TWI605249B - 使用無固定形式管理區域之晶圓檢查 - Google Patents

使用無固定形式管理區域之晶圓檢查 Download PDF

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Publication number
TWI605249B
TWI605249B TW103121424A TW103121424A TWI605249B TW I605249 B TWI605249 B TW I605249B TW 103121424 A TW103121424 A TW 103121424A TW 103121424 A TW103121424 A TW 103121424A TW I605249 B TWI605249 B TW I605249B
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TW
Taiwan
Prior art keywords
images
wafer
management
interest
patterns
Prior art date
Application number
TW103121424A
Other languages
English (en)
Chinese (zh)
Other versions
TW201510516A (zh
Inventor
吳肯翁
羅濤
高理升
尤金 雪芬
亞瑞文迪 百拉吉
Original Assignee
克萊譚克公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 克萊譚克公司 filed Critical 克萊譚克公司
Publication of TW201510516A publication Critical patent/TW201510516A/zh
Application granted granted Critical
Publication of TWI605249B publication Critical patent/TWI605249B/zh

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Classifications

    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • G06T7/001—Industrial image inspection using an image reference approach
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/10—Image acquisition modality
    • G06T2207/10056—Microscopic image
    • G06T2207/10061—Microscopic image from scanning electron microscope
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30108—Industrial image inspection
    • G06T2207/30148—Semiconductor; IC; Wafer

Landscapes

  • Engineering & Computer Science (AREA)
  • Quality & Reliability (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Image Processing (AREA)
  • Image Analysis (AREA)
TW103121424A 2013-06-21 2014-06-20 使用無固定形式管理區域之晶圓檢查 TWI605249B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201361837936P 2013-06-21 2013-06-21
US201361913380P 2013-12-08 2013-12-08
US14/168,011 US9171364B2 (en) 2013-06-21 2014-01-30 Wafer inspection using free-form care areas

Publications (2)

Publication Number Publication Date
TW201510516A TW201510516A (zh) 2015-03-16
TWI605249B true TWI605249B (zh) 2017-11-11

Family

ID=52105363

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103121424A TWI605249B (zh) 2013-06-21 2014-06-20 使用無固定形式管理區域之晶圓檢查

Country Status (7)

Country Link
US (1) US9171364B2 (enExample)
JP (1) JP6220061B2 (enExample)
KR (1) KR102110634B1 (enExample)
CN (1) CN105453245B (enExample)
IL (1) IL243236B (enExample)
TW (1) TWI605249B (enExample)
WO (1) WO2014205385A1 (enExample)

Cited By (1)

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TWI713672B (zh) * 2016-01-11 2020-12-21 美商克萊譚克公司 為樣品產生模擬輸出之系統，非暫時性電腦可讀媒體及電腦實施方法

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US9171364B2 (en) * 2013-06-21 2015-10-27 Kla-Tencor Corp. Wafer inspection using free-form care areas
US9401016B2 (en) 2014-05-12 2016-07-26 Kla-Tencor Corp. Using high resolution full die image data for inspection
US10339262B2 (en) * 2016-03-29 2019-07-02 Kla-Tencor Corporation System and method for defining care areas in repeating structures of design data
US10740888B2 (en) * 2016-04-22 2020-08-11 Kla-Tencor Corporation Computer assisted weak pattern detection and quantification system
US10146036B2 (en) 2016-06-07 2018-12-04 Globalfoundries Inc. Semiconductor wafer inspection using care area group-specific threshold settings for detecting defects
US11580398B2 (en) * 2016-10-14 2023-02-14 KLA-Tenor Corp. Diagnostic systems and methods for deep learning models configured for semiconductor applications
US10679909B2 (en) * 2016-11-21 2020-06-09 Kla-Tencor Corporation System, method and non-transitory computer readable medium for tuning sensitivies of, and determining a process window for, a modulated wafer
US10402688B2 (en) * 2016-12-07 2019-09-03 Kla-Tencor Corporation Data augmentation for convolutional neural network-based defect inspection
US10692690B2 (en) 2017-03-27 2020-06-23 Kla-Tencor Corporation Care areas for improved electron beam defect detection
US10600177B2 (en) * 2017-08-09 2020-03-24 Kla-Tencor Corporation Nuisance reduction using location-based attributes
US10997710B2 (en) * 2017-10-18 2021-05-04 Kla-Tencor Corporation Adaptive care areas for die-die inspection
CN109560000B (zh) * 2018-11-30 2020-08-25 上海华力微电子有限公司 一种晶圆缺陷扫描方法
US11776859B2 (en) 2018-12-19 2023-10-03 Kla Corporation Care area based swath speed for throughput and sensitivity improvement
US11379972B2 (en) 2020-06-03 2022-07-05 Applied Materials Israel Ltd. Detecting defects in semiconductor specimens using weak labeling
US20220101114A1 (en) * 2020-09-27 2022-03-31 Kla Corporation Interpretable deep learning-based defect detection and classification
US12165306B2 (en) * 2021-03-16 2024-12-10 Kla Corporation Segmentation of design care areas with a rendered design image
WO2023026489A1 (ja) * 2021-08-27 2023-03-02 株式会社日立ハイテク コンピュータシステムおよび解析方法
US20230128610A1 (en) * 2021-10-25 2023-04-27 Kla Corporation Continuous Machine Learning Model Training for Semiconductor Manufacturing

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JP3566470B2 (ja) * 1996-09-17 2004-09-15 株式会社日立製作所 パターン検査方法及びその装置
WO2007026361A2 (en) 2005-09-01 2007-03-08 Camtek Limited A method and a system for establishing an inspection recipe
US7570796B2 (en) * 2005-11-18 2009-08-04 Kla-Tencor Technologies Corp. Methods and systems for utilizing design data in combination with inspection data
US7676077B2 (en) * 2005-11-18 2010-03-09 Kla-Tencor Technologies Corp. Methods and systems for utilizing design data in combination with inspection data
US8045786B2 (en) 2006-10-24 2011-10-25 Kla-Tencor Technologies Corp. Waferless recipe optimization
US7894659B2 (en) 2007-02-28 2011-02-22 Kla-Tencor Technologies Corp. Methods for accurate identification of an edge of a care area for an array area formed on a wafer and methods for binning defects detected in an array area formed on a wafer
CN101295659B (zh) * 2007-04-29 2010-06-09 中芯国际集成电路制造(上海)有限公司 半导体器件的缺陷检测方法
US8254661B2 (en) 2008-06-02 2012-08-28 Applied Materials Israel, Ltd. System and method for generating spatial signatures
KR101342203B1 (ko) * 2010-01-05 2013-12-16 가부시키가이샤 히다치 하이테크놀로지즈 Ｓｅｍ을 이용한 결함 검사 방법 및 장치
US8559001B2 (en) 2010-01-11 2013-10-15 Kla-Tencor Corporation Inspection guided overlay metrology
JP5722551B2 (ja) * 2010-05-13 2015-05-20 株式会社日立ハイテクノロジーズ 欠陥検査方法及びその装置
JP2012255740A (ja) * 2011-06-10 2012-12-27 Fujitsu Semiconductor Ltd 欠陥検査装置および欠陥検査方法
US9189844B2 (en) * 2012-10-15 2015-11-17 Kla-Tencor Corp. Detecting defects on a wafer using defect-specific information
US9092846B2 (en) * 2013-02-01 2015-07-28 Kla-Tencor Corp. Detecting defects on a wafer using defect-specific and multi-channel information
US9171364B2 (en) * 2013-06-21 2015-10-27 Kla-Tencor Corp. Wafer inspection using free-form care areas
US9355208B2 (en) * 2013-07-08 2016-05-31 Kla-Tencor Corp. Detecting defects on a wafer

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI713672B (zh) * 2016-01-11 2020-12-21 美商克萊譚克公司 為樣品產生模擬輸出之系統，非暫時性電腦可讀媒體及電腦實施方法

Also Published As

Publication number Publication date
KR20160022377A (ko) 2016-02-29
KR102110634B1 (ko) 2020-05-13
US9171364B2 (en) 2015-10-27
JP6220061B2 (ja) 2017-10-25
TW201510516A (zh) 2015-03-16
CN105453245B (zh) 2018-10-26
US20140376802A1 (en) 2014-12-25
CN105453245A (zh) 2016-03-30
IL243236B (en) 2019-02-28
JP2016524334A (ja) 2016-08-12
WO2014205385A1 (en) 2014-12-24

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