TWI617646B - Method for production antistatic surface protection film, and antistatic surface protection film - Google Patents

Method for production antistatic surface protection film, and antistatic surface protection film Download PDF

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TWI617646B
TWI617646B TW105140212A TW105140212A TWI617646B TW I617646 B TWI617646 B TW I617646B TW 105140212 A TW105140212 A TW 105140212A TW 105140212 A TW105140212 A TW 105140212A TW I617646 B TWI617646 B TW I617646B
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film
antistatic
adhesive layer
surface protection
release
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TW201716532A (en
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小林弘幸
春日充
遠藤佳子
林益史
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藤森工業股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/06Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04Interconnection of layers
    • B32B7/06Interconnection of layers permitting easy separation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04Interconnection of layers
    • B32B7/12Interconnection of layers using interposed adhesives or interposed materials with bonding properties
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04Homopolymers or copolymers of esters
    • C09J133/06Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/20Properties of the layers or laminate having particular electrical or magnetic properties, e.g. piezoelectric
    • B32B2307/21Anti-static
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/40Properties of the layers or laminate having particular optical properties
    • B32B2307/412Transparent

Abstract

本發明提供一種對被黏附體的污染少並且無經時劣化,具有優良的抗剝離靜電性能的防靜電表面保護膜的製造方法以及防靜電表面保護膜。一種防靜電表面保護膜的製造方法,是在由具有透明性的樹脂構成的基材膜(1)的單面上形成黏接劑層(2)後,將在樹脂膜(3)的單面上層疊含有防靜電劑的剝離劑層(4)而成的剝離膜(5),藉由該剝離劑層(4)貼合於該黏接劑層(2)的表面上的防靜電表面保護膜(10)的製造方法,其中,剝離劑層(4)是藉由含有以二甲基聚矽氧烷作為主要成分的剝離劑、20℃下是液體的聚矽氧烷類化合物以及防靜電劑的樹脂組成物來形成。 The invention provides a method for manufacturing an antistatic surface protection film with less pollution to an adherend and no deterioration with time, and has excellent anti-peeling electrostatic performance, and an antistatic surface protection film. A method for manufacturing an antistatic surface protective film is to form an adhesive layer (2) on one side of a base film (1) made of a transparent resin, and then place the adhesive film on one side of the resin film (3). A release film (5) formed by laminating a release agent layer (4) containing an antistatic agent, and an antistatic surface protection bonded to the surface of the adhesive layer (2) by the release agent layer (4) A method for producing a film (10), wherein the release agent layer (4) comprises a release agent containing dimethylpolysiloxane as a main component, a polysiloxane compound that is liquid at 20 ° C, and antistatic Agent resin composition.

Description

防靜電表面保護膜之製造方法及防靜電表面保護膜 Method for manufacturing antistatic surface protective film and antistatic surface protective film

本發明涉及一種貼合於偏光板、相位差板、顯示器用透鏡膜等光學構件(下面,有時也稱“光學用膜”)的表面上的防靜電表面保護膜的製造方法以及防靜電表面保護膜。更詳細而言,本發明提供一種對被黏附體的污染少、無經時劣化且具有優良的抗剝離靜電性能的防靜電表面保護膜的製造方法、以及防靜電表面保護膜。 The present invention relates to a method for producing an antistatic surface protective film and an antistatic surface bonded to the surface of an optical member (hereinafter, sometimes referred to as an "optical film") such as a polarizing plate, a retardation plate, and a lens film for a display Protective film. More specifically, the present invention provides a method for producing an antistatic surface protective film with less pollution to an adherend, no deterioration with time, and excellent anti-peeling electrostatic performance, and an antistatic surface protective film.

目前,當製造、搬運偏光板、相位差板、顯示器用透鏡膜、防反射膜、硬塗膜、觸控面板用透明導電膜等的光學用膜、以及使用了它們的顯示器等光學產品時,藉由在該光學用膜的表面貼合表面保護膜而防止後續步驟中的表面污染、刮傷。為了節省對表面保護膜進行剝離後再進行貼合的勞力和時間從而提高作業效率,對作為產品的光學用膜的外觀檢查而言,有時也在光學用膜上貼合著表面保護膜的狀態下直接實施。 Currently, when manufacturing and transporting optical films such as polarizing plates, retardation plates, lens films for displays, anti-reflection films, hard coating films, transparent conductive films for touch panels, and optical products such as displays, The surface protection film is attached to the surface of the optical film to prevent surface contamination and scratches in subsequent steps. In order to save the labor and time of laminating the surface protective film and then attaching it to improve work efficiency, the appearance inspection of the optical film as a product may sometimes include a surface protective film laminated on the optical film. It is implemented directly in the state.

以往以來,為了在光學產品的製造步驟中防止傷痕和污垢 的附著,通常使用在基材膜的單面設置了黏接劑層的表面保護膜。表面保護膜是介隔微黏接力的黏接劑層被貼合於光學用膜上。將黏接劑層設定為微黏接力的原因在於,為了將使用完畢的表面保護膜從光學用膜表面剝離而去除時,能夠容易地進行剝離,並且為了防止黏接劑附著並殘留在作為被黏附體的產品的光學用膜上(所謂的防止黏接劑殘留的發生)的現象。 In the past, in order to prevent scratches and dirt during the manufacturing process of optical products For adhesion, a surface protection film having an adhesive layer provided on one side of a base film is generally used. The surface protective film is an adhesive layer that is bonded to the optical film with a slight adhesive force. The reason why the adhesive layer is set to have a microadhesive force is that when the used surface protective film is removed from the surface of the optical film and removed, it can be easily peeled off, and to prevent the adhesive from adhering and remaining on the substrate. Phenomenon on the optical film of the product of the adherend (so-called prevention of occurrence of adhesive residue).

近年來,在液晶顯示面板的生產步驟中,由於將貼合於光學用膜上的表面保護膜剝離而去除時產生的剝離靜電壓,會破壞用於控制液晶顯示面板的顯示畫面的驅動IC等電路構件,還有液晶分子的取向會損傷,雖然這些現象發生的件數少但也在發生。 In recent years, in the production process of a liquid crystal display panel, a peeling static voltage generated when a surface protective film attached to an optical film is peeled off and removed, destroying a driver IC or the like for controlling a display screen of a liquid crystal display panel. Circuit components and the orientation of liquid crystal molecules are damaged. Although these phenomena occur in a small number, they also occur.

另外,為了減少液晶顯示面板的電耗,液晶材料的驅動電壓趨於降低,隨之驅動IC的擊穿電壓也趨於降低。最近,要求將剝離靜電壓控制在+0.7kV~-0.7kV的範圍內。 In addition, in order to reduce the power consumption of the liquid crystal display panel, the driving voltage of the liquid crystal material tends to decrease, and the breakdown voltage of the driving IC also tends to decrease. Recently, it has been required to control the peeling static voltage within a range of +0.7 kV to -0.7 kV.

因此,為了防止從作為被黏附體的光學用膜上剝離表面保護膜時因剝離靜電壓高所引起的缺陷,有人提出了一種表面保護膜,其使用了含有用於降低剝離靜電壓的防靜電劑的黏接劑層。 Therefore, in order to prevent defects caused by a high peeling static voltage when the surface protective film is peeled from an optical film as an adherend, a surface protective film has been proposed which uses an antistatic agent to reduce the peeling static voltage. Adhesive layer.

例如,在專利文獻1中,公開了一種使用由烷基三甲基銨鹽、含羥基的丙烯酸類聚合物、聚異氰酸酯組成的黏接劑的表面保護膜。 For example, Patent Document 1 discloses a surface protection film using an adhesive composed of an alkyltrimethylammonium salt, a hydroxyl-containing acrylic polymer, and a polyisocyanate.

另外,在專利文獻2中,公開了一種由離子性液體和酸值為1.0以下的丙烯酸聚合物組成的黏接劑組成物、以及使用了該組成物的黏接片類。 In addition, Patent Document 2 discloses an adhesive composition composed of an ionic liquid and an acrylic polymer having an acid value of 1.0 or less, and an adhesive sheet using the composition.

另外,在專利文獻3中,公開了一種由丙烯酸聚合物、聚 醚多元醇化合物、藉由陰離子吸附性化合物處理過的鹼金屬鹽組成的黏接劑組成物、以及使用了該組成物的表面保護膜。 In addition, Patent Document 3 discloses an acrylic polymer, a polymer An ether polyol compound, an adhesive composition composed of an alkali metal salt treated with an anion-adsorbing compound, and a surface protective film using the composition.

另外,在專利文獻4中,公開了一種由離子性液體、鹼金屬鹽、玻璃化轉變溫度為0℃以下的聚合物組成的黏接劑組成物、以及使用了該組成物的表面保護膜。 In addition, Patent Document 4 discloses an adhesive composition composed of an ionic liquid, an alkali metal salt, and a polymer having a glass transition temperature of 0 ° C. or lower, and a surface protective film using the composition.

另外,在專利文獻5、6中,公開了在表面保護膜的黏接劑層中混合聚醚改性聚矽氧烷的技術內容。 In addition, Patent Documents 5 and 6 disclose the technical content of mixing a polyether-modified polysiloxane with an adhesive layer of a surface protective film.

【先前技術文獻】 [Previous Technical Literature]

【專利文獻】 [Patent Literature]

【專利文獻1】:日本特開2005-131957號公報 [Patent Document 1]: Japanese Patent Laid-Open No. 2005-131957

【專利文獻2】:日本特開2005-330464號公報 [Patent Document 2]: Japanese Patent Laid-Open No. 2005-330464

【專利文獻3】:日本特開2005-314476號公報 [Patent Document 3]: Japanese Patent Laid-Open No. 2005-314476

【專利文獻4】:日本特開2006-152235號公報 [Patent Document 4]: Japanese Patent Laid-Open No. 2006-152235

【專利文獻5】:日本特開2009-275128號公報 [Patent Document 5]: Japanese Patent Laid-Open No. 2009-275128

【專利文獻6】:日本專利第4537450號公報 [Patent Document 6]: Japanese Patent No. 4537450

上述專利文獻1~4中,在黏接劑層內部添加有防靜電劑,但黏接劑層的厚度越厚,並且隨著時間的推移,防靜電劑從黏接劑層向表面保護膜所貼合的被黏附體移動的量會越多。另外,在LR(Low Reflective)偏光板、AG(Anti Glare)-LR偏光板等的光學用膜中,由於採用聚矽氧烷化合物或氟化物等對光學用膜表面施加了防污染處理,因此,當從作 為被黏附體的光學用膜上剝離該光學用膜所使用的表面保護膜時,剝離靜電壓變高。 In the above Patent Documents 1 to 4, an antistatic agent is added inside the adhesive layer, but the thicker the thickness of the adhesive layer, the antistatic agent moves from the adhesive layer to the surface protective film over time. The more the attached adherend moves, the more it will move. In addition, in optical films such as LR (Low Reflective) polarizers and AG (Anti Glare) -LR polarizers, anti-fouling treatment is applied to the surface of the optical film by using a polysiloxane compound or fluoride. , When from When the surface protective film used for the optical film is peeled from the optical film to be an adherend, the peeling static voltage becomes high.

另外,如專利文獻5、6該,當在黏接劑層中混合了聚醚改性聚矽氧烷時,難以對表面保護膜的黏接力進行微調。另外,由於在黏接劑層內混合有聚醚改性聚矽氧烷,因此,當在基材膜上塗布、乾燥黏接劑組成物的條件發生變化時,表面保護膜上形成的黏接劑層表面的特性微妙地發生變化。並且,從保護光學用膜表面的觀點出發,無法使黏接劑層的厚度設定為極薄。因此,根據黏接劑層的厚度,需要增加黏接劑層內混合的聚醚改性聚矽氧烷的添加量,結果容易污染被黏附體表面,隨時間的黏接力和對被黏附體的污染性發生變化。 In addition, as described in Patent Documents 5 and 6, when the polyether-modified polysiloxane is mixed in the adhesive layer, it is difficult to fine-tune the adhesive force of the surface protective film. In addition, since the polyether-modified polysiloxane is mixed in the adhesive layer, when the conditions for coating and drying the adhesive composition on the substrate film are changed, the adhesion formed on the surface protective film is changed. The characteristics of the surface of the agent layer change subtly. In addition, from the viewpoint of protecting the surface of the optical film, the thickness of the adhesive layer cannot be set to be extremely thin. Therefore, according to the thickness of the adhesive layer, it is necessary to increase the amount of polyether-modified polysiloxane mixed in the adhesive layer. As a result, it is easy to contaminate the surface of the adherend, the adhesion force with time and the Pollution has changed.

近年來,伴隨著3D顯示器(立體視覺顯示器)的普及,有在偏光板等光學用膜的表面貼合FPR(圖案相位差膜,Film Patterned Retarder)膜的情況。剝離在偏光板等光學用膜的表面所貼合的表面保護膜後,貼合FPR膜。但是,當偏光板等的光學用膜表面被表面保護膜使用的黏接劑、防靜電劑所污染時,存在難以黏接FPR膜的問題。因此,對該用途上使用的表面保護膜而言,要求其對被黏附體的污染少。 In recent years, with the spread of 3D displays (stereoscopic displays), FPR (Film Patterned Retarder) films may be bonded to the surface of optical films such as polarizing plates. After peeling the surface protection film bonded to the surface of an optical film such as a polarizing plate, the FPR film is bonded. However, when the surface of an optical film such as a polarizing plate is contaminated with an adhesive or an antistatic agent used for a surface protective film, there is a problem that it is difficult to adhere the FPR film. Therefore, the surface protection film used for this application is required to have less contamination to an adherend.

另一方面,在一些液晶面板製造廠商中,作為表面保護膜對被黏附體的污染性的評價方法,是採用如下方法:對偏光板等的光學用膜上貼合的表面保護膜進行一次剝離,在混入了氣泡的狀態下進行再貼合,對再貼合後的物件在規定條件下加熱處理,然後剝離表面保護膜並觀察被黏附體的表面。在這種評價方法中,即使被黏附體的表面污染是微量 的,若在混入氣泡的部分與表面保護膜的黏接劑相接觸的部分之間存在被黏附體表面污染的差異,則會作為氣泡痕跡(有時也稱作“氣泡污痕”)殘留。因此,作為對被黏附體表面的污染性的評價方法,會是非常嚴格的評價方法。近年來,即使是以這種嚴格的評價方法進行判定的結果,也需要對被黏附體的表面污染性方面沒有問題的表面保護膜。但目前的狀況是,在以往所提出的使用了含有防靜電劑的黏接劑層的表面保護膜中,難以解決該課題。 On the other hand, in some liquid crystal panel manufacturers, as a method for evaluating the contamination property of a surface protection film to an adherend, the following method is used: the surface protection film bonded to an optical film such as a polarizing plate is peeled once After re-lamination in a state where air bubbles are mixed, the re-laminated article is heat-treated under prescribed conditions, and then the surface protective film is peeled off and the surface of the adherend is observed. In this evaluation method, even if the surface contamination of the adherend is trace If there is a difference in the contamination of the surface of the adherend between the portion where the bubbles are mixed and the portion where the adhesive of the surface protective film is in contact, it will remain as a bubble mark (also sometimes referred to as "bubble stain"). Therefore, as a method for evaluating the contamination of the surface of an adherend, it is a very strict evaluation method. In recent years, even as a result of determination by such a rigorous evaluation method, a surface protective film that has no problem with the surface contamination of an adherend is required. However, the current situation is that it has been difficult to solve this problem in a surface protection film using an adhesive layer containing an antistatic agent that has been proposed in the past.

因此,需要一種在光學用膜中使用的表面保護膜,其對被黏附體的污染非常少、且對被黏附體的污染性沒有經時變化(不隨著時間推移發生變化)。並且,需要將從被黏附體上剝離時的剝離靜電壓抑制得低的表面保護膜。 Therefore, there is a need for a surface protection film for use in an optical film, which has very little contamination of the adherend and does not change the contamination of the adherend with time (it does not change over time). In addition, a surface protective film that suppresses the peeling static voltage when peeling from the adherend is low.

為了解決該課題,本發明人等進行了精心研究。 In order to solve this problem, the present inventors have conducted intensive studies.

為了減少對被黏附體的污染並且也減少防靜電性能的經時變化,需要降低被推測是污染被黏附體的原因的防靜電劑的添加量。但是,當降低防靜電劑的添加量時,會導致從被黏附體上剝離表面保護膜時的剝離靜電壓變高。本發明人等研究了在不增加防靜電劑添加量的絕對量的情況下壓抑從被黏附體上剝離表面保護膜時的剝離靜電壓的方法。其結果發現,不在黏接劑組成物中添加防靜電劑並進行混合而形成黏接劑層,而是塗布黏接劑組成物並進行乾燥而層疊黏接劑層後,藉由對黏接劑層表面賦予適量的防靜電劑成分,能夠壓抑從作為被黏附體的光學用膜上剝離表面保護膜時的剝離靜電壓,並基於上述發現完成了本發明。 In order to reduce contamination of the adherend and also to reduce the change with time of the antistatic performance, it is necessary to reduce the amount of the antistatic agent that is supposed to be the cause of contaminating the adherend. However, when the amount of the antistatic agent is reduced, the peeling static voltage when the surface protective film is peeled from the adherend becomes high. The present inventors have studied a method of suppressing the peeling static voltage when peeling a surface protective film from an adherend without increasing the absolute amount of an antistatic agent. As a result, it was found that instead of adding an antistatic agent to the adhesive composition and mixing to form an adhesive layer, the adhesive composition was coated and dried to laminate the adhesive layer, and then the adhesive was applied to the adhesive. The surface of the layer is provided with an appropriate amount of an antistatic agent component, which can suppress the peeling static voltage when peeling the surface protective film from the optical film as an adherend, and completed the present invention based on the above findings.

本發明就是鑒於上述情況而完成的,其課題在於提供一種對被黏附體的污染少、且具有無經時劣化(不隨著時間推移發生劣化)的優良的抗剝離靜電性能的防靜電表面保護膜的製造方法、以及防靜電表面保護膜。 The present invention has been made in view of the above-mentioned circumstances, and an object thereof is to provide an antistatic surface protection with excellent anti-peeling electrostatic properties with little pollution to adherends and no degradation with time (deterioration does not occur over time). A method for producing a film, and an antistatic surface protective film.

為了解決上述課題,本發明防靜電表面保護膜的技術思想在於,在塗布黏接劑組成物並進行乾燥而層疊黏接劑層後,對該黏接劑層的表面賦予適量的20℃下是液體的聚矽氧烷(silicone)類化合物和防靜電劑,由此,能夠壓抑對被黏附體的污染性,而且能夠壓抑從作為被黏附體的光學用膜上剝離時的剝離靜電壓。 In order to solve the above-mentioned problem, the technical idea of the antistatic surface protection film of the present invention is that after applying the adhesive composition and drying to laminate the adhesive layer, the surface of the adhesive layer is given an appropriate amount at 20 ° C. The liquid silicone-based compound and the antistatic agent can suppress contamination of an adherend, and can suppress a peeling static voltage when peeled from an optical film as an adherend.

為了解決上述課題,本發明提供一種防靜電表面保護膜的製造方法,其是在由具有透明性的樹脂構成的基材膜的單面上形成黏接劑層後,將在樹脂膜單面上層疊了含有防靜電劑的剝離劑層的剝離膜,藉由前述剝離劑層貼合在前述黏接劑層表面的防靜電表面保護膜的製造方法,其中,前述剝離劑層是由含有以二甲基聚矽氧烷作為主要成分的剝離劑、20℃下是液體的聚矽氧烷類化合物以及防靜電劑的樹脂組成物來形成。 In order to solve the above-mentioned problems, the present invention provides a method for producing an antistatic surface protective film, which comprises forming an adhesive layer on one surface of a substrate film made of a transparent resin, and then placing the adhesive layer on one surface of the resin film. A method for producing an antistatic surface protective film in which a release agent layer containing a release agent layer is laminated, and the release agent layer is bonded to the surface of the adhesive layer, wherein the release agent layer comprises A resin composition containing methyl polysiloxane as a main component, a polysiloxane compound that is a liquid at 20 ° C., and an antistatic agent are formed.

另外,較佳為前述聚矽氧烷類化合物為聚醚改性聚矽氧烷。 The polysiloxane compound is preferably a polyether-modified polysiloxane.

另外,較佳為前述防靜電劑為鹼金屬鹽。 The antistatic agent is preferably an alkali metal salt.

另外,較佳為前述黏接劑層是使(甲基)丙烯酸酯共聚物交聯而成的丙烯酸類黏接劑層。 The adhesive layer is preferably an acrylic adhesive layer obtained by crosslinking a (meth) acrylate copolymer.

另外,為了解決上述課題,本發明提供一種防靜電表面保護膜,該防靜電表面保護膜是在由具有透明性的樹 脂構成的基材膜的單面形成黏接劑層,並且在樹脂膜單面層疊了含有防靜電劑的剝離劑層的剝離膜藉由前述剝離劑層貼合於前述黏接劑層表面而成,前述剝離劑層是由含有以二甲基聚矽氧烷作為主要成分的剝離劑、20℃下是液體的聚矽氧烷類化合物以及防靜電劑的樹脂組成物來形成。 In addition, in order to solve the above-mentioned problems, the present invention provides an antistatic surface protective film formed by a transparent tree An adhesive layer is formed on one side of the base material film made of grease, and a release film in which a release agent layer containing an antistatic agent is laminated on one side of the resin film is bonded to the surface of the adhesive layer by the release agent layer. The release agent layer is formed of a resin composition containing a release agent containing dimethylpolysiloxane as a main component, a polysiloxane compound that is liquid at 20 ° C, and an antistatic agent.

另外,較佳為前述聚矽氧烷類化合物為聚醚改性聚矽氧烷。 The polysiloxane compound is preferably a polyether-modified polysiloxane.

另外,較佳為前述防靜電劑為鹼金屬鹽。 The antistatic agent is preferably an alkali metal salt.

另外,較佳為前述黏接劑層是使(甲基)丙烯酸酯共聚物交聯而成的丙烯酸類黏接劑層。 The adhesive layer is preferably an acrylic adhesive layer obtained by crosslinking a (meth) acrylate copolymer.

另外,本發明提供一種光學用膜,其貼合有上述防靜電表面保護膜。 The present invention also provides an optical film to which the above-mentioned antistatic surface protective film is bonded.

另外,本發明提供一種光學構件,其貼合有上述防靜電表面保護膜。 In addition, the present invention provides an optical member to which the above-mentioned antistatic surface protective film is bonded.

本發明的防靜電表面保護膜對被黏附體的污染少,且對被黏附體的低污染性無經時變化(不會隨著時間推移發生變化)。另外,基於本發明,能夠提供一種防靜電表面保護膜的製造方法以及防靜電表面保護膜,其中,即使是LR偏光板、AG-LR偏光板等的被黏附體的表面藉由聚矽氧烷化合物、氟化物等進行過防污染處理的光學用膜,該防靜電表面保護膜也能夠壓抑從被黏附體上剝離防靜電表面保護膜時發生的剝離靜電壓,並具有無經時劣化且優良的抗剝離靜電性能。 The antistatic surface protection film of the present invention has less pollution to the adherend, and has no time-varying change to the adherend's low pollution (it will not change with time). In addition, based on the present invention, it is possible to provide a method for producing an antistatic surface protective film and an antistatic surface protective film, in which the surface of an adherend such as an LR polarizing plate or an AG-LR polarizing plate is made of polysiloxane Compounds, fluorides, and other optical films that have undergone antifouling treatment. This antistatic surface protective film also suppresses the peeling static voltage that occurs when the antistatic surface protective film is peeled from the adherend, and it has excellent deterioration over time. Anti-peeling electrostatic performance.

基於本發明的防靜電表面保護膜,能夠可靠地保護光學用 膜表面,因此能夠實現生產效率的提高和成品率的提高。 The antistatic surface protection film according to the present invention can reliably protect optical The surface of the film can therefore improve productivity and yield.

1‧‧‧基材膜 1‧‧‧ substrate film

2‧‧‧黏接劑層 2‧‧‧adhesive layer

3‧‧‧樹脂膜 3‧‧‧ resin film

4‧‧‧剝離劑層 4‧‧‧ peeling agent layer

5‧‧‧剝離膜 5‧‧‧ peeling film

7‧‧‧20℃下是液體的聚矽氧烷類化合物和防靜電劑 Polysiloxanes and antistatic agents that are liquid at 7‧‧‧20 ° C

8‧‧‧被黏附體(光學構件) 8‧‧‧ Adhered body (optical member)

10‧‧‧防靜電表面保護膜 10‧‧‧Anti-static surface protective film

11‧‧‧已剝下剝離膜的防靜電表面保護膜 11‧‧‧ Anti-static surface protective film with peeling film

20‧‧‧貼合了防靜電表面保護膜的光學構件 20‧‧‧ Optical member with anti-static surface protective film

圖1是表示本發明的防靜電表面保護膜的概念的剖面圖。 FIG. 1 is a cross-sectional view showing the concept of an antistatic surface protection film of the present invention.

圖2是表示從本發明的防靜電表面保護膜剝下剝離膜的狀態的剖面圖。 2 is a cross-sectional view showing a state where a release film is peeled from the antistatic surface protective film of the present invention.

圖3是表示本發明的光學構件的一實施例的剖面圖。 FIG. 3 is a cross-sectional view showing an embodiment of the optical member of the present invention.

下面,基於實施方式詳細說明本發明。 Hereinafter, the present invention will be described in detail based on the embodiments.

圖1是表示本發明的防靜電表面保護膜的概念的剖面圖。該防靜電表面保護膜10,是在透明的基材膜1單面的表面形成有黏接劑層2。在該黏接劑層2的表面上貼合有剝離膜5,該剝離膜5是在樹脂膜3的表面形成剝離劑層4而成。 FIG. 1 is a cross-sectional view showing the concept of an antistatic surface protection film of the present invention. In this antistatic surface protection film 10, an adhesive layer 2 is formed on the surface of one side of a transparent base film 1. A release film 5 is laminated on the surface of the adhesive layer 2, and the release film 5 is formed by forming a release agent layer 4 on the surface of the resin film 3.

作為在本發明的防靜電表面保護膜10中使用的基材膜1,使用由具有透明性和撓性的樹脂構成的基材膜。由此,能夠在將防靜電表面保護膜貼合於作為被黏附體的光學構件的狀態下實施光學構件的外觀檢查。用作基材膜1的由具有透明性的樹脂構成的膜,較佳為使用聚對苯二甲酸乙二醇酯、聚萘二甲酸乙二醇酯、聚間苯二甲酸乙二醇酯(polyethylene isophthalate)、聚對苯二甲酸丁二醇酯等聚酯膜。作為該膜只要具有所需強度且具有光學適應性即可,除了聚酯膜以外也可以使用由其它樹脂構成的膜。基材膜1既可以是未拉伸膜,也可以是被施以單軸拉伸或雙軸拉伸而成的膜。另外,也可以將拉伸膜的拉伸倍率、拉伸膜的伴隨晶體化所形成的軸方向的取 向角度控制在特定值上。 As the base film 1 used in the antistatic surface protection film 10 of the present invention, a base film made of a resin having transparency and flexibility is used. Thereby, the appearance inspection of an optical member can be performed in the state which bonded the antistatic surface protective film to the optical member as an adherend. As the film made of a transparent resin used as the base film 1, polyethylene terephthalate, polyethylene naphthalate, and polyethylene isophthalate ( Polyester films such as polyethylene isophthalate) and polybutylene terephthalate. The film may have a desired strength and optical compatibility, and a film made of another resin may be used in addition to the polyester film. The base film 1 may be an unstretched film or a film obtained by uniaxial stretching or biaxial stretching. In addition, the stretching ratio of the stretched film and the axial direction formed by the crystallization of the stretched film may be selected. The direction angle is controlled at a specific value.

對本發明的防靜電表面保護膜10中使用的基材膜1的厚度而言,並沒有特別的限定,例如,較佳為12~100μm左右的厚度;若為20~50μm左右的厚度則易於操作,因此更佳。 The thickness of the base film 1 used in the antistatic surface protection film 10 of the present invention is not particularly limited, for example, a thickness of about 12 to 100 μm is preferred; if the thickness is about 20 to 50 μm, it is easy to handle And therefore better.

另外,根據需要,可在基材膜1的與形成有黏接劑層2的面相反側的面上,設置用於防止表面污染的防污層、防靜電層、防止刮傷的硬塗層等。另外,在基材膜1的表面,也可以實施基於電暈放電進行的表面改性、底塗劑的塗抹等易黏接化處理。 In addition, if necessary, an antifouling layer, an antistatic layer, and a hard coating layer to prevent surface contamination can be provided on the surface of the base film 1 opposite to the surface on which the adhesive layer 2 is formed. Wait. In addition, the surface of the base film 1 may be subjected to adhesion treatment such as surface modification by corona discharge, application of a primer, and the like.

另外,對本發明的防靜電表面保護膜10中使用的黏接劑層2而言,只要是在被黏附體的表面上進行黏接、使用完畢後可簡單地剝下並且難以污染被黏附體的黏接劑層即可,並沒有特別限定,但考慮到在光學用膜上貼合後的耐久性等,通常採用使(甲基)丙烯酸酯共聚物交聯而成的丙烯酸類黏接劑層。 In addition, as for the adhesive layer 2 used in the antistatic surface protection film 10 of the present invention, as long as it is adhered to the surface of the adherend, it can be easily peeled off after use and it is difficult to contaminate the adherend. The adhesive layer is not particularly limited, but in consideration of durability after bonding to an optical film, an acrylic adhesive layer obtained by crosslinking a (meth) acrylate copolymer is generally used. .

作為(甲基)丙烯酸酯共聚物,可以舉出將主要單體與共聚用單體、官能性單體進行共聚而成的共聚物,其中,該主要單體可舉出丙烯酸正丁酯、丙烯酸2-乙基己酯、丙烯酸異辛酯、丙烯酸異壬酯等;該共聚用單體可舉出丙烯腈、醋酸乙烯酯、甲基丙烯酸甲酯、丙烯酸乙酯等;該官能性單體可舉出丙烯酸、甲基丙烯酸、丙烯酸羥乙酯、丙烯酸羥丁酯、甲基丙烯酸縮水甘油酯、N-羥甲基甲基丙烯醯胺等。(甲基)丙烯酸酯共聚物中,主要單體和共聚用單體均可以為(甲基)丙烯酸酯,也可以作為共聚用單體含有一種或兩種以上的除了(甲基)丙烯酸酯以外的單體。 Examples of the (meth) acrylate copolymer include a copolymer obtained by copolymerizing a main monomer with a comonomer and a functional monomer. Among these, the main monomer includes n-butyl acrylate and acrylic acid. 2-ethylhexyl, isooctyl acrylate, isononyl acrylate, etc .; the comonomers include acrylonitrile, vinyl acetate, methyl methacrylate, ethyl acrylate, etc .; the functional monomer may be Examples include acrylic acid, methacrylic acid, hydroxyethyl acrylate, hydroxybutyl acrylate, glycidyl methacrylate, and N-methylolmethacrylamide. In the (meth) acrylic acid ester copolymer, both the main monomer and the comonomer may be (meth) acrylic acid esters, and may contain one or two or more kinds of comonomers other than (meth) acrylic acid esters. Monomer.

另外,也可以使(甲基)丙烯酸酯共聚物與含有聚氧化亞烷基(polyoxyalkylene)的化合物進行共聚或者進行混合。作為可共聚的含有聚氧化亞烷基的化合物,可以舉出:聚乙二醇(400)單丙烯酸酯、聚乙二醇(400)單甲基丙烯酸酯、甲氧基聚乙二醇(400)丙烯酸酯、甲氧基聚乙二醇(400)甲基丙烯酸酯、聚丙二醇(400)單丙烯酸酯、聚丙二醇(400)單甲基丙烯酸酯、甲氧基聚丙二醇(400)丙烯酸酯、甲氧基聚丙二醇(400)甲基丙烯酸酯等。藉由將這些含有聚氧化亞烷基的單體與前述(甲基)丙烯酸酯共聚物的主要單體、官能性單體進行共聚,能夠獲得由含有聚氧化亞烷基的共聚物所組成的黏接劑。 In addition, the (meth) acrylate copolymer may be copolymerized or mixed with a polyoxyalkylene-containing compound. Examples of the copolymerizable polyoxyalkylene-containing compound include polyethylene glycol (400) monoacrylate, polyethylene glycol (400) monomethacrylate, and methoxypolyethylene glycol (400 ) Acrylate, methoxy polyethylene glycol (400) methacrylate, polypropylene glycol (400) monoacrylate, polypropylene glycol (400) monomethacrylate, methoxy polypropylene glycol (400) acrylate, Methoxy polypropylene glycol (400) methacrylate and the like. By copolymerizing these polyoxyalkylene-containing monomers with the main monomer and functional monomer of the (meth) acrylic acid ester copolymer, it is possible to obtain a polymer composed of a polyoxyalkylene-containing copolymer. Adhesive.

作為可與(甲基)丙烯酸酯共聚物進行混合的含有聚氧化亞烷基的化合物,較佳為含有聚氧化亞烷基的(甲基)丙烯酸酯共聚物,更佳為含有聚氧化亞烷基的(甲基)丙烯酸類單體的聚合物,例如,可以舉出聚乙二醇(400)單丙烯酸酯、聚乙二醇(400)單甲基丙烯酸酯、甲氧基聚乙二醇(400)丙烯酸酯、甲氧基聚乙二醇(400)甲基丙烯酸酯、聚丙二醇(400)單丙烯酸酯、聚丙二醇(400)單甲基丙烯酸酯、甲氧基聚丙二醇(400)丙烯酸酯、甲氧基聚丙二醇(400)甲基丙烯酸酯等的聚合物。藉由將這些含有聚氧化亞烷基的化合物與前述(甲基)丙烯酸酯共聚物進行混合,能夠獲得添加了含有聚氧化亞烷基的化合物的黏接劑。 The polyoxyalkylene-containing compound that can be mixed with the (meth) acrylate copolymer is preferably a (meth) acrylate copolymer containing a polyoxyalkylene, and more preferably a polyoxyalkylene. Examples of polymers of (meth) acrylic monomers such as polyethylene glycol (400) monoacrylate, polyethylene glycol (400) monomethacrylate, and methoxypolyethylene glycol (400) Acrylate, methoxypolyethylene glycol (400) methacrylate, polypropylene glycol (400) monoacrylate, polypropylene glycol (400) monomethacrylate, methoxypolypropylene glycol (400) acrylic acid Polymers such as esters and methoxy polypropylene glycol (400) methacrylate. By mixing these polyoxyalkylene-containing compounds with the (meth) acrylate copolymer, an adhesive to which a polyoxyalkylene-containing compound is added can be obtained.

對添加於黏接劑層2中的硬化劑而言,作為使(甲基)丙烯酸酯共聚物交聯的交聯劑,可以舉出異氰酸酯化合物、環氧化合物、三聚氰胺化合物、金屬螯合物等。另外,作為增黏劑,可以舉出松香類、香豆酮-茚類、萜烯類、石油類、酚類等。 Examples of the curing agent added to the adhesive layer 2 include a isocyanate compound, an epoxy compound, a melamine compound, and a metal chelate as a crosslinking agent for crosslinking the (meth) acrylate copolymer. . Examples of the thickener include rosin, coumarone-indene, terpene, petroleum, and phenol.

對本發明的防靜電表面保護膜10中使用的黏接劑層2的厚度,並沒有特別的限定,例如,較佳為5~40μm左右的厚度,更佳為10~30μm左右的厚度。當為防靜電表面保護膜對被黏附體表面的剝離強度(黏接力)為0.03~0.3N/25mm左右的、具有微黏接力的黏接劑層2時,從被黏附體上剝離防靜電表面保護膜時的操作性優良,因此較佳。另外,基於從防靜電表面保護膜10剝下剝離膜5時的操作性優良的觀點,較佳為剝離膜5從黏接劑層2上剝下的剝離力為0.2N/50mm以下。 The thickness of the adhesive layer 2 used in the antistatic surface protection film 10 of the present invention is not particularly limited. For example, a thickness of about 5 to 40 μm is preferred, and a thickness of about 10 to 30 μm is more preferred. When the peeling strength (adhesive force) of the antistatic surface protective film to the surface of the adherend is about 0.03 to 0.3N / 25mm and the adhesive layer 2 has a slight adhesive force, the antistatic surface is peeled from the adherend. The protective film is preferable because it has excellent operability. In addition, from the viewpoint of excellent operability when peeling the release film 5 from the antistatic surface protective film 10, it is preferable that the peel force of the peeling film 5 from the adhesive layer 2 is 0.2 N / 50 mm or less.

另外,對本發明的防靜電表面保護膜10中使用的剝離膜5而言,是在樹脂膜3的單面上形成有剝離劑層4,該剝離劑層4是使用含有以二甲基聚矽氧烷作為主要成分的剝離劑、20℃下是液體的聚矽氧烷類化合物以及防靜電劑的樹脂組成物來形成。 In addition, in the release film 5 used in the antistatic surface protection film 10 of the present invention, a release agent layer 4 is formed on one side of the resin film 3, and the release agent layer 4 contains Oxyalkane is a resin composition containing a release agent as a main component, a polysiloxane compound that is liquid at 20 ° C, and an antistatic agent.

作為樹脂膜3,可以舉出聚酯膜、聚醯胺膜、聚乙烯膜、聚丙烯膜、聚醯亞胺膜等,從透明性優良或價格比較低廉的觀點出發,特別較佳為聚酯膜。樹脂膜既可以是未拉伸膜,也可以是單軸拉伸膜或雙軸拉伸膜。另外,也可以將拉伸膜的拉伸倍率、拉伸膜的伴隨著晶體化所形成的軸方向的取向角度控制在特定值。 Examples of the resin film 3 include a polyester film, a polyimide film, a polyethylene film, a polypropylene film, and a polyimide film. From the viewpoint of excellent transparency or relatively low cost, polyester is particularly preferred. membrane. The resin film may be an unstretched film, or a uniaxially stretched film or a biaxially stretched film. The stretching ratio of the stretched film and the orientation angle in the axial direction of the stretched film accompanying crystallization may be controlled to specific values.

對樹脂膜3的厚度並沒有特別的限定,例如,較佳為12~100μm左右的厚度;若為20~50μm左右的厚度則易於操作,因此更理想。 The thickness of the resin film 3 is not particularly limited, and for example, a thickness of about 12 to 100 μm is preferable; a thickness of about 20 to 50 μm is easy to handle, so it is more preferable.

另外,在樹脂膜3的表面,也可以根據需要實施基於電暈 放電進行的表面改性、底塗劑的塗抹等易黏接化處理。 In addition, the surface of the resin film 3 may be subjected to corona-based treatment as necessary. Adhesive treatments such as surface modification by discharge and application of primer.

作為構成剝離劑層4的、以二甲基聚矽氧烷作為主要成分的剝離劑,可以舉出加成反應型、縮合反應型、陽離子聚合型、自由基聚合型等的公知的聚矽氧烷類剝離劑。作為加成反應型聚矽氧烷類剝離劑市售的產品,例如,可以舉出:KS-776A、KS-847T、KS-779H、KS-837、KS-778、KS-830(信越化學工業(股)公司製造);SRX-211、SRX-345、SRX-357、SD7333、SD7220、SD7223、LTC-300B、LTC-350G、LTC-310(陶氏康寧東麗(股)公司(Dow Corning Toray Co.,Ltd.)製造)等。作為縮合反應型市售的產品,例如,可以舉出SRX-290、SYLOFF-23(陶氏康寧東麗(股)公司製造)等。作為陽離子聚合型市售的產品,例如,可以舉出TPR-6501、TPR-6500、UV9300、UV9315、UV9430(邁圖高新材料公司(Momentive Performance Materials Inc.)製造)、X62-7622(信越化學工業(股)公司製造)等。作為自由基聚合型市售的產品,例如,可以舉出X62-7205(信越化學工業(股)公司製造)等。 Examples of the release agent comprising dimethylpolysiloxane as the main component constituting the release agent layer 4 include well-known polysiloxanes such as addition reaction type, condensation reaction type, cation polymerization type, and radical polymerization type. Alkane release agent. Examples of commercially available products of the addition reaction type polysiloxane-based stripping agent include KS-776A, KS-847T, KS-779H, KS-837, KS-778, and KS-830 (Shin-Etsu Chemical Industry Co., Ltd. (Manufactured by the company); SRX-211, SRX-345, SRX-357, SD7333, SD7220, SD7223, LTC-300B, LTC-350G, LTC-310 (Dow Corning Toray (Stock) Company (Dow Corning Toray Co., Ltd.)). As a condensation reaction type commercially available product, SRX-290, SYLOFF-23 (made by Dow Corning Toray Co., Ltd.), etc. are mentioned, for example. Examples of commercially available cationic polymerization products include TPR-66501, TPR-6500, UV9300, UV9315, and UV9430 (manufactured by Momentive Performance Materials Inc.), X62-7622 (Shin-Etsu Chemical Industry Co., Ltd.) (Stock) company)). As a commercially available product of a radical polymerization type, X62-7205 (made by Shin-Etsu Chemical Industry Co., Ltd.) etc. are mentioned, for example.

作為構成剝離劑層4的、20℃下是液體的聚矽氧烷類化合物,可以舉出聚醚改性聚矽氧烷、烷基改性聚矽氧烷、甲醇高級脂肪酸酯改性聚矽氧烷等。在本發明中,為了提高黏接劑層表面的防靜電性,使用在以二甲基聚矽氧烷作為主要成分的剝離劑層中相溶的狀態的20℃下是液體的聚矽氧烷類化合物。從本發明的用途而言,較佳為改性聚矽氧烷化合物中的聚醚改性聚矽氧烷。聚醚改性聚矽氧烷中的聚醚鏈是由氧化乙烯(環氧乙烷)、氧化丙烯(環氧丙烷)等構成,例如,藉由 選擇側鏈中使用的聚氧化乙烯的分子量,能夠調整與聚矽氧烷剝離劑的相溶性、防靜電效果等物理性質。 Examples of the polysiloxane compound constituting the release agent layer 4 that is liquid at 20 ° C. include polyether-modified polysiloxane, alkyl-modified polysiloxane, and methanol higher fatty acid ester-modified polysiloxane. Siloxane, etc. In the present invention, in order to improve the antistatic property of the surface of the adhesive layer, a polysiloxane which is liquid at 20 ° C. in a state compatible with the release agent layer containing dimethylpolysiloxane as a main component is used. Compound. From the uses of the present invention, polyether-modified polysiloxanes among modified polysiloxane compounds are preferred. The polyether chain in the polyether-modified polysiloxane is composed of ethylene oxide (ethylene oxide), propylene oxide (propylene oxide), and the like, for example, by By selecting the molecular weight of the polyethylene oxide used in the side chain, physical properties such as compatibility with the polysiloxane release agent and antistatic effect can be adjusted.

另外,作為聚醚改性聚矽氧烷市售的產品,例如,可以舉出:KF-351A、KF-352A、KF-353、KF-354L、KF-355A、KF-642(信越化學工業(股)公司製造);SH8400、SH8700、SF8410(陶氏康寧東麗(股)公司製造);TSF-4440、TSF-4441、TSF-4445、TSF-4446、TSF-4450(邁圖高新材料公司(Momentive Performance Materials Inc.)製造);BYK-300、BYK-306、BYK-307、BYK-320、BYK-325、BYK-330(BYK-Chemie公司製造)等。 Examples of commercially available products of polyether-modified polysiloxane include KF-351A, KF-352A, KF-353, KF-354L, KF-355A, and KF-642 (Shin-Etsu Chemical Industry ( Stock)); SH8400, SH8700, SF8410 (made by Dow Corning Toray Co., Ltd.); TSF-4440, TSF-44441, TSF-4445, TSF-4446, TSF-4450 (Made by Momentive Performance Materials Inc.); BYK-300, BYK-306, BYK-307, BYK-320, BYK-325, BYK-330 (by BYK-Chemie) and the like.

20℃下是液體的聚矽氧烷類化合物相對於以二甲基聚矽氧烷作為主要成分的剝離劑的添加量,是根據聚矽氧烷化合物的種類、與剝離劑的相溶性程度的不同而不同,只要考慮到從被黏附體上剝離防靜電表面保護膜時所需的剝離靜電壓、對被黏附體的污染性、黏接特性等而進行設定即可。 The amount of polysiloxane compounds that are liquid at 20 ° C relative to the release agent containing dimethylpolysiloxane as the main component depends on the type of the polysiloxane compound and the degree of compatibility with the release agent. The difference is different, as long as it is set in consideration of the peeling static voltage required when peeling the antistatic surface protective film from the adherend, the contamination property to the adherend, the adhesion characteristics, and the like.

作為構成剝離劑層4的防靜電劑,較佳為對於以二甲基聚矽氧烷作為主要成分的剝離劑溶液的分散性良好、並且不阻礙以二甲基聚矽氧烷作為主要成分的剝離劑的硬化的防靜電劑。作為這樣的防靜電劑,較佳為鹼金屬鹽。 The antistatic agent constituting the release agent layer 4 is preferably one having good dispersibility to a release agent solution containing dimethylpolysiloxane as a main component and not hindering a solution containing dimethylpolysiloxane as a main component. A hardened antistatic agent for release agents. As such an antistatic agent, an alkali metal salt is preferable.

作為鹼金屬鹽,可以舉出:包含鋰、鈉、鉀的金屬鹽,具體而言,例如,較佳為使用藉由包含Li+、Na+、K+的陽離子與包含Cl-、Br-、I-、BF4 -、PF6 -、SCN-、ClO4 -、CF3SO3 -、(CF3SO2)2N-、(C2F5SO2)2N-、(CF3SO2)3C-的陰離子所構成的金屬鹽。其中,特別較佳為使用LiBr、LiI、LiBF4、LiPF6、LiSCN、LiClO4、LiCF3SO3、Li(CF3SO2)2N、Li(C2F5SO2)2N、Li(CF3SO2)3C 等鋰鹽。這些鹼金屬鹽既可以單獨使用,也可以混合兩種以上使用。為了離子性物質的穩定化,也可以添加含有聚氧化亞烷基(聚乙二醇)結構的化合物。 The alkali metal salt may include: comprising lithium, sodium, potassium salts, specifically, for example, is preferably used by containing Li +, Na +, K + cations comprising Cl -, Br -, I -, BF 4 -, PF 6 -, SCN -, ClO 4 -, CF 3 SO 3 -, (CF 3 SO 2) 2 N -, (C 2 F 5 SO 2) 2 N -, (CF 3 SO 2) 3 C - anions consisting of a metal salt. Among them, LiBr, LiI, LiBF 4 , LiPF 6 , LiSCN, LiClO 4 , LiCF 3 SO 3 , Li (CF 3 SO 2 ) 2 N, Li (C 2 F 5 SO 2 ) 2 N, Li are particularly preferably used. (CF 3 SO 2 ) 3 C and other lithium salts. These alkali metal salts may be used alone or in combination of two or more. To stabilize the ionic substance, a compound containing a polyoxyalkylene (polyethylene glycol) structure may be added.

防靜電劑相對於以二甲基聚矽氧烷作為主要成分的剝離劑的添加量,是根據防靜電劑的種類、與剝離劑的親和性的程度的不同而不同,但考慮到從被黏附體上剝離防靜電表面保護膜時所需的剝離靜電壓、對被黏附體的污染性、黏接特性等進行設定即可。 The amount of antistatic agent added to the release agent containing dimethylpolysiloxane as the main component varies depending on the type of the antistatic agent and the degree of affinity with the release agent, but it is considered that The peeling static voltage required for peeling the antistatic surface protection film on the body, the contamination property of the adherend, the adhesion characteristics, and the like may be set.

對於以二甲基聚矽氧烷作為主要成分的剝離劑與聚醚改性聚矽氧烷和防靜電劑的混合方法而言,並沒有特別的限定。可以採用下列混合方法中的任一種方法:在以二甲基聚矽氧烷作為主要成分的剝離劑中,添加聚醚改性聚矽氧烷和防靜電劑進行混合後,添加剝離劑硬化用催化劑並加以混合的方法;預先採用有機溶劑稀釋以二甲基聚矽氧烷作為主要成分的剝離劑後,添加聚醚改性聚矽氧烷和防靜電劑以及剝離劑硬化用催化劑並加以混合的方法;預先將以聚矽氧烷作為主要成分的剝離劑稀釋於有機溶劑後,添加催化劑而進行混合,然後,添加聚醚改性聚矽氧烷和防靜電劑並加以混合的方法等。另外,根據需要,也可以添加矽烷偶聯劑等黏合促進劑、含有聚氧化亞烷基的化合物等的輔助防靜電效果的材料。 There is no particular limitation on the method of mixing the release agent containing dimethylpolysiloxane as a main component, the polyether-modified polysiloxane, and the antistatic agent. Any one of the following mixing methods can be adopted: in a release agent containing dimethylpolysiloxane as a main component, after adding polyether-modified polysiloxane and an antistatic agent to mix, add a release agent for hardening A method of mixing catalysts; using an organic solvent to dilute a stripping agent containing dimethylpolysiloxane as a main component in advance, adding and mixing a polyether-modified polysiloxane and an antistatic agent and a curing agent for the stripping agent and mixing them A method of diluting a release agent containing polysiloxane as a main component in an organic solvent in advance, adding a catalyst and mixing, and then adding and mixing a polyether-modified polysiloxane and an antistatic agent. In addition, if necessary, materials such as an adhesion promoter such as a silane coupling agent, or a compound containing a polyoxyalkylene group to assist the antistatic effect may be added.

對於以二甲基聚矽氧烷作為主要成分的剝離劑與聚醚改性聚矽氧烷和防靜電劑的混合比例而言,並沒有特別的限定,但相對於以二甲基聚矽氧烷作為主要成分的剝離劑的固體成分100,較佳為聚醚改性聚矽氧烷和防靜電劑以固體成分計為 5~100左右的比例。相對於以二甲基聚矽氧烷作為主要成分的剝離劑的固體成分100,若聚醚改性聚矽氧烷和防靜電劑的以固體成分換算的添加量小於5的比例,則防靜電劑對黏接劑層表面的轉移量也變少,難以使黏接劑層發揮防靜電的功能。另外,相對於以二甲基聚矽氧烷作為主要成分的剝離劑的固體成分100,若聚醚改性聚矽氧烷和防靜電劑的以固體成分換算的添加量超過100的比例,則導致與聚醚改性聚矽氧烷和防靜電劑一起以二甲基聚矽氧烷作為主要成分的剝離劑也會被轉移至黏接劑層表面,因此,可能會降低黏接劑層的黏接特性。 There is no particular limitation on the mixing ratio of the release agent containing dimethyl polysiloxane as the main component, the polyether-modified polysiloxane, and the antistatic agent, but it is relatively The solid component 100 of the release agent with alkane as the main component is preferably a polyether-modified polysiloxane and an antistatic agent. 5 to 100 ratio. Relative to the solid content 100 of the release agent containing dimethylpolysiloxane as the main component, if the polyether modified polysiloxane and the antistatic agent are added in a proportion of less than 5 in terms of solid content, antistatic The transfer amount of the adhesive to the surface of the adhesive layer is also reduced, making it difficult for the adhesive layer to exert an antistatic function. In addition, with respect to the solid content 100 of the release agent containing dimethylpolysiloxane as a main component, if the polyether-modified polysiloxane and the antistatic agent are added in an amount exceeding 100% in terms of solid content, then As a result, the release agent containing dimethylpolysiloxane as the main component together with the polyether-modified polysiloxane and the antistatic agent will also be transferred to the surface of the adhesive layer, so the adhesive layer may be reduced. Adhesive properties.

本發明中在防靜電表面保護膜10的基材膜1上形成黏接劑層2的方法以及貼合剝離膜5的方法,均可採用公知的方法來進行,沒有特別的限定。具體而言,可以舉出:(1)將用於形成黏接劑層2的樹脂組成物塗布於基材膜1的單面上並進行乾燥,形成黏接劑層後貼合剝離膜5的方法;(2)將用於形成黏接劑層2的樹脂組成物塗布於剝離膜5表面上並進行乾燥,形成黏接劑層後,貼合基材膜1的方法等。可以採用其中的任一種方法。 In the present invention, the method for forming the adhesive layer 2 on the base film 1 of the antistatic surface protection film 10 and the method for bonding the release film 5 can be performed by a known method, and are not particularly limited. Specifically, (1) the resin composition for forming the adhesive layer 2 is coated on one side of the base film 1 and dried to form an adhesive layer and then the release film 5 is bonded; Method; (2) a method of applying the resin composition for forming the adhesive layer 2 on the surface of the release film 5 and drying to form an adhesive layer, and then bonding the base film 1 and the like. Either method can be used.

另外,當將黏接劑層2形成於基材膜1表面時,可採用公知的方法來進行。具體而言,能夠使用逆轉塗布、缺角輪刮刀塗布、凹版塗布、狹縫式擠壓塗布、麥勒棒(Mayer bar)塗布、氣刀塗布等公知的塗布方法。 When the adhesive layer 2 is formed on the surface of the base film 1, a known method can be used. Specifically, well-known coating methods, such as reverse coating, notch wheel blade coating, gravure coating, slit extrusion coating, Mayer bar coating, and air knife coating, can be used.

另外,同樣地,當將剝離劑層4形成於樹脂膜3時,可以採用公知的方法來進行。具體而言,能夠採用凹版塗布、麥勒棒塗布、氣刀塗布等公知的塗布方法。 Similarly, when the release agent layer 4 is formed on the resin film 3, it can be performed by a well-known method. Specifically, well-known coating methods, such as gravure coating, Mylar bar coating, and air knife coating, can be used.

對具有上述構成的本發明防靜電表面保護膜10而言,從作為被黏附體的光學用膜上剝離時的表面電位較佳為+0.7kV~-0.7kV。並且,更佳為表面電位為+0.5kV~-0.5kV,特別較佳為表面電位為+0.1kV~-0.1kV。該表面電位能夠藉由改變剝離劑層中所含有的聚醚改性聚矽氧烷和防靜電劑的種類、添加量等來進行調整。 In the antistatic surface protective film 10 of the present invention having the above-mentioned configuration, the surface potential when peeled from the optical film as an adherend is preferably +0.7 kV to -0.7 kV. The surface potential is more preferably +0.5 kV to -0.5 kV, and the surface potential is more preferably +0.1 kV to -0.1 kV. This surface potential can be adjusted by changing the type and amount of polyether-modified polysiloxane and antistatic agent contained in the release agent layer.

圖2是表示從本發明的防靜電表面保護膜上剝下剝離膜的狀態的剖面圖。 FIG. 2 is a cross-sectional view showing a state where a release film is peeled from the antistatic surface protection film of the present invention.

藉由將剝離膜5從如圖1所示的防靜電表面保護膜10上剝下,剝離膜5的剝離劑層4所含的、20℃下是液體的聚矽氧烷類化合物和防靜電劑(附圖標記7)的一部分,被轉移(附著)至防靜電表面保護膜10的黏接劑層2的表面。因此,在圖2中,以附圖標記7的斑點示意性地示出了被轉移至防靜電表面保護膜的黏接劑層2表面的、20℃下是液體的聚矽氧烷類化合物和防靜電劑。 By peeling the release film 5 from the antistatic surface protective film 10 shown in FIG. 1, the polysiloxane compound and the antistatic liquid contained in the release agent layer 4 of the release film 5 at 20 ° C. are liquid. A part of the adhesive (reference numeral 7) is transferred (attached) to the surface of the adhesive layer 2 of the antistatic surface protection film 10. Therefore, in FIG. 2, the spots of reference numeral 7 schematically show the polysiloxane compound and the polysiloxane compound that are liquid at 20 ° C. and are transferred to the surface of the adhesive layer 2 of the antistatic surface protection film. Antistatic agent.

對本發明的防靜電表面保護膜而言,當將圖2所示的剝下了剝離膜的狀態的防靜電表面保護膜11貼合於被黏附體上時,被轉移至該黏接劑層2表面的、20℃下是液體的聚矽氧烷類化合物和防靜電劑,與被黏附體表面進行接觸。藉由該操作,能夠壓抑再次從被黏附體上剝下防靜電表面保護膜時的剝離靜電壓。 In the antistatic surface protection film of the present invention, when the antistatic surface protection film 11 in a state where the release film is peeled off as shown in FIG. 2 is attached to the adherend, it is transferred to the adhesive layer 2 Surface polysiloxane compounds and antistatic agents that are liquid at 20 ° C come into contact with the surface of the adherend. With this operation, it is possible to suppress the peeling static voltage when the antistatic surface protective film is peeled from the adherend again.

圖3是表示本發明的光學構件的實施例的剖面圖。 FIG. 3 is a cross-sectional view showing an embodiment of an optical member of the present invention.

在將剝離膜5從本發明的防靜電表面保護膜10上剝下從而黏接劑層2外露的狀態下,藉由該黏接劑層2貼合於作為被 黏附體的光學構件8上。 In a state where the release film 5 is peeled from the antistatic surface protection film 10 of the present invention and the adhesive layer 2 is exposed, the adhesive layer 2 is attached to the substrate as a substrate. On the optical member 8 of the adherend.

即,在圖3中示出了貼合有本發明防靜電表面保護膜10的光學構件20。作為光學構件,可以舉出偏光板、相位差板、透鏡膜、兼用作相位差板的偏光板、兼用作透鏡膜的偏光板等光學用膜。這種光學構件被用作液晶顯示面板等液晶顯示裝置、各種計量儀器類光學系統裝置等的構成構件。另外,作為光學構件,還可以舉出防反射膜、硬塗膜、觸控面板用透明導電膜等光學用膜。特別是,能夠較佳為用作貼合於表面已用聚矽氧烷化合物、氟化合物等進行過防污染處理的低反射處理偏光板(LR偏光板)、防眩低反射處理偏光板(AG-LR偏光板)等光學用膜的施加了防污染處理的面上的防靜電表面保護膜。 That is, FIG. 3 shows the optical member 20 to which the antistatic surface protective film 10 of the present invention is bonded. Examples of the optical member include optical films such as a polarizing plate, a retardation plate, a lens film, a polarizing plate also serving as a retardation plate, and a polarizing plate also serving as a lens film. Such an optical member is used as a constituent member of a liquid crystal display device such as a liquid crystal display panel, various optical systems such as various measuring instruments, and the like. Examples of the optical member include optical films such as antireflection films, hard coat films, and transparent conductive films for touch panels. In particular, it can be suitably used as a low-reflection-treated polarizing plate (LR polarizing plate) and an anti-glare low-reflection polarizing plate (AG) bonded to a surface that has been subjected to anti-pollution treatment with a polysiloxane compound, fluorine compound, or the like. -LR polarizer) Anti-static surface protective film on the surface of the optical film such as anti-pollution treatment.

基於本發明的光學構件,當將防靜電表面保護膜10從作為被黏附體的光學構件(光學用膜)上剝離去除時,能夠充分地將剝離靜電壓抑制在低水準,因此,不用擔心會破壞驅動IC、TFT元件、柵極線驅動電路等的電路構件,能夠提高製造液晶顯示面板等步驟中的生產效率,確保生產步驟的可靠性。 According to the optical member of the present invention, when the antistatic surface protective film 10 is peeled off from the optical member (optical film) as an adherend, the peeling static voltage can be sufficiently suppressed to a low level, so there is no need to worry about Destroying circuit components such as a driving IC, a TFT element, and a gate line driving circuit can improve the production efficiency in the steps of manufacturing a liquid crystal display panel and the like, and ensure the reliability of the production steps.

【實施例】 [Example]

下面藉由實施例進一步說明本發明。 The present invention is further explained by the following examples.

(實施例1) (Example 1)

(防靜電表面保護膜的製造) (Manufacture of antistatic surface protective film)

將5重量份的加成反應型聚矽氧烷(產品名稱為SRX-345,陶氏康寧東麗(股)公司(Dow Corning Toray Co.,Ltd.)製造)、0.15重量份的聚醚改性聚矽氧烷(產品名稱為SH8400,陶氏康寧東麗(股)公司製造)、5重量份的高氯酸鋰為10%的醋 酸乙酯溶液、95重量份的甲苯與醋酸乙酯為1:1的混合溶劑、以及0.05重量份的鉑催化劑(產品名稱為SRX-212 Catalyst(催化劑),陶氏康寧東麗(股)公司製造)混合在一起並進行攪拌混合,配製了形成實施例1的剝離劑層的塗料。採用麥勒棒,將形成實施例1的剝離劑層的塗料,以使乾燥後的厚度成為0.2μm的方式,塗布在厚度為38μm的聚對苯二甲酸乙二醇酯膜的表面,並在120℃的熱風循環式烘爐中乾燥1分鐘,獲得了實施例1的剝離膜。另一方面,將由丙烯酸2-乙基己酯與丙烯酸2-羥乙酯以100:4的重量比進行共聚而成的、重均分子量為47萬的丙烯酸酯共聚物30重量份,溶解於70重量份的醋酸乙酯中而獲得黏接劑(固體成分含量為30%的醋酸乙酯溶液),相對於100重量份的該黏接劑,添加1.2重量份的HDI類硬化劑(產品名稱為Coronate HX,日本聚氨酯工業(股)公司(Nippon Polyurethane Industry Co.,Ltd.)製造)並進行混合而形成塗抹液,並將該塗抹液以使乾燥後的厚度成為20μm的方式塗布於厚度為38μm的聚對苯二甲酸乙二醇酯膜的表面,然後藉由100℃的熱風循環式烘爐乾燥2分鐘,從而形成了黏接劑層。然後,在該黏接劑層的表面,貼合了上述製造的實施例1的剝離膜的剝離劑層(聚矽氧烷處理面)。將所得到的黏著膜在40℃的環境下保溫5天,以使黏接劑硬化,獲得了實施例1的防靜電表面保護膜。 5 parts by weight of an addition reaction type polysiloxane (product name: SRX-345, manufactured by Dow Corning Toray Co., Ltd.) and 0.15 parts by weight of polyether modified Polysiloxane (Product name: SH8400, manufactured by Dow Corning Toray Co., Ltd.), 5 parts by weight of lithium perchlorate, 10% vinegar Acid ethyl ester solution, 95 parts by weight of toluene and ethyl acetate mixed solvent of 1: 1, and 0.05 parts by weight of a platinum catalyst (product name is SRX-212 Catalyst), Dow Corning Toray Co., Ltd. (Manufactured) were mixed together and stirred to prepare a coating material for forming the release agent layer of Example 1. Using a Müller rod, the coating material forming the release agent layer of Example 1 was applied on the surface of a polyethylene terephthalate film having a thickness of 38 μm so that the thickness after drying was 0.2 μm. It dried at 120 degreeC for 1 minute in the hot-air circulation type oven, and obtained the peeling film of Example 1. On the other hand, 30 parts by weight of an acrylate copolymer having a weight average molecular weight of 470,000, which was copolymerized with 2-ethylhexyl acrylate and 2-hydroxyethyl acrylate at a weight ratio of 100: 4, was dissolved in 70 An adhesive (a 30% ethyl acetate solution having a solid content of 30% by weight) was added to ethyl acetate, and 1.2 parts by weight of an HDI-based hardener (product name: Coronate HX (manufactured by Nippon Polyurethane Industry Co., Ltd.) was mixed to form an application liquid, and the application liquid was applied to a thickness of 38 μm so that the thickness after drying was 20 μm. The surface of the polyethylene terephthalate film was dried in a hot air circulation oven at 100 ° C. for 2 minutes, thereby forming an adhesive layer. Then, on the surface of the adhesive layer, a release agent layer (polysiloxane-treated surface) of the release film of Example 1 produced as described above was bonded. The obtained adhesive film was held in an environment at 40 ° C. for 5 days to harden the adhesive, and the antistatic surface protection film of Example 1 was obtained.

(實施例2) (Example 2)

除了將形成實施例1的剝離劑層的塗料的乾燥後的厚度設定為0.1μm以外,與實施例1同樣地進行操作,獲得了實施例 2的防靜電表面保護膜。 An Example was obtained in the same manner as in Example 1 except that the thickness after drying of the coating material forming the release agent layer of Example 1 was set to 0.1 μm. 2 Anti-static surface protective film.

(實施例3) (Example 3)

作為實施例1的加成反應型聚矽氧烷使用了陶氏康寧東麗(股)公司(Dow Corning Toray Co.,Ltd.)製造的名稱為SRX-211的產品,作為聚醚改性聚矽氧烷使用了信越化學工業(股)公司製造的名稱為KS-352A的產品,使用10重量份的雙(三氟甲烷磺醯)亞胺鋰為10%的醋酸乙酯溶液來代替5重量份的高氯酸鋰為10%的醋酸乙酯溶液,除上述以外與實施例1同樣地進行操作,獲得了實施例3的防靜電表面保護膜。 As the addition reaction type polysiloxane of Example 1, a product named SRX-211 manufactured by Dow Corning Toray Co., Ltd. was used as a polyether-modified polysiloxane Siloxane uses a product named KS-352A manufactured by Shin-Etsu Chemical Industry Co., Ltd., and uses 10 parts by weight of a lithium bis (trifluoromethanesulfonium) imide solution in 10% ethyl acetate instead of 5 weight. Parts of lithium perchlorate was a 10% ethyl acetate solution. Except for the above, the same operation as in Example 1 was performed to obtain an antistatic surface protection film of Example 3.

(比較例1) (Comparative example 1)

將5重量份的加成反應型聚矽氧烷(產品名稱為SRX-345,陶氏康寧東麗(股)公司製造)、95重量份的甲苯與醋酸乙酯為1:1的混合溶劑、以及0.05重量份的鉑催化劑(產品名稱為SRX-212 Catalyst,陶氏康寧東麗(股)公司製造)混合在一起並進行攪拌混合,配製了形成比較例1的剝離劑層的塗料。採用麥勒棒,將形成比較例1的剝離劑層的塗料,以使乾燥後的厚度成為0.2μm的方式,塗布在厚度為38μm的聚對苯二甲酸乙二醇酯膜的表面,並在120℃的熱風循環式烘爐中乾燥1分鐘,獲得了比較例1的剝離膜。另一方面,相對於100重量份的實施例1的黏接劑(固體成分含量為30%的醋酸乙酯溶液),添加並混合了0.3重量份的聚醚改性聚矽氧烷(產品名稱為SH8400,陶氏康寧東麗(股)公司(Dow Corning Toray Co.,Ltd.)製造)、10重量份的高氯酸鋰為10%的醋酸乙酯溶液、1.2重量份的HDI類硬化劑(產品名稱為Coronate HX,日本聚氨酯 工業(股)公司製造)而形成塗抹液,並將該塗抹液以使乾燥後的厚度成為20μm的方式塗布於厚度為38μm的聚對苯二甲酸乙二醇酯膜的表面,然後藉由100℃的熱風循環式烘爐乾燥2分鐘,從而形成了黏接劑層。然後,在該黏接劑層的表面,貼合了上述製造的比較例1的剝離膜的剝離劑層(聚矽氧烷處理面)。將所得到的黏著膜在40℃的環境下保溫5天,以使黏接劑硬化,獲得了比較例1的防靜電表面保護膜。 5 parts by weight of an addition reaction type polysiloxane (product name is SRX-345, manufactured by Dow Corning Toray Co., Ltd.), 95 parts by weight of a mixed solvent of toluene and ethyl acetate of 1: 1, And 0.05 parts by weight of a platinum catalyst (product name: SRX-212 Catalyst, manufactured by Dow Corning Toray Co., Ltd.) were mixed together and mixed by stirring to prepare a coating material for forming a release agent layer of Comparative Example 1. Using a Mettler rod, the coating material forming the release agent layer of Comparative Example 1 was coated on the surface of a polyethylene terephthalate film having a thickness of 38 μm so that the thickness after drying was 0.2 μm, and It dried in the hot-air circulation type oven at 120 degreeC for 1 minute, and the peeling film of the comparative example 1 was obtained. On the other hand, 0.3 parts by weight of a polyether-modified polysiloxane (product name) was added to and mixed with 100 parts by weight of the adhesive of Example 1 (ethyl acetate solution having a solid content of 30%). SH8400, manufactured by Dow Corning Toray Co., Ltd., 10 parts by weight of lithium perchlorate, 10% ethyl acetate solution, and 1.2 parts by weight of HDI-based hardener (Product name is Coronate HX, Japan Polyurethane Industrial Co., Ltd.) to form an application liquid, and apply the application liquid to a thickness of 20 μm after drying on a surface of a polyethylene terephthalate film having a thickness of 38 μm, and then apply 100 The hot air circulation oven at ℃ was dried for 2 minutes, thereby forming an adhesive layer. Then, on the surface of the adhesive layer, a release agent layer (polysiloxane-treated surface) of the release film of Comparative Example 1 produced as described above was bonded. The obtained adhesive film was held in an environment at 40 ° C. for 5 days to harden the adhesive, and an antistatic surface protective film of Comparative Example 1 was obtained.

(比較例2) (Comparative example 2)

除了將聚醚改性聚矽氧烷(產品名稱為SH8400,陶氏康寧東麗(股)公司製造)設定為0.03重量份、將高氯酸鋰為10%的醋酸乙酯溶液設定為1重量份以外,與比較例1同樣地進行操作,獲得了比較例2的防靜電表面保護膜。 In addition to setting polyether-modified polysiloxane (product name: SH8400, manufactured by Dow Corning Toray Co., Ltd.) to 0.03 parts by weight, and 10% ethyl acetate solution of lithium perchlorate to 1 weight Other operations were performed in the same manner as in Comparative Example 1, and an antistatic surface protective film of Comparative Example 2 was obtained.

(實施例4) (Example 4)

將丙烯酸2-乙基己酯、丙烯酸丁酯和丙烯酸2-羥乙酯以60:40:4的重量比進行共聚而成的重均分子量為48萬的丙烯酸酯共聚物30重量份,溶解於70重量份的醋酸乙酯中形成黏接劑(固體成分含量為30%的醋酸乙酯溶液),相對於100重量份的該黏接劑添加並混合1.2重量份的HDI類硬化劑(產品名稱為Coronate HX,日本聚氨酯工業(股)公司製造)而獲得塗抹液,使用該塗抹液來代替實施例1的塗抹液,除此以外,與實施例1同樣地進行操作,獲得了實施例4的防靜電表面保護膜。 30 parts by weight of an acrylate copolymer having a weight average molecular weight of 480,000 obtained by copolymerizing 2-ethylhexyl acrylate, butyl acrylate, and 2-hydroxyethyl acrylate at a weight ratio of 60: 40: 4, was dissolved in An adhesive (70% ethyl acetate solution with a solid content of 30%) is formed in 70 parts by weight of ethyl acetate, and 1.2 parts by weight of HDI-based hardener (product name is added and mixed with 100 parts by weight of the adhesive). Coronate HX (manufactured by Nippon Polyurethane Industry Co., Ltd.) was used to obtain an application liquid, and this application liquid was used in place of the application liquid of Example 1, except that the same operation was performed as in Example 1 to obtain Example 4 Anti-static surface protective film.

(實施例5) (Example 5)

將丙烯酸2-乙基己酯、甲氧基聚乙二醇(400)甲基丙烯酸酯和丙烯酸2-羥乙酯以90:10:4的重量比進行共聚而成的重均 分子量為38萬的(甲基)丙烯酸酯共聚物30重量份,溶解於70重量份的醋酸乙酯中形成黏接劑(固體成分含量為30%的醋酸乙酯溶液),相對於100重量份的該黏接劑添加並混合1.2重量份的HDI類硬化劑(產品名稱為Coronate HX,日本聚氨酯工業(股)公司製造)而獲得塗抹液,使用該塗抹液來代替實施例1的塗抹液,除此以外,與實施例1同樣地進行操作,獲得了實施例5的防靜電表面保護膜。 Weight average by copolymerizing 2-ethylhexyl acrylate, methoxypolyethylene glycol (400) methacrylate and 2-hydroxyethyl acrylate at a weight ratio of 90: 10: 4 30 parts by weight of a (meth) acrylate copolymer having a molecular weight of 380,000, dissolved in 70 parts by weight of ethyl acetate to form an adhesive (solid acetate content of 30% ethyl acetate solution), relative to 100 parts by weight This adhesive was added with 1.2 parts by weight of a HDI-based hardener (product name: Coronate HX, manufactured by Japan Polyurethane Industry Co., Ltd.) to obtain an application liquid, and the application liquid was used instead of the application liquid of Example 1. Other than that, it carried out similarly to Example 1, and obtained the antistatic surface protection film of Example 5.

(實施例6) (Example 6)

將丙烯酸2-乙基己酯與丙烯酸以100:4的重量比進行共聚而成的重均分子量為52萬的丙烯酸酯共聚物30重量份,溶解於70重量份的醋酸乙酯中形成黏接劑(固體成分含量為30%的醋酸乙酯溶液),相對於100重量份的該黏接劑添加並混合1.0重量份的環氧類硬化劑(產品名稱為TETRAD-C,三菱瓦斯化學(股)公司(Mitsubishi Gas Chemical Company Inc.)製造)而獲得塗抹液,使用該塗抹液來代替實施例1的塗抹液,除此以外與實施例1同樣地進行操作,獲得了實施例6的防靜電表面保護膜。 30 parts by weight of an acrylate copolymer having a weight average molecular weight of 520,000, which was obtained by copolymerizing 2-ethylhexyl acrylate and acrylic acid at a weight ratio of 100: 4, was dissolved in 70 parts by weight of ethyl acetate to form adhesion. Agent (solid content 30% ethyl acetate solution), and 1.0 part by weight of epoxy-based hardener (product name is TETRAD-C, Mitsubishi Gas Chemical Co., Ltd. is added to 100 parts by weight of the adhesive). ) (Manufactured by Mitsubishi Gas Chemical Company Inc.) to obtain an application liquid, and using this application liquid instead of the application liquid of Example 1, the same operation as in Example 1 was performed to obtain the antistatic of Example 6. Surface protective film.

下面示出評價試驗的方法和結果。 The methods and results of the evaluation tests are shown below.

<剝離膜的剝離力的測定方法> <Method for measuring peeling force of release film>

以寬度50mm、長度150mm的尺寸切割防靜電表面保護膜的試樣。在23℃×50%RH的試驗環境下,使用拉伸試驗機以300mm/分鐘的剝離速度向180°方向剝掉剝離膜,測定此時的強度,並將其作為剝離膜的剝離力(N/50mm)。 A sample of the antistatic surface protective film was cut with a width of 50 mm and a length of 150 mm. In a test environment of 23 ° C. × 50% RH, the peeling film was peeled in a 180 ° direction at a peeling speed of 300 mm / min using a tensile tester, and the strength at this time was measured, and this was used as the peeling force of the peeling film (N / 50mm).

<防靜電表面保護膜的黏接力的測定方法> <Method for measuring adhesive force of antistatic surface protective film>

採用貼合機在玻璃板表面貼合了防眩低反射處理偏光板 (AG-LR偏光板)。然後,將切割成寬度為25mm的防靜電表面保護膜貼合於偏光板的表面後,在23℃×50%RH的試驗環境下保管1天。然後,使用拉伸試驗機以300mm/分鐘的剝離速度向180°方向剝離掉防靜電表面保護膜,測定此時的強度,並將其作為黏接力(N/25mm)。 An antiglare and low-reflection polarizer is laminated on the surface of the glass plate using a laminator (AG-LR polarizer). Then, an antistatic surface protective film cut into a width of 25 mm was bonded to the surface of the polarizing plate, and then stored in a test environment at 23 ° C. × 50% RH for one day. Then, the antistatic surface protective film was peeled off in a 180 ° direction at a peeling speed of 300 mm / min using a tensile tester, and the strength at this time was measured as the adhesive force (N / 25 mm).

<防靜電表面保護膜的剝離靜電壓的測定方法> <Method for measuring peeling static voltage of antistatic surface protective film>

採用貼合機在玻璃板表面貼合了防眩低反射處理偏光板(AG-LR偏光板)。然後,將切割成寬度為25mm的防靜電表面保護膜貼合於偏光板的表面後,在23℃×50%RH的試驗環境下保管1天。然後,在使用高速剝離試驗機(TESTER產業(股)公司(TESTER Sangyo Co.,Ltd.)製造)以每分鐘40m的剝離速度剝離防靜電表面保護膜的同時,使用表面電位計(基恩士(股)公司(Keyence Corporation)製造)每10ms測定前述偏光板表面的表面電位,並將此時的表面電位絕對值的最大值作為剝離靜電壓(kV)。 An anti-glare low-reflection polarizer (AG-LR polarizer) was bonded to the surface of the glass plate using a laminator. Then, an antistatic surface protective film cut into a width of 25 mm was bonded to the surface of the polarizing plate, and then stored in a test environment at 23 ° C. × 50% RH for one day. Then, while using a high-speed peel tester (manufactured by TESTER Sangyo Co., Ltd.) to peel off the antistatic surface protective film at a peel rate of 40 m per minute, a surface potentiometer (Keyence The surface potential of the surface of the polarizing plate was measured every 10 ms, and the maximum value of the absolute value of the surface potential at this time was taken as the peeling static voltage (kV).

<防靜電表面保護膜的表面污染性的確認方法> <Confirmation method of surface contamination property of antistatic surface protection film>

採用貼合機在玻璃板表面貼合了防眩低反射處理偏光板(AG-LR偏光板)。然後,將切割成寬度為25mm的防靜電表面保護膜貼合於偏光板的表面後,在23℃×50%RH的試驗環境下保管3天和30天。然後,剝下防靜電表面保護膜,藉由目測觀察了偏光板表面的污染性。作為表面污染性的判定基準,當偏光板上無污染轉移時判定為(○),當確認偏光板上有污染轉移時判定為(╳)。 An anti-glare low-reflection polarizer (AG-LR polarizer) was bonded to the surface of the glass plate using a laminator. Then, an antistatic surface protective film cut into a width of 25 mm was bonded to the surface of the polarizing plate, and then stored in a test environment at 23 ° C. × 50% RH for 3 days and 30 days. Then, the antistatic surface protective film was peeled off, and the contamination of the surface of the polarizing plate was visually observed. As a criterion for determining the surface contamination, it was judged (○) when there was no pollution transfer on the polarizing plate, and (,) when it was confirmed that there was pollution transfer on the polarizing plate.

對所得到的實施例1~6和比較例1~2的防靜電表面保護膜進行測定,並將測定結果示於表1~2中。其中, “2EHA”是指丙烯酸2-乙基己酯,“HEA”是指丙烯酸2-羥乙酯,“BA”是指丙烯酸丁酯,“#400G”是指甲氧基聚乙二醇(400)甲基丙烯酸酯,“AA”是指丙烯酸,“LiClO4”是指高氯酸鋰,“Li(CF3SO2)2N”是指雙(三氟甲烷磺醯)亞胺鋰。黏接劑層和剝離劑層的組成,是以使黏接劑總量或者形成剝離劑層的塗料總量分別成為約100重量份的方式用重量份進行表示。 The obtained antistatic surface protective films of Examples 1 to 6 and Comparative Examples 1 to 2 were measured, and the measurement results are shown in Tables 1 to 2. Among them, "2EHA" refers to 2-ethylhexyl acrylate, "HEA" refers to 2-hydroxyethyl acrylate, "BA" refers to butyl acrylate, and "# 400G" refers to nailoxy polyethylene glycol (400 ) Methacrylate, "AA" means acrylic acid, "LiClO 4 " means lithium perchlorate, and "Li (CF 3 SO 2 ) 2 N" means lithium bis (trifluoromethanesulfonium) imide. The composition of the adhesive layer and the release agent layer is expressed in parts by weight such that the total amount of the adhesive agent or the total amount of the coating material forming the release agent layer is approximately 100 parts by weight.

根據表1和表2所示的測定結果,可知下述情況。 From the measurement results shown in Tables 1 and 2, the following cases are known.

本發明實施例1~6的防靜電表面保護膜具有適當的黏接力,並對被黏附體表面沒有污染,而且,從被黏附體上剝離防靜電表面保護膜時的剝離靜電壓低。 The anti-static surface protection films of Examples 1 to 6 of the present invention have proper adhesion, have no pollution to the surface of the adherend, and have a low peeling static voltage when the anti-static surface protection film is peeled from the adherend.

另一方面,對於在黏接劑層中添加了聚矽氧烷化合物和防靜電劑的、比較例1的防靜電表面保護膜而言,從被黏附體上 剝離防靜電表面保護膜時的剝離靜電壓低而良好,但剝離後對被黏附體的污染多。另外,在減少了防靜電劑和聚矽氧烷化合物的量的比較例2中,雖改善了對被黏附體的污染性,但從被黏附體上剝離防靜電表面保護膜時的剝離靜電壓高。 On the other hand, the antistatic surface protective film of Comparative Example 1 in which a polysiloxane compound and an antistatic agent were added to the adhesive layer was obtained from the adherend. When the antistatic surface protective film is peeled off, the peeling static voltage is low and good, but there is much contamination of the adherend after peeling. In Comparative Example 2 in which the amounts of the antistatic agent and the polysiloxane compound were reduced, although the contamination of the adherend was improved, the peeling static voltage when the antistatic surface protective film was peeled from the adherend high.

即,在黏接劑中混合了聚矽氧烷化合物和防靜電劑的比較例1、2中,難以同時滿足剝離靜電壓的降低和對被黏附體的污染性的改善。另一方面,在剝離劑層中添加了聚矽氧烷化合物和防靜電劑後,使聚矽氧烷化合物和防靜電劑轉移至黏接劑層的表面的實施例1~6,具有能夠以少的添加量降低剝離靜電壓的效果,因此對被黏附體也沒有污染,獲得了良好的防靜電表面保護膜。 That is, in Comparative Examples 1 and 2 in which a polysiloxane compound and an antistatic agent were mixed in an adhesive, it was difficult to satisfy both the reduction of the peeling static voltage and the improvement of the contamination of the adherend. On the other hand, after adding a polysiloxane compound and an antistatic agent to the release agent layer, Examples 1 to 6 in which the polysiloxane compound and the antistatic agent were transferred to the surface of the adhesive layer have the following properties: A small amount of addition reduces the effect of peeling static voltage, so there is no pollution to the adherend, and a good antistatic surface protective film is obtained.

【產業利用性】 [Industrial availability]

本發明的防靜電表面保護膜,例如,能夠應用於偏光板、相位差板、顯示器用透鏡膜等的光學用膜中,此外,在各種光學構件等的生產步驟等中,可為了保護該光學構件等的表面而使用。特別是,當作為表面已用聚矽氧烷化合物、氟化合物等進行過防污染處理的LR偏光板、AG-LR偏光板等光學用膜的防靜電表面保護膜來使用的情況下,能夠減少從被黏附體上剝離時產生的靜電量。 The antistatic surface protective film of the present invention can be applied to, for example, optical films such as polarizing plates, retardation plates, and lens films for displays. In addition, in the production steps of various optical members and the like, the optical films can be protected. Members and other surfaces. In particular, when used as an antistatic surface protective film for an optical film such as an LR polarizing plate or an AG-LR polarizing plate whose surface has been subjected to antifouling treatment with a polysiloxane compound, a fluorine compound, or the like, it can be reduced. The amount of static electricity generated when peeling from the adherend.

本發明的防靜電表面保護膜對被黏附體的污染少並且無經時劣化(不隨著時間推移而發生劣化),具有優良的抗剝離靜電性能,因此能夠提高生產步驟的成品率,在工業上的利用價值高。 The antistatic surface protection film of the invention has less pollution to the adherend and does not deteriorate with time (does not deteriorate over time), and has excellent anti-peeling static performance, so it can improve the yield of the production step. High utilization value.

1‧‧‧基材膜 1‧‧‧ substrate film

2‧‧‧黏接劑層 2‧‧‧adhesive layer

3‧‧‧樹脂膜 3‧‧‧ resin film

4‧‧‧剝離劑層 4‧‧‧ peeling agent layer

5‧‧‧剝離膜 5‧‧‧ peeling film

7‧‧‧20℃下是液體的聚矽氧烷類化合物和防靜電劑 Polysiloxanes and antistatic agents that are liquid at 7‧‧‧20 ° C

10‧‧‧防靜電表面保護膜 10‧‧‧Anti-static surface protective film

Claims (5)

一種防靜電表面保護膜用剝離膜,其特徵在於,能夠將防靜電劑僅轉印至在基材膜的單面上形成黏接劑層的防靜電表面保護膜的該黏接劑層的表面上,其中,該防靜電表面保護膜用剝離膜係在樹脂膜單面上直接地層疊含有防靜電劑的剝離劑層,該剝離劑層是藉由含有以二甲基聚矽氧烷作為主要成分的剝離劑、20℃下是液體的聚矽氧烷類化合物的聚醚改性聚矽氧烷、和防靜電劑的樹脂組成物來形成,該黏接劑層是使含有(甲基)丙烯酸酯共聚物和交聯劑的黏接劑組成物交聯而成的丙烯酸類黏接劑層,將該防靜電表面保護膜用剝離膜介隔該剝離劑層貼合於該黏接劑層的表面時,能夠將該剝離劑層的防靜電劑僅轉印至該黏接劑層的表面上。 A release film for an antistatic surface protection film, characterized in that the antistatic agent can be transferred only to the surface of the adhesive layer of the antistatic surface protection film that forms an adhesive layer on one side of the base film. In the above, the release film for an antistatic surface protection film is a laminate of a release agent layer containing an antistatic agent directly on one side of a resin film. The release agent layer contains dimethylpolysiloxane as a main component. A component release agent, a polyether-modified polysiloxane containing a polysiloxane compound that is liquid at 20 ° C., and a resin composition of an antistatic agent are formed, and the adhesive layer contains (meth) An acrylic adhesive layer obtained by cross-linking an acrylate copolymer and an adhesive composition of a cross-linking agent. The anti-static surface protective film is adhered to the adhesive layer with the release film interposed therebetween. In the case of a surface, the antistatic agent of the release agent layer can be transferred only to the surface of the adhesive layer. 如申請專利範圍第1項之防靜電表面保護膜用剝離膜,其特徵在於,該剝離劑層含有相對於以該二甲基聚矽氧烷作為主要成分的剝離劑的固體成分100重量份,該聚醚改性聚矽氧烷和防靜電劑以固體成分計為5~100重量份的比例。 For example, the release film for an antistatic surface protection film according to item 1 of the application, wherein the release agent layer contains 100 parts by weight of the solid content of the release agent containing the dimethylpolysiloxane as a main component. The polyether-modified polysiloxane and the antistatic agent have a ratio of 5 to 100 parts by weight based on the solid content. 如申請專利範圍第1或2項之防靜電表面保護膜用剝離膜,其特徵在於,將該防靜電表面保護膜用剝離膜介隔該剝離劑層貼合於該黏接劑層的表面後,在23℃×50%RH的試驗環境下,使用拉伸試驗機以300mm/分鐘的剝離速度向180°方向自該黏接劑層剝掉該防靜電表面保護膜用剝離膜時的剝離力為0.2N/50mm以下。 For example, the release film for an antistatic surface protection film according to item 1 or 2 of the patent application scope, characterized in that the release film for the antistatic surface protection film is bonded to the surface of the adhesive layer with the release agent layer interposed In a test environment of 23 ° C. × 50% RH, the peeling force when peeling the release film for an antistatic surface protection film from the adhesive layer at a peeling speed of 300 mm / min in a direction of 180 ° using a tensile tester It is 0.2N / 50mm or less. 如申請專利範圍第1或2項之防靜電表面保護膜用剝離膜,其特徵在於,該防靜電劑是鹼金屬鹽。 For example, the release film for an antistatic surface protection film according to item 1 or 2 of the patent application scope, wherein the antistatic agent is an alkali metal salt. 一種光學用膜用的防靜電表面保護膜,其貼合有如申請專利範圍第1至4項中任一項之防靜電表面保護膜用剝離膜。 An antistatic surface protection film for an optical film, which is bonded with a release film for an antistatic surface protection film according to any one of claims 1 to 4 of the scope of patent application.
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