TWI622543B - Peeling device and method of substrate, and manufacturing method of electronic component - Google Patents

Peeling device and method of substrate, and manufacturing method of electronic component Download PDF

Info

Publication number
TWI622543B
TWI622543B TW103102806A TW103102806A TWI622543B TW I622543 B TWI622543 B TW I622543B TW 103102806 A TW103102806 A TW 103102806A TW 103102806 A TW103102806 A TW 103102806A TW I622543 B TWI622543 B TW I622543B
Authority
TW
Taiwan
Prior art keywords
substrate
flexible plate
peeling
interface
plate
Prior art date
Application number
TW103102806A
Other languages
Chinese (zh)
Other versions
TW201441137A (en
Inventor
Yasunori Ito
Hiroshi Utsugi
Kei Takiuchi
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Publication of TW201441137A publication Critical patent/TW201441137A/en
Application granted granted Critical
Publication of TWI622543B publication Critical patent/TWI622543B/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65HHANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H29/00Delivering or advancing articles from machines; Advancing articles to or into piles
    • B65H29/54Article strippers, e.g. for stripping from advancing elements
    • B65H29/56Article strippers, e.g. for stripping from advancing elements for stripping from elements or machines
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65HHANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H2301/00Handling processes for sheets or webs
    • B65H2301/50Auxiliary process performed during handling process
    • B65H2301/51Modifying a characteristic of handled material
    • B65H2301/511Processing surface of handled material upon transport or guiding thereof, e.g. cleaning
    • B65H2301/5112Processing surface of handled material upon transport or guiding thereof, e.g. cleaning removing material from outer surface
    • B65H2301/51122Processing surface of handled material upon transport or guiding thereof, e.g. cleaning removing material from outer surface peeling layer of material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65HHANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H2701/00Handled material; Storage means
    • B65H2701/10Handled articles or webs
    • B65H2701/17Nature of material
    • B65H2701/175Plastic
    • B65H2701/1752Polymer film

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Folding Of Thin Sheet-Like Materials, Special Discharging Devices, And Others (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

本發明係關於一種基板之剝離裝置,其係將基板與補強上述基板之補強板之界面藉由使上述基板及上述補強板中之至少一者彎曲變形而沿自一端側朝向另一端側之剝離方向依序剝離,且包括剝離器件,該剝離器件包含:可撓性板,其吸附保持上述基板或上述補強板;及驅動器件,其藉由對上述可撓性板賦予與上述界面平行之方向之力,而使上述一者與上述可撓性板一起彎曲變形。 The present invention relates to a peeling device for a substrate, which peels along an interface from the one end side to the other end side by bending and deforming at least one of the substrate and the reinforcing plate at the interface between the substrate and the reinforcing plate that reinforces the substrate. The peeling direction is sequential, and the peeling device includes: a flexible plate that adsorbs and holds the substrate or the reinforcing plate; and a driving device that applies a direction parallel to the interface to the flexible plate. Force to bend and deform one of the above together with the flexible plate.

Description

基板之剝離裝置及剝離方法以及電子元件之製造方法 Peeling device and method of substrate, and manufacturing method of electronic component

本發明係關於一種剝離基板與補強板之界面之基板之剝離裝置及剝離方法以及電子元件之製造方法。 The invention relates to a peeling device, a peeling method, and an electronic component manufacturing method for peeling a substrate at the interface between the substrate and the reinforcing plate.

近年來,伴隨著顯示面板、太陽電池、及薄膜二次電池等電子元件之薄型化、輕量化,而期待用於電子元件之基板之薄板化。然而,若基板之強度因薄板化而降低,則基板之操作性劣化,因此難以於基板之表面形成薄膜電晶體(TFT:Thin Film Transistor)、彩色濾光片(CF:color filter)等電子元件用之功能層。 In recent years, along with the reduction in thickness and weight of electronic components such as display panels, solar cells, and thin film secondary batteries, thinner substrates for electronic components are expected. However, if the strength of the substrate is reduced due to thinning, the operability of the substrate is deteriorated, so it is difficult to form electronic components such as thin film transistors (TFTs) and color filters (CFs) on the surface of the substrates. Use the functional layer.

因此,提出有如下方法:構成於基板之背面可剝離地貼附補強板之表面而成之積層板(廣義上為積層體),於該積層板之基板之正面形成功能層後,剝離基板與補強板之界面(例如參照專利文獻1)。以下,將形成有功能層之面稱為基板之「正面」,將貼附有補強板之表面之面稱為基板之「背面」。 Therefore, the following method is proposed: a laminated board (laminated body in a broad sense) formed by attaching a surface of a reinforcing plate releasably on the back surface of the substrate, and forming a functional layer on the front side of the substrate of the laminated board, peeling the substrate The interface of the reinforcing plate (for example, refer to Patent Document 1). Hereinafter, the surface on which the functional layer is formed is referred to as the “front surface” of the substrate, and the surface on which the reinforcing plate is attached is referred to as the “back surface” of the substrate.

專利文獻1之剝離方法為如下方法:以基板之背面與補強板之表面之界面自一端側朝向另一端側依序剝離之方式,使基板及補強板中之至少一板材彎曲變形,從而全面剝離界面。上述彎曲變形係藉由如下方式進行,即,利用可撓性板吸附保持基板及補強板中之至少一者,使固定於可撓性板之複數個可動體沿與上述界面正交之方向獨立地移動。 The peeling method of Patent Document 1 is a method in which the interface between the back surface of the substrate and the surface of the reinforcing plate is sequentially peeled from one end side to the other end side, so that at least one of the substrate and the reinforcing plate is bent and deformed, thereby comprehensively peeling interface. The above-mentioned bending deformation is performed by holding at least one of the substrate and the reinforcing plate by using a flexible plate, so that a plurality of movable bodies fixed to the flexible plate are independent in a direction orthogonal to the interface. To move.

圖18(a)係模式性地表示利用專利文獻1之剝離裝置之基板之剝離 形態之積層板100的俯視圖。圖18(b)係圖18(a)所示之基板之剝離形態之側視圖。 FIG. 18 (a) schematically shows the peeling of a substrate using a peeling device of Patent Document 1. FIG. A plan view of the morphological laminated board 100. Fig. 18 (b) is a side view of the peeling form of the substrate shown in Fig. 18 (a).

如圖18(b)般,積層板100包含基板102與貼附於基板102之背面之補強板104。圖18(a)之虛線A及圖18(b)之符號A係基板102與補強板104之界面已剝離之剝離區域106和界面未剝離之未剝離區域108之邊界線(以下亦稱為「剝離前線」,以下由符號A表示)。以該剝離前線A如圖18(a)之箭頭B般自積層板100之角部110側朝向角部112側大致平行地行進之方式,使圖18(b)之複數個可動體114、114…如箭頭C般依序下降移動。 As shown in FIG. 18 (b), the laminated board 100 includes a substrate 102 and a reinforcing plate 104 attached to the back surface of the substrate 102. The dotted line A in FIG. 18 (a) and the symbol A in FIG. 18 (b) are the boundary lines (hereinafter also referred to as " "Peeling front", hereinafter indicated by symbol A). 18 (b), the plurality of movable bodies 114, 114 of FIG. 18 (b) are moved in such a way that the front line A of the laminated board 100 travels in parallel from the corner 110 side toward the corner 112 side as shown by arrow B in FIG. 18 (a). … Moving in sequence like arrow C.

基板102之正面無法變形地被真空吸附保持於作為支持器件之平板狀之平台116,補強板104被真空吸附保持於可彈性變形之可撓性板118。可動體114、114…以柵格狀固定於該可撓性板118。即,使沿相對於剝離前線A之剝離行進方向即箭頭B大致正交之方向排列之複數個可動體114、114…同時下降移動而使可撓性板118彎曲變形,藉此,剝離前線A沿箭頭B方向行進。 The front surface of the substrate 102 is vacuum-absorbed and held on a flat plate-shaped platform 116 as a supporting device, and the reinforcing plate 104 is vacuum-absorbed and held on an elastically deformable flexible plate 118. The movable bodies 114, 114... Are fixed to the flexible plate 118 in a grid shape. That is, the plurality of movable bodies 114, 114, which are arranged along the peeling travel direction with respect to the front line A, that is, the arrow B is substantially orthogonal, are simultaneously moved downward to bend and deform the flexible plate 118, thereby peeling the front line A Go in the direction of arrow B.

如上所述,專利文獻1之剝離裝置係於將界面保持於水平方向之狀態下使界面剝離之裝置。即,專利文獻1之剝離裝置係如下裝置,即,藉由對可撓性板118賦予與界面正交之方向之縱方向之荷重成分(箭頭C方向之荷重成分),而使補強板104與可撓性板118一起彎曲變形,從而使界面剝離。 As described above, the peeling device of Patent Document 1 is a device that peels an interface while keeping the interface in a horizontal direction. That is, the peeling device of Patent Document 1 is a device that applies a load component (a load component in the direction of the arrow C) in the longitudinal direction to the flexible plate 118 in a direction orthogonal to the interface, so that the reinforcing plate 104 and The flexible plates 118 are bent and deformed together, thereby peeling the interface.

再者,亦可將補強板104真空吸附保持於平台116,使基板102真空吸附保持於可撓性板118,使基板102與可撓性板118一起彎曲變形而使界面剝離。又,於專利文獻1中係以剝離區域106之曲率半徑a成為250mm~2500mm之方式,藉由可動體114、114…使可撓性板118彎曲變形。 In addition, the reinforcing plate 104 may be vacuum-adsorbed and held on the stage 116, the substrate 102 may be vacuum-adsorbed and held on the flexible plate 118, and the substrate 102 and the flexible plate 118 may be deformed together by bending to deform the interface. Further, in Patent Document 1, the flexible plate 118 is bent and deformed by the movable bodies 114, 114, ... so that the curvature radius a of the peeling region 106 becomes 250 mm to 2500 mm.

[先前技術文獻] [Prior technical literature] [專利文獻] [Patent Literature]

[專利文獻1]國際公開第11/024689號 [Patent Document 1] International Publication No. 11/024689

專利文獻1之基板之剝離裝置係僅利用與界面正交之箭頭C方向之荷重成分而使界面剝離之裝置,因此補強板104(於可撓性板118吸附有基板102之情形時為基板102)於剝離前線A之附近大幅(曲率半徑較小)彎曲變形。於此情形時,存在如下問題:若補強板104(基板102)之大幅彎曲變形之局部部分自可撓性板118脫離,則利用可撓性板118對補強板104(基板102)之真空吸附保持被解除,因此補強板104(基板102)自可撓性板118脫落而破損。 The substrate peeling device of Patent Document 1 is a device that peels the interface using only the load component in the direction of the arrow C orthogonal to the interface. Therefore, the reinforcing plate 104 (the substrate 102 when the flexible plate 118 adsorbs the substrate 102) ) The bending deformation is large (the curvature radius is small) near the line A before peeling. In this case, there is a problem that if a part of the large bending deformation of the reinforcing plate 104 (the substrate 102) is detached from the flexible plate 118, the flexible plate 118 is used to vacuum-absorb the reinforcing plate 104 (the substrate 102) Since the holding is released, the reinforcing plate 104 (the substrate 102) falls off from the flexible plate 118 and is broken.

又,於如圖19般剝離對象物為將形成有功能層之2片基板102、102彼此以密封材料120接著而成之積層板122之情形時,亦存在如下問題:與界面正交之箭頭C方向之荷重成分作用於剝離2片基板102、102之方向,故而導致2片基板102、102剝離。 In addition, when the object to be peeled is a laminated board 122 in which two substrates 102 and 102 having a functional layer formed thereon are bonded with a sealing material 120 as shown in FIG. 19, there is also a problem that an arrow orthogonal to the interface exists. The load component in the C direction acts on the direction in which the two substrates 102 and 102 are peeled, so that the two substrates 102 and 102 are peeled.

本發明係鑒於上述問題而完成者,其目的在於提供一種可抑制基板或補強板之破裂且可抑制基板彼此之剝離的基板之剝離裝置及剝離方法以及電子元件之製造方法。 The present invention has been made in view of the above-mentioned problems, and an object thereof is to provide a peeling device, a peeling method, and an electronic component manufacturing method for a substrate that can suppress cracking of a substrate or a reinforcing plate and can suppress peeling of the substrates from each other.

為達成上述目的,本發明之一態樣之基板之剝離裝置係將基板與補強上述基板之補強板之界面藉由使上述基板及上述補強板中之至少一者彎曲變形而沿自一端側朝向另一端側之剝離方向依序剝離,且包括剝離器件,該剝離器件包含:可撓性板,其吸附保持上述基板或上述補強板;及驅動器件,其藉由對上述可撓性板賦予與上述界面平行之方向之力,而使上述一者與上述可撓性板一起彎曲變形。 In order to achieve the above object, a peeling device for a substrate of one aspect of the present invention is to bend the interface of the substrate and the reinforcing plate that reinforces the substrate, and at least one of the substrate and the reinforcing plate is bent and deformed to face from one end side. The peeling direction on the other end side is sequentially peeled, and includes a peeling device including a flexible plate that adsorbs and holds the substrate or the reinforcing plate; and a driving device that imparts the flexible plate with the flexible plate. The force in the direction parallel to the interface causes the aforementioned one to deform together with the flexible plate.

為達成上述目的,本發明之一態樣之基板之剝離方法係將基板 與補強上述基板之補強板之界面藉由使上述基板及上述補強板中之至少一者彎曲變形而沿自一端側朝向另一端側之剝離方向依序剝離,且包括剝離步驟,該剝離步驟係藉由可撓性板吸附保持上述基板或上述補強板,藉由對上述可撓性板賦予與上述界面平行之方向之力而使上述一者與上述可撓性板一起彎曲變形,從而剝離上述界面。 In order to achieve the above object, a method for stripping a substrate according to one aspect of the present invention is to remove the substrate The interface with the reinforcing plate for reinforcing the substrate is sequentially peeled in a peeling direction from one end side to the other end by bending and deforming at least one of the substrate and the reinforcing plate, and includes a peeling step. The peeling step is The substrate or the reinforcing plate is held and held by a flexible plate, and the flexible plate is bent and deformed together with the flexible plate by applying a force in a direction parallel to the interface to the flexible plate, thereby peeling the above. interface.

為達成上述目的,本發明之一態樣之電子元件之製造方法包括:功能層形成步驟,其於由補強板補強之基板之正面形成功能層;及剝離步驟,其藉由使形成有上述功能層之上述基板及上述補強板中之至少一者彎曲變形,而沿自一端側朝向另一端側之剝離方向依序剝離上述基板與上述補強板之界面;且上述剝離步驟為如下步驟:藉由可撓性板吸附保持上述基板或上述補強板,藉由對上述可撓性板賦予與上述界面平行之方向之力而使上述一者與上述可撓性板一起彎曲變形,從而剝離上述界面。 To achieve the above object, a method for manufacturing an electronic component according to one aspect of the present invention includes: a functional layer forming step of forming a functional layer on a front surface of a substrate reinforced by a reinforcing plate; and a peeling step by forming the above function At least one of the substrate and the reinforcing plate of the layer is bent and deformed, and the interface between the substrate and the reinforcing plate is sequentially peeled in a peeling direction from one end side to the other end side; and the peeling step is as follows: The flexible plate adsorbs and holds the substrate or the reinforcing plate, and by applying a force in a direction parallel to the interface to the flexible plate, the flexible plate is deformed together with the flexible plate to peel the interface.

本發明之剝離形態之一態樣係基於如下之發明者之見解而完成,即,若對可撓性板賦予與界面平行之方向之力,使剝離前線附近之可撓性板產生彎曲力矩,則可剝離界面。 One aspect of the peeling form of the present invention is based on the inventor's opinion that if a force is applied to the flexible plate in a direction parallel to the interface, the flexible plate near the front line of the peeling will generate a bending moment, The interface can be peeled off.

若對可撓性板賦予與界面平行之方向之力,則於剝離前線附近之可撓性板,主要利用與界面平行之方向之荷重成分產生彎曲力矩。本發明之剝離形態之一態樣係使剝離前線附近之可撓性板產生上述彎曲力矩而剝離界面。藉由使利用可撓性板之彎曲而產生之拉伸荷重成分(相對於界面大致正交之方向之荷重成分)變小、或成為壓縮荷重成分,利用可撓性板對補強板(或基板)之真空吸附保持未被解除,而可防止於界面之剝離時補強板或基板大幅彎曲變形,因此可抑制基板或補強板之破損,並且可抑制基板彼此之剝離。 If a force is applied to the flexible plate in a direction parallel to the interface, the flexible plate near the peeling front line mainly uses a load component in a direction parallel to the interface to generate a bending moment. One aspect of the peeling form of the present invention is to cause the flexible plate near the peeling front line to generate the aforementioned bending moment and peel the interface. By reducing the tensile load component (the load component in a direction substantially orthogonal to the interface) generated by the bending of the flexible plate or making it a compressive load component, the flexible plate is used to reinforce the plate (or the substrate). The vacuum suction is not released, and the reinforcing plate or the substrate can be prevented from being greatly deformed when the interface is peeled off. Therefore, the substrate or the reinforcing plate can be prevented from being damaged, and the substrates can be prevented from being peeled from each other.

本發明之基板之剝離裝置之一態樣較佳為,上述剝離器件包括:支持器件,其支持包含上述基板及上述補強板之積層體之第1主 面;上述可撓性板,其吸附保持上述積層體之第2主面;及上述驅動器件,其藉由對上述可撓性板之與吸附面相反的一側之位置且與上述可撓性板之吸附面沿上述界面之方向分開之位置賦予與上述界面平行之方向之力,而使上述一者與上述可撓性板一起彎曲變形。 In one aspect of the peeling device of the substrate of the present invention, it is preferable that the peeling device includes: a supporting device that supports the first main body of the laminated body including the substrate and the reinforcing plate. The flexible plate, which holds and holds the second main surface of the laminated body; and the driving device, which is opposite to the suction surface of the flexible plate and is flexible The position where the adsorption surface of the plate is separated in the direction of the interface imparts a force in a direction parallel to the interface, so that the aforementioned one is deformed together with the flexible plate.

本發明之基板之剝離方法之一態樣較佳為,上述剝離步驟包括如下步驟:藉由支持器件支持包含上述基板及上述補強板之積層體之第1主面,並且藉由上述可撓性板吸附保持上述積層體之第2主面;及藉由利用驅動器件對上述可撓性板之與吸附面相反的一側之位置且與上述可撓性板之吸附面沿上述界面之方向分開之位置賦予與上述界面平行之方向之力,而使上述一者與上述可撓性板一起彎曲變形,從而剝離上述界面。 In one aspect of the method for peeling a substrate of the present invention, it is preferable that the peeling step includes the following steps: supporting a first main surface of a laminated body including the substrate and the reinforcing plate by a supporting device, and using the flexibility The second main surface of the laminated body is held by the plate adsorption; and the position of the flexible plate opposite to the adsorption surface is separated from the adsorption surface of the flexible plate along the interface by using a driving device. The position is given a force in a direction parallel to the interface, and the one is bent and deformed together with the flexible plate, so that the interface is peeled off.

本發明之電子元件之製造方法之一態樣較佳為,上述剝離步驟包括如下步驟:藉由支持器件支持包含上述基板及上述補強板之積層體之第1主面,並且藉由上述可撓性板吸附保持上述積層體之第2主面;及藉由利用驅動器件對上述可撓性板之與吸附面相反的一側之位置且與上述可撓性板之吸附面沿上述界面之方向分開之位置賦予與上述界面平行之方向之力,而使上述一者與上述可撓性板一起彎曲變形,從而剝離上述界面。 In one aspect of the manufacturing method of the electronic component of the present invention, it is preferable that the stripping step includes the following steps: supporting the first main surface of the multilayer body including the substrate and the reinforcing plate by a supporting device, and by the flexible The second main surface of the laminated body is adsorbed and held by the flexible plate; and the position of the flexible plate on the side opposite to the adsorbed surface and the direction along the interface with the adsorbed surface of the flexible plate by the driving device The separated position imparts a force in a direction parallel to the interface, so that the one is bent and deformed together with the flexible plate, thereby peeling the interface.

根據本發明之剝離形態之一態樣,藉由支持器件支持積層體之第1主面,藉由可撓性板吸附保持積層體之第2主面。而且,藉由驅動器件對可撓性板之與吸附面相反的一側之位置且與可撓性板之吸附面沿界面之方向分開之位置賦予與界面平行之方向之力。藉此,於剝離前線附近之可撓性板良好地產生上述彎曲力矩。 According to one aspect of the peeling form of the present invention, the first main surface of the laminated body is supported by the supporting device, and the second main surface of the laminated body is held by the flexible plate. Further, the driving device applies a force in a direction parallel to the interface to a position on the side of the flexible plate opposite to the adsorption surface and a position separated from the adsorption surface of the flexible plate along the interface direction. Thereby, the above-mentioned bending moment is favorably generated in the flexible plate near the peeling front line.

本發明之一態樣較佳為,上述基板係厚度為0.2mm以下之玻璃基板。 In one aspect of the present invention, the substrate is preferably a glass substrate having a thickness of 0.2 mm or less.

根據本發明之一態樣,適於應對電子元件之薄壁化之玻璃基板 之剝離裝置、剝離方法、電子元件之製造方法。 According to an aspect of the present invention, a glass substrate suitable for coping with the thinning of electronic components Peeling device, peeling method, and manufacturing method of electronic component.

且說,若使可撓性板自一端部朝向另一端部彎曲變形,則於可撓性板產生之彎曲力矩向最大值增大。藉此,於可撓性板之包含一端部在內之一端部附近,與其他部分相比,曲率半徑變小。若曲率半徑變得過小,則會產生被吸附於可撓性板之吸附面之基板或補強板自可撓性板剝離之問題。 In addition, if the flexible plate is bent and deformed from one end portion to the other end portion, the bending moment generated in the flexible plate increases toward the maximum value. Thereby, the radius of curvature becomes smaller in the vicinity of one end portion including one end portion of the flexible plate than the other portions. If the curvature radius becomes too small, a problem arises that the substrate or the reinforcing plate that is adsorbed on the adsorption surface of the flexible plate is peeled from the flexible plate.

為了消除上述問題,本發明之一態樣較佳為,於上述可撓性板之與吸附面相反的面設有限制上述可撓性板之彎曲變形量之限制構件,且上述限制構件自上述可撓性板開始彎曲變形之上述可撓性板之一端部朝向另一端部而設置。 In order to eliminate the above-mentioned problem, in one aspect of the present invention, it is preferable that a restricting member for restricting the amount of bending deformation of the flexible plate is provided on a surface of the flexible plate opposite to the adsorption surface, and the restricting member is from the above. One end of the above-mentioned flexible board, where the flexible board starts to bend and deform, is provided toward the other end.

根據本發明之一態樣,藉由限制構件限制可撓性板之至少一端部之彎曲變形量,因此可消除基板或補強板自可撓性板剝離之問題。再者,於可撓性板產生之彎曲力矩與剝離前線之長度大致成比例,於剝離前線最長之位置成為最大值。 According to an aspect of the present invention, the amount of bending deformation of at least one end portion of the flexible plate is restricted by the restricting member, so that the problem of peeling the substrate or the reinforcing plate from the flexible plate can be eliminated. In addition, the bending moment generated in the flexible plate is approximately proportional to the length of the line before peeling, and becomes the maximum at the position where the line is longest before peeling.

本發明之一態樣較佳為,上述限制構件係藉由將剛性高於上述可撓性板之複數個塊體隔著特定之間隙沿著自上述一端部朝向上述另一端部的方向配設而構成,上述特定之間隙係設定為與限制上述彎曲變形量之限制量相當之間隙。 According to an aspect of the present invention, it is preferable that the restricting member is disposed along a direction from the one end portion to the other end portion through a plurality of blocks having a rigidity higher than the flexible plate. In other words, the specific gap is a gap corresponding to a limit amount that limits the amount of the bending deformation.

根據本發明之一態樣,隨著可撓性板自一端部朝向另一端部彎曲變形,即隨著可撓性板之曲率半徑變小,塊體與塊體之間之間隙變小。而且,於達到限制可撓性板之彎曲量之曲率半徑時,塊體與塊體之間隙消失,塊體彼此抵接。藉此,可限制可撓性板之彎曲變形量。 According to an aspect of the present invention, as the flexible plate is bent and deformed from one end to the other end, that is, as the radius of curvature of the flexible plate becomes smaller, the gap between the blocks becomes smaller. Furthermore, when the radius of curvature limiting the amount of bending of the flexible plate is reached, the gap between the block and the block disappears, and the blocks abut against each other. This can limit the amount of bending deformation of the flexible plate.

根據本發明,可提供一種能夠抑制基板或補強板之破裂且能夠抑制基板彼此之剝離的基板之剝離裝置及剝離方法以及電子元件之製造方法。 According to the present invention, it is possible to provide a substrate peeling device, a peeling method, and an electronic component manufacturing method capable of suppressing cracking of a substrate or a reinforcing plate and suppressing peeling of the substrates from each other.

1‧‧‧積層板 1‧‧‧ laminated board

1A‧‧‧積層板 1A‧‧‧Laminated board

1B‧‧‧積層板 1B‧‧‧Laminated board

1C‧‧‧角部 1C‧‧‧Corner

1D‧‧‧角部 1D‧‧‧Corner

2‧‧‧基板 2‧‧‧ substrate

2A‧‧‧基板 2A‧‧‧ substrate

2B‧‧‧基板 2B‧‧‧ substrate

3‧‧‧補強板 3‧‧‧ Reinforcing board

3A‧‧‧補強板 3A‧‧‧ Reinforcing board

3B‧‧‧補強板 3B‧‧‧ Reinforcing board

4‧‧‧支持板 4‧‧‧ support board

5‧‧‧樹脂層 5‧‧‧ resin layer

6‧‧‧積層體 6‧‧‧ laminated body

7‧‧‧液晶層 7‧‧‧ LCD layer

8‧‧‧界面 8‧‧‧ interface

10‧‧‧剝離裝置 10‧‧‧ peeling device

12‧‧‧彈性片材 12‧‧‧ elastic sheet

14‧‧‧平台 14‧‧‧platform

16‧‧‧彈性片材 16‧‧‧ Elastic sheet

18‧‧‧可撓性板 18‧‧‧ flexible board

18A‧‧‧本體部 18A‧‧‧Body

18B‧‧‧突出部 18B‧‧‧ protrusion

18C‧‧‧突出部 18C‧‧‧ protrusion

18D‧‧‧可撓性板 18D‧‧‧Flexible board

20‧‧‧基台 20‧‧‧ abutment

22‧‧‧軸 22‧‧‧axis

24‧‧‧軸承 24‧‧‧bearing

26‧‧‧伺服氣缸 26‧‧‧Servo cylinder

26A‧‧‧氣缸本體 26A‧‧‧Cylinder body

26B‧‧‧活塞 26B‧‧‧Piston

28‧‧‧軸 28‧‧‧axis

30‧‧‧軸承 30‧‧‧bearing

32‧‧‧軸 32‧‧‧axis

34‧‧‧軸承 34‧‧‧bearing

36‧‧‧搬出裝置 36‧‧‧ Remove device

38‧‧‧吸附墊 38‧‧‧Adsorption pad

40‧‧‧剝離裝置 40‧‧‧ peeling device

50‧‧‧剝離裝置 50‧‧‧ peeling device

52‧‧‧基台 52‧‧‧ abutment

54‧‧‧可撓性板 54‧‧‧ flexible board

54B‧‧‧突出部 54B‧‧‧ protrusion

56‧‧‧伺服氣缸 56‧‧‧Servo cylinder

56A‧‧‧氣缸本體 56A‧‧‧Cylinder body

56B‧‧‧活塞 56B‧‧‧Piston

60‧‧‧剝離裝置 60‧‧‧ peeling device

62‧‧‧伺服氣缸 62‧‧‧Servo cylinder

62A‧‧‧氣缸 62A‧‧‧Cylinder

62B‧‧‧活塞 62B‧‧‧Piston

64‧‧‧軸 64‧‧‧axis

65‧‧‧軸承 65‧‧‧bearing

66‧‧‧軸 66‧‧‧axis

68‧‧‧軸承 68‧‧‧bearing

70‧‧‧剝離裝置 70‧‧‧ peeling device

72‧‧‧阻尼器用氣缸 72‧‧‧ Cylinder for damper

72A‧‧‧氣缸 72A‧‧‧Cylinder

72B‧‧‧活塞 72B‧‧‧Piston

74‧‧‧軸 74‧‧‧axis

75‧‧‧軸承 75‧‧‧bearing

76‧‧‧軸 76‧‧‧axis

78‧‧‧軸承 78‧‧‧bearing

80‧‧‧剝離裝置 80‧‧‧ stripping device

82‧‧‧限制構件 82‧‧‧ Restricted components

84‧‧‧塊體 84‧‧‧ block

100‧‧‧積層板 100‧‧‧ laminated board

102‧‧‧基板 102‧‧‧ substrate

104‧‧‧補強板 104‧‧‧ Reinforcing board

106‧‧‧剝離區域 106‧‧‧ stripped area

108‧‧‧未剝離區域 108‧‧‧ Unstriped area

110‧‧‧角部 110‧‧‧ Corner

112‧‧‧角部 112‧‧‧ Corner

114‧‧‧可動體 114‧‧‧ movable body

116‧‧‧平台 116‧‧‧Platform

118‧‧‧可撓性板 118‧‧‧ flexible board

118A‧‧‧與吸附面相反的面 118A‧‧‧ The side opposite to the suction side

118B‧‧‧吸附面 118B‧‧‧ Adsorption surface

118C‧‧‧位置 118C‧‧‧Location

118D‧‧‧可撓性板 118D‧‧‧Flexible board

120‧‧‧密封材料 120‧‧‧sealing material

122‧‧‧積層板 122‧‧‧ laminated board

124‧‧‧界面 124‧‧‧ interface

a‧‧‧曲率半徑 a‧‧‧curvature radius

A‧‧‧剝離前線 A‧‧‧ stripped front

B‧‧‧方向 B‧‧‧ direction

C‧‧‧方向 C‧‧‧ direction

E‧‧‧方向 E‧‧‧ direction

F‧‧‧方向 F‧‧‧ direction

G‧‧‧方向 G‧‧‧ direction

H‧‧‧高度 H‧‧‧ height

J‧‧‧間隙 J‧‧‧ Clearance

L‧‧‧長度 L‧‧‧ length

P1‧‧‧荷重成分 P1‧‧‧Load composition

P2‧‧‧力 P2‧‧‧force

R‧‧‧最小曲率半徑 R‧‧‧Minimal curvature radius

圖1係供於電子元件之製造步驟之積層板之主要部分放大側視圖。 FIG. 1 is an enlarged side view of a main part of a laminated board used for manufacturing steps of electronic components.

圖2係表示於電子元件之製造步驟之中途所製作之積層體之一例的側視圖。 FIG. 2 is a side view showing an example of a multilayer body produced in the middle of the manufacturing steps of an electronic component.

圖3(a)係表示先前之基板之剝離方法之原理圖,圖3(b)係本發明之基板之剝離方法之原理圖。 FIG. 3 (a) is a schematic diagram showing a previous method for peeling a substrate, and FIG. 3 (b) is a schematic diagram showing a method for peeling a substrate according to the present invention.

圖4係第1形態之剝離裝置之俯視圖。 Fig. 4 is a plan view of the peeling device of the first embodiment.

圖5係圖4所示之剝離裝置之側視圖。 FIG. 5 is a side view of the peeling device shown in FIG. 4.

圖6(a)係圖4所示之剝離裝置之動作說明圖且自剝離開始經過特定時間後之剝離裝置之側視圖,圖6(b)係圖4所示之剝離裝置之動作說明圖且剛剝離後之剝離裝置之側視圖。 FIG. 6 (a) is an operation explanatory diagram of the peeling device shown in FIG. 4 and a side view of the peeling device after a certain time has elapsed since the start of peeling. Side view of the peeling device immediately after peeling.

圖7(a)係圖4所示之剝離裝置之動作說明圖且使已剝離之補強板沿鉛垂方向退避之剝離裝置之側視圖,圖7(b)係圖4所示之剝離裝置之動作說明圖且剛藉由搬出裝置保持已剝離之補強板後之剝離裝置之側視圖。 FIG. 7 (a) is a side view of the peeling device illustrating the operation of the peeling device shown in FIG. 4 and the peeling reinforcing plate is retracted in the vertical direction. FIG. 7 (b) is a peeling device shown in FIG. 4 An explanatory diagram of the operation and a side view of the peeling device immediately after the peeled reinforcing plate is held by the carrying device.

圖8係第2形態之剝離裝置之俯視圖。 Fig. 8 is a plan view of a peeling device of a second embodiment.

圖9係圖8所示之剝離裝置之側視圖。 FIG. 9 is a side view of the peeling device shown in FIG. 8. FIG.

圖10係第3形態之剝離裝置之側視圖。 Fig. 10 is a side view of a peeling device of a third embodiment.

圖11係第4形態之剝離裝置之俯視圖。 Fig. 11 is a plan view of a peeling device of a fourth embodiment.

圖12係第5形態之剝離裝置之俯視圖。 Fig. 12 is a plan view of a peeling device of a fifth embodiment.

圖13係第6形態之剝離裝置之俯視圖。 Fig. 13 is a plan view of a peeling device of a sixth embodiment.

圖14係圖13所示之剝離裝置之側視圖。 FIG. 14 is a side view of the peeling device shown in FIG. 13.

圖15係表示可撓性板不彎曲之狀態下之限制構件之構成之主要部分放大側視圖。 FIG. 15 is an enlarged side view of a main part showing the configuration of the restricting member in a state where the flexible plate is not bent.

圖16係可撓性板經彎曲變形之剝離裝置之側視圖。 FIG. 16 is a side view of a peeling device in which a flexible plate is deformed by bending.

圖17係表示可撓性板彎曲至最小曲率半徑時塊體彼此抵接之狀態之說明圖。 FIG. 17 is an explanatory diagram showing a state where the blocks abut against each other when the flexible plates are bent to a minimum radius of curvature.

圖18(a)係模式性地表示專利文獻1之剝離裝置之基板之剝離形態之積層板之俯視圖,圖18(b)係圖18(a)所示之剝離形態之側視圖。 FIG. 18 (a) is a plan view of a laminated board schematically showing a peeling form of a substrate of a peeling device of Patent Document 1, and FIG. 18 (b) is a side view of the peeling form shown in FIG. 18 (a).

圖19係表示於形成有功能層之2片基板作用有剝離方向之力之形態之說明圖。 FIG. 19 is an explanatory diagram showing a state in which a force in a peeling direction acts on two substrates on which a functional layer is formed.

以下,根據隨附圖式,對本發明之基板之剝離裝置及剝離方法以及電子元件之製造方法之實施形態進行說明。 Hereinafter, embodiments of a peeling device, a peeling method, and an electronic component manufacturing method for a substrate of the present invention will be described based on the accompanying drawings.

圖1係供於電子元件之製造步驟之積層板1之主要部分放大側視圖。 FIG. 1 is an enlarged side view of a main part of the laminated board 1 provided for the manufacturing steps of electronic components.

[電子元件之製造方法] [Manufacturing method of electronic components]

實施形態之電子元件之製造方法係為了應對用於電子元件之基板2之薄板化,而包括如下步驟:功能層形成步驟,其係構成於基板2之背面貼附補強板3之表面而成之積層板1,於積層板1之基板2之正面形成功能層;及剝離步驟,其係剝離形成有功能層之基板2與補強板3之界面。於上述剝離步驟中係使用實施形態之基板之剝離裝置。關於剝離裝置於下文進行敍述。再者,補強板3未成為電子元件之一部分,而是於自基板2剝離之後,用於基板2之補強而被重新利用。 The manufacturing method of the electronic component according to the embodiment is to cope with the thinning of the substrate 2 for electronic components, and includes the following steps: a functional layer forming step, which is formed by attaching the surface of the reinforcing plate 3 on the back surface of the substrate 2 The laminated board 1 forms a functional layer on the front surface of the substrate 2 of the laminated board 1; and a peeling step, which peels off the interface between the substrate 2 on which the functional layer is formed and the reinforcing plate 3. The above-mentioned peeling step is a peeling device using the substrate of the embodiment. The peeling device will be described below. In addition, the reinforcing plate 3 does not become a part of the electronic component, but is reused for reinforcing the substrate 2 after being peeled from the substrate 2.

上述電子元件係指顯示面板、太陽電池、薄膜二次電池等電子零件。又,上述顯示面板包含液晶面板(LCD)、電漿面板(PDP)、及有機EL(electroluminescence,電致發光)面板(OLED)。 The aforementioned electronic components refer to electronic components such as display panels, solar cells, and thin film secondary batteries. The display panel includes a liquid crystal panel (LCD), a plasma panel (PDP), and an organic EL (electroluminescence) panel (OLED).

[積層板1] [Laminate 1]

如圖1般,積層板1包含基板2及補強基板2之補強板3,藉由於基板2之背面貼附補強板3之表面而構成。 As shown in FIG. 1, the laminated board 1 includes a substrate 2 and a reinforcing plate 3 for reinforcing the substrate 2, and is configured by attaching the surface of the reinforcing plate 3 to the rear surface of the substrate 2.

[基板2] [Substrate 2]

於電子元件之製造步驟之中途,於基板2之正面形成特定之功能層(例如TFT(Thin Film Transistor,薄膜電晶體)、CF(Conductive Film,導電薄膜))。 In the middle of the manufacturing steps of the electronic component, a specific functional layer (such as a TFT (Thin Film Transistor), a CF (Conductive Film)) is formed on the front surface of the substrate 2.

基板2例如為玻璃基板、陶瓷基板、樹脂基板、金屬基板或半導體基板等、及貼合其等而成者,但玻璃基板之耐化學品性、耐透濕性優異且線膨脹係數較小,故而較佳。其原因在於,線膨脹係數越小,於高溫下形成之功能層之圖案在冷卻時越不易偏移。 The substrate 2 is, for example, a glass substrate, a ceramic substrate, a resin substrate, a metal substrate, a semiconductor substrate, or the like, and those bonded together, but the glass substrate has excellent chemical resistance, moisture resistance, and a small linear expansion coefficient. Therefore, it is better. The reason is that the smaller the linear expansion coefficient, the less likely the pattern of the functional layer formed at high temperature to shift when cooled.

作為玻璃基板之玻璃,並無特別限定,例如可例示無鹼玻璃、硼矽酸玻璃、鹼石灰玻璃、高矽玻璃、其他以氧化矽為主要成分之氧化物系玻璃等。作為氧化物系玻璃,較佳為基於氧化物換算所得之氧化矽之含量為40~90質量%之玻璃。 The glass used as the glass substrate is not particularly limited, and examples thereof include alkali-free glass, borosilicate glass, soda-lime glass, high-silica glass, and other oxide-based glasses containing silicon oxide as a main component. The oxide-based glass is preferably a glass having a silicon oxide content of 40 to 90% by mass based on oxide conversion.

又,作為玻璃基板之玻璃,較佳為採用適於電子元件之種類及其製造步驟之玻璃。例如,液晶面板用之玻璃基板較佳為由實質上不含鹼金屬成分之玻璃(無鹼玻璃)構成。如此,玻璃基板之玻璃係根據所應用之電子元件之種類及其製造步驟而適當選擇。 Further, as the glass of the glass substrate, it is preferable to use a glass suitable for the type of electronic component and its manufacturing process. For example, the glass substrate for a liquid crystal panel is preferably composed of glass (alkali-free glass) that does not substantially contain an alkali metal component. As such, the glass of the glass substrate is appropriately selected according to the type of the electronic component to be applied and its manufacturing steps.

上述樹脂基板之樹脂可為結晶性樹脂,亦可為非結晶性樹脂,並無特別限定。 The resin of the resin substrate may be a crystalline resin or a non-crystalline resin, and is not particularly limited.

基板2之厚度係根據基板2之種類而設定。例如,於玻璃基板之情形時,為了電子元件之輕量化、薄板化,較佳為0.7mm以下,更佳為0.2mm以下,進而較佳為0.1mm以下。於0.2mm以下之情形時,可對玻璃基板賦予良好之撓性,而成為應對電子元件之薄型化之較佳之基板。於0.1mm以下之情形時,可將玻璃基板捲取成輥狀。又,就容易製造玻璃基板、容易操作玻璃基板等理由而言,玻璃基板之厚度較佳為0.03mm以上。 The thickness of the substrate 2 is set according to the type of the substrate 2. For example, in the case of a glass substrate, in order to reduce the weight and thickness of the electronic component, it is preferably 0.7 mm or less, more preferably 0.2 mm or less, and even more preferably 0.1 mm or less. In the case of 0.2 mm or less, it is possible to impart good flexibility to the glass substrate, and thus it is a better substrate for reducing the thickness of electronic components. When the thickness is less than 0.1 mm, the glass substrate can be wound into a roll shape. In addition, for reasons such as easy manufacture of a glass substrate and easy handling of the glass substrate, the thickness of the glass substrate is preferably 0.03 mm or more.

[補強板3] [Boost plate 3]

補強板3具備如下功能:若貼附於基板2,則於進行剝離操作之 前補強基板2。補強板3係於形成功能層之後,在電子元件之製造步驟之中途,藉由實施形態之基板之剝離裝置而自基板2剝離。 The reinforcing plate 3 has the following functions: if it is attached to the substrate 2, Front reinforcement substrate 2. After forming the functional layer, the reinforcing plate 3 is peeled from the substrate 2 by the substrate peeling device of the embodiment in the middle of the manufacturing steps of the electronic component.

為了抑制因溫度變化所致之翹曲或剝離,補強板3較佳為與基板2之線膨脹係數之差較小者。於基板2為玻璃基板之情形時,補強板3較佳為包含玻璃板。該玻璃板之玻璃較佳為與玻璃基板之玻璃為相同之種類。 In order to suppress warpage or peeling due to temperature changes, the difference between the linear expansion coefficient of the reinforcing plate 3 and the substrate 2 is preferably small. When the substrate 2 is a glass substrate, the reinforcing plate 3 preferably includes a glass plate. The glass of the glass plate is preferably the same type as the glass of the glass substrate.

補強板3包括成為基底之支持板4、及形成於支持板4之面之樹脂層5。藉由作用於樹脂層5與基板2之間之凡得瓦耳力(Van Der Waals force)、或樹脂層5之黏著力等,基板2隔著樹脂層5可剝離地貼附於支持板4。 The reinforcing plate 3 includes a support plate 4 as a base, and a resin layer 5 formed on a surface of the support plate 4. The substrate 2 is releasably attached to the support plate 4 via the resin layer 5 by a Van Der Waals force acting between the resin layer 5 and the substrate 2 or an adhesive force of the resin layer 5.

再者,圖1之補強板3由支持板4與樹脂層5構成,但亦可僅由支持板4構成。於此情形時,藉由作用於支持板4與基板2之間之凡得瓦耳力等,可剝離地貼附支持板4與基板2。又,於此情形時,較佳為,以作為玻璃板之支持板4與作為玻璃基板之基板2於高溫下不接著之方式於支持板4之貼附側面形成無機薄膜。 The reinforcing plate 3 in FIG. 1 is composed of the supporting plate 4 and the resin layer 5, but may be composed of only the supporting plate 4. In this case, the support plate 4 and the substrate 2 are detachably attached by a Van der Waals force or the like acting between the support plate 4 and the substrate 2. In this case, it is preferable that an inorganic thin film is formed on a side surface of the support plate 4 such that the support plate 4 as a glass plate and the substrate 2 as a glass substrate are not adhered at a high temperature.

又,圖1之支持板4為1片,樹脂層5為1層,但亦可由複數片支持板4構成支持板4並且將樹脂層5以複數層構成。 Although the support plate 4 in FIG. 1 is one sheet and the resin layer 5 is one layer, the support plate 4 may be formed by a plurality of support plates 4 and the resin layer 5 may be formed by a plurality of layers.

[支持板4] [Support board 4]

支持板4藉由隔著樹脂層5支持基板2,而使基板2藉由補強板3得以補強。該支持板4亦具備防止電子元件之製造步驟中之基板2之變形、擦傷、破損等之功能。 The supporting plate 4 supports the substrate 2 through the resin layer 5, so that the substrate 2 is reinforced by the reinforcing plate 3. The support plate 4 also has a function of preventing deformation, abrasion, damage, etc. of the substrate 2 in the manufacturing steps of the electronic component.

作為支持板4,例如可例示玻璃板、陶瓷板、樹脂板、半導體板、或金屬板等。支持板4之種類係根據電子元件之種類、及基板2之種類等而適當選定。若支持板4與基板2為相同種類,則減少因溫度變化所致之翹曲、剝離,故而較佳。 Examples of the support plate 4 include a glass plate, a ceramic plate, a resin plate, a semiconductor plate, and a metal plate. The type of the support plate 4 is appropriately selected according to the type of the electronic component, the type of the substrate 2, and the like. If the support plate 4 and the substrate 2 are of the same type, it is preferable to reduce warpage and peeling due to temperature changes.

支持板4與基板2之平均線膨脹係數之差(絕對值)係根據基板2之 尺寸形狀等而適當設定,例如較佳為35×10-7/℃以下。此處,所謂「平均線膨脹係數」係指50~300℃之溫度範圍內之平均線膨脹係數(JIS R 3102:1995)。 The difference (absolute value) between the average linear expansion coefficients of the support plate 4 and the substrate 2 is appropriately set depending on the size and shape of the substrate 2, and is preferably 35 × 10 -7 / ° C. or lower. Here, the "average linear expansion coefficient" means an average linear expansion coefficient in a temperature range of 50 to 300 ° C (JIS R 3102: 1995).

支持板4之厚度較佳為例如0.7mm以下。又,為了補強基板2,支持板4之厚度較佳為0.4mm以上。支持板4之厚度可厚於基板2,亦可薄於基板2。 The thickness of the support plate 4 is preferably 0.7 mm or less, for example. In order to reinforce the substrate 2, the thickness of the support plate 4 is preferably 0.4 mm or more. The thickness of the support plate 4 may be thicker than the substrate 2 or thinner than the substrate 2.

支持板4之外形尺寸較佳為,以支持板4可支持樹脂層5之整體之方式如圖1所示般與樹脂層5之外形尺寸相同、或大於樹脂層5之外形尺寸。 The outer dimension of the support plate 4 is preferably such that the outer dimension of the resin layer 5 is the same as or larger than the outer dimension of the resin layer 5 as shown in FIG. 1.

[樹脂層5] [Resin layer 5]

樹脂層5具備如下功能:於密接基板2之後,於進行剝離操作之前,防止基板2相對於支持板4之位置偏移。又,樹脂層5亦具備藉由剝離操作而容易地自基板2剝離之功能。藉由容易地剝離基板2,可防止剝離時之基板2之破損。進而,樹脂層5形成為與支持板4之間之結合力相對地高於與基板2之結合力。 The resin layer 5 has a function of preventing the position of the substrate 2 from being shifted relative to the support plate 4 after closely contacting the substrate 2 and before performing a peeling operation. The resin layer 5 also has a function of easily peeling from the substrate 2 by a peeling operation. By easily peeling the substrate 2, it is possible to prevent the substrate 2 from being damaged during peeling. Furthermore, the resin layer 5 is formed so that the bonding force with the support plate 4 is relatively higher than the bonding force with the substrate 2.

樹脂層5之樹脂並無特別限定,可例示丙烯酸系樹脂、聚烯烴樹脂、聚胺基甲酸酯樹脂、聚醯亞胺樹脂、聚矽氧樹脂、聚醯亞胺聚矽氧樹脂等。又,亦可混合複數種樹脂而使用,就耐熱性或剝離性之觀點而言,較佳為聚矽氧樹脂、聚醯亞胺聚矽氧樹脂。 The resin of the resin layer 5 is not particularly limited, and examples thereof include an acrylic resin, a polyolefin resin, a polyurethane resin, a polyimide resin, a polysiloxane resin, and a polyimide polysiloxane resin. In addition, a plurality of resins may be mixed and used. From the viewpoint of heat resistance and peelability, polysiloxane resins and polyimide polysiloxane resins are preferred.

樹脂層5之厚度並無特別限定,但較佳為1~50μm,更佳為4~20μm。其原因在於,藉由將樹脂層5之厚度設為1μm以上,於在樹脂層5與基板2之間混入有氣泡或異物之情形時,樹脂層5會以吸收氣泡或異物之厚度之方式變形。另一方面,其原因在於,若樹脂層5之厚度為50μm以下,則可縮短樹脂層5之形成時間,進而不會超出需要地使用樹脂層5之樹脂,故而較為經濟。 The thickness of the resin layer 5 is not particularly limited, but is preferably 1 to 50 μm, and more preferably 4 to 20 μm. The reason is that by setting the thickness of the resin layer 5 to 1 μm or more, when bubbles or foreign matter are mixed between the resin layer 5 and the substrate 2, the resin layer 5 is deformed so as to absorb the thickness of the bubbles or foreign matter. . On the other hand, if the thickness of the resin layer 5 is 50 μm or less, the formation time of the resin layer 5 can be shortened, and the resin of the resin layer 5 is not used more than necessary, which is economical.

樹脂層5之外形尺寸較佳為,以樹脂層5可密接基板2之整體之方 式如圖1所示般與基板2之外形尺寸相同、或大於基板2之外形尺寸。 The outer dimension of the resin layer 5 is preferably such that the entirety of the substrate 2 can be closely contacted by the resin layer 5. The formula is the same as or larger than the outer dimension of the substrate 2 as shown in FIG. 1.

再者,樹脂層5亦可包含2層以上。於此情形時,「樹脂層之厚度」係指所有樹脂層之合計厚度。又,於樹脂層5包含2層以上之情形時,形成各層之樹脂之種類亦可不同。進而,積層板1之構成並不限定於圖1所示者。例如,亦可使用含有選自由金屬矽化物、氮化物及碳化物所組成之群(WSi2、AlN、TiN、Si3N4及SiC等)中之至少1種之無機層以代替樹脂層5。又,亦可不使用樹脂層5,而藉由對基板2與補強板3之各者之接合面進行鏡面研磨,而使其等之接合面之表面粗糙度變小,接合基板2與補強板3。 The resin layer 5 may include two or more layers. In this case, the "thickness of the resin layer" means the total thickness of all the resin layers. When the resin layer 5 includes two or more layers, the types of resins forming the respective layers may be different. Furthermore, the configuration of the laminated board 1 is not limited to that shown in FIG. 1. For example, instead of the resin layer 5, an inorganic layer containing at least one selected from the group consisting of metal silicide, nitride, and carbide (WSi 2 , AlN, TiN, Si 3 N 4, and SiC) may be used. . In addition, instead of using the resin layer 5, the surface of each of the substrate 2 and the reinforcing plate 3 can be mirror-polished to reduce the surface roughness of the joint surfaces and the substrate 2 and the reinforcing plate 3 can be joined together. .

圖2係於電子元件之製造步驟之中途所製作之積層體6之主要部分放大側視圖。 FIG. 2 is an enlarged side view of a main part of the multilayer body 6 produced in the middle of the manufacturing steps of the electronic component.

[積層體6] [Laminated body 6]

積層體6係藉由使於圖1之積層板1之基板2之正面形成有功能層之2片積層板1、1以各自之功能層對向之方式結合而構成。功能層之種類係根據電子元件之種類而選擇。複數個功能層亦可依序積層於基板2之正面。作為功能層之形成方法,可使用一般方法,例如可使用CVD(Chemical Vapor Deposition,化學氣相沈積)法、PVD(Physical Vapor Deposition,物理氣相沈積)法等蒸鍍法、及濺鍍法等。功能層係藉由光微影法、及蝕刻法形成為特定之圖案。 The laminated body 6 is constituted by combining two laminated plates 1 and 1 having functional layers formed on the front surface of the substrate 2 of the laminated plate 1 of FIG. 1 so that their respective functional layers face each other. The type of the functional layer is selected according to the type of the electronic component. A plurality of functional layers can also be sequentially laminated on the front surface of the substrate 2. As a method for forming the functional layer, a general method can be used. For example, a vapor deposition method such as a CVD (Chemical Vapor Deposition) method, a PVD (Physical Vapor Deposition) method, or a sputtering method can be used. . The functional layer is formed into a specific pattern by a photolithography method and an etching method.

圖2之積層體6自上層至下層具備補強板3A、基板2A、液晶層(功能層)7、基板2B、及補強板3B。即,隔著中央之液晶層7而於上層側設有包含基板2A與補強板3A之積層板1A,於下層側設有包含基板2B與補強板3B之積層板1B。 The laminated body 6 in FIG. 2 includes a reinforcing plate 3A, a substrate 2A, a liquid crystal layer (functional layer) 7, a substrate 2B, and a reinforcing plate 3B from the upper layer to the lower layer. That is, a laminated board 1A including a substrate 2A and a reinforcing plate 3A is provided on the upper side via a liquid crystal layer 7 in the center, and a laminated board 1B including the substrate 2B and a reinforcing plate 3B is provided on the lower side.

圖2之積層體6係於LCD之製造步驟之中途所製作者。於基板2A之液晶層7側之面,即基板2A之正面,形成有薄膜電晶體(TFT),於基板2B之液晶層7側之面,即基板2B之正面,形成有彩色濾光片 (CF),由薄膜電晶體與彩色濾光片形成作為功能層之液晶層7。 The laminated body 6 in FIG. 2 is produced in the middle of the manufacturing steps of the LCD. A thin film transistor (TFT) is formed on the surface of the liquid crystal layer 7 side of the substrate 2A, that is, the front surface of the substrate 2A, and a color filter is formed on the surface of the liquid crystal layer 7 side of the substrate 2B, that is, the front surface of the substrate 2B. (CF) A liquid crystal layer 7 as a functional layer is formed of a thin film transistor and a color filter.

再者,圖2之積層體6為於兩側配置有補強板3A、3B之構成,但作為積層體,亦可為僅於單側配置有補強板之構成。 In addition, the laminated body 6 in FIG. 2 has a structure in which the reinforcing plates 3A and 3B are arranged on both sides, but as a laminated body, a structure in which the reinforcing plate is arranged only on one side may be used.

積層體6於剝離步驟中被剝離補強板3A、3B。於已剝離補強板3A、3B之基板2A、2B之背面安裝有背光源等電子零件,藉此,製造作為製品之LCD。補強板3A、3B之剝離係使用下述剝離裝置。 The laminated body 6 is peeled from the reinforcing plates 3A and 3B in the peeling step. Electronic components such as a backlight are mounted on the back surfaces of the substrates 2A and 2B of the stripped reinforcing plates 3A and 3B, thereby manufacturing an LCD as a product. The peeling of the reinforcing plates 3A and 3B was performed using the following peeling device.

[本發明之基板之剝離方法] [Peeling method of substrate of the present invention]

首先,於說明實施形態之基板之剝離裝置之前,對先前之基板之剝離方法與本發明之基板之剝離方法之不同點進行說明。 First, before describing the substrate peeling device of the embodiment, the differences between the previous method for peeling a substrate and the method for peeling a substrate according to the present invention will be described.

圖3(a)係表示先前之基板之剝離方法之原理圖,圖3(b)係本發明之基板之剝離方法之原理圖。再者,於圖3(a)及3(b)中,使用標附於圖18(a)及18(b)之符號進行說明。 FIG. 3 (a) is a schematic diagram showing a previous method for peeling a substrate, and FIG. 3 (b) is a schematic diagram showing a method for peeling a substrate according to the present invention. In addition, in FIGS. 3 (a) and 3 (b), description is made using the symbols attached to FIGS. 18 (a) and 18 (b).

如圖3(a)般,先前之基板之剝離方法為如下方法,即,對積層板100之基板102與補強板104之界面124附加與界面124正交之箭頭C方向之荷重成分P1而剝離界面124。 As shown in FIG. 3 (a), the previous method for peeling the substrate is the method of adding the load component P1 in the direction of the arrow C orthogonal to the interface 124 to the interface 124 of the substrate 102 and the reinforcing plate 104 of the laminate 100 and peeling it off. Interface 124.

相對於此,圖3(b)所示之本發明之基板之剝離方法為如下方法,即,藉由對可撓性板118賦予與界面124平行之箭頭D方向之力P2而使補強板104(或基板102)與可撓性板118一起彎曲變形,從而剝離界面124。具體而言,對可撓性板118之與吸附面相反的面118A側之位置且與可撓性板118之吸附面118B沿界面124之方向分開之位置118C賦予力P2,而剝離界面124。即,位置118C係指於其正下方不存在積層板100之位置。 In contrast, the method of peeling the substrate of the present invention shown in FIG. 3 (b) is a method in which the reinforcing plate 104 is reinforced by applying a force P2 to the flexible plate 118 in the direction of the arrow D parallel to the interface 124. (Or the substrate 102) is bent and deformed together with the flexible plate 118, so that the interface 124 is peeled off. Specifically, a force P2 is applied to a position 118C of the flexible plate 118 on the side opposite to the suction surface 118A side and separated from the suction surface 118B of the flexible plate 118 in the direction of the interface 124, and the interface 124 is peeled off. That is, the position 118C refers to a position where the laminated board 100 does not exist directly below it.

如圖3(b)般,若對可撓性板118賦予與與吸附面相反的面118A平行之箭頭D方向之力P2,則於剝離前線A附近之可撓性板118D,主要藉由與界面124平行之方向之荷重成分而產生彎曲力矩。本發明之基板之剝離方法係使剝離前線A附近之可撓性板118D產生上述彎曲力矩 而剝離界面124。使利用可撓性板118之彎曲而產生之拉伸荷重成分(相對於界面124大致正交,剝離界面124之方向之荷重成分)變小、或使壓縮荷重成分(相對於界面124大致正交,與剝離界面124之方向為相反方向之荷重成分)變大,藉此,剝離前線A附近之利用可撓性板118D對補強板104(或基板102)之真空吸附保持未被解除,而可防止於界面124之剝離時補強板104(或基板102)大幅彎曲變形,因此可抑制補強板104(或基板102)之破損,並且可抑制基板102、102彼此之剝離(參照圖19)。 As shown in FIG. 3 (b), if a force P2 is applied to the flexible plate 118 in the direction of the arrow D that is parallel to the surface 118A opposite to the adsorption surface, the flexible plate 118D near the front line A is mainly peeled by The load component in the parallel direction of the interface 124 generates a bending moment. The method for peeling the substrate of the present invention causes the flexible plate 118D near the peeling line A to generate the above-mentioned bending moment. And peeling interface 124. The tensile load component (approximately orthogonal to the interface 124 and the load component in the direction of peeling the interface 124) generated by the bending of the flexible plate 118 is reduced, or the compressive load component (approximately orthogonal to the interface 124) is reduced. (The load component in the direction opposite to the direction of the peeling interface 124) becomes larger, whereby the vacuum adsorption of the reinforcing plate 104 (or the substrate 102) by the flexible plate 118D near the peeling line A is not released, and the It is possible to prevent the reinforcing plate 104 (or the substrate 102) from being greatly bent and deformed when the interface 124 is peeled off. Therefore, it is possible to suppress the damage of the reinforcing plate 104 (or the substrate 102) and to prevent the substrates 102 and 102 from peeling from each other (see FIG. 19).

其次,說明本發明之基板之剝離裝置。 Next, the substrate peeling device of the present invention will be described.

[第1形態之基板之剝離裝置10之構成] [Configuration of the substrate peeling device 10 of the first form]

圖4係第1形態之剝離裝置10之俯視圖,圖5係圖4所示之剝離裝置10之側視圖。圖4、圖5中說明之剝離對象物為圖1所示之積層板1,但亦可為圖2所示之積層體6(與圖19所示之積層板122為同一物)。 FIG. 4 is a plan view of the peeling device 10 in the first form, and FIG. 5 is a side view of the peeling device 10 shown in FIG. 4. The peeling object described in FIGS. 4 and 5 is the laminated board 1 shown in FIG. 1, but it may also be the laminated body 6 shown in FIG. 2 (the same thing as the laminated board 122 shown in FIG. 19).

剝離裝置10為如下裝置,即,於將積層板1之界面8保持於水平方向之狀態下,將界面8自積層板1之角部(一端部)1C朝向角部(另一端部)1D依序剝離。於剝離界面8時,剝離界面8之剝離區域與未剝離區域之邊界線即剝離前線A(參照圖4)沿箭頭E方向行進。又,剝離裝置10係支持基板2使之無法變形,使補強板3彎曲變形而剝離界面8,但亦可支持補強板3使之無法變形,使基板2彎曲變形而剝離界面8。 The peeling device 10 is a device that holds the interface 8 of the multilayer board 1 in a horizontal direction, and positions the interface 8 from the corner (one end) 1C of the laminate 1 toward the corner (the other end) 1D. Order stripping. When the interface 8 is peeled, the boundary line between the peeled area and the non-peeled area of the peeled interface 8, that is, the front line A (see FIG. 4), advances in the direction of the arrow E. In addition, the peeling device 10 supports the substrate 2 so that it cannot be deformed and bends and deforms the reinforcing plate 3 to peel the interface 8. However, it can also support the reinforcing plate 3 so that it cannot deform and bends and deforms the substrate 2 to peel the interface 8.

剝離裝置10包括:平台14(支持器件),其隔著橡膠製之彈性片材12而真空吸附保持俯視呈矩形狀之基板2之正面(第1主面)使之無法變形;及可撓性板18,其隔著橡膠製之彈性片材16而真空吸附保持俯視呈矩形狀之補強板3之背面(第2主面)。平台14被固定於基台20之上表面。 The peeling device 10 includes: a platform 14 (supporting device) that vacuum-holds the front surface (the first main surface) of the substrate 2 that is rectangular in plan view through a rubber-made elastic sheet 12 so that it cannot be deformed; and flexibility The plate 18 has a back surface (a second main surface) of the reinforcing plate 3 having a rectangular shape in a plan view by vacuum suction through an elastic sheet 16 made of rubber. The platform 14 is fixed on the upper surface of the base 20.

可撓性板18包括真空吸附保持補強板3之矩形狀之本體部18A。本體部18A具有面積充分大於補強板3且沿補強板3之外形之形狀。於 本體部18A之一端設有自積層板1之角部1C沿水平方向朝外側突出之矩形狀之突出部18B。又,於本體部18A之另一端,設有自積層板1之角部1D沿水平方向朝外側突出之矩形狀之突出部18C。突出部18B、18C係沿剝離前線A之行進方向(箭頭E方向)而設置。 The flexible plate 18 includes a rectangular-shaped main body portion 18A that vacuum-retains and holds the reinforcing plate 3. The main body portion 18A has a shape that is sufficiently larger in area than the reinforcing plate 3 and follows the outer shape of the reinforcing plate 3. to One end of the main body portion 18A is provided with a rectangular-shaped protruding portion 18B protruding from the corner portion 1C of the laminated board 1 toward the outside in the horizontal direction. Further, at the other end of the main body portion 18A, a rectangular-shaped protruding portion 18C protruding from the corner portion 1D of the laminate 1 in a horizontal direction to the outside is provided. The protruding portions 18B and 18C are provided along the traveling direction (direction of the arrow E) of the front line A for peeling.

可撓性板18之每單位寬度(1mm)之彎曲剛性較佳為1000~40000N‧mm2/mm。例如,於可撓性板18之寬度為100mm之部分,彎曲剛性成為100000~4000000N‧mm2。藉由將可撓性板18之每單位寬度(1mm)之彎曲剛性設為1000N‧mm2/mm以上,可防止可撓性板18吸附保持之板(實施形態中為補強板3)之彎折。又,藉由將可撓性板18之每單位寬度(1mm)之彎曲剛性設為40000N‧mm2/mm以下,可使可撓性板18吸附保持之板適度彎曲變形。作為可撓性板18,除例如聚氯乙烯(PVC)樹脂、聚碳酸酯樹脂、丙烯酸系樹脂、聚縮醛(POM)樹脂等樹脂板以外,可使用金屬板。 The bending rigidity per unit width (1 mm) of the flexible plate 18 is preferably 1,000 to 40,000 N · mm 2 / mm. For example, in a portion where the width of the flexible plate 18 is 100 mm, the bending rigidity is 100,000 to 4000000 N · mm 2 . By setting the bending rigidity per unit width (1mm) of the flexible plate 18 to 1000 N‧ mm 2 / mm or more, the bending of the plate (the reinforcing plate 3 in the embodiment) which is held by the flexible plate 18 can be prevented. fold. In addition, by setting the bending rigidity per unit width (1 mm) of the flexible plate 18 to be 40,000 N · mm 2 / mm or less, the plate held and held by the flexible plate 18 can be appropriately bent and deformed. As the flexible plate 18, a metal plate can be used in addition to resin plates such as polyvinyl chloride (PVC) resin, polycarbonate resin, acrylic resin, and polyacetal (POM) resin.

於可撓性板18之突出部18C之端部,沿水平方向設置有軸22,該軸22旋動自如地支持於固定於基台20之上表面的軸承24、24。因此,可撓性板18以軸22為中心相對於基台20傾動自如地設置。 A shaft 22 is provided at an end of the protruding portion 18C of the flexible plate 18 in a horizontal direction, and the shaft 22 is rotatably supported by bearings 24 and 24 fixed on the upper surface of the base 20. Therefore, the flexible plate 18 is tiltably provided with respect to the base 20 around the shaft 22.

又,於可撓性板18搭載有作為驅動器件之伺服氣缸(servo cylinder)26。再者,於實施形態中,例示伺服氣缸26作為驅動器件,但驅動器件亦可為包含旋轉式之伺服馬達及滾珠螺桿機構等之直接驅動裝置,亦可為液壓氣缸(例如氣壓氣缸)。又,由驅動器件與可撓性板18構成本發明之剝離器件。 A servo cylinder 26 as a driving device is mounted on the flexible plate 18. Furthermore, in the embodiment, the servo cylinder 26 is exemplified as a driving device, but the driving device may be a direct driving device including a rotary servo motor, a ball screw mechanism, or the like, or a hydraulic cylinder (for example, a pneumatic cylinder). The driving device and the flexible plate 18 constitute a peeling device of the present invention.

伺服氣缸26包括氣缸本體26A與活塞26B。又,於圖4之俯視下,伺服氣缸26配置為活塞26B之軸和連結角部1C與角部1D之直線吻合。即,活塞26B沿剝離前線A之行進方向(箭頭E方向)伸縮。 The servo cylinder 26 includes a cylinder body 26A and a piston 26B. In the plan view of FIG. 4, the servo cylinder 26 is arranged such that the axis of the piston 26B and the straight line between the connecting corner portion 1C and the corner portion 1D coincide. That is, the piston 26B expands and contracts in the traveling direction (arrow E direction) of the front line A of peeling.

於氣缸本體26A之基端部,沿水平方向設置有軸28,該軸28旋動自如地支持於固定於可撓性板18之突出部18C之上表面的軸承30、 30。又,於活塞26B之前端部,沿水平方向設置有軸32,該軸32旋動自如地支持於固定於可撓性板18之突出部18B之上表面的軸承34、34。 A shaft 28 is provided at the base end portion of the cylinder body 26A in the horizontal direction, and the shaft 28 is rotatably supported by a bearing 30 fixed on the upper surface of the protruding portion 18C of the flexible plate 18, 30. A shaft 32 is provided in the horizontal direction at the front end of the piston 26B. The shaft 32 is rotatably supported by bearings 34 and 34 fixed to the upper surface of the protruding portion 18B of the flexible plate 18.

[剝離裝置10之作用] [Function of Peeling Device 10]

若藉由未圖示之控制部使伺服氣缸26之活塞26B自圖5之伸長狀態進行收縮動作,則對可撓性板18之突出部18B賦予與界面8平行之方向之力。即,對可撓性板18之與吸附面相反的一側之位置且與可撓性板18之吸附面沿界面8之方向分開之位置之突出部18B賦予伺服氣缸26之力。藉由伺服氣缸26之力,圖4之剝離前線A沿箭頭E方向移動,界面8自角部1C朝向角部1D依序剝離。 When the piston 26B of the servo cylinder 26 is retracted from the extended state in FIG. 5 by a control unit (not shown), a force in a direction parallel to the interface 8 is applied to the protruding portion 18B of the flexible plate 18. That is, the servo cylinder 26 is given a force to the protruding portion 18B of the flexible plate 18 at a position opposite to the suction surface and at a position separated from the suction surface of the flexible plate 18 in the direction of the interface 8. By the force of the servo cylinder 26, the peeling front A of FIG. 4 moves in the direction of the arrow E, and the interface 8 peels in sequence from the corner 1C toward the corner 1D.

圖6(a)係圖4所示之剝離裝置10之動作說明圖且係自剝離開始經過特定時間後之剝離裝置10之側視圖。圖6(b)係圖4所示之剝離裝置10之動作說明圖且係剛剝離界面8之後之剝離裝置10之側視圖。 FIG. 6 (a) is an operation explanatory diagram of the peeling device 10 shown in FIG. 4 and is a side view of the peeling device 10 after a specific time has elapsed since the peeling started. FIG. 6 (b) is an operation explanatory diagram of the peeling device 10 shown in FIG. 4 and is a side view of the peeling device 10 immediately after the interface 8 is peeled.

如圖6(a)所示,若活塞26B沿箭頭F方向進行收縮動作,則經由軸32及軸承34、34對突出部18B賦予與界面8平行之方向之力。藉由該力,可撓性板18開始彎曲變形。繼而,伺服氣缸26追隨可撓性板18之彎曲變形,藉由軸28與軸32之旋動作用而以軸28為中心傾動。而且,藉由可撓性板18之彎曲變形,於剝離前線A附近之可撓性板18D,主要藉由與界面8平行之方向之荷重成分而產生彎曲力矩。藉由該彎曲力矩,界面8追隨活塞26B之伸縮動作而依序剝離,如圖6(b)般全面剝離。 As shown in FIG. 6 (a), when the piston 26B performs a contraction operation in the direction of the arrow F, a force in a direction parallel to the interface 8 is applied to the protruding portion 18B via the shaft 32 and the bearings 34 and 34. With this force, the flexible plate 18 starts to bend and deform. Then, the servo cylinder 26 follows the bending deformation of the flexible plate 18, and is tilted around the shaft 28 by the rotation of the shaft 28 and the shaft 32. In addition, due to the bending deformation of the flexible plate 18, the flexible plate 18D near the peeling front line A mainly generates a bending moment by a load component in a direction parallel to the interface 8. By this bending moment, the interface 8 is peeled off in sequence following the telescopic movement of the piston 26B, as shown in FIG. 6 (b).

第1形態之剝離裝置10係使剝離前線A附近之可撓性板18D產生上述彎曲力矩而剝離界面8,因此於剝離界面8時,藉由使利用可撓性板18之彎曲而產生之拉伸荷重成分(相對於界面8大致正交之方向之荷重成分)變小、或成為壓縮荷重成分(於圖6中為壓縮荷重成分),剝離前線A附近之利用可撓性板18D對補強板3(或基板2)之真空吸附保持未被 解除,而可防止剝離前線A附近之補強板3(或基板2)大幅彎曲變形。藉此,可抑制補強板3(或基板2)之破損。又,於剝離對象物為圖2之積層體6之情形時,可抑制基板2A、2B彼此之剝離。 The peeling device 10 of the first form peels the interface 8 by causing the flexible plate 18D near the peeling line A to generate the bending moment described above. Therefore, when the interface 8 is peeled, the tensile force generated by the bending of the flexible plate 18 is used. The tensile load component (a load component in a direction substantially orthogonal to the interface 8) becomes smaller or becomes a compressive load component (a compressive load component in FIG. 6), and the flexible plate 18D near the front line A is used to strengthen the reinforcing plate. The vacuum adsorption of 3 (or substrate 2) remains unaffected When it is released, the reinforcing plate 3 (or the substrate 2) near the peeling front line A can be prevented from being greatly deformed. Thereby, breakage of the reinforcing plate 3 (or the substrate 2) can be suppressed. Moreover, when the object to be peeled is the laminated body 6 of FIG. 2, peeling of the substrates 2A and 2B from each other can be suppressed.

圖7(a)係圖4所示之剝離裝置10之動作說明圖且係使已剝離之補強板3沿鉛垂方向退避之剝離裝置10之側視圖。圖7(b)係圖4所示之剝離裝置10之動作說明圖且係剛藉由搬出裝置36保持已剝離之補強板3後之剝離裝置10之側視圖。 FIG. 7 (a) is an explanatory view of the operation of the peeling device 10 shown in FIG. 4 and is a side view of the peeling device 10 in which the peeled reinforcing plate 3 is retracted in the vertical direction. FIG. 7 (b) is an operation explanatory diagram of the peeling device 10 shown in FIG. 4 and is a side view of the peeling device 10 immediately after the peeled reinforcing plate 3 is held by the carrying-out device 36.

如圖6(b)般,若界面8全面剝離,則可撓性板18藉由未圖示之傾動裝置而以軸22為中心傾動至圖7(a)之退避位置。此後,可撓性板18藉由以活塞26B之箭頭G所示之伸長恢復動作而解除彎曲變形,恢復至圖7(b)之原來之形狀。藉此,補強板3沿鉛垂方向變更姿勢。此後,搬出裝置36朝向補強板3進出移動,搬出裝置36之吸附墊38、38…吸附於補強板3之表面。此後,利用可撓性板18對補強板3之真空吸附保持被解除,藉由搬出裝置36自剝離裝置10搬出補強板3。 As shown in FIG. 6 (b), if the interface 8 is completely peeled off, the flexible plate 18 is tilted to the retreat position of FIG. 7 (a) by the tilting device (not shown) with the shaft 22 as the center. Thereafter, the flexible plate 18 is released from the bending deformation by the extension recovery operation indicated by the arrow G of the piston 26B, and is restored to the original shape shown in FIG. 7 (b). Thereby, the posture of the reinforcing plate 3 is changed in the vertical direction. Thereafter, the carrying-out device 36 moves in and out of the reinforcing plate 3, and the suction pads 38, 38,... Of the carrying-out device 36 are adsorbed on the surface of the reinforcing plate 3. Thereafter, the vacuum suction holding of the reinforcing plate 3 by the flexible plate 18 is released, and the reinforcing plate 3 is carried out from the peeling device 10 by the carrying-out device 36.

又,同樣地,未圖示之搬出裝置朝向基板2進出移動,該搬出裝置之吸附墊吸附於基板2之背面。此後,利用平台14對基板2之真空吸附保持被解除,藉由搬出裝置自剝離裝置10搬出基板2。藉由以上動作,利用剝離裝置10對積層板1之剝離作業結束。 Similarly, an unillustrated unloading device moves in and out of the substrate 2, and the suction pad of the unloading device is adsorbed on the back surface of the substrate 2. Thereafter, the vacuum suction holding of the substrate 2 by the platform 14 is released, and the substrate 2 is carried out from the peeling device 10 by a carrying-out device. With the above operation, the peeling operation of the laminated board 1 by the peeling device 10 is completed.

再者,於剝離裝置10中,較佳為,以與剝離前線A之行進方向(圖4之箭頭E)正交之方向之基板2(補強板3)之長度與可撓性板18之長度之比相等之方式,設定可撓性板18之本體部18A之大小。藉此,剝離前線A通過時之本體部18A之彎曲變形量(曲率半徑)變為固定,因此剝離動作穩定。 Furthermore, in the peeling device 10, it is preferable that the length of the substrate 2 (reinforcing plate 3) and the length of the flexible plate 18 in a direction orthogonal to the traveling direction (arrow E in FIG. 4) of the front line A for peeling. The size of the body portion 18A of the flexible plate 18 is set so that the ratios are equal. Thereby, the amount of bending deformation (curvature radius) of the main body portion 18A when the front line A passes through is peeled, and the peeling operation is stable.

又,較佳為,使剝離前線A變短時之剝離前線A之行進速度較剝離前線A變長時之剝離前線A之行進速度低速。藉此,可抑制因可撓性板18之回彈(spring back)作用而於剛結束剝離後產生之可撓性板18 之振動(彈跳(bound))。 Moreover, it is preferable that the traveling speed of the peeling front line A when the peeling front line A becomes short is lower than the traveling speed of the peeling front line A when the peeling front line A becomes long. Thereby, the flexible plate 18 which is generated immediately after the peeling due to the spring back action of the flexible plate 18 can be suppressed. Vibration (bound).

[第2形態之基板之剝離裝置40之構成] [Configuration of Substrate Peeling Device 40 of the Second Form]

圖8係第2形態之剝離裝置40之俯視圖,圖9係圖8所示之剝離裝置40之側視圖。又,於說明剝離裝置40之構成時,對與圖4至圖7所示之剝離裝置10相同或類似之構件標附相同之符號並省略說明。 FIG. 8 is a plan view of the peeling device 40 in the second form, and FIG. 9 is a side view of the peeling device 40 shown in FIG. 8. In describing the structure of the peeling device 40, the same or similar components as those of the peeling device 10 shown in Figs.

剝離裝置40相對於剝離裝置10之構成上之不同點在於將支持伺服氣缸26之軸28之軸承30、30固定於基台20之上表面,其他構成相同。 The difference between the structure of the peeling device 40 and the peeling device 10 is that the bearings 30 and 30 supporting the shaft 28 of the servo cylinder 26 are fixed to the upper surface of the base 20, and the other structures are the same.

[剝離裝置40之作用] [Function of Peeling Device 40]

與剝離裝置10同樣地,若活塞26B沿箭頭F方向進行收縮動作,則經由軸32及軸承34、34對突出部18B賦予與界面8平行之方向之力。可撓性板18藉由該力開始彎曲變形,並且伺服氣缸26追隨可撓性板18之彎曲變形,藉由軸28與軸32之旋動作用而以軸28為中心傾動。而且,藉由可撓性板18之彎曲變形,於剝離前線A附近之可撓性板18D(參照圖6(a)),主要藉由與界面8平行之方向之荷重成分而產生彎曲力矩。藉由該彎曲力矩,界面8追隨活塞26B之伸縮動作而依序剝離。 Similarly to the peeling device 10, when the piston 26B performs a shrinking operation in the direction of the arrow F, a force in a direction parallel to the interface 8 is applied to the protruding portion 18B via the shaft 32 and the bearings 34 and 34. The flexible plate 18 starts to bend and deform by this force, and the servo cylinder 26 follows the bending deformation of the flexible plate 18, and tilts around the shaft 28 by the rotation of the shaft 28 and the shaft 32. Further, due to the bending deformation of the flexible plate 18, the flexible plate 18D (see FIG. 6 (a)) near the peeling line A mainly generates a bending moment by a load component in a direction parallel to the interface 8. By this bending moment, the interface 8 is sequentially peeled following the telescopic movement of the piston 26B.

若界面8全面剝離,則可撓性板18藉由未圖示之傾動裝置而以軸22為中心傾動至退避位置(參照圖7(a))。此時,伺服氣缸26亦追隨而以軸28為中心旋動。 When the interface 8 is completely peeled off, the flexible plate 18 is tilted to the retracted position around the shaft 22 by a tilting device (not shown) (see FIG. 7 (a)). At this time, the servo cylinder 26 also follows and rotates around the shaft 28.

[第3形態之基板之剝離裝置50之構成] [Configuration of the substrate peeling device 50 of the third form]

圖10係第3形態之剝離裝置50之側視圖。又,於說明剝離裝置50之構成時,對與圖4至圖7所示之剝離裝置10相同或類似之構件標附相同之符號並省略說明。 FIG. 10 is a side view of the peeling device 50 according to the third embodiment. In describing the structure of the peeling device 50, the same reference numerals are given to members that are the same as or similar to those of the peeling device 10 shown in FIGS. 4 to 7, and descriptions thereof are omitted.

剝離裝置50相對於剝離裝置10之構成上之不同點在於:經由軸承24及軸22將上方側之可撓性板18傾動自如地配置於側視呈L字形狀 之基台52之上表面,將下方側之可撓性板54與可撓性板18平行地配置於基台52之上表面,隔著彈性片材12將基板2真空吸附保持於可撓性板54,及將與伺服氣缸26相同構成之伺服氣缸56配置於可撓性板54。伺服氣缸56亦與伺服氣缸26同樣地,氣缸本體56A經由軸28及軸承30而支持於可撓性板54,活塞56B經由軸32及軸承34而支持於可撓性板54之突出部54B。 The difference between the structure of the peeling device 50 and the peeling device 10 is that the flexible plate 18 on the upper side is freely arranged in an L-shape in side view through the bearing 24 and the shaft 22 On the upper surface of the base 52, the lower flexible plate 54 and the flexible plate 18 are arranged in parallel on the upper surface of the base 52, and the substrate 2 is vacuum-held and held to the flexibility via the elastic sheet 12. The plate 54 and the servo cylinder 56 having the same configuration as the servo cylinder 26 are disposed on the flexible plate 54. The servo cylinder 56 is similar to the servo cylinder 26 in that the cylinder body 56A is supported by the flexible plate 54 via the shaft 28 and the bearing 30, and the piston 56B is supported by the protruding portion 54B of the flexible plate 54 via the shaft 32 and the bearing 34.

[剝離裝置50之作用] [Function of Peeling Device 50]

使伺服氣缸26之活塞26B進行收縮動作而使可撓性板18彎曲變形,同時使伺服氣缸56之活塞56B進行收縮動作而使可撓性板54彎曲變形。藉此,對剝離前線附近之基板2及補強板3賦予彎曲力矩而剝離界面8。 The piston 26B of the servo cylinder 26 is contracted to deform the flexible plate 18, and the piston 56B of the servo cylinder 56 is contracted to deform the flexible plate 54. Thereby, a bending moment is applied to the substrate 2 and the reinforcing plate 3 near the front line of peeling, and the interface 8 is peeled.

[第4形態之基板之剝離裝置60之構成] [Configuration of Substrate Peeling Device 60 in the Fourth Form]

圖11係第4形態之剝離裝置60之俯視圖。於說明剝離裝置60之構成時,對與圖4至圖7所示之剝離裝置10相同或類似之構件標附相同之符號並省略說明。 FIG. 11 is a plan view of a peeling device 60 in a fourth embodiment. In describing the configuration of the peeling device 60, the same or similar components as those of the peeling device 10 shown in Figs. 4 to 7 are denoted by the same reference numerals and description thereof will be omitted.

剝離裝置60相對於剝離裝置10之構成上之不同點在於,除伺服氣缸26以外,亦將2台伺服氣缸62、62配置於可撓性板18,其他構成相同。 The difference between the structure of the peeling device 60 and the peeling device 10 is that in addition to the servo cylinder 26, two servo cylinders 62 and 62 are also arranged on the flexible plate 18, and the other structures are the same.

於角部1C至角部1D之剝離前線通過之剝離全長上,伺服氣缸26承擔執行前半部分之剝離之作用,伺服氣缸62、62承擔執行後半部分之剝離之作用。因此,伺服氣缸26之氣缸本體26A經由軸28及軸承30支持於可撓性板18之本體部18A之大致中央部。又,伺服氣缸62、62之各者之活塞62B、62B係與伺服氣缸26之活塞26B平行地配置並且配置於伺服氣缸26之氣缸本體26A之兩側方。 On the entire length of the peeling line passing from the corner 1C to the corner 1D, the servo cylinder 26 is responsible for performing the peeling of the first half, and the servo cylinders 62, 62 are responsible for performing the peeling of the second half. Therefore, the cylinder body 26A of the servo cylinder 26 is supported at the substantially central portion of the body portion 18A of the flexible plate 18 via the shaft 28 and the bearing 30. The pistons 62B and 62B of each of the servo cylinders 62 and 62 are arranged parallel to the piston 26B of the servo cylinder 26 and are arranged on both sides of the cylinder body 26A of the servo cylinder 26.

又,活塞62B、62B分別經由軸64及軸承65而支持於本體部18A之大致中央部,氣缸62A、62A分別經由軸66及軸承68而支持於突出部 18C。 In addition, the pistons 62B and 62B are supported by the central portion of the main body portion 18A via the shaft 64 and the bearing 65, and the cylinders 62A and 62A are supported by the protruding portion via the shaft 66 and the bearing 68, respectively. 18C.

[剝離裝置60之作用] [Function of Peeling Device 60]

藉由使伺服氣缸26之活塞26B進行收縮動作而使可撓性板18彎曲變形,對剝離前線附近之補強板3賦予彎曲力矩而剝離界面。繼而,結束活塞26B之收縮動作,並且開始伺服氣缸62、62之活塞62B、62B之收縮動作,繼續使可撓性板18彎曲變形。藉此,對剝離前線附近之補強板3繼續賦予彎曲力矩。繼而,於即將結束活塞62B、62B之收縮動作之前全面剝離界面。 When the piston 26B of the servo cylinder 26 is retracted, the flexible plate 18 is bent and deformed, and a bending moment is applied to the reinforcing plate 3 near the peeling line to peel the interface. Then, the contraction operation of the piston 26B is ended, and the contraction operations of the pistons 62B, 62B of the servo cylinders 62, 62 are started, and the flexible plate 18 is continuously deformed by bending. Thereby, the bending moment is continued to be given to the reinforcing plate 3 near the peeling front line. Then, the interface is completely peeled off immediately before the contraction of the pistons 62B, 62B.

具備3台伺服氣缸26、62、62之剝離裝置60於剝離大型積層板1之界面之情形時較為有利。 The peeling device 60 provided with three servo cylinders 26, 62, 62 is advantageous when peeling the interface of the large-scale laminated board 1.

[第5形態之基板之剝離裝置70之構成] [Configuration of the substrate peeling device 70 of the fifth form]

圖12係第5形態之剝離裝置70之俯視圖。於說明剝離裝置70之構成時,對與圖4至圖7所示之剝離裝置10相同或類似之構件標附相同之符號並省略說明。 FIG. 12 is a plan view of a peeling device 70 in a fifth embodiment. When describing the structure of the peeling device 70, the same or similar components as those of the peeling device 10 shown in Figs. 4 to 7 are assigned the same reference numerals and descriptions thereof are omitted.

剝離裝置70相對於剝離裝置10之構成上之不同點在於將2台阻尼器用氣缸72、72配置於可撓性板18,其他構成相同。 The difference between the structure of the peeling device 70 and the peeling device 10 is that the two damper cylinders 72 and 72 are arranged on the flexible plate 18, and the other structures are the same.

阻尼器用氣缸72、72之各者之活塞72B、72B係與伺服氣缸26之活塞26B平行地配置,並且配置於伺服氣缸26之氣缸本體26A之兩側方。 The pistons 72B and 72B of each of the damper cylinders 72 and 72 are arranged parallel to the piston 26B of the servo cylinder 26 and are arranged on both sides of the cylinder body 26A of the servo cylinder 26.

又,活塞72B、72B分別經由軸74及軸承75而支持於本體部18A,氣缸72A、72A分別經由軸76及軸承78而支持於突出部18C。 The pistons 72B and 72B are supported by the main body portion 18A via the shaft 74 and the bearing 75, respectively, and the cylinders 72A and 72A are supported by the protruding portion 18C via the shaft 76 and the bearing 78, respectively.

[剝離裝置70之作用] [Function of the peeling device 70]

可藉由阻尼器用氣缸72、72吸收因可撓性板18之回彈作用而於剛結束剝離後產生之可撓性板18之振動(接合)。 The damper cylinders 72 and 72 can absorb the vibration (joint) of the flexible plate 18 generated immediately after the peeling due to the rebound effect of the flexible plate 18.

[第6形態之基板之剝離裝置80之構成] [Configuration of the substrate peeling device 80 of the sixth form]

圖13係第6形態之剝離裝置80之俯視圖,圖14係剝離裝置80之側 視圖。於說明剝離裝置80之構成時,對與圖4至圖7所示之剝離裝置10相同或類似之構件標附相同之符號並省略說明。 FIG. 13 is a plan view of the peeling device 80 in the sixth form, and FIG. 14 is a side view of the peeling device 80 view. In describing the structure of the peeling device 80, the same or similar components as those of the peeling device 10 shown in Figs. 4 to 7 are assigned the same reference numerals and descriptions thereof are omitted.

若使可撓性板18自角部1C朝向角部1D彎曲變形,則於可撓性板18產生之彎曲力矩向最大值增大。藉此,於可撓性板18之包含角部1C在內之角部1C之附近,與其他部分相比,曲率半徑變小。若曲率半徑變得過小,則會產生被吸附於可撓性板18之吸附面之補強板3(基板2)自可撓性板18剝離之問題。 When the flexible plate 18 is bent and deformed from the corner portion 1C toward the corner portion 1D, the bending moment generated at the flexible plate 18 increases toward the maximum value. Thereby, in the vicinity of the corner portion 1C including the corner portion 1C of the flexible plate 18, the radius of curvature becomes smaller than that of other portions. If the curvature radius becomes too small, a problem arises that the reinforcing plate 3 (substrate 2) that is adsorbed on the adsorption surface of the flexible plate 18 is peeled from the flexible plate 18.

為了消除上述問題,於剝離裝置80中,於可撓性板18之與吸附面相反的面固定有限制可撓性板18之彎曲變形量之限制構件82。該限制構件82係自可撓性板18開始彎曲變形之突出部(一端部)18B朝向突出部(另一端部)18C而設置。 In order to eliminate the above-mentioned problems, in the peeling device 80, a restricting member 82 that restricts the amount of bending deformation of the flexible plate 18 is fixed to the surface of the flexible plate 18 opposite to the suction surface. The restricting member 82 is provided from a protruding portion (one end portion) 18B that is bent and deformed from the flexible plate 18 toward the protruding portion (the other end portion) 18C.

具體而言,限制構件82係相對於連結角部1C與角部1D之線段而成對地配置於對稱位置,且沿上述線段平行地配置。又,限制構件82自突出部18B配置至本體部18A之中央位置為止。本體部18A之中央位置係剝離前線A最長之位置,且係於可撓性板18產生之彎曲力矩為最大值之位置。 Specifically, the restricting member 82 is disposed in a symmetrical position in pairs with respect to the line segment connecting the corner portion 1C and the corner portion 1D, and is disposed in parallel along the line segment. The restricting member 82 is arranged from the protruding portion 18B to the center position of the main body portion 18A. The central position of the main body portion 18A is the position where the front line A is the longest and is at the position where the bending moment generated by the flexible plate 18 is the maximum.

圖15係表示可撓性板18不彎曲之狀態下之限制構件82之構成之主要部分放大側視圖。 FIG. 15 is an enlarged side view showing a main part of the configuration of the restricting member 82 in a state where the flexible plate 18 is not bent.

限制構件82係藉由將剛性高於可撓性板之例如鋁合金製之複數個塊體84隔著特定之間隙(J)自突出部18B朝向本體部18A之中央位置配設而構成。又,特定之間隙(J)設定為與限制可撓性板18之彎曲變形量之限制量相當之間隙。 The restricting member 82 is configured by arranging a plurality of blocks 84 made of, for example, an aluminum alloy having a higher rigidity than a flexible plate, from the protruding portion 18B toward the central position of the main body portion 18A with a specific gap (J). In addition, the specific gap (J) is set to a gap corresponding to a restriction amount that restricts the amount of bending deformation of the flexible plate 18.

具體而言,將塊體84之高度(H)設為4mm,將長度(L)設為10mm。而且,將可撓性板18之彎曲變形量之限制值規定為可撓性板18之最小曲率半徑(R),於將該最小曲率半徑(R)設為1000mm之情形時,特定之間隙(J)為0.04mm。 Specifically, the height (H) of the block 84 is 4 mm, and the length (L) is 10 mm. In addition, the limit value of the bending deformation amount of the flexible plate 18 is defined as the minimum radius of curvature (R) of the flexible plate 18, and when the minimum radius of curvature (R) is set to 1000 mm, a specific gap ( J) is 0.04 mm.

圖16係可撓性板18經彎曲變形之剝離裝置80之側視圖,圖17係表示可撓性板18彎曲至最小曲率半徑(R=1000mm)時塊體84與塊體84之間隙(J)消失而使塊體84彼此抵接之狀態之說明圖。 FIG. 16 is a side view of the peeling device 80 of the flexible plate 18 undergoing bending deformation, and FIG. 17 is a diagram showing the gap between the block 84 and the block 84 when the flexible plate 18 is bent to the minimum radius of curvature (R = 1000 mm) (J ) Is an explanatory view of a state where the blocks 84 are brought into contact with each other by disappearing.

如圖16般,隨著可撓性板18自突出部18B朝向本體部18A之中央部彎曲變形,即隨著可撓性板18之曲率半徑變小,塊體84與塊體84之間之間隙(J)變小。而且,於可撓性板18彎曲至最小曲率半徑(R=1000mm)時,如圖17般,塊體84與塊體84之間隙(J)消失,塊體84彼此抵接,限制構件82成為剛體,因此可限制可撓性板18之彎曲變形量。 As shown in FIG. 16, as the flexible plate 18 bends and deforms from the protruding portion 18B toward the central portion of the main body portion 18A, that is, as the radius of curvature of the flexible plate 18 becomes smaller, the distance between the block 84 and the block 84 becomes smaller. The gap (J) becomes smaller. When the flexible plate 18 is bent to the minimum radius of curvature (R = 1000 mm), as shown in FIG. 17, the gap (J) between the block 84 and the block 84 disappears, the blocks 84 abut against each other, and the restricting member 82 becomes The rigid body can limit the amount of bending deformation of the flexible plate 18.

藉此,可消除被吸附於可撓性板18之吸附面之補強板3(基板2)自可撓性板18剝離之問題。 Thereby, the problem that the reinforcing plate 3 (substrate 2) which is adsorbed on the adsorption surface of the flexible plate 18 is peeled from the flexible plate 18 can be eliminated.

以上,對本發明之較佳形態進行了說明,但本發明並不限制於上述形態。可於不脫離本發明之範圍之情況下,於上述形態中添加各種變形及替換。 As mentioned above, although the preferable aspect of this invention was described, this invention is not limited to the said aspect. Various modifications and substitutions can be added to the above-mentioned forms without departing from the scope of the present invention.

本申請案係基於2013年1月25日提出申請之日本專利申請案2013-012415、及2013年11月11日提出申請之日本專利申請案2013-232957者,其等之內容以參照之形式被引入本文中。 This application is based on Japanese Patent Application 2013-012415 filed on January 25, 2013, and Japanese Patent Application 2013-232957 filed on November 11, 2013, and the contents thereof are incorporated by reference. Introduced in this article.

Claims (10)

一種基板之剝離裝置,其係將基板與補強上述基板之補強板之界面藉由使上述基板及上述補強板中之至少一者彎曲變形而沿自一端側朝向另一端側之剝離方向依序剝離,包括剝離器件,該剝離器件包含:可撓性板,其吸附保持上述基板或上述補強板;及驅動器件,其藉由對上述可撓性板賦予與上述界面平行之方向之力而使上述一者與上述可撓性板一起彎曲變形,於上述可撓性板之與吸附面相反的面設有限制上述可撓性板之彎曲變形量之限制構件,且上述限制構件係自上述可撓性板開始彎曲變形之上述可撓性板之一端部朝向另一端部而設置。A peeling device for a substrate is a device for sequentially peeling an interface between a substrate and a reinforcing plate for reinforcing the substrate by bending and deforming at least one of the substrate and the reinforcing plate in a peeling direction from one end side to the other end side. And includes a peeling device including: a flexible plate that adsorbs and holds the substrate or the reinforcing plate; and a driving device that applies a force in a direction parallel to the interface to the flexible plate to make the above One is bent and deformed together with the flexible plate, and a restricting member for restricting the amount of bending deformation of the flexible plate is provided on the surface of the flexible plate opposite to the adsorption surface, and the restricting member is from the flexible plate. One end portion of the flexible plate that starts to bend and deform is provided toward the other end portion. 如請求項1之基板之剝離裝置,其中上述剝離器件包含:支持器件,其支持包含上述基板及上述補強板之積層體之第1主面;上述可撓性板,其吸附保持上述積層體之第2主面;及上述驅動器件,其藉由對上述可撓性板之與吸附面相反的一側之位置且與上述可撓性板之吸附面沿上述界面之方向分開之位置賦予與上述界面平行之方向之力,而使上述一者與上述可撓性板一起彎曲變形。For example, the peeling device of the substrate of claim 1, wherein the peeling device includes: a supporting device that supports the first main surface of the laminated body including the substrate and the reinforcing plate; and the flexible plate that adsorbs and holds the laminated body. A second main surface; and the driving device, which is provided to the above-mentioned flexible plate by a position on the side opposite to the adsorption surface of the flexible plate and a position separated from the adsorption surface of the flexible plate in the direction of the interface. The force in the direction parallel to the interface causes the aforementioned one to deform together with the flexible plate. 如請求項1或2之基板之剝離裝置,其中上述基板係厚度為0.2mm以下之玻璃基板。For example, the substrate peeling device of claim 1 or 2, wherein the substrate is a glass substrate having a thickness of 0.2 mm or less. 如請求項1或2之基板之剝離裝置,其中上述限制構件係藉由將剛性高於上述可撓性板之複數個塊體隔著特定之間隙沿著自上述一端部朝向上述另一端部的方向配設而構成,上述特定之間隙係設定為與限制上述彎曲變形量之限制量相當之間隙。For example, the peeling device of the substrate of claim 1 or 2, wherein the restricting member is formed by moving a plurality of blocks having higher rigidity than the flexible board from the one end toward the other end through a specific gap. It is configured by arranging directions, and the specific gap is set to a gap corresponding to a restriction amount that restricts the bending deformation amount. 一種基板之剝離方法,其係將基板與補強上述基板之補強板之界面藉由使上述基板及上述補強板中之至少一者彎曲變形而沿自一端側朝向另一端側之剝離方向依序剝離,包括剝離步驟,該剝離步驟係藉由可撓性板吸附保持上述基板或上述補強板,藉由對上述可撓性板賦予與上述界面平行之方向之力而使上述一者與上述可撓性板一起彎曲變形,從而剝離上述界面,且上述可撓性板係藉由設於上述可撓性板之與吸附面相反的面之限制構件限制彎曲變形量而進行彎曲變形,其中上述限制構件係自上述可撓性板開始彎曲變形之上述可撓性板之一端部朝向另一端部而設置。A method for peeling a substrate, in which the interface between the substrate and a reinforcing plate that reinforces the substrate is sequentially deformed by bending and deforming at least one of the substrate and the reinforcing plate in a peeling direction from one end side to the other end side. It includes a peeling step. The peeling step is to hold and hold the substrate or the reinforcing plate by a flexible plate, and apply a force in a direction parallel to the interface to the flexible plate to make the one and the flexible plate. The flexible plate is bent and deformed together to peel off the interface, and the flexible plate is bent and deformed by a restricting member provided on a surface of the flexible plate opposite to the adsorption surface to restrict the amount of bending deformation, wherein the restricting member One end portion of the flexible plate that is bent and deformed from the flexible plate is provided toward the other end portion. 如請求項5之基板之剝離方法,其中上述剝離步驟包括如下步驟:藉由支持器件支持包含上述基板及上述補強板之積層體之第1主面,並且藉由上述可撓性板吸附保持上述積層體之第2主面;及藉由利用驅動器件對上述可撓性板之與吸附面相反的一側之位置且與上述可撓性板之吸附面沿上述界面之方向分開之位置賦予與上述界面平行之方向之力,而使上述一者與上述可撓性板一起彎曲變形,從而剝離上述界面。For example, the method for stripping a substrate according to claim 5, wherein the stripping step includes the following steps: supporting the first main surface of the laminated body including the substrate and the reinforcing plate by a supporting device, and holding the above by the flexible plate adsorption. The second main surface of the laminated body; and a position of the flexible plate opposite to the adsorption surface and a position separated from the adsorption surface of the flexible plate along the interface by using a driving device. The force in the direction parallel to the interface causes the one of the interface and the flexible plate to bend and deform together, thereby peeling the interface. 如請求項5或6之基板之剝離方法,其中上述基板係厚度為0.2mm以下之玻璃基板。The method for peeling a substrate according to claim 5 or 6, wherein the substrate is a glass substrate having a thickness of 0.2 mm or less. 一種電子元件之製造方法,其包括:功能層形成步驟,其於由補強板補強之基板之正面形成功能層;及剝離步驟,其藉由使形成有上述功能層之上述基板及上述補強板中之至少一者彎曲變形,而沿自一端側朝向另一端側之剝離方向依序剝離上述基板與上述補強板之界面;上述剝離步驟為如下步驟:藉由可撓性板吸附保持上述基板或上述補強板,藉由對上述可撓性板賦予與上述界面平行之方向之力而使上述一者與上述可撓性板一起彎曲變形,從而剝離上述界面,且上述可撓性板係藉由設於上述可撓性板之與吸附面相反的面之限制構件限制彎曲變形量而進行彎曲變形,其中上述限制構件係自上述可撓性板開始彎曲變形之上述可撓性板之一端部朝向另一端部而設置。An electronic component manufacturing method includes: a functional layer forming step of forming a functional layer on a front surface of a substrate reinforced by a reinforcing plate; and a peeling step by using the substrate and the reinforcing plate on which the functional layer is formed. At least one of them is bent and deformed, and the interface between the substrate and the reinforcing plate is sequentially peeled along a peeling direction from one end side to the other end side; the peeling step is as follows: the substrate or the substrate is held by a flexible plate adsorption The reinforcing plate is configured to bend and deform together with the flexible plate by applying a force in a direction parallel to the interface to the flexible plate, thereby peeling off the interface, and the flexible plate is provided by The restricting member on the surface of the flexible plate opposite to the suction surface restricts the amount of bending deformation to perform the bending deformation, wherein the restricting member is one end of the flexible plate that is bent and deformed from the flexible plate toward the other. It is provided at one end. 如請求項8之電子元件之製造方法,其中上述剝離步驟包括如下步驟:藉由支持器件支持包含上述基板及上述補強板之積層體之第1主面,並且藉由上述可撓性板吸附保持上述積層體之第2主面;及藉由利用驅動器件對上述可撓性板之與吸附面相反的一側之位置且與上述可撓性板之吸附面沿上述界面之方向分開之位置賦予與上述界面平行之方向之力,而使上述一者與上述可撓性板一起彎曲變形,從而剝離上述界面。For example, the method for manufacturing an electronic component according to claim 8, wherein the stripping step includes the following steps: supporting the first main surface of the laminated body including the substrate and the reinforcing plate by a supporting device, and holding and holding the flexible plate by adsorption; A second main surface of the laminated body; and a position at a side of the flexible plate opposite to the suction surface and separated from the suction surface of the flexible plate in a direction of the interface by using a driving device A force in a direction parallel to the interface causes the aforementioned one to bend and deform together with the flexible plate, thereby peeling the interface. 如請求項8或9之電子元件之製造方法,其中上述基板係厚度為0.2mm以下之玻璃基板。The method for manufacturing an electronic component according to claim 8 or 9, wherein the substrate is a glass substrate having a thickness of 0.2 mm or less.
TW103102806A 2013-01-25 2014-01-24 Peeling device and method of substrate, and manufacturing method of electronic component TWI622543B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013012415 2013-01-25
JP2013232957A JP6252118B2 (en) 2013-01-25 2013-11-11 Substrate peeling apparatus and peeling method, and electronic device manufacturing method

Publications (2)

Publication Number Publication Date
TW201441137A TW201441137A (en) 2014-11-01
TWI622543B true TWI622543B (en) 2018-05-01

Family

ID=51611380

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103102806A TWI622543B (en) 2013-01-25 2014-01-24 Peeling device and method of substrate, and manufacturing method of electronic component

Country Status (3)

Country Link
JP (1) JP6252118B2 (en)
KR (1) KR102100160B1 (en)
TW (1) TWI622543B (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6375554B2 (en) * 2014-11-12 2018-08-22 Agc株式会社 Substrate peeling apparatus and peeling method
WO2016081391A1 (en) * 2014-11-19 2016-05-26 Corning Incorporated Apparatus and method of peeling a multi-layer substrate
CN105742224A (en) * 2014-12-11 2016-07-06 南京瀚宇彩欣科技有限责任公司 Substrate absorption apparatus
CN105856798B (en) * 2015-02-10 2019-11-08 Agc株式会社 The stripping off device and stripping means of laminated body and the manufacturing method of electronic device
JP6548006B2 (en) 2015-02-10 2019-07-24 Agc株式会社 Peeling device for laminate, peeling method, and method of manufacturing electronic device
JPWO2017065155A1 (en) 2015-10-16 2018-08-02 旭硝子株式会社 Laminate peeling apparatus, peeling method, and electronic device manufacturing method

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004142878A (en) * 2002-10-24 2004-05-20 Toray Ind Inc Peeling method of flexible film, peeling device and circuit substrate
JP2004219551A (en) * 2003-01-10 2004-08-05 Nec Corp Flexible electronic device and method of manufacturing the same
JP2004265913A (en) * 2003-02-04 2004-09-24 Toray Ind Inc Circuit board member and method of manufacturing circuit board
TW201144199A (en) * 2010-03-03 2011-12-16 Beac Co Ltd Plastic film peeling apparatus
TW201302970A (en) * 2011-04-28 2013-01-16 Kaneka Corp Flexible print board integrated with reinforcing plate

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61197056U (en) * 1985-05-30 1986-12-09
JP2007174887A (en) * 2005-11-24 2007-07-05 Daiwa Kasei Ind Co Ltd Fastener
JP2010130760A (en) * 2008-11-26 2010-06-10 Yazaki Corp Cable routing structure for wire harnesses
WO2011024689A1 (en) * 2009-08-31 2011-03-03 旭硝子株式会社 Peeling device

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004142878A (en) * 2002-10-24 2004-05-20 Toray Ind Inc Peeling method of flexible film, peeling device and circuit substrate
JP2004219551A (en) * 2003-01-10 2004-08-05 Nec Corp Flexible electronic device and method of manufacturing the same
JP2004265913A (en) * 2003-02-04 2004-09-24 Toray Ind Inc Circuit board member and method of manufacturing circuit board
TW201144199A (en) * 2010-03-03 2011-12-16 Beac Co Ltd Plastic film peeling apparatus
TW201302970A (en) * 2011-04-28 2013-01-16 Kaneka Corp Flexible print board integrated with reinforcing plate

Also Published As

Publication number Publication date
TW201441137A (en) 2014-11-01
KR20140095995A (en) 2014-08-04
JP6252118B2 (en) 2017-12-27
KR102100160B1 (en) 2020-04-13
JP2014159337A (en) 2014-09-04

Similar Documents

Publication Publication Date Title
TWI622543B (en) Peeling device and method of substrate, and manufacturing method of electronic component
TWI602703B (en) Substrate stripping apparatus and stripping method, and electronic device manufacturing method
TWI580566B (en) A manufacturing method of an electronic device, and a method for manufacturing a glass laminate
KR101538835B1 (en) Method for manufacturing laminate, and laminate
CN103972133A (en) Peeling device and peeling method of substrate, and manufacturing method of electronic device
KR102535656B1 (en) Peeling apparatus and peeling method for laminate, and manufacturing method of electronic device
US20170266943A1 (en) Substrate suction device, substrate bonding device, substrate bonding method, and electronic device manufacturing method
TWI601682B (en) Substrate stripping apparatus and stripping method, and electronic device manufacturing method
JP2016147758A (en) Peeling device and peeling method for laminate, and manufacturing method of electronic device
KR102406894B1 (en) Peeling apparatus and peeling method for laminate, and manufacturing method of electronic device
JP6471606B2 (en) Laminate peeling apparatus, peeling method, and electronic device manufacturing method
TWI822930B (en) Manufacturing method and manufacturing device of glass film and manufacturing method of electronic components including glass film
US20200105569A1 (en) Methods for processing a substrate
JP6468462B2 (en) Laminate peeling apparatus, peeling method, and electronic device manufacturing method
KR102471564B1 (en) Peeling apparatus and peeling method for laminate, and manufacturing method of electronic device
CN105856798B (en) The stripping off device and stripping means of laminated body and the manufacturing method of electronic device