CN108597651A - A kind of transparent conductive film - Google Patents
A kind of transparent conductive film Download PDFInfo
- Publication number
- CN108597651A CN108597651A CN201810568079.6A CN201810568079A CN108597651A CN 108597651 A CN108597651 A CN 108597651A CN 201810568079 A CN201810568079 A CN 201810568079A CN 108597651 A CN108597651 A CN 108597651A
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- CN
- China
- Prior art keywords
- transparent conductive
- refractive
- conductive film
- layer
- resin
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
- H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
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- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Theoretical Computer Science (AREA)
- Human Computer Interaction (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Laminated Bodies (AREA)
Abstract
The invention discloses a kind of transparent conductive films, including substrate layer, it is characterized in that, it is formed with the transparency conducting layer with pH effect function at least one surface of substrate layer, the high refracting layer and refractive index that transparency conducting layer is 1.6 or more by refractive index are that 1.45 forming low-refractive-index layers below are formed by stacking, the present invention in the etched pattern with transparency conducting layer stealthy performance and transparency conducting layer with excellent adhesiveness.
Description
Technical field
The present invention relates to conductive film fields, more particularly, to a kind of transparent conductive film.
Background technology
In capacitive touch screen, as the sensor of the touch location for detecting finger, it is roughly divided into glass base
It is laminated with the glass sensor of transparency conducting layer on plate, and is laminated with the transparent plastic of transparency conducting layer on overlay
Film sensors.Especially in thin film sensor, typically one is stacked in by the way that two linear transparent conductive films will be etched into
It rises relatively more.But the boundary part for the drafting department and non-drafting department for having etched transparency conducting layer in this way is easy visual identity, from
And have the problem of appearance of capacitive touch screen.
Presently disclosed optics is easy to be etched corroded by liquid to have when being etched by etching solution with stack membrane to be difficult to have
The hidden problem of stable etched mark.There is quick erosion with the increase of the output of production of intelligent mobile phone in recent years
Quarter demand, the final step of especially etch process removes the alkali process of remaining photoresist, uses 5 weights for being heated to 40 DEG C
Measure the sodium hydrate aqueous solution of %.When executing this harsh alkali process, the silica dioxide granule that includes in resin layer is easy molten
Change or fall off, keeps the stealthy performance of the etched pattern of transparency conducting layer bad.In view of the foregoing, the present inventor carries out
A large amount of effort as a result, it has been found that, when the low-index layer for the outmost surface layer for forming the layered product for being used to form transparency conducting layer
When, by using above-mentioned resistance to solve containing silica fine particles in prescribed limit are mixed in active energy beam hardening resin
The problem of etching deficiency.
Invention content
The present invention is to overcome the above situation insufficient, it is desirable to provide a kind of technical solution that can be solved the above problems.
A kind of transparent conductive film, including substrate layer are formed with pH effect at least one surface of substrate layer
The transparency conducting layer of function, the high refracting layer and refractive index that transparency conducting layer is 1.6 or more by refractive index are 1.45 below
Forming low-refractive-index layer is formed by stacking, and the forming low-refractive-index layer includes mainly following components by weight：Activity containing repellency resin
100 parts of energy ray-curable resin, 2~120 parts by weight of silica fine particles, the active-energy containing repellency resin
Between ray curing resin and silica fine particles forming low-refractive-index layer is formed by mixing simultaneously photocuring.
As a further solution of the present invention：The Average Particle Diameters of the silica fine particles be located at 20~70nm it
Between.
As a further solution of the present invention：The silica fine particles use hollow silica fine particles.
As a further solution of the present invention：The silica fine particles use reactive silicon dioxide fine grained.
As a further solution of the present invention：The active energy ray curable resin containing repellency resin is dredged
Water-base resin uses fluororesin.
As a further solution of the present invention：The forming low-refractive-index layer has the surface free energy of 37mN/m or more.
As a further solution of the present invention：The film thickness size of the forming low-refractive-index layer is 20 150nm.
Beneficial effects of the present invention：It the stealthy performance of the etched pattern with transparency conducting layer and transparent is led in the present invention
Electric layer has excellent adhesiveness.
The additional aspect and advantage of the present invention will be set forth in part in the description, and will partly become from the following description
Obviously, or practice through the invention is recognized.
Specific implementation mode
Below in conjunction with the embodiment of the present invention, technical scheme in the embodiment of the invention is clearly and completely described,
Obviously, described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.Based in the present invention
Embodiment, every other embodiment obtained by those of ordinary skill in the art without making creative efforts, all
Belong to the scope of protection of the invention.
In the embodiment of the present invention, a kind of transparent conductive film, including substrate layer is formed at least one surface of substrate layer
There are the transparency conducting layer with pH effect function, high refracting layer and refraction of the transparency conducting layer by refractive index for 1.6 or more
Rate is that 1.45 forming low-refractive-index layers below are formed by stacking, and the forming low-refractive-index layer includes mainly following components by weight：Contain reprimand
100 parts of the active energy ray curable resin of water-base resin, 2~120 parts by weight of silica fine particles, contains repellency
Between the active energy ray curable resin and silica fine particles of resin forming low-refractive-index layer is formed by mixing simultaneously photocuring.
The Average Particle Diameters of the silica fine particles are between 20~70nm.
The silica fine particles use hollow silica fine particles.
The silica fine particles use reactive silicon dioxide fine grained.
The hydrophobic resin of the active energy ray curable resin containing repellency resin uses fluororesin.
The forming low-refractive-index layer has the surface free energy of 37mN/m or more.
The film thickness size of the forming low-refractive-index layer is 20 150nm.
The present invention operation principle be：If formed in the present invention in transparency conducting layer, it is used to form low-index layer,
It is in outmost surface layer, the layered product of the active-energy low-index layer formation composition containing waterproof resin wherein,
Include harsh alkali process edge quenching treatment executing because the silica dioxide granule that it includes has in relatively small range
In the case of can effectively inhibit the melting of silicon dioxide microparticle in low-index layer or fall off（The effect is sometimes referred to as " resistance to
Etching "）.In addition, low-refraction will be increased in the amount of the low-index layer of silicon dioxide particles in relatively small range,
The relatively low waterproof resin of refractive index, is lowered in predetermined range, and low refraction can obtain required predetermined refraction.
As a result, can steadily make the pattern form of transparency conducting layer invisible.In addition, the surface free energy amount of low-index layer will lead to
It crosses including waterproof resin, the fine concave-convex surface formed by silica fine particles increases to scheduled range, in low folding
The request penetrated in rate layer, which is reduced to, to obtain scheduled adhesiveness to transparency conducting layer to be formed etc..
It is obvious to a person skilled in the art that invention is not limited to the details of the above exemplary embodiments, Er Qie
In the case of without departing substantially from spirit or essential attributes of the invention, the present invention can be realized in other specific forms.Therefore, no matter
From the point of view of which point, the present embodiments are to be considered as illustrative and not restrictive, and the scope of the present invention is by appended power
Profit requires rather than above description limits, it is intended that all by what is fallen within the meaning and scope of the equivalent requirements of the claims
Variation is included within the present invention.
Claims (7)
1. a kind of transparent conductive film, including substrate layer, which is characterized in that being formed at least one surface of substrate layer has
The transparency conducting layer of pH effect function, the high refracting layer and refractive index that transparency conducting layer is 1.6 or more by refractive index are
1.45 forming low-refractive-index layers below are formed by stacking；
The forming low-refractive-index layer includes mainly following components by weight：Active energy ray curable containing repellency resin
100 parts of resin, 2~120 parts by weight of silica fine particles, the active energy ray curable resin containing repellency resin
Between silica fine particles forming low-refractive-index layer is formed by mixing simultaneously photocuring.
2. transparent conductive film according to claim 1, which is characterized in that the average grain diameter of the silica fine particles is big
It is small to be located between 20~70nm.
3. transparent conductive film according to claim 1, which is characterized in that the silica fine particles use hollow two
Fine-grained silica.
4. transparent conductive film according to claim 1, which is characterized in that the silica fine particles are using reactivity two
Fine-grained silica.
5. transparent conductive film according to claim 1, which is characterized in that the active-energy containing repellency resin is penetrated
The hydrophobic resin of line gel-type resin uses fluororesin.
6. transparent conductive film according to claim 1, which is characterized in that the forming low-refractive-index layer has the table of 37mN/m or more
Face free energy.
7. transparent conductive film according to claim 1, which is characterized in that the film thickness size of the forming low-refractive-index layer is 20
150nm。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810568079.6A CN108597651A (en) | 2018-06-05 | 2018-06-05 | A kind of transparent conductive film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810568079.6A CN108597651A (en) | 2018-06-05 | 2018-06-05 | A kind of transparent conductive film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108597651A true CN108597651A (en) | 2018-09-28 |
Family
ID=63630800
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810568079.6A Pending CN108597651A (en) | 2018-06-05 | 2018-06-05 | A kind of transparent conductive film |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108597651A (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101858994A (en) * | 2009-04-10 | 2010-10-13 | 东丽先端素材株式会社 | Low reflection film |
| CN105313391A (en) * | 2014-07-29 | 2016-02-10 | 大日本印刷株式会社 | Laminate, conductive laminate, and touch panel |
| CN106024109A (en) * | 2015-03-30 | 2016-10-12 | 琳得科株式会社 | Transparent conductive film |
| CN106009813A (en) * | 2015-03-30 | 2016-10-12 | 琳得科株式会社 | Transparent conductive film |
-
2018
- 2018-06-05 CN CN201810568079.6A patent/CN108597651A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101858994A (en) * | 2009-04-10 | 2010-10-13 | 东丽先端素材株式会社 | Low reflection film |
| CN105313391A (en) * | 2014-07-29 | 2016-02-10 | 大日本印刷株式会社 | Laminate, conductive laminate, and touch panel |
| CN106024109A (en) * | 2015-03-30 | 2016-10-12 | 琳得科株式会社 | Transparent conductive film |
| CN106009813A (en) * | 2015-03-30 | 2016-10-12 | 琳得科株式会社 | Transparent conductive film |
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| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| WD01 | Invention patent application deemed withdrawn after publication | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20180928 |