TWI617393B - 用於ｃｍｐ硏磨頭的基板進動機制 - Google Patents

用於ｃｍｐ硏磨頭的基板進動機制 Download PDF

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Publication number
TWI617393B
TWI617393B TW103107644A TW103107644A TWI617393B TW I617393 B TWI617393 B TW I617393B TW 103107644 A TW103107644 A TW 103107644A TW 103107644 A TW103107644 A TW 103107644A TW I617393 B TWI617393 B TW I617393B
Authority
TW
Taiwan
Prior art keywords
assembly
fixed ring
head assembly
substrate
gear
Prior art date
Application number
TW103107644A
Other languages
English (en)
Chinese (zh)
Other versions
TW201446417A (zh
Inventor
陳志宏
丹達維特果譚沙杉克
古魯薩米傑
徐主強
Original Assignee
應用材料股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 應用材料股份有限公司 filed Critical 應用材料股份有限公司
Publication of TW201446417A publication Critical patent/TW201446417A/zh
Application granted granted Critical
Publication of TWI617393B publication Critical patent/TWI617393B/zh

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/27—Work carriers
    • B24B37/30—Work carriers for single side lapping of plane surfaces
    • B24B37/32—Retaining rings

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
TW103107644A 2013-03-14 2014-03-06 用於ｃｍｐ硏磨頭的基板進動機制 TWI617393B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/827,629 2013-03-14
US13/827,629 US20140273756A1 (en) 2013-03-14 2013-03-14 Substrate precession mechanism for cmp polishing head

Publications (2)

Publication Number Publication Date
TW201446417A TW201446417A (zh) 2014-12-16
TWI617393B true TWI617393B (zh) 2018-03-11

Family

ID=51529186

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103107644A TWI617393B (zh) 2013-03-14 2014-03-06 用於ｃｍｐ硏磨頭的基板進動機制

Country Status (6)

Country Link
US (1) US20140273756A1 (https=)
JP (1) JP6581964B2 (https=)
KR (1) KR102243725B1 (https=)
CN (1) CN105190845B (https=)
TW (1) TWI617393B (https=)
WO (1) WO2014158548A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11986923B2 (en) 2020-11-10 2024-05-21 Applied Materials, Inc. Polishing head with local wafer pressure

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014163735A1 (en) * 2013-03-13 2014-10-09 Applied Materials, Inc. Reinforcement ring for carrier head
US20140273756A1 (en) * 2013-03-14 2014-09-18 Chih Hung Chen Substrate precession mechanism for cmp polishing head
JP7051332B2 (ja) 2017-08-23 2022-04-11 キヤノン株式会社 有機化合物及び光電変換素子
KR102459832B1 (ko) * 2017-11-22 2022-10-28 주식회사 케이씨텍 캐리어
TWI639486B (zh) * 2018-05-31 2018-11-01 國立清華大學 全向整合式調節裝置
WO2023229658A1 (en) * 2022-05-27 2023-11-30 Applied Materials, Inc. Clamping retainer for chemical mechanical polishing and method of operation

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6729946B2 (en) * 2000-04-17 2004-05-04 Ebara Corporation Polishing apparatus
US7338569B2 (en) * 2004-09-29 2008-03-04 Agere Systems Inc. Method and system of using offset gage for CMP polishing pad alignment and adjustment
CN101396805A (zh) * 2006-11-22 2009-04-01 应用材料股份有限公司 具有保持环和夹持环的研磨头

Family Cites Families (15)

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Publication number Priority date Publication date Assignee Title
JP2008229846A (ja) * 1995-10-09 2008-10-02 Ebara Corp ポリッシング装置及び方法並びにトップリング
JP3724869B2 (ja) * 1995-10-09 2005-12-07 株式会社荏原製作所 ポリッシング装置および方法
JPH10156712A (ja) * 1996-11-29 1998-06-16 Oki Electric Ind Co Ltd ウエハ研磨装置
JP2000334655A (ja) * 1999-05-26 2000-12-05 Matsushita Electric Ind Co Ltd Ｃｍｐ加工装置
US7198561B2 (en) * 2000-07-25 2007-04-03 Applied Materials, Inc. Flexible membrane for multi-chamber carrier head
US6527625B1 (en) * 2000-08-31 2003-03-04 Multi-Planar Technologies, Inc. Chemical mechanical polishing apparatus and method having a soft backed polishing head
CN101607381B (zh) * 2000-08-31 2014-04-16 株式会社荏原制作所 化学机械抛光头、设备和方法以及平面化半导体晶片
JP2004106173A (ja) * 2002-08-29 2004-04-08 Fujikoshi Mach Corp 両面研磨装置
KR100502362B1 (ko) * 2003-08-05 2005-07-21 두산디앤디 주식회사 컨디셔너 캐리어용 복합운동기구가 구비된 반도체 웨이퍼표면연마장비
US20080076253A1 (en) * 2004-09-30 2008-03-27 Hiroshi Fukada Adhesive Sheet,Semiconductor Device,and Process for Producing Semiconductor Device
US7699688B2 (en) * 2006-11-22 2010-04-20 Applied Materials, Inc. Carrier ring for carrier head
KR101022277B1 (ko) * 2009-02-25 2011-03-21 그린스펙(주) 실리콘 베어 웨이퍼 연마장치용 캐리어 헤드
JP5303491B2 (ja) * 2010-02-19 2013-10-02 信越半導体株式会社 研磨ヘッド及び研磨装置
US20130288577A1 (en) * 2012-04-27 2013-10-31 Applied Materials, Inc. Methods and apparatus for active substrate precession during chemical mechanical polishing
US20140273756A1 (en) * 2013-03-14 2014-09-18 Chih Hung Chen Substrate precession mechanism for cmp polishing head

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6729946B2 (en) * 2000-04-17 2004-05-04 Ebara Corporation Polishing apparatus
US7338569B2 (en) * 2004-09-29 2008-03-04 Agere Systems Inc. Method and system of using offset gage for CMP polishing pad alignment and adjustment
CN101396805A (zh) * 2006-11-22 2009-04-01 应用材料股份有限公司 具有保持环和夹持环的研磨头

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11986923B2 (en) 2020-11-10 2024-05-21 Applied Materials, Inc. Polishing head with local wafer pressure
US12251788B2 (en) 2020-11-10 2025-03-18 Applied Materials, Inc. Polishing head with local wafer pressure

Also Published As

Publication number Publication date
KR102243725B1 (ko) 2021-04-23
US20140273756A1 (en) 2014-09-18
JP2016515303A (ja) 2016-05-26
JP6581964B2 (ja) 2019-09-25
CN105190845B (zh) 2019-02-22
TW201446417A (zh) 2014-12-16
WO2014158548A1 (en) 2014-10-02
KR20150132842A (ko) 2015-11-26
CN105190845A (zh) 2015-12-23

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