TWI621719B - Metal mask material and metal mask - Google Patents
Metal mask material and metal mask Download PDFInfo
- Publication number
- TWI621719B TWI621719B TW105131996A TW105131996A TWI621719B TW I621719 B TWI621719 B TW I621719B TW 105131996 A TW105131996 A TW 105131996A TW 105131996 A TW105131996 A TW 105131996A TW I621719 B TWI621719 B TW I621719B
- Authority
- TW
- Taiwan
- Prior art keywords
- metal mask
- rolling
- metal
- mask material
- jis
- Prior art date
Links
- 239000002184 metal Substances 0.000 title claims abstract description 91
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 91
- 239000000463 material Substances 0.000 title claims abstract description 59
- 238000005096 rolling process Methods 0.000 claims abstract description 45
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 11
- 239000000956 alloy Substances 0.000 claims abstract description 11
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 claims abstract description 8
- 239000012535 impurity Substances 0.000 claims abstract description 3
- 230000007547 defect Effects 0.000 abstract description 28
- 238000005530 etching Methods 0.000 abstract description 18
- 238000012545 processing Methods 0.000 abstract description 9
- 238000000137 annealing Methods 0.000 description 30
- 239000013078 crystal Substances 0.000 description 24
- 238000005097 cold rolling Methods 0.000 description 23
- 238000001953 recrystallisation Methods 0.000 description 23
- 238000000034 method Methods 0.000 description 20
- 239000000758 substrate Substances 0.000 description 12
- HYHSBSXUHZOYLX-WDSKDSINSA-N S-nitrosoglutathione Chemical compound OC(=O)[C@@H](N)CCC(=O)N[C@@H](CSN=O)C(=O)NCC(O)=O HYHSBSXUHZOYLX-WDSKDSINSA-N 0.000 description 11
- 239000003921 oil Substances 0.000 description 11
- 238000004519 manufacturing process Methods 0.000 description 10
- 238000005259 measurement Methods 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 8
- 230000003746 surface roughness Effects 0.000 description 8
- 239000011368 organic material Substances 0.000 description 7
- 230000002829 reductive effect Effects 0.000 description 6
- 238000007740 vapor deposition Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 239000011888 foil Substances 0.000 description 5
- 239000010731 rolling oil Substances 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- 239000003086 colorant Substances 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 4
- 230000000873 masking effect Effects 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 238000000059 patterning Methods 0.000 description 4
- 238000011179 visual inspection Methods 0.000 description 4
- 230000002950 deficient Effects 0.000 description 3
- 238000010790 dilution Methods 0.000 description 3
- 239000012895 dilution Substances 0.000 description 3
- 238000002845 discoloration Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 238000000879 optical micrograph Methods 0.000 description 3
- 238000007639 printing Methods 0.000 description 3
- 229920000742 Cotton Polymers 0.000 description 2
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 2
- 230000002159 abnormal effect Effects 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 230000003014 reinforcing effect Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 208000032544 Cicatrix Diseases 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000004049 embossing Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000005098 hot rolling Methods 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 231100000241 scar Toxicity 0.000 description 1
- 230000037387 scars Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 230000003313 weakening effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
- C23C14/044—Coating on selected surface areas, e.g. using masks using masks using masks to redistribute rather than totally prevent coating, e.g. producing thickness gradient
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/10—Ferrous alloys, e.g. steel alloys containing cobalt
- C22C38/105—Ferrous alloys, e.g. steel alloys containing cobalt containing Co and Ni
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Metal Rolling (AREA)
- Electroluminescent Light Sources (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015216849A JP6177299B2 (ja) | 2015-11-04 | 2015-11-04 | メタルマスク材料及びメタルマスク |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201718904A TW201718904A (zh) | 2017-06-01 |
| TWI621719B true TWI621719B (zh) | 2018-04-21 |
Family
ID=58740561
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW105131996A TWI621719B (zh) | 2015-11-04 | 2016-10-04 | Metal mask material and metal mask |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP6177299B2 (ja) |
| KR (1) | KR101879052B1 (ja) |
| CN (1) | CN106917063B (ja) |
| TW (1) | TWI621719B (ja) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7156279B2 (ja) * | 2017-06-20 | 2022-10-19 | 日立金属株式会社 | メタルマスク用薄板の製造方法及びメタルマスク用薄板 |
| KR102300029B1 (ko) * | 2017-07-27 | 2021-09-09 | 삼성디스플레이 주식회사 | 마스크 프레임 조립체와 이의 제조 방법 및 표시 장치의 제조 방법 |
| KR102358039B1 (ko) * | 2017-09-07 | 2022-02-04 | 엘지이노텍 주식회사 | Oled 화소 증착을 위한 금속재의 증착용 마스크 |
| KR102591494B1 (ko) * | 2017-11-14 | 2023-10-20 | 다이니폰 인사츠 가부시키가이샤 | 증착 마스크를 제조하기 위한 금속판, 금속판의 검사 방법, 금속판의 제조 방법, 증착 마스크, 증착 마스크 장치 및 증착 마스크의 제조 방법 |
| US12037673B2 (en) | 2018-09-27 | 2024-07-16 | Nippon Steel Chemical & Material Co., Ltd. | Metal mask material, method for manufacturing same, and metal mask |
| KR102371177B1 (ko) * | 2020-04-27 | 2022-03-08 | 주식회사 오럼머티리얼 | 마스크 금속막, 마스크 금속막 지지 템플릿 및 프레임 일체형 마스크 |
| CN113540385A (zh) * | 2020-04-22 | 2021-10-22 | 悟勞茂材料公司 | 掩模金属膜、掩模金属膜支撑模板、掩模支撑模板及其制造方法 |
| CN117337342A (zh) | 2021-05-17 | 2024-01-02 | 日铁化学材料株式会社 | 铁类合金箔及其制造方法、以及使用其的部件 |
| TWI772066B (zh) * | 2021-06-16 | 2022-07-21 | 達運精密工業股份有限公司 | 金屬遮罩基材的製備方法 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003221651A (ja) * | 2001-11-20 | 2003-08-08 | Nippon Mining & Metals Co Ltd | シャドウマスク用Ｆｅ−Ｎｉ系およびＦｅ−Ｎｉ−Ｃｏ系合金条 |
| JP2010214447A (ja) * | 2009-03-18 | 2010-09-30 | Hitachi Metals Ltd | エッチング加工用素材の製造方法及びエッチング加工用素材 |
| CN103429388A (zh) * | 2011-03-28 | 2013-12-04 | Jx日矿日石金属株式会社 | Co-Si系铜合金板 |
| JP2014101543A (ja) * | 2012-11-20 | 2014-06-05 | Jx Nippon Mining & Metals Corp | メタルマスク材料及びメタルマスク |
| WO2015030209A1 (ja) * | 2013-08-29 | 2015-03-05 | Jx日鉱日石金属株式会社 | 表面処理金属材、キャリア付金属箔、コネクタ、端子、積層体、シールドテープ、シールド材、プリント配線板、金属加工部材、電子機器、及び、プリント配線板の製造方法 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1050478A (ja) | 1996-04-19 | 1998-02-20 | Toray Ind Inc | 有機電界発光素子およびその製造方法 |
| JP3545684B2 (ja) * | 2000-07-17 | 2004-07-21 | 日鉱金属加工株式会社 | エッチング穿孔性に優れたＦｅ−Ｎｉ系合金シャドウマスク用素材 |
| KR100632861B1 (ko) * | 2002-05-13 | 2006-10-13 | 미쓰이 긴조꾸 고교 가부시키가이샤 | 칩온 필름용 플렉시블 프린트배선판 |
| JP4126648B2 (ja) | 2002-07-01 | 2008-07-30 | 日立金属株式会社 | メタルマスク用部材の製造方法 |
| JP2004039628A (ja) | 2003-06-04 | 2004-02-05 | Hitachi Metals Ltd | メタルマスク |
| WO2006014281A2 (en) * | 2004-07-02 | 2006-02-09 | A. Schulman Invision Inc. | Co-extruded mask layer |
| WO2011152178A1 (ja) * | 2010-05-31 | 2011-12-08 | 東洋紡績株式会社 | フレキシブル金属張積層体 |
| CN103209838B (zh) * | 2010-11-18 | 2016-08-17 | 3M创新有限公司 | 将图像施加到表面的方法及其使用的套件 |
| JP5758254B2 (ja) * | 2011-09-27 | 2015-08-05 | Jx日鉱日石金属株式会社 | 圧延銅箔 |
| ES2639493T3 (es) * | 2011-11-04 | 2017-10-26 | Jx Nippon Mining & Metals Corporation | Lámina de cobre para producción de grafeno y procedimiento de producción de la misma, y procedimiento de producción de grafeno |
| WO2014073694A1 (ja) * | 2012-11-09 | 2014-05-15 | Jx日鉱日石金属株式会社 | 表面処理銅箔及びそれを用いた積層板、銅張積層板、プリント配線板並びに電子機器 |
-
2015
- 2015-11-04 JP JP2015216849A patent/JP6177299B2/ja active Active
-
2016
- 2016-10-04 TW TW105131996A patent/TWI621719B/zh active
- 2016-10-25 KR KR1020160139018A patent/KR101879052B1/ko active IP Right Grant
- 2016-11-04 CN CN201610963957.5A patent/CN106917063B/zh active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003221651A (ja) * | 2001-11-20 | 2003-08-08 | Nippon Mining & Metals Co Ltd | シャドウマスク用Ｆｅ−Ｎｉ系およびＦｅ−Ｎｉ−Ｃｏ系合金条 |
| JP2010214447A (ja) * | 2009-03-18 | 2010-09-30 | Hitachi Metals Ltd | エッチング加工用素材の製造方法及びエッチング加工用素材 |
| CN103429388A (zh) * | 2011-03-28 | 2013-12-04 | Jx日矿日石金属株式会社 | Co-Si系铜合金板 |
| JP2014101543A (ja) * | 2012-11-20 | 2014-06-05 | Jx Nippon Mining & Metals Corp | メタルマスク材料及びメタルマスク |
| WO2015030209A1 (ja) * | 2013-08-29 | 2015-03-05 | Jx日鉱日石金属株式会社 | 表面処理金属材、キャリア付金属箔、コネクタ、端子、積層体、シールドテープ、シールド材、プリント配線板、金属加工部材、電子機器、及び、プリント配線板の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP6177299B2 (ja) | 2017-08-09 |
| KR101879052B1 (ko) | 2018-07-16 |
| CN106917063A (zh) | 2017-07-04 |
| KR20170052472A (ko) | 2017-05-12 |
| TW201718904A (zh) | 2017-06-01 |
| CN106917063B (zh) | 2019-04-02 |
| JP2017088915A (ja) | 2017-05-25 |
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