TWI706577B - Method for manufacturing long-period fiber grating - Google Patents

Method for manufacturing long-period fiber grating Download PDF

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TWI706577B
TWI706577B TW108133946A TW108133946A TWI706577B TW I706577 B TWI706577 B TW I706577B TW 108133946 A TW108133946 A TW 108133946A TW 108133946 A TW108133946 A TW 108133946A TW I706577 B TWI706577 B TW I706577B
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optical fiber
long
laser
manufacturing
fiber
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TW202114245A (en
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江家慶
溫新宜
陳景綸
翁健傑
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國立高雄科技大學
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Abstract

本發明揭櫫一種長週期光纖光柵的製造方法,此方法包含:設置一具長週期結構的遮罩件於一光纖上;照射一雷射經遮罩件至光纖,使光纖對應長週期結構之部位的表面燒熔,而非對應長週期結構之部位的表面未燒熔;以及濕蝕刻光纖。 The present invention discloses a method for manufacturing a long-period fiber grating. The method includes: arranging a shielding member with a long-period structure on an optical fiber; irradiating a laser to the optical fiber through the shielding member so that the optical fiber corresponds to the long-period structure The surface of the part is melted, but not the surface of the part corresponding to the long-period structure; and the fiber is wet-etched.

Description

長週期光纖光柵的製造方法 Method for manufacturing long-period fiber grating

本發明關於一種光纖光柵的製造方法,且特別攸關一種長週期光纖光柵的製造方法。 The invention relates to a method for manufacturing a fiber grating, and particularly relates to a method for manufacturing a long-period fiber grating.

請參照中華民國發明專利公告號I394993,揭示一種可調變長週期光纖光柵的製作方法,其包含:預先去除光纖的纖衣層,並蝕刻縮減光纖的披覆層厚度;於基材表面上形成金屬層;於金屬層表面上塗覆光阻層並軟烤;曝光光阻層後再次加熱光阻層;經由顯影液去除未曝光的光阻層,以形成下幾何構造於金屬層表面上;將光纖固定於下幾何構造上;再次塗覆另一光阻層於光纖及下幾何構造上,並對光阻層曝光顯影,以形成上幾何構造堆疊於下幾何構造上,藉此上幾何構造與下幾何構造於光纖外表面構成鋸齒狀幾何構造的光阻層;加熱光纖及其外表面的光阻層;及利用分離液使光纖外表面的光阻層與金屬層分離,以取得可調變長週期光纖光柵成品。 Please refer to the Republic of China Invention Patent Publication No. I394993, which discloses a method for fabricating a variable-length-period fiber grating which includes: removing the fiber coating layer of the fiber in advance, and etching to reduce the thickness of the coating layer of the fiber; forming on the surface of the substrate Metal layer; coating a photoresist layer on the surface of the metal layer and soft-baking; heat the photoresist layer again after exposing the photoresist layer; remove the unexposed photoresist layer through a developer to form a lower geometric structure on the surface of the metal layer; The optical fiber is fixed on the lower geometric structure; another photoresist layer is coated on the optical fiber and the lower geometric structure again, and the photoresist layer is exposed and developed to form an upper geometric structure stacked on the lower geometric structure, whereby the upper geometric structure and The lower geometric structure is formed on the outer surface of the optical fiber to form a photoresist layer with a zigzag geometric structure; the optical fiber and the photoresist layer on the outer surface are heated; and the photoresist layer on the outer surface of the optical fiber is separated from the metal layer by a separating liquid to achieve adjustable The finished long-period fiber grating.

請另參照中華民國發明專利公告號I484232,揭示一種可調變長週期光纖光柵的製作方法,此方法可提升製程效率且包含:預先去除光纖的纖衣層,並蝕刻縮減光纖的披覆層厚度達10至125μm;以物理氣相沉積、化學氣相沉積、或貼合於基材表面上形成犧牲層;以網版印刷機台於犧牲層上印製第一幾何構造,第一幾何構造為呈連續排列的凸塊;將光纖固定於第一幾何構造上;以網版印刷機台於第一幾何構造上印製第二幾何構造,且第二幾何構造及第一幾何構造共同包覆光纖的外表面;及利用蝕刻液去除犧牲層。 Please also refer to the Republic of China Invention Patent Publication No. I484232, which discloses a method for fabricating a variable-length-period fiber grating. This method can improve the process efficiency and includes: removing the fiber coating layer of the fiber in advance, and etching to reduce the thickness of the coating layer of the fiber Up to 10 to 125μm; the sacrificial layer is formed by physical vapor deposition, chemical vapor deposition, or bonding on the surface of the substrate; the first geometric structure is printed on the sacrificial layer by a screen printing machine, and the first geometric structure is Continuously arranged bumps; fix the optical fiber on the first geometric structure; use the screen printing machine to print the second geometric structure on the first geometric structure, and the second geometric structure and the first geometric structure cover the optical fiber together The outer surface; and the use of etching solution to remove the sacrificial layer.

請又參照中華民國發明專利公告號I406022,揭示一種可調變長週期光纖光柵的製作方法,此方法包含:預先去除光纖的纖衣層,並蝕刻縮減光纖的披覆層厚度為10至125μm;以物理或化學氣相沉積於基材表面上形成金屬層;於金屬層表面上塗覆光阻材料以形成光阻層;加熱光阻層至玻璃轉換溫度以上,以揮發殘留於光阻層中的溶劑,並使光阻層硬化;局部曝光光阻層,並於完成曝光後再次加熱光阻層至玻璃轉換溫度以上;經由顯影液去除未曝光的光阻層,以使光阻層顯影成形;將光纖固定於光阻層上;於光纖與光阻層上塗覆另一光阻層,使此二光阻層共同形成鋸齒狀結構覆蓋於光纖外表面;加熱光纖及位於光纖外表面的光阻層,以揮發光阻層中的溶劑,並讓光阻流動填滿空隙;於光纖外表面形成數個金屬調變層,各金屬調變層分別填入鋸齒狀結構形成的間隙內;利用分離液使光纖外表面的光阻層及金屬調變層脫離金屬層;及去除光纖外表面的光阻層。 Please refer to the Republic of China Invention Patent Announcement No. I406022, which discloses a method for fabricating a tunable variable-length-period fiber grating. The method includes: removing the fiber coating layer of the fiber in advance, and etching to reduce the thickness of the coating layer of the fiber to 10 to 125 μm; The metal layer is formed by physical or chemical vapor deposition on the surface of the substrate; the photoresist material is coated on the surface of the metal layer to form the photoresist layer; the photoresist layer is heated to above the glass transition temperature to volatilize the remaining in the photoresist layer Solvent and harden the photoresist layer; partially expose the photoresist layer, and after the exposure is completed, heat the photoresist layer to above the glass transition temperature; remove the unexposed photoresist layer through a developer solution to develop the photoresist layer; Fix the optical fiber on the photoresist layer; coat another photoresist layer on the optical fiber and the photoresist layer so that the two photoresist layers together form a zigzag structure covering the outer surface of the fiber; heat the fiber and the photoresist on the outer surface of the fiber Layer, volatilize the solvent in the light-emitting resist layer, and let the photoresist flow to fill the gap; form several metal modulation layers on the outer surface of the optical fiber, and each metal modulation layer is respectively filled into the gap formed by the zigzag structure; The liquid makes the photoresist layer and the metal modulating layer on the outer surface of the optical fiber separate from the metal layer; and removes the photoresist layer on the outer surface of the optical fiber.

請再參照中華民國發明專利公告號I418865,揭示一種光纖光柵的製作方法,此方法包含:預先去除光纖的纖衣層,並蝕刻縮減光纖的披覆層厚度到10至125μm;以物理或化學氣相沉積於基材表面上形成金屬層;於金屬層表面上塗覆光阻材料以形成光阻層;加熱光阻層至玻璃轉換溫度以上,以揮發殘留於光阻層中的溶劑,並使光阻層硬化;局部曝光光阻層後再次加熱光阻層至玻璃轉換溫度以上;經由顯影液去除未曝光的光阻層,以使光阻層顯影成形;將光纖固定於光阻層上;於光纖與光阻層上塗覆另一光阻層,使此等光阻層共同形成鋸齒狀結構覆蓋於光纖外表面;加熱光纖及位於光纖外表面的光阻層,以揮發各光阻層中的溶劑,並讓光阻流動填滿空隙;利用分離液使光纖外表面的光阻層與金屬層相互分離;及將高分子聚合物覆蓋於光纖外表面,並填滿鋸齒狀結構所形成的 間隙,以形成保護層。 Please refer to the Republic of China Invention Patent Publication No. I418865 again, which discloses a method for fabricating fiber gratings. This method includes: removing the fiber coating layer of the optical fiber in advance, and etching to reduce the thickness of the coating layer of the optical fiber to 10 to 125 μm; using physical or chemical gas Phase deposition is deposited on the surface of the substrate to form a metal layer; a photoresist material is coated on the surface of the metal layer to form a photoresist layer; the photoresist layer is heated to above the glass transition temperature to volatilize the solvent remaining in the photoresist layer and light The resist layer is hardened; the resist layer is partially exposed and then heated again to above the glass transition temperature; the unexposed resist layer is removed by a developer to develop and shape the resist layer; the optical fiber is fixed on the resist layer; The optical fiber and the photoresist layer are coated with another photoresist layer so that these photoresist layers together form a zigzag structure covering the outer surface of the optical fiber; the optical fiber and the photoresist layer located on the outer surface of the optical fiber are heated to volatilize the Solvent and let the photoresist flow to fill the gap; use the separating liquid to separate the photoresist layer and the metal layer on the outer surface of the optical fiber; and cover the outer surface of the optical fiber with polymer polymer and fill the zigzag structure formed by Gap to form a protective layer.

由上可知,習知方法採用蝕刻手段來縮減光纖厚度,然因蝕刻深度不足,因此無法提升光纖傳輸耗損,進而導致光纖靈敏度不佳。另一方面,習知方法需多道繁瑣的製程,導致整體耗時且冗長。因此,確實有必要針對上述問題提出改善。 It can be seen from the above that the conventional method uses an etching method to reduce the thickness of the optical fiber. However, due to the insufficient etching depth, the transmission loss of the optical fiber cannot be increased, resulting in poor optical fiber sensitivity. On the other hand, the conventional method requires multiple cumbersome manufacturing processes, resulting in overall time-consuming and lengthy. Therefore, it is indeed necessary to propose improvements to the above problems.

本發明之一目的是在解決習知方法所得之光纖傳輸耗損不佳的問題。 One purpose of the present invention is to solve the problem of poor optical fiber transmission loss obtained by the conventional method.

本發明之另一目的是在解決習知方法所得之光纖靈敏度不佳的問題。 Another object of the present invention is to solve the problem of poor sensitivity of the optical fiber obtained by the conventional method.

本發明之又一目的是在解決習知方法過於繁瑣的問題。 Another purpose of the present invention is to solve the problem that the conventional method is too cumbersome.

是以,本發明揭示一種長週期光纖光柵的製造方法,此方法包含:設置一具長週期結構的遮罩件於一光纖上;照射一雷射經遮罩件至光纖,使光纖對應長週期結構之部位的表面燒熔,而非對應長週期結構之部位的表面未燒熔;以及濕蝕刻光纖。 Therefore, the present invention discloses a method for manufacturing a long-period fiber grating. The method includes: arranging a shielding member with a long-period structure on an optical fiber; irradiating a laser to the optical fiber through the shielding member to make the optical fiber correspond to the long-period The surface of the part of the structure is melted, but the surface of the part corresponding to the long-period structure is not melted; and the fiber is wet-etched.

較佳地,雷射為準分子雷射(excimer laser)。 Preferably, the laser is an excimer laser.

較佳地,雷射為Ar2*、Kr2*、F2*、Xe2*、ArF、KrF、XeBr、XeCl、XeF、或KrCl。 Preferably, the laser is Ar 2 *, Kr 2 *, F 2 *, Xe 2 *, ArF, KrF, XeBr, XeCl, XeF, or KrCl.

較佳地,雷射能量為10至15mJ、頻率為50至150Hz。 Preferably, the laser energy is 10 to 15 mJ and the frequency is 50 to 150 Hz.

較佳地,雷射走速為0.05至0.3mm/s。 Preferably, the laser travel speed is 0.05 to 0.3 mm/s.

較佳地,於設置遮罩件前,預先濕蝕刻光纖。 Preferably, the optical fiber is wet-etched in advance before the mask is set.

較佳地,於設置遮罩件前,去除光纖外的一外衣層。 Preferably, before setting the shielding member, a coat layer outside the optical fiber is removed.

較佳地,光纖對應長週期結構之部位於濕蝕刻後的厚度為15至25μm,非對應長週期結構之部位於濕蝕刻後的厚度為40至45μm。 Preferably, the thickness of the part of the optical fiber corresponding to the long-period structure after wet etching is 15 to 25 μm, and the thickness of the part not corresponding to the long-period structure after wet etching is 40 to 45 μm.

依本發明,透過雷射照射與濕蝕刻的搭配可強化蝕刻深度(亦即,縮減光纖厚度),以改善光纖的傳輸耗損,從而提升其靈敏度。此外,所提之方法利用雷射照射與濕蝕刻便可完成,無須光阻顯影製程,如此可提高操作便利性與縮短製程時間。 According to the present invention, the combination of laser irradiation and wet etching can enhance the etching depth (that is, reduce the thickness of the optical fiber) to improve the transmission loss of the optical fiber, thereby increasing its sensitivity. In addition, the proposed method can be completed by laser irradiation and wet etching, without the need for a photoresist development process, which can improve operation convenience and shorten the process time.

(S1至S5)‧‧‧步驟 (S1 to S5)‧‧‧Step

(1)‧‧‧光纖 (1)‧‧‧Optical fiber

(11、12)‧‧‧部位 (11, 12)‧‧‧Location

(2)‧‧‧外衣層 (2)‧‧‧Outer layer

(3、4)‧‧‧遮罩件 (3, 4)‧‧‧Mask

(31、41)‧‧‧長週期結構 (31, 41)‧‧‧Long period structure

(D1至D3)‧‧‧厚度 (D1 to D3)‧‧‧Thickness

(R)‧‧‧雷射 (R)‧‧‧Laser

(S)‧‧‧移動方向 (S)‧‧‧Movement direction

圖1為一流程圖,說明著本發明一實施方式之長週期光纖光柵的製造方法。 FIG. 1 is a flowchart illustrating a method of manufacturing a long period fiber grating according to an embodiment of the present invention.

圖2A至2E為一系列剖面圖,呈現著上述方法。 Figures 2A to 2E are a series of cross-sectional views showing the above method.

圖3為一立體示意圖,呈現著上述方法所用的遮罩件。 Figure 3 is a three-dimensional schematic diagram showing the mask used in the above method.

圖4為一光學顯微鏡照片,顯示著光纖表面經雷射照射後呈燒熔狀態。 Figure 4 is an optical microscope photo showing that the surface of the optical fiber is in a molten state after being irradiated by a laser.

圖5為一光學顯微鏡照片,顯示著光纖經濕蝕刻後的結構。 Figure 5 is an optical microscope photograph showing the structure of the optical fiber after wet etching.

為讓本發明上述及/或其他目的、功效、特徵更明顯易懂,下文特舉較佳實施方式,作詳細說明於下:本發明之一實施方式提出一種長週期光纖光柵的製造方法,此方法可加強蝕刻深度,並改善光纖的傳輸耗損與靈敏度。 In order to make the above and/or other objectives, effects, and features of the present invention more obvious and understandable, the preferred embodiments are specifically described below in detail: An embodiment of the present invention provides a method for manufacturing a long-period fiber grating. The method can strengthen the etching depth and improve the transmission loss and sensitivity of the optical fiber.

首先,如圖1與圖2A所示,去除一光纖(1)外的一外衣層(2)。步驟(S1)可讓外衣層(2)所包覆的光纖(1)裸露,如此可方便後續對光纖(1)的處理。外衣層(2)的去除可採用剝離或研磨等方式達到;具體而言,剝離可用鉗子夾住外衣層(2)並沿光纖(1)一端滑動完成,研磨可用砂紙來回摩擦外 衣層(2)完成。 First, as shown in Fig. 1 and Fig. 2A, a coat layer (2) outside an optical fiber (1) is removed. Step (S1) allows the optical fiber (1) covered by the outer layer (2) to be exposed, which facilitates subsequent processing of the optical fiber (1). The removal of the outer layer (2) can be achieved by peeling or grinding; specifically, the peeling can be accomplished by clamping the outer layer (2) with pliers and sliding along one end of the optical fiber (1), and grinding can be done by rubbing the outer layer with sandpaper back and forth. The clothing layer (2) is completed.

其次,如圖1與圖2B所示,預先濕蝕刻光纖(1)。步驟(S2)可縮減光纖(1)的厚度(D1),其可節省後續步驟所需的時間;較佳地,縮減厚度(D1)至55至70μm。此外,預先濕蝕刻時,可浸泡光纖(1)於蝕刻液中,而蝕刻液可為氫氟酸溶液但不限於此,其實例如BOE(buffered oxide etch),較佳地為BOE 6:1(49%HF水溶液與40%NH4F水溶液以體積比1:6混合而成)。 Next, as shown in Fig. 1 and Fig. 2B, the optical fiber (1) is wet-etched in advance. The step (S2) can reduce the thickness (D1) of the optical fiber (1), which can save the time required for subsequent steps; preferably, the thickness (D1) is reduced to 55 to 70 μm. In addition, during pre-wet etching, the optical fiber (1) can be immersed in an etching solution, and the etching solution can be a hydrofluoric acid solution but is not limited thereto. In fact, for example, BOE (buffered oxide etch), preferably BOE 6:1 ( 49% HF aqueous solution and 40% NH 4 F aqueous solution are mixed in a volume ratio of 1:6).

接著,如圖1與圖2C所示,設置一具長週期結構(31)的遮罩件(3)於光纖(1)上。文中所用之「長週期結構」乙詞意指多個週期排列之透光區域所組成的結構(圖3);各透光區域的寬度可依後續形成之光柵的周期而定,較佳地為1至5mm。再者,為穩固光纖(1)位置,可設置另一如前所述的遮罩件(3),使光纖(1)配置於此等遮罩件(3、4)之間。 Next, as shown in Figs. 1 and 2C, a mask (3) with a long period structure (31) is set on the optical fiber (1). The term "long-period structure" used in the text refers to a structure composed of a plurality of periodically arranged light-transmitting regions (Figure 3); the width of each light-transmitting region can be determined by the period of the subsequently formed grating, preferably 1 to 5mm. Furthermore, in order to stabilize the position of the optical fiber (1), another shielding member (3) as described above can be arranged so that the optical fiber (1) is arranged between these shielding members (3, 4).

然後,如圖1與圖2D所示,照射一雷射(R)經遮罩件(3)至光纖(1),雷射(R)照射可使光纖(1)對應長週期結構(31)之部位(11)的表面燒熔,而非對應長週期結構(31)之部位(12)的表面未燒熔。請參照圖4,以光學顯微鏡呈現光纖(1)燒熔表面。步驟(S4)可使雷射(R)產生熱效應於光纖(1)表面而燒熔之,藉此於後續濕蝕刻步驟(S5)後,使燒熔部位(11)與未燒熔部位(12)形成蝕刻深度差異。為使深度差異沿光纖(1)軸向分布,於雷射(R)照射時可於原地轉動光纖(1),或雷射(R)沿光纖(1)的圓周轉動。此外,雷射(R)可為準分子雷射但不限於此,其實例如Ar2*、Kr2*、F2*、Xe2*、ArF、KrF、XeBr、XeCl、XeF、或KrCl。再者,雷射(R)參數可後續的蝕刻深度而定;較佳地,雷射(R)能量為10至15mJ,例如12mJ,頻率為50至150Hz,例如100Hz。由於雷射(R)呈現光束,為於光纖(1)上形成多個燒熔 部位(11),雷射(R)可相對光纖(1)沿一方向(S)移動,而移動速度(或稱「走速」)較佳地為0.05至0.3mm/s,例如0.2mm/s。 Then, as shown in Figure 1 and Figure 2D, irradiate a laser (R) to the optical fiber (1) through the shielding member (3), and the laser (R) irradiation can make the optical fiber (1) correspond to the long-period structure (31) The surface of the part (11) is melted, but not the surface of the part (12) corresponding to the long period structure (31). Please refer to Figure 4 to show the sintered surface of the optical fiber (1) with an optical microscope. Step (S4) can cause the laser (R) to generate thermal effect on the surface of the optical fiber (1) to melt it, so that after the subsequent wet etching step (S5), the melted part (11) and the unsmelted part (12) ) A difference in etching depth is formed. In order to distribute the depth difference along the axis of the optical fiber (1), the optical fiber (1) can be rotated in situ when the laser (R) is irradiated, or the laser (R) can be rotated along the circumference of the optical fiber (1). In addition, the laser (R) can be an excimer laser, but is not limited thereto. In fact, for example, Ar 2 *, Kr 2 *, F 2 *, Xe 2 *, ArF, KrF, XeBr, XeCl, XeF or KrCl. Furthermore, the parameters of the laser (R) can be determined by the subsequent etching depth; preferably, the energy of the laser (R) is 10 to 15 mJ, such as 12 mJ, and the frequency is 50 to 150 Hz, such as 100 Hz. Since the laser (R) presents a beam of light, in order to form multiple melting parts (11) on the optical fiber (1), the laser (R) can move in one direction (S) relative to the optical fiber (1), and the moving speed (or The "travel speed") is preferably 0.05 to 0.3 mm/s, for example 0.2 mm/s.

最後,如圖1與圖2E所示,濕蝕刻光纖(1)。此步驟(S5)可再縮減光纖(1)的厚度(D2、D3);較佳地,縮減對應長週期結構(31)之部位(11)的厚度(D2)為15至25μm,縮減非對應長週期結構(31)之部位(12)的厚度(D3)為40至45μm。請參照圖5,以光學顯微鏡呈現光纖(1)濕蝕刻後的構造。此外,濕蝕刻時,同樣可浸泡光纖(1)於蝕刻液中,而蝕刻液可為氫氟酸溶液但不限於此,其實例如BOE,較佳地為BOE 6:1。 Finally, as shown in Figure 1 and Figure 2E, wet etch the optical fiber (1). This step (S5) can further reduce the thickness (D2, D3) of the optical fiber (1); preferably, reduce the thickness (D2) of the part (11) corresponding to the long-period structure (31) to 15 to 25 μm, reducing the non-corresponding The thickness (D3) of the part (12) of the long-period structure (31) is 40 to 45 μm. Please refer to Figure 5 to show the structure of the optical fiber (1) after wet etching with an optical microscope. In addition, during wet etching, the optical fiber (1) can also be immersed in an etching solution, and the etching solution can be a hydrofluoric acid solution but is not limited thereto. In fact, for example, BOE, preferably BOE 6:1.

根據上述實施方式,可於光纖製作出長週期性,使光纖具有良好的週期結構與共振波長。此外,透過雷射照射與濕蝕刻的搭配使用可強化蝕刻深度,進而改善光纖的傳輸耗損並提升靈敏度。而且,所提之方法簡單利用雷射照射與濕蝕刻便可完成,無須繁瑣的製程(如:光阻顯影製程)。如此一來,可提高長週期性光柵製作的便利性與縮短製作時間。 According to the above-mentioned embodiment, long periodicity can be fabricated in the optical fiber, so that the optical fiber has a good periodic structure and resonance wavelength. In addition, the combination of laser irradiation and wet etching can enhance the etching depth, thereby improving the transmission loss of the optical fiber and increasing the sensitivity. Moreover, the proposed method can be completed by simply using laser irradiation and wet etching, and does not require complicated processes (such as photoresist development process). In this way, the convenience of producing long-period gratings can be improved and the production time can be shortened.

惟以上所述者,僅為本發明之較佳實施例,但不能以此限定本發明實施之範圍;故,凡依本發明申請專利範圍及發明說明書內容所作之簡單的等效改變與修飾,皆仍屬本發明專利涵蓋之範圍內。 However, the above are only preferred embodiments of the present invention, but cannot be used to limit the scope of implementation of the present invention; therefore, all simple equivalent changes and modifications made according to the scope of the patent application of the present invention and the content of the description of the invention, All are still within the scope of the invention patent.

(1)‧‧‧光纖 (1)‧‧‧Optical fiber

(11、12)‧‧‧部位 (11, 12)‧‧‧Location

(D2、D3)‧‧‧厚度 (D2, D3)‧‧‧Thickness

Claims (9)

一種長週期光纖光柵的製造方法,係包括:設置一具長週期結構的遮罩件於一光纖上;照射一雷射經該遮罩件至該光纖,該雷射產生熱效應於光纖表面,使該光纖對應該長週期結構之部位的表面燒熔,而該光纖非對應該長週期結構之部位的表面未燒熔,其中該雷射能量為10至15mJ、頻率為50至150Hz;以及濕蝕刻該光纖,使該光纖表面之燒熔部位與未燒熔部位產生形成蝕刻深度差異。 A method for manufacturing a long-period fiber grating includes: arranging a shielding member with a long-period structure on an optical fiber; irradiating a laser through the shielding member to the optical fiber, and the laser generates a thermal effect on the surface of the optical fiber to make The surface of the optical fiber corresponding to the long-period structure is melted while the surface of the optical fiber does not correspond to the long-period structure. The laser energy is 10 to 15 mJ and the frequency is 50 to 150 Hz; and wet etching For the optical fiber, the sintered part and the unsintered part on the surface of the optical fiber have a difference in etching depth. 如請求項第1項所述之製造方法,其中該雷射為準分子雷射。 The manufacturing method according to claim 1, wherein the laser is an excimer laser. 如請求項第1項所述之製造方法,其中該雷射為選自由Ar2*、Kr2*、F2*、Xe2*、ArF、KrF、XeBr、XeCl、XeF、及KrCl所組成的群組。 The manufacturing method according to claim 1, wherein the laser is selected from Ar 2 *, Kr 2 *, F 2 *, Xe 2 *, ArF, KrF, XeBr, XeCl, XeF, and KrCl Group. 如請求項第1項所述之製造方法,其中該雷射走速為0.05至0.3mm/s。 The manufacturing method according to claim 1, wherein the laser traveling speed is 0.05 to 0.3 mm/s. 如請求項第1項所述之製造方法,於該遮罩件設置步驟前,更包括:預先濕蝕刻該光纖。 According to the manufacturing method described in claim 1, before the step of setting the mask member, it further comprises: pre-wetting the optical fiber. 如請求項第1項所述之製造方法,於該遮罩件設置步驟前,更包括:去除該光纖外的一外衣層。 According to the manufacturing method described in claim 1, before the step of setting the shielding member, it further includes: removing a coat layer outside the optical fiber. 如請求項第1項所述之製造方法,於該遮罩件設置步驟前,更包括:去除該光纖外的一外衣層;以及預先濕蝕刻該光纖。 According to the manufacturing method described in claim 1, before the step of setting the shielding member, it further includes: removing a coating layer outside the optical fiber; and pre-wet etching the optical fiber. 如請求項第1項所述之製造方法,其中該光纖對應該長週期結構之部位於該濕蝕刻後的厚度為15至25μm,非對應該長週期結構之部位於該濕蝕刻後的厚度為40至45μm。 The manufacturing method according to claim 1, wherein the thickness of the part of the optical fiber corresponding to the long-period structure after the wet etching is 15 to 25 μm, and the thickness of the part that is not corresponding to the long-period structure after the wet etching is 40 to 45μm. 如請求項第1項所述之製造方法,其中該雷射能量為12mJ、頻率為50至100Hz、走速為0.2mm/s。 The manufacturing method according to claim 1, wherein the laser energy is 12 mJ, the frequency is 50 to 100 Hz, and the traveling speed is 0.2 mm/s.
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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW419607B (en) * 1999-01-13 2001-01-21 Sumitomo Electric Industries Optical fiber grating element, manufacture method of the same and optical filter
US6201911B1 (en) * 1998-08-19 2001-03-13 Samsung Electronics Co., Ltd. Apparatus for manufacturing long-period fiber gratings and apparatus for manufacturing two-band long-period fiber gratings using the same
TWI484232B (en) * 2013-12-09 2015-05-11 Metal Ind Res & Dev Ct Method for manufacturing a tunable long-period fiber grating
CN106707406A (en) * 2016-11-02 2017-05-24 北京信息科技大学 System for producing long-cycle optical fiber grating based on femtosecond laser direct writing method

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6201911B1 (en) * 1998-08-19 2001-03-13 Samsung Electronics Co., Ltd. Apparatus for manufacturing long-period fiber gratings and apparatus for manufacturing two-band long-period fiber gratings using the same
TW419607B (en) * 1999-01-13 2001-01-21 Sumitomo Electric Industries Optical fiber grating element, manufacture method of the same and optical filter
TWI484232B (en) * 2013-12-09 2015-05-11 Metal Ind Res & Dev Ct Method for manufacturing a tunable long-period fiber grating
CN106707406A (en) * 2016-11-02 2017-05-24 北京信息科技大学 System for producing long-cycle optical fiber grating based on femtosecond laser direct writing method

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