TWI752017B - Films and electrical insulating sheets, adhesive tapes, and rotary machines using the same - Google Patents

Films and electrical insulating sheets, adhesive tapes, and rotary machines using the same Download PDF

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Publication number
TWI752017B
TWI752017B TW106110684A TW106110684A TWI752017B TW I752017 B TWI752017 B TW I752017B TW 106110684 A TW106110684 A TW 106110684A TW 106110684 A TW106110684 A TW 106110684A TW I752017 B TWI752017 B TW I752017B
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TW
Taiwan
Prior art keywords
film
inorganic particles
thickness
layer
thin film
Prior art date
Application number
TW106110684A
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Chinese (zh)
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TW201807032A (en
Inventor
吉田昌平
濱崎莉沙
青山滋
Original Assignee
日商東麗股份有限公司
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Publication of TW201807032A publication Critical patent/TW201807032A/en
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Publication of TWI752017B publication Critical patent/TWI752017B/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B17/00Insulators or insulating bodies characterised by their form
    • H01B17/54Insulators or insulating bodies characterised by their form having heating or cooling devices
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/30Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
    • B32B27/304Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers comprising vinyl halide (co)polymers, e.g. PVC, PVDC, PVF, PVDF
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B25/00Layered products comprising a layer of natural or synthetic rubber
    • B32B25/04Layered products comprising a layer of natural or synthetic rubber comprising rubber as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B25/042Layered products comprising a layer of natural or synthetic rubber comprising rubber as the main or only constituent of a layer, which is next to another layer of the same or of a different material of natural rubber or synthetic rubber
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B25/00Layered products comprising a layer of natural or synthetic rubber
    • B32B25/04Layered products comprising a layer of natural or synthetic rubber comprising rubber as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B25/08Layered products comprising a layer of natural or synthetic rubber comprising rubber as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B25/00Layered products comprising a layer of natural or synthetic rubber
    • B32B25/14Layered products comprising a layer of natural or synthetic rubber comprising synthetic rubber copolymers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/06Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B27/08Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/18Layered products comprising a layer of synthetic resin characterised by the use of special additives
    • B32B27/20Layered products comprising a layer of synthetic resin characterised by the use of special additives using fillers, pigments, thixotroping agents
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/18Layered products comprising a layer of synthetic resin characterised by the use of special additives
    • B32B27/20Layered products comprising a layer of synthetic resin characterised by the use of special additives using fillers, pigments, thixotroping agents
    • B32B27/205Layered products comprising a layer of synthetic resin characterised by the use of special additives using fillers, pigments, thixotroping agents the fillers creating voids or cavities, e.g. by stretching
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/28Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42
    • B32B27/281Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42 comprising polyimides
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/28Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42
    • B32B27/285Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42 comprising polyethers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/28Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42
    • B32B27/286Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42 comprising polysulphones; polysulfides
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/28Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42
    • B32B27/288Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42 comprising polyketones
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/30Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
    • B32B27/302Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers comprising aromatic vinyl (co)polymers, e.g. styrenic (co)polymers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/30Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
    • B32B27/306Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers comprising vinyl acetate or vinyl alcohol (co)polymers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/30Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
    • B32B27/308Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers comprising acrylic (co)polymers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/32Layered products comprising a layer of synthetic resin comprising polyolefins
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/34Layered products comprising a layer of synthetic resin comprising polyamides
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/36Layered products comprising a layer of synthetic resin comprising polyesters
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/36Layered products comprising a layer of synthetic resin comprising polyesters
    • B32B27/365Layered products comprising a layer of synthetic resin comprising polyesters comprising polycarbonates
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/38Layered products comprising a layer of synthetic resin comprising epoxy resins
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/40Layered products comprising a layer of synthetic resin comprising polyurethanes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/42Layered products comprising a layer of synthetic resin comprising condensation resins of aldehydes, e.g. with phenols, ureas or melamines
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B3/00Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form
    • B32B3/26Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer
    • B32B3/30Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer characterised by a layer formed with recesses or projections, e.g. hollows, grooves, protuberances, ribs
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/02Elements
    • C08K3/04Carbon
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/02Elements
    • C08K3/06Sulfur
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/02Elements
    • C08K3/08Metals
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L67/00Compositions of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Compositions of derivatives of such polymers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L67/00Compositions of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Compositions of derivatives of such polymers
    • C08L67/02Polyesters derived from dicarboxylic acids and dihydroxy compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B17/00Insulators or insulating bodies characterised by their form
    • H01B17/56Insulating bodies
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B3/00Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
    • H01B3/18Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
    • H01B3/30Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
    • H01B3/42Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes polyesters; polyethers; polyacetals
    • H01B3/421Polyesters
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2250/00Layers arrangement
    • B32B2250/022 layers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2250/00Layers arrangement
    • B32B2250/24All layers being polymeric
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2264/00Composition or properties of particles which form a particulate layer or are present as additives
    • B32B2264/10Inorganic particles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2264/00Composition or properties of particles which form a particulate layer or are present as additives
    • B32B2264/10Inorganic particles
    • B32B2264/102Oxide or hydroxide
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2264/00Composition or properties of particles which form a particulate layer or are present as additives
    • B32B2264/10Inorganic particles
    • B32B2264/104Oxysalt, e.g. carbonate, sulfate, phosphate or nitrate particles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2264/00Composition or properties of particles which form a particulate layer or are present as additives
    • B32B2264/10Inorganic particles
    • B32B2264/105Metal
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2264/00Composition or properties of particles which form a particulate layer or are present as additives
    • B32B2264/10Inorganic particles
    • B32B2264/107Ceramic
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2264/00Composition or properties of particles which form a particulate layer or are present as additives
    • B32B2264/12Mixture of at least two particles made of different materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2270/00Resin or rubber layer containing a blend of at least two different polymers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/20Properties of the layers or laminate having particular electrical or magnetic properties, e.g. piezoelectric
    • B32B2307/206Insulating
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/30Properties of the layers or laminate having particular thermal properties
    • B32B2307/306Resistant to heat
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/50Properties of the layers or laminate having particular mechanical properties
    • B32B2307/538Roughness
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/70Other properties
    • B32B2307/716Degradable
    • B32B2307/7163Biodegradable
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/70Other properties
    • B32B2307/732Dimensional properties
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/70Other properties
    • B32B2307/732Dimensional properties
    • B32B2307/734Dimensional stability
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/70Other properties
    • B32B2307/738Thermoformability
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2405/00Adhesive articles, e.g. adhesive tapes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2419/00Buildings or parts thereof
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00Electrical equipment
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00Electrical equipment
    • B32B2457/08PCBs, i.e. printed circuit boards
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00Electrical equipment
    • B32B2457/10Batteries
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2367/00Characterised by the use of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Derivatives of such polymers
    • C08J2367/02Polyesters derived from dicarboxylic acids and dihydroxy compounds
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
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    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/40Additional features of adhesives in the form of films or foils characterized by the presence of essential components
    • C09J2301/41Additional features of adhesives in the form of films or foils characterized by the presence of essential components additives as essential feature of the carrier layer

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Abstract

提供一種電絕緣性、散熱性及加工性優異之薄膜。更且,藉由使用該薄膜,提供導熱性優異之電絕緣片、及使用該電絕緣片之旋轉機、以及黏著帶等。其係至少一側的表面之粗大突起數SPc(4000)為15個/mm2以上之薄膜。 A thin film excellent in electrical insulation, heat dissipation and processability is provided. Furthermore, by using this film, an electrical insulating sheet excellent in thermal conductivity, a rotary machine using the electrical insulating sheet, an adhesive tape, and the like are provided. It is a thin film in which the number SPc (4000) of coarse protrusions on at least one surface is 15 pieces/mm 2 or more.

Description

薄膜及使用其之電絕緣片、黏著帶、旋轉機 Films and electrical insulating sheets, adhesive tapes, and rotary machines using the same

本發明係有關一種薄膜。而且,本發明係有關使用該薄膜之電絕緣片及黏著帶。 The present invention relates to a film. Furthermore, the present invention relates to an electrical insulating sheet and an adhesive tape using the film.

聚酯(特別是聚對酞酸乙二酯(以下稱為PET)或聚2,6-萘二甲酸乙二酯等)樹脂及聚芳硫醚(特別是聚苯硫醚(以下稱為PPS)等)樹脂之機械特性、熱特性、耐藥性、電特性及成形性優異,可在各種的用途上使用。由於該等樹脂經薄膜化之聚酯薄膜及聚芳硫醚薄膜之機械特性及電特性等優異,故使用在覆銅積層板、太陽能電池用背板、黏著帶、可撓性印刷電路基板、薄膜開關、面狀發熱體、扁平電纜、旋轉機用絕緣材料、電池用絕緣材等之電絕緣材料、磁性記錄材料、電容器用材料、包裝材料、汽車材料、建築材料、照片用途、圖像用途、熱轉印用途等之各種用途。 Polyester (especially polyethylene terephthalate (hereinafter referred to as PET) or polyethylene 2,6-naphthalate, etc.) resin and polyarylene sulfide (especially polyphenylene sulfide (hereinafter referred to as PPS) ) etc.) resins are excellent in mechanical properties, thermal properties, chemical resistance, electrical properties and moldability, and can be used in various applications. Due to the excellent mechanical properties and electrical properties of polyester films and polyarylene sulfide films made of these resins, they are used in copper-clad laminates, back sheets for solar cells, adhesive tapes, flexible printed circuit boards, Membrane switches, planar heating elements, flat cables, insulating materials for rotating machines, electrical insulating materials for batteries, etc., magnetic recording materials, materials for capacitors, packaging materials, automotive materials, building materials, photographic applications, image applications , heat transfer and other uses.

該等用途之中,旋轉機用絕緣材(例如發電機用絕緣材、車輛馬達用絕緣材、一般產業馬達用絕緣材)中,近年來,因旋轉機的小型化、高輸出,在線圈周邊已出現發熱及蓄熱之情形,因此之系統內的溫度上昇會引發旋轉機的輸出降低、功耗增加及材料壽命的降低之 問題。同樣地,即使在太陽能電池用背板材料、反射板材料、LED基板材料、電路材料、鋰離子電池材料中,因近年來的高輸出、小型化,在系統內的溫度上升已臻明顯。 Among these applications, among insulating materials for rotating machines (eg, insulating materials for generators, insulating materials for vehicle motors, and insulating materials for general industrial motors), in recent years, due to the miniaturization and high output of rotating machines, the area around coils Heat generation and heat storage have occurred, so the temperature rise in the system will cause a reduction in the output of the rotating machine, an increase in power consumption, and a reduction in the life of the material. problem. Similarly, even in solar cell backsheet materials, reflector materials, LED substrate materials, circuit materials, and lithium-ion battery materials, the temperature rise in the system has become remarkable due to recent high output and miniaturization.

因此,將內部所產生之熱傳導/散逸致外部的熱管理成為重要,因而要求一種散熱性高的薄膜。截至目前,已提議作為散熱性高的薄膜之各種材料,例如提議:在導熱性高的石墨片的單側或兩表層使層積有PET薄膜的保護層之複合式薄膜(專利文獻1)、使在雙軸延伸PET薄膜中含有纖維狀碳材料之薄膜(專利文獻2、專利文獻3)等。 Therefore, it is important to conduct/dissipate the heat generated inside and manage the heat outside, and thus a film with high heat dissipation is required. Various materials of films with high heat dissipation have been proposed so far, for example, a composite film in which a protective layer of PET film is laminated on one side or both surface layers of a graphite sheet with high thermal conductivity (Patent Document 1), A film containing a fibrous carbon material in a biaxially stretched PET film (Patent Document 2, Patent Document 3) or the like.

[先前技術文獻] [Prior Art Literature] [專利文獻] [Patent Literature]

專利文獻1:日本特開2008-80672號公報 Patent Document 1: Japanese Patent Laid-Open No. 2008-80672

專利文獻2:日本特開2013-28753號公報 Patent Document 2: Japanese Patent Application Laid-Open No. 2013-28753

專利文獻3:日本特開2013-38179號公報 Patent Document 3: Japanese Patent Laid-Open No. 2013-38179

然而,專利文獻1之技術中,除了有石墨片脆弱、加工性差之問題,亦有成為保護層之PET薄膜的導熱係數低而無法充分發揮石墨片的高散熱性之問題。而且,專利文獻2及專利文獻3之技術中,由於薄膜具有導電性,因而無法使用在要求絕緣性之用途上。而且,將薄膜材作為散熱材使用時,提高與欲散熱處之界面密接 ,以降低界面的熱阻為重要,為了提高界面密接,會有隔著接著劑及清漆、油脂、黏著材之所謂的界面填充材而組裝在機器內的情形。然而,專利文獻1~3之薄膜,因表面平滑而使界面填充材與薄膜之接觸表面積變小,其結果在界面之熱阻變大,而有無法發揮充分的散熱性之情形。 However, in the technique of Patent Document 1, in addition to the problems that the graphite sheet is fragile and the workability is poor, the thermal conductivity of the PET film serving as the protective layer is low, and the high heat dissipation property of the graphite sheet cannot be fully exerted. Moreover, in the technique of patent document 2 and patent document 3, since a thin film has electroconductivity, it cannot be used for the application which requires insulation. In addition, when the film material is used as a heat dissipation material, the adhesion to the interface of the place to be dissipated can be improved. , It is important to reduce the thermal resistance of the interface, and in order to improve the interface adhesion, it may be assembled in the machine through the so-called interface filler such as adhesive, varnish, grease, and adhesive. However, the thin films of Patent Documents 1 to 3 have a smooth surface, so that the contact surface area between the interface filler and the thin film is reduced, and as a result, the thermal resistance at the interface increases, and sufficient heat dissipation may not be exhibited.

因此,本發明之課題係提供一種電絕緣性、散熱性及加工性優異之薄膜。 Therefore, an object of the present invention is to provide a thin film excellent in electrical insulating properties, heat dissipation properties, and processability.

為了解決上述課題,本發明之構成如下。 In order to solve the above-mentioned problems, the present invention is constituted as follows.

(1)一種薄膜,其係至少一側的表面之粗大突起數SPc(4000)為15個/mm2以上之薄膜。 (1) A thin film in which the number of coarse projections SPc (4000) on at least one surface is 15 pieces/mm 2 or more.

(2)如(1)記載之薄膜,其中在薄膜具有包含無機粒子之層(P1層),當P1層中之無機粒子的含量設為Vf1(體積%)、P1層中之空隙率設為Va(體積%)時,Va/Vf1為1以下。 (2) The thin film according to (1), wherein the thin film has a layer (P1 layer) containing inorganic particles, when the content of the inorganic particles in the P1 layer is Vf1 (volume %), and the porosity in the P1 layer is set as In the case of Va (volume %), Va/Vf1 is 1 or less.

(3)如(2)記載之薄膜,其中在P1層以垂直於薄膜面方向且平行於薄膜長度方向的方式切取之剖面中,當每10000μm2存在之無機粒子數為Nf(個)時,Nf/Vf1為25以下。 (3) (2) film according to of which in cross-section in a manner perpendicular to the film plane direction and parallel to the film longitudinal direction of cut of the P1 layer, when 2 Number of the inorganic particles per 10000μm existence of Nf of (a), Nf/Vf1 is 25 or less.

(4)如(2)或(3)記載之薄膜,其中在P1層以垂直於薄膜面方向且平行於薄膜長度方向的方式切取之剖面中,無機粒子之平均等效圓直徑為3μm以上。 (4) The thin film according to (2) or (3), wherein the average equivalent circle diameter of the inorganic particles is 3 μm or more in a cross section of the P1 layer taken perpendicular to the thin film surface direction and parallel to the thin film longitudinal direction.

(5)如(1)~(4)中任一項記載之薄膜,其中薄膜具有包含無機粒子之層(P1層),就薄膜之厚度設為T(μm)且該粗大突起數SPc(4000)為15個/mm2以上之表面而言,當從 該表面至該厚度0.1T為止之範圍的無機粒子含量設為Vfa(體積%)、從該厚度0.1T至該厚度0.9T為止之範圍的無機粒子含量設為Vfb(體積%)時,滿足Vfa/Vfb為0≦Vfa/Vfb<1。 (5) The thin film according to any one of (1) to (4), wherein the thin film has a layer (P1 layer) containing inorganic particles, the thickness of the thin film is set to T (μm), and the number of coarse protrusions SPc (4000 ) is 15/mm 2 or more, when the inorganic particle content in the range from the surface to the thickness 0.1T is Vfa (volume %), and the range from the thickness 0.1T to the thickness 0.9T When the content of the inorganic particles is Vfb (volume %), Vfa/Vfb satisfies 0≦Vfa/Vfb<1.

(6)如(1)~(5)中任一項記載之薄膜,其中薄膜之厚度方向的導熱係數為0.15W/mK以上,且表面比電阻為1013Ω/□以上。 (6) The thin film according to any one of (1) to (5), wherein the thermal conductivity in the thickness direction of the thin film is 0.15 W/mK or more, and the surface specific resistance is 10 13 Ω/□ or more.

(7)如(1)~(6)中任一項記載之薄膜,其中薄膜係以聚酯樹脂為主成分。 (7) The film according to any one of (1) to (6), wherein the film is mainly composed of a polyester resin.

(8)如(1)~(7)中任一項記載之薄膜,其中該粗大突起數SPc(4000)為15個/mm2以上之表面的表面粗糙度Ra係100nm以上。 (8) The thin film according to any one of (1) to (7), wherein the surface roughness Ra of the surface where the number of coarse protrusions SPc(4000) is 15 pieces/mm 2 or more is 100 nm or more.

(9)一種電絕緣片,其係使用如(1)~(8)中任一項記載之薄膜而成。 (9) An electrical insulating sheet using the thin film according to any one of (1) to (8).

(10)一種黏著帶,其係使用如(1)~(8)中任一項記載之薄膜而成。 (10) An adhesive tape obtained by using the film according to any one of (1) to (8).

(11)一種旋轉機,其係使用(9)記載之電絕緣片而成。 (11) A rotating machine using the electrical insulating sheet described in (9).

依據本發明,即可提供一種電絕緣性、散熱性及加工性較以往之薄膜優異的薄膜,該薄膜可適當地應用在覆銅積層板、太陽能電池用背板、黏著帶、可撓性印刷電路基板、薄膜開關、面狀發熱體、扁平電纜、旋轉機用絕緣材料、電池用絕緣材料等之重視電絕緣性與散熱性之用途。而且,亦可發揮薄膜之表面特性而使用在黏著帶、離型膜、轉印膜、設計片、建築材料等。 According to the present invention, it is possible to provide a film which is superior in electrical insulation, heat dissipation and processability than conventional films, and the film can be suitably used in copper clad laminates, back sheets for solar cells, adhesive tapes, flexible printing Circuit boards, membrane switches, planar heating elements, flat cables, insulating materials for rotating machines, insulating materials for batteries, etc., where electrical insulation and heat dissipation are important. In addition, it can also be used in adhesive tapes, release films, transfer films, design sheets, building materials, etc. by taking advantage of the surface properties of the film.

1‧‧‧長度(l) 1‧‧‧Length (l)

2‧‧‧寬度(b) 2‧‧‧Width (b)

3‧‧‧厚度(t) 3‧‧‧Thickness (t)

4‧‧‧模具的凸部 4‧‧‧Protrusion of the mold

5‧‧‧模具的凹部 5‧‧‧Concave part of mold

X‧‧‧模具凸部的節距 X‧‧‧Pitch of die protrusions

Y‧‧‧模具凸部的寬度 Y‧‧‧Width of die protrusion

Z‧‧‧模具凸部的高度 Z‧‧‧The height of the die protrusion

[圖1]示意地顯示以外接長方體包圍粒子之一例的圖。 [ Fig. 1] Fig. 1 is a diagram schematically showing an example of a particle surrounded by a circumscribed rectangular parallelepiped.

[圖2]示意地顯示模具形狀之一例的圖。 [ Fig. 2 ] A diagram schematically showing an example of a mold shape.

[實施發明之形態] [Form of implementing the invention]

本發明之薄膜,其至少一側之表面的SPc(4000)必須為15個/mm2以上。SPc係表示表面粗糙度之指標。本發明中,SPc(4000)係由後述測定方法而求得,係呈示每基準面積存在之4000nm以上的突起數者。所謂SPc(4000)為15個/mm2以上者,係表示在薄膜表面具有一定數以上之大的突起者。至少一側之表面的SPc(4000)在上述範圍內者,藉此而增加界面之表面積,而可有效地散熱。更佳為30個/mm2以上,進一步較佳為50個/mm2以上。SPc(4000)未達15個/mm2時,由於薄膜與界面填充材之接觸面積變小,會有在界面的熱傳遞受到限制之情形。SPc(4000)之上限並無特別限制,惟為了防止因突起間隔變的過小而阻礙界面填充材的充填,故較佳為1000個/mm2以下,更佳為800個/mm2以下。 In the film of the present invention, SPc(4000) on at least one surface of the film must be 15 pieces/mm 2 or more. SPc is an index representing surface roughness. In the present invention, SPc(4000) is determined by the measurement method described later, and represents the number of protrusions of 4000 nm or more per reference area. When SPc(4000) is 15 pieces/mm 2 or more, it means that there are a certain number or more of large protrusions on the film surface. The SPc (4000) of the surface of at least one side is within the above-mentioned range, thereby increasing the surface area of the interface and effectively dissipating heat. More preferably, it is 30 pieces/mm 2 or more, and still more preferably 50 pieces/mm 2 or more. When the SPc (4000) is less than 15 pieces/mm 2 , the contact area between the film and the interface filler becomes smaller, and the heat transfer at the interface may be limited. The upper limit of SPc(4000) is not particularly limited, but in order to prevent the interfacial filler from being hindered due to the excessively small protrusion interval, it is preferably 1000 pieces/mm 2 or less, more preferably 800 pieces/mm 2 or less.

為了將薄膜表面之SPc(4000)設在上述範圍之方法並無特別限定,例如可列舉:使薄膜含有無機粒子之方法、使用細微的凹凸形狀之模具以SPc(4000)在上述範圍內之方式在薄膜表面施行加工之方法等。另外,以使薄膜含有無機粒子之方法,為了將薄膜表面之 SPc(4000)設在上述範圍,須使含有高濃度之粒徑大的粒子,然以使薄膜含有無機粒子之方法而將薄膜表面之SPc(4000)設在上述範圍時,將無機粒子之種類或表面活性、含量進行控制、或控制延伸條件下,以粒子滑落、或在無機粒子界面發生界面剝離進行抑制者為佳。 The method for setting the SPc(4000) on the surface of the film within the above-mentioned range is not particularly limited, but for example, a method of making the film contain inorganic particles, a method of using a mold with fine concavo-convex shapes so that the SPc(4000) is within the above-mentioned range can be mentioned. A method of processing the film surface, etc. In addition, in the method of making the thin film contain inorganic particles, in order to make the thin film surface When SPc (4000) is set in the above range, it is necessary to contain particles with a high concentration and large particle size. However, when the SPc (4000) on the surface of the thin film is set in the above range by the method of containing inorganic particles in the thin film, the type of inorganic particles It is preferable to control the surface activity and content, or control the elongation conditions to suppress particle slippage or interfacial exfoliation at the interface of inorganic particles.

本發明中,成為薄膜之主成分的樹脂並無特別限定,作為較佳之例係可列舉如:(i)聚對酞酸乙二酯、聚2,6-萘二甲酸乙二酯、聚對酞酸丙二酯、聚對酞酸丁二酯等之聚酯樹脂;(ii)脂肪族聚酯樹脂、脂肪族芳香族聚酯、多醣類、包含澱粉之聚合物等之生物分解性樹脂;(iii)聚(甲基)丙烯酸酯等之丙烯酸系樹脂;(iv)聚乙烯、聚丙烯、聚甲基戊烯、聚異戊二烯、環氧改質聚烯烴、酸改質聚烯烴、脂環式聚烯烴樹脂等之聚烯烴系樹脂;(v)聚醯胺系樹脂、聚碳酸酯、聚苯乙烯、聚醚、聚酯醯胺、聚醚酯、聚氯乙烯、聚乙烯醇、聚縮醛、聚芳硫醚、聚醚醚酮、聚胺甲酸酯、聚碸、聚芳氧化物、聚醯亞胺、聚醚醯亞胺、聚酯彈性體、聚醯胺彈性體、聚烯烴彈性體等之其它樹脂;(vi)環氧樹脂、不飽和聚酯樹脂等之硬化性樹脂經硬化而得者及將該等作為成分之共聚物、或者該等之混合物等。其中,以成膜性、耐熱性及尺寸安定性等優異之聚酯樹脂及聚芳硫醚樹脂等特別適用,更佳者係使用成膜性及加工性優異之聚酯樹脂。另外,本發明中,在表示「主成分」時,呈示該成分在全部成分中所佔比例為50體積%以上,以60體積%以上者為佳。 In the present invention, the resin that becomes the main component of the film is not particularly limited, and preferred examples include: (i) polyethylene terephthalate, polyethylene 2,6-naphthalate, polyethylene terephthalate, and polyethylene terephthalate. Polyester resins of propylene phthalate, polybutylene terephthalate, etc.; (ii) Biodegradable resins of aliphatic polyester resins, aliphatic aromatic polyesters, polysaccharides, polymers containing starch, etc. ; (iii) acrylic resins such as poly(meth)acrylates; (iv) polyethylene, polypropylene, polymethylpentene, polyisoprene, epoxy-modified polyolefin, acid-modified polyolefin , alicyclic polyolefin resin and other polyolefin resins; (v) polyamide resin, polycarbonate, polystyrene, polyether, polyesteramide, polyetherester, polyvinyl chloride, polyvinyl alcohol , polyacetal, polyarylene sulfide, polyether ether ketone, polyurethane, polyamide, polyaryloxide, polyimide, polyetherimide, polyester elastomer, polyamide elastomer , other resins such as polyolefin elastomers; (vi) hardening resins such as epoxy resins, unsaturated polyester resins and other hardening resins, and copolymers or mixtures of these as components. Among them, polyester resins and polyarylene sulfide resins which are excellent in film-forming properties, heat resistance and dimensional stability are particularly suitable, and polyester resins which are excellent in film-forming properties and processability are more preferably used. In addition, in this invention, when expressing "main component", it shows that the ratio of this component in all components is 50 volume% or more, Preferably it is 60 volume% or more.

本發明中,聚酯係表示由主要構成成分具有二羧酸構成成分與二元醇構成成分所成之樹脂。本發明中使用之聚酯方面,係依據JIS K-7122(1987),以升溫速度20℃/分鐘,將樹脂以20℃/分鐘之升溫速度從25℃加熱(第1次運行)至300℃,以該狀態維持5分鐘之後,接著以成為25℃以下之方式驟冷,再以20℃/分鐘之升溫速度從25℃升溫至300℃而得的第2次運行之差示掃描量熱圖中,以由熔解峰之峰面積求得之結晶熔解熱量△Hm為15J/g以上之樹脂為佳。結晶熔解熱量△Hm更佳為20J/g以上,尤佳為25J/g以上,特佳為30J/g以上。藉由使用如此之聚酯,在後述之製造方法中,容易配向/結晶,可作成高耐熱之薄膜。另外,本說明書中,構成成分為聚酯時,呈示可經水解而得到的最小單元。而且,本說明書中,在表現「主要構成成分」時,該構成成分在全部構成成分中所佔的比率為80莫耳%以上,較佳為90莫耳%以上,更佳為95莫耳%以上。 In the present invention, polyester refers to a resin comprising a dicarboxylic acid constituent and a dihydric alcohol constituent as main constituents. The polyester used in the present invention is based on JIS K-7122 (1987), and the resin is heated at a temperature increase rate of 20°C/min from 25°C (first run) to 300°C at a temperature increase rate of 20°C/min. , after maintaining in this state for 5 minutes, then quenching so that it becomes below 25°C, and then increasing the temperature from 25°C to 300°C at a temperature increase rate of 20°C/min. Differential scanning calorimetry of the second operation Among them, a resin whose crystal fusion heat ΔHm obtained from the peak area of the melting peak is 15 J/g or more is preferable. The crystal fusion heat ΔHm is more preferably 20 J/g or more, particularly preferably 25 J/g or more, and particularly preferably 30 J/g or more. By using such a polyester, in the production method described later, alignment and crystallization are easy, and a film with high heat resistance can be produced. In addition, in this specification, when a structural component is a polyester, the minimum unit which can be obtained by hydrolysis is shown. Furthermore, in this specification, when expressing "main constituent", the ratio of the constituent to all constituents is 80 mol % or more, preferably 90 mol % or more, more preferably 95 mol % above.

上述構成聚酯之二羧酸構成成分方面,可列舉如:丙二酸、丁二酸、戊二酸、己二酸、辛二酸、癸二酸、十二烷二酸、二聚物酸、二十烷二酸、庚二酸、壬二酸、甲基丙二酸、乙基丙二酸等之脂肪族二羧酸類;金剛烷二羧酸、降莰烯二羧酸、異山梨醇、環己烷二羧酸、十氫萘二羧酸等之脂環族二羧酸類;對酞酸、異酞酸、酞酸、1,4-萘二羧酸、1,5-萘二羧酸、2,6-萘二羧酸、1,8-萘二羧酸、4,4'-二苯基二羧酸、4,4'-二苯基醚二羧酸、5-鈉磺酸基異酞酸、蒽二羧酸、菲二羧酸、9,9'- 雙(4-羧基苯基)茀酸等之芳香族二羧酸、或其酯衍生物,惟並不限於該等。而且,亦可使用在上述各種羧酸構成成分之羧基末端,將l-交酯、d-交酯、羥基苯甲酸等之含氧酸類,及其衍生物,及含氧酸連續複數者等加成而得者。而且,該等係可單獨使用,亦可因應所需而使用複數種。 The above-mentioned dicarboxylic acid constituting the polyester includes, for example, malonic acid, succinic acid, glutaric acid, adipic acid, suberic acid, sebacic acid, dodecanedioic acid, dimer acid , Aliphatic dicarboxylic acids such as eicosanedioic acid, pimelic acid, azelaic acid, methylmalonic acid, ethylmalonic acid, etc.; adamantane dicarboxylic acid, norbornene dicarboxylic acid, isosorbide , cyclohexanedicarboxylic acid, decahydronaphthalene dicarboxylic acid and other alicyclic dicarboxylic acids; terephthalic acid, isophthalic acid, phthalic acid, 1,4-naphthalene dicarboxylic acid, 1,5-naphthalene dicarboxylic acid Acid, 2,6-naphthalenedicarboxylic acid, 1,8-naphthalenedicarboxylic acid, 4,4'-diphenyldicarboxylic acid, 4,4'-diphenyl ether dicarboxylic acid, 5-sodium sulfonic acid isophthalic acid, anthracene dicarboxylic acid, phenanthrene dicarboxylic acid, 9,9'- Aromatic dicarboxylic acids such as bis(4-carboxyphenyl)fornic acid, or ester derivatives thereof, are not limited to these. In addition, oxyacids such as l-lactide, d-lactide, hydroxybenzoic acid, and derivatives thereof, and oxyacids in consecutive plurals, etc., can also be used at the carboxyl terminus of the above-mentioned various carboxylic acid constituents. Achievers. In addition, these systems may be used alone, or a plurality of types may be used as required.

又,上述構成聚酯之二元醇構成成分方面,可列舉如:乙二醇、1,2-丙二醇、1,3-丙二醇、1,4-丁二醇、1,2-丁二醇、1,3-丁二醇等之脂肪族二元醇類;環己烷二甲醇、螺甘油、異山梨醇等之脂環式二元醇類;雙酚A、1,3-苯二甲醇、1,4-苯二甲醇、9,9'-雙(4-羥基苯基)茀、芳香族二元醇類等之二元醇、上述二元醇複數個連續者等之例,惟並不限於該等。而且,該等係可單獨使用,亦可因應所需而使用複數種。 In addition, the above-mentioned diol constituents constituting the polyester include ethylene glycol, 1,2-propanediol, 1,3-propanediol, 1,4-butanediol, 1,2-butanediol, Alicyclic diols such as 1,3-butanediol; alicyclic diols such as cyclohexanedimethanol, spiroglycerol, isosorbide, etc.; bisphenol A, 1,3-benzenedimethanol, Examples of diols such as 1,4-benzenedimethanol, 9,9'-bis(4-hydroxyphenyl) fluoride, aromatic diols, and a plurality of the above-mentioned diols in succession, etc., are not limited to such. In addition, these systems may be used alone, or a plurality of types may be used as required.

而且,本發明之薄膜中,主成分為聚酯樹脂時,全部二羧酸構成成分中之芳香族二羧酸構成成分之比率較佳為90莫耳%以上100莫耳%以下。更佳為95莫耳%以上100莫耳%以下。又更佳為98莫耳%以上100莫耳%以下,特佳為99莫耳%以上100莫耳%以下,最佳為100莫耳%,亦即,二羧酸構成成分之全部可為芳香族羧酸構成成分。未達90莫耳%時,會有耐熱性降低的情形。全部二羧酸構成成分中之芳香族二羧酸構成成分的比率為90莫耳%以上100莫耳%以下時,在後述製造方法中,容易成為配向/結晶化,可作成耐熱性高的薄膜。 Furthermore, in the film of the present invention, when the main component is a polyester resin, the ratio of the aromatic dicarboxylic acid constituent in all the dicarboxylic acid constituents is preferably 90 mol % or more and 100 mol % or less. More preferably, it is 95 mol% or more and 100 mol% or less. Still more preferably 98 mol % or more and 100 mol % or less, particularly preferably 99 mol % or more and 100 mol % or less, and most preferably 100 mol %, that is, all the components of the dicarboxylic acid can be aromatic. carboxylic acid constituents. If it is less than 90 mol%, the heat resistance may decrease. When the ratio of the aromatic dicarboxylic acid constituent among all the dicarboxylic acid constituents is 90 mol % or more and 100 mol % or less, alignment and crystallization are likely to occur in the production method described later, and a film with high heat resistance can be produced. .

本發明之薄膜中,主成分為聚酯樹脂時,由 二羧酸構成成分與二元醇構成成分所構成之重複單元係可適合使用由對酞酸乙二酯、乙烯-2,6-萘二羧酸酯、對酞酸丙二酯、對酞酸丁二酯、對酞酸1,4-環己烯二亞甲酯、乙烯-2,6-萘二羧酸酯所構成者,以該等成為主要重複單元者為佳。另外,此處所謂的主要重複單元係指,上述重複單元之合計為全部重複單元的80莫耳%以上,以90莫耳%以上為佳,以95莫耳%以上更佳之重複單元。更且,從成本及聚合的容易度,及耐熱性之觀點,以對酞酸乙二酯、乙烯-2,6-萘二羧酸酯為主要重複單元者為佳。此時,將對酞酸乙二酯作為主要重複單元使用時,可得到更便宜且有通用性之具有耐熱性的薄膜,而且,將乙烯-2,6-萘二羧酸酯作為主要重複單元使用時,可作成耐熱性更為優異之薄膜。 In the film of the present invention, when the main component is polyester resin, the As the repeating unit system composed of the dicarboxylic acid constituent and the diol constituent, ethylene terephthalate, ethylene-2,6-naphthalene dicarboxylate, propylene terephthalate, terephthalic acid can be suitably used. Those composed of butanediester, 1,4-cyclohexene dimethylene terephthalate, and ethylene-2,6-naphthalenedicarboxylate are preferred as the main repeating unit. In addition, the main repeating unit referred to here refers to a repeating unit in which the total of the repeating units is 80 mol% or more, preferably 90 mol% or more, and more preferably 95 mol% or more of all repeating units. Furthermore, from the viewpoints of cost, ease of polymerization, and heat resistance, those having ethylene terephthalate and ethylene-2,6-naphthalene dicarboxylate as main repeating units are preferred. In this case, when ethylene terephthalate is used as the main repeating unit, a film with heat resistance that is cheaper and versatile can be obtained, and ethylene-2,6-naphthalene dicarboxylate is used as the main repeating unit When used, it can be made into a film with better heat resistance.

藉由適當地組合上述構成成分(二羧酸與二元醇)並使其縮聚,可得到聚酯,惟以具有3個以上羧基及/或羥基之構成成分等共聚者亦佳。此時,相對於聚酯之全部構成成分,具有3個以上羧基及/或羥基之構成成分的共聚率為0.005莫耳%以上2.5莫耳%以下者,因可提高薄膜的延伸性而佳。 A polyester can be obtained by appropriately combining and polycondensing the above constituents (dicarboxylic acid and diol), but a constituent having three or more carboxyl groups and/or hydroxyl groups or the like is also preferred. In this case, it is preferable that the copolymerization ratio of the constituents having 3 or more carboxyl groups and/or hydroxyl groups is 0.005 mol% or more and 2.5 mol% or less with respect to all the constituent components of the polyester, since the stretchability of the film can be improved.

本發明之薄膜中,主成分為聚酯樹脂時,聚酯之固有黏度(以下;IV)係以0.6以上者為佳。更佳為0.65以上,又更佳為0.68以上,特佳為0.7以上。IV較小時,含有後述無機粒子時,分子間之纏合變過少而有無法得到機械物性、或經時的機械特性容易劣化,或容易脆化之情形。本發明之薄膜中,藉由將聚酯之IV作成0.6以上 ,可得到高的機械特性與高的耐久性。另外,IV之上限並無特別確定,而有因聚合時間增長而不利於成本、或熔融擠出變的困難之情形。因此,較佳為1.0以下,更佳為0.9以下。 In the film of the present invention, when the main component is a polyester resin, the intrinsic viscosity (hereinafter; IV) of the polyester is preferably 0.6 or more. More preferably, it is 0.65 or more, still more preferably 0.68 or more, and particularly preferably 0.7 or more. When the IV is small, and when inorganic particles described below are contained, the entanglement between molecules becomes too small, and mechanical properties cannot be obtained, or mechanical properties over time tend to deteriorate, or brittleness tends to occur. In the film of the present invention, by setting the IV of the polyester to be 0.6 or more , high mechanical properties and high durability can be obtained. In addition, the upper limit of IV is not particularly determined, but there is a case where cost is disadvantageous due to an increase in polymerization time, or melt extrusion becomes difficult. Therefore, 1.0 or less is preferable, and 0.9 or less is more preferable.

而且,為了得到上述IV之聚酯,係有通過熔融聚合而在成為既定之熔融黏度之時點進行吐出、股束化、切削,並經小片化而得之方法、與以低於目標之固有黏度暫予小片化,其後進行固相聚合而得之方法。該等之中,尤其以IV為0.65以上時,可抑制熱劣化,且可降低羧基末端基數之觀點,以使用以低於目標之固有黏度暫予小片化,其後進行固相聚合而得之方法為佳。而且,在後述方法中,使在聚酯中含有無機粒子時進行固相聚合者,因可進一步提高薄膜之IV而佳。其結果,使在聚酯中含有無機粒子而在後述之製造方法中進行製膜時,因可抑制過度的結晶化而提高延伸性,提高所得薄膜之機械特性。 Furthermore, in order to obtain the polyester of the above-mentioned IV, there are methods of discharging, bundling, cutting, and pelletizing by melt polymerization at a point when the melt viscosity reaches a predetermined melt viscosity, and a method of obtaining an inherent viscosity lower than the target. A method obtained by temporarily forming small pieces and then performing solid-phase polymerization. Among them, in particular, when the IV is 0.65 or more, thermal degradation can be suppressed and the number of carboxyl terminal groups can be reduced. It is obtained by temporarily forming small pieces with an intrinsic viscosity lower than the target, and then performing solid-phase polymerization. method is better. Furthermore, in the method described later, solid-phase polymerization is performed when the polyester contains inorganic particles, since the IV of the film can be further improved. As a result, when an inorganic particle is contained in polyester and a film is formed in the production method described later, excessive crystallization can be suppressed, so that the stretchability can be improved, and the mechanical properties of the obtained film can be improved.

本發明之薄膜中,主成分為聚酯樹脂時,聚酯之熔點Tm係以240℃以上290℃以下者為佳。此處所提及之熔點Tm係經由DSC而得之升溫過程(升溫速度:20℃/分鐘)中的熔點Tm,經由根據JIS K-7121(1987)之方法,以20℃/分鐘之升溫速度從25℃加熱(第1次運行)至300℃,以該狀態維持5分鐘,接著以成為25℃以下之方式驟冷,再以20℃/分鐘之升溫速度從25℃升溫至300℃所得第2次運行的結晶熔解峰之峰頂溫度作成聚酯之熔點Tm。熔點Tm更佳為245℃以上275℃以下,又更佳為 250℃以上265℃以下。熔點Tm未達240℃時,會有薄膜之耐熱性低劣之情形而不佳,而且,熔點Tm超過290℃時,會有擠出加工變的困難之情形而不佳。 In the film of the present invention, when the main component is a polyester resin, the melting point Tm of the polyester is preferably 240°C or higher and 290°C or lower. The melting point Tm mentioned here is the melting point Tm in the heating process (heating rate: 20°C/min) obtained by DSC, by the method according to JIS K-7121 (1987), at a temperature increase rate of 20°C/min Heating from 25°C (1st operation) to 300°C, maintaining this state for 5 minutes, then quenching so as to be 25°C or lower, and heating from 25°C to 300°C at a temperature increase rate of 20°C/min. The temperature at the top of the crystal melting peak of the two runs was taken as the melting point Tm of the polyester. The melting point Tm is more preferably 245°C or higher and 275°C or lower, and more preferably Above 250°C and below 265°C. When the melting point Tm is less than 240°C, the heat resistance of the film may be inferior, which is undesirable, and when the melting point Tm exceeds 290°C, extrusion processing may become difficult, which is undesirable.

本發明之薄膜中,主成分為聚酯樹脂時,聚酯之羧基末端基數以40當量/t以下者為佳。更佳為30當量/t以下,進一步較佳為20當量/t以下。羧基末端基數高時,即使控制構造,亦有因源自羧基末端基之質子的觸媒作用強而促進水解或熱分解,薄膜之劣化更容易進行之情形。藉由使羧基末端基數成為上述範圍,可成為抑制如水解或熱分解之劣化的薄膜。而且,為了使羧基末端基數成為40當量/t以下時,可藉由使用以下所得之聚酯而得:1)使二羧酸構成成分與二元醇構成成分進行酯化反應,在通過熔融聚合而成為既定的熔融黏度之時點進行吐出、股束化、切削,並經小片化之後,進行固相聚合之方法;2)在自酯交換反應或酯化反應結束後至縮聚反應初期(固有黏度小於0.3)為止之期間,添加緩衝劑之方法,等之組合等。而且,亦可藉由在成形時添加緩衝劑或封端劑而得。封端劑係指使聚酯之羧基末端基或羥基末端基反應而鍵結,使源自末端基之質子的觸媒活性消失之化合物之意,具體而言,可列舉:具有

Figure 106110684-A0202-12-0011-7
唑啉基、環氧基、碳二亞胺基、異氰酸酯基等之取代基的化合物等。在使用耐水解劑時,相對於聚酯總量,較佳為含有0.01質量%以上。更佳為0.1質量%以上。藉由組合上述聚酯並添加耐水解劑,可抑制因無機粒子添加所致之聚酯之劣化,可進一步提高機械特性、耐熱性。而且, 從過剩之耐水解劑會降低阻燃性情形之觀點來看,耐水解劑之含量上限較佳為2質量%以下,更佳為1質量%以下,進一步較佳為0.8質量%以下。 In the film of the present invention, when the main component is a polyester resin, the number of carboxyl end groups of the polyester is preferably 40 equivalents/t or less. More preferably, it is 30 equivalents/t or less, and still more preferably 20 equivalents/t or less. When the number of carboxyl terminal groups is high, even if the structure is controlled, hydrolysis or thermal decomposition may be promoted due to the strong catalytic action of protons derived from the carboxyl terminal groups, and the deterioration of the film may be more likely to proceed. By making the number of carboxyl terminal groups into the above-mentioned range, it is possible to obtain a thin film that suppresses deterioration such as hydrolysis or thermal decomposition. In addition, in order to make the number of carboxyl terminal groups to be 40 equivalents/t or less, it can be obtained by using a polyester obtained as follows: 1) The dicarboxylic acid constituent and the diol constituent are subjected to an esterification reaction, and then by melt polymerization When the melt viscosity reaches a predetermined point, it is discharged, bundled, and cut, and after small pieces, it is a method of solid-phase polymerization; During the period of less than 0.3), the method of adding a buffer, a combination of the like, etc. Furthermore, it can also be obtained by adding a buffer or an end-capping agent at the time of molding. The terminal-capping agent means a compound that reacts and bonds with a carboxyl terminal group or a hydroxyl terminal group of the polyester, so that the catalytic activity of the proton derived from the terminal group disappears. Specifically, there are exemplified:
Figure 106110684-A0202-12-0011-7
Substituent compounds of oxazoline group, epoxy group, carbodiimide group, isocyanate group, etc., etc. When using a hydrolysis-resistant agent, it is preferable to contain 0.01 mass % or more with respect to the total amount of polyester. More preferably, it is 0.1 mass % or more. By combining the above-mentioned polyester and adding a hydrolysis-resistant agent, the deterioration of the polyester due to the addition of inorganic particles can be suppressed, and the mechanical properties and heat resistance can be further improved. Furthermore, the upper limit of the content of the hydrolysis resistance agent is preferably 2 mass % or less, more preferably 1 mass % or less, and still more preferably 0.8 mass % or less, from the viewpoint that the excessive hydrolysis resistance agent reduces the flame retardancy.

本發明之薄膜在具有包含無機粒子之層(P1層),且將P1層中之無機粒子含量設為Vf1(體積%)、P1層中之孔隙率設為Va(體積%)時,Va/Vf1係以1以下者為佳。其中所謂的無機粒子含量Vf1(體積%)係經由後述之測定方法而求得者,在將P1層以垂直於薄膜面方向且平行於薄膜長度方向的方式切取之剖面的剖面SEM圖像內,求取薄膜之剖面積中所佔的無機粒子之面積比率。而且,此處所謂的孔隙率Va(體積%)係由後述測定方法而求得者,在將P1層以垂直於薄膜面方向且平行於薄膜長度方向的方式切取之剖面的剖面SEM圖像內,薄膜之剖面積中所佔的空隙之面積比率,求取其比率。Va/Vf1更佳為0.8以下,又更佳為0.6以下。Va/Vf1超過1時,薄膜中之導熱係數低之空氣居多,其結果係薄膜之散熱性降低。Va/Vf1之下限為0。本發明之薄膜中,藉由將Va/Vf1設為1以下,可得到高散熱性。 When the thin film of the present invention has a layer (P1 layer) containing inorganic particles, and the inorganic particle content in the P1 layer is Vf1 (volume %), and the porosity in the P1 layer is Va (volume %), Va/ Vf1 series is preferably less than 1. The so-called inorganic particle content Vf1 (volume %) is obtained by the measurement method described later, and in the cross-sectional SEM image of the cross-section of the P1 layer taken perpendicular to the film surface direction and parallel to the film longitudinal direction, The area ratio of the inorganic particles occupied in the cross-sectional area of the thin film was obtained. In addition, the porosity Va (volume %) referred to here is obtained by the measurement method described later, in the cross-sectional SEM image of the cross-section of the P1 layer taken perpendicular to the film surface direction and parallel to the film longitudinal direction. , the ratio of the area of the void occupied in the cross-sectional area of the film, to obtain the ratio. Va/Vf1 is more preferably 0.8 or less, and still more preferably 0.6 or less. When Va/Vf1 exceeds 1, the air with low thermal conductivity in the film is mostly, and as a result, the heat dissipation property of the film is lowered. The lower limit of Va/Vf1 is 0. In the thin film of the present invention, high heat dissipation can be obtained by setting Va/Vf1 to be 1 or less.

本發明之薄膜中,主成分為聚酯樹脂時,由於Va/Vf1為1以下,故在無機粒子之表面以使用含有與聚酯具反應性之取代基(以下稱為反應性取代基)者為佳。此處所謂的反應性取代基係可與聚酯之羧基末端基或羥基末端基反應而鍵結之取代基,具體而言,可列舉:

Figure 106110684-A0202-12-0012-8
唑啉基、環氧基、碳二亞胺基、異氰酸酯基、酸酐基等之取代基。尤其是,當從與聚酯之反應性高,且形成之 鍵結的耐熱性高之觀點來看,特佳為環氧基。尤其是,在無機粒子之表面具有反應性取代基時,在聚酯與無機粒子之混練時形成鍵結,因而形成強固的界面,故在後述延伸步驟中,可抑制聚酯與無機粒子界面之界面剝離。 In the film of the present invention, when the main component is a polyester resin, since Va/Vf1 is 1 or less, one containing a substituent reactive with polyester (hereinafter referred to as a reactive substituent) is used on the surface of the inorganic particles. better. The so-called reactive substituent here is a substituent which can react with a carboxyl terminal group or a hydroxyl terminal group of the polyester to be bonded, and specifically, it can be exemplified:
Figure 106110684-A0202-12-0012-8
Substituents of oxazoline group, epoxy group, carbodiimide group, isocyanate group, acid anhydride group, etc. In particular, an epoxy group is particularly preferred from the viewpoint of high reactivity with polyester and high heat resistance of the formed bond. In particular, when the surfaces of the inorganic particles have reactive substituents, bonds are formed during the kneading of the polyester and the inorganic particles, thereby forming a strong interface. Therefore, in the extension step described later, the interface between the polyester and the inorganic particles can be suppressed. Interface peeling.

本發明之薄膜中,無機粒子之每單位表面積的反應性取代基之量較佳為0.2×10-6mol/m2以上1.4×10-4mol/m2以下。更佳為1×10-5mol/m2以上×10-4mol/m2以下,又更佳為1.3×10-5mol/m2以上5×10-5mol/m2以下。低於0.2×10-6mol/m2時,聚酯與無機粒子之間的鍵結變得不充分,在延伸時引起明顯的界面剝離,結果會降低導熱係數。而且,超過1.4×10-4mol/m2時,鍵結量變得過多而降低延伸性。本發明之薄膜中,藉由無機粒子之每單位表面積的反應性取代基之量成為0.2×10-6mol/m2以上1.4×10-4mol/m2以下,可兼具有導熱性及延伸性。 In the thin film of the present invention, the amount of the reactive substituent per unit surface area of the inorganic particles is preferably 0.2×10 -6 mol/m 2 or more and 1.4×10 -4 mol/m 2 or less. More preferably, it is 1 × 10 -5 mol/m 2 or more × 10 -4 mol/m 2 or less, and still more preferably 1.3 × 10 -5 mol/m 2 or more and 5 × 10 -5 mol/m 2 or less. Below 0.2 × 10 -6 mol/m 2 , the bonding between the polyester and the inorganic particles becomes insufficient, causing significant interfacial peeling during elongation, resulting in a decrease in thermal conductivity. Furthermore, when it exceeds 1.4×10 -4 mol/m 2 , the amount of bonding becomes too large and the elongation decreases. In the thin film of the present invention, since the amount of the reactive substituent per unit surface area of the inorganic particles is 0.2×10 -6 mol/m 2 or more and 1.4×10 -4 mol/m 2 or less, it is possible to have both thermal conductivity and thermal conductivity. Extensibility.

本發明之薄膜中,無機粒子係以經具有反應性取代基之表面處理劑處理者為佳。就表面處理劑之具體例而言,可列舉:具有

Figure 106110684-A0202-12-0013-9
唑啉基、環氧基、碳二亞胺基、酸酐基、異氰酸酯基等之矽烷偶合劑、鈦偶合劑、鋁酸鹽系偶合劑,該等之中,宜使用2-(3,4-環氧基環己基)乙基三甲氧基矽烷、3-環氧丙氧基丙基甲基二甲氧基矽烷、3-環氧丙氧基丙基三甲氧基矽烷、3-環氧丙氧基丙基甲基二乙氧基矽烷、3-環氧丙氧基丙基三乙氧基矽烷、環氧丙氧基辛基三甲氧基矽烷等之具有環氧基的矽烷偶合劑;3-異氰酸酯丙基三乙氧基矽烷、3-異氰酸酯丙基三甲氧基矽烷等之具有異氰酸酯基的矽烷偶合劑; 3-三甲氧基矽基丙基琥珀酸酐等之具有酸酐基的矽烷偶合劑等。而且,亦宜使用具有反應性取代基之烷氧基寡聚物等。而且,亦宜使用甲基丙烯酸環氧丙酯等之具有環氧基的單體、2-異氰酸酯乙基甲基丙烯酸酯等之具有異氰酸酯基的單體與苯乙烯、乙烯、丙烯、丙烯酸等共聚之樹脂;聚碳二亞胺、含
Figure 106110684-A0202-12-0014-10
唑啉基之樹脂等。該等之中,本發明之薄膜的主成分為聚酯樹脂時,從可在聚酯與無機粒子之兩者形成鍵結而形成強固的界面之觀點上,特佳為:2-(3,4-環氧基環己基)乙基三甲氧基矽烷、3-環氧丙氧基丙基甲基二甲氧基矽烷、3-環氧丙氧基丙基三甲氧基矽烷、3-環氧丙氧基丙基甲基二乙氧基矽烷、3-環氧丙氧基丙基三乙氧基矽烷、環氧丙氧基辛基三甲氧基矽烷等之具有環氧基的矽烷偶合劑;3-異氰酸酯丙基三乙氧基矽烷、3-異氰酸酯丙基三甲氧基矽烷等之具有異氰酸酯基的矽烷偶合劑;3-三甲氧基矽基丙基琥珀酸酐等之具有酸酐基的矽烷偶合劑;具有反應性取代基之烷氧基寡聚物。而且,亦較宜使用上述之具有反應性取代基的表面處理劑彼此之混合、具有反應性取代基之表面處理劑與不具有反應性取代基之表面處理劑的混合。 In the film of the present invention, the inorganic particles are preferably treated with a surface treatment agent having a reactive substituent. Specific examples of the surface treatment agent include:
Figure 106110684-A0202-12-0013-9
Silane coupling agent, titanium coupling agent, aluminate coupling agent such as oxazoline group, epoxy group, carbodiimide group, acid anhydride group, isocyanate group, etc. Among them, 2-(3,4- Epoxycyclohexyl)ethyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropyl Silane coupling agents with epoxy groups such as propylpropylmethyldiethoxysilane, 3-glycidoxypropyltriethoxysilane, glycidoxyoctyltrimethoxysilane, etc.; 3- Isocyanate propyl triethoxy silane, 3-isocyanatopropyl trimethoxy silane and other silane coupling agents with isocyanate groups; 3-trimethoxysilyl propyl succinic anhydride and other silane coupling agents with acid anhydride groups, etc. Furthermore, an alkoxy oligomer or the like having a reactive substituent is also suitably used. In addition, monomers having epoxy groups such as glycidyl methacrylate, monomers having isocyanate groups such as 2-isocyanate ethyl methacrylate, and styrene, ethylene, propylene, acrylic acid, etc. are preferably used for copolymerization resin; polycarbodiimide, containing
Figure 106110684-A0202-12-0014-10
oxazoline-based resin, etc. Among these, when the main component of the film of the present invention is a polyester resin, from the viewpoint that a bond can be formed between the polyester and the inorganic particles to form a strong interface, 2-(3, 4-Epoxycyclohexyl)ethyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-epoxy Silane coupling agents with epoxy groups such as propoxypropylmethyldiethoxysilane, 3-glycidoxypropyltriethoxysilane, and glycidoxyoctyltrimethoxysilane; Silane coupling agents with isocyanate groups such as 3-isocyanatopropyltriethoxysilane and 3-isocyanatopropyltrimethoxysilane; silane coupling agents with acid anhydride groups such as 3-trimethoxysilylpropyl succinic anhydride ; Alkoxy oligomers with reactive substituents. Furthermore, it is also preferable to use a mixture of the above-mentioned surface-treating agents having a reactive substituent, and a mixture of a surface-treating agent having a reactive substituent and a surface-treating agent having no reactive substituent.

P1層中之無機粒子含量Vf1(體積%)為5~25體積%者,因可提高薄膜之導熱係數及延伸性而佳,更佳為7.5~25體積%,又更佳為10~20體積%。無機粒子含量未達5體積%時,無機粒子間之接觸概率變低,結果會有散熱性降低之情形。含量超過25體積%時,薄膜之延伸性、作為絕緣材等使用時之加工性有降低之情形。 When the inorganic particle content Vf1 (vol%) in the P1 layer is 5~25vol%, it is better because it can improve the thermal conductivity and extensibility of the film, more preferably 7.5~25vol%, and more preferably 10~20vol% %. When the content of the inorganic particles is less than 5% by volume, the contact probability between the inorganic particles becomes low, and as a result, the heat dissipation property may decrease. When the content exceeds 25% by volume, the stretchability of the film and the workability when used as an insulating material or the like may be reduced.

本發明之薄膜在P1層以垂直於薄膜面方向且平行於薄膜長度方向的方式切取之剖面中,將每10000μm2之無機粒子的數設為Nf(個)時,Nf/Vf1以25以下為佳。更佳為15以下,又更佳10以下。Nf/Vf1超過25時,則有無機粒子間之接觸概率變低,薄膜的導熱係數變低,因無機粒子所致之薄膜表面的凹凸形成變得不充分,或在界面之散熱變得不充分的情形。Nf/Vf1之下限並無特別限定,但從製膜時之延伸性及捲繞性之觀點來看,較佳為1。 In the film of the present invention, in the cross section of the P1 layer taken perpendicular to the film surface direction and parallel to the film longitudinal direction, when the number of inorganic particles per 10000 μm 2 is defined as Nf (pieces), Nf/Vf1 is 25 or less as good. More preferably, it is 15 or less, and still more preferably 10 or less. When Nf/Vf1 exceeds 25, the probability of contact between inorganic particles decreases, the thermal conductivity of the thin film decreases, the formation of irregularities on the thin film surface due to the inorganic particles becomes insufficient, or the heat dissipation at the interface becomes insufficient. situation. The lower limit of Nf/Vf1 is not particularly limited, but is preferably 1 from the viewpoints of stretchability and windability during film formation.

本發明之薄膜係以P1層中所含的無機粒子係以包含高寬比2以上之無機粒子者為佳。其中所謂的高寬比2以上之粒子係指,如圖1所示之以外接長方體包圍一次粒子,將該外接長方體之最長的一邊定義為長度(l)、最短的一邊定義為厚度(t)、其餘的一邊定義為寬度(b)時,長度(l)與厚度(t)之比l/t(以下稱為高寬比)為2以上時之粒子。相較於含有高寬比未達2之粒子的薄膜,含有高寬比2以上之粒子的薄膜之粒子間的接觸概率較高,而且,接觸概率係以高寬比高者愈高。高寬比更佳為3以上,又更高為5以上。而且,高寬比之上限並無特別限制,惟從在將無機粒子混練至樹脂中時,防止粒子的損壞及破裂之觀點來看,較佳為40以下,更佳為30以下。 In the thin film of the present invention, it is preferable that the inorganic particles contained in the P1 layer include inorganic particles with an aspect ratio of 2 or more. The so-called particles with an aspect ratio of 2 or more refer to the primary particles surrounded by a circumscribed cuboid as shown in Figure 1, the longest side of the circumscribed cuboid is defined as the length (l), and the shortest side is defined as the thickness (t) , When the other side is defined as the width (b), the ratio l/t (hereinafter referred to as the aspect ratio) of the length (l) to the thickness (t) is 2 or more. Compared with films containing particles with an aspect ratio of less than 2, the film containing particles with an aspect ratio of 2 or more has a higher contact probability between particles, and the contact probability is higher with a higher aspect ratio. The aspect ratio is more preferably 3 or more, and still higher is 5 or more. Further, the upper limit of the aspect ratio is not particularly limited, but is preferably 40 or less, more preferably 30 or less, from the viewpoint of preventing breakage and cracking of the particles when the inorganic particles are kneaded into the resin.

本發明之薄膜在將P1層以垂直於薄膜面方向且平行於薄膜長度方向的方式切取之剖面中,無機粒子之平均等效圓直徑較佳為3μm以上,更佳為5μm以上,進一步較佳為8μm以上。此處所謂的等效圓直徑係指,觀 察剖面所得之無機粒子的剖面積與繪製相同面積之正圓時之正圓的直徑。無機粒子之平均等效圓直徑小於3μm時,因無機粒子所致之薄膜表面之凹凸形成受到抑制,會有在界面之散熱受到阻礙之情形。平均等效圓直徑之上限係因薄膜之延伸性、作為絕緣材等使用時之絕緣性及加工性的提高,故以50μm以下為佳。 In the film of the present invention, in the cross section of the P1 layer taken perpendicular to the film surface direction and parallel to the film length direction, the average equivalent circle diameter of the inorganic particles is preferably 3 μm or more, more preferably 5 μm or more, still more preferably is 8 μm or more. The so-called equivalent circle diameter here refers to, The cross-sectional area of the inorganic particles obtained by observing the cross-section is the diameter of the perfect circle when a perfect circle of the same area is drawn. When the average equivalent circle diameter of the inorganic particles is less than 3 μm, the formation of irregularities on the surface of the thin film caused by the inorganic particles is suppressed, and the heat dissipation at the interface may be hindered. The upper limit of the average equivalent circle diameter is preferably 50 μm or less because of the stretchability of the film, and the improvement of the insulating properties and workability when used as an insulating material or the like.

本發明之薄膜中,無機粒子之材質係可列舉例如:金、銀、銅、鉑、鈀、錸、釩、鋨、鈷、鐵、鋅、釕、鐠、鉻、鎳、鋁、錫、鋅、鈦、鉭、鋯、銻、銦、釔、鑭、矽等之金屬;氧化鋅、氧化鈦、氧化銫、氧化銻、氧化錫、氧化銦錫、氧化釔、氧化鑭、氧化鋯、氧化鋁、氧化鎂、氧化矽等之金屬氧化物;氟化鋰、氟化鎂、氟化鋁、冰晶石等之金屬氟化物;磷酸鈣等之金屬磷酸鹽;碳酸鈣等之碳酸鹽;硫酸鋇、硫酸鎂等之硫酸鹽;氮化矽、氮化硼、氮化碳等之氮化物;矽灰石、海泡石、金蛭石等之矽酸鹽;鈦酸鉀、鈦酸鍶等之鈦酸鹽等。 In the thin film of the present invention, the material of the inorganic particles includes, for example, gold, silver, copper, platinum, palladium, rhenium, vanadium, osmium, cobalt, iron, zinc, ruthenium, ruthenium, chromium, nickel, aluminum, tin, zinc , titanium, tantalum, zirconium, antimony, indium, yttrium, lanthanum, silicon and other metals; zinc oxide, titanium oxide, cesium oxide, antimony oxide, tin oxide, indium tin oxide, yttrium oxide, lanthanum oxide, zirconium oxide, aluminum oxide , metal oxides such as magnesium oxide and silicon oxide; metal fluorides such as lithium fluoride, magnesium fluoride, aluminum fluoride, cryolite, etc.; metal phosphates such as calcium phosphate; carbonates such as calcium carbonate; barium sulfate, Sulfates of magnesium sulfate, etc.; nitrides of silicon nitride, boron nitride, carbon nitride, etc.; silicates of wollastonite, sepiolite, vermiculite, etc.; titanium of potassium titanate, strontium titanate, etc. acid, etc.

而且,該等無機粒子係可使用2種以上。 Moreover, these inorganic particle systems can use 2 or more types.

鑒於本發明之薄膜在需要電絕緣性的用途中使用者多,就無機粒子之材質而言,較佳為不具導電性之氧化鋅、氧化鈦、氧化銫、氧化銻、氧化錫、氧化銦錫、氧化釔、氧化鑭、氧化鋯、氧化鋁、氧化鎂、氧化矽等之金屬氧化物;氟化鋰、氟化鎂、氟化鋁、冰晶石等之金屬氟化物;磷酸鈣等之金屬磷酸鹽;碳酸鈣等之碳酸鹽;硫酸鋇、硫酸鎂等之硫酸鹽;氮化矽、氮化硼 、氮化碳等之氮化物;矽灰石、海泡石、金蛭石等之矽酸鹽;鈦酸鉀等之鈦酸鹽等。 In view of the fact that the film of the present invention is widely used in applications that require electrical insulation, as for the material of the inorganic particles, zinc oxide, titanium oxide, cesium oxide, antimony oxide, tin oxide, and indium tin oxide are preferably non-conductive. , metal oxides such as yttrium oxide, lanthanum oxide, zirconia, aluminum oxide, magnesium oxide, silicon oxide, etc.; metal fluorides such as lithium fluoride, magnesium fluoride, aluminum fluoride, cryolite, etc.; metal phosphoric acid such as calcium phosphate Salts; carbonates such as calcium carbonate; sulfates such as barium sulfate, magnesium sulfate, etc.; silicon nitride, boron nitride , nitrides such as carbon nitride; silicates such as wollastonite, sepiolite, vermiculite, etc.; titanates such as potassium titanate, etc.

本發明之薄膜的厚度T較佳為3μm以上500μm以下,更佳為5μm以上400μm以下,又更佳為10μm以上300μm以下。厚度小於3μm時,薄膜之成膜性降低,經常發生延伸時薄膜破裂之情形。另一方面,厚度超過500μm時,作為絕緣材等使用時之裁切及彎折變得困難而有加工性降低之情形。本發明之薄膜中,藉由薄膜之厚度設為3μm以上500μm以下,可兼具成膜性與加工性。 The thickness T of the film of the present invention is preferably 3 μm or more and 500 μm or less, more preferably 5 μm or more and 400 μm or less, and still more preferably 10 μm or more and 300 μm or less. When the thickness is less than 3 μm, the film-forming property of the film is reduced, and the film is often broken during stretching. On the other hand, when the thickness exceeds 500 μm, cutting and bending at the time of use as an insulating material or the like become difficult, and the workability may be lowered. In the thin film of the present invention, by setting the thickness of the thin film to be 3 μm or more and 500 μm or less, it is possible to have both film formability and processability.

本發明之薄膜係厚度方向的導熱係數較佳為0.15W/mK以上。更佳為0.20W/mK以上,進一步較佳為0.25W/mK以上。藉由滿足該值,可適用在覆銅積層板、太陽能電池用背板、黏著帶、可撓性印刷電路基板、薄膜開關、面狀發熱體、扁平電纜、旋轉機用絕緣材料、電池用絕緣材等之重視電絕緣性與散熱性之用途。就提高薄膜厚度方向的導熱係數之手段而言,可列舉:成為如上述更佳之原料配方之方法、延伸時控制分子鏈之配向的方法等。 The thermal conductivity in the thickness direction of the thin film system of the present invention is preferably 0.15 W/mK or more. More preferably, it is 0.20 W/mK or more, and still more preferably 0.25 W/mK or more. By satisfying this value, it can be applied to copper clad laminates, back sheets for solar cells, adhesive tapes, flexible printed circuit boards, membrane switches, planar heating elements, flat cables, insulating materials for rotating machines, and insulating materials for batteries. Materials that attach importance to electrical insulation and heat dissipation. As a means of improving the thermal conductivity in the thickness direction of the film, a method of obtaining a more preferable raw material formulation as described above, a method of controlling the alignment of molecular chains during stretching, and the like are exemplified.

本發明之薄膜係表面比電阻較佳為1×1013Ω/□以上,更佳為5×1013Ω/□以上。藉由滿足該值,可適用作為電絕緣材料。 The surface specific resistance of the thin film system of the present invention is preferably 1×10 13 Ω/□ or more, more preferably 5×10 13 Ω/□ or more. By satisfying this value, it can be used as an electrical insulating material.

本發明之薄膜係前述SPc(4000)為15個/mm2以上之表面的表面粗糙度Ra較佳為100nm以上,更佳為300nm以上,又更佳為500nm以上。表面粗糙度小於100nm時,因無機粒子所致之薄膜表面之凹凸形成受到抑制, 會有在界面之散熱受到阻礙之情形。為了防止因突起間隙過小而阻礙界面填充材之充填,表面粗糙度Ra之上限較佳為3000nm以下,更佳為2000nm以下。本發明中,SRa係經由後述之測定方法而求得者。 The thin-film of the present invention SPc (4000) surface 15 / mm 2 or more, the surface roughness Ra is preferably more than 100nm, more preferably 300nm or more, and more preferably 500nm or more. When the surface roughness is less than 100 nm, the formation of irregularities on the surface of the thin film due to inorganic particles is suppressed, and heat dissipation at the interface may be hindered. The upper limit of the surface roughness Ra is preferably 3000 nm or less, more preferably 2000 nm or less, in order to prevent the filling of the interface filler from being hindered due to the excessively small protrusion gap. In the present invention, SRa is obtained by the measurement method described later.

用以將薄膜表面之SRa設在上述範圍之手法並無特別限定,但可列舉例如:使無機粒子含在薄膜之方法、使用細微的凹凸形狀之模具使Ra成為上述範圍內而在薄膜表面施行加工之方法等。 The method for setting the SRa on the surface of the film within the above-mentioned range is not particularly limited, but for example, a method of incorporating inorganic particles into the film, using a mold with fine concavo-convex shapes to make the Ra within the above-mentioned range, and applying the method to the film surface processing methods, etc.

本發明之薄膜係就當將薄膜之厚度設為T(μm)且前述粗大突起數SPc(4000)為15個/mm2以上之表面而言,將從該表面至該厚度0.1T為止之範圍的無機粒子含量設為Vfa(體積%)、從該厚度0.1T至該厚度0.9T為止之範圍的無機粒子含量設為Vfb(體積%)時,以滿足Vfa/Vfb為0≦Vfa/Vfb<1者為佳。本發明中,Vfa/Vfb係以下述之方法求得者,Vfa/Vfb愈小,表示薄膜之表層中的無機粒子含量少。其結果係可抑制:無機粒子自薄膜表面的滑落、以及在與無機粒子之界面發生界面剝離的情形。尤其是,對平滑面使薄膜接著之用途中發揮顯著的效果,不易發生無機粒子之滑落及在無機粒子界面中發生的界面剝離,因可提高對平滑面之密接力而佳。更佳為0.1≦Vfa/Vfb≦8,又更佳為0.2≦Vfa/Vfb≦0.5。Vfa/Vfb為1以上時,存在表面之無機粒子增多,會有無機粒子自薄膜表面滑落而發生步驟污染、或在與無機粒子之界面發生界面剝離之情形。而且,Vfa/Vfb之下限雖為0,然在設為0.1以上時,由於表面之熱傳遞會變大, 因而為佳。另外,由於設為0≦Vfa/Vfb<1,在控制無機粒子之種類及表面活性後,無機粒子含量較少之層與較多之層積層後作成積層結構,以至少在單側之表面設置無機粒子少之層為佳。 The thin film of the present invention is a range from the surface to the thickness of 0.1T on the surface where the thickness of the thin film is set to T (μm) and the number of coarse protrusions SPc (4000) is 15 pieces/mm 2 or more. When the content of inorganic particles is Vfa (volume %), and the inorganic particle content in the range from the thickness 0.1T to the thickness 0.9T is Vfb (volume %), Vfa/Vfb is 0≦Vfa/Vfb< 1 is better. In the present invention, Vfa/Vfb is obtained by the following method, and the smaller the Vfa/Vfb, the smaller the inorganic particle content in the surface layer of the thin film. As a result, the slippage of the inorganic particles from the thin film surface and the occurrence of interfacial peeling at the interface with the inorganic particles can be suppressed. In particular, it has a remarkable effect in the application of bonding thin films to a smooth surface, and it is not easy to cause slippage of inorganic particles and interfacial peeling at the interface of inorganic particles, and it is preferable that the adhesion to the smooth surface can be improved. More preferably, 0.1≦Vfa/Vfb≦8, and still more preferably 0.2≦Vfa/Vfb≦0.5. When Vfa/Vfb is 1 or more, the inorganic particles on the surface may increase, and the inorganic particles may slip off the surface of the film to cause step contamination, or interface peeling may occur at the interface with the inorganic particles. In addition, although the lower limit of Vfa/Vfb is 0, when it is set to 0.1 or more, heat transfer on the surface increases, which is preferable. In addition, since 0≦Vfa/Vfb<1, after controlling the type and surface activity of the inorganic particles, a layer with a small amount of inorganic particles and a layer with a large amount of inorganic particles are stacked to form a layered structure, so as to be arranged on at least one surface. A layer with few inorganic particles is preferred.

本發明之薄膜可為僅由上述P1層所構成之單層薄膜,而且,P1層之至少單面積層有其它層(以下亦有將其它層簡稱為P2層之情形)之積層構成亦為適用。其中,為了抑制無機粒子自薄膜表面的滑落、或在與無機粒子之界面發生界面剝離,以在P1層之至少單面上積層有粒子含量少於P1層的P2層之積層構成者為佳。更佳者係可在P1層之兩面上積層有粒子含量少於P1層的P2層之積層構成者。此時,從成膜性之觀點來看,較佳為將P2層之主成分設為聚酯樹脂。 The film of the present invention may be a single-layer film composed of only the above-mentioned P1 layer, and a laminated structure in which at least a single-area layer of the P1 layer has other layers (hereinafter, the other layers are also referred to as P2 layers for short) is also applicable. . Among them, in order to prevent the inorganic particles from slipping off the surface of the film or interfacial peeling at the interface with the inorganic particles, it is preferable to laminate a P2 layer with a particle content less than that of the P1 layer on at least one side of the P1 layer. More preferably, it is a laminated structure in which a P2 layer having a particle content smaller than that of the P1 layer can be laminated on both sides of the P1 layer. In this case, from the viewpoint of film-forming properties, it is preferable to make the main component of the P2 layer a polyester resin.

而且,在P2層添加無機粒子者因可提高散熱性而佳,就無機粒子而言,係可使用上述者。此時,P2層之無機粒子含量Vf2(體積%)係,為了薄膜滿足0≦Vfa/Vfb<1之關係,在與P1層之無機粒子含量Vf1(體積%)之間滿足0≦Vf1/Vf2<1者為佳。更佳為0≦Vf1/Vf2≦0.8,又更佳為0≦Vf1/Vf2≦0.5。Vf1/Vf2為1以上時,會在表面存在很多粒子,而有粒子自薄膜表面滑落而發生步驟污染、或在無機粒子之界面發生界面剝離的情形。 In addition, it is preferable to add inorganic particles to the P2 layer because heat dissipation can be improved, and as the inorganic particles, the above-mentioned ones can be used. At this time, the inorganic particle content Vf2 (volume %) of the P2 layer is such that 0≦Vf1/Vf2 is satisfied between the inorganic particle content Vf1 (volume %) of the P1 layer and the inorganic particle content Vf1 (volume %) of the P1 layer in order for the thin film to satisfy the relationship of 0≦Vfa/Vfb<1 <1 is better. More preferably, 0≦Vf1/Vf2≦0.8, and still more preferably 0≦Vf1/Vf2≦0.5. When Vf1/Vf2 is 1 or more, many particles exist on the surface, and the particles slip off the surface of the film to cause step contamination, or interface peeling occurs at the interface of inorganic particles.

P2層中之無機粒子含量Vf2(體積%)為0~5體積%者,由於提高薄膜之延伸性而較佳,更佳為0~3體積%,進一步較佳為0~2體積%。含量超出5體積%時, 會有薄膜之延伸性、作為絕緣材等使用時之加工性降低的情形。 The inorganic particle content Vf2 (volume %) in the P2 layer is preferably 0 to 5 vol % because the stretchability of the film is improved, more preferably 0 to 3 vol %, and still more preferably 0 to 2 vol %. When the content exceeds 5% by volume, The stretchability of the film and the workability when used as an insulating material or the like may be reduced.

P1層與P2層之比率較佳為P1層之比例設為薄膜全體之40體積%,更佳為50體積%以上,又更佳為70體積%以上。P1層之比例未達40體積%時,會有因P1層所致導熱係數提高效果變得不充分的情形。 The ratio of the P1 layer to the P2 layer is preferably 40% by volume of the entire film, more preferably 50% by volume or more, and still more preferably 70% by volume or more. When the ratio of the P1 layer is less than 40% by volume, the effect of improving the thermal conductivity by the P1 layer may become insufficient.

本發明之薄膜係具有高電絕緣性、散熱性及加工性者。本發明之薄膜係發揮其功能,可適合作為覆銅積層板、太陽能電池用背板、黏著帶、可撓性印刷電路基板、薄膜開關、面狀發熱體、扁平電纜、旋轉機用絕緣材料、電池用絕緣材等之電絕緣片使用。尤其是,作為旋轉機用電絕緣片使用時,通過機器之散熱性的提高,相較於使用以往之電絕緣片時,可提高輸出及效率。而且,利用薄膜之表面特性,亦可使用黏著帶、離型膜、轉印膜、設計片、建築材料等。 The thin film of the present invention has high electrical insulating properties, heat dissipation properties and processability. The film of the present invention exerts its function, and can be suitably used as copper-clad laminates, back sheets for solar cells, adhesive tapes, flexible printed circuit boards, membrane switches, planar heating elements, flat cables, insulating materials for rotating machines, It is used as an electrical insulating sheet for insulating materials such as batteries. In particular, when used as an electrical insulating sheet for a rotating machine, the output and efficiency can be improved compared to when using a conventional electrical insulating sheet by improving the heat dissipation of the machine. Furthermore, by utilizing the surface properties of the film, adhesive tapes, release films, transfer films, design sheets, building materials, etc. can also be used.

本發明之薄膜係斷裂伸度較佳為10%以上。更佳為20%以上,又更佳為30%以上。在本發明之薄膜中,斷裂伸度未達10%時,在成膜時、連續加工之運送或裁切等之加工時,薄膜變得容易斷裂。在本發明之薄膜中,藉由斷裂伸度設為10%以上,可兼具成膜性與加工性。 The elongation at break of the film of the present invention is preferably 10% or more. More preferably, it is 20% or more, and still more preferably 30% or more. In the film of the present invention, when the elongation at break is less than 10%, the film is likely to be broken during film formation, during transportation during continuous processing, or during processing such as cutting. In the film of the present invention, by setting the elongation at break to be 10% or more, it is possible to have both film-forming properties and processability.

本發明之薄膜係根據UL94-VTM試驗法評價時之燃燒距離成為125mm以下者為佳。更佳為115mm以下,進一步較佳為105mm以下,尤其100mm以下,特佳為95mm以下。本發明之薄膜中,藉由根據UL94-VTM試 驗法評價時之燃燒距離成為125mm以下者,例如在作為太陽能電池用背板用途而使用時,可成為安全性更高者。 The film of the present invention preferably has a burning distance of 125 mm or less when evaluated by the UL94-VTM test method. More preferably, it is 115 mm or less, still more preferably 105 mm or less, especially 100 mm or less, and particularly preferably 95 mm or less. In the film of the present invention, by testing according to UL94-VTM If the burning distance at the time of test method evaluation is 125 mm or less, for example, when it is used as a back sheet for solar cells, it can be used with higher safety.

本發明之薄膜中,薄膜表面之SPc(4000)成為需要之範圍內之方式使用細微的凹凸形狀之模具在薄膜表面加工時,如圖2所示,使用凸部4以等間隔排列成點狀之模具者而可用以提高在薄膜表面的散熱性,因而為佳。模具凸部之形狀可為略三角形、略四角形、略六角形、圓、橢圓等之任一者。模具凸部之節距X較佳為20μm以上200μm以下,更佳為50μm以上150μm以下。節距超出200μm時,由於薄膜表面之凸起數少而有在界面之散熱不足之情形。節距未達20μm時,會有因加工而難以對薄膜表面賦予凹凸形狀、賦予之突起的間隔變的過小使界面充填材的充填變的不足、加工性變差之情形。模具凸部之寬度Y較佳為模具凸部之節距X的0.25倍以上、0.75倍以下的長度,更佳為0.4倍以上、0.6倍以下。寬度Y未達節距X的0.25倍、或超出0.75倍時,會有因加工而難以對薄膜表面賦予凹凸形狀的情形。模具凸部之高度Z較佳為5μm以上,更佳為10μm以上。模具凸部之高度未達5μm時,賦予薄膜表面之凹凸形狀變得平緩,因此在界面之散熱會變得不充分。而且,就實施加工之薄膜而言,係以使用延伸時之面積延伸倍率為10倍以下之薄膜者為佳,更佳為8倍以下。使用面積倍率超出10倍之薄膜時,會有因加工而使對薄膜表面之凹凸形狀的賦予變得不充分之情形。 In the film of the present invention, the SPc (4000) of the film surface is within the required range. When processing the film surface using a mold with a fine concavo-convex shape, as shown in FIG. The mold can be used to improve the heat dissipation on the surface of the film, so it is better. The shape of the mold convex portion may be any of a substantially triangular shape, a substantially quadrangular shape, a substantially hexagonal shape, a circle, an ellipse, and the like. The pitch X of the die protrusions is preferably 20 μm or more and 200 μm or less, and more preferably 50 μm or more and 150 μm or less. When the pitch exceeds 200 μm, the heat dissipation at the interface may be insufficient due to the small number of protrusions on the film surface. When the pitch is less than 20 μm, it may be difficult to impart a concavo-convex shape to the film surface due to processing, and the interval between the imparted protrusions may become too small, resulting in insufficient filling of the interface filler and poor workability. The width Y of the mold protrusions is preferably 0.25 times or more and 0.75 times or less of the pitch X of the mold protrusions, more preferably 0.4 times or more and 0.6 times or less. When the width Y is less than 0.25 times the pitch X, or exceeds 0.75 times, it may be difficult to impart the uneven shape to the surface of the film due to processing. The height Z of the mold convex portion is preferably 5 μm or more, and more preferably 10 μm or more. When the height of the mold convex portion is less than 5 μm, the unevenness provided to the surface of the film becomes gentle, so that the heat dissipation at the interface becomes insufficient. Furthermore, as for the film to be processed, it is preferable to use a film whose area stretching ratio at the time of stretching is 10 times or less, more preferably 8 times or less. When a film having an area magnification of more than 10 times is used, the provision of unevenness on the surface of the film may become insufficient due to processing.

接著,對於本發明之薄膜的製造方法,說明 主成分為聚酯樹脂之情形之一例,本發明並不解釋為限定於該例。 Next, the method for producing the thin film of the present invention will be described An example of the case where the main component is a polyester resin is not to be interpreted as being limited to this example.

(步驟1:聚酯之聚合) (Step 1: Polymerization of polyester)

聚酯係可藉由由上述之二羧酸構成成分、二元醇構成成分經酯化反應或酯交換反應進行縮聚反應,而將固有黏度作成0.4以上而得。在進行酯交換反應時,除了可使用乙酸鎂、乙酸鈣、乙酸錳、乙酸鈷、乙酸鈣等習知的酯交換反應觸媒,亦可添加作為聚合觸媒之三氧化銻等。酯化反應時,預先添加數ppm之氫氧化鉀等之鹼金屬時,可抑制二乙二醇之副生成物,亦改善耐熱性及耐水解性。 The polyester system can be obtained by carrying out a polycondensation reaction of the above-mentioned dicarboxylic acid constituents and diol constituents through an esterification reaction or a transesterification reaction, so that the intrinsic viscosity is 0.4 or more. When performing the transesterification, in addition to using conventional transesterification catalysts such as magnesium acetate, calcium acetate, manganese acetate, cobalt acetate, calcium acetate, etc., antimony trioxide and the like can also be added as a polymerization catalyst. During the esterification reaction, when several ppm of alkali metals such as potassium hydroxide are added in advance, by-products of diethylene glycol can be suppressed, and heat resistance and hydrolysis resistance can also be improved.

又,就縮聚反應觸媒而言,可使用二氧化鍺之乙二醇溶液、三氧化銻、鈦烷氧化物、鈦螯合物化合物等。 Moreover, as a polycondensation reaction catalyst, the ethylene glycol solution of germanium dioxide, antimony trioxide, a titanium alkoxide, a titanium chelate compound, etc. can be used.

就其他添加物而言,例如可列舉:以賦予靜電施加特性之目的的乙酸鎂、作為輔觸媒之乙酸鈣等,可在不妨礙本發明之效果的範圍下添加。而且,為了賦予薄膜之平滑性,亦可添加各種粒子、或含有利用觸媒之內部析出粒子。 Other additives include, for example, magnesium acetate for the purpose of imparting electrostatic application properties, calcium acetate as a co-catalyst, and the like, and may be added within a range that does not inhibit the effects of the present invention. Furthermore, in order to impart smoothness to the thin film, various particles may be added, or internally precipitated particles using a catalyst may be contained.

(步驟2:無機粒子之表面處理) (Step 2: Surface Treatment of Inorganic Particles)

在無機粒子進行表面處理時,無機粒子係可列舉i)使粒子在溶媒中分散後,一面攪拌該分散液,一面添加表面處理劑、或使表面處理劑溶解/分散之溶液/分散液之方法、ii)一面攪拌無機粒子之粉體,一面添加使表面處理劑溶解/分散之溶液/分散液之方法等。而且,表面 處理劑為樹脂系之物時,亦較宜使用iii)將無機粒子與表面處理劑進行熔融混練之方法。當無機粒子之重量設為100質量份時,表面處理劑之添加量較佳為0.1質量份以上5質量份以下。更佳為0.2質量份以上3質量份以下,又更佳為0.5質量份以上1.5質量份以下。低於0.1質量份時,在後面的步驟中將聚酯與無機粒子熔融混練時,聚酯與無機粒子之間的鍵結變得不充分,延伸時引起界面剝離,而降低導熱性。而且,超出5質量份時,鍵結量變過多而使延伸性降低。 When the inorganic particles are surface-treated, the inorganic particles include i) a method of dispersing the particles in a solvent and then adding a surface-treating agent, or a solution/dispersion in which the surface-treating agent is dissolved/dispersed while stirring the dispersion. , ii) A method of adding a solution/dispersion for dissolving/dispersing the surface treatment agent while stirring the powder of inorganic particles. Moreover, the surface When the treating agent is resin-based, it is also preferable to use the method of iii) melt-kneading the inorganic particles and the surface treating agent. When the weight of the inorganic particles is set to 100 parts by mass, the addition amount of the surface treatment agent is preferably 0.1 part by mass or more and 5 parts by mass or less. More preferably, it is 0.2 mass parts or more and 3 mass parts or less, and still more preferably 0.5 mass parts or more and 1.5 mass parts or less. When the content is less than 0.1 part by mass, when the polyester and the inorganic particles are melt-kneaded in the subsequent step, the bonding between the polyester and the inorganic particles becomes insufficient, interfacial peeling occurs during extension, and thermal conductivity is lowered. Furthermore, when it exceeds 5 mass parts, the amount of bonding becomes too large and the elongation is lowered.

(步驟3:聚酯樹脂組成物之製造) (Step 3: Manufacture of polyester resin composition)

使在經由上述步驟1所得之聚酯含有由上述步驟2所得的無機粒子而得到聚酯樹脂組成物之方法,較佳為預先將聚酯與無機粒子使用排氣式雙軸混練擠出機或串聯型擠出機進行熔融混練之方法。此時,為了不使無機粒子之形狀在熔融混練中損壞,較佳為聚酯在熔融狀態下供給無機粒子,較佳為由側進料供給至擠出機。 The polyester obtained in the above-mentioned step 1 contains the inorganic particles obtained in the above-mentioned step 2 to obtain a polyester resin composition. Preferably, the polyester and the inorganic particles are preliminarily kneaded using a vented biaxial kneading extruder or A method of melt-kneading with tandem extruders. At this time, in order not to damage the shape of the inorganic particles during melt-kneading, the polyester is preferably supplied in a molten state to the inorganic particles, and preferably supplied to the extruder from a side feed.

而且,使聚酯含有無機粒子之熔融混練時由於受到熱歷程,故有不少的聚酯劣化。因此,相較於P1層中之無機粒子的含量,製作添加量多的高濃度母料顆粒(Master pellet),將此與聚酯混合並稀釋,將P1層中無機粒子之量作成所要的含量時,可抑制聚酯之劣化,由延伸性、機械特性、耐熱性等之觀點來看,而較佳。更且,相較於P1層中之無機粒子的含量,將添加量多的高濃度母料顆粒在固相聚合後使用者,由提高分子量,可進一步減少羧基末端基數之觀點來看,而特佳。固相聚 合中,以將固相聚合溫度設在聚酯之熔點Tm-30℃以下、熔點Tm-60℃以上、真空度0.3Torr以下進行固相聚合反應者為佳。 Moreover, when melt-kneading polyester-containing inorganic particles is subjected to a thermal history, a lot of polyester is deteriorated. Therefore, compared with the content of inorganic particles in the P1 layer, a high concentration master pellet (Master pellet) with a large amount of addition is made, mixed with polyester and diluted, and the amount of inorganic particles in the P1 layer is made into the desired content. In this case, the deterioration of the polyester can be suppressed, which is preferable from the viewpoints of elongation, mechanical properties, heat resistance, and the like. Moreover, compared with the content of the inorganic particles in the P1 layer, using the high concentration masterbatch particles with a large amount of addition after solid-phase polymerization can increase the molecular weight and further reduce the number of carboxyl end groups. good. solid state polymerization In the combination, the solid-phase polymerization reaction is preferably carried out at a temperature of solid-phase polymerization below the melting point Tm-30°C of polyester, above the melting point Tm-60°C, and vacuum degree below 0.3 Torr.

(步驟4:薄膜之製造) (Step 4: Fabrication of Film)

本發明之薄膜僅包含P1層之單膜構成時,將P1層用原料在擠出機內加熱熔解,由噴嘴在經冷卻之澆鑄滾筒上擠出加工成片狀之方法(熔融鑄造法)。作為其他方法,亦可使用使P1層用之原料溶解於溶媒中,將該溶液由噴嘴擠出在澆鑄滾筒、環形帶等之支撐體上而成為膜狀,接著,從該膜層使溶媒乾燥去除並加工成片狀之方法(溶液澆鑄法)等。其中,由生產性高之觀點來看,以經由熔融澆鑄法成形為片狀者為佳(以下,經由熔融澆鑄法成形為片狀之步驟稱為熔融擠出步驟)。 When the film of the present invention consists only of a single film of the P1 layer, the raw material for the P1 layer is heated and melted in an extruder, and is extruded from a nozzle on a cooled casting drum to form a sheet (melt casting method). As another method, the raw material for the P1 layer is dissolved in a solvent, the solution is extruded from a nozzle on a support such as a casting drum, an endless belt, etc. to form a film, and then the solvent is dried from the film layer. A method of removing and processing into flakes (solution casting method), etc. Among them, from the viewpoint of high productivity, it is preferable to form into a sheet by a melt casting method (hereinafter, the step of forming into a sheet by a melt casting method is referred to as a melt extrusion step).

在熔融擠出步驟中製造時,使包含聚酯與無機粒子之組成物乾燥後,使用擠出機由噴嘴熔融擠出成為膜狀,經冷卻至表面溫度10℃以上60℃以下之滾筒上,藉由靜電密接冷卻而固化,製作未延伸片。 In the melt extrusion step, after drying the composition containing polyester and inorganic particles, it is melt extruded from a nozzle into a film using an extruder, and cooled to a surface temperature of 10°C or more and 60°C or less on a roller. It solidifies by electrostatic adhesion cooling, and produces an unstretched sheet.

在擠出機熔融擠出時,使在氮氣環境下熔融,由對擠出機的小片供給至擠出到噴嘴的時間愈短愈好,目標設為30分鐘以下,更佳為15分鐘以下,又更佳為5分鐘以下,從抑制因分子量降低所致之劣化、以及抑制羧基末端基數的增加之觀點來看,而較佳。 When melt extruding from the extruder, melt in a nitrogen atmosphere, and the time from supplying the small pieces to the extruder to extruding to the nozzle is as short as possible, and the target is set to 30 minutes or less, more preferably 15 minutes or less, Still more preferably, it is 5 minutes or less, and it is more preferable from the viewpoints of suppressing deterioration due to a decrease in molecular weight and suppressing an increase in the number of carboxyl terminal groups.

另外,本發明之薄膜在包含P2層之積層結構時,將2個不同的材料分別投入2台擠出機使其熔融,使在由噴嘴吐出之前積層,共擠出成片狀即可。 In addition, when the film of the present invention has a layered structure including the P2 layer, two different materials may be fed into two extruders, melted, laminated before being discharged from a nozzle, and co-extruded into a sheet.

接著,將上述所得之未延伸片在玻璃轉移溫度Tg以上之溫度中進行雙軸延伸。就進行雙軸延伸之方法而言,可為將長度方向與寬度方向之延伸進行分離的逐次雙軸延伸方法、及將長度方向與寬度方向之延伸同時進行的同時雙軸延伸方法等之任一者。就延伸條件之一例而言,可列舉:1)同時雙軸延伸時,將延伸溫度設為聚酯之玻璃轉移溫度Tg以上Tg+15℃以下之範圍的溫度、2)逐次雙軸延伸時,將第一軸的延伸溫度設為聚酯之玻璃轉移溫度Tg以上Tg+15℃以下(更佳為Tg以上Tg+10℃以下)之溫度,將第二軸的延伸溫度設為Tg+5℃以上Tg+25℃以下之溫度等。 Next, the unstretched sheet obtained above is biaxially stretched at a temperature equal to or higher than the glass transition temperature Tg. The method of biaxial stretching may be any of the sequential biaxial stretching method in which the stretching in the longitudinal direction and the width direction is separated, and the simultaneous biaxial stretching method in which the stretching in the longitudinal direction and the width direction is carried out simultaneously. By. As an example of the stretching conditions, 1) in the case of simultaneous biaxial stretching, the stretching temperature is set to a temperature in the range of the glass transition temperature Tg of polyester or higher and Tg+15°C or lower, and 2) in the case of successive biaxial stretching, The stretching temperature of the first axis is set to be the glass transition temperature Tg of polyester or more and Tg+15°C or less (more preferably Tg or more and Tg+10°C or less), and the stretching temperature of the second axis is set to Tg+5°C Above Tg+25℃ or below temperature.

延伸倍率係在同時雙軸延伸、逐次雙軸延伸中皆是長度方向與寬度方向分別為1.5倍以上3.5倍以下。更佳為2.0倍以上3.0倍以下。而且合併縱向的延伸倍率與橫向的延伸倍率之面積延伸倍率為2倍以上12倍以下、更佳為4倍以上10倍以下。面積延伸倍率未達2倍時,所得薄膜之配向性低,會有機械強度及耐熱性降低之情形。而且,面積延伸倍率超出12倍時,會有在延伸時容易發生破裂、所得薄膜之空隙率變大、導熱性降低之傾向。 The stretching ratio is 1.5 times or more and 3.5 times or less in the longitudinal direction and the width direction in both simultaneous biaxial stretching and successive biaxial stretching. More preferably, it is 2.0 times or more and 3.0 times or less. Furthermore, the area stretching ratio combining the stretching ratio in the longitudinal direction and the stretching ratio in the lateral direction is 2 times or more and 12 times or less, more preferably 4 times or more and 10 times or less. When the area elongation ratio is less than 2 times, the orientation of the obtained film is low, and the mechanical strength and heat resistance may be lowered. In addition, when the area stretching ratio exceeds 12 times, cracks are likely to occur during stretching, the porosity of the obtained film tends to increase, and the thermal conductivity tends to decrease.

接著,為了將所得雙軸延伸薄膜之結晶配向充分進行並賦予平面性與尺寸安定性,在聚酯之玻璃轉移溫度Tg以上且小於熔點Tm之溫度Th進行1秒鐘以上30秒鐘以下之熱處理,均勻地緩慢冷卻後,冷卻至室溫。本發明之薄膜的製造方法中,熱處理溫度Th與聚酯之熔 點Tm之差Tm-Th為20℃以上90℃以下,較佳為25℃以上70℃以下,更佳為30℃以上60℃以下。而且,上述熱處理步驟中,可依需要在寬度方向或長度方向施行3~12%之鬆弛處理,接著依需要,亦可為了進一步提高與其它素材之密接性而進行電暈放電處理等,並進行捲繞,藉此得到本發明之薄膜。 Next, in order to sufficiently advance the crystal orientation of the obtained biaxially stretched film and impart planarity and dimensional stability, a heat treatment is performed at a temperature Th of not less than the glass transition temperature Tg of the polyester and not more than the melting point Tm of the polyester for 1 second or more and 30 seconds or less. , and after cooling slowly evenly, cool to room temperature. In the production method of the film of the present invention, the heat treatment temperature Th and the melting point of the polyester The point Tm difference Tm-Th is 20°C or higher and 90°C or lower, preferably 25°C or higher and 70°C or lower, more preferably 30°C or higher and 60°C or lower. Furthermore, in the above-mentioned heat treatment step, a relaxation treatment of 3 to 12% may be performed in the width direction or the length direction as needed, and then, as needed, a corona discharge treatment, etc. may also be performed in order to further improve the adhesion with other materials. winding, thereby obtaining the film of the present invention.

而且,使用微細的凹凸形狀之模具在薄膜表面施行加工時,在製膜時使用具有微細的凹凸形狀之澆鑄滾筒或延伸輥、延伸軋輥之方法,或得到雙軸延伸薄膜後,使用微細的凹凸形狀之模具壓製成薄膜之方法等。 Furthermore, when the surface of the film is processed using a mold having a fine concavo-convex shape, a method of using a casting roll, a stretching roll, or a stretching roll having a fine concavo-convex shape during film formation, or a method of obtaining a biaxially stretched film, using a fine concavo-convex shape A method of pressing a mold of the shape into a film, etc.

接著,對於本發明之製造方法,說明主成分為聚芳硫醚樹脂時之一例,惟本發明並不限於該例作解釋。 Next, the production method of the present invention will be described as an example when the main component is a polyarylene sulfide resin, but the present invention is not limited to this example.

(步驟1:聚苯硫醚之聚合) (Step 1: Polymerization of polyphenylene sulfide)

將硫化鈉與對-二氯苯在N-甲基-2-吡咯啶酮(NMP)等之醯胺系極性溶媒中使在高溫高壓下反應。亦可依需要,使包含三鹵苯等之共聚成分。添加作為聚合度調整劑之苛性鹼或羧酸鹼金屬鹽等,使在230℃~280℃下進行聚合反應。 Sodium sulfide and p-dichlorobenzene are reacted under high temperature and high pressure in an amide-based polar solvent such as N-methyl-2-pyrrolidone (NMP). A copolymerization component including trihalobenzene and the like can also be used as required. A caustic alkali, an alkali metal carboxylate, etc. are added as a polymerization degree adjuster, and the polymerization reaction is carried out at 230°C to 280°C.

聚合後將聚合物進行冷卻,並將聚合物作為水漿,以濾器過濾後,得到粒狀聚合物。將此於乙酸鹽等之水溶液中在30℃~100℃進行10~60分鐘之攪拌處理,在離子交換水中於30~80℃清洗數次,進行乾燥而得到PPS粉末。將該粉末聚合物在氧分壓10托(Torr)以下,較佳為5托以下,並在NMP中清洗後,以30~80℃之離 子交換水清洗數次,在5托以下之減壓下進行乾燥。由於如此所得之粉末聚合物實質上為線狀之PPS聚合物,故可安定地延伸成膜。 After the polymerization, the polymer was cooled, and the polymer was filtered through a filter as an aqueous slurry to obtain a granular polymer. This is stirred in an aqueous solution of acetate or the like at 30°C to 100°C for 10 to 60 minutes, washed several times in ion-exchanged water at 30 to 80°C, and dried to obtain PPS powder. The powder polymer is washed in NMP under an oxygen partial pressure of 10 Torr or less, preferably 5 Torr or less, and then separated at a temperature of 30 to 80 °C. The sub-exchange water was washed several times and dried under a reduced pressure below 5 Torr. Since the powder polymer thus obtained is substantially a linear PPS polymer, it can be stably extended to form a film.

(步驟2:無機粒子之表面處理) (Step 2: Surface Treatment of Inorganic Particles)

在無機粒子進行表面處理時,無機粒子係i)使粒子分散在溶媒中之後,將該分散液一面攪拌一面添加表面處理劑、或使表面處理劑溶解/分散之溶液/分散液的方法、ii)一面攪拌無機粒子之粉體一面添加使表面處理劑溶解/分散之溶液/分散液的方法等。而且,表面處理劑為樹脂系之物時,亦適用iii)將無機粒子與表面處理劑進行熔融混練之方法。表面處理材劑之添加量係當無機粒子之重量為100質量份時,以0.1質量份以上5質量份以下者為佳。 When the inorganic particles are surface-treated, the inorganic particles are i) a method of dispersing the particles in a solvent and then adding a surface-treating agent or a solution/dispersion in which the surface-treating agent is dissolved/dispersed while stirring the dispersion, ii ) A method of adding a solution/dispersion for dissolving/dispersing a surface treating agent while stirring the powder of inorganic particles, etc. In addition, when the surface treating agent is resin-based, the method of iii) melt-kneading the inorganic particles and the surface treating agent is also applicable. The addition amount of the surface treatment material is preferably 0.1 part by mass to 5 parts by mass when the weight of the inorganic particles is 100 parts by mass.

(步驟3:聚苯硫醚樹脂組成物之製造) (Step 3: Manufacture of polyphenylene sulfide resin composition)

由上述步驟1所得的聚苯硫醚中,得到含有由上述步驟2所得之無機粒子的聚苯硫醚樹脂組成物之方法,較佳為預先將聚苯硫醚與無機粒子使用排氣式雙軸混練擠出機或串聯型擠出機進行熔融混練之方法。此時,為了使無機粒子之形狀不會在熔融混練中損壞,以聚苯硫醚在熔融狀態下供給無機粒子者為佳,以經側進料供給至擠出機者為佳。由擠出機吐出之腸狀的聚合物係依常法在水浴中等冷卻後,進行切斷而在聚合物中,粒子成為分散之顆粒(以下,亦有將該顆粒稱為粒子顆粒之情形)。而且,僅將上述步驟1中所得的聚苯硫醚粉末進行顆粒化(以下,亦有將該顆粒稱為無粒子顆粒之情形),可在製 造薄膜時與粒子顆粒混合使用。 The method for obtaining a polyphenylene sulfide resin composition containing the inorganic particles obtained in the above-mentioned step 2 from the polyphenylene sulfide obtained in the above-mentioned step 1 is preferably to use an exhaust-type dual A method of melt kneading with a shaft kneading extruder or a tandem extruder. At this time, in order to prevent the shape of the inorganic particles from being damaged during melt-kneading, polyphenylene sulfide is preferably supplied to the inorganic particles in a molten state, and preferably supplied to the extruder by side feed. The intestine-shaped polymer discharged from the extruder is cooled in a water bath according to the usual method, and then cut to form particles dispersed in the polymer (hereinafter, the particles may also be referred to as particle particles). . Furthermore, only the polyphenylene sulfide powder obtained in the above-mentioned step 1 is granulated (hereinafter, the granules may also be referred to as non-particle granules). It is mixed with particles and particles when making films.

(步驟4:薄膜之製造) (Step 4: Fabrication of Film)

由上述步驟3所得之粒子顆粒及/或無粒子顆粒在減壓下乾燥後,投入擠出機之熔融部加熱至300~350℃之溫度,較佳為310~340℃之擠出機。然後,使經擠出機之熔融聚合物通過濾器內,將該熔融聚合物使用T模之噴嘴吐成片狀。該濾器部分及接口器之設定溫度以設定在比擠出機之熔融的溫度高出3~20℃之溫度為佳,更佳為高出5~15℃之溫度。將該片狀物密接在表面溫度20~70℃之冷卻滾筒上進行冷卻固化,得到實質上未配向狀態之未延伸薄膜。 The particles and/or particle-free particles obtained in the above step 3 are dried under reduced pressure, and then put into the melting part of the extruder and heated to a temperature of 300-350°C, preferably an extruder of 310-340°C. Then, the molten polymer passed through the extruder was passed through the filter, and the molten polymer was discharged into a sheet shape using the nozzle of the T-die. The setting temperature of the filter part and the interface device is preferably set at a temperature higher than the melting temperature of the extruder by 3-20°C, more preferably 5-15°C higher. The sheet-like object was adhered to a cooling roller with a surface temperature of 20 to 70° C., and cooled and solidified to obtain an unstretched film in a substantially unaligned state.

接著,將該未延伸薄膜進行雙軸延伸使雙軸配向。延伸方法方面係可使用逐次雙軸延伸法、同時雙軸延伸法、或組合該等之方法。此處,以使用逐次雙軸延伸法之例進行說明。 Next, the unstretched film is biaxially stretched for biaxial alignment. In terms of the stretching method, a sequential biaxial stretching method, a simultaneous biaxial stretching method, or a combination of these methods can be used. Here, an example of using the successive biaxial stretching method will be described.

將未延伸薄膜以加熱輥群加熱後,分別在長度方向與寬度方向以1.5倍以上3.5倍以下之延伸倍率進行延伸。更佳為2.0倍以上3.0倍以下。而且,合併縱向的延伸倍率與橫向的延伸倍率之面積延伸倍率為2倍以上12倍以下、更佳為4倍以上10倍以下。面積延伸倍率小於2倍時,所得薄膜之配向性低而有機械強度及耐熱性降低之情形。而且面積延伸倍率超出12倍時,會有延伸時容易發生破損、或所得薄膜之空隙率變大、導熱性降低之傾向。延伸溫度較佳為70~130℃為佳,更佳為80~110℃。 After the unstretched film is heated by the heating roll group, it is stretched at a stretching ratio of 1.5 times or more and 3.5 times or less in the longitudinal direction and the width direction, respectively. More preferably, it is 2.0 times or more and 3.0 times or less. Furthermore, the area stretching ratio combining the stretching ratio in the longitudinal direction and the stretching ratio in the lateral direction is 2 times or more and 12 times or less, more preferably 4 times or more and 10 times or less. When the area stretching ratio is less than 2 times, the orientation of the obtained film may be low, and the mechanical strength and heat resistance may be reduced. In addition, when the area stretching ratio exceeds 12 times, breakage is likely to occur during stretching, or the porosity of the obtained film tends to increase, and the thermal conductivity tends to decrease. The extension temperature is preferably 70 to 130°C, more preferably 80 to 110°C.

接著,將該雙軸延伸薄膜在張力下進行熱處理。熱處理溫度較佳為160~280℃之範圍,以一階段或二階段以上之多階段進行。此時,該熱處理溫度下在薄膜寬度方向0~10%之範圍進行鬆弛處理者,以熱的尺寸安定性之觀點上為佳。在進行2階段之熱處理時,將第1階段之熱處理溫度設在160~220℃之範圍,將第2階段之熱處理溫度設在230~280℃之範圍之高於第1階段之溫度者,因改善薄膜之平面性及安定成膜而佳。熱處理後係將薄膜冷卻至室溫。接著,可依所需,為了進一步提高與其它素材之密接性,係可進行電暈放電處理,並進行捲繞,藉此得到本發明之薄膜。 Next, the biaxially stretched film is heat-treated under tension. The heat treatment temperature is preferably in the range of 160 to 280° C., and is carried out in one stage or more than two stages. In this case, it is preferable from the viewpoint of thermal dimensional stability that the relaxation treatment is performed in the range of 0 to 10% in the width direction of the film at the heat treatment temperature. When two-stage heat treatment is performed, the heat treatment temperature of the first stage is set in the range of 160~220°C, and the heat treatment temperature of the second stage is set in the range of 230~280°C, which is higher than the temperature of the first stage. It is better to improve the flatness of the film and to stabilize the film formation. After heat treatment, the film was cooled to room temperature. Then, as required, in order to further improve the adhesiveness with other materials, corona discharge treatment can be performed, and the film of the present invention can be obtained by winding.

[特性之評價方法] [Evaluation method of characteristics]

A. 聚酯之組成分析 A. Composition Analysis of Polyester

將聚酯通過鹼而水解,將各成分經由氣相層析儀或高效液相層析儀分析,由各成分之峰面積求得組成比。以下係呈示一例。二羧酸構成成分或其它構成成分係以高效液相層析儀進行測定。測定條件係可用習知方法分析,以下係呈示測定條件之一例。 The polyester is hydrolyzed by alkali, each component is analyzed by a gas chromatograph or a high performance liquid chromatograph, and the composition ratio is obtained from the peak area of each component. An example is shown below. The dicarboxylic acid constituent or other constituents are measured by high performance liquid chromatography. The measurement conditions can be analyzed by conventional methods, and an example of the measurement conditions is shown below.

裝置:島津LC-10A Device: Shimadzu LC-10A

管柱:YMC-Pack ODS-A 150×4.6mm S-5μm 120A Column: YMC-Pack ODS-A 150×4.6mm S-5μm 120A

管柱溫度:40℃ Column temperature: 40℃

流量:1.2ml/min Flow: 1.2ml/min

檢測器:UV 240nm Detector: UV 240nm

二元醇構成成分、其它構成成分之定量係可使用氣 相層析儀並以習知方法進行分析。以下係呈示測定條件之一例。 Gas can be used for quantitative determination of glycol constituents and other constituents phase chromatograph and analyzed by conventional methods. An example of measurement conditions is shown below.

裝置:島津9A(島津製作所(股)製) Installation: Shimadzu 9A (manufactured by Shimadzu Corporation)

管柱:SUPELCOWAX-10毛細管柱30m Column: SUPELCOWAX-10 capillary column 30m

管柱溫度:140℃~250℃(升溫速度5℃/min) Column temperature: 140°C~250°C (heating rate 5°C/min)

流量:氮氣25ml/min Flow: Nitrogen 25ml/min

檢測器:FID。 Detector: FID.

B. 固有黏度IV B. Intrinsic Viscosity IV

在鄰氯酚100ml中,使薄膜溶解(溶液中之樹脂濃度C=1.2g/ml),使用奧氏黏度計測定該溶液在25℃之黏度。而且,同樣地測定溶媒之黏度。使用所得之溶液黏度、溶媒黏度,由下述式(1)求算出[η],以所得之值定義為固有黏度[IV]。 The film was dissolved in 100 ml of o-chlorophenol (resin concentration in the solution C=1.2 g/ml), and the viscosity of the solution at 25°C was measured using an Ostrich viscometer. Furthermore, the viscosity of the solvent was measured in the same manner. Using the obtained solution viscosity and solvent viscosity, [η] was calculated from the following formula (1), and the obtained value was defined as the intrinsic viscosity [IV].

ηsp/C=[η]+K[η]2.C (1) ηsp/C=[η]+K[η] 2 . C (1)

(其中,ηsp=(溶液黏度/溶媒黏度))-1、K為赫金斯常數(為0.343))。另外,測定係於分離無機粒子等之不溶成分後實施。 (where, ηsp=(viscosity of solution/viscosity of solvent))-1, K is the Huggins constant (0.343)). In addition, measurement is implemented after isolation|separation of insoluble components, such as an inorganic particle.

C. 玻璃轉移溫度Tg、熔點Tm、結晶熔解熱量△Hm C. Glass transition temperature Tg, melting point Tm, crystal fusion heat △Hm

將薄膜,依據JIS K-7121(1987)及JIS K-7122(1987),在測定裝置將Seiko電子工業(股)製之差示掃描熱量測定裝置「Robot DSC-RDC220」在數據分析中使用Disk session「SSC/5200」,根據以下方法測定。 The film was measured according to JIS K-7121 (1987) and JIS K-7122 (1987), and the measuring device was a differential scanning calorimeter "Robot DSC-RDC220" manufactured by Seiko Electronics Co., Ltd. for data analysis using Disk The session "SSC/5200" was measured according to the following method.

(1)第1次運行測定 (1) The first operation measurement

在樣品盤中將薄膜之樣品各秤取5mg,升溫速度係 以20℃/分鐘將樹脂以20℃/分鐘之升溫速度自25℃加熱至300℃(PPS樹脂之情形時為320℃),以該狀態維持5分鐘,接著成為25℃以下之方式驟冷。 Weigh 5 mg of each film sample in the sample pan, and the heating rate is The resin was heated from 25°C to 300°C (320°C in the case of PPS resin) at a temperature increase rate of 20°C/min at 20°C/min, maintained in this state for 5 minutes, and then quenched so that it became 25°C or lower.

(2)第2次運行 (2) The second operation

在第1次運行測定結束後,隨後立即再度以20℃/分鐘之升溫速度自25℃升溫至300℃(PPS樹脂之情形時為320℃)進行測定。在所得第2次運行之差示掃描熱量測定圖中,玻璃轉移溫度係依據JIS K-7121(1987)記載之方法求得(從各基準線之延長直線在縱軸方向為等距離之直線、與玻璃轉移之階段狀的變化部分之曲線交叉點求得)。而且,亦以結晶熔解峰之峰頂溫度為熔點Tm,結晶熔解熱量△Hm係依據JIS K-7122(1987)記載之方法求得。 Immediately after the completion of the first run measurement, the measurement was performed again from 25°C to 300°C (320°C in the case of PPS resin) at a temperature increase rate of 20°C/min. In the differential scanning calorimetry chart obtained for the second run, the glass transition temperature was obtained according to the method described in JIS K-7121 (1987) (a straight line extending from each reference line is equidistant in the vertical axis direction, Obtained from the intersection point of the curve with the phase-like change portion of the glass transition). In addition, the peak top temperature of the crystal melting peak was also taken as the melting point Tm, and the crystal melting heat ΔHm was determined according to the method described in JIS K-7122 (1987).

D. 斷裂伸度 D. Elongation at break

薄膜之斷裂伸度係依據ASTM-D882(1997)將樣品裁成1cm×20cm大小,在夾頭5cm、延伸速度300mm/分鐘延伸時,測定斷裂伸度。其中,測定係將薄膜之任一方向為0°,在薄膜面內從-90°至90°每10°改變方向切取樣品,將斷裂伸度成為最小之方向定義為薄膜之長度方向。以長度方向之斷裂伸度、與長度方向正交之方向的斷裂伸度之平均值作為薄膜之斷裂伸度。 The breaking elongation of the film is based on ASTM-D882 (1997), the sample is cut into a size of 1 cm×20 cm, and the breaking elongation is measured when the clip is stretched at 5 cm and the extension speed is 300 mm/min. In the measurement, any direction of the film is set to 0°, and samples are cut out from -90° to 90° in the film plane every 10°, and the direction in which the elongation at break becomes the smallest is defined as the longitudinal direction of the film. The average value of the elongation at break in the longitudinal direction and the elongation at break in the direction orthogonal to the longitudinal direction was taken as the elongation at break of the film.

E. 粗大突起數SPc(4000)、表面粗糙度SRa E. Coarse protrusion number SPc (4000), surface roughness SRa

使用觸針法之高精細細微形狀測定器(3維表面粗糙度計),依據JIS-B0601(1994年)以下述條件測定表面形態,求算出表面粗糙度SRa。 The surface morphology was measured under the following conditions according to JIS-B0601 (1994) using a high-definition micro-shape measuring device (three-dimensional surface roughness meter) of the stylus method, and the surface roughness SRa was calculated.

測定裝置:3維細微形狀測定器(型式ET-4000A) 小坂研究所(股)製 Measuring device: 3-dimensional micro-shape measuring device (type ET-4000A) Kosaka Research Institute (stock) system

分析機器:3維表面粗糙度分析系統(型式TDA-31) Analysis Machine: 3D Surface Roughness Analysis System (Type TDA-31)

觸針:尖端半徑0.5μmR、直徑2μm,鑽石製 Stylus: tip radius 0.5μmR, diameter 2μm, diamond

針壓:100μN Needle pressure: 100μN

測定方向:將薄膜長度方向、薄膜寬度方向各測定1次後之平均 Measurement direction: average after measuring the film length direction and film width direction once each

X測定長度:1.0mm X measurement length: 1.0mm

X進料速度:0.1mm/s(測定速度) X feeding speed: 0.1mm/s (measurement speed)

Y進料節距:5μm(測定間隔) Y feed pitch: 5 μm (measurement interval)

Y線數:81根(測定根數) Number of Y lines: 81 (measurement number)

Z倍率:20倍(縱向倍率) Z magnification: 20 times (vertical magnification)

低頻截止:0.20mm(波形截止值) Low frequency cutoff: 0.20mm (waveform cutoff value)

高頻截止:R+Wmm(粗度截止值) High frequency cutoff: R+Wmm (coarse cutoff value)

(R+W係無截止) (R+W system has no cut-off)

過濾方式:高斯空間型 Filter method: Gaussian space type

調平:有(傾斜校正) Leveling: Yes (tilt correction)

基準面積:1mm2Base area: 1mm 2 .

粗大突起數SPc(4000)係呈示每基準面積之4000nm以上的突起數,在分析系統中以下述設定分析時求算出。 The number of coarse protrusions SPc(4000) represents the number of protrusions per reference area of 4000 nm or more, and was calculated in the analysis system with the following settings.

切片水平條件設定:上下間隔固定 Slice level condition setting: fixed upper and lower intervals

中心節距水平:0.05μm Center pitch level: 0.05μm

上下水平間隔:0.025μm Up and down horizontal interval: 0.025μm

下限:3975nm Lower limit: 3975nm

中心水平:4000nm Center level: 4000nm

上限:4025nm。 Upper limit: 4025nm.

F. 空隙率Va F. Porosity Va

P1層中之空隙率係依以下之(A1)~(A5)之步驟求得。而且,測定係將薄膜裁切處隨機地變更,共計進行10次,以該算術平均值作為該P1層之空隙率Va(體積%)。 The porosity in the P1 layer is obtained according to the following steps (A1) to (A5). In addition, the measurement was performed 10 times in total by randomly changing the film cut position, and the arithmetic mean value was used as the void ratio Va (volume %) of the P1 layer.

(A1)使用切片機,薄膜剖面在厚度方向不壓扁,以對薄膜面方向呈垂直裁切,並對薄膜長度方向(經由斷裂伸度之測定而定義之方向)呈平行地裁切。 (A1) Using a microtome, the cross section of the film is cut perpendicular to the film surface direction without being flattened in the thickness direction, and the film is cut parallel to the longitudinal direction of the film (the direction defined by the measurement of elongation at break).

(A2)接著將裁切之剖面使用掃描型電子顯微鏡進行觀察,得到擴大3000倍觀察之圖像。而且,觀察處係在P1層內隨機規定者,惟分別使圖像之上下方向與薄膜的厚度方向、圖像之左右方向與薄膜之長度方向成為平行。 (A2) Next, the cut section was observed with a scanning electron microscope, and an image observed at a magnification of 3000 times was obtained. In addition, the observation point is randomly determined in the P1 layer, and the vertical direction of the image is parallel to the thickness direction of the film, and the left-right direction of the image is parallel to the longitudinal direction of the film.

(A3)測量上述(A2)所得之圖像中的P1層之面積(亦包含P1層內存在之空隙及無機粒子的面積之全部面積),將此設為A。另外,在圖像中難以判別P1層與其它層之界面時,另外相同,對於樣品之剖面使用微分干涉顯微鏡觀察偏光檢索P1層之界面位置,估計P1層之面積。 (A3) Measure the area of the P1 layer in the image obtained in the above (A2) (including the entire area of the voids and the area of the inorganic particles existing in the P1 layer), and set this as A. In addition, when it is difficult to distinguish the interface between the P1 layer and other layers in the image, in the same way, the cross-section of the sample is observed using a differential interference microscope to search for the interface position of the P1 layer, and the area of the P1 layer is estimated.

(A4)測量圖像中之P1層內存在的全部空隙面積,將總面積設為B。此處,作為測量對象,不限於空隙之整體含在圖像內,僅部分出現的氣泡亦包括在圖像內。 (A4) Measure the total void area present in the P1 layer in the image, and set the total area as B. Here, as the measurement object, not only the entire voids are included in the image, but the air bubbles that appear only partially are also included in the image.

(A5)以B除以A(B/A),藉由在此乘以100,求取P1層內之空隙的面積比例,以此值作為空隙率Va(體積%)。 (A5) Divide B by A (B/A), and multiply this by 100 to obtain the area ratio of the voids in the P1 layer, and use this value as the void ratio Va (volume %).

G. P1層中之無機粒子含量Vf1、無機粒子之數Nf、無機粒子之平均等效圓直徑 G. Inorganic particle content Vf1 in P1 layer, number Nf of inorganic particles, average equivalent circle diameter of inorganic particles

P1層中之無機粒子含量Vf1、無機粒子之數Nf、無機粒子之平均等效圓直徑係依以下之(B1)~(B7)之步驟求得。而且,測定係將薄膜裁切處隨機地變更,共計進行10次,以該算術平均值分別作為該P1層之無機粒子含量Vf1(體積%)、無機粒子之數Nf(個)、無機粒子之平均等效圓直徑(μm)。 The inorganic particle content Vf1 in the P1 layer, the number of inorganic particles Nf, and the average equivalent circle diameter of the inorganic particles are obtained according to the following steps (B1) to (B7). In addition, the measurement is carried out 10 times in total by randomly changing the cut position of the film, and the arithmetic mean value is taken as the inorganic particle content Vf1 (volume %), the number of inorganic particles Nf (pieces), and the number of inorganic particles in the P1 layer, respectively. Average equivalent circle diameter (μm).

(B1)使用切片機,薄膜剖面在厚度方向不壓扁,以對薄膜面方向呈垂直裁切,並對薄膜長度方向(經由斷裂伸度之測定而定義之方向)呈平行地裁切。 (B1) Using a slicer, the cross section of the film is cut perpendicular to the film surface direction without being flattened in the thickness direction, and the film length direction (the direction defined by the measurement of elongation at break) is cut parallel to the film.

(B2)接著將裁切之剖面使用掃描型電子顯微鏡進行觀察,得到擴大3000倍觀察之圖像。而且,觀察處係在P1層內隨機規定者,惟分別使圖像之上下方向與薄膜的厚度方向、圖像之左右方向與薄膜之長度方向成為平行。 (B2) Next, the cut cross section was observed with a scanning electron microscope, and an image observed at a magnification of 3000 times was obtained. In addition, the observation point is randomly determined in the P1 layer, and the vertical direction of the image is parallel to the thickness direction of the film, and the left-right direction of the image is parallel to the longitudinal direction of the film.

(B3)測量上述(B2)所得之圖像中的P1層之面積(亦包含P1層內存在之空隙及無機粒子的面積之全部面積),將此設為A。另外,在圖像中難以判別P1層與其它層之界面時,另外相同,對於樣品之剖面使用微分干涉顯微鏡觀察偏光檢索P1層之界面位置,估計P1層之面積。 (B3) Measure the area of the P1 layer in the image obtained in the above (B2) (including the entire area of the voids and the area of the inorganic particles existing in the P1 layer), and set this as A. In addition, when it is difficult to distinguish the interface between the P1 layer and other layers in the image, in the same way, the cross-section of the sample is observed using a differential interference microscope to search for the interface position of the P1 layer, and the area of the P1 layer is estimated.

(B4)測量圖像中之P1層內存在的全部無機粒子之面積,將總面積設為C。此處,作為測量對象,不限於無機粒子之整體含在圖像內,僅部分出現的無機粒子亦包括在圖像內。而且,在圖像中難以判定無機粒子位置時,另外相同,對於樣品之剖面進行能量分散型X射線分析,判定包含無機物之部分後,求算出面積。 (B4) The area of all the inorganic particles present in the P1 layer in the image is measured, and the total area is set to C. Here, the measurement object is not limited to the inclusion of the entire inorganic particles in the image, and the inorganic particles that appear only partially are also included in the image. Furthermore, when it is difficult to determine the position of the inorganic particles in the image, similarly, energy dispersive X-ray analysis is performed on the cross section of the sample, and the area is calculated after determining the portion including the inorganic matter.

(B5)以C除以A(C/A),藉由在此乘以100,求取P1層 內之無機粒子的面積比例,以此值作為無機粒子含量Vf1(體積%)。 (B5) Divide C by A (C/A), and by multiplying here by 100, obtain the P1 layer The area ratio of the inorganic particles inside is taken as the inorganic particle content Vf1 (volume %).

(B6)(B4)中,計算所觀察之全部的無機粒子之個數,作為無機粒子之數Nf。 (B6) In (B4), the number of all observed inorganic particles is calculated as the number Nf of inorganic particles.

(B7)(B4)中,求取所觀察之無機粒子的各個面積,以該面積與描繪相同面積之正圓的直徑作為無機粒子之等效圓直徑(μm)。對於所觀察之全部粒子求取等效圓直徑後,以該等之算術平均值作為平均等效圓直徑(μm)。 In (B7) and (B4), each area of the observed inorganic particles is obtained, and the area and the diameter of a perfect circle that draws the same area are used as the equivalent circle diameter (μm) of the inorganic particles. After calculating the equivalent circle diameter for all the observed particles, the arithmetic mean of these was used as the average equivalent circle diameter (μm).

H. 薄膜之厚度T(μm)、由薄膜表面至厚度0.1T之範圍的無機粒子含量Vfa(體積%)、由厚度0.1T至厚度0.9T之範圍的無機粒子含量Vfb(體積%) H. Thin film thickness T (μm), inorganic particle content Vfa (volume %) ranging from the film surface to thickness 0.1T, inorganic particle content Vfb (volume %) ranging from thickness 0.1T to thickness 0.9T

薄膜之厚度T(μm)、由薄膜表面至厚度0.1T之範圍的無機粒子含量Vfa(體積%)、由厚度0.1T至厚度0.9T之範圍的無機粒子含量Vfb(體積%)係依以下(C1)~(C7)之步驟求得。而且,測定係將薄膜裁切處隨機地變更,共計進行10次,以該算術平均值分別作為薄膜之厚度T(μm)、由薄膜表面至厚度0.1T為止之範圍的無機粒子含量Vfa(體積%)、由厚度0.1T至厚度0.9T為止之範圍的無機粒子含量Vfb(體積%)。 The thickness T (μm) of the film, the inorganic particle content Vfa (volume %) in the range from the film surface to the thickness 0.1T, and the inorganic particle content Vfb (volume %) in the range from the thickness 0.1T to 0.9T are as follows ( C1) ~ (C7) steps to obtain. In addition, the measurement was carried out 10 times in total by randomly changing the cut position of the film, and the arithmetic mean value was used as the thickness T (μm) of the film and the inorganic particle content Vfa (volume) in the range from the film surface to the thickness of 0.1T, respectively. %), the inorganic particle content Vfb (volume %) in the range from thickness 0.1T to thickness 0.9T.

(C1)使用切片機,薄膜剖面在厚度方向不壓扁,以對薄膜面方向呈垂直裁切,並對薄膜長度方向(經由斷裂伸度之測定而定義之方向)呈平行裁切。 (C1) Using a slicing machine, the cross section of the film is not flattened in the thickness direction to cut perpendicular to the film surface direction and parallel to the longitudinal direction of the film (the direction defined by the measurement of elongation at break).

(C2)接著將裁切之剖面使用掃描型電子顯微鏡進行觀察,得到擴大3000倍觀察之圖像。而且,觀察處係隨機規定者,惟分別使圖像之上下方向與薄膜的厚度方向 、圖像之左右方向與薄膜之長度方向成為平行。而且,在厚度方向使觀察處移動而進行,準備由一表面至另一表面之連續圖像。 (C2) Next, the cut section was observed with a scanning electron microscope, and an image observed at a magnification of 3000 times was obtained. In addition, the observation point is randomly determined, but the upper and lower directions of the image and the thickness direction of the film are respectively set. , The left and right direction of the image is parallel to the length direction of the film. Furthermore, it is performed by moving the observation point in the thickness direction, and a continuous image from one surface to the other surface is prepared.

(C3)上述(C2)所得之圖像中,測量自表面至厚度0~0.1T之範圍的面積(包含薄膜內存在之空隙及無機粒子的面積之全部面積),將此設為Aa。而且,同樣地測量自表面至厚度0.1T~0.9T之範圍的面積,將總面積設為Ab。 (C3) In the image obtained in the above (C2), the area from the surface to the thickness of 0 to 0.1 T (the entire area including the area of voids and inorganic particles existing in the thin film) is measured, and this is defined as Aa. And similarly, the area from the surface to the range of thickness 0.1T-0.9T was measured, and the total area was made into Ab.

(C4)在圖像中之薄膜內,測量自表面至厚度0~0.1T之範圍的全部之無機粒子的面積,將總面積設為Ba。此處,作為測量對象,不僅限於厚度0~0.1T之範圍之無機粒子之整體含在圖像內,僅部分出現的無機粒子亦包括在圖像內。另外,在圖像中難以判別無機粒子之處時,另外相同,對於樣品之剖面進行能量分散型X射線分析,確定由無機物所構成之部分後,求算出面積。而且相同地測量自表面至厚度0.1T~0.9T之範圍的全部之無機粒子的面積,將總面積設為Bb。 (C4) In the thin film in the image, the area of all the inorganic particles in the range from the surface to the thickness of 0 to 0.1 T was measured, and the total area was defined as Ba. Here, as the measurement object, not only the entire inorganic particles in the range of thickness 0 to 0.1 T are included in the image, but the inorganic particles only partially appearing are also included in the image. In addition, when it is difficult to distinguish inorganic particles in the image, in the same manner, energy dispersive X-ray analysis is performed on the cross section of the sample, and the area is calculated after identifying the portion composed of inorganic substances. Furthermore, the area of all the inorganic particles in the range from the surface to the thickness of 0.1T to 0.9T was measured in the same manner, and the total area was defined as Bb.

(C5)以Ba除以Aa(Ba/Aa),藉由在此乘以100,求取自表面至厚度0~0.1T之範圍的無機粒子之面積比例,以此值作為自表面至厚度0.1T之範圍的無機粒子含量Vfa(體積%)。而且,同樣地以Bb除以Ab(Bb/Ab),藉由在此乘以100,作為0.1T~0.9T之範圍的無機粒子之含量Vfb(體積%)。而且,薄膜之厚度T(μm)係使用千分錶,依據JIS K7130(1992年)A-2法,對於將薄膜以10片重疊的狀態之任意5處,測定厚度。將該平均值除以10求出薄膜之厚度T(μm)。 (C5) Divide Ba by Aa (Ba/Aa), and multiply here by 100 to obtain the area ratio of inorganic particles ranging from the surface to the thickness of 0 to 0.1T, and use this value as the value from the surface to the thickness of 0.1 Inorganic particle content Vfa (volume %) in the range of T. And similarly, divide Bb by Ab (Bb/Ab), and multiply here by 100, and set it as content Vfb (vol%) of the inorganic particle in the range of 0.1T-0.9T. In addition, the thickness T (μm) of the thin film was measured using a dial gauge in accordance with JIS K7130 (1992) A-2 method at any five places in a state where ten thin films were stacked. The average value was divided by 10 to obtain the thickness T (μm) of the thin film.

I. 薄膜厚度方向之導熱率 I. Thermal conductivity in the thickness direction of the film

使用尖端平坦之千分錶厚度計(Mitsutoyo(股)製),測定薄膜厚度之後,使用鐘罩式沉積機在薄膜兩面沉積鋁。沉積厚度係自薄膜單面照射激光筆之雷射光,自相反面以肉眼觀察雷射光不再透過時之厚度。接著,將雷射光吸收用噴霧(Fine Chemical Japan(股)製之Black guard spray FC-153)薄薄地塗在兩面並使其乾燥後,切取10mm見方之正方形樣品,使用Xe閃光燈分析儀的NETZSCN製造的LFA467 Nanoflash,以測定溫度25℃測定薄膜厚度方向之熱擴散率α(m2/s)。而且,測定係實施4次,以其平均值作為熱擴散率,在下述式(2)求得導熱係數。 After measuring the thickness of the film using a flat-tip dial gauge thickness gauge (manufactured by Mitsutoyo Co., Ltd.), aluminum was deposited on both sides of the film using a bell jar deposition machine. The deposition thickness is the thickness when the laser light from the laser pointer is irradiated from one side of the film, and the thickness when the laser light is no longer transmitted is observed with the naked eye from the opposite side. Next, a spray for laser light absorption (Black guard spray FC-153 manufactured by Fine Chemical Japan Co., Ltd.) was applied thinly on both sides and dried, and then a 10 mm square sample was cut out and manufactured by NETZSCN using a Xe flash lamp analyzer. The LFA467 Nanoflash was used to measure the thermal diffusivity α (m 2 /s) in the thickness direction of the film at a measurement temperature of 25°C. Then, the measurement system was carried out four times, and the average value was used as the thermal diffusivity, and the thermal conductivity was obtained by the following formula (2).

導熱係數(W/mK)=α(m2/s)×比熱(J/kg.K)×密度(kg/m3) (2) Thermal conductivity (W/mK)=α(m 2 /s)×specific heat (J/kg.K)×density (kg/m 3 ) (2)

另外,比熱係使用依據JIS K-7123(1987)求得之值。而且,密度係使用薄膜裁成30mm×40mm大小之試料,並使用電子比重計(Mirage貿易(股)製之SD-120L),在室溫23℃、相對濕度65%之環境下,進行10次測定,使用所得之平均值。 In addition, the specific heat system used the value calculated|required based on JIS K-7123 (1987). In addition, the density is a sample cut into a size of 30mm × 40mm using a film, and an electronic hydrometer (SD-120L manufactured by Mirage Trading Co., Ltd.) is used at room temperature of 23°C and relative humidity of 65%. The environment is carried out 10 times. For measurement, the obtained average value was used.

J. 表面比電阻 J. Surface specific resistance

薄膜之表面比電阻係以數位超高電阻微電流計R8340(Advantest(股)製)測定。測定係在薄膜之兩面的各個面中,面內中在任意之10處實施測定,分別求取該平均值。所得平均值以較低之值作為表面比電阻。而且,測定試料係使用在23℃、65%Rh之室內經調濕24小時者 。使用所得之值並依下述者判定。A與B係實用範圍。 The surface specific resistivity of the thin film was measured with a digital ultra-high-resistance microcurrent meter R8340 (manufactured by Advantest Co., Ltd.). The measurement was carried out on each of both surfaces of the film, and the measurement was performed at arbitrary 10 places in the surface, and the average value was obtained for each. The obtained average value was taken as the surface specific resistance which was the lower value. In addition, the measurement sample was used in a room of 23°C, 65%Rh and humidity-conditioned for 24 hours. . Use the obtained value and determine as follows. A and B series practical range.

A:表面比電阻為5×1013Ω/□以上 A: Surface specific resistance is 5×10 13 Ω/□ or more

B:表面比電阻為1×1013Ω/□以上且小於5×1013Ω/□ B: The surface specific resistance is 1×10 13 Ω/□ or more and less than 5×10 13 Ω/□

D:表面比電阻小於1×1013Ω/□。 D: The surface specific resistance is less than 1×10 13 Ω/□.

K. 電絕緣性 K. Electrical Insulation

在薄膜之兩面,使乾燥後之厚度成為5μm之方式均勻地塗布熱硬化性之接著劑,隔著該接著劑在薄膜之兩面將杜邦帝人Advanced Paper公司之「Nomex」(註冊商標)(410型、厚度50μm)以熱壓機貼合。 On both sides of the film, a thermosetting adhesive was uniformly applied so that the thickness after drying was 5 μm, and “Nomex” (registered trademark) (Type 410 of DuPont Teijin Advanced Paper Co., Ltd.) was applied to both sides of the film through the adhesive. , thickness 50μm) with a hot press.

將所得積層體裁成25cm×25cm大小之正方形,在23℃、65%Rh之室內調濕24小時後,依據JIS C2151(2006),使用AC擊穿測試儀(春日電機(股)製、AC30kV),在頻率60Hz、升壓速度1000V/秒,測定每單位厚度之絕緣破壞電壓(kV/mm)。另外,積層體之厚度係使用尖端平坦之千分錶厚度計(Mitsutoyo(股)製)測量。電絕緣性係以下述判定基準評價。A、B係適合作為電絕緣性高之材料使用。 The obtained laminate was cut into a square of size 25cm×25cm, and the humidity was adjusted in a room of 23°C and 65%Rh for 24 hours. According to JIS C2151 (2006), an AC breakdown tester (manufactured by Kasuga Electric Co., Ltd., AC30kV) was used. , measure the dielectric breakdown voltage (kV/mm) per unit thickness at a frequency of 60Hz and a boosting speed of 1000V/sec. In addition, the thickness of the laminated body was measured using a flat-tip dial gauge thickness gauge (manufactured by Mitsutoyo Co., Ltd.). The electrical insulating properties were evaluated according to the following criteria. Series A and B are suitable for use as materials with high electrical insulating properties.

A:絕緣破壞電壓為150kV/mm以上 A: The dielectric breakdown voltage is above 150kV/mm

B:絕緣破壞電壓為100kV/mm以上且小於150kV/mm B: The dielectric breakdown voltage is more than 100kV/mm and less than 150kV/mm

D:絕緣破壞電壓小於100kV/mm。 D: The dielectric breakdown voltage is less than 100kV/mm.

L. 散熱性 L. Heat dissipation

在薄膜之兩面,使乾燥後之厚度成為5μm之方式均勻地塗布熱硬化性之接著劑,隔著該接著劑在薄膜之兩面將杜邦帝人Advanced Paper公司之「Nomex」(註冊商標)(410型、厚度50μm)以熱壓機貼合。 On both sides of the film, a thermosetting adhesive was uniformly applied so that the thickness after drying was 5 μm, and “Nomex” (registered trademark) (Type 410 of DuPont Teijin Advanced Paper Co., Ltd.) was applied to both sides of the film through the adhesive. , thickness 50μm) with a hot press.

將所得之積層體切成複數片直徑8cm之圓型,使厚度成為1~1.5mm之範圍的方式重疊,放置在25℃之室溫下的直徑3cm之面熱源(3W)之上使積層體的單面密接而設置。另外,在設置時,以積層體的中心與中心一置的方式設置,而且,在積層體與面熱源之界面、及積層體彼此的界面中,薄薄地塗布信越化學工業(股)製之散熱矽脂(G-775),以界面不混入空氣之方式使之密接。設置開始5分鐘過後,使用熱成像法(Nippon Avionics股份有限公司製造)測定熱源與相反面側之積層體的表面溫度。測定位置係對應於積層體之圓形的中心處,與對應於積層體之圓形的端部處之2處,分別將圓形的中心之溫度設為Tc(℃)、圓形的端部之溫度設為Te(℃)。Tc與Te之溫度差愈小,係指熱在周圍擴散而緩和熱點之意,散熱性係通過以下之判定基準評價。A~C係適用作為散熱性高的材料。 The obtained layered product was cut into a plurality of circular shapes with a diameter of 8 cm, stacked so that the thickness was in the range of 1 to 1.5 mm, and placed on a surface heat source (3W) with a diameter of 3 cm at a room temperature of 25°C to make the layered product. set for single-sided close contact. In addition, when installing, the center of the layered body is placed at the center, and the interface between the layered body and the surface heat source and the interface between the layered bodies are thinly coated with a heat sink manufactured by Shin-Etsu Chemical Co., Ltd. Silicone grease (G-775) to make the interface tightly bonded so that no air is mixed in the interface. Five minutes after the start of the setting, the surface temperature of the heat source and the laminate on the opposite side was measured using a thermal imaging method (manufactured by Nippon Avionics Co., Ltd.). The measurement positions correspond to the center of the circle of the laminated body, and two places correspond to the ends of the circle of the laminated body. The temperature at the center of the circle is Tc (°C), and the temperature at the end of the circle is set as Tc (°C), respectively. The temperature is set as Te (°C). The smaller the temperature difference between Tc and Te, means that the heat diffuses around and relieves the hot spot, and the heat dissipation is evaluated according to the following criteria. A to C series are suitable as materials with high heat dissipation.

A:Tc-Te小於10℃ A: Tc-Te is less than 10℃

B:Tc-Te為10℃以上且小於15℃ B: Tc-Te is 10°C or more and less than 15°C

C:Tc-Te為15℃以上且小於20℃ C: Tc-Te is 15°C or more and less than 20°C

D:Tc-Te為20℃以上。 D: Tc-Te is 20°C or higher.

M. 加工性 M. Processability

在薄膜之兩面,使乾燥後之厚度成為5μm之方式均勻地塗布熱硬化性之接著劑,隔著該接著劑在薄膜之兩面將杜邦帝人Advanced Paper公司之「Nomex」(註冊商標)(410型、厚度50μm)以熱壓機貼合。 On both sides of the film, a thermosetting adhesive was uniformly applied so that the thickness after drying was 5 μm, and “Nomex” (registered trademark) (Type 410 of DuPont Teijin Advanced Paper Co., Ltd.) was applied to both sides of the film through the adhesive. , thickness 50μm) with a hot press.

接著,對於所得之積層體,使用Scott耐揉磨耗試驗 機(東洋精機工業(股)製),依據JIS-K-6328實施摩擦試驗。樣品尺寸係寬度10mm、長度200mm,以負載2.5kg測定,求得直到可用肉眼確認在積層界面之裂開或破損的次數。加工性係依以下基準判定。A與B在實用範圍。 Next, the obtained layered product was subjected to the Scott rubbing abrasion test. machine (manufactured by Toyo Seiki Kogyo Co., Ltd.), and a friction test was carried out in accordance with JIS-K-6328. The size of the sample is 10 mm in width and 200 mm in length, measured with a load of 2.5 kg, and the number of times of cracking or breakage at the laminate interface can be confirmed with the naked eye. Workability was determined according to the following criteria. A and B are in the practical range.

A:100次以上 A: More than 100 times

B:50次以上且小於100次 B: 50 times or more and less than 100 times

C:小於50次 C: less than 50 times

N. 對平滑面之接著性 N. Adhesion to smooth surfaces

在薄膜之兩面,使乾燥後之厚度成為5μm之方式均勻地塗布熱硬化性之接著劑,隔著該接著劑在薄膜之兩面將Toray(股)製PPS薄膜「Torelina」(註冊商標)(3030型、厚度16μm)以熱壓機貼合。切成寬度10mm、長度200mm之樣品,將樣品在大榮科學精器製作所製造之拉伸試驗機中,在速度200mm/分鐘、剝離角度180°保持的條件下,依照JIS K 6854-2(1999)測定。由所得之剝離長度(mm)與剝離負載(N)的測定數據,依最佳線性方法導出最佳負載直線,求得180°剝離強度。對平滑面之接著性係以下述基準判定。A與B在實用上為佳。 On both sides of the film, a thermosetting adhesive was uniformly applied so that the thickness after drying was 5 μm, and the PPS film “Torelina” (registered trademark) (3030) made by Toray Co., Ltd. was applied to both sides of the film through the adhesive. type, thickness 16 μm) and lamination with a hot press. Cut into samples with a width of 10mm and a length of 200mm, and put the samples in a tensile testing machine manufactured by Taiei Science Precision Manufacturing Co., Ltd. under the conditions of a speed of 200mm/min and a peeling angle of 180°, in accordance with JIS K 6854-2 (1999 ) to measure. From the obtained measurement data of the peeling length (mm) and peeling load (N), the optimum load straight line was derived according to the optimum linear method, and the 180° peel strength was obtained. Adhesion to the smooth surface was determined according to the following criteria. A and B are practically better.

A:3.0N/cm以上 A: 3.0N/cm or more

B:1.0N/cm以上且小於3.0N/cm B: 1.0N/cm or more and less than 3.0N/cm

C:小於1.0N/cm。 C: Less than 1.0 N/cm.

[實施例] [Example]

以下,對於本發明係列舉實施例進行說明,惟本發明並不限於該等。 Hereinafter, the present invention will be described with reference to a series of embodiments, but the present invention is not limited to these.

(參考例1-1) (Reference Example 1-1)

使用對酞酸二甲酯作為酸成分、使用乙二醇作為二元醇,並將氧化鍺作為聚合觸媒,進行縮聚反應,得到固有黏度0.65之聚酯的顆粒。而且由此而得的聚酯之玻璃轉移溫度Tg為83℃、熔點Tm255℃、結晶熔解熱量為37J/g。 Using dimethyl terephthalate as an acid component, using ethylene glycol as a dihydric alcohol, and using germanium oxide as a polymerization catalyst, a polycondensation reaction was performed to obtain polyester particles with an intrinsic viscosity of 0.65. Furthermore, the glass transition temperature Tg of the polyester thus obtained was 83°C, the melting point Tm was 255°C, and the heat of crystal fusion was 37 J/g.

(參考例1-2) (Reference Example 1-2)

在高壓釜中饋入47%硫氫化鈉9.44kg(80莫耳)、96%氫氧化鈉3.43kg(82.4莫耳)、N-甲基-2-吡咯啶酮(NMP)13.0kg(131莫耳)、乙酸鈉2.86kg(34.9莫耳)及離子交換水12kg,常壓下一面通過氮氣一面以3小時緩緩加熱至235℃,餾除水17.0kg及NMP 0.3kg(3.23莫耳)之後,將反應容器冷卻至160℃。其次,加入作為主要單體之對-二氯苯(p-DCB)11.5kg(78.4莫耳)、作為副成分單體之1,2,4-三氯苯0.007kg(0.04莫耳),再追加NMP22.2kg(223莫耳),將反應容器在氮氣下密封,一面以400rpm攪拌,一面以0.6℃/分鐘之速度由200℃升溫至270℃。在270℃經過30分鐘之後,將水1.11kg(61.6莫耳)以10分鐘注入系統內,在270℃進一步持續100分鐘的反應。然後,再將水1.60kg(88.8莫耳)再次注入系統內,冷卻至240℃後,再以0.4℃/分鐘之速度冷卻至210℃,然後驟冷至室溫附近。取出內容物,以32公升之NMP稀釋後,將溶劑與固形物以篩子(80網目)分濾。將所得之粒子再度以38公升之NMP在85℃下清洗。然後,以67公升之溫水清洗5次,加以分濾,再以0.05質量%乙酸鈣水溶液70,000g清洗5次,加以分濾。藉由將所得之粒子在60℃下熱風乾燥,在 120℃下進行20小時之減壓乾燥,得到白色之PPS樹脂的粉粒體。所得PPS樹脂之粉粒體係玻璃轉移溫度Tg為92℃、熔點Tm280℃、結晶熔解熱量為33J/g。 Feed into the autoclave 9.44kg (80 moles) of 47% sodium hydrosulfide, 3.43kg (82.4 moles) of 96% sodium hydroxide, 13.0kg (131 moles) of N-methyl-2-pyrrolidone (NMP). ear), sodium acetate 2.86kg (34.9 moles) and 12kg of ion-exchanged water, slowly heated to 235 ° C for 3 hours by nitrogen gas under normal pressure, after the distillation of water 17.0kg and NMP 0.3kg (3.23 moles) , the reaction vessel was cooled to 160 °C. Next, 11.5 kg (78.4 mol) of p-dichlorobenzene (p-DCB) as the main monomer, 0.007 kg (0.04 mol) of 1,2,4-trichlorobenzene as the sub-component monomer were added, and then 22.2 kg (223 moles) of NMP was added, the reaction vessel was sealed under nitrogen, and the temperature was increased from 200°C to 270°C at a rate of 0.6°C/min while stirring at 400 rpm. After 30 minutes at 270°C, 1.11 kg (61.6 mol) of water was injected into the system for 10 minutes, and the reaction was further continued at 270°C for 100 minutes. Then, 1.60 kg (88.8 moles) of water was injected into the system again, cooled to 240°C, then cooled to 210°C at a rate of 0.4°C/min, and then quenched to around room temperature. The contents were taken out and diluted with 32 liters of NMP, and then the solvent and solids were filtered through a sieve (80 mesh). The resulting particles were washed again with 38 liters of NMP at 85°C. Then, it wash|cleaned 5 times with 67 liters of warm water, and carried out separate filtration, and also washed five times with 70,000 g of 0.05 mass % calcium acetate aqueous solution, and carried out separate filtration. By drying the obtained particles with hot air at 60°C, Drying under reduced pressure was carried out at 120° C. for 20 hours to obtain white particles of PPS resin. The glass transition temperature Tg of the powder system of the obtained PPS resin was 92°C, the melting point Tm was 280°C, and the heat of crystal fusion was 33 J/g.

(參考例2-1) (Reference Example 2-1)

將平均粒徑17μm、高寬比4之矽灰石粒子(啟和爐材(股)製、K400)放入亨舍爾混合機中攪拌,在該狀態下,以對矽灰石粒子100質量%之矽烷偶合劑(信越化學(股)製、KBM-403)成為1質量%之方式將矽烷偶合劑噴霧添加,在70℃下加熱攪拌2小時後,取出,藉此得到經表面處理之矽灰石粒子。 Put the wollastonite particles with an average particle size of 17 μm and an aspect ratio of 4 (made by Kaihe Furnace Materials Co., Ltd., K400) into a Henschel mixer and stir, in this state, to 100 mass of wollastonite particles. % of silane coupling agent (manufactured by Shin-Etsu Chemical Co., Ltd., KBM-403) was sprayed and added to 1% by mass, heated and stirred at 70°C for 2 hours, and then taken out to obtain a surface-treated silicon limestone particles.

(參考例2-2) (Reference Example 2-2)

將平均粒徑1μm、高寬比1之氧化矽粒子放入亨舍爾混合機中攪拌,在該狀態下,以對矽灰石粒子100質量%之矽烷偶合劑(信越化學(股)製、KBM-403)成為1質量%之方式將矽烷偶合劑噴霧添加,在70℃下加熱攪拌2小時後,取出,藉此得到經表面處理之氧化矽粒子。 Silica particles with an average particle size of 1 μm and an aspect ratio of 1 were put into a Henschel mixer and stirred, and in this state, 100% by mass of a silane coupling agent (manufactured by Shin-Etsu Chemical Co., Ltd.) was added to the wollastonite particles. KBM-403) was added by spraying the silane coupling agent so as to be 1 mass %, and after heating and stirring at 70° C. for 2 hours, it was taken out to obtain surface-treated silicon oxide particles.

(參考例2-3) (Reference Example 2-3)

將平均粒徑30μm、高寬比4之矽灰石粒子(Kinsei Matec(股)製、FPW#150)放入亨舍爾混合機中攪拌,在該狀態下,以對矽灰石粒子100質量%之矽烷偶合劑(信越化學(股)製、KBM-403)成為1質量%之方式將矽烷偶合劑噴霧添加,在70℃下加熱攪拌2小時後,取出,藉此得到經表面處理之矽灰石粒子。 The wollastonite particles with an average particle size of 30 μm and an aspect ratio of 4 (manufactured by Kinsei Matec Co., Ltd., FPW #150) were put into a Henschel mixer and stirred. % of silane coupling agent (manufactured by Shin-Etsu Chemical Co., Ltd., KBM-403) was sprayed and added to 1% by mass, heated and stirred at 70°C for 2 hours, and then taken out to obtain a surface-treated silicon limestone particles.

(參考例3-1) (Reference Example 3-1)

將具有1處以上之側進料口且設有1處之混練槳混練 部的同向旋轉型之排氣式雙軸混練擠出機(日本製鋼所製、螺桿直徑為30mm、螺桿長度/螺桿直徑=45.5)加熱至265℃,從主進料口供給參考例1-1中得到的聚酯60質量份,從側進料口供給參考例2-1中得到的經表面處理之矽灰石粒子40質量份,溶融混練後,吐出成股束狀,在溫度25℃的水中冷卻後,立即切割,製作成含有40重量%之矽灰石粒子的母料顆粒。 The mixing paddle with more than 1 side feed port and 1 position will be kneaded The co-rotating type vented twin-shaft kneading extruder (made by Nippon Steel, screw diameter 30mm, screw length/screw diameter = 45.5) was heated to 265°C, and the reference example 1- 60 parts by mass of the polyester obtained in 1, 40 parts by mass of the surface-treated wollastonite particles obtained in Reference Example 2-1 were supplied from the side feed port, and after being melted and kneaded, they were spit out into strands, and the temperature was 25°C. After cooling in hot water, it was cut immediately to make master batch particles containing 40% by weight of wollastonite particles.

(參考例3-2) (Reference Example 3-2)

將具有1處以上之側進料口且設有1處之混練槳混練部的同向旋轉型之排氣式雙軸混練擠出機(日本製鋼所製、螺桿直徑為30mm、螺桿長度/螺桿直徑=45.5)加熱至265℃,從主進料口供給參考例1-1中得到的聚酯90質量份,從側進料口供給參考例2-2中得到的經表面處理之氧化矽粒子10質量份,溶融混練後,吐出成股束狀,在溫度25℃的水中冷卻後,立即切割,製作成含有10重量%之氧化矽粒子的母料顆粒。 A co-rotating type vented twin-shaft kneading extruder (manufactured by Nippon Steel, screw diameter 30 mm, screw length / screw Diameter=45.5) was heated to 265°C, 90 parts by mass of the polyester obtained in Reference Example 1-1 was supplied from the main feed port, and the surface-treated silicon oxide particles obtained in Reference Example 2-2 were supplied from the side feed port 10 parts by mass were melted and kneaded, and then discharged into strands, cooled in water at a temperature of 25°C, and cut immediately to prepare master batch particles containing 10% by weight of silicon oxide particles.

(參考例3-3) (Reference Example 3-3)

將具有1處以上之側進料口且設有1處之混練槳混練部的同向旋轉型之排氣式雙軸混練擠出機(日本製鋼所製、螺桿直徑為30mm、螺桿長度/螺桿直徑=45.5)加熱至265℃,從主進料口供給參考例1-1中得到的聚酯94.0質量份,從側進料口供給參考例2-2中得到的經表面處理之氧化矽粒子2.0質量份,以及平均纖維徑0.06μm、平均纖維長度10μm之多層奈米碳管4.0質量份,溶融混練後,吐出成股束狀,在溫度25℃的水中冷卻後,立即切割,製 作成含有2.0重量%之氧化矽粒子、4.0重量%之多層奈米碳管的母料顆粒。 A co-rotating type vented twin-shaft kneading extruder (manufactured by Nippon Steel, screw diameter 30 mm, screw length / screw Diameter=45.5) was heated to 265°C, 94.0 parts by mass of the polyester obtained in Reference Example 1-1 was supplied from the main feed port, and the surface-treated silicon oxide particles obtained in Reference Example 2-2 were supplied from the side feed port 2.0 parts by mass, and 4.0 parts by mass of multi-layer carbon nanotubes with an average fiber diameter of 0.06 μm and an average fiber length of 10 μm, melted and kneaded, spit out into strands, cooled in water at a temperature of 25 ° C, and immediately cut to make A master batch particle containing 2.0% by weight of silicon oxide particles and 4.0% by weight of multilayer carbon nanotubes was prepared.

(參考例3-4) (Reference Example 3-4)

將具有1處以上之側進料口且設有1處之混練槳混練部的同向旋轉型之排氣式雙軸混練擠出機(日本製鋼所製、螺桿直徑為30mm、螺桿長度/螺桿直徑=45.5)加熱至265℃,從主進料口供給參考例1-1中得到的聚酯70.0質量份,從側進料口供給參考例2-2中得到的經表面處理之氧化矽粒子2.0質量份,以及參考例2-3中得到的矽灰石粒子28.0質量份,溶融混練後,吐出成股束狀,在溫度25℃的水中冷卻後,立即切割,製作成含有2.0重量%之氧化矽粒子、28.0重量%之矽灰石粒子的母料顆粒。 A co-rotating type vented twin-shaft kneading extruder (manufactured by Nippon Steel, screw diameter 30 mm, screw length / screw Diameter=45.5) was heated to 265°C, 70.0 parts by mass of the polyester obtained in Reference Example 1-1 was supplied from the main feed port, and the surface-treated silicon oxide particles obtained in Reference Example 2-2 were supplied from the side feed port 2.0 parts by mass, and 28.0 parts by mass of the wollastonite particles obtained in Reference Example 2-3 were melted and kneaded, spit out into strands, cooled in water at a temperature of 25°C, and then cut immediately to make 2.0 wt % of the wollastonite particles. Masterbatch particles of silica particles, 28.0 wt% wollastonite particles.

(參考例3-5) (Reference Example 3-5)

將參考例1-2中得到的PPS粉粒體在設於320℃的單軸擠出機中溶融混練擠出股束狀,以切割機切斷而顆粒化。 The PPS powders and granules obtained in Reference Example 1-2 were melt-kneaded and extruded into strands in a uniaxial extruder set at 320° C., cut with a cutter, and pelletized.

(參考例3-6) (Reference Example 3-6)

將具有1處以上之側進料口且設有1處之混練槳混練部的同向旋轉型之排氣式雙軸混練擠出機(日本製鋼所製、螺桿直徑為30mm、螺桿長度/螺桿直徑=45.5)加熱至310℃,從主進料口供給參考例1-2中得到的PPS樹脂60質量份,從側進料口供給參考例2-1中得到的經表面處理之矽灰石粒子40質量份,溶融混練後,吐出成股束狀,在溫度25℃的水中冷卻後,立即切割,製作成含有40重量%之矽灰石粒子的母料顆粒。 A co-rotating type vented twin-shaft kneading extruder (manufactured by Nippon Steel, screw diameter 30 mm, screw length / screw Diameter=45.5) was heated to 310°C, 60 parts by mass of the PPS resin obtained in Reference Example 1-2 was supplied from the main feed port, and the surface-treated wollastonite obtained in Reference Example 2-1 was supplied from the side feed port 40 parts by mass of particles were melted and kneaded, and then discharged into strands, cooled in water at a temperature of 25° C., and then cut immediately to prepare master batch particles containing 40% by weight of wollastonite particles.

(實施例1) (Example 1)

將混合有參考例3-1所得之母料顆粒67.5質量份、與參考例1-1所得之聚酯32.5質量份者,在180℃之溫度下進行3小時真空乾燥後供給至擠出機,在氮氣環境下以280℃之溫度使熔融,導入至T模噴嘴。接著,由T模噴嘴內擠出成片狀作為熔融單層片,將該熔融單層片以靜電施加法密接於表面溫度保持在25℃之滾筒上並使其冷卻固化,得到未延伸單層薄膜。 67.5 parts by mass of the master batch pellet obtained in Reference Example 3-1 and 32.5 parts by mass of the polyester obtained in Reference Example 1-1 were mixed with vacuum drying at a temperature of 180° C. for 3 hours and then supplied to an extruder, It was melted at a temperature of 280° C. in a nitrogen atmosphere, and introduced into a T-die nozzle. Next, it was extruded from a T-die nozzle into a sheet as a molten monolayer sheet, and the molten monolayer sheet was adhered to a roller whose surface temperature was kept at 25°C by electrostatic application, and was cooled and solidified to obtain an unstretched monolayer. film.

接著,將該未延伸單層薄膜以加熱至90℃的溫度之輥群預熱後,使用100℃的溫度之加熱輥在長度方向(縱向)進行2.5倍延伸,以25℃的溫度之輥群冷卻,得到單軸延伸薄膜。將所得之單軸延伸薄膜的兩端以夾子握持,同時導入拉幅機內之90℃的溫度之預熱區,接著連續地在100℃的溫度之加熱區在長度方向朝直角方向(寬度方向)延伸2.75倍。進而接著,於拉幅機內之熱處理區1在220℃之溫度下施行20秒鐘之熱處理,進一步在熱處理區2進行150℃之熱處理,在熱處理區3以100℃之溫度進行熱處理。另外,熱處理時,在熱處理區1與熱處理區2之間在寬度方向進行4%之鬆弛處理。接著,均勻地緩慢冷卻後捲繞,得到厚度50μm之雙軸延伸薄膜。將所得薄膜之物性及特性呈示於表1。 Next, the unstretched single-layer film was preheated with a roll group heated to a temperature of 90° C., and then stretched 2.5 times in the longitudinal direction (longitudinal direction) using a heating roll with a temperature of 100° C., and a roll group with a temperature of 25° C. was used. After cooling, a uniaxially stretched film was obtained. Both ends of the obtained uniaxially stretched film were held by clips, while being introduced into a preheating zone at a temperature of 90°C in a tenter frame, and then continuously in a heating zone at a temperature of 100°C in the longitudinal direction in the right-angle direction (width). direction) extends 2.75 times. Further, heat treatment was performed at a temperature of 220°C for 20 seconds in a heat treatment zone 1 in the tenter frame, a heat treatment at a temperature of 150°C was further performed in a heat treatment zone 2 , and a heat treatment was performed at a temperature of 100°C in a heat treatment zone 3 . In addition, during the heat treatment, a relaxation treatment of 4% in the width direction is performed between the heat treatment zone 1 and the heat treatment zone 2. Next, it was uniformly cooled slowly and then wound up to obtain a biaxially stretched film with a thickness of 50 μm. The physical properties and characteristics of the obtained films are shown in Table 1.

(實施例2) (Example 2)

在實施例1,除了分別將供給至擠出機之母料顆粒之量變更為40.0質量份、聚酯之量變更為60.0質量份以外,係與實施例1同樣地進行操作,得到厚度50μm之雙軸延 伸薄膜。將所得薄膜之物性及特性呈示於表1。 In Example 1, except that the amount of the master batch pellets supplied to the extruder was changed to 40.0 parts by mass and the amount of polyester was changed to 60.0 parts by mass, respectively, it was carried out in the same manner as in Example 1 to obtain a pellet with a thickness of 50 μm. biaxial extension stretch film. The physical properties and characteristics of the obtained films are shown in Table 1.

(實施例3) (Example 3)

在實施例1,除了分別將供給至擠出機之母料顆粒之量變更為30.0質量份、聚酯之量變更為70.0質量份以外,係與實施例1同樣地進行操作,得到厚度50μm之雙軸延伸薄膜。將所得薄膜之物性及特性呈示於表1。 In Example 1, except that the amount of the master batch pellets supplied to the extruder was changed to 30.0 parts by mass and the amount of polyester was changed to 70.0 parts by mass, respectively, it was carried out in the same manner as in Example 1 to obtain a pellet with a thickness of 50 μm. Biaxially stretched film. The physical properties and characteristics of the obtained films are shown in Table 1.

(比較例3) (Comparative Example 3)

在實施例1,除了分別將供給至擠出機之母料顆粒之量變更為20.0質量份、聚酯之量變更為80.0質量份以外,係與實施例1同樣地進行操作,得到厚度50μm之雙軸延伸薄膜。將所得薄膜之物性及特性呈示於表1。 In Example 1, except that the amount of the master batch pellets supplied to the extruder was changed to 20.0 parts by mass and the amount of polyester was changed to 80.0 parts by mass, respectively, it was carried out in the same manner as in Example 1 to obtain a pellet with a thickness of 50 μm. Biaxially stretched film. The physical properties and characteristics of the obtained films are shown in Table 1.

(實施例4) (Example 4)

在參考例2-1,除了使用平均粒徑4μm、高寬比8之矽灰石粒子(Kinsei Matec(股)製、SH-1800)取代平均粒徑17μm、高寬比4之矽灰石粒子以外,係與實施例1同樣地進行操作,得到厚度50μm之雙軸延伸薄膜。將所得薄膜之物性及特性呈示於表1。 In Reference Example 2-1, wollastonite particles with an average particle size of 4 μm and an aspect ratio of 8 (manufactured by Kinsei Matec Co., Ltd., SH-1800) were used instead of the wollastonite particles with an average particle size of 17 μm and an aspect ratio of 4. Other than that, it carried out similarly to Example 1, and obtained the biaxially stretched film of thickness 50 micrometers. The physical properties and characteristics of the obtained films are shown in Table 1.

(比較例1) (Comparative Example 1)

將混合有參考例3-2所得之母料顆粒10.0質量份、與參考例1-1所得之聚酯90.0質量份者,在180℃之溫度下進行3小時真空乾燥後供給至擠出機,在氮氣環境下以280℃之溫度使熔融,導入至T模噴嘴。接著,由T模噴嘴內擠出成片狀作為熔融單層片,將該熔融單層片以靜電施加法密接於表面溫度保持在25℃之滾筒上並使其冷卻固化,得到未延伸單層薄膜。此後與實施例1同樣地進行 操作而進行延伸,得到厚度50μm之雙軸延伸薄膜。將所得薄膜之物性及特性呈示於表1。 After mixing 10.0 parts by mass of the master batch pellets obtained in Reference Example 3-2 and 90.0 parts by mass of the polyester obtained in Reference Example 1-1, vacuum-drying at a temperature of 180° C. for 3 hours was supplied to an extruder, It was melted at a temperature of 280° C. in a nitrogen atmosphere, and introduced into a T-die nozzle. Next, it was extruded from a T-die nozzle into a sheet as a molten monolayer sheet, and the molten monolayer sheet was adhered to a roller whose surface temperature was kept at 25°C by electrostatic application, and was cooled and solidified to obtain an unstretched monolayer. film. Thereafter, it was carried out in the same manner as in Example 1 Stretching was performed by the operation to obtain a biaxially stretched film with a thickness of 50 μm. The physical properties and characteristics of the obtained films are shown in Table 1.

(比較例7) (Comparative Example 7)

將混合有參考例3-3所得之母料顆粒50.0質量份、與參考例1-1所得之聚酯50.0質量份者,在180℃之溫度下進行3小時真空乾燥後供給至擠出機,在氮氣環境下以280℃之溫度使熔融,導入至T模噴嘴。接著,由T模噴嘴內擠出成片狀作為熔融單層片,將該熔融單層片以靜電施加法密接於表面溫度保持在25℃之滾筒上並使其冷卻固化,得到未延伸單層薄膜。此後與實施例1同樣地進行操作而進行延伸,得到厚度50μm之雙軸延伸薄膜。將所得薄膜之物性及特性呈示於表1。 50.0 parts by mass of the master batch pellets obtained in Reference Example 3-3 and 50.0 parts by mass of the polyester obtained in Reference Example 1-1 were mixed with vacuum-drying at a temperature of 180° C. for 3 hours and then supplied to an extruder, It was melted at a temperature of 280° C. in a nitrogen atmosphere, and introduced into a T-die nozzle. Next, it was extruded from a T-die nozzle into a sheet as a molten monolayer sheet, and the molten monolayer sheet was adhered to a roller whose surface temperature was kept at 25°C by electrostatic application, and was cooled and solidified to obtain an unstretched monolayer. film. Thereafter, it was stretched in the same manner as in Example 1 to obtain a biaxially stretched film with a thickness of 50 μm. The physical properties and characteristics of the obtained films are shown in Table 1.

(實施例6) (Example 6)

將混合有參考例3-4所得之母料顆粒50.0質量份、與參考例1-1所得之聚酯50.0質量份者,在180℃之溫度下進行3小時真空乾燥後供給至擠出機,在氮氣環境下以280℃之溫度使熔融,導入至T模噴嘴。接著,由T模噴嘴內擠出成片狀作為熔融單層片,將該熔融單層片以靜電施加法密接於表面溫度保持在25℃之滾筒上並使其冷卻固化,得到未延伸單層薄膜。此後與實施例1同樣地進行操作而進行延伸,得到厚度50μm之雙軸延伸薄膜。將所得薄膜之物性及特性呈示於表1。 50.0 parts by mass of the master batch pellets obtained in Reference Example 3-4 and 50.0 parts by mass of the polyester obtained in Reference Example 1-1 were mixed with vacuum-drying at a temperature of 180° C. for 3 hours and then supplied to an extruder, It was melted at a temperature of 280° C. in a nitrogen atmosphere, and introduced into a T-die nozzle. Next, it was extruded from a T-die nozzle into a sheet as a molten monolayer sheet, and the molten monolayer sheet was adhered to a roller whose surface temperature was kept at 25°C by electrostatic application, and was cooled and solidified to obtain an unstretched monolayer. film. Thereafter, it was stretched in the same manner as in Example 1 to obtain a biaxially stretched film with a thickness of 50 μm. The physical properties and characteristics of the obtained films are shown in Table 1.

(比較例2) (Comparative Example 2)

在比較例1,除了分別將供給至擠出機之母料顆粒的量變更為60.0質量份、聚酯之量變更為40.0質量份以外, 以與比較例1之相同方式進行,得到厚度50μm之雙軸延伸薄膜。所得薄膜之物性及特性呈示於表1。 In Comparative Example 1, except that the amount of the master batch pellets supplied to the extruder was changed to 60.0 parts by mass and the amount of polyester was changed to 40.0 parts by mass, respectively, In the same manner as in Comparative Example 1, a biaxially stretched film with a thickness of 50 μm was obtained. The physical properties and characteristics of the obtained films are shown in Table 1.

(比較例4) (Comparative Example 4)

在實施例2,除了分別將長度方向的延伸倍率變更為3.6倍、寬度方向的延伸倍率變更為3.6倍以外,係與實施例2同樣地進行操作,得到厚度50μm之雙軸延伸薄膜。將所得薄膜之物性及特性呈示於表1。 In Example 2, a biaxially stretched film with a thickness of 50 μm was obtained in the same manner as in Example 2, except that the stretching ratio in the longitudinal direction was changed to 3.6 times and the stretching ratio in the width direction was changed to 3.6 times, respectively. The physical properties and characteristics of the obtained films are shown in Table 1.

(比較例6) (Comparative Example 6)

在實施例1,在得到未延伸單層薄膜時,除了將厚度調整為50μm,且未進行隨後之步驟以外,與實施例1同樣地進行操作,得到厚度50μm之未延伸單層薄膜。將所得薄膜之物性及特性呈示於表1。 In Example 1, when obtaining an unstretched monolayer film, except that the thickness was adjusted to 50 μm and the subsequent steps were not performed, the same procedure as in Example 1 was carried out to obtain an unstretched monolayer film with a thickness of 50 μm. The physical properties and characteristics of the obtained films are shown in Table 1.

(實施例5) (Example 5)

將比較例1所得之厚度50μm的雙軸延伸薄膜,及將下述模具1加熱至200℃,使片與模具之凹凸面接觸並以20MPa加壓,在該狀態下維持2分鐘。然後,將該模具冷卻後釋放壓力並從模具脫模,得到賦予表面凹凸的薄膜。將所得薄膜之物性及特性呈示於表1。 The biaxially stretched film with a thickness of 50 μm obtained in Comparative Example 1 and the following mold 1 were heated to 200° C., the sheet was brought into contact with the uneven surface of the mold, and pressed at 20 MPa, and maintained in this state for 2 minutes. Then, after cooling the mold, the pressure was released, and the mold was released from the mold to obtain a film having surface irregularities. The physical properties and characteristics of the obtained films are shown in Table 1.

‧模具1 Mold 1

材質:鎳、圖案:點狀、 Material: Nickel, Pattern: Dot,

凸部節距:140μm、凸部寬度:70μm、凸部高度:10μm。 The pitch of the convex portion: 140 μm, the width of the convex portion: 70 μm, and the height of the convex portion: 10 μm.

(比較例5) (Comparative Example 5)

將比較例1所得之厚度50μm的雙軸延伸薄膜,及將下述模具2加熱至200℃,使片與模具之凹凸面接觸並以 20MPa加壓,在該狀態下維持2分鐘。然後,將該模具冷卻後釋放壓力並從模具脫模,得到賦予表面凹凸的薄膜。將所得薄膜之物性及特性呈示於表1。 The biaxially stretched film with a thickness of 50 μm obtained in Comparative Example 1 and the following mold 2 were heated to 200° C., the sheet was brought into contact with the uneven surface of the mold, and the 20 MPa of pressure was applied, and this state was maintained for 2 minutes. Then, after cooling the mold, the pressure was released, and the mold was released from the mold to obtain a film having surface irregularities. The physical properties and characteristics of the obtained films are shown in Table 1.

‧模具2 Mold 2

材質:鎳、圖案:點狀、 Material: Nickel, Pattern: Dot,

凸部節距:500μm、凸部寬度:380μm、凸部高度:100μm。 Protrusion pitch: 500 μm, protrusion width: 380 μm, protrusion height: 100 μm.

(實施例7) (Example 7)

在實施例1,除了以雙軸延伸後之薄膜厚度成為250μm之方式而調整擠出機之擠出吐出量以外,係與實施例1同樣地進行操作,得到厚度250μm之雙軸延伸薄膜。將所得薄膜之物性及特性呈示於表1。 In Example 1, a biaxially stretched film having a thickness of 250 μm was obtained in the same manner as in Example 1, except that the extrusion output of the extruder was adjusted so that the film thickness after biaxial stretching was 250 μm. The physical properties and characteristics of the obtained films are shown in Table 1.

(實施例8) (Example 8)

準備2台擠出機(擠出機A及擠出機B),將混合有參考例3-1所得之母料顆粒67.5質量份、與參考例1-1所得之聚酯32.5質量份者,在180℃之溫度下進行3小時真空乾燥後供給至擠出機A,將僅有參考例1-1所得之聚酯在180℃之溫度下進行3小時真空乾燥後供給至擠出機B。使所供給之樹脂經由各個擠出機於氮氣環境下、在280℃之溫度熔融後,擠出機B之樹脂在擠出機A之樹脂的兩表層積層為3層,導入T模噴嘴。此時,以3層的積層厚度之比成為1:10:1之方式積層。接著,由T模噴嘴內擠出片狀作成熔融積層片,將該熔融積層片以靜電施加法密接於表面溫度保持在25℃之滾筒上並使其冷卻固化,得到未延伸積層薄膜。此後係與實施例1同樣地進行操作而進行延伸 ,得到厚度50μm之雙軸延伸薄膜。將所得薄膜之物性及特性呈示於表1。 Two extruders (extruder A and extruder B) were prepared, and 67.5 parts by mass of the master batch pellet obtained in Reference Example 3-1 and 32.5 parts by mass of polyester obtained in Reference Example 1-1 were mixed, After vacuum drying at a temperature of 180°C for 3 hours, it was supplied to extruder A, and only the polyester obtained in Reference Example 1-1 was vacuum-dried at a temperature of 180°C for 3 hours and supplied to extruder B. After the supplied resin was melted at a temperature of 280°C through each extruder in a nitrogen atmosphere, the resin of extruder B was laminated on both surfaces of the resin of extruder A into three layers, and was introduced into a T-die nozzle. At this time, the three layers were laminated so that the ratio of the lamination thicknesses of the three layers was 1:10:1. Next, a sheet was extruded from a T-die nozzle to form a molten laminated sheet, and the molten laminated sheet was adhered to a roller whose surface temperature was maintained at 25°C by electrostatic application, and was cooled and solidified to obtain an unstretched laminated film. After that, the extension was carried out in the same manner as in Example 1. , a biaxially stretched film with a thickness of 50 μm was obtained. The physical properties and characteristics of the obtained thin films are shown in Table 1.

(實施例9) (Example 9)

在實施例8,除了分別將供給至擠出機A之母料顆粒的量變更為40.0質量份、聚酯之量變更為60.0質量份以外,係與實施例8同樣地進行操作,得到厚度50μm之雙軸延伸薄膜。將所得薄膜之物性及特性呈示於表1。 In Example 8, except that the amount of the master batch pellets supplied to the extruder A was changed to 40.0 parts by mass and the amount of polyester was changed to 60.0 parts by mass, it was carried out in the same manner as in Example 8 to obtain a thickness of 50 μm. The biaxially stretched film. The physical properties and characteristics of the obtained films are shown in Table 1.

(實施例10) (Example 10)

在實施例8,除了分別將供給至擠出機A之母料顆粒的量變更為30.0質量份、聚酯之量變更為70.0質量份以外,係與實施例8同樣地進行操作,得到厚度50μm之雙軸延伸薄膜。將所得薄膜之物性及特性呈示於表1。 In Example 8, except that the amount of the master batch pellets supplied to the extruder A was changed to 30.0 parts by mass and the amount of polyester was changed to 70.0 parts by mass, it was carried out in the same manner as in Example 8 to obtain a thickness of 50 μm. The biaxially stretched film. The physical properties and characteristics of the obtained films are shown in Table 1.

(比較例9) (Comparative Example 9)

在實施例8,除了分別將供給至擠出機A之母料顆粒的量變更為20.0質量份、聚酯之量變更為80.0質量份以外,係與實施例1同樣地進行操作,得到厚度50μm之雙軸延伸薄膜。將所得薄膜之物性及特性呈示於表1。 In Example 8, except having changed the amount of the master batch pellets supplied to the extruder A to 20.0 parts by mass and the amount of polyester to 80.0 parts by mass, respectively, it was carried out in the same manner as in Example 1 to obtain a thickness of 50 μm. The biaxially stretched film. The physical properties and characteristics of the obtained films are shown in Table 1.

(實施例11) (Example 11)

在參考例2-1,除了使用平均粒徑4μm、高寬比8之矽灰石粒子(Kinsei Matec(股)製、SH-1800)取代平均粒徑17μm、高寬比4之矽灰石粒子以外,係與實施例8同樣地進行操作,得到厚度50μm之雙軸延伸薄膜。將所得薄膜之物性及特性呈示於表1。 In Reference Example 2-1, wollastonite particles with an average particle size of 4 μm and an aspect ratio of 8 (manufactured by Kinsei Matec Co., Ltd., SH-1800) were used instead of the wollastonite particles with an average particle size of 17 μm and an aspect ratio of 4. Other than that, it carried out similarly to Example 8, and obtained the biaxially stretched film of thickness 50 micrometers. The physical properties and characteristics of the obtained films are shown in Table 1.

(實施例18) (Example 18)

在參考例2-1,除了使用平均粒徑14μm之金屬矽粒子 (Kinsei Matec(股)製、M-Si # 350)取代平均粒徑17μm、高寬比4之矽灰石粒子以外,係與實施例8同樣地進行操作,得到厚度50μm之雙軸延伸薄膜。將所得薄膜之物性及特性呈示於表1。 In Reference Example 2-1, except for the use of metal silicon particles with an average particle size of 14 μm (Kinsei Matec Co., Ltd., M-Si# 350) was used in the same manner as in Example 8, except that the wollastonite particles having an average particle diameter of 17 μm and an aspect ratio of 4 were replaced, to obtain a biaxially stretched film with a thickness of 50 μm. The physical properties and characteristics of the obtained films are shown in Table 1.

(實施例19) (Example 19)

在參考例2-1,除了使用平均粒徑16μm之矽鋁酸鹽粒子(Quarzwerke公司製、SILATHERM T 1360-0112)取代平均粒徑17μm、高寬比4之矽灰石粒子以外,係與實施例8同樣地進行操作,得到厚度50μm之雙軸延伸薄膜。將所得薄膜之物性及特性呈示於表1。 In Reference Example 2-1, except that aluminosilicate particles with an average particle size of 16 μm (Silatherm T 1360-0112, manufactured by Quarzwerke Co., Ltd.) were used instead of the wollastonite particles with an average particle size of 17 μm and an aspect ratio of 4, the same procedures were carried out. Example 8 was carried out in the same manner to obtain a biaxially stretched film with a thickness of 50 μm. The physical properties and characteristics of the obtained films are shown in Table 1.

(實施例12) (Example 12)

將混合有參考例3-4所得之母料顆粒50.0質量份、與參考例1-1所得之聚酯50.0質量份者,在180℃之溫度下進行3小時真空乾燥後供給至擠出機A,在氮氣環境下以280℃之溫度使熔融以外,係與實施例8同樣地進行操作,得到厚度50μm之雙軸延伸薄膜。將所得薄膜之物性及特性呈示於表1。 After mixing 50.0 parts by mass of the master batch pellets obtained in Reference Example 3-4 and 50.0 parts by mass of the polyester obtained in Reference Example 1-1, the mixture was vacuum-dried at a temperature of 180° C. for 3 hours, and then supplied to the extruder A. , except that it was melted at a temperature of 280° C. in a nitrogen atmosphere, it was carried out in the same manner as in Example 8 to obtain a biaxially stretched film with a thickness of 50 μm. The physical properties and characteristics of the obtained films are shown in Table 1.

(比較例10) (Comparative Example 10)

在實施例8,將混合有參考例3-2所得之母料顆粒10.0質量份、與參考例1-1所得之聚酯90.0質量份者供給至擠出機A以外,係與實施例8同樣地進行操作,得到厚度50μm之雙軸延伸薄膜。將所得薄膜之物性及特性呈示於表1。 In Example 8, it was the same as Example 8 except that 10.0 parts by mass of the master batch pellet obtained in Reference Example 3-2 and 90.0 parts by mass of the polyester obtained in Reference Example 1-1 were mixed and supplied to the extruder A. This operation was carried out to obtain a biaxially stretched film with a thickness of 50 μm. The physical properties and characteristics of the obtained films are shown in Table 1.

(實施例13) (Example 13)

在實施例8,除了以雙軸延伸後之薄膜厚度成為 250μm之方式而調整擠出機之擠出吐出量以外,係與實施例8同樣地進行操作,得到厚度250μm之雙軸延伸薄膜。將所得薄膜之物性及特性呈示於表1。 In Example 8, except that the film thickness after biaxial stretching became Except having adjusted the extrusion discharge amount of the extruder so that it might become 250 micrometers, it carried out similarly to Example 8, and obtained the biaxially stretched film of thickness 250 micrometers. The physical properties and characteristics of the obtained films are shown in Table 1.

(實施例14) (Example 14)

除了將3層之積層厚度之比變更為1:16:1以外,係與實施例8同樣地進行操作,得到厚度50μm之雙軸延伸薄膜。將所得薄膜之物性及特性呈示於表1。 A biaxially stretched film with a thickness of 50 μm was obtained in the same manner as in Example 8, except that the ratio of the laminate thicknesses of the three layers was changed to 1:16:1. The physical properties and characteristics of the obtained films are shown in Table 1.

(實施例15) (Example 15)

除了將3層之積層厚度之比變更為1:8:1以外,係與實施例8同樣地進行操作,得到厚度50μm之雙軸延伸薄膜。將所得薄膜之物性及特性呈示於表1。 A biaxially stretched film having a thickness of 50 μm was obtained in the same manner as in Example 8, except that the ratio of the laminate thicknesses of the three layers was changed to 1:8:1. The physical properties and characteristics of the obtained films are shown in Table 1.

(實施例16) (Example 16)

除了將3層之積層厚度之比變更為1:6:1以外,係與實施例8同樣地進行操作,得到厚度50μm之雙軸延伸薄膜。將所得薄膜之物性及特性呈示於表1。 A biaxially stretched film having a thickness of 50 μm was obtained in the same manner as in Example 8, except that the ratio of the laminate thicknesses of the three layers was changed to 1:6:1. The physical properties and characteristics of the obtained films are shown in Table 1.

(比較例8) (Comparative Example 8)

除了將3層之積層厚度之比變更為1:4:1以外,係與實施例8同樣地進行操作,得到厚度50μm之雙軸延伸薄膜。將所得薄膜之物性及特性呈示於表1。 A biaxially stretched film having a thickness of 50 μm was obtained in the same manner as in Example 8, except that the ratio of the laminate thicknesses of the three layers was changed to 1:4:1. The physical properties and characteristics of the obtained films are shown in Table 1.

(比較例11) (Comparative Example 11)

在實施例9,除了分別將長度方向的延伸倍率變更為3.6倍、寬度方向的延伸倍率變更為3.6倍以外,係與實施例9同樣地進行操作,得到厚度50μm之雙軸延伸薄膜。將所得薄膜之物性及特性呈示於表1。 In Example 9, a biaxially stretched film with a thickness of 50 μm was obtained in the same manner as in Example 9, except that the stretching ratio in the longitudinal direction was changed to 3.6 times and the stretching ratio in the width direction was changed to 3.6 times, respectively. The physical properties and characteristics of the obtained films are shown in Table 1.

(實施例17) (Example 17)

準備2台擠出機(擠出機A及擠出機B),將混合有參考例3-6所得之母料顆粒67.5質量份、與參考例3-5所得之顆粒32.5質量份者,在180℃之溫度下進行3小時真空乾燥後供給至擠出機A,將僅有參考例3-5所得之顆粒在180℃之溫度下進行3小時真空乾燥後供給至擠出機B。使所供給之樹脂經由各個擠出機於氮氣環境下、在320℃之溫度熔融後,擠出機B之樹脂在擠出機A之樹脂的兩表層積層為3層,導入T模噴嘴。此時,以3層的積層厚度之比成為1:10:1之方式積層。接著,由T模噴嘴內擠出片狀作成熔融積層片,將該熔融積層片以靜電施加法密接於表面溫度保持在25℃之滾筒上並使其冷卻固化,得到未延伸積層薄膜。 Two extruders (extruder A and extruder B) were prepared, and 67.5 parts by mass of the master batch pellets obtained in Reference Example 3-6 and 32.5 parts by mass of the pellets obtained in Reference Example 3-5 were mixed in After vacuum drying at a temperature of 180°C for 3 hours, it was supplied to extruder A, and only the pellets obtained in Reference Example 3-5 were vacuum dried at a temperature of 180°C for 3 hours and supplied to extruder B. After the supplied resin was melted at a temperature of 320° C. through each extruder in a nitrogen atmosphere, the resin of extruder B was laminated on both surfaces of the resin of extruder A to form three layers and introduced into a T-die nozzle. At this time, the three layers were laminated so that the ratio of the lamination thicknesses of the three layers was 1:10:1. Next, a sheet was extruded from a T-die nozzle to form a molten laminated sheet, and the molten laminated sheet was adhered to a roller whose surface temperature was maintained at 25°C by electrostatic application, and was cooled and solidified to obtain an unstretched laminated film.

接著,將該未延伸單層薄膜以加熱至100℃的溫度之輥群預熱後,使用110℃的溫度之加熱輥在長度方向(縱向)進行2.5倍延伸,以25℃的溫度之輥群冷卻,得到單軸延伸薄膜。將所得之單軸延伸薄膜的兩端以夾子握持,同時導入拉幅機內之100℃的溫度之預熱區,接著連續地在110℃的溫度之預熱區在長度方向朝直角方向(寬度方向)延伸2.75倍。進而接著,於拉幅機內之熱處理區1在180℃之溫度下施行熱處理,進一步在熱處理區2進行230℃之熱處理,在熱處理區3以130℃之溫度進行熱處理。另外,熱處理時,在熱處理區1與熱處理區2之間在寬度方向進行4%之鬆弛處理。接著,均勻地緩慢冷卻後捲繞,得到厚度50μm之雙軸延伸薄膜。將所得薄膜之物性及特性呈示於表1。 Next, the unstretched single-layer film was preheated with a roll group heated to a temperature of 100° C., and then stretched 2.5 times in the longitudinal direction (longitudinal direction) using a heating roll with a temperature of 110° C., and a roll group with a temperature of 25° C. was used. After cooling, a uniaxially stretched film was obtained. Both ends of the obtained uniaxially stretched film were held with clips, while being introduced into a preheating zone at a temperature of 100°C in a tenter frame, and then continuously in the preheating zone at a temperature of 110°C in the longitudinal direction in the right-angle direction ( Width direction) extends 2.75 times. Furthermore, heat treatment was performed at a temperature of 180° C. in the heat treatment zone 1 in the tenter, further heat treatment at a temperature of 230° C. in the heat treatment zone 2 , and heat treatment at a temperature of 130° C. in the heat treatment zone 3 . In addition, during the heat treatment, a relaxation treatment of 4% in the width direction is performed between the heat treatment zone 1 and the heat treatment zone 2. Next, it was uniformly cooled slowly and then wound up to obtain a biaxially stretched film with a thickness of 50 μm. The physical properties and characteristics of the obtained thin films are shown in Table 1.

Figure 106110684-A0305-02-0056-1
Figure 106110684-A0305-02-0056-1

Figure 106110684-A0305-02-0057-2
Figure 106110684-A0305-02-0057-2

Figure 106110684-A0305-02-0058-3
Figure 106110684-A0305-02-0058-3

Figure 106110684-A0305-02-0059-4
Figure 106110684-A0305-02-0059-4

[產業上之可利用性] [Industrial Availability]

依據本發明,可提供一種電絕緣性、散熱性及加工性比以往之薄膜優異的薄膜。該薄膜係可適用在覆銅積層板、太陽能電池用背板、黏著帶、可撓性印刷電路基板、薄膜開關、面狀發熱體、扁平電纜、旋轉機用絕緣材料、電池用絕緣材料等之重視電絕緣性與散熱性之用途。而且,亦可發揮薄膜之表面特性而使用在黏著帶、離型膜、轉印膜、設計片、建築材料等。 According to the present invention, it is possible to provide a thin film having excellent electrical insulating properties, heat dissipation properties, and processability as compared with conventional thin films. The film can be applied to copper clad laminates, back sheets for solar cells, adhesive tapes, flexible printed circuit boards, membrane switches, planar heating elements, flat cables, insulating materials for rotating machines, insulating materials for batteries, etc. Emphasis on the use of electrical insulation and heat dissipation. In addition, it can also be used in adhesive tapes, release films, transfer films, design sheets, building materials, etc. by taking advantage of the surface properties of the film.

Claims (10)

一種薄膜,其係至少一側的表面之粗大突起數SPc(4000)為15個/mm2以上,該薄膜之厚度為3μm以上500μm以下,該薄膜具有包含無機粒子之層(P1層),當P1層中之無機粒子的含量設為Vf1(體積%)、P1層中之空隙率設為Va(體積%)時,Va/Vf1為1以下。 A thin film, the number of coarse protrusions SPc (4000) on the surface of at least one side is 15 pieces/mm 2 or more, the thickness of the thin film is 3 μm or more and 500 μm or less, and the thin film has a layer (P1 layer) containing inorganic particles, when Va/Vf1 is 1 or less when the content of the inorganic particles in the P1 layer is Vf1 (volume %) and the porosity in the P1 layer is Va (volume %). 如請求項1之薄膜,其中在該P1層以垂直於薄膜面方向且平行於薄膜長度方向的方式切取之剖面中,當每10000μm2存在之無機粒子的數設為Nf(個)時,Nf/Vf1為25以下。 When the thin film Paragraph 1 request, wherein the P1 layer cross section in a manner perpendicular to the film plane direction and parallel to the film longitudinal direction is cut out of, when the number of the inorganic particles present of each 10000μm 2 to Nf of (a), Nf of /Vf1 is 25 or less. 如請求項1或2之薄膜,其中在該P1層以垂直於薄膜面方向且平行於薄膜長度方向的方式切取之剖面中,無機粒子之平均等效圓直徑為3μm以上。 The film of claim 1 or 2, wherein in the cross section of the P1 layer taken perpendicular to the film surface direction and parallel to the film length direction, the average equivalent circle diameter of the inorganic particles is 3 μm or more. 如請求項1或2之薄膜,其中薄膜具有包含無機粒子之層(P1層),就薄膜之厚度設為T(μm)且該粗大突起數SPc(4000)為15個/mm2以上之表面而言,當從該表面至該厚度0.1T為止之範圍的無機粒子含量設為Vfa(體積%)、從該厚度0.1T至該厚度0.9T為止之範圍的無機粒子含量設為Vfb(體積%)時,Vfa/Vfb滿足0≦Vfa/Vfb<1。 The thin film of claim 1 or 2, wherein the thin film has a layer (P1 layer) containing inorganic particles, the thickness of the thin film is set as T (μm) and the number of coarse protrusions SPc (4000) is 15 pieces/mm 2 or more of the surface For example, when the content of inorganic particles in the range from the surface to the thickness of 0.1T is set as Vfa (volume %), and the content of inorganic particles in the range from the thickness of 0.1T to the thickness of 0.9T is set as Vfb (volume %) ), Vfa/Vfb satisfies 0≦Vfa/Vfb<1. 如請求項1或2之薄膜,其中薄膜之厚度方向的導熱係數為0.15W/mK以上,且表面比電阻為1013Ω/□以上。 The film of claim 1 or 2, wherein the thermal conductivity in the thickness direction of the film is 0.15 W/mK or more, and the surface specific resistance is 10 13 Ω/□ or more. 如請求項1或2之薄膜,其中薄膜係以聚酯樹脂為主成分。 The film of claim 1 or 2, wherein the film is mainly composed of polyester resin. 如請求項1或2之薄膜,其中該粗大突起數SPc(4000)為15個/mm2以上之表面的表面粗糙度Ra為100nm以上。 The thin film according to claim 1 or 2, wherein the surface roughness Ra of the surface of which the number of coarse protrusions SPc(4000) is 15 pieces/mm 2 or more is 100 nm or more. 一種電絕緣片,其係使用如請求項1至7中任一項之薄膜而成。 An electrical insulating sheet, which is formed using the thin film according to any one of claims 1 to 7. 一種黏著帶,其係使用如請求項1至7中任一項之薄膜而成。 An adhesive tape, which is formed using the film according to any one of claims 1 to 7. 一種旋轉機,其係使用如請求項8之電絕緣片而成。 A rotating machine is made by using the electrical insulating sheet as claimed in item 8.
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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06183166A (en) * 1992-12-22 1994-07-05 Toray Ind Inc Film for thermal stencil paper
US20040175560A1 (en) * 2003-01-30 2004-09-09 Chang-Ho Suh Porous polyester film
TW200730347A (en) * 2005-11-28 2007-08-16 Toray Industries Biaxially oriented film laminating board, electrical insulation board and machine part
CN105073858A (en) * 2013-03-26 2015-11-18 东丽株式会社 Film

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3111492B2 (en) 1991-03-28 2000-11-20 三菱化学ポリエステルフィルム株式会社 Polyester film
EP0674589A4 (en) * 1992-12-09 1996-02-28 Hoechst Ag Electrical insulation from biaxially oriented penbb film.
JPH08225728A (en) 1995-02-20 1996-09-03 Kanegafuchi Chem Ind Co Ltd Flame-retardant polyester-based resin composition
EP1314550B1 (en) * 2000-08-22 2008-04-16 Toyo Boseki Kabushiki Kaisha Laminated biaxially-oriented polyamide film and process for producing the same
JP2005229104A (en) 2004-01-13 2005-08-25 Toray Ind Inc Biaxial orientation polyester film for capacitor, metallized polyester film, and film capacitor
WO2007129695A1 (en) * 2006-05-10 2007-11-15 Toray Industries, Inc. Biaxially oriented polyarylene sulfide film
JP4977424B2 (en) 2006-09-28 2012-07-18 株式会社カネカ Graphite composite film
CN101797800B (en) * 2009-12-30 2012-05-30 四川华通特种工程塑料研究中心有限公司 Technology for preparing polyphenyl sulfide composite film
JP5788731B2 (en) 2011-07-29 2015-10-07 帝人デュポンフィルム株式会社 Biaxially stretched thermoplastic resin film for high thermal conductive adhesive tape substrate and high thermal conductive adhesive tape comprising the same
JP6017767B2 (en) 2011-08-05 2016-11-02 帝人フィルムソリューション株式会社 High thermal conductivity biaxially stretched polyester film
JP2017066391A (en) 2015-09-29 2017-04-06 東レ株式会社 Polyester film and electric insulation sheet, wind power generator and adhesive tape using the same

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06183166A (en) * 1992-12-22 1994-07-05 Toray Ind Inc Film for thermal stencil paper
US20040175560A1 (en) * 2003-01-30 2004-09-09 Chang-Ho Suh Porous polyester film
TW200730347A (en) * 2005-11-28 2007-08-16 Toray Industries Biaxially oriented film laminating board, electrical insulation board and machine part
CN105073858A (en) * 2013-03-26 2015-11-18 东丽株式会社 Film

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