TWI711058B - Manufacturing method and device of electronic component and electronic component - Google Patents
Manufacturing method and device of electronic component and electronic component Download PDFInfo
- Publication number
- TWI711058B TWI711058B TW107139834A TW107139834A TWI711058B TW I711058 B TWI711058 B TW I711058B TW 107139834 A TW107139834 A TW 107139834A TW 107139834 A TW107139834 A TW 107139834A TW I711058 B TWI711058 B TW I711058B
- Authority
- TW
- Taiwan
- Prior art keywords
- electronic component
- conductive paste
- layer
- platen
- paste layer
- Prior art date
Links
Images
Abstract
本發明的課題是在於提供一邊防止或抑制被浸漬塗佈於電子部件的端面之導電性糊料層的拉絲所造成的缺陷,一邊可使導電性糊料層的塗佈厚均一化之電子部件的製造方法及裝置以及電子部件。 其解決手段,電子部件的製造方法是具備: 第1工程,其是將電子部件(10)的端面(12)浸漬於導電性糊料(120)的浸漬層(130),而形成浸漬塗佈於電子部件的端面之導電性糊料層(14); 第2工程,其是使電子部件的導電性糊料層接觸於將導電性糊料塗佈於定盤(100)而形成的潤濕層(140); 第3工程,其是一邊使導電性糊料層與定盤上的潤濕層接觸,一邊使電子部件在與定盤的表面平行的至少一方向上移動;及 第4工程,其是在該第3工程之後使電子部件的導電性糊料層從定盤側分離。The subject of the present invention is to provide an electronic component that can uniformize the coating thickness of the conductive paste layer while preventing or suppressing defects caused by the wire drawing of the conductive paste layer that is dipped and coated on the end surface of the electronic component Manufacturing method and device and electronic components. The solution is to manufacture electronic components with: The first process, which involves immersing the end surface (12) of the electronic component (10) in the impregnation layer (130) of the conductive paste (120) to form a dip coating The conductive paste layer (14) on the end surface of the electronic component; The second process, which is to make the conductive paste layer of the electronic component contact the wetting formed by coating the conductive paste on the plate (100) Layer (140); the third step, which is to move the electronic component in at least one direction parallel to the surface of the plate while contacting the conductive paste layer with the wetting layer on the platen; and the fourth step, This is to separate the conductive paste layer of the electronic component from the platen side after the third step.
Description
本發明係有關於電子部件的製造方法及裝置以及電子部件。The present invention relates to a manufacturing method and device of an electronic component and an electronic component.
本發明者提案有:例如在層積陶瓷電容器、電感器、熱變阻器等電子部件本體的端面浸漬塗佈導電性糊料層,而在電子部件本體形成外部電極的裝置及方法(專利文獻1)。僅經浸漬塗佈後的導電性糊料層的膜厚無法均一化。在這裡,也提案有:將浸漬塗佈有導電性糊料的電子部件本體,從形成於定盤面的導電性糊料膜層拉起後,使形成於電子部件本體端部的導電性糊料的垂下部,接觸於將導電性糊料膜層除去的定盤面(專利文獻2)。該工程因為是將電子部件本體側的多餘的導電性糊料藉由定盤來擦拭,故稱為塗抹(blot)工程。藉由該塗抹工程的實施,期待能在電子部件本體的端部形成大致均均的導電性糊料層。 [先前技術文獻] [專利文獻]The inventor of the present invention proposes an apparatus and method for dip-coating a conductive paste layer on the end surface of an electronic component body such as multilayer ceramic capacitors, inductors, and thermal varistors, and forming external electrodes on the electronic component body (Patent Document 1) . The film thickness of the conductive paste layer only after dip coating cannot be made uniform. Here, it is also proposed that the electronic component body coated with conductive paste is pulled up from the conductive paste film layer formed on the surface of the plate, and then the conductive paste formed at the end of the electronic component body The hanging part of, is in contact with the platen surface where the conductive paste film layer is removed (Patent Document 2). This process is called a blot process because the excess conductive paste on the main body of the electronic component is wiped with a platen. Through the implementation of this painting process, it is expected that a substantially uniform conductive paste layer can be formed at the end of the electronic component body. [Prior Art Document] [Patent Document]
[專利文獻1] 特開2002-237403號公報 [專利文獻2] 特開昭63-45813號公報[Patent Document 1] Japanese Patent Application Publication No. 2002-237403 [Patent Document 2] Japanese Patent Application Publication No. 63-45813
[發明所欲解決的問題][The problem to be solved by the invention]
但是,即便實施塗抹工程,從定盤將電子部件本體拉起後,電子部件本體的導電性糊料會因自體重量而垂下。又,會產生定盤上的導電性糊料與電子部件本體的導電性糊料連在一起的起絲現象。因為這種現象,會引起電子部件本體的外部電極,其覆蓋端面的中心附近的部分變厚,覆蓋周緣附近的部分變薄的傾向。而且,會有電子部件本體的外部電極,其覆蓋電子部件本體的端部的側面的部分、或者覆蓋端面與側面相交的角部的部分變得更薄的傾向。However, even if the painting process is carried out, after the electronic component body is pulled up from the platen, the conductive paste of the electronic component body will hang down due to its own weight. In addition, the conductive paste on the platen and the conductive paste on the main body of the electronic component may be connected to the conductive paste. Because of this phenomenon, the external electrode of the electronic component body tends to thicken in the portion near the center of the covering end surface, and thin in the portion near the periphery. Furthermore, there is a tendency for the external electrodes of the electronic component body to cover the side surfaces of the end of the electronic component body or the corners where the end surface and the side meet to become thinner.
這樣的外部電極,除了阻礙了外部電極表面的平坦性以外,外部電極也產生膜厚不均。又,將具有這樣的外部電極的電子部件焊接至基板的話,焊接品質會變得不穩定。In addition to hindering the flatness of the surface of the external electrode, such external electrodes also have uneven film thickness. In addition, when an electronic component having such external electrodes is soldered to a substrate, the soldering quality may become unstable.
近年來,電子部件持續變得更小型化。在該小型化的電子部件的端部,以想定的形狀及膜厚形成導電層時,在利用定盤的浸漬塗佈法中,追加調整端面的膜厚的塗抹工程的從前的方法是有極限的。In recent years, electronic components have continued to become more compact. When the conductive layer is formed at the end of this miniaturized electronic component with a predetermined shape and film thickness, the conventional method of adding a coating process to adjust the film thickness of the end surface in the dip coating method using a fixed plate has a limit. of.
本發明的幾個態樣,其目的為提供一種電子部件的製造方法及裝置以及電子部件,能夠藉由新的方法來改善特別是形成於經小型化的電子部件的端部的導電層的膜厚,或者以想定的膜厚來形成導電層。 [解決問題的手段]In several aspects of the present invention, its purpose is to provide a method and apparatus for manufacturing an electronic component, and an electronic component, which can improve the film of the conductive layer formed at the end of the miniaturized electronic component by a new method. Thickness, or the conductive layer is formed with a predetermined film thickness. [Means to solve the problem]
(1)本發明的一態樣為: 一種電子部件的製造方法,為在至少一個電子部件本體的端部包含:端面、及與前述端面接續的側面,並在前述端部形成電極而製造電子部件的方法,具有: 在前述端部,形成成為前述電極的導電性糊料層之第1工程; 在前述導電性糊料層硬化前,調整形成於前述端面的前述導電性糊料層的膜厚之第2工程;以及 在前述導電性糊料層硬化前,調整形成於前述側面的前述導電性糊料層的膜厚之第3工程。(1) One aspect of the present invention is: A method of manufacturing an electronic component, in which the end of at least one electronic component body includes an end surface and a side surface continuous with the end surface, and an electrode is formed at the end to manufacture electronics The method of the part includes: the first step of forming a conductive paste layer to become the electrode at the end portion; adjusting the film of the conductive paste layer formed on the end surface before the conductive paste layer is cured The second step of thickening; and the third step of adjusting the film thickness of the conductive paste layer formed on the side surface before the conductive paste layer is cured.
根據本發明的一態樣,在電子部件本體的端部形成的導電性糊料層在導電性糊料層硬化前,分別調整端面及側面的膜厚。特別是,因為具有調整形成於電子部件本體的側面的導電性糊料層的膜厚之第3工程,未調整的膜厚的厚的部分被刮除,或者藉由將膜厚的厚的部分移行至薄的部分等的作用,在將形成於電子部件本體的側面的導電性糊料的膜厚均勻化的同時,也確保了預定的厚度。調整形成於電子部件本體的端面的導電性糊料層的膜厚之第2工程,能藉由上述的從前的塗抹工程、或後述的經改良的塗抹工程等來實施。此外,若是在第1工程之後導電性糊料層硬化前,不管第2工程及第3工程的順序為何,第3工程即便是在第2工程的前或後,也可同時實施第2工程及第3工程。或者如同後述,也可以同時實施第1~第3工程。According to one aspect of the present invention, the conductive paste layer formed at the end of the electronic component body is adjusted to have the film thickness of the end surface and the side surface before the conductive paste layer is cured. In particular, because there is a third step of adjusting the thickness of the conductive paste layer formed on the side surface of the electronic component body, the thick portion of the unadjusted film thickness is scraped off, or the thick portion of the film thickness The function of moving to a thin portion etc. not only equalizes the film thickness of the conductive paste formed on the side surface of the electronic component body, but also ensures a predetermined thickness. The second process of adjusting the film thickness of the conductive paste layer formed on the end surface of the electronic component body can be implemented by the above-mentioned conventional painting process or the improved painting process described later. In addition, if the conductive paste layer is hardened after the first process, regardless of the order of the second process and the third process, even if the third process is before or after the second process, the second process and the The third project. Or, as described later, the first to third steps may be implemented at the same time.
(2)如本發明的一態樣(1),其中,前述第3工程可以包含:使形成於前述端面的前述導電性糊料層與膜厚調整構件接觸的工程。這樣的話,未調整的膜厚的厚的部分,會被膜厚調整構件削除,或者被移至薄的部分。(2) According to an aspect (1) of the present invention, the third step may include a step of bringing the conductive paste layer formed on the end surface into contact with a film thickness adjusting member. In this case, the thick part of the unadjusted film thickness may be cut off by the film thickness adjusting member or moved to the thin part.
(3)如本發明的一態樣(2),其中,前述第3工程可以包含:使用環狀線材作為前述膜厚調整構件,在前述環狀線材之中,配置前述至少一個電子部件本體的前述端部的工程。這樣的話,能夠同時調整形成於端部的全側面的導電性糊料層的膜厚。(3) According to an aspect (2) of the present invention, the third step may include: using a ring-shaped wire as the film thickness adjusting member, and in the ring-shaped wire, disposing the at least one electronic component body The engineering of the aforementioned end. In this case, the film thickness of the conductive paste layer formed on the entire side surface of the end portion can be adjusted at the same time.
(4)如本發明的一態樣(2),其中,前述至少一個電子部件本體可以包含複數電子部件本體;其中,前述第3工程可以包含:使用線材彼此在交點接觸的網狀構件來作為前述膜厚調整構件,在前述網狀構件形成複數環狀線材,在各個前述複數環狀線材之中,配置各個前述複數電子部件本體的前述端部的工程。這樣的話,在音波以等方向傳遞的複數環狀線材之中配置複數電子部件本體的各個端,能夠同時進行在複數電子部件本體的各個端部的側面的膜厚調整。(4) According to an aspect (2) of the present invention, wherein the at least one electronic component body may include a plurality of electronic component bodies; wherein, the third step may include: using a mesh member in which wires contact each other at an intersection point as the In the film thickness adjusting member, a plurality of ring-shaped wires are formed on the mesh member, and the end portions of the plurality of electronic component bodies are arranged among the plurality of ring-shaped wires. In this way, the respective ends of the plurality of electronic component bodies are arranged among the plurality of ring-shaped wires in which sound waves propagate in equal directions, and the film thickness adjustment on the side surfaces of the respective ends of the plurality of electronic component bodies can be performed simultaneously.
(5)如本發明的一態樣(2)~(4)中的任一者,其中,前述第3工程可以包含:在前述膜厚調整構件使音波傳遞的工程。這樣的話,因為對環狀線材等膜厚調整構件賦予藉由超音波的頻率及振幅來定義的振動能量,能更有效率地調整膜厚。而且,附著於網狀構件的多餘的導電性糊料因為音波的振動而落下,能防止網狀構件的污染。(5) According to any one of aspects (2) to (4) of the present invention, the third step may include a step of transmitting sound waves to the film thickness adjusting member. In this case, since the vibration energy defined by the frequency and amplitude of the ultrasonic wave is given to the film thickness adjusting member such as the ring-shaped wire, the film thickness can be adjusted more efficiently. Furthermore, the excess conductive paste adhering to the mesh member is dropped due to the vibration of the sound wave, and contamination of the mesh member can be prevented.
(6)如附屬於本發明的一態樣(4)的態樣(5),其中,前述第3工程可以包含:從前述網狀構件的輪廓的一部分使前述音波傳遞,在前述網狀構件的前述輪廓的另一部分使前述音波反射的工程。因為音波為等方向傳遞,能從網狀構件的輪廓的一部分傳遞音波。因為在網狀構件的輪廓的另一部分使音波反射,能夠將反射波的能量利用於膜厚調整。此外,使音波的頻率因應電子部件本體的配列間距來變更較佳,例如調整音波的頻率,使音波的一波長或半波長實質地相等於配列間距較佳。(6) As in the aspect (5) attached to the aspect (4) of the present invention, the third step may include: transmitting the sound wave from a part of the outline of the mesh member, The other part of the aforementioned profile makes the aforementioned sound waves reflect. Since sound waves are transmitted in equal directions, sound waves can be transmitted from a part of the contour of the mesh member. Since sound waves are reflected in another part of the contour of the mesh member, the energy of the reflected waves can be used for film thickness adjustment. In addition, it is better to change the frequency of the sound wave in accordance with the arrangement pitch of the electronic component body. For example, it is better to adjust the frequency of the sound wave so that one or half wavelength of the sound wave is substantially equal to the arrangement pitch.
(7)如本發明的一態樣(5)或(6),其中,前述音波可以是超音波。利用超音波的高頻,能夠將與頻率相依的能量提高來調整膜厚。此外,藉由使電子部件本體與膜厚調整構件相對移動,能夠覆蓋膜厚調整範圍。(7) According to an aspect (5) or (6) of the present invention, wherein the aforementioned sound wave may be an ultrasonic wave. Utilizing the high frequency of ultrasonic waves can increase the frequency-dependent energy to adjust the film thickness. In addition, by relatively moving the electronic component body and the film thickness adjustment member, the film thickness adjustment range can be covered.
(8)如本發明的一態樣(1),其中,前述第2工程及前述第3工程可以包含:在形成於定盤的凹部中,收容形成於前述端部的前述導電性糊料層的工程;以及使前述凹部內的前述導電性糊料硬化的工程。這樣的話,因為形成於端面及側面的導電性糊料層在凹部內經膜厚調整而硬化,能夠同時實施第2工程及第3工程。(8) According to an aspect (1) of the present invention, the second step and the third step may include: accommodating the conductive paste layer formed at the end in a recess formed in the table plate And the process of hardening the conductive paste in the recess. In this case, since the conductive paste layer formed on the end surface and the side surface is cured by adjusting the film thickness in the concave portion, the second process and the third process can be simultaneously performed.
(9)如本發明的一態樣(1),其中,前述第1工程、第2工程及前述第3工程可以包含:將前述端部浸漬於形成在模盤的凹部裡填充的導電性糊料的工程;以及使前述凹部內的前述導電性糊料硬化的工程。這樣的話,藉由將電子部件本體的端部插入填充至凹部的導電性糊料層來實施第1工程,形成於端面及側面的導電性糊料層在凹部內經膜厚調整,實施第2、第3工程。因此能夠同時實施第1工程、第2工程及第3工程。(9) According to an aspect (1) of the present invention, the first step, the second step, and the third step may include: immersing the end portion in a conductive paste filled in a recess formed in a mold plate And the process of hardening the conductive paste in the recess. In this case, the first step is implemented by inserting the end of the electronic component body into the conductive paste layer filled in the recess, and the conductive paste layer formed on the end and side surfaces is adjusted in film thickness in the recess to implement the second The third project. Therefore, the first process, the second process, and the third process can be implemented at the same time.
(10)如本發明的一態樣(1)~(9),其中,在前述第1工程、前述第2工程及第3工程的至少一個工程之前,可以更具有:在將前述至少一個電子部件本體的前述端部夾在中間配置的2條線材,使僅偏移半波長相位的音波傳遞,並將前述至少一個電子部件本體定芯的工程。因為僅偏移半波長相位的2種音波的波形中的波峰之間的相位為一致,藉由傳遞該音波的2條線材的接觸,能矯正電子部件本體的位置。藉此,能將偏移中芯的電子部件本體定芯。其結果,能夠使該定芯工程後的第1工程、第2工程及/或第3工程以更高精度來實現。(10) According to one aspect (1) to (9) of the present invention, before at least one of the first process, the second process, and the third process, there may be more: The end portion of the component body is sandwiched between two wires arranged in the middle to transmit sound waves whose phase is shifted by only half a wavelength, and to core the at least one electronic component body. Because the phases of the peaks in the waveforms of the two sound waves shifted by only half a wavelength are the same, the position of the main body of the electronic component can be corrected by the contact of the two wires that transmit the sound waves. Thereby, it is possible to center the electronic component body with the offset center. As a result, the first process, the second process, and/or the third process after the centering process can be realized with higher accuracy.
(11)本發明的其他態樣為: 一種電子部件的製造裝置,為在至少一個電子部件本體的端部形成電極而製造電子部件的製造裝置,具有: 在位於前述至少一個電子部件本體的前述端部的端面、及與前述端面連續的側面,塗佈導電性糊料而形成導電性糊料層的塗佈部; 與形成於前述端面的前述導電性糊料層接觸,調整前述導電性糊料層的膜厚的第1膜厚調整構件;以及 與形成於前述側面的前述導電性糊料層接觸,調整前述導電性糊料層的膜厚的第2膜厚調整構件。(11) Another aspect of the present invention is: an electronic component manufacturing device, which is used to form an electrode on the end of at least one electronic component body, and has: in the aforementioned at least one electronic component body The end surface of the end portion and the side surface continuous with the end surface are coated with a conductive paste to form a coating portion of the conductive paste layer; is in contact with the conductive paste layer formed on the end surface to adjust the conductive paste A first film thickness adjusting member for adjusting the film thickness of the material layer; and a second film thickness adjusting member for adjusting the film thickness of the conductive paste layer in contact with the conductive paste layer formed on the side surface.
根據本發明的其他態樣,能適宜地實施本發明的一態樣(1)的電子部件的製造方法。According to other aspects of the present invention, the method of manufacturing an electronic component of one aspect (1) of the present invention can be suitably implemented.
(12)如本發明的其他態樣(11),其中,前述至少一個電子部件本體可以包含複數電子部件本體;其中,前述第2膜厚調整構件可以包含:線材彼此在交點接觸的網狀構件;在前述網狀構件形成複數環狀線材,在各個前述複數環狀線材之中,配置各個前述複數電子部件本體的前述端部。藉此,能將本發明的一態樣(4)適宜地實施。(12) According to another aspect (11) of the present invention, wherein the at least one electronic component body may include a plurality of electronic component bodies; wherein, the second film thickness adjusting member may include: a mesh member in which the wires are in contact with each other at the intersection point ; A plurality of ring-shaped wires are formed in the mesh member, and in each of the plurality of ring-shaped wires, the ends of each of the plurality of electronic component bodies are arranged. Thereby, the aspect (4) of the present invention can be suitably implemented.
(13)本發明的其他態樣(12),可以更具有:在前述第2膜厚調整構件使音波傳遞的音波發生源。藉此,能將本發明的一態樣(5)或(6)適宜地實施。(13) Another aspect (12) of the present invention may further include a sound wave generating source that transmits sound waves to the second film thickness adjusting member. Thereby, one aspect (5) or (6) of the present invention can be suitably implemented.
(14)如本發明的其他態樣(11),包含:形成於定盤的凹部;其中,將前述凹部的底壁作為前述第1膜厚調整構件,將前述凹部的側壁作為前述第2膜厚調整構件。藉此,能將本發明的一態樣(8)適宜地實施。(14) According to another aspect (11) of the present invention, comprising: a recess formed in the platen; wherein the bottom wall of the recess is used as the first film thickness adjusting member, and the side wall of the recess is used as the second film Thick adjustment member. Thereby, the aspect (8) of the present invention can be suitably implemented.
(15)如本發明的其他態樣(11),包含:形成於模盤的凹部;其中,將前述塗佈部作為收容前述導電性糊料的前述凹部,將前述凹部的底壁作為前述第1膜厚調整構件,將前述凹部的側壁作為前述第2膜厚調整構件。藉此,能將本發明的一態樣(9)適宜地實施。(15) According to another aspect (11) of the present invention, comprising: a recess formed in the die plate; wherein the coating part is used as the recess for accommodating the conductive paste, and the bottom wall of the recess is the first 1 film thickness adjusting member, the side wall of the recessed portion is used as the second film thickness adjusting member. Thereby, the aspect (9) of the present invention can be suitably implemented.
(16)本發明的再一個其他態樣為: 一種電子部件,具有:電子部件本體;以及 覆蓋前述電子部件本體的端部; 其中, 前述端部包含:端面、與前述端面接續的側面; 前述電極在前述端面及前述側面具有實質相等的厚度。(16) Still another aspect of the present invention is: an electronic component having: an electronic component body; and an end portion covering the aforementioned electronic component body; wherein, the aforementioned end portion includes: an end surface and a side surface continuous with the aforementioned end surface; aforementioned The electrode has substantially the same thickness on the end surface and the side surface.
(17)如本發明的再一個其他態樣(16),其中, 前述端部包含:前述端面及前述側面相交的角部; 覆蓋前述角部的前述電極的厚度為覆蓋前述端面的前述電極的厚度以上。(17) According to still another aspect (16) of the present invention, the "end" includes: a corner where the end face and the side face intersect; "the thickness of the electrode covering the corner is the same as that of the electrode covering the end face Above the thickness.
(18)如本發明的再一個其他態樣(16)或(17),其中,前述電極的表面凹凸的最大深度可以是20μm以下。(18) According to still another aspect (16) or (17) of the present invention, the maximum depth of the surface unevenness of the aforementioned electrode may be 20 μm or less.
[實施形態][Implementation form]
以下,詳細說明本發明較佳的實施形態。此外,以下說明的本實施形態並非用來不當地限制記載於申請專利範圍的本發明內容,本實施形態所說明的構成的全體並不一定是作為本發明的解決手段所必須者。Hereinafter, a preferred embodiment of the present invention will be described in detail. In addition, the present embodiment described below is not intended to unduly limit the content of the present invention described in the scope of the patent application, and the entire structure described in the present embodiment is not necessarily required as a solution of the present invention.
1.電子元件的製造方法 在圖1中表示有:具有端部2的電子部件本體1、例如在定盤(圖未示)上以均勻厚度形成的導電性糊料的浸漬層3。端面2包含:端面2A、及與其接續的側面2B;關於在電子部件本體1的端部2形成電極而製造電子部件的本實施形態的製造方法,包含:在電子部件本體1的端部2形成導電性糊料層的第1工程、在導電性糊料層硬化前,調整形成於電子部件本體1的端面2A的導電性糊料層的膜厚的第2工程、在導電性糊料層硬化前,調整形成於電子部件本體1的側面2B的導電性糊料層的膜厚的第3工程。1. Manufacturing method of electronic component is shown in FIG. 1 as an
1.1.第1實施形態 在圖2(A)(B)及圖3(A)(B)表示第1實施形態的第1工程及第3工程。此外,為了使說明更容易理解,以誇張的尺寸描繪圖式中的一部分的構件,例如浸漬層3及導電性糊料層4的尺寸及形狀與其他構件的尺寸及形狀相比被擴大。1.1. The first embodiment Fig. 2(A)(B) and Fig. 3(A)(B) show the first process and the third process of the first embodiment. In order to make the description easier to understand, some of the members in the drawing are drawn with exaggerated dimensions. For example, the sizes and shapes of the impregnated
為了實施第1工程,如圖2(A)所示,使電子部件本體1與浸漬層3相對移動(上下動),使電子部件本體1的端部2浸漬於浸漬層3。之後,如圖2(B)所示,使電子部件本體1與浸漬層3相對移動(上下動),使電子部件本體1的端部2從浸漬層3分離。藉此,在電子部件本體1的端部2塗佈形成導電性糊料層4。In order to implement the first process, as shown in FIG. 2(A), the
圖3(A)(B)表示第3工程。在該第3工程的前或後,例如雖然將專利文獻2所記載的習知的塗抹工程作為第2工程來實施,但關於第2工程之後再說明。為了實施第3工程,如第3圖(A)所示,例如使用膜厚調整構件(第2膜厚調整構件)5A。膜厚調整構件5A可以是與形成於端部2的全側面(為矩形剖面的本實施形態中為4側面)的至少一個側面2B的導電性糊料層4相接觸者。不管膜厚調整構件5A的形狀為何,只要是與側面2B線接觸或面接觸者即可。但是,也可以是與導電性糊料層4非接觸的膜厚調整構件,例如從膜厚調整構件即噴出噴嘴使壓縮空氣噴出,來調整側面2B上的導電性糊料層4的膜厚也可以。Figure 3 (A) (B) shows the third process. Before or after the third process, for example, the conventional painting process described in
作為膜厚調整構件,較佳為環狀構件,例如若使用如圖3(A)的那種環狀線材5A的話,能夠同時調整形成於端部2的全側面2B的導電性糊料層4的膜厚。在第3工程中,如圖3(A)所示,使電子部件本體1與環狀線材5A相對移動(上下動),使電子部件本體1的端部2配置於環狀線材5A之中。藉此,因為使形成於側面2B的導電性糊料層4與環狀構件5A接觸,形成於側面2B的未調整的導電性糊料層4的膜厚的厚的部分,會被環狀構件5A削除,或者被移至薄的部分。之後,如圖3(B)所示,使電子部件本體1與環狀線材5A相對移動(上下動),使側面2B上的具有經膜厚調整的導電性糊料層(也稱為電極)4A的端部2從環狀線材5A脫離。因此,在第1工程所形成的端部2的導電性糊料層4,因為在其硬化前實施第2及第3工程,能夠加工成端面2A及側面2B的膜厚經調整的導電性糊料層4A。The film thickness adjusting member is preferably a ring-shaped member. For example, if a ring-shaped
圖4(A)(B)為表示對以一維配列或二維配列的複數電子部件本體1,同時實施第3工程的圖。此時,作為膜厚調整構件,複數環狀線材5A使用一維或二維配列的網狀構件5。如圖5所示,與在行或列方向上相鄰的2個電子部件本體1、1的配列間距d一致而將環狀線材5A配列,在圖5中,在行或列方向上相鄰的2個環狀線材5A不共用線材而互相獨立。換言之,在行或列方向上相鄰的2個電子部件本體1、1之間配置有2條線材。或者,以在行或列方向上相鄰的2個電子部件本體1、1之間配置兩者共用的1條線材來取代之也可以(參照圖7)。Fig. 4(A)(B) is a diagram showing the simultaneous implementation of the third process for a plurality of
1.2.第2實施形態 圖6(A)(B)表示使用傳遞音波的膜厚調整構件來實施第3工程的本發明的第2實施形態。在圖6(A)(B)中,膜厚調整構件例如網狀構件5的端部連接超音波振動元件6(廣義來說為音波發生源)。特別是,網狀構件5為線材彼此在交點接觸者較佳。又,網狀構件5使用容易傳遞音波及超音波的線材例如鋼琴線較佳。因為音波為等方向傳遞,能夠使音波在網狀構件5的行方向及列方向延伸,且在交點接觸的所有線材傳遞。如圖6(A)所示,在形成於網狀構件5的複數環狀線材5A之中配置端部2的話,因為對環狀線材5A賦予藉由超音波的頻率及振幅來定義的振動能量,能更有效率地調整膜厚。而且,附著於網狀構件5的多餘的導電性糊料因為音波的振動而落下,能防止網狀構件5的污染。之後,如圖6(B)所示,使電子部件本體1與環狀線材5相對移動(上下動),使側面2B上的具有經膜厚調整的導電性糊料層4A的端部2從環狀線材5A脫離。1.2. The second embodiment Fig. 6(A)(B) shows a second embodiment of the present invention in which the third process is implemented using a film thickness adjusting member that transmits sound waves. In FIG. 6(A)(B), the end of a film thickness adjusting member such as a
在膜厚調整構件例如網狀構件5傳遞的音波能夠調整頻率。圖7表示藉由音波的頻率所調整的波長、與電子部件本體間1、1間的間距d的關連。例如,將間距作為d=5.29mm、網狀構件5的音波傳遞速度作為5290m/s而調整頻率時。此時,頻率在250kHz的波長≒4×d、在500kHz的波長≒2d、在1MHz的波長≒d。撰擇音波的波長大致等於d或2d的頻率後,賦予至各個環狀線材5d的振動能量變得大致相等,期待能將複數電子部件本體1的各端部2的側面2B調整為均等的膜厚。The frequency of the sound wave transmitted through the film thickness adjusting member such as the
在圖7中,在網狀構件5的輪廓的一部分(例如略矩形的一邊)配置超音波振動元件6,在網狀構件5的輪廓的另一部分(例如與略矩形的一邊對向的另一邊)配置反射構件7。這樣的話,也能夠使反射波的能量利用於膜厚調整。此外,將音波作為超音波的話,利用超音波的高頻,能夠將與頻率相依的能量提高來調整膜厚。藉由使電子部件本體1與膜厚調整構件5相對移動,能夠覆蓋膜厚調整範圍。In FIG. 7, the
此外,為了調整頻率,例如將波形監視器連接至反射構件7,在觀察波形的同時確認波長的長度及相位,而將連接至超音波振動元件6的驅動部調諧進而調整頻率也可以。又,在圖7所示的網狀構件5的縱橫的線材(例如鋼琴線)設置:附加張力來使其維持網狀的圖未示的框體也可以。又,超音波振動元件6沿著圖7所示的網狀構件5的一邊配置,不限於對在圖7的橫方向延伸的所有線材供應超音波者,對至少一條線材供應超音波也可以。因為超音波以等方向傳遞,在縱橫的所有線材傳遞。In addition, in order to adjust the frequency, for example, a waveform monitor is connected to the
1.3.第3實施形態 本發明的第3實施形態為:例如在圖2(A)(B)所示的第1工程之後,同時實施第2工程及第3工程者。在該第3實施形態中,如圖8(A)所示,準備例如在表面形成至少一個複數凹部12的定盤(也稱為模盤)10。凹部12的底壁、側壁作為第1、第2膜厚調整構件來作用。此外,電子部件本體1使端部2露出,保持於載體平板(夾具)20。載體平板20也可以用於第1、第2實施形態。載體平板20例如由彈性體形成。電子部件本體1殘留一端部並嵌合於孔22中而保持於載體平板20。1.3. The third embodiment The third embodiment of the present invention is, for example, a person who simultaneously implements the second process and the third process after the first process shown in FIG. 2(A)(B). In this third embodiment, as shown in FIG. 8(A), for example, a fixed plate (also referred to as a mold plate) 10 having at least one plurality of
如從圖8(B)到圖8(C)的移動,使定盤10與載體平板20相對移動(上下動),在定盤10的凹部12內,插入形成有導電性糊料層4的端部2。藉此,形成於端面2A與側面2B的導電性糊料層4,被藉由將凹部12畫分的底壁(第1膜厚調整構件)與側壁(第2膜厚調整構件)來進行膜厚調整。在凹部12內,經膜厚調整的導電性糊料層4被硬化。之後,如圖8(D)所示,使載體平板20相對於定盤10相對移動,使形成於電子部件本體1的端部2的導電性糊料層4A從定盤10的凹部12脫離。8(B) to 8(C), the fixed
其中,導電性糊料為具有流動性及高黏性的導電性物質,為懸濁分散系統。在當導電性糊料層4、4A具有流動性時將其放入凹部12中進行膜厚調整,藉由定盤10的加熱及乾燥等使其在凹部12內加速硬化。此外,導電性糊料層4的量較佳為調整成不會從定盤10的凹部12溢出的量。Among them, the conductive paste is a conductive material with fluidity and high viscosity, which is a suspended dispersion system. When the
1.4.第4實施形態 本發明的第4實施形態為:同時實施第1工程、第2工程及第3工程者。在該第4實施形態中,如圖9(A)所示,在模盤10的凹部12內,形成圖1所示的導電性糊料的浸漬層3。也就是說,在本實施形態中,凹部12除了作為第1、第2膜厚調整構件以外也作為塗佈部來作用。1.4. The fourth embodiment The fourth embodiment of the present invention is to implement the first process, the second process, and the third process at the same time. In this fourth embodiment, as shown in FIG. 9(A), the impregnated
如從圖9(B)到圖9(C)的移動,使定盤10與載體平板20相對移動(上下動),將電子部件本體1的端部2浸漬於在模盤10的凹部12內形成的浸漬層3。藉此,端部2即端面2A與側面2B,在形成導電性糊料層4的同時,被藉由將凹部12畫分的底壁(第1膜厚調整構件)與側壁(第2膜厚調整構件)來進行膜厚調整。在凹部12內,導電性糊料層4A硬化後,如圖9(D)所示,使載體平板20相對模盤10相對移動,使形成於電子部件本體1的端部2的導電性糊料層4A從模盤10的凹部12脫離。9(B) to 9(C), the fixed
2.第1、第2實施形態的實施所用的製造裝置 2.1.電子部件的製造裝置 圖10表示第1或第2實施形態的實施所用的製造裝置。該製造裝置具有:載體平板(夾具)20、膜厚調整構件例如圖4(A)(B)、圖6(A)(B)或圖7等所示的網狀構件5(可具備超音波振動元件6或反射體7,不具備也可以)、定盤100。2. Manufacturing equipment used in the implementation of the first and second embodiments 2.1. Electronic component manufacturing equipment Figure 10 shows the manufacturing equipment used in the implementation of the first or second embodiment. This manufacturing device has: a carrier plate (jig) 20, a film thickness adjustment member such as the
載體平板(夾具)20一致於電子部件本體1的端部2的輪廓,例如在圖11(A)(B)所示平面視時可以具有矩形孔22。使用矩形孔22的話,分批處理的複數的電子部件本體1的尺寸L11的長邊與尺寸L21的短邊的方向相對齊。因此,能夠使保持於夾具20的電子部件本體1的短邊例如與X方向一致,使長邊例如與Y方向一致。但是,孔22一致於電子部件本體1的端部2的輪廓而形成,未必會是矩形。The carrier plate (clamp) 20 conforms to the contour of the
將電子部件本體1插入如圖11(A)所示的夾具20的矩形孔22時,可以使用與夾具20重疊配置的插入導引150。插入導引150具有:圓形錐體孔152、及與其連通的矩形孔154。放入圓形錐體孔152的電子部件本體1,例如藉由向插入導引150賦予振動等,使其導向矩形孔154而方向被對齊。之後,藉由按壓部160來使電子部件本體1例如彈性嵌合於橡膠製夾具20的矩形孔22。When inserting the
在圖10中,將電子部件本體1垂下而保持的載體平板(夾具)20,被以裝卸自如的方式支持於夾具固定盤30。在夾具固定盤30的上方固定有基盤40,在下方配置有定盤100,例如在側方配置有膜厚調整構件(例如網狀構件5)。在基盤40設有使夾具固定盤30移動的移動機構50。其中,在圖10中將垂直三軸方向設為X、Y、Z。移動機構50可以包含:X軸驅動部60、Y軸驅動部70及Z軸驅動部80。Z軸驅動部80是必要的,但X軸驅動部60及Y軸驅動部70可以隨意。此外,移動機構50可以是將夾具固定盤30及定盤100的至少一者,至少在Z軸方向上移動者。In FIG. 10, the carrier plate (jig) 20 which hangs down the electronic component
X軸驅動部60可以藉由沿著X軸軌道62相對於基盤40在X軸方向上可移動的X載台來構成。Y軸驅動部70可以藉由沿著Y軸軌道72相對於X軸驅動部60在Y軸方向上可移動的Y載台來構成。Z軸驅動部80例如固定於Y軸驅動部70,在Z軸82往Z軸方向上可移動。The
夾具固定盤30被固定於Z軸82。因此,夾具固定盤30、夾具20及電子部件本體1藉由移動機構50,相對於定盤100在Z軸方向上移動,同時可沿著平行定盤100表面的X-Y平面移動。又,網狀構件5藉由圖未示的移動機構在X方向上進退移動。網狀構件5在實施第3工程時,配置於夾具20的下方,除此之外時退避至圖10的位置。The
2.2.第1工程及第2工程 以下,說明記載於本案申請人的台灣專利申請號105133284的第1工程、第2工程、及改良的第2工程。2.2.
2.2.1.第1工程前的端面調整工程 如圖12(A)所示,保持有電子部件本體1的夾具20被固定於夾具固定盤30。圖12(B)表示電子部件本體1的端面高度的調整工程。在圖12(B)中,相對於未鋪設導電性糊料的定盤100,藉由Z軸驅動部80來使保持於夾具20的電子部件本體1下降,使電子部件本體1的端面2A接觸定盤100。藉此,保持於夾具20的電子部件本體1的端面2A的高度變得均勻。2.2.1. End face adjustment process before the first process As shown in FIG. 12(A), the
2.2.2.第1工程 圖13(A)~圖13(C)表示導電性糊料的浸漬塗佈工程(第1工程)。在圖13(A)中,使刀片112藉由刮刀單元110來水平移動,在定盤100上形成由導電性糊料130所形成的高度h1的浸漬層130。在圖13(B)中,藉由Z軸驅動部80來使電子部件本體1下降,使電子部件本體1的端面2A接觸定盤100上的浸漬層130。之後,如圖13(C)所示,使電子部件本體1上升。藉此,在電子部件本體1的端部2形成導電性糊料層4。2.2.2. The first process Figure 13 (A) ~ Figure 13 (C) show the conductive paste dip coating process (the first process). In FIG. 13(A), the
2.2.3.第2工程 圖14(A)~圖14(C)表示從前的塗抹工程(第2工程)。在圖14(A)中,藉由刮刀單元來使與定盤100的表面101接觸的刀片114水平移動,刮取定盤100上的導電性糊料。在圖14(B)中,使電子部件本體1下降,使形成於電子部件本體1的端部2的導電性糊料層4接觸定盤100。之後,如圖14(C)所示,使電子部件本體1上升。2.2.3. The second process Figure 14 (A) ~ Figure 14 (C) show the previous painting process (the second process). In FIG. 14(A), the
2.2.4.改良的第2工程 2.2.4.1.濕式 圖15(A)~圖15(C)表示接著圖14(A)所實施的塗抹工程。從定盤100上將導電性糊料刮取後,形成在圖15(A)中的由刀片114所設定的高度h2的糊料膜層(潤濕層)140。也就是說,在從前的塗抹工程中,利用無糊料膜層的乾狀態的定盤100實施塗抹工程,但在本實施形態中,利用形成糊料膜層(潤濕層)140的濕狀態的定盤100來實施塗抹工程。2.2.4. Second process of improvement 2.2.4.1. Wet type Figure 15(A) to Figure 15(C) show the painting process performed following Figure 14(A). After the conductive paste is scraped from the table 100, the paste film layer (wetting layer) 140 of the height h2 set by the
接著,如圖15(B)所示使電子部件本體1下降,使形成於電子部件本體1的端部2的導電性糊料層4接觸糊料膜層(潤濕層)140。再來,藉由圖10所示的移動機構50的X軸驅動部60及/或Y軸驅動部70,使導電性糊料層14以接觸糊料膜層(潤濕層)140的狀態,使電子部件本體1在與定盤100的表面101平行的至少一方向上(例如X軸方向及Y軸方向的至少一方向上)相對移動。之後,如圖15(C)所示,使電子部件本體1上升。藉此,因為導電性糊料層14在與定盤100上的糊料膜層(潤濕層)140接觸並同時移動,在平坦化的同時,也能使成為起絲原因的多餘的導電性糊料轉印至定盤面101側並能夠擦取之。使該多餘的導電性糊料轉印至定盤面的效果,相較於如專利文獻2使電子部件成為靜止狀態,如本發明的實施形態這樣以與定盤100平行的方式使電子部件本體1移動的效果更為顯著。Next, as shown in FIG. 15(B), the
2.2.4.2.乾式 取代圖15(A)~圖15(C)所示的濕式,使電子部件本體1的導電性糊料層4接觸未形成糊料膜層(潤濕層)140的乾狀態的定盤100表面101,且使電子部件本體1在與定盤100表面101平行的至少一方向上,較佳為在相異的二個以上的方向上相對移動。特別是使其在相異的二個以上的方向上移動的話,能提高在從前的塗抹工程中使無法轉印至定盤100側的多餘的導電性糊料轉印至定盤100側的效果。2.2.4.2. The dry method replaces the wet method shown in FIGS. 15(A) to 15(C), and the
3.第3、第4實施形態的實施所用的製造裝置 3.1.第4實施形態的實施所用的製造裝置 圖16表示第4實施形態的實施所用的製造裝置200。圖16所示的載體平板20,在例如在金屬製基部20A形成的孔20B內配置彈性體例如橡膠(例如矽橡膠)20C,在彈性體20C形成將電子部件本體1彈性保持的孔22。3. Manufacturing equipment used in the implementation of the third and fourth embodiments 3.1. Manufacturing equipment used in the implementation of the fourth embodiment Figure 16 shows a manufacturing equipment 200 used in the implementation of the fourth embodiment. In the
另一方面,圖16所示的模盤10,在模部10B形成孔10B1,在該孔10B1內配置凹部形成構件10B2,填充有導電性糊料3的凹部12形成於凹部形成構件10B2內。凹部形成構件10B2較佳為以能形成成形精度高的凹部12的材料例如矽橡膠來形成。凹部形成構件B2能夠與例如圖16所示的調溫部10C接觸。藉此,調溫部10C與凹部12內的浸漬層(導電性糊料)3之間的熱交換會通過凹部形成構件10B2來進行。調溫部10C能夠使用:加熱部例如加熱器、能切換加熱/冷卻的例如珀耳帖元件(Peltier device)等來構成。藉由加熱導電性糊料能加速硬化。將模盤(定盤)10冷卻後,模盤10除了會收縮以外,相對地凹部12能夠擴大,藉此能提升導電性糊料層4A的離模性。On the other hand, the
如圖16所示,模盤10的基部10A與載體平板20的基台24,能夠相對移動(上下動)。藉此,能實施圖9(B)~圖9(D)的各工程。模盤10的基部10A與載體平板20的基台24,在相對移動時,藉由定芯導引構件(Guide member)52來導引較佳。例如基部10A側的雌構件52A、與例如基台24側的雄構件52B之間的例如藉由錐體狀的嵌合,對於模盤10的凹部12電子部件本體1被定芯。As shown in FIG. 16, the
在從載體平板20及模盤10相對移動的方向來觀察時的模盤10的平面圖(圖17)中,模盤10的凹部12為比電子部件本體1的端部2輪廓(鏈線)還大的輪廓(實線),且具有與電子部件本體1的端部2輪廓(鏈線)相似輪廓(實線)。在圖17中,藉由導引構件52的作用,電子部件本體1的端部2輪廓(鏈線)的中心P1會與凹部12輪廓(實線)的中心P2一致。In the plan view (FIG. 17) of the
確保了圖17所示的定芯狀態(P1=P2)後,在電子部件本體1的端部2,以與設計相同的形狀及膜厚來形成導電性糊料層(電)4A。圖18表示配置於凹部12的電子部件本體1。電子部件本體1的端面2包含:端面2A、及側面2B。另一方面,模盤10的凹部12包含:與端面2A對向的底壁12A、及與側面2B對向的側壁12B。從電子部件本體1的左側面2B到凹部12的側壁12B的距離T11L、與從電子部件本體1的右側面2B到凹部12的側壁12B的距離T11R能設為實質上相等。藉此,能將形成於電子部件本體1的端部2側面2B的導電層4膜厚設為實質上均等。After ensuring the centering state (P1=P2) shown in FIG. 17, at the
藉由管理模盤10的基部10A與載體平板20的基台24的相對移動距離,從電子部件本體1的端面2A到凹部12的底壁12A的距離T21、與從電子部件本體1的側面2B到凹部12的側壁12B的距離T11R、T11L能設為實質上相等。By managing the relative movement distance between the base 10A of the
這樣,在電子部件本體1的端部2之中,能夠確保在端面2A及側面2B具有必要充分且均勻厚度的導電層4A。在從前的浸漬塗佈法中,在導電性糊料層降下為止會因自體重量等,使得電子部件本體的端部之中,在端面與側面的導電層厚度不同,藉由本實施形態能夠自始使得在端面2A及側面2B的導電層厚度實質相等。In this way, in the
在圖18中,凹部12的底壁12A與側壁12B相交的第1角部12C的輪廓,比電子部件本體1的端面2A與側面2B相交的第2角部2C的輪廓還大,且與第2角部2C的輪廓為相似形狀。這樣的話,能夠使覆蓋電子部件本體1的端面2A與側面2B相交的第1角部2C的導電層4的厚度T31,為其他厚度T11R、T11L及T21以上。In FIG. 18, the contour of the
3.2.第3實施形態的實施所用的製造裝置 第3實施形態的實施所用的製造裝置,藉由:圖10所示的製造裝置(但不需要網狀構件5、移動機構50中的X、Y驅動部60、70)、圖16所示的製造裝置(但不需要凹部12內的浸漬層3)來構成。藉由圖10所示的製造裝置,在圖8(B)所示電子部件本體1的端部2實施塗佈導電性糊料層4的第2工程。藉由圖16所示的製造裝置,能夠實施圖8(C)(D)所示的第2、第3工程。3.2. Manufacturing device used in the implementation of the third embodiment The manufacturing device used in the implementation of the third embodiment is provided by: the manufacturing device shown in FIG. 10 (but the X, Y in the
4.電子部件 圖19表示由上述製造方法所製造的電子部件1A,圖20表示形成於電子部件本體1的導電層4A的剖面。在此,本發明所適用的電子部件1A的大小並沒有特別限制,適合隨著尺寸降低而超小型化的電子部件1A。作為超小型的電子部件1A,將圖19所示的例如矩形(正方形或長方形)剖面的一邊的最大長度設為L1,將與矩形剖面垂直的方向的長度設為L2時,L1=500μm以下且L2=1000μm以下。較佳為L1=300μm以下L2=600μm以下、更佳為L1=200μm以下且L2=400μm以下、再更佳為L1=125μm以下且L2=250μm以下。此外,這裡所指的矩形除了是二邊相交的角部被嚴格地限制為90°以外,也包含角部為彎曲或去角的略矩形狀者。此外,本發明當然也適用於矩形剖面以外的電子部件1A。4. Electronic component FIG. 19 shows an
4.1.電極的膜厚 在圖20中,形成於端面2A的電極4A的實質上均勻的厚度T1、形成於側面2B的電極4A的實質上均均的厚度T2可以是指實質上T1=T2。該膜厚,雖然與利用表示凹部12的膜厚調整(第3、第4實施形態)後的尺寸的圖18的說明一樣,也能利用凹部12以外的膜厚調整構件5A等的第1、第2實施形態來確保。而且特別是根據第3、第4實施形態,形成於角部2C的電極4A的厚度T3可以設為T3≧T1或T3≧T2。該等膜厚,與從前的塗抹工程後的膜厚作明確的區別。4.1. Film thickness of the electrode "In FIG. 20, the substantially uniform thickness T1 of the
4.2電極的平坦性評價 圖21(A)(B)表示藉由本實施形態的方法所製造的電子部件1A的端面。作為比較例,圖22(A)(B)表示實施專利文獻2所揭示的塗抹工程(僅有Z移動)所製造的電子部件的端面。4.2 Evaluation of flatness of electrodes Figure 21 (A) (B) shows the end surface of the
經由比較本實施形態的圖21(A)與比較例的圖22(A)可以明確得知:相對於在圖21(A)中在電極的表面未存在有導電性糊料的起絲所造成的環狀痕跡,在圖22(A)和上述一樣在兩個地方生成明確的管狀痕跡。比較例的圖22(A)所示的環狀痕跡,使圖22(B)所示的電極表面成為凸狀阻礙了平坦性。痕跡部分產生破裂生,也會發生剝離。將電子部件焊接至基板的話,只有容易剝離的痕跡部分被焊接,焊接品質會變得不穩定。By comparing Figure 21 (A) of this embodiment with Figure 22 (A) of the comparative example, it is clear that compared to Figure 21 (A), there is no threading of the conductive paste on the electrode surface. As shown in Figure 22(A), there are clear tubular marks in two places as above. The ring-shaped trace shown in FIG. 22(A) of the comparative example makes the surface of the electrode shown in FIG. 22(B) convex and hinders flatness. Cracking occurs in the trace part, and peeling also occurs. When soldering electronic components to a substrate, only the traces that are easily peeled off are soldered, and soldering quality becomes unstable.
判明圖22(B)的兩個地方的環狀痕跡所引起的電極表面的凹凸的最大深度為70~180μm。相對此於,在圖21(B)所示的本實施形態的電子部件中,因為電極不存在有環狀痕跡,能使得電極的表面的凹凸的最大深度具有20μm以下、較佳為具有10μm以下的平坦性。It was found that the maximum depth of the unevenness of the electrode surface caused by the ring-shaped marks in the two places in FIG. 22(B) was 70 to 180 μm. In contrast, in the electronic component of the present embodiment shown in FIG. 21(B), since there are no ring-shaped traces on the electrode, the maximum depth of the unevenness on the electrode surface can be 20 μm or less, preferably 10 μm or less The flatness.
此外,如同上述雖然詳細說明本實施形態,但該技術領域的通常知識者應能理解在不脫離本發明的新穎事項及效果的實體範圍內,能有許多變化。因此,這些變形例全都包含在本發明的範圍內。例如,在說明書或圖式中,至少一次,用更廣義或同義的不同用語一同記載的用語,在說明書或圖式中任一部分,都可以用該不同用語來置換。又本實施形態及變形例的所有組合都包含於本發明的範圍內。In addition, although the present embodiment has been described in detail as described above, those skilled in the art should understand that many changes can be made without departing from the scope of the novelty and effects of the present invention. Therefore, these modified examples are all included in the scope of the present invention. For example, in the specification or the drawings, at least once, a term that is described together with a different term that is broader or synonymous can be replaced with the different term in any part of the specification or the drawing. In addition, all combinations of the present embodiment and modification examples are included in the scope of the present invention.
其中,例如圖11(B)的矩形孔22的長度L11、L21的一者,例如使長度L21比電子部件本體1的對應的一者的長度還長,來使如圖11(A)所示的電子部件本體1容易插入矩形孔22內也可以。在這種情況,將電子部件本體1裝設於夾具20後,電子部件本體1的定芯(例如圖11(B)的X軸或Y軸方向的定位)是必要的。Among them, for example, one of the lengths L11 and L21 of the
圖23(A)(B)表示電子部件本體1的定芯夾具及定芯方法。該定芯夾具具有:將電子部件本體1夾在中間而配置的2條線材5B、5C。超音波振動元件6如圖23(A)所示,使僅以半波長相位相互偏移的音波在2條線材5B、5C傳遞。當設有反射構件7時,不使被傳遞的音波產生相位偏移而反射的話,也能夠利用該反射能量。因為僅偏移半波長相位的2種音波的波形中的波峰之間的相位為一致,藉由傳遞該音波而如圖24(B)那樣使振動的2條線材5B、5C接觸,能矯正電子部件本體1的位置。藉此,能將偏移中芯的電子部件本體1定芯。FIG. 23(A)(B) shows the centering jig and the centering method of the
如圖23(A)所示,具有複數一對的線材5B、5C時,供應在各一對線材5B、5C相位偏移的音波。此時,將供應至一對線材5B、5C的相位偏移的2種音波,並列供應至其他全部的一對線材5B、5C的話,僅設有2個超音波振動元件也可以。又,取代圖23(A)的定芯夾具,將圖6(A)(B)或圖7所示的網狀構件5作為定芯夾具兼用也可以。因為包含於網狀構件5的環狀線材5A的內部尺寸比電子部件本體1的對向側面間的距離還大,能作為形成導電性糊料層4前的電子部件本體1的定芯夾具兼用。又,在圖7的橫方向的延伸的2條線材傳遞相位偏移的2種音波的話,在圖7的縱方向延伸的線材中,2種音波會抵消。因為在圖7的縱方向延伸的線材不振動,對圖23(B)所示的定芯動作不會產生不好的影響。As shown in FIG. 23(A), when there are a plurality of pairs of
該定芯工程,在第1、第2實施形態中至少在第3工程之前,在第3實施形態中至少第2、第3工程之前,在第4實施形態中在第1~第3工程之前分別實施的話,能夠在環狀線材5A或凹部12內,將被定芯的電子部件本體1高精度地配置。因此,該定芯工程,在第1工程、第2工程及第3工程的至少一個工程前實施也可以。藉此,能夠使該定芯工程後的第1工程、第2工程及/或第3工程以更高精度來實現。This core alignment process is at least before the third process in the first and second embodiments, before at least the second and third processes in the third embodiment, and before the first to third processes in the fourth embodiment If implemented separately, the centered
此外,該定芯夾具及定芯方法,在塗佈工程(第1工程)、端面的膜厚調整工程(第2工程)或側面的膜厚調整工程(第3工程)的任一者之前實施也可以,未必要伴隨著膜厚調整工程也能發揮定芯效果。因此,作為裝設於夾具的電子部件本體的定芯夾具及定芯方法能被更廣地定義。In addition, the centering jig and centering method are implemented before any one of the coating process (first process), end surface film thickness adjustment process (second process), or side film thickness adjustment process (third process) It is also possible that the centering effect can be exhibited without the need to accompany the film thickness adjustment process. Therefore, a centering jig and a centering method as an electronic component body mounted on the jig can be more widely defined.
1‧‧‧電子部件本體1A‧‧‧電子部件2‧‧‧端部2A‧‧‧端面2B‧‧‧側面3‧‧‧浸漬層4‧‧‧導電性糊料層4A‧‧‧電極(導電性糊料層)5‧‧‧網狀構件(第2膜厚調整構件)5A‧‧‧環狀線材(第2膜厚調整構件)5B,5C‧‧‧線材6‧‧‧音波發生源(超音波振動元件)7‧‧‧反射構件10‧‧‧模盤(定盤)10C‧‧‧調溫部12‧‧‧凹部(塗佈部、第1,第2膜厚調整構件)20‧‧‧夾具22‧‧‧矩形孔24‧‧‧十字孔26‧‧‧圓形孔30‧‧‧夾具固定盤40‧‧‧固定盤50‧‧‧移動機構60‧‧‧X軸驅動部70‧‧‧Y軸驅動部80‧‧‧Z軸驅動部100‧‧‧定盤(第1膜厚調整構件)101‧‧‧表面(定盤面)110‧‧‧刮刀單元112,114‧‧‧刀片130‧‧‧糊料膜層(浸漬層)140‧‧‧糊料膜層(潤濕層)150‧‧‧插入導引152‧‧‧圓形錐體孔154‧‧‧矩形孔1‧‧‧Electronic component body 1A‧‧‧Electronic component2‧‧‧End 2A‧‧‧End 2B‧‧‧Side 3‧‧‧Impregnated layer 4‧‧‧Conductive paste layer 4A‧‧‧Electrode ( Conductive paste layer) 5‧‧‧Mesh member (second film thickness adjustment member) 5A‧‧‧Ring-shaped wire (second film thickness adjustment member) 5B, 5C‧‧‧Wire 6‧‧‧Sound wave source (Ultrasonic vibration element) 7‧‧‧Reflecting member 10‧‧‧Mould plate (fixing plate) 10C‧‧‧Temperature adjustment part 12‧‧‧Concave part (coating part, first and second film thickness adjustment members) 20 ‧‧‧Clamp 22‧‧‧Rectangular hole 24‧‧‧Cross hole 26‧‧‧Circular hole 30‧‧‧Fixture fixing plate 40‧‧‧Fixing plate 50‧‧‧Moving mechanism 60‧‧‧X-axis driving part 70‧‧‧Y-axis driving part 80‧‧‧Z-axis driving part 100‧‧‧Fitting plate (1st film thickness adjustment member) 101‧‧‧ Surface (fixing plate surface) 110‧‧‧Scraper unit 112, 114‧‧ ‧Blade 130‧‧‧Paste film (impregnation layer) 140‧‧‧Paste film (wetting layer) 150‧‧‧Insert guide 152‧‧‧Round cone hole 154‧‧‧Rectangular hole
[圖1] 概略地表示用於本發明的製造方法的電子部件本體與導電性糊料層的浸漬層的圖。 [圖2] 圖2(A)(B)為表示本發明的第1實施形態的製造方法的第1工程的圖。 [圖3] 圖3(A)(B)為表示本發明的第1實施形態的製造方法的第3工程的圖。 [圖4] 圖4(A)(B)為表示對複數電子部件本體同時實施第3工程的圖。 [圖5] 圖4(A)所示的工程的側面圖。 [圖6] 圖6(A)(B)為表示本發明的第2實施形態的製造方法的第3工程的圖。 [圖7] 表示藉由音波的頻率所調整的波長、與電子部件本體間的間距的關連的圖。 [圖8] 圖8(A)~圖8(D)為表示本發明的第3實施形態的製造方法的第2工程及第3工程的圖。 [圖9] 圖9(A)~圖9(D)為表示本發明的第4實施形態的製造方法的第1~第3工程的圖。 [圖10] 表示實施本發明的第1及第2實施形態的製造方法的製造裝置的圖。 [圖11] 圖11(A)(B)為表示插入導引及載體平板的圖。 [圖12] 圖12(A)(B)為表示夾具搬入工程及電子部件的端面高度調整工程的圖。 [圖13] 圖13(A)~圖13(C)為表示導電性糊料的浸漬塗佈工程(第1工程)的圖。 [圖14] 圖14(A)~圖14(C)為表示用於本發明的第1、第2實施形態的從前的塗抹工程(第2工程)的概要的圖。 [圖15] 圖15(A)~圖15(C)為表示用於本發明的第1、第2實施形態的改良的塗抹工程(濕式的第2工程)的圖。 [圖16] 表示實施本發明的第3及第4實施形態的製造方法的製造裝置的圖。 [圖17] 說明模盤的凹部與電子部件本體的端面之間的相似形狀的圖。 [圖18] 說明凹部與電子部件本體的端部之間的間隙尺寸的圖。 [圖19] 本發明的實施形態的電子部件的概略斜視圖。 [圖20] 表示形成於電子部件本體的端部的電極的剖面的圖。 [圖21] 圖21(A)(B)為形成於本發明的實施形態的電子部件的端面的外部電極的正面圖及側面圖。 [圖22] 圖22(A)(B)為形成於比較例的電子部件的端面的外部電極的正面圖及側面圖。 [圖23] 圖23(A)(B)為表示電子部件本體的定芯夾具及定芯工程的圖。[Fig. 1] A diagram schematically showing an impregnated layer of an electronic component body and a conductive paste layer used in the manufacturing method of the present invention. [FIG. 2] FIG. 2(A)(B) is a diagram showing the first step of the manufacturing method of the first embodiment of the present invention. [FIG. 3] FIG. 3(A)(B) is a diagram showing a third step of the manufacturing method of the first embodiment of the present invention. [Fig. 4] Fig. 4(A)(B) is a diagram showing the simultaneous implementation of the third process on multiple electronic component bodies. [Figure 5] The side view of the project shown in Figure 4(A). [FIG. 6] FIG. 6(A)(B) is a diagram showing the third step of the manufacturing method of the second embodiment of the present invention. [Figure 7] A diagram showing the relationship between the wavelength adjusted by the frequency of the sound wave and the distance between the electronic component body. [FIG. 8] FIGS. 8(A) to 8(D) are diagrams showing the second step and the third step of the manufacturing method of the third embodiment of the present invention. [FIG. 9] FIGS. 9(A) to 9(D) are diagrams showing the first to third processes of the manufacturing method of the fourth embodiment of the present invention. [FIG. 10] A diagram showing a manufacturing apparatus that implements the manufacturing methods of the first and second embodiments of the present invention. [Fig. 11] Fig. 11(A)(B) is a diagram showing the insertion guide and carrier plate. [Figure 12] Figure 12 (A) (B) is a diagram showing the jig loading process and the end face height adjustment process of electronic components. [FIG. 13] FIGS. 13(A) to 13(C) are diagrams showing the dip coating process (first process) of the conductive paste. [FIG. 14] FIGS. 14(A) to 14(C) are diagrams showing the outline of the conventional painting process (second process) used in the first and second embodiments of the present invention. [FIG. 15] FIGS. 15(A) to 15(C) are diagrams showing an improved painting process (wet-type second process) used in the first and second embodiments of the present invention. [FIG. 16] A diagram showing a manufacturing apparatus that implements the manufacturing methods of the third and fourth embodiments of the present invention. [Fig. 17] A diagram illustrating the similar shape between the recess of the die plate and the end surface of the electronic component body. [Figure 18] A diagram illustrating the size of the gap between the recess and the end of the electronic component body. [FIG. 19] A schematic perspective view of the electronic component of the embodiment of the present invention. [FIG. 20] A diagram showing a cross-section of an electrode formed at the end of an electronic component body. [FIG. 21] FIG. 21(A)(B) is a front view and a side view of the external electrode formed on the end surface of the electronic component of the embodiment of the present invention. [FIG. 22] FIG. 22(A)(B) is a front view and a side view of the external electrode formed on the end surface of the electronic component of the comparative example. [Fig. 23] Fig. 23(A)(B) is a diagram showing the centering jig and the centering process of the electronic component body.
1‧‧‧電子部件本體 1‧‧‧Electronic component body
4‧‧‧導電性糊料層 4‧‧‧Conductive paste layer
20‧‧‧夾具 20‧‧‧Fixture
30‧‧‧夾具固定盤 30‧‧‧Fixture fixing plate
82‧‧‧Z軸 82‧‧‧Z axis
100‧‧‧定盤(第1膜厚調整構件) 100‧‧‧Fitting plate (the first film thickness adjustment member)
101‧‧‧表面(定盤面) 101‧‧‧Surface (fixed surface)
110‧‧‧刮刀單元 110‧‧‧Scraper unit
112‧‧‧刀片 112‧‧‧Blade
140‧‧‧糊料膜層(潤濕層) 140‧‧‧Paste film layer (wetting layer)
Claims (9)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW107139834A TWI711058B (en) | 2017-08-09 | 2017-08-09 | Manufacturing method and device of electronic component and electronic component |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW107139834A TWI711058B (en) | 2017-08-09 | 2017-08-09 | Manufacturing method and device of electronic component and electronic component |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201911340A TW201911340A (en) | 2019-03-16 |
TWI711058B true TWI711058B (en) | 2020-11-21 |
Family
ID=66590233
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW107139834A TWI711058B (en) | 2017-08-09 | 2017-08-09 | Manufacturing method and device of electronic component and electronic component |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI711058B (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7079511B2 (en) * | 2020-04-02 | 2022-06-02 | 株式会社クリエイティブコーティングス | Manufacturing method of electronic parts |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW430103U (en) * | 1999-12-31 | 2001-04-11 | Inpaq Technology Co Ltd | Electrode structure improvement of stacked electronic devices |
TW200946608A (en) * | 2008-02-26 | 2009-11-16 | Cambrios Technologies Corp | Methods and compositions for ink jet deposition of conductive features |
JP2011166030A (en) * | 2010-02-12 | 2011-08-25 | Murata Mfg Co Ltd | Method of forming electrode and method of manufacturing electronic component containing the electrode |
TWI474343B (en) * | 2007-10-26 | 2015-02-21 | Teijin Ltd | Transparent conductive laminates and transparent touch panels |
TWI587333B (en) * | 2015-07-01 | 2017-06-11 | Holy Stone Enterprise Co Ltd | Ceramic capacitor structure |
-
2017
- 2017-08-09 TW TW107139834A patent/TWI711058B/en active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW430103U (en) * | 1999-12-31 | 2001-04-11 | Inpaq Technology Co Ltd | Electrode structure improvement of stacked electronic devices |
TWI474343B (en) * | 2007-10-26 | 2015-02-21 | Teijin Ltd | Transparent conductive laminates and transparent touch panels |
TW200946608A (en) * | 2008-02-26 | 2009-11-16 | Cambrios Technologies Corp | Methods and compositions for ink jet deposition of conductive features |
JP2011166030A (en) * | 2010-02-12 | 2011-08-25 | Murata Mfg Co Ltd | Method of forming electrode and method of manufacturing electronic component containing the electrode |
TWI587333B (en) * | 2015-07-01 | 2017-06-11 | Holy Stone Enterprise Co Ltd | Ceramic capacitor structure |
Also Published As
Publication number | Publication date |
---|---|
TW201911340A (en) | 2019-03-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2018070093A1 (en) | Method and apparatus for manufacturing electronic component, and electronic component | |
KR20210030893A (en) | Electronic component manufacturing device | |
US20240075679A1 (en) | Systems and methods for 3d printing with vacuum assisted laser printing machine | |
TWI711058B (en) | Manufacturing method and device of electronic component and electronic component | |
JP2016100459A (en) | Manufacturing method and apparatus of electronic component and electronic component | |
TWI660376B (en) | Manufacturing method and device of electronic component and electronic component | |
EP4000930A1 (en) | Three-dimensional molding machine | |
JP2010517276A (en) | Method and apparatus for joining solder balls arranged at predetermined intervals | |
CN110890451A (en) | Method for applying electronic components | |
TWI690950B (en) | Manufacturing method and device of electronic parts | |
KR100755801B1 (en) | Apparatus and method of fabricating solder bump and solder ball | |
JP2013030523A (en) | Method of manufacturing metal-ceramic junction circuit board | |
JP5189494B2 (en) | Method for forming a contact structure between a microelectronic component and a carrier substrate, and an assembly unit formed by this method | |
US3333278A (en) | Method of making frequency responsive device | |
CN103203970A (en) | A hybrid preparation process for a three-dimensional mask plate | |
US9572293B2 (en) | Placement apparatus and a suction nozzle for an optical component | |
JP7199507B2 (en) | Deposition equipment and mounter | |
WO2022107307A1 (en) | Production method and production device for three-dimensionally fabricated object | |
KR101759545B1 (en) | Apparatus for removing paste from squeegee | |
KR101889874B1 (en) | Piezo-electric element for parts feeder, manufacturing method thereof and parts feeder using the same | |
CN115921910B (en) | Vibrating mirror spray head multi-material 3D printing equipment and printing method | |
CN117412819A (en) | Method for manufacturing electronic component and paste application device | |
WO2021105976A1 (en) | Methods and systems for producing three-dimensional electronic products | |
JP2021136383A (en) | Manufacturing method of metal structure | |
TW202207250A (en) | Electronic component manufacturing method and device |