磨機、三輥機、離心攪拌機、珠磨機等,一邊粉碎一邊分散於前述溶液。 The preparation of the liquid composition is preferably carried out by dispersing the inorganic filler and other components as needed in a solution in which a resin and other components as needed are dissolved in a solvent. The inorganic filler can be dispersed in the solution while being pulverized by a ball mill, a three-roll mill, a centrifugal mixer, a bead mill or the like.

將液狀組成物塗佈於支撐體之方法,例如可列舉出輥塗佈法、棒塗佈法、網版印刷法、模頭塗佈法及缺角輪塗佈法,可為連續式或分批式(單板式)。 Examples of the method of applying the liquid composition to the support include a roll coating method, a bar coating method, a screen printing method, a die coating method, and a slanting wheel coating method, and may be continuous or Batch type (single board).

塗膜的乾燥較佳係藉由從塗膜使溶劑蒸發而進行。當使用金屬箔及金屬板以外的支撐體作為支撐體,使形成於支撐體上之塗膜乾燥,並藉由熱壓合等,將所得之乾燥膜從支撐體轉印至金屬箔或金屬板時,較佳以使溶劑的一部分殘存於乾燥膜中之方式來進行。此時,乾燥膜中的溶劑量,較佳為1至25質量%。乾燥溫度一般為50至180℃,較佳為80至150℃。 Drying of the coating film is preferably carried out by evaporating the solvent from the coating film. When a support other than the metal foil and the metal plate is used as a support, the coating film formed on the support is dried, and the obtained dried film is transferred from the support to the metal foil or the metal plate by thermocompression bonding or the like. In this case, it is preferred to carry out a part of the solvent remaining in the dried film. At this time, the amount of the solvent in the dried film is preferably from 1 to 25% by mass. The drying temperature is usually from 50 to 180 ° C, preferably from 80 to 150 ° C.

形成於支撐體上之乾燥膜或轉印至金屬箔或金屬板之乾燥膜,當使用熱塑性樹脂作為樹脂時,較佳係進行熱處理,藉此,可調節其分子量及結晶化度,而得到黏著性或導熱性優異之絕緣膜。熱處理係在氮氣等之惰性氣體環境下,一般於250至350℃,較佳於270至320℃進行。 The dried film formed on the support or the dried film transferred to the metal foil or the metal plate is preferably subjected to heat treatment when a thermoplastic resin is used as the resin, whereby the molecular weight and the degree of crystallization can be adjusted to obtain adhesion. An insulating film excellent in properties or thermal conductivity. The heat treatment is carried out under an inert gas atmosphere such as nitrogen, generally at 250 to 350 ° C, preferably at 270 to 320 ° C.

當如此做法而得到金屬箔與絕緣層之積層中間體時,如前述(A)所述,以該絕緣層面作為貼合面,並藉由熱壓合等將該積層中間體與金屬板的粗面貼合,藉此,可得到本發明之積層板。此外,在以金屬板的粗面作為貼合面而得到金屬板與絕緣層之積層中間體時,如前述(B)所述,以其絕緣層面作為貼合面,並藉由熱壓合等將該積層中間體與金屬箔貼合,藉此,可得到本發明之積層板。此外,在將形成於支撐體上之絕緣層從支撐體剝離而得到絕緣薄膜時,如前述(C)所述,以金屬板的粗面作為貼合面,以金屬板與金屬箔夾持該絕緣薄膜並藉由熱壓合等來貼合此等,藉此可得到本發明之積層板。 When the laminated intermediate of the metal foil and the insulating layer is obtained in this way, as described in the above (A), the insulating layer is used as a bonding surface, and the laminated intermediate body and the metal plate are thickened by thermocompression bonding or the like. The laminated sheets of the present invention can be obtained by surface bonding. In addition, when the laminated surface of the metal plate and the insulating layer is obtained by using the rough surface of the metal plate as the bonding surface, as described in the above (B), the insulating layer is used as the bonding surface, and by thermocompression bonding or the like. The laminated intermediate is bonded to a metal foil, whereby the laminated board of the present invention can be obtained. Further, when the insulating layer formed on the support is peeled off from the support to obtain an insulating film, as described in the above (C), the rough surface of the metal plate is used as a bonding surface, and the metal plate and the metal foil are sandwiched between the metal plate and the metal foil. The insulating film is bonded to the insulating film by heat pressing or the like, whereby the laminated board of the present invention can be obtained.

從如此做法所得到之積層板,使其金屬箔進行圖案化而形成電路圖案,依需要而進行切斷加工、開孔加工般之鑿穿加工、彎曲加工等之加工,藉此得到金屬基底電路基板。金屬箔的圖案化,例如可在金屬箔上形成遮罩圖案,並使金屬箔的露出部以蝕刻進行除去。 From the laminated board obtained in this way, the metal foil is patterned to form a circuit pattern, and if necessary, a cutting process such as a cutting process or a hole drilling process, a bending process, or the like is performed, thereby obtaining a metal base circuit. Substrate. For the patterning of the metal foil, for example, a mask pattern can be formed on the metal foil, and the exposed portion of the metal foil can be removed by etching.

實施例 Example [液晶聚酯之流動起始溫度的測定] [Determination of Flow Starting Temperature of Liquid Crystal Polyester]

使用熔流試驗機(島津製作所股份有限公司的「CFT-500型」),將液晶聚酯約2g裝填於安裝有具有內徑1mm及長度10mm的噴嘴之模頭之壓缸,一邊在9.8MPa(100kg/cm2)的荷重下以4℃/分的速度升溫,一邊使液晶聚酯熔融,從噴嘴中擠壓出,並測定顯示4800Pa‧s(48000P)的黏度之溫度。 Using a melt flow tester ("CFT-500 type" of Shimadzu Corporation,), about 2 g of liquid crystal polyester was loaded on a cylinder equipped with a die having a nozzle having an inner diameter of 1 mm and a length of 10 mm, while being at 9.8 MPa. The temperature was raised at a rate of 4 ° C /min under a load of (100 kg / cm 2 ), and the liquid crystal polyester was melted, extruded from a nozzle, and a temperature at which a viscosity of 4800 Pa ‧ (48000 P) was measured was measured.

[液晶聚酯溶液之黏度的測定] [Determination of Viscosity of Liquid Crystalline Polyester Solution]

使用B型黏度計(東機產業股份有限公司的「TVL-20型」),藉由No.21的轉子,以旋轉數20rpm測定。 Using a B-type viscometer ("TVL-20 type" of Toki Sangyo Co., Ltd.), the rotor of No. 21 was measured at a number of revolutions of 20 rpm.

[金屬板的面之十點平均粗糙度的測定] [Determination of ten-point average roughness of the surface of a metal plate]

使用表面粗糙度測定裝置(KLA Tencor股份有限公司,計算規格JIS B0601-1994),依據JIS B0601:1994,於測定速度:5μm/秒、評估長度:1.0mm的條件下測定。 Using a surface roughness measuring device (KLA Tencor Co., Ltd., calculation standard JIS B0601-1994), it was measured under the conditions of a measurement speed: 5 μm/sec and an evaluation length: 1.0 mm in accordance with JIS B0601:1994.

[金屬板] [Metal plate]

金屬板係使用:藉由噴砂處理,使藉壓延法所得之雙面為鏡面(壓延方向的十點平均粗糙度:1.2μm、垂直於壓延方向之方向的十點平均粗糙度:2.4μm)且厚度為1.0mm之鋁合金板之一面粗面化所得到之金屬板,一面為具有第1表所示的十點平均粗糙度之粗面,且另一面為鏡面之厚度1.0mm的金屬板(1)至(4)。此外,直接使用前述鋁合金板作為金屬板(5)。 For the use of a metal plate: by means of sandblasting, the double-sided surface obtained by the calendering method is mirror-finished (ten-point average roughness in the rolling direction: 1.2 μm, ten-point average roughness in the direction perpendicular to the rolling direction: 2.4 μm) A metal plate obtained by roughening one surface of an aluminum alloy plate having a thickness of 1.0 mm is a rough surface having a ten-point average roughness shown in Table 1 on one side, and a metal plate having a mirror surface thickness of 1.0 mm on the other side ( 1) to (4). Further, the aforementioned aluminum alloy plate was directly used as the metal plate (5).

[鑿穿加工性] [Chiseling processability]

使用鋁合金板用的總鑿穿模,藉由模壓機(Aida Engineering股份有限公司的「80 Ton Press」),於夾持具壓力20kN、脫模力59kN、模壓速度60SPN的條件下對積層板進行鑿穿加工後,以光學顯微鏡來確認出該切削面的絕緣層是否產生缺損。 The total chiseling die for the aluminum alloy plate was laminated by a molding machine ("80 Ton Press" of Aida Engineering Co., Ltd.) under the conditions of a clamping pressure of 20 kN, a releasing force of 59 kN, and a molding speed of 60 SPN. After the board was subjected to the chiseling process, it was confirmed by an optical microscope whether or not the insulating layer of the cutting surface was defective.

[彎曲加工性] [bending workability]

藉由蝕刻來去除被切斷為10mm×30mm的尺寸之積層板的金屬箔,並以絕緣層作為外側,以使彎曲部成為直徑15mm之方式將所得之金屬板與絕緣層之積層體彎曲加工成180°後,以目視來觀察絕緣層是否從金屬板產生剝離。 The metal foil of the laminated board cut into a size of 10 mm × 30 mm was removed by etching, and the laminated body of the obtained metal plate and the insulating layer was bent by using the insulating layer as the outer side so that the bent portion became 15 mm in diameter. After 180°, it was visually observed whether or not the insulating layer was peeled off from the metal plate.

[絕緣層的散熱性] [The heat dissipation of the insulating layer]

藉由蝕刻來部分地去除被切斷成30mm×40mm的尺寸之積層板的金屬箔,而形成14mm×10mm的島部。使用焊錫將電晶體(東芝股份有限公司的「C2233」)安裝於該島 部,將所得之附有電晶體的積層板,以使金屬板介由聚矽氧滑脂層而與水冷卻裝置的冷卻面相對向之方式安裝於水冷卻裝置。接著將30W的電力P供給至電晶體,測定電晶體的溫度T1與水冷卻裝置之冷卻面的溫度T2,並以溫度T1與溫度T2的差T1-T2對電力P之比的值(T1-T2)/P作為熱阻。 The metal foil of the laminate cut into a size of 30 mm × 40 mm was partially removed by etching to form an island portion of 14 mm × 10 mm. Mounting the transistor ("C2233" of Toshiba Co., Ltd.) to the island using solder In the section, the obtained laminated plate with the transistor is attached to the water cooling device so that the metal plate is opposed to the cooling surface of the water cooling device via the polyoxygen oxide grease layer. Next, 30 W of power P is supplied to the transistor, and the temperature T1 of the transistor and the temperature T2 of the cooling surface of the water-cooling device are measured, and the ratio of the difference T1-T2 between the temperature T1 and the temperature T2 to the power P (T1- T2)/P acts as a thermal resistance.

實施例1及2以及比較例1至3 Examples 1 and 2 and Comparative Examples 1 to 3 [液晶聚酯的製造] [Manufacture of Liquid Crystal Polyester]

將6-羥基-2-萘甲酸1976g(10.5莫耳)、4-羥基乙腈1474g(9.75莫耳)、間苯二甲酸1620g(9.75莫耳)及乙酸酐2374g(23.25莫耳),裝入於具備有攪拌裝置、扭矩計、氮氣導入管、溫度計及迴流冷卻器之反應器中,以氮氣取代反應器內的氣體後,於氮氣迴流下,一邊攪拌一邊於15分鐘內從室溫升溫至150℃,以150℃迴流3小時。接著,一邊餾除副產物的乙酸及未反應的乙酸酐,一邊於2小時50分鐘內從150℃升溫至300℃,於300℃保持1小時後,從反應器中取出內容物,並冷卻至室溫。以粉碎機將所得之固形物予以粉碎,而得到粉末狀的預聚物。該預聚物的流動起始溫度為235℃。接著,於氮氣環境下,將該預聚物於6小時內從室溫升溫至223℃,於223℃保持3小時並藉此進行固相聚合後,進行冷卻而得到粉末狀的液晶聚酯。該液晶聚酯的流動起始溫度為270℃。 6-hydroxy-2-naphthoic acid 1976 g (10.5 mol), 4-hydroxyacetonitrile 1474 g (9.75 mol), isophthalic acid 1620 g (9.75 mol) and acetic anhydride 2374 g (23.25 mol) were charged in A reactor equipped with a stirring device, a torque meter, a nitrogen gas introduction tube, a thermometer, and a reflux condenser, and replacing the gas in the reactor with nitrogen gas, and then raising the temperature from room temperature to 150 in 15 minutes while stirring under nitrogen gas under reflux. °C, reflux at 150 ° C for 3 hours. Next, while distilling off by-product acetic acid and unreacted acetic anhydride, the temperature was raised from 150 ° C to 300 ° C in 2 hours and 50 minutes, and after maintaining at 300 ° C for 1 hour, the contents were taken out from the reactor and cooled to Room temperature. The obtained solid matter was pulverized by a pulverizer to obtain a powdery prepolymer. The prepolymer had a flow initiation temperature of 235 °C. Next, the prepolymer was heated from room temperature to 223 ° C in 6 hours under a nitrogen atmosphere, and maintained at 223 ° C for 3 hours to carry out solid phase polymerization, followed by cooling to obtain a powdery liquid crystal polyester. The liquid crystal polyester had a flow initiation temperature of 270 °C.

[液晶聚酯溶液的調製] [Modulation of Liquid Crystal Polyester Solution]

將液晶聚酯2200g加入於N,N-二甲基乙醯胺7800g, 於100℃加熱2小時,得到液晶聚酯溶液。該溶液的黏度為400cP。 2200 g of liquid crystal polyester was added to 7800 g of N,N-dimethylacetamide. The mixture was heated at 100 ° C for 2 hours to obtain a liquid crystal polyester solution. The viscosity of the solution was 400 cP.

[液狀組成物的調製] [Modulation of liquid composition]

將氮化硼及氧化鋁加入於液晶聚酯溶液,藉由離心攪拌脫泡機攪拌5分鐘,而得到液狀組成物。在此,液晶聚酯與氮化硼與氧化鋁之比率,以質量基準計,從各比重(液晶聚酯1.37g/cm3、氧化鋁3.98g/cm3、氮化硼2.28g/cm3)分別調整為液晶聚酯50體積%、氧化鋁25體積%、氮化硼25體積%。 Boron nitride and alumina were added to the liquid crystal polyester solution, and stirred by a centrifugal stirring deaerator for 5 minutes to obtain a liquid composition. Here, the ratio of the liquid crystal polyester to the boron nitride to the alumina is based on the specific gravity (liquid crystal polyester 1.37 g/cm 3 , alumina 3.98 g/cm 3 , boron nitride 2.28 g/cm 3 ). The temperature was adjusted to 50% by volume of the liquid crystal polyester, 25% by volume of the alumina, and 25% by volume of the boron nitride.

[銅箔與絕緣層之積層中間體的製造] [Manufacture of laminated intermediates of copper foil and insulating layer]

以該塗膜的厚度成為約90μm之方式將液狀組成物塗佈於厚度100μm的聚酯薄膜後,於100℃乾燥20分鐘。將所得之聚酯薄膜與乾燥膜之積層中間體,以使乾燥膜與銅箔接觸之方式與厚度35μm的銅箔疊合,通過被加熱至150℃之一對熱輥間,將乾燥膜與銅箔熱壓合。接著,剝離聚酯薄膜,於290℃對所得之銅箔與乾燥膜之積層中間體進行3小時的熱處理,而得到銅箔與絕緣層之積層中間體。 The liquid composition was applied to a polyester film having a thickness of 100 μm so that the thickness of the coating film was about 90 μm, and then dried at 100 ° C for 20 minutes. The laminated intermediate film of the obtained polyester film and the dried film is laminated with a copper foil having a thickness of 35 μm in such a manner that the dried film is in contact with the copper foil, and is heated to a temperature between 150 ° C and the hot roll to dry the film. The copper foil is thermocompression bonded. Next, the polyester film was peeled off, and the obtained intermediate layer of the copper foil and the dried film was heat-treated at 290 ° C for 3 hours to obtain a laminated intermediate of the copper foil and the insulating layer.

[積層板的製造] [Manufacture of laminate]

將銅箔與絕緣層之積層中間體與金屬板疊合。此時,當使用金屬板(1)至(4)作為金屬板時,以使金屬板的粗面接觸於絕緣層,當使用金屬板(5)作為金屬板時,以使金屬板之一面接觸於絕緣層。接著,一邊施加20MPa的壓力一邊於340℃進行20分鐘的熱處理,以將絕緣層與金屬板熱壓合。對所得之積層板進行鑿穿加工性及彎曲加工性的評 估,並測定絕緣層的熱阻,結果如第2表所示。 The laminated intermediate of the copper foil and the insulating layer is laminated with the metal plate. At this time, when the metal plates (1) to (4) are used as the metal plates, the rough faces of the metal plates are brought into contact with the insulating layer, and when the metal plates (5) are used as the metal plates, one side of the metal plates is brought into contact with each other. In the insulation layer. Next, heat treatment was performed at 340 ° C for 20 minutes while applying a pressure of 20 MPa to thermally press-bond the insulating layer to the metal plate. Evaluation of the chiseling process and bending workability of the obtained laminate The thermal resistance of the insulating layer was measured and measured, and the results are shown in Table 2.

Claims (7)

一種積層板,其係具有:藉壓延法所得之金屬板、設置在前述金屬板上且含有樹脂之絕緣層、以及設置在前述絕緣層上之金屬箔,該積層板之特徵為:前述金屬板係:接於前述絕緣層之面之壓延方向的十點平均粗糙度Rz(MD)及垂直於前述壓延方向之方向的十點平均粗糙度Rz(TD)分別獨立地為4至20μm,且前述Rz(TD)對前述Rz(MD)之比率(Rz(TD)/Rz(MD))為1.5以下之金屬板。 A laminated board comprising: a metal plate obtained by a rolling method, an insulating layer provided on the metal plate and containing a resin, and a metal foil provided on the insulating layer, the laminated board being characterized by: the metal plate The ten-point average roughness Rz (MD) of the rolling direction of the surface of the insulating layer and the ten-point average roughness Rz (TD) perpendicular to the direction of the rolling direction are each independently 4 to 20 μm, and the foregoing The ratio of Rz (TD) to the aforementioned Rz (MD) (Rz (TD) / Rz (MD)) is 1.5 or less. 如申請專利範圍第1項所述之積層板,其中前述樹脂為液晶聚酯。 The laminate according to claim 1, wherein the resin is a liquid crystal polyester. 如申請專利範圍第2項所述之積層板,其中前述液晶聚酯為具有以下述式(1)表示之重複單位、以下述式(2)表示之重複單位、及以下述式(3)表示之重複單位之液晶聚酯,(1)-O-Ar1-CO-(2)-CO-Ar2-CO-(3)-X-Ar3-Y-(Ar1表示伸苯基、伸萘基或伸聯苯基;Ar2及Ar3分別獨立地表示伸苯基、伸萘基、伸聯苯基或以下述式(4)表示之基;X及Y分別獨立地表示氧原子或亞胺基;位於以Ar1、Ar2或Ar3表示之前述基之氫原子,可分別獨立地被鹵素原子、烷基或芳基所置換)(4)-Ar4-Z-Ar6- (Ar4及Ar6分別獨立地表示伸苯基或伸萘基;Z表示氧原子、硫原子、羰基、磺醯基或亞烷基)。 The laminate according to the second aspect of the invention, wherein the liquid crystal polyester has a repeating unit represented by the following formula (1), a repeating unit represented by the following formula (2), and is represented by the following formula (3) The liquid crystal polyester of the repeating unit, (1)-O-Ar 1 -CO-(2)-CO-Ar 2 -CO-(3)-X-Ar 3 -Y- (Ar 1 represents a phenyl group, a stretch a naphthyl group or a biphenyl group; Ar 2 and Ar 3 each independently represent a phenylene group, a naphthyl group, a biphenyl group or a group represented by the following formula (4); and X and Y each independently represent an oxygen atom or An imino group; a hydrogen atom located in the aforementioned group represented by Ar 1 , Ar 2 or Ar 3 , which may be independently substituted by a halogen atom, an alkyl group or an aryl group) (4)-Ar 4 -Z-Ar 6 - (Ar 4 and Ar 6 each independently represent a phenyl or anthracene group; and Z represents an oxygen atom, a sulfur atom, a carbonyl group, a sulfonyl group or an alkylene group). 如申請專利範圍第3項所述之積層板,其中相對於構成前述液晶聚酯之全部重複單位的合計量,前述液晶聚酯具有以前述式(1)表示之重複單位30至80莫耳%、以前述式(2)表示之重複單位10至35莫耳%、及以前述式(3)表示之重複單位10至35莫耳%之液晶聚酯。 The laminate according to claim 3, wherein the liquid crystal polyester has a repeating unit represented by the above formula (1) of 30 to 80 mol% with respect to a total of all repeating units constituting the liquid crystal polyester. A liquid crystal polyester having a repeating unit of 10 to 35 mol% represented by the above formula (2) and a repeating unit of 10 to 35 mol% represented by the above formula (3). 如申請專利範圍第3或4項所述之積層板,其中X及/或Y分別為亞胺基。 The laminate according to claim 3, wherein X and/or Y are each an imine group. 如申請專利範圍第1至5項中任一項所述之積層板,其中前述絕緣層為進一步包含選自由氧化鋁、氧化矽、氮化硼及氮化鋁所組成之群的至少1種無機填料之絕緣層。 The laminate according to any one of claims 1 to 5, wherein the insulating layer further comprises at least one inorganic selected from the group consisting of alumina, cerium oxide, boron nitride, and aluminum nitride. Insulation of the filler. 一種積層板的製造方法,其係如申請專利範圍第1至6項中任一項所述之積層板的製造方法,其具有:藉由使以壓延法所得之原料金屬板之至少一面進行粗面化,而得到前述金屬板之步驟。 A method for producing a laminated board according to any one of claims 1 to 6, which has a method of manufacturing at least one side of a raw metal sheet obtained by a calendering method. The step of obtaining the aforementioned metal plate is carried out.
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