TWI694302B - 光罩及顯示裝置之製造方法 - Google Patents

光罩及顯示裝置之製造方法 Download PDF

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Publication number
TWI694302B
TWI694302B TW108109637A TW108109637A TWI694302B TW I694302 B TWI694302 B TW I694302B TW 108109637 A TW108109637 A TW 108109637A TW 108109637 A TW108109637 A TW 108109637A TW I694302 B TWI694302 B TW I694302B
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TW
Taiwan
Prior art keywords
pattern
light
film
main
mask
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TW108109637A
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English (en)
Chinese (zh)
Other versions
TW201928507A (zh
Inventor
今敷修久
吉川裕
菅原浩幸
Original Assignee
日商Ｈｏｙａ股份有限公司
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Application filed by 日商Ｈｏｙａ股份有限公司 filed Critical 日商Ｈｏｙａ股份有限公司
Publication of TW201928507A publication Critical patent/TW201928507A/zh
Application granted granted Critical
Publication of TWI694302B publication Critical patent/TWI694302B/zh

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/34—Phase-edge PSM, e.g. chromeless PSM; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/121—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements
    • H10K59/1213—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements the pixel elements being TFTs

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Geometry (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW108109637A 2014-09-29 2015-08-25 光罩及顯示裝置之製造方法 TWI694302B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014-199013 2014-09-29
JP2014199013A JP6335735B2 (ja) 2014-09-29 2014-09-29 フォトマスク及び表示装置の製造方法

Publications (2)

Publication Number Publication Date
TW201928507A TW201928507A (zh) 2019-07-16
TWI694302B true TWI694302B (zh) 2020-05-21

Family

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Family Applications (4)

Application Number Title Priority Date Filing Date
TW104127730A TWI604264B (zh) 2014-09-29 2015-08-25 光罩及顯示裝置之製造方法
TW108109637A TWI694302B (zh) 2014-09-29 2015-08-25 光罩及顯示裝置之製造方法
TW106130522A TWI635353B (zh) 2014-09-29 2015-08-25 光罩及顯示裝置之製造方法
TW106130523A TWI658320B (zh) 2014-09-29 2015-08-25 圖案轉印方法及顯示裝置之製造方法

Family Applications Before (1)

Application Number Title Priority Date Filing Date
TW104127730A TWI604264B (zh) 2014-09-29 2015-08-25 光罩及顯示裝置之製造方法

Family Applications After (2)

Application Number Title Priority Date Filing Date
TW106130522A TWI635353B (zh) 2014-09-29 2015-08-25 光罩及顯示裝置之製造方法
TW106130523A TWI658320B (zh) 2014-09-29 2015-08-25 圖案轉印方法及顯示裝置之製造方法

Country Status (4)

Country Link
JP (1) JP6335735B2 (ko)
KR (3) KR20160037806A (ko)
CN (2) CN105467745B (ko)
TW (4) TWI604264B (ko)

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* Cited by examiner, † Cited by third party
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JP6259509B1 (ja) * 2016-12-28 2018-01-10 株式会社エスケーエレクトロニクス ハーフトーンマスク、フォトマスクブランクス及びハーフトーンマスクの製造方法
JP6808665B2 (ja) * 2017-03-10 2021-01-06 Hoya株式会社 表示装置製造用フォトマスク、及び表示装置の製造方法
JP7080070B2 (ja) * 2017-03-24 2022-06-03 Hoya株式会社 フォトマスク、及び表示装置の製造方法
JP6368000B1 (ja) * 2017-04-04 2018-08-01 株式会社エスケーエレクトロニクス フォトマスク及びフォトマスクブランクス並びにフォトマスクの製造方法
TWI659262B (zh) * 2017-08-07 2019-05-11 日商Ｈｏｙａ股份有限公司 光罩之修正方法、光罩之製造方法、光罩及顯示裝置之製造方法
TWI710649B (zh) * 2017-09-12 2020-11-21 日商Ｈｏｙａ股份有限公司 光罩及顯示裝置之製造方法
JP6731441B2 (ja) * 2018-05-01 2020-07-29 Hoya株式会社 フォトマスク及び表示装置の製造方法
KR102254646B1 (ko) 2018-07-30 2021-05-21 호야 가부시키가이샤 포토마스크 수정 방법, 포토마스크의 제조 방법, 포토마스크, 및 표시 장치용 디바이스의 제조 방법
KR102367141B1 (ko) * 2019-02-27 2022-02-23 호야 가부시키가이샤 포토마스크, 포토마스크의 제조 방법, 및 표시 장치의 제조 방법
JP7437959B2 (ja) * 2019-03-07 2024-02-26 Hoya株式会社 修正フォトマスク、及び表示装置の製造方法
JP7383490B2 (ja) * 2020-01-07 2023-11-20 株式会社エスケーエレクトロニクス フォトマスク

Citations (2)

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TW200912522A (en) * 2007-07-24 2009-03-16 Canon Kk Original plate data generation method, original plate generation method, exposure method, device manufacturing method, and computer-readable storage medium for generating original plate data
TW201421148A (zh) * 2012-10-25 2014-06-01 Hoya Corp 顯示裝置製造用光罩、及圖案轉印方法

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JPH0695360A (ja) * 1992-09-10 1994-04-08 Fujitsu Ltd 光学マスク
JP2000019710A (ja) * 1998-07-07 2000-01-21 Hitachi Ltd 半導体集積回路装置の製造方法
JP2000181048A (ja) * 1998-12-16 2000-06-30 Sharp Corp フォトマスクおよびその製造方法、並びにそれを用いた露光方法
JP3746497B2 (ja) * 2003-06-24 2006-02-15 松下電器産業株式会社 フォトマスク
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JP2007219038A (ja) * 2006-02-15 2007-08-30 Hoya Corp マスクブランク及びフォトマスク
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JP5611581B2 (ja) * 2009-12-21 2014-10-22 Hoya株式会社 マスクブランク及びその製造方法、並びに、転写マスク及びその製造方法
CN108267927B (zh) * 2011-12-21 2021-08-24 大日本印刷株式会社 大型相移掩膜
JP2013140236A (ja) * 2011-12-29 2013-07-18 Hoya Corp マスクブランク及び位相シフトマスクの製造方法
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JP6139826B2 (ja) * 2012-05-02 2017-05-31 Hoya株式会社 フォトマスク、パターン転写方法、及びフラットパネルディスプレイの製造方法
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Patent Citations (2)

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Publication number Priority date Publication date Assignee Title
TW200912522A (en) * 2007-07-24 2009-03-16 Canon Kk Original plate data generation method, original plate generation method, exposure method, device manufacturing method, and computer-readable storage medium for generating original plate data
TW201421148A (zh) * 2012-10-25 2014-06-01 Hoya Corp 顯示裝置製造用光罩、及圖案轉印方法

Also Published As

Publication number Publication date
KR20200132813A (ko) 2020-11-25
CN110824828A (zh) 2020-02-21
JP2016071059A (ja) 2016-05-09
CN105467745B (zh) 2019-12-20
TWI604264B (zh) 2017-11-01
TW201627751A (zh) 2016-08-01
TW201740184A (zh) 2017-11-16
KR20170117988A (ko) 2017-10-24
CN105467745A (zh) 2016-04-06
KR20160037806A (ko) 2016-04-06
KR102304206B1 (ko) 2021-09-17
TW201743129A (zh) 2017-12-16
TWI635353B (zh) 2018-09-11
TWI658320B (zh) 2019-05-01
CN110824828B (zh) 2023-12-29
KR102182505B1 (ko) 2020-11-24
JP6335735B2 (ja) 2018-05-30
TW201928507A (zh) 2019-07-16

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