TWI697458B - 濺鍍靶 - Google Patents

濺鍍靶 Download PDF

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Publication number
TWI697458B
TWI697458B TW108110623A TW108110623A TWI697458B TW I697458 B TWI697458 B TW I697458B TW 108110623 A TW108110623 A TW 108110623A TW 108110623 A TW108110623 A TW 108110623A TW I697458 B TWI697458 B TW I697458B
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TW
Taiwan
Prior art keywords
sputtering target
less
thickness direction
volume resistivity
pores
Prior art date
Application number
TW108110623A
Other languages
English (en)
Chinese (zh)
Other versions
TW201942060A (zh
Inventor
掛野崇
久家俊洋
Original Assignee
日商Ｊｘ金屬股份有限公司
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Application filed by 日商Ｊｘ金屬股份有限公司 filed Critical 日商Ｊｘ金屬股份有限公司
Publication of TW201942060A publication Critical patent/TW201942060A/zh
Application granted granted Critical
Publication of TWI697458B publication Critical patent/TWI697458B/zh

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/453—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30—Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3284—Zinc oxides, zincates, cadmium oxides, cadmiates, mercury oxides, mercurates or oxide forming salts thereof
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30—Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3286—Gallium oxides, gallates, indium oxides, indates, thallium oxides, thallates or oxide forming salts thereof, e.g. zinc gallate

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Structural Engineering (AREA)
  • Physical Vapour Deposition (AREA)
  • Compositions Of Oxide Ceramics (AREA)
TW108110623A 2018-03-30 2019-03-27 濺鍍靶 TWI697458B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP2018-069081 2018-03-30
JP2018069081A JP6523510B1 (ja) 2018-03-30 2018-03-30 スパッタリングターゲット

Publications (2)

Publication Number Publication Date
TW201942060A TW201942060A (zh) 2019-11-01
TWI697458B true TWI697458B (zh) 2020-07-01

Family

ID=66730552

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108110623A TWI697458B (zh) 2018-03-30 2019-03-27 濺鍍靶

Country Status (4)

Country Link
JP (1) JP6523510B1 (ja)
KR (1) KR102188415B1 (ja)
CN (1) CN110318026A (ja)
TW (1) TWI697458B (ja)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201734240A (zh) * 2016-03-28 2017-10-01 Jx Nippon Mining & Metals Corp 圓筒形濺射靶件及其製造方法
TW201802030A (zh) * 2016-03-31 2018-01-16 Ｊｘ金屬股份有限公司 Ｉｚｏ燒結體濺鍍靶及其製造方法
TW201805457A (zh) * 2016-03-31 2018-02-16 Ｊｘ金屬股份有限公司 氧化銦－氧化鋅系（ｉｚｏ）濺鍍鈀及其製造方法
JP2018044248A (ja) * 2017-12-21 2018-03-22 Ｊｘ金属株式会社 焼結体、スパッタリングターゲット及びその製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE420565B (sv) 1974-06-06 1981-10-19 Pharmacia Ab Hjelpmedel for intravaskuler administraring for anvendning i samband med intravaskuler administrering av en losning eller en suspension av ett diagnostiseringsmedel
US6078189A (en) 1996-12-13 2000-06-20 International Business Machines Corporation Dynamic test reordering
JPH10306367A (ja) * 1997-05-06 1998-11-17 Sumitomo Metal Mining Co Ltd スパッタリングターゲット用ＺｎＯ−Ｇａ２Ｏ３系焼結体およびその製造方法
KR100774778B1 (ko) * 1999-11-25 2007-11-07 이데미쓰 고산 가부시키가이샤 스퍼터링 타겟, 투명한 도전성 산화물 및 스퍼터링 타겟의제조방법
KR101932369B1 (ko) * 2015-02-27 2018-12-24 제이엑스금속주식회사 산화물 소결체 및 그 산화물 소결체로 이루어지는 스퍼터링 타깃

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201734240A (zh) * 2016-03-28 2017-10-01 Jx Nippon Mining & Metals Corp 圓筒形濺射靶件及其製造方法
TW201802030A (zh) * 2016-03-31 2018-01-16 Ｊｘ金屬股份有限公司 Ｉｚｏ燒結體濺鍍靶及其製造方法
TW201805457A (zh) * 2016-03-31 2018-02-16 Ｊｘ金屬股份有限公司 氧化銦－氧化鋅系（ｉｚｏ）濺鍍鈀及其製造方法
JP2018044248A (ja) * 2017-12-21 2018-03-22 Ｊｘ金属株式会社 焼結体、スパッタリングターゲット及びその製造方法

Also Published As

Publication number Publication date
KR20190114895A (ko) 2019-10-10
CN110318026A (zh) 2019-10-11
KR102188415B1 (ko) 2020-12-08
JP6523510B1 (ja) 2019-06-05
TW201942060A (zh) 2019-11-01
JP2019178396A (ja) 2019-10-17

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