TWI713593B - 使用脈衝雷射於玻璃基板形成孔之方法、及製造具有孔之玻璃基板之方法 - Google Patents
使用脈衝雷射於玻璃基板形成孔之方法、及製造具有孔之玻璃基板之方法 Download PDFInfo
- Publication number
- TWI713593B TWI713593B TW105131221A TW105131221A TWI713593B TW I713593 B TWI713593 B TW I713593B TW 105131221 A TW105131221 A TW 105131221A TW 105131221 A TW105131221 A TW 105131221A TW I713593 B TWI713593 B TW I713593B
- Authority
- TW
- Taiwan
- Prior art keywords
- glass substrate
- pulse laser
- diameter
- hole
- pulse
- Prior art date
Links
- 239000011521 glass Substances 0.000 title claims abstract description 201
- 239000000758 substrate Substances 0.000 title claims abstract description 198
- 238000000034 method Methods 0.000 title claims abstract description 79
- 230000001678 irradiating effect Effects 0.000 claims abstract description 8
- 238000010521 absorption reaction Methods 0.000 claims description 13
- 238000004519 manufacturing process Methods 0.000 claims description 10
- 238000010586 diagram Methods 0.000 description 8
- 230000005856 abnormality Effects 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 230000002745 absorbent Effects 0.000 description 2
- 239000002250 absorbent Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 230000001427 coherent effect Effects 0.000 description 1
- 238000000326 densiometry Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- SYHGEUNFJIGTRX-UHFFFAOYSA-N methylenedioxypyrovalerone Chemical compound C=1C=C2OCOC2=CC=1C(=O)C(CCC)N1CCCC1 SYHGEUNFJIGTRX-UHFFFAOYSA-N 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/08—Severing cooled glass by fusing, i.e. by melting through the glass
- C03B33/082—Severing cooled glass by fusing, i.e. by melting through the glass using a focussed radiation beam, e.g. laser
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/38—Removing material by boring or cutting
- B23K26/382—Removing material by boring or cutting by boring
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
- B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/073—Shaping the laser spot
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/40—Removing material taking account of the properties of the material involved
- B23K26/402—Removing material taking account of the properties of the material involved involving non-metallic material, e.g. isolators
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
- B23K2103/54—Glass
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Laser Beam Processing (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP??2015-196264 | 2015-10-01 | ||
| JP2015196264 | 2015-10-01 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201720768A TW201720768A (zh) | 2017-06-16 |
| TWI713593B true TWI713593B (zh) | 2020-12-21 |
Family
ID=58447445
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW105131221A TWI713593B (zh) | 2015-10-01 | 2016-09-29 | 使用脈衝雷射於玻璃基板形成孔之方法、及製造具有孔之玻璃基板之方法 |
Country Status (3)
| Country | Link |
|---|---|
| US (2) | US10442720B2 (enExample) |
| JP (2) | JP6274284B2 (enExample) |
| TW (1) | TWI713593B (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7195261B2 (ja) | 2017-10-04 | 2022-12-23 | ギガフォトン株式会社 | レーザ加工方法 |
| WO2019189225A1 (ja) * | 2018-03-26 | 2019-10-03 | Agc株式会社 | 拡散素子、照明モジュールおよび非球面レンズの加工方法 |
| US10470300B1 (en) * | 2018-07-24 | 2019-11-05 | AGC Inc. | Glass panel for wiring board and method of manufacturing wiring board |
| JP7139886B2 (ja) | 2018-10-30 | 2022-09-21 | Agc株式会社 | 孔を有するガラス基板の製造方法、およびアニール用ガラス積層体 |
| EP4021678A1 (en) * | 2019-08-30 | 2022-07-06 | Corning Incorporated | Method and apparatus for forming holes in brittle materials assisted by stress reduction through heating |
| WO2024034035A1 (ja) * | 2022-08-09 | 2024-02-15 | ギガフォトン株式会社 | レーザ加工方法、レーザ加工装置、及び電子デバイスの製造方法 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005088023A (ja) * | 2003-09-12 | 2005-04-07 | Seiko Epson Corp | 透明体の加工方法 |
| TW201527024A (zh) * | 2013-12-17 | 2015-07-16 | 康寧公司 | 可離子交換玻璃基板之雷射切割 |
Family Cites Families (34)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11217237A (ja) * | 1996-03-25 | 1999-08-10 | Nippon Sheet Glass Co Ltd | レーザ加工用ガラス基材及びレーザ加工方法 |
| JP3957010B2 (ja) * | 1997-06-04 | 2007-08-08 | 日本板硝子株式会社 | 微細孔を有するガラス基材 |
| JP2000301372A (ja) | 1999-04-23 | 2000-10-31 | Seiko Epson Corp | 透明材料のレーザ加工方法 |
| US7301621B2 (en) * | 1999-06-10 | 2007-11-27 | Aradigm Corporation | Method and device for non-destructive analysis of perforations in a material |
| JP3797068B2 (ja) * | 2000-07-10 | 2006-07-12 | セイコーエプソン株式会社 | レーザによる微細加工方法 |
| CN100443241C (zh) | 2001-04-02 | 2008-12-17 | 太阳诱电株式会社 | 利用激光的透光材料的加工方法 |
| JP2003226551A (ja) * | 2002-02-05 | 2003-08-12 | Nippon Sheet Glass Co Ltd | 微細孔を有するガラス板およびその製造方法 |
| JP4267240B2 (ja) * | 2002-02-22 | 2009-05-27 | 日本板硝子株式会社 | ガラス構造物の製造方法 |
| US7880117B2 (en) * | 2002-12-24 | 2011-02-01 | Panasonic Corporation | Method and apparatus of drilling high density submicron cavities using parallel laser beams |
| JP2004291026A (ja) * | 2003-03-27 | 2004-10-21 | Seiko Epson Corp | 脆性材料の穴あけ加工方法およびその装置 |
| JP2005118821A (ja) | 2003-10-16 | 2005-05-12 | Olympus Corp | 超短パルスレーザ加工方法 |
| US20050087522A1 (en) * | 2003-10-24 | 2005-04-28 | Yunlong Sun | Laser processing of a locally heated target material |
| EP1772245B1 (en) * | 2004-07-30 | 2014-05-07 | Mitsuboshi Diamond Industrial Co., Ltd. | Vertical crack forming method and vertical crack forming device in substrate |
| US7598167B2 (en) * | 2004-08-24 | 2009-10-06 | Micron Technology, Inc. | Method of forming vias in semiconductor substrates without damaging active regions thereof and resulting structures |
| US8394301B2 (en) * | 2006-06-02 | 2013-03-12 | Electro Scientific Industries, Inc. | Process for forming panel with an optically transmissive portion and products related thereto |
| US20080093775A1 (en) * | 2006-08-19 | 2008-04-24 | Colorado State University Research Foundation | Nanometer-scale ablation using focused, coherent extreme ultraviolet/soft x-ray light |
| KR101235617B1 (ko) * | 2007-10-16 | 2013-02-28 | 미쓰보시 다이야몬도 고교 가부시키가이샤 | 취성 재료 기판의 u자 형상 홈 가공 방법 및 이것을 사용한 제거 가공 방법 및 도려내기 가공 방법 및 모따기 방법 |
| SG194382A1 (en) * | 2008-09-30 | 2013-11-29 | Hoya Corp | Glass substrate for a magnetic disk and magnetic disk |
| US9346130B2 (en) * | 2008-12-17 | 2016-05-24 | Electro Scientific Industries, Inc. | Method for laser processing glass with a chamfered edge |
| JP5414467B2 (ja) * | 2009-11-09 | 2014-02-12 | キヤノン株式会社 | レーザ加工方法 |
| EP2594629A4 (en) * | 2010-07-16 | 2016-05-11 | Fujikura Ltd | BASE BODY AND METHOD FOR PRODUCING THE BASE BODY |
| JP2013209223A (ja) * | 2010-07-27 | 2013-10-10 | Asahi Glass Co Ltd | 半導体チップ実装用のガラス基板へのアブレーション加工の方法 |
| US20120168412A1 (en) * | 2011-01-05 | 2012-07-05 | Electro Scientific Industries, Inc | Apparatus and method for forming an aperture in a substrate |
| JP2013146780A (ja) * | 2012-01-23 | 2013-08-01 | Mitsuboshi Diamond Industrial Co Ltd | 脆性材料基板のレーザ加工方法 |
| CN104114506B (zh) * | 2012-02-29 | 2017-05-24 | 伊雷克托科学工业股份有限公司 | 加工强化玻璃的方法和装置及藉此制造的物品 |
| JP5896411B2 (ja) * | 2012-05-14 | 2016-03-30 | 国立研究開発法人産業技術総合研究所 | レーザー誘起背面式の透明基板微細加工を行う加工装置 |
| JP6238675B2 (ja) * | 2013-10-10 | 2017-11-29 | キヤノン株式会社 | レーザ加工方法及びインクジェットヘッドの製造方法 |
| US10017410B2 (en) * | 2013-10-25 | 2018-07-10 | Rofin-Sinar Technologies Llc | Method of fabricating a glass magnetic hard drive disk platter using filamentation by burst ultrafast laser pulses |
| US9517929B2 (en) * | 2013-11-19 | 2016-12-13 | Rofin-Sinar Technologies Inc. | Method of fabricating electromechanical microchips with a burst ultrafast laser pulses |
| US11053156B2 (en) * | 2013-11-19 | 2021-07-06 | Rofin-Sinar Technologies Llc | Method of closed form release for brittle materials using burst ultrafast laser pulses |
| US9687936B2 (en) * | 2013-12-17 | 2017-06-27 | Corning Incorporated | Transparent material cutting with ultrafast laser and beam optics |
| CN107207325A (zh) * | 2015-02-10 | 2017-09-26 | 日本板硝子株式会社 | 激光加工用玻璃以及使用其的带孔玻璃的制造方法 |
| WO2016160391A1 (en) * | 2015-03-27 | 2016-10-06 | Corning Incorporated | Gas permeable window and method of fabricating the same |
| US10366904B2 (en) * | 2016-09-08 | 2019-07-30 | Corning Incorporated | Articles having holes with morphology attributes and methods for fabricating the same |
-
2016
- 2016-09-27 US US15/276,990 patent/US10442720B2/en active Active
- 2016-09-28 JP JP2016190372A patent/JP6274284B2/ja active Active
- 2016-09-29 TW TW105131221A patent/TWI713593B/zh active
-
2017
- 2017-11-27 JP JP2017226440A patent/JP2018035067A/ja active Pending
-
2019
- 2019-08-06 US US16/533,242 patent/US20190359515A1/en not_active Abandoned
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005088023A (ja) * | 2003-09-12 | 2005-04-07 | Seiko Epson Corp | 透明体の加工方法 |
| TW201527024A (zh) * | 2013-12-17 | 2015-07-16 | 康寧公司 | 可離子交換玻璃基板之雷射切割 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20170096361A1 (en) | 2017-04-06 |
| US10442720B2 (en) | 2019-10-15 |
| TW201720768A (zh) | 2017-06-16 |
| JP2017066027A (ja) | 2017-04-06 |
| US20190359515A1 (en) | 2019-11-28 |
| JP6274284B2 (ja) | 2018-02-07 |
| JP2018035067A (ja) | 2018-03-08 |
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