TWI689023B - Stacked semiconductor package - Google Patents
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- TWI689023B TWI689023B TW108126395A TW108126395A TWI689023B TW I689023 B TWI689023 B TW I689023B TW 108126395 A TW108126395 A TW 108126395A TW 108126395 A TW108126395 A TW 108126395A TW I689023 B TWI689023 B TW I689023B
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
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- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/0554—External layer
- H01L2224/0555—Shape
- H01L2224/05552—Shape in top view
- H01L2224/05554—Shape in top view being square
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- H—ELECTRICITY
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- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32225—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48225—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
- H01L2224/48227—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
- H01L2224/491—Disposition
- H01L2224/4912—Layout
- H01L2224/49175—Parallel arrangements
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73265—Layer and wire connectors
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
- H01L2924/1815—Shape
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- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
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Abstract
Description
本發明係關於一種堆疊式半導體封裝結構,尤指一種使用改良線路基板的堆疊式半導體封裝結構。 The invention relates to a stacked semiconductor packaging structure, in particular to a stacked semiconductor packaging structure using an improved circuit substrate.
在半導體封裝技術可使用堆疊式半導體封裝結構,將多顆晶片以堆疊方式進行封裝,來縮減封裝體的橫向尺寸。 In the semiconductor packaging technology, a stacked semiconductor packaging structure may be used to package multiple chips in a stacked manner to reduce the lateral size of the package.
請參閱圖8A及圖8B所示,一種堆疊式半導體封裝結構包含有一線路基板50、一第一晶片60、一包晶膠層70(Film-On-Die adhesive;FOD)及一第二晶片80;其中該第一晶片60係電性連接在線路基板50上,再將貼附有第二晶片80的包晶膠層70加熱後平壓貼合至線路基板50上,以覆蓋第一晶片60,如圖8B所示,據以構成堆疊式半導體封裝結構。
Please refer to FIGS. 8A and 8B, a stacked semiconductor package structure includes a
由圖8B可知,上述包晶膠層70為了完整包覆該第一晶片60,會預先加熱後呈黏稠狀再平貼至線路基板50上;然而,因為第一晶片60有一定厚度,所以包晶膠層70在平貼過程中,其對應第一晶片60的部分膠體會被向上、向外排擠,再由於包晶膠層70呈黏稠狀,故在給予包晶膠層70均勻下壓的平貼過程中,被排擠的部分膠體是無法被均勻地推擠到整個包晶膠層70,而造成對應第一晶片50位置的包晶膠層70部分向上拱起,再如圖9A及圖9B所示,包晶膠層70中間對應第一晶片60位置的高度至其周圍的高度之間落差大(在本例示中包含有9段高度差H1~H9),使得後續第二晶片80無法堆疊在平坦的包晶膠層70上,
待堆疊式半導體封裝結構完成後,則易有脫層的現象,故而有必要進一步改良之。
As can be seen from FIG. 8B, in order to completely cover the
有鑑於上述堆疊式半導體封裝結構因使用包晶膠層而易有脫層之缺陷,本發明主要目的係提供一種堆疊式半導體封裝結構及其線路基板,以改善脫層缺陷。 In view of the fact that the stacked semiconductor package structure described above is prone to delamination due to the use of a peri-plastic layer, the main object of the present invention is to provide a stacked semiconductor package structure and its circuit substrate to improve delamination defects.
欲達上述目的所使用的主要技術手段係令該堆疊式半導體封裝結構包含有:一線路基板,其第一表面上形成有一絕緣保護層,且包含有一晶片區及多個位在該晶片區周圍且凸出於該絕緣保護層的凸件;其中該晶片區內包含有多個接點;一第一晶片,係設置在該線路基板的該晶片區,並電性連接至該些接點;一包晶膠層,係貼合並包覆位於該線路基板的該絕緣保護層上的凸件及該第一晶片;以及一第二晶片,係設置在該包晶膠層上;其中該第二晶片的尺寸大於該第一晶片尺寸,且該第二晶片向下對應該些凸件。 The main technical means used to achieve the above purpose is that the stacked semiconductor package structure includes: a circuit substrate, an insulating protective layer is formed on the first surface thereof, and includes a chip area and a plurality of locations around the chip area And protruding from the insulating protection layer; wherein the chip area contains a plurality of contacts; a first chip is disposed in the chip area of the circuit substrate and electrically connected to the contacts; A encapsulant layer, which is attached and covered with the protrusions and the first chip on the insulating protective layer of the circuit substrate; and a second chip, which is arranged on the encapsulant layer; wherein the second The size of the wafer is larger than the size of the first wafer, and the second wafer corresponds downward to the protrusions.
由上述說明可知,本發明主要在線路基板的晶片區外形成有多個凸件,當加熱後呈黏稠狀的包晶膠層平貼於該第一表面的絕緣保護層時,由於多個凸件位在晶片區外圍,包晶膠層的膠體可均勻地被排擠,以減縮晶片區至周圍的高度落差,使該第二晶片較平坦地設置在該包晶膠層上。 As can be seen from the above description, the present invention mainly forms a plurality of protrusions outside the wafer area of the circuit substrate. When a viscous encapsulant layer is applied to the insulating protective layer on the first surface after heating, due to the plurality of protrusions The device is located at the periphery of the wafer area, and the colloid of the encapsulant layer can be evenly squeezed out to reduce the height difference from the wafer area to the surrounding area, so that the second wafer is arranged on the encapsulant layer more evenly.
1、1a、1b、1c、1d:堆疊式半導體封裝結構 1, 1a, 1b, 1c, 1d: stacked semiconductor packaging structure
10:線路基板 10: circuit board
101:第一表面 101: first surface
102:第二表面 102: second surface
103:絕緣保護層 103: insulating protective layer
11:晶片區 11: Wafer area
12、12a、12b:凸件 12, 12a, 12b: convex parts
13:接點 13: Contact
14:錫球 14: Tin ball
15:線路 15: Line
20:第一晶片 20: First chip
201:黏膠 201: viscose
21:接墊 21: Pad
22:連接線 22: connection line
30:包晶膠層 30: encapsulated gel layer
40:第二晶片 40: Second chip
S1:第一外側區 S1: first lateral zone
S2:第二外側區 S2: Second outer zone
50:線路基板 50: circuit board
60:第一晶片 60: First chip
70:包晶膠層 70: encapsulated gel layer
80:第二晶片 80: second chip
圖1:係本發明一堆疊式半導體封裝結構的側視剖面圖。 FIG. 1 is a side cross-sectional view of a stacked semiconductor package structure of the present invention.
圖2A及圖2B:係本發明堆疊式封裝製程中不同步驟下的半成品側視剖面圖。 2A and 2B are side cross-sectional views of semi-finished products at different steps in the stacked packaging process of the present invention.
圖3A:係本發明堆疊式封裝製程的第一實施例的上視平面圖。 FIG. 3A is a top plan view of the first embodiment of the stacked packaging process of the present invention.
圖3B:係圖3B的包晶膠層高度變化圖。 Fig. 3B: A graph of the change in height of the cladding gel layer of Fig. 3B.
圖4A:係本發明堆疊式封裝製程的第二實施例的上視平面圖。 FIG. 4A is a top plan view of a second embodiment of the stacked packaging process of the present invention.
圖4B:係圖4A的包晶膠層高度變化圖。 Fig. 4B: A graph of the change in height of the cladding layer of Fig. 4A.
圖5A:係本發明堆疊式封裝製程的第三實施例的上視平面圖。 FIG. 5A is a top plan view of a third embodiment of the stacked packaging process of the present invention.
圖5B:係圖5A的包晶膠層高度變化圖。 Fig. 5B: A graph of the change in height of the cladding gel layer of Fig. 5A.
圖6A:係本發明堆疊式封裝製程的第四實施例的上視平面圖。 6A: It is a top plan view of the fourth embodiment of the stacked packaging process of the present invention.
圖6B:係圖6A的包晶膠層高度變化圖。 Fig. 6B: A graph of the change in height of the cladding gel layer of Fig. 6A.
圖7A:係本發明堆疊式封裝製程的第五實施例的上視平面圖。 7A: It is a top plan view of a fifth embodiment of the stacked packaging process of the present invention.
圖7B:係圖7A的包晶膠層高度變化圖。 Fig. 7B: A graph of the change in height of the cladding gel layer of Fig. 7A.
圖8A及圖8B:係既有堆疊式封裝製程中不同步驟下的半成品側視剖面圖。 8A and 8B are side cross-sectional views of semi-finished products at different steps in the existing stacked packaging process.
圖9A:係圖8B上視平面圖。 Figure 9A: a top plan view of Figure 8B.
圖9B:係圖9A的包晶膠層高度變化圖。 FIG. 9B: A graph of the change in the height of the peritectic layer of FIG. 9A.
本發明係針對堆疊式半導體封裝結構進行改良,以下配合多個不同實施例及圖式詳加說明本案技術內容。 The present invention is directed to the improvement of the stacked semiconductor package structure. The technical content of this case will be described in detail in conjunction with a number of different embodiments and drawings.
首先請參閱圖1所示,本發明堆疊式半導體封裝結構1的一實施例,其包含有線路基板10、第一晶片20、包晶膠層30及第二晶片40。
First, please refer to FIG. 1, an embodiment of the stacked
上述線路基板10包含有一第一表面101及一相對第一表面101的第
二表面102;請配合圖3A所示,第一表面101上包含有一晶片區11及多個凸件12,第二表面102形成有多個錫球14或凸塊。線路基板10內形成有線路15,第一表面101上的晶片區11內包含有多個接點13,且多個凸件12係位在晶片區11外圍並且凸出於第一表面101,線路15用以電性連接第一表面101上的接點13及第二表面102的錫球14或凸塊。於本實施例,線路基板10為玻璃纖維板(FR4板或FR5板),且玻璃纖維板的第一表面101及第二表面102分別塗佈有絕緣保護層103(如:綠漆),故凸件12係凸出於第一表面101上的絕緣保護層103,但絕緣保護層103不覆蓋第一表面101上的接點13及第二表面102上的錫球14或凸塊,即錫球14或凸塊係凸出於該第二表面102上的絕緣保護層103。較佳地,凸件12係為絕緣材質,例如綠漆或樹脂;由於凸件12係凸出於絕緣保護層103,故凸件12可與絕緣保護層為相同材質,但均不以此為限。
The
上述第一晶片20係設置在線路基板10的晶片區11,並電性連接至接點13;於本實施例,如圖2A所示,第一晶片20透過黏膠201固定在線路基板10的絕緣保護層103上,且第一晶片20的多個接墊21朝上,並以打線製程將連接線22一端連接於接墊21,另一端連接至接點13上,使第一晶片20與線路基板10電性連接。
The above-mentioned
上述第二晶片40係設置在包晶膠層30上,包晶膠層30連同其上的第二晶片40均勻平壓並貼合於線路基板10的第一表面101上的絕緣保護層103,由於包晶膠層30的厚度大於第一晶片20、凸件12及連接線22的高度,故可包覆第一晶片20、凸件12及連接線22於其中。於本實施例,包晶膠層30為一雙面膠帶(Die-Attach Film;DAF),可於加熱後呈黏椆狀,如圖2B所示,故於加熱後貼合至線路基板10之第一表面101的絕緣保護層103。
The
如圖2B所示,上述第二晶片40透過包晶膠層30間隔疊設在第一晶片20上,且第二晶片40的尺寸大於第一晶片20尺寸,令第二晶片40向下對應有
第一晶片20、連接線22及凸件12。即第二晶片40的大小範圍可覆蓋第一晶片20、連接線22及凸件12。
As shown in FIG. 2B, the
線路基板10上有多個凸件12,當包晶膠層30能均勻平壓至線路基板10的第一表面101時,由於凸件12位在晶片區11外圍,包晶膠層30的膠體可均勻地被排擠,使得包晶膠層30自對應線路基板10位在中間晶片區11至其外圍區域的高度落差呈現緩減現象;再者,本實施例具有數量較多的柱狀凸件12之間間隔通道多,亦有助於減少包晶膠層30於貼合後不易生成氣泡。
There are a plurality of
請參閱圖3A所示,為本發明堆疊式半導體封裝結構1的第一實施例的上視平面;於本實施例,線路基板10的各凸件12係呈柱狀,且多個凸件矩陣地排列在晶片區11之外圍;於本實施例,多個凸件12排列在晶片區11的四周外圍。再如圖3B所示,為對應圖3A包晶膠層30之高度分佈圖,與圖9B相較,相鄰段的高度差H1/H2、H2/H3、H3/H4、H4/H5、H5/H6、H6/H7、H7/H8、H8/H9間隔變寬,且最低高度差H9的範圍明顯減少許多,配合圖1所示,代表本發明堆疊式半導體封裝結構的包晶膠層30自對應晶片區11至其外圍區域的高度落差已緩減,如此第二晶片40即可較平坦地設置在包晶膠層30上。
Please refer to FIG. 3A, which is a top plan view of the first embodiment of the stacked
請參閱圖4A所示,為本發明堆疊式半導體封裝結構1a的第二實施例的上視平面。於本實施例,線路基板10上各凸件12a係呈片狀,且些凸件12a係相互平行地排列在晶片區11之外;於本實施例,多個片狀凸件12a係平行地排列在晶片區11的四周外圍;其中位在晶片區11外之二相對第一外側區S1的各凸件12a長度相較位在晶片區11外之二相對第二外側區S2的各凸件12a長度長,且位在晶片區11外之各第二外側區S2的凸件12a數量相較位在晶片區11外之各第一外側區S1的凸件12a數量多,又位在各第二外側區S2的凸件12a係呈雙排並列。再如圖1及圖4B所示,為對應圖4A包晶膠層30之高度分佈圖,與圖9B相較,相鄰段的高度差H1/H2、H2/H3、H3/H4、H4/H5、H5/H6、H6/H7、H7/H8、H8/H9間隔
同樣拉寬,且最低高度差H9的範圍也明顯減少許多,代表包晶膠層30自對應晶片區11至其外圍區域的高度落差已緩減,第二晶片40可較平坦地設置在包晶膠層30上。
Please refer to FIG. 4A, which is a top plan view of the second embodiment of the stacked semiconductor package structure 1a of the present invention. In this embodiment, each of the
請參閱圖5A所示,為本發明堆疊式半導體封裝結構1b的第三實施例,其與第二實施例大致相同,惟於本實施例,位在各第二外側區S2的凸件12a係呈三排並列。再如圖5B所示,為對應圖5A包晶膠層30之高度分佈圖,與圖9B相較,相鄰段的高度差H1/H2、H2/H3、H3/H4、H4/H5、H5/H6、H6/H7、H7/H8、H8/H9間隔同樣拉寬,且最低高度差H9的範圍也明顯減少許多,代表包晶膠層30自對應晶片區11至其外圍區域的高度落差已緩減,第二晶片40可較平坦地設置在包晶膠層30上,如圖1所示。
Please refer to FIG. 5A, which is a third embodiment of the stacked
請參閱圖6A所示,為本發明堆疊式半導體封裝結構1c的第四實施例;於本實施例,線路基板10上各凸件12b係呈塊狀。於本實施例,位在晶片區11外之二相對第一外側區S1的各凸件12b長度相較位在晶片區11外之二相對第二外側區S2的各凸件12b長度短,且位在各第二外側區S2的凸件12b數量與位在各第一外側區S1的凸件12b數量相同。再如圖6B所示,為對應圖6A包晶膠層30之高度分佈圖,與圖9B相較,相鄰段的高度差H1/H2、H2/H3、H3/H4、H4/H5、H5/H6、H6/H7、H7/H8、H8/H9間隔同樣拉寬,且最低高度差H9的範圍也明顯減少許多,代表包晶膠層30自對應晶片區11至其外圍區域的高度落差已緩減,第二晶片40可較平坦地設置在包晶膠層30上,如圖1所示。
Please refer to FIG. 6A, which is a fourth embodiment of the stacked
請參閱圖7A所示,為本發明堆疊式半導體封裝結構1d的第五實施例,其與第四實施例大致相同,惟於本實施例,僅於二第二外側區S2分別設置有一塊狀凸件12b。再如圖7B所示,為對應圖7A包晶膠層30之高度分佈圖,與
圖9B相較,相鄰段的高度差H1/H2、H2/H3、H3/H4、H4/H5、H5/H6、H6/H7、H7/H8、H8/H9間隔同樣拉寬,且最低高度差H9的範圍也明顯減少許多,代表包晶膠層30自對應晶片區11至其外圍區域的高度落差已緩減,第二晶片40可較平坦地設置在包晶膠層30上,如圖1所示。
Please refer to FIG. 7A, which is a fifth embodiment of the stacked
綜上所述,本發明主要在線路基板的第一表面的晶片區外形成有多個凸件,當加熱後呈黏稠狀的包晶膠層平貼於第一表面時,對應各凸件位置的部分膠體同樣被向外及向上推擠,以減縮晶片區至周圍的高度落差,使第二晶片較平坦地設置在包晶膠層上,消除封裝後脫層或存在氣泡等疑慮。 To sum up, the present invention mainly forms a plurality of convex parts outside the wafer area on the first surface of the circuit substrate. When the viscous encapsulant layer after heating is flat on the first surface, corresponding to the position of each convex part Part of the colloid is also pushed outwards and upwards to reduce the height difference from the wafer area to the surrounding area, so that the second wafer is arranged flat on the encapsulant layer, eliminating the delamination or the existence of bubbles after packaging.
以上所述僅是本發明的實施例而已,並非對本發明做任何形式上的限制,雖然本發明已以實施例揭露如上,然而並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明技術方案的範圍內,當可利用上述揭示的技術內容作出些許更動或修飾為等同變化的等效實施例,但凡是未脫離本發明技術方案的內容,依據本發明的技術實質對以上實施例所作的任何簡單修改、等同變化與修飾,均仍屬於本發明技術方案的範圍內。 The above is only an embodiment of the present invention, and does not limit the present invention in any form. Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention. Any person with ordinary knowledge in the technical field of the art, Within the scope of not departing from the technical solution of the present invention, when the technical contents disclosed above can be used to make some modifications or modifications to equivalent embodiments of equivalent changes, but any content that does not depart from the technical solution of the present invention, based on the technical essence of the present invention Any simple modifications, equivalent changes and modifications made to the above embodiments still fall within the scope of the technical solution of the present invention.
1:堆疊式半導體封裝結構 1: Stacked semiconductor packaging structure
10:線路基板 10: circuit board
101:第一表面 101: first surface
102:第二表面 102: second surface
103:絕緣保護層 103: insulating protective layer
12:凸件 12: convex
13:接點 13: Contact
14:錫球 14: Tin ball
15:線路 15: Line
20:第一晶片 20: First chip
201:黏膠 201: viscose
21:接墊 21: Pad
22:連接線 22: connection line
30:包晶膠層 30: encapsulated gel layer
40:第二晶片 40: Second chip
Claims (10)
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
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TW201409588A (en) * | 2012-08-31 | 2014-03-01 | Taiwan Semiconductor Mfg | Package structure |
TW201515125A (en) * | 2013-10-09 | 2015-04-16 | Powertech Technology Inc | Pillar bump structur having non-equal heights to erase solder co-planarity difference |
TW201519404A (en) * | 2013-11-14 | 2015-05-16 | Taiwan Semiconductor Mfg Co Ltd | Three dimensional integrated circuit (3DIC) structure and method of manufacturing the same |
TW201633497A (en) * | 2014-12-18 | 2016-09-16 | 英特爾公司 | Low cost package warpage solution |
TW201806039A (en) * | 2016-08-09 | 2018-02-16 | 矽品精密工業股份有限公司 | Electronic stack-up structure and the manufacture thereof |
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TW201409588A (en) * | 2012-08-31 | 2014-03-01 | Taiwan Semiconductor Mfg | Package structure |
TW201515125A (en) * | 2013-10-09 | 2015-04-16 | Powertech Technology Inc | Pillar bump structur having non-equal heights to erase solder co-planarity difference |
TW201519404A (en) * | 2013-11-14 | 2015-05-16 | Taiwan Semiconductor Mfg Co Ltd | Three dimensional integrated circuit (3DIC) structure and method of manufacturing the same |
TW201633497A (en) * | 2014-12-18 | 2016-09-16 | 英特爾公司 | Low cost package warpage solution |
TW201806039A (en) * | 2016-08-09 | 2018-02-16 | 矽品精密工業股份有限公司 | Electronic stack-up structure and the manufacture thereof |
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