TWI612851B - 用於極紫外線光源的系統、將自極紫外光系統產生之照射放大光束相對於標靶材料對準的方法及極紫外光系統 - Google Patents
用於極紫外線光源的系統、將自極紫外光系統產生之照射放大光束相對於標靶材料對準的方法及極紫外光系統 Download PDFInfo
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- TWI612851B TWI612851B TW103109580A TW103109580A TWI612851B TW I612851 B TWI612851 B TW I612851B TW 103109580 A TW103109580 A TW 103109580A TW 103109580 A TW103109580 A TW 103109580A TW I612851 B TWI612851 B TW I612851B
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Classifications
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—Production of X-ray radiation generated from plasma
- H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
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- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- X-Ray Techniques (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201361787228P | 2013-03-15 | 2013-03-15 | |
| US61/787,228 | 2013-03-15 | ||
| US14/035,847 | 2013-09-24 | ||
| US14/035,847 US8872144B1 (en) | 2013-09-24 | 2013-09-24 | System and method for laser beam focus control for extreme ultraviolet laser produced plasma source |
| US14/184,777 US9000405B2 (en) | 2013-03-15 | 2014-02-20 | Beam position control for an extreme ultraviolet light source |
| US14/184,777 | 2014-02-20 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201444418A TW201444418A (zh) | 2014-11-16 |
| TWI612851B true TWI612851B (zh) | 2018-01-21 |
Family
ID=51580614
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW103109580A TWI612851B (zh) | 2013-03-15 | 2014-03-14 | 用於極紫外線光源的系統、將自極紫外光系統產生之照射放大光束相對於標靶材料對準的方法及極紫外光系統 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP6374481B2 (ko) |
| KR (1) | KR102214861B1 (ko) |
| TW (1) | TWI612851B (ko) |
| WO (1) | WO2014149435A1 (ko) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9820368B2 (en) | 2015-08-12 | 2017-11-14 | Asml Netherlands B.V. | Target expansion rate control in an extreme ultraviolet light source |
| TWI739755B (zh) * | 2015-08-12 | 2021-09-21 | 荷蘭商Ａｓｍｌ荷蘭公司 | 極紫外線光源中之目標擴張率控制 |
| US10663866B2 (en) * | 2016-09-20 | 2020-05-26 | Asml Netherlands B.V. | Wavelength-based optical filtering |
| US10935720B2 (en) * | 2019-04-29 | 2021-03-02 | Ii-Vi Delaware, Inc. | Laser beam product parameter adjustments |
| KR20210152703A (ko) | 2020-06-09 | 2021-12-16 | 삼성전자주식회사 | 반도체 제조 장치 및 그의 동작 방법 |
| JP2023535267A (ja) * | 2020-07-30 | 2023-08-17 | エーエスエムエル ネザーランズ ビー．ブイ． | Ｅｕｖ光源のターゲット計測 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20110141865A1 (en) * | 2009-12-15 | 2011-06-16 | Cymer Inc. | Metrology for Extreme Ultraviolet Light Source |
| US20120019826A1 (en) * | 2010-07-22 | 2012-01-26 | Cymer, Inc. | Alignment of light source focus |
| US8173985B2 (en) * | 2009-12-15 | 2012-05-08 | Cymer, Inc. | Beam transport system for extreme ultraviolet light source |
| US20130020511A1 (en) * | 2010-10-08 | 2013-01-24 | Gigaphoton Inc | Mirror, mirror device, laser apparatus, and extreme ultraviolet light generation apparatus |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3256984B2 (ja) * | 1991-06-13 | 2002-02-18 | ソニー・プレシジョン・テクノロジー株式会社 | 変位検出装置 |
| US7598509B2 (en) * | 2004-11-01 | 2009-10-06 | Cymer, Inc. | Laser produced plasma EUV light source |
| US7087914B2 (en) * | 2004-03-17 | 2006-08-08 | Cymer, Inc | High repetition rate laser produced plasma EUV light source |
| JP5368261B2 (ja) * | 2008-11-06 | 2013-12-18 | ギガフォトン株式会社 | 極端紫外光源装置、極端紫外光源装置の制御方法 |
| US8283643B2 (en) * | 2008-11-24 | 2012-10-09 | Cymer, Inc. | Systems and methods for drive laser beam delivery in an EUV light source |
-
2014
- 2014-02-25 JP JP2016500393A patent/JP6374481B2/ja active Active
- 2014-02-25 WO PCT/US2014/018419 patent/WO2014149435A1/en active Application Filing
- 2014-02-25 KR KR1020157028292A patent/KR102214861B1/ko active IP Right Grant
- 2014-03-14 TW TW103109580A patent/TWI612851B/zh active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20110141865A1 (en) * | 2009-12-15 | 2011-06-16 | Cymer Inc. | Metrology for Extreme Ultraviolet Light Source |
| US8173985B2 (en) * | 2009-12-15 | 2012-05-08 | Cymer, Inc. | Beam transport system for extreme ultraviolet light source |
| US20120019826A1 (en) * | 2010-07-22 | 2012-01-26 | Cymer, Inc. | Alignment of light source focus |
| US20130020511A1 (en) * | 2010-10-08 | 2013-01-24 | Gigaphoton Inc | Mirror, mirror device, laser apparatus, and extreme ultraviolet light generation apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| KR102214861B1 (ko) | 2021-02-10 |
| JP6374481B2 (ja) | 2018-08-15 |
| JP2016512383A (ja) | 2016-04-25 |
| TW201444418A (zh) | 2014-11-16 |
| WO2014149435A1 (en) | 2014-09-25 |
| KR20150130440A (ko) | 2015-11-23 |
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