TWI666339B - Plasma coating device - Google Patents

Abstract

A plasma coating device. The plasma coating device includes an ordinary piezoelectric plasma generator and at least one feeding fixture. The normal piezoelectric slurry generator includes a tubular electrode and a rotating nozzle. A rotary nozzle is provided at the bottom of the tubular electrode. The rotating nozzle has a plasma nozzle and an outer surface, and the outer diameter of the lower part of the outer surface is gradually reduced from the bottom of the tubular electrode to the plasma nozzle. The feeding jig is provided on the periphery of the outer side of the rotating nozzle. The feeding fixture includes at least one precursor spout. The feeding jig is configured to spray the coated precursor toward the lower portion of the outer side of the rotary nozzle through the precursor nozzle. When the plasma nozzle ejects the plasma, a low-pressure area is formed near the plasma nozzle. The coating precursor is attracted by the low-pressure area and flows along the lower side of the outer side of the rotating nozzle to the plasma nozzle to react with the plasma.

Description

Plasma coating device

The invention relates to a plasma device, and more particularly to a plasma coating device.

The application of atmospheric plasma is very wide, and it can be applied to the surface treatment, surface modification, and coating of workpieces. Especially the plasma jet in atmospheric plasma. Due to the high plasma density of the spray plasma, the good treatment effect and the low cost, there are many industrial applications of the spray plasma.

With the vigorous development of atmospheric plasma technology, rotary atmospheric plasma equipment has been developed to increase the processing area of atmospheric plasma and reduce the temperature of the processed workpieces, thereby greatly increasing the processing speed of atmospheric plasma, and Improve the application range of atmospheric plasma to workpiece materials.

However, the currently available rotary atmospheric plasma equipment can only use oxidizing gases such as air and nitrogen. If the rotary atmospheric plasma equipment is to be used for deposition or coating, the following problems arise. First, when a rotary atmospheric plasma device is used for deposition or coating, the raw materials for deposition or coating need to be provided, but if the raw materials for deposition or coating enter the interior of the plasma equipment along with working gas such as air or nitrogen, it is easy to place the plasma The inside of the device reacts Deposition and plating in the plasma equipment, this will cause the plasma generated by the plasma equipment to be unstable, and it may also cause the plasma to react with the deposition or coating materials early and cause plasma polymerization in the plasma equipment. Powder, which affects the efficiency and quality of plasma coating. Secondly, in order to improve the aforementioned problems, some atmospheric plasma technologies only add deposition or coating materials near the plasma ejection outlet. Although this adjustment can definitely solve this problem, it also makes the rotation of the nozzle of the atmospheric plasma equipment unable to run smoothly, and the plasma treatment area is limited.

Therefore, an object of the present invention is to provide a plasma coating device with a feeding jig located adjacent to the periphery of a rotary nozzle, thereby not only providing a rotary plasma for large-area coating, but also reducing processing The temperature of the workpiece at the time of coating can solve the problem of contamination of the coating materials inside the rotating nozzle and the tubular electrode on it, and can improve the stability of the plasma, and can effectively perform the coating operation and improve the coating quality.

According to the above object of the present invention, a plasma coating device is provided. The plasma coating device includes an ordinary piezoelectric plasma generator and at least one feeding fixture. A normal plasma generator is configured to generate a plasma. The normal piezoelectric slurry generator includes a tubular electrode and a rotating nozzle. A rotary nozzle is provided at the bottom of the tubular electrode. The rotating nozzle is configured to spray plasma in a rotating state. The rotating nozzle has a plasma nozzle and an outer surface, and the outer diameter of the lower part of the outer surface is gradually reduced from the bottom of the tubular electrode to the plasma nozzle. At least one feeding jig is disposed on the periphery of the outer side of the rotating nozzle, wherein the at least one feeding jig includes at least one precursor nozzle. The at least one feeding jig is configured to spray toward the rotation through the at least one precursor nozzle. The coating precursor is sprayed on the lower part of the outer side of the mouth. When the plasma nozzle ejects the plasma, a low-pressure area is formed near the plasma nozzle. The coating precursor is attracted by the low-pressure area and flows along the lower side of the outer side of the rotating nozzle to the plasma nozzle to react with the plasma.

According to an embodiment of the present invention, the at least one precursor ejection port of the at least one feeding jig is directly opposite the lower part of the outer side of the rotating nozzle.

According to an embodiment of the present invention, the at least one feeding jig includes an annular joint portion and an annular extension portion. The annular joint portion is enclosed outside the tubular electrode and / or the rotary nozzle, wherein the annular joint portion is not in contact with the rotary nozzle. The annular extension portion extends downward from the bottom of the annular joint portion, and at least one precursor spraying port is disposed in the annular extension portion.

According to an embodiment of the present invention, the above-mentioned annular extension portion has an annular flow channel, and the annular flow channel is in communication with at least one precursor ejection port.

According to an embodiment of the present invention, the at least one precursor ejection port includes a plurality of precursor ejection ports, and the precursor ejection ports have the same distance therebetween.

According to an embodiment of the present invention, the bottom surface of the annular extension is higher than the plasma nozzle of the rotary nozzle, and the height difference between the bottom surface of the annular extension and the plasma nozzle of the rotary nozzle is equal to or less than about 2 cm.

According to an embodiment of the present invention, the bottom surface of the annular extension is lower than the plasma nozzle of the rotary nozzle, and the height difference between the bottom surface of the annular extension and the plasma nozzle of the rotary nozzle is less than about 1 cm.

According to an embodiment of the present invention, the lower part of the outer side of the rotary nozzle is a slope.

According to an embodiment of the present invention, one of the sides of the inclined surface is the outer edge of the plasma nozzle.

According to an embodiment of the present invention, the lower portion of the outer surface of the rotary nozzle is a curved surface.

According to an embodiment of the present invention, the at least one feeding jig is fixed on the tubular electrode, and the at least one feeding jig does not rotate.

According to an embodiment of the present invention, the above-mentioned tubular electrode includes an upper portion and a lower portion connected to each other, the rotary nozzle is fixed to a lower portion of the tubular electrode, and the lower portion of the tubular electrode rotates together with the rotary nozzle.

According to an embodiment of the present invention, the at least one feeding jig includes a plurality of feeding jigs, and the feeding jigs are surrounded by a tubular electrode and / or a rotating nozzle, and the feeding jigs are not connected with Rotating nozzle contacts.

According to an embodiment of the present invention, the at least one precursor ejection nozzle includes a plurality of precursor ejection nozzles respectively located on the bottom surface of the feeding fixtures, and each precursor ejection nozzle is higher than the plasma ejection nozzle of the rotary nozzle, and each precursor The height difference between the nozzle and the plasma nozzle of the rotating nozzle is equal to or less than about 2 cm.

According to an embodiment of the present invention, the at least one precursor ejection nozzle includes a plurality of precursor ejection nozzles respectively located on the bottom surface of these feeding fixtures, and each precursor ejection nozzle is lower than the plasma ejection nozzle of the rotary nozzle, The height difference between the nozzle and the plasma nozzle of the rotating nozzle is less than about 1 cm.

According to an embodiment of the present invention, the coating precursor is a gas, a mist droplet, a liquid, or a powder.

100‧‧‧ Plasma coating device

100a‧‧‧ Plasma Coating Device

100b‧‧‧ Plasma Coating Device

110‧‧‧Ordinary piezoelectric plasma generator

112‧‧‧ Plasma

120‧‧‧ tubular electrode

120a‧‧‧upper

120b‧‧‧lower

122‧‧‧ Chamber

124‧‧‧ bottom

126‧‧‧Center axis

130‧‧‧rotating nozzle

130a‧‧‧rotating nozzle

132‧‧‧ outside

132a‧‧‧ outside

132b‧‧‧lower

132b’‧‧‧ lower

134‧‧‧ Underside

136‧‧‧ Plasma nozzle

138‧‧‧ side

140‧‧‧ rod electrode

150‧‧‧Feeding fixture

150a‧‧‧Feeding fixture

152‧‧‧ precursor spout

152a‧‧‧ precursor spout

154‧‧‧Ring junction

154b‧‧‧ bottom

156‧‧‧Circular extension

156b‧‧‧ Underside

156c‧‧‧Circular runner

158‧‧‧Circle

160‧‧‧Coated precursor

170‧‧‧ Power

180‧‧‧ Workpiece substrate

182‧‧‧ surface

184‧‧‧Coated

H‧‧‧height difference

h‧‧‧ height difference

In order to make the above and other objects, features, advantages, and embodiments of the present invention more comprehensible, the description of the drawings is as follows: [FIG. 1] A plasma coating device according to an embodiment of the present invention is shown [Fig. 2] is a schematic diagram showing a plasma coating apparatus according to an embodiment of the present invention; and [Fig. 3] is a schematic diagram showing a plasma coating apparatus according to an embodiment of the present invention.

Please refer to FIG. 1, which is a schematic diagram of a plasma coating device according to an embodiment of the present invention. Plasma coating apparatus 100 uses a reaction of plasma 112 and coating precursor 160 to coat a surface 182 of a workpiece substrate 180. The plasma coating device 100 may mainly include an ordinary piezoelectric plasma generator 110 and at least one feeding fixture 150. The constant pressure plasma generator 110 is configured to generate a plasma 112, and the feeding fixture 150 is configured to provide a coating precursor 160 to the constant pressure plasma generator 110.

In some embodiments, the piezoelectric paste generator 110 mainly includes a tubular electrode 120 and a rotating nozzle 130. The tubular electrode 120 has a chamber 122. The plasma 112 of the normal piezoelectric plasma generator 110 may be generated in the cavity 122 of the tubular electrode 120. In some exemplary examples, as shown in FIG. 1, the conventional piezoelectric plasma generator 110 may further include a rod-shaped electrode 140, wherein the rod-shaped electrode 140 is provided at Inside the chamber 122 of the tubular electrode 120. In such an example, the tubular electrode 120 may be referred to as an external electrode, and the rod-shaped electrode 140 may be referred to as an internal electrode. The two poles of the power source 170 are electrically connected to the tubular electrode 120 and the rod-shaped electrode 140 respectively, so that a potential difference is generated between the tubular electrode 120 and the rod-shaped electrode 140. The working gas used to generate the plasma may be introduced into the chamber 122 of the tubular electrode 120.

In other exemplary examples, in addition to the tubular electrode 120, the ordinary piezoelectric generator 100 further includes another tubular electrode, the other tubular electrode is disposed above the tubular electrode 120, and the cavity and The chamber 122 of the tubular electrode 120 communicates. The two poles of the power source 170 are electrically connected to the tubular electrode 120 and the other tubular electrode, respectively. The working gas used to generate the plasma may be introduced into the chamber 122 of the tubular electrode 120.

The rotary nozzle 130 is disposed on the bottom 124 of the tubular electrode 120, and the rotary nozzle 130 is opposite to the rod-shaped electrode 140. The rotary nozzle 130 is configured to spray the plasma 112 generated in the chamber 122 of the tubular electrode 120 in a rotating state. The rotating nozzle 130 can be rotated by the central axis 126 of the tubular electrode 120 as a rotation center. The rotary nozzle 130 has an outer surface 132 and a bottom surface 134, wherein the outer surface 132 of the rotary nozzle 130 can extend from the bottom 124 of the tubular electrode 120 to the bottom surface 134 of the rotary nozzle 130, and the bottom surface 124 of the tubular electrode 120 and the bottom surface of the rotary nozzle 130 134 joints. The rotary nozzle 130 may, for example, have a plasma nozzle 136, wherein the plasma nozzle 136 is located on the bottom surface 134 of the rotary nozzle 130. The plasma nozzle 112 may be ejected from the plasma nozzle 136 by the rotary nozzle 130 in a rotating manner. When the air flow of the plasma 112 is ejected from the plasma nozzle 136 of the rotary nozzle 130, a low-pressure region can be formed near the plasma nozzle 136. The outer diameter of the outer side 132 of the rotating nozzle 130 can be from the bottom 124 of the tubular electrode 120 to the plasma nozzle. 136 shrinks. In some exemplary examples, the outer surface 132 of the rotary nozzle 130 includes a lower portion 132b, which is adjacent to the plasma nozzle 136, and the outer diameter of the lower portion 132b can be tapered from the top of the lower portion 132b to the plasma nozzle 136. In the example shown in FIG. 1, the lower portion 132 b of the outer side surface 132 of the rotary nozzle 130 is an arc surface. The lower portion 132b of the outer side 132 of the rotary nozzle 130 may preferably have, for example, a streamlined profile.

The feeding jig 150 is provided on the periphery of the outer side surface 132 of the rotary nozzle 130. A part of the feeding jig 150 may be located on the periphery of the tubular electrode 120. The feeding fixture 150 includes at least one precursor spout 152. In some exemplary examples, the front-loading nozzle 152 of the feeding fixture 150 may face the lower portion 132b of the outer side 132 of the rotary nozzle 130. The feeding jig 150 is configured to spray the coating precursor 160 toward the lower portion 132b of the outer side 132 of the rotary nozzle 130 through the precursor nozzle 152, so that the coated precursor 160 flows to the electric power along the lower portion 132b of the outer side 132 of the rotary nozzle 130. In front of the plasma nozzle 136, it is mixed and reacted with the plasma 112 sprayed from the plasma nozzle 136. The feed fixture 150 is connected to a precursor source pipeline. The coating precursor 160 may be a gas, a mist droplet, a liquid, or a powder.

In some examples, the feed jig 150 does not rotate. The feeding jig 150 may be fixed on the tubular electrode 120, for example. In some exemplary examples, the tubular electrode 120 may include an upper portion 120a and a lower portion 120b, wherein the upper portion 120a and the lower portion 120b are interconnected, and the lower portion 120b is rotatably coupled to the bottom end of the upper portion 120a. The lower portion 120b of the tubular electrode 120 can be rotated around the central axis 126 of the tubular electrode 120 as a rotation center. The feeding jig 150 can be fixed to the upper part 120a of the tubular electrode 120, and the rotary nozzle 130 can be fixed to the tubular electrode 120a. 120 Lower part of the bottom 120b. In some exemplary examples, the lower portion 120b of the tubular electrode 120 rotates with the rotating nozzle 130, and the upper portion 120a of the tubular electrode 120 does not rotate.

The rotary nozzle 130 sprays the plasma 112 in a rotating manner, so that the sprayed plasma 112 also rotates. Therefore, the coating area of the plasma 112 during the coating operation can be expanded, and a large area coating can be performed to reduce the coating time and improve Productivity, and can reduce the temperature of the coated substrate 180 of the workpiece during coating, so that the material selection of the workpiece substrate 180 can be more diversified. In addition, when the rotating nozzle 130 ejects the plasma 112 flowing at a high speed, a low-pressure region is formed near the plasma nozzle 136. This low-pressure region may be attractive to the coating precursor 160. When the feeding fixture 150 sprays the coating precursor 160 toward the lower portion 132b of the outer side 132 of the rotary nozzle 130, the low-pressure area near the plasma nozzle 136 is used to attract the coating precursor 160, and the outer side 132 of the rotary nozzle 130 is used The outer diameter of the lower portion 132b is gradually reduced toward the plasma nozzle 136 to guide the coating precursor 160. Therefore, the coating precursor 160 can flow along the lower portion 132b of the outer side 132 of the rotary nozzle 130 to the front of the plasma nozzle 136, and instantly mix and react with the plasma 112 that is rotated by the plasma nozzle 136, and thus can be applied to the workpiece substrate 180. A plating film 184 is smoothly formed on the surface 182. Therefore, the application of the ordinary piezoelectric coating device 100 can not only effectively improve the problem of waste and pollution caused by the coating precursor 160 being dissipated in the atmosphere, but also can improve the uniform mixing of the coating precursor 160 and the plasma 112 in a very short time. This can avoid the problem of excessive reaction between the coating precursor 160 and the plasma 112, and can further improve the quality of the coating 184.

In the embodiment shown in FIG. 1, the plasma coating apparatus 100 includes a single feeding fixture 150. This feeding jig 150 is a ring-shaped feeding jig. In some examples, the feeding fixture 150 includes an annular joint 154 and an annular extension 156. The normal piezoelectric slurry generator 110 is disposed in the annular joint portion 154, and the annular joint portion 154 may be annularly disposed outside the rotary nozzle 130 and / or the tubular electrode 120. For example, the annular joint portion 154 is disposed outside the tubular electrode 120 and the rotating nozzle 130. The annular joint portion 154 is not in contact with the rotary nozzle 130. The annular extension portion 156 extends downward from the bottom portion 154 b of the annular joint portion 154. For example, the annular extension portion 156 extends downward from the outer peripheral edge of the bottom portion 154 b of the annular joint portion 154. The normal piezoelectric slurry generator 110 is disposed in the annular extension portion 156, and the annular extension portion 156 may be annularly disposed outside the rotary nozzle 130 and / or the tubular electrode 120. For example, the annular extension portion 156 is disposed outside the rotary nozzle 130. The annular extension 156 is separated from the rotary nozzle 130 by a distance, and an annular channel 158 can be formed between the annular extension 156 and the rotary nozzle 130.

A precursor spout 152 is provided in the annular extension 156. In some embodiments, the annular extension 156 has an annular flow channel 156c, and the feeding fixture 150 has a single precursor ejection port 152, wherein the former ejection port 152 is annular and communicates with the annular flow channel 156c. In some exemplary examples, the precursor nozzle 152 is opposite to the rotary nozzle 130 so as to spray the coated precursor 160 toward the outer side 132 of the rotary nozzle 130. After the coating precursor 160 is sprayed from the precursor nozzle 152 of the feeding fixture 150 to the outer side 132 of the rotary nozzle 130, it can be confined in the annular channel 158 between the annular extension 156 and the rotary nozzle 130. And then flow along the outer side 132 of the rotating nozzle 130 to the electricity Front of the nozzle 136. In some examples, as shown in FIG. 1, the bottom surface 156 b of the annular extension 156 is higher than the plasma nozzle 136 of the rotary nozzle 130, and between the bottom surface 156 b of the annular extension 156 and the plasma nozzle 136 of the rotary nozzle 130 The height difference H may be equal to or less than about 2 cm, for example. In other examples, the bottom surface 156b of the annular extension 156 is lower than the plasma nozzle 136 of the rotary nozzle 130, and the height difference H between the bottom surface 156b of the annular extension 156 and the plasma nozzle 136 of the rotary nozzle 130 is less than About 1 cm.

In other embodiments, the annular extension 156 of the feeding jig 150 has an annular flow channel 156c, and the feeding jig 150 has a plurality of precursor nozzles 152. These precursor nozzles 152 communicate with the annular flow passage 156c, and these precursor nozzles 152 are opposed to the rotary nozzle 130. The precursor nozzles 152 are arranged around the rotating nozzle 130, and the precursor nozzles 152 may have the same pitch or different pitches. In some specific examples, the annular extension 156 of the feeding jig 150 does not have an annular flow channel, and the precursor nozzles 152 are spaced apart from each other to independently spray the coating precursor 160 toward the rotary nozzle 130.

Please refer to FIG. 2, which is a schematic diagram of a plasma coating device according to an embodiment of the present invention. The structure of the plasma coating device 100a of this embodiment is substantially the same as the structure of the plasma coating device 100 of the above embodiment. The difference between the two is that the rotary nozzle 130a of the plasma coating device 100a and the plasma coating device 100 have the same structure. The structure of the rotary nozzle 130 is different.

In the plasma coating apparatus 100a, the lower portion 132b 'of the outer side surface 132a of the rotary nozzle 130a is an inclined surface, that is, an inclined plane, not an arc surface. In some exemplary examples, the lower portion 132b 'of the outer side 132a of the rotating nozzle 130a One side 138, that is, one side of the inclined plane, is the outer edge of the plasma nozzle 136. Therefore, the lower portion 132b 'of the outer side surface 132a of the rotary nozzle 130a extends obliquely to the plasma nozzle 136.

Please refer to FIG. 3, which is a schematic diagram of a plasma coating device according to an embodiment of the present invention. The structure of the plasma coating device 100b of this embodiment is substantially the same as the structure of the plasma coating device 100 of the above embodiment. The difference between the two is that the plasma coating device 100b includes a plurality of feeding fixtures 150a, and these The structure of the feeding fixture 150 a is different from the structure of the feeding fixture 150 of the plasma coating apparatus 100.

In the plasma coating device 100b, these feeding fixtures 150a are surrounded outside the tubular electrode 120 and / or the rotary nozzle 130. For example, the feeding jigs 150 a are enclosed outside the outer side surface 132 of the rotary nozzle 130. The feeding fixtures 150a are not in contact with the rotating nozzle 130, and the feeding fixtures 150a may not be rotated. Each of the feeding fixtures 150a includes at least one precursor spout 152a, and the precursor spouts 152 are located on the bottom surface of the feeding fixture 150a. In some exemplary examples, the feed nozzles 152 a of the feed fixtures 150 a may face the lower portion 132 b of the outer side 132 of the rotary nozzle 130.

In some examples, the precursor nozzle 152a of each feed fixture 150a is higher than the plasma nozzle 136 of the rotary nozzle 130, and the height difference h between each precursor nozzle 152a and the plasma nozzle 136 of the rotary nozzle 130 is h Can be equal to or less than about 2 cm. In some specific examples, the precursor nozzle 152a of each feed fixture 150a is lower than the plasma nozzle 136 of the rotary nozzle 130, and the height difference between each precursor nozzle 152a and the plasma nozzle 136 of the rotary nozzle 130 h may be less than about 1 cm.

It can be known from the above embodiments that one advantage of the present invention is that the feeding fixture of the plasma coating device of the present invention is located adjacent to the periphery of the rotary nozzle, thereby not only providing a rotary plasma for large-area coating, It can reduce the temperature of the workpiece to be coated during coating, and it can also solve the problem of contamination of the coating materials inside the rotating nozzle and the tubular electrode on it, which can improve the stability of the plasma, and can efficiently perform the coating operation and improve the coating. quality.

Although the present invention has been disclosed as above by way of example, it is not intended to limit the present invention. Any person with ordinary knowledge in this technical field can make various changes and modifications without departing from the spirit and scope of the present invention. Therefore, the protection scope of the present invention shall be determined by the scope of the appended patent application.

Claims (16)

A plasma coating device includes: an ordinary piezoelectric plasma generator configured to generate a plasma, wherein the ordinary piezoelectric plasma generator includes: a tubular electrode; and a rotary nozzle provided at a bottom of one of the tubular electrodes Wherein the rotary nozzle is configured to spray the plasma in a rotating state, the rotary nozzle has a plasma nozzle and an outer side, and an outer diameter of a lower part of the outer side is from the bottom of the tubular electrode to the The direction of the plasma nozzle is tapered; and at least one feeding fixture is provided on the periphery of the outer side of the rotary nozzle, wherein the at least one feeding fixture includes at least one precursor nozzle and the at least one feeding fixture Configured to spray a coating precursor toward the lower portion of the outer side of the rotary nozzle through the at least one precursor spray port, wherein when the plasma spray port sprays the plasma, a low-pressure region is formed near the plasma spray port, the coating film The precursor is attracted by the low-pressure region and flows along the lower portion of the outer side of the rotary nozzle to the plasma nozzle to react with the plasma. For example, the plasma coating device of the scope of patent application, wherein the at least one precursor nozzle of the at least one feeding jig is facing the lower part of the outer side of the rotary nozzle. For example, the plasma coating device of item 1 of the patent application scope, wherein the at least one feeding jig includes: a ring-shaped joint portion surrounding the tubular electrode and / or the rotary nozzle, wherein the ring-shaped joint portion is Not in contact with the rotary nozzle; and an annular extension portion extending downward from a bottom of the annular joint portion, wherein the at least one precursor nozzle is provided in the annular extension portion. For example, the plasma coating device according to item 3 of the patent application, wherein the annular extension portion has an annular flow channel, and the annular flow channel is in communication with the at least one precursor ejection port. For example, the plasma coating device for item 4 of the patent application scope, wherein the at least one precursor nozzle includes a plurality of precursor nozzles, and the precursor nozzles have the same distance therebetween. For example, the plasma coating device of the third item of the patent application, wherein a bottom surface of one of the annular extensions is higher than the plasma nozzle of the rotary nozzle, and the bottom surface of the annular extension and the plasma of the rotary nozzle One of the nozzles has a height difference of 2 cm or less. For example, the plasma coating device for item 3 of the patent application scope, wherein a bottom surface of one of the annular extensions is lower than the plasma nozzle of the rotary nozzle, and the bottom surface of the annular extension and the plasma of the rotary nozzle The height difference of one of the spouts is less than 1 cm. For example, the plasma coating device of the first patent application range, wherein the lower part of the outer side of the rotary nozzle is an inclined surface. For example, the plasma coating device for item 8 of the patent scope, wherein one side of the inclined surface is an outer edge of the plasma nozzle. For example, the plasma coating device of the first patent application range, wherein the lower part of the outer surface of the rotary nozzle is an arc surface. For example, the plasma coating device according to item 1 of the application, wherein the at least one feeding fixture is fixed on the tubular electrode, and the at least one feeding fixture does not rotate. For example, the plasma coating device of the first patent application range, wherein the tubular electrode includes an upper portion and a lower portion connected to each other, the rotary nozzle is fixed to the lower portion of the tubular electrode, and the lower portion of the tubular electrode and the rotary nozzle Rotate together. For example, the plasma coating device of the scope of patent application, wherein the at least one feeding jig includes a plurality of feeding jigs, the feeding jigs are enclosed outside the tubular electrode and / or the rotating nozzle, and The feeding jigs are not in contact with the rotating nozzle. For example, the plasma coating device according to item 13 of the patent application, wherein the at least one precursor nozzle includes a plurality of precursor nozzles respectively located on the bottom surface of the feeding fixtures, and each of the precursor nozzles is higher than the rotary nozzle. For the plasma nozzle, a height difference between each of the precursor nozzles and the plasma nozzle of the rotary nozzle is equal to or less than 2 cm. For example, the plasma coating device according to item 13 of the patent application, wherein the at least one precursor spray nozzle includes a plurality of precursor spray nozzles respectively located on the bottom surface of the feeding fixtures, and each of the precursor spray nozzles is lower than the rotary nozzle For the plasma nozzle, the height difference between each of the precursor nozzles and the plasma nozzle of the rotary nozzle is less than 1 cm. For example, the plasma coating device according to item 1 of the application, wherein the coating precursor is a gas, a mist droplet, a liquid, or a powder.