TWI671188B - Antistatic surface-protective film - Google Patents

Antistatic surface-protective film Download PDF

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TWI671188B
TWI671188B TW105104710A TW105104710A TWI671188B TW I671188 B TWI671188 B TW I671188B TW 105104710 A TW105104710 A TW 105104710A TW 105104710 A TW105104710 A TW 105104710A TW I671188 B TWI671188 B TW I671188B
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film
antistatic
antistatic agent
protective film
adherend
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TW201637860A (en
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小林弘幸
新見洋人
春日充
鈴木千恵
五十嵐智美
木俣絵美子
林益史
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日商藤森工業股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/18Layered products comprising a layer of synthetic resin characterised by the use of special additives
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04Interconnection of layers
    • B32B7/12Interconnection of layers using interposed adhesives or interposed materials with bonding properties
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
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    • C09J133/00Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04Homopolymers or copolymers of esters
    • C09J133/06Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04Homopolymers or copolymers of esters
    • C09J133/06Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C09J133/08Homopolymers or copolymers of acrylic acid esters
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • C09J7/22Plastics; Metallised plastics
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • C09J7/29Laminated material
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/30Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38Pressure-sensitive adhesives [PSA]
    • C09J7/381Pressure-sensitive adhesives [PSA] based on macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
    • C09J7/385Acrylic polymers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/20Properties of the layers or laminate having particular electrical or magnetic properties, e.g. piezoelectric
    • B32B2307/21Anti-static
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/40Properties of the layers or laminate having particular optical properties
    • B32B2307/412Transparent
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/30Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/40Additional features of adhesives in the form of films or foils characterized by the presence of essential components
    • C09J2301/414Additional features of adhesives in the form of films or foils characterized by the presence of essential components presence of a copolymer

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
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  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Laminated Bodies (AREA)
  • Adhesive Tapes (AREA)
  • Adhesives Or Adhesive Processes (AREA)

Abstract

本發明提供一種防靜電表面保護膜,其對被黏附體的污染少,且不會經時劣化而具有優異的剝離防靜電性能。所述防靜電表面保護膜(10)的特徵在於,在由具有透明性的樹脂形成的基材膜(1)的一個面上,依次層疊不含防靜電劑的黏結劑層(2)、防靜電劑層(3)、經剝離處理的剝離膜(4)。 The invention provides an antistatic surface protection film, which has less pollution to an adherend, does not deteriorate over time, and has excellent peeling antistatic performance. The anti-static surface protective film (10) is characterized in that an antistatic agent-free adhesive layer (2) and an antistatic agent are sequentially laminated on one surface of a base film (1) formed of a transparent resin. An electrostatic agent layer (3) and a peeling film (4).

Description

防靜電表面保護膜 Anti-static surface protection film

本發明係關於一種貼合於偏光板、相位差板、顯示器用透鏡膜(lens film)等光學元件(以下、有時也稱作光學用膜)表面的防靜電表面保護膜。更詳細而言,本發明提供一種防靜電表面保護膜,其對被黏附體的污染少,且不會經時劣化而具有優異的剝離防靜電性能。 The present invention relates to an antistatic surface protection film adhered to the surface of an optical element (hereinafter, also sometimes referred to as an optical film) such as a polarizing plate, a retardation plate, and a lens film for a display. In more detail, the present invention provides an antistatic surface protection film, which has less contamination to an adherend, does not deteriorate over time, and has excellent peeling antistatic performance.

在製造、搬運偏光板、相位差板、顯示器用透鏡膜、防反射膜、硬塗膜、觸摸面板用透明導電性膜等光學用膜及使用了它們的顯示器等光學產品時,在該光學用膜的表面貼合表面保護膜,以防止後續步驟中的表面污染和損傷。作為產品的光學用膜的外觀檢查為了節省剝下表面保護膜再進行貼合的時間,提高工作效率,有時也以表面保護膜貼合於光學用膜的狀態進行作業。 When manufacturing and transporting optical films such as polarizing plates, retardation plates, display lens films, anti-reflection films, hard coating films, and transparent conductive films for touch panels, and optical products such as displays using these, The surface of the film is adhered to a surface protection film to prevent surface contamination and damage in subsequent steps. In order to save the time of peeling off the surface protective film and then bonding, and improve the working efficiency, the appearance inspection of the optical film as a product may be performed in a state where the surface protective film is bonded to the optical film.

長期以來,在光學產品的製造步驟中,為了防止損傷或污染物的附著,通常使用在基材膜的一個面上設有黏結劑層的表面保護膜。表面保護膜經由具有弱黏結力的黏結劑層貼合於光學用膜上。將黏結劑層設為弱黏結力,是為了將使用過的表面保護膜從光學用膜的表面上剝離去除時,能夠容易剝離,且黏 結劑不附著殘留在作為被黏附體的光學用膜產品上(所謂防止殘膠的產生)。 For a long time, in the manufacturing steps of optical products, in order to prevent damage or adhesion of contaminants, a surface protection film having an adhesive layer on one surface of a base film is generally used. The surface protection film is bonded to the optical film through an adhesive layer having a weak adhesive force. The reason why the adhesive layer has a weak adhesive force is that when the used surface protective film is peeled off from the surface of the optical film, the adhesive layer can be easily peeled off and the adhesiveness can be improved. The adhesive does not adhere to and remain on the optical film product as an adherend (so-called prevention of generation of adhesive residue).

近年來,在液晶顯示面板的生產步驟中,如下現象雖然發生件數少,但還是存在如下現象:由於將貼合於光學用膜上的表面保護膜剝離去除時產生的剝離靜電壓,用於控制液晶顯示面板的顯示畫面的驅動IC等電路元件被破壞、液晶分子的配向損壞。 In recent years, in the production steps of liquid crystal display panels, although the following phenomena occur in small numbers, there are still the following phenomena: The peeling static voltage generated when the surface protective film attached to the optical film is peeled off and removed is used for Circuit elements such as a driver IC that controls a display screen of the liquid crystal display panel are damaged, and alignment of liquid crystal molecules is damaged.

此外,為了降低液晶顯示面板的耗電,液晶材料的驅動電壓變低,驅動IC的破壞電壓也隨之變低。最近開始要求使剝離靜電壓在+0.7kV~-0.7kV的範圍內。 In addition, in order to reduce the power consumption of the liquid crystal display panel, the driving voltage of the liquid crystal material is reduced, and the destruction voltage of the driving IC is also reduced accordingly. Recently, it has been required to make the peeling static voltage within a range of +0.7 kV to -0.7 kV.

因此,在將表面保護膜從作為被黏附體的光學用膜上剝離時,為了防止因剝離靜電壓高而導致的不良狀況,人們提出了一種用於將剝離靜電壓抑制為較低的、使用了含有防靜電劑的黏結劑層的表面保護膜。 Therefore, when peeling a surface protective film from an optical film as an adherend, in order to prevent a defect caused by a high peeling static voltage, a method for suppressing the peeling static voltage to a low level has been proposed. A surface protective film of an adhesive layer containing an antistatic agent.

例如,在專利文獻1中,公開了一種表面保護膜,其使用了由烷基三甲基銨鹽、含有羥基的丙烯酸類聚合物、聚異氰酸酯構成的黏結劑。 For example, Patent Document 1 discloses a surface protective film using a binder composed of an alkyltrimethylammonium salt, a hydroxyl-containing acrylic polymer, and a polyisocyanate.

此外,在專利文獻2中,公開了一種黏結劑組合物及使用了該黏結劑組合物的黏結片類,所述黏結劑組合物由離子性液體及酸值為1.0以下的丙烯酸聚合物構成。 In addition, Patent Document 2 discloses an adhesive composition composed of an ionic liquid and an acrylic polymer having an acid value of 1.0 or less, and an adhesive sheet using the adhesive composition.

此外,在專利文獻3中,公開了一種黏結劑組合物及使用了該黏結劑組合物的表面保護膜,所述黏結組合物由丙烯酸聚合物、聚醚多元醇化合物、經陰離子吸附性化合物處理過的鹼金屬鹽構成。 In addition, Patent Document 3 discloses an adhesive composition and a surface protective film using the adhesive composition. The adhesive composition is treated with an acrylic polymer, a polyether polyol compound, and an anion-adsorbing compound. Alkali metal salt.

此外,在專利文獻4中,公開了一種黏結劑組合物及使用了該黏結劑組合物的表面保護膜,所述黏結劑組合物由離子性液體、鹼金屬鹽、玻璃化轉移溫度為0℃以下的聚合物構成。 In addition, Patent Document 4 discloses an adhesive composition and a surface protection film using the adhesive composition. The adhesive composition consists of an ionic liquid, an alkali metal salt, and a glass transition temperature of 0 ° C. It consists of the following polymers.

此外,在專利文獻5、6中,公開了在表面保護膜的黏結劑層中混合聚醚改質矽氧樹脂。 In addition, Patent Documents 5 and 6 disclose mixing a polyether-modified silicone resin with an adhesive layer of a surface protective film.

現有技術文獻 Prior art literature 專利文獻 Patent literature

專利文獻1:日本特開2005-131957號公報 Patent Document 1: Japanese Patent Application Laid-Open No. 2005-131957

專利文獻2:日本特開2005-330464號公報 Patent Document 2: Japanese Patent Application Laid-Open No. 2005-330464

專利文獻3:日本特開2005-314476號公報 Patent Document 3: Japanese Patent Application Laid-Open No. 2005-314476

專利文獻4:日本特開2006-152235號公報 Patent Document 4: Japanese Patent Application Laid-Open No. 2006-152235

專利文獻5:日本特開2009-275128號公報 Patent Document 5: Japanese Patent Application Laid-Open No. 2009-275128

專利文獻6:專利第4537450號公報 Patent Document 6: Patent No. 4537450

在上述專利文獻1~4中,雖然在黏結劑層的內部添加了防靜電劑,但黏結劑層的厚度越厚,或貼合於被黏附體的時間越久,對於貼合有表面保護膜的被黏附體,從黏結劑層轉移到被黏附體的防靜電劑的量也越多。此外,在LR(Low Reflective,低反射)偏光板、AG(Anti Glare,防眩光)-LR偏光板等光學用膜中,光學用膜的表面經矽氧樹脂化合物或氟化合物等進行了防污染處理,因此將用於這種光學用膜的表面保護膜從作為被黏附體的光學用膜上剝離時的剝離靜電壓變 高。 In the aforementioned Patent Documents 1 to 4, although an antistatic agent is added to the inside of the adhesive layer, the thicker the adhesive layer or the longer it adheres to the adherend, the longer the surface protective film is adhered to. The greater the amount of antistatic agent transferred from the adhesive layer to the adherend in the adherend. In addition, in optical films such as LR (Low Reflective) polarizers and AG (Anti Glare) -LR polarizers, the surface of the optical film is protected against contamination by silicone resin or fluorine compounds. Treatment, the peeling static voltage when the surface protective film for such an optical film is peeled from the optical film as an adherend is changed high.

此外,在專利文獻5、6所述的在黏結劑層中混合聚醚改質矽氧樹脂的情況下,難以對表面保護膜的黏結力進行微調整。此外,由於在黏結劑層內混有聚醚改質矽氧樹脂,若將黏結劑組合物塗佈於基材膜上並乾燥的條件發生改變,則形成有表面保護膜的黏結劑層的表面的特性發生微妙的變化。更進一步,從保護光學用膜的表面的角度考慮,無法使黏結劑層的厚度變得極薄。因此,需要根據黏結劑層的厚度增加混合在黏結劑層內的聚醚改質矽氧樹脂的添加量,結果被黏附體表面易於被污染,對黏結力或被黏附體的污染性發生經時變化。 In addition, when polyether-modified silicone resin is mixed in the adhesive layer described in Patent Documents 5 and 6, it is difficult to finely adjust the adhesive force of the surface protective film. In addition, since the polyether modified silicone resin is mixed in the adhesive layer, if the conditions for applying the adhesive composition to the substrate film and drying are changed, the surface of the adhesive layer having the surface protective film is formed. The characteristics have changed subtly. Furthermore, from the viewpoint of protecting the surface of the optical film, the thickness of the adhesive layer cannot be made extremely thin. Therefore, it is necessary to increase the amount of the polyether modified silicone resin mixed in the adhesive layer according to the thickness of the adhesive layer. As a result, the surface of the adherend is liable to be contaminated, and the contamination of the adhesive force or the adherend takes time. Variety.

近年,隨著3D顯示器(立體顯示器)的普及,在偏光板等光學用膜的表面有時貼合有圖案化相位差(FPR;Film Patterned Retarder)膜。在將貼合於偏光板等光學用膜的表面的表面保護膜剝下後,貼合FPR膜。但是,偏光板等光學用膜的表面若被用於表面保護膜的黏結劑或防靜電劑污染,則存在FPR膜難以黏接的問題。因此,對於該用途的表面保護膜,要求一種對被黏附體的污染少的膜。 In recent years, with the spread of 3D displays (stereoscopic displays), a patterned retardation (FPR) film may be bonded to the surface of an optical film such as a polarizing plate. After peeling off the surface protection film attached to the surface of an optical film such as a polarizing plate, the FPR film is attached. However, if the surface of an optical film such as a polarizing plate is contaminated with an adhesive or an antistatic agent for a surface protection film, there is a problem that it is difficult to adhere the FPR film. Therefore, a surface protection film for this purpose requires a film with less contamination to the adherend.

另一方面,在一些液晶面板製造商中,作為表面保護膜對被黏附體的污染性的評價方法,係採用如下方法,先將貼合於偏光板等光學用膜的表面保護膜剝下,以混入有氣泡的狀態再次貼合,以規定條件進行加熱處理,然後,剝下表面保護膜,觀察被黏附體的表面。在這種評價方法中,即使被黏附體的表面污染為微量,若在混入氣泡的部分和表面保護膜的與黏結劑接觸的部分,被黏附體的表面污染有差別,則以氣泡 痕跡(有時也稱為氣泡斑)的形式殘留。因此,作為這種對被黏附體的表面的污染性的評價方法,成為非常嚴格的評價方法。近年來要求一種表面保護膜,該表面保護膜即使在由這種嚴格的評價方法所判定的結果中,在對被黏附體的表面的污染性上也不存在問題。但是,以往所提出的使用了含有防靜電劑的黏結劑層的表面保護膜處於難以解決該技術問題的狀況。 On the other hand, in some liquid crystal panel manufacturers, as a method for evaluating the contamination of the adherend by the surface protective film, the following method is adopted. First, the surface protective film attached to an optical film such as a polarizing plate is peeled off. After attaching again in a state with air bubbles mixed therein, and performing heat treatment under predetermined conditions, the surface protective film was peeled off, and the surface of the adherend was observed. In this evaluation method, even if the surface of the adherend is contaminated in a small amount, if there is a difference in the surface contamination of the adherend in the part where the air bubbles are mixed and the part of the surface protective film that is in contact with the adhesive, the air bubbles Traces (sometimes referred to as bubble patches) remain. Therefore, as an evaluation method of the contamination property to the surface of an adherend, it becomes a very strict evaluation method. In recent years, a surface protective film has been required, and even if the surface protective film is determined by such a strict evaluation method, there is no problem in the contamination of the surface of the adherend. However, conventionally, a surface protection film using an adhesive layer containing an antistatic agent has been difficult to solve this technical problem.

因此,需要一種表面保護膜,該表面保護膜用於光學用膜中,對被黏附體的污染非常少,且對被黏附體的污染性不會經時變化。更進一步,要求一種能夠將從被黏附體剝離時的剝離靜電壓抑制為較低的表面保護膜。 Therefore, there is a need for a surface protection film, which is used in an optical film, has very little pollution to an adherend, and does not change the contamination of the adherend with time. Furthermore, there is a need for a surface protection film capable of suppressing the peeling static voltage when peeling from an adherend to be low.

本申請發明人為了解決這些技術問題進行了認真的研究。 The inventors of the present application have conducted earnest research in order to solve these technical problems.

為了對被黏附體的污染少,且使防靜電性能的經時變化小,需要減少被推測為污染被黏附體的原因的防靜電劑的添加量。但是,在減少防靜電劑的添加量的情況下,將表面保護膜從被黏附體剝離時的剝離靜電壓會增高。本申請發明人對於在不增加防靜電劑添加量的絕對量的情況下,將表面保護膜從被黏附體剝離時的剝離靜電壓抑制為較低的方法進行了研究。結果發現了:不是在黏結劑組合物中添加防靜電劑而混合形成黏結劑層,而是在塗佈、乾燥黏結劑組合物並層疊黏結劑層後,透過向黏結劑層的表面施予適量的防靜電劑成分,能夠將表面保護膜從作為被黏附體的光學用膜上剝離時的剝離靜電壓抑制為較低,進而完成了本發明。 In order to reduce the contamination of the adherend and minimize the change with time in antistatic performance, it is necessary to reduce the amount of the antistatic agent presumed to cause contamination of the adherend. However, when the amount of the antistatic agent to be added is reduced, the peeling static voltage when the surface protective film is peeled from the adherend increases. The inventors of the present application have studied a method for suppressing the peeling static voltage when the surface protective film is peeled from the adherend to be low without increasing the absolute amount of the antistatic agent. As a result, it was found that instead of adding an antistatic agent to the adhesive composition and mixing it to form an adhesive layer, after applying, drying, and laminating the adhesive composition, the adhesive layer was applied with an appropriate amount on the surface of the adhesive layer. The antistatic agent component can suppress the peeling static voltage when the surface protective film is peeled from the optical film as an adherend to be low, and completed the present invention.

本發明是考慮了上述情況而完成的,技術課題在 於提供一種防靜電表面保護膜,其對被黏附體的污染少,且不會經時劣化而具有優異的剝離防靜電性能。 The present invention has been made in consideration of the above circumstances, and the technical problems are In order to provide an anti-static surface protection film, it has less pollution to the adherend, and does not deteriorate with time, and has excellent peeling anti-static performance.

本發明的防靜電表面保護膜在塗佈、乾燥黏結劑組合物並層疊黏結劑層後,在該黏結劑層的表面上,形成存在有含防靜電劑材料的防靜電劑層。因此本發明的技術思想為,在將對被黏附體的污染性抑制為低污染性的基礎上,將從作為被黏附體的光學用膜剝離時的剝離靜電壓抑制為較低。 In the antistatic surface protection film of the present invention, after the adhesive composition is coated and dried, and an adhesive layer is laminated, an antistatic agent layer containing an antistatic agent material is formed on the surface of the adhesive layer. Therefore, the technical idea of the present invention is to suppress the peeling static voltage when peeling off the optical film as an adherend while suppressing the contamination of the adherend to a low contamination property.

為了解決上述技術問題,本發明提供一種防靜電表面保護膜,其特徵在於,在由具有透明性的樹脂形成的基材膜的一個面上,依次層疊不含防靜電劑的黏結劑層、防靜電劑層、以及經剝離處理的剝離膜。 In order to solve the above-mentioned technical problems, the present invention provides an antistatic surface protection film, characterized in that an antistatic agent-free adhesive layer and an antistatic agent are sequentially laminated on one surface of a substrate film formed of a transparent resin. An electrostatic agent layer and a release film subjected to a release treatment.

此外,所述防靜電劑層優選含有選自由鹼金屬鹽、離子化合物所構成的群組中的一種。 The antistatic agent layer preferably contains one selected from the group consisting of an alkali metal salt and an ionic compound.

此外,所述不含防靜電劑的黏結劑層優選使用丙烯酸類黏結劑組合物來形成。 The antistatic agent-free adhesive layer is preferably formed using an acrylic adhesive composition.

此外,所述防靜電劑層的厚度優選為0.01~0.3μm。 In addition, the thickness of the antistatic agent layer is preferably 0.01 to 0.3 μm .

本發明的防靜電表面保護膜對被黏附體的污染少,且對被黏附體的低污染性不會經時變化。此外,根據本發明,能夠提供一種防靜電表面保護膜,其即使為LR偏光板或AG-LR偏光板等被黏附體的表面透過矽氧樹脂化合物或氟化合物等進行了防污染處理的光學用膜,也能夠將防靜電表面保護膜從被黏附體上剝離時產生的剝離靜電壓抑制為較低,不會 經時劣化而具有優異的剝離防靜電性能。 The antistatic surface protection film of the present invention has less pollution to the adherend, and its low pollution to the adherend does not change over time. In addition, according to the present invention, it is possible to provide an antistatic surface protective film which is used for optical applications in which the surface of an adherend such as an LR polarizer or an AG-LR polarizer is subjected to antifouling treatment through a silicone resin compound or a fluorine compound. Film, it is also possible to suppress the peeling static voltage generated when the antistatic surface protection film is peeled from the adherend to be low, Degraded over time and has excellent peeling antistatic performance.

根據本發明的防靜電表面保護膜,由於能夠確實地保護光學用膜的表面,因此能夠預期生產率的提高及成品率的提高。 According to the antistatic surface protective film of the present invention, since the surface of the optical film can be reliably protected, an improvement in productivity and an improvement in yield can be expected.

1‧‧‧基材膜 1‧‧‧ substrate film

2‧‧‧黏黏結劑層 2‧‧‧ Adhesive layer

3‧‧‧防靜電劑層 3‧‧‧Antistatic agent layer

4‧‧‧剝離膜 4‧‧‧ peeling film

5‧‧‧光學元件 5‧‧‧ Optical Elements

10‧‧‧防靜電表面保護膜 10‧‧‧Anti-static surface protective film

11‧‧‧剝下了剝離膜的防靜電表面保護膜 11‧‧‧ peeled off the anti-static surface protective film

20‧‧‧貼合了防靜電表面保護膜的光學元件 20‧‧‧ Optical element with anti-static surface protective film

第1圖為本發明的防靜電表面保護膜的示意剖面圖;第2圖為表示從本發明的防靜電表面保護膜上剝下剝離膜的狀態的剖面圖;第3圖為表示將本發明的防靜電表面保護膜貼合於光學元件上的一個實施例的剖面圖。 FIG. 1 is a schematic cross-sectional view of an antistatic surface protective film of the present invention; FIG. 2 is a cross-sectional view illustrating a state where a release film is peeled from the antistatic surface protective film of the present invention; A cross-sectional view of an embodiment of an antistatic surface protective film attached to an optical element.

以下,根據實施的方式對本發明進行詳細說明。 Hereinafter, this invention is demonstrated in detail based on embodiment.

第1圖為本發明的防靜電表面保護膜的示意剖面圖。該防靜電表面保護膜10在透明的基材膜1的一個面的表面上形成有不含防靜電劑的黏結劑層2。在該黏結劑層2的表面上形成有存在含防靜電劑材料的防靜電劑層3,更進一步,在防靜電劑層3的表面上貼合有經剝離處理的剝離膜4。 FIG. 1 is a schematic cross-sectional view of an antistatic surface protection film of the present invention. This antistatic surface protection film 10 has an adhesive layer 2 containing no antistatic agent on the surface of one surface of a transparent base film 1. An antistatic agent layer 3 containing an antistatic agent material is formed on the surface of the adhesive layer 2, and a release film 4 subjected to a peeling treatment is bonded to the surface of the antistatic agent layer 3.

作為用於本發明的防靜電表面保護膜10的基材膜1,使用由具有透明性及可撓性的樹脂形成的基材膜。如此,能夠以防靜電表面保護膜貼合于作為被黏附體的光學元件上的狀態,進行光學元件的外觀檢查。用作基材膜1的具有透明性的樹脂膜適宜使用聚對苯二甲酸乙二醇酯、聚萘二甲酸乙二醇酯、聚間苯二甲酸乙二醇酯、聚對苯二甲酸丁二醇酯等聚酯膜。除了聚酯膜之外,只要是具有所需強度、且具有光學特性 的膜,由其他樹脂構成的膜也可以使用。基材膜1可以是無拉伸膜,也可以是經單軸或雙軸拉伸的膜。此外,也可以將拉伸膜的拉伸倍率、隨拉伸膜的結晶化而形成的軸方向的配向角度控制為特定的值。 As the base film 1 used for the antistatic surface protection film 10 of the present invention, a base film made of a resin having transparency and flexibility is used. In this way, the appearance inspection of the optical element can be performed in a state where the antistatic surface protective film is bonded to the optical element as an adherend. As the transparent resin film used as the base film 1, polyethylene terephthalate, polyethylene naphthalate, polyethylene isophthalate, and polybutylene terephthalate are suitably used. Polyester films such as glycol esters. In addition to polyester film, as long as it has the required strength and has optical characteristics A film made of other resins can also be used. The base film 1 may be a non-stretched film, or may be a uniaxially or biaxially stretched film. The stretching ratio of the stretched film and the alignment angle in the axial direction formed by the crystallization of the stretched film may be controlled to specific values.

用於本發明的防靜電表面保護膜10的基材膜1的厚度沒有特別的限定,例如,優選為12~100μm左右的厚度。更進一步,基材膜1更優選為20~50μm左右的厚度,此時則便於操作。 The thickness of the base film 1 used in the antistatic surface protection film 10 of the present invention is not particularly limited, and for example, a thickness of about 12 to 100 μm is preferred. Furthermore, the thickness of the base film 1 is more preferably about 20 to 50 μm , and in this case, it is easy to handle.

此外,可以根據需要,在基材膜1的形成有黏結劑層2的面的相反側面上,設置防止表面污染的防汙層、防靜電層、防損傷的硬塗層等。此外,在基材膜1的表面上可以施加經由電暈放電的表面改質、塗佈增黏塗劑等易黏接處理。 In addition, if necessary, an antifouling layer, an antistatic layer, a hard coat layer, or the like that prevents surface contamination can be provided on the opposite side of the surface on which the adhesive layer 2 is formed on the base film 1. In addition, the surface of the base film 1 may be subjected to an easy-adhesion treatment such as surface modification via corona discharge and application of a tackifier.

此外,用於本發明的防靜電表面保護膜10的黏結劑層2只要是黏接於被黏附體的表面來保護被黏附體後,能夠從被黏附體上簡單剝下,且難以污染被黏附體的黏結劑即可,沒有特別的限定。但是,若考慮貼合於光學用膜後的耐久性等,優選使用由(甲基)丙烯酸酯共聚物交聯而成的丙烯酸類黏結劑組合物來形成黏結劑層。 In addition, as long as the adhesive layer 2 used in the antistatic surface protection film 10 of the present invention is adhered to the surface of the adherend to protect the adherend, it can be simply peeled off from the adherend and it is difficult to contaminate the adhered The binder is not particularly limited as long as it is a binder. However, in consideration of durability after bonding to an optical film, it is preferable to form an adhesive layer using an acrylic adhesive composition obtained by crosslinking a (meth) acrylate copolymer.

作為(甲基)丙烯酸酯共聚物,可列舉出使正丁基丙烯酸酯、2-乙基己基丙烯酸酯、異辛基丙烯酸酯、異壬基丙烯酸酯等主要單體與丙烯腈、醋酸乙烯酯、甲基丙烯酸甲酯、丙烯酸乙酯等共聚單體、丙烯酸、甲基丙烯酸、羥基乙基丙烯酸酯、羥基丁基丙烯酸酯、甲基丙烯酸縮水甘油酯、N-羥甲基丙烯醯胺等官能性單體共聚而成的共聚物。(甲基)丙 烯酸酯共聚物可以主要單體及共聚單體均為(甲基)丙烯酸酯,作為共聚單體,也可以含有1種或2種以上(甲基)丙烯酸酯以外的單體。 Examples of the (meth) acrylate copolymer include a main monomer such as n-butyl acrylate, 2-ethylhexyl acrylate, isooctyl acrylate, and isononyl acrylate, and acrylonitrile and vinyl acetate. , Comonomers such as methyl methacrylate, ethyl acrylate, acrylic acid, methacrylic acid, hydroxyethyl acrylate, hydroxybutyl acrylate, glycidyl methacrylate, N-hydroxymethacrylamide, etc. Copolymer made from copolymerizing monomers. (Meth) acrylic The acrylate copolymer may have both a main monomer and a comonomer as (meth) acrylates, and as a comonomer, it may contain one or more monomers other than (meth) acrylates.

此外,在(甲基)丙烯酸酯共聚物中,可以將含有聚氧化烯基的化合物共聚,也可將其混合。作為含有可共聚的聚氧化烯基的化合物,可列舉出聚乙二醇(400)單丙烯酸酯、聚乙二醇(400)單甲基丙烯酸酯,甲氧基聚乙二醇(400)丙烯酸酯、甲氧基聚乙二醇(400)甲基丙烯酸酯、聚丙二醇(400)單丙烯酸酯、聚丙二醇(400)單甲基丙烯酸酯、甲氧基聚丙二醇(400)丙烯酸酯、甲氧基聚丙二醇(400)甲基丙烯酸酯等。透過使這些含有聚氧化烯基的單體與所述(甲基)丙烯酸酯共聚物的主要單體或官能性單體共聚,能夠得到由含有聚氧化烯基的共聚物形成的黏結劑。 In the (meth) acrylate copolymer, a compound containing a polyoxyalkylene group may be copolymerized or mixed. Examples of the compound containing a copolymerizable polyoxyalkylene group include polyethylene glycol (400) monoacrylate, polyethylene glycol (400) monomethacrylate, and methoxypolyethylene glycol (400) acrylic acid. Esters, methoxy polyethylene glycol (400) methacrylate, polypropylene glycol (400) monoacrylate, polypropylene glycol (400) monomethacrylate, methoxy polypropylene glycol (400) acrylate, methoxy Polypropylene glycol (400) methacrylate and the like. By copolymerizing these polyoxyalkylene group-containing monomers with the main monomer or functional monomer of the (meth) acrylate copolymer, it is possible to obtain a binder composed of a polyoxyalkylene group-containing copolymer.

作為可混合於(甲基)丙烯酸酯共聚物中的含有聚氧化烯基的化合物,優選為含有聚氧化烯基的(甲基)丙烯酸酯共聚物,更優選為含有聚氧化烯基的(甲基)丙烯酸類單體的聚合物。例如,可列舉出聚乙二醇(400)單丙烯酸酯、聚乙二醇(400)單甲基丙烯酸酯、甲氧基聚乙二醇(400)丙烯酸酯、甲氧基聚乙二醇(400)甲基丙烯酸酯、聚丙二醇(400)單丙烯酸酯、聚丙二醇(400)單甲基丙烯酸酯、甲氧基聚丙二醇(400)丙烯酸酯、甲氧基聚丙二醇(400)甲基丙烯酸酯等的聚合物。透過將這些含有聚氧化烯基的化合物與所述(甲基)丙烯酸酯共聚物混合,能夠獲得添加有含有聚氧化烯基的化合物的黏結劑。 The polyoxyalkylene group-containing compound that can be mixed in the (meth) acrylate copolymer is preferably a (meth) acrylate copolymer containing a polyoxyalkylene group, and more preferably a (meth) acrylate containing a polyoxyalkylene group. Polymers) of acrylic monomers. For example, polyethylene glycol (400) monoacrylate, polyethylene glycol (400) monomethacrylate, methoxy polyethylene glycol (400) acrylate, and methoxy polyethylene glycol ( 400) methacrylate, polypropylene glycol (400) monoacrylate, polypropylene glycol (400) monomethacrylate, methoxy polypropylene glycol (400) acrylate, methoxy polypropylene glycol (400) methacrylate And other polymers. By mixing these polyoxyalkylene group-containing compounds with the (meth) acrylate copolymer, a binder to which a polyoxyalkylene group-containing compound is added can be obtained.

作為添加於黏結劑層2的固化劑而言,作為使(甲基)丙烯酸酯共聚物交聯的交聯劑,可列舉出異氰酸酯化合物、環氧化合物、三聚氰胺化合物、金屬螯合物等。此外,作為增黏劑,可列舉出松香類、香豆酮茚類(coumarone indene)、萜烯類(terpene)、石油類、酚類等。 Examples of the curing agent added to the adhesive layer 2 include a isocyanate compound, an epoxy compound, a melamine compound, and a metal chelate as a crosslinking agent that crosslinks the (meth) acrylate copolymer. Examples of the thickener include rosin, coumarone indene, terpene, petroleum, and phenol.

用於本發明的防靜電表面保護膜10的黏結劑層2的厚度沒有特別的限定,例如,優選為5~40μm左右的厚度,更優選為10~30μm左右的厚度。 The thickness of the adhesive layer 2 used in the antistatic surface protection film 10 of the present invention is not particularly limited. For example, the thickness is preferably about 5 to 40 μm , and more preferably about 10 to 30 μm .

作為在基材膜1的表面上形成黏結劑層2的方法,以公知的方法進行即可,具體而言,可使用反向塗佈法、逗號塗佈法(Comma Coating)、凹版塗佈法(gravure coating)、狹縫式塗佈法(slot die coating)、線棒式塗佈法(Meyer bar coating)、氣刀塗佈法等公知的塗佈方法。 As a method for forming the adhesive layer 2 on the surface of the base film 1, a known method may be used. Specifically, a reverse coating method, a comma coating method, or a gravure coating method may be used. Gravure coating, slot die coating, Meyer bar coating, air knife coating and other known coating methods are known.

此外,本發明的防靜電表面保護膜10所使用的、用於形成防靜電劑層3的含防靜電劑材料可列舉出防靜電劑單體、防靜電劑與各種樹脂的混合物等。 The antistatic agent-containing material used to form the antistatic agent layer 3 used in the antistatic surface protective film 10 of the present invention includes an antistatic agent alone, a mixture of an antistatic agent, and various resins.

作為防靜電劑,可列舉出表面活性劑類、離子性液體、鹼金屬鹽、金屬酸化物、金屬微粒,導電性聚合物、碳、碳納米管等,從透明性和對(甲基)丙烯酸類聚合物的親和性等方面考慮,優選為表面活性劑類、離子化合物、鹼金屬鹽。 Examples of the antistatic agent include surfactants, ionic liquids, alkali metal salts, metal acid compounds, metal particles, conductive polymers, carbon, carbon nanotubes, and the like. From transparency and (meth) acrylic acid, In consideration of the affinity of the polymer-based polymer, surfactants, ionic compounds, and alkali metal salts are preferred.

此外,作為用於防靜電劑與各種樹脂的混合物的樹脂,可列舉出聚酯類樹脂、聚醯胺類樹脂、聚氨酯類樹脂、聚烯烴樹脂、聚乙烯醇縮丁醛樹脂、聚乙烯醇樹脂、聚醋酸乙烯酯樹脂、纖維素樹脂、矽氧樹脂、氟樹脂等。 Examples of the resin used in the mixture of the antistatic agent and various resins include polyester resins, polyamide resins, polyurethane resins, polyolefin resins, polyvinyl butyral resins, and polyvinyl alcohol resins. , Polyvinyl acetate resin, cellulose resin, silicone resin, fluorine resin, etc.

作為表面活性劑,可列舉出非離子型、陽離子型、陰離子型、兩性型等。作為非離子型表面活性劑,可列舉出聚氧乙烯烷基醚類、聚氧乙烯烷基苯基醚類、山梨糖醇酐脂肪酸酯類、聚氧乙烯山梨糖醇酐脂肪酸酯類、聚氧乙烯脂肪酸酯類、甘油脂肪酸酯類、丙二醇脂肪酸酯類、聚氧化烯改質矽氧樹脂類等。 Examples of the surfactant include nonionic, cationic, anionic, and amphoteric types. Examples of the nonionic surfactant include polyoxyethylene alkyl ethers, polyoxyethylene alkylphenyl ethers, sorbitan fatty acid esters, polyoxyethylene sorbitan fatty acid esters, and polyoxyethylene. Ethylene fatty acid esters, glycerin fatty acid esters, propylene glycol fatty acid esters, polyoxyalkylene modified silicone resins, and the like.

作為陽離子型表面活性劑,可列舉出烷基三甲基銨鹽類、二烷基二甲基銨鹽類、烷基苄基二甲基銨鹽類等。 Examples of the cationic surfactant include alkyltrimethylammonium salts, dialkyldimethylammonium salts, and alkylbenzyldimethylammonium salts.

作為陰離子類表面活性劑,可列舉出單烷基硫酸鹽類、烷基聚氧乙烯硫酸鹽類、烷基苯磺酸鹽類、單烷基磷酸鹽類等。 Examples of the anionic surfactant include monoalkyl sulfates, alkyl polyoxyethylene sulfates, alkylbenzene sulfonates, and monoalkyl phosphates.

作為兩性型表面活性劑,可列舉出烷基二甲基氧化胺、烷基羧基甜菜鹼等。 Examples of the amphoteric surfactant include alkyldimethylamine oxide, alkylcarboxybetaine, and the like.

離子化合物是指由陰離子與陽離子構成的、常溫下為液體的離子性液體與常溫下為固體的離子固體。作為陽離子部分,可列舉出有機陽離子或無機陽離子,例如,咪唑鎓離子等環狀脒離子、吡啶鎓離子、銨離子、鋶離子、鏻離子等。此外,作為陰離子部分,可列舉出有機陰離子或無機陰離子,例如,CnH2n+1COO-、CnF2n+1COO-、NO3 -、CnF2n+1SO3 -、(CnF2n+1SO2)2N-、(CnF2n+1SO2)3C-、PO4 3-、AlCl4 -、Al2Cl7 -、ClO4 -、BF4 -、PF6 -、AsF6 -、SbF6 -等。上述式中,下標n為0以上的整數。在n=0的情況下,相當於HCOO-、(FSO2)2N-等。 Ionic compounds refer to ionic liquids composed of anions and cations, which are liquid at normal temperature, and ionic solids which are solid at normal temperature. Examples of the cationic moiety include organic cations and inorganic cations, and examples include cyclic sulfonium ions such as imidazolium ions, pyridinium ions, ammonium ions, sulfonium ions, and sulfonium ions. Further, as the anionic moiety include an organic anion or inorganic anion, e.g., C n H 2n + 1 COO -, C n F 2n + 1 COO -, NO 3 -, C n F 2n + 1 SO 3 -, ( C n F 2n + 1 SO 2 ) 2 N -, (C n F 2n + 1 SO 2) 3 C -, PO 4 3-, AlCl 4 -, Al 2 Cl 7 -, ClO 4 -, BF 4 -, PF 6 -, AsF 6 -, SbF 6 - and so on. In the above formula, the subscript n is an integer of 0 or more. In the case of n = 0, it is equivalent to HCOO , (FSO 2 ) 2 N and the like.

作為鹼金屬鹽,可列舉出由鋰、鈉、鉀形成的金屬鹽。具體而言,例如,可適宜地使用Li+、Na+、K+組成的陽 離子與Cl-、Br-、I-、BF4 -、PF6 -、SCN-、ClO4 -、CF3SO3 -、(FSO2)2N-、(CF3SO2)2N-、(C2F5SO2)2N-、(CF3SO2)3C-組成的陰離子所構成的金屬鹽。其中,特別優選使用LiBr、LiI、LiBF4、LiPF6、LiSCN、LiClO4、LiCF3SO3、Li(FSO2)2N、Li(CF3SO2)2N、Li(C2F5SO2)2N、Li(CF3SO2)3C等鋰鹽。這些鹼金屬鹽可以單獨使用,或者可以2種以上混合使用。為了離子性物質的穩定化,也可以添加含有聚氧化西基結構的化合物。 Examples of the alkali metal salt include metal salts formed of lithium, sodium, and potassium. Specifically, for example, can be suitably used Li +, Na +, K + cations and Cl -, Br -, I - , BF 4 -, PF 6 -, SCN -, ClO 4 -, CF 3 SO 3 -, (FSO 2) 2 N -, (CF 3 SO 2) 2 N -, (C 2 F 5 SO 2) 2 N -, (CF 3 SO 2) 3 C - anion of the metal salt thereof. Among them, LiBr, LiI, LiBF 4 , LiPF 6 , LiSCN, LiClO 4 , LiCF 3 SO 3 , Li (FSO 2 ) 2 N, Li (CF 3 SO 2 ) 2 N, and Li (C 2 F 5 SO) are particularly preferably used. 2 ) Lithium salts such as 2 N and Li (CF 3 SO 2 ) 3 C. These alkali metal salts may be used singly or in combination of two or more kinds. In order to stabilize the ionic substance, a compound containing a polyoxywestyl structure may be added.

防靜電劑層3的乾燥後的塗佈膜的厚度是考慮防靜電劑的種類及其防靜電性、被黏附體污染性而決定的即可,但優選為0.3μm以下。防靜電劑層3的厚度若超過0.3μm,在表面保護膜貼合於被黏附體時,黏結劑組合物的成分變得難以從形成有防靜電劑層的樹脂之間出現在表面保護膜與被黏附體的介面上,黏結劑層2的黏結力達不到規定值,因此不優選。防靜電劑層3的厚度例如為0.01~0.3μm。 The thickness of the dried coating film of the antistatic agent layer 3 may be determined in consideration of the type of the antistatic agent, its antistatic property, and contamination by the adherend, but it is preferably 0.3 μm or less. When the thickness of the antistatic agent layer 3 exceeds 0.3 μm, when the surface protective film is bonded to the adherend, it becomes difficult for the components of the adhesive composition to appear between the surface protective film and the resin formed with the antistatic agent layer. Since the adhesive force of the adhesive layer 2 does not reach a predetermined value on the interface of the adherend, it is not preferable. The thickness of the antistatic agent layer 3 is, for example, 0.01 to 0.3 μm.

從將防靜電表面保護膜10(具體為第2圖所示的剝下剝離膜的防靜電表面保護膜11)由被黏附體上剝下時的操作性優異的方面考慮,將防靜電表面保護膜10從被黏附體的表面剝離時的剝離強度(黏結力)優選為0.03~0.3N/25mm左右的弱黏結力。 The antistatic surface protection film 10 (specifically, the antistatic surface protection film 11 from which the release film is peeled off as shown in FIG. 2) is peeled from the adherend, and the antistatic surface is protected from the viewpoint of excellent operability. The peeling strength (adhesive force) when the film 10 is peeled from the surface of the adherend is preferably a weak adhesive force of about 0.03 to 0.3 N / 25 mm.

此外,從將剝離膜4由防靜電表面保護膜10上剝下時的操作性優異的方面考慮,將剝離膜4從防靜電劑層3上剝離時的剝離力優選為0.2N/50mm以下。 In addition, from the viewpoint of excellent operability when peeling the release film 4 from the antistatic surface protective film 10, the peel force when peeling the release film 4 from the antistatic agent layer 3 is preferably 0.2 N / 50 mm or less.

此外,在本發明的防靜電表面保護膜10中,在黏結劑層2的表面形成防靜電劑層3的方法沒有特別的限定。例 如,可列舉出以下方法:(1)使剝離膜4的剝離劑層中含有上述含防靜電劑材料,將剝離膜4貼合於黏結劑層2時轉印至黏結劑層2的方法;(2)在黏結劑層2的表面上印刷上述含防靜電劑材料的方法;(3)在黏結劑層2的表面上塗佈上述含防靜電劑材料的方法等。對於上述含防靜電劑材料的印刷、塗佈,可以進行均勻的印刷、塗佈,或者也可以特定的圖案進行印刷、塗佈。只要考慮黏結劑層對於防靜電表面保護膜的被黏附體的黏結力等而決定即可。對於含防靜電劑材料的印刷或塗佈的方法,可使用公知的方法進行。 In addition, in the antistatic surface protective film 10 of the present invention, the method of forming the antistatic agent layer 3 on the surface of the adhesive layer 2 is not particularly limited. example For example, the following methods can be enumerated: (1) a method of making the release agent layer of the release film 4 contain the above-mentioned antistatic agent-containing material, and transferring the release film 4 to the adhesive layer 2 when the release film 4 is bonded to the adhesive layer 2; (2) a method of printing the above-mentioned antistatic agent-containing material on the surface of the adhesive layer 2; (3) a method of applying the above-mentioned antistatic agent-containing material on the surface of the adhesive layer 2 and the like. The antistatic agent-containing material may be printed or coated uniformly, or may be printed or coated with a specific pattern. It is only necessary to determine the adhesion force of the adhesive layer to the adherend of the antistatic surface protective film. The printing or coating method of the antistatic agent-containing material can be performed by a known method.

第1圖所示的用於本發明的防靜電表面保護膜10所使用的剝離膜4的樹脂沒有特別的限定。作為剝離膜4,例如,可例示出聚酯膜、聚醯胺膜、聚乙烯膜、聚丙烯膜、聚醯亞胺膜等樹脂膜的一個面經矽氧樹脂類剝離劑、含長鏈烷基的樹脂、氟樹脂等剝離劑處理的剝離膜,或使聚乙烯樹脂、聚丙烯樹脂、聚甲基戊烯樹脂、氟樹脂等具有離型性的樹脂膜化的剝離膜。 The resin used for the release film 4 used in the antistatic surface protective film 10 of the present invention shown in FIG. 1 is not particularly limited. As the release film 4, for example, one surface of a resin film such as a polyester film, a polyimide film, a polyethylene film, a polypropylene film, or a polyimide film is subjected to a silicone resin-based release agent or a long-chain alkane-containing agent. A release film treated with a release agent such as a base resin, a fluororesin, or a release film formed by releasing a resin having a release property such as a polyethylene resin, a polypropylene resin, a polymethylpentene resin, or a fluororesin.

剝離膜的厚度沒有特別的限定,例如,優選為12~100μm左右的厚度,若為20~50μm左右的厚度則容易操作,故而更優選。 The thickness of the release film is not particularly limited. For example, a thickness of about 12 to 100 μm is preferable, and a thickness of about 20 to 50 μm is easy to handle, so it is more preferable.

第2圖為表示從本發明的防靜電表面保護膜上剝下剝離膜的狀態的剖面圖。在第2圖所示的剝下了剝離膜的防靜電表面保護膜11中,在黏結劑層2的表面上設置有防靜電劑層3。 Fig. 2 is a cross-sectional view showing a state where the release film is peeled from the antistatic surface protection film of the present invention. In the antistatic surface protection film 11 in which the release film is peeled off as shown in FIG. 2, an antistatic agent layer 3 is provided on the surface of the adhesive layer 2.

第3圖為表示將本發明的防靜電表面保護膜貼合 於光學元件上的實施例的剖面圖。 Fig. 3 shows the bonding of the antistatic surface protective film of the present invention. Sectional view of an embodiment on an optical element.

本發明的防靜電表面保護膜10剝下了經剝離處理的剝離膜4,以露出防靜電劑層3的狀態(第2圖的防靜電表面保護膜11),經由該防靜電劑層3貼合于作為被黏附體的光學元件5上。 The antistatic surface protective film 10 of the present invention is peeled off the release film 4 after the peeling treatment, and the antistatic agent layer 3 is exposed (the antistatic surface protective film 11 in FIG. 2), and the antistatic surface protective film 10 is pasted through the antistatic agent layer 3. It is attached to the optical element 5 as an adherend.

即,第3圖表示了貼合有從本發明的防靜電表面保護膜10上剝下剝離膜4的狀態的防靜電表面保護膜11的光學元件20。作為光學元件,可列舉出偏光板、相位差板、透鏡膜、兼用為相位差板的偏光板、兼用為透鏡膜的偏光板等光學用膜。這樣的光學元件可用作液晶顯示面板等液晶顯示裝置、各種計量儀器類的光學類裝置等的構成元件來使用。此外,作為光學元件,可列舉出抗反射膜、硬塗膜、觸摸面板用透明導電性膜等光學用膜。特別是能夠適宜地用作表面透過矽氧樹脂化合物或氟化合物等進行了防污染處理的低反射處理偏光板(LR偏光板)或防眩低反射處理偏光板(AG-LR偏光板)等光學用膜的、貼合於經防污染處理的面上的防靜電表面保護膜來使用。 That is, FIG. 3 shows the optical element 20 to which the antistatic surface protective film 11 is bonded in a state where the release film 4 is peeled from the antistatic surface protective film 10 of the present invention. Examples of the optical element include optical films such as a polarizing plate, a retardation plate, a lens film, a polarizing plate also serving as a retardation plate, and a polarizing plate also serving as a lens film. Such an optical element can be used as a structural element, such as a liquid crystal display device, such as a liquid crystal display panel, and various optical devices, such as various measuring instruments. Examples of the optical element include optical films such as an antireflection film, a hard coat film, and a transparent conductive film for a touch panel. In particular, it can be suitably used as optical materials such as low-reflection-treated polarizing plates (LR polarizing plates) and anti-glare low-reflection processing polarizing plates (AG-LR polarizing plates) that have been subjected to anti-pollution treatment such as silicone resin or fluorine compounds. Use a film with an antistatic surface protective film attached to the anti-contamination surface.

將從本發明的防靜電表面保護膜10剝下剝離膜4的狀態的防靜電表面保護膜11從作為被黏附體的光學元件(光學用膜)上剝離去除時,能夠充分低地抑制剝離靜電壓。因此,無需擔心破壞驅動IC、TFT元件、柵線驅動電路等電路元件,能夠提高在製造液晶顯示面板的步驟中的生產效率,確保生產步驟的可靠性。 When the antistatic surface protection film 11 in a state where the release film 4 is peeled from the antistatic surface protection film 10 of the present invention is peeled off from the optical element (optical film) as an adherend, the peeling static voltage can be sufficiently reduced. . Therefore, there is no need to worry about damaging circuit elements such as a driving IC, a TFT element, and a gate line driving circuit, and it is possible to improve the production efficiency in the step of manufacturing the liquid crystal display panel and ensure the reliability of the production step.

實施例Examples

接著,透過實施例對本發明進行進一步說明。 Next, the present invention will be further described through examples.

(實施例1) (Example 1) (防靜電表面保護膜的製作) (Production of antistatic surface protective film)

相對於100重量份由80重量份2-乙基己基丙烯酸酯、17重量份甲氧基聚乙二醇(400)甲基丙烯酸酯、3重量份2-羥基乙基丙烯酸酯的共聚物構成之黏接劑的40%醋酸乙酯溶液,攪拌混合2重量份的異氰酸酯類固化劑(東曹公司製CORONATE(註冊商標)HX),配製為黏結劑組合物。在厚度為38μm的聚對苯二甲酸乙二醇酯膜的表面,用塗佈裝置塗佈所配製的黏結劑組合物使乾燥後的黏結劑層的厚度為20μm。然後,使用100℃的熱風循環式烘箱進行3分鐘加熱乾燥,得到黏結膜。然後,在黏結劑層的表面上,用4號線棒(Meyer bar)塗佈作為防靜電劑的雙三氟甲烷磺醯亞胺鋰(Lithium bis(trifluoromethanesulfonyl)imide)的醋酸乙酯溶液使乾燥後的防靜電劑層的厚度變為0.1μm,然後使用100℃的熱風循環式烘箱進行2分鐘加熱乾燥,製成在黏結劑層的表面形成有防靜電劑層的樣品。在該樣品的防靜電劑層的表面貼合剝離膜(三菱樹脂(株)製Diafoil MRF38,在厚度為38μm的聚對苯二甲酸乙二醇酯膜的表面上經矽氧樹脂剝離劑處理而成),得到實施例1的防靜電表面保護膜。 It is composed of a copolymer of 80 parts by weight of 2-ethylhexyl acrylate, 17 parts by weight of methoxypolyethylene glycol (400) methacrylate, and 3 parts by weight of 2-hydroxyethyl acrylate with respect to 100 parts by weight. A 40% ethyl acetate solution of an adhesive was stirred and mixed with 2 parts by weight of an isocyanate-based curing agent (CORONATE (registered trademark) HX manufactured by Tosoh Corporation) to prepare an adhesive composition. On the surface of the polyethylene terephthalate film having a thickness of 38 μm, the prepared adhesive composition was applied with a coating device so that the thickness of the dried adhesive layer was 20 μm. Then, it heat-dried using 100 degreeC hot air circulation type oven for 3 minutes, and obtained the adhesive film. Then, on the surface of the adhesive layer, an ethyl acetate solution of Lithium bis (trifluoromethanesulfonyl) imide as an antistatic agent was coated with a Meyer bar and dried. The thickness of the antistatic agent layer was changed to 0.1 μm, and then heated and dried in a hot air circulation oven at 100 ° C. for 2 minutes to prepare a sample having an antistatic agent layer formed on the surface of the adhesive layer. A release film (Diafoil MRF38, manufactured by Mitsubishi Resins Co., Ltd.) was attached to the surface of the antistatic agent layer of the sample, and a surface of a polyethylene terephthalate film having a thickness of 38 μm was treated with a silicone resin release agent. As a result, an antistatic surface protection film of Example 1 was obtained.

(實施例2) (Example 2)

相對於100重量份由70重量份2-乙基己基丙烯酸酯、20重量份丁基丙烯酸酯、7重量份甲氧基聚乙二醇(400)甲基丙烯酸酯、2重量份2-羥基乙基丙烯酸酯的共聚物構成之黏結劑的40%醋酸乙酯溶液,攪拌混合1重量份異氰酸酯類固化 劑(東曹公司製CORONATE(註冊商標)HX),配製為黏結劑組合物。在厚度為38μm的聚對苯二甲酸乙二醇酯膜的表面上,用塗佈裝置塗佈配製的黏結劑組合物使乾燥後的黏結劑層的厚度為20μm。然後,使用100℃的熱風循環式烘箱進行3分鐘加熱乾燥,得到黏結膜。然後,在黏結劑層的表面上,用4號線棒塗佈作為防靜電劑的雙氟磺醯亞胺鋰(Lithium bis(fluorosulfonyl)imide)的醋酸乙酯溶液使乾燥後的防靜電劑層的厚度為0.05μm,然後使用100℃的熱風循環式烘箱進行2分鐘加熱乾燥,製成在黏結劑層的表面上形成有防靜電劑層的樣品。在該樣品的防靜電劑層的表面上貼合剝離膜(三菱樹脂(株)製Diafoil MRF38,在厚度為38μm的聚對苯二甲酸乙二醇酯膜的表面上經矽氧樹脂剝離劑處理而成),得到實施例2的防靜電表面保護膜。 70 parts by weight of 2-ethylhexyl acrylate, 20 parts by weight of butyl acrylate, 7 parts by weight of methoxypolyethylene glycol (400) methacrylate, and 2 parts by weight of 2-hydroxyethyl with respect to 100 parts by weight. A 40% ethyl acetate solution of a binder composed of a copolymer of acrylic acrylate and 1 part by weight of an isocyanate-based curing agent (CORONATE (registered trademark) HX manufactured by Tosoh Corporation) was stirred and mixed to prepare a binder composition. On the surface of the polyethylene terephthalate film having a thickness of 38 μm , the prepared adhesive composition was applied with a coating device so that the thickness of the dried adhesive layer was 20 μm . Then, it heat-dried using 100 degreeC hot air circulation type oven for 3 minutes, and obtained the adhesive film. Then, the surface of the adhesive layer was coated with an ethyl acetate solution of lithium bis (fluorosulfonyl) imide as an antistatic agent using a wire rod No. 4 to make the dried antistatic agent layer. The thickness was 0.05 μm , and then heated and dried in a hot air circulation oven at 100 ° C. for 2 minutes to prepare a sample having an antistatic agent layer formed on the surface of the adhesive layer. A release film (Diafoil MRF38, manufactured by Mitsubishi Resins Co., Ltd.) was attached to the surface of the sample's antistatic agent layer, and the surface of the polyethylene terephthalate film with a thickness of 38 μm was peeled off by a silicone Agent treatment) to obtain the antistatic surface protection film of Example 2.

(實施例3) (Example 3)

除了將實施例1的防靜電劑層的乾燥後的厚度設為0.3μm以外,以與實施例1相同的方式,得到實施例3的防靜電表面保護膜。 An antistatic surface protection film of Example 3 was obtained in the same manner as in Example 1, except that the dried thickness of the antistatic agent layer of Example 1 was set to 0.3 μm .

(實施例4) (Example 4)

除了將實施例1的防靜電劑變更為雙三氟甲磺醯亞胺三正丁基甲銨(tri-n-butylmethylammonium bis-(trifluoromethanesulfonyl)imide,3M日本公司製,商品編號:FC-4400)以外,以與實施例1相同的方式,得到實施例4的防靜電表面保護膜。 Except that the antistatic agent in Example 1 was changed to tri-n-butylmethylammonium bis- (trifluoromethanesulfonyl) imide (manufactured by 3M Japan, product number: FC-4400), In the same manner as in Example 1, an antistatic surface protection film of Example 4 was obtained.

(比較例1) (Comparative example 1)

在實施例1的黏結劑組合物中,以固含量比例為100:1.5的方式混合實施例1的防靜電劑,塗佈混合有防靜電劑的黏結劑組合物使乾燥後的黏結劑層的厚度為20μm,從而代替在黏結劑層上層疊防靜電劑層,除此之外,以與實施例1相同的方式,得到比較例1的防靜電表面保護膜。 In the adhesive composition of Example 1, the antistatic agent of Example 1 was mixed in such a manner that the solid content ratio was 100: 1.5, and the adhesive composition mixed with the antistatic agent was applied to dry the adhesive layer. The thickness was 20 μm , and instead of laminating the antistatic agent layer on the adhesive layer, the antistatic surface protective film of Comparative Example 1 was obtained in the same manner as in Example 1.

(比較例2) (Comparative example 2)

除了未設置防靜電劑層以外,以與實施例1相同的方式,得到比較例2的表面保護膜。 A surface protection film of Comparative Example 2 was obtained in the same manner as in Example 1 except that the antistatic agent layer was not provided.

(比較例3) (Comparative example 3)

除了使防靜電劑層的乾燥後的厚度為0.5μm以外,以與實施例1相同的方式,得到比較例3的防靜電表面保護膜。 An antistatic surface protection film of Comparative Example 3 was obtained in the same manner as in Example 1 except that the thickness of the antistatic agent layer after drying was 0.5 μm .

以下,顯示出評價試驗的方法及結果。 The methods and results of the evaluation tests are shown below.

〈剝離膜的剝離力的測定方法〉 <Method for measuring peeling force of release film>

將防靜電表面保護膜的樣品剪裁成寬度50mm、長度150mm。在23℃×50%RH的試驗環境下,用拉伸試驗機以300mm/分鐘的剝離速度在180°的方向上,測定將剝離膜從防靜電劑層上剝離時的強度,將其作為剝離膜的剝離力(N/50mm)。 A sample of the antistatic surface protective film was cut into a width of 50 mm and a length of 150 mm. In a test environment of 23 ° C. × 50% RH, a tensile tester was used at a peeling speed of 300 mm / min in a direction of 180 ° to measure the strength when the release film was peeled from the antistatic agent layer, and this was taken as the peel. Film peeling force (N / 50mm).

〈防靜電劑的表面的表面電阻率的測定方法〉 <Method for measuring surface resistivity of antistatic agent surface>

將剝離膜從防靜電表面保護膜的樣品剝離後,使用高電阻電阻率計(三菱化學Analytech公司製Hiresta(註冊商標)-UP),在施加電壓100V、測定時間30秒的條件下測定防靜電劑層的表面的表面電阻率。 After the release film was peeled off from the sample of the antistatic surface protection film, the antistatic was measured using a high-resistance resistivity meter (Hiresta (registered trademark) -UP by Analytical Technology, Inc.) under a voltage of 100V and a measurement time of 30 seconds. Surface resistivity of the surface of the agent layer.

〈防靜電表面保護膜的黏結力的測定方法〉 <Method for measuring the adhesion of antistatic surface protective film>

使用貼合機,在玻璃板的表面貼合防眩低反射處理偏光板(AG-LR偏光板)。然後,在偏光板的表面上貼合剪裁成寬度25mm的防靜電表面保護膜後,在23℃×50%RH的試驗環境下保存1天。然後,使用拉伸試驗機,以300mm/分鐘的剝離速度在180°的方向上,測定剝離防靜電表面保護膜時的強度,將其作為黏結力(N/25mm)。 Using a laminator, an anti-glare low-reflection polarizer (AG-LR polarizer) was bonded to the surface of the glass plate. Then, an antistatic surface protective film having a width of 25 mm was cut and bonded on the surface of the polarizing plate, and then stored in a test environment at 23 ° C. × 50% RH for one day. Then, using a tensile tester, the strength at the time of peeling the antistatic surface protective film was measured at a peeling speed of 300 mm / min in a direction of 180 °, and this was used as the adhesive force (N / 25 mm).

〈防靜電表面保護膜的剝離靜電壓的測定方法〉 <Measurement method of peeling static voltage of antistatic surface protective film>

使用貼合機,在玻璃板的表面貼合防眩低反射處理偏光板(AG-LR偏光板)。然後,在偏光板的表面上經由防靜電劑層貼合剪裁成寬度25mm的防靜電表面保護膜後,在23℃×50%RH的試驗環境下保存1天。然後,使用高速剝離試驗機(Tester產業製)以每分鐘40m的剝離速度剝離防靜電表面保護膜,同時使用表面電位計(Keyence(株)製)每10ms測定一次上述偏光板表面的表面電位,將此時的表面電位的絕對值的最大值作為剝離靜電壓(kV)。 Using a laminator, an anti-glare low-reflection polarizer (AG-LR polarizer) was bonded to the surface of the glass plate. Then, an antistatic surface protective film with a width of 25 mm was cut and bonded to the surface of the polarizing plate via an antistatic agent layer, and then stored in a test environment at 23 ° C. 50% RH for one day. Then, a high-speed peel tester (manufactured by Tester Industries) was used to peel off the antistatic surface protective film at a peeling speed of 40 m per minute, and the surface potential of the surface of the polarizing plate was measured every 10 ms using a surface potentiometer (manufactured by Keyence) The maximum value of the absolute value of the surface potential at this time was taken as the peeling static voltage (kV).

〈防靜電表面保護膜的表面污染性的確認方法〉 <Method for confirming surface contamination of antistatic surface protective film>

使用貼合機,在玻璃板的表面貼合防眩低反射處理偏光板(AG-LR偏光板)。然後,在偏光板的表面上經由防靜電劑層貼合剪裁成寬度25mm的防靜電表面保護膜後,在23℃×50%RH的試驗環境下保存3天及30天。然後,剝下防靜電表面保護膜,以目視觀察偏光板的表面的污染性。作為表面污染性的判定標準,以偏光板上無污染轉移的情況評為(○),確認偏光板上有污染轉移的情況評為(×)。 Using a laminator, an anti-glare low-reflection polarizer (AG-LR polarizer) was bonded to the surface of the glass plate. Then, an antistatic surface protective film having a width of 25 mm was cut and bonded on the surface of the polarizing plate via an antistatic agent layer, and then stored in a test environment at 23 ° C. × 50% RH for 3 days and 30 days. Then, the antistatic surface protective film was peeled off, and the contamination of the surface of the polarizing plate was visually observed. As a criterion for determining the surface contamination, a case where no pollution was transferred on the polarizing plate was rated (○), and a case where pollution was transferred on the polarizing plate was rated (×).

對於得到的實施例1~4及比較例1~3的防靜電表面 保護膜進行測定的測定結果如表1及表2所示。“LiTFSI”意謂雙三氟甲烷磺醯亞胺鋰,“LiFSI”意謂雙氟磺醯亞胺鋰,“FC-4400”意謂雙三氟甲烷磺醯亞胺三正丁基甲銨。此外,防靜電劑層的表面的表面電阻率一欄中的“4.3E11”意謂4.3×1011,“超範圍(Over-range)”意謂表面電阻率(Ω/□)超過測定上限值(1.0×1013以上),無法測定。 The measurement results of the obtained antistatic surface protective films of Examples 1 to 4 and Comparative Examples 1 to 3 are shown in Tables 1 and 2. "LiTFSI" means lithium bistrifluoromethanesulfonylimide, "LiFSI" means lithium bisfluorosulfimide lithium, and "FC-4400" means bistrifluoromethanesulfonylimine tri-n-butylmethylammonium. In addition, “4.3E11” in the column of the surface resistivity of the surface of the antistatic agent layer means 4.3 × 10 11 , and “Over-range” means that the surface resistivity (Ω / □) exceeds the upper measurement limit. The value (1.0 × 10 13 or more) cannot be measured.

根據表1及表2所示的測定結果可知如下情況: 本發明的實施例1~4的防靜電表面保護膜即使經由防靜電劑層貼合,仍具有適度的黏結力,對被黏附體的表面沒有污染,且將防靜電表面保護膜從被黏附體上剝離時的剝離靜電壓低。 According to the measurement results shown in Tables 1 and 2, the following situations are known: The antistatic surface protection films of Examples 1 to 4 of the present invention have a moderate adhesive force even if they are bonded through an antistatic agent layer, have no pollution to the surface of the adherend, and remove the antistatic surface protection film from the adherend. The peeling static voltage at the time of the peeling is low.

另一方面,在黏結劑層中均勻混合有防靜電劑的比較例1的表面保護膜,將表面保護膜從被黏附體上剝離時的剝離靜電壓低,為良好,但在保存30天後,對被黏附體的污染性發生經時惡化。此外,在黏結劑層的表面未設防靜電劑層的比較例2的表面保護膜,將表面保護膜從被黏附體上剝離時的剝離靜電壓變高。更進一步,增加了防靜電劑層的厚度的比較例3,將表面保護膜從被黏附體上剝離時的剝離靜電壓低,為良好,但剝離後的對被黏附體的污染增加。 On the other hand, the surface protection film of Comparative Example 1 in which the antistatic agent was uniformly mixed in the adhesive layer had a low peeling static voltage when the surface protection film was peeled from the adherend, but it was good, but after 30 days of storage, The contamination of adherends deteriorates over time. In addition, the surface protection film of Comparative Example 2 in which the antistatic agent layer was not provided on the surface of the adhesive layer had a high peeling static voltage when the surface protection film was peeled from the adherend. Furthermore, in Comparative Example 3 in which the thickness of the antistatic agent layer was increased, the peeling static voltage when the surface protective film was peeled from the adherend was low and good, but the contamination of the adherend after peeling increased.

工業實用性Industrial applicability

本發明的防靜電表面保護膜能夠用於在例如偏光板、相位差板、顯示器用透鏡膜等光學用膜、以及其他各種光學元件等的生產步驟等中,保護該光學元件等的表面。特別是在用作表面用矽氧樹脂化合物或氟化合物等進行了防污染處理的LR偏光板或AG-LR偏光板等光學用膜的防靜電表面保護膜來使用的情況下,在從被黏附體上剝離時,能夠減少靜電的產生量。 The antistatic surface protection film of the present invention can be used to protect the surface of an optical element or the like in an optical film such as a polarizing plate, a retardation plate, a lens film for a display, or other various optical elements. In particular, when it is used as an antistatic surface protective film for an optical film such as an LR polarizer or an AG-LR polarizer that has been subjected to antifouling treatment with a silicone resin compound or a fluorine compound on the surface, When the body is peeled off, the amount of static electricity generated can be reduced.

本發明的防靜電表面保護膜對被黏附體的污染少,更進一步,不會經時劣化而具有優異的剝離防靜電性能。因此,本發明的防靜電表面保護膜能提高各種光學元件等的生產步驟的成品率,在工業上的利用價值大。 The antistatic surface protective film of the present invention has less contamination to the adherend, and further, it does not deteriorate over time, and has excellent peeling antistatic performance. Therefore, the antistatic surface protection film of the present invention can improve the yield of production steps of various optical elements and the like, and has great industrial application value.

Claims (2)

一種防靜電表面保護膜,其特徵在於,其為在由具有透明性的樹脂形成的一基材膜的一個面上,依次層疊一不含防靜電劑的黏結劑層、一防靜電劑層、一剝離膜的防靜電表面保護膜,該不含防靜電劑的黏結劑層是使用丙烯酸類黏結劑組合物而形成的,該防靜電劑層是形成在該黏結劑層的整個表面上,該防靜電劑層的厚度為0.01~0.3μm,以將該剝離膜從該防靜電表面保護膜剝下時的操作性優異之方式而對該剝離膜之樹脂膜的一側以剝離劑進行處理。An antistatic surface protection film, characterized in that it is a layer of an antistatic agent-free adhesive layer, an antistatic agent layer, and An antistatic surface protective film of a release film. The antistatic agent-free adhesive layer is formed using an acrylic adhesive composition. The antistatic layer is formed on the entire surface of the adhesive layer. The thickness of the antistatic agent layer is 0.01 to 0.3 μm, and one side of the resin film of the release film is treated with a release agent so that the release film has excellent operability when peeled from the antistatic surface protection film. 如申請專利範圍第1項所述之防靜電表面保護膜,其特徵在於,該防靜電劑層含有選自由鹼金屬鹽、離子化合物所構成的群組中的一種。The antistatic surface protection film according to item 1 of the scope of the patent application, wherein the antistatic agent layer contains one selected from the group consisting of an alkali metal salt and an ionic compound.
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