TWI603138B - Repair structure and display panel thereof - Google Patents

Repair structure and display panel thereof Download PDF

Info

Publication number
TWI603138B
TWI603138B TW105143442A TW105143442A TWI603138B TW I603138 B TWI603138 B TW I603138B TW 105143442 A TW105143442 A TW 105143442A TW 105143442 A TW105143442 A TW 105143442A TW I603138 B TWI603138 B TW I603138B
Authority
TW
Taiwan
Prior art keywords
layer
disposed
protective layer
line
hole
Prior art date
Application number
TW105143442A
Other languages
Chinese (zh)
Other versions
TW201823828A (en
Inventor
林以尊
Original Assignee
友達光電股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 友達光電股份有限公司 filed Critical 友達光電股份有限公司
Priority to TW105143442A priority Critical patent/TWI603138B/en
Priority to CN201710092053.4A priority patent/CN106959559A/en
Application granted granted Critical
Publication of TWI603138B publication Critical patent/TWI603138B/en
Publication of TW201823828A publication Critical patent/TW201823828A/en

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/136259Repairing; Defects
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/136259Repairing; Defects
    • G02F1/136263Line defects
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/136259Repairing; Defects
    • G02F1/136272Auxiliary lines

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Electroluminescent Light Sources (AREA)

Description

修補結構及其顯示面板Repair structure and its display panel

本發明是有關於一種修補結構及其顯示面板,且特別是有關於一種能達到良好修補效果的修補結構及其顯示面板。The present invention relates to a repair structure and a display panel thereof, and more particularly to a repair structure and a display panel thereof which can achieve a good repair effect.

顯示裝置包括陣列基板、對向基板以及填充於兩基板之間的顯示介電層。其中,陣列基板上設置有大量的訊號線(例如掃描線和資料線)。但是在生產過程中,大量設置的訊號線會有斷線的問題,這時斷線上的訊號就不能得到正常訊號傳輸,從而形成顯示面板的顯示缺陷,因此需要一些訊號線的修補方法,以降低生產成本。The display device includes an array substrate, a counter substrate, and a display dielectric layer filled between the two substrates. The array substrate is provided with a large number of signal lines (such as scan lines and data lines). However, in the production process, a large number of signal lines may be disconnected. At this time, the signal on the broken line cannot be transmitted normally, thereby forming display defects of the display panel. Therefore, some signal line repair methods are needed to reduce the number of signal lines. Cost of production.

現今常使用的方式為雷射焊接(laser welding) 或/及雷射切割(laser cutting)的方式來進行。然而雷射線的能量如控制太小,有修補不完全的問題;雷射線的能量如控制太大,則可能將周圍導線破壞的問題存在。The method commonly used today is carried out by means of laser welding or/and laser cutting. However, if the energy of the lightning ray is too small, there is a problem of incomplete repair; if the energy of the lightning ray is too large, the problem of damage of the surrounding wires may exist.

本發明提供一種修補結構及其顯示面板,其可以避免修補結構及其顯示面板之訊號線修補過程造成的金屬屑飛濺。更甚而,本發明之修補結構可在不大幅增加製程步驟與成本的前提下製作出,而可有效降低生產成本。The invention provides a repair structure and a display panel thereof, which can avoid metal chip splash caused by the signal line repairing process of the repair structure and the display panel thereof. Moreover, the repair structure of the present invention can be produced without greatly increasing the number of process steps and costs, and can effectively reduce the production cost.

本發明提供一種修補結構,包括修補線、訊號線、絕緣層、輔助層以及阻擋層。修補線,設置於基板上。訊號線,設置於基板上,且訊號線與修補線交叉設置。絕緣層,設置於修補線與訊號線之間。輔助層,設置於絕緣層上,且輔助層具有孔洞,孔洞垂直投影設置於修補線與訊號線重疊之上方。阻擋層,設置於基板上,且阻擋層覆蓋輔助層一部份,且填入孔洞中,其中,輔助層與阻擋層係由非導體材料所構成。The present invention provides a repair structure including a repair line, a signal line, an insulating layer, an auxiliary layer, and a barrier layer. The repair line is disposed on the substrate. The signal line is disposed on the substrate, and the signal line and the repair line are disposed at intersection. The insulating layer is disposed between the repairing line and the signal line. The auxiliary layer is disposed on the insulating layer, and the auxiliary layer has a hole, and the vertical projection of the hole is disposed above the overlap of the repair line and the signal line. The barrier layer is disposed on the substrate, and the barrier layer covers a portion of the auxiliary layer and is filled in the hole, wherein the auxiliary layer and the barrier layer are composed of a non-conductor material.

本發明另提供一種顯示面板,包括如上述之修補結構、對向基板以及顯示介電層。其中,顯示介電層設置於上述之基板與對向基板之間。The present invention further provides a display panel comprising the repair structure, the opposite substrate and the display dielectric layer as described above. The display dielectric layer is disposed between the substrate and the opposite substrate.

為讓本發明之上述特徵和優點能更明顯易懂,下文特舉一些實施例,並配合所附圖式作詳細說明如下。The above described features and advantages of the invention will be apparent from the following description.

以下將以圖式揭露本發明之多個實施方式,為明確說明起見,許多實務上的細節將在以下敘述中一併說明。然而,應瞭解到,這些實務上的細節不應用以限制本發明。也就是說,在本發明部分實施方式中,這些實務上的細節是非必要的。此外,為簡化圖式起見,一些習知慣用的結構與元件在圖式中將以簡單示意的方式為之。The various embodiments of the present invention are disclosed in the drawings, and in the claims However, it should be understood that these practical details are not intended to limit the invention. That is, in some embodiments of the invention, these practical details are not necessary. In addition, some of the conventional structures and elements are shown in the drawings in a simplified manner.

在以下詳細說明中,參考了作為詳細說明的一部分的附圖。在附圖中,類似符號通常表示類似部件,除非上下文另行指明。具體實施方式部分、附圖和權利要求書中記載的示例性實施例並不是限制性的。在不脫離在此所呈現主題的精神或範圍的情況下,可以利用其他實施例,且可以進行其他改變。應當理解,在此一般性記載以及附圖中圖示的本公開的各方案可以按照在此明確和隱含公開的多種不同配置來設置、替換、組合、分割和設計。In the following detailed description, reference is made to the accompanying drawings. In the drawings, like reference characters generally refer to the The exemplary embodiments described in the Detailed Description, the drawings, and the claims are not limiting. Other embodiments may be utilized, and other changes may be made, without departing from the spirit or scope of the subject matter presented herein. It should be understood that the various aspects of the present disclosure, which are set forth in the <RTIgt;

至於文中之用語僅是為描述特定實施例之目的,且並非意欲限制本發明。如本文中所使用的,除非本文另外有明確指示,否則單數形式「一」以及「所述」也代表包括複數的形式或至少一個的形式。而文中使用「第一」、「第二」等來描述各種元件、區、層等,但是這樣的用語僅用以將一元件、區或層區別於另一元件、區或層。因此,可在不偏離本揭示所教示的情況下,將以下討論之第一元件、零件、區域、層和/或部分稱為第二元件、零件、區域、層和/或部分。The words used in the text are for the purpose of describing particular embodiments and are not intended to limit the invention. As used herein, the singular forms " " " The use of "first", "second", etc., is used to describe various elements, regions, layers, etc., but such terms are used to distinguish one element, region or layer from another element, region or layer. Thus, a first element, component, region, layer, and/or portion discussed below may be referred to as a second element, component, region, layer, and/or portion, without departing from the disclosure.

此外,本文中可使用諸如“於...下”、“於...上”、“下”、“上”及其類似之空間相對用語,來描述附圖中之一元件或特徵與另一元件或特徵的關係。應瞭解,空間相對用語可涵蓋使用中之元件除了附圖所描繪之方位以外的不同方位。舉例而言,若將圖中的元件翻轉,則被描述為位於其他元件或特徵“下方”或“之下”的元件接著將定向成位於其他元件或特徵“上方”。因此,空間相對用語“於......下”可包括上方以及下方的兩方位。In addition, spatially relative terms such as "under", "on", "lower", "upper" and the like may be used herein to describe one element or feature in the drawings. The relationship of a component or feature. It will be appreciated that the spatially relative terms may encompass different orientations of the elements in the application in addition to the orientation depicted in the drawings. For example, elements in the "following" or "beneath" or "an" or "an" Thus, the spatially relative terms "under" can include both orientations above and below.

如在本文中所使用的用語「大約」、「約」、「近乎」或「實質上」應大體上意指在給定值或範圍的百分之二十以內,較佳為在百分之十以內,更佳為在百分之五以內。在此所提供的數量為近似,意指若無特別陳述,可以用語「大約」、「約」、「近乎」或「實質上」加以表示。As used herein, the terms "about", "about", "nearly" or "substantially" shall mean substantially within twenty percent of a given value or range, preferably in percent. Within ten, better than five percent. The quantities provided herein are approximate, meaning that unless otherwise stated, the terms "about", "about", "nearly" or "substantially" may be used.

在附圖中,為了清楚起見,放大了層、膜、面板、區域等的厚度。在整個說明書中,相同的附圖標記表示相同的元件。應當理解,當諸如層、膜、區域或基板的元件被稱為在另一元件”上”或”連接到”另一元件時,其可以直接在另一元件上或與另一元件連接,或者中間元件可以也存在。相反地,當元件被稱為”直接在另一元件上”或”直接連接到”另一元件時,不存在中間元件。如本文所使用的,”連接”可以指物理及/或電連接。In the figures, the thickness of layers, films, panels, regions, etc., are exaggerated for clarity. Throughout the specification, the same reference numerals denote the same elements. It will be understood that when an element such as a layer, a film, a region or a substrate is referred to as "on" or "connected to" another element, it can be Intermediate components can also be present. In contrast, when an element is referred to as “directly on” or “directly connected to” another element, As used herein, "connected" may refer to both physical and/or electrical connections.

圖1繪示一種顯示面板訊號線的配置示意圖。請參照圖1,對照實施例與多個實施例之顯示面板10、10’具有顯示區31與周邊區33。基板100、100’具有一條以上的修補線21、21’設置於周邊區33,訊號線11、11’設置於顯示區31,且修補線21、21’與訊號線11、11’交錯,以形成預修補點124a及124b。當訊號線11、11’具有斷點D而產生斷線時,使用雷射焊接(laser welding)可將此受損之訊號線11、11’的兩端分別經由預修補點124a及124b,而與修補線21、21’熔接,使受損的訊號線11、11’經由修補線21、21’維持電性連接(電導通的狀態),並使顯示區31正常運作。FIG. 1 is a schematic diagram showing the configuration of a display panel signal line. Referring to Fig. 1, the display panel 10, 10' of the comparative embodiment and the plurality of embodiments has a display area 31 and a peripheral area 33. The substrate 100, 100' has one or more repair lines 21, 21' disposed in the peripheral region 33, the signal lines 11, 11' are disposed in the display area 31, and the repair lines 21, 21' are interlaced with the signal lines 11, 11' to Pre-patching points 124a and 124b are formed. When the signal lines 11, 11' have a break point D and a disconnection occurs, the two ends of the damaged signal lines 11, 11' can be respectively passed through the pre-repair points 124a and 124b by using laser welding. The repaired wires 21, 21' are welded to maintain the electrically connected (electrically conductive state) of the damaged signal lines 11, 11' via the repair lines 21, 21', and the display area 31 is normally operated.

於其中一個實施例中,訊號線電性連接於驅動晶片IC,其中訊號線可以為資料線或閘極線(或稱為掃描線),以下說明將以訊號線為資料線為範例,但不限於此。訊號線11、11’設置於顯示區31且延伸至周邊區33,且當訊號線21、21’不具有斷點D時修補線21、21’是浮置電極線(floating line),當訊號線11、11’具有斷點D時修補線21、21’則與訊號線11、11’維持電性連接。以下將針對圖1區域A的放大圖與剖面圖做詳細的說明。In one embodiment, the signal line is electrically connected to the driving chip IC, wherein the signal line can be a data line or a gate line (or a scan line). The following description uses the signal line as a data line as an example, but not Limited to this. The signal lines 11, 11' are disposed in the display area 31 and extend to the peripheral area 33, and when the signal lines 21, 21' do not have the break point D, the repair lines 21, 21' are floating lines, when the signal When the lines 11, 11' have a break point D, the repair lines 21, 21' remain electrically connected to the signal lines 11, 11'. The enlarged view and the cross-sectional view of the area A of Fig. 1 will be described in detail below.

請參照圖2,圖2為本發明之圖1局部的放大上視圖(或稱為俯視圖)。修補結構P包括修補線21、訊號線11、絕緣層(上視圖未畫出)、輔助層43、43’、阻擋層45與孔洞TH、TH’。本實施例中,訊號線21(例如:資料線)與修補線21之間配置有絕緣層 (上視圖未畫出)。舉例而言,訊號線21(例如:資料線)可配置於修補線21上方且兩者之間配置有絕緣層 (上視圖未畫出),但不限於此。於其它實施例中,修補線21可配置於訊號線21上方且兩者之間配置有絕緣層 (上視圖未畫出),且修補線21可選擇性的為掃描線或資料線其中一者。訊號線21上方配置有輔助層43、43’,且輔助層43、43’具有孔洞TH、TH’。孔洞TH、TH’垂直投影設置於修補線21與訊號線11重疊之正上方,即修補線21與訊號線11的重疊範圍A1垂直投影於基板100上與孔洞TH、TH’的垂直投影於基板100上的面積A2互相重疊。較佳的,孔洞TH、TH’的面積A2係大於或實質上等於修補線21與訊號線11的重疊範圍A1。換言之,當孔洞TH、TH’的面積A2係大於修補線21與訊號線11的重疊範圍A1時,孔洞TH、TH’可與修補線21以及訊號線11的重疊範圍A1至少一部份重疊。阻擋層45,設置於輔助層43、43’上,且阻擋層45填入孔洞TH、TH’中,其中輔助層43、43’與阻擋層45係由非導體材料所構成。Please refer to FIG. 2. FIG. 2 is an enlarged top view (or top view) of a portion of FIG. 1 of the present invention. The repair structure P includes a repair line 21, a signal line 11, an insulating layer (not shown in the upper view), an auxiliary layer 43, 43', a barrier layer 45, and holes TH, TH'. In this embodiment, an insulating layer (not shown in the upper view) is disposed between the signal line 21 (for example, the data line) and the repairing line 21. For example, the signal line 21 (for example, a data line) may be disposed above the repairing line 21 with an insulating layer disposed therebetween (not shown in the upper view), but is not limited thereto. In other embodiments, the repairing line 21 can be disposed above the signal line 21 with an insulating layer disposed therebetween (not shown in the upper view), and the repairing line 21 can be selectively one of a scanning line or a data line. . The auxiliary layers 43, 43' are disposed above the signal line 21, and the auxiliary layers 43, 43' have holes TH, TH'. The vertical projections of the holes TH and TH' are disposed directly above the overlap of the repairing line 21 and the signal line 11, that is, the overlapping range A1 of the repairing line 21 and the signal line 11 is perpendicularly projected on the substrate 100 and vertically projected on the substrate by the holes TH, TH'. The area A2 on 100 overlaps each other. Preferably, the area A2 of the holes TH, TH' is greater than or substantially equal to the overlapping range A1 of the repair line 21 and the signal line 11. In other words, when the area A2 of the holes TH, TH' is larger than the overlapping range A1 of the repair line 21 and the signal line 11, the holes TH, TH' may overlap at least partially with the overlapping area A1 of the repair line 21 and the signal line 11. The barrier layer 45 is disposed on the auxiliary layers 43, 43', and the barrier layer 45 is filled in the holes TH, TH', wherein the auxiliary layers 43, 43' and the barrier layer 45 are composed of a non-conductive material.

請參照圖3,圖3為本發明之修補結構之圖2 之第一實施例之A-A’剖面線之剖面示意圖。修補訊號線21設置於基板100的內表面,然基板100的內表面可選擇性的設置其他層別例如緩衝層(圖未示)可增加可撓性或黏附力其中至少一者的效果等,本發明並不以此為限。修補線21,設置於基板100上。訊號線11設置於基板100上,絕緣層41設置於修補線21與訊號線11之間。舉例而言,訊號線21(例如:資料線)可配置於修補線21上方且兩者之間配置有絕緣層 (上視圖未畫出),但不限於此。於其它實施例中,修補線21可配置於訊號線21上方且兩者之間配置有絕緣層 (上視圖未畫出),且修補線21可選擇性的為掃描線或資料線其中一者。輔助層43,設置於絕緣層41上,且輔助層43具有孔洞TH,孔洞TH垂直投影設置於修補線21與訊號線11重疊之上方。孔洞TH,是由輔助層43所定義出,故孔洞TH沒有其他保護層或輔助層43來形成孔洞TH底面,即孔洞TH本身沒有底面與頂面視為穿孔。阻擋層45,設置於基板100上,且阻擋層45覆蓋輔助層43至少一部份,且填入孔洞TH中,其中,輔助層43與阻擋層45係由非導體材料所構成。本實施例中,孔洞TH是由輔助層43所形成,輔助層43之內側壁43b與訊號線11上表面11a定義出孔洞TH。阻擋層45填入孔洞TH中,其中阻擋層45接觸內側壁43b與訊號線11上表面11a。阻擋層45可部分填滿孔洞TH。然為達到較佳的保護效果,阻擋層45覆蓋輔助層43之至少一部份的上表面43a,即阻擋層45接觸輔助層43之至少部份的上表面43a,且阻擋層45填滿孔洞TH,然本發明容許製程上的對位誤差。Please refer to FIG. 3. FIG. 3 is a cross-sectional view of the A-A' section line of the first embodiment of FIG. 2 of the repair structure of the present invention. The repair signal line 21 is disposed on the inner surface of the substrate 100, and the inner surface of the substrate 100 can be selectively provided with other layers such as a buffer layer (not shown) to increase the effect of at least one of flexibility or adhesion, etc. The invention is not limited thereto. The repair line 21 is disposed on the substrate 100. The signal line 11 is disposed on the substrate 100, and the insulating layer 41 is disposed between the repair line 21 and the signal line 11. For example, the signal line 21 (for example, a data line) may be disposed above the repairing line 21 with an insulating layer disposed therebetween (not shown in the upper view), but is not limited thereto. In other embodiments, the repairing line 21 can be disposed above the signal line 21 with an insulating layer disposed therebetween (not shown in the upper view), and the repairing line 21 can be selectively one of a scanning line or a data line. . The auxiliary layer 43 is disposed on the insulating layer 41, and the auxiliary layer 43 has a hole TH. The hole TH is vertically projected and disposed above the repair line 21 and the signal line 11. The hole TH is defined by the auxiliary layer 43, so that the hole TH has no other protective layer or auxiliary layer 43 to form the bottom surface of the hole TH, that is, the hole TH itself has no bottom surface and the top surface is regarded as a perforation. The barrier layer 45 is disposed on the substrate 100, and the barrier layer 45 covers at least a portion of the auxiliary layer 43 and is filled in the hole TH. The auxiliary layer 43 and the barrier layer 45 are composed of a non-conductor material. In this embodiment, the hole TH is formed by the auxiliary layer 43, and the inner side wall 43b of the auxiliary layer 43 and the upper surface 11a of the signal line 11 define a hole TH. The barrier layer 45 is filled in the hole TH, wherein the barrier layer 45 contacts the inner side wall 43b and the upper surface 11a of the signal line 11. The barrier layer 45 can partially fill the holes TH. However, in order to achieve a better protective effect, the barrier layer 45 covers the upper surface 43a of at least a portion of the auxiliary layer 43, that is, the barrier layer 45 contacts the upper surface 43a of at least a portion of the auxiliary layer 43, and the barrier layer 45 fills the hole. TH, however, the present invention allows for alignment errors in the process.

進一步而言,輔助層43的孔洞TH可以提供阻擋層45於垂直基板100方向上的厚度H,以利之後修補製程的保護功能。其中,阻擋層45的厚度H舉例而言較佳為大於或等於約2.15微米(um)且小於或等於 3微米(um)。本實施例中,輔助層43可為單層或多層結構,且其材料可選自於有機材料,舉例而言為例如光阻(photo resist)、光間隙物(photo spacer)、黑色遮光層(black matrix)或彩色濾光層(color filter)或其它合適的材料。阻擋層45材料可以選自於有機材料,例如光阻(photo resist)、光間隙物(photo spacer)、黑色遮光層(black matrix)或彩色濾光層(color filter)。於一變化實施例,輔助層43可以為紅色彩色濾光層、綠色彩色濾光層或藍色彩色濾光層。Further, the hole TH of the auxiliary layer 43 can provide the thickness H of the barrier layer 45 in the direction of the vertical substrate 100 to facilitate the protection function of the subsequent repair process. The thickness H of the barrier layer 45 is preferably, for example, greater than or equal to about 2.15 micrometers (um) and less than or equal to 3 micrometers (um). In this embodiment, the auxiliary layer 43 may be a single layer or a multilayer structure, and the material thereof may be selected from organic materials such as, for example, a photo resist, a photo spacer, and a black light shielding layer ( Black matrix) or color filter or other suitable material. The barrier layer 45 material may be selected from organic materials such as photo resists, photo spacers, black matrices, or color filters. In a variant embodiment, the auxiliary layer 43 can be a red color filter layer, a green color filter layer or a blue color filter layer.

請參考圖4為本發明之修補結構之第一實施例之另一變化實施例之剖面示意圖。圖4與圖3所示之第一實施例的差別在於輔助層43材料選自於無機材料,舉例而言為氧化物、氮化物、氮氧化合物、氧化鋁、或其它合適的材料。輔助層43為無機材料可以增加後續阻擋層45設置時增加介面附著力。本變化實施例中,輔助層43包括第一保護層PV1與第二保護層PV2,且第一保護層PV1與第二保護層PV2的材料可以為不同或實質上相同,當保護層PV1、PV2為單層時第一保護層PV1相當於輔助層43。第一保護層PV1與第二保護層PV2材料選自於無機材料,舉例而言為氧化物、氮化物、氮氧化合物、氧化鋁、或其它合適的材料。孔洞TH,是由輔助層43所定義出,故孔洞TH沒有其他保護層PV1、PV2或輔助層43來形成孔洞TH底面,即孔洞TH本身沒有底面與頂面視為穿孔(through hole)或稱為貫穿孔,即貫通輔助層43之上表面與下表面。Please refer to FIG. 4, which is a cross-sectional view showing another modified embodiment of the first embodiment of the repair structure of the present invention. 4 differs from the first embodiment shown in FIG. 3 in that the auxiliary layer 43 material is selected from inorganic materials such as oxides, nitrides, oxynitrides, aluminas, or other suitable materials. The auxiliary layer 43 is an inorganic material that can increase the adhesion of the interface when the subsequent barrier layer 45 is disposed. In this variant embodiment, the auxiliary layer 43 includes a first protective layer PV1 and a second protective layer PV2, and the materials of the first protective layer PV1 and the second protective layer PV2 may be different or substantially the same, when the protective layers PV1, PV2 The first protective layer PV1 corresponds to the auxiliary layer 43 when it is a single layer. The first protective layer PV1 and the second protective layer PV2 material are selected from inorganic materials such as oxides, nitrides, oxynitrides, aluminum oxides, or other suitable materials. The hole TH is defined by the auxiliary layer 43, so that the hole TH has no other protective layer PV1, PV2 or the auxiliary layer 43 to form the bottom surface of the hole TH, that is, the hole TH itself has no bottom surface and the top surface is regarded as a through hole or It is a through hole, that is, penetrates the upper surface and the lower surface of the auxiliary layer 43.

阻擋層45可為單層或多層結構,且其材料可以選自於有機材料,例如光阻(photo resist)、光間隙物(photo spacer)、黑色遮光層(black matrix)或彩色濾光層(color filter)、或其它合適的材料。於形成阻擋層45時,因阻擋層45具有材料流動性質,因此塗佈時不易形成垂直基板100方向上厚度。因此預先形成孔洞TH,可以提高阻擋層45垂直基板100方向上厚度。因此本實施例較佳為阻擋層45與輔助層43係為直接接觸,當阻擋層45為有機材料,如直接設置於訊號線11上,可能會有剝離的問題,因此可選用無機材料的輔助層43可當作黏附層,使阻擋層45填入孔洞TH中不易剝離。然為達到較佳的保護效果,阻擋層45覆蓋輔助層43之至少一部份的上表面43a,即阻擋層45接觸輔助層43之至少部份的上表面43a,且阻擋層45填滿孔洞TH,然本發明容許製程上的對位誤差。The barrier layer 45 may be a single layer or a multilayer structure, and the material thereof may be selected from an organic material such as a photo resist, a photo spacer, a black matrix or a color filter layer ( Color filter), or other suitable material. When the barrier layer 45 is formed, since the barrier layer 45 has a material flow property, it is difficult to form a thickness in the direction of the vertical substrate 100 at the time of coating. Therefore, the hole TH is formed in advance, and the thickness of the barrier layer 45 in the direction perpendicular to the substrate 100 can be increased. Therefore, in this embodiment, the barrier layer 45 and the auxiliary layer 43 are in direct contact with each other. When the barrier layer 45 is made of an organic material, such as directly disposed on the signal line 11, there may be a problem of peeling. Therefore, an auxiliary of inorganic materials may be used. The layer 43 can serve as an adhesion layer, so that the barrier layer 45 is filled in the holes TH and is not easily peeled off. However, in order to achieve a better protective effect, the barrier layer 45 covers the upper surface 43a of at least a portion of the auxiliary layer 43, that is, the barrier layer 45 contacts the upper surface 43a of at least a portion of the auxiliary layer 43, and the barrier layer 45 fills the hole. TH, however, the present invention allows for alignment errors in the process.

阻擋層45可以為透光或不透光,較佳為選用不透光材料,例如黑色遮光層(black matrix),因為搭配顯示區31製程步驟,黑色遮光層(black matrix)往往是最後一道製程,如此顯示區31與周邊區33可以一起做,因此不會增加額外的製程步驟。於其它實施例中,若阻擋層45選用不透光材料,也可由多個不同色的彩色光阻堆疊而成,但不限於此。The barrier layer 45 may be transparent or opaque, preferably an opaque material, such as a black matrix, because the black matrix is often the last process. Thus, the display area 31 and the peripheral area 33 can be made together, so that no additional process steps are added. In other embodiments, if the barrier layer 45 is made of an opaque material, it may be stacked by a plurality of color resists of different colors, but is not limited thereto.

請參照圖5,圖5為本發明之之修補結構之圖2 之A-A’剖面線之第二實施例之剖面示意圖。修補線21設置於基板100的內表面,然基板100的內表面可設置其他層別例如緩衝層增加可撓性,本發明並不以此為限。修補線21,設置於基板100上。絕緣層41設置於修補線21上。訊號線11設置於絕緣層41上方。換句話說,絕緣層41設置於修補線21與訊號線11之間。其中訊號線11也可設置於修補線21下方,本發明並不以此為限。Referring to FIG. 5, FIG. 5 is a cross-sectional view showing a second embodiment of the A-A' section line of FIG. 2 of the repair structure of the present invention. The repairing line 21 is disposed on the inner surface of the substrate 100. The inner surface of the substrate 100 may be provided with other layers such as a buffer layer to increase flexibility, and the invention is not limited thereto. The repair line 21 is disposed on the substrate 100. The insulating layer 41 is provided on the repairing line 21. The signal line 11 is disposed above the insulating layer 41. In other words, the insulating layer 41 is disposed between the repair line 21 and the signal line 11. The signal line 11 can also be disposed under the repairing line 21, and the invention is not limited thereto.

如圖5所示,圖5與圖4第一實施例之又一變化實施不同之處在於第二實施例的輔助層43’更包括有機層431,有機層431設置於第一保護層PV1’與第二保護層PV2’之間,且第二保護層PV2’於孔洞TH中接觸第一保護層PV1’。舉例而言,第二保護層PV2’延有機層431的側面431a延伸。有機層431可為單層或多層結構,且其材料,舉例而言為例如光阻(photo resist)、光間隙物(photo spacer)、黑色遮光層(black matrix)或彩色濾光層(color filter)或其它合適的材料。於本實施例中,第一保護層PV1’覆蓋絕緣層41的部分上表面與訊號線11的部分上表面11a。於較佳實施例中,第一保護層PV1’接觸絕緣層41(例如:絕緣層41上表面)且覆蓋訊號線11之側面11c與部分上表面11a,其中訊號線11的下表面11b接觸絕緣層41頂面(或稱為上表面),訊號線11的上表面11a藉由孔洞TH暴露出,訊號線11之側面11c連接訊號線11的上表面11a與訊號線11的下表面11b。孔洞TH暴露出訊號線11的上表面11a,即對應輔助層43’未覆蓋訊號線11的上表面11a之處。第二保護層PV2’設置於有機層431之頂面上,且第二保護層PV2’延有機層431的側面431a延伸形成孔洞TH之內側壁43b,且第二保護層PV2’較佳延伸至孔洞TH內與第一保護層PV1’ 接觸。孔洞TH,是由輔助層43’所定義出,故孔洞TH沒有其他保護層PV1’、 PV2’、 有機層431或輔助層43’來形成孔洞TH底面(或填入孔洞TH中),即孔洞TH本身沒有底面與頂面視為穿孔(through hole),換句話說阻擋層45藉由孔洞TH與設置於輔助層43’下的層別(或表面)接觸,舉例而言與訊號線11的部分上表面11a接觸。As shown in FIG. 5, FIG. 5 is different from the other variation of the first embodiment of FIG. 4 in that the auxiliary layer 43' of the second embodiment further includes an organic layer 431, and the organic layer 431 is disposed on the first protective layer PV1'. Between the second protective layer PV2' and the second protective layer PV2' contacts the first protective layer PV1' in the hole TH. For example, the second protective layer PV2' extends over the side 431a of the organic layer 431. The organic layer 431 may be a single layer or a multilayer structure, and its material is, for example, a photo resist, a photo spacer, a black matrix, or a color filter. ) or other suitable materials. In the present embodiment, the first protective layer PV1' covers a portion of the upper surface of the insulating layer 41 and a portion of the upper surface 11a of the signal line 11. In a preferred embodiment, the first protective layer PV1' contacts the insulating layer 41 (for example, the upper surface of the insulating layer 41) and covers the side surface 11c of the signal line 11 and a portion of the upper surface 11a, wherein the lower surface 11b of the signal line 11 is in contact with the insulating layer. The top surface (or upper surface) of the layer 41, the upper surface 11a of the signal line 11 is exposed by the hole TH, and the side surface 11c of the signal line 11 is connected to the upper surface 11a of the signal line 11 and the lower surface 11b of the signal line 11. The hole TH exposes the upper surface 11a of the signal line 11, i.e., where the auxiliary layer 43' does not cover the upper surface 11a of the signal line 11. The second protective layer PV2' is disposed on the top surface of the organic layer 431, and the side surface 431a of the second protective layer PV2' extending the organic layer 431 extends to form the inner sidewall 43b of the hole TH, and the second protective layer PV2' preferably extends to The hole TH is in contact with the first protective layer PV1'. The hole TH is defined by the auxiliary layer 43', so the hole TH has no other protective layer PV1', PV2', the organic layer 431 or the auxiliary layer 43' to form the bottom surface of the hole TH (or fill in the hole TH), that is, the hole The TH itself has no bottom surface and a top surface as a through hole. In other words, the barrier layer 45 is in contact with the layer (or surface) disposed under the auxiliary layer 43' by the hole TH, for example, with the signal line 11. Part of the upper surface 11a is in contact.

請參照圖6,圖6為本發明之圖2 之A-A’剖面線之第三實施例之剖面示意圖。圖6與圖5所述之第二實施例不同之處在於更包含凹槽O。較佳地,凹槽O具有底面B1、B2,底面B1、B2分別由第一保護層PV1”與第二保護層PV2”所形成,且底面B1、B2設置於孔洞TH’中,如此阻擋層45不與設置於輔助層43’下的層別(或表面)接觸。換句話說阻擋層45係與輔助層43’中的其中一層(或表面)接觸,其中輔助層43’更包括有機層431,有機層431設置於第一保護層PV1”與第二保護層PV2”之間。第一保護層PV1”與第二保護層PV2”材料選自於無機材料,舉例而言為氧化物、氮化物、氮氧化合物、氧化鋁、或其它合適的材料,其中第一保護層PV1”與第二保護層PV2”材料可為相同或不同。本實施例之凹槽O由有機層431、第一保護層PV1”與第二保護層PV2”共同形成。孔洞TH’由有機層431形成,孔洞TH’沒有其他保護層PV1”、 PV2”、 有機層431或輔助層43’形成孔洞TH底面(或填入孔洞TH中),即孔洞TH本身沒有底面與頂面視為穿孔(through hole),即設置於有機層431上與下的膜層可藉由孔洞TH而直接接觸,舉例而言第一保護層PV1”與第二保護層PV2”係藉由孔洞TH而直接接觸。底面B1、B2分別由第一保護層PV1”與第二保護層PV2”所形成。換言之,凹槽O的底面B2可為第二保護層PV2”之頂面(或稱為上表面),凹槽O的底面B1可為第一保護層PV1”之頂面(或稱為上表面),即底面B1與底面B1位於不同的水平面。於其它實施例中,凹槽只具有一個底面,舉例而言,第一保護層PV1”延伸到孔洞TH’內,第一保護層PV1”覆蓋至少部分訊號線11上表面11a形成底面B1,並搭配第二保護層PV2”只覆蓋孔洞TH’之內側壁43b而不覆蓋底面B1,藉以定義出凹槽O。於另一變化實施例中,第二保護層PV2” 延伸覆蓋孔洞TH,第二保護層PV2”延有機層431的地形表面起伏,第一保護層PV1”不延伸到孔洞TH’內,第二保護層PV2” 覆蓋部分訊號線11上表面形成底面B2。Please refer to FIG. 6. FIG. 6 is a cross-sectional view showing a third embodiment of the line A-A' of FIG. 2 of the present invention. Figure 6 differs from the second embodiment illustrated in Figure 5 in that it further comprises a recess O. Preferably, the recess O has a bottom surface B1, B2, and the bottom surface B1, B2 is formed by the first protective layer PV1" and the second protective layer PV2", respectively, and the bottom surfaces B1, B2 are disposed in the hole TH', such a barrier layer 45 is not in contact with the layer (or surface) disposed under the auxiliary layer 43'. In other words, the barrier layer 45 is in contact with one of the auxiliary layers 43', wherein the auxiliary layer 43' further includes an organic layer 431 disposed on the first protective layer PV1" and the second protective layer PV2 "between. The first protective layer PV1" and the second protective layer PV2" material is selected from inorganic materials such as oxides, nitrides, oxynitrides, aluminum oxides, or other suitable materials, wherein the first protective layer PV1" The material may be the same or different from the second protective layer PV2". The groove O of this embodiment is formed by the organic layer 431, the first protective layer PV1" and the second protective layer PV2". The hole TH' is formed by the organic layer 431. The hole TH' has no other protective layer PV1", PV2", the organic layer 431 or the auxiliary layer 43' forms the bottom surface of the hole TH (or is filled in the hole TH), that is, the hole TH itself has no bottom surface and The top surface is regarded as a through hole, that is, the film layer disposed on the lower layer and the lower layer of the organic layer 431 can be directly contacted by the holes TH, for example, the first protective layer PV1" and the second protective layer PV2" The holes TH are in direct contact. The bottom surfaces B1, B2 are formed by the first protective layer PV1" and the second protective layer PV2, respectively. In other words, the bottom surface B2 of the recess O may be the top surface (or upper surface) of the second protective layer PV2", and the bottom surface B1 of the recess O may be the top surface (or upper surface of the first protective layer PV1" ), that is, the bottom surface B1 and the bottom surface B1 are located at different horizontal planes. In other embodiments, the recess has only one bottom surface. For example, the first protective layer PV1" extends into the hole TH', and the first protective layer PV1" covers at least part of the signal line 11 upper surface 11a to form the bottom surface B1, and The second protective layer PV2" covers only the inner side wall 43b of the hole TH' without covering the bottom surface B1, thereby defining the groove O. In another variant embodiment, the second protective layer PV2" extends over the hole TH, second The topography surface of the protective layer PV2" extends the organic layer 431, the first protective layer PV1" does not extend into the hole TH', and the second protective layer PV2" covers the upper surface of the portion of the signal line 11 to form the bottom surface B2.

請參照圖1、圖7與圖8,圖7為本發明之顯示面板之對照實施例之修補後之剖面示意圖,圖8為本發明之顯示面板之修補後之剖面示意圖。圖8,為第一實施例、第二實施例、第三實施例與上述變化例中任一修補結構所形成顯示面板10,然圖示以第二實施例為範例。圖7與圖8之顯示面板10、10’具有基板100、100’與對向基板200、200’與顯示介電層(圖未示),其中顯示介質層(圖未示)設置於基板100、100’與對向基板200、200’之間。修補結構P、P’設置於基板100、100’之內表面,且位於圖1所示之周邊區33。基板100、100’、200、200’可為硬質基板或可撓式基板,其材料可包括例如玻璃、石英、塑膠、藍寶石或其它適合的無機或有機透明材料,且基板100、100’與對向基板200、200’材料可以為相同或不同。顯示介質層(圖未示)可包括高分子分散型液晶(PDLC)層、高分子網絡型液晶(PNLC)層、膽固醇液晶層、電致變化層、其它可藉由垂直電場或水平電場加以驅動的顯示介質層或電激發光層或其它合適的顯示介質層,然而顯示介質層的材料與顯示面板的驅動模式,本領域人員可視需求作適當選擇。對照實施例之修補結構P’包括基板100’、修補線21’、絕緣層41’、訊號線11’以及阻擋層53。其中對照實施例也可以更包括中介保護層51,用以提供阻擋層53於後續的黏附力,避免阻擋層53剝落。第二實施例之顯示面板10之修補結構P包括基板100、修補線21、絕緣層41、訊號線11、輔助層43’、孔洞TH以及阻擋層45。Referring to FIG. 1 , FIG. 7 and FIG. 8 , FIG. 7 is a schematic cross-sectional view of a control panel of the present invention after being repaired, and FIG. 8 is a cross-sectional view of the display panel of the present invention after repair. 8 is a view showing a display panel 10 formed by any of the first embodiment, the second embodiment, the third embodiment, and the above-described modification, but the second embodiment is taken as an example. The display panels 10, 10' of FIGS. 7 and 8 have a substrate 100, 100' and a counter substrate 200, 200' and a display dielectric layer (not shown), wherein a display medium layer (not shown) is disposed on the substrate 100. Between 100' and the opposite substrate 200, 200'. The repair structures P, P' are disposed on the inner surface of the substrate 100, 100' and are located in the peripheral region 33 shown in FIG. The substrate 100, 100', 200, 200' may be a rigid substrate or a flexible substrate, the material of which may include, for example, glass, quartz, plastic, sapphire or other suitable inorganic or organic transparent material, and the substrate 100, 100' and the pair The materials to the substrates 200, 200' may be the same or different. The display medium layer (not shown) may include a polymer dispersed liquid crystal (PDLC) layer, a polymer network liquid crystal (PNLC) layer, a cholesteric liquid crystal layer, an electro-change layer, and the like may be driven by a vertical electric field or a horizontal electric field. The display medium layer or the electro-optic light layer or other suitable display medium layer, however, the material of the display medium layer and the driving mode of the display panel can be appropriately selected by those skilled in the art as needed. The repair structure P' of the comparative embodiment includes a substrate 100', a repair line 21', an insulating layer 41', a signal line 11', and a barrier layer 53. The comparative embodiment may further include an intermediate protective layer 51 for providing a subsequent adhesion of the barrier layer 53 to prevent the barrier layer 53 from peeling off. The repair structure P of the display panel 10 of the second embodiment includes a substrate 100, a repair line 21, an insulating layer 41, a signal line 11, an auxiliary layer 43', a hole TH, and a barrier layer 45.

修補製程通常是經由基板100、100’外表面100b、100b’進行,以雷射L等方式熔接修補線21、21’與訊號線11、11’,以形成焊接導體3。對照實施例的顯示面板10’相較於第一實施例、第二實施例或第三實施例所形成的顯示面板10,對照實施例不具有輔助層,因此於修補線21’與訊號線11’垂直投影於基板100’重疊之處不具有孔洞TH、TH’或凹槽O。對照實施例的顯示面板10’進行修補製程時經熔融的訊號線11’或修補線21’的金屬殘屑可能會穿過阻擋層53,造成金屬殘屑可能會飛濺到對向基板200’或周圍訊號線造成訊號短路。或者,當對照實施例的顯示面板因觸碰或測試等原因被按壓且對向基板200’上也具有電極層61’時,有可能會與穿過阻擋層53’上的金屬殘屑接觸,進而導致訊號線11’與電極層61’發生短路,使得對照實施例的顯示面板的顯示品質變差。其中,電極層61’可為透明電極且可以為提供共通電壓(Com)。The repair process is usually performed via the outer surfaces 100b, 100b' of the substrates 100, 100', and the repair lines 21, 21' and the signal lines 11, 11' are welded by laser L or the like to form the solder conductor 3. The display panel 10' of the comparative embodiment has no auxiliary layer compared to the display panel 10 formed by the first embodiment, the second embodiment, or the third embodiment, so that the repair line 21' and the signal line 11 are The 'vertical projection' does not have holes TH, TH' or grooves O where the substrate 100' overlaps. The metal debris of the melted signal line 11' or the repair line 21' may be passed through the barrier layer 53 during the repair process of the display panel 10' of the embodiment, causing metal debris to splash onto the opposite substrate 200' or The surrounding signal line causes a short circuit. Alternatively, when the display panel of the comparative embodiment is pressed by a touch or test or the like and the electrode layer 61' is also provided on the opposite substrate 200', there is a possibility of coming into contact with metal debris passing through the barrier layer 53'. Further, the signal line 11' is short-circuited with the electrode layer 61', so that the display quality of the display panel of the comparative example is deteriorated. Here, the electrode layer 61' may be a transparent electrode and may provide a common voltage (Com).

上述實施例中所形成的顯示面板因具有孔洞或凹槽,進行修補製程時輔助層可以提供阻擋層於垂直基板方向上形成較對照實施例厚的厚度,因此可以避免修補製程時經熔融的訊號線或修補線的金屬殘屑貫穿阻擋層,使阻擋層達到良好的保護作用,進而提供較佳顯示品質。此外可在不大幅增加製程步驟與成本的前提下製作出,而可有效降低生產成本。The display panel formed in the above embodiment has holes or grooves. When the repair process is performed, the auxiliary layer can provide the barrier layer to have a thickness thicker than that of the comparative embodiment in the direction of the vertical substrate, thereby avoiding the melted signal during the repair process. The metal residue of the wire or the repair wire penetrates the barrier layer to provide a good protection for the barrier layer, thereby providing better display quality. In addition, it can be produced without significantly increasing the process steps and costs, and can effectively reduce production costs.

雖然已經結合目前被認為是實用的示例性實施例描述了本發明,但是應當理解,本發明不限於所公開的實施例,而是相反地,旨在適用於各種修改和等同佈置包括在所附權利要求的精神和範圍內。Although the present invention has been described in connection with the exemplary embodiments of the present invention, it is understood that the invention is not limited to the disclosed embodiments, but rather, it is intended to apply to various modifications and equivalent arrangements. Within the spirit and scope of the claims.

100、100’‧‧‧基板 100, 100'‧‧‧ substrates

IC‧‧‧驅動晶片 IC‧‧‧Drive Chip

31‧‧‧周邊區 31‧‧‧The surrounding area

33‧‧‧周邊區 33‧‧‧The surrounding area

124a、124b‧‧‧預修補點 124a, 124b‧‧‧ pre-repair points

D‧‧‧斷點 D‧‧‧ breakpoint

A‧‧‧區域 A‧‧‧ area

41、41’‧‧‧絕緣層 41, 41'‧‧‧Insulation

11、11’‧‧‧訊號線 11, 11'‧‧‧ signal line

21、21’‧‧‧修補線 21, 21’‧‧‧ repair line

43、43’‧‧‧輔助層 43, 43’‧‧‧ auxiliary layer

TH、TH’‧‧‧孔洞 TH, TH’‧‧‧ holes

A1‧‧‧重疊範圍 A1‧‧‧ overlapping range

A2‧‧‧面積 A2‧‧‧ area

11a、43a‧‧‧上表面 11a, 43a‧‧‧ upper surface

11b‧‧‧下表面 11b‧‧‧ lower surface

11c、431a‧‧‧側面 11c, 431a‧‧‧ side

43b‧‧‧內側壁 43b‧‧‧ inner side wall

H‧‧‧厚度 H‧‧‧thickness

45、53‧‧‧阻擋層 45, 53‧‧‧ barrier

PV2、PV2’‧‧‧第二保護層 PV2, PV2'‧‧‧ second protective layer

PV1、PV1’‧‧‧第一保護層 PV1, PV1'‧‧‧ first protective layer

B1、B2‧‧‧底面 B1, B2‧‧‧ bottom

431‧‧‧有機層 431‧‧‧Organic layer

51‧‧‧中介保護層 51‧‧‧Intermediary protection

O‧‧‧凹槽 O‧‧‧ Groove

100a、100a’‧‧‧內表面 100a, 100a’‧‧‧ inner surface

61’‧‧‧電極層 61'‧‧‧Electrical layer

L‧‧‧雷射 L‧‧‧Laser

100b、100b’‧‧‧外表面 100b, 100b’‧‧‧ outer surface

P、P’‧‧‧修補結構 P, P’‧‧‧ repair structure

3‧‧‧焊接導體 3‧‧‧Welded conductor

圖1為本發明之顯示面板訊號線與修補線的配置示意圖; 圖2為本發明之修補結構之圖1局部的放大上視圖; 圖3為本發明之修補結構之圖2之A-A’剖面線之第一實施例之剖面示意圖; 圖4為本發明之修補結構之第一實施例之另一變化實施例之剖面示意圖; 圖5為本發明之修補結構之圖2之A-A’剖面線之第二實施例之剖面示意圖; 圖6為本發明之修補結構之圖2 之A-A’剖面線之第三實施例之剖面示意圖; 圖7為本發明之顯示面板之對照實施例之修補後之剖面示意圖; 圖8為本發明之顯示面板之修補後之剖面示意圖。1 is a schematic view showing the arrangement of a signal line and a repairing line of the display panel of the present invention; FIG. 2 is an enlarged top view of a portion of the repairing structure of the present invention; FIG. 3 is a view of FIG. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 4 is a cross-sectional view showing another modified embodiment of the first embodiment of the repair structure of the present invention; FIG. 5 is a view of the repair structure of the present invention taken along line A-A' of FIG. FIG. 6 is a cross-sectional view showing a third embodiment of the cross-sectional line A-A' of FIG. 2 of the repair structure of the present invention; FIG. 7 is a cross-sectional view of the display panel of the present invention. FIG. 8 is a schematic cross-sectional view of the display panel of the present invention after repair.

100‧‧‧基板 100‧‧‧Substrate

43a、11a‧‧‧上表面 43a, 11a‧‧‧ upper surface

21‧‧‧修補線 21‧‧‧ repair line

43b‧‧‧內側壁 43b‧‧‧ inner side wall

41‧‧‧絕緣層 41‧‧‧Insulation

H‧‧‧厚度 H‧‧‧thickness

11‧‧‧訊號線 11‧‧‧Signal line

TH‧‧‧孔洞 TH‧‧‧ hole

43‧‧‧輔助層 43‧‧‧Auxiliary layer

45‧‧‧阻擋層 45‧‧‧Block

Claims (10)

一種修補結構,包括:一修補線,設置於一基板上,且該修補線是一浮置電極線(floating line);一訊號線,設置於該基板上,且該訊號線與該修補線交叉設置;一絕緣層,設置於該修補線與該訊號線之間;一輔助層,設置於該絕緣層上,且該輔助層具有一孔洞,該孔洞垂直投影設置於該修補線與該訊號線重疊之上方;至少一保護層,設置於該基板上,該至少一保護層與該輔助層部份重疊,且延伸覆蓋至該孔洞,以構成一凹槽;以及一阻擋層,設置於該基板上,且填入該孔洞中,其中,該輔助層與該阻擋層係由非導體材料所構成。 A repairing structure includes: a repairing line disposed on a substrate, wherein the repairing line is a floating line; a signal line is disposed on the substrate, and the signal line crosses the repairing line An insulating layer is disposed between the repairing line and the signal line; an auxiliary layer is disposed on the insulating layer, and the auxiliary layer has a hole, and the hole is vertically projected on the repairing line and the signal line Above the overlap; at least one protective layer disposed on the substrate, the at least one protective layer partially overlapping the auxiliary layer, and extending to cover the hole to form a groove; and a barrier layer disposed on the substrate And filling the hole, wherein the auxiliary layer and the barrier layer are composed of a non-conductor material. 如請求項1所述之修補結構,其中,該輔助層包括一第一保護層與一第二保護層,且該第一保護層與該第二保護層係由無機材料所形成。 The repairing structure of claim 1, wherein the auxiliary layer comprises a first protective layer and a second protective layer, and the first protective layer and the second protective layer are formed of an inorganic material. 如請求項2所述之修補結構,其中,該輔助層更包括一有機層,設置於該第一保護層與該第二保護層之間。 The repairing structure of claim 2, wherein the auxiliary layer further comprises an organic layer disposed between the first protective layer and the second protective layer. 如請求項1所述之修補結構,其中,該輔助層係由有機材料所組成。 The repair structure of claim 1, wherein the auxiliary layer is composed of an organic material. 如請求項1所述之修補結構,其中,該阻擋層包含光間隙物或彩色濾光層其中至少一者。 The repair structure of claim 1, wherein the barrier layer comprises at least one of a light spacer or a color filter layer. 如請求項1所述之修補結構,其中,該至少一保護層包含 一第一保護層與一第二保護層,其中,該第一保護層,設置於輔助層之下且延伸覆蓋至該孔洞,該第二保護層,設置於輔助層之上,且延伸覆蓋至該孔洞,且該第二保護層於該孔洞接觸該第一保護層。 The repair structure of claim 1, wherein the at least one protective layer comprises a first protective layer and a second protective layer, wherein the first protective layer is disposed under the auxiliary layer and extends to cover the hole, and the second protective layer is disposed on the auxiliary layer and extends to cover The hole, and the second protective layer contacts the first protective layer at the hole. 一種顯示面板,包括:如請求項1~6所述之修補結構;一對向基板與一顯示介電層,其中該顯示介電層設置於該基板與該對向基板之間。 A display panel comprising: the repair structure according to any one of claims 1 to 6; a pair of a substrate and a display dielectric layer, wherein the display dielectric layer is disposed between the substrate and the opposite substrate. 如請求項7所述之顯示面板,更包括一電極層,設置於該對向基板之內表面。 The display panel of claim 7, further comprising an electrode layer disposed on an inner surface of the opposite substrate. 如請求項7所述之顯示面板,其中,該顯示面板具有一顯示區與一周邊區,其中該修補線設置於該周邊區,該訊號線電性連接於一驅動晶片,且該訊號線設置於該顯示區且延伸至該周邊區。 The display panel of claim 7, wherein the display panel has a display area and a peripheral area, wherein the repairing line is disposed in the peripheral area, the signal line is electrically connected to a driving chip, and the signal line is disposed on the The display area extends to the peripheral area. 如請求項9所述之顯示面板,其中該驅動晶片為一資料線驅動晶片。The display panel of claim 9, wherein the driving chip is a data line driving chip.
TW105143442A 2016-12-27 2016-12-27 Repair structure and display panel thereof TWI603138B (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
TW105143442A TWI603138B (en) 2016-12-27 2016-12-27 Repair structure and display panel thereof
CN201710092053.4A CN106959559A (en) 2016-12-27 2017-02-21 Repairing structure and display panel thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW105143442A TWI603138B (en) 2016-12-27 2016-12-27 Repair structure and display panel thereof

Publications (2)

Publication Number Publication Date
TWI603138B true TWI603138B (en) 2017-10-21
TW201823828A TW201823828A (en) 2018-07-01

Family

ID=59481531

Family Applications (1)

Application Number Title Priority Date Filing Date
TW105143442A TWI603138B (en) 2016-12-27 2016-12-27 Repair structure and display panel thereof

Country Status (2)

Country Link
CN (1) CN106959559A (en)
TW (1) TWI603138B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113345920B (en) * 2021-05-26 2022-12-06 深圳市华星光电半导体显示技术有限公司 Array substrate and preparation method and repair method thereof

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201239491A (en) * 2011-03-30 2012-10-01 Au Optronics Corp Rescue line structure, repairing method and liquid crystal display panel
CN102938394A (en) * 2012-11-16 2013-02-20 京东方科技集团股份有限公司 Display device, transflective type thin film transistor array substrate and manufacture method thereof
TW201334139A (en) * 2012-02-03 2013-08-16 E Ink Holdings Inc Display panel circuit structure
CN105607306A (en) * 2014-11-18 2016-05-25 三星显示有限公司 Method of manufacturing display substrate, repair method of display substrate and display substrate repaired by the repair method

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4465065B2 (en) * 1998-10-30 2010-05-19 シャープ株式会社 Wiring disconnection repair method
KR20080058762A (en) * 2006-12-22 2008-06-26 엘지디스플레이 주식회사 An array substrate of thin film transistor liquid crystal display device and the method for fabricating thereof
CN100533747C (en) * 2007-12-24 2009-08-26 友达光电股份有限公司 Pixel structure and method for repairing thereof
TWI562340B (en) * 2015-09-15 2016-12-11 Au Optronics Corp Pixel structure and display panel

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201239491A (en) * 2011-03-30 2012-10-01 Au Optronics Corp Rescue line structure, repairing method and liquid crystal display panel
TW201334139A (en) * 2012-02-03 2013-08-16 E Ink Holdings Inc Display panel circuit structure
CN102938394A (en) * 2012-11-16 2013-02-20 京东方科技集团股份有限公司 Display device, transflective type thin film transistor array substrate and manufacture method thereof
CN105607306A (en) * 2014-11-18 2016-05-25 三星显示有限公司 Method of manufacturing display substrate, repair method of display substrate and display substrate repaired by the repair method

Also Published As

Publication number Publication date
CN106959559A (en) 2017-07-18
TW201823828A (en) 2018-07-01

Similar Documents

Publication Publication Date Title
JP4386862B2 (en) Liquid crystal display device and manufacturing method thereof
TWI642044B (en) Electronic device and manufacturing method thereof
TW201930970A (en) Display panel
CN108628041A (en) Display panel
KR102078807B1 (en) Liquid crystal display
TWI401495B (en) Display panel
TW200813540A (en) Liquid crystal display
WO2016106856A1 (en) Thin film transistor array substrate and liquid crystal display panel
KR102113523B1 (en) Liquid crystal display device and Method for manufacturing the same
KR100610994B1 (en) Liquid crystal display unit
TWI603138B (en) Repair structure and display panel thereof
CN108254988A (en) Broken wire repair method
JP2003216062A (en) Display device
JP2007079357A (en) Display apparatus
JPH11163479A (en) Wiring substrate, array substrate for display device, liquid crystal display device having array substrate, and method for manufacturing the wiring substrate and the array substrate
US20070229752A1 (en) Liquid crystal display apparatus
JP2004205729A (en) Liquid crystal device and method for manufacturing the same
CN1893091A (en) Thin film panel and method of manufacturing the same
JP3241208B2 (en) Active matrix substrate, liquid crystal display device using the same, and method of manufacturing the same
JP4765424B2 (en) Liquid crystal display panel and liquid crystal display device using the same
KR100577301B1 (en) Liquid Crystal Display Device And Method For Fabricating The Same
TWI710819B (en) Liquid crystal display
US20240105897A1 (en) Display device, method of manufacturing the same and tiled display device including the same
JP2004302382A (en) Substrate for electrooptical device, its manufacturing method, and electrooptical device
KR20170034326A (en) Semiconductor device and manufacturing method of semiconductor device

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees