TWI654166B - 寡聚胺基酮及其作為光起始劑之用途 - Google Patents

寡聚胺基酮及其作為光起始劑之用途

Info

Publication number
TWI654166B
TWI654166B TW107102941A TW107102941A TWI654166B TW I654166 B TWI654166 B TW I654166B TW 107102941 A TW107102941 A TW 107102941A TW 107102941 A TW107102941 A TW 107102941A TW I654166 B TWI654166 B TW I654166B
Authority
TW
Taiwan
Prior art keywords
ink
amine
curable coating
ketone
composition
Prior art date
Application number
TW107102941A
Other languages
English (en)
Chinese (zh)
Other versions
TW201815744A (zh
Inventor
高德凱-屋維
迪柯爾卓根
Original Assignee
美商太陽化學公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 美商太陽化學公司 filed Critical 美商太陽化學公司
Publication of TW201815744A publication Critical patent/TW201815744A/zh
Application granted granted Critical
Publication of TWI654166B publication Critical patent/TWI654166B/zh

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C225/00Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones
    • C07C225/22Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones having amino groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C229/00Compounds containing amino and carboxyl groups bound to the same carbon skeleton
    • C07C229/52Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to carbon atoms of six-membered aromatic rings of the same carbon skeleton
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10Esters
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/02Printing inks
    • C09D11/03Printing inks characterised by features other than the chemical nature of the binder
    • C09D11/037Printing inks characterised by features other than the chemical nature of the binder characterised by the pigment
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/02Printing inks
    • C09D11/10Printing inks based on artificial resins
    • C09D11/101Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/02Printing inks
    • C09D11/10Printing inks based on artificial resins
    • C09D11/106Printing inks based on artificial resins containing macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds
    • C09D11/107Printing inks based on artificial resins containing macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds from unsaturated acids or derivatives thereof
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10Esters
    • C08F222/12Esters of phenols or saturated alcohols
    • C08F222/20Esters containing oxygen in addition to the carboxy oxygen
    • C08F222/205Esters containing oxygen in addition to the carboxy oxygen the ester chains containing seven or more carbon atoms
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10Esters
    • C08F222/12Esters of phenols or saturated alcohols
    • C08F222/22Esters containing nitrogen
    • C08F222/225Esters containing nitrogen the ester chains containing seven or more carbon atoms

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Paints Or Removers (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Polymerisation Methods In General (AREA)
TW107102941A 2013-08-12 2014-08-05 寡聚胺基酮及其作為光起始劑之用途 TWI654166B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201361864730P 2013-08-12 2013-08-12
US61/864,730 2013-08-12

Publications (2)

Publication Number Publication Date
TW201815744A TW201815744A (zh) 2018-05-01
TWI654166B true TWI654166B (zh) 2019-03-21

Family

ID=52468569

Family Applications (2)

Application Number Title Priority Date Filing Date
TW103126816A TWI622575B (zh) 2013-08-12 2014-08-05 寡聚胺基酮及其作為光起始劑之用途
TW107102941A TWI654166B (zh) 2013-08-12 2014-08-05 寡聚胺基酮及其作為光起始劑之用途

Family Applications Before (1)

Application Number Title Priority Date Filing Date
TW103126816A TWI622575B (zh) 2013-08-12 2014-08-05 寡聚胺基酮及其作為光起始劑之用途

Country Status (6)

Country Link
US (2) US9982150B2 (enExample)
EP (1) EP3033324B8 (enExample)
JP (2) JP6594873B2 (enExample)
CN (3) CN105517990B (enExample)
TW (2) TWI622575B (enExample)
WO (1) WO2015023371A1 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9938232B2 (en) * 2014-04-23 2018-04-10 Sun Chemical Corporation LED photoinitiators
JP6940688B2 (ja) 2017-08-30 2021-09-29 デンツプライ デトレイ ゲー.エム.ベー.ハー. 光開始剤修飾ポリ酸ポリマー
EP3449895A1 (en) * 2017-08-30 2019-03-06 Dentsply DeTrey GmbH Photoinitiator modified polyacidic polymer
CN109762397A (zh) * 2019-01-21 2019-05-17 长沙新宇高分子科技有限公司 一种含氨基酮光引发剂的uv光固化组合物
US11608445B2 (en) 2020-10-14 2023-03-21 Sun Chemical Corporation Oligomeric aminoketones and their use as photoinitiators
WO2023118482A1 (en) 2021-12-24 2023-06-29 Sun Chemical Corporation Amine synergists with uv-a absorption

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2722264C2 (de) 1977-05-17 1984-06-28 Merck Patent Gmbh, 6100 Darmstadt Verwendung von substituierten Oxyalkylphenonen als Photosensibilisatoren
JPH0771865B2 (ja) * 1987-08-07 1995-08-02 富士写真フイルム株式会社 記録材料
US5888481A (en) * 1995-09-29 1999-03-30 Alliedsignal Inc. Cinnamamides and their use as stabilizers
ATE553076T1 (de) * 2002-12-12 2012-04-15 Basf Se Aminosubstituierte hydroxyphenylbenzophenonderivate
DE102004041197A1 (de) 2004-08-26 2006-03-02 Degussa Ag Strahlungsempfindliche Masse
ITVA20050049A1 (it) 2005-08-05 2007-02-06 Lamberti Spa Sistemi fotopolimerizzabili contenenti coiniziatori a bassa estraibilita' e volatilita'
JP2007177179A (ja) * 2005-12-28 2007-07-12 Fujifilm Corp インク、カラーフィルタ及びその製造方法、並びに表示装置
US20100143274A1 (en) 2007-03-07 2010-06-10 Ciba Corporation Use of amines and amides for the stabilization of organic micronized uv absorbers
JP2009013314A (ja) * 2007-07-06 2009-01-22 Toyo Ink Mfg Co Ltd 光硬化型インキ
WO2011030089A1 (en) * 2009-09-08 2011-03-17 Sun Chemical B.V. A photoinitiator composition
CN103044581B (zh) * 2012-04-05 2014-10-29 常州强力电子新材料股份有限公司 一种大分子光引发剂及其制备方法和应用
CN103059168B (zh) * 2013-01-17 2014-09-17 长沙新宇高分子科技有限公司 一种二苯甲酮类光引发剂及其制备方法
EP3024858B1 (en) * 2013-07-23 2017-10-18 Allnex Belgium S.A. Polymeric photoinitiators
US9938232B2 (en) * 2014-04-23 2018-04-10 Sun Chemical Corporation LED photoinitiators

Also Published As

Publication number Publication date
EP3033324B1 (en) 2024-03-13
CN107266328B (zh) 2019-11-19
EP3033324A4 (en) 2017-07-19
US20160160061A1 (en) 2016-06-09
JP2016532696A (ja) 2016-10-20
EP3033324A1 (en) 2016-06-22
US20180251648A1 (en) 2018-09-06
EP3033324B8 (en) 2024-04-17
US9982150B2 (en) 2018-05-29
JP6743237B2 (ja) 2020-08-19
CN105517990A (zh) 2016-04-20
US10563073B2 (en) 2020-02-18
CN107266328A (zh) 2017-10-20
TW201506003A (zh) 2015-02-16
TWI622575B (zh) 2018-05-01
JP6594873B2 (ja) 2019-10-23
CN105517990B (zh) 2018-10-02
TW201815744A (zh) 2018-05-01
WO2015023371A1 (en) 2015-02-19
JP2019142922A (ja) 2019-08-29
CN109320429A (zh) 2019-02-12

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