TWI676924B - Touch display device - Google Patents

Touch display device Download PDF

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TWI676924B
TWI676924B TW107139210A TW107139210A TWI676924B TW I676924 B TWI676924 B TW I676924B TW 107139210 A TW107139210 A TW 107139210A TW 107139210 A TW107139210 A TW 107139210A TW I676924 B TWI676924 B TW I676924B
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light
layer
thickness
conductive layer
refractive index
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TW107139210A
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TW202018473A (en
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鄭文騰
Wen Teng Cheng
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友達光電股份有限公司
Au Optronics Corporation
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Priority to TW107139210A priority Critical patent/TWI676924B/en
Priority to CN201910491083.1A priority patent/CN110221725A/en
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    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412Digitisers structurally integrated in a display

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Position Input By Displaying (AREA)
  • Polarising Elements (AREA)

Abstract

一種觸控顯示裝置,包含陣列基板、顯示介質層、濾光層、第一透光氧化層、第二透光氧化層、透光導電層以及觸控面板。顯示介質層設置在陣列基板之上。濾光層設置在顯示介質層之上。第一透光氧化層設置在濾光層之上,並具有第一折射率。第二透光氧化層設置在第一透光氧化層之上,並具有第二折射率,且第一折射率大於第二折射率。透光導電層設置在第二透光氧化層之上,其中透光導電層的厚度介於1000埃(Å)與3000埃(Å)之間。觸控面板設置在透光導電層之上。 A touch display device includes an array substrate, a display medium layer, a filter layer, a first transparent oxide layer, a second transparent oxide layer, a transparent conductive layer, and a touch panel. The display medium layer is disposed on the array substrate. The filter layer is disposed on the display medium layer. The first light-transmitting oxide layer is disposed above the filter layer and has a first refractive index. The second transparent oxide layer is disposed on the first transparent oxide layer and has a second refractive index, and the first refractive index is greater than the second refractive index. The transparent conductive layer is disposed on the second transparent oxide layer, and the thickness of the transparent conductive layer is between 1000 Angstroms (Å) and 3000 Angstroms (Å). The touch panel is disposed on the light-transmitting conductive layer.

Description

觸控顯示裝置 Touch display device

本揭露內容是關於一種觸控顯示裝置。 This disclosure relates to a touch display device.

隨著電子產品設計的發展日漸茁壯,許多具有高機能性的電子產品也漸漸被開發出來。以提供使用者顯示畫面的產品來說,其產品趨向讓使用者可直接在顯示畫面進行觸控操作,以利操作過程可更直觀,也因此相關產品的發展性也備受看好。 With the development of electronic product design, many highly functional electronic products are gradually being developed. For products that provide users with a display screen, their products tend to allow users to perform touch operations directly on the display screen, so that the operation process can be more intuitive, so the development of related products is also highly optimistic.

具體來說,這類電子產品可藉由將顯示面板與觸控面板結合於一起來實現,其中觸控面板係可透過探測電性訊號的變化來判斷使用者的觸控位置,像是電阻變化或是電容變化。然而,隨著電子產品的尺寸有更動或是觸控精度需求提升,這些電性訊號受到其他訊號干擾的程度也可能升高,使得使用者的觸控體驗會受到影響,因此,在觸控方面與減少受到干擾的議題已成為相關領域的發展方向之一。 Specifically, such electronic products can be realized by combining a display panel and a touch panel. The touch panel can detect a user's touch position by detecting a change in an electrical signal, such as a change in resistance. Or the capacitance changes. However, as the size of electronic products changes or the need for touch accuracy increases, the degree to which these electrical signals are disturbed by other signals may also increase, making the user ’s touch experience affected. Therefore, in terms of touch, The issue of reducing interference has become one of the development directions in related fields.

本揭露內容之一實施方式提供一種觸控顯示裝置,包含陣列基板、顯示介質層、濾光層、第一透光氧化層、 第二透光氧化層、透光導電層以及觸控面板。顯示介質層設置在陣列基板之上。濾光層設置在顯示介質層之上。第一透光氧化層設置在濾光層之上,並具有第一折射率。第二透光氧化層設置在第一透光氧化層之上,並具有第二折射率,且第一折射率大於第二折射率。透光導電層設置在第二透光氧化層之上,其中透光導電層的厚度介於1000埃(Å)與3000埃(Å)之間。觸控面板設置在透光導電層之上。 An embodiment of the present disclosure provides a touch display device including an array substrate, a display medium layer, a filter layer, a first transparent oxide layer, The second transparent oxide layer, the transparent conductive layer, and the touch panel. The display medium layer is disposed on the array substrate. The filter layer is disposed on the display medium layer. The first light-transmitting oxide layer is disposed above the filter layer and has a first refractive index. The second transparent oxide layer is disposed on the first transparent oxide layer and has a second refractive index, and the first refractive index is greater than the second refractive index. The transparent conductive layer is disposed on the second transparent oxide layer, and the thickness of the transparent conductive layer is between 1000 Angstroms (Å) and 3000 Angstroms (Å). The touch panel is disposed on the light-transmitting conductive layer.

於部分實施方式中,透光導電層的材料包含氧化銦錫,且透光導電層的厚度介於1100埃(Å)與1600埃(Å)之間。 In some embodiments, the material of the transparent conductive layer includes indium tin oxide, and the thickness of the transparent conductive layer is between 1100 Angstroms (Å) and 1600 Angstroms (Å).

於部分實施方式中,第一透光氧化層的厚度介於80埃(Å)與200埃(Å)之間,而第二透光氧化層的厚度介於250埃(Å)與400埃(Å)之間。 In some embodiments, the thickness of the first transparent oxide layer is between 80 Angstroms (Å) and 200 Angstroms (Å), and the thickness of the second transparent oxide layer is between 250 Angstroms (Å) and 400 Angstroms (Å). Å).

於部分實施方式中,透光導電層的材料包含氧化銦錫,且透光導電層的厚度介於2550埃(Å)與2850埃(Å)之間。 In some embodiments, the material of the transparent conductive layer includes indium tin oxide, and the thickness of the transparent conductive layer is between 2550 Angstroms (Å) and 2850 Angstroms (Å).

於部分實施方式中,第一透光氧化層的厚度介於100埃(Å)與220埃(Å)之間,而第二透光氧化層的厚度介於200埃(Å)與400埃(Å)之間。 In some embodiments, the thickness of the first light-transmitting oxide layer is between 100 Å (Å) and 220 Å (Å), and the thickness of the second light-transmitting oxide layer is between 200 Å (Å) and 400 Å ( Å).

於部分實施方式中,第一折射率介於2.1與2.5之間,而第二折射率介於1.4與1.6之間。 In some embodiments, the first refractive index is between 2.1 and 2.5, and the second refractive index is between 1.4 and 1.6.

於部分實施方式中,第一透光氧化層的材料包含五氧化二鈮(Nb2O5),而第二透光氧化層的材料包含二氧化矽(SiO2)。 In some embodiments, the material of the first light-transmitting oxide layer includes niobium pentoxide (Nb 2 O 5 ), and the material of the second light-transmitting oxide layer includes silicon dioxide (SiO 2 ).

於部分實施方式中,第二透光氧化層疊置在第一透光氧化層上並形成交界面,透光導電層疊置在第二透光氧化 層上並形成交界面,透光導電層的材料包含氧化銦錫,且透光導電層具有第三折射率,其中第三折射率介於第一折射率與第二折射率之間。 In some embodiments, a second light-transmissive oxidation layer is disposed on the first light-transmissive oxide layer and forms an interface, and a light-transmissive conductive layer is disposed on the second light-transmissive oxide layer. An interface is formed on the layer. The material of the transparent conductive layer includes indium tin oxide, and the transparent conductive layer has a third refractive index, wherein the third refractive index is between the first refractive index and the second refractive index.

於部分實施方式中,觸控顯示裝置更包含第一偏光層以及第二偏光層。第一偏光層連接陣列基板。第二偏光層設置在透光導電層與觸控面板之間。 In some embodiments, the touch display device further includes a first polarizing layer and a second polarizing layer. The first polarizing layer is connected to the array substrate. The second polarizing layer is disposed between the light-transmitting conductive layer and the touch panel.

本揭露內容之一實施方式提供一種觸控顯示裝置,包含陣列基板、顯示介質層、濾光層、第一透光氧化層、第二透光氧化層、透光導電層以及觸控面板。顯示介質層,設置於陣列基板之上。濾光層設置在顯示介質層之上。第一透光氧化層設置在濾光層之上,並具有第一折射率。第二透光氧化層設置在第一透光氧化層之上,並具有第二折射率,且第一折射率大於第二折射率。透光導電層設置於第二透光氧化層之上,並具有厚度T,且A-B≦T≦A+C,其中A為厚度參考值,B為第一厚度變化值,C為第二厚度變化值,其中當透光導電層的厚度T落在A-B至A之間的時候,透光導電層的厚度T與透光率呈正相關,而當透光導電層的厚度落在A至A+C之間的時候,透光導電層的厚度T與透光率呈負相關。觸控面板設置於透光導電層之上。 An embodiment of the present disclosure provides a touch display device including an array substrate, a display medium layer, a filter layer, a first transparent oxide layer, a second transparent oxide layer, a transparent conductive layer, and a touch panel. The display medium layer is disposed on the array substrate. The filter layer is disposed on the display medium layer. The first light-transmitting oxide layer is disposed above the filter layer and has a first refractive index. The second transparent oxide layer is disposed on the first transparent oxide layer and has a second refractive index, and the first refractive index is greater than the second refractive index. The transparent conductive layer is disposed on the second transparent oxide layer and has a thickness T, and AB ≦ T ≦ A + C, where A is a thickness reference value, B is a first thickness change value, and C is a second thickness change When the thickness T of the transparent conductive layer falls between AB and A, the thickness T of the transparent conductive layer has a positive correlation with the light transmittance, and when the thickness of the transparent conductive layer falls between A and A + C In between, the thickness T of the light-transmitting conductive layer has a negative correlation with the light transmittance. The touch panel is disposed on the transparent conductive layer.

透過上述配置,觸控顯示裝置提供可影像顯示以及觸控操作功能,而配置在觸控面板之下的透明導電層可屏蔽電性訊號,從而提升訊號雜訊比。在使用氧化銦錫形成厚度大於1000埃(Å)的透光導電層的狀況下,可使透光導電層的片電阻小於60(Ω/□),以利進一步提升訊號雜訊比的效果。而在使 用氧化銦錫形成厚度小於3000埃(Å)的透光導電層的狀況下,可因薄膜干涉現象,形成透光率大於84%的透光導電層,以適於觸控顯示裝置的顯示需求。因此,厚度介於1000埃(Å)與3000埃(Å)之間的透光導電層可在適於顯示需求的條件下,達到進一步提升訊號雜訊比的效果。 Through the above configuration, the touch display device provides image display and touch operation functions, and the transparent conductive layer disposed under the touch panel can shield electrical signals, thereby improving the signal-to-noise ratio. In the case where indium tin oxide is used to form a light-transmitting conductive layer having a thickness of more than 1000 Angstroms (Å), the sheet resistance of the light-transmitting conductive layer can be less than 60 (Ω / □) to further improve the signal-to-noise ratio effect. While making When indium tin oxide is used to form a light-transmitting conductive layer with a thickness of less than 3000 Angstroms (Å), a light-transmitting conductive layer having a light transmittance of more than 84% can be formed due to the thin film interference phenomenon, which is suitable for the display needs of touch display devices. . Therefore, a light-transmitting conductive layer having a thickness between 1000 Angstroms (Å) and 3000 Angstroms (Å) can further improve the signal-to-noise ratio under conditions suitable for display requirements.

100‧‧‧觸控顯示裝置 100‧‧‧ touch display device

102‧‧‧第一偏光層 102‧‧‧first polarizing layer

110‧‧‧陣列基板 110‧‧‧Array substrate

112‧‧‧顯示介質層 112‧‧‧Display media layer

114‧‧‧間隙物 114‧‧‧ Spacer

116‧‧‧濾光層 116‧‧‧ Filter

120‧‧‧光學匹配層 120‧‧‧Optical matching layer

122‧‧‧第一透光氧化層 122‧‧‧The first transparent oxide layer

124‧‧‧第二透光氧化層 124‧‧‧Second transparent oxide layer

126‧‧‧透光導電層 126‧‧‧ Transparent conductive layer

128‧‧‧第二偏光層 128‧‧‧second polarizing layer

130‧‧‧膠體層 130‧‧‧ colloid layer

132‧‧‧觸控面板 132‧‧‧Touch Panel

I1‧‧‧第一區間 I1‧‧‧The first interval

I2‧‧‧第二區間 I2‧‧‧Second Section

T、TA、TB‧‧‧厚度 T, TA, TB‧‧‧thickness

第1圖為依據本揭露內容的部分實施方式繪示觸控顯示裝置的側視示意圖。 FIG. 1 is a schematic side view of a touch display device according to some embodiments of the disclosure.

第2圖繪示第1圖的透光導電層的厚度與其對光線穿透率的關係圖。 FIG. 2 is a graph showing the relationship between the thickness of the light-transmitting conductive layer in FIG. 1 and its light transmittance.

以下將以圖式揭露本發明之複數個實施方式,為明確說明起見,許多實務上的細節將在以下敘述中一併說明。然而,應瞭解到,這些實務上的細節不應用以限制本發明。也就是說,在本發明部分實施方式中,這些實務上的細節為非必要的。此外,為簡化圖式起見,一些習知慣用的結構與元件在圖式中將以簡單示意的方式繪示之。在本文中,使用第一、第二與第三等等之詞彙,為用於辨別不同元件、區域、層,而非用以限制本揭露內容。 In the following, a plurality of embodiments of the present invention will be disclosed graphically. For the sake of clarity, many practical details will be described in the following description. It should be understood, however, that these practical details should not be used to limit the invention. That is, in some embodiments of the present invention, these practical details are unnecessary. In addition, in order to simplify the drawings, some conventional structures and components will be shown in the drawings in a simple and schematic manner. In this article, the terms first, second, third, etc. are used to identify different components, regions, layers, and not to limit the disclosure.

本揭露內容的觸控顯示裝置可透過整合於一起的顯示面板與觸控面板提供顯示及觸控功能,其中觸控顯示裝置 更包含配置在顯示面板與觸控面板之間的透明導電層,以屏蔽來自顯示面板發出的電性訊號,從而提升觸控顯示裝置的訊號雜訊比(S/N)。 The touch display device disclosed in the present disclosure can provide display and touch functions through a display panel and a touch panel integrated together, wherein the touch display device It also includes a transparent conductive layer disposed between the display panel and the touch panel to shield the electrical signals from the display panel, thereby improving the signal-to-noise ratio (S / N) of the touch display device.

請參照第1圖,第1圖為依據本揭露內容的部分實施方式繪示觸控顯示裝置100的側視示意圖。觸控顯示裝置100包含第一偏光層102、陣列基板110、顯示介質層112、間隙物114、濾光層116、光學匹配層120、透光導電層126、第二偏光層128、膠體層130以及觸控面板132。 Please refer to FIG. 1. FIG. 1 is a schematic side view of a touch display device 100 according to some embodiments of the present disclosure. The touch display device 100 includes a first polarizing layer 102, an array substrate 110, a display medium layer 112, a spacer 114, a filter layer 116, an optical matching layer 120, a transparent conductive layer 126, a second polarizing layer 128, and a colloidal layer 130. And touch panel 132.

第一偏光層102連接陣列基板110,且觸控顯示裝置100可更包含背光模組(未繪示),配置以使第一偏光層102位在背光模組與陣列基板110之間,並用以朝著第一偏光層102發射光線。陣列基板110可包含薄膜電晶體及畫素電極(未繪示),且薄膜電晶體電性連接畫素電極,以透過薄膜電晶體施加電壓予畫素電極,從而耦合出電場。 The first polarizing layer 102 is connected to the array substrate 110, and the touch display device 100 may further include a backlight module (not shown) configured so that the first polarizing layer 102 is located between the backlight module and the array substrate 110, and is used for Light is emitted toward the first polarizing layer 102. The array substrate 110 may include a thin film transistor and a pixel electrode (not shown), and the thin film transistor is electrically connected to the pixel electrode to apply a voltage to the pixel electrode through the thin film transistor, thereby coupling out an electric field.

顯示介質層112設置在陣列基板110之上,並具有顯示介質,例如像是液晶分子。顯示介質層112的顯示介質可藉由陣列基板110的畫素電極所耦合出的電場來控制,從而控制是否使自第一偏光層102向上行進的光線穿過。 The display medium layer 112 is disposed on the array substrate 110 and has a display medium such as liquid crystal molecules. The display medium of the display medium layer 112 can be controlled by the electric field coupled by the pixel electrodes of the array substrate 110, so as to control whether the light traveling upward from the first polarizing layer 102 passes through.

濾光層116設置在顯示介質層112之上,且間隙物114設置在陣列基板110與濾光層116之間。間隙物114可配置以使陣列基板110與濾光層116之間存在間距,從而提供足夠的空間來將顯示介質填充於使陣列基板110與濾光層116之間。濾光層116可包含不同顏色的色阻,例如紅色色阻、綠色色阻及藍色色阻,以使自顯示介質層112通過濾光層116的光 線可帶有相因應的顏色,從而使觸控顯示裝置100提供影像。此外,觸控顯示裝置100可更包含遮光層(未繪示),例如黑色矩陣,並與濾光層116共同設置在顯示介質層112之上,以利區隔濾光層116的各色色阻,並遮蔽位在顯示介質層112下方的層體或元件的可視性。 The filter layer 116 is disposed on the display medium layer 112, and the spacer 114 is disposed between the array substrate 110 and the filter layer 116. The spacer 114 may be configured so that there is a gap between the array substrate 110 and the filter layer 116, so as to provide sufficient space to fill the display medium between the array substrate 110 and the filter layer 116. The filter layer 116 may include color resistances of different colors, such as red color resistance, green color resistance, and blue color resistance, so that light from the display medium layer 112 passing through the filter layer 116 The lines may have corresponding colors, so that the touch display device 100 provides an image. In addition, the touch display device 100 may further include a light-shielding layer (not shown), such as a black matrix, and is disposed on the display medium layer 112 together with the filter layer 116 so as to separate the color resistance of the filter layer 116. , And obscure the visibility of the layer body or element located below the display medium layer 112.

光學匹配層120設置在濾光層116之上,而透光導電層126設置在光學匹配層120之上。光學匹配層120包含第一透光氧化層122與第二透光氧化層124,第一透光氧化層122設置在濾光層116之上,而第二透光氧化層124設置在第一透光氧化層122之上。具體來說,濾光層116可包含透光基板,例如玻璃基板,其中遮光層與各色色阻可形成在透光基板的表面上,而光學匹配層120可形成在透光基板的另一側的表面上。 The optical matching layer 120 is disposed on the filter layer 116, and the light-transmitting conductive layer 126 is disposed on the optical matching layer 120. The optical matching layer 120 includes a first light-transmitting oxide layer 122 and a second light-transmitting oxide layer 124. The first light-transmitting oxide layer 122 is disposed on the filter layer 116, and the second light-transmitting oxide layer 124 is disposed on the first transparent layer. On the photo-oxidation layer 122. Specifically, the filter layer 116 may include a light-transmitting substrate, such as a glass substrate, wherein the light-shielding layer and each color resist may be formed on the surface of the light-transmitting substrate, and the optical matching layer 120 may be formed on the other side of the light-transmitting substrate. on the surface.

第一透光氧化層122的材料包含金屬氧化物,像是五氧化二鈮(Nb2O5)、二氧化鈦(TiO2)或其他類似物。第二透光氧化層124的材料包含非金屬氧化物,像是二氧化矽(SiO2)或其他類似物。透光導電層126的材料包含金屬氧化物,像是氧化銦錫(ITO)或其他類似物。第二偏光層128設置在透光導電層126之上,且透過膠體層130連接觸控面板132,即第二偏光層128會位在透光導電層126與觸控面板132之間。此外,膠體層130可包含光學膠。 The material of the first light-transmissive oxide layer 122 includes a metal oxide, such as niobium pentoxide (Nb 2 O 5 ), titanium dioxide (TiO 2 ), or the like. The material of the second light-transmissive oxide layer 124 includes a non-metal oxide, such as silicon dioxide (SiO 2 ) or the like. The material of the light-transmitting conductive layer 126 includes a metal oxide, such as indium tin oxide (ITO) or the like. The second polarizing layer 128 is disposed on the transparent conductive layer 126 and is connected to the touch panel 132 through the colloidal layer 130, that is, the second polarizing layer 128 is located between the transparent conductive layer 126 and the touch panel 132. In addition, the colloid layer 130 may include an optical glue.

使用者可藉由觸控面板132進行對觸控顯示裝置100的觸控操作,其中於進行操作期間,透光導電層126可屏蔽來自其下方層體或元件的電性訊號,以避免這些電性訊號干擾觸控面板132解析使用者的觸控位置,從而避免觸控面板 132對使用者的觸控位置產生誤判。對此,由於透光導電層126為用來屏蔽電性訊號,故在部分實施方式中,透光導電層126以俯視觀之的形狀可以是一個完整填滿的圖案,例如圓形、矩形或其他多邊形,即其形狀輪廓內的面積與表面積會是相同的。 The user can perform touch operations on the touch display device 100 through the touch panel 132. During the operation, the light-transmitting conductive layer 126 can shield the electrical signals from the layers or components below it to avoid these electrical signals. Sexual signals interfere with the touch panel 132 to resolve the user's touch position, thereby avoiding the touch panel 132 misjudges the user's touch position. In this regard, since the light-transmitting conductive layer 126 is used for shielding electrical signals, in some embodiments, the shape of the light-transmitting conductive layer 126 in a plan view may be a completely filled pattern, such as a circle, a rectangle, or Other polygons, that is, the area and surface area within the shape contour will be the same.

透光導電層126提供的屏蔽效果會與其阻抗有關,舉例來說,透光導電層126的阻抗會與觸控面板132的訊號雜訊比呈負相關。也就是說,可透過降低透光導電層126的阻抗來提升觸控面板132的訊號雜訊比,從而提升觸控面板132對觸控操作的判斷精度。 The shielding effect provided by the transparent conductive layer 126 is related to its impedance. For example, the impedance of the transparent conductive layer 126 is inversely related to the signal-to-noise ratio of the touch panel 132. That is, the signal-to-noise ratio of the touch panel 132 can be improved by reducing the impedance of the light-transmitting conductive layer 126, thereby improving the touch panel 132's judgment accuracy of touch operations.

透光導電層126的阻抗會與其厚度T有相關性,例如透光導電層126的阻抗會與其厚度T呈現負相關,因此可藉由增厚透光導電層126來降低其阻抗。在透光導電層126的材料包含氧化銦錫,且其厚度T大於1000埃(Å)的情況下,可致使透光導電層126的片電阻小於60(Ω/□),以利於提升屏蔽電性訊號的效果。另一方面,透光導電層126的厚度T也與其穿透率有相關性,而穿透率又會與觸控顯示裝置100呈現的影像品質有相關性。對此,在使用氧化銦錫形成厚度T介於1000埃(Å)與3000埃(Å)之間的透光導電層126時,可因薄膜干涉現象,形成透光率適於顯示需求的透光導電層126。 The resistance of the light-transmitting conductive layer 126 is related to its thickness T. For example, the resistance of the light-transmitting conductive layer 126 is inversely related to its thickness T. Therefore, the resistance of the light-transmitting conductive layer 126 can be reduced by thickening it. In the case where the material of the light-transmitting conductive layer 126 includes indium tin oxide and its thickness T is greater than 1000 Angstroms (Å), the sheet resistance of the light-transmitting conductive layer 126 can be made less than 60 (Ω / □), which is beneficial to improving the shielding current. Effect of sexual signals. On the other hand, the thickness T of the transparent conductive layer 126 is also related to its transmittance, and the transmittance is related to the image quality presented by the touch display device 100. For this reason, when the indium tin oxide is used to form the light-transmitting conductive layer 126 with a thickness T between 1000 Angstroms (Å) and 3000 Angstroms (Å), a thin-film interference phenomenon may be used to form a light-transmitting layer suitable for display requirements. Photoconductive layer 126.

進一步來說,請看到第2圖,第2圖繪示第1圖的透光導電層126的厚度T與其對光線穿透率的關係圖,其中橫軸為透光導電層的厚度,單位為埃(Å),而縱軸為透光導電層對光線的穿透率,單位為百分比(%)。如第2圖所示,由氧化 銦錫形成的透光導電層在其厚度小於3000埃(Å)的情況下,其對光線穿透率會呈現波動起伏,此波動起伏係因薄膜干涉現象而導致,其中穿透率在厚度約1300埃(Å)處及約2700埃(Å)處會有極大值。 Further, please see FIG. 2, which shows the relationship between the thickness T of the light-transmitting conductive layer 126 in FIG. 1 and its light transmittance, where the horizontal axis is the thickness of the light-transmitting conductive layer, in units Is Angstrom (Å), and the vertical axis is the light transmittance of the light-transmitting conductive layer, and the unit is percentage (%). As shown in Figure 2, by oxidation When the thickness of the light-transmitting conductive layer formed by indium tin is less than 3000 Angstroms (Å), its light transmittance will fluctuate. This fluctuation is caused by the phenomenon of thin film interference. There will be maximum values at 1300 Angstroms (Å) and about 2700 Angstroms (Å).

在此,所述的「極大值」意思為,在透光導電層的厚度符合「A-B≦透光導電層的厚度T≦A+C」區間,其中A為厚度參考值;B為第一厚度變化值;C為第二厚度變化值的情況下,當透光導電層的厚度T落在A-B至A之間的時候,透光導電層的厚度T與透光率呈正相關,而當透光導電層的厚度落在A至A+C之間的時候,透光導電層的厚度T與透光率呈負相關。 Here, the “maximum value” means that the thickness of the light-transmitting conductive layer conforms to the interval of “AB ≦ thickness of the light-transmitting conductive layer T ≦ A + C”, where A is the thickness reference value and B is the first thickness When C is the second thickness change value, when the thickness T of the light-transmitting conductive layer falls between AB and A, the thickness T of the light-transmitting conductive layer has a positive correlation with the light transmittance. When the thickness of the conductive layer falls between A and A + C, the thickness T of the light-transmitting conductive layer has a negative correlation with the light transmittance.

具體來說,厚度參考值A可以是約1300埃(Å),第一厚度變化值B可以是約600埃(Å),第二厚度變化值C可以是約700埃(Å),使得區間為:700埃(Å)≦透光導電層的厚度T≦2000埃(Å)。此時,當透光導電層的厚度在700埃(Å)至1300埃(Å)時,大致會是呈現厚度與透光率呈正相關,而當透光導電層的厚度在1300埃(Å)至2000埃(Å)時,大致會是呈現厚度與透光率呈負相關,而在正相關與負相關的交界點附近的穿透率可大於85%。例如,當透光導電層的厚度介於1100埃(Å)與1600埃(Å)之間的時候,其穿透率會介於86%至92%之間,如第一區間I1所示。 Specifically, the thickness reference value A may be about 1300 Angstroms (Å), the first thickness change value B may be about 600 Angstroms (Å), and the second thickness change value C may be about 700 Angstroms (Å), so that the interval is : 700 Angstrom (Å) ≦ thickness of the transparent conductive layer T ≦ 2000 Angstrom (Å). At this time, when the thickness of the light-transmitting conductive layer is in the range of 700 Angstroms (Å) to 1300 Å (Å), the thickness and the light transmittance are approximately correlated, and when the thickness of the light-transmitting conductive layer is 1300 Angstroms (Å) To 2000 Angstroms (Å), there will be a negative correlation between thickness and light transmittance, and the transmittance near the junction of positive correlation and negative correlation may be greater than 85%. For example, when the thickness of the light-transmitting conductive layer is between 1100 Angstroms (Å) and 1600 Angstroms (Å), its transmittance is between 86% and 92%, as shown in the first interval I1.

此外,厚度參考值A也可以是約2700埃(Å),第一厚度變化值B可以是約700埃(Å),第二厚度變化值C可以是約700埃(Å),使得區間為:2000埃(Å)≦透光導電層的厚度T ≦3400埃(Å)。此時,當透光導電層的厚度在2000埃(Å)至2700埃(Å)時,大致會是呈現厚度與透光率呈正相關,而當透光導電層的厚度在2700埃(Å)至3400埃(Å)時,大致會是呈現厚度與透光率呈負相關,而在正相關與負相關的交界點附近的穿透率可大於84%。例如,當透光導電層的厚度介於2550埃(Å)與2850埃(Å)之間的時候,其穿透率會介於85%至88%之間,如第二區間I2所示。 In addition, the thickness reference value A may also be about 2700 Angstroms (Å), the first thickness change value B may be about 700 Angstroms (Å), and the second thickness change value C may be about 700 Angstroms (Å), so that the interval is: 2000 Angstrom (Å) ≦ thickness T of the transparent conductive layer ≦ 3400 Angstroms (Å). At this time, when the thickness of the light-transmitting conductive layer is 2000 Å (Å) to 2700 Å (Å), the thickness and the light transmittance are approximately positively correlated, and when the thickness of the light-transmitting conductive layer is 2700 Å (Å) When it reaches 3400 angstroms (Å), the thickness and the light transmittance are generally negatively correlated, and the transmittance near the junction of the positive and negative correlations may be greater than 84%. For example, when the thickness of the light-transmitting conductive layer is between 2550 Angstroms (Å) and 2850 Angstroms (Å), its transmittance will be between 85% and 88%, as shown in the second interval I2.

於部分實施方式中,透光導電層126的厚度T可以是介於1100埃(Å)與1600埃(Å)之間,而穿透率為介於86%至92%之間,且片電阻為大於0(Ω/□)並小於60(Ω/□)。於其他實施方式中,透光導電層126的厚度T也可以是介於2550埃(Å)與2850埃(Å)之間,而穿透率會介於86%至92%之間,且片電阻為大於0(Ω/□)並小於30(Ω/□)。 In some embodiments, the thickness T of the transparent conductive layer 126 may be between 1100 Angstroms (Å) and 1600 Angstroms (Å), and the transmittance is between 86% and 92%. It is greater than 0 (Ω / □) and less than 60 (Ω / □). In other embodiments, the thickness T of the transparent conductive layer 126 may be between 2550 Angstroms (Å) and 2850 Angstroms (Å), and the transmittance may be between 86% and 92%. The resistance is greater than 0 (Ω / □) and less than 30 (Ω / □).

另一方面,位在濾光層116與透光導電層126之間的光學匹配層120可提供透光導電層126光學校正的效果,從而防止透光導電層126因其厚度T超過1000埃(Å)而導致觸控顯示裝置100所呈現的影像有色偏現象。具體來說,光學匹配層120可藉由其層體的折射率差異而達到補償色偏的效果,在此,所述「補償色偏」意思為,對於自濾光層116依序穿過光學匹配層120及透光導電層126的光線而言,此光線在色域在CIE 1976(L*,a*,b*)色彩空間上,於座標a*的位置以及於座標b*的位置可藉由光學匹配層120的補償效果而更接近0。 On the other hand, the optical matching layer 120 located between the filter layer 116 and the light-transmitting conductive layer 126 can provide the optical correction effect of the light-transmitting conductive layer 126, thereby preventing the light-transmitting conductive layer 126 from exceeding a thickness T of 1000 angstroms ( Å), resulting in a color shift phenomenon in the image presented by the touch display device 100. Specifically, the optical matching layer 120 can achieve the effect of compensating for color shift by the refractive index difference of the layer body. Here, the term “compensating for color shift” means that the self-filtering layer 116 passes through the optics in order. As for the light of the matching layer 120 and the light-transmitting conductive layer 126, this light has a color gamut in the CIE 1976 (L *, a *, b *) color space, and can be located at the coordinate a * and the coordinate b * It is closer to 0 by the compensation effect of the optical matching layer 120.

具體而言,第一透光氧化層122具有第一折射率,第二透光氧化層124具有第二折射率,且第一折射率大於 第二折射率。於部分實施方式中,第一折射率可介於2.1與2.5之間,第二折射率可介於1.4與1.6之間,而在透光導電層126是由氧化銦錫形成的情況下,透光導電層126具有第三折射率,且介於1.7與2.1之間,即第三折射率會介於第一折射率與第二折射率之間。第一透光氧化層122的厚度TA及第二透光氧化層124的厚度TB分別為小於1000埃(Å),且可因應透光導電層126的厚度T調整,從而利於達到補償色偏的效果。舉例來說,在透光導電層126的厚度T介於1100埃(Å)與1600埃(Å)之間的實施方式中,第一透光氧化層122的厚度TA介於80埃(Å)與200埃(Å)之間,第二透光氧化層124的厚度TB介於250埃(Å)與400埃(Å)之間。而在透光導電層126的厚度T介於2550埃(Å)與2850埃(Å)之間的實施方式中,第一透光氧化層122的厚度TA介於100埃(Å)與220埃(Å)之間,第二透光氧化層124的厚度TB介於200埃(Å)與400埃(Å)之間。透過上述配置,第一透光氧化層122的厚度TA及第二透光氧化層124的厚度TB分別為小於1000埃(Å)的情況下,配合相因應的折射率配置,可使光學匹配層120對透光導電層126達到補償色偏的效果。 Specifically, the first transparent oxide layer 122 has a first refractive index, and the second transparent oxide layer 124 has a second refractive index, and the first refractive index is greater than Second refractive index. In some embodiments, the first refractive index may be between 2.1 and 2.5, and the second refractive index may be between 1.4 and 1.6. In the case where the transparent conductive layer 126 is formed of indium tin oxide, The photoconductive layer 126 has a third refractive index and is between 1.7 and 2.1, that is, the third refractive index will be between the first refractive index and the second refractive index. The thickness TA of the first light-transmitting oxide layer 122 and the thickness TB of the second light-transmitting oxide layer 124 are respectively less than 1000 Angstroms (Å), and can be adjusted according to the thickness T of the light-transmitting conductive layer 126, thereby facilitating the compensation of color shift effect. For example, in the embodiment where the thickness T of the transparent conductive layer 126 is between 1100 Å (Å) and 1600 Å (Å), the thickness TA of the first transparent oxide layer 122 is between 80 Å (Å). The thickness TB of the second light-transmitting oxide layer 124 is between 250 Angstrom (Å) and 200 Angstrom (Å), and the thickness TB is between 250 Angstrom (Å) and 400 Angstrom (Å). In the embodiment where the thickness T of the transparent conductive layer 126 is between 2550 Angstroms (Å) and 2850 Angstroms (Å), the thickness TA of the first transparent oxide layer 122 is between 100 Angstroms (Å) and 220 Angstroms. (Å), the thickness TB of the second light-transmitting oxide layer 124 is between 200 Å (Å) and 400 Å (Å). Through the above configuration, when the thickness TA of the first light-transmitting oxide layer 122 and the thickness TB of the second light-transmitting oxide layer 124 are less than 1000 Angstroms (Å), the optical matching layer can be matched with the corresponding refractive index configuration. 120 pairs of transparent conductive layers 126 achieve the effect of compensating for color shift.

此外,透光導電層126可直接疊置在光學匹配層120上並與其連接,以利進一步補償色偏。進一步來說,第一透光氧化層122、第二透光氧化層124以及透光導電層126可採層疊的方式依序疊置,其中第二透光氧化層124可疊置在第一透光氧化層122上並形成交界面,而透光導電層126可疊置在第二透光氧化層124上並形成交界面。 In addition, the transparent conductive layer 126 can be directly stacked on the optical matching layer 120 and connected to the optical matching layer 120 to further compensate for color shift. Further, the first light-transmissive oxide layer 122, the second light-transmissive oxide layer 124, and the light-transmissive conductive layer 126 may be sequentially stacked in a stacked manner, wherein the second light-transmissive oxide layer 124 may be stacked on the first light-transmissive layer. The photo-oxidized layer 122 forms an interface, and the light-transmissive conductive layer 126 can be stacked on the second light-transmissive oxide layer 124 to form an interface.

對於不同的觸控判斷精度需求,可對應選用上述不同厚度範圍的透光導電層126。而雖厚度介於1100埃(Å)與1600埃(Å)之間的透光導電層126與厚度介於2550埃(Å)與2850埃(Å)之間的透光導電層126在第2圖所示的穿透率極大值(分別約為90%與88%)處有差異,然而,在透光導電層126之上設置有第二偏光層128的情況下,由於穿過透光導電層126的光線會再穿過第二偏光層128,故兩種厚度區間的穿透率差距會再縮減。另一方面,雖上述觸控顯示裝置100是採用顯示介質層112與濾光層116的組合來提供影像顯示功能,然而,本揭露內容不以此為限,於其他實施方式中,顯示介質層112與濾光層116的組合也可置換為其他顯示元件,像是置換為電致發光元件,例如微二極體發光元件、量子點發光元件或其他類似元件。 For different touch judgment accuracy requirements, the light-transmitting conductive layers 126 in different thickness ranges can be selected correspondingly. Although the thickness of the transparent conductive layer 126 between 1100 Angstroms (Å) and 1600 Angstroms (Å) and the thickness of the transparent conductive layer 126 between 2550 Angstroms (Å) and 2850 Angstroms (Å) are in the second place. The transmittance maximum values shown in the figure are different (approximately 90% and 88%, respectively). However, in the case where the second polarizing layer 128 is provided on the light-transmitting conductive layer 126, The light of the layer 126 will pass through the second polarizing layer 128 again, so the transmittance difference between the two thickness ranges will be reduced again. On the other hand, although the above-mentioned touch display device 100 uses a combination of the display medium layer 112 and the filter layer 116 to provide an image display function, the disclosure is not limited thereto. In other embodiments, the display medium layer The combination of 112 and the filter layer 116 can also be replaced with other display elements, such as an electroluminescent element, such as a microdiode light-emitting element, a quantum dot light-emitting element, or other similar elements.

綜上所述,本揭露內容的觸控顯示裝置提供影像顯示以及觸控操作功能,其中觸控操作功能係由觸控面板實現。此外,觸控顯示裝置更包含透明導電層,透明導電層配置在觸控面板之下並可屏蔽電性訊號,從而提升訊號雜訊比。在使用氧化銦錫形成厚度大於1000埃(Å)的透光導電層的狀況下,可使透光導電層的片電阻小於60(Ω/□),以利進一步提升訊號雜訊比的效果。而在使用氧化銦錫形成厚度小於3000埃(Å)的透光導電層的狀況下,可因薄膜干涉現象,形成透光率大於84%的透光導電層,以適於觸控顯示裝置的顯示需求。此外,觸控顯示裝置可更包含光學匹配層,其中光學匹配層配置在透光導電層之下,並包含至少兩層透光氧化層,此兩層透光 氧化層的折射率不同,且也異於透光導電層的折射率,以達到對透光導電層達到補償色偏的效果。 In summary, the touch display device of the present disclosure provides image display and touch operation functions, wherein the touch operation function is implemented by a touch panel. In addition, the touch display device further includes a transparent conductive layer. The transparent conductive layer is disposed under the touch panel and shields the electrical signals, thereby improving the signal-to-noise ratio. In the case where indium tin oxide is used to form a light-transmitting conductive layer having a thickness of more than 1000 Angstroms (Å), the sheet resistance of the light-transmitting conductive layer can be less than 60 (Ω / □) to further improve the signal-to-noise ratio effect. In the case where indium tin oxide is used to form a light-transmitting conductive layer having a thickness of less than 3000 Angstroms (Å), a light-transmitting conductive layer having a light transmittance of more than 84% can be formed due to the thin film interference phenomenon, which is suitable for touch display devices. Show demand. In addition, the touch display device may further include an optical matching layer, wherein the optical matching layer is disposed under the light-transmitting conductive layer and includes at least two light-transmitting oxide layers, and the two layers are light-transmitting The refractive index of the oxide layer is different and also different from the refractive index of the light-transmitting conductive layer, so as to achieve the effect of compensating for the color shift of the light-transmitting conductive layer.

雖然本發明已以多種實施方式揭露如上,然其並非用以限定本發明,任何熟習此技藝者,在不脫離本發明之精神和範圍內,當可作各種之更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。 Although the present invention has been disclosed in various embodiments as above, it is not intended to limit the present invention. Any person skilled in the art can make various modifications and retouches without departing from the spirit and scope of the present invention. The scope of protection shall be determined by the scope of the attached patent application.

Claims (10)

一種觸控顯示裝置,包含:一陣列基板;一顯示介質層,設置在該陣列基板之上;一濾光層,設置在該顯示介質層之上;一第一透光氧化層,設置在該濾光層之上,並具有一第一折射率;一第二透光氧化層,設置在該第一透光氧化層之上,並具有一第二折射率,且該第一折射率大於該第二折射率;一透光導電層,設置在該第二透光氧化層之上,其中該透光導電層的厚度介於1000埃(Å)與3000埃(Å)之間;以及一觸控面板,設置在該透光導電層之上。A touch display device includes: an array substrate; a display medium layer disposed on the array substrate; a filter layer disposed on the display medium layer; a first light-transmitting oxide layer disposed on the display substrate; Above the filter layer and having a first refractive index; a second light-transmitting oxide layer is disposed on the first light-transmitting oxide layer and has a second refractive index, and the first refractive index is greater than the A second refractive index; a light-transmitting conductive layer disposed on the second light-transmitting oxide layer, wherein the thickness of the light-transmitting conductive layer is between 1000 Å (Å) and 3000 Å (Å); and The control panel is disposed on the light-transmitting conductive layer. 如申請專利範圍第1項所述之觸控顯示裝置,其中該透光導電層的材料包含氧化銦錫,且該透光導電層的厚度介於1100埃(Å)與1600埃(Å)之間。The touch display device according to item 1 of the application, wherein the material of the transparent conductive layer includes indium tin oxide, and the thickness of the transparent conductive layer is between 1100 Angstroms (Å) and 1600 Angstroms (Å). between. 如申請專利範圍第2項所述之觸控顯示裝置,其中該第一透光氧化層的厚度介於80埃(Å)與200埃(Å)之間,而該第二透光氧化層的厚度介於250埃(Å)與400埃(Å)之間。The touch display device according to item 2 of the scope of patent application, wherein the thickness of the first transparent oxide layer is between 80 Angstroms (Å) and 200 Angstroms (Å), and the thickness of the second transparent oxide layer is The thickness is between 250 Angstroms (Å) and 400 Angstroms (Å). 如申請專利範圍第1項所述之觸控顯示裝置,其中該透光導電層的材料包含氧化銦錫,且該透光導電層的厚度介於2550埃(Å)與2850埃(Å)之間。The touch display device according to item 1 of the scope of patent application, wherein the material of the transparent conductive layer includes indium tin oxide, and the thickness of the transparent conductive layer is between 2550 Angstroms (Å) and 2850 Angstroms (Å). between. 如申請專利範圍第4項所述之觸控顯示裝置,其中該第一透光氧化層的厚度介於100埃(Å)與220埃(Å)之間,而該第二透光氧化層的厚度介於200埃(Å)與400埃(Å)之間。The touch display device according to item 4 of the scope of patent application, wherein the thickness of the first light-transmitting oxide layer is between 100 Å (Å) and 220 Å (Å), and the thickness of the second light-transmitting oxide layer is The thickness is between 200 Angstroms (Å) and 400 Angstroms (Å). 如申請專利範圍第1項所述之觸控顯示裝置,其中該第一折射率介於2.1與2.5之間,而該第二折射率介於1.4與1.6之間。The touch display device according to item 1 of the scope of patent application, wherein the first refractive index is between 2.1 and 2.5, and the second refractive index is between 1.4 and 1.6. 如申請專利範圍第6項所述之觸控顯示裝置,其中該第一透光氧化層的材料包含五氧化二鈮(Nb2O5),而該第二透光氧化層的材料包含二氧化矽(SiO2)。The touch display device according to item 6 of the application, wherein the material of the first light-transmitting oxide layer includes niobium pentoxide (Nb 2 O 5 ), and the material of the second light-transmitting oxide layer includes dioxide Silicon (SiO 2 ). 如申請專利範圍第7項所述之觸控顯示裝置,其中該第二透光氧化層疊置在該第一透光氧化層上並形成交界面,該透光導電層疊置在該第二透光氧化層上並形成交界面,該透光導電層的材料包含氧化銦錫,且該透光導電層具有一第三折射率,其中該第三折射率介於該第一折射率與該第二折射率之間。The touch display device according to item 7 of the scope of patent application, wherein the second light-transmissive oxide layer is disposed on the first light-transmissive oxide layer and forms an interface, and the light-transmissive conductive layer is disposed on the second light-transmissive layer. An interface is formed on the oxide layer. The material of the transparent conductive layer includes indium tin oxide, and the transparent conductive layer has a third refractive index, wherein the third refractive index is between the first refractive index and the second refractive index. Refractive index between. 如申請專利範圍第1項所述之觸控顯示裝置,更包含:一第一偏光層,連接該陣列基板;以及一第二偏光層,設置在該透光導電層與該觸控面板之間。The touch display device according to item 1 of the scope of patent application, further comprising: a first polarizing layer connected to the array substrate; and a second polarizing layer disposed between the transparent conductive layer and the touch panel. . 一種觸控顯示裝置,包含:一陣列基板;一顯示介質層,設置於該陣列基板之上;一濾光層,設置在該顯示介質層之上;一第一透光氧化層,設置在該濾光層之上,並具有一第一折射率;一第二透光氧化層,設置在該第一透光氧化層之上,並具有一第二折射率,且該第一折射率大於該第二折射率;一透光導電層,設置於該第二透光氧化層之上,並具有厚度T,且A-B≦T≦A+C,其中A為厚度參考值,B為第一厚度變化值,C為第二厚度變化值,其中當該透光導電層的厚度T落在A-B至A之間的時候,該透光導電層的厚度T與透光率呈正相關,而當該透光導電層的厚度落在A至A+C之間的時候,該透光導電層的厚度T與透光率呈負相關;以及一觸控面板,設置於該透光導電層之上。A touch display device includes: an array substrate; a display medium layer disposed on the array substrate; a filter layer disposed on the display medium layer; a first light-transmitting oxide layer disposed on the display substrate; Above the filter layer and having a first refractive index; a second light-transmitting oxide layer is disposed on the first light-transmitting oxide layer and has a second refractive index, and the first refractive index is greater than the A second refractive index; a light-transmitting conductive layer disposed on the second light-transmitting oxide layer and having a thickness T and AB ≦ T ≦ A + C, where A is a thickness reference value and B is a first thickness change Value, C is the second thickness change value. When the thickness T of the light-transmitting conductive layer falls between AB and A, the thickness T of the light-transmitting conductive layer has a positive correlation with the light transmittance. When the thickness of the conductive layer falls between A and A + C, the thickness T of the transparent conductive layer has a negative correlation with the light transmittance; and a touch panel is disposed on the transparent conductive layer.
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