TWI668710B - Method for forming electric conductor and electric conductor - Google Patents

Method for forming electric conductor and electric conductor Download PDF

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Publication number
TWI668710B
TWI668710B TW104131227A TW104131227A TWI668710B TW I668710 B TWI668710 B TW I668710B TW 104131227 A TW104131227 A TW 104131227A TW 104131227 A TW104131227 A TW 104131227A TW I668710 B TWI668710 B TW I668710B
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support
curved surface
conductive film
surface portion
thickness
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TW104131227A
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TW201618125A (en
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宮本治彦
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日商富士軟片股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C53/00Shaping by bending, folding, twisting, straightening or flattening; Apparatus therefor
    • B29C53/02Bending or folding
    • B29C53/04Bending or folding of plates or sheets
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K9/00Screening of apparatus or components against electric or magnetic fields

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Mechanical Engineering (AREA)
  • Laminated Bodies (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

本發明提供一種即使形成曲率半徑較小的曲面部,亦可 防止支撐體與導電膜之間的剝離之導電體的成形方法及導電體。藉由加熱器而僅加熱層疊體的成為曲面部之部分,並且一邊對層疊體施加拉伸力,一邊以支撐體成為外側且導電膜成為內側之方式對層疊體實施彎曲加工,從而製作曲面部,在將導電膜的厚度設為B1、黏合劑的厚度設為C1、曲面部中之導電膜的內側面的曲率半徑設為R之情況下,將曲面部中之支撐體的厚度A2相對於平面部中之支撐體的厚度A1之比A2/A1設為最小值(R+B1/2)/((R+B1+C1+A2/2)×1.45)以上且最大值(R+B1/2)/((R+B1+C1+A2/2)×0.9)以下。 The present invention provides that even if a curved surface portion having a small radius of curvature is formed, A method of forming a conductor and a conductor for preventing peeling between the support and the conductive film. The surface of the laminated body which is the curved surface portion is heated by the heater, and the laminated body is bent to apply the tensile force to the laminated body, and the laminated body is bent to form the curved surface portion. When the thickness of the conductive film is B1, the thickness of the adhesive is C1, and the radius of curvature of the inner side surface of the conductive film in the curved portion is R, the thickness A2 of the support in the curved portion is relative to The ratio A2/A1 of the thickness A1 of the support in the flat portion is set to a minimum value (R+B1/2)/((R+B1+C1+A2/2)×1.45) or more and a maximum value (R+B1/ 2) / ((R + B1 + C1 + A2 / 2) × 0.9) or less.

Description

導電體的成形方法及導電體 Method for forming electric conductor and electric conductor

本發明係有關一種導電體的成形方法,尤其係有關一種用於獲得三維形狀的導電體的成形方法。 The present invention relates to a method of forming an electrical conductor, and more particularly to a method of forming an electrical conductor for obtaining a three-dimensional shape.

並且,本發明亦係有關一種三維形狀的導電體。 Moreover, the present invention is also directed to an electrical conductor of a three-dimensional shape.

近年來,以行動資訊設備為首之各種電子設備中正在推進觸控面板的普及,該觸控面板與液晶顯示裝置等顯示裝置進行組合而被使用,並藉由接觸於畫面而進行對電子設備的輸入操作。 In recent years, the popularity of touch panels is being promoted in various electronic devices including mobile information devices. The touch panels are used in combination with display devices such as liquid crystal display devices, and are used for electronic devices by contacting the screens. Enter the action.

並且,在追求提高電子設備的攜帶性及操作性之過程中,即使在觸控面板中亦要求薄型且可應對三維形狀者,正在推進在可撓性透明的絕緣基板上形成有檢測電極之導電膜的開發。 In addition, in the process of pursuing the improvement of the portability and operability of the electronic device, even if it is required to be thin and can cope with a three-dimensional shape in the touch panel, the conduction of the detecting electrode on the flexible and transparent insulating substrate is being promoted. Development of membranes.

在製造該種三維形狀的觸控面板時,有在將導電膜和支撐體一同變形為三維形狀之後,使它們彼此貼合之方法,但是因導電膜和支撐體的變形形狀的誤差和貼合時的位置偏離而難以獲得高品質的觸控面板,並且導致製造變得複雜。 When the touch panel of the three-dimensional shape is manufactured, there is a method in which the conductive film and the support are deformed together into a three-dimensional shape, and they are attached to each other, but the deformation and fit of the deformed shape of the conductive film and the support are obtained. When the position is deviated, it is difficult to obtain a high-quality touch panel, and the manufacturing becomes complicated.

並且,亦有將導電膜設置於模具內,並進行射出成形而形成支撐體,藉此製造三維形狀的觸控面板的方法,但是在射出成形中存在難以較薄地形成支撐體之問題。 In addition, there is a method in which a conductive film is placed in a mold and a support is formed by injection molding to form a three-dimensional touch panel. However, in the injection molding, there is a problem that it is difficult to form a support thinly.

於是,例如在專利文獻1中研究了如下方法,亦即在將 導電膜黏合於平板狀的支撐體之後,將導電膜和支撐體統一成形為三維形狀的導電體之方法,但是已知在成形應變較大的部分,尤其在高溫高濕環境下,因黏合劑熔融而黏合力降低,導電膜從支撐體剝離。 Thus, for example, in Patent Document 1, the following method is studied, that is, After the conductive film is bonded to the flat support, the conductive film and the support are uniformly formed into a three-dimensional electric conductor, but it is known that the adhesive is large in a portion where the strain is large, especially in a high-temperature and high-humidity environment. When melted and the adhesive force is lowered, the conductive film is peeled off from the support.

並且,除了觸控面板以外,針對具有三維形狀之發熱體、從雜訊保護電子設備之三維形狀的電磁屏蔽件等,同樣地,在將導電膜和支撐體統一地成形為三維形狀之情況下,有可能導電膜從支撐體剝離,在專利文獻2中提出有在從兩面輻射加熱層疊體而進行彎曲加工時,藉由選擇彎曲加工部的加熱寬度而使翹曲及剝離不易產生之導電體的製造方法,前述層疊體在成為電磁屏蔽層之導電膜的單側或兩側黏合有由聚碳酸酯構成之支撐體。 In addition, in the case of a heat-generating body having a three-dimensional shape, an electromagnetic shield having a three-dimensional shape from a noise-protecting electronic device, and the like, in the same manner, in the case where the conductive film and the support are uniformly formed into a three-dimensional shape, In the case of the conductive film, the conductive film may be peeled off from the support. In the case of the bending process, when the laminate is heated and irradiated from both surfaces, the conductor having a heating width of the bent portion is selected so that the warpage and the peeling are less likely to occur. In the production method, the laminate has a support made of polycarbonate adhered to one side or both sides of the conductive film serving as the electromagnetic shielding layer.

【先前技術文獻】 [Previous Technical Literature]

【專利文獻】 [Patent Literature]

【專利文獻1】 日本專利公開2013-257796號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2013-257796

【專利文獻2】 日本專利公開2010-272661號公報 Patent Document 2 Japanese Patent Laid-Open Publication No. 2010-272661

然而,若彎曲加工部的曲率半徑較小,則如第7圖所示,彎曲加工部11中之沿層疊體12的內側面之長度和沿外側面之長度之差較大,因此僅選擇根據加熱器13之加熱寬度,則存在導電膜14與支撐體15之間容易產生剝離之問題。例如因位於彎曲加工部11的內側之導電膜14過剩而使壓縮力發揮作用,導致導電 膜14壓曲而引起前述剝離。 However, if the radius of curvature of the bent portion is small, as shown in Fig. 7, the difference between the length of the inner side surface of the laminated body 12 and the length along the outer side surface in the bent portion 11 is large, so only the selection is based on The heating width of the heater 13 causes a problem that peeling easily occurs between the conductive film 14 and the support 15. For example, since the conductive film 14 located inside the bent portion 11 is excessive, the compressive force acts to cause conduction. The film 14 is buckling to cause the aforementioned peeling.

本發明係為了解決該種以往的問題而完成者,其目的在於提供一種即使形成曲率半徑較小的曲面部,亦可防止支撐體與導電膜之間的剝離之導電體的成形方法。 The present invention has been made to solve such conventional problems, and an object of the invention is to provide a method of forming a conductor which can prevent peeling between a support and a conductive film even if a curved surface portion having a small radius of curvature is formed.

並且,本發明的目的在於還提供一種支撐體與導電膜不剝離之三維形狀的導電體。 Further, an object of the present invention is to provide a three-dimensional electric conductor in which a support body and a conductive film are not peeled off.

本發明之導電體的成形方法為,在層疊體上形成曲面部,從而成形具有平面部和曲面部之三維形狀的導電體之導電體的成形方法,前述層疊體在具有平板形狀之絕緣性支撐體的表面上經由黏合劑而接合有具有金屬網之導電膜,其中,在成形加工時,僅加熱層疊體的成為曲面部之部分,並一邊至少對成為曲面部之部分施加拉伸力,一邊以支撐體成為外側且導電膜成為內側之方式對層疊體實施彎曲加工,從而製作曲面部,在將平面部中之支撐體的厚度設為A1、導電膜的厚度為B1、黏合劑的厚度設為C1、所製作之曲面部中之支撐體的厚度設為A2、曲面部內表面的曲率半徑設為R之情況下,A2/A1為(R+B1/2)/((R+B1+C1+A2/2)×1.45)以上且(R+B1/2)/((R+B1+C1+A2/2)×0.9)以下。 In the method for molding a conductor according to the present invention, a method of forming a conductor having a three-dimensional shape of a flat portion and a curved portion is formed by forming a curved surface portion on the laminated body, and the laminated body has an insulating support having a flat plate shape. On the surface of the body, a conductive film having a metal mesh is bonded to the surface of the body, and at the time of the molding process, only the portion of the laminate that is the curved surface portion is heated, and at least the portion that becomes the curved portion is subjected to a tensile force. The laminate is subjected to bending processing so that the support is outside and the conductive film is inside, and the curved portion is formed. The thickness of the support in the flat portion is A1, the thickness of the conductive film is B1, and the thickness of the adhesive is set. In the case where the thickness of the support in the curved surface portion produced by C1 is A2, and the radius of curvature of the inner surface of the curved surface portion is R, A2/A1 is (R+B1/2)/((R+B1+C1) +A2/2)×1.45) or more and (R+B1/2)/((R+B1+C1+A2/2)×0.9) or less.

在將曲面部的彎曲角度設為X°之情況下,以曲面部中之層疊體的伸長量E成為π×(A2+B1+2‧C1)×(X/360)×0.9以上且π×(A2+B1+2‧C1)×(X/360)×1.45以下 When the bending angle of the curved surface portion is X°, the elongation E of the laminate in the curved surface portion is π × (A 2 + B1 + 2‧ C1) × (X / 360) × 0.9 or more and π × (A2+B1+2‧C1)×(X/360)×1.45 or less

之方式,一邊對層疊體施加拉伸力,一邊對層疊體實施彎曲加工,從而製作曲面部為較佳。 In this manner, it is preferable to apply a bending force to the laminated body while performing a bending process on the laminated body to form a curved surface portion.

並且,在層疊體的成為曲面部之部分加熱成比支撐體的玻璃化轉變溫度高的溫度,並且成為平面部之部分維持比支撐體的玻璃化轉變溫度低的溫度之狀態下,對層疊體實施彎曲加工,從而製作曲面部為較佳。 In the state in which the portion of the laminate which is the curved surface portion is heated to a temperature higher than the glass transition temperature of the support, and the portion of the flat portion is maintained at a temperature lower than the glass transition temperature of the support, the laminate is laminated. It is preferable to carry out bending processing to produce a curved surface portion.

能夠從支撐體側對層疊體的成為曲面部之部分進行加熱。 The portion of the laminate which is the curved surface portion can be heated from the support side.

並且,也能夠一邊僅對在層疊體中的支撐體施加拉伸力,一邊對層疊體實施彎曲加工,從而製作曲面部。 Further, it is also possible to form a curved surface portion by performing a bending process on the laminate only by applying a tensile force to the support in the laminate.

支撐體由絕緣性透明的樹脂構成,導電膜為在具有可撓性之絕緣基板的表面上配置有金屬網之透明導電膜,黏合劑能夠使用透明的層疊體。 The support is made of an insulating transparent resin, and the conductive film is a transparent conductive film in which a metal mesh is placed on the surface of the flexible insulating substrate, and a transparent laminate can be used as the adhesive.

導電體能夠用作觸控面板、電磁波屏蔽體或發熱體。 The conductor can be used as a touch panel, an electromagnetic wave shield, or a heat generating body.

本發明之導電體為在絕緣性支撐體的表面上經由黏合劑而接合有具有金屬網之導電膜之三維形狀的導電體,其中,前述導電體具有平面部和曲面部,在將平面部中之支撐體的厚度設為A1、導電膜的厚度設為B1、黏合劑的厚度設為C1、曲面部中之支撐體的厚度為A2、曲面部內面的曲率半徑為R之情況下,A2/A1為(R+B1/2)/((R+B1+C1+A2/2)×1.45)以上且(R+B1/2)/((R+B1+C1+A2/2)×0.9)以下。 The conductor of the present invention is a conductor having a three-dimensional shape in which a conductive film having a metal mesh is bonded to a surface of an insulating support via an adhesive, wherein the conductor has a flat portion and a curved portion, and in the planar portion When the thickness of the support is A1, the thickness of the conductive film is B1, the thickness of the adhesive is C1, the thickness of the support in the curved portion is A2, and the radius of curvature of the inner surface of the curved portion is R, A2/ A1 is (R+B1/2)/((R+B1+C1+A2/2)×1.45) or more and (R+B1/2)/((R+B1+C1+A2/2)×0.9) the following.

支撐體由絕緣性透明的樹脂構成,導電膜為在具有可撓性之絕緣基板的表面上配置有金屬網之透明導電膜,黏合劑能夠構成為是透明者。 The support is made of an insulating transparent resin, and the conductive film is a transparent conductive film in which a metal mesh is disposed on the surface of the flexible insulating substrate, and the adhesive can be configured to be transparent.

導電體能夠用作觸控面板、電磁波屏蔽體或發熱體。 The conductor can be used as a touch panel, an electromagnetic wave shield, or a heat generating body.

依本發明,在成形加工時僅對層疊體的成為曲面部之部分進行加熱,並且一邊至少對成為曲面部之部分施加拉伸力,一邊以支撐體成為外側且導電膜成為內側之方式對層疊體實施彎曲加工,從而製作曲面部,因此,即使形成曲率半徑較小的曲面部,亦能夠防止支撐體與導電膜之間的剝離。 According to the present invention, only the portion which is the curved surface portion of the laminate is heated during the forming process, and the tensile force is applied to at least the portion which becomes the curved surface portion, and the support is placed outside and the conductive film is inside. Since the curved portion is formed by the bending process, the curved portion is formed. Therefore, even if a curved portion having a small radius of curvature is formed, peeling between the support and the conductive film can be prevented.

1‧‧‧層疊體 1‧‧‧ laminated body

2‧‧‧支撐體 2‧‧‧Support

3‧‧‧導電膜 3‧‧‧Electrical film

4‧‧‧黏合劑 4‧‧‧Binder

5‧‧‧加熱器 5‧‧‧heater

6‧‧‧曲面部 6‧‧‧Surface

7‧‧‧觸控面板 7‧‧‧Touch panel

11‧‧‧彎曲加工部 11‧‧‧Bending processing department

12‧‧‧層疊體 12‧‧‧Laminated body

13‧‧‧加熱器 13‧‧‧heater

14‧‧‧導電膜 14‧‧‧Electrical film

15‧‧‧支撐體 15‧‧‧Support

31‧‧‧絕緣基板 31‧‧‧Insert substrate

32‧‧‧導電構件 32‧‧‧Electrical components

33‧‧‧保護層 33‧‧‧Protective layer

34‧‧‧第1檢測電極 34‧‧‧1st detection electrode

34a、36a‧‧‧金屬細線 34a, 36a‧‧‧Metal thin wires

35‧‧‧第1周邊配線 35‧‧‧1st perimeter wiring

36‧‧‧第2檢測電極 36‧‧‧2nd detection electrode

37‧‧‧第2周邊配線 37‧‧‧2nd perimeter wiring

S1‧‧‧感測區域 S1‧‧‧Sensing area

S2‧‧‧周邊區域 Surrounding area of S2‧‧

D1‧‧‧第1方向 D1‧‧‧1st direction

D2‧‧‧第2方向 D2‧‧‧2nd direction

C‧‧‧成為曲面部之部分 C‧‧‧ becomes part of the curved surface

F‧‧‧拉伸力 F‧‧‧Stretching force

P‧‧‧成為平面部之部分 P‧‧‧ became part of the plane

A1‧‧‧平面部中之支撐體的厚度 A1‧‧‧ Thickness of the support in the flat section

A2‧‧‧曲面部中之支撐體的厚度 A2‧‧‧Thickness of the support in the curved surface

B1‧‧‧導電膜的厚度 B1‧‧‧Thickness of conductive film

C1‧‧‧黏合劑的厚度 C1‧‧‧Binder thickness

X‧‧‧曲面部的彎曲角度 X‧‧‧Bending angle of curved surface

R‧‧‧曲面部中之導電膜的內側面的曲率半徑 R‧‧‧The radius of curvature of the inner side of the conductive film in the curved surface

第1圖係表示在本發明的實施形態1之導電體的成形方法中使用之層疊體之局部剖面圖。 Fig. 1 is a partial cross-sectional view showing a laminate used in a method of molding a conductor according to a first embodiment of the present invention.

第2圖係表示使用於層疊體之導電膜之平面圖。 Fig. 2 is a plan view showing a conductive film used in a laminate.

第3圖係表示導電膜的檢測電極之局部平面圖。 Fig. 3 is a partial plan view showing the detecting electrode of the electroconductive film.

第4圖係表示藉由實施形態1之導電體的成形方法而被成形加工之層疊體之局部剖面圖。 Fig. 4 is a partial cross-sectional view showing a laminate which is formed by the molding method of the conductor of the first embodiment.

第5圖係表示藉由實施形態1之導電體的成形方法而成形之導電體之立體圖。 Fig. 5 is a perspective view showing a conductor formed by the molding method of the conductor of the first embodiment.

第6圖係表示藉由實施形態2之導電體的成形方法而被成形加工之層疊體之局部剖面圖。 Fig. 6 is a partial cross-sectional view showing a laminate which is formed by the molding method of the conductor of the second embodiment.

第7圖係表示以往的導電體的成形方法中之問題之局部剖面圖。 Fig. 7 is a partial cross-sectional view showing a problem in a conventional method of forming a conductor.

本發明之導電體的成形方法能夠適用於複數個檢測電極形成於透明的支撐體的表面上之觸控面板的成形,此外,亦可適用於用於產生熱量之導電膜接合於支撐體的表面上之發熱體、用於阻斷電磁波的導電膜接合於支撐體的表面上之電磁波屏蔽體等導電體的成形。 The method for forming a conductor of the present invention can be applied to the formation of a touch panel in which a plurality of detecting electrodes are formed on the surface of a transparent support, and can also be applied to a surface of a conductive film for generating heat bonded to a support. The upper heating element, the conductive film for blocking electromagnetic waves, and the conductive body such as an electromagnetic wave shield bonded to the surface of the support are formed.

在此,以觸控面板的成形為例,對以下實施形態進行說明。 Here, the following embodiments will be described by taking a shape of a touch panel as an example.

實施形態1 Embodiment 1

第1圖中示出在實施形態1之導電體的成形方法中使用之層疊體1的構成。該層疊體1係藉由實施包括彎曲加工之三維加工而用於製造角筒形狀(箱形形狀)的觸控面板者,透明的導電膜3藉由透明的黏合劑4而接合於具有平板形狀之透明的絕緣性支撐體2的表面上。導電膜3係在可撓性的透明的絕緣基板31的兩面上個別地形成有導電構件32,且以包覆導電構件32之方式在絕緣基板31的兩面上形成有透明的保護層33者。 Fig. 1 shows the configuration of the laminated body 1 used in the method for molding a conductor according to the first embodiment. The laminated body 1 is a touch panel for manufacturing a square tube shape (box shape) by performing three-dimensional processing including bending processing, and the transparent conductive film 3 is bonded to have a flat plate shape by a transparent adhesive 4 On the surface of the transparent insulating support 2. In the conductive film 3, the conductive member 32 is formed separately on both surfaces of the flexible transparent insulating substrate 31, and a transparent protective layer 33 is formed on both surfaces of the insulating substrate 31 so as to cover the conductive member 32.

如第2圖所示,在導電膜3上劃分有感測區域S1,且在感測區域S1的外側劃分有周邊區域S2。在絕緣基板31的表面上,在感測區域S1內形成有個別地沿第1方向D1延伸且在正交於第 1方向D1之第2方向D2上並列配置之複數個第1檢測電極34,在周邊區域S2,連接於複數個第1檢測電極34上之複數個第1周邊配線35彼此靠近地排列。 As shown in FIG. 2, the sensing region S1 is divided on the conductive film 3, and the peripheral region S2 is defined outside the sensing region S1. On the surface of the insulating substrate 31, formed in the sensing region S1, individually extending along the first direction D1 and orthogonal to the first The plurality of first detecting electrodes 34 arranged side by side in the second direction D2 of the one direction D1 are arranged in the peripheral region S2 so that the plurality of first peripheral wirings 35 connected to the plurality of first detecting electrodes 34 are close to each other.

同樣地,在絕緣基板31的背面上,在感測區域S1內形成有個別地沿第2方向D2延伸且在第1方向D1上並列配置之複數個第2檢測電極36,在周邊區域S2,連接於複數個第2檢測電極36上之複數個第2周邊配線37彼此靠近地排列。 Similarly, on the back surface of the insulating substrate 31, a plurality of second detecting electrodes 36 which are individually extended in the second direction D2 and arranged in parallel in the first direction D1 are formed in the sensing region S1, and in the peripheral region S2, The plurality of second peripheral wires 37 connected to the plurality of second detecting electrodes 36 are arranged close to each other.

另外,如第3圖所示,配置於絕緣基板31的表面上之第1檢測電極34藉由由金屬細線34a構成之網格圖案而形成,配置於絕緣基板31的背面上之第2檢測電極36亦藉由由金屬細線36a構成之網格圖案而形成。 Further, as shown in FIG. 3, the first detecting electrode 34 disposed on the surface of the insulating substrate 31 is formed by a mesh pattern composed of the thin metal wires 34a, and the second detecting electrode is disposed on the back surface of the insulating substrate 31. 36 is also formed by a grid pattern composed of thin metal wires 36a.

藉由在絕緣基板31的表面上形成包括第1檢測電極34及第1周邊配線35之導電構件32,且在絕緣基板31的背面上形成包括第2檢測電極36及第2周邊配線37之導電構件32,並以包覆該些導電構件32之方式在絕緣基板31的兩面上形成透明的保護層33,從而製造該種導電膜3。 The conductive member 32 including the first detecting electrode 34 and the first peripheral wiring 35 is formed on the surface of the insulating substrate 31, and the conductive layer including the second detecting electrode 36 and the second peripheral wiring 37 is formed on the back surface of the insulating substrate 31. The member 32 is formed with a transparent protective layer 33 on both sides of the insulating substrate 31 so as to cover the conductive members 32, thereby manufacturing the conductive film 3.

該些導電構件32的形成方法並無特別的限定。例如,如在日本專利公開2012-185813號公報的<0067>~<0083>中所記載,藉由對具有含有感光性鹵化銀鹽之乳劑層之感光材料進行曝光,並實施顯影處理,從而能夠形成導電構件36。 The method of forming the conductive members 32 is not particularly limited. For example, as described in <0067> to <0083> of Japanese Patent Laid-Open Publication No. 2012-185813, it is possible to expose a photosensitive material having an emulsion layer containing a photosensitive silver halide salt and perform development processing. A conductive member 36 is formed.

並且,在絕緣基板31的表面及背面個別地形成金屬箔,在各金屬箔上將抗蝕劑以圖案狀進行印刷,或者對整個面塗佈之 抗蝕劑進行曝光,並藉由顯影而進行圖案化,從而對開口部的金屬進行蝕刻,由此亦能夠形成該些導電構件32。另外,作為其他方法,能夠利用如下方法:將包含構成導電構件32之材料的微粒之漿料,在絕緣基板31的表面及背面進行印刷,從而對漿料實施金屬電鍍之方法;利用使用油墨之噴墨法之方法,前述油墨包含構成導電構件32之材料的微粒;藉由絲網印刷而形成油墨之方法,前述油墨包含構成導電構件32之材料的微粒;在絕緣基板31形成槽,且在其槽塗佈導電油墨之方法;及微接觸印刷圖案化方法等。 Further, a metal foil is individually formed on the front surface and the back surface of the insulating substrate 31, and the resist is printed on the metal foil in a pattern or coated on the entire surface. The resist is exposed and patterned by development to etch the metal of the opening, whereby the conductive members 32 can be formed. Further, as another method, a method in which a slurry containing fine particles of a material constituting the conductive member 32 is printed on the front and back surfaces of the insulating substrate 31 to perform metal plating on the slurry, and a method of using the ink can be used. In the inkjet method, the ink includes fine particles constituting a material of the conductive member 32; a method of forming an ink by screen printing, the ink includes fine particles constituting a material of the conductive member 32; a groove is formed in the insulating substrate 31, and A method in which a groove is coated with a conductive ink; and a method of microcontact printing patterning.

在此,作為一例,關於對具有含有感光性鹵化銀鹽之乳劑層之感光材料進行曝光,並藉由實施顯影處理而製作觸控面板用導電膜之方法進行說明。 Here, as an example, a method of exposing a photosensitive material having an emulsion layer containing a photosensitive silver halide salt to a conductive film for a touch panel by performing development processing will be described.

(鹵化銀乳劑的製備) (Preparation of silver halide emulsion)

在保持38℃、pH4.5之下述1溶液中,一邊攪拌下述2溶液及3溶液的各相當於90%之量,一邊同時經20分鐘進行添加,形成0.16μm的核粒子。接著,經8分鐘添加下述4溶液及5溶液,另外,下述2溶液及3溶液的剩餘的10%的量經2分鐘進行添加,使得成長至0.21μm。另外,添加碘化鉀0.15g,熟化5分鐘,並結束了粒子形成。 In the following 1 solution which was maintained at 38 ° C and pH 4.5, the following 2 solutions and 3 solutions were each stirred in an amount of 90%, and added simultaneously for 20 minutes to form core particles of 0.16 μm. Next, the following 4 solutions and 5 solutions were added over 8 minutes, and the remaining 10% of the following 2 solutions and 3 solutions were added over 2 minutes to grow to 0.21 μm. Further, 0.15 g of potassium iodide was added, and the mixture was aged for 5 minutes to complete the formation of particles.

1溶液: 1 solution:

水 750ml Water 750ml

2溶液: 2 solution:

3溶液: 3 solution:

4溶液: 4 solution:

5溶液: 5 solution:

然後,按照常規方法,並藉由絮凝法而進行了水洗。具體而言,將溫度降到35℃,並使用硫酸降低pH(pH為3.6±0.2的範圍)至鹵化銀沉降。其次,去除了約3升上清液(第一水洗)。另外,在添加3升的蒸餾水之後,添加硫酸至鹵化銀沉降。再次去除了3升上清液(第二水洗)。進而重複進行1次與第二水洗相同的操作(第三水洗),結束了水洗及脫鹽製程。將水洗及脫鹽後的乳劑調整為pH6.4、pAg7.5,並添加明膠3.9g、苯硫代磺酸鈉10mg、苯硫代亞磺酸鈉3mg、硫代硫酸鈉15mg和氯金酸10mg,在55℃下,以獲得最佳靈敏度之方式實施化學增感,作為穩定劑添加1,3,3a,7-四氮茚100mg、作為防腐劑添加了PROXEL(商品名稱,ICI Co.,Ltd.製造)100mg。最終獲得之乳劑為包含碘化銀0.08莫耳%,氯溴化銀的比率為氯化銀70莫耳%、溴化銀30莫耳%、平均粒徑0.22μm、變異系數9%的碘氯溴化銀立方體顆粒乳劑。 Then, water washing was carried out by a conventional method and by a flocculation method. Specifically, the temperature was lowered to 35 ° C, and the pH was lowered using sulfuric acid (pH 3.6 ± 0.2 range) to settle silver halide. Next, about 3 liters of supernatant (first water wash) was removed. Further, after adding 3 liters of distilled water, sulfuric acid was added to settle the silver halide. Three liters of supernatant (second water wash) was removed again. Further, the same operation as the second water washing (third water washing) was repeated once, and the water washing and desalination process was completed. The washed and desalted emulsion was adjusted to pH 6.4, pAg7.5, and gelatin 3.9 g, sodium phenylthiosulfonate 10 mg, sodium phenylthiosulfinate 3 mg, sodium thiosulfate 15 mg, and chloroauric acid 10 mg were added. Chemical sensitization was carried out at 55 ° C for optimum sensitivity, and 1,3,3a,7-tetrazine 100 mg was added as a stabilizer, and PROXEL (trade name, ICI Co., Ltd.) was added as a preservative. Made) 100mg. The finally obtained emulsion is iochlorobromide containing 0.08 mol% of silver iodide, silver chlorobromide ratio of 70 mol% of silver chloride, 30 mol% of silver bromide, average particle diameter of 0.22 μm and coefficient of variation of 9%. Silver cube granule emulsion.

(感光性層形成用組合物的製備) (Preparation of Composition for Photosensitive Layer Formation)

在上述乳劑中添加1,3,3a,7-四氮茚1.2×10-4莫耳/莫耳Ag、對苯二酚1.2×10-2莫耳/莫耳Ag、檸檬酸3.0×10-4莫耳/莫耳Ag、2,4-二氯-6-羥基-1,3,5-三嗪鈉鹽0.90g/莫耳Ag,並使用檸檬酸將塗佈液pH調整為5.6,從而獲得感光性層形成用組合物。 Adding 1,3,3a,7-tetrazinium 1.2×10 -4 mol/mol Ag to the above emulsion, hydroquinone 1.2×10 -2 mol/mol Ag, citric acid 3.0×10 - 4 mol/mol Ag, 2,4-dichloro-6-hydroxy-1,3,5-triazine sodium salt 0.90 g/mol Ag, and the pH of the coating liquid was adjusted to 5.6 using citric acid, thereby A composition for forming a photosensitive layer was obtained.

(感光性層形成製程) (Photosensitive layer forming process)

對絕緣基板實施電暈放電處理之後,在絕緣基板的兩面設置了作為下塗層之厚度為0.1μm的明膠層,進而在下塗層上設置了光學濃度約為1.0且包含藉由顯影液的鹼性而脫色之染料之防光暈層。在上述防光暈層上塗佈上述感光性層形成用組合物,進而設置厚度為0.15μm的明膠層,獲得了兩面形成有感光性層之絕緣基板。將兩面形成有感光性層之絕緣基板設為薄膜A。所形成之感光性層中銀量為6.0g/m2、明膠量為1.0g/m2After the corona discharge treatment is performed on the insulating substrate, a gelatin layer having a thickness of 0.1 μm as an undercoat layer is provided on both surfaces of the insulating substrate, and an optical density of about 1.0 is provided on the undercoat layer and is contained by the developer. An antihalation layer of an alkaline, decolorized dye. The photosensitive layer-forming composition was applied onto the antihalation layer, and a gelatin layer having a thickness of 0.15 μm was further provided to obtain an insulating substrate having a photosensitive layer formed on both surfaces thereof. The insulating substrate on which the photosensitive layer is formed on both sides is referred to as a film A. The amount of silver in the photosensitive layer formed was 6.0 g/m 2 and the amount of gelatin was 1.0 g/m 2 .

(曝光顯影製程) (exposure development process)

在上述薄膜A的兩面,經由對應於導電構件36的圖案之光罩,並使用將高壓水銀燈作為光源之平行光進行了曝光。在曝光之後,藉由下述顯影液進行顯影,進而使用定影液(商品名稱:CN16X用N3X-R、FUJI FILM CO.,LTD.製造)進行了顯影處理。另外,藉由純淨水進行沖洗並乾燥,從而獲得了兩面形成有由Ag線構成之導電構件36和明膠層之絕緣基板。明膠層形成於Ag線之間。將所獲得之薄膜設為薄膜B。 On both sides of the above-mentioned film A, exposure was performed via a photomask corresponding to the pattern of the conductive member 36, and parallel light using a high-pressure mercury lamp as a light source. After the exposure, development was carried out by the following developer, and development treatment was carried out using a fixing solution (trade name: N3X-R for CN16X, manufactured by FUJI FILM CO., LTD.). Further, by rinsing with pure water and drying, an insulating substrate having conductive members 36 and a gelatin layer composed of Ag wires on both sides was obtained. The gelatin layer is formed between the Ag lines. The obtained film was designated as film B.

(顯影液的組成) (composition of developer)

在顯影液1升(L)中包含以下化合物。 The following compound was contained in 1 liter (L) of the developer.

(加熱製程) (heating process)

針對上述薄膜B,在120℃的過熱蒸氣槽中靜放130秒鐘而進行了加熱處理。將加熱處理後的薄膜設為薄膜C。 The film B was subjected to heat treatment by standing in a superheated steam bath at 120 ° C for 130 seconds. The heat-treated film was designated as film C.

(明膠分解處理) (gelatin decomposition treatment)

針對薄膜C,在蛋白質分解酶(NAGASE CHEMTEX CORPORATION製造Bioplase AL-15FG)的水溶液(蛋白質分解酶的濃度:0.5質量%、液溫:40℃)中浸漬120秒鐘。從水溶液取出薄膜C,並在溫水(液溫:50℃)中浸漬120秒鐘並進行了清洗。將明膠分解處理後的薄膜設為薄膜D。該薄膜D為觸控面板用導電膜。 The film C was immersed in an aqueous solution (concentration of a proteolytic enzyme: 0.5% by mass, liquid temperature: 40 ° C) of a proteolytic enzyme (Biopase AL-15FG manufactured by NAGASE CHEMTEX CORPORATION) for 120 seconds. The film C was taken out from the aqueous solution, and immersed in warm water (liquid temperature: 50 ° C) for 120 seconds and washed. The film after the gelatin decomposition treatment was used as the film D. This film D is a conductive film for a touch panel.

將如此製造之導電膜3使用透明的黏合劑4來接合於支撐體2的表面上,藉此製作觸控面板用層疊體1。 The conductive film 3 thus produced is bonded to the surface of the support 2 using a transparent adhesive 4, whereby a laminated body 1 for a touch panel is produced.

作為支撐體2的形成材料,能夠使用聚碳酸酯(PC)、環烯烴聚合物(COP)、丙烯酸樹脂等。 As a material for forming the support 2, polycarbonate (PC), cycloolefin polymer (COP), acrylic resin, or the like can be used.

接著,關於對層疊體1實施彎曲加工而製作曲面部之方法進行說明。 Next, a method of forming a curved surface portion by bending the laminated body 1 will be described.

首先,將層疊體1設置於未圖示的加工機上,並夾緊層疊體1的兩端。另外,作為加工機而使用通用的加工機,該通用的加工機對所保持之層疊體1進行局部加熱,並且一邊對層疊體1施加拉伸力,一邊對層疊體1實施彎曲加工,從而能夠成形為三 維形狀。 First, the laminated body 1 is placed on a processing machine (not shown), and both ends of the laminated body 1 are clamped. In addition, as a processing machine, a general-purpose processing machine is used, and the laminated body 1 is locally heated, and the laminated body 1 is subjected to bending processing while applying a tensile force to the laminated body 1. Formed into three Dimensional shape.

在此,所謂彎曲加工是例如將平板形狀的層疊體1彎曲變形為規定角度之作業,在層疊體1變形為具有規定的中心之圓弧狀之情況下,將描繪圓弧之層疊體1的部分稱作曲面部,將從規定的中心至層疊體1的距離稱作曲率半徑,將對應於曲面部之圓周角稱作彎曲角度,不會變形為圓弧狀而維持平板形狀之層疊體1的部分稱作平面部。 Here, the bending process is, for example, an operation of bending and deforming the flat-plate-shaped laminated body 1 to a predetermined angle, and when the laminated body 1 is deformed into an arc shape having a predetermined center, the laminated body 1 of the circular arc is drawn. The surface is referred to as a curved surface portion, and the distance from the predetermined center to the laminated body 1 is referred to as a radius of curvature, and the circumferential angle corresponding to the curved surface portion is referred to as a bending angle, and the laminated body 1 having a flat plate shape is not deformed into an arc shape. Part is called a plane.

接著,如第4圖所示,藉由加工而在層疊體1的成為曲面部之部分C的附近且與層疊體1的導電膜3對置之位置,配置成為發熱體之加熱器5而僅對成為曲面部之部分C進行加熱,該狀態下,一邊對至少包含成為曲面部之部分C之層疊體1施加拉伸力F,一邊以支撐體2成為外側且導電膜3成為內側之方式對層疊體1實施彎曲加工,從而製作曲面部6。 Then, as shown in Fig. 4, the heater 5 serving as a heating element is disposed at a position facing the conductive film 3 of the laminated body 1 in the vicinity of the portion C of the laminated body 1 which is the curved surface portion by processing. The part C which is the curved surface portion is heated, and in this state, the tensile force F is applied to the laminated body 1 including at least the portion C which is the curved surface portion, and the support 2 is placed outside and the conductive film 3 is inside. The laminated body 1 is subjected to bending processing to produce the curved surface portion 6.

另外,從加熱器5產生之熱量並不僅限於涉及到成為曲面部之部分C,亦涉及到成為平面部之部分P不少熱量,在此,僅對成為曲面部之部分C進行加熱係,成為曲面部之部分C被加熱為比構成支撐體2之材料的玻璃化轉變溫度高的溫度,且成為平面部P之部分維持比構成支撐體2之材料的玻璃化轉變溫度低的溫度之狀態。 In addition, the amount of heat generated from the heater 5 is not limited to the part C which is the curved surface portion, and the heat of the portion C which becomes the curved portion is heated. The portion C of the curved surface portion is heated to a temperature higher than the glass transition temperature of the material constituting the support 2, and the portion of the flat portion P is maintained at a temperature lower than the glass transition temperature of the material constituting the support 2.

例如在使用聚碳酸酯作為支撐體2的形成材料之情況下,由於聚碳酸酯的玻璃化轉變溫度約為150℃,因此將成為曲面部之部分C加熱至溫度160℃左右為較佳。 For example, when polycarbonate is used as the material for forming the support 2, since the glass transition temperature of the polycarbonate is about 150 ° C, it is preferable to heat the portion C which becomes the curved surface portion to a temperature of about 160 °C.

該情況下,導電膜3的絕緣基板31例如由具有260℃以上的熔融溫度之雙軸拉伸聚對苯二甲酸乙酯(PET)等高熔點材料形成為較佳。 In this case, the insulating substrate 31 of the conductive film 3 is preferably formed of a high melting point material such as biaxially stretched polyethylene terephthalate (PET) having a melting temperature of 260 ° C or higher.

並且黏合支撐體2和導電膜3之黏合劑4可以係,藉由加熱成為曲面部之部分C時的溫度而熔融,從而黏合力降低者,例如能夠使用3M公司製造之光學用透明黏合片(OCA)。 Further, the adhesive 4 for bonding the support 2 and the conductive film 3 can be melted by heating at a temperature at which the portion C of the curved portion is heated, and the adhesive force can be lowered. For example, an optical transparent adhesive sheet manufactured by 3M can be used. OCA).

並且,在設為實施彎曲加工之前的平板形狀的層疊體1中之支撐體2的厚度為A1、導電膜3的厚度為B1、黏合劑4的厚度為C1、藉由彎曲加工而製作之曲面部6的彎曲角度為X°之情況下,以曲面部6中之層疊體1的伸長量E為最小值Emin=π×(A2+B1+2.C1)×(X/360)×0.9以上且最大值Emax=π×(A2+B1+2.C1)×(X/360)×1.45以下 Further, the thickness of the support 2 in the flat plate-shaped laminate 1 before the bending process is A1, the thickness of the conductive film 3 is B1, the thickness of the adhesive 4 is C1, and the curved surface is formed by bending. When the bending angle of the portion 6 is X°, the elongation E of the laminated body 1 in the curved surface portion 6 is the minimum value Emin=π×(A2+B1+2.C1)×(X/360)×0.9 or more. And the maximum value Emax=π×(A2+B1+2.C1)×(X/360)×1.45 or less

之方式,一邊對層疊體1施加拉伸力,一邊對層疊體1實施彎曲加工,從而製作曲面部6為較佳。 In the embodiment, the laminate 1 is subjected to a bending process while applying a tensile force to the laminate 1, and the curved portion 6 is preferably formed.

在此,在最小值Emin及最大值Emax的各式中所記載之量π×(A2+B1+2.C1)×(X/360)表示將曲面部6的彎曲角度設為X°時的、沿支撐體2的厚度方向的中央部分的圓弧之長度與沿導電膜3的厚度方向的中央部分的圓弧之長度之間的差分。 Here, the amount π×(A2+B1+2.C1)×(X/360) described in each of the minimum value Emin and the maximum value Emax represents when the bending angle of the curved surface portion 6 is X°. The difference between the length of the arc along the central portion in the thickness direction of the support 2 and the length of the arc along the central portion in the thickness direction of the conductive film 3.

若曲面部6中的層疊體1的伸長量E小於最小值Emin,則位於曲面部6的內側之導電膜3比位於曲面部6的外側之支撐體2過剩,壓縮力作用於導電膜3,黏合劑4藉由加熱而黏合力降低,因此有可能導致產生導電膜3從支撐體2剝離。 When the elongation E of the laminated body 1 in the curved surface portion 6 is smaller than the minimum value Emin, the conductive film 3 located inside the curved surface portion 6 is excessively larger than the support 2 located outside the curved surface portion 6, and a compressive force acts on the conductive film 3, The adhesive 4 is lowered in adhesion by heating, and thus it is possible to cause the conductive film 3 to be peeled off from the support 2 .

另一方面,若曲面部6中之層疊體1的伸長量E大於最大值Emax,則該情況下,有可能在導電膜3的導電構件32,尤其在由金屬細線34a及36a構成之網格圖案中導致發生斷線。 On the other hand, if the elongation E of the laminated body 1 in the curved surface portion 6 is larger than the maximum value Emax, in this case, there is a possibility that the conductive member 32 of the conductive film 3, particularly the mesh composed of the metal thin wires 34a and 36a. A broken line is caused in the pattern.

因此,將曲面部6中之層疊體1的伸長量E設定為最小值Emin以上且最大值Emax以下並對層疊體1實施彎曲加工,藉此能夠防止導電膜3從支撐體2剝離和導電膜3的導電構件32的斷線,並能夠製作曲面部6。 Therefore, the elongation E of the laminate 1 in the curved surface portion 6 is set to be equal to or smaller than the minimum value Emin and the maximum value Emax or less, and the laminate 1 is subjected to bending processing, whereby the conductive film 3 can be prevented from being peeled off from the support 2 and the conductive film The disconnection of the conductive member 32 of 3 can produce the curved surface portion 6.

另外,實施彎曲加工之前的平板形狀的層疊體1中之支撐體2的厚度A1、導電膜3的厚度B1及黏合劑4的厚度C1,與對層疊體1實施彎曲加工之後的平面部P中之支撐體2的厚度、導電膜3的厚度及黏合劑4的厚度相同。 Further, the thickness A1 of the support 2, the thickness B1 of the conductive film 3, and the thickness C1 of the adhesive 4 in the flat laminated body 1 before the bending process are performed in the flat portion P after the bending of the laminated body 1 is performed. The thickness of the support 2, the thickness of the conductive film 3, and the thickness of the adhesive 4 are the same.

由於一邊將成為曲面部之部分C加熱為比支撐體2的構成材料的玻璃化轉變溫度高的溫度,一邊對層疊體1施加拉伸力,從而對曲面部6中之層疊體1賦予伸長量E,因此如第4圖所示,在實施彎曲加工之後的曲面部6中之支撐體2的厚度A2小於平面部P中之支撐體2的厚度A1。亦即,曲面部6中之支撐體2比平面部P中之支撐體2薄。加工後的曲面部6中之支撐體2的厚度A2根據層疊體1的伸長量E而發生變化,在曲面部6中之層疊體1的伸長量E為最小的情況下,加工後的曲面部6中之支撐體2的厚度A2為最大,在曲面部6中之層疊體1的伸長量E為最大的情況下,加工後的曲面部6中之支撐體2的厚度A2為最小。 When the portion C which is the curved surface portion is heated to a temperature higher than the glass transition temperature of the constituent material of the support 2, a tensile force is applied to the laminated body 1 to impart elongation to the laminated body 1 in the curved surface portion 6. E, therefore, as shown in Fig. 4, the thickness A2 of the support 2 in the curved surface portion 6 after the bending process is performed is smaller than the thickness A1 of the support 2 in the flat portion P. That is, the support 2 in the curved portion 6 is thinner than the support 2 in the planar portion P. The thickness A2 of the support 2 in the curved surface portion 6 after the processing changes according to the elongation E of the laminated body 1, and when the elongation E of the laminated body 1 in the curved surface portion 6 is the smallest, the curved surface portion after the processing The thickness A2 of the support 2 in 6 is the largest, and when the elongation E of the laminated body 1 in the curved surface portion 6 is the largest, the thickness A2 of the support 2 in the curved surface portion 6 after the processing is the smallest.

在此,平面部P中之支撐體2的厚度A1的值在彎曲加工 的前後不發生變化,因此若考慮曲面部6中之支撐體2的厚度A2相對於平面部P中之支撐體2的厚度A1之比A2/A1,則與曲面部6中之支撐體2的厚度A2同樣地,A2/A1的值亦根據層疊體1的伸長量E而發生變化,在曲面部6中之層疊體1的伸長量E為最小值Emin之情況下,A2/A1的值為最大,曲面部6中之層疊體1的伸長量E為最大值Emax之情況下,A2/A1的值為最小。 Here, the value of the thickness A1 of the support 2 in the plane portion P is bent. The front and back do not change, so considering the ratio A2/A1 of the thickness A2 of the support 2 in the curved portion 6 to the thickness A1 of the support 2 in the planar portion P, the support 2 in the curved portion 6 Similarly, in the thickness A2, the value of A2/A1 also changes according to the elongation E of the laminated body 1. When the elongation E of the laminated body 1 in the curved surface portion 6 is the minimum value Emin, the value of A2/A1 is When the elongation E of the laminated body 1 in the curved surface portion 6 is the maximum value Emax, the value of A2/A1 is the smallest.

具體而言,曲面部6中之層疊體1的伸長量E為最小值Emin=π×(A2+B1+2.C1)×(X/360)×0.9的情況下,若在第4圖的垂直於紙面之方向上,支撐體2的構成材料係不移動者,且將曲面部6中之導電膜3的內側面的曲率半徑設為R,則曲面部6中之支撐體2的厚度A2相對於平面部P中之支撐體2的厚度A1之比A2/A1在該情況下示出之最大值(A2/A1)max能夠表示成(A2/A1)max=(R+B1/2)/((R+B1+C1+A2/2)×0.9)...(1)。 Specifically, when the elongation E of the laminated body 1 in the curved surface portion 6 is the minimum value Emin=π×(A2+B1+2.C1)×(X/360)×0.9, in the case of FIG. 4 In the direction perpendicular to the plane of the paper, the constituent material of the support 2 is not moved, and the radius of curvature of the inner side surface of the conductive film 3 in the curved surface portion 6 is R, and the thickness A2 of the support 2 in the curved surface portion 6 The ratio A2/A1 with respect to the thickness A1 of the support 2 in the planar portion P is the maximum value (A2/A1)max shown in this case can be expressed as (A2/A1)max=(R+B1/2) /((R+B1+C1+A2/2)×0.9). . . (1).

另一方面,在曲面部6中之層疊體1的伸長量E為最大值Emax=π×(A2+B1+2‧C1)×(X/360)×1.45的情況下,同樣地,曲面部6中之支撐體2的厚度A2相對於平面部P中之支撐體2的厚度A1之比A2/A1在該情況下示出之最小值(A2/A1)min能夠表示成(A2/A1)min=(R+B1/2)/((R+B1+C1+A2/2)×1.45)...(2)。 On the other hand, when the elongation E of the laminated body 1 in the curved surface portion 6 is the maximum value Emax=π×(A2+B1+2‧C1)×(X/360)×1.45, the curved surface portion is similarly obtained. The ratio A2/A1 of the thickness A2 of the support 2 in the support 2 to the thickness A1 of the support 2 in the plane portion P can be expressed as (A2/A1) in the minimum value (A2/A1) min shown in this case. Min=(R+B1/2)/((R+B1+C1+A2/2)×1.45). . . (2).

從而,為了使曲面部6中之支撐體2的厚度A2相對於平面部P中之支撐體2的厚度A1之比A2/A1滿足最小值(A2/A1)min以上且最大值(A2/A1)max以下的條件,若對層疊體1實施 彎曲加工,則一邊能夠同時防止導電膜3從支撐體2剝離和導電膜3的導電構件32斷線,一邊能夠製作曲面部6。 Therefore, in order to make the ratio A2/A1 of the thickness A2 of the support 2 in the curved surface portion 6 to the thickness A1 of the support 2 in the planar portion P satisfy the minimum value (A2/A1) min or more and the maximum value (A2/A1) Under the condition of max or less, if the laminated body 1 is implemented In the bending process, the curved surface portion 6 can be produced while preventing the conductive film 3 from being peeled off from the support 2 and the conductive member 32 of the conductive film 3 from being broken.

如此,在製作曲面部6之後,解除加工機的夾緊,從加工機取出層疊體1。 In this manner, after the curved surface portion 6 is produced, the clamping of the processing machine is released, and the laminated body 1 is taken out from the processing machine.

同樣地,藉由製作層疊體1所需要的複數個曲面部6,能夠製造例如具有如第5圖所示之矩形的上表面之角筒形狀(箱形形狀)的觸控面板7。該觸控面板7由於能夠防止曲面部6中之導電膜3從支撐體2剝離,因此具有良好的外觀,並且能夠在導電膜3的導電構件32不產生斷線而進行可靠性高的動作。 In the same manner, by manufacturing the plurality of curved surface portions 6 required for the laminated body 1, it is possible to manufacture, for example, the touch panel 7 having the rectangular tube shape (box shape) of the rectangular upper surface as shown in FIG. Since the touch panel 7 can prevent the conductive film 3 in the curved surface portion 6 from being peeled off from the support 2, it has a good appearance and can perform a highly reliable operation without causing disconnection of the conductive member 32 of the conductive film 3.

實施形態2 Embodiment 2

在上述實施形態1中,藉由加工而在層疊體1的成為曲面部6之部分C的附近且與層疊體1的導電膜3對置之位置配置了加熱器5,但是並不限定於此,如第6圖所示,亦可在層疊體1的成為曲面部6之部分C的附近且在與層疊體1的支撐體2對置之位置配置加熱器5。 In the first embodiment, the heater 5 is disposed in the vicinity of the portion C of the laminated body 1 which is the curved surface portion 6 and is opposed to the conductive film 3 of the laminated body 1 by the processing. However, the heater 5 is not limited thereto. As shown in FIG. 6, the heater 5 may be disposed in the vicinity of the portion C of the laminated body 1 which is the curved surface portion 6, and at a position opposed to the support 2 of the laminated body 1.

藉由來自加熱器5的熱量,將成為曲面部6之部分C中之構成支撐體2之材料加熱至比玻璃化轉變溫度高的溫度,因此若加熱器5配置於與支撐體2對置之位置,亦即在形成有曲面部6之情況下配置於成為曲面部6的外側之位置,能夠有效地製作曲面部6。 The material constituting the support 2 in the portion C of the curved surface portion 6 is heated to a temperature higher than the glass transition temperature by the heat from the heater 5, so that the heater 5 is disposed opposite the support 2 The position, that is, when the curved surface portion 6 is formed, is disposed at a position outside the curved surface portion 6, and the curved surface portion 6 can be efficiently produced.

另外,上述實施形態1及2中,為了加熱成為曲面部6之部分C而使用了成為發熱體之加熱器5,但是亦可藉由放射加 熱等其他方式來進行加熱。 Further, in the above-described first and second embodiments, the heater 5 serving as a heating element is used to heat the portion C which becomes the curved surface portion 6, but it is also possible to use radiation Heat and other means to heat.

並且,在上述實施形態1及2中,一邊對層疊體1施加拉伸力F,一邊對層疊體1實施了彎曲加工,但是由於需要使支撐體2產生伸長,因此亦可一邊僅對在層疊體1中的支撐體2施加拉伸力F,一邊對層疊體1實施彎曲加工,從而亦能夠製作曲面部6。在導電膜3未配置於支撐體2的整個面上,而是在支撐體2的端部形成有不存在導電膜3的區域之情況下,藉由使該支撐體2的端部夾緊於加工機而能夠僅對支撐體2施加拉伸力F。 Further, in the above-described first and second embodiments, the laminated body 1 is subjected to bending processing while applying the tensile force F to the laminated body 1. However, since the supporting body 2 needs to be elongated, it is possible to laminate only one side. The support body 2 in the body 1 is subjected to a bending force F, and the curved body portion 6 can be produced by performing bending processing on the laminated body 1. In the case where the conductive film 3 is not disposed on the entire surface of the support 2, but the end portion of the support 2 is formed with a region where the conductive film 3 is not present, the end portion of the support 2 is clamped by The processing machine can apply the tensile force F only to the support 2 .

上述實施形態1及2中,導電膜3具有配置於絕緣基板31的表面上之複數個第1檢測電極34及複數個第1周邊配線35和配置於絕緣基板31的背面上之複數個第2檢測電極36及複數個第2周邊配線37,但是並不限定於此。 In the first and second embodiments, the conductive film 3 has a plurality of first detecting electrodes 34 and a plurality of first peripheral wirings 35 disposed on the surface of the insulating substrate 31, and a plurality of second portions disposed on the back surface of the insulating substrate 31. The detection electrode 36 and the plurality of second peripheral wires 37 are not limited thereto.

例如亦可設為如下構成,複數個第1檢測電極34和複數個第2檢測電極36經由層間絕緣膜而配置於絕緣基板31的一面側,並且複數個第1周邊配線35和複數個第2周邊配線37配置於與絕緣基板31同一面側。 For example, the plurality of first detecting electrodes 34 and the plurality of second detecting electrodes 36 may be disposed on one surface side of the insulating substrate 31 via the interlayer insulating film, and the plurality of first peripheral wirings 35 and the plurality of second portions The peripheral wiring 37 is disposed on the same surface side as the insulating substrate 31.

並且,在上述實施形態1及2中,製作了具有矩形上表面之角筒形狀的觸控面板7,但是並不限定於此,以同樣的方式能夠製作具有3角形或5角形以上的多邊形上表面之角筒形狀的觸控面板、圓筒形狀或橢圓形狀的觸控面板。另外,此外,具有曲面部之各種三維形狀的觸控面板亦能夠以同樣的方式製作。 Further, in the above-described first and second embodiments, the touch panel 7 having the rectangular tube shape having a rectangular upper surface is produced. However, the present invention is not limited thereto, and a polygonal shape having a triangular shape or a pentagon shape or more can be produced in the same manner. A touch panel of a rectangular tube shape, a cylindrical shape or an elliptical touch panel. Further, in addition, the touch panel having various three-dimensional shapes of the curved surface portion can be produced in the same manner.

並且,除了觸控面板以外,以同樣的方式亦可製作發熱 體、電磁波屏蔽體等具有曲面部之三維形狀的導電體。 Moreover, in addition to the touch panel, it is possible to produce heat in the same manner. A conductor having a three-dimensional shape of a curved surface portion, such as a body or an electromagnetic wave shield.

[實施例] [Examples]

實施例1 Example 1

對導電膜3藉由透明的黏合劑4而接合於支撐體2的表面上之層疊體1施加拉伸力,並且一邊僅對成為曲面部6之部分進行加熱,一邊以支撐體2成為外側且導電膜3成為內側之方式實施彎曲加工,從而製作出曲面部6。 The laminate 1 of the conductive film 3 bonded to the surface of the support 2 by the transparent adhesive 4 is subjected to a tensile force, and while the portion to be the curved portion 6 is heated, the support 2 is placed outside. The curved surface portion 6 is produced by performing bending processing so that the conductive film 3 is inside.

使用厚度為A1=0.5mm的聚碳酸酯(PC)作為支撐體2,使用具有由雙軸拉伸聚對苯二甲酸乙酯(PET)構成之絕緣基板31之厚度為B1=0.1mm的透明導電膜作為導電膜3,使用厚度為C1=0.05mm的3M公司製造的光學用透明黏合片(OCA)8172CL作為黏合劑4。 Polycarbonate (PC) having a thickness of A1 = 0.5 mm was used as the support 2, and a transparent substrate having a thickness of B1 = 0.1 mm made of biaxially stretched polyethylene terephthalate (PET) was used. Conductive film As the conductive film 3, an optical transparent adhesive sheet (OCA) 8172CL manufactured by 3M Company having a thickness of C1 = 0.05 mm was used as the adhesive 4.

並且,將成為曲面部6之部分C的加熱溫度設為160℃,加工後曲面部6中之導電膜3的內側面的曲率半徑R設為1mm、加工後的曲面部6中之支撐體2的厚度A2設為0.3mm。 Further, the heating temperature of the portion C which is the curved surface portion 6 is 160 ° C, and the radius of curvature R of the inner side surface of the conductive film 3 in the curved surface portion 6 after the processing is set to 1 mm, and the support 2 in the curved surface portion 6 after the processing The thickness A2 is set to 0.3 mm.

實施例2 Example 2

將加工後的面部6中之導電膜3的內側面的曲率半徑R設為2mm、加工後的曲面部6中之支撐體2的厚度A2設為0.34mm,除此之外,以與實施例1同樣的方式製作出曲面部6。 The radius of curvature R of the inner side surface of the conductive film 3 in the processed face portion 6 was set to 2 mm, and the thickness A2 of the support body 2 in the curved surface portion 6 after the processing was set to 0.34 mm, and other examples were given. In the same manner, the curved surface portion 6 is produced.

實施例3 Example 3

將加工後的曲面部6中之導電膜3的內側面的曲率半徑R設為2mm、加工後的曲面部6中之支撐體2的厚度A2設為 0.43mm,除此之外,以與實施例1同樣的方式製作出曲面部6。 The radius of curvature R of the inner side surface of the conductive film 3 in the processed curved surface portion 6 is 2 mm, and the thickness A2 of the support 2 in the curved surface portion 6 after the processing is set to The curved surface portion 6 was produced in the same manner as in the first embodiment except for 0.43 mm.

實施例4 Example 4

將加工後的曲面部6中之導電膜3的內側面的曲率半徑R設為3mm、加工後的曲面部6中之支撐體2的厚度A2設為0.33mm,除此之外,以與實施例1同樣的方式製作出曲面部6。 The curvature radius R of the inner surface of the conductive film 3 in the processed curved surface portion 6 is set to 3 mm, and the thickness A2 of the support 2 in the curved surface portion 6 after the processing is set to 0.33 mm, and In the same manner as in Example 1, the curved surface portion 6 was produced.

實施例5 Example 5

將加工後的曲面部6中之導電膜3的內側面的曲率半徑R設為3mm、加工後的曲面部6中之支撐體2的厚度A2設為0.42mm,除此之外,以與實施例1同樣的方式製作出曲面部6。 The curvature radius R of the inner surface of the conductive film 3 in the processed curved surface portion 6 was set to 3 mm, and the thickness A2 of the support 2 in the curved surface portion 6 after the processing was set to 0.42 mm, and In the same manner as in Example 1, the curved surface portion 6 was produced.

實施例6 Example 6

將加工後的曲面部6中之導電膜3的內側面的曲率半徑R設為3mm、加工後的曲面部6中之支撐體2的厚度A2設為0.48mm,除此之外,以與實施例1同樣的方式製作出曲面部6。 The curvature radius R of the inner side surface of the conductive film 3 in the processed curved surface portion 6 was set to 3 mm, and the thickness A2 of the support body 2 in the curved surface portion 6 after the processing was set to 0.48 mm, and In the same manner as in Example 1, the curved surface portion 6 was produced.

實施例7 Example 7

將使用了厚度為A1=1.0mm的聚碳酸酯(PC)之層疊體1用作支撐體2,並將加工後的曲面部6中之導電膜3的內側面的曲率半徑R設為1mm,加工後的曲面部6中之支撐體2的厚度A2設為0.66mm,除此之外,以與實施例1同樣的方式製作出曲面部6。 A laminate 1 using polycarbonate (PC) having a thickness of A1 = 1.0 mm was used as the support 2, and the radius of curvature R of the inner side surface of the conductive film 3 in the processed curved surface portion 6 was set to 1 mm. The curved surface portion 6 was produced in the same manner as in the first embodiment except that the thickness A2 of the support 2 in the curved surface portion 6 after the processing was 0.66 mm.

實施例8 Example 8

將加工後的曲面部6中之導電膜3的內側面的曲率半徑R設為2mm、加工後的曲面部6中之支撐體2的厚度A2設為 0.62mm,除此之外,以與實施例7同樣的方式製作出曲面部6。 The radius of curvature R of the inner side surface of the conductive film 3 in the processed curved surface portion 6 is 2 mm, and the thickness A2 of the support 2 in the curved surface portion 6 after the processing is set to A curved surface portion 6 was produced in the same manner as in Example 7 except for 0.62 mm.

實施例9 Example 9

將加工後的曲面部6中之導電膜3的內側面的曲率半徑R設為2mm、加工後的曲面部6中之支撐體2的厚度A2設為0.74mm,除此之外,以與實施例7同樣的方式製作出曲面部6。 The curvature radius R of the inner surface of the conductive film 3 in the processed curved surface portion 6 was set to 2 mm, and the thickness A2 of the support 2 in the curved surface portion 6 after the processing was set to 0.74 mm, and In the same manner as in Example 7, the curved surface portion 6 was produced.

實施例10 Example 10

將加工後的曲面部6中之導電膜3的內側面的曲率半徑R設為3mm、加工後的曲面部6中之支撐體2的厚度A2設為0.76mm,除此之外,以與實施例7同樣的方式製作出曲面部6。 The curvature radius R of the inner side surface of the conductive film 3 in the processed curved surface portion 6 was set to 3 mm, and the thickness A2 of the support body 2 in the curved surface portion 6 after the processing was set to 0.76 mm, and In the same manner as in Example 7, the curved surface portion 6 was produced.

實施例11 Example 11

將加工後的曲面部6中之導電膜3的內側面的曲率半徑R設為3mm、加工後的曲面部6中之支撐體2的厚度A2設為0.92mm,除此之外,以與實施例7同樣的方式製作出曲面部6。 The curvature radius R of the inner side surface of the conductive film 3 in the processed curved surface portion 6 was set to 3 mm, and the thickness A2 of the support body 2 in the curved surface portion 6 after the processing was set to 0.92 mm, and In the same manner as in Example 7, the curved surface portion 6 was produced.

比較例1 Comparative example 1

將加工後的曲面部6中之導電膜3的內側面的曲率半徑R設為1mm、加工後的曲面部6中之支撐體2的厚度A2設為0.2mm,除此之外,以與實施例1同樣的方式製作出曲面部6。 The curvature radius R of the inner surface of the conductive film 3 in the processed curved surface portion 6 was set to 1 mm, and the thickness A2 of the support 2 in the curved surface portion 6 after the processing was set to 0.2 mm, and In the same manner as in Example 1, the curved surface portion 6 was produced.

比較例2 Comparative example 2

將加工後的曲面部6中之導電膜3的內側面的曲率半徑R設為1mm、加工後的曲面部6中之支撐體2的厚度A2設為0.44mm,除此之外,以與實施例1同樣的方式製作出曲面部6。 The curvature radius R of the inner surface of the conductive film 3 in the processed curved surface portion 6 is set to 1 mm, and the thickness A2 of the support 2 in the curved surface portion 6 after the processing is set to 0.44 mm, and In the same manner as in Example 1, the curved surface portion 6 was produced.

比較例3 Comparative example 3

將加工後的曲面部6中之導電膜3的內側面的曲率半徑R設為1mm、加工後的曲面部6中之支撐體2的厚度A2設為0.49mm,除此之外,以與實施例1同樣的方式製作出曲面部6。 The curvature radius R of the inner surface of the conductive film 3 in the processed curved surface portion 6 is set to 1 mm, and the thickness A2 of the support 2 in the curved surface portion 6 after the processing is set to 0.49 mm, and In the same manner as in Example 1, the curved surface portion 6 was produced.

比較例4 Comparative example 4

將加工後的曲面部6中之導電膜3的內側面的曲率半徑R設為2mm、加工後的曲面部6中之支撐體2的厚度A2設為0.22mm,除此之外,以與實施例1同樣的方式製作出曲面部6。 The curvature radius R of the inner side surface of the conductive film 3 in the processed curved surface portion 6 was set to 2 mm, and the thickness A2 of the support body 2 in the curved surface portion 6 after the processing was set to 0.22 mm, and In the same manner as in Example 1, the curved surface portion 6 was produced.

比較例5 Comparative Example 5

將加工後的曲面部6中之導電膜3的內側面的曲率半徑R設為2mm、加工後的曲面部6中之支撐體2的厚度A2設為0.49mm,除此之外,以與實施例1同樣的方式製作出曲面部6。 The curvature radius R of the inner surface of the conductive film 3 in the processed curved surface portion 6 is 2 mm, and the thickness A2 of the support 2 in the curved surface portion 6 after the processing is set to 0.49 mm, and In the same manner as in Example 1, the curved surface portion 6 was produced.

比較例6 Comparative Example 6

將加工後的曲面部6中之導電膜3的內側面的曲率半徑R設為3mm、加工後的曲面部6中之支撐體2的厚度A2設為0.26mm,除此之外,以與實施例1同樣的方式製作出曲面部6。 The curvature radius R of the inner surface of the conductive film 3 in the processed curved surface portion 6 was set to 3 mm, and the thickness A2 of the support 2 in the curved surface portion 6 after the processing was set to 0.26 mm, and In the same manner as in Example 1, the curved surface portion 6 was produced.

比較例7 Comparative Example 7

將加工後的曲面部6中之導電膜3的內側面的曲率半徑R設為1mm、加工後的曲面部6中之支撐體2的厚度A2設為0.38mm,除此之外,以與實施例7同樣的方式製作出曲面部6。 The curvature radius R of the inner surface of the conductive film 3 in the processed curved surface portion 6 was set to 1 mm, and the thickness A2 of the support 2 in the curved surface portion 6 after the processing was set to 0.38 mm, and In the same manner as in Example 7, the curved surface portion 6 was produced.

比較例8 Comparative Example 8

將加工後的曲面部6中之導電膜3的內側面的曲率半徑R設為1mm、加工後的曲面部6中之支撐體2的厚度A2設為 0.50mm,除此之外,以與實施例7同樣的方式製作出曲面部6。 The radius of curvature R of the inner side surface of the conductive film 3 in the processed curved surface portion 6 is set to 1 mm, and the thickness A2 of the support 2 in the curved surface portion 6 after the processing is set to A curved surface portion 6 was produced in the same manner as in Example 7 except that 0.50 mm was used.

比較例9 Comparative Example 9

將加工後的曲面部6中之導電膜3的內側面的曲率半徑R設為1mm、加工後的曲面部6中之支撐體2的厚度A2設為0.90mm,除此之外,以與實施例7同樣的方式製作出曲面部6。 The curvature radius R of the inner surface of the conductive film 3 in the processed curved surface portion 6 was set to 1 mm, and the thickness A2 of the support 2 in the curved surface portion 6 after the processing was set to 0.90 mm, and In the same manner as in Example 7, the curved surface portion 6 was produced.

比較例10 Comparative Example 10

將加工後的曲面部6中之導電膜3的內側面的曲率半徑R設為2mm、加工後的曲面部6中之支撐體2的厚度A2設為0.4mm,除此之外,以與實施例7同樣的方式製作出曲面部6。 The curvature radius R of the inner side surface of the conductive film 3 in the processed curved surface portion 6 was set to 2 mm, and the thickness A2 of the support body 2 in the curved surface portion 6 after the processing was set to 0.4 mm, and In the same manner as in Example 7, the curved surface portion 6 was produced.

比較例11 Comparative Example 11

將加工後的曲面部6中之導電膜3的內側面的曲率半徑R設為2mm、加工後的曲面部6中之支撐體2的厚度A2設為0.92mm,除此之外,以與實施例7同樣的方式製作出曲面部6。 The curvature radius R of the inner surface of the conductive film 3 in the processed curved surface portion 6 was set to 2 mm, and the thickness A2 of the support 2 in the curved surface portion 6 after the processing was set to 0.92 mm, and In the same manner as in Example 7, the curved surface portion 6 was produced.

比較例12 Comparative Example 12

將加工後的曲面部6中之導電膜3的內側面的曲率半徑R設為3mm、加工後的曲面部6中之支撐體2的厚度A2設為0.44mm,除此之外,以與實施例7同樣的方式製作出曲面部6。 The curvature radius R of the inner side surface of the conductive film 3 in the processed curved surface portion 6 was set to 3 mm, and the thickness A2 of the support body 2 in the curved surface portion 6 after the processing was set to 0.44 mm, and In the same manner as in Example 7, the curved surface portion 6 was produced.

比較例13 Comparative Example 13

將加工後的曲面部6中之導電膜3的內側面的曲率半徑R設為3mm、加工後的曲面部6中之支撐體2的厚度A2設為0.56mm,除此之外,以與實施例7同樣的方式製作出曲面部6。 The curvature radius R of the inner surface of the conductive film 3 in the processed curved surface portion 6 was set to 3 mm, and the thickness A2 of the support 2 in the curved surface portion 6 after the processing was set to 0.56 mm, and In the same manner as in Example 7, the curved surface portion 6 was produced.

該些實施例1~11及比較例1~13中,對使用厚度為 A1=0.5mm的聚碳酸酯(PC)作為支撐體2,且將曲面部6中之導電膜3的內側面的曲率半徑R設為1mm之實施例1及比較例1~3中個別地製作之曲面部,藉由目測評價在支撐體2與導電膜3之間有無產生剝離,並且對曲面部中之導電膜3內的導電構件32實施導通檢查而評價了有無產生導電構件32的斷線時,獲得了如表1所示之結果。並且,在表1中記載有,在上述式(1)及式(2)中代入實施例1及比較例1~3的各自曲面部6中之支撐體2的厚度A2、導電膜3的厚度B1、黏合劑4的厚度C1及曲率半徑R而算出之、支撐體2的厚度之比A2/A1的最大值(A2/A1)max及最小值(A2/A1)min。 In the first to eleventh and the comparative examples 1 to 13, the thickness of the use was Polycarbonate (PC) having A1 = 0.5 mm was used as the support 2, and each of Example 1 and Comparative Examples 1 to 3 in which the radius of curvature R of the inner surface of the conductive film 3 in the curved surface portion 6 was set to 1 mm was individually produced. The curved surface portion was visually evaluated for the presence or absence of peeling between the support 2 and the conductive film 3, and the conductive member 32 in the conductive film 3 in the curved portion was subjected to conduction inspection to evaluate the presence or absence of the disconnection of the conductive member 32. At the time, the results as shown in Table 1 were obtained. Further, in Table 1, the thickness A2 of the support 2 and the thickness of the conductive film 3 in the curved surface portions 6 of the first embodiment and the comparative examples 1 to 3 are substituted in the above formulas (1) and (2). B1, the maximum thickness (A2/A1)max and the minimum value (A2/A1) min of the ratio A2/A1 of the thickness of the support 2 calculated by the thickness C1 of the adhesive 4 and the radius of curvature R.

在表1的評價結果中,A表示未確認到在支撐體2與導電膜3之間產生剝離,也未確認到在導電膜3內的導電構件32產生斷線,B表示雖然未確認到在導電膜3內的導電構件32產生斷線,但是確認到在支撐體2與導電膜3之間產生剝離,C表示雖然未確認到在支撐體2與導電膜3之間產生剝離,但是確認到在導電膜3內的導電構件32產生斷線。 In the evaluation results of Table 1, A indicates that no peeling occurred between the support 2 and the conductive film 3, and it was not confirmed that the conductive member 32 in the conductive film 3 was broken, and B indicates that the conductive film 3 was not confirmed. The inner conductive member 32 was broken, but it was confirmed that peeling occurred between the support 2 and the conductive film 3, and C indicates that peeling occurred between the support 2 and the conductive film 3 was not confirmed, but it was confirmed that the conductive film 3 was present. The conductive member 32 inside is broken.

實施例1中之比A2/A1=0.6滿足最小值(A2/A1)min以 上且最大值(A2/A1)max以下之條件,不僅未產生支撐體2與導電膜3之間的剝離,而且亦未產生導電膜3內的導電構件32的斷線。 The ratio A2/A1=0.6 in Example 1 satisfies the minimum value (A2/A1) min to The condition of the upper limit and the maximum value (A2/A1) max or less does not cause peeling between the support 2 and the conductive film 3, and the disconnection of the conductive member 32 in the conductive film 3 does not occur.

與此相對,由於比較例1中之比A2/A1=0.4小於最小值(A2/A1)min,且曲面部6中之層疊體1過度伸長,因此認為係導電膜3內的導電構件32斷線者。 On the other hand, since the ratio A2/A1=0.4 in Comparative Example 1 is smaller than the minimum value (A2/A1) min, and the laminated body 1 in the curved surface portion 6 is excessively elongated, it is considered that the conductive member 32 in the conductive film 3 is broken. Line player.

另一方面,由於比較例2中之比A2/A1=0.88及比較例3中之比A2/A1=0.98均大於最大值(A2/A1)max,且曲面部6中之層疊體1的伸長量E不足,因此認為係在導電膜3產生壓曲而從支撐體2剝離者。 On the other hand, since the ratio A2/A1=0.88 in Comparative Example 2 and the ratio A2/A1=0.98 in Comparative Example 3 are larger than the maximum value (A2/A1)max, and the elongation of the laminated body 1 in the curved surface portion 6 Since the amount E is insufficient, it is considered that the conductive film 3 is buckling and peeled off from the support 2 .

在實施例1~12及比較例1~12中,對使用厚度為A1=0.5mm的聚碳酸酯(PC)作為支撐體2,且曲面部6中之導電膜3的內側面的曲率半徑R設為2mm之實施例2~3及比較例4~5中個別地製作之曲面部,藉由目測而評價有無產生支撐體2與導電膜3之間的剝離,並且對曲面部中之導電膜3內的導電構件32實施導通檢查而評價了有無產生導電構件32的斷線時,獲得了如表2所示之結果。並且,在表2中記載有,在上述式(1)及式(2)中藉由代入實施例2~3及比較例4~5的各自的曲面部6中之支撐體2的厚度A2、導電膜3的厚度B1、黏合劑4的厚度C1及曲率半徑R而算出之、支撐體2的厚度之比A2/A1的最大值(A2/A1)max及最小值(A2/A1)min。 In Examples 1 to 12 and Comparative Examples 1 to 12, polycarbonate (PC) having a thickness of A1 = 0.5 mm was used as the support 2, and the radius of curvature R of the inner side surface of the conductive film 3 in the curved surface portion 6 was used. The curved surface portions which were individually formed in Examples 2 to 3 and Comparative Examples 4 to 5 of 2 mm were evaluated by visual inspection for the occurrence of peeling between the support 2 and the conductive film 3, and the conductive film in the curved surface portion. When the conductive member 32 in 3 was subjected to the conduction inspection to evaluate the presence or absence of the disconnection of the conductive member 32, the results as shown in Table 2 were obtained. Further, in Table 2, the thickness A2 of the support 2 in each of the curved surface portions 6 of Examples 2 to 3 and Comparative Examples 4 to 5 is substituted in the above formulas (1) and (2). The maximum value (A2/A1)max and the minimum value (A2/A1) min of the ratio A2/A1 of the thickness of the support 2 calculated from the thickness B1 of the conductive film 3, the thickness C1 of the adhesive 4, and the radius of curvature R.

表2的評價結果中之A、B及C與表1中示出者相同。 Among the evaluation results of Table 2, A, B, and C are the same as those shown in Table 1.

實施例2中之比A2/A1=0.68及實施例3中之比A2/A1=0.86均滿足最小值(A2/A1)min以上且最大值(A2/A1)max以下的條件,不僅未產生支撐體2與導電膜3之間的剝離,而且亦未產生導電膜3內的導電構件32的斷線。 The ratio of the ratio A2/A1=0.68 in the second embodiment and the ratio A2/A1=0.86 in the third embodiment satisfy the minimum value (A2/A1) min or more and the maximum value (A2/A1)max or less, not only not generated. The peeling between the support 2 and the conductive film 3 does not cause disconnection of the conductive member 32 in the conductive film 3.

與此相對,由於比較例4中之比A2/A1=0.44小於最小值(A2/A1)min,且曲面部6中之層疊體1過度伸長,因此認為係導電膜3內的導電構件32斷線者。 On the other hand, since the ratio A2/A1=0.44 in Comparative Example 4 is smaller than the minimum value (A2/A1) min, and the laminated body 1 in the curved surface portion 6 is excessively elongated, it is considered that the conductive member 32 in the conductive film 3 is broken. Line player.

另一方面,由於比較例5中之比A2/A1=0.98超過最大值(A2/A1)max,且曲面部6中之層疊體1的伸長量E不足,因此認為係在導電膜3產生壓曲而從支撐體2剝離者。 On the other hand, since the ratio A2/A1=0.98 in Comparative Example 5 exceeds the maximum value (A2/A1)max, and the elongation E of the laminated body 1 in the curved surface portion 6 is insufficient, it is considered that the pressure is generated in the conductive film 3. The person who peeled off from the support 2 is bent.

在實施例1~12及比較例1~12中,對使用厚度為A1=0.5mm的聚碳酸酯(PC)作為支撐體2,且曲面部6中之導電膜3的內側面的曲率半徑R設為3mm之實施例4~6及比較例6中個別地製作之曲面部,藉由目測而評價有無產生支撐體2與導電膜3之間的剝離,並且對曲面部中之導電膜3內的導電構件32實施導通檢查而評價了有無產生導電構件32的斷線時,獲得了如表3所示之結果。並且,在表3中記載有,在上述式(1)及式(2) 中藉由代入實施例4~6及比較例6各自的曲面部6中之支撐體2的厚度A2、導電膜3的厚度B1、黏合劑4的厚度C1及曲率半徑R而算出之、支撐體2的厚度之比A2/A1的最大值(A2/A1)max及最小值(A2/A1)min。 In Examples 1 to 12 and Comparative Examples 1 to 12, polycarbonate (PC) having a thickness of A1 = 0.5 mm was used as the support 2, and the radius of curvature R of the inner side surface of the conductive film 3 in the curved surface portion 6 was used. The curved surface portions which were individually formed in Examples 4 to 6 and Comparative Example 6 of 3 mm were evaluated by visual observation for the occurrence of peeling between the support 2 and the conductive film 3, and in the conductive film 3 in the curved surface portion. When the conductive member 32 was subjected to the conduction inspection to evaluate the presence or absence of the disconnection of the conductive member 32, the results as shown in Table 3 were obtained. Further, in Table 3, the above formulas (1) and (2) are described. The support body is calculated by substituting the thickness A2 of the support 2, the thickness B1 of the conductive film 3, the thickness C1 of the adhesive 4, and the radius of curvature R in the curved surface portion 6 of each of the fourth to sixth embodiments and the comparative example 6 The ratio of the thickness of 2 is the maximum value (A2/A1)max and the minimum value (A2/A1) min of A2/A1.

表3的評價結果中之A及C與表1中示出者相同。 Among the evaluation results of Table 3, A and C are the same as those shown in Table 1.

實施例4中之比A2/A1=0.66、實施例5中之比A2/A1=0.84及實施例6中之比A2/A1=0.96均滿足最小值(A2/A1)min以上且最大值(A2/A1)max以下之條件,不僅未產生支撐體2與導電膜3之間的剝離,而且亦未產生導電膜3內的導電構件32的斷線。 The ratio A2/A1=0.66 in Example 4, the ratio A2/A1=0.84 in Example 5, and the ratio A2/A1=0.96 in Example 6 satisfy the minimum value (A2/A1) min or more and the maximum value ( The condition of A2/A1)max or less not only causes peeling between the support 2 and the conductive film 3, but also does not cause disconnection of the conductive member 32 in the conductive film 3.

與此相對,由於比較例6中之比A2/A1=0.52小於最小值(A2/A1)min,且曲面部6中之層疊體1過度伸長,因此認為係導電膜3內的導電構件32斷線者。 On the other hand, since the ratio A2/A1=0.52 in Comparative Example 6 is smaller than the minimum value (A2/A1) min, and the laminated body 1 in the curved surface portion 6 is excessively elongated, it is considered that the conductive member 32 in the conductive film 3 is broken. Line player.

在實施例1~12及比較例1~12中,對使用厚度為A1=1.0mm的聚碳酸酯(PC)作為支撐體2,且曲面部6中之導電膜3的內側面的曲率半徑R設為1mm之實施例7及比較例7~9中個別地製作之曲面部,藉由目測而評價有無產生支撐體2與導電膜3之間的剝離,並且對曲面部中之導電膜3內的導電構件32實施導通檢查而評價了有無產生導電構件32的斷線時,獲得了如 表4所示之結果。並且,在表4中記載有,藉由在上述式(1)及式(2)中代入實施例7及比較例7~9各自的曲面部6中之支撐體2的厚度A2、導電膜3的厚度B1、黏合劑4的厚度C1及曲率半徑R而算出之、支撐體2的厚度之比A2/A1的最大值(A2/A1)max及最小值(A2/A1)min。 In Examples 1 to 12 and Comparative Examples 1 to 12, polycarbonate (PC) having a thickness of A1 = 1.0 mm was used as the support 2, and the radius of curvature R of the inner side surface of the conductive film 3 in the curved surface portion 6 was used. The curved surface portions which were individually produced in Example 7 and Comparative Examples 7 to 9 which were set to 1 mm were visually evaluated for the presence or absence of peeling between the support 2 and the conductive film 3, and in the conductive film 3 in the curved surface portion. When the conductive member 32 performs a conduction check and evaluates whether or not the disconnection of the conductive member 32 occurs, the obtained The results shown in Table 4. Further, in Table 4, the thickness A2 of the support 2 in the curved surface portion 6 of each of the seventh embodiment and the comparative examples 7 to 9 is substituted in the above formulas (1) and (2), and the conductive film 3 is described. The thickness B1, the thickness C1 of the adhesive 4, and the radius of curvature R are calculated as the maximum value (A2/A1)max and the minimum value (A2/A1) min of the ratio A2/A1 of the thickness of the support 2.

表4的評價結果中之A、B及C與表1中示出者相同。 Among the evaluation results of Table 4, A, B, and C are the same as those shown in Table 1.

實施例7中之比A2/A1=0.66滿足最小值(A2/A1)min以上且最大值(A2/A1)max以下的條件,不僅未產生支撐體2與導電膜3之間的剝離,而且亦未產生導電膜3內的導電構件32的斷線。 In the case where the ratio A2/A1=0.66 in the seventh embodiment satisfies the minimum value (A2/A1) min or more and the maximum value (A2/A1)max or less, not only the peeling between the support 2 and the conductive film 3 but also the peeling between the support 2 and the conductive film 3 is not caused. Broken wires of the conductive member 32 in the conductive film 3 are also not generated.

與此相對,由於比較例7中之比A2/A1=0.38及比較例8中之比A2/A1=0.5均小於最小值(A2/A1)min,並且曲面部6中之層疊體1過度伸長,因此認為係導電膜3內的導電構件32斷線者。 On the other hand, since the ratio A2/A1=0.38 in Comparative Example 7 and the ratio A2/A1=0.5 in Comparative Example 8 are both smaller than the minimum value (A2/A1) min, and the laminated body 1 in the curved surface portion 6 is excessively elongated. Therefore, it is considered that the conductive member 32 in the conductive film 3 is broken.

另一方面,由於比較例9中之比A2/A1=0.9超過最大值(A2/A1)max,且曲面部6中之層疊體1的伸長量E不足,因此認為係在導電膜3產生壓曲而從支撐體2剝離者。 On the other hand, since the ratio A2/A1=0.9 in Comparative Example 9 exceeds the maximum value (A2/A1)max, and the elongation E of the laminate 1 in the curved surface portion 6 is insufficient, it is considered that the pressure is generated in the conductive film 3. The person who peeled off from the support 2 is bent.

在實施例1~12及比較例1~12中,對使用厚度為 A1=1.0mm的聚碳酸酯(PC)作為支撐體2,且曲面部6中之導電膜3的內側面的曲率半徑R設為2mm之實施例8~9及比較例10~11中個別地製作之曲面部,藉由目測而評價有無產生支撐體2與導電膜3之間的剝離,並且對曲面部中之導電膜3內的導電構件32實施導通檢查而評價了有無產生導電構件32的斷線時,獲得了如表5所示之結果。並且,在表5中記載有,在上述式(1)及式(2)中代入實施例8~9及比較例10~11各自的曲面部6中之支撐體2的厚度A2、導電膜3的厚度B1、黏合劑4的厚度C1及曲率半徑R而算出之、支撐體2的厚度之比A2/A1的最大值(A2/A1)max及最小值(A2/A1)min。 In Examples 1 to 12 and Comparative Examples 1 to 12, the thickness used was Polycarbonate (PC) having A1 = 1.0 mm is used as the support 2, and the curvature radius R of the inner side surface of the conductive film 3 in the curved surface portion 6 is set to 2 mm, and individual examples 8 to 9 and comparative examples 10 to 11 are individually The surface portion to be produced was evaluated for the presence or absence of peeling between the support 2 and the conductive film 3 by visual inspection, and the conductive member 32 in the conductive film 3 in the curved portion was subjected to conduction inspection to evaluate the presence or absence of the conductive member 32. When the line is broken, the results as shown in Table 5 are obtained. Further, in Table 5, the thickness A2 of the support 2 and the conductive film 3 in the curved surface portions 6 of the respective Examples 8 to 9 and Comparative Examples 10 to 11 are substituted in the above formulas (1) and (2). The thickness B1, the thickness C1 of the adhesive 4, and the radius of curvature R are calculated as the maximum value (A2/A1)max and the minimum value (A2/A1) min of the ratio A2/A1 of the thickness of the support 2.

表5的評價結果中之A、B及C係與表1中示出者相同。 The A, B, and C lines in the evaluation results of Table 5 are the same as those shown in Table 1.

實施例8中之比A2/A1=0.62及實施例9中之比A2/A1=0.74均滿足最小值(A2/A1)min以上且最大值(A2/A1)max以下的條件,不僅未產生支撐體2與導電膜3之間的剝離,而且亦未產生導電膜3內的導電構件32的斷線。 The ratio of the ratio A2/A1=0.62 in the eighth embodiment and the ratio A2/A1=0.74 in the example 9 satisfy the minimum value (A2/A1) min or more and the maximum value (A2/A1)max or less, not only not generated. The peeling between the support 2 and the conductive film 3 does not cause disconnection of the conductive member 32 in the conductive film 3.

與此相對,由於比較例10中之比A2/A1=0.4小於最小值(A2/A1)min,且曲面部6中之層疊體1過度伸長,因此認為係導電膜3內的導電構件32斷線者。 On the other hand, since the ratio A2/A1=0.4 in Comparative Example 10 is smaller than the minimum value (A2/A1) min, and the laminated body 1 in the curved surface portion 6 is excessively elongated, it is considered that the conductive member 32 in the conductive film 3 is broken. Line player.

另一方面,由於比較例11中之比A2/A1=0.92超過最大值(A2/A1)max,且曲面部6中之層疊體1的伸長量E不足,因此認為係在導電膜3產生壓曲而從支撐體2剝離者。 On the other hand, since the ratio A2/A1=0.92 in Comparative Example 11 exceeds the maximum value (A2/A1)max, and the elongation E of the laminated body 1 in the curved surface portion 6 is insufficient, it is considered that the pressure is generated in the conductive film 3. The person who peeled off from the support 2 is bent.

在實施例1~12及比較例1~12中,對使用厚度為A1=1.0mm的聚碳酸酯(PC)作為支撐體2,且曲面部6中之導電膜3的內側面的曲率半徑R設為3mm之實施例10~11及比較例12~13中個別地製作之曲面部,藉由目測而評價有無產生支撐體2與導電膜3之間的剝離,並且對曲面部中之導電膜3內的導電構件32實施導通檢查而評價了有無產生導電構件32的斷線時,獲得了如表6所示之結果。並且,在表6中記載有,在上述式(1)及式(2)中代入實施例10~11及比較例12~13各自的曲面部6中之支撐體2的厚度A2、導電膜3的厚度B1、黏合劑4的厚度C1及曲率半徑R而算出之、支撐體2的厚度之比A2/A1的最大值(A2/A1)max及最小值(A2/A1)min。 In Examples 1 to 12 and Comparative Examples 1 to 12, polycarbonate (PC) having a thickness of A1 = 1.0 mm was used as the support 2, and the radius of curvature R of the inner side surface of the conductive film 3 in the curved surface portion 6 was used. The curved surface portions which were individually produced in Examples 10 to 11 and Comparative Examples 12 to 13 of 3 mm were visually evaluated for the presence or absence of peeling between the support 2 and the conductive film 3, and the conductive film in the curved surface portion. When the conductive member 32 in 3 was subjected to the conduction inspection and the presence or absence of the disconnection of the conductive member 32 was evaluated, the results as shown in Table 6 were obtained. Further, in Table 6, the thickness A2 of the support 2 and the conductive film 3 in the curved surface portions 6 of the respective examples 10 to 11 and the comparative examples 12 to 13 are substituted in the above formulas (1) and (2). The thickness B1, the thickness C1 of the adhesive 4, and the radius of curvature R are calculated as the maximum value (A2/A1)max and the minimum value (A2/A1) min of the ratio A2/A1 of the thickness of the support 2.

表6的評價結果中之A及C與表1中示出者相同。 Among the evaluation results of Table 6, A and C are the same as those shown in Table 1.

實施例10中之比A2/A1=0.76及實施例11中之比A2/A1=0.92均滿足最小值(A2/A1)min以上且最大值(A2/A1)max以下的條件,不僅未產生支撐體2與導電膜3之間的剝離,而且亦未產生導電膜3內的導電構件32的斷線。 The ratio of the ratio A2/A1=0.76 in the tenth embodiment and the ratio A2/A1=0.92 in the example 11 satisfying the minimum value (A2/A1) min or more and the maximum value (A2/A1)max or less are not produced. The peeling between the support 2 and the conductive film 3 does not cause disconnection of the conductive member 32 in the conductive film 3.

與此相對,由於比較例12中之比A2/A1=0.44及比較例13中之比A2/A1=0.56小於最小值(A2/A1)min,且曲面部6中之層疊體1過度伸長,因此認為係導電膜3內的導電構件32斷線者。 On the other hand, since the ratio A2/A1=0.44 in Comparative Example 12 and the ratio A2/A1=0.56 in Comparative Example 13 are smaller than the minimum value (A2/A1) min, and the laminated body 1 in the curved surface portion 6 is excessively elongated, Therefore, it is considered that the conductive member 32 in the conductive film 3 is broken.

Claims (10)

一種導電體的成形方法,其為在層疊體上形成曲面部,從而成形具有平面部和前述曲面部之三維形狀的導電體之導電體的成形方法,前述層疊體在具有平板形狀之絕緣性支撐體的表面上經由黏合劑而接合有具有金屬網之導電膜,前述導電體的成形方法的特徵為,在成形加工時,僅加熱前述層疊體的成為曲面部之部分,一邊至少對成為前述曲面部之部分施加拉伸力,一邊以前述支撐體成為外側且前述導電膜成為內側之方式對前述層疊體實施彎曲加工,從而製作前述曲面部,在將前述平面部中之前述支撐體的厚度設為A1、前述導電膜的厚度設為B1、前述黏合劑的厚度設為C1、所製作之前述曲面部中之前述支撐體的厚度設為A2、前述曲面部的內表面的曲率半徑設為R之情況下,A2/A1為(R+B1/2)/((R+B1+C1+A2/2)×1.45)以上且(R+B1/2)/((R+B1+C1+A2/2)×0.9)以下。 A method of forming a conductor, which is a method of forming a conductor having a planar portion and a three-dimensional shape of a curved portion formed on a laminate, wherein the laminate has an insulating support having a flat shape A conductive film having a metal mesh is bonded to the surface of the body via a bonding agent, and the method of molding the conductive body is characterized in that at least the portion which becomes the curved surface portion of the laminated body is heated at the time of forming A part of the portion is subjected to a tensile force, and the laminate is subjected to a bending process so that the support is outside and the conductive film is inside. The curved portion is formed, and the thickness of the support in the flat portion is set. In the case of A1, the thickness of the conductive film is B1, the thickness of the adhesive is C1, the thickness of the support in the curved surface portion produced is A2, and the radius of curvature of the inner surface of the curved surface portion is R. In the case, A2/A1 is (R+B1/2)/((R+B1+C1+A2/2)×1.45) or more and (R+B1/2)/((R+B1+C1+A2) /2) × 0.9) below. 如申請專利範圍第1項所述之導電體的成形方法,其中,在將前述曲面部的彎曲角度設為X°之情況下,以前述曲面部中之前述層疊體的伸長量E成為π×(A2+B1+2‧C1)×(X/360)×0.9以上且π×(A2+B1+2‧C1)×(X/360)×1.45以下之方式,一邊對前述層疊體施加拉伸力,一邊對前述層疊體實施彎曲加工,從而製作前述曲面部。 In the method of forming a conductor according to the first aspect of the invention, in the case where the bending angle of the curved surface portion is X°, the elongation E of the laminate in the curved surface portion is π × (A2+B1+2‧C1)×(X/360)×0.9 or more and π×(A2+B1+2‧C1)×(X/360)×1.45 or less, while stretching the laminate The above-mentioned laminated body is subjected to bending processing to produce the curved surface portion. 如申請專利範圍第1或2項所述之導電體的成形方法,其中,在前述層疊體的成為前述曲面部之前述部分加熱為比前述支撐體的玻璃化轉變溫度高的溫度,並且在成為前述平面部之部分維持比前述支撐體的玻璃化轉變溫度低的溫度之狀態下,對前述層疊體實施彎曲加工,從而製作前述曲面部。 The method of forming a conductor according to the first or second aspect of the invention, wherein the portion of the laminate that is the curved surface portion is heated to a temperature higher than a glass transition temperature of the support, and is In a state in which the portion of the flat portion is maintained at a temperature lower than the glass transition temperature of the support, the laminate is subjected to a bending process to produce the curved surface portion. 如申請專利範圍第1或2項所述之導電體的成形方法,其中,從前述支撐體側對前述層疊體的成為前述曲面部之前述部分進行加熱。 The method of forming a conductor according to the first or second aspect of the invention, wherein the portion of the laminate that is the curved surface portion is heated from the support side. 如申請專利範圍第1或2項所述之導電體的成形方法,其中,一邊僅對前述層疊體中的前述支撐體施加拉伸力,一邊對前述層疊體實施彎曲加工,從而製作前述曲面部。 The method of forming a conductor according to the first or second aspect of the invention, wherein the laminate is subjected to a bending process only by applying a tensile force to the support in the laminate, thereby producing the curved portion. . 如申請專利範圍第1或2項所述之導電體的成形方法,其中,前述支撐體由絕緣性透明的樹脂構成,前述導電膜為在具有可撓性之絕緣基板的表面上配置有前述金屬網之透明導電膜,前述黏合劑係透明者。 The method of forming a conductor according to the first or second aspect of the invention, wherein the support is made of an insulating transparent resin, and the conductive film is provided with the metal on a surface of the flexible insulating substrate. The transparent conductive film of the mesh, wherein the adhesive is transparent. 如申請專利範圍第1或2項所述之導電體的成形方法,其中,前述導電體用作觸控面板、電磁波屏蔽體或發熱體。 The method of forming a conductor according to the first or second aspect of the invention, wherein the conductor is used as a touch panel, an electromagnetic wave shield or a heat generating body. 一種導電體,其為在絕緣性支撐體的表面上經由黏合劑而接合有具有金屬網之導電膜之三維形狀的導電體,前述導電體的特徵為,具有平面部和曲面部,在將前述平面部中之前述支撐體的厚度設為A1、前述導電膜的厚度設為B1、前述黏合劑的厚度設為C1、前述曲面部中之前述支撐體的厚度設為A2、前述曲面部內表面的曲率半徑設為R之情況下,A2/A1為(R+B1/2)/((R+B1+C1+A2/2)×1.45)以上且(R+B1/2)/((R+B1+C1+A2/2)×0.9)以下,前述曲面部內表面的曲率半徑R為1mm以上且3mm以下。 An electric conductor in which a three-dimensional shape having a conductive film having a metal mesh is bonded to a surface of an insulating support via an adhesive, the conductive body having a flat portion and a curved surface portion, The thickness of the support in the flat portion is A1, the thickness of the conductive film is B1, the thickness of the adhesive is C1, and the thickness of the support in the curved portion is A2, and the inner surface of the curved surface is When the radius of curvature is set to R, A2/A1 is (R+B1/2)/((R+B1+C1+A2/2)×1.45) and (R+B1/2)/((R+ B1 + C1 + A2 / 2) × 0.9) Hereinafter, the radius of curvature R of the inner surface of the curved surface portion is 1 mm or more and 3 mm or less. 如申請專利範圍第8項所述之導電體,其中,前述支撐體由絕緣性透明的樹脂構成,前述導電膜為在具有可撓性之絕緣基板的表面上配置有前述金屬網之透明導電膜,前述黏合劑係透明者。 The conductor according to claim 8, wherein the support is made of an insulating transparent resin, and the conductive film is a transparent conductive film in which the metal mesh is disposed on a surface of a flexible insulating substrate. The aforementioned adhesive is transparent. 如申請專利範圍第8或9項所述之導電體,其用作觸控面板、電磁波屏蔽體或發熱體。 The electric conductor according to claim 8 or 9, which is used as a touch panel, an electromagnetic wave shield or a heat generating body.
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