TWI656038B - Laminate, conductive laminate and touch panel - Google Patents
Laminate, conductive laminate and touch panel Download PDFInfo
- Publication number
- TWI656038B TWI656038B TW104124193A TW104124193A TWI656038B TW I656038 B TWI656038 B TW I656038B TW 104124193 A TW104124193 A TW 104124193A TW 104124193 A TW104124193 A TW 104124193A TW I656038 B TWI656038 B TW I656038B
- Authority
- TW
- Taiwan
- Prior art keywords
- layer
- film
- contact angle
- low contact
- laminated body
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/04—Interconnection of layers
- B32B7/12—Interconnection of layers using interposed adhesives or interposed materials with bonding properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B33/00—Layered products characterised by particular properties or particular surface features, e.g. particular surface coatings; Layered products designed for particular purposes not covered by another single class
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2250/00—Layers arrangement
- B32B2250/03—3 layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
- B32B2457/20—Displays, e.g. liquid crystal displays, plasma displays
- B32B2457/208—Touch screens
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
Landscapes
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Theoretical Computer Science (AREA)
- Human Computer Interaction (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Laminated Bodies (AREA)
- Position Input By Displaying (AREA)
- Non-Insulated Conductors (AREA)
Abstract
本發明提供一種即便於將附黏著層之膜貼合於基材膜之與透明導電層側為相反側之面並實施加熱處理後將該附黏著層之膜剝離之情形時,亦可較佳地防止貼合有該附黏著層之膜之面之水之接觸角增大而接著性降低之積層體。 The present invention provides a case in which a film with an adhesive layer is preferably applied even when the film with an adhesive layer is adhered to the surface of the base film opposite to the transparent conductive layer side and the film is peeled after the heat treatment is performed. The laminated body which prevents the contact angle of water from increasing on the surface to which the film with the adhesive layer is attached and the adhesiveness thereof is reduced.
本發明之積層體於基材膜之一面上具有一層以上之光學功能層,於上述基材膜之另一面上具有低接觸角層,該積層體係用以在上述光學功能層之與上述基材膜側為相反側之面上形成經圖案化之透明導電層者,其特徵在於:於將附黏著層之膜貼合於上述低接觸角層之表面,並於150℃、60分鐘之條件進行加熱後將上述附黏著層之膜剝離時上述低接觸角層之表面之由JIS K6768(1999)所規定之潤濕張力為30mN/m以上。 The laminated body of the present invention has one or more optical functional layers on one side of the base film, and a low contact angle layer on the other side of the base film. The laminated system is used for connecting the optical functional layer to the base. The film side is a patterned transparent conductive layer formed on the opposite side, which is characterized in that the film with the adhesive layer is adhered to the surface of the above-mentioned low contact angle layer and is performed at 150 ° C for 60 minutes. When the film with the adhesive layer is peeled off after heating, the wetting tension specified by JIS K6768 (1999) on the surface of the low contact angle layer is 30 mN / m or more.
Description
本發明係關於一種積層體、導電性積層體及觸控面板。 The invention relates to a laminated body, a conductive laminated body and a touch panel.
目前,作為具備具有液晶顯示面板等顯示面板之顯示裝置之各種裝置、例如PDA(Personal Digital Assistants)、可攜資訊終端、汽車導航系統等之輸入手段,廣泛使用有觸控面板。 Currently, touch panels are widely used as input means for various devices including display devices having a display panel such as a liquid crystal display panel, such as PDA (Personal Digital Assistants), portable information terminals, and car navigation systems.
觸控面板係具備於基材膜上設置包含ITO(銦錫氧化物)、金屬纖維、奈米碳管等之透明導電層而成之透明導電性膜者,通常係與顯示面板分開製造,並配置於上述顯示面板之前表面。 A touch panel is a transparent conductive film provided with a transparent conductive layer including ITO (indium tin oxide), metal fibers, carbon nanotubes, etc. on a base film, and is usually manufactured separately from a display panel, and It is arranged on the front surface of the display panel.
此處,包含ITO等之透明導電層或光學調整層之整個層或者一部分通常係經過濺鍍處理而設置於基材膜上,該濺鍍處理於使用有輥之輥對輥(roll-to-roll)之狀態下進行,該輥捲繞有基材膜,此時基材膜表面因來自濺鍍處理時之電漿之二次電子而被加熱至90℃以上。因此,於濺鍍處理中,存在於搬送時基材膜產生褶皺或歪扭等問題。對於此種問題,已知有例如藉由於基材膜之抵接於導輥之面(與實施濺鍍處理之面為相反側之面)貼合保護膜而改善搬送時所產生之褶皺或歪扭之方法(例如參照專利文獻1)。 Here, the entire layer or a part of a transparent conductive layer or an optical adjustment layer containing ITO or the like is usually provided on a substrate film by a sputtering process, which is performed on a roll-to-roll using a roll It is carried out in a state of roll), and the roll is wound with a base film. At this time, the surface of the base film is heated to 90 ° C. or higher due to secondary electrons from the plasma during the sputtering process. Therefore, in the sputtering process, there is a problem that the base film is wrinkled or twisted during transportation. For such a problem, for example, it is known to improve the wrinkles or distortion generated during transportation by bonding the protective film to the surface of the base film that is in contact with the guide roller (the surface opposite to the surface on which the sputtering process is performed). Twist method (for example, refer to Patent Document 1).
而且,關於形成有此種透明導電層之透明導電性膜,於將保護膜剝離後,介隔黏著層而將其他功能性構件(偏光板等)貼附於基材膜之貼合有保護膜之側之面。 In addition, for a transparent conductive film having such a transparent conductive layer formed thereon, after the protective film is peeled off, another functional member (polarizing plate, etc.) is attached to the base film through a protective layer, and the protective film is bonded. Side face.
然而,藉由濺鍍處理而形成之透明導電層存在如下情況:為 了實現低電阻化、提高透明性、及提高耐久性,視需要於150℃左右之高溫進行加熱處理而使其結晶化。 However, the transparent conductive layer formed by the sputtering process has the following cases: In order to reduce the resistance, improve the transparency, and improve the durability, if necessary, heat treatment at a high temperature of about 150 ° C to crystallize it.
又,通常已知即便於為了實現藉由省除製造步驟中之真空製程而降低成本,又,為了提高透明導電性膜之彎折性而使用例如金屬纖維、奈米碳管等作為ITO以外之導電性材料之情形時,藉由於110~150℃左右之條件進行加熱處理,導電材料重疊存在之部分亦會分別熔解、密合而導通,從而可極佳地實現低電阻化。 In addition, it is generally known to use metal fibers, carbon nanotubes, etc. as materials other than ITO in order to reduce costs by eliminating the vacuum process in the manufacturing steps, and to improve the bendability of transparent conductive films. In the case of conductive materials, heat treatment is performed at a temperature of about 110 to 150 ° C, and the portions where the conductive materials overlap are also melted, adhered, and turned on, thereby achieving excellent resistance reduction.
又,透明導電性膜周邊之配線係藉由對銀膏進行燒成而製 成,因此於製作透明導電性膜周邊之配線時,於120~140℃左右之條件下對透明導電性膜進行加熱。 The wiring around the transparent conductive film is made by firing a silver paste. Therefore, when making wiring around the transparent conductive film, the transparent conductive film is heated at about 120 to 140 ° C.
進而,於透明導電性膜中,為了抑制因圖案化後由加熱引起之尺寸變化而導致配線之間隔偏移,有時會於圖案化之前於150℃左右之條件下對透明導電性膜進行加熱而調整基材之收縮率。 Furthermore, in the transparent conductive film, in order to suppress the gap between the wirings from being shifted due to dimensional changes caused by heating after patterning, the transparent conductive film may be heated at about 150 ° C before patterning. And adjust the shrinkage of the substrate.
然而,於上述加熱時,存在源自上述保護膜之黏著層之低分 子成分於導電性積層體之貼合有上述保護膜之面發生移動之情況。若產生此種低分子成分之移動,則存在將上述保護膜剝離後之面之水之接觸角增大(即,潤濕性降低),其後與其他光學構件貼附時介隔黏著構件之接著性降低或液狀黏著劑或液狀接著劑不易塗開等問題。 However, at the time of the above-mentioned heating, there is a low score of the adhesive layer derived from the above-mentioned protective film. The sub-component may move on the surface of the conductive laminated body to which the protective film is attached. If such a movement of the low-molecular component occurs, there is an increase in the contact angle of water on the surface after the protective film is peeled off (that is, the wettability is reduced), and thereafter, when it is attached to other optical members, the adhesive member is separated through the adhesive member. The adhesiveness is lowered, or the liquid adhesive or the liquid adhesive is difficult to spread.
例如,於專利文獻2中揭示有將於基材膜上控制了水之接觸 角的硬塗膜用於靜電電容方式之觸控面板,但並未有任何關於實施加熱處理後之水之接觸角之研究。 For example, Patent Document 2 discloses that water contact is controlled on a substrate film. The corner hard coating film is used for a capacitive touch panel, but there has not been any research on the contact angle of water after heat treatment.
[專利文獻1]日本特開2012-194644號公報 [Patent Document 1] Japanese Patent Application Publication No. 2012-194644
[專利文獻2]日本特開2011-177938號公報 [Patent Document 2] Japanese Patent Application Laid-Open No. 2011-177938
本發明鑒於上述現狀,目的在於提供一種即便於將附黏著層之膜貼合於基材膜之與透明導電層側為相反側之面並實施加熱處理後將該附黏著層之膜剝離之情形時,亦可較佳地防止貼合有該附黏著層之膜之面之水之接觸角增大而接著性降低之積層體、導電性積層體及觸控面板。 The present invention has been made in view of the foregoing circumstances, and an object thereof is to provide a case where the film of the adhesive layer is peeled off after the film of the adhesive layer is bonded to the surface of the base film opposite to the transparent conductive layer side and the heat treatment is performed. In this case, a laminated body, a conductive laminated body, and a touch panel in which the contact angle of water on the surface to which the film with the adhesive layer is attached is increased and the adhesion is reduced can be better prevented.
本發明係一種積層體,其於基材膜之一面上具有一層以上之光學功能層,於上述基材膜之另一面上具有低接觸角層,該積層體係用以在上述光學功能層之與上述基材膜側為相反側之面上形成經圖案化之透明導電層者,其特徵在於:於將附黏著層之膜貼合於上述低接觸角層之表面,在150℃、60分鐘之條件加熱後,將上述附黏著層之膜剝離時,上述低接觸角層之表面由JIS K6768(1999)所規定之潤濕張力為30mN/m以上。 The present invention is a laminated body having one or more optical functional layers on one side of a base film and a low contact angle layer on the other side of the base film. The laminated system is used for the combination of the optical functional layers. The substrate film side is a patterned transparent conductive layer formed on the opposite side, which is characterized in that the film with an adhesive layer is adhered to the surface of the low contact angle layer at 150 ° C for 60 minutes. When the film with the adhesive layer is peeled off after heating under conditions, the surface of the low contact angle layer has a wetting tension of 30 mN / m or more as specified by JIS K6768 (1999).
本發明之積層體較佳為:貼合附黏著層之膜前之低接觸角層之表面由JIS K6768(1999)所規定之潤濕張力、與於150℃、60分鐘之條件加熱後將上述附黏著層之膜剝離後上述低接觸角層之表面由JIS K6768(1999)所規定之潤濕張力的差為20mN/m以下。 The laminated body of the present invention is preferably such that the surface of the low contact angle layer before laminating the film with the adhesive layer is adhered to the wetting tension specified by JIS K6768 (1999) and heated at 150 ° C for 60 minutes to heat the above. After the film with the adhesion layer is peeled off, the difference in the wetting tension of the surface of the low contact angle layer specified by JIS K6768 (1999) is 20 mN / m or less.
又,較佳為具有選自由硬塗層、高折射率層及低折射率層所組成之群中之至少一層來作為一層以上之光學功能層。 Moreover, it is preferable to have at least one layer selected from the group consisting of a hard coat layer, a high refractive index layer, and a low refractive index layer as one or more optical functional layers.
又,較佳為高折射率層及低折射率層依序被積層於基材膜上而作為一層以上之光學功能層。 In addition, it is preferable that the high refractive index layer and the low refractive index layer are sequentially laminated on the base film to serve as one or more optical functional layers.
又,較佳為硬塗層、高折射率層及低折射率層依序被積層於基材膜上而作為一層以上之光學功能層。 In addition, it is preferable that the hard coat layer, the high refractive index layer, and the low refractive index layer are sequentially laminated on the substrate film as one or more optical functional layers.
又,較佳為硬塗層、高折射率層及低折射率層依序被積層於基材膜上而作為上述一層以上之光學功能層者。 In addition, it is preferable that a hard coat layer, a high refractive index layer, and a low refractive index layer are sequentially laminated on a base film to serve as one or more optical functional layers.
又,較佳為上述低接觸角層係由未硬化之(甲基)丙烯酸樹脂單獨構成或由含有上述未硬化之(甲基)丙烯酸樹脂之組成物構成。 The low contact angle layer is preferably composed of an uncured (meth) acrylic resin alone or a composition containing the uncured (meth) acrylic resin.
又,較佳為上述基材膜之低接觸角層側被賦予硬塗性能。 Moreover, it is preferable that the low-contact-angle-layer side of the said base film is given hard-coating property.
又,較佳為上述低接觸角層具有硬塗性能。 Moreover, it is preferable that the said low contact angle layer has a hard-coating property.
又,較佳為於上述低接觸角層與基材膜之間具有硬塗層。 Moreover, it is preferable to have a hard-coat layer between the said low contact angle layer and a base film.
又,較佳為上述透明導電層含有銦錫氧化物或導電性纖維狀填料。 The transparent conductive layer preferably contains indium tin oxide or a conductive fibrous filler.
又,本發明亦為一種導電性積層體,其特徵在於:其於上述積層體之光學功能層之與基材膜側為相反側之面上形成有經圖案化之透明導電層。 In addition, the present invention is also a conductive laminated body characterized in that a patterned transparent conductive layer is formed on a surface of the optical functional layer of the laminated body opposite to the substrate film side.
又,本發明亦為一種觸控面板,其特徵在於:具備上述導電性積層體。 The present invention is also a touch panel including the above-mentioned conductive laminate.
以下,對本發明詳細地進行說明。 Hereinafter, the present invention will be described in detail.
本發明人等對先前之課題進行了努力研究,結果發現,於在基材膜之與形成透明導電層之側為相反側之面依序形成有低接觸角層及附黏著層之膜之積層體中,藉由以於實施加熱處理而將上述附黏著層之膜剝 離時上述低接觸角層之貼合有附黏著層之膜之面之由JIS K6768(1999)所規定之潤濕張力成為特定之範圍之方式進行控制,可較佳地防止接著性之降低,從而完成了本發明。 The present inventors have made diligent research on the previous subject, and as a result, have found that a laminate of a low contact angle layer and a film with an adhesion layer is sequentially formed on the surface of the base film opposite to the side where the transparent conductive layer is formed. In the body, the film with the adhesive layer is peeled by performing a heat treatment. When the above-mentioned low contact angle layer is adhered to the surface of the film with the adhesive layer, the wetting tension specified by JIS K6768 (1999) is controlled in a specific range, which can better prevent the decrease in adhesiveness. Thus, the present invention has been completed.
再者,由本案發明人等之研究而首次發現如下課題:於對先前之在基材膜上介隔黏著層貼附有附黏著層之膜之積層體進行加熱處理後將附黏著層之膜剝離時,於貼附有該附黏著層之膜之低接觸角層之面會產生水之接觸角增大。 In addition, the research by the inventors of the present case found the following problem for the first time: after heating the laminated body with a film with an adhesive layer attached to the substrate film through the adhesive layer, the film with the adhesive layer was heated. During peeling, the contact angle of water will increase on the surface of the low contact angle layer to which the film with the adhesive layer is attached.
又,於本說明書中,所謂「透明導電膜」中之「透明」,意指於面內具有使可見光透過之區域,亦可實質上為半透明。又,所謂「透明」,具體而言,例如係指波長550nm下之透光率為50%以上。 In addition, in the present specification, "transparent" in the "transparent conductive film" means that there is a region in a plane that transmits visible light, and it may be substantially translucent. The term "transparent" specifically refers to, for example, a light transmittance of 50% or more at a wavelength of 550 nm.
本發明之積層體於基材膜之一面上具有低接觸角層。 The laminated body of the present invention has a low contact angle layer on one surface of the base film.
藉由具有上述低接觸角層,即便於下述用以使透明導電層結晶化之加熱後將附黏著層之膜剝離之情形時,亦可抑制於貼附有該附黏著層之膜之低接觸角層之面的水之接觸角增大,從而可防止該面之接著性降低。 By having the above-mentioned low contact angle layer, even when the film with an adhesive layer is peeled off after the heating for crystallizing the transparent conductive layer described below, the level of the film with the adhesive layer can be suppressed. The contact angle of water on the surface of the contact angle layer is increased, so that the adhesion of the surface can be prevented from decreasing.
即,認為先前之於基材膜上介隔黏著層貼附有附黏著層之膜之積層體之水之接觸角之增大,係由因上述積層體之加熱處理而使上述黏著層之低分子成分於基材膜表面移動而引起。 That is, it is considered that the increase in the contact angle of water of the laminated body to which the film with the adhesive layer was attached on the substrate film through the adhesive layer was caused by the heat treatment of the laminated body to make the adhesive layer low. Caused by molecular components moving on the surface of the substrate film.
相對於此,於本發明之積層體中,於基材膜之與透明導電層側為相反側之表面設置有低接觸角層,於該低接觸角層上進而貼附有附黏著層之膜。該附黏著層之膜通常係介隔黏著層而貼附於低接觸角層上,推測即便如先前之積層體般黏著層之低分子成分於低接觸角層側移動,亦可藉由構成該低接觸角層之成分覆蓋上述低分子成分或於剝離上述附黏著層之膜時 上述低接觸角層之一部分發生表層剝離,而抑制於將上述附黏著層之膜剝離後之面產生水之接觸角增大。 In contrast, in the laminated body of the present invention, a low contact angle layer is provided on the surface of the substrate film opposite to the transparent conductive layer side, and a film with an adhesion layer is further attached to the low contact angle layer. . The film with the adhesive layer is usually attached to the low contact angle layer through the adhesive layer. It is speculated that even if the low molecular component of the adhesive layer is moved to the low contact angle layer side like the previous laminated body, it can also be constituted by When the component of the low contact angle layer covers the above-mentioned low-molecular component or when the film with the adhesive layer is peeled off A part of the low contact angle layer is peeled off from the surface layer, and the contact angle at which water is generated on the surface after peeling the film with the adhesion layer is suppressed from increasing.
關於上述低接觸角層,將附黏著層之膜貼合於上述低接觸角 層之表面,於150℃、60分鐘之條件加熱後將上述附黏著層之膜剝離時上述低接觸角層之表面之由JIS K6768(1999)所規定之潤濕張力為30mN/m以上。若未達30mN/m,則上述低接觸角層之貼附有附黏著層之膜之面對其他光學構件之接著性變得不足,液狀黏著劑或液狀接著劑之塗展性亦變得不充分。 Regarding the low contact angle layer, a film with an adhesive layer is bonded to the low contact angle. When the surface of the layer is heated at 150 ° C. for 60 minutes and the film with the adhesive layer is peeled off, the wetting tension specified by JIS K6768 (1999) on the surface of the low contact angle layer is 30 mN / m or more. If it is less than 30 mN / m, the adhesion of the film with the adhesion layer on the low contact angle layer described above to other optical members becomes insufficient, and the spreadability of the liquid adhesive or liquid adhesive also changes. Not enough.
上述低接觸角層之表面之由JIS K6768(1999)所規定之潤濕張力較佳為35mN/m以上,更佳為40mN/m以上。 The wetting tension specified by JIS K6768 (1999) on the surface of the low contact angle layer is preferably 35 mN / m or more, and more preferably 40 mN / m or more.
再者,於本發明中,與包含金屬纖維等之透明導電層中之為了實現低電阻化而進行之加熱、製作透明導電性膜周邊之配線時之加熱、及為了調整基材之收縮率而進行之加熱等相比,為了使包含ITO之透明導電層結晶化而進行之加熱條件(150℃、60分鐘)最為嚴格,因此採用該加熱條件(150℃、60分鐘)。 Furthermore, in the present invention, heating with a transparent conductive layer containing a metal fiber or the like to reduce resistance, heating during the production of wiring around the transparent conductive film, and adjustment of the shrinkage of the substrate The heating conditions (150 ° C, 60 minutes) for crystallizing the transparent conductive layer containing ITO are the most severe compared to the heating, etc., so this heating conditions (150 ° C, 60 minutes) are used.
上述低接觸角層較佳為下述貼合附黏著層之膜之前之低接 觸角層之表面之由JIS K6768(1999)所規定之潤濕張力與於150℃、60分鐘之條件加熱後將上述附黏著層之膜剝離後之上述低接觸角層之表面之由JIS K6768(1999)所規定之潤濕張力的差為20mN/m以下。 The low-contact-angle layer is preferably a low-contact layer before the following film is attached to the adhesive layer. The surface of the antenna layer has the wetting tension specified by JIS K6768 (1999) and the surface of the low contact angle layer after being peeled off the film with the adhesive layer after heating at 150 ° C for 60 minutes. The surface of the low contact angle layer is formed by JIS K6768 ( The difference in wetting tension specified in 1999) is 20 mN / m or less.
若上述潤濕張力之差為20mN/m以下,則可較佳地抑制於將上述附黏著層之膜剝離後之面產生水之接觸角增大。 If the difference in the wetting tension is 20 mN / m or less, the increase in the contact angle of water generated on the surface after the film of the adhesive layer is peeled off can be better suppressed.
上述潤濕張力之差更佳為10mN/m以下。 The difference in the wetting tension is more preferably 10 mN / m or less.
於本發明之積層體中,作為上述低接觸角層,例如可列舉由 苯乙烯系樹脂、(甲基)丙烯酸系樹脂、乙酸乙烯酯系樹脂、乙烯醚系樹脂、含鹵素之樹脂、脂環式烴系樹脂、聚碳酸酯系樹脂、聚酯系樹脂、聚醯胺系樹脂、纖維素衍生物、聚矽氧系樹脂及橡膠或彈性體等構成者。其中,較佳為由未硬化之(甲基)丙烯酸系樹脂單獨構成或由含上述未硬化之(甲基)丙烯酸系樹脂之組成物構成。此種低接觸角層可較佳地防止接著性降低。 In the laminated body of the present invention, as the low contact angle layer, for example, Styrene resin, (meth) acrylic resin, vinyl acetate resin, vinyl ether resin, halogen-containing resin, alicyclic hydrocarbon resin, polycarbonate resin, polyester resin, polyamide Based resins, cellulose derivatives, silicone resins, and rubber or elastomers. Among these, it is preferable that it is comprised by the uncured (meth) acrylic-type resin alone or by the composition containing the said uncured (meth) acrylic-type resin. Such a low contact angle layer can better prevent a decrease in adhesion.
此外,所謂上述「未硬化」,係指構成上述低接觸角層之樹脂雖未被實施硬化處理,但該低接觸角層無觸黏感之狀態。 The "uncured" refers to a state in which the resin constituting the low contact angle layer has not been cured, but the low contact angle layer has no tacky feel.
又,所謂「無觸黏感之狀態」,具體而言,係指於使手指接觸低接觸角層時,於手指貼附於低接觸角層之狀態或使手指於低接觸角層上滑動時不會被卡住之狀態。 The "non-tacky state" specifically refers to a state in which a finger is in contact with a low contact angle layer, a state in which a finger is attached to a low contact angle layer, or a finger is slid over a low contact angle layer. Will not be stuck.
此外,於本說明書中,「(甲基)丙烯酸酯」係指甲基丙烯酸酯及丙烯酸酯,所謂「樹脂」,只要未特別提及,則為亦包含單體、低聚物、聚合物等之概念。 In addition, in the present specification, "(meth) acrylate" means methacrylate and acrylate. The so-called "resin" includes monomers, oligomers, polymers, etc., unless otherwise mentioned. Concept.
構成上述低接觸角層之樹脂較佳為重量平均分子量為5000 ~50萬。若未達5000,則存在未硬化時之上述低接觸角層會產生觸黏感之情況,若超過50萬,則存在用以形成低接觸角層之組成物之黏度變得過高而無法均勻地塗佈之情況。上述重量平均分子量之更佳下限為7000,更佳上限為20萬。 The resin constituting the above-mentioned low contact angle layer preferably has a weight average molecular weight of 5000 ~ 500,000. If it is less than 5,000, there may be cases where the above-mentioned low contact angle layer is tacky when it is not hardened. If it exceeds 500,000, the viscosity of the composition used to form the low contact angle layer becomes too high to be uniform. Ground coating. The more preferable lower limit of the weight average molecular weight is 7,000, and the more preferable upper limit is 200,000.
此外,於本說明書中,上述重量平均分子量係藉由利用凝膠滲透層析法(GPC)之聚苯乙烯換算而求出之值。 In addition, in this specification, the said weight average molecular weight is a value calculated | required by polystyrene conversion by gel permeation chromatography (GPC).
構成上述低接觸角層之樹脂較佳為雙鍵當量為100以上。若 未達100,則存在如下情況:不僅有難以合成聚合物,玻璃轉移點(Tg)降低之虞,即便合成了聚合物,未硬化時之上述低接觸角層亦會產生觸黏感。 The resin constituting the low contact angle layer preferably has a double bond equivalent of 100 or more. If If it is less than 100, it is not only difficult to synthesize the polymer, but the glass transition point (Tg) may be reduced. Even if the polymer is synthesized, the above-mentioned low contact angle layer may have a tacky feeling when it is not cured.
再者,所謂構成上述低接觸角層之樹脂之雙鍵當量,係由 In addition, the double bond equivalent of the resin constituting the low contact angle layer is determined by
(化合物之1分子之分子量)/(化合物1分子中所含之雙鍵之數量)定義之值。 (Molecular weight of one molecule of the compound) / (Number of double bonds contained in the molecule of compound 1).
構成上述低接觸角層之樹脂較佳為溶劑乾燥型樹脂。 The resin constituting the low contact angle layer is preferably a solvent-drying resin.
所謂上述溶劑乾燥型樹脂,意指於塗佈含該樹脂與溶劑之組成物時藉由僅使上述溶劑乾燥便會成為被膜之樹脂。 The above-mentioned solvent-drying resin means a resin that becomes a film by drying only the above-mentioned solvent when coating a composition containing the resin and a solvent.
構成上述低接觸角層之樹脂較佳為1分子中不具有反應性官能基。若構成上述低接觸角層之樹脂於1分子中具有反應性官能基,則存在於塗佈含該樹脂之組成物而形成低接觸角層時會產生觸黏感之情況。 The resin constituting the low contact angle layer preferably does not have a reactive functional group in one molecule. If the resin constituting the low contact angle layer has a reactive functional group in one molecule, a tacky feeling may occur when a composition containing the resin is applied to form a low contact angle layer.
此外,所謂上述「於1分子中不具有反應性官能基」,除於構成上述低接觸角層之樹脂之分子中完全不包含反應性官能基之情形以外,亦可於可維持低接觸角層無觸黏感之狀態之範圍內於1分子中具有反應性官能基。 In addition, the above-mentioned "without reactive functional group in one molecule" can also maintain the low contact angle layer in addition to the case where the reactive polymer group is not included in the molecule of the resin constituting the low contact angle layer at all. Within the range of no tackiness state, there is a reactive functional group in one molecule.
上述低接觸角層可藉由將含構成上述低接觸角層之樹脂與 溶劑之組成物(以下亦稱為低接觸角層用組成物)塗佈於上述基材膜之與形成透明導電層之側為相反側之面上並使所形成之塗膜乾燥而形成。 The low contact angle layer can be formed by combining a resin containing the low contact angle layer and A composition of a solvent (hereinafter also referred to as a composition for a low contact angle layer) is formed by coating the surface of the substrate film on the side opposite to the side where the transparent conductive layer is formed and drying the formed coating film.
作為上述溶劑,可根據所使用之樹脂成分之種類及溶解性而選擇並使用,例如可例示:酮類(丙酮、甲基乙基酮、甲基異丁基酮、環己酮、二丙酮醇等)、醚類(二烷、四氫呋喃、丙二醇單甲醚、丙二醇單甲醚乙酸酯等)、脂肪族烴類(己烷等)、脂環式烴類(環己烷等)、芳香族烴類(甲苯、二甲苯等)、鹵化碳類(二氯甲烷、二氯乙烷等)、酯類(乙酸甲酯、 乙酸乙酯、乙酸丁酯等)、水、醇類(乙醇、異丙醇、丁醇、環己醇等)、賽璐蘇類(甲基賽璐蘇、乙基賽璐蘇等)、乙酸賽璐蘇類、亞碸類(二甲基亞碸等)、及醯胺類(二甲基甲醯胺、二甲基乙醯胺等)等,亦可為該等之混合溶劑。 The solvent can be selected and used according to the type and solubility of the resin component used, and examples thereof include ketones (acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, and diacetone alcohol). Etc.), ethers (two Alkane, tetrahydrofuran, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, etc.), aliphatic hydrocarbons (hexane, etc.), alicyclic hydrocarbons (cyclohexane, etc.), aromatic hydrocarbons (toluene, xylene) Etc.), halogenated carbons (dichloromethane, dichloroethane, etc.), esters (methyl acetate, ethyl acetate, butyl acetate, etc.), water, alcohols (ethanol, isopropanol, butanol, cyclic Hexanol, etc.), Celluloids (methylcellulose, ethylcellulose, etc.), Cellulose Acetate, Sublimines (Dimethylphosphine, etc.), and Amidoamines (Dimethyl Methylamine, dimethylacetamide, etc.) can also be mixed solvents of these.
上述低接觸角層亦可於不妨礙本發明之效果之範圍適當添加抗黏連劑、調平劑、抗靜電劑等公知之添加劑。 The above-mentioned low contact angle layer may be appropriately added with a known additive such as an anti-blocking agent, a leveling agent, or an antistatic agent within a range that does not prevent the effect of the present invention.
上述低接觸角層用組成物較佳黏度為0.5~5.0mPa.s(25℃)。若未達0.5mPa.s(25℃),則存在無法形成足夠厚度之低接觸角層,而無法實現改善低接觸角層之接著性之情況,若超過5.0mPa.s(25℃),則存在無法形成均勻之低接觸角層之情況。 The above-mentioned composition for the low contact angle layer preferably has a viscosity of 0.5 to 5.0 mPa. s (25 ° C). If it does not reach 0.5mPa. s (25 ° C), there may be cases where a low contact angle layer with sufficient thickness cannot be formed, and it is impossible to improve the adhesion of the low contact angle layer. If it exceeds 5.0 mPa. s (25 ° C), there is a case where a uniform low contact angle layer cannot be formed.
上述黏度之更佳下限為0.7mPa.s(25℃),更佳上限為3.0mPa·s(25℃)。 The better lower limit of the above viscosity is 0.7 mPa. s (25 ° C), and a more preferable upper limit is 3.0 mPa · s (25 ° C).
上述低接觸角層較佳厚度為1~1000nm。若未達1nm,則存在低接觸角層之厚度不足,而無法實現改善該低接觸角層之接著性之情況,若超過1000nm,則存在低接觸角層容易出現龜裂而於剝離附黏著層之膜時會產生面狀剝離之情形。上述低接觸角層之厚度之更佳下限為5nm,更佳上限為500nm。此外,於上述低接觸角層被賦予了如下述之硬塗性能之情形時,該低接觸角層之厚度亦可具有超過1000nm之厚度。 The above-mentioned low contact angle layer preferably has a thickness of 1 to 1000 nm. If it is less than 1 nm, the thickness of the low contact angle layer may be insufficient to improve the adhesion of the low contact angle layer. If it exceeds 1000 nm, the low contact angle layer may be easily cracked and the adhesion layer may be peeled off. When the film is formed, surface peeling may occur. The lower limit of the thickness of the low contact angle layer is more preferably 5 nm, and the more preferable upper limit is 500 nm. In addition, in the case where the above-mentioned low contact angle layer is provided with hard coating performance as described below, the thickness of the low contact angle layer may have a thickness exceeding 1000 nm.
作為將上述低接觸角層用組成物塗佈於基材膜上之方法並未特別限定,例如可列舉:旋轉塗佈法、浸漬法、噴霧法、模嘴塗佈法、棒式塗佈法、輥式塗佈法、彎月面塗佈法(meniscus coater method)、軟版印刷法、網版印刷法、液滴塗佈法等公知之方法。 The method for applying the composition for a low contact angle layer to a substrate film is not particularly limited, and examples thereof include a spin coating method, a dipping method, a spray method, a die coating method, and a rod coating method. , A roll coating method, a meniscus coater method, a flexographic printing method, a screen printing method, a droplet coating method, and other known methods.
又,即便於下述之於低接觸角層與基材膜之間設置硬塗層之情形時, 亦可藉由相同之方法於該硬塗層上形成上述低接觸角層。 In addition, even in the case where a hard coat layer is provided between the low contact angle layer and the base film, as described below, The above-mentioned low contact angle layer can also be formed on the hard coat layer by the same method.
較佳為於利用上述方法而形成之低接觸角層之與上述基材 膜側為相反側之面上貼合附黏著層之膜。上述附黏著層之膜可較佳地用作保護膜,藉由貼合上述附黏著層之膜,可於用以形成下述透明導電層之濺鍍處理時改善因搬送性之問題而產生之褶皺或歪扭。 It is preferable that the low contact angle layer formed by the method described above is in contact with the substrate. The film side is a film on which the adhesive layer is attached on the surface on the opposite side. The film with an adhesive layer can be preferably used as a protective film. By bonding the film with an adhesive layer, it can be improved due to transportability problems during the sputtering process used to form the transparent conductive layer described below. Wrinkled or crooked.
上述附黏著層之膜較佳為至少由基材與黏著層構成,具備平 滑性、耐熱性且硬度及韌性優異者。 The film with an adhesive layer is preferably composed of at least a substrate and an adhesive layer, and has a flat surface. Those with excellent sliding properties, heat resistance, and hardness and toughness.
作為上述基材,並未特別限定,例如可列舉:聚酯系樹脂、聚丙烯系樹脂、聚苯乙烯系樹脂、聚乙烯醇系樹脂、聚芳酯系樹脂、聚苯硫醚系樹脂等。其中,較佳為使用聚酯系樹脂、聚丙烯系樹脂。 The substrate is not particularly limited, and examples thereof include polyester resins, polypropylene resins, polystyrene resins, polyvinyl alcohol resins, polyarylate resins, and polyphenylene sulfide resins. Among these, a polyester resin and a polypropylene resin are preferably used.
又,作為上述黏著層,係至少包含黏著劑之層,作為該黏著劑,例如可列舉:胺酯(urethane)系、橡膠系、聚矽氧系、丙烯酸系黏著劑等。其中,就耐熱性較高且低成本之觀點而言,較佳為丙烯酸系黏著劑。 The adhesive layer is a layer containing at least an adhesive. Examples of the adhesive include urethane-based, rubber-based, silicone-based, and acrylic-based adhesives. Among these, from the viewpoint of high heat resistance and low cost, an acrylic adhesive is preferred.
又,作為上述丙烯酸系黏著劑,例如可列舉使丙烯酸酯與其他單體進行共聚合而成之丙烯酸酯共聚物。 Examples of the acrylic pressure-sensitive adhesive include an acrylate copolymer obtained by copolymerizing an acrylate with another monomer.
作為上述其他單體,例如可列舉:丙烯酸甲酯、甲基丙烯酸 甲酯、苯乙烯、丙烯腈、乙酸乙烯酯、丙烯酸、甲基丙烯酸、衣康酸、丙烯酸羥基乙酯、甲基丙烯酸羥基乙酯、丙烯酸丙二醇酯、丙烯醯胺、甲基丙烯醯胺、丙烯酸縮水甘油酯、甲基丙烯酸縮水甘油酯、甲基丙烯酸二甲胺基乙酯、甲基丙烯酸第三丁基胺基乙酯、甲基丙烯酸正乙基己酯等。其中,較佳為使用甲基丙烯酸正乙基己酯。 Examples of the other monomer include methyl acrylate and methacrylic acid. Methyl ester, styrene, acrylonitrile, vinyl acetate, acrylic acid, methacrylic acid, itaconic acid, hydroxyethyl acrylate, hydroxyethyl methacrylate, propylene glycol acrylate, acrylamide, methacrylamide, acrylic acid Glycidyl ester, glycidyl methacrylate, dimethylaminoethyl methacrylate, third butylaminoethyl methacrylate, n-ethylhexyl methacrylate, and the like. Among these, n-ethylhexyl methacrylate is preferably used.
上述其他單體既可單獨使用,亦可混合多種而使用。 These other monomers may be used alone or in combination.
作為上述丙烯酸酯共聚物所含之丙烯酸酯與其他單體之單元比(丙烯酸酯/其他單體),只要上述丙烯酸酯共聚物可發揮所需之黏著力,則並未特別限定。 The unit ratio (acrylate / other monomer) of the acrylate and other monomers contained in the acrylate copolymer is not particularly limited as long as the acrylate copolymer can exhibit the required adhesive force.
作為上述丙烯酸酯共聚物之重量平均分子量(Mw),只要上述丙烯酸系黏著劑發揮所需之黏著力,則並未特別限定。 The weight average molecular weight (Mw) of the acrylate copolymer is not particularly limited as long as the acrylic pressure-sensitive adhesive exhibits the required adhesive force.
上述黏著劑層亦可進而包含交聯劑。 The said adhesive layer may further contain a crosslinking agent.
作為上述交聯劑,並未特別限定,例如可列舉環氧系、異氰酸酯系等之交聯劑。 The crosslinking agent is not particularly limited, and examples thereof include epoxy-based and isocyanate-based crosslinking agents.
作為上述環氧系交聯劑,例如可列舉多官能環氧系化合物。 Examples of the epoxy-based crosslinking agent include a polyfunctional epoxy-based compound.
作為上述多官能環氧系化合物,例如可列舉:山梨糖醇聚縮水甘油醚、聚甘油聚縮水甘油醚、新戊四醇聚縮水甘油醚、二甘油聚縮水甘油醚、甘油聚縮水甘油醚、三羥甲基丙烷聚縮水甘油醚、新戊二醇二縮水甘油醚、1,6-己二醇二縮水甘油醚、氫化雙酚A二縮水甘油醚、聚乙二醇二縮水甘油醚、聚丙二醇二縮水甘油醚、聚丁二烯二縮水甘油醚等。 Examples of the polyfunctional epoxy-based compound include sorbitol polyglycidyl ether, polyglycerol polyglycidyl ether, neoglycerol polyglycidyl ether, diglycerol polyglycidyl ether, glycerin polyglycidyl ether, Trimethylolpropane polyglycidyl ether, neopentyl glycol diglycidyl ether, 1,6-hexanediol diglycidyl ether, hydrogenated bisphenol A diglycidyl ether, polyethylene glycol diglycidyl ether, poly Propylene glycol diglycidyl ether, polybutadiene diglycidyl ether, and the like.
作為上述異氰酸酯系交聯劑,例如可列舉:聚異氰酸酯化合物、聚異氰酸酯化合物之三聚物、於末端具有使聚異氰酸酯化合物與多元醇化合物反應而得之異氰酸酯基之胺酯預聚物、或此種胺酯預聚物之三聚物等。 Examples of the isocyanate-based crosslinking agent include a polyisocyanate compound, a terpolymer of a polyisocyanate compound, an amine ester prepolymer having an isocyanate group obtained by reacting a polyisocyanate compound and a polyol compound at a terminal, or the like Trimers of amine ester prepolymers, etc.
作為上述聚異氰酸酯化合物,並未特別限定,例如可列舉:2,4-甲苯二異氰酸酯、2,5-甲苯二異氰酸酯、1,3-苯二甲基二異氰酸酯、1,4-苯二甲基二異氰酸酯、二苯基甲烷-4,4'-二異氰酸酯、3-甲基二苯基甲烷二異氰酸酯、六亞甲基二異氰酸酯、異佛爾酮二異氰酸酯、二環己基甲烷-4,4' -二異氰酸酯、二環己基甲烷-2,4'-二異氰酸酯、離胺酸異氰酸酯等。 The polyisocyanate compound is not particularly limited, and examples thereof include 2,4-toluene diisocyanate, 2,5-toluene diisocyanate, 1,3-benzenedimethyldiisocyanate, and 1,4-benzenedimethyl Diisocyanate, diphenylmethane-4,4'-diisocyanate, 3-methyldiphenylmethane diisocyanate, hexamethylene diisocyanate, isophorone diisocyanate, dicyclohexylmethane-4,4 ' -Diisocyanate, dicyclohexylmethane-2,4'-diisocyanate, lysine isocyanate, etc.
上述交聯劑之含量根據上述交聯劑之種類而有所不同,例如相對於上述黏著劑100質量份,可設在0.5~10.0質量份之範圍內。 The content of the cross-linking agent varies depending on the type of the cross-linking agent. For example, it can be set within a range of 0.5 to 10.0 parts by mass with respect to 100 parts by mass of the adhesive.
上述黏著劑層亦可進而含有金屬螯合劑。 The adhesive layer may further contain a metal chelator.
上述黏著劑層所使用之金屬螯合劑係具有金屬元素與鹽形成部位者,於與上述黏著劑一併使用之情形時,上述金屬元素與黏著劑所具有之羧基等可藉由進行螯合鍵結而交聯。 The metal chelating agent used in the adhesive layer has a metal element and a salt-forming site. When used together with the adhesive, the metal element and the carboxyl group of the adhesive can be bonded by chelation. And cross-linking.
作為此種金屬螯合物之具體例,例如可列舉:異丙酸鋁、丁酸鋁、乙酸鋁、乙醯乙酸乙酯鋁、乙醯丙酮鋁、乙醯丙酮酸雙(乙醯乙酸乙酯)鋁、乙醯乙酸烷基酯鋁等鋁螯合化合物;或二丙氧基-雙(乙醯丙酮酸)鈦(dipropoxy-bis(acetylacetonato)titanate)、二丁氧基鈦-雙(辛二醇酸酯)、二丙氧基鈦-雙(乙醯乙酸乙酯)、二丙氧基鈦-雙(乳酸酯)、二丙氧基鈦-雙(三乙醇胺)、二正丁氧基鈦-雙(三乙醇胺)、三正丁氧基鈦單硬脂酸酯、鈦酸丁酯二聚物、聚(乙醯丙酮酸鈦)等鈦螯合化合物;或四乙醯丙酮酸鋯、單乙醯丙酮酸鋯、雙乙醯丙酮酸鋯、乙醯丙酮酸雙(乙醯乙酸乙酯)鋯、乙酸鋯等鋯螯合化合物;辛酸鋅、月桂酸鋅、硬脂酸鋅、辛酸錫等有機羧酸金屬鹽;及乙醯丙酮鋅螯合物、苯甲醯丙酮鋅螯合物、二苯甲醯甲烷鋅螯合物、乙醯乙酸乙酯鋅螯合物等鋅螯合化合物。其中,較佳為使用異丙酸鋁、丁酸鋁、乙酸鋁、乙醯乙酸乙酯鋁、乙醯丙酮酸鋁、乙醯丙酮酸雙(乙醯乙酸乙酯)鋁、乙醯乙酸烷基酯鋁等鋁螯合化合物。其原因在於:容易調整使上述黏著劑進行交聯之交聯速度。 Specific examples of such a metal chelate include aluminum isopropylate, aluminum butyrate, aluminum acetate, aluminum ethyl acetate, aluminum ethyl acetone, and ethyl acetonyl bis (ethyl acetate) ) Aluminum, aluminum chelate compounds such as aluminum alkyl acetoacetate; or dipropoxy-bis (acetylacetonato) titanium, dibutoxy titanium-bis (octyl Alcoholate), titanium dipropoxy-bis (ethyl acetate), titanium dipropoxy-bis (lactate), titanium dipropoxy-bis (triethanolamine), di-n-butoxy Titanium chelate compounds such as titanium-bis (triethanolamine), tri-n-butoxytitanium monostearate, butyl titanate dimer, poly (titanium acetate pyruvate); or zirconium tetraacetamate pyruvate, Zirconium chelate compounds such as zirconium monoacetate pyruvate, zirconium diacetam pyruvate, bis (ethylacetate) zirconium, zirconium acetate; zinc octoate, zinc laurate, zinc stearate, tin octoate And other organic carboxylic acid metal salts; and zinc chelate compounds such as acetoacetone zinc chelate, benzamidine zinc acetone chelate, dibenzomethane zinc chelate, and ethyl acetate ethyl acetate chelate. Among these, aluminum isopropylate, aluminum butyrate, aluminum acetate, aluminum ethyl acetate, aluminum ethyl pyruvate, aluminum ethyl pyruvate bis (ethyl acetate) aluminum, and ethyl ethyl acetate are preferably used. Aluminum chelate compounds such as ester aluminum. The reason is that it is easy to adjust the crosslinking speed at which the above-mentioned adhesive is crosslinked.
上述金屬螯合劑之含量根據上述金屬螯合劑之種類而有所 不同,相對於上述黏著劑100質量份,較佳在0.06~0.50質量份之範圍內。 若少於上述範圍,則有形成上述黏著劑層時之交聯速度減慢而生產性降低之虞,另一方面,即便於多於上述範圍之情形時,效果亦不會改變,材料費成本增加。 The content of the above-mentioned metal chelating agent varies according to the type of the above-mentioned metal chelating agent Different, it is preferably in the range of 0.06 to 0.50 parts by mass with respect to 100 parts by mass of the above-mentioned adhesive. If it is less than the above range, the cross-linking speed at the time of forming the above-mentioned adhesive layer may be slowed and productivity may be reduced. On the other hand, even when it is more than the above range, the effect will not change and the material cost increase.
上述黏著劑層亦可含有其他添加劑。 The adhesive layer may contain other additives.
作為上述其他添加劑,例如可列舉抗氧化劑、紫外線吸收劑等。 Examples of the other additives include antioxidants and ultraviolet absorbers.
又,於上述黏著劑係使構成丙烯酸系黏著劑之丙烯酸酯及如其他單體之藉由光照射而硬化之感光性單體成分進行聚合而成之感光性黏著劑,且藉由於塗佈含上述感光性單體成分之黏著劑後,利用紫外線或可見光線之照射使其聚合、硬化而形成黏著劑層之情形時,於上述黏著劑中添加光聚合起始劑。 In addition, the above-mentioned adhesive is a photosensitive adhesive obtained by polymerizing an acrylic ester constituting an acrylic adhesive and a photosensitive monomer component that is cured by light irradiation such as other monomers, and is applied by coating. In the case where the adhesive of the photosensitive monomer component is polymerized and hardened by irradiation with ultraviolet rays or visible light to form an adhesive layer, a photopolymerization initiator is added to the adhesive.
作為上述黏著劑層之膜厚,通常在3~200μm之範圍內,其中,較佳在4~100μm之範圍內,尤佳在5~50μm之範圍內。 The film thickness of the adhesive layer is usually within a range of 3 to 200 μm, and among them, preferably within a range of 4 to 100 μm, and particularly preferably within a range of 5 to 50 μm.
作為上述黏著劑層之形成方法,例如可使用:將黏著劑層形成材料塗佈於基材上之方法;將黏著劑層轉印至基材上之方法;將黏著劑層之構成材料與基板之構成材料熔融共擠出而成形之方法;將黏著劑層之構成材料與基板之構成材料分別藉由擠出等而成形為膜狀後進行接著之方法等。其中,就可平滑性良好地形成黏著劑層之方面而言,較佳為使用將黏著劑層形成材料塗佈於基板上之方法。 As the method for forming the above-mentioned adhesive layer, for example, a method of applying an adhesive layer-forming material to a substrate, a method of transferring an adhesive layer to a substrate, and a constituent material of the adhesive layer and a substrate may be used. A method of forming the constituent material by melt co-extrusion; a method of forming the constituent material of the adhesive layer and the constituent material of the substrate into a film shape by extrusion or the like, respectively, and the subsequent method. Among them, a method of applying an adhesive layer forming material to a substrate is preferably used in terms of forming an adhesive layer with good smoothness.
又,上述附黏著層之膜係於形成下述經圖案化之透明導電層後剝離,其剝離強度較佳為10~500mN/25mm。若未達10mN/25mm,則存在於本發明之積層體之製造過程中附黏著層之膜會剝離之情況,若超 過500mN/25mm,則存在無法自低接觸角層剝離之情況。此外,如下所述,當上述透明導電層為在濺鍍處理後實施加熱處理而結晶化而成者時,上述附黏著層之膜較佳為於實施上述加熱處理而使導電層結晶化後或於其後之步驟中結束加熱處理後等任一後續步驟中被剝離。 In addition, the film with an adhesive layer is peeled after forming a patterned transparent conductive layer described below, and its peel strength is preferably 10 to 500 mN / 25 mm. If it is less than 10mN / 25mm, there may be cases where the film with an adhesive layer is peeled off during the manufacturing process of the laminated body of the present invention. When it exceeds 500mN / 25mm, it may not be able to peel from the low contact angle layer. In addition, as described below, when the transparent conductive layer is crystallized by performing a heat treatment after the sputtering process, the film with an adhesive layer is preferably formed after the conductive layer is crystallized by performing the heat treatment or After the heat treatment is completed in the subsequent steps, it is peeled off in any of the subsequent steps.
又,於下述含導電性纖維狀填料等之透明導電層中亦同樣,較佳為:於為了實現低電阻化而進行之加熱、或後續步驟之對銀膏進行燒成後之任一步驟中進行剝離。 The same applies to the following transparent conductive layer containing a conductive fibrous filler and the like, and it is preferably any step after heating to reduce the resistance or firing the silver paste in a subsequent step. Peeling is performed in the middle.
上述附黏著層之膜之對上述低接觸角層之貼附較佳為介隔 上述附黏著層之膜之黏著層進行。本發明之積層體由於具有上述低接觸角層,故而不會產生上述附黏著層之膜剝離後之低接觸角層表面之接著性降低。 The adhesion of the film with an adhesive layer to the low contact angle layer is preferably a spacer. The adhesion layer of the film with the adhesion layer is performed. Since the laminated body of the present invention has the above-mentioned low contact angle layer, the adhesion of the surface of the low contact angle layer after peeling of the film with the adhesion layer is not generated.
本發明之積層體於基材膜之一面上具有一層以上之光學功 能層。 The laminated body of the present invention has more than one layer of optical function on one surface of the substrate film. Energy layer.
作為上述一層以上之光學功能層,可列舉先前公知之任意之光學功能層,具體而言,例如可列舉:硬塗層、低折射率層、高折射率層、防污層、抗靜電層、及防眩層等。 As the above-mentioned one or more optical functional layers, any conventionally known optical functional layer may be mentioned. Specifically, for example, a hard coat layer, a low refractive index layer, a high refractive index layer, an antifouling layer, an antistatic layer, And anti-glare layer.
其中,較佳為具有選自由硬塗層、高折射率層及低折射率層所組成之群中之至少一層者。 Among them, it is preferable to have at least one layer selected from the group consisting of a hard coat layer, a high refractive index layer, and a low refractive index layer.
於本發明之積層體中,就可如下所述般實現不可見經圖案化之透明導電層之觀點而言,上述一層以上之光學功能層更佳為高折射率層及低折射率層依序積層於基材膜上而成者。 In the laminated body of the present invention, from the viewpoint that the patterned transparent conductive layer can be invisible as described below, it is more preferable that the one or more optical functional layers be a high refractive index layer and a low refractive index layer in this order. Laminated on a base film.
又,上述一層以上之光學功能層進而較佳為硬塗層、高折射率層及低 折射率層依序形成於上述基材膜上而成者。藉由具有此種構成之光學功能層,可實現不可見透明導電層,並且可對本發明之積層體賦予硬塗性。 In addition, the one or more optical functional layers are further preferably a hard coat layer, a high refractive index layer, and a low A refractive index layer is sequentially formed on the said base film. With the optical functional layer having such a structure, an invisible transparent conductive layer can be realized, and a hard coat property can be imparted to the laminated body of the present invention.
上述硬塗層之根據基於JIS K5600-5-4(1999)之鉛筆硬 度試驗(負載4.9N)而得之鉛筆硬度較佳為F以上,更佳為H以上。上述硬塗層係保證本發明之積層體之硬塗性之層,例如較佳為使用含有藉由紫外線而硬化之樹脂即游離放射線硬化型樹脂與光聚合起始劑之硬塗層用組成物而形成者。 The hard coating is based on the pencil hardness of JIS K5600-5-4 (1999). The pencil hardness obtained by the degree test (load 4.9N) is preferably F or more, and more preferably H or more. The hard coat layer is a layer that guarantees the hard coatability of the laminate of the present invention. For example, it is preferable to use a composition for a hard coat layer containing a resin that is hardened by ultraviolet rays, that is, a radiation-hardening resin and a photopolymerization initiator. And the former.
作為上述游離放射線硬化型樹脂,例如可列舉具有丙烯酸酯 系官能基之化合物等具有1個或2個以上之不飽和鍵之化合物。作為具有1個不飽和鍵之化合物,例如可列舉:(甲基)丙烯酸乙酯、(甲基)丙烯酸乙基己酯、苯乙烯、甲基苯乙烯、N-乙烯基吡咯啶酮等。作為具有2個以上之不飽和鍵之化合物,例如可列舉:聚羥甲基丙烷三(甲基)丙烯酸酯、三丙二醇二(甲基)丙烯酸酯、二乙二醇二(甲基)丙烯酸酯、新戊四醇三(甲基)丙烯酸酯、新戊四醇四(甲基)丙烯酸酯、二新戊四醇六(甲基)丙烯酸酯、二新戊四醇五(甲基)丙烯酸酯、1,6-己二醇二(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯等;及利用環氧乙烷(EO)等將該等改質而成之多官能化合物;或上述多官能化合物與(甲基)丙烯酸酯等之反應產物(例如多元醇之聚(甲基)丙烯酸酯)等。 Examples of the free radiation-curable resin include acrylates. Compounds having a functional group such as a compound having one or more unsaturated bonds. Examples of the compound having one unsaturated bond include ethyl (meth) acrylate, ethylhexyl (meth) acrylate, styrene, methylstyrene, and N-vinylpyrrolidone. Examples of the compound having two or more unsaturated bonds include polymethylolpropane tri (meth) acrylate, tripropylene glycol di (meth) acrylate, and diethylene glycol di (meth) acrylate. , Neopentaerythritol tri (meth) acrylate, neopentaerythritol tetra (meth) acrylate, dipentaerythritol hexa (meth) acrylate, dinepentaerythritol penta (meth) acrylate , 1,6-hexanediol di (meth) acrylate, neopentyl glycol di (meth) acrylate, etc .; and polyfunctional compounds modified by using ethylene oxide (EO) etc. Or a reaction product of the above-mentioned polyfunctional compound with a (meth) acrylate or the like (for example, a poly (meth) acrylate of a polyol) or the like.
作為上述游離放射線硬化型樹脂,包含上述化合物,亦可使 用具有不飽和雙鍵之相對低分子量(數量平均分子量300~8萬,較佳為400~5000)之聚酯樹脂、聚醚樹脂、丙烯酸樹脂、環氧樹脂、胺酯樹脂、醇酸樹脂、螺縮醛樹脂、聚丁二烯樹脂、多硫醇多烯樹脂等。此外,此情況下 之樹脂,係指包含單體以外之二聚物、低聚物、聚合物之全部。 As the above-mentioned free radiation-curable resin, the above-mentioned compound is included, and Polyester resin, polyether resin, acrylic resin, epoxy resin, amine ester resin, alkyd resin, relatively low molecular weight (number average molecular weight 300-80,000, preferably 400-5000) with unsaturated double bonds, Spiro acetal resin, polybutadiene resin, polythiol polyene resin, etc. Also, in this case Resin means all dimers, oligomers and polymers other than monomers.
作為本發明中之較佳之化合物,可列舉具有3個以上不飽和鍵之化合物。若使用此種化合物,則可提高形成之硬塗層之交聯密度,從而可使硬塗度良好。 Preferred compounds in the present invention include compounds having three or more unsaturated bonds. If such a compound is used, the crosslinking density of the formed hard coat layer can be increased, and the degree of hard coat can be made good.
具體而言,於本發明中,較佳為將新戊四醇三丙烯酸酯、新戊四醇四丙烯酸酯、聚酯多官能丙烯酸酯低聚物(3~15官能)、胺酯多官能丙烯酸酯低聚物(3~15官能)等適當組合使用。 Specifically, in the present invention, neopentaerythritol triacrylate, neopentaerythritol tetraacrylate, polyester multifunctional acrylate oligomer (3 to 15 functions), and amine multifunctional acrylic acid are preferred. Ester oligomers (3 to 15 functions) are used in appropriate combination.
上述游離放射線硬化型樹脂亦可與溶劑乾燥型樹脂一併使 用。藉由併用溶劑乾燥型樹脂,可有效地防止塗佈面之被膜缺陷。此外,所謂上述溶劑乾燥型樹脂,係指如熱塑性樹脂等,即塗佈時僅藉由使為了調整固形物成分而添加之溶劑乾燥便會形成被膜之樹脂。 The above-mentioned free radiation hardening resin may be used together with the solvent-drying resin. use. By using a solvent-drying resin in combination, it is possible to effectively prevent coating defects on the coating surface. In addition, the above-mentioned solvent-drying resin refers to, for example, a thermoplastic resin, that is, a resin that forms a film by drying only a solvent added to adjust a solid content during coating.
作為可與上述游離放射線硬化型樹脂一併使用之溶劑乾燥型樹脂,並未特別限定,通常可使用熱塑性樹脂。 The solvent-drying resin that can be used together with the above-mentioned free radiation-curable resin is not particularly limited, and a thermoplastic resin can be generally used.
作為上述熱塑性樹脂,並未特別限定,例如可列舉:苯乙烯系樹脂、(甲基)丙烯酸系樹脂、乙酸乙烯酯系樹脂、乙烯醚系樹脂、含鹵素之樹脂、脂環式烴系樹脂、聚碳酸酯系樹脂、聚酯系樹脂、聚醯胺系樹脂、纖維素衍生物、聚矽氧系樹脂及橡膠或彈性體等。上述熱塑性樹脂較佳為非晶性且可溶解於有機溶劑(尤其是可溶解多種聚合物或硬化性化合物之共用溶劑)。尤其是就製膜性、透明性或耐候性之觀點而言,較佳為苯乙烯系樹脂、(甲基)丙烯酸系樹脂、脂環式烴系樹脂、聚酯系樹脂、纖維素衍生物(纖維素酯類等)等。 The thermoplastic resin is not particularly limited, and examples thereof include styrene resins, (meth) acrylic resins, vinyl acetate resins, vinyl ether resins, halogen-containing resins, alicyclic hydrocarbon resins, Polycarbonate resin, polyester resin, polyamide resin, cellulose derivative, silicone resin, rubber or elastomer, etc. The thermoplastic resin is preferably amorphous and soluble in an organic solvent (especially a common solvent capable of dissolving a plurality of polymers or curable compounds). In particular, from the viewpoints of film-forming properties, transparency, and weather resistance, styrene resins, (meth) acrylic resins, alicyclic hydrocarbon resins, polyester resins, and cellulose derivatives ( Cellulose esters, etc.).
又,上述硬塗層用組成物亦可含有熱硬化性樹脂。 Moreover, the said composition for hard-coat layers may contain a thermosetting resin.
作為上述熱硬化性樹脂,並未特別限定,例如可列舉:酚系樹脂、脲樹脂、酞酸二烯丙酯樹脂(diallylphthalate resin)、三聚氰胺樹脂、胍胺樹脂、不飽和聚酯樹脂、聚胺酯樹脂、環氧樹脂、胺基醇酸樹脂、三聚氰胺-脲共縮合樹脂、矽樹脂、聚矽氧烷樹脂等。 The thermosetting resin is not particularly limited, and examples thereof include a phenol resin, a urea resin, a diallyl phthalate resin, a melamine resin, a guanamine resin, an unsaturated polyester resin, and a polyurethane resin. , Epoxy resin, amino alkyd resin, melamine-urea co-condensation resin, silicone resin, polysiloxane resin, etc.
作為上述光聚合起始劑,並未特別限定,可使用公知者,例 如,作為上述光聚合起始劑,具體例可列舉:苯乙酮類、二苯甲酮類、米契爾苯甲醯基苯甲酸酯(Michler's benzoyl benzoate)、α-戊基肟酯(α-amyloxime)、9-氧硫類(thioxanthone)、苯丙酮類、苯偶醯類、安息香類、醯基氧化膦類。又,較佳為混合光增感劑而使用,作為其具體例,例如可列舉正丁基胺、三乙基胺、聚正丁基膦等。 The photopolymerization initiator is not particularly limited, and a known one can be used. For example, specific examples of the photopolymerization initiator include acetophenones, benzophenones, and michell benzamidine. Michler's benzoyl benzoate, α-amyloxime, 9-oxosulfur Thioxanthone, phenylacetone, benzoin, benzoin, fluorenyl phosphine oxide. In addition, it is preferable to use a mixture of a photosensitizer, and specific examples thereof include n-butylamine, triethylamine, and poly-n-butylphosphine.
作為上述光聚合起始劑,於上述游離放射線硬化型樹脂係具 有自由基聚合性不飽和基之樹脂系時,較佳為單獨使用或混合使用苯乙酮類、二苯甲酮類、9-氧硫類、安息香、安息香甲醚等。又,於上述游離放射線硬化型樹脂係具有自由基聚合性官能基之樹脂系時,作為上述光聚合起始劑,較佳為單獨使用或以混合物之形式使用芳香族重氮鎓鹽、芳香族鋶鹽、芳香族錪鹽、茂金屬化合物、安息香磺酸酯等。 As the photopolymerization initiator, when the free-radiation-curable resin is a resin system having a radically polymerizable unsaturated group, acetophenones, benzophenones, 9- Oxygen sulfur Category, benzoin, benzoin methyl ether, etc. When the above-mentioned free-radiation-curable resin is a resin system having a radical polymerizable functional group, it is preferable to use an aromatic diazonium salt or an aromatic diazonium salt alone or as a mixture as the photopolymerization initiator. Onium salts, aromatic onium salts, metallocene compounds, benzoin sulfonates, and the like.
作為於本發明中使用之起始劑,於具有自由基聚合性不飽和基之游離放射線硬化型樹脂之情形時,就與游離放射線硬化型樹脂之相溶性、及黃變亦較少之理由而言,較佳為1-羥基-環己基-苯基-酮。 As the initiator used in the present invention, in the case of a free radiation-curable resin having a radically polymerizable unsaturated group, it is because the compatibility with the free radiation-curable resin and the yellowing are small. In other words, 1-hydroxy-cyclohexyl-phenyl-one is preferred.
上述硬塗層用組成物中之上述光聚合起始劑之含量相對於 上述游離放射線硬化型樹脂100質量份,較佳為1~10質量份。其原因在於:若未達1質量份,則存在無法將第1本發明之積層體中之硬塗層之硬度設 為上述範圍之情況,若超過10質量份,則有游離放射線無法到達至所塗佈之膜之深部而未促進內部硬化,從而無法獲得目標硬塗層之表面之鉛筆硬度F以上之虞。上述光聚合起始劑之含量之更佳下限為2質量份,更佳上限為8質量份。藉由使上述光聚合起始劑之含量處於該範圍,於厚度方向上不會產生硬度分佈,而容易成為均勻之硬度。 The content of the photopolymerization initiator in the composition for a hard coat layer is relative to 100 parts by mass of the above-mentioned free radiation curable resin is preferably 1 to 10 parts by mass. The reason is that if it is less than 1 part by mass, the hardness of the hard coat layer in the laminated body of the first invention cannot be set. In the case of the above range, if it exceeds 10 parts by mass, the free radiation may not reach the deep portion of the applied film without promoting internal hardening, and the pencil hardness F or more of the surface of the target hard coat layer may not be obtained. A more preferable lower limit of the content of the photopolymerization initiator is 2 parts by mass, and a more preferable upper limit is 8 parts by mass. When the content of the photopolymerization initiator is in this range, hardness distribution does not occur in the thickness direction, and it is easy to achieve uniform hardness.
上述硬塗層用組成物亦可含有與上述低接觸角層形成用組成物相同之溶劑。 The composition for a hard coat layer may contain the same solvent as the composition for forming a low contact angle layer.
尤其是於本發明中,就與樹脂之相溶性、塗佈性優異之理由而言,其中較佳為酮系之溶劑且至少含有甲基乙基酮、甲基異丁基酮、環己酮之任一者或該等之混合物。 Especially in the present invention, for reasons of excellent compatibility with the resin and coating properties, among them, a ketone-based solvent is preferred and it contains at least methyl ethyl ketone, methyl isobutyl ketone, and cyclohexanone. Any one or a mixture of these.
上述硬塗層用組成物中之原料之含有比率(固形物成分),並未特別限定,通常較佳設為5~70質量%,尤佳設為15~60質量%。 The content ratio (solid content) of the raw materials in the hard coat composition is not particularly limited, but it is usually preferably 5 to 70% by mass, and particularly preferably 15 to 60% by mass.
於上述硬塗層用組成物中,亦可根據提高硬塗層之硬度、抑制硬化收縮、防止黏連、控制折射率、賦予防眩性、改變粒子或硬塗層表面之性質等目的而添加先前公知之有機、無機微粒子、分散劑、界面活性劑、抗靜電劑、矽烷偶合劑、增黏劑、防著色劑、著色劑(顏料、染料)、消泡劑、調平劑、阻燃劑、紫外線吸收劑、接著賦予劑、聚合抑制劑、抗氧化劑、表面改質劑等。 In the above-mentioned composition for a hard coat layer, it can also be added for the purpose of improving the hardness of the hard coat layer, suppressing hardening shrinkage, preventing blocking, controlling refractive index, imparting anti-glare properties, changing the properties of particles or the surface of the hard coat layer, and the like. Previously known organic, inorganic fine particles, dispersants, surfactants, antistatic agents, silane coupling agents, tackifiers, anti-colorants, colorants (pigments, dyes), defoamers, leveling agents, flame retardants , UV absorbers, adhesives, polymerization inhibitors, antioxidants, surface modifiers, etc.
又,上述硬塗層用組成物亦可混合光增感劑而使用,作為其具體例,例如可列舉正丁基胺、三乙基胺、聚正丁基膦等。 Moreover, the said composition for hard-coat layers can also be mixed with a photosensitizer, and as a specific example, n-butylamine, triethylamine, poly-n-butylphosphine, etc. are mentioned, for example.
作為上述硬塗層用組成物之製備方法,只要可將各成分均勻地混合,則並未特別限定,例如可使用塗料振盪機、珠磨機、捏合機、攪 拌器等公知之裝置進行。 The method for preparing the above-mentioned composition for a hard coat layer is not particularly limited as long as the components can be uniformly mixed. For example, a paint shaker, a bead mill, a kneader, and agitator can be used. It is performed by a known device such as a mixer.
又,作為將上述硬塗層用組成物塗佈於上述基材膜上之方 法,並未特別限定,例如可列舉:旋轉塗佈法、浸漬法、噴霧法、模嘴塗佈法、棒式塗佈法、輥式塗佈法、彎月面塗佈法、軟版印刷法、網版印刷法、液滴塗佈法等公知之方法。 In addition, as a method of applying the composition for a hard coat layer to the base film, The method is not particularly limited, and examples thereof include a spin coating method, a dipping method, a spray method, a die coating method, a bar coating method, a roll coating method, a meniscus coating method, and a flexographic printing method. Well-known methods, such as a method, a screen printing method, and a droplet coating method.
對於將上述硬塗層用組成物塗佈於上述基材膜上而形成之 塗膜,較佳為視需要進行加熱及/或乾燥,並藉由活性能量線照射等而使其硬化。 Formed by coating the composition for a hard coat layer on the substrate film The coating film is preferably heated and / or dried as necessary, and hardened by irradiation with active energy rays or the like.
作為上述活性能量線照射,可列舉藉由紫外線或電子束之照 射。作為上述紫外線源之具體例,例如可列舉:超高壓水銀燈、高壓水銀燈、低壓水銀燈、碳弧燈、黑光螢光燈、金屬鹵化物燈等光源。又,作為紫外線之波長,可使用190~380nm之波長區域。作為電子束源之具體例,可列舉:柯克勞夫-沃耳吞(Cockcroft Walton)型、範德格拉夫特(Van de Graaff)型、共振變壓器型、絕緣芯變壓器型、或直線型、高頻高壓(Dynamitron)型、高頻型等各種電子束加速器。 Examples of the active energy ray irradiation include irradiation with ultraviolet rays or electron beams. Shoot. Specific examples of the ultraviolet light source include light sources such as an ultrahigh-pressure mercury lamp, a high-pressure mercury lamp, a low-pressure mercury lamp, a carbon arc lamp, a black fluorescent lamp, and a metal halide lamp. As the wavelength of ultraviolet rays, a wavelength range of 190 to 380 nm can be used. Specific examples of the electron beam source include a Cockcroft Walton type, a Van de Graaff type, a resonance transformer type, an insulated core transformer type, or a linear type, Various electron beam accelerators such as high-frequency high-voltage (Dynamitron) and high-frequency types.
此外,上述硬塗層之較佳厚度(硬化時)為0.5~15μm, 更佳為0.8~10μm,就防捲曲性或防龜裂性尤其優異之理由而言,最佳為1.5~8μm之範圍。上述硬塗層之厚度係利用電子顯微鏡(SEM、TEM、STEM)對剖面進行觀察,並測定任意之10點而得之平均值(μm)。作為其他方法,硬塗層之厚度亦可使用厚度測定裝置Mitutoyo公司製造之數位式量表(digimatic indicator)IDF-130測定任意之10點,並求出平均值。 In addition, the preferred thickness of the hard coating layer (when hardened) is 0.5 to 15 μm. It is more preferably 0.8 to 10 μm, and for the reason that curl resistance or crack resistance is particularly excellent, it is most preferably in a range of 1.5 to 8 μm. The thickness of the hard coat layer is an average value (μm) obtained by observing a cross section with an electron microscope (SEM, TEM, STEM) and measuring an arbitrary 10 points. As another method, the thickness of the hard coating layer may be measured at an arbitrary ten points using a digital indicator IDF-130 manufactured by Mitutoyo, a thickness measuring device, and an average value may be determined.
如下所述,本發明之積層體具有經圖案化之透明導電層,且 係用於靜電電容方式之觸控面板之構件,故而有「使上述經圖案化之透明導電層不可見」等要求。作為使上述經圖案化之透明導電層之不可見之手段,可列舉依序積層高折射率層及低折射率層作為上述光學功能層之方法,但為了適合該透明導電層及觸控面板,而要求嚴密之光學特性,且要求厚度或折射率之嚴密之控制。具體而言,上述高折射率層較佳為厚度10~100nm,折射率1.55~1.75,上述低折射率層較佳為厚度10~100nm,折射率1.35~1.55。上述高折射率層及上述低折射率層之厚度更佳為10~70nm。 As described below, the laminated body of the present invention has a patterned transparent conductive layer, and It is a component used in the touch panel of the electrostatic capacitance method, so there is a requirement such that the above-mentioned patterned transparent conductive layer is invisible. As a means for making the patterned transparent conductive layer invisible, a method of sequentially stacking a high refractive index layer and a low refractive index layer as the optical function layer may be mentioned, but in order to be suitable for the transparent conductive layer and the touch panel, And strict optical characteristics are required, and strict control of thickness or refractive index is required. Specifically, the high refractive index layer preferably has a thickness of 10 to 100 nm and a refractive index of 1.55 to 1.75, and the low refractive index layer preferably has a thickness of 10 to 100 nm and a refractive index of 1.35 to 1.55. The thickness of the high refractive index layer and the low refractive index layer is more preferably 10 to 70 nm.
作為形成上述高折射率層之方法,可大致分為濕式法與乾式法。濕式法於生產效率之方面優異。 As a method for forming the high refractive index layer, it can be roughly classified into a wet method and a dry method. The wet method is excellent in terms of production efficiency.
作為濕式法,可列舉:使用金屬烷氧化物等並藉由溶膠凝膠法而形成之方法;及塗佈使黏合劑樹脂中含有高折射率粒子之組成物而形成之方法。作為乾式法,可列舉:自下述高折射率粒子中選擇具有所需折射率之材料,並藉由物理氣相沈積法或化學氣相沈積法而形成之方法。 Examples of the wet method include a method formed by a sol-gel method using a metal alkoxide or the like; and a method formed by applying a composition containing a high refractive index particle in a binder resin. Examples of the dry method include a method in which a material having a desired refractive index is selected from the following high-refractive index particles and formed by a physical vapor deposition method or a chemical vapor deposition method.
作為形成上述低折射率層之方法,可大致分為濕式法與乾式法。濕式法於生產效率之方面優異。 As a method of forming the low refractive index layer, it can be roughly classified into a wet method and a dry method. The wet method is excellent in terms of production efficiency.
作為濕式法,與高折射率層同樣,可列舉:使用金屬烷氧化物等並藉由溶膠凝膠法而形成之方法;塗佈如氟樹脂之低折射率之黏合劑而形成之方法;及塗佈使黏合劑樹脂中含有低折射率粒子之組成物而形成之方法。作為乾式法,可列舉:自下述低折射率粒子中選擇具有所需折射率之材料,並藉由物理氣相沈積法或化學氣相沈積法而形成之方法。 As the wet method, as with the high-refractive index layer, a method using a metal alkoxide or the like and forming it by a sol-gel method; a method using a low-refractive-index adhesive such as a fluororesin; And a method of coating and forming a composition containing low refractive index particles in the binder resin. Examples of the dry method include a method in which a material having a desired refractive index is selected from the following low-refractive index particles and formed by a physical vapor deposition method or a chemical vapor deposition method.
於本發明之積層體中,上述硬塗層、高折射率層及低折射率 層較佳為各者之折射率滿足下述式(1)之關係。藉由滿足下述式(1),可較佳地實現使形成於上述低折射率層上之透明導電層不可見。 In the laminated body of the present invention, the hard coat layer, the high refractive index layer, and the low refractive index The layers preferably have a refractive index satisfying the relationship of the following formula (1). By satisfying the following formula (1), the transparent conductive layer formed on the low refractive index layer can be made invisible.
高折射率層之折射率>硬塗層之折射率>低折射率層之折射率 Refractive index of high refractive index layer> Refractive index of hard coating layer> Refractive index of low refractive index layer
(1) (1)
作為上述高折射率層,並未特別限定,可列舉先前公知者,例如可使用於上述硬塗層所說明之樹脂及溶劑中含有高折射率微粒子之組成物而形成。 The high-refractive index layer is not particularly limited, and examples thereof include conventionally known ones. For example, the resin and the solvent described in the hard coat layer described above can be formed by containing a composition having high-refractive-index fine particles.
作為上述高折射率微粒子、例如可較佳地使用折射率為1.50~2.80之金屬氧化物微粒子等。作為上述金屬氧化物微粒子,具體而言,例如可列舉:氧化鈦(TiO2、折射率:2.71)、氧化鋯(ZrO2、折射率:2.10)、氧化鈰(CeO2、折射率:2.20)、氧化錫(SnO2、折射率:2.00)、錫銻氧化物(ATO、折射率:1.75~1.95)、銦錫氧化物(ITO、折射率:1.95~2.00)、磷錫化合物(PTO、折射率:1.75~1.85)、氧化銻(Sb2O5、折射率:2.04)、氧化鋅鋁(AZO、折射率:1.90~2.00)、氧化鎵鋅(GZO、折射率:1.90~2.00)及銻酸鋅(ZnSb2O6、折射率:1.90~2.00)等。其中,氧化錫(SnO2)、錫銻氧化物(ATO)、銦錫氧化物(ITO)、磷錫化合物(PTO)、氧化銻(Sb2O5)、氧化鋅鋁(AZO)、氧化鎵鋅(GZO)及銻酸鋅(ZnSb2O6)為導電性金屬氧化物,具有藉由控制微粒子之擴散狀態而形成導電通路從而可賦予抗靜電性之優點。 As the high refractive index fine particles, for example, metal oxide fine particles having a refractive index of 1.50 to 2.80 can be preferably used. Specific examples of the metal oxide fine particles include titanium oxide (TiO 2 , refractive index: 2.71), zirconia (ZrO 2 , refractive index: 2.10), and cerium oxide (CeO 2 , refractive index: 2.20). , Tin oxide (SnO 2 , refractive index: 2.00), tin antimony oxide (ATO, refractive index: 1.75 to 1.95), indium tin oxide (ITO, refractive index: 1.95 to 2.00), phosphorus tin compound (PTO, refraction Ratio: 1.75 ~ 1.85), antimony oxide (Sb 2 O 5 , refractive index: 2.04), zinc aluminum oxide (AZO, refractive index: 1.90 ~ 2.00), zinc gallium oxide (GZO, refractive index: 1.90 ~ 2.00), and antimony Zinc acid (ZnSb 2 O 6 , refractive index: 1.90 ~ 2.00), etc. Among them, tin oxide (SnO 2 ), tin antimony oxide (ATO), indium tin oxide (ITO), phosphorus tin compound (PTO), antimony oxide (Sb 2 O 5 ), zinc aluminum oxide (AZO), gallium oxide Zinc (GZO) and zinc antimonate (ZnSb 2 O 6 ) are conductive metal oxides, and have the advantage that antistatic properties can be imparted by forming conductive paths by controlling the diffusion state of fine particles.
又,就耐光性等耐久穩定性較高之觀點而言,較佳為氧化鋯(ZrO2)。 From the viewpoint of high durability such as light resistance, zirconia (ZrO 2 ) is preferred.
作為上述低折射率層,較佳為由1)含有二氧化矽或氟化鎂之樹脂、2)為低折射率樹脂之氟系樹脂、3)含有二氧化矽或氟化鎂之氟系樹脂、4)二氧化矽或氟化鎂之薄膜等任一者構成。關於氟系樹脂以外之 樹脂,可使用與上述之硬塗層所使用之樹脂相同之樹脂。又,上述二氧化矽較佳為實心二氧化矽微粒子或中空二氧化矽微粒子。 The low refractive index layer is preferably composed of 1) a resin containing silicon dioxide or magnesium fluoride, 2) a fluorine-based resin containing low-refractive index resin, and 3) a fluorine-based resin containing silicon dioxide or magnesium fluoride. 4) A thin film of silicon dioxide or magnesium fluoride. About other than fluorine resin As the resin, the same resin as that used for the above-mentioned hard coat layer can be used. The silicon dioxide is preferably solid silicon dioxide fine particles or hollow silicon dioxide fine particles.
作為上述氟系樹脂,可使用至少於分子中包含氟原子之聚合 性化合物或其聚合物。作為聚合性化合物,並未特別限定,例如較佳為具有利用游離放射線而硬化之官能基、熱硬化之極性基等硬化反應性基者。 又,亦可為同時具有該等反應性基之化合物。相對於該聚合性化合物,聚合物係完全不具有如上述之反應性基等者。 As the above-mentioned fluorine-based resin, a polymerization including a fluorine atom at least in a molecule can be used Sex compounds or polymers. Although it does not specifically limit as a polymerizable compound, For example, it is preferable to have a hardening reactive group, such as a functional group hardened by a free radiation, and a polar group thermally hardened. It may also be a compound having both of these reactive groups. With respect to the polymerizable compound, the polymer system does not have any of the above-mentioned reactive groups and the like.
作為上述具有利用游離放射線而硬化之官能基之聚合性化 合物,可廣泛地使用具有乙烯性不飽和鍵之含氟單體。更具體而言,可例示:氟代烯烴類(例如氟乙烯、偏二氟乙烯、四氟乙烯、六氟丙烯、全氟丁二烯、全氟-2,2-二甲基-1,3-二氧雜環戊烯等)。作為具有(甲基)丙烯醯氧基者,亦有如下:(甲基)丙烯酸2,2-2-三氟乙酯、(甲基)丙烯酸2,2,3,3,3-五氟丙酯、(甲基)丙烯酸2-(全氟丁基)乙酯、(甲基)丙烯酸2-(全氟己基)乙酯、(甲基)丙烯酸2-(全氟辛基)乙酯、(甲基)丙烯酸2-(全氟癸基)乙酯、α-三氟甲基丙烯酸甲酯、α-三氟甲基丙烯酸乙酯般之於分子中具有氟原子之(甲基)丙烯酸酯化合物;及於分子中具有至少具有3個氟原子之碳數1~14之氟代烷基、氟代環烷基或氟代伸烷基及至少2個(甲基)丙烯醯氧基的含氟多官能(甲基)丙烯酸酯化合物等。 Polymerization as the functional group having the above-mentioned functional group hardened by free radiation As the compound, a fluorine-containing monomer having an ethylenically unsaturated bond can be widely used. More specifically, fluoroolefins (e.g., fluoroethylene, vinylidene fluoride, tetrafluoroethylene, hexafluoropropylene, perfluorobutadiene, perfluoro-2,2-dimethyl-1,3 -Dioxolene, etc.). As those having (meth) acrylic acid, there are also the following: 2,2-2-trifluoroethyl (meth) acrylate, and 2,2,3,3,3-pentafluoropropane (meth) acrylate Ester, 2- (perfluorobutyl) ethyl (meth) acrylate, 2- (perfluorohexyl) ethyl (meth) acrylate, 2- (perfluorooctyl) ethyl (meth) acrylate, ( 2- (perfluorodecyl) ethyl meth) acrylate, α-trifluoromethyl methacrylate, α-trifluoroethyl methacrylate (meth) acrylate compounds having a fluorine atom in the molecule ; And fluorine-containing fluoroalkyl, fluorinated cycloalkyl or fluorinated alkyl groups having at least 3 fluorine atoms in the molecule and having 1 to 14 carbon atoms and at least 2 (meth) acryloxy groups Polyfunctional (meth) acrylate compounds and the like.
作為上述熱硬化之極性基,較佳為例如羥基、羧基、胺基、 環氧基等氫鍵形成基。該等不僅與塗膜之密合性優異,而且與二氧化矽等無機超微粒子之親和性亦優異。作為具有熱硬化性極性基之聚合性化合物,例如可列舉:4-氟乙烯-全氟烷基乙烯醚共聚物;氟乙烯-烴系乙烯 醚共聚物;及環氧、聚胺酯、纖維素、苯酚、聚醯亞胺等各樹脂之氟改質品等。 As the thermally-curable polar group, for example, a hydroxyl group, a carboxyl group, an amine group, Hydrogen-bonding groups such as epoxy groups. These are not only excellent in adhesion to the coating film, but also excellent in affinity with inorganic ultrafine particles such as silicon dioxide. Examples of the polymerizable compound having a thermosetting polar group include a 4-fluoroethylene-perfluoroalkyl vinyl ether copolymer; and a fluoroethylene-hydrocarbon-based ethylene. Ether copolymer; and fluorine modified products of epoxy, polyurethane, cellulose, phenol, polyimide and other resins.
作為上述同時具有利用游離放射線而硬化之官能基與熱硬化之極性基之聚合性化合物,可例示:丙烯酸或甲基丙烯酸之部分及完全氟化烷基、烯基、芳基酯類;完全或部分氟化乙烯醚類;完全或部分氟化乙烯酯類;及完全或部分氟化乙烯基酮類等。 Examples of the polymerizable compound having a functional group that is hardened by free radiation and a polar group that is thermally hardened include the following: partially or completely fluorinated alkyl, alkenyl, and aryl esters of acrylic acid or methacrylic acid; completely or Partially fluorinated vinyl ethers; fully or partially fluorinated vinyl esters; and fully or partially fluorinated vinyl ketones.
又,作為氟系樹脂,例如可列舉如下者。 Examples of the fluorine-based resin include the following.
至少含有1種具上述游離放射線硬化性基之聚合性化合物之含氟(甲基)丙烯酸酯化合物之單體或單體混合物之聚合物;上述含氟(甲基)丙烯酸酯化合物之至少1種與如(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸2-乙基己酯般於分子中不含氟原子之(甲基)丙烯酸酯化合物的共聚物;及氟乙烯、偏二氟乙烯、三氟乙烯、三氟氯乙烯、3,3,3-三氟丙烯、1,1,2-三氯-3,3,3-三氟丙烯、六氟丙烯之類的含氟單體之均聚物或共聚物等。亦可使用使該等共聚物含有聚矽氧成分之含聚矽氧之偏二氟乙烯共聚物。作為此情形時之聚矽氧成分,可例示:(聚)二甲基矽氧烷、(聚)二乙基矽氧烷、(聚)二苯基矽氧烷、(聚)甲基苯基矽氧烷、烷基改質(聚)二甲基矽氧烷、含偶氮基之(聚)二甲基矽氧烷、二甲基聚矽氧、苯基甲基聚矽氧、烷基.芳烷基改質聚矽氧、氟矽酮、聚醚改質聚矽氧、脂肪酸酯改質聚矽氧、甲基氫聚矽氧、含矽烷醇基之聚矽氧、含烷氧基之聚矽氧、含酚基之聚矽氧、甲基丙烯酸改質聚矽氧、丙烯酸改質聚矽氧、胺基改質聚矽氧、羧酸改質聚矽氧、甲醇改質聚矽氧、環氧基改質聚矽氧、巰基改質聚矽氧、氟改質聚矽氧、聚醚改質聚矽氧等。其中,較佳為具有 二甲基矽氧烷結構者。 A monomer or a polymer of a monomer mixture containing at least one fluorine-containing (meth) acrylate compound of the polymerizable compound having the above-mentioned free radiation-curable group; at least one of the above-mentioned fluorine-containing (meth) acrylate compound It is not as good in the molecule as methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate Copolymers of (meth) acrylate compounds containing fluorine atoms; and fluoroethylene, vinylidene fluoride, trifluoroethylene, trifluorochloroethylene, 3,3,3-trifluoropropylene, 1,1,2-tri Homopolymers or copolymers of fluorine-containing monomers such as chloro-3,3,3-trifluoropropylene and hexafluoropropylene. Polysiloxane-containing vinylidene fluoride copolymers in which these copolymers contain a polysiloxane component can also be used. Examples of the polysiloxane component in this case include (poly) dimethylsiloxane, (poly) diethylsiloxane, (poly) diphenylsiloxane, and (poly) methylphenyl) Siloxane, alkyl modified (poly) dimethylsiloxane, (poly) dimethylsiloxanes containing azo groups, dimethylpolysiloxane, phenylmethylpolysiloxane, alkyl . Aralkyl modified polysiloxane, fluorosilicone, polyether modified polysiloxane, fatty acid ester modified polysiloxane, methylhydrogen polysiloxane, silanol containing silanol group, alkoxy group Polysiloxane, phenol-containing polysiloxane, methacrylic modified polysiloxane, acrylic modified polysiloxane, amine modified polysiloxane, carboxylic acid modified polysiloxane, methanol modified polysiloxane Oxygen, epoxy-modified polysiloxane, mercapto-modified polysiloxane, fluorine-modified polysiloxane, polyether-modified polysiloxane, etc. Among them, it is preferable to have Dimethylsiloxane structure.
進而,由如下之化合物構成之非聚合物或聚合物亦可用作氟 系樹脂。即,可使用如下:使分子中具有至少1個異氰酸酯基之含氟化合物與分子中具有至少1個如胺基、羥基、羧基之與異氰酸酯基反應之官能基之化合物進行反應而得之化合物;及使如含氟之聚醚多元醇、含氟之烷基多元醇、含氟之聚酯多元醇、含氟之ε-己內酯改質多元醇之含氟之多元醇與具有異氰酸酯基之化合物進行反應而得之化合物等。 Furthermore, non-polymers or polymers composed of the following compounds can also be used as fluorine Department of resin. That is, the following can be used: a compound obtained by reacting a fluorine-containing compound having at least one isocyanate group in a molecule with a compound having at least one functional group reacting with an isocyanate group such as an amine group, a hydroxyl group, and a carboxyl group in the molecule; And the fluorine-containing polyols such as fluorine-containing polyether polyols, fluorine-containing alkyl polyols, fluorine-containing polyester polyols, fluorine-containing ε-caprolactone modified polyols, and those having isocyanate groups Compounds obtained by reacting compounds.
又,亦可將如上述記載之各樹脂與上述具有氟原子之聚合性 化合物或聚合物一起混合而使用。進而,可適當使用用以使反應性基等硬化之硬化劑、用以使塗佈性提高或賦予防污性之各種添加劑、溶劑。 In addition, each of the resins described above and the above-mentioned polymerizable polymer having a fluorine atom may be used. Compounds or polymers are used together. Further, a hardening agent for hardening a reactive group or the like, various additives and a solvent for improving coatability or imparting antifouling properties can be appropriately used.
於上述低折射率層之形成中,較佳為將添加低折射率劑及樹 脂等而成之低折射率層用組成物之黏度設為可獲得較佳塗佈性之0.5~5mPa.s(25℃)、更佳為0.7~3mPa.s(25℃)之範圍。可實現可見光線之優異之抗反射層、且可形成均勻且無塗佈不均之薄膜,並且可形成密合性尤其優異之低折射率層。 In the formation of the above-mentioned low refractive index layer, it is preferable to add a low refractive index agent and a tree The viscosity of the composition for a low refractive index layer made of a grease or the like is set to 0.5 to 5 mPa to obtain better coating properties. s (25 ℃), more preferably 0.7 ~ 3mPa. s (25 ° C) range. It can realize an excellent anti-reflection layer for visible light, and it can form a uniform and non-uniform thin film, and it can form a low refractive index layer with particularly excellent adhesion.
構成上述低折射率層之樹脂之硬化手段亦可與上述硬塗層 中之硬化手段相同。於為了進行硬化處理而利用加熱手段之情形時,較佳為藉由加熱,將例如產生自由基而使聚合性化合物之聚合開始之熱聚合起始劑添加至氟系樹脂組成物。 The hardening means of the resin constituting the low refractive index layer may also be the same as that of the hard coat layer. The hardening method is the same. When a heating means is used for hardening treatment, it is preferred to add a thermal polymerization initiator that initiates polymerization of a polymerizable compound by heating to the fluorine-based resin composition by heating.
作為上述基材膜,並未特別限定,例如可列舉:聚酯系樹脂、 乙酸酯系樹脂、聚醚碸系樹脂、聚碳酸酯系樹脂、聚醯胺系樹脂、聚醯亞胺系樹脂、聚烯烴系樹脂、(甲基)丙烯酸系樹脂、聚氯乙烯系樹脂、聚偏二 氯乙烯系樹脂、聚苯乙烯系樹脂、聚乙烯醇系樹脂、聚芳酯系樹脂、聚苯硫醚系樹脂、芳香族聚醚酮系樹脂等。其中,可較佳地使用聚酯系樹脂、聚碳酸酯系樹脂、聚烯烴系樹脂。 The base film is not particularly limited, and examples thereof include polyester resins, Acetate resin, Polyether resin, Polycarbonate resin, Polyamide resin, Polyimide resin, Polyolefin resin, (Meth) acrylic resin, Polyvinyl chloride resin, Poly partial Vinyl chloride-based resins, polystyrene-based resins, polyvinyl alcohol-based resins, polyarylate-based resins, polyphenylene sulfide-based resins, aromatic polyetherketone-based resins, and the like. Among them, polyester-based resins, polycarbonate-based resins, and polyolefin-based resins can be preferably used.
作為上述基材膜所使用之聚烯烴系樹脂,例如可列舉將聚乙 烯、聚丙烯、環狀聚烯烴等至少1種設為構成成分之基材。作為上述環狀聚烯烴,例如可列舉具有降莰烯骨架者。 Examples of the polyolefin-based resin used in the substrate film include polyethylene At least one of olefin, polypropylene, and cyclic polyolefin is used as the base material of the constituents. Examples of the cyclic polyolefin include those having a norbornene skeleton.
作為上述聚碳酸酯系樹脂,例如可列舉:將雙酚類(雙酚A)設為基質之芳香族聚碳酸酯、二乙二醇雙(烯丙基碳酸酯)等脂肪族聚碳酸酯等。 Examples of the polycarbonate-based resin include an aromatic polycarbonate having a bisphenol (bisphenol A) as a matrix, an aliphatic polycarbonate such as diethylene glycol bis (allyl carbonate), and the like. .
作為上述(甲基)丙烯酸系樹脂,例如可列舉:聚(甲基)丙烯酸甲酯、聚(甲基)丙烯酸乙酯、(甲基)丙烯酸甲酯-(甲基)丙烯酸丁酯共聚物等。 Examples of the (meth) acrylic resin include poly (meth) acrylate, poly (meth) acrylate, methyl (meth) acrylate-butyl (meth) acrylate copolymer, and the like. .
作為上述聚酯系樹脂,例如可列舉將聚對苯二甲酸乙二酯(PET)、聚對苯二甲酸丙二酯、聚對苯二甲酸丁二酯、聚萘二甲酸乙二酯(PEN)中之至少1種設為構成成分之基材。 Examples of the polyester-based resin include polyethylene terephthalate (PET), polytrimethylene terephthalate, polybutylene terephthalate, and polyethylene naphthalate (PEN At least one of) is used as a base material of a constituent.
作為上述芳香族聚醚酮系樹脂,例如可列舉聚醚醚酮(PEEK)等。 Examples of the aromatic polyetherketone-based resin include polyetheretherketone (PEEK).
於本發明中,上述基材膜之厚度並未特別限定,可設為5~300μm,就操作性或防止於上述積層體產生之褶皺或歪扭等之觀點而言,厚度較佳為10μm以上,就薄膜化之觀點而言,較佳為200μm以下。 In the present invention, the thickness of the substrate film is not particularly limited, and may be set to 5 to 300 μm. The thickness is preferably 10 μm or more in terms of operability or prevention of wrinkles or distortions generated in the laminated body. From the viewpoint of thinning, the thickness is preferably 200 μm or less.
上述基材膜之厚度的更佳下限為15μm,更佳上限為125μm。 The more preferable lower limit of the thickness of the substrate film is 15 μm, and the more preferable upper limit is 125 μm.
關於上述基材膜,亦可預先對其表面實施濺鍍、電暈放電、紫外線照射、電子束照射、化學處理、氧化等蝕刻處理或底塗處理。藉由預先實施該等處理,可提高與形成於上述基材膜上之硬塗層或單官能單體之硬化層之密合性。又,亦可於形成硬塗層或硬化層之前,視需要藉由溶 劑清洗或超音波清洗等對基材膜表面進行除塵、清潔化。 The substrate film may be subjected to an etching treatment or a primer treatment such as sputtering, corona discharge, ultraviolet irradiation, electron beam irradiation, chemical treatment, or oxidation in advance on the surface thereof. By performing these processes in advance, the adhesion with the hard coat layer or the hardened layer of the monofunctional monomer formed on the substrate film can be improved. Alternatively, before forming a hard coat layer or a hardened layer, Agent cleaning or ultrasonic cleaning can be used to remove dust and clean the surface of the substrate film.
本發明之積層體為如下之構成:於基材膜之一面上具有一層 以上之光學功能層且於該基材膜之另一面上具有低接觸角層;就賦予製造時之防捲曲性或防龜裂性、防損傷性之觀點而言,較佳為對上述低接觸角層側賦予硬塗性能。 The laminated body of the present invention has the following structure: a layer is provided on one surface of the base film The above optical functional layer has a low contact angle layer on the other side of the base film; from the viewpoint of imparting curl resistance, crack resistance, and damage resistance at the time of manufacturing, it is preferable that the above-mentioned low contact is The corner layer side imparts hard coating performance.
作為賦予上述硬塗性能之方法,例如可較佳地列舉:對上述低接觸角層賦予硬塗性能之方法或於上述低接觸角層與基材膜之間形成硬塗層之方法。 Examples of the method for imparting the hard-coating performance include a method for imparting a hard-coating performance to the low-contact-angle layer or a method for forming a hard-coat layer between the low-contact-angle layer and the substrate film.
作為對上述低接觸角層賦予硬塗性能之方法,例如可列舉如 下方法:將與上述硬塗層用組成物相同之游離放射線硬化型樹脂及光聚合起始劑添加至低接觸角層用組成物,並塗佈於上述基材膜進行乾燥,其後進行紫外線等活性能量線之照射而形成上述低接觸角層。 Examples of the method for imparting hard coating performance to the low contact angle layer include, for example, Method: Add the same radiation-hardenable resin and photopolymerization initiator as the composition for the hard coat layer to the composition for the low contact angle layer, apply to the substrate film to dry, and then perform ultraviolet rays The above-mentioned low contact angle layer is formed by irradiation of active energy rays.
作為於上述低接觸角層與基材膜之間形成硬塗層之方法,例 如可列舉:利用與形成上述作為光學功能層之硬塗層相同之方法,於上述基材膜之面上形成硬塗層,進而於該硬塗層之與基材膜為相反側之面上形成上述低接觸角層之方法。 As a method for forming a hard coat layer between the above-mentioned low contact angle layer and the substrate film, an example For example, it is possible to form a hard coat layer on the surface of the above-mentioned substrate film by the same method as that of forming the above-mentioned hard coat layer as the optical functional layer, and then to form the hard coating layer on the side opposite to the substrate film. Method for forming the above-mentioned low contact angle layer.
就可較佳地賦予防捲曲性之方面而言,形成於上述低接觸角與基材膜之間之硬塗層之厚度較佳為與上述作為光學功能層之硬塗層為相同程度之厚度。 The thickness of the hard coat layer formed between the above-mentioned low contact angle and the base film is preferably the same as that of the above-mentioned hard coat layer as the optical functional layer in terms of giving the curl resistance better. .
再者,所謂「相同程度之厚度」,意指上述低接觸角與基材膜之間之硬塗層之厚度與作為上述光學功能層之硬塗層之厚度之差為1.0μm以下之情形。 In addition, the "thickness of the same degree" means a case where the difference between the thickness of the hard coat layer between the low contact angle and the base film and the thickness of the hard coat layer as the optical functional layer is 1.0 μm or less.
本發明之積層體係用以於上述光學功能層之與上述基材膜 側為相反側之面上形成經圖案化之透明導電層。 The laminated system of the present invention is used for the optical functional layer and the substrate film. A patterned transparent conductive layer is formed on the opposite side.
作為上述透明導電層,並未特別限定,例如可列舉:含金屬氧化物之透明導電層或含導電性纖維狀填料之透明導電層等。 The transparent conductive layer is not particularly limited, and examples thereof include a transparent conductive layer containing a metal oxide or a transparent conductive layer containing a conductive fibrous filler.
作為含上述金屬氧化物之透明導電層,例如可列舉由銦錫氧 化物(ITO)、氧化鋅(ZnO)、氧化鋅鋁(AZO)、氧化鎵鋅(GZO)、氧化錫(SnO2)、氧化銦(In2O3)、氧化鎢(WO3)等構成之膜,其中較佳為銦錫氧化物(ITO)。 Examples of the transparent conductive layer containing the metal oxide include indium tin oxide (ITO), zinc oxide (ZnO), zinc aluminum oxide (AZO), gallium zinc oxide (GZO), tin oxide (SnO 2 ), A film made of indium oxide (In 2 O 3 ), tungsten oxide (WO 3 ), or the like is preferred. Among them, indium tin oxide (ITO) is preferred.
含上述金屬氧化物之透明導電層之厚度並未特別限制,為了 製成使其表面電阻為200Ω/□以下之具有良好導電性之連續被膜而需要某一程度之厚度,若厚度變得過厚,則會導致透明性之降低等,故而上述厚度之較佳下限為15nm,較佳上限為45nm,更佳下限為20nm,更佳上限為40nm。若厚度未達15nm,則表面電阻增高,且不易成為連續被膜。 又,若超過45nm,則存在會導致透明性降低等情況。 The thickness of the transparent conductive layer containing the above metal oxide is not particularly limited. It is necessary to make a continuous film with good conductivity with a surface resistance of 200Ω / □ or less. If the thickness becomes too thick, it will lead to a reduction in transparency, etc., so the lower limit of the above thickness is preferred. It is 15 nm, a preferable upper limit is 45 nm, a more preferable lower limit is 20 nm, and a more preferable upper limit is 40 nm. If the thickness is less than 15 nm, the surface resistance increases and it becomes difficult to form a continuous film. Moreover, when it exceeds 45 nm, transparency may fall, etc. may exist.
含上述金屬氧化物之透明導電層可藉由濺鍍處理而形成,較佳為於該濺鍍處理後,於150℃、60分鐘之條件實施加熱處理而使其結晶化。 The transparent conductive layer containing the above-mentioned metal oxide can be formed by a sputtering process, and it is preferable to perform a heat treatment at 150 ° C. for 60 minutes after the sputtering process to crystallize it.
藉由使上述透明導電層結晶化,透明導電層被低電阻化,並且,透明性及耐久性亦提高。 By crystallizing the transparent conductive layer, the transparent conductive layer is reduced in resistance, and transparency and durability are also improved.
再者,作為對藉由上述濺鍍處理而形成之透明導電層進行圖案化之方法,可列舉公知之蝕刻法等。上述透明導電層之加熱處理既可於對透明導電層進行圖案化之前進行,亦可於對透明導電層進行圖案化之後進行。 Moreover, as a method of patterning the transparent conductive layer formed by the said sputtering process, a well-known etching method etc. are mentioned. The heat treatment of the transparent conductive layer may be performed before the transparent conductive layer is patterned, or may be performed after the transparent conductive layer is patterned.
又,於上述積層體之光學功能層之與基材膜側為相反側之面上形成有 經圖案化之透明導電層之導電性積層體亦為本發明之一。 In addition, the optical functional layer of the laminated body is formed on a surface opposite to the substrate film side. The conductive laminated body of the patterned transparent conductive layer is also one of the present invention.
關於上述含導電性纖維狀填料之透明導電層之厚度,只要可 獲得導電性能,則並未特別限定,於考慮到導通之情形時,較佳為導電性纖維狀填料局部存在於層內之任一處。藉由使上述導電性纖維狀填料局部存在於層內,不僅導通變得良好,而且只要最小限度之纖維含量即可,並且可提高總透光率,降低霧度。 Regarding the thickness of the transparent conductive layer containing the conductive fibrous filler, The conductive properties are not particularly limited. In consideration of conduction, it is preferable that the conductive fibrous filler is locally present in any part of the layer. By making the conductive fibrous filler locally in the layer, not only the conduction becomes good, but also the minimum fiber content is required, and the total light transmittance can be increased and the haze can be reduced.
本發明之積層體之霧度值之較佳上限為5%,更佳上限為1.5%,進而較佳上限為1%,總透光率之較佳下限為80%,更佳之下限為90%。 The preferred upper limit of the haze value of the laminated body of the present invention is 5%, the more preferred upper limit is 1.5%, and the further preferred upper limit is 1%. The preferred lower limit of the total light transmittance is 80%, and the preferred lower limit is 90%. .
再者,上述霧度值係內部霧度值與表面霧度值之合計,且係依據JISK-7136所測得之值。作為用於測定之機器,可列舉:反射-穿透率計HM-150(村上色彩技術研究所)。 The haze value is the total of the internal haze value and the surface haze value, and is a value measured in accordance with JISK-7136. Examples of the measurement device include a reflection-transmittance meter HM-150 (Murakami Color Technology Research Institute).
又,上述總透光率係依據JIS K-7361所測得之值。作為用於測定之機器,可列舉:反射-穿透率計HM-150(村上色彩技術研究所)。 The total light transmittance is a value measured in accordance with JIS K-7361. Examples of the measurement device include a reflection-transmittance meter HM-150 (Murakami Color Technology Research Institute).
又,就可使導電性積層體之電阻值進一步降低之方面而言,更佳為上述導電性纖維狀填料局部存在於層之表面附近。 Moreover, from the point which can further reduce the electric resistance value of a conductive laminated body, it is more preferable that the said conductive fibrous filler exists locally in the vicinity of the surface of a layer.
於上述含導電性纖維狀填料之透明導電層中,較佳為厚度未 達導電性纖維狀填料之纖維直徑。若上述透明導電層之厚度為導電性纖維狀填料之纖維直徑以上,則存在黏合劑樹脂進入導電性纖維狀填料之接點之量增多而導通惡化,從而無法獲得目標電阻值之情況。 In the transparent conductive layer containing the conductive fibrous filler, the thickness is preferably Reach the fiber diameter of conductive fibrous filler. If the thickness of the transparent conductive layer is greater than the fiber diameter of the conductive fibrous filler, the amount of the adhesive resin entering the contact point of the conductive fibrous filler may increase and the conduction may deteriorate, and the target resistance value may not be obtained.
作為上述含導電性纖維狀填料之透明導電層之厚度,具體而言,較佳為10~200nm左右。若上述透明導電層之厚度未達10nm,則存在如下情況:該透明導電層形成時在塗佈透明導電層用組成物時產生未塗佈之區 域,而於藉由下述轉印法形成上述透明導電層之情形時,上述透明導電層未被轉印。另一方面,若超過200nm,則存在必須使導電性纖維狀填料之纖維直徑變粗至超過下述之較佳範圍,故而導電性積層體之霧度上升而總透光率降低之情況,從而於光學方面並不合適。上述含導電性纖維狀填料之透明導電層之厚度更佳為50nm以下,進而較佳為30nm以下。 As the thickness of the transparent conductive layer containing the conductive fibrous filler, specifically, it is preferably about 10 to 200 nm. If the thickness of the transparent conductive layer is less than 10 nm, there are cases in which an uncoated region is generated when the transparent conductive layer is formed while coating the composition for a transparent conductive layer. In the case where the transparent conductive layer is formed by the following transfer method, the transparent conductive layer is not transferred. On the other hand, if it exceeds 200 nm, the fiber diameter of the conductive fibrous filler must be made thicker than the preferable range described below, so that the haze of the conductive laminate may increase and the total light transmittance may decrease. Not optically appropriate. The thickness of the transparent conductive layer containing the conductive fibrous filler is more preferably 50 nm or less, and even more preferably 30 nm or less.
再者,上述透明導電層之厚度例如可以如下方式求出:使用SEM、STEM、TEM等電子顯微鏡,求出以1000~50萬倍對上述透明導電層之剖面進行觀察並對厚度進行測定而得之10處部位的平均值。 In addition, the thickness of the transparent conductive layer can be obtained, for example, by using an electron microscope such as SEM, STEM, or TEM to determine the thickness of the transparent conductive layer by observing the cross section of the transparent conductive layer at 1000 to 500,000 times. Average of 10 locations.
上述導電性纖維狀填料較佳為纖維直徑為200nm以下,且纖維長度為1μm以上。 The conductive fibrous filler preferably has a fiber diameter of 200 nm or less and a fiber length of 1 μm or more.
若上述纖維直徑超過200nm,則存在導電性積層體之霧度值增高或透光性能變得不足之情況。就透明導電層之導電性之觀點而言,上述導電性纖維狀填料之纖維直徑之較佳下限為10nm,上述纖維直徑之更佳範圍為15~180nm。 When the fiber diameter exceeds 200 nm, the haze value of the conductive laminate may increase or the light transmission performance may become insufficient. From the viewpoint of the conductivity of the transparent conductive layer, the preferable lower limit of the fiber diameter of the conductive fibrous filler is 10 nm, and the more preferable range of the fiber diameter is 15 to 180 nm.
又,若上述導電性纖維狀填料之纖維長度未達1μm,則存在無法形成具有足夠之導電性能之透明導電層之情況,且有產生凝聚而導致霧度值上升或透光性能降低之虞,因此上述纖維長度之較佳上限為500μm,上述纖維長度之更佳範圍為3~300μm,進而較佳範圍為10~30μm。 In addition, if the fiber length of the above-mentioned conductive fibrous filler is less than 1 μm, a transparent conductive layer having sufficient conductive properties may not be formed, and agglomeration may occur, resulting in an increase in haze value or a decrease in light transmission performance. Therefore, the preferable upper limit of the fiber length is 500 μm, and the more preferable range of the fiber length is 3 to 300 μm, and the more preferable range is 10 to 30 μm.
再者,上述導電性纖維狀填料之纖維直徑、纖維長度例如可以如下方式求出:使用SEM、STEM、TEM等電子顯微鏡,求出以1000~50萬倍對上述導電性纖維狀填料之纖維直徑及纖維長度進行測定而得之10處部位的平均值。 In addition, the fiber diameter and fiber length of the conductive fibrous filler can be determined, for example, as follows: using an electron microscope such as SEM, STEM, and TEM, the fiber diameter of the conductive fibrous filler can be determined by 1,000 to 500,000 times. And the fiber length was measured and averaged at 10 locations.
作為此種導電性纖維狀填料,較佳為選自由導電性碳纖維、 金屬纖維及金屬被覆合成纖維所組成之群中之至少1種。 The conductive fibrous filler is preferably selected from conductive carbon fibers, At least one of the group consisting of metal fibers and metal-coated synthetic fibers.
作為上述導電性碳纖維,例如可列舉:氣相沈積法碳纖維(VGCF)、奈米碳管、杯形絲(wire cup)、絲絨(wire wool)等。該等導電性碳纖維可使用1種或2種以上。 Examples of the conductive carbon fiber include a vapor deposition carbon fiber (VGCF), a nano carbon tube, a wire cup, and a wire wool. These conductive carbon fibers may be used alone or in combination of two or more.
作為上述金屬纖維,例如可使用藉由使不鏽鋼、鐵、金、銀、 鋁、鎳、鈦等延伸為細且長之拉線法或切削法等而製作之纖維。此種金屬纖維可使用1種或2種以上。於該等金屬纖維之中,就導電性優異之方面而言,較佳為使用銀之金屬纖維。 As the metal fiber, for example, stainless steel, iron, gold, silver, Fibers made of aluminum, nickel, titanium, etc., which are drawn into a thin and long drawing method or cutting method. Such metal fibers can be used alone or in combination of two or more. Among these metal fibers, a metal fiber using silver is preferred in terms of excellent electrical conductivity.
作為使用上述銀之金屬纖維之製造方法,例如可列舉於溶液中將硝酸銀、硫酸銀等銀化合物還原之方法等,作為於溶液中將硫酸銀還原之方法,繼Y.Sun、B.Gates、B.Mayers、&Y.Xia,“Crystalline silver nanowires by soft solution processing”、Nanoletters、(2002)、2(2)165~168所記載之「多元醇」法,可列舉藉由於聚乙烯吡咯啶酮(PVP)之存在下將溶解於乙二醇中之硫酸銀還原而合成之方法等。 Examples of the method for producing the metal fiber using the silver include a method of reducing silver compounds such as silver nitrate and silver sulfate in a solution. As a method of reducing silver sulfate in a solution, following Y.Sun, B.Gates, The "polyol" method described in B. Mayers, & Y. Xia, "Crystalline silver nanowires by soft solution processing", Nanoetters, (2002), 2 (2) 165-168, can be cited by polyvinylpyrrolidone ( A method for synthesizing by reducing silver sulfate dissolved in ethylene glycol in the presence of PVP).
作為上述金屬被覆合成纖維,例如可列舉於丙烯酸系纖維塗 佈有金、銀、鋁、鎳、鈦等而成之纖維等。此種金屬被覆合成纖維可使用1種或2種以上。於該等金屬被覆合成纖維之中,就導電性優異之方面而言,較佳為使用銀之金屬被覆合成纖維。 Examples of the metal-coated synthetic fibers include acrylic fiber coatings. Fabrics made of gold, silver, aluminum, nickel, titanium, etc. Such metal-coated synthetic fibers may be used alone or in combination of two or more. Among these metal-coated synthetic fibers, a metal-coated synthetic fiber using silver is preferred in terms of excellent electrical conductivity.
作為上述導電性纖維狀填料之含量,例如相對於構成透明導 電層之樹脂成分100質量份,較佳為20~3000質量份。若未達20質量份,則存在無法形成具有足夠之導電性能之透明導電層之情況,若超過3000質 量份,則存在導電性積層體之霧度增高或透光性能變得不足之情況。又,存在黏合劑樹脂進入導電性纖維狀填料之接點之量增多而導致透明導電層之導通惡化,造成本發明之導電性積層體無法獲得目標電阻值之情況。上述導電性纖維狀填料之含量之更佳下限為50質量份,更佳上限為1000質量份。 As the content of the conductive fibrous filler, for example, the content of The resin component of the electric layer is 100 parts by mass, preferably 20 to 3000 parts by mass. If it is less than 20 parts by mass, there may be cases where a transparent conductive layer having sufficient conductivity cannot be formed, and if it exceeds 3000 parts by mass The amount may increase the haze of the conductive laminated body or the light transmission performance may be insufficient. In addition, there is a case where the amount of the adhesive resin entering the conductive fibrous filler increases, which leads to deterioration of the conduction of the transparent conductive layer, and the conductive laminated body of the present invention may not be able to obtain a target resistance value. A more preferable lower limit of the content of the conductive fibrous filler is 50 parts by mass, and a more preferable upper limit is 1000 parts by mass.
上述導電性纖維狀填料之一部分較佳為自上述透明導電層 之表面突出。於藉由使用了轉印膜之轉印法製造本發明之導電性積層體之情形時,以使上述透明導電層側面與被轉印體相對向之方式使其等積層並加壓,而使上述導電性纖維狀填料自透明導電層之與基材膜側為相反側之表面(即,透明導電層之被擠壓於被轉印體之面)突出,藉此,該突出之導電性纖維狀填料於嵌入至被轉印體之狀態下被轉印,其結果,所獲得之導電性積層體之耐溶劑性提高,可藉由蝕刻法等較佳地進行導電圖案之形成等。又,導電性積層體之耐擦傷性亦變得優異。 A part of the conductive fibrous filler is preferably from the transparent conductive layer. The surface is prominent. When the conductive laminated body of the present invention is manufactured by a transfer method using a transfer film, the transparent conductive layer is laminated and pressurized so that the side of the transparent conductive layer faces the object to be transferred, so that The conductive fibrous filler protrudes from the surface of the transparent conductive layer that is opposite to the substrate film side (that is, the surface of the transparent conductive layer that is pressed against the transferee), whereby the protruding conductive fibers The filler is transferred in a state of being embedded in the transferred body. As a result, the obtained conductive laminated body has improved solvent resistance, and the conductive pattern can be formed by an etching method or the like. In addition, the conductive laminate has excellent scratch resistance.
上述導電性纖維狀填料之一部分較佳為距上述透明導電層 之表面5~600nm之範圍地突出。於本發明中,上述透明導電層之表面之未突出導電性纖維狀填料之平坦之部位至所突出之導電性纖維狀填料之前端為止之垂直距離之範圍較佳為5~600nm。若上述垂直距離未達5nm,則存在導電性積層體之耐溶劑性不會提高之情形,若超過600nm,則存在導電性纖維狀填料會自透明導電層脫落之情況。上述垂直距離之更佳下限為10nm,更佳上限為200nm。 A part of the conductive fibrous filler is preferably away from the transparent conductive layer. The surface protrudes from 5 to 600 nm. In the present invention, the range of the vertical distance from the flat portion of the surface of the transparent conductive layer that does not protrude from the conductive fibrous filler to the front end of the protruded conductive fibrous filler is preferably 5 to 600 nm. If the vertical distance is less than 5 nm, the solvent resistance of the conductive laminate may not be improved. If it exceeds 600 nm, the conductive fibrous filler may fall off from the transparent conductive layer. The more preferable lower limit of the vertical distance is 10 nm, and the more preferable upper limit is 200 nm.
再者,自上述透明導電層之表面突出之導電性纖維狀填料之垂直距離例如可以如下方式求出:使用SEM、STEM、TEM等電子顯微鏡,以1000 ~50萬倍進行上述透明導電層之表面之觀察,求出對自上述透明導電層之表面之平坦之部位至所突出之導電性纖維狀填料之前端為止之垂直距離進行測定而得之10處部位的平均值。 In addition, the vertical distance of the conductive fibrous filler protruding from the surface of the transparent conductive layer can be obtained, for example, by using an electron microscope such as SEM, STEM, and TEM at 1000 Observe the surface of the transparent conductive layer by ~ 500,000 times, and determine the 10 points obtained by measuring the vertical distance from the flat part of the surface of the transparent conductive layer to the front end of the protruding conductive fibrous filler. Site average.
於本發明之導電性積層體中,上述透明導電層之構成上述表 面之上述導電性纖維狀填料之導電材料元素之比率,以原子組成百分率計為0.15~5.00at%。若未達0.15at%,則會產生本發明之導電性積層體之導電性變得不足或蝕刻速度減慢之不良情況。若超過5.00at%,則本發明之導電性積層體之透光率降低,又,耐擦傷性較差。構成存在於上述透明導電層之表面之導電性纖維狀填料之導電材料元素之比率之較佳下限為0.20at%,較佳上限為2.00at%,更佳下限為0.30at%,更佳上限為1.00at%。 In the conductive laminated body of the present invention, the constitution of the transparent conductive layer is as described in the above table. The ratio of the conductive material elements of the above-mentioned conductive fibrous filler is 0.15 to 5.00 at% in terms of atomic composition percentage. If it is less than 0.15 at%, there will be a problem that the conductivity of the conductive laminated body of the present invention becomes insufficient or the etching rate is reduced. If it exceeds 5.00 at%, the light transmittance of the conductive laminate of the present invention is reduced, and the scratch resistance is poor. A preferable lower limit of the ratio of the conductive material elements constituting the conductive fibrous filler existing on the surface of the transparent conductive layer is 0.20at%, a preferable upper limit is 2.00at%, a more preferable lower limit is 0.30at%, and a more preferable upper limit is 1.00at%.
再者,構成存在於上述透明導電層之表面之導電性纖維狀填料之導電材料元素之比率可使用X射線光電子分光分析法,並根據以下之條件進行測定。 In addition, the ratio of the conductive material elements constituting the conductive fibrous filler existing on the surface of the transparent conductive layer can be measured using X-ray photoelectron spectrometry under the following conditions.
加速電壓:15kV Accelerating voltage: 15kV
發射電流:10mA Emission current: 10mA
X射線源:Al Dual Anode X-ray source: Al Dual Anode
測定面積:300×700μmΦ Measurement area: 300 × 700μmΦ
對自表面至深度10nm之部分進行測定 Measurement from the surface to a depth of 10 nm
n=3次之平均值 n = 3 times average
再者,具有此種表面之透明導電層較佳為源於導電性纖維狀填料而於該表面形成可達成耐溶劑性及耐擦傷性、進而低霧度值且極高之透光率之程度之凹凸形狀。 Furthermore, it is preferable that the transparent conductive layer having such a surface is derived from a conductive fibrous filler and formed on the surface to such an extent that solvent resistance and abrasion resistance can be achieved, and further a low haze value and extremely high light transmittance are formed. The uneven shape.
作為本發明之導電性積層體之製造方法,例如可列舉如下方 法:藉由通常之塗佈法將透明導電性層積層於基材膜上之方法;進而於其上以可獲得目標電阻值之水準積層保護層之方法;及具有使用於基材膜上至少具有上述導電性層之轉印膜,將上述導電性層轉印至被轉印體之轉印步驟之方法等。於使導電性積層體之電阻值更低之情形時,較佳為藉由具有將上述導電性層轉印至被轉印體之轉印步驟之方法而製造。 Examples of the method for producing the conductive laminated body of the present invention include the following: Method: a method of laminating a transparent conductive layer on a substrate film by a general coating method; further a method of laminating a protective layer thereon at a level capable of obtaining a target resistance value; and having at least a substrate film A transfer film having the above-mentioned conductive layer, a method for transferring the above-mentioned conductive layer to a transfer target, and the like. In the case where the electrical resistance of the conductive laminate is lowered, it is preferably produced by a method having a transfer step of transferring the conductive layer to a transfer target.
於上述轉印步驟中,使用於基材膜上至少具有導電性層之轉印膜。 In the above transfer step, a transfer film having at least a conductive layer on a base film is used.
作為上述被轉印體,只要為可設置導電性層之構件,則並未特別限定,例如可列舉:由玻璃、樹脂、金屬、陶瓷等任意之材料構成之基材或形成於該等基材上之樹脂層或黏著層等被轉印層等。 The transfer target is not particularly limited as long as it is a member capable of providing a conductive layer, and examples thereof include a substrate made of any material such as glass, resin, metal, ceramic, or the like. Transferred layers such as resin layers or adhesive layers.
本發明之積層體可使用於電視、電腦等之顯示器顯示。可尤 佳地使用於LCD、有機、無機LED、PDP、電子紙等高精細影像用顯示器或觸控面板之表面。 The laminated body of the present invention can be used for display display of televisions, computers and the like. Coyo It is best used on the surface of high-definition imaging displays or touch panels such as LCD, organic, inorganic LED, PDP, and electronic paper.
其中,於上述積層體之光學功能層之與基材膜側為相反側之面上形成有經圖案化之透明導電層之本發明之導電性積層體可較佳地用於靜電電容方式之觸控面板。又,使用此種本發明之導電性積層體之觸控面板亦為本發明之一。本發明之觸控面板較佳為靜電電容方式之觸控面板。 Among them, the conductive laminated body of the present invention, in which the patterned transparent conductive layer is formed on the side of the optical functional layer of the laminated body opposite to the substrate film side, can be preferably used for the capacitive touch. Control panel. In addition, a touch panel using the conductive laminated body of the present invention is also one of the present invention. The touch panel of the present invention is preferably a touch panel of an electrostatic capacitance method.
本發明之積層體係由上述之構成所構成,故而即便於將附黏著層之膜貼合於基材膜之與透明導電層側為相反側之面並實施加熱處理後將該附黏著層之膜剝離之情形時,亦可較佳地防止貼合有該附黏著層之膜之面之水之接觸角增大而接著性降低。 The laminated system of the present invention is composed of the above-mentioned structure. Therefore, even if the film with an adhesive layer is bonded to the surface of the base film opposite to the transparent conductive layer side and the heat treatment is performed, the film with the adhesive layer is heated. In the case of peeling, it is also possible to prevent the contact angle of water from increasing on the surface of the film to which the adhesive layer is attached, and the adhesion to be lowered.
藉由下述之實施例對本發明之內容進行說明,但本發明之內容並不限定在該等實施態樣而解釋。此外,只要未特別限定,則於本實施例中,「份」及「%」分別表示「質量份」及「質量%」。 The contents of the present invention will be described by the following examples, but the contents of the present invention are not limited to the embodiments. In addition, as long as it is not specifically limited, in this embodiment, "part" and "%" represent "mass part" and "mass%", respectively.
使用下述配方之硬塗層組成物,以乾燥後之厚度成為2.0μm之方式塗佈於厚度100μm之雙軸延伸聚酯膜(東洋紡公司製造,A4300;附底塗層)之一面上(底塗層上),而形成硬塗層。 The hard-coating composition with the following formula was applied on one side of a biaxially-stretched polyester film (manufactured by Toyobo Co., Ltd., A4300; with undercoating) having a thickness of 2.0 μm so that the thickness after drying became 2.0 μm Coating)) to form a hard coating.
繼而,使用下述配方之高折射率層用組成物及低折射率層用組成物,將高折射率層(厚度50nm,折射率1.68)及低折射率層(厚度30nm,折射率1.48)依序形成於雙軸延伸聚酯膜之硬塗層上。 Next, using the composition for the high refractive index layer and the composition for the low refractive index layer described below, the high refractive index layer (thickness 50 nm, refractive index 1.68) and the low refractive index layer (thickness 30 nm, refractive index 1.48) were used. Sequentially formed on the hard coat of a biaxially stretched polyester film.
再者,由硬塗層、高折射率層及低折射率層構成之光學功能層之乾燥條件均設為70℃、60秒。又,於將硬塗層用組成物之塗膜、高折射率層用組成物之塗膜、及低折射率層用組成物之塗膜各個進行乾燥後,分別進行紫外線照射(150mJ/cm2)。 In addition, the drying conditions of the optical functional layer composed of the hard coat layer, the high refractive index layer, and the low refractive index layer were all set to 70 ° C. and 60 seconds. In addition, after drying each of the coating film of the composition for the hard coat layer, the coating film of the composition for the high refractive index layer, and the coating film of the composition for the low refractive index layer, ultraviolet irradiation (150 mJ / cm 2 ).
又,於上述雙軸延伸聚酯膜之另一面上塗佈下述配方之低接觸角層用組成物1而形成塗膜,並於70℃、60秒之條件進行乾燥,藉此獲得於雙軸延伸聚酯膜之另一面上設置有厚度20nm之低接觸角層之積層體。 In addition, a coating film was formed by coating the composition 1 for a low contact angle layer with the following formula on the other surface of the above-mentioned biaxially stretched polyester film, and drying was performed at 70 ° C and 60 seconds to obtain a biaxially-oriented polyester film. A laminated body of a low contact angle layer with a thickness of 20 nm is provided on the other side of the axially-stretched polyester film.
二新戊四醇六丙烯酸酯(重量平均分子量580,雙鍵當量100) 50份 Dipentaerythritol hexaacrylate (weight average molecular weight 580, double bond equivalent 100) 50 parts
光聚合起始劑(BASF公司製造,Irgacure 184) 2份 Photopolymerization initiator (manufactured by BASF, Irgacure 184) 2 parts
甲基異丁基酮 200份 Methyl isobutyl ketone 200 parts
二新戊四醇六丙烯酸酯(重量平均分子量580,雙鍵當量100) 10份 Dipentaerythritol hexaacrylate (weight average molecular weight 580, double bond equivalent 100) 10 parts
光聚合起始劑(BASF公司製造,Irgacure 127) 0.7份 Photopolymerization initiator (Irgacure 127, manufactured by BASF Corporation) 0.7 part
含高折射率粒子之液體(使平均粒徑10~15nm之氧化鋯粒子分散於甲基乙基酮中並將固形物成分設為30%而成者) 65份 Liquid containing high refractive index particles (a dispersion of zirconia particles having an average particle size of 10 to 15 nm in methyl ethyl ketone and a solid content of 30%) 65 parts
甲基異丁基酮 1000份 Methyl isobutyl ketone 1000 parts
二新戊四醇六丙烯酸酯(重量平均分子量580,雙鍵當量100) 3.5份 Dipentaerythritol hexaacrylate (weight average molecular weight 580, double bond equivalent 100) 3.5 parts
光聚合起始劑(BASF公司製造,Irgacure 127) 1份 Photopolymerization initiator (manufactured by BASF, Irgacure 127) 1 part
含低折射率粒子之液體(使平均粒徑10~15nm之二氧化矽粒子分散於甲基異丁基酮中並將固形物成分設為30%而成者) 21.7份 Liquid containing low-refractive-index particles (one obtained by dispersing silica particles with an average particle size of 10 to 15 nm in methyl isobutyl ketone and setting the solid content to 30%) 21.7 parts
甲基異丁基酮 1000份 Methyl isobutyl ketone 1000 parts
丙烯酸聚合物溶液(重量平均分子量16萬,雙鍵當量1000,固形物成分25%) 16份 Acrylic polymer solution (weight average molecular weight 160,000, double bond equivalent 1,000, solid content 25%) 16 parts
甲基異丁基酮 1000份 Methyl isobutyl ketone 1000 parts
將實施例1之低接觸角層用組成物1變更為下述配方之低接觸角層用 組成物2,以乾燥後之厚度成為2.0μm之方式塗佈該低接觸角層用組成物2而形成塗膜,然後於70℃、60秒之條件進行乾燥,並進行紫外線照射(150mJ/cm2)而形成低接觸角層,除此以外,以與實施例1相同之方式獲得積層體。 The composition for low contact angle layer 1 of Example 1 was changed to the composition for low contact angle layer 2 of the following formula, and the composition 2 for low contact angle layer was applied so that the thickness after drying became 2.0 μm. A laminated body was obtained in the same manner as in Example 1 except that a coating film was formed, followed by drying at 70 ° C. for 60 seconds, and irradiating with ultraviolet rays (150 mJ / cm 2 ) to form a low contact angle layer.
丙烯酸聚合物(重量平均分子量16萬,雙鍵當量1000,固形物成分25%)16份 16 parts of acrylic polymer (weight average molecular weight 160,000, double bond equivalent 1,000, solid content 25%)
二新戊四醇六丙烯酸酯(重量平構分子量580,雙鍵當量100) 4份 Dinepentaerythritol hexaacrylate (flat weight 580, double bond equivalent 100) 4 parts
光聚合起始劑(BASF公司製造,Irgacure 127) 0.8份 Photopolymerization initiator (Irgacure 127, manufactured by BASF) 0.8 part
甲基異丁基酮 30份 30 parts of methyl isobutyl ketone
於以與實施例1相同之方式形成光學功能層後,於上述雙軸延伸聚酯膜之另一面上,以乾燥後之厚度成為2.0μm之方式塗佈上述硬塗層用組成物而形成塗膜,然後進行該塗膜之乾燥及紫外線照射而形成硬塗層(折射率1.52)。再者,塗膜之乾燥條件為70℃、60秒,紫外線之照射量設為150mJ/cm2。繼而,使用低接觸角層用組成物1,以厚度成為20nm之方式於形成於雙軸延伸聚酯膜之另一面上之硬塗層上形成低接觸角層。於70℃、60秒之條件下對塗佈低接觸角層用組成物1而形成之塗膜進行乾燥,獲得積層體。 After the optical functional layer was formed in the same manner as in Example 1, the composition for the hard coat layer was coated on the other surface of the biaxially stretched polyester film so that the thickness after drying became 2.0 μm to form a coating. The film is then dried and irradiated with ultraviolet rays to form a hard coat layer (refractive index 1.52). The drying conditions of the coating film were 70 ° C. and 60 seconds, and the irradiation amount of ultraviolet rays was 150 mJ / cm 2 . Then, using the composition 1 for a low contact angle layer, a low contact angle layer was formed on the hard-coat layer formed on the other surface of the biaxially stretched polyester film so that thickness might be 20 nm. The coating film formed by applying the composition 1 for a low contact angle layer was dried at 70 ° C. for 60 seconds to obtain a laminated body.
將實施例1之低接觸角層用組成物1變更為下述配方之低接觸角層用組成物3,除此以外,以與實施例1相同之方式獲得積層體。 A laminated body was obtained in the same manner as in Example 1 except that the composition 1 for a low contact angle layer of Example 1 was changed to the composition 3 for a low contact angle layer of the following formula.
丙烯酸聚合物(重量平均分子量9100,雙鍵當量1000) 16份 Acrylic polymer (weight average molecular weight 9100, double bond equivalent 1000) 16 parts
甲基異丁基酮 1000份 Methyl isobutyl ketone 1000 parts
將實施例1之低接觸角層用組成物1變更為下述配方之低接觸角層用組成物4,除此以外,以與實施例1相同之方式獲得積層體。 A laminated body was obtained in the same manner as in Example 1 except that the composition 1 for a low contact angle layer of Example 1 was changed to the composition 4 for a low contact angle layer of the following formula.
丙烯酸聚合物(重量平均分子量59400,雙鍵當量425) 16份 Acrylic polymer (weight average molecular weight 59400, double bond equivalent 425) 16 parts
甲基異丁基酮 1000份 Methyl isobutyl ketone 1000 parts
將實施例1之低接觸角層用組成物1變更為下述配方之低接觸角層用組成物5,除此以外,以與實施例1相同之方式獲得積層體。 A laminated body was obtained in the same manner as in Example 1 except that the composition 1 for a low contact angle layer of Example 1 was changed to the composition 5 for a low contact angle layer of the following formula.
丙烯酸聚合物(重量平均分子量15400,雙鍵當量265) 16份 Acrylic polymer (weight average molecular weight 15400, double bond equivalent 265) 16 parts
甲基異丁基酮 1000份 Methyl isobutyl ketone 1000 parts
將實施例1之低接觸角層用組成物1變更為下述配方之低接觸角層用組成物6,除此以外,以與實施例1相同之方式獲得積層體。 A laminated body was obtained in the same manner as in Example 1 except that the composition 1 for a low contact angle layer of Example 1 was changed to the composition 6 for a low contact angle layer of the following formula.
丙烯酸聚合物(重量平均分子量75800,雙鍵當量230) 16份 Acrylic polymer (weight average molecular weight 75800, double bond equivalent 230) 16 parts
甲基異丁基酮 1000份 Methyl isobutyl ketone 1000 parts
將實施例1之低接觸角層用組成物1變更為下述配方之低接觸角層用 組成物7,除此以外,以與實施例1相同之方式獲得積層體。 The composition 1 for the low contact angle layer of Example 1 was changed to the composition for the low contact angle layer of the following formula Except for the composition 7, a laminated body was obtained in the same manner as in Example 1.
丙烯酸聚合物(重量平均分子量63000,雙鍵當量200) 16份 Acrylic polymer (weight average molecular weight 63,000, double bond equivalent 200) 16 parts
甲基異丁基酮 1000份 Methyl isobutyl ketone 1000 parts
將實施例1之低接觸角層用組成物1變更為下述配方之低接觸角層用組成物8,於與實施例1相同之條件進行塗膜之乾燥,然後對該乾燥後之塗膜進行紫外線照射(150mJ/cm2)而形成低接觸角層,除此以外,以與實施例1相同之方式獲得積層體。 The composition 1 for a low contact angle layer of Example 1 was changed to the composition 8 for a low contact angle layer of the following formula, the coating film was dried under the same conditions as in Example 1, and the dried coating film was then dried. A laminated body was obtained in the same manner as in Example 1 except that ultraviolet irradiation (150 mJ / cm 2 ) was performed to form a low contact angle layer.
二新戊四醇六丙烯酸酯(重量平均分子量580,雙鍵當量100) 50份 Dipentaerythritol hexaacrylate (weight average molecular weight 580, double bond equivalent 100) 50 parts
光聚合起始劑(BASF公司製造,Irgacure 184) 2份 Photopolymerization initiator (manufactured by BASF, Irgacure 184) 2 parts
甲基異丁基酮 3000份 Methyl isobutyl ketone 3000 parts
將實施例1之低接觸角層用組成物1變更為下述配方之低接觸角層用組成物9,以厚度成為20nm之方式塗佈該低接觸角層用組成物9而形成塗膜,然後於70℃、60秒之條件進行乾燥,並進行紫外線照射(150mJ/cm2)而形成低接觸角層,除此以外,以與實施例1相同之方式獲得積層體。 The composition 1 for a low contact angle layer of Example 1 was changed to the composition 9 for a low contact angle layer of the following formula, and the composition 9 for a low contact angle layer was applied so as to have a thickness of 20 nm to form a coating film. A laminated body was obtained in the same manner as in Example 1 except that drying was performed at 70 ° C. for 60 seconds, and a low contact angle layer was formed by ultraviolet irradiation (150 mJ / cm 2 ).
二新戊四醇六丙烯酸酯(重量平均分子量580,雙鍵當量100) 50份 Dipentaerythritol hexaacrylate (weight average molecular weight 580, double bond equivalent 100) 50 parts
光聚合起始劑(BASF公司製造,Irgacure 184) 2份 Photopolymerization initiator (manufactured by BASF, Irgacure 184) 2 parts
聚矽氧系調平劑(大日精化工業公司製造,SEIKA BEAM 10-28,固形 物成分10%) 1份 Silicone-based leveling agent (manufactured by Daiichi SEIKI, SEIKA BEAM 10-28, solid Ingredients 10%) 1 serving
甲基異丁基酮 3000份 Methyl isobutyl ketone 3000 parts
將實施例2之低接觸角層用組成物2變更為下述配方之低接觸角層用組成物10,除此以外,以與實施例2相同之方式獲得積層體。 A laminated body was obtained in the same manner as in Example 2 except that the composition 2 for a low contact angle layer of Example 2 was changed to the composition 10 for a low contact angle layer of the following formula.
二新戊四醇六丙烯酸酯(重量平均分子量580,雙鍵當量100) 50份 Dipentaerythritol hexaacrylate (weight average molecular weight 580, double bond equivalent 100) 50 parts
光聚合起始劑(BASF公司製造,Irgacure 184) 2份 Photopolymerization initiator (manufactured by BASF, Irgacure 184) 2 parts
聚矽氧系調平劑(大日精化工業公司製造,SEIKA BEAM 10-28,固形物成分10%) 1份 Silicone leveling agent (manufactured by Dainichi Seika Co., Ltd. SEIKA BEAM 10-28, solid content 10%) 1 part
甲基異丁基酮 200份 Methyl isobutyl ketone 200 parts
將低接觸角層用組成物1變更為上述低接觸角層用組成物9,除此以外,以與實施例3相同之方式獲得積層體。 A laminated body was obtained in the same manner as in Example 3 except that the composition 1 for a low contact angle layer was changed to the composition 9 for a low contact angle layer described above.
將低接觸角層用組成物1變更為上述低接觸角層用組成物9,除此以外,以與實施例1相同之方式獲得積層體。 A laminated body was obtained in the same manner as in Example 1 except that the composition 1 for a low contact angle layer was changed to the composition 9 for a low contact angle layer described above.
如下所述,對實施例、比較例及參考例中獲得之積層體進行物性測定及評價。將各結果示於表1。 As described below, the physical properties of the laminated bodies obtained in the examples, comparative examples, and reference examples were measured and evaluated. Each result is shown in Table 1.
於厚度125μm之上述雙軸延伸聚酯膜上形成黏著層,而獲得附黏著層之膜。 An adhesive layer was formed on the above-mentioned biaxially stretched polyester film having a thickness of 125 μm to obtain a film with an adhesive layer.
使用如下黏著劑溶液:作為形成上述黏著層之黏著劑,利用丙烯酸系黏著劑(綜研化學公司製造:SK-Dyne 1811L(固形物成分23%))及異氰酸酯系交聯劑(綜研化學公司製造:TD75(固形物成分75%)),以丙烯酸系黏著劑:異氰酸酯系交聯劑=100:1(質量比)進行混合,並以固形物成分成為20%(質量基準)之方式溶解於溶劑(乙酸乙酯)中而成之黏著劑溶液。將該黏著劑溶液塗佈於上述雙軸延伸聚酯膜上,並於100℃下乾燥1分鐘而形成黏著層(厚度15μm)。進而於黏著層之面貼合可再剝離之脫模膜以進行保護。 The following adhesive solution was used. As the adhesive for forming the above-mentioned adhesive layer, an acrylic adhesive (manufactured by Soken Chemical Co., Ltd .: SK-Dyne 1811L (solid content: 23%)) and an isocyanate-based crosslinking agent (manufactured by Kenken Chemical Co., Ltd.) were used: TD75 (solid content 75%)), mixed with an acrylic adhesive: isocyanate-based crosslinking agent = 100: 1 (mass ratio), and dissolved in a solvent such that the solid content becomes 20% (mass basis) Ethyl acetate). This adhesive solution was applied on the biaxially stretched polyester film, and dried at 100 ° C. for 1 minute to form an adhesive layer (thickness: 15 μm). Further, a releasable release film is attached to the surface of the adhesive layer for protection.
上述附黏著層之膜係於將上述脫模膜剝離後使用。 The film with an adhesive layer is used after peeling the said release film.
針對於實施例及比較例中獲得之積層體,基於JIS K6768(1999),對貼合上述附黏著層之膜之前之低接觸角層之表面之潤濕張力(初始)與於150℃、60分鐘之條件加熱後將上述附黏著層之膜剝離後之潤濕張力(加熱後)進行測定。 For the laminates obtained in the examples and comparative examples, based on JIS K6768 (1999), the wetting tension (initial) of the surface of the low contact angle layer before lamination of the film with the adhesive layer was After the condition of minutes, the wetting tension (after heating) after peeling the film with the adhesive layer was measured.
再者,作為試驗用混合液,準備潤濕張力22.6~73.0mN/m之液體。 In addition, as a test mixture liquid, a liquid having a wetting tension of 22.6 to 73.0 mN / m was prepared.
針對於實施例及比較例中獲得之積層體,藉由下述所記載之方法,對於在150℃、60分鐘之條件加熱後將上述附黏著層之膜剝離後之低接觸角層之表面之貼附性進行測定,並根據以下之基準進行評價。 For the laminates obtained in the examples and comparative examples, the surface of the low-contact-angle layer after peeling the film with the above-mentioned adhesive layer after heating at 150 ° C for 60 minutes was performed by the method described below. The adhesiveness was measured and evaluated based on the following criteria.
將1mm厚之不鏽鋼板(寬度25mm以上)貼附於兩面黏著帶(VHB雙面膠帶Y-4920,Sumitomo 3M公司製造)之一黏著面,使2kg之輥往返兩次而將切斷為寬度25mm、長度150mm之尺寸之實施例及比較例中所獲得之積層體貼合於上述兩面黏著帶之另一黏著面,製作測定樣本。 A 1mm thick stainless steel plate (25mm or more in width) was attached to one of the two sides of an adhesive tape (VHB double-sided tape Y-4920, manufactured by Sumitomo 3M), and a 2kg roller was reciprocated twice to cut the width to 25mm. The laminated body obtained in the examples and comparative examples with a length of 150 mm was adhered to the other adhesive surface of the above two-sided adhesive tape to prepare a measurement sample.
將測定樣本於室溫環境下放置72小時後,使用剝離試驗機(裝置名:小型桌上試驗機「EZ-LX」島津製作所公司製造)並基於JIS Z 0237,於拉伸速度300mm/分鐘、剝離角度180度之條件下測定剝離強度(N/25mm寬)。 After the measurement sample was left at room temperature for 72 hours, a peel tester (apparatus name: small table tester "EZ-LX" manufactured by Shimadzu Corporation) was used based on JIS Z 0237 at a tensile speed of 300 mm / minute, The peeling strength (N / 25mm width) was measured under the condition of a peeling angle of 180 degrees.
◎:剝離強度為10N/25mm以上 ◎: Peel strength is 10N / 25mm or more
○:剝離強度為5N/25mm以上且未達10N/25mm ○: Peel strength is 5N / 25mm or more and less than 10N / 25mm
×:剝離強度未達5N/25mm ×: Peel strength is less than 5N / 25mm
針對於實施例及比較例中所獲得之積層體,使用#0000號之鋼絲絨,以特定之摩擦荷重(150g/cm2)對貼合上述附黏著層之膜之前之低接觸角層之表面往返摩擦10次,目視其後之塗膜之損傷狀態並根據下述之基準進行評價。 For the laminates obtained in the examples and comparative examples, the surface of the low contact angle layer before the film with the above-mentioned adhesion layer was bonded with a specific friction load (150 g / cm 2 ) using steel wool of # 0000 with a steel wool of # 0000 It rubbed back and forth 10 times, and the damage state of the subsequent coating film was visually evaluated and evaluated based on the following criteria.
◎:未受損(傷痕0條) ◎: Not damaged (0 scars)
○:幾乎未受損(傷痕約為1~9條) ○: Hardly damaged (about 1 to 9 scars)
×:明顯受損(傷痕為10條以上或具有無數條呈帶狀之傷痕之狀態)或塗膜剝離 ×: Significantly damaged (10 or more scars or a state with numerous band-shaped scars) or peeling of the coating film
關於實施例及比較例中所獲得之積層體之貼合上述附黏著層之膜之前之低接觸角層表面之觸黏性(觸黏感),藉由手指接觸並根據以下之基準進行評價。 About the tackiness (tacky feel) of the surface of the low contact angle layer before the above-mentioned film with an adhesion layer was laminated on the laminates obtained in the examples and comparative examples, it was evaluated based on the following criteria by finger contact.
○:無觸黏感(即便使手指接觸,手指亦不會貼附,使手指滑動而亦不會卡住之狀態) ○: No stickiness (even if the fingers are in contact, the fingers will not stick, and the fingers will slide without getting stuck)
×:具有觸黏感(於手指接觸之情況下不會移動或者即便移動也會被卡住) ×: It has a sticky feel (it will not move if it is in contact with fingers or it will be stuck even if it moves)
如表1所示,關於加熱後之貼附性,於實施例1~5之積層 體中,剝離強度成為10N/25mm以上而為良好之結果,於實施例6~9之積層體中,剝離強度成為5N/25mm以上且未達10N/25mm而為較好之結果,相對於此,比較例1~3之積層體之剝離強度未達5N/25mm,而與兩面黏著帶之貼附性較差。 As shown in Table 1, the adhesiveness after heating was laminated in Examples 1 to 5. In the body, the peeling strength was 10N / 25mm or more, which is a good result. In the laminates of Examples 6 to 9, the peeling strength was 5N / 25mm or more and less than 10N / 25mm, which is a better result. The peel strength of the laminates of Comparative Examples 1 to 3 was less than 5N / 25mm, and the adhesion to the two-sided adhesive tape was poor.
又,於實施例之積層體中,關於耐SW性,對低接觸角層賦予了硬塗性能之實施例2、及於基材膜與低接觸角層之間設置有硬塗層之實施例3之積層體未受損而尤其良好,實施例1、4~9之積層體幾乎未受損。 In the laminated body of the examples, regarding the SW resistance, Example 2 in which the hard contact performance was imparted to the low contact angle layer, and the example in which a hard coat layer was provided between the substrate film and the low contact angle layer. The laminated body of 3 was not damaged and was particularly good. The laminated bodies of Examples 1, 4 to 9 were hardly damaged.
又,觸黏性於全部實施例之積層體中均優異。 In addition, the tackiness was excellent in the laminates of all the examples.
又,實施例1~8之積層體於加熱前後之潤濕張力之差較小,為6mN/m以下。於潤濕張力之差如上述般較小之實施例1~8之積層體中,黏著層之成分向低接觸角層之移行較少而黏著層之黏著劑成分向低接觸角層之移行得以抑制,從而不僅可抑制貼附性之降低,亦可抑制對製為光學膜之透光性等光學特性造成惡劣影響。又,實施例9之積層體之潤濕張力之差係較實施例1~8之積層體更大之值,但加熱後之潤濕張力為30mN/m以上,潤濕張力之差為20mN/m以下,故而成功確保所需之貼附性能。 In addition, the difference in wetting tension between the laminates of Examples 1 to 8 before and after heating was small, and was 6 mN / m or less. In the laminates of Examples 1 to 8 in which the difference in wetting tension was as small as described above, the components of the adhesive layer shifted less to the low contact angle layer, and the adhesive components of the adhesive layer shifted to the low contact angle layer. Suppression can not only suppress the decrease of the adhesion, but also suppress the bad influence on the optical characteristics such as the light transmittance of the optical film. In addition, the difference in wetting tension between the laminates of Example 9 is larger than that of the laminates of Examples 1 to 8, but the wetting tension after heating is 30 mN / m or more, and the difference between the wetting tensions is 20 mN / m or less, successfully securing the required adhesion performance.
再者,實施例之積層體之霧度值均為5%以下,總透光率均為80%以上。 Moreover, the haze values of the laminated bodies in the examples are all 5% or less, and the total light transmittances are all 80% or more.
另一方面,參考例1之積層體由於加熱後之潤濕張力為30mN/m以上,故而貼附性之評價良好,但加熱前之低接觸角層之黏性較大而無法準確地測定潤濕張力。又,由於潤濕張力之差為超過20mN/m之較大之值,故而不僅黏著層之黏著劑成分向低接觸角層之移行幅度較大,而且初始之潤濕張力亦較大,因此結果會產生低接觸角層之耐SW性或觸黏性較差等 不良情況,而於實際使用上欠佳。 On the other hand, since the laminated body of Reference Example 1 has a wetting tension after heating of 30 mN / m or more, the adhesion evaluation is good, but the low contact angle layer before heating has a large viscosity and cannot accurately measure the wetting. Wet tension. In addition, since the difference in wetting tension is a large value exceeding 20 mN / m, not only the adhesive component of the adhesive layer has a larger migration range to the low contact angle layer, but also the initial wetting tension is larger, so the result Will have low contact angle, poor SW resistance or poor tackiness, etc. Adverse conditions, but not good in actual use.
又,實施例之積層體係藉由濺鍍處理而形成含ITO之透明導電層(厚度20~30μm),並使圖案化之透明導電層不可見,確認出光學特性無問題。 In the multilayer system of the example, a transparent conductive layer (thickness: 20-30 μm) containing ITO was formed by a sputtering process, and the patterned transparent conductive layer was invisible, and it was confirmed that there were no problems with optical characteristics.
進而,將實施例3裁斷為100mm×100mm,並藉由濺鍍處理形成透明導電層,然後放置於平台並測定4個角中距平台最遠之距離,結果為5mm以內,防捲曲性亦優異;其中,上述實施例3係成為光學功能層之硬塗層及於基材膜與低接觸角層之間之硬塗層具有相同厚度者。 Furthermore, Example 3 was cut into 100 mm × 100 mm, and a transparent conductive layer was formed by sputtering. The transparent conductive layer was then placed on the platform and the distance between the four corners and the platform was measured. As a result, the distance was within 5 mm, and the curl resistance was also excellent. Among them, the above-mentioned Example 3 is a hard coating layer which becomes an optical functional layer and a hard coating layer between the substrate film and the low contact angle layer having the same thickness.
另一方面,於比較例1~3之積層體中,潤濕張力未達30mN/m,而無法賦予充分之貼附性。 On the other hand, in the laminates of Comparative Examples 1 to 3, the wetting tension was less than 30 mN / m, and sufficient adhesiveness could not be provided.
又,於參考例1之積層體中,於進行用以形成透明導電層之濺鍍處理時,積層體之捲繞體有觸黏感而黏連,從而無法將積層體捲起而無法形成透明導電層。 Also, in the multilayer body of Reference Example 1, when the sputtering process for forming a transparent conductive layer was performed, the wound body of the multilayer body had a tacky feel and stuck, so that the multilayer body could not be rolled up and could not be formed transparent Conductive layer.
又,藉由比較實施例9之積層體與比較例1之積層體,而發現於低接觸角層中不含調平劑者貼附性優異。 In addition, by comparing the laminated body of Example 9 and the laminated body of Comparative Example 1, it was found that those without a leveling agent in the low contact angle layer exhibited excellent adhesion.
又,藉由與實施例1相同之方法,使用硬塗層用組成物於厚度100μm之雙軸延伸聚酯膜之一面上形成塗膜,於半固化後,利用轉印法形成使用了銀奈米線之透明導電層。其後,進行硬塗層之硬化,並藉由與實施例1相同之方法於上述雙軸延伸聚酯膜之另一面上形成低接觸角層,獲得導電性積層體。對該導電性積層體進行用以實現透明導電層之低電阻化之加熱,結果加熱後之潤濕張力為30mN/m以上,潤濕張力之差為20mN/m以下,從而可確保所需之貼附性能。又,光學特性亦無問題。 In addition, in the same manner as in Example 1, a coating film was formed on one surface of a biaxially stretched polyester film having a thickness of 100 μm using the composition for a hard coat layer, and after the semi-curing, a silver nano-film was formed by a transfer method. Transparent conductive layer of rice noodles. Thereafter, the hard coat layer was hardened, and a low contact angle layer was formed on the other side of the above-mentioned biaxially stretched polyester film by the same method as in Example 1 to obtain a conductive laminate. The conductive laminate is heated to reduce the resistance of the transparent conductive layer. As a result, the wetting tension after heating is 30 mN / m or more, and the difference between the wetting tensions is 20 mN / m or less. Adhesive performance. In addition, there are no problems with optical characteristics.
本發明可提供一種即便於將附黏著層之膜貼合於基材膜之 與透明導電層側為相反側之面並實施加熱處理後將該附黏著層之膜剝離時,亦可較佳地防止貼合有該附黏著層之膜之面之水之接觸角增大而接著性降低之積層體。 The present invention can provide a method for attaching a film with an adhesive layer to a substrate film. When the surface opposite to the side of the transparent conductive layer is heated and the film with the adhesive layer is peeled off after heat treatment, the contact angle of water on the surface to which the film with the adhesive layer is attached can also be prevented from increasing. Laminated body with reduced adhesion.
Claims (12)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP2014-154322 | 2014-07-29 | ||
JP2014154322 | 2014-07-29 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201612001A TW201612001A (en) | 2016-04-01 |
TWI656038B true TWI656038B (en) | 2019-04-11 |
Family
ID=55242167
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW104124193A TWI656038B (en) | 2014-07-29 | 2015-07-27 | Laminate, conductive laminate and touch panel |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6720481B2 (en) |
KR (1) | KR102054166B1 (en) |
CN (1) | CN105313391B (en) |
TW (1) | TWI656038B (en) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6427004B2 (en) * | 2014-12-26 | 2018-11-21 | 株式会社トッパンTomoegawaオプティカルフィルム | Laminated film, transparent conductive film and touch panel |
JP5905983B1 (en) * | 2015-02-19 | 2016-04-20 | 積水化学工業株式会社 | Light transmissive conductive film, film roll thereof, and touch panel having the same |
JP6791647B2 (en) * | 2016-03-29 | 2020-11-25 | リンテック株式会社 | Laminate and protective film |
WO2017200042A1 (en) * | 2016-05-20 | 2017-11-23 | 大日本印刷株式会社 | Optical laminated body, and image display device |
CN109564803B (en) * | 2017-01-16 | 2020-03-06 | 昭和电工株式会社 | Transparent conductive film and method for producing transparent conductive pattern |
EP3603960B1 (en) * | 2017-03-27 | 2022-10-26 | Toppan Printing Co., Ltd. | Transparent conductive gas barrier laminate |
CN109791816B (en) * | 2017-03-29 | 2021-09-14 | 积水化学工业株式会社 | Transparent conductive film for light adjusting film and light adjusting film |
WO2019066079A1 (en) * | 2017-09-29 | 2019-04-04 | 大日本印刷株式会社 | Method for producing protective film-attached laminate, and protective film-attached laminate |
JP7476791B2 (en) * | 2018-03-09 | 2024-05-01 | 大日本印刷株式会社 | Conductive film, sensor, touch panel, and image display device |
CN108597651A (en) * | 2018-06-05 | 2018-09-28 | 江西和信化研纳米材料有限公司 | A kind of transparent conductive film |
KR102032316B1 (en) | 2018-07-09 | 2019-10-15 | 에스케이씨 주식회사 | Optical multilayer film, optical component and display device comprising same |
CN109686498A (en) * | 2018-12-25 | 2019-04-26 | 深圳市欧科力科技有限公司 | A kind of preparation method of photoactive electrode slurry |
WO2020255458A1 (en) | 2019-06-20 | 2020-12-24 | 昭和電工株式会社 | Transparent electroconductive film laminate and method for processing same |
JP7558659B2 (en) * | 2020-01-31 | 2024-10-01 | 日東電工株式会社 | Adhesive sheet |
JP7039674B2 (en) * | 2020-11-05 | 2022-03-22 | リンテック株式会社 | Laminates and protective films |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW200937457A (en) * | 2007-10-26 | 2009-09-01 | Teijin Ltd | Transparent conductive laminate and touch panel |
CN102149778A (en) * | 2008-09-17 | 2011-08-10 | 木本股份有限公司 | Surface-protective film and laminate |
TW201230077A (en) * | 2010-10-29 | 2012-07-16 | Toray Industries | Transparent conductive laminate and producing method thereof |
TW201303908A (en) * | 2011-05-11 | 2013-01-16 | Nitto Denko Corp | Transparent conductive laminate and touch panel |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005157543A (en) * | 2003-11-21 | 2005-06-16 | Matsushita Electric Ind Co Ltd | Light transmission touch panel |
WO2008041506A1 (en) * | 2006-09-29 | 2008-04-10 | Kimoto Co., Ltd. | Film for optical use, transparent conductive member using the same, and transparent touch panel |
JP4464449B2 (en) * | 2008-08-18 | 2010-05-19 | 尾池工業株式会社 | Transparent conductive laminate and touch panel |
KR20150126980A (en) * | 2008-12-26 | 2015-11-13 | 데이진 가부시키가이샤 | Transparent electroconductive laminate and transparent touch panel |
JP5245893B2 (en) * | 2009-02-13 | 2013-07-24 | 凸版印刷株式会社 | Multilayer film and method for producing the same |
JP2011177938A (en) | 2010-02-26 | 2011-09-15 | Teijin Dupont Films Japan Ltd | Hard coat film |
CN102446576B (en) * | 2010-10-14 | 2014-04-23 | 远东新世纪股份有限公司 | Transparent conductive film with light penetration degree and preparation method thereof |
JP2012194644A (en) | 2011-03-15 | 2012-10-11 | Nissha Printing Co Ltd | Manufacturing method of film with one-side conductive film for electrostatic sensor |
-
2015
- 2015-07-24 JP JP2015146643A patent/JP6720481B2/en active Active
- 2015-07-27 TW TW104124193A patent/TWI656038B/en active
- 2015-07-28 CN CN201510450320.1A patent/CN105313391B/en active Active
- 2015-07-28 KR KR1020150106491A patent/KR102054166B1/en active IP Right Grant
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW200937457A (en) * | 2007-10-26 | 2009-09-01 | Teijin Ltd | Transparent conductive laminate and touch panel |
CN102149778A (en) * | 2008-09-17 | 2011-08-10 | 木本股份有限公司 | Surface-protective film and laminate |
TW201230077A (en) * | 2010-10-29 | 2012-07-16 | Toray Industries | Transparent conductive laminate and producing method thereof |
TW201303908A (en) * | 2011-05-11 | 2013-01-16 | Nitto Denko Corp | Transparent conductive laminate and touch panel |
Also Published As
Publication number | Publication date |
---|---|
KR102054166B1 (en) | 2019-12-10 |
KR20160014551A (en) | 2016-02-11 |
JP2016032935A (en) | 2016-03-10 |
JP6720481B2 (en) | 2020-07-08 |
CN105313391A (en) | 2016-02-10 |
CN105313391B (en) | 2018-10-12 |
TW201612001A (en) | 2016-04-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI656038B (en) | Laminate, conductive laminate and touch panel | |
JP6328984B2 (en) | Double-sided transparent conductive film and touch panel | |
KR101452598B1 (en) | Optical laminate, polarizing plate and image display device | |
TWI547843B (en) | Optical sheet, conductive sheet and display device including optical sheet | |
KR101796808B1 (en) | Optical laminate, method for manufacturing an optical laminate, polarizing plate, and image display device | |
TW201346675A (en) | Transparent conductive film, touch panel and display device | |
JP6950680B2 (en) | Protective film, optical film, laminate, polarizing plate, image display device, and manufacturing method of polarizing plate | |
JPWO2005109449A1 (en) | Conductive film for touch panel and conductive film manufacturing method for touch panel | |
US20160039188A1 (en) | Transfer material, substrate with transfer layer, touch panel, manufacturing methods therefor, and information display device | |
JP2020154316A (en) | Optical laminate, image display device, and touch panel sensor | |
JP5786297B2 (en) | Optical laminate, transparent conductive film, and capacitive touch panel | |
KR20150105331A (en) | Optical laminated body, method for manufacturing same, and polarization plate and liquid-crystal display device using optical laminated body | |
TW201800248A (en) | Protective-film-attached film on which transparent conductive film is to be laminated and method of manufacturing transparent conductive film | |
JP6331581B2 (en) | Laminate for forming transparent conductive film, transparent conductive film, touch panel, method for selecting second substrate with adhesive layer, method for producing laminate for forming transparent conductive film, and method for producing transparent conductive film | |
JP2018078090A (en) | Transparent conductive film and touch panel using the same | |
TW201622982A (en) | Transparent multilayer film and touch panel display | |
JP6856028B2 (en) | Optical film, polarizing film, method of manufacturing polarizing film, and image display device | |
JP6526380B2 (en) | Display with touch panel | |
JP6533791B2 (en) | Anti-watermark film and touch panel display | |
JP6460471B2 (en) | Laminated body, polarizing plate, and image display device | |
JP6458445B2 (en) | Transparent conductive laminate, touch panel using the transparent conductive laminate, a method for producing the transparent conductive laminate, and a method for producing a touch panel using the transparent conductive laminate | |
JP6256154B2 (en) | Laminated body, touch panel using the laminated body, and method for manufacturing the laminated body | |
JP6349235B2 (en) | Transparent laminated film and touch panel display | |
JP6405883B2 (en) | LAMINATE, CONDUCTIVE LAMINATE, AND TOUCH PANEL | |
JP7035381B2 (en) | Optical film, image display device or touch panel |