TWI684667B - 沉積技術（一） - Google Patents
沉積技術（一） Download PDFInfo
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- TWI684667B TWI684667B TW104140939A TW104140939A TWI684667B TW I684667 B TWI684667 B TW I684667B TW 104140939 A TW104140939 A TW 104140939A TW 104140939 A TW104140939 A TW 104140939A TW I684667 B TWI684667 B TW I684667B
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- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
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- C23C16/45544—Atomic layer deposition [ALD] characterized by the apparatus
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- C23C16/484—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using X-ray radiation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
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- C23C16/487—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using electron radiation
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- C—CHEMISTRY; METALLURGY
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- C23C16/54—Apparatus specially adapted for continuous coating
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
- C23C16/482—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using incoherent light, UV to IR, e.g. lamps
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
- C23C16/483—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using coherent light, UV to IR, e.g. lasers
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Chemical Vapour Deposition (AREA)
- Formation Of Insulating Films (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FI20140361A FI126970B (en) | 2014-12-22 | 2014-12-22 | Atomic layer cultivation in which the first and second species of source materials are present simultaneously |
| FI20140361 | 2014-12-22 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201634736A TW201634736A (zh) | 2016-10-01 |
| TWI684667B true TWI684667B (zh) | 2020-02-11 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
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| EP3559307B1 (en) * | 2017-02-08 | 2022-08-03 | Picosun Oy | Deposition or cleaning apparatus with movable structure and method of operation |
| CN107400878A (zh) * | 2017-07-26 | 2017-11-28 | 北京芯微诺达科技有限公司 | 一种原子层沉积设备的进气系统及其方法 |
| FI129557B (en) | 2019-11-28 | 2022-04-29 | Picosun Oy | Substrate processing apparatus and process |
| FI129369B (en) * | 2020-06-26 | 2021-12-31 | Picosun Oy | Substrate processing equipment and process |
| RU2748658C1 (ru) * | 2020-07-16 | 2021-05-28 | Пикосан Ой | Устройство для осаждения или очистки с подвижной конструкцией и способ его эксплуатации |
| RU204415U1 (ru) * | 2020-12-17 | 2021-05-24 | Дмитрий Сергеевич Кузьмичев | Устройство для атомно-слоевого осаждения |
| KR20220164161A (ko) * | 2021-06-04 | 2022-12-13 | 주성엔지니어링(주) | 박막 증착 방법 |
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- 2015-11-25 RU RU2017124639A patent/RU2702669C2/ru active
- 2015-11-25 EP EP15872018.5A patent/EP3237650B1/en active Active
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- 2015-11-25 CN CN201580069868.XA patent/CN107109647A/zh active Pending
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- 2015-11-25 KR KR1020247012706A patent/KR20240056632A/ko not_active Ceased
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Also Published As
| Publication number | Publication date |
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| WO2016102748A1 (en) | 2016-06-30 |
| ES2870613T3 (es) | 2021-10-27 |
| KR20240056632A (ko) | 2024-04-30 |
| TW201634736A (zh) | 2016-10-01 |
| JP2018500462A (ja) | 2018-01-11 |
| CN107109647A (zh) | 2017-08-29 |
| EP3237650A1 (en) | 2017-11-01 |
| US20170342560A1 (en) | 2017-11-30 |
| KR20170099904A (ko) | 2017-09-01 |
| FI20140361A7 (fi) | 2016-06-23 |
| RU2017124639A3 (enExample) | 2019-05-08 |
| KR102659545B1 (ko) | 2024-04-23 |
| KR20230163589A (ko) | 2023-11-30 |
| SG11201703665WA (en) | 2017-06-29 |
| FI126970B (en) | 2017-08-31 |
| EP3237650A4 (en) | 2018-01-17 |
| RU2017124639A (ru) | 2019-01-24 |
| JP6814136B2 (ja) | 2021-01-13 |
| US10619241B2 (en) | 2020-04-14 |
| CN115961267A (zh) | 2023-04-14 |
| RU2702669C2 (ru) | 2019-10-09 |
| EP3237650B1 (en) | 2021-04-21 |
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