TWI689023B - Stacked semiconductor package - Google Patents

Stacked semiconductor package Download PDF

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TWI689023B
TWI689023B TW108126395A TW108126395A TWI689023B TW I689023 B TWI689023 B TW I689023B TW 108126395 A TW108126395 A TW 108126395A TW 108126395 A TW108126395 A TW 108126395A TW I689023 B TWI689023 B TW I689023B
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area
chip
wafer
stacked semiconductor
semiconductor package
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TW108126395A
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Chinese (zh)
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TW202105542A (en
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程政宇
游舜名
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力成科技股份有限公司
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/0554External layer
    • H01L2224/0555Shape
    • H01L2224/05552Shape in top view
    • H01L2224/05554Shape in top view being square
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/4912Layout
    • H01L2224/49175Parallel arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation
    • H01L2924/1815Shape

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  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Wire Bonding (AREA)

Abstract

The present invention relates to a stacked semiconductor package and has a substrate, a first chip, a second chip and an adhesive layer. The substrate has a chip area and multiple projections formed around the chip area. Multiple pads are formed on the chip area. The first chip is mounted on the chip area and electrically connected to the pads. The adhesive layer encapsulates the first chip and the projections. The second chip is mounted on the adhesive layer and a size of the second chip is larger than that of the first chip, so the second chip corresponds the first chip and the projections. Since the projections formed around the chip area, a top surface of the adhesive layer is flatter.

Description

堆疊式半導體封裝結構Stacked semiconductor packaging structure

本發明係關於一種堆疊式半導體封裝結構,尤指一種使用改良線路基板的堆疊式半導體封裝結構。 The invention relates to a stacked semiconductor packaging structure, in particular to a stacked semiconductor packaging structure using an improved circuit substrate.

在半導體封裝技術可使用堆疊式半導體封裝結構,將多顆晶片以堆疊方式進行封裝,來縮減封裝體的橫向尺寸。 In the semiconductor packaging technology, a stacked semiconductor packaging structure may be used to package multiple chips in a stacked manner to reduce the lateral size of the package.

請參閱圖8A及圖8B所示,一種堆疊式半導體封裝結構包含有一線路基板50、一第一晶片60、一包晶膠層70(Film-On-Die adhesive;FOD)及一第二晶片80;其中該第一晶片60係電性連接在線路基板50上,再將貼附有第二晶片80的包晶膠層70加熱後平壓貼合至線路基板50上,以覆蓋第一晶片60,如圖8B所示,據以構成堆疊式半導體封裝結構。 Please refer to FIGS. 8A and 8B, a stacked semiconductor package structure includes a circuit substrate 50, a first chip 60, a encapsulant layer 70 (Film-On-Die adhesive; FOD) and a second chip 80 Wherein the first chip 60 is electrically connected to the circuit substrate 50, and then the encapsulant layer 70 attached with the second chip 80 is heated and then flat-pressed and bonded to the circuit substrate 50 to cover the first chip 60 As shown in FIG. 8B, a stacked semiconductor package structure is constructed accordingly.

由圖8B可知,上述包晶膠層70為了完整包覆該第一晶片60,會預先加熱後呈黏稠狀再平貼至線路基板50上;然而,因為第一晶片60有一定厚度,所以包晶膠層70在平貼過程中,其對應第一晶片60的部分膠體會被向上、向外排擠,再由於包晶膠層70呈黏稠狀,故在給予包晶膠層70均勻下壓的平貼過程中,被排擠的部分膠體是無法被均勻地推擠到整個包晶膠層70,而造成對應第一晶片50位置的包晶膠層70部分向上拱起,再如圖9A及圖9B所示,包晶膠層70中間對應第一晶片60位置的高度至其周圍的高度之間落差大(在本例示中包含有9段高度差H1~H9),使得後續第二晶片80無法堆疊在平坦的包晶膠層70上, 待堆疊式半導體封裝結構完成後,則易有脫層的現象,故而有必要進一步改良之。 As can be seen from FIG. 8B, in order to completely cover the first wafer 60, the above encapsulant layer 70 is pre-heated in a viscous state and then flatly attached to the circuit substrate 50; however, because the first wafer 60 has a certain thickness, the package During the flat lamination process of the gel layer 70, part of the colloid corresponding to the first wafer 60 will be squeezed upwards and outwards. Since the encapsulant layer 70 is viscous, the encapsulant layer 70 is pressed down evenly. During the flat lamination process, the part of the colloid that is being pushed out cannot be evenly pushed to the entire encapsulant layer 70, which causes the part of the encapsulant layer 70 corresponding to the position of the first wafer 50 to arch upward, as shown in FIG. 9A and FIG. As shown in FIG. 9B, the height difference between the height corresponding to the position of the first wafer 60 in the middle of the encapsulant layer 70 and the surrounding height is large (in this example, there are 9 levels of height differences H1~H9), making the subsequent second wafer 80 unable to Stacked on a flat encapsulant layer 70, After the stacked semiconductor package structure is completed, it is prone to delamination, so further improvement is necessary.

有鑑於上述堆疊式半導體封裝結構因使用包晶膠層而易有脫層之缺陷,本發明主要目的係提供一種堆疊式半導體封裝結構及其線路基板,以改善脫層缺陷。 In view of the fact that the stacked semiconductor package structure described above is prone to delamination due to the use of a peri-plastic layer, the main object of the present invention is to provide a stacked semiconductor package structure and its circuit substrate to improve delamination defects.

欲達上述目的所使用的主要技術手段係令該堆疊式半導體封裝結構包含有:一線路基板,其第一表面上形成有一絕緣保護層,且包含有一晶片區及多個位在該晶片區周圍且凸出於該絕緣保護層的凸件;其中該晶片區內包含有多個接點;一第一晶片,係設置在該線路基板的該晶片區,並電性連接至該些接點;一包晶膠層,係貼合並包覆位於該線路基板的該絕緣保護層上的凸件及該第一晶片;以及一第二晶片,係設置在該包晶膠層上;其中該第二晶片的尺寸大於該第一晶片尺寸,且該第二晶片向下對應該些凸件。 The main technical means used to achieve the above purpose is that the stacked semiconductor package structure includes: a circuit substrate, an insulating protective layer is formed on the first surface thereof, and includes a chip area and a plurality of locations around the chip area And protruding from the insulating protection layer; wherein the chip area contains a plurality of contacts; a first chip is disposed in the chip area of the circuit substrate and electrically connected to the contacts; A encapsulant layer, which is attached and covered with the protrusions and the first chip on the insulating protective layer of the circuit substrate; and a second chip, which is arranged on the encapsulant layer; wherein the second The size of the wafer is larger than the size of the first wafer, and the second wafer corresponds downward to the protrusions.

由上述說明可知,本發明主要在線路基板的晶片區外形成有多個凸件,當加熱後呈黏稠狀的包晶膠層平貼於該第一表面的絕緣保護層時,由於多個凸件位在晶片區外圍,包晶膠層的膠體可均勻地被排擠,以減縮晶片區至周圍的高度落差,使該第二晶片較平坦地設置在該包晶膠層上。 As can be seen from the above description, the present invention mainly forms a plurality of protrusions outside the wafer area of the circuit substrate. When a viscous encapsulant layer is applied to the insulating protective layer on the first surface after heating, due to the plurality of protrusions The device is located at the periphery of the wafer area, and the colloid of the encapsulant layer can be evenly squeezed out to reduce the height difference from the wafer area to the surrounding area, so that the second wafer is arranged on the encapsulant layer more evenly.

1、1a、1b、1c、1d:堆疊式半導體封裝結構 1, 1a, 1b, 1c, 1d: stacked semiconductor packaging structure

10:線路基板 10: circuit board

101:第一表面 101: first surface

102:第二表面 102: second surface

103:絕緣保護層 103: insulating protective layer

11:晶片區 11: Wafer area

12、12a、12b:凸件 12, 12a, 12b: convex parts

13:接點 13: Contact

14:錫球 14: Tin ball

15:線路 15: Line

20:第一晶片 20: First chip

201:黏膠 201: viscose

21:接墊 21: Pad

22:連接線 22: connection line

30:包晶膠層 30: encapsulated gel layer

40:第二晶片 40: Second chip

S1:第一外側區 S1: first lateral zone

S2:第二外側區 S2: Second outer zone

50:線路基板 50: circuit board

60:第一晶片 60: First chip

70:包晶膠層 70: encapsulated gel layer

80:第二晶片 80: second chip

圖1:係本發明一堆疊式半導體封裝結構的側視剖面圖。 FIG. 1 is a side cross-sectional view of a stacked semiconductor package structure of the present invention.

圖2A及圖2B:係本發明堆疊式封裝製程中不同步驟下的半成品側視剖面圖。 2A and 2B are side cross-sectional views of semi-finished products at different steps in the stacked packaging process of the present invention.

圖3A:係本發明堆疊式封裝製程的第一實施例的上視平面圖。 FIG. 3A is a top plan view of the first embodiment of the stacked packaging process of the present invention.

圖3B:係圖3B的包晶膠層高度變化圖。 Fig. 3B: A graph of the change in height of the cladding gel layer of Fig. 3B.

圖4A:係本發明堆疊式封裝製程的第二實施例的上視平面圖。 FIG. 4A is a top plan view of a second embodiment of the stacked packaging process of the present invention.

圖4B:係圖4A的包晶膠層高度變化圖。 Fig. 4B: A graph of the change in height of the cladding layer of Fig. 4A.

圖5A:係本發明堆疊式封裝製程的第三實施例的上視平面圖。 FIG. 5A is a top plan view of a third embodiment of the stacked packaging process of the present invention.

圖5B:係圖5A的包晶膠層高度變化圖。 Fig. 5B: A graph of the change in height of the cladding gel layer of Fig. 5A.

圖6A:係本發明堆疊式封裝製程的第四實施例的上視平面圖。 6A: It is a top plan view of the fourth embodiment of the stacked packaging process of the present invention.

圖6B:係圖6A的包晶膠層高度變化圖。 Fig. 6B: A graph of the change in height of the cladding gel layer of Fig. 6A.

圖7A:係本發明堆疊式封裝製程的第五實施例的上視平面圖。 7A: It is a top plan view of a fifth embodiment of the stacked packaging process of the present invention.

圖7B:係圖7A的包晶膠層高度變化圖。 Fig. 7B: A graph of the change in height of the cladding gel layer of Fig. 7A.

圖8A及圖8B:係既有堆疊式封裝製程中不同步驟下的半成品側視剖面圖。 8A and 8B are side cross-sectional views of semi-finished products at different steps in the existing stacked packaging process.

圖9A:係圖8B上視平面圖。 Figure 9A: a top plan view of Figure 8B.

圖9B:係圖9A的包晶膠層高度變化圖。 FIG. 9B: A graph of the change in the height of the peritectic layer of FIG. 9A.

本發明係針對堆疊式半導體封裝結構進行改良,以下配合多個不同實施例及圖式詳加說明本案技術內容。 The present invention is directed to the improvement of the stacked semiconductor package structure. The technical content of this case will be described in detail in conjunction with a number of different embodiments and drawings.

首先請參閱圖1所示,本發明堆疊式半導體封裝結構1的一實施例,其包含有線路基板10、第一晶片20、包晶膠層30及第二晶片40。 First, please refer to FIG. 1, an embodiment of the stacked semiconductor package structure 1 of the present invention includes a circuit substrate 10, a first chip 20, a encapsulant layer 30 and a second chip 40.

上述線路基板10包含有一第一表面101及一相對第一表面101的第 二表面102;請配合圖3A所示,第一表面101上包含有一晶片區11及多個凸件12,第二表面102形成有多個錫球14或凸塊。線路基板10內形成有線路15,第一表面101上的晶片區11內包含有多個接點13,且多個凸件12係位在晶片區11外圍並且凸出於第一表面101,線路15用以電性連接第一表面101上的接點13及第二表面102的錫球14或凸塊。於本實施例,線路基板10為玻璃纖維板(FR4板或FR5板),且玻璃纖維板的第一表面101及第二表面102分別塗佈有絕緣保護層103(如:綠漆),故凸件12係凸出於第一表面101上的絕緣保護層103,但絕緣保護層103不覆蓋第一表面101上的接點13及第二表面102上的錫球14或凸塊,即錫球14或凸塊係凸出於該第二表面102上的絕緣保護層103。較佳地,凸件12係為絕緣材質,例如綠漆或樹脂;由於凸件12係凸出於絕緣保護層103,故凸件12可與絕緣保護層為相同材質,但均不以此為限。 The circuit board 10 includes a first surface 101 and a third surface opposite to the first surface 101 Two surfaces 102; please refer to FIG. 3A, the first surface 101 includes a wafer area 11 and a plurality of protrusions 12, and the second surface 102 is formed with a plurality of solder balls 14 or bumps. A circuit 15 is formed in the circuit substrate 10, the wafer area 11 on the first surface 101 includes a plurality of contacts 13, and a plurality of protrusions 12 are located on the periphery of the wafer area 11 and protrude from the first surface 101, the circuit 15 is a solder ball 14 or bump for electrically connecting the contact 13 on the first surface 101 and the second surface 102. In this embodiment, the circuit substrate 10 is a glass fiber board (FR4 board or FR5 board), and the first surface 101 and the second surface 102 of the glass fiber board are coated with an insulating protective layer 103 (such as green paint), so the convex parts 12 is protruding from the insulating protective layer 103 on the first surface 101, but the insulating protective layer 103 does not cover the contact 13 on the first surface 101 and the solder balls 14 or bumps on the second surface 102, that is, the solder balls 14 Or the bumps protrude from the insulating protective layer 103 on the second surface 102. Preferably, the convex member 12 is made of an insulating material, such as green paint or resin; because the convex member 12 is protruded from the insulating protective layer 103, the convex member 12 and the insulating protective layer can be made of the same material, but neither is limit.

上述第一晶片20係設置在線路基板10的晶片區11,並電性連接至接點13;於本實施例,如圖2A所示,第一晶片20透過黏膠201固定在線路基板10的絕緣保護層103上,且第一晶片20的多個接墊21朝上,並以打線製程將連接線22一端連接於接墊21,另一端連接至接點13上,使第一晶片20與線路基板10電性連接。 The above-mentioned first chip 20 is disposed in the chip area 11 of the circuit substrate 10 and is electrically connected to the contact 13; in this embodiment, as shown in FIG. 2A, the first chip 20 is fixed to the circuit substrate 10 through the adhesive 201 On the insulating protective layer 103, and the plurality of pads 21 of the first chip 20 face upward, and one end of the connecting wire 22 is connected to the pad 21 and the other end is connected to the contact 13 by a wire bonding process, so that the first chip 20 and The circuit board 10 is electrically connected.

上述第二晶片40係設置在包晶膠層30上,包晶膠層30連同其上的第二晶片40均勻平壓並貼合於線路基板10的第一表面101上的絕緣保護層103,由於包晶膠層30的厚度大於第一晶片20、凸件12及連接線22的高度,故可包覆第一晶片20、凸件12及連接線22於其中。於本實施例,包晶膠層30為一雙面膠帶(Die-Attach Film;DAF),可於加熱後呈黏椆狀,如圖2B所示,故於加熱後貼合至線路基板10之第一表面101的絕緣保護層103。 The second wafer 40 is disposed on the encapsulant layer 30, and the encapsulant layer 30 and the second wafer 40 thereon are evenly pressed and attached to the insulating protective layer 103 on the first surface 101 of the circuit substrate 10, Since the thickness of the encapsulant layer 30 is greater than the heights of the first wafer 20, the convex member 12 and the connecting wire 22, the first wafer 20, the convex member 12 and the connecting wire 22 can be covered therein. In this embodiment, the encapsulant layer 30 is a double-sided adhesive tape (Die-Attach Film; DAF), which can be sticky after heating, as shown in FIG. 2B, so it is bonded to the circuit substrate 10 after heating The insulating protective layer 103 of the first surface 101.

如圖2B所示,上述第二晶片40透過包晶膠層30間隔疊設在第一晶片20上,且第二晶片40的尺寸大於第一晶片20尺寸,令第二晶片40向下對應有 第一晶片20、連接線22及凸件12。即第二晶片40的大小範圍可覆蓋第一晶片20、連接線22及凸件12。 As shown in FIG. 2B, the second wafer 40 is stacked on the first wafer 20 through the encapsulant layer 30, and the size of the second wafer 40 is larger than the size of the first wafer 20, so that the second wafer 40 corresponds to The first wafer 20, the connection line 22, and the protrusions 12. That is, the size range of the second wafer 40 can cover the first wafer 20, the connection line 22, and the protrusion 12.

線路基板10上有多個凸件12,當包晶膠層30能均勻平壓至線路基板10的第一表面101時,由於凸件12位在晶片區11外圍,包晶膠層30的膠體可均勻地被排擠,使得包晶膠層30自對應線路基板10位在中間晶片區11至其外圍區域的高度落差呈現緩減現象;再者,本實施例具有數量較多的柱狀凸件12之間間隔通道多,亦有助於減少包晶膠層30於貼合後不易生成氣泡。 There are a plurality of protrusions 12 on the circuit substrate 10. When the encapsulant layer 30 can be evenly pressed onto the first surface 101 of the circuit substrate 10, since the protrusions 12 are located on the periphery of the wafer area 11, the colloid of the encapsulant layer 30 Can be evenly squeezed out, so that the height drop of the encapsulant layer 30 from the corresponding circuit substrate 10 located in the middle wafer area 11 to its peripheral area presents a slowing down phenomenon; furthermore, this embodiment has a large number of columnar convex pieces The large number of spaced channels between 12 also helps to reduce the generation of air bubbles in the encapsulated gel layer 30 after bonding.

請參閱圖3A所示,為本發明堆疊式半導體封裝結構1的第一實施例的上視平面;於本實施例,線路基板10的各凸件12係呈柱狀,且多個凸件矩陣地排列在晶片區11之外圍;於本實施例,多個凸件12排列在晶片區11的四周外圍。再如圖3B所示,為對應圖3A包晶膠層30之高度分佈圖,與圖9B相較,相鄰段的高度差H1/H2、H2/H3、H3/H4、H4/H5、H5/H6、H6/H7、H7/H8、H8/H9間隔變寬,且最低高度差H9的範圍明顯減少許多,配合圖1所示,代表本發明堆疊式半導體封裝結構的包晶膠層30自對應晶片區11至其外圍區域的高度落差已緩減,如此第二晶片40即可較平坦地設置在包晶膠層30上。 Please refer to FIG. 3A, which is a top plan view of the first embodiment of the stacked semiconductor package structure 1 of the present invention. In this embodiment, each convex element 12 of the circuit substrate 10 is columnar, and a plurality of convex element matrix Are arranged on the periphery of the wafer area 11; in this embodiment, a plurality of protrusions 12 are arranged on the periphery of the wafer area 11. As shown in FIG. 3B, it is a height distribution diagram corresponding to the cladding layer 30 of FIG. 3A. Compared with FIG. 9B, the height difference between adjacent sections H1/H2, H2/H3, H3/H4, H4/H5, H5 /H6, H6/H7, H7/H8, H8/H9 interval becomes wider, and the range of the minimum height difference H9 is significantly reduced, with the help of FIG. 1, the encapsulant layer 30 representing the stacked semiconductor packaging structure of the present invention is The height difference from the corresponding wafer area 11 to its peripheral area has been reduced, so that the second wafer 40 can be arranged on the encapsulant layer 30 relatively flatly.

請參閱圖4A所示,為本發明堆疊式半導體封裝結構1a的第二實施例的上視平面。於本實施例,線路基板10上各凸件12a係呈片狀,且些凸件12a係相互平行地排列在晶片區11之外;於本實施例,多個片狀凸件12a係平行地排列在晶片區11的四周外圍;其中位在晶片區11外之二相對第一外側區S1的各凸件12a長度相較位在晶片區11外之二相對第二外側區S2的各凸件12a長度長,且位在晶片區11外之各第二外側區S2的凸件12a數量相較位在晶片區11外之各第一外側區S1的凸件12a數量多,又位在各第二外側區S2的凸件12a係呈雙排並列。再如圖1及圖4B所示,為對應圖4A包晶膠層30之高度分佈圖,與圖9B相較,相鄰段的高度差H1/H2、H2/H3、H3/H4、H4/H5、H5/H6、H6/H7、H7/H8、H8/H9間隔 同樣拉寬,且最低高度差H9的範圍也明顯減少許多,代表包晶膠層30自對應晶片區11至其外圍區域的高度落差已緩減,第二晶片40可較平坦地設置在包晶膠層30上。 Please refer to FIG. 4A, which is a top plan view of the second embodiment of the stacked semiconductor package structure 1a of the present invention. In this embodiment, each of the protrusions 12a on the circuit board 10 is in a sheet shape, and the protrusions 12a are arranged parallel to each other outside the wafer area 11; in this embodiment, a plurality of sheet-shaped protrusions 12a are in parallel Arranged around the periphery of the wafer area 11; the length of each of the convex parts 12a located outside the wafer area 11 relative to the first outer side area S1 is shorter than that of the convex pieces located outside the wafer area 11 relative to the second outer side area S2 The length of 12a is long, and the number of protrusions 12a of each second outer area S2 located outside the wafer area 11 is larger than the number of protrusions 12a of each first outer area S1 located outside the wafer area 11, and is located in each The convex parts 12a of the two outer side regions S2 are arranged side by side in double rows. As shown in FIGS. 1 and 4B, it is a height distribution diagram corresponding to the cladding layer 30 of FIG. 4A. Compared with FIG. 9B, the height difference between adjacent sections is H1/H2, H2/H3, H3/H4, H4/ H5, H5/H6, H6/H7, H7/H8, H8/H9 interval Also widened, and the range of the minimum height difference H9 is also significantly reduced, which means that the height difference of the encapsulant layer 30 from the corresponding wafer area 11 to its peripheral area has been reduced, and the second wafer 40 can be arranged more flatly on the encapsulated crystal The glue layer 30.

請參閱圖5A所示,為本發明堆疊式半導體封裝結構1b的第三實施例,其與第二實施例大致相同,惟於本實施例,位在各第二外側區S2的凸件12a係呈三排並列。再如圖5B所示,為對應圖5A包晶膠層30之高度分佈圖,與圖9B相較,相鄰段的高度差H1/H2、H2/H3、H3/H4、H4/H5、H5/H6、H6/H7、H7/H8、H8/H9間隔同樣拉寬,且最低高度差H9的範圍也明顯減少許多,代表包晶膠層30自對應晶片區11至其外圍區域的高度落差已緩減,第二晶片40可較平坦地設置在包晶膠層30上,如圖1所示。 Please refer to FIG. 5A, which is a third embodiment of the stacked semiconductor package structure 1b of the present invention, which is substantially the same as the second embodiment. However, in this embodiment, the protrusions 12a located in each second outer region S2 are In three rows side by side. As shown in FIG. 5B, it is a height distribution diagram corresponding to the cladding layer 30 of FIG. 5A. Compared with FIG. 9B, the height difference between adjacent sections H1/H2, H2/H3, H3/H4, H4/H5, H5 /H6, H6/H7, H7/H8, H8/H9 interval is also widened, and the range of the minimum height difference H9 is also significantly reduced, indicating that the height difference of the encapsulant layer 30 from the corresponding wafer area 11 to its peripheral area has Slowly, the second wafer 40 can be arranged on the encapsulant layer 30 relatively flat, as shown in FIG. 1.

請參閱圖6A所示,為本發明堆疊式半導體封裝結構1c的第四實施例;於本實施例,線路基板10上各凸件12b係呈塊狀。於本實施例,位在晶片區11外之二相對第一外側區S1的各凸件12b長度相較位在晶片區11外之二相對第二外側區S2的各凸件12b長度短,且位在各第二外側區S2的凸件12b數量與位在各第一外側區S1的凸件12b數量相同。再如圖6B所示,為對應圖6A包晶膠層30之高度分佈圖,與圖9B相較,相鄰段的高度差H1/H2、H2/H3、H3/H4、H4/H5、H5/H6、H6/H7、H7/H8、H8/H9間隔同樣拉寬,且最低高度差H9的範圍也明顯減少許多,代表包晶膠層30自對應晶片區11至其外圍區域的高度落差已緩減,第二晶片40可較平坦地設置在包晶膠層30上,如圖1所示。 Please refer to FIG. 6A, which is a fourth embodiment of the stacked semiconductor package structure 1c of the present invention. In this embodiment, each of the protrusions 12b on the circuit substrate 10 is block-shaped. In this embodiment, the length of each of the protrusions 12b located outside the wafer area 11 relative to the first outer area S1 is shorter than the length of the protrusions 12b located outside the wafer area 11 relative to the second outer area S2, and The number of protrusions 12b located in each second outer area S2 is the same as the number of protrusions 12b located in each first outer area S1. As shown in FIG. 6B, it is a height distribution diagram corresponding to the cladding layer 30 of FIG. 6A. Compared with FIG. 9B, the height difference between adjacent sections H1/H2, H2/H3, H3/H4, H4/H5, H5 /H6, H6/H7, H7/H8, H8/H9 interval is also widened, and the range of the minimum height difference H9 is also significantly reduced, indicating that the height difference of the encapsulant layer 30 from the corresponding wafer area 11 to its peripheral area has Slowly, the second wafer 40 can be arranged on the encapsulant layer 30 relatively flat, as shown in FIG. 1.

請參閱圖7A所示,為本發明堆疊式半導體封裝結構1d的第五實施例,其與第四實施例大致相同,惟於本實施例,僅於二第二外側區S2分別設置有一塊狀凸件12b。再如圖7B所示,為對應圖7A包晶膠層30之高度分佈圖,與 圖9B相較,相鄰段的高度差H1/H2、H2/H3、H3/H4、H4/H5、H5/H6、H6/H7、H7/H8、H8/H9間隔同樣拉寬,且最低高度差H9的範圍也明顯減少許多,代表包晶膠層30自對應晶片區11至其外圍區域的高度落差已緩減,第二晶片40可較平坦地設置在包晶膠層30上,如圖1所示。 Please refer to FIG. 7A, which is a fifth embodiment of the stacked semiconductor package structure 1d of the present invention, which is substantially the same as the fourth embodiment. However, in this embodiment, only two second outer regions S2 are provided with a piece Convex part 12b. As shown in FIG. 7B, it is a height distribution diagram corresponding to FIG. 7A cladding layer 30, and Compared with Fig. 9B, the height differences between adjacent sections H1/H2, H2/H3, H3/H4, H4/H5, H5/H6, H6/H7, H7/H8, H8/H9 are also widened, and the minimum height The range of the difference H9 is also significantly reduced, which means that the height difference of the encapsulant layer 30 from the corresponding wafer area 11 to its peripheral area has been reduced, and the second wafer 40 can be arranged on the encapsulant layer 30 relatively flat, as shown in FIG. 1 shown.

綜上所述,本發明主要在線路基板的第一表面的晶片區外形成有多個凸件,當加熱後呈黏稠狀的包晶膠層平貼於第一表面時,對應各凸件位置的部分膠體同樣被向外及向上推擠,以減縮晶片區至周圍的高度落差,使第二晶片較平坦地設置在包晶膠層上,消除封裝後脫層或存在氣泡等疑慮。 To sum up, the present invention mainly forms a plurality of convex parts outside the wafer area on the first surface of the circuit substrate. When the viscous encapsulant layer after heating is flat on the first surface, corresponding to the position of each convex part Part of the colloid is also pushed outwards and upwards to reduce the height difference from the wafer area to the surrounding area, so that the second wafer is arranged flat on the encapsulant layer, eliminating the delamination or the existence of bubbles after packaging.

以上所述僅是本發明的實施例而已,並非對本發明做任何形式上的限制,雖然本發明已以實施例揭露如上,然而並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明技術方案的範圍內,當可利用上述揭示的技術內容作出些許更動或修飾為等同變化的等效實施例,但凡是未脫離本發明技術方案的內容,依據本發明的技術實質對以上實施例所作的任何簡單修改、等同變化與修飾,均仍屬於本發明技術方案的範圍內。 The above is only an embodiment of the present invention, and does not limit the present invention in any form. Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention. Any person with ordinary knowledge in the technical field of the art, Within the scope of not departing from the technical solution of the present invention, when the technical contents disclosed above can be used to make some modifications or modifications to equivalent embodiments of equivalent changes, but any content that does not depart from the technical solution of the present invention, based on the technical essence of the present invention Any simple modifications, equivalent changes and modifications made to the above embodiments still fall within the scope of the technical solution of the present invention.

1:堆疊式半導體封裝結構 1: Stacked semiconductor packaging structure

10:線路基板 10: circuit board

101:第一表面 101: first surface

102:第二表面 102: second surface

103:絕緣保護層 103: insulating protective layer

12:凸件 12: convex

13:接點 13: Contact

14:錫球 14: Tin ball

15:線路 15: Line

20:第一晶片 20: First chip

201:黏膠 201: viscose

21:接墊 21: Pad

22:連接線 22: connection line

30:包晶膠層 30: encapsulated gel layer

40:第二晶片 40: Second chip

Claims (10)

一種堆疊式半導體封裝結構,包括:一線路基板,其第一表面上形成有一絕緣保護層,且包含有一晶片區及多個位在該晶片區周圍且凸出於該絕緣保護層的凸件;其中該晶片區內包含有多個接點;一第一晶片,係設置在該線路基板的該晶片區,並電性連接至該些接點;一包晶膠層,係貼合並包覆位於該線路基板的該絕緣保護層上的該凸件及該第一晶片;以及一第二晶片,係設置在該包晶膠層上;其中該第二晶片的尺寸大於該第一晶片尺寸,且該第二晶片向下對應該些凸件。 A stacked semiconductor packaging structure includes: a circuit substrate having an insulating protective layer formed on a first surface thereof, and including a chip area and a plurality of protrusions located around the chip area and protruding from the insulating protective layer; The chip area contains a plurality of contacts; a first chip is provided in the chip area of the circuit substrate and is electrically connected to the contacts; a crystal encapsulant layer is attached and covered in The protrusion and the first chip on the insulating protective layer of the circuit substrate; and a second chip, which are disposed on the encapsulant layer; wherein the size of the second chip is larger than the size of the first chip, and The second wafer corresponds downward to the protrusions. 如請求項1所述之堆疊式半導體封裝結構,其中各該凸件係件呈柱狀,且該些凸件係矩陣地排列在該晶片區之外。 The stacked semiconductor package structure according to claim 1, wherein each of the convex member ties is columnar, and the convex elements are arranged in a matrix outside the chip area. 如請求項1所述之堆疊式半導體封裝結構,其中各該凸件係呈片狀,且該些凸件係相互平行地排列在該晶片區之外。 The stacked semiconductor package structure according to claim 1, wherein each of the convex pieces is in a sheet shape, and the convex pieces are arranged parallel to each other outside the chip area. 如請求項3所述之堆疊式半導體封裝結構,其中位在該晶片區之外之二相對第一外側區的各該凸件長度相較位在該晶片區之外之二相對第二外側區的各該凸件長度長;其中位在該晶片區外之各該第二外側區的該些凸件數量相較位在該晶片區外之各該第一外側區的該些凸件數量多。 The stacked semiconductor package structure as claimed in claim 3, wherein the length of each of the protrusions located outside the wafer area relative to the first outer side area is two opposite to the second outside area outside the wafer area The length of each of the protruding members is long; the number of the protruding members of each of the second outer regions located outside the wafer region is larger than the number of the protruding members of each of the first outer regions located outside the wafer region . 如請求項1所述之堆疊式半導體封裝結構,其中:位在該晶片區外之二相對第一外側區的各該凸件係呈塊狀;以及位在該晶片區外之二相對第二外側區的各該凸件係呈塊狀;其中位在各該第一外側區的該凸件長度相較位在各該第二外側區的該凸件長度短。 The stacked semiconductor package structure according to claim 1, wherein: each of the protrusions located outside the wafer area and the first outer area is in a block shape; and the two located outside the wafer area are opposite the second Each convex part of the outer side region is in a block shape; the length of the convex part located in each of the first outer side regions is shorter than the length of the convex part located in each of the second outer side regions. 如請求項5所述之堆疊式半導體封裝結構,其中位在該晶片區之各該第二外側區的該凸件與位在該晶片區之各該第一外側區的該凸件數量相 同。 The stacked semiconductor package structure according to claim 5, wherein the number of the protrusions located in each second outer area of the wafer area and the number of protrusions located in each first outer area of the wafer area with. 如請求項1所述之堆疊式半導體封裝結構,各該凸件係塊狀,分別排列在該晶片區外之二相對第二外側區。 According to the stacked semiconductor package structure of claim 1, each of the protruding members is in a block shape, and is arranged in two opposite outer second regions outside the chip region. 如請求項1至7中任一項所述之堆疊式半導體封裝結構,其中該線路基板進一步包括:一第二表面,其上形成有一保護絕緣層,並於該保護絕緣層外凸出有多個錫球或凸塊;以及複數線路,係形成於該線路基板內,以電性連接該些接點及該些錫球或凸塊。 The stacked semiconductor package structure according to any one of claims 1 to 7, wherein the circuit substrate further includes: a second surface on which a protective insulating layer is formed and protrudes more than the protective insulating layer A plurality of solder balls or bumps; and a plurality of circuits are formed in the circuit substrate to electrically connect the contacts and the solder balls or bumps. 如請求項1至7中任一項所述之堆疊式半導體封裝結構,其中各該凸件材質與該保護絕緣層相同。 The stacked semiconductor package structure according to any one of claims 1 to 7, wherein the material of each protrusion is the same as the protective insulating layer. 如請求項1至7中任一項所述之堆疊式半導體封裝結構,其中各該凸件材質為樹脂。The stacked semiconductor package structure according to any one of claims 1 to 7, wherein the material of each of the protrusions is resin.
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TW201515125A (en) * 2013-10-09 2015-04-16 Powertech Technology Inc Pillar bump structur having non-equal heights to erase solder co-planarity difference
TW201519404A (en) * 2013-11-14 2015-05-16 Taiwan Semiconductor Mfg Co Ltd Three dimensional integrated circuit (3DIC) structure and method of manufacturing the same
TW201633497A (en) * 2014-12-18 2016-09-16 英特爾公司 Low cost package warpage solution
TW201806039A (en) * 2016-08-09 2018-02-16 矽品精密工業股份有限公司 Electronic stack-up structure and the manufacture thereof

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201409588A (en) * 2012-08-31 2014-03-01 Taiwan Semiconductor Mfg Package structure
TW201515125A (en) * 2013-10-09 2015-04-16 Powertech Technology Inc Pillar bump structur having non-equal heights to erase solder co-planarity difference
TW201519404A (en) * 2013-11-14 2015-05-16 Taiwan Semiconductor Mfg Co Ltd Three dimensional integrated circuit (3DIC) structure and method of manufacturing the same
TW201633497A (en) * 2014-12-18 2016-09-16 英特爾公司 Low cost package warpage solution
TW201806039A (en) * 2016-08-09 2018-02-16 矽品精密工業股份有限公司 Electronic stack-up structure and the manufacture thereof

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