TWI685510B - Polyester film - Google Patents

Polyester film Download PDF

Info

Publication number
TWI685510B
TWI685510B TW104137870A TW104137870A TWI685510B TW I685510 B TWI685510 B TW I685510B TW 104137870 A TW104137870 A TW 104137870A TW 104137870 A TW104137870 A TW 104137870A TW I685510 B TWI685510 B TW I685510B
Authority
TW
Taiwan
Prior art keywords
film
layer
polyester
temperature
polyester film
Prior art date
Application number
TW104137870A
Other languages
Chinese (zh)
Other versions
TW201625714A (en
Inventor
鈴木維允
堀江將人
川原慎也
東大路卓司
Original Assignee
日商東麗股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商東麗股份有限公司 filed Critical 日商東麗股份有限公司
Publication of TW201625714A publication Critical patent/TW201625714A/en
Application granted granted Critical
Publication of TWI685510B publication Critical patent/TWI685510B/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/36Layered products comprising a layer of synthetic resin comprising polyesters
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L67/00Compositions of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Compositions of derivatives of such polymers
    • C08L67/02Polyesters derived from dicarboxylic acids and dihydroxy compounds
    • C08L67/03Polyesters derived from dicarboxylic acids and dihydroxy compounds the dicarboxylic acids and dihydroxy compounds having the carboxyl- and the hydroxy groups directly linked to aromatic rings
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2203/00Applications
    • C08L2203/16Applications used for films

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Laminated Bodies (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)

Abstract

本發明係一種聚酯薄膜,其係聚對苯二甲酸乙二酯於構成薄膜之聚酯樹脂中所占之比例為60重量%以上者,且於200℃下進行30分鐘熱處理之情形時之薄膜長度方向及寬度方向之熱收縮率均為0.5%以下。 The present invention is a polyester film whose proportion of polyethylene terephthalate in the polyester resin constituting the film is 60% by weight or more and heat treatment is performed at 200°C for 30 minutes The thermal shrinkage rate of the film in the longitudinal direction and the width direction is 0.5% or less.

本發明提供一種實現耐熱性、尤其是高溫下之低熱收縮率,且加工性優異之薄膜。 The present invention provides a film that achieves heat resistance, especially low thermal shrinkage at high temperatures, and excellent processability.

Description

聚酯薄膜 Polyester film

本發明係關於一種於高溫下熱收縮率亦較低之聚酯薄膜。 The invention relates to a polyester film with a low heat shrinkage rate at high temperature.

聚酯樹脂、尤其是聚對苯二甲酸乙二酯(以下有時簡稱為PET)、或聚2,6-萘二甲酸乙二酯(以下有時簡稱為PEN)等機械特性、熱特性、耐化學品性、電氣特性、成形性優異,而被使用於各種用途。將該聚酯薄膜化而成之聚酯薄膜中之雙軸配向聚酯薄膜,由於其機械性特性、電氣特性等優異,因此用作太陽能電池底層片材、熱水器馬達用電性絕緣材料、或油電混合車等使用之車載空調用馬達或驅動馬達用等之電性絕緣材料、磁性記錄材料、或電容器用材料、包裝材料、建築材料、及照相用途、繪圖用途、感熱轉印用途等之各種工業材料、及軟性顯示器或有機電致發光(EL,Electro Luminescence)等之透明電極基板等光學材料。 Mechanical properties, thermal properties, such as polyester resins, especially polyethylene terephthalate (hereinafter sometimes referred to as PET) or polyethylene 2,6-naphthalene dicarboxylate (hereinafter sometimes referred to as PEN) It is excellent in chemical resistance, electrical characteristics, and formability, and is used in various applications. The biaxially oriented polyester film in the polyester film formed from the polyester film has excellent mechanical properties and electrical properties, so it is used as a solar cell bottom sheet, an electric insulating material for water heater motors, or Electrical insulating materials, magnetic recording materials, or capacitor materials, packaging materials, construction materials, and photographic applications, drawing applications, thermal transfer applications, etc. for automotive air-conditioning motors or drive motors used in hybrid vehicles, etc. Various industrial materials, and optical materials such as flexible displays and transparent electrode substrates such as organic electroluminescence (EL, Electro Luminescence).

該等用途中,於用於光學材料(例如透明導電膜之製膜基板(氧化銦錫(ITO,Indium Tin Oxide)蒸鍍基板等))用途之情形時,為了提高ITO膜之導電性,必須進行固定溫度下之固化步驟,而要求耐熱性、尤其是基板之熱收縮率之降低。因此,已知有將低熱收縮性優異之薄膜用於該用途(專利文獻1、2、3)。 In these applications, when used for optical materials (such as film-forming substrates of transparent conductive films (ITO, Indium Tin Oxide) substrates, etc.), in order to improve the conductivity of the ITO film, it is necessary Carrying out the curing step at a fixed temperature requires heat resistance, especially a reduction in the thermal shrinkage of the substrate. Therefore, it is known to use a film excellent in low heat shrinkability for this purpose (Patent Documents 1, 2, and 3).

[先前技術文獻] [Prior Technical Literature] [專利文獻] [Patent Literature]

專利文獻1:日本專利特開平3-13315號公報 Patent Document 1: Japanese Patent Laid-Open No. 3-13315

專利文獻2:日本專利特開平11-165350號公報 Patent Document 2: Japanese Patent Laid-Open No. 11-165350

專利文獻3:日本專利特開2005-216706號公報 Patent Document 3: Japanese Patent Laid-Open No. 2005-216706

然而,為了較習知進一步提昇ITO膜之導電性來製作高性能之光學裝置,則必須提高固化步驟之溫度。因此,對於用於透明導電膜之製膜基板用途之聚酯薄膜,要求高溫下之薄膜之熱收縮率較習知品進一步降低。為了使聚酯薄膜中之機械特性、耐熱性優異之PET薄膜之熱收縮率降低,對薄膜以較高之溫度進行熱固定處理較為有效。然而,為了降低更高溫度下之熱收縮率,若以高溫實施熱固定處理,則存在有損薄膜之平面性之問題。另一方面,聚酯薄膜中,PEN薄膜與PET薄膜機械特性同樣優異,又,與PET薄膜相比,PEN薄膜之耐熱性更優異。然而,已知PEN薄膜具有如下問題:由於構成薄膜之PEN具有剛性分子結構,因此加工性較差,於加工時薄膜會破裂。 However, in order to further improve the conductivity of the ITO film to make high-performance optical devices, it is necessary to increase the temperature of the curing step. Therefore, for the polyester film used for the film-forming substrate of the transparent conductive film, the thermal shrinkage rate of the film at high temperature is required to be further reduced compared to conventional products. In order to reduce the thermal shrinkage of PET film with excellent mechanical properties and heat resistance in polyester film, it is more effective to heat fix the film at a higher temperature. However, in order to reduce the heat shrinkage rate at a higher temperature, if the heat fixing treatment is performed at a high temperature, there is a problem that the flatness of the film is impaired. On the other hand, among the polyester films, the PEN film and the PET film are equally excellent in mechanical properties, and compared with the PET film, the PEN film has more excellent heat resistance. However, it is known that the PEN film has the following problem: since the PEN constituting the film has a rigid molecular structure, the processability is poor, and the film may break during processing.

本發明之課題在於:鑒於該習知技術之背景,提供一種高溫條件下之熱收縮率較低之聚酯薄膜。又,目的在於提供一種平面性良好且加工性優異之聚酯薄膜。 The object of the present invention is to provide a polyester film with a low heat shrinkage rate under high temperature conditions in view of the background of the conventional technology. In addition, an object is to provide a polyester film having good flatness and excellent processability.

為了解決上述課題,本發明採用以下構成。即: In order to solve the above-mentioned problems, the present invention adopts the following configuration. which is:

[I]一種聚酯薄膜,其係聚對苯二甲酸乙二酯於構成薄膜之聚酯 樹脂中所占之比例為60重量%以上者,且於200℃下進行30分鐘熱處理之情形時之薄膜長度方向、寬度方向之熱收縮率均為0.5%以下。 [I] A polyester film consisting of polyethylene terephthalate in the polyester constituting the film When the proportion in the resin is 60% by weight or more, the heat shrinkage in the longitudinal direction and the width direction of the film when the heat treatment is performed at 200°C for 30 minutes is 0.5% or less.

[II]如[I]之聚酯薄膜,其中,於200℃下進行30分鐘熱處理之情形時之薄膜長度方向之熱收縮率、寬度方向之熱收縮率中,至少任一者之熱收縮率為0.01%以上。 [II] The polyester film according to [I], wherein at least one of the heat shrinkage rate in the longitudinal direction and the width direction heat shrinkage rate when the film is heat-treated at 200°C for 30 minutes 0.01% or more.

[III]如[I]或[II]之聚酯薄膜,其中,於220℃下進行30分鐘熱處理之情形時之薄膜長度方向之熱收縮率、寬度方向之熱收縮率均為0.5%以下,且至少任一者之熱收縮率為0.01%以上。 [III] The polyester film according to [I] or [II], wherein the heat shrinkage rate in the longitudinal direction and the heat shrinkage rate in the width direction of the film when heat-treated at 220°C for 30 minutes are both 0.5% or less, And at least any one has a heat shrinkage rate of 0.01% or more.

[IV]如[I]至[III]中任一項之聚酯薄膜,其中,於藉由非接觸式雷射顯微鏡測定薄膜之凹凸時,薄膜之凹凸差為300μm以下。 [IV] The polyester film according to any one of [I] to [III], wherein, when the unevenness of the film is measured by a non-contact laser microscope, the unevenness of the film is 300 μm or less.

[V]如[I]至[IV]中任一項之聚酯薄膜,其中,面配向係數為0.145以上且0.165以下。 [V] The polyester film according to any one of [I] to [IV], wherein the surface alignment coefficient is 0.145 or more and 0.165 or less.

[VI]如[I]至[V]中任一項之聚酯薄膜,其中,構成薄膜之聚酯樹脂具有熔點(Tmf(℃)),且具有1個以上之微小吸熱波峰溫度(Tmeta(℃))。 [VI] The polyester film according to any one of [I] to [V], wherein the polyester resin constituting the film has a melting point (Tmf (°C)) and has at least one minute endothermic peak temperature (Tmeta( ℃)).

[VII]如[VI]之聚酯薄膜,其中,構成薄膜之聚酯樹脂具有2個以上之微小吸熱波峰(Tmeta(℃)),且最低溫度之Tmeta(Tmeta1)(℃)與最高溫度之Tmeta(Tmeta2)(℃)滿足以下之關係:Tmf-35(℃)≦Tmeta1(℃)<Tmeta2(℃)≦Tmf(℃)。 [VII] The polyester film as described in [VI], wherein the polyester resin constituting the film has two or more tiny endothermic peaks (Tmeta(℃)), and the lowest temperature Tmeta(Tmeta1)(℃) and the highest temperature Tmeta(Tmeta2)(℃) satisfies the following relationship: Tmf-35(℃)≦Tmeta1(℃)<Tmeta2(℃)≦Tmf(℃).

[VIII]如[I]至[VII]中任一項之聚酯薄膜,其中,上述聚酯薄膜為包含至少3層之積層聚酯薄膜,且構成薄膜最表面之層(A層)中所包含之聚酯樹脂之熔點(Tmo(℃))為260℃以上。 [VIII] The polyester film according to any one of [I] to [VII], wherein the polyester film is a laminated polyester film including at least 3 layers, and is formed in a layer (layer A) constituting the outermost surface of the film The melting point (Tmo (°C)) of the included polyester resin is 260°C or higher.

[IX]如[VIII]之聚酯薄膜,其中,上述積層聚酯薄膜包含3層, 且構成表層之層(A層)中所包含之聚酯樹脂之熔點(Tmo(℃))、與構成內層之層(B層)中所包含之聚酯樹脂之熔點(Tmi(℃))的差為5℃以上且10℃以下。 [IX] The polyester film according to [VIII], wherein the laminated polyester film contains 3 layers, And the melting point of the polyester resin contained in the layer constituting the surface layer (layer A) (Tmo (℃)), and the melting point of the polyester resin contained in the layer constituting the inner layer (layer B) (Tmi (℃)) The difference is between 5°C and 10°C.

[X]如[IX]之聚酯薄膜,其中構成表層之層(A層)之厚度之和、與構成內層之層(B層)之厚度之比為1/8以上且1/4以下。 [X] The polyester film as in [IX], wherein the ratio of the sum of the thickness of the layer constituting the surface layer (layer A) and the thickness of the layer constituting the inner layer (layer B) is 1/8 or more and 1/4 or less .

[XI]如[I]至[X]中任一項之聚酯薄膜,其係用於透明導電膜之製膜基板。 [XI] The polyester film according to any one of [I] to [X], which is a film-forming substrate for a transparent conductive film.

根據本發明,可提供一種實現耐熱性、尤其是高溫下之低熱收縮率,且加工性優異之薄膜。 According to the present invention, it is possible to provide a film that achieves heat resistance, particularly low thermal shrinkage at high temperatures, and is excellent in processability.

以下列舉具體例,對本發明進行詳細說明。本發明之聚酯薄膜為聚對苯二甲酸乙二酯於構成薄膜之聚酯樹脂中所占之比例為60重量%以上的聚酯薄膜。 Specific examples are given below to explain the present invention in detail. The polyester film of the present invention is a polyester film in which the proportion of polyethylene terephthalate in the polyester resin constituting the film is 60% by weight or more.

此處所述之聚酯係具有二羧酸構成成分與二醇構成成分而成者。再者,於本說明書內,構成成分表示藉由將聚酯水解而可獲得之最小單位。聚對苯二甲酸乙二酯之比例較佳為70重量%以上,進而較佳為80重量%以上。 The polyester described here has a dicarboxylic acid component and a diol component. In addition, in this specification, a component represents the minimum unit which can be obtained by hydrolyzing polyester. The ratio of polyethylene terephthalate is preferably 70% by weight or more, and more preferably 80% by weight or more.

本發明之聚酯薄膜於200℃下進行30分鐘熱處理後之薄膜長度方向及寬度方向之熱收縮率必須均為0.5%以下。更佳為,對本發明之薄膜於200℃下進行30分鐘處理後之長度方向及寬度方向之熱收縮率為0.3%以下。 After the polyester film of the present invention is heat-treated at 200°C for 30 minutes, the thermal shrinkage rate in the longitudinal direction and the width direction of the film must be 0.5% or less. More preferably, the film of the present invention has a thermal shrinkage ratio of 0.3% or less in the longitudinal direction and the width direction after treatment at 200°C for 30 minutes.

通常,於聚酯薄膜為延伸薄膜之情形時,分子鏈因延伸而處於拉伸狀態(配向之狀態)。因此,於被加熱之情形時,存在分子鏈之拉伸解除,薄膜發生收縮,而平面性惡化之情形。作為抑制該因熱引起之收縮或平面性之惡化之方法,已知有使用如下方法:為了使藉由延伸而形成之聚酯分子鏈之結構(以下稱為薄膜結構)穩定化,而於延伸步驟後設置以既定溫度進行熱處理之步驟(將該熱處理溫度稱為熱固定溫度)。藉由於延伸步驟後實施熱處理步驟,而可獲得一定程度、平面性、機械特性良好之薄膜。然而,即便為此種經過熱處理步驟之薄膜,若以高溫、尤其是200℃以上之溫度對薄膜加熱,則構成薄膜之分子之結構混亂,導致平面性惡化。即,為了使熱收縮率降低,使薄膜平面性良好,而必須使構成薄膜之分子之結構變得牢固,成為於高溫下、尤其是200℃以上亦穩定之結構。 Generally, when the polyester film is a stretched film, the molecular chain is in a stretched state (aligned state) due to stretching. Therefore, when heated, the stretching of the molecular chain is released, the film shrinks, and the flatness deteriorates. As a method for suppressing this shrinkage due to heat or deterioration in flatness, it is known to use the following method: in order to stabilize the structure of the polyester molecular chain formed by stretching (hereinafter referred to as a film structure), the stretching After the step, a step for performing heat treatment at a predetermined temperature is set (this heat treatment temperature is referred to as a heat fixing temperature). By performing the heat treatment step after the extension step, a film with a certain degree of flatness and good mechanical properties can be obtained. However, even for such a thin film subjected to a heat treatment step, if the thin film is heated at a high temperature, especially at a temperature of 200° C. or higher, the structure of the molecules constituting the thin film is disordered, resulting in deterioration of planarity. That is, in order to reduce the thermal shrinkage rate and improve the flatness of the film, it is necessary to make the structure of the molecules constituting the film strong and become a structure that is stable even at high temperatures, especially at 200°C or higher.

因延伸而處於拉伸狀態之分子鏈因熱而收縮之程度不同。因此,即便於薄膜面內熱收縮率亦會產生差異,使薄膜產生皺褶而有損平面性。例如,於將聚酯薄膜用於作為透明導電膜之製膜基板之ITO蒸鍍用基板之情形時,因蒸鍍ITO膜後之步驟(固化步驟等)而對薄膜施加熱負荷。此時,若因聚酯薄膜之熱收縮而損害薄膜之平面性,則ITO膜之導電性降低,因此欠佳。 The molecular chains in a stretched state due to extension contract due to heat to different degrees. Therefore, even in the film surface, the thermal shrinkage rate will be different, causing the film to wrinkle and impair the flatness. For example, in the case where a polyester film is used as a substrate for ITO vapor deposition as a film-forming substrate of a transparent conductive film, a heat load is applied to the thin film due to a step (curing step, etc.) after vapor deposition of the ITO film. At this time, if the flatness of the film is impaired due to the thermal shrinkage of the polyester film, the conductivity of the ITO film decreases, which is not good.

又,通常,固化溫度較高則ITO膜之結晶尺寸變大,ITO膜之導電性提昇,但若該結晶尺寸較大,則將作為基板之薄膜彎折等變形時之追隨性變差,於ITO膜容易產生龜裂。可同時實現ITO膜之變形時追隨性與導電性之固化溫度,為200℃以上且220℃以下。因此,藉由將作為該溫度之200℃、220℃下之薄膜之長度 方向及寬度方向之熱收縮率均設為0.5%以下,而可於無損薄膜之平面性地之情況下使ITO膜於適當溫度下固化,提昇作為透明導電基板之性能,因此較佳。更佳為0.3%以下。 In addition, in general, when the curing temperature is high, the crystal size of the ITO film becomes large, and the conductivity of the ITO film increases. However, if the crystal size is large, the followability during deformation such as the bending of the thin film of the substrate becomes poor. ITO film is prone to cracking. The curing temperature of the followability and conductivity when the ITO film is deformed can be achieved at the same time, which is 200°C or higher and 220°C or lower. Therefore, by taking the length of the film at 200°C and 220°C as the temperature The thermal shrinkage in both the direction and the width direction is set to 0.5% or less, and the ITO film can be cured at an appropriate temperature without impairing the planarity of the film, thereby improving the performance as a transparent conductive substrate, which is preferable. More preferably, it is below 0.3%.

如上所述,自聚酯薄膜之平面性之觀點而言,200℃、220℃下之薄膜之熱收縮率較佳為較小,但於將聚酯薄膜用於ITO蒸鍍用基板之情形時,200℃、220℃下之薄膜之熱收縮率若長度方向、寬度方向之任一者為0.01%以上,則聚酯薄膜因熱發生收縮而不會膨脹,因此可抑制ITO膜產生龜裂,提昇作為透明導電基板之性能,因此較佳。更佳為200℃、220℃下之薄膜之熱收縮率於長度方向、寬度方向之任一者為0.03%以上。 As described above, from the viewpoint of the planarity of the polyester film, the thermal shrinkage of the film at 200°C and 220°C is preferably small, but when the polyester film is used as a substrate for ITO vapor deposition If the thermal shrinkage of the film at 200°C and 220°C is greater than 0.01% in either the longitudinal direction or the width direction, the polyester film shrinks due to heat and does not swell, so cracking of the ITO film can be suppressed. It is better to improve the performance as a transparent conductive substrate. More preferably, the thermal shrinkage of the film at 200°C and 220°C is 0.03% or more in either the longitudinal direction or the width direction.

為了將本發明之聚酯薄膜之熱收縮率設為上述範圍,可列舉於既定之條件下實施聚酯薄膜之製膜之方法(方法A)、將構成薄膜之聚酯樹脂設為既定構成之方法(方法B)、及組合(方法A)、(方法B)之方法。 In order to set the heat shrinkage ratio of the polyester film of the present invention to the above range, a method of forming a polyester film under predetermined conditions (method A), and setting the polyester resin constituting the film to a predetermined structure can be cited Method (Method B), and methods combining (Method A) and (Method B).

首先,對(方法A)進行說明。本發明之聚酯薄膜可藉由如下方法(方法A)而較佳地獲得:以下述方法製作聚對苯二甲酸乙二酯於構成薄膜之聚酯樹脂中所占之比例為60重量%以上的聚酯薄膜,進而以下述方法進行退火。 First, (Method A) will be described. The polyester film of the present invention can be preferably obtained by the following method (Method A): The proportion of polyethylene terephthalate produced in the polyester resin constituting the film by the following method is 60% by weight or more The polyester film is further annealed in the following method.

首先,對製作薄膜之方法進行說明。 First, the method of making a film will be described.

將包含聚對苯二甲酸乙二酯60重量%以上之聚酯於擠出機內加熱熔融後,自噴嘴噴出而獲得未延伸片材,然後,實施雙軸延伸,獲得雙軸配向聚酯薄膜,於該方法中,藉由滿足以下條件,可使200℃下之熱收縮率變小。 After heating and melting polyester containing 60% by weight or more of polyethylene terephthalate in an extruder, it is ejected from a nozzle to obtain an unstretched sheet, and then, biaxial stretching is performed to obtain a biaxially oriented polyester film In this method, the thermal shrinkage rate at 200°C can be reduced by satisfying the following conditions.

(1)於自噴嘴噴出熔融之聚酯而製作未延伸片材時,在冷卻至表 面溫度10℃以上且40℃以下之轉鼓上藉由靜電而密接冷卻固化,製作未延伸片材。 (1) When the molten polyester is ejected from the nozzle to produce an unstretched sheet, after cooling to the surface A drum having a surface temperature of 10°C or higher and 40°C or lower is closely cooled and solidified by static electricity to produce an unstretched sheet.

(2)於滿足下述(i)式之溫度T1n(℃)下,使(1)所得之未延伸片材沿薄膜之長度方向(MD)與薄膜之寬度方向(TD)以面積倍率10.0倍以上且16.0倍以下之程度進行雙軸延伸。 (2) At a temperature T1n (°C) that satisfies the following formula (i), the unstretched sheet obtained in (1) is 10.0 times the area ratio along the length direction (MD) of the film and the width direction (TD) of the film The biaxial extension is performed to the extent of 16.0 times or more.

(i)Tg(℃)≦T1n(℃)≦Tg+40(℃) (i)Tg(℃)≦T1n(℃)≦Tg+40(℃)

Tg:構成聚酯薄膜之聚酯樹脂之玻璃轉移溫度(℃) Tg: glass transition temperature of polyester resin constituting polyester film (℃)

(3)以滿足下述(ii)式之溫度(Th0(℃)),對於(2)所得之雙軸延伸薄膜進行1秒以上且30秒以下之熱固定處理,均勻地緩冷後,冷卻至室溫,藉此獲得聚酯薄膜。 (3) The temperature (Th0 (°C)) that satisfies the following formula (ii) is performed, and the biaxially stretched film obtained in (2) is subjected to heat fixing treatment for 1 second or more and 30 seconds or less, uniformly slowly cooled, and then cooled To room temperature, thereby obtaining a polyester film.

(ii)Tmf-35(℃)≦Th0(℃)≦Tmf(℃) (ii) Tmf-35(℃)≦Th0(℃)≦Tmf(℃)

Tmf:構成聚酯薄膜之聚酯樹脂之熔點(℃) Tmf: Melting point of polyester resin constituting polyester film (℃)

藉由以滿足(1)之條件獲得未延伸片材而可獲得實質上非晶之聚酯薄膜,於(2)以後之步驟中,可容易對薄膜賦予配向,使熱收縮率變小,而可容易獲得機械特性良好之薄膜。藉由以滿足(2)之條件獲得雙軸延伸薄膜,可對薄膜賦予適度之配向,從而可製成機械特性良好之薄膜。藉由以滿足(3)之條件完成結晶配向,可使已形成配向之聚酯分子鏈之結構穩定,降低熱收縮率,從而製成平面性良好之薄膜。 By obtaining an unstretched sheet material that satisfies the conditions of (1), a substantially amorphous polyester film can be obtained. In the subsequent steps of (2), the film can be easily oriented to reduce the heat shrinkage, and Films with good mechanical properties can be easily obtained. By obtaining a biaxially stretched film that satisfies the condition of (2), the film can be moderately oriented, and a film with good mechanical properties can be made. By fulfilling the conditions of (3) to complete the crystal alignment, the structure of the aligned polyester molecular chain can be stabilized, the thermal shrinkage rate can be reduced, and the film with good planarity can be made.

再者,於(2)中,作為進行雙軸延伸之方法,使用如下任一方法均可:分別進行薄膜之長度方向(MD,Machine Direction)與薄膜之寬度方向(與薄膜之長度方向垂直之方向,TD(Transverse Direction,橫向))之延伸的逐次雙軸延伸方法、或同時進行長度方向與寬度方向之延伸的同時雙軸延伸方法。又,於延伸溫度(T1n)(℃) 未滿Tg(℃)之情形時,難以進行延伸。於T1n(℃)超過Tg+40(℃)之情形時,存在頻繁發生薄膜破裂,而無法藉由延伸獲得薄膜的情形。更佳為Tg+10(℃)≦T1n(℃)≦Tg+30(℃)。 In addition, in (2), as a method of performing biaxial stretching, any of the following methods may be used: separately performing the longitudinal direction of the film (MD, Machine Direction) and the width direction of the film (which is perpendicular to the longitudinal direction of the film) Direction, TD (Transverse Direction, horizontal) successive biaxial extension method, or simultaneous biaxial extension method in which the longitudinal direction and the width direction are simultaneously extended. Also, at the extension temperature (T1n) (℃) In the case of less than Tg (°C), it is difficult to extend. In the case where T1n(°C) exceeds Tg+40(°C), there are cases where the film breaks frequently and the film cannot be obtained by stretching. More preferably, Tg+10(°C)≦T1n(°C)≦Tg+30(°C).

關於(3)之步驟,自平面性之觀點而言,較佳為以握持薄膜之兩端之狀態進行的方法。又,自使熱收縮率降低之觀點而言,沿薄膜寬度方向一面相對於薄膜寬度收縮1~10%一面進行熱固定的方法亦較佳。 Regarding the step (3), from the viewpoint of flatness, it is preferable to perform the method while holding both ends of the film. In addition, from the viewpoint of reducing the thermal shrinkage rate, a method of thermally fixing one side of the film width direction relative to the film width by 1 to 10% shrinkage is also preferable.

於(3)中,薄膜所產生之熱收縮係如上所述般於與形成薄膜結構之溫度接近之溫度下產生,因此為了抑制超過200℃之高溫下之薄膜之熱收縮率,重要的是使熱固定溫度(Th0(℃))變高。另一方面,於以熱固定溫度(Th0(℃))超過Tmf(℃)之溫度進行熱處理之情形時,薄膜熔化而無法進行製膜。又,若以過於接近Tmf(℃)之溫度進行熱處理,則存在平面性惡化之情形。因此,更佳為Tmf-25(℃)≦Th0(℃)≦Tmf-10(℃)。若實施該熱固定處理,則構成薄膜之聚酯樹脂具有反映出該熱固定溫度之微小吸熱波峰(Tmeta(℃))。因此,構成本發明之聚酯薄膜之聚酯樹脂較佳為具有微小吸熱波峰。而且,該微小吸熱波峰較佳為Tmf-35(℃)以上且Tmf(℃)以下,進而較佳為Tmf-25(℃)以上且Tmf-10(℃)以下。 In (3), the heat shrinkage generated by the film is generated at a temperature close to the temperature at which the film structure is formed as described above. Therefore, in order to suppress the heat shrinkage rate of the film at a high temperature exceeding 200°C, it is important to make The heat fixing temperature (Th0 (°C)) becomes higher. On the other hand, when heat treatment is performed at a temperature where the heat-fixing temperature (Th0 (°C)) exceeds Tmf (°C), the thin film is melted and the film cannot be formed. In addition, if the heat treatment is performed at a temperature too close to Tmf (°C), the planarity may deteriorate. Therefore, it is more preferable that Tmf-25(°C)≦Th0(°C)≦Tmf-10(°C). When this heat fixing process is performed, the polyester resin constituting the film has a small endothermic peak (Tmeta (°C)) reflecting the heat fixing temperature. Therefore, the polyester resin constituting the polyester film of the present invention preferably has a minute endothermic peak. Moreover, the minute endothermic peak is preferably Tmf-35 (°C) or more and Tmf (°C) or less, and more preferably Tmf-25 (°C) or more and Tmf-10 (°C) or less.

又,為了降低更高溫度下之熱收縮率,要使薄膜內之已形成配向之聚酯分子鏈之結構變得更牢固,因此較佳為藉由以下(4)之方法實施退火處理。 In addition, in order to reduce the heat shrinkage rate at a higher temperature, the structure of the aligned polyester molecular chain in the film becomes stronger, so it is preferable to perform annealing treatment by the following method (4).

(4)於滿足下述(iii)式之熱處理溫度Th1(℃)下,對於(3)所得之薄膜以70秒以上且600秒以下之時間進行退火。作為進行該退火處理之方法,可列舉以設置於薄膜捲出輥與薄膜捲取輥之 間之烘箱對薄膜進行熱處理(再退火(off-annealing))的方法。 (4) At the heat treatment temperature Th1 (°C) satisfying the following formula (iii), the thin film obtained in (3) is annealed for 70 seconds or more and 600 seconds or less. As a method of performing this annealing treatment, there may be mentioned the ones provided on the film take-up roll and the film take-up roll The method of heat treatment (off-annealing) of the film in the oven in between.

(iii)Tmf-35(℃)≦Th1(℃)≦Th0(熱固定溫度)(℃) (iii) Tmf-35(℃)≦Th1(℃)≦Th0(heat fixing temperature)(℃)

對於以滿足(3)之條件熱固定之薄膜,進而以滿足(4)之條件進行退火,藉此可使薄膜內之已形成配向之聚酯分子鏈之結構變得更牢固,從而可大幅降低如超過200℃之高溫下之熱收縮率。 For the film that is thermally fixed to meet the condition of (3), and then anneal to meet the condition of (4), the structure of the aligned polyester molecular chain in the film can be made stronger, which can be greatly reduced For example, the heat shrinkage rate at high temperature exceeding 200℃.

於Th1(℃)超過Th0(熱固定溫度)(℃)之情形時,於(4)之步驟中,經(3)之步驟固定化的薄膜內之分子鏈之結構會被破壞,結果存在薄膜大幅收縮,而平面性惡化的情形。另一方面,於Th1(℃)低於Tmf-35(℃)之情形時,存在無法降低高溫下之熱收縮率的情形。於Th1(℃)低於Th0(熱固定溫度)(℃)之情形時,尤其係Th1(℃)充分小於Th0(熱固定溫度)(℃)之情形時,觀察到微小吸熱波峰(Tmeta)係反映藉由(3)之步驟中之熱固定處理而形成之薄膜結構者、及反映藉由(4)之步驟中之退火處理而形成之薄膜結構者。於該情形時,由(3)之熱固定之步驟所形成的薄膜之結構於(4)之退火處理步驟中不會被破壞,因此可使薄膜內之已形成配向之聚酯分子鏈之結構變得更加牢固。於該情形時,可使如超過200℃之高溫下之熱收縮率大幅降低,從而使薄膜之平面性變得良好。因此,構成本發明之聚酯薄膜之聚酯樹脂較佳為具有2個以上之Tmeta(℃)。而且,於Tmeta(℃)存在2個以上之情形時,低溫度之Tmeta(Tmeta1)(℃)、與高溫度之Tmeta(Tmeta2)(℃)滿足Tmf-35(℃)≦Tmeta1(℃)<Tmeta2(℃)≦Tmf(℃),於該情形時,可獲得平面性良好之薄膜,因此較佳。(3)之熱固定處理步驟、及(4)之退火處理步驟可進行複數次。經過複數次(3)之熱固定處理步驟、及(4)之退火處理步驟之薄膜存在具有3個以上Tmeta(℃)之情形。於具有3 個以上Tmeta(℃)之情形時,將最低溫度之Tmeta(℃)設為Tmeta1(℃),將最高溫度之Tmeta(℃)設為Tmeta2(℃),且較佳為滿足Tmf-35(℃)≦Tmeta1(℃)<Tmeta2(℃)≦Tmf(℃)之關係。 When Th1 (℃) exceeds Th0 (thermal fixation temperature) (℃), in the step (4), the molecular chain structure in the film fixed by the step (3) will be destroyed, resulting in the presence of the film The situation of sharp contraction and worsening flatness. On the other hand, when Th1 (°C) is lower than Tmf-35 (°C), there is a case where the heat shrinkage rate at high temperature cannot be reduced. When Th1 (℃) is lower than Th0 (thermal fixation temperature) (℃), especially when Th1 (℃) is sufficiently smaller than Th0 (thermal fixation temperature) (℃), a small endothermic peak (Tmeta) system is observed Those reflecting the thin film structure formed by the heat fixing process in the step (3), and those reflecting the thin film structure formed by the annealing process in the step (4). In this case, the structure of the film formed by the heat fixing step of (3) will not be destroyed during the annealing process of (4), so that the structure of the aligned polyester molecular chain in the film can be formed Become stronger. In this case, the heat shrinkage rate at a high temperature exceeding 200°C can be greatly reduced, and the flatness of the film becomes good. Therefore, the polyester resin constituting the polyester film of the present invention preferably has two or more Tmeta (°C). Moreover, when there are two or more Tmeta(℃), the low temperature Tmeta(Tmeta1)(℃) and the high temperature Tmeta(Tmeta2)(℃) satisfy Tmf-35(℃)≦Tmeta1(℃)< Tmeta2(°C)≦Tmf(°C). In this case, a thin film with good planarity can be obtained, which is preferable. The heat fixing process of (3) and the annealing process of (4) can be performed multiple times. The film that has undergone the heat-fixing process of (3) multiple times and the annealing process of (4) may have more than 3 Tmeta (°C). Yu has 3 In the case of more than one Tmeta (℃), the lowest temperature Tmeta (℃) is set to Tmeta1 (℃), the highest temperature Tmeta (℃) is set to Tmeta2 (℃), and preferably meets Tmf-35 (℃ )≦Tmeta1(℃)<Tmeta2(℃)≦Tmf(℃).

其次,對(方法B)進行說明。本發明之聚酯薄膜可藉由如下方法(方法B)而較佳獲得:製成包含至少3層之積層薄膜,且將構成薄膜之最表面所包含之層(A層)的樹脂之熔點(Tmo)設為260℃以上。藉由將薄膜之構成設為上述構成,可降低薄膜之熱收縮率,使平面性良好,因此較佳。本發明之聚酯薄膜之主成分即聚對苯二甲酸乙二酯之熔點為約255℃。即,構成A層之聚酯包含聚對苯二甲酸乙二酯以外之高熔點成分。藉由具有包含具有高熔點之樹脂之表層(A層),而於如僅包含構成內層(B層)之樹脂之薄膜所無法實施的較高溫度下,亦可進行熱固定處理或退火處理。其原因在於:藉由存在包含具有高熔點之樹脂之表層(A層),即便以較高溫度進行熱固定處理或退火處理,亦可防止內層(B層)熔融。於此種較高溫度下成功實施熱固定處理或退火處理之結果,可大幅降低如超過200℃之高溫下之熱收縮率。 Next, (Method B) will be described. The polyester film of the present invention can be preferably obtained by the following method (method B): a laminated film comprising at least 3 layers, and the melting point of the resin constituting the layer (layer A) included in the outermost surface of the film ( Tmo) is set to 260°C or higher. By setting the structure of the film as described above, the thermal shrinkage of the film can be reduced and the flatness can be improved, which is preferable. The main component of the polyester film of the present invention, polyethylene terephthalate, has a melting point of about 255°C. That is, the polyester constituting the layer A contains a high melting point component other than polyethylene terephthalate. By having a surface layer (layer A) containing a resin with a high melting point, it can also be heat-fixed or annealed at higher temperatures that cannot be implemented with a thin film containing only the resin constituting the inner layer (layer B) . The reason for this is that the presence of a surface layer (layer A) containing a resin having a high melting point prevents the inner layer (layer B) from melting even if heat fixing treatment or annealing treatment is performed at a relatively high temperature. The results of successful heat fixing treatment or annealing treatment at such higher temperatures can greatly reduce the heat shrinkage rate at high temperatures such as over 200°C.

更佳為構成薄膜之最表面所包含之層(A層)之樹脂之熔點(Tmo)為262℃以上。又,自加工性、機械特性之觀點而言,較佳為不構成表層之內層(B層)為聚對苯二甲酸乙二酯。構成本發明之聚酯薄膜之聚酯樹脂之熔點Tmf(℃),反映了含有60重量%以上之主成分即聚對苯二甲酸乙二酯之熔點。 More preferably, the melting point (Tmo) of the resin constituting the layer (layer A) included on the outermost surface of the film is 262°C or higher. In addition, from the viewpoint of workability and mechanical properties, it is preferable that the inner layer (layer B) that does not constitute the surface layer is polyethylene terephthalate. The melting point Tmf (°C) of the polyester resin constituting the polyester film of the present invention reflects the melting point of polyethylene terephthalate containing 60% by weight or more of the main component.

作為用於A層之樹脂,可列舉聚萘二甲酸乙二酯(以下有時稱為PEN)、聚對苯二甲酸環己二甲酯(以下有時稱為PCHT)、聚苯硫醚(以下有時稱為PPS)、或該等之混合物。又,為 了提昇A層與B層之密接性,於無損本案發明之效果之範圍內,於構成A層之樹脂中少量添加構成B層之樹脂亦為較佳之實施形態。於構成A層之樹脂中添加構成B層之樹脂之量相對於構成A層之樹脂總量較佳為0.01重量%以上、未滿15重量%,進而較佳為0.1重量%以上且5重量%以下。 Examples of the resin used in the layer A include polyethylene naphthalate (hereinafter sometimes referred to as PEN), polycyclohexane terephthalate (hereinafter sometimes referred to as PCHT), and polyphenylene sulfide ( Hereinafter referred to as PPS), or a mixture of these. Also, for In order to improve the adhesion between the A layer and the B layer, within the range that does not impair the effect of the invention of the present invention, it is also a preferred embodiment to add a small amount of the resin constituting the B layer to the resin constituting the A layer. The amount of the resin constituting the layer B added to the resin constituting the layer A is preferably 0.01% by weight or more and less than 15% by weight relative to the total amount of the resin constituting the layer A, and more preferably 0.1% by weight or more and 5% by weight. the following.

又,較佳為構成表層(A層)之樹脂之熔點(Tmo(℃))、與構成內層(B層)之聚酯樹脂之熔點(Tmi(℃))之差(Tmo-Tmi(C))為5℃以上且15℃以下。若該溫度差超過15℃,則存在於熔融擠出時積層性變差之情形。另一方面,若未滿5℃,則存在難以對A層施加較強之配向之情形。更佳為5℃以上且10℃以下。 Furthermore, it is preferable that the difference between the melting point (Tmo (°C)) of the resin constituting the surface layer (layer A) and the melting point (Tmi (°C)) of the polyester resin constituting the inner layer (layer B) (Tmo-Tmi(C )) is 5°C or higher and 15°C or lower. If the temperature difference exceeds 15°C, the lamination property may be deteriorated during melt extrusion. On the other hand, if it is less than 5°C, it may be difficult to apply a strong alignment to the layer A. More preferably, it is 5°C or higher and 10°C or lower.

構成表層之層(A層)之厚度之和、與構成內層之層(B層)之厚度之比(A層之厚度之和/B層之厚度)較佳為1/16~1/2。於小於1/16之情形時,表層(A層)之厚度變薄,而存在保護B層之作用不充分,平面性、耐熱性變差之情形。於超過1/2之情形時,存在延伸性變差之情形。構成表層之層(A層)之厚度之和、與構成內層之層(B層)之厚度之比(A層之厚度之和/B層之厚度)更佳為1/8~1/4。藉由設為該範圍,可製成平面性、耐熱性、延伸性優異之薄膜。又,A層之單側之厚度較佳為5μm以上且30μm以下。即便於滿足上述積層比之情形時,於A層之單側之厚度未滿5μm之情形時,亦存在平面性變差之情形,於超過30μm之情形時,亦存在延伸性、加工性變差之情形。 The ratio of the sum of the thickness of the layer constituting the surface layer (layer A) and the thickness of the layer constituting the inner layer (layer B) (sum of the thickness of the layer A/thickness of the layer B) is preferably 1/16 to 1/2 . In the case of less than 1/16, the thickness of the surface layer (layer A) becomes thin, and the effect of protecting the layer B is insufficient, and the flatness and heat resistance may deteriorate. When it exceeds 1/2, the extensibility may deteriorate. The ratio of the thickness of the layer constituting the surface layer (layer A) to the thickness of the layer constituting the inner layer (layer B) (the sum of the thickness of the layer A/the thickness of the layer B) is more preferably 1/8 to 1/4 . By setting to this range, a film excellent in flatness, heat resistance, and extensibility can be produced. In addition, the thickness of one side of the layer A is preferably 5 μm or more and 30 μm or less. That is, when it is convenient to satisfy the above-mentioned stacking ratio, when the thickness of one side of the A layer is less than 5 μm, there is also a case where the flatness is deteriorated, and when it exceeds 30 μm, there is also a deterioration in the extensibility and workability. Situation.

於將本發明之聚酯薄膜設為包含至少3層之積層薄膜之情形時,可較佳地使用如下之方法:對構成積層薄膜之每層使用擠出機,使各層之原料熔融,藉由設置於擠出裝置與噴嘴之間之 合流裝置使該等以熔融狀態積層後,導引至噴嘴,自噴嘴擠出至流延鼓上而加工為片狀。該片材係於冷卻至表面溫度10℃以上且40℃以下之轉鼓上藉由靜電而密接冷卻固化,從而製作未延伸片材。將該未延伸片材藉由上述(2)~(4)之方法製膜,而獲得聚酯薄膜。 When the polyester film of the present invention is a laminate film including at least 3 layers, the following method may be preferably used: the extruder is used for each layer constituting the laminate film, and the raw materials of each layer are melted by Between the extrusion device and the nozzle After the merging device laminates these in a molten state, it is guided to the nozzle, and is extruded from the nozzle onto the casting drum to be processed into a sheet shape. The sheet is closely cooled and solidified by static electricity on a drum cooled to a surface temperature of 10°C or higher and 40°C or lower to produce an unextended sheet. The unstretched sheet was formed into a film by the methods (2) to (4) above to obtain a polyester film.

於本構成之積層薄膜中,由於構成表層之樹脂之熔點(Tmo(℃))高於構成薄膜之內層之樹脂之熔點(Tmi(℃)),因此於藉由熱固定步驟及退火步驟對薄膜加熱之情形時,藉由表層保護內層之樹脂之效果,而與單層PET薄膜相比,薄膜之結構不易被破壞。其結果為,薄膜之平面性變得更加良好。 In the laminated film of this configuration, since the melting point (Tmo (°C)) of the resin constituting the surface layer is higher than the melting point (Tmi (°C)) of the resin constituting the inner layer of the film, the heat fixation step and the annealing step When the film is heated, the effect of protecting the resin of the inner layer by the surface layer, compared with the single-layer PET film, the structure of the film is not easy to be destroyed. As a result, the flatness of the film becomes better.

又,於本構成之積層薄膜中,以下實施形態亦較佳:於如滿足(iv)式之熱固定溫度(Th0(℃))下,進行1秒以上且30秒以下之熱處理,均勻地緩冷後,冷卻至室溫,藉此獲得聚酯薄膜,然後,於滿足下述(v)式之退火處理溫度Th1(℃)下,以70秒以上且600秒以下之時間進行退火。 In addition, in the laminated film of this configuration, the following embodiment is also preferable: at a heat-fixing temperature (Th0 (°C)) that satisfies formula (iv), heat treatment is performed for 1 second or more and 30 seconds or less to evenly relax After cooling, it is cooled to room temperature to obtain a polyester film, and then annealed at a temperature of Th1 (°C) that satisfies the following formula (v) for 70 seconds to 600 seconds.

(iv)Tmf-10(℃)≦Th0(熱固定溫度)(℃)≦Tmf(℃) (iv) Tmf-10(℃)≦Th0(heat fixing temperature)(℃)≦Tmf(℃)

(v)Tmf-35(℃)≦Th1(℃)≦Th0(熱固定溫度)(℃) (v) Tmf-35(℃)≦Th1(℃)≦Th0(heat fix temperature)(℃)

於本構成之積層薄膜中,構成表層之樹脂之熔點(Tmo(℃))高於構成薄膜之聚酯樹脂之熔點Tmf(℃)。即,如上所述般表層可保護內層之樹脂,因此可使熱固定溫度變高,從而可以在接近Tmf(℃)之溫度進行熱固定而不會使薄膜熔化。於滿足(iv)式之情形時,熱固定溫度接近Tmf(℃),因此反映熱固定溫度之Tmeta(℃)與熔點波峰重疊,而無法觀察到。另一方面,由於雙軸延伸後可以更高溫度形成薄膜結構,因此可使(4)之退火步驟之溫度高溫化而不會破壞薄膜結構。其結果為,可成為於高溫下亦穩定之薄膜結構,從而可降 低高溫下之熱收縮率。 In the laminated film of this constitution, the melting point (Tmo (°C)) of the resin constituting the surface layer is higher than the melting point Tmf (°C) of the polyester resin constituting the film. That is, the surface layer protects the resin of the inner layer as described above, so that the heat fixing temperature can be increased, so that the heat fixing can be performed at a temperature close to Tmf (°C) without melting the film. When the equation (iv) is satisfied, the heat fixing temperature is close to Tmf (°C), so Tmeta (°C) reflecting the heat fixing temperature overlaps with the melting peak and cannot be observed. On the other hand, since the film structure can be formed at a higher temperature after biaxial stretching, the temperature of the annealing step of (4) can be increased without damaging the film structure. As a result, it can be a thin film structure that is stable even at high temperature Heat shrinkage at low temperature.

以上述方式獲得之本發明之薄膜於高溫下之熱收縮率較低,又,平面性亦優異。 The film of the present invention obtained in the above-described manner has a low heat shrinkage rate at high temperatures, and is excellent in flatness.

本發明之薄膜較佳為於藉由下述方法以非接觸式雷射顯微鏡測定薄膜之凹凸時,薄膜之凹凸差為300μm以下。若凹凸差為0μm,則實質上成為平面,因此下限值為0μm以上。 When the film of the present invention is measured by a non-contact laser microscope by the following method, the unevenness of the film is preferably 300 μm or less. If the difference in concavity and convexity is 0 μm, it becomes substantially flat, so the lower limit is 0 μm or more.

於薄膜表面之凹凸差超過300μm之情形時,存在因薄膜加工性之惡化或ITO蒸鍍後之導電性變差而欠佳之情形。凹凸差越小,則ITO蒸鍍後之導電性越提昇。為了將薄膜表面之凹凸差設為上述範圍,可列舉於薄膜之雙軸延伸後設置熱固定步驟、進而於熱固定步驟後設置以熱固定溫度以下之溫度進行退火之步驟等方法。更佳為150μm以下,尤佳為80μm以下。 When the unevenness of the film surface exceeds 300 μm, there is a case where the processability of the film deteriorates or the conductivity after ITO deposition deteriorates, which may be unsatisfactory. The smaller the unevenness, the higher the conductivity after ITO deposition. In order to set the unevenness of the surface of the film to the above range, a method of providing a heat fixing step after the biaxial stretching of the film, and a step of annealing at a temperature below the heat fixing temperature after the heat fixing step can be cited. It is more preferably 150 μm or less, and particularly preferably 80 μm or less.

又,本發明之聚酯薄膜較佳為面配向係數為0.145以上且0.165以下。面配向係數係藉由下述方法,根據薄膜之折射率而求出。包含PET、PEN等之雙軸延伸薄膜之面配向係數,通常因分子鏈中所含之苯環平行於薄膜平面地排列,故而變大。苯環由於在分子鏈中較為剛直,因此於面配向係數超過0.165之情形時,苯環較多且平行於薄膜平面地排列,因此存在於將薄膜彎曲或斷裁等加工時,薄膜容易破裂之情形。於面配向係數低於0.145之情形時,未藉由雙軸延伸賦予配向,因此存在機械強度變差之情形。 In addition, the polyester film of the present invention preferably has a surface alignment coefficient of 0.145 or more and 0.165 or less. The plane alignment coefficient is obtained from the refractive index of the film by the following method. The surface alignment coefficient of a biaxially stretched film including PET, PEN, etc., usually becomes larger because the benzene rings contained in the molecular chain are arranged parallel to the plane of the film. The benzene ring is relatively rigid in the molecular chain, so when the surface alignment coefficient exceeds 0.165, there are many benzene rings and are arranged parallel to the film plane. Therefore, the film is likely to break when the film is bent or cut. situation. In the case where the surface alignment coefficient is less than 0.145, the alignment is not given by biaxial extension, so the mechanical strength may be deteriorated.

又,關於本發明之聚酯薄膜,若構成薄膜之聚酯樹脂含有磷酸與磷酸鹼金屬鹽,則耐濕熱性優異,因此較佳。作為使聚酯樹脂含有磷酸與磷酸鹼金屬鹽之方法,可列舉於聚酯樹脂之聚合時添加磷酸與磷酸鹼金屬鹽。於本發明之聚酯薄膜為具有A層、B 層之積層薄膜之情形時,僅使A層含有磷酸與磷酸鹼金屬鹽之樣態、及使A層、B層均含有磷酸與磷酸鹼金屬鹽之樣態耐濕熱性優異,因此較佳。於本發明之聚酯薄膜之耐濕熱性良好之情形時,可較佳用作於更惡劣之環境下使用之顯示器、例如汽車導航系統之顯示器所使用的ITO蒸鍍基板。 In addition, regarding the polyester film of the present invention, if the polyester resin constituting the film contains phosphoric acid and an alkali metal salt of phosphoric acid, it is excellent in moisture resistance and heat resistance, which is preferable. As a method of making the polyester resin contain phosphoric acid and alkali metal phosphate, phosphoric acid and alkali metal phosphate are added during the polymerization of the polyester resin. The polyester film of the present invention has A layer and B In the case of a laminated film of a layer, it is preferable that only layer A contains phosphoric acid and alkali metal phosphate, and that layer A and layer B both contain phosphoric acid and alkali metal phosphate. When the polyester film of the present invention has good moisture and heat resistance, it can be preferably used as an ITO vapor-deposited substrate for displays used in more severe environments, such as displays for car navigation systems.

藉由本發明所得之薄膜其加工性、平面性優異、高溫下之熱收縮率較小,因此可較佳用作ITO等透明電極蒸鍍基板用途。 The film obtained by the present invention has excellent processability, flatness, and a low heat shrinkage rate at high temperature, and therefore can be preferably used as a transparent electrode vapor deposition substrate for ITO or the like.

[特性之評價方法] [Characteristic evaluation method] A.構成各層之樹脂之熔點(Tmo、Tmi)(℃) A. Melting point (Tmo, Tmi) of resin constituting each layer (℃)

對於試樣,藉由基於JIS K 7121(1999)之方法,使用Seiko電子工業(股)製造之示差掃描熱量測定裝置“Robot DSC-RDC220”,數據解析使用DISC Session“SSC/5200”,按照下述要領實施測定。逐次稱量5mg試樣並置於樣品盤中,將試樣以20℃/分鐘之升溫速度自25℃加熱至320℃(1stRUN(第一操作))。獲得1stRUN之示差掃描熱量測定圖表(將縱軸設為熱能、橫軸設為溫度)。求出該1stRUN之示差掃描熱量測定圖表之位於吸熱波峰即結晶熔解波峰處的峰頂之溫度,將其設為熔點(℃)。於觀測到2個以上之結晶熔解波峰之情形時,將波峰面積最大之峰頂之溫度設為熔點。 For the sample, the differential scanning calorimeter "Robot DSC-RDC220" manufactured by Seiko Electronics Co., Ltd. was used by a method based on JIS K 7121 (1999), and the data analysis used DISC Session "SSC/5200", as follows The outline describes the measurement. The 5 mg samples were weighed successively and placed in the sample pan, and the samples were heated from 25°C to 320°C at a temperature increase rate of 20°C/min (1stRUN (first operation)). A differential scanning calorie measurement chart of 1stRUN is obtained (the vertical axis is thermal energy and the horizontal axis is temperature). The temperature of the peak at the end of the crystal melting peak at the endothermic peak, that is, the crystal melting peak of the 1stRUN differential scanning calorimetry chart, was determined as the melting point (°C). When two or more crystal melting peaks are observed, the temperature of the peak top with the largest peak area is set as the melting point.

試樣係使用切片機自積層聚酯薄膜僅削出構成各層之樹脂而供於測定。 In the sample, only the resin constituting each layer was cut out from the laminated polyester film using a microtome for measurement.

B.構成聚酯薄膜之聚酯樹脂之熔點(Tmf)(℃) B. Melting point (Tmf) of polyester resin constituting polyester film (℃)

對於試樣,藉由基於JIS K 7121(1999)之方法,使用Seiko電子工業(股)製造之示差掃描熱量測定裝置“Robot DSC-RDC220”,數據解析使用DISC Session“SSC/5200”,按照下述要領實施測定。逐次稱量5mg試樣並置於樣品盤中,將試樣以20℃/分鐘之升溫速度自25℃加熱至320℃(1stRUN)。獲得1stRUN之示差掃描熱量測定圖表(將縱軸設為熱能、橫軸設為溫度)。求出該1stRUN之示差掃描熱量測定圖表之位於吸熱波峰即結晶熔解波峰處之峰頂之溫度,將其設為熔點(℃)。於觀測到2個以上之結晶熔解波峰之情形時,將波峰面積最大之峰頂之溫度設為熔點。 For the sample, the differential scanning calorimeter "Robot DSC-RDC220" manufactured by Seiko Electronics Co., Ltd. was used by a method based on JIS K 7121 (1999), and the data analysis used DISC Session "SSC/5200", as follows The outline describes the measurement. The 5 mg samples were weighed successively and placed in the sample pan, and the samples were heated from 25°C to 320°C (1stRUN) at a temperature increase rate of 20°C/min. A differential scanning calorie measurement chart of 1stRUN is obtained (the vertical axis is thermal energy and the horizontal axis is temperature). The temperature at the peak top of the crystal melting peak at the endothermic peak, which is the endothermic peak, of the 1stRUN differential scanning calorimetry chart is obtained and set as the melting point (°C). When two or more crystal melting peaks are observed, the temperature of the peak top with the largest peak area is set as the melting point.

C.構成聚酯薄膜之聚酯樹脂之微小吸熱波峰(Tmeta1、Tmeta2)(℃) C. Tiny endothermic peak (Tmeta1, Tmeta2) of polyester resin constituting polyester film (℃)

微小吸熱波峰溫度Tmeta(℃)係依照JIS K 7122(1999),使用Seiko電子工業(股)製造之示差掃描熱量測定裝置“Robot DSC-RDC220”,數據解析使用DISC Session“SSC/5200”進行測定。稱量5mg試樣並置於樣品盤中,將試樣以20℃/分鐘之升溫速度自25℃加熱至320℃(1stRUN)。獲得1stRUN之示差掃描熱量測定圖表(將縱軸設為熱能、橫軸設為溫度)。以所得之示差掃描熱量測定圖表中之結晶熔解波峰前之微小吸熱波峰溫度作為Tmeta(℃)。於難以觀測到微小之吸熱之波峰之情形時,藉由數據解析部放大波峰附近,讀取峰值。於微小吸熱波峰存在多個之情形時,將溫度最高之微小吸熱波峰設為Tmeta1(℃),將最低之微小吸熱波峰設為Tmeta2(℃)。 The small endothermic peak temperature Tmeta (℃) is based on JIS K 7122 (1999), using a differential scanning calorimeter measuring device "Robot DSC-RDC220" manufactured by Seiko Electronics Co., Ltd., and the data analysis is measured using DISC Session "SSC/5200" . A 5 mg sample was weighed and placed in a sample pan, and the sample was heated from 25°C to 320°C (1stRUN) at a temperature increase rate of 20°C/min. A differential scanning calorie measurement chart of 1stRUN is obtained (the vertical axis is thermal energy and the horizontal axis is temperature). The microscopic endothermic peak temperature before the crystal melting peak in the obtained differential scanning calorimetry chart is taken as Tmeta (°C). When it is difficult to observe a small endothermic peak, the data analysis unit amplifies the vicinity of the peak and reads the peak. When there are a plurality of minute endothermic peaks, the highest minute endothermic peak is set to Tmeta1 (°C), and the lowest minute endothermic peak is set to Tmeta2 (°C).

微小吸熱波峰之圖表讀取方法係使用解析軟體之波峰檢測功能,將作為波峰檢測到之溫度中於未滿熔點之溫度下檢測到之吸熱波峰設為Tmeta。 The method of reading the graph of the small endothermic peak is to use the peak detection function of the analysis software, and set the endothermic peak detected at the temperature below the melting point among the temperatures detected as the peak as Tmeta.

D.構成聚酯薄膜之聚酯樹脂之玻璃轉移溫度(Tg)(℃) D. Glass transition temperature (Tg) (℃) of the polyester resin constituting the polyester film

依照JIS K 7121(1999),使用Seiko電子工業(股)製造之示差掃描熱量測定裝置“Robot DSC-RDC220”,數據解析使用DISC Session“SSC/5200”,按照下述要領實施測定。 In accordance with JIS K 7121 (1999), a differential scanning calorimeter measuring device "Robot DSC-RDC220" manufactured by Seiko Electronics Co., Ltd. was used, and data analysis was performed using DISC Session "SSC/5200". The measurement was performed according to the following procedure.

稱量5mg試樣並置於樣品盤中,將試樣以20℃/分鐘之升溫速度自25℃加熱至300℃(1stRUN),以該狀態保持5分鐘,繼而以成為25℃以下之方式進行急冷。立即繼續再次以20℃/分鐘之升溫速度自25℃升溫至300℃而進行測定,獲得2ndRUN(第二操作)之示差掃描熱量測定圖表(將縱軸設為熱能、橫軸設為溫度)。於該2ndRUN之示差掃描熱量測定圖表中,於玻璃轉移之階梯狀之變化部分,根據於縱軸方向上距各基準線延長所得之直線等距離之直線與玻璃轉移之階梯狀變化部分之曲線相交的點而求出。於觀測到2個以上玻璃轉移之階梯狀變化部分之情形時,對各者分別求出玻璃轉移溫度,將該等溫度之平均值設為試樣玻璃轉移溫度(Tg)(℃)。 Weigh 5 mg of the sample and place it in the sample tray, heat the sample from 25°C to 300°C (1stRUN) at a temperature increase rate of 20°C/min, hold it for 5 minutes in this state, and then quench it to become below 25°C . Immediately continue to measure again from 25°C to 300°C at a temperature increase rate of 20°C/min to obtain a differential scanning calorimetry chart of 2ndRUN (second operation) (the vertical axis is thermal energy and the horizontal axis is temperature). In the differential scanning calorimetry chart of the 2ndRUN, the step change portion of the glass transition intersects the curve of the step change portion of the glass transition according to a straight line equidistant from a straight line extending from each reference line in the longitudinal axis direction Point. When two or more stepped portions of glass transition are observed, the glass transition temperature is determined for each of them, and the average value of these temperatures is defined as the sample glass transition temperature (Tg) (°C).

D.薄膜之面配向係數(fn) D. Film surface alignment coefficient (fn)

依照JIS K 7105(1999),使用Atago(股)製造之阿貝式折射率計求出20℃下之折射率。測定薄膜之表面之長度方向折射率(Nmd)、寬度方向折射率(Nd)、及厚度方向折射率(Nz),算出面配向係數(fn)。 According to JIS K 7105 (1999), the refractive index at 20° C. was determined using an Abbe-type refractometer manufactured by Atago Co., Ltd. The refractive index in the longitudinal direction (Nmd), the refractive index in the width direction (Nd), and the refractive index in the thickness direction (Nz) of the surface of the film were measured, and the plane alignment coefficient (fn) was calculated.

fn=(Nmd+Ntd)/2-Nz fn=(Nmd+Ntd)/2-Nz

E.薄膜之熱收縮率(%) E. Thermal shrinkage of the film (%)

依照JIS C 2318(1997),測定薄膜之熱收縮率。將薄膜切出寬10mm、長150mm之細長條狀。以測長部分成為約100mm之方式於薄膜劃出標線,於23℃之條件下測定標線之長度,設為L0。其後,於加熱至既定溫度(200℃或220℃)之熱風烘箱內懸掛2g之砝碼而垂吊薄膜,放置30分鐘。自烘箱取出薄膜並冷卻至23℃後,測定標線之長度,設為L1。藉由下述(vi)式求出薄膜之收縮率。測定係以使薄膜長度方向或薄膜寬度方向成為150mm之長度之方式隨機地切出5個部位進行測定。分別計算出長度方向、寬度方向之平均值,設為薄膜之熱收縮率。 According to JIS C 2318 (1997), the thermal shrinkage of the film was measured. The film was cut into elongate strips with a width of 10 mm and a length of 150 mm. A marking line was drawn on the film so that the length measurement part became approximately 100 mm, and the length of the marking line was measured under the condition of 23° C. and set to L0. After that, hang the weight of 2g in a hot air oven heated to a predetermined temperature (200°C or 220°C) to hang the film and leave it for 30 minutes. After removing the film from the oven and cooling to 23°C, the length of the marking line was measured and set to L1. The shrinkage of the film was determined by the following formula (vi). The measurement was performed by randomly cutting out 5 parts so that the length of the film or the width of the film was 150 mm. The average value of the longitudinal direction and the width direction was calculated separately, and set as the thermal shrinkage rate of the film.

(vi)(薄膜熱收縮率)=(L0-L1)/L0×100 (vi) (Film thermal shrinkage) = (L0-L1)/L0×100

F.薄膜之平面性 F. Flatness of the film

使用作為非接觸式雷射顯微鏡之由三鷹光器(股)製造之非接觸三維測定裝置NH-SP3進行評價。解析係使用菱光公司(股)製造之NH soft。將薄膜切出120mm×120mm大小之薄膜。使各邊平行於薄膜長度方向或寬度方向。將切出之薄膜之4邊利用膠帶固定於水平保持之測定台。於三維形狀測定模式下,測定薄膜之表面形狀。將X軸方向設為薄膜長度方向,Y軸方向設為薄膜寬度方向。測定間距係X軸方向設為100μm,Y軸方向設為500μm,測定範圍係設為100mm×100mm之範圍,Z軸倍率係設為20倍。算出Z軸方向之最高點與最低點之差(高度差H(μm))。自薄膜隨機地將5個部位切出上述形狀,算出其平均值,並以如下方式進行評價。 Evaluation was performed using a non-contact three-dimensional measuring device NH-SP3 manufactured by Mitaka Koki Co., Ltd. as a non-contact laser microscope. For the analysis, NH soft manufactured by Ryoko Co., Ltd. was used. Cut the film into 120mm×120mm size film. Make each side parallel to the length or width of the film. Fix the 4 sides of the cut film to the horizontally held measuring table with tape. In the three-dimensional shape measurement mode, the surface shape of the film is measured. Let the X-axis direction be the film length direction, and the Y-axis direction be the film width direction. The measurement pitch is set to 100 μm in the X axis direction, 500 μm in the Y axis direction, the measurement range is set to a range of 100 mm×100 mm, and the Z axis magnification is set to 20 times. Calculate the difference between the highest point and the lowest point in the Z-axis direction (height difference H (μm)). Five parts were randomly cut out of the above shape from the film, the average value thereof was calculated, and evaluation was performed as follows.

0≦H<80評價A 0≦H<80 evaluation A

80≦H<150評價B 80≦H<150 evaluation B

150≦H≦300評價C 150≦H≦300 evaluation C

300<H評價D 300<H evaluation D

評價A為平面性最優異。 Evaluation A was the most excellent in flatness.

G.薄膜之厚度(μm) G. Thickness of film (μm)

薄膜厚度係使用針盤量規,按照JIS K7130(1992年)A-2法,以重疊10片薄膜之狀態對任意5個部位測定厚度。將其平均值除以10而設為薄膜厚度。 The thickness of the film is measured using a dial gauge, according to JIS K7130 (1992) A-2 method, and measuring the thickness of any 5 locations in a state where 10 films are stacked. The average value is divided by 10 to make the film thickness.

H.積層薄膜之各層之厚度(μm) H. Thickness of each layer of laminated film (μm)

於薄膜為積層薄膜之情形時,依照下述方法,求出各層之厚度。沿與薄膜寬度方向平行方向利用切片機切出薄膜截面。藉由掃描型電子顯微鏡以5000倍之倍率觀察該截面,求出積層各層之厚度比率。根據所求出之積層比率與上述薄膜厚度,算出各層之厚度。 When the film is a laminated film, the thickness of each layer is determined according to the following method. Use a microtome to cut out the film cross section parallel to the film width direction. The cross section was observed with a scanning electron microscope at a magnification of 5000 times, and the thickness ratio of each layer of the build-up layer was obtained. The thickness of each layer is calculated based on the obtained lamination ratio and the above-mentioned film thickness.

I.沖裁性 I. Punchability

使用高分子計器(股)製造之試驗片沖裁機,將積層薄膜沖裁為JIS K-6251所記載之5號型啞鈴形狀。對重疊50片之薄膜進行沖裁時發生端面之破裂、剝離之片數M進行計數,對沖裁性進行評價。 Using a test piece punching machine manufactured by a polymer meter (unit), the laminated film was punched into the No. 5 dumbbell shape described in JIS K-6251. The number M of the cracks and peeling of the end surface during the punching of 50 overlapping films was counted, and the punchability was evaluated.

0≦M≦9:沖裁性A 0≦M≦9: Punchability A

10≦M≦20:沖裁性B 10≦M≦20: Punchability B

21≦M≦30:沖裁性C 21≦M≦30: Punchability C

31≦M:沖裁性D 31≦M: Punchability D

A最優異,D最差。 A is the best and D is the worst.

J.固有黏度IV J. Intrinsic viscosity IV

使聚酯組成物溶解於鄰氯酚100ml中(溶液濃度C=1.2g/dl),使用奧士華黏度計測定該溶液於25℃下之黏度。又,同樣地測定溶劑之黏度。使用所得之溶液黏度、溶劑黏度,根據下述(c)式,算出[η](dl/g),將所得之值設為固有黏度(IV)。 The polyester composition was dissolved in 100 ml of o-chlorophenol (solution concentration C=1.2 g/dl), and the viscosity of the solution at 25° C. was measured using an Oswald viscometer. In addition, the viscosity of the solvent was measured in the same manner. Using the obtained solution viscosity and solvent viscosity, [η] (dl/g) was calculated according to the following formula (c), and the obtained value was defined as the intrinsic viscosity (IV).

(c)ηsp/C=[η]+K[η]2.C (c)ηsp/C=[η]+K[η] 2 . C

(此處,ηsp=(溶液黏度(dl/g)/溶劑黏度(dl/g))-1,K為赫金斯常數(設為0.343))。 (Here, ηsp=(solution viscosity (dl/g)/solvent viscosity (dl/g))-1, K is the Hekins constant (set to 0.343)).

K.末端羧基量 K. amount of terminal carboxyl group

關於末端羧基量,依照Maulice之方法,按照以下之方法進行測定(文獻:M.J.Maulice,F.Huizinga,Anal.Chim.Acta,22 363(1960))。將測定試樣(僅分離聚酯樹脂(原料)或積層體之P1層而得者)2g於溫度80℃下溶解於鄰甲酚/氯仿(重量比7/3)50mL中,藉由0.05N之KOH/甲醇溶液進行滴定,測定末端羧基濃度,以當量/聚酯1t(eq./t)之值表示。再者,滴定時之指示劑係使用酚紅,當自黃綠色變化為淺紅色時設為滴定之終點。再者,於使測定試樣溶解之溶液中存在無機粒子等不溶物之情形時,實施如下修正:對溶液進行過濾,測定不溶物之重量,將自測定試樣重量減去不溶物之重量所得之校正值設為測定試樣重量。 The amount of terminal carboxyl groups was measured according to the method of Maulice according to the following method (Document: M.J. Maulice, F. Huizinga, Anal. Chim. Acta, 22 363 (1960)). Dissolve 2g of the measurement sample (only separated from the polyester resin (raw material) or the P1 layer of the laminate) at a temperature of 80°C in 50mL of o-cresol/chloroform (weight ratio 7/3) by 0.05N The KOH/methanol solution was titrated, and the terminal carboxyl group concentration was measured and expressed as the value of equivalent/polyester 1t (eq./t). Furthermore, phenol red is used as the indicator during the titration, and it is set as the end point of the titration when it changes from yellowish green to light red. In addition, when there is an insoluble matter such as inorganic particles in the solution in which the measurement sample is dissolved, the following correction is implemented: the solution is filtered, the weight of the insoluble matter is measured, and the weight of the insoluble matter is subtracted from the weight of the measurement sample The correction value is set as the measured sample weight.

L.製膜性 L. Film making

對製膜過程中薄膜1小時內破裂之次數進行計數,將未滿1次者設為A,將1次以上、未滿3次者設為B,將3次以上、未滿5次者設為C,將5次以上者設為D,從而進行評價。A製膜性最佳,D最差。 Count the number of times the film ruptures within 1 hour during the film-making process, set A to less than 1 time, set to B for more than 1 time and less than 3 times, and set to 3 or more and less than 5 times It is C, and the evaluation is made by making D five or more times. A has the best film formation and D has the worst.

再者,於上述測定中,於不清楚要測定之薄膜之長度方向或寬度方向之情形時,將薄膜中具有最大折射率之方向視為長度方向,將與長度方向正交之方向視為寬度方向。又,薄膜中最大折射率之方向可藉由折射率計測定薄膜所有方向之折射率而求出,亦可藉由利用相位差測定裝置(雙折射測定裝置)等決定遲相軸方向而求出。 Furthermore, in the above measurement, when the length direction or width direction of the film to be measured is not clear, the direction with the largest refractive index in the film is regarded as the length direction, and the direction orthogonal to the length direction is regarded as the width direction. In addition, the direction of the maximum refractive index in the film can be obtained by measuring the refractive index of the film in all directions by a refractometer, or by determining the direction of the slow phase axis using a phase difference measurement device (birefringence measurement device), etc. .

M.薄膜之耐濕熱性 M. Moisture and heat resistance of the film

將積層薄膜以長邊與薄膜之長度方向之方式、以長邊與寬度方向平行之方式分別切出1cm×20cm之大小,基於ASTM-D882(1997),測定以夾頭間距5cm、拉伸速度300mm/分鐘進行拉伸時之斷裂伸長率。再者,樣品數係設為n=5,又,分別對薄膜之長度方向、寬度方向進行測定後,求出其等之平均值,將其設為薄膜之斷裂伸長率E0。 Cut the laminated film with the long side and the longitudinal direction of the film, and the long side and the width direction parallel to cut out a size of 1cm × 20cm, based on ASTM-D882 (1997), measured with a chuck spacing of 5cm, stretching speed Elongation at break when stretched at 300mm/min. In addition, the number of samples is set to n=5, and after measuring the longitudinal direction and the width direction of the film, respectively, the average value thereof is obtained, and this is taken as the elongation at break E0 of the film.

其次,對同樣地切出之薄膜,藉由Tabai Espec(股)製造之壓力鍋,於溫度125℃、相對濕度100%RH之高濕熱條件下進行處理後,測定斷裂伸長率。再者,測定係設為n=5,對薄膜之長度方向、寬度方向分別進行測定,將其平均值設為斷裂伸長率E1。使用所得之斷裂伸長率E0、E1,藉由以下之(d)式算出伸長率保持率。以1小時為單位變更處理時間,將伸長率保持率成為50%以下 之處理時間設為伸長率半衰期。 Next, the film cut out in the same way was processed by a pressure cooker manufactured by Tabai Espec (share) under high humidity and heat conditions at a temperature of 125°C and a relative humidity of 100% RH, and the elongation at break was measured. In addition, the measurement system was set to n=5, and the longitudinal direction and the width direction of the film were respectively measured, and the average value was defined as the elongation at break E1. Using the obtained elongation at break E0 and E1, the elongation retention rate was calculated by the following formula (d). Change the processing time in units of 1 hour to keep the elongation retention rate below 50% The processing time is set as the elongation half-life.

(d)伸長率保持率(%)=E1/E0×100 (d) Elongation retention rate (%)=E1/E0×100

根據所得之伸長率半衰期,以如下方式判定薄膜之耐濕熱性。 Based on the obtained half-life of elongation, the film's moisture and heat resistance was determined in the following manner.

伸長率半衰期為30小時以上之情形:A When the elongation half-life is more than 30 hours: A

伸長率半衰期為20小時以上、未滿30小時之情形:B When the elongation half-life is more than 20 hours and less than 30 hours: B

伸長率半衰期未滿20小時之情形:C When the elongation half-life is less than 20 hours: C

[實施例] [Example]

以下,列舉實施例對本發明進行說明,但本發明未必限定於該等。 Hereinafter, the present invention will be described with examples, but the present invention is not necessarily limited to these.

[PET-A之製造]以三氧化二銻作為觸媒,由對苯二甲酸及乙二醇依照常用方法進行聚合,獲得熔融聚合PET。所得之熔融聚合PET之玻璃轉移溫度為81℃,熔點為255℃,固有黏度為0.62,末端羧基量為20eq./t。其次,使熔融聚合PET依照常用方法進行固相聚合,獲得PET-A。所得之PET-A之玻璃轉移溫度為82℃,熔點為255℃,固有黏度為0.85,末端羧基量為11eq./t。 [Manufacture of PET-A] Using antimony trioxide as a catalyst, terephthalic acid and ethylene glycol are polymerized according to a common method to obtain a melt polymerized PET. The glass transition temperature of the resulting melt-polymerized PET was 81°C, the melting point was 255°C, the intrinsic viscosity was 0.62, and the amount of terminal carboxyl groups was 20 eq./t. Next, melt-polymerized PET was subjected to solid-phase polymerization according to a common method to obtain PET-A. The glass transition temperature of the obtained PET-A was 82°C, the melting point was 255°C, the intrinsic viscosity was 0.85, and the amount of terminal carboxyl groups was 11 eq./t.

[PEN-A之製造]以乙酸錳作為觸媒,由2,6-萘二甲酸二甲酯及乙二醇實施酯交換反應。酯交換反應結束後,以三氧化二銻作為觸媒,依照常用方法獲得PEN-A。所得之PEN-A之玻璃轉移溫度為124℃,熔點為265℃,固有黏度為0.62,末端羧基濃度為25eq./t。 [Manufacture of PEN-A] Using manganese acetate as a catalyst, a transesterification reaction was carried out from dimethyl 2,6-naphthalenedicarboxylate and ethylene glycol. After the transesterification reaction is completed, antimony trioxide is used as a catalyst to obtain PEN-A according to a common method. The resulting PEN-A had a glass transition temperature of 124°C, a melting point of 265°C, an intrinsic viscosity of 0.62, and a terminal carboxyl group concentration of 25 eq./t.

[PET-B之製造]使用對苯二甲酸及乙二醇作為原料,以三氧化二銻作為觸媒,進行聚合。與添加三氧化二銻同時,添加將磷酸與磷酸二氫鈉二水合物溶解於乙二醇而成之溶液。磷酸係以其相對於PET成為2.0mol/t當量之方式添加,磷酸二氫鈉二水合 物係以其相對於PET成為1.7mol/t當量之方式添加。又,為了抑制因磷化合物導致聚合觸媒失活,而與添加磷化合物同時添加相對於PET為2.4mol/t當量之乙酸錳,進行聚合反應,獲得PET-C。所得之PET-C之玻璃轉移溫度為81℃,熔點為255℃,固有黏度為0.68,末端羧基量為20eq./t。其次,使PET-C依照常用方法進行固相聚合,獲得PET-B。所得之PET-B之玻璃轉移溫度為82℃,熔點為255℃,固有黏度為0.85,末端羧基量為11eq./t。 [Manufacture of PET-B] Polymerization is carried out using terephthalic acid and ethylene glycol as raw materials and antimony trioxide as a catalyst. Simultaneously with the addition of antimony trioxide, a solution prepared by dissolving phosphoric acid and sodium dihydrogen phosphate dihydrate in ethylene glycol is added. Phosphoric acid is added in such a way that it becomes 2.0 mol/t equivalent to PET, and sodium dihydrogen phosphate dihydrate The material system is added so that it becomes 1.7 mol/t equivalent with respect to PET. In addition, in order to suppress the deactivation of the polymerization catalyst due to the phosphorus compound, manganese acetate equivalent to 2.4 mol/t equivalent to PET was added at the same time as the addition of the phosphorus compound to carry out the polymerization reaction to obtain PET-C. The glass transition temperature of the obtained PET-C was 81°C, the melting point was 255°C, the intrinsic viscosity was 0.68, and the amount of terminal carboxyl groups was 20eq./t. Next, PET-C is subjected to solid-phase polymerization according to a common method to obtain PET-B. The glass transition temperature of the obtained PET-B was 82°C, the melting point was 255°C, the intrinsic viscosity was 0.85, and the amount of terminal carboxyl groups was 11 eq./t.

[PEN-B之製造]使用2,6-萘二甲酸二甲酯及乙二醇作為原料,以乙酸錳作為觸媒,實施酯交換反應。酯交換反應結束後,以三氧化二銻作為觸媒進行聚合。與添加三氧化二銻同時,添加將磷酸與磷酸二氫鈉二水合物溶解於乙二醇而成之溶液。磷酸係以其相對於PET成為2.0mol/t當量之方式添加,磷酸二氫鈉二水合物係以其相對於PET成為1.7mol/t當量之方式添加,進行聚合反應,獲得PEN-B。所得之PEN-B之玻璃轉移溫度為124℃,熔點為265℃,固有黏度為0.62,末端羧基濃度為20eq./t。 [Production of PEN-B] Using dimethyl 2,6-naphthalenedicarboxylate and ethylene glycol as raw materials, and manganese acetate as a catalyst, a transesterification reaction was carried out. After the transesterification reaction is completed, antimony trioxide is used as a catalyst for polymerization. Simultaneously with the addition of antimony trioxide, a solution prepared by dissolving phosphoric acid and sodium dihydrogen phosphate dihydrate in ethylene glycol is added. Phosphoric acid was added so that it was 2.0 mol/t equivalent to PET, and sodium dihydrogen phosphate dihydrate was added so that it was 1.7 mol/t equivalent to PET, and a polymerization reaction was performed to obtain PEN-B. The glass transition temperature of the obtained PEN-B was 124°C, the melting point was 265°C, the intrinsic viscosity was 0.62, and the terminal carboxyl group concentration was 20 eq./t.

(實施例1) (Example 1)

作為構成表層之樹脂,設為PEN-A 100質量份,於160℃下真空乾燥2小時後投入至擠出機1。又,將作為構成內層之樹脂之PET-A 100質量份於160℃下真空乾燥2小時後,投入至擠出機2。於擠出機內使各原料於表中記載之溫度下熔融,藉由合流裝置以使投入至擠出機1之樹脂成為薄膜之兩表層之方式合流,擠出至表面溫度25℃之流延鼓上,製作具有3層結構之積層片材。繼而,利用經加熱之輥組對該片材進行預熱後,於95℃之溫度下沿長度方向 (MD方向)進行3.2倍延伸,然後利用溫度25℃之輥組進行冷卻而獲得單軸延伸薄膜。一面以夾具握持所得之單軸延伸薄膜之兩端,一面將其於拉幅機內之溫度110℃之加熱區域沿與長度方向呈直角之寬度方向(TD方向)延伸3.5倍。進而,接著於拉幅機內之熱處理區域在240℃之溫度下實施10秒之熱固定。於熱固定之步驟中,使薄膜沿薄膜寬度方向相對於薄膜寬度收縮5%。繼而,於冷卻區域均勻地緩冷後,進行捲取而獲得積層聚酯薄膜。進而,對於所得之薄膜,藉由設置於薄膜捲出輥與薄膜捲取輥之間之熱風烘箱,於220℃之溫度下,以薄膜供於熱處理之時間成為5分鐘之方式實施退火處理,獲得厚度100μm之薄膜。將薄膜之各特性示於表中。其為200℃熱收縮率較低,且平面性亦特別良好之薄膜。 The resin constituting the surface layer was set to 100 parts by mass of PEN-A, which was vacuum-dried at 160° C. for 2 hours and then put into the extruder 1. In addition, 100 parts by mass of PET-A as the resin constituting the inner layer was vacuum dried at 160° C. for 2 hours, and then put into the extruder 2. In the extruder, each raw material is melted at the temperature described in the table, and the resin added to the extruder 1 is merged by a merging device in such a manner that the two layers of the film are extruded and cast to a surface temperature of 25°C. On the drum, a laminated sheet with a 3-layer structure is produced. Then, after preheating the sheet with a heated roller set, it is along the length direction at a temperature of 95°C (MD direction) 3.2 times stretching, and then cooling with a roller set at a temperature of 25°C to obtain a uniaxially stretched film. While holding both ends of the resulting uniaxially stretched film with a jig, the heated area of 110°C in the tenter was extended 3.5 times in the width direction (TD direction) at right angles to the length direction. Furthermore, the heat treatment zone in the tenter was thermally fixed at 240°C for 10 seconds. In the step of heat fixing, the film is shrunk by 5% relative to the film width in the film width direction. Then, after slowly cooling uniformly in the cooling area, winding is performed to obtain a laminated polyester film. Furthermore, the obtained film was annealed by a hot air oven installed between the film take-out roll and the film take-up roll at a temperature of 220° C. so that the time for the film to be subjected to the heat treatment became 5 minutes to obtain A film with a thickness of 100 μm. The characteristics of the film are shown in the table. It is a film with a low thermal shrinkage at 200°C and a particularly good flatness.

(實施例2~4) (Examples 2 to 4)

將樹脂之組成、製膜條件變更為如表所示,除此以外,與實施例1同樣地進行製膜。將薄膜之特性示於表中。其為200℃熱收縮率較低,且平面性亦特別良好之薄膜。 The film formation was performed in the same manner as in Example 1 except that the composition of the resin and the film formation conditions were changed as shown in the table. The characteristics of the film are shown in the table. It is a film with a low thermal shrinkage at 200°C and a particularly good flatness.

(實施例5) (Example 5)

將薄膜之熱固定溫度、再退火溫度變更為如表中記載,除此以外,與實施例1同樣地獲得厚度100μm之薄膜。將薄膜之各特性示於表中。由於熱固定溫度為薄膜熔點附近,因此僅觀察到1個Tmeta。可知該薄膜為200℃熱收縮率較低,此外,220℃之熱收縮率亦較低,且平面性優異的薄膜。 A thin film having a thickness of 100 μm was obtained in the same manner as in Example 1 except that the heat fixing temperature and the re-annealing temperature of the thin film were changed as described in the table. The characteristics of the film are shown in the table. Since the heat fixing temperature is near the melting point of the film, only one Tmeta was observed. It can be seen that the film has a low heat shrinkage rate at 200°C, and a low heat shrinkage rate at 220°C, and is excellent in flatness.

(實施例6~8) (Examples 6 to 8)

將樹脂之組成、製膜條件變更為如表所示,除此以外,與實施例5同樣地進行製膜。將薄膜之特性示於表中。其為220℃熱收縮率較低,且平面性亦特別良好之薄膜。 The film formation was performed in the same manner as in Example 5 except that the composition of the resin and the film forming conditions were changed as shown in the table. The characteristics of the film are shown in the table. It is a film with a low heat shrinkage at 220°C and particularly good flatness.

(實施例9~14、22) (Examples 9-14, 22)

將薄膜之積層比、薄膜之厚度變更為如表所示,除此以外,與實施例1同樣地進行製膜。將薄膜之特性示於表中。於實施例9中,由於表層(A層)之積層比較大,因此雖製膜性、加工性稍差,但可耐實用。於實施例11中,由於表層(A層)之積層比較小而厚度較薄,因此保護內層(B層)之功能降低,平面性變差。於實施例13中,由於表層(A層)之單側之厚度較薄,因此雖保護內層(B層)之功能降低,平面性稍差,但可耐實用。於實施例22中,由於表層(A層)之單側之厚度較厚,因此雖製膜性、加工性稍差,但可耐實用。 Except that the lamination ratio of the thin film and the thickness of the thin film were changed as shown in the table, a film was formed in the same manner as in Example 1. The characteristics of the film are shown in the table. In Example 9, since the build-up of the surface layer (layer A) is relatively large, although the film formability and processability are slightly inferior, it is practically resistant. In Example 11, since the buildup of the surface layer (layer A) is relatively small and the thickness is thin, the function of protecting the inner layer (layer B) is reduced, and the planarity is deteriorated. In Example 13, since the thickness of one side of the surface layer (layer A) is thin, although the function of protecting the inner layer (layer B) is reduced, the flatness is slightly poor, but it is practical and durable. In Example 22, since the thickness of one side of the surface layer (layer A) is relatively thick, although the film formability and processability are slightly inferior, it is practically resistant.

(實施例15~17) (Examples 15-17)

將樹脂之組成、薄膜之再退火溫度變更為如表中記載,除此以外,與實施例5同樣地進行製膜。將薄膜之特性示於表中。由於與實施例5相比再退火溫度較低,因此雖220℃熱收縮率稍差,但平面性顯示出優異特性。 Except that the composition of the resin and the re-annealing temperature of the thin film were changed as described in the table, a film was formed in the same manner as in Example 5. The characteristics of the film are shown in the table. Since the re-annealing temperature is lower than in Example 5, the heat shrinkage at 220°C is slightly inferior, but the flatness shows excellent characteristics.

(實施例18、21) (Examples 18 and 21)

將構成薄膜之樹脂設為僅有聚對苯二甲酸乙二酯,將製膜條件設為如表所示,從而製作單膜之薄膜。將薄膜之特性示於表中。於 實施例18中,200℃熱收縮率優異,雖然平面性與實施例1相比稍差但可耐實用。於實施例21中,由於熱固定溫度與退火溫度相同,因此熱收縮率優異。雖平面性稍差,但可耐實用。 The resin constituting the film was made of only polyethylene terephthalate, and the film-forming conditions were set as shown in the table to produce a single-film film. The characteristics of the film are shown in the table. in In Example 18, the heat shrinkage rate at 200°C was excellent, and although the flatness was slightly inferior to that in Example 1, it was practically resistant. In Example 21, since the heat fixing temperature is the same as the annealing temperature, the heat shrinkage rate is excellent. Although the flatness is slightly poor, it is practical.

(實施例19) (Example 19)

將構成A層之樹脂之組成設為如表中記載,除此以外,與實施例1同樣地獲得薄膜。將薄膜之特性示於表中。可知A層之熔點未滿260℃,平面性稍差。 A film was obtained in the same manner as in Example 1 except that the composition of the resin constituting the layer A was as described in the table. The characteristics of the film are shown in the table. It can be seen that the melting point of layer A is less than 260°C, and the flatness is slightly poor.

(實施例20) (Example 20)

將A層所使用之樹脂設為PCHT,除此以外,與實施例1同樣地獲得薄膜。PCHT係使用Eastman Chemical公司製造之copolyester 13319。將薄膜之特性示於表中。其為熱收縮率、平面性優異之薄膜。 A thin film was obtained in the same manner as in Example 1 except that the resin used in the layer A was PCHT. For PCHT, Copolyester 13319 manufactured by Eastman Chemical Company was used. The characteristics of the film are shown in the table. It is a film with excellent heat shrinkage and flatness.

(實施例23~25) (Examples 23 to 25)

將A層所使用之樹脂設為PEN-B,且將B層所使用之樹脂設為PET-B,除此以外,與實施例1同樣地獲得薄膜。將薄膜之特性示於表中。為熱收縮率、平面性、耐濕熱性優異之薄膜。 A film was obtained in the same manner as in Example 1 except that the resin used in layer A was PEN-B and the resin used in layer B was PET-B. The characteristics of the film are shown in the table. It is a film with excellent heat shrinkage, flatness and moisture resistance.

(比較例1、2) (Comparative examples 1, 2)

將構成薄膜之樹脂設為僅有聚對苯二甲酸乙二酯,將製膜條件設為如表所示,從而製作單膜之薄膜。將薄膜之特性示於表中。於比較例1中,由於Tmeta1之溫度較低,且未滿Tmf-35℃,因此 熱收縮率變差。於比較例2中,由於熱固定溫度較高,Tmf相同,因此製膜性較差而無法獲得薄膜。 The resin constituting the film was made of only polyethylene terephthalate, and the film-forming conditions were set as shown in the table to produce a single-film film. The characteristics of the film are shown in the table. In Comparative Example 1, because the temperature of Tmeta1 is low and it is less than Tmf-35℃, so The heat shrinkage rate becomes worse. In Comparative Example 2, since the heat-fixing temperature is high and the Tmf is the same, the film-forming property is poor and a thin film cannot be obtained.

(比較例3、4) (Comparative Examples 3 and 4)

將構成薄膜之樹脂設為僅PEN,以表中記載之延伸條件進行製膜。將所得之薄膜之特性示於表中。於比較例3中,僅進行熱固定,於比較例4中,於熱固定步驟後實施再退火。由於並非以PET為主成分之薄膜,面配向係數(fn)較大,因此加工性大幅變差。 The resin constituting the film was made PEN only, and the film was formed under the stretching conditions described in the table. The characteristics of the obtained film are shown in the table. In Comparative Example 3, only heat fixing is performed, and in Comparative Example 4, re-annealing is performed after the heat fixing step. Since the film which is not mainly composed of PET has a large surface alignment coefficient (fn), the processability is greatly deteriorated.

(比較例5、6) (Comparative Examples 5, 6)

將構成A層之樹脂之組成、製膜條件變更為如表中記載,除此以外,與實施例1同樣地製作薄膜。將薄膜特性示於表中。 A film was produced in the same manner as in Example 1 except that the composition of the resin constituting the layer A and the film forming conditions were changed as described in the table. The film characteristics are shown in the table.

於比較例5中,由於Tmeta1之溫度較低,未滿Tmf-35℃,因此熱收縮率大幅變差。於比較例6中,由於未經過再退火步驟,因此熱收縮率大幅變差。 In Comparative Example 5, since the temperature of Tmeta1 is low and less than Tmf-35°C, the thermal shrinkage rate is greatly deteriorated. In Comparative Example 6, since the re-annealing step was not performed, the thermal shrinkage rate greatly deteriorated.

Figure 104137870-A0101-12-0027-1
Figure 104137870-A0101-12-0027-1

Figure 104137870-A0101-12-0028-2
Figure 104137870-A0101-12-0028-2

Figure 104137870-A0101-12-0029-3
Figure 104137870-A0101-12-0029-3

Figure 104137870-A0101-12-0030-4
Figure 104137870-A0101-12-0030-4

Figure 104137870-A0101-12-0031-5
Figure 104137870-A0101-12-0031-5

Figure 104137870-A0101-12-0032-6
Figure 104137870-A0101-12-0032-6

Figure 104137870-A0101-12-0033-7
Figure 104137870-A0101-12-0033-7

Figure 104137870-A0101-12-0034-8
Figure 104137870-A0101-12-0034-8

Figure 104137870-A0101-12-0035-9
Figure 104137870-A0101-12-0035-9

Figure 104137870-A0101-12-0036-10
Figure 104137870-A0101-12-0036-10

(產業上之可利用性) (Industry availability)

本發明之聚酯薄膜不僅平面性、加工性優異,而且耐熱性亦優異。因此,本發明之聚酯薄膜於透明電極蒸鍍等高溫之環境之步驟中薄膜形狀變化亦較少,可較佳地用作光學裝置基板用途。 The polyester film of the present invention is not only excellent in flatness and processability, but also excellent in heat resistance. Therefore, the polyester film of the present invention changes little in the shape of the film in the step of high temperature environment such as transparent electrode deposition, and can be preferably used as an optical device substrate.

Claims (7)

一種聚酯薄膜,其係聚對苯二甲酸乙二酯於構成薄膜之聚酯樹脂中所占之比例為60重量%以上者,且於220℃下進行30分鐘熱處理之情形時之薄膜長度方向、寬度方向之熱收縮率均為0.5%以下,且至少任一者之熱收縮率為0.01%以上;其中,構成薄膜之聚酯樹脂具有熔點(Tmf(℃)),且具有2個以上之微小吸熱波峰溫度(Tmeta(℃)),且最低溫度之Tmeta(Tmeta1)(℃)與最高溫度之Tmeta(Tmeta2)(℃)滿足以下之關係:Tmf-35(℃)≦Tmeta1(℃)<Tmeta2(℃)≦Tmf(℃)。 A polyester film whose length of polyethylene terephthalate in the polyester resin constituting the film is 60% by weight or more and heat treatment at 220°C for 30 minutes , The thermal shrinkage in the width direction is 0.5% or less, and at least any one has a thermal shrinkage of 0.01% or more; Among them, the polyester resin constituting the film has a melting point (Tmf (℃)), and has more than 2 The small endothermic peak temperature (Tmeta(℃)), and the lowest temperature Tmeta(Tmeta1)(℃) and the highest temperature Tmeta(Tmeta2)(℃) satisfy the following relationship: Tmf-35(℃)≦Tmeta1(℃)< Tmeta2(℃)≦Tmf(℃). 如請求項1之聚酯薄膜,其中,於藉由非接觸式雷射顯微鏡測定薄膜之凹凸時,薄膜之凹凸差為300μm以下。 The polyester film according to claim 1, wherein, when the unevenness of the film is measured by a non-contact laser microscope, the unevenness of the film is 300 μm or less. 如請求項1之聚酯薄膜,其中,面配向係數為0.145以上且0.165以下。 The polyester film according to claim 1, wherein the surface alignment coefficient is 0.145 or more and 0.165 or less. 如請求項1之聚酯薄膜,其中,上述聚酯薄膜為包含至少3層之積層聚酯薄膜,且構成薄膜表面之層(A層)中所包含之聚酯樹脂之熔點(Tmo(℃))為260℃以上。 The polyester film according to claim 1, wherein the polyester film is a laminated polyester film containing at least 3 layers, and the melting point of the polyester resin included in the layer (layer A) constituting the film surface (Tmo (°C) ) Is above 260℃. 如請求項4之聚酯薄膜,其中,上述積層聚酯薄膜包含3層,且構成表層之層(A層)中所包含之聚酯樹脂之熔點(Tmo(℃))、與構成內層之層(B層)中所包含之聚酯樹脂之熔點(Tmi(℃))的差為5℃以上且10℃以下。 The polyester film according to claim 4, wherein the laminated polyester film includes three layers, and the melting point (Tmo (°C)) of the polyester resin included in the layer (A layer) constituting the surface layer and the inner layer The difference in melting point (Tmi (°C)) of the polyester resin included in the layer (layer B) is 5°C or higher and 10°C or lower. 如請求項5之聚酯薄膜,其中,構成表層之層(A層)之厚度之和、與構成內層之層(B層)之厚度之比為1/8以上且1/4以下。 The polyester film according to claim 5, wherein the ratio of the sum of the thickness of the layer constituting the surface layer (layer A) and the thickness of the layer constituting the inner layer (layer B) is 1/8 or more and 1/4 or less. 如請求項1至5中任一項之聚酯薄膜,其係用於透明導電膜之製膜基板。 The polyester film according to any one of claims 1 to 5, which is used for a film-forming substrate of a transparent conductive film.
TW104137870A 2014-11-28 2015-11-17 Polyester film TWI685510B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014241226 2014-11-28
JP2014-241226 2014-11-28

Publications (2)

Publication Number Publication Date
TW201625714A TW201625714A (en) 2016-07-16
TWI685510B true TWI685510B (en) 2020-02-21

Family

ID=56074139

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104137870A TWI685510B (en) 2014-11-28 2015-11-17 Polyester film

Country Status (5)

Country Link
JP (1) JP6565683B2 (en)
KR (1) KR102402833B1 (en)
CN (1) CN107001666B (en)
TW (1) TWI685510B (en)
WO (1) WO2016084568A1 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102619518B1 (en) * 2017-09-22 2023-12-29 미쯔비시 케미컬 주식회사 Copolymerized polyester film
JP2020012067A (en) * 2018-07-19 2020-01-23 日東電工株式会社 Polyester film, protection film, protection film laminate, and method for producing protection film
JP7234563B2 (en) * 2018-10-05 2023-03-08 東レ株式会社 polyethylene terephthalate film
EP3854837B1 (en) * 2018-10-31 2024-01-10 JFE Steel Corporation Film for coating metal sheet and resin-coated metal sheet
KR102378969B1 (en) * 2018-11-09 2022-03-25 주식회사 엘지화학 Method for Manufacturing Conductive Polymer Substrate
JP7231732B2 (en) * 2019-06-28 2023-03-01 富士フイルム株式会社 Sheet set for pressure measurement, sheet for pressure measurement
WO2024050690A1 (en) * 2022-09-06 2024-03-14 扬州纳力新材料科技有限公司 Composite polyester film, preparation method therefor, and use thereof

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200307602A (en) * 2002-06-04 2003-12-16 Teijin Jupont Films Japan Ltd Laminated polyester film and laminated thin film
TW201412838A (en) * 2012-08-21 2014-04-01 Toray Industries Biaxially oriented polyethylene terephthalate film and method for producing same

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2692269B2 (en) 1989-06-13 1997-12-17 ダイアホイルヘキスト株式会社 Low shrinkage polyester film
US5811493A (en) * 1994-10-21 1998-09-22 Minnesota Mining And Manufacturing Company Paper-like film
JPH08132523A (en) * 1994-11-09 1996-05-28 Toray Ind Inc Low heat-shrinkable polyester film
JP3539588B2 (en) * 1995-03-14 2004-07-07 東レ株式会社 Polyester film and method for producing the same
JPH10180866A (en) * 1996-10-21 1998-07-07 Toray Ind Inc Low heat-shrinkable polyester film and its manufacture
JPH11165350A (en) 1997-12-04 1999-06-22 Toray Ind Inc Biaxially orientated polyester film for flexible printing substrate, and manufacture thereof
JP4456883B2 (en) 2004-01-30 2010-04-28 帝人デュポンフィルム株式会社 Dye-sensitized solar cell laminate film and dye-sensitized solar cell electrode using the same
US20090127741A1 (en) * 2005-06-09 2009-05-21 Toray Industries, Inc. A Corporation Of Japan Process for producing biaxially oriented polyester film
JP4983075B2 (en) * 2006-04-04 2012-07-25 東レ株式会社 Method for producing biaxially stretched polyester film
CN101134810B (en) * 2006-09-01 2011-05-04 远东新世纪股份有限公司 Modified copolyester, thermal shrinkage polyester film produced thereby and method for preparing same
CN101511920B (en) * 2006-09-06 2012-05-09 东洋纺织株式会社 Polyester film for molding
CN100999587A (en) * 2006-12-25 2007-07-18 刘津平 Biological whole degrading film and mfg. process of its material
WO2010110119A1 (en) * 2009-03-26 2010-09-30 東レ株式会社 Polyester film for solar cells, solar cell back sheet using same, and solar cell
JP2012017456A (en) * 2010-06-11 2012-01-26 Fujifilm Corp Polyester film and method for producing the same, back sheet for solar cell, and solar cell module
CN102933372B (en) * 2010-07-06 2016-03-30 东丽株式会社 Shaping double axial orientated polyester film
WO2012133515A1 (en) * 2011-03-28 2012-10-04 富士フイルム株式会社 Polyester film, solar cell backsheet using same, and process for producing polyester film

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200307602A (en) * 2002-06-04 2003-12-16 Teijin Jupont Films Japan Ltd Laminated polyester film and laminated thin film
TW201412838A (en) * 2012-08-21 2014-04-01 Toray Industries Biaxially oriented polyethylene terephthalate film and method for producing same

Also Published As

Publication number Publication date
JP6565683B2 (en) 2019-08-28
WO2016084568A1 (en) 2016-06-02
CN107001666A (en) 2017-08-01
KR102402833B1 (en) 2022-05-27
JPWO2016084568A1 (en) 2017-09-07
KR20170090410A (en) 2017-08-07
TW201625714A (en) 2016-07-16
CN107001666B (en) 2020-09-01

Similar Documents

Publication Publication Date Title
TWI685510B (en) Polyester film
KR101981080B1 (en) Biaxially oriented polyethylene terephthalate film
JP6672819B2 (en) Polyester film
KR101393937B1 (en) Biaxially-oriented polyester film for flexible display
JP6507640B2 (en) Laminated polyester film
TWI752017B (en) Films and electrical insulating sheets, adhesive tapes, and rotary machines using the same
JP6760066B2 (en) Biaxially oriented polyester film
JP4902464B2 (en) Solar cell back surface protective film
JP2018021168A (en) Biaxially oriented polyester film
JP2010234673A (en) Polyester film
JP5287583B2 (en) Polyester film for solar cells
JP2016163949A (en) Protective polyester film for mold release
JP6874358B2 (en) Polyester composition and its biaxially stretched polyester film
JP3948908B2 (en) Polyester film for coverlay film
JP2015071277A (en) Laminated film
JP6938927B2 (en) Biaxially oriented polyester film for transparent conductive substrates and its manufacturing method
JP5287584B2 (en) Polyester film for solar cells
JP5437646B2 (en) Film for touch panel and roll thereof
JP6374214B2 (en) Laminated film with coating layer
JP2015037097A (en) Polyester film for solar battery protection film, and solar battery protection film arranged by use thereof
JP2015208945A (en) Release polyester film
JP2012169519A (en) Base material polyester film forming inorganic thin film for solar cell
JP2011016899A (en) Polyester film for heat-resistant tape
JP2015216388A (en) Method for manufacturing inorganic thin film-forming base polyester film for solar batteries