TWI711816B - System and method for inspecting object - Google Patents

System and method for inspecting object Download PDF

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TWI711816B
TWI711816B TW104142460A TW104142460A TWI711816B TW I711816 B TWI711816 B TW I711816B TW 104142460 A TW104142460 A TW 104142460A TW 104142460 A TW104142460 A TW 104142460A TW I711816 B TWI711816 B TW I711816B
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reflection
analyzer
dark field
predefined parameter
light beam
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TW201629470A (en
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諾瑪 葛頓
伊泰 寇漢
阿米爾 提茲后瑞
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大陸商蘇州康代智能科技股份有限公司
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications

Abstract

A system for inspecting an object, the system may include a sensing module; a beam splitter; an objective lens; a bright field illumination module that is configured to generate a bright field beam of first predefined parameters and direct the bright field beam towards the beam splitter; a dark field illumination module that is configured to generate a first dark field beam of second predefined parameters and direct the first dark field beam towards the object; wherein there is a difference between the first predefined parameters and the second predefined parameters; wherein the beam splitter is configured to (a) reflect the bright field beam towards the object; (b) receive a reflectance of the bright field beam, (c) direct the reflectance of the bright field beam towards the objective lens; (d) receive a reflectance of the first dark field beam, (e) direct the reflectance of the first dark field beam towards the objective lens; wherein the objective lens is configured to direct the reflectance of the first dark field beam and the reflectance of the bright field beam towards the sensing module; and wherein the sensing module is configured to differentiate between the reflectance of the first dark field beam and the reflectance of the bright field beam based on the difference between the first predefined parameters and the second predefined parameters.

Description

一種檢驗物件的系統及方法 System and method for inspecting objects

本申請要求2014年12月18日提交的美國臨時專利62/093,477的優先權,其以引用的方式併入本文。 This application claims priority from U.S. Provisional Patent 62/093,477 filed on December 18, 2014, which is incorporated herein by reference.

本發明係有關於光學檢驗中的可分離的多個照射源。 The present invention relates to separable multiple illumination sources in optical inspection.

許多光學和視覺檢驗系統對被檢驗物件使用多個照射源。顯微鏡中的常見示例,AOI機器和驗證系統使用暗場源和明場源二者,其中暗場源從斜角或從側面照射物件,並且明場源從上方(即,與成像路徑同軸)照射物件。有時它們一起使用來形成具有寬的角度覆蓋範圍的均勻照明。一些其他時間,僅其中一個源被使用,以便顯示某些方面,例如,暗場照射只強調表面的不規則,而明場強調變色,諸如銅氧化。 Many optical and visual inspection systems use multiple illumination sources for the object being inspected. Common examples in microscopes, AOI machines and verification systems use both dark field sources and bright field sources, where the dark field source illuminates the object from an oblique angle or from the side, and the bright field source illuminates from above (ie, coaxial with the imaging path) object. Sometimes they are used together to form uniform illumination with wide angular coverage. At some other times, only one of the sources is used in order to show certain aspects, for example, dark field illumination only emphasizes surface irregularities, while bright field emphasizes discoloration, such as copper oxidation.

在另一個示例中,照射PCB層中的光亮的金屬導體形成高度依賴於入射光角度和局部表面法線方向的鏡面反射。明場光主要從導體的水平面上平坦的部分被反射,而暗場光主要從它的斜邊和由表面的不規則被反射。 In another example, the bright metal conductor illuminating the PCB layer forms a specular reflection that is highly dependent on the incident light angle and the local surface normal direction. Bright field light is mainly reflected from the flat part of the horizontal surface of the conductor, while dark field light is mainly reflected from its hypotenuse and irregularities on the surface.

因此遵循的是,存在包括在選擇性照射影像中的每一個中的、關於被檢驗物件的幾何形狀、形貌、材料和可能 的缺陷的潛在豐富資訊。 Therefore, it is followed that there are the geometric shapes, morphologies, materials and possibilities of the inspected object included in each of the selective illumination images. The potential rich information of the defects.

然而,為了最大化吞吐量且確保物件的完全覆蓋,AOI系統通常在單個掃描中同時使用全部照射源,丟失一些只來自選擇性照射影像的可用資訊。 However, in order to maximize throughput and ensure complete coverage of objects, AOI systems usually use all illumination sources at the same time in a single scan, losing some available information only from selective illumination images.

因此,對於AOI系統將有利的是,其能夠同時生成多個這樣的影像同時仍然執行僅單個掃描。 Therefore, it would be advantageous for an AOI system to be able to generate multiple such images simultaneously while still performing only a single scan.

可以提供系統和方法。 Can provide systems and methods.

該系統可以包括感測模組、分束器、物鏡、明場照射模組和暗場照射模組,該明場照射模組被配置為生成第一預定義參數的明場光束並將明場光束導向光學模組,該光學模組包括分束器和物鏡;該暗場照射模組被配置為生成第二預定義參數的第一暗場光束並且將第一暗場光束導向物件;其中第一預定義參數和第二預定義參數之間有差別;其中光學模組被配置為(a)朝向物件反射明場光束;(b)接收明場光束的反射,(c)接收第一暗場光束的反射,(d)將第一暗場光束的反射和明場光束的反射導向感測模組;並且其中感測模組被配置為基於第一預定義參數和第二預定義參數之間的差別區分第一暗場光束的反射和明場光束的反射。 The system may include a sensing module, a beam splitter, an objective lens, a bright field irradiation module, and a dark field irradiation module. The bright field irradiation module is configured to generate a bright field light beam with a first predefined parameter and A light beam guiding optical module, the optical module including a beam splitter and an objective lens; the dark field irradiation module is configured to generate a first dark field light beam with a second predefined parameter and guide the first dark field light beam to an object; There is a difference between a predefined parameter and a second predefined parameter; wherein the optical module is configured to (a) reflect the bright field beam toward the object; (b) receive the reflection of the bright field beam, (c) receive the first dark field The reflection of the light beam, (d) the reflection of the first dark field light beam and the reflection of the bright field light beam are directed to the sensing module; and wherein the sensing module is configured to be based on the difference between the first predefined parameter and the second predefined parameter The difference distinguishes the reflection of the first dark field beam and the reflection of the bright field beam.

該系統可以用於檢驗物件,該系統可以包括感測模組、分束器、物鏡、明場照射模組和暗場照射模組,該明場照射模組可以被配置為生成第一預定義參數的明場光束並且將該明場光束導向分束器;該暗場照射模組可以被配 置為生成第二預定義參數的第一暗場光束並且將該第一暗場光束導向物件;其中第一預定義參數和第二預定義參數之間可有差別;其中分束器可以被配置為(a)朝向物件反射明場光束;(b)接收明場光束的反射,(c)將明場光束的反射導向物鏡,(d)接收第一暗場光束的反射,(e)將第一暗場光束的反射導向物鏡;其中物鏡可以被配置為將第一暗場光束的反射和明場的光束的反射導向感測模組;並且其中感測模組可以被配置為基於第一預定義參數和第二預定義參數之間的差別而區分第一暗場光束的反射和明場光束的反射。 The system can be used to inspect an object. The system can include a sensing module, a beam splitter, an objective lens, a bright field illumination module, and a dark field illumination module. The bright field illumination module can be configured to generate a first predefined Parameters of the bright field beam and direct the bright field beam to the beam splitter; the dark field irradiation module can be configured Set to generate a first dark field beam with a second predefined parameter and direct the first dark field beam to an object; wherein there may be a difference between the first predefined parameter and the second predefined parameter; wherein the beam splitter can be configured (A) reflect the bright field beam toward the object; (b) receive the reflection of the bright field beam, (c) guide the reflection of the bright field beam to the objective lens, (d) receive the reflection of the first dark field beam, (e) The reflection of a dark field beam is guided to the objective lens; wherein the objective lens may be configured to guide the reflection of the first dark field beam and the reflection of the bright field beam to the sensing module; and wherein the sensing module may be configured to be based on the first preset The difference between the defined parameter and the second predefined parameter distinguishes the reflection of the first dark field beam from the reflection of the bright field beam.

感測模組可以包括偏振照相機,並且其中,對於偏振的第一預定義參數和第二預定義參數彼此不同。 The sensing module may include a polarization camera, and wherein the first predefined parameter and the second predefined parameter for polarization are different from each other.

感測模組可以包括照相機,分析器可在所述照相機之前,並且其中,對於偏振的第一預定義參數和第二預定義參數彼此不同。 The sensing module may include a camera, the analyzer may be in front of the camera, and wherein the first predefined parameter and the second predefined parameter for polarization are different from each other.

感測模組可以包括分析器;其中分析器可以包括至少第一類型和第二類型的多個分析器區域;其中第一類型的分析器區域經過明場光束的反射;並且其中第二類型的分析器區域經過第一暗場光束的反射。 The sensing module may include an analyzer; wherein the analyzer may include a plurality of analyzer regions of at least a first type and a second type; wherein the analyzer region of the first type is reflected by the bright field beam; and wherein the analyzer region of the second type The analyzer area is reflected by the first dark field beam.

多個分析器區域可以是條帶狀。 Multiple analyzer areas can be striped.

多個分析器區域可以是矩形。 Multiple analyzer areas can be rectangular.

分析器區域中的兩個或更多個分析器區域的形狀和/或大小可以彼此不同。 The shapes and/or sizes of two or more analyzer areas in the analyzer area may be different from each other.

暗場照射模組可以被配置為生成第三預定義參數的第二暗場光束並且將第二暗場光束導向物件;其中第三預定義參數與第一和第二預定義參數的每一個可以都不同;其中分束器還可以被配置為接收第二暗場光束的反射並且將第二暗場光束的反射導向分束器;其中物鏡還可以被配置為將第二暗場光束的反射導向感測模組;並且其中感測模組可以被配置為基於第一預定義參數、第二預定義參數和第三預定義參數之間的差別而區分第一暗場光束的反射、第二暗場光束的反射以及明場光束的反射。 The dark field illumination module can be configured to generate a second dark field beam of a third predefined parameter and direct the second dark field beam to an object; wherein each of the third predefined parameter and the first and second predefined parameters can be Are different; wherein the beam splitter can also be configured to receive the reflection of the second dark field beam and guide the reflection of the second dark field beam to the beam splitter; wherein the objective lens can also be configured to guide the reflection of the second dark field beam A sensing module; and wherein the sensing module can be configured to distinguish between the reflection of the first dark field beam and the second dark based on the difference between the first predefined parameter, the second predefined parameter, and the third predefined parameter The reflection of the field beam and the reflection of the bright field beam.

感測模組可以包括分析器;其中分析器可以包括至少第一類型和第二類型的多個分析器區域;其中第一類型的分析器區域使明場光束的反射通過;並且其中第二類型的分析器區域使第一暗場光束的反射通過。 The sensing module may include an analyzer; wherein the analyzer may include a plurality of analyzer areas of at least a first type and a second type; wherein the analyzer area of the first type passes the reflection of the bright field beam; and wherein the second type The analyzer area allows the reflection of the first dark field beam to pass through.

感測模組可以包括多個照相機、分配模組以及多個分析器,其中分析器可在每個照相機之前;並且其中分配模組可以被配置為將第一暗場光束的反射、第二暗場光束的反射以及明場光束的反射分配到多個分析器。 The sensing module may include a plurality of cameras, a distribution module, and a plurality of analyzers, wherein the analyzer may be in front of each camera; and wherein the distribution module may be configured to reflect the first dark field beam, the second dark The reflection of the field beam and the reflection of the bright field beam are distributed to multiple analyzers.

多個分析器中的每個分析器可以包括至少第一類型和第二類型的多個分析器區域;其中第一類型的分析器區域使明場光束的反射通過;並且其中第二類型的分析器區域使第一暗場光束的反射通過。 Each analyzer of the plurality of analyzers may include a plurality of analyzer regions of at least a first type and a second type; wherein the analyzer regions of the first type pass the reflection of the bright-field beam; and wherein the second type of analyzer The filter area allows the reflection of the first dark field beam to pass through.

多個分析器區域可以是條帶狀。 Multiple analyzer areas can be striped.

多個分析器區域可以是矩形。 Multiple analyzer areas can be rectangular.

分析器區域中的兩個或更多個分析器區域的形狀和/或大小彼此不同。 The shapes and/or sizes of two or more analyzer regions in the analyzer regions are different from each other.

多個分析器中的不同分析器可以被配置為使出自第一暗場光束的反射、第二暗場光束的反射以及明場光束的反射的不同的光束通過。 Different analyzers of the plurality of analyzers may be configured to pass different light beams from the reflection of the first dark field light beam, the reflection of the second dark field light beam, and the reflection of the bright field light beam.

該方法可以包括由明場照射模組生成第一預定義參數的明場光束並且將明場光束導向包括分束器和物鏡的光學模組;由暗場照射模組生成第二預定義參數的第一暗場光束並且將第一暗場光束導向物件;其中第一預定義參數和第二預定義參數之間有差別;由光學模組朝向物件反射明場光束;由光學模組接收明場光束的反射;由光學模組將明場光束的反射導向感測模組;由光學模組接收第一暗場光束的反射;由光學模組將第一暗場光束的反射導向感測模組;以及由感測模組基於第一預定義參數和第二預定義參數之間的差別來區分第一暗場光束的反射和明場光束的反射。 The method may include generating a brightfield beam with a first predefined parameter by a brightfield irradiation module and directing the brightfield beam to an optical module including a beam splitter and an objective lens; and generating a second predefined parameter by the darkfield irradiation module The first dark field beam and the first dark field beam are directed to the object; wherein there is a difference between the first predefined parameter and the second predefined parameter; the bright field beam is reflected by the optical module toward the object; the bright field is received by the optical module The reflection of the light beam; the reflection of the bright field beam is guided by the optical module to the sensing module; the reflection of the first dark field beam is received by the optical module; the reflection of the first dark field beam is guided by the optical module to the sensing module ; And the sensing module distinguishes the reflection of the first dark field beam from the reflection of the bright field beam based on the difference between the first predefined parameter and the second predefined parameter.

該方法可以包括由明場照射模組生成第一預定義參數的明場光束並且將明場光束導向分束器;由暗場照射模組生成第二預定義參數的第一暗場光束並且將第一暗場光束導向物件;其中第一預定義參數和第二預定義參數之間可以有差別;由分束器朝向物件反射明場光束;由分束器接收明場光束的反射;由分束器將明場光束的反射導向物鏡;由分束器接收第一暗場光束的反射;由分束器將第一暗場光束的反射導向物鏡;由物鏡將第一暗場光束的反射 和明場光束的反射導向感測模組;由感測模組基於第一預定義參數和第二預定義參數之間的差別來區分第一暗場光束的反射和明場光束的反射。 The method may include generating a bright field beam of a first predefined parameter by a bright field irradiation module and directing the bright field beam to a beam splitter; generating a first dark field beam of a second predefined parameter by the dark field irradiation module and transferring The first dark field beam is guided to the object; the first predefined parameter and the second predefined parameter can be different; the bright field beam is reflected by the beam splitter toward the object; the reflection of the bright field beam is received by the beam splitter; The beamer guides the reflection of the bright field beam to the objective lens; the beam splitter receives the reflection of the first dark field beam; the beam splitter guides the reflection of the first dark field beam to the objective lens; the objective lens reflects the first dark field beam And the reflection of the bright field beam is guided to the sensing module; the sensing module distinguishes the reflection of the first dark field beam from the reflection of the bright field beam based on the difference between the first predefined parameter and the second predefined parameter.

感測模組可包括偏振照相機,並且其中,對於偏振的第一預定義參數和第二預定義參數可以彼此不同。 The sensing module may include a polarization camera, and wherein the first predefined parameter and the second predefined parameter for polarization may be different from each other.

感測模組可包括照相機,分析器在照相機之前,並且其中對於偏振的第一預定義參數和第二預定義參數可彼此不同。 The sensing module may include a camera, the analyzer is in front of the camera, and wherein the first predefined parameter and the second predefined parameter for polarization may be different from each other.

感測模組可包括分析器;其中分析器可包括至少第一類型和第二類型的多個分析器區域;其中第一類型的分析器區域使明場光束的反射通過;並且其中第二類型的分析器區域使第一暗場光束的反射通過。 The sensing module may include an analyzer; wherein the analyzer may include a plurality of analyzer areas of at least a first type and a second type; wherein the analyzer area of the first type passes the reflection of the bright field beam; and wherein the second type The analyzer area allows the reflection of the first dark field beam to pass through.

多個分析器區域可以是條帶狀。 Multiple analyzer areas can be striped.

多個分析器區域可以是矩形。 Multiple analyzer areas can be rectangular.

在方法中,其中分析器區域中的兩個或更多個分析器區域的形狀和/或大小彼此不同。 In the method, wherein the shapes and/or sizes of two or more analyzer regions in the analyzer regions are different from each other.

該方法可以包括由暗場照射模組生成第三預定義參數的第二暗場光束;將第二暗場光束導向物件;其中第三預定義參數與第一和第二預定義參數中的每一個之間可以有差別;由分束器接收第二暗場光束的反射;將第二暗場光束的反射導向分束器;由物鏡將第二暗場光束的反射導向感測模組;以及,由感測模組基於第一預定義參數、第二預定義參數以及第三預定義參數之間的差別來區分第一暗 場光束的反射、第二暗場光束的反射和明場光束的反射。 The method may include generating a second dark-field beam with a third predefined parameter by a dark-field illumination module; directing the second dark-field beam to an object; wherein the third predefined parameter and each of the first and second predefined parameters There may be a difference between one; the reflection of the second dark field beam is received by the beam splitter; the reflection of the second dark field beam is guided to the beam splitter; the reflection of the second dark field beam is guided to the sensing module by the objective lens; and , The sensing module distinguishes the first dark based on the difference between the first predefined parameter, the second predefined parameter, and the third predefined parameter The reflection of the field beam, the reflection of the second dark field beam, and the reflection of the bright field beam.

感測模組可包括分析器;其中分析器可包括至少第一類型和第二類型的多個分析器區域;其中第一類型的分析器區域使明場光束的反射通過;並且其中第二類型的分析器區域使第一暗場光束的反射通過。 The sensing module may include an analyzer; wherein the analyzer may include a plurality of analyzer areas of at least a first type and a second type; wherein the analyzer area of the first type passes the reflection of the bright field beam; and wherein the second type The analyzer area allows the reflection of the first dark field beam to pass through.

感測模組可以包括多個照相機、分配模組以及多個分析器,其中分析器在每個照相機之前;並且其中該方法可以包括由分配模組將第一暗場光束的反射、第二暗場光束的反射以及明場光束的反射分配到多個分析器。 The sensing module may include a plurality of cameras, a distribution module, and a plurality of analyzers, where the analyzer is in front of each camera; and wherein the method may include the distribution module reflecting the first dark field beam and the second dark field. The reflection of the field beam and the reflection of the bright field beam are distributed to multiple analyzers.

在方法中,其中多個分析器中的每個分析器可以包括至少第一類型和第二類型的多個分析器區域;其中第一類型的分析器區域使明場光束的反射通過;並且其中第二類型的分析器區域使第一暗場光束的反射通過。 In the method, wherein each of the plurality of analyzers may include a plurality of analyzer regions of at least a first type and a second type; wherein the analyzer regions of the first type pass the reflection of the bright field beam; and wherein The second type of analyzer area passes the reflection of the first dark field beam.

多個分析器區域可以是條帶狀。 Multiple analyzer areas can be striped.

多個分析器區域可以是矩形。 Multiple analyzer areas can be rectangular.

分析器區域中的兩個或更多個分析器區域的形狀和/或大小可以彼此不同。 The shapes and/or sizes of two or more analyzer areas in the analyzer area may be different from each other.

該方法還可以包括由多個分析器中的不同分析器使出自第一暗場光束的反射、第二暗場光束的反射以及明場光束的反射之外的不同的光束通過。 The method may further include passing different light beams other than the reflection of the first dark field light beam, the reflection of the second dark field light beam, and the reflection of the bright field light beam by different analyzers of the plurality of analyzers.

1:桌子或載物台 1: table or stage

2:物件、物品 2: Objects, articles

3:照相機 3: camera

4:物鏡 4: Objective lens

5:明場源、明場光源 5: Bright field source, bright field light source

6:分束器 6: beam splitter

8:紅色濾色器、明場修調節器 8: Red color filter, bright field repair adjuster

15、16、18:照相機 15, 16, 18: camera

17:分析器、液晶調製器 17: Analyzer, LCD modulator

71:暗場源、第一暗場光源 71: Dark field source, first dark field light source

72:暗場源、第二暗場光源 72: dark field source, second dark field light source

91:濾光器、第一暗場濾光器或偏光器 91: filter, first dark field filter or polarizer

92:濾光器、第二暗場濾光器或偏光器 92: filter, second dark field filter or polarizer

101:明場光束、第一明場光束 101: Brightfield beam, first brightfield beam

102:暗場光束、第一暗場光束 102: Dark field beam, first dark field beam

103:暗場光束、第二暗場光束 103: Dark field beam, second dark field beam

111、112、113:反射 111, 112, 113: reflection

141:影像處理器 141: image processor

142:控制器 142: Controller

151:第一附加分束器 151: The first additional beam splitter

152:第二附加分束器 152: second additional beam splitter

171、172、173、200、210:分析器 171, 172, 173, 200, 210: analyzer

201、202、203、204: 細長條帶、盒 201, 202, 203, 204: Slim strips, boxes

211、212、213、214:矩形區域、盒 211, 212, 213, 214: rectangular area, box

400:方法 400: method

410~460:步驟 410~460: steps

從以下結合附圖的詳細描述中,將會更全面地理解和領會本發明,在附圖中: 圖1A示出了根據本發明的實施例的檢驗系統;圖1B示出了根據本發明的實施例的檢驗系統;圖1C示出了根據本發明的實施例的檢驗系統;圖2示出了根據本發明的各個實施例的分析器;以及圖3示出了根據本發明的實施例的方法。 From the following detailed description in conjunction with the accompanying drawings, the present invention will be more fully understood and understood, in the accompanying drawings: Figure 1A shows an inspection system according to an embodiment of the invention; Figure 1B shows an inspection system according to an embodiment of the invention; Figure 1C shows an inspection system according to an embodiment of the invention; Figure 2 shows An analyzer according to various embodiments of the present invention; and FIG. 3 shows a method according to an embodiment of the present invention.

因為實現本發明的裝置在大多數情況下由本領域技術人員所熟知的電子組件和電路組成,因此為了本發明的基本概念的理解和領會並且為了不混淆或轉移本發明的教導,相比於如上所說明的所考慮的必要性將不在任何更大程度上解釋電路細節。 Because the device for implementing the present invention is composed of electronic components and circuits well known to those skilled in the art in most cases, for the understanding and understanding of the basic concepts of the present invention and in order not to confuse or transfer the teachings of the present invention, compared to the above The explained necessity of consideration will not explain the circuit details to any greater extent.

在以下說明書中,將參考本發明的實施例的具體示例來對本發明進行描述。然而,明顯的是,在不背離如在所附申請專利範圍中闡述的本發明的廣泛的精神和範圍的情況下可以在其中做出各種修改和改變。 In the following specification, the present invention will be described with reference to specific examples of embodiments of the present invention. However, it is obvious that various modifications and changes can be made therein without departing from the broad spirit and scope of the present invention as set forth in the scope of the appended application.

術語“和/或”的意思是另外的或可選的。尤其是

Figure 104142460-A0305-02-0010-7
A和/或B的意思是只是A、只是B或者是A和B二者。 The term "and/or" means additional or optional. especially
Figure 104142460-A0305-02-0010-7
A and/or B means just A, just B, or both A and B.

提供了可以將不同的光學性質(例如,使用濾色器或LED的顏色)分配到各種照射源,並且使用能夠在這些性質之間進行區分的照相機(例如,彩色照相機)的方法和系統。 Provided are methods and systems that can assign different optical properties (for example, colors using color filters or LEDs) to various illumination sources, and use cameras (for example, color cameras) capable of distinguishing between these properties.

在圖1A、1B和1C中,分束器被示出為放置在物件和物鏡之間。這不一定必須如此並且物鏡可以放置在物件和分 束器之間。分束器和物鏡可以形成光學模組。 In Figures 1A, 1B, and 1C, the beam splitter is shown placed between the object and the objective lens. This does not have to be the case and the objective lens can be placed on the object and Between the beam device. The beam splitter and the objective lens can form an optical module.

在一個實施例中,如在圖1A中所示,RGB彩色線掃描照相機3掃描物品2,其中還有三個線照射源──來自側面的兩個暗場源71和72,以及通過分束器6照明的明場源5。用紅色濾色器8覆蓋明場源5,而用綠色濾光器91和92分別覆蓋暗場源71和72。這裡通過舉例的方式來選擇顏色並且可以按照對應用的適合性來不同地選擇顏色。 In one embodiment, as shown in FIG. 1A, the RGB color line scan camera 3 scans the article 2, which also has three line illumination sources—two dark field sources 71 and 72 from the side, and a beam splitter 6 Bright field source for illumination 5. The bright field source 5 is covered with a red color filter 8, and the dark field sources 71 and 72 are covered with green filters 91 and 92, respectively. Here, the color is selected by way of example, and the color can be selected differently according to the suitability for the application.

照相機輸出RGB彩色影像以用於分析。每個輸出像素的顏色構成表示來自不同選定的顏色的光源中的每一個的反射光的量和平衡。 The camera outputs RGB color images for analysis. The color composition of each output pixel represents the amount and balance of reflected light from each of the light sources of different selected colors.

可選地,濾光器91和92還可以是不同的顏色,如,綠色和藍色。這允許進一步區分從右側反射的光和從左側反射的光,從而提供每個像素位置中的關於表面取向的更多資訊。 Optionally, the filters 91 and 92 may also be of different colors, such as green and blue. This allows further differentiation between light reflected from the right and light reflected from the left, thereby providing more information about the surface orientation in each pixel location.

在圖1A-1C中,存在對各個反射的引用。這些反射光譜可以是鏡面反射和/或漫反射。反射的類型(漫反射或鏡面反射)可以取決於被照射物件的範圍的區域的取向。例如,圖1A-1C示出了大體上水平的範圍的照射。在這種情況中,給出明場源和暗場源的照射角度,物鏡4收集明場光束101的鏡面反射並且可以接收暗場光束102和103的漫反射。 In Figures 1A-1C, there are references to individual reflections. These reflection spectra can be specular reflection and/or diffuse reflection. The type of reflection (diffuse or specular) may depend on the orientation of the area of the range of the illuminated object. For example, Figures 1A-1C show a substantially horizontal range of illumination. In this case, given the illumination angles of the bright field source and the dark field source, the objective lens 4 collects the specular reflection of the bright field light beam 101 and can receive the diffuse reflection of the dark field light beams 102 and 103.

例如,如果被照射的範圍包括具有大約45度的取向的區域,則物鏡將收集第一暗場光束102的鏡面反射並且可以接收明場光束101和第二暗場光束103的漫反射。 For example, if the irradiated range includes an area having an orientation of approximately 45 degrees, the objective lens will collect the specular reflection of the first dark field beam 102 and can receive the diffuse reflection of the bright field beam 101 and the second dark field beam 103.

例如,如果被照射的範圍包括具有大約負45度的取向的區域,則物鏡將收集第二暗場光束103的鏡面反射並且可以接收明場光束101和第一暗場光束102的漫反射。 For example, if the illuminated range includes an area having an orientation of approximately minus 45 degrees, the objective lens will collect the specular reflection of the second dark field beam 103 and can receive the diffuse reflection of the bright field beam 101 and the first dark field beam 102.

在圖1A中,檢驗的物件(物件)被表示為2,並且系統包括: In Figure 1A, the inspected object (object) is represented as 2, and the system includes:

a.用於支撐和/或移動物件2的桌子或載物台1。 a. A table or stage 1 for supporting and/or moving an object 2.

b.包括明場光源5和明場修調節器(諸如,濾光器或偏光器和/或減速器)8的明場照射模組。 b. A brightfield illumination module including a brightfield light source 5 and a brightfield modifier (such as a filter or a polarizer and/or a reducer) 8.

c.包括第一暗場光源71、第一暗場濾光器或偏光器91、第二暗場光源72、第二暗場濾光器或偏光器92的暗場照射模組。 c. A dark field illumination module including a first dark field light source 71, a first dark field filter or polarizer 91, a second dark field light source 72, and a second dark field filter or polarizer 92.

d.分束器6。 d. Beam splitter 6.

e.物鏡4。 e. Objective 4.

f.照相機3。 f. Camera 3.

g.影像處理器141。 g. Image processor 141.

h.用於控制系統的控制器142。 h. Controller 142 for controlling the system.

照相機3可以是偏振照相機。相應地──照相機3可以包括分析器或可調的濾色器。因此,照相機3可以接收不同偏振的光並且可以在不同偏振分量之間進行區分。 The camera 3 may be a polarization camera. Correspondingly-the camera 3 may include an analyzer or an adjustable color filter. Therefore, the camera 3 can receive light of different polarizations and can distinguish between different polarization components.

物鏡4被放置在照相機3和分束器6之間。分束器6被放置在物件2和物鏡4之間。 The objective lens 4 is placed between the camera 3 and the beam splitter 6. The beam splitter 6 is placed between the object 2 and the objective lens 4.

第一預定義參數(顏色和/或偏振)的第一明場光束101由明場照射模組產生並且被導向分束器6。 The first brightfield light beam 101 of the first predefined parameter (color and/or polarization) is generated by the brightfield illumination module and guided to the beam splitter 6.

分束器6以第一角度範圍將第一明場光束101反射到物件2上。第一角範圍包括物件2的法線。 The beam splitter 6 reflects the first bright field beam 101 onto the object 2 in a first angular range. The first angle range includes the normal of the object 2.

第一明場光束101的反射111通過分束器6且通過物鏡4並且照射到照相機3上。 The reflection 111 of the first brightfield light beam 101 passes through the beam splitter 6 and passes through the objective lens 4 and irradiates the camera 3.

第二預定義參數(顏色和/或偏振)的第一暗場光束102由第一暗場光源71和第一暗場濾光器或偏光器91形成並且以與第一角度範圍不同的第二角度範圍被導向物件。 The first dark field beam 102 of the second predefined parameter (color and/or polarization) is formed by the first dark field light source 71 and the first dark field filter or polarizer 91 and has a second angle range different from the first angle range. The angle range is directed to the object.

第一暗場光束102的反射112通過分束器6且通過物鏡4並且照射到照相機3上。 The reflection 112 of the first dark field light beam 102 passes through the beam splitter 6 and passes through the objective lens 4 and irradiates the camera 3.

第二預定義參數(顏色和/或偏振)的第二暗場光束103由第二暗場光源72和第二暗場濾光器或偏光器92形成並且以與第一和第二角度範圍不同的第三角度範圍被導向物件。 The second dark field light beam 103 of the second predefined parameter (color and/or polarization) is formed by the second dark field light source 72 and the second dark field filter or polarizer 92 and is different from the first and second angular ranges The third angle range is directed to the object.

第二暗場光束103的反射113通過分束器6且通過物鏡4並且照射到照相機3上。 The reflection 113 of the second dark field light beam 103 passes through the beam splitter 6 and passes through the objective lens 4 and irradiates the camera 3.

第一、第二和第三參數彼此不同並且照相機3能夠區分第一、第二和第三參數的光,並且由此照相機3可以在物件2的同個掃描期間接收由三個不同的光束(101、102和103)照射物件2產生的資訊並且區分由這些光束中的每一個照射物件2產生的反射光。 The first, second, and third parameters are different from each other and the camera 3 can distinguish the light of the first, second, and third parameters, and thus the camera 3 can receive three different light beams during the same scan of the object 2 ( 101, 102, and 103) illuminate the information generated by the object 2 and distinguish the reflected light generated by each of these light beams illuminating the object 2.

圖1A的系統可以執行物件2的線掃描──在此期間第一明場光束101以及第一和第二暗場光束102和103以幾條光線照射到物件2上。 The system of FIG. 1A can perform line scanning of the object 2-during this period, the first bright field beam 101 and the first and second dark field beams 102 and 103 irradiate the object 2 with several rays.

可選地,圖1A的系統可以執行物件2的面掃描-在此期間第一明場光束101以及第一和第二暗場光束102和103以光的二維區域照射到物件2上。 Optionally, the system of FIG. 1A can perform area scanning of the object 2-during this period, the first bright field beam 101 and the first and second dark field beams 102 and 103 irradiate the object 2 with a two-dimensional area of light.

使用面掃描RGB彩色照相機、具有第一濾色器的同軸明場光源、以及圍繞光軸的、具有與第一濾色器不同的顏色的第二濾色器的暗場光環也可以實現面掃描系統。 Surface scanning can also be achieved using a surface scan RGB color camera, a coaxial bright field light source with a first color filter, and a dark field halo around the optical axis of a second color filter with a color different from the first color filter. system.

除了顏色之外的其它光學性質可以用來區分,諸如偏振取向。光源利用具有不同(優選垂直)取向的線性偏光器來覆蓋,然而使用能夠利用不同分析器取向獲取多個影像的照相機系統。 Other optical properties besides color can be used to distinguish, such as polarization orientation. The light source is covered with linear polarizers with different (preferably vertical) orientations, but a camera system capable of acquiring multiple images with different analyzer orientations is used.

圖1B示出了根據本發明的實施例的系統。 Figure 1B shows a system according to an embodiment of the invention.

圖1B的系統不同於圖1A的系統,其還包括在照相機3之前──在照相機3和物鏡4之間的分析器(或液晶光學調製器)17。 The system of FIG. 1B is different from the system of FIG. 1A in that it also includes an analyzer (or liquid crystal optical modulator) 17 before the camera 3-between the camera 3 and the objective lens 4.

圖1A的偏振照相機3或圖1B的液晶調製器17可以包括任意設置的分析器,如在圖2中所述的但不限於這些設置。 The polarization camera 3 of FIG. 1A or the liquid crystal modulator 17 of FIG. 1B may include arbitrarily arranged analyzers, as described in FIG. 2 but not limited to these settings.

圖2示出了根據本發明的各個實施例的兩種設置的分析器200和210。 Figure 2 shows analyzers 200 and 210 in two settings according to various embodiments of the present invention.

分析器200和210可以被用在諸如圖1C的系統的系統中並且可以被用在諸如在圖1B中示出的具有單個照相機的系統中。 The analyzers 200 and 210 may be used in a system such as the system of FIG. 1C and may be used in a system with a single camera such as that shown in FIG. 1B.

換句話說,任何數量的照相機可以被用在系統中,不是如在圖1A中所描述的僅一個偏振照相機3,或不是僅一個 非偏振照相機,或其任何組合。 In other words, any number of cameras can be used in the system, not just one polarization camera 3 as described in Figure 1A, or not just one Non-polarized camera, or any combination thereof.

圖2示出了具有不同區域的分析器,它們的偏振性質彼此不同(例如

Figure 104142460-A0305-02-0015-8
偏振取向可以彼此不同)。 Figure 2 shows analyzers with different regions, their polarization properties are different from each other (e.g.
Figure 104142460-A0305-02-0015-8
The polarization orientations can be different from each other).

相同分析器的不同區域可以具有相同的形狀和大小,但也可以彼此形狀和/或大小不同。 Different regions of the same analyzer can have the same shape and size, but can also be different from each other in shape and/or size.

圖2的分析器200具有細長條帶201、202、203和204,細長條帶的偏振參數彼此不同。該分析器可以適合線照射,在該線照射中,用光線來掃描檢驗的物品並且因此(假設有分析器的4個不同的區域)──單個掃描導致獲得了檢驗物品的四個不同的影像──每個具有其自己的偏振參數。 The analyzer 200 of FIG. 2 has elongated strips 201, 202, 203, and 204, and the polarization parameters of the elongated strips are different from each other. The analyzer can be suitable for line illumination, in which light is used to scan the inspected item and therefore (assuming 4 different areas of the analyzer)-a single scan results in four different images of the inspected item ──Each has its own polarization parameter.

圖2的分析器210包括四種不同類型的矩形區域(211、212、213和214),它們以可以類似於RGB像素陣列的貝爾(Bayer)圖案的重複(馬賽克樣)圖案佈置。這個佈置可以適合面照射。 The analyzer 210 of FIG. 2 includes four different types of rectangular regions (211, 212, 213, and 214) arranged in a repeating (mosaic-like) pattern that may be similar to the Bayer pattern of the RGB pixel array. This arrangement can be suitable for surface illumination.

在圖2中,包括不同取向的線的盒的偏振參數彼此不同。例如,盒201和211可以表示45度取向的線性偏振,盒202和212可以表示90度取向的線性偏振,盒203和213可以表示0度取向的線性偏振,以及盒204和214可以表示分析器的非偏振部分。應該注意的是,偏振取向可以與該示例中的不同並且不同的線可表示其他偏振參數之間的差異。 In FIG. 2, the polarization parameters of the cells including wires of different orientations are different from each other. For example, boxes 201 and 211 can represent linear polarizations oriented at 45 degrees, boxes 202 and 212 can represent linear polarizations oriented at 90 degrees, boxes 203 and 213 can represent linear polarizations oriented at 0 degrees, and boxes 204 and 214 can represent analyzers The non-polarized part. It should be noted that the polarization orientation may be different from that in this example and different lines may indicate the difference between other polarization parameters.

不同的區域類型的數目可以不同於四個。 The number of different area types can be different from four.

圖1C示出了根據本發明的實施例的系統。 Figure 1C shows a system according to an embodiment of the invention.

圖1C的系統包括三個照相機15、16和18,而不是圖1A和1B中的單個照相機。 The system of Figure 1C includes three cameras 15, 16, and 18 instead of the single camera in Figures 1A and 1B.

圖1C的系統還包括分配模組(第一附加分束器151和第二附加分束器152),用於將來自物件的光在三個照相機15、16和18之間分配。 The system of FIG. 1C also includes a distribution module (a first additional beam splitter 151 and a second additional beam splitter 152) for distributing the light from the object among the three cameras 15, 16 and 18.

三個分析器171、172和173在照相機15、16和18之前──每個照相機前一個分析器。 Three analyzers 171, 172, and 173 are in front of cameras 15, 16, and 18—one analyzer in front of each camera.

第一附加分束器151和第二附加分束器152將來自物件的光分到照相機15、16和18之間。 The first additional beam splitter 151 and the second additional beam splitter 152 split the light from the object between the cameras 15, 16 and 18.

應該注意的是,分析器171、172和173可以具有可調節的取向(或任何其他可調節的偏振參數),並且分析器171、172和173的取向可以彼此不同──允許每個照相機接收來自單個光源的光。 It should be noted that the analyzers 171, 172, and 173 can have adjustable orientations (or any other adjustable polarization parameters), and the orientations of the analyzers 171, 172, and 173 can be different from each other—allowing each camera to receive data from Light from a single source.

圖1A、1B和1C的系統中的任何一個可以包括控制器(諸如圖1A和1C的控制器142),該控制器被佈置為協調桌子移動和照相機影像捕捉,調節光源和偏光器,等等。 Any of the systems of Figures 1A, 1B, and 1C may include a controller (such as the controller 142 of Figures 1A and 1C) that is arranged to coordinate table movement and camera image capture, adjust light sources and polarizers, etc. .

系統可以包括附加部分,諸如移動載物台/桌子、控制器、具有幀抓取器、影像處理(參見圖1A和1C的影像處理器141)以及GUI的電腦等等。 The system may include additional parts, such as a mobile stage/table, a controller, a computer with a frame grabber, image processing (see image processor 141 in FIGS. 1A and 1C), GUI, and so on.

可以提供使用如上示出的系統來檢驗被檢驗物品的方法。 It is possible to provide a method for inspecting an item to be inspected using the system shown above.

圖3示出了根據本發明的實施例的方法400。 Figure 3 shows a method 400 according to an embodiment of the invention.

方法400可以由步驟410和415開始。 The method 400 may begin with steps 410 and 415.

步驟410可以包括由明場照射模組生成第一預定義參數的明場光束並且將明視場光束導向分束器。 Step 410 may include generating a brightfield beam of the first predefined parameter by the brightfield illumination module and directing the brightfield beam to the beam splitter.

步驟410之後可以是由分束器朝向物件反射明場光束的步驟420。 Step 410 may be followed by step 420 of reflecting the bright field light beam from the beam splitter toward the object.

步驟420之後可以是由分束器接收明場光束的反射的步驟430。 Step 420 may be followed by step 430 of receiving the reflection of the bright field beam by the beam splitter.

步驟430之後可以是由分束器將明場光束的反射光導向物鏡的步驟440。 Step 430 may be followed by step 440 in which the reflected light of the bright field beam is guided by the beam splitter to the objective lens.

步驟415可以包括由暗場照射模組生成第二預定義參數的第一暗場光束並且將第一暗場光束導向物件。第一預定義參數和第二預定義參數之間有差別。 Step 415 may include generating a first dark field beam with a second predefined parameter by the dark field irradiation module and directing the first dark field beam to the object. There is a difference between the first predefined parameter and the second predefined parameter.

步驟415之後可以是由分束器接收第一暗場光束的反射的步驟425。 Step 415 may be followed by step 425 of receiving the reflection of the first dark field light beam by the beam splitter.

步驟425之後可以是由分束器將第一暗場光束的反射導向物鏡的步驟435。 Step 425 may be followed by step 435 of the beam splitter guiding the reflection of the first dark field beam to the objective lens.

步驟440和435之後可以是由物鏡將第一暗場光束的反射和明場光束的反射導向感測模組的步驟450。 Steps 440 and 435 may be followed by step 450 of guiding the reflection of the first dark field beam and the reflection of the bright field beam to the sensing module by the objective lens.

步驟450之後可以是由感測模組基於第一預定義參數和第二預定義參數之間的差別,來區分在第一暗場光束的反射和明場光束的反射的步驟460。 Step 450 may be followed by a step 460 in which the sensing module distinguishes the reflection of the first dark field beam from the reflection of the bright field beam based on the difference between the first predefined parameter and the second predefined parameter.

此外,本領域的技術人員將意識到以上所描述的操作的功能之間的界限僅僅是說明性的。多個操作的功能可以組合成單個操作,和/或單個操作的功能可以分配在附加的 操作中。此外,可選的實施例可以包括特定操作的多個實例,並且操作的順序可以在各個其它的實施例中變化。 In addition, those skilled in the art will realize that the boundaries between the functions of the operations described above are merely illustrative. The functions of multiple operations can be combined into a single operation, and/or the functions of a single operation can be allocated in additional In operation. In addition, alternative embodiments may include multiple instances of specific operations, and the order of operations may be changed in various other embodiments.

因此,應該理解的是,本文所描繪的結構僅僅是示例性的,並且事實上,完成相同功能的許多其他結構也可以被實現。在理論上,但仍然確定的是,完成相同功能的組件的任何佈置是有效地“關聯的”,使得完成期望的功能。因此,本文中為完成特定功能所組合的任何兩個組件可以被視為彼此“相關聯的”從而完成期望的功能,而不考慮結構或中間組件。同樣地,任何兩個如此關聯的組件也可以被視作彼此“操作地連接”或“操作地耦合”以完成期望的功能。 Therefore, it should be understood that the structure described herein is only exemplary, and in fact, many other structures that accomplish the same function can also be implemented. In theory, it is still certain that any arrangement of components that accomplish the same function is effectively "associated" so that the desired function is accomplished. Therefore, any two components combined to accomplish a specific function herein can be regarded as being "associated" with each other to accomplish the desired function, regardless of the structure or intermediate components. Likewise, any two components so related can also be regarded as being "operably connected" or "operably coupled" to each other to accomplish the desired function.

然而,其它的修改、變型和替換也是可能的。因此,說明書和附圖被視為是說明性的意義而不是限制性的意義。 However, other modifications, variations, and replacements are also possible. Therefore, the description and the drawings are regarded as illustrative rather than restrictive.

詞語“包括”不是排除之後列在請求項中的那些其他元件或步驟的存在。應該理解的是,這樣使用的術語在適合的情況中是可交換的,使得本文所描述的本發明的實施例,例如,除了本文所示出或以其他方式描述的取向之外,能夠在其他取向上操作。對術語“包括(comprising)”、“包括(comprises)”的任何引用也應該被解讀為對術語“包括(consisting)”(排除其他元件的存在)和/或對術語“大體上包括(essentially consisting)”(排除其他材料或重要元件的存在)的引用。 The word "comprising" does not exclude the existence of those other elements or steps listed later in the claim. It should be understood that the terms used in this way are interchangeable under appropriate circumstances, so that the embodiments of the invention described herein, for example, can be used in other than the orientation shown or described in other ways. Operation in orientation. Any reference to the terms "comprising" and "comprises" should also be interpreted as referring to the term "consisting" (excluding the presence of other elements) and/or to the term "essentially consisting of )” (excluding the existence of other materials or important components).

此外,本文所使用的術語“一(a)”或“一(an)” 被定義為一個或多於一個。還有,請求項中的介紹性短語的使用,諸如“至少一個”和“一個或多個”不應該被解釋為意味著:通過不定冠詞“一(a)”或“一(an)”介紹另一個請求項元素將包含如此介紹的請求項元素的任意特定請求項限制為包含僅一個這樣元素的發明,即使當相同的請求項包括介紹性短語“一個或多個”或“至少一個”以及不定冠詞諸如“一(a)”或“一(an)”。同樣適用於定冠詞的使用。除非另有說明,諸如“第一”和“第二”的術語被用於任意地在這樣的術語描述的元素之間進行區分。 In addition, the term "a" or "an" as used herein Is defined as one or more than one. Also, the use of introductory phrases in the claim, such as "at least one" and "one or more" should not be interpreted as meaning: through the indefinite article "one (a)" or "one (an)" The introduction of another claim element limits any particular claim that contains the claim element so introduced to an invention that contains only one such element, even when the same claim includes the introductory phrase "one or more" or "at least one "And indefinite articles such as "一 (a)" or "一 (an)". The same applies to the use of definite articles. Unless stated otherwise, terms such as "first" and "second" are used to arbitrarily distinguish between the elements described by such terms.

因此,這些術語並不必須旨在表明這樣的元件的時間或其它優先順序。某些措施在相互不同的請求項中被陳述的單純事實並不指示這些措施的組合不能有利地被使用。 Therefore, these terms are not necessarily intended to indicate the timing or other order of priority of such elements. The mere fact that certain measures are stated in mutually different claims does not indicate that the combination of these measures cannot be used to advantage.

1:桌子或載物台 1: table or stage

2:物件、物品 2: Objects, articles

3:照相機 3: camera

4:物鏡 4: Objective lens

5:明場源、明場光源 5: Bright field source, bright field light source

6:分束器 6: beam splitter

8:紅色濾色器、明場修調節器 8: Red color filter, bright field repair adjuster

71:暗場源、第一暗場光源 71: Dark field source, first dark field light source

72:暗場源、第二暗場光源 72: dark field source, second dark field light source

91:濾光器、第一暗場濾光器或偏光器 91: filter, first dark field filter or polarizer

92:濾光器、第二暗場濾光器或偏光器 92: filter, second dark field filter or polarizer

101:明場光束、第一明場光束 101: Brightfield beam, first brightfield beam

102:暗場光束、第一暗場光束 102: Dark field beam, first dark field beam

103:暗場光束、第二暗場光束 103: Dark field beam, second dark field beam

111、112、113:反射 111, 112, 113: reflection

141:影像處理器 141: image processor

142:控制器 142: Controller

Claims (30)

一種檢驗物件的系統,所述系統包括:感測模組;分束器;物鏡;明場照射模組,其被配置為生成第一預定義參數的明場光束並且將所述明場光束導向包括所述分束器和所述物鏡的光學模組;暗場照射模組,其被配置為生成第二預定義參數的第一暗場光束並且將所述第一暗場光束導向所述物件;其中所述第一預定義參數和所述第二預定義參數之間存在差別;其中,所述光學模組被配置為:(a)朝向所述物件反射所述明場光束,(b)接收所述明場光束的反射,(c)接收所述第一暗場光束的反射,(d)將所述第一暗場光束的反射和所述明場光束的反射同時導向所述感測模組;以及其中,所述感測模組被配置為基於所述第一預定義參數和所述第二預定義參數之間的所述差別,區分在同個掃描期間接收的所述第一暗場光束的反射和所述明場光束的反射。 A system for inspecting an object, the system comprising: a sensing module; a beam splitter; an objective lens; a bright field irradiation module configured to generate a bright field light beam of a first predefined parameter and guide the bright field light beam An optical module including the beam splitter and the objective lens; a dark-field irradiation module configured to generate a first dark-field beam of a second predefined parameter and direct the first dark-field beam to the object Wherein there is a difference between the first predefined parameter and the second predefined parameter; wherein, the optical module is configured to: (a) reflect the bright field light beam toward the object, (b) Receiving the reflection of the bright field light beam, (c) receiving the reflection of the first dark field light beam, (d) guiding the reflection of the first dark field light beam and the reflection of the bright field light beam to the sensing Module; and wherein the sensing module is configured to distinguish the first received during the same scan based on the difference between the first predefined parameter and the second predefined parameter The reflection of the dark field beam and the reflection of the bright field beam. 如請求項1所述的系統,其中所述感測模組包括偏振照相機,並且其中,對於偏振的所述第一預定義參數和所 述第二預定義參數彼此不同。 The system according to claim 1, wherein the sensing module includes a polarization camera, and wherein the first predefined parameter for polarization and the The second predefined parameters are different from each other. 如請求項1所述的系統,其中所述感測模組包括照相機,分析器在所述照相機之前,並且其中,對於偏振的所述第一預定義參數和所述第二預定義參數彼此不同。 The system according to claim 1, wherein the sensing module includes a camera, the analyzer is in front of the camera, and wherein the first predefined parameter and the second predefined parameter for polarization are different from each other . 如請求項1所述的系統,其中所述感測模組包括分析器;其中所述分析器包括至少第一類型和第二類型的多個分析器區域;其中所述第一類型的分析器區域使所述明場光束的反射通過;並且其中所述第二類型的分析器區域使所述第一暗場光束的反射通過。 The system according to claim 1, wherein the sensing module includes an analyzer; wherein the analyzer includes a plurality of analyzer regions of at least a first type and a second type; wherein the first type of analyzer The area passes the reflection of the bright field beam; and wherein the second type of analyzer area passes the reflection of the first dark field beam. 如請求項4所述的系統,其中所述多個分析器區域是條帶狀。 The system according to claim 4, wherein the plurality of analyzer areas are striped. 如請求項4所述的系統,其中所述多個分析器區域是矩形。 The system according to claim 4, wherein the plurality of analyzer regions are rectangular. 如請求項4所述的系統,其中所述分析器區域中的兩個或更多個分析器區域在形狀和/或大小上彼此不同。 The system according to claim 4, wherein two or more of the analyzer areas are different from each other in shape and/or size. 如請求項1所述的系統,其中所述暗場照射模組還被配置為生成第三預定義參數的第二暗場光束並且將所述第二暗場光束導向所述物件;其中所述第三預定義參數與所述第一預定義參數和所述第二預定義參數中的每一個存在差別;其中,所述分束器還被配置為接收所述第二暗場光束的反射並且將所述第二暗場光束的反射導向所述分束器;其中,所述物鏡還被配置為將所述第二暗場光束的 反射導向所述感測模組;以及其中,所述感測模組被配置為基於所述第一預定義參數、所述第二預定義參數和第三預定義參數之間的所述差別區分所述第一暗場光束的反射、所述第二暗場光束的反射以及所述明場光束的反射。 The system according to claim 1, wherein the dark field irradiation module is further configured to generate a second dark field beam of a third predefined parameter and direct the second dark field beam to the object; wherein The third predefined parameter is different from each of the first predefined parameter and the second predefined parameter; wherein, the beam splitter is further configured to receive the reflection of the second dark field beam and Guide the reflection of the second dark field beam to the beam splitter; wherein the objective lens is also configured to transfer the second dark field beam Reflection guides the sensing module; and wherein the sensing module is configured to distinguish based on the difference between the first predefined parameter, the second predefined parameter, and the third predefined parameter The reflection of the first dark field light beam, the reflection of the second dark field light beam, and the reflection of the bright field light beam. 如請求項8所述的系統,其中,所述感測模組包括分析器;其中所述分析器包括至少第一類型和第二類型的多個分析器區域;其中所述第一類型的分析器區域使所述明場光束的反射通過;並且其中所述第二類型的分析器區域使所述第一暗場光束的反射通過。 The system according to claim 8, wherein the sensing module includes an analyzer; wherein the analyzer includes a plurality of analyzer regions of at least a first type and a second type; wherein the first type of analysis The detector area passes the reflection of the bright field beam; and wherein the second type of analyzer area passes the reflection of the first dark field beam. 如請求項8所述的系統,其中,所述感測模組包括多個照相機、分配模組和多個分析器,其中有分析器在每個照相機之前;並且其中所述分配模組被配置為將所述第一暗場光束的反射、所述第二暗場光束的反射以及所述明場光束的反射分配到所述多個分析器。 The system according to claim 8, wherein the sensing module includes a plurality of cameras, a distribution module, and a plurality of analyzers, wherein the analyzer is in front of each camera; and wherein the distribution module is configured To distribute the reflection of the first dark field light beam, the reflection of the second dark field light beam, and the reflection of the bright field light beam to the plurality of analyzers. 如請求項10所述的系統,其中,所述多個分析器中的每個分析器包括至少第一類型和第二類型的多個分析器區域;其中所述第一類型的分析器區域使所述明場光束的反射通過;並且其中所述第二類型的分析器區域使所述第一暗場光束的反射通過。 The system according to claim 10, wherein each of the plurality of analyzers includes a plurality of analyzer areas of at least a first type and a second type; wherein the first type of analyzer area is The reflection of the bright field beam passes; and wherein the second type of analyzer region passes the reflection of the first dark field beam. 如請求項11所述的系統,其中,所述多個分析器區域是條帶狀。 The system according to claim 11, wherein the plurality of analyzer regions are striped. 如請求項12所述的系統,其中,所述多個分析器區域是矩形。 The system according to claim 12, wherein the plurality of analyzer regions are rectangular. 如請求項13所述的系統,其中,所述分析器區域中的兩個或更多個分析器區域在形狀和/或大小上彼此不同。 The system according to claim 13, wherein two or more of the analyzer areas are different from each other in shape and/or size. 如請求項10所述的系統,其中,所述多個分析器中的不同分析器被配置為使出自所述第一暗場光束的反射、所述第二暗場光束的反射以及所述明場光束的反射的不同的光束通過。 The system according to claim 10, wherein different analyzers of the plurality of analyzers are configured to cause reflection from the first dark field beam, reflection from the second dark field beam, and The field beam is reflected by the different beams. 一種檢驗物件的方法,包含:藉由明場照射模組,生成第一預定義參數的明場光束並且將所述明場光束導向包括分束器和物鏡的光學模組;藉由暗場照射模組,生成第二預定義參數的第一暗場光束並且將所述第一暗場光束導向物件;其中所述第一預定義參數和所述第二預定義參數之間存在差別;藉由所述光學模組,朝向所述物件來反射所述明場光束;藉由所述光學模組,接收所述明場光束的反射;藉由所述光學模組,將所述明場光束的反射導向感測模組;藉由所述光學模組,接收所述第一暗場光束的反射;藉由所述光學模組,將所述第一暗場光束的反射導向所述感測模組,且將所述第一暗場光束的反射和所述明場光束的反射同時導向所述感測模組;以及藉由所述感測模組,基於所述第一預定義參數和所 述第二預定義參數之間的所述差別,區分在同個掃描期間接收的所述第一暗場光束的反射和所述明場光束的反射。 A method of inspecting an object includes: generating a bright field beam with a first predefined parameter by a bright field irradiation module and directing the bright field beam to an optical module including a beam splitter and an objective lens; A module for generating a first dark field beam with a second predefined parameter and directing the first dark field beam to an object; wherein there is a difference between the first predefined parameter and the second predefined parameter; by The optical module reflects the bright-field light beam toward the object; the optical module receives the reflection of the bright-field light beam; Reflection guiding sensing module; by the optical module, receiving the reflection of the first dark field light beam; by the optical module, guiding the reflection of the first dark field light beam to the sensing module Group, and guide the reflection of the first dark field beam and the reflection of the bright field beam to the sensing module at the same time; and by the sensing module, based on the first predefined parameter and the The difference between the second predefined parameters distinguishes the reflection of the first dark field light beam and the reflection of the bright field light beam received during the same scan. 如請求項16所述的方法,其中所述感測模組包括偏振照相機,並且其中對於偏振的所述第一預定義參數和所述第二預定義參數彼此不同。 The method according to claim 16, wherein the sensing module includes a polarization camera, and wherein the first predefined parameter and the second predefined parameter for polarization are different from each other. 如請求項16所述的方法,其中所述感測模組包括照相機,而分析器在所述照相機之前,並且其中對於偏振的所述第一預定義參數和所述第二預定義參數彼此不同。 The method of claim 16, wherein the sensing module includes a camera, and the analyzer is before the camera, and wherein the first predefined parameter and the second predefined parameter for polarization are different from each other . 如請求項16所述的方法,其中所述感測模組包括分析器;其中所述分析器包括至少第一類型和第二類型的多個分析器區域;其中所述第一類型的分析器區域使所述明場光束的反射通過;並且其中所述第二類型的分析器區域使所述第一暗場光束的反射通過。 The method according to claim 16, wherein the sensing module includes an analyzer; wherein the analyzer includes a plurality of analyzer regions of at least a first type and a second type; wherein the first type of analyzer The area passes the reflection of the bright field beam; and wherein the second type of analyzer area passes the reflection of the first dark field beam. 如請求項19所述的方法,其中所述多個分析器區域是條帶狀。 The method according to claim 19, wherein the plurality of analyzer regions are striped. 如請求項19所述的方法,其中所述多個分析器區域是矩形。 The method according to claim 19, wherein the plurality of analyzer regions are rectangular. 如請求項19所述的方法,其中所述分析器區域中的兩個或更多個分析器區域在形狀和/或大小上彼此不同。 The method according to claim 19, wherein two or more of the analyzer regions are different from each other in shape and/or size. 如請求項16所述的方法,包含:藉由所述暗場照射模組,生成第三預定義參數的第二暗場光束;將所述第二暗場光束導向所述物件;其中所述第三預定義參數與所述第一預定義參數和所述第 二預定義參數中的每一個存在差別;藉由所述分束器,接收所述第二暗場光束的反射;將所述第二暗場光束的反射導向所述分束器;藉由所述物鏡,將所述第二暗場光束的反射導向所述感測模組;以及藉由所述感測模組,基於所述第一預定義參數、所述第二預定義參數和第三預定義參數之間的所述差別,區分所述第一暗場光束的反射、所述第二暗場光束的反射以及所述明場光束的反射。 The method according to claim 16, comprising: generating a second dark field light beam with a third predefined parameter by the dark field illumination module; directing the second dark field light beam to the object; wherein The third predefined parameter and the first predefined parameter and the first Each of the two predefined parameters is different; by the beam splitter, the reflection of the second dark field beam is received; the reflection of the second dark field beam is directed to the beam splitter; The objective lens guides the reflection of the second dark field light beam to the sensing module; and by the sensing module, based on the first predefined parameter, the second predefined parameter and the third The difference between the predefined parameters distinguishes the reflection of the first dark field light beam, the reflection of the second dark field light beam, and the reflection of the bright field light beam. 如請求項23所述的方法,其中所述感測模組包括分析器;其中所述分析器包括至少第一類型和第二類型的多個分析器區域;其中所述第一類型的分析器區域使所述明場光束的反射通過;並且其中所述第二類型的分析器區域使所述第一暗場光束的反射通過。 The method according to claim 23, wherein the sensing module includes an analyzer; wherein the analyzer includes a plurality of analyzer regions of at least a first type and a second type; wherein the first type of analyzer The area passes the reflection of the bright field beam; and wherein the second type of analyzer area passes the reflection of the first dark field beam. 如請求項23所述的方法,其中所述感測模組包括多個照相機、分配模組和多個分析器,其中有分析器在每個照相機之前;並且所述方法包含:藉由所述分配模組,將所述第一暗場光束的反射、所述第二暗場光束的反射以及所述明場光束的反射分配到所述多個分析器。 The method according to claim 23, wherein the sensing module includes a plurality of cameras, a distribution module, and a plurality of analyzers, wherein an analyzer is in front of each camera; and the method includes: The distribution module distributes the reflection of the first dark field light beam, the reflection of the second dark field light beam, and the reflection of the bright field light beam to the plurality of analyzers. 如請求項25所述的方法,其中所述多個分析器中的每個分析器包括至少第一類型和第二類型的多個分析器區域;其中所述第一類型的分析器區域使所述明場光束的反射通過;並且其中所述第二類型的分析器區域使所述第一暗場光束的反射通過。 The method according to claim 25, wherein each of the plurality of analyzers includes a plurality of analyzer areas of at least a first type and a second type; wherein the analyzer areas of the first type enable all The reflection of the bright field beam passes; and wherein the second type of analyzer region passes the reflection of the first dark field beam. 如請求項26所述的方法,其中所述多個分析器區域是條帶狀。 The method according to claim 26, wherein the plurality of analyzer regions are striped. 如請求項27所述的方法,其中所述多個分析器區域是矩形。 The method according to claim 27, wherein the plurality of analyzer regions are rectangular. 如請求項28所述的方法,其中所述分析器區域中的兩個或更多個分析器區域在形狀和/或大小上彼此不同。 The method according to claim 28, wherein two or more of the analyzer regions are different from each other in shape and/or size. 如請求項25所述的方法,其中包含:藉由所述多個分析器中的不同分析器,使出自所述第一暗場光束的反射、所述第二暗場光束的反射以及所述明場光束的反射的不同的光束通過。 The method according to claim 25, wherein the method includes: using different analyzers of the plurality of analyzers to make the reflection from the first dark field beam, the reflection from the second dark field beam, and the Brightfield beams are reflected by different beams.
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