TWI595811B - Printed circuit board and method for manufacturing the same - Google Patents
Printed circuit board and method for manufacturing the same Download PDFInfo
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- TWI595811B TWI595811B TW102126939A TW102126939A TWI595811B TW I595811 B TWI595811 B TW I595811B TW 102126939 A TW102126939 A TW 102126939A TW 102126939 A TW102126939 A TW 102126939A TW I595811 B TWI595811 B TW I595811B
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
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Description
本發明是有關於一種印刷電路板及其製造方法。 The present invention relates to a printed circuit board and a method of fabricating the same.
近年來,隨著可攜式裝置厚度的薄型化,係不斷藉由使具有多個電子元件安裝在其上的電路板變薄、以及使安裝在可攜式裝置上的電子元件變薄,來試圖減少所有內部元件的厚度。 In recent years, with the thinning of the thickness of the portable device, it has been continuously thinned by a circuit board having a plurality of electronic components mounted thereon, and the electronic components mounted on the portable device are thinned. Try to reduce the thickness of all internal components.
特別是當具有電子元件安裝在其上的電路板是以薄板型式製造出來時,在電路板的製造處理或安裝電子元件時的迴銲處理等期間,電路板係暴露在高溫環境中,且電路板反覆地承受高溫處理或冷卻,如此使得電路板可能由於其材料的天性而有翹曲的現象發生。 In particular, when a circuit board having an electronic component mounted thereon is manufactured in a thin plate type, the circuit board is exposed to a high temperature environment during the manufacturing process of the circuit board or the reflow process when the electronic component is mounted, and the circuit The board is repeatedly subjected to high temperature processing or cooling, so that the board may be warped due to the nature of its material.
為了防止電路板的翹曲現象,係不斷地試圖減少原始材料間熱膨脹係數(Coefficient of Thermal Expansion,CTE)的差異,以提升在電路板製造過程中所使用的原始材料的剛性,並改善在迴銲處理時由於各個熱膨脹係數間的差異所造成的翹曲現象。因此,增加了其技術發展的必要性。 In order to prevent the warpage of the board, it is constantly trying to reduce the difference in coefficient of thermal expansion (CTE) between the original materials to improve the rigidity of the original material used in the manufacturing process of the board, and improve the back. Warpage caused by the difference in thermal expansion coefficients during the welding process. Therefore, the need for its technological development has increased.
此外,作為在電路板的製造過程中,藉由改善電路 板實體結構來避免電路板發生翹曲的方法,為了增加電路板芯材料的剛性,已檢視進一步於電路板中插入一金屬補強材的方法;然而,由於此補強材乃為一金屬材料,必須事先除去金屬補強材的一特定部分,以形成穿孔(via)等等來電性連接電路圖案。 In addition, as a circuit in the manufacturing process, by improving the circuit The physical structure of the board to avoid warping of the board, in order to increase the rigidity of the board core material, a method of further inserting a metal reinforcing material into the board has been examined; however, since the reinforcing material is a metal material, it is necessary A specific portion of the metal reinforcing material is removed in advance to form a via or the like.
然而,為了形成穿孔等等於金屬補強材、金屬芯材料或類似材料之中,必須以蝕刻處理或雷射來除去金屬補強材。在此種情形下,必須進行提供一分離載板、形成一絕緣層於位在載板上的金屬補強材上、及移除載板的製程,以進行金屬補強材的處理,如此的處理過程可能會導致電路板製造成本的增加。 However, in order to form a perforation or the like among a metal reinforcing material, a metal core material or the like, the metal reinforcing material must be removed by an etching treatment or a laser. In this case, it is necessary to perform a process of providing a separate carrier, forming an insulating layer on the metal reinforcing material on the carrier, and removing the carrier to perform processing of the metal reinforcing material. This may result in an increase in board manufacturing costs.
此外,在使用金屬補強材的先前技術的例子中,為了避免貫穿孔接觸金屬補強材,在貫穿孔通過的位置,要事先除去掉一部分的金屬補強材,接著在包括貫穿孔(through hole)的表面上形成絕緣層,但在形成電路配線時,形成一密間距(fine pitch)的貫穿孔可能有其難度。 Further, in the prior art example using the metal reinforcing material, in order to prevent the through hole from contacting the metal reinforcing material, a part of the metal reinforcing material is removed in advance at a position where the through hole passes, and then in the through hole. An insulating layer is formed on the surface, but it may be difficult to form a fine pitch through hole when forming circuit wiring.
相關文獻:日本專利申請公開案第2004-193295號 Related documents: Japanese Patent Application Publication No. 2004-193295
本發明的一目的係提出一種用於防止翹曲現象發生的印刷電路板。 An object of the present invention is to provide a printed circuit board for preventing the occurrence of warpage.
本發明的另一目的係提出一種印刷電路板的製造方法,能夠最低化在印刷電路板的製造過程中,電路板翹曲現象的發生。 Another object of the present invention is to provide a method of manufacturing a printed circuit board that minimizes the occurrence of warpage of the board during the manufacturing process of the printed circuit board.
根據本發明之一示範實施例,提出一種印刷電路 板,此一印刷電路板包括一芯,所述芯具有交互層疊於芯中的絕緣層及一芯補強材。 According to an exemplary embodiment of the present invention, a printed circuit is proposed The board, the printed circuit board includes a core having an insulating layer and a core reinforcing material alternately laminated in the core.
芯可具有使得芯補強材插入於絕緣層之間的型態,和使得芯補強材層疊於絕緣層之二表面上的型態。 The core may have a configuration in which a core reinforcing material is interposed between the insulating layers, and a pattern in which the core reinforcing material is laminated on both surfaces of the insulating layer.
芯補強材可以一板狀玻璃材料製成,且可以非導電性高分子材料之薄膜型態形成。 The core reinforcing material can be made of a plate-shaped glass material and can be formed in a film form of a non-conductive polymer material.
芯補強材之一厚度的一部分相對於芯之總厚度所佔的比例範圍可從35%到80%,並且芯可滿足於以下翹曲特性的等式,翹曲特性的等式係描述芯補強材和絕緣層之間的熱膨脹係數與彈性模數(modulus of elasticity)關係。 The ratio of a part of the thickness of one of the core reinforcing materials to the total thickness of the core may range from 35% to 80%, and the core may satisfy the following equation of warpage characteristics, and the equation of the warping characteristic describes the core reinforcing The coefficient of thermal expansion between the material and the insulating layer is related to the modulus of elasticity.
根據本發明之另一示範實施例,提出一種印刷電路板,包括一具有剛性之芯補強材、絕緣層、一貫穿孔、一電路層及一電鍍層,絕緣層形成於芯補強材之二表面上,貫穿孔係以貫穿絕緣層與芯補強材的方式形成,電路層形成於絕緣層上,電鍍層形成於貫穿孔中,以實現電路層之層間連接。 According to another exemplary embodiment of the present invention, a printed circuit board is provided, comprising a rigid core reinforcing material, an insulating layer, a consistent through hole, a circuit layer and a plating layer, and the insulating layer is formed on two surfaces of the core reinforcing material The through hole is formed through the insulating layer and the core reinforcing material, the circuit layer is formed on the insulating layer, and the plating layer is formed in the through hole to realize the interlayer connection of the circuit layer.
根據本發明之另一示範實施例,提出一種印刷電路 板的製造方法,包括:準備一芯補強材;形成絕緣層於芯補強材之二表面上;形成一貫穿孔,貫穿芯補強材與絕緣層;以及形成一電鍍層於貫穿孔中,並形成一電路層於絕緣層之一表面上。 According to another exemplary embodiment of the present invention, a printed circuit is proposed The manufacturing method of the board comprises: preparing a core reinforcing material; forming an insulating layer on the two surfaces of the core reinforcing material; forming a uniform perforation, penetrating the core reinforcing material and the insulating layer; and forming a plating layer in the through hole, and forming a The circuit layer is on one surface of the insulating layer.
根據本發明之另一示範實施例,提出一種印刷電路 板,包括一絕緣層、芯補強材、一貫穿孔以及一電路層,芯補強材層疊於絕緣層之二表面上,貫穿孔以貫穿絕緣層與芯補強材的方式形成,電路層形成於芯補強材上。 According to another exemplary embodiment of the present invention, a printed circuit is proposed The plate comprises an insulating layer, a core reinforcing material, a consistent perforation and a circuit layer. The core reinforcing material is laminated on the two surfaces of the insulating layer, the through hole is formed through the insulating layer and the core reinforcing material, and the circuit layer is formed on the core reinforcing On the material.
根據本發明之另一示範實施例,提出一種印刷電路 板的製造方法,包括:接合芯補強材至一絕緣層之二表面上;形成一種子層於芯補強材上;形成一阻鍍層,阻鍍層具有一開口,以形成一電路層於種子層上;形成一電鍍層於開口中,以形成所述電路層;以及藉由去除阻鍍層,形成電路層。 According to another exemplary embodiment of the present invention, a printed circuit is proposed The manufacturing method of the board comprises: bonding a core reinforcing material to two surfaces of an insulating layer; forming a sub-layer on the core reinforcing material; forming a resist plating layer, the resist plating layer having an opening to form a circuit layer on the seed layer Forming a plating layer in the opening to form the circuit layer; and forming a circuit layer by removing the plating resist.
100‧‧‧印刷電路板 100‧‧‧Printed circuit board
110‧‧‧芯補強材 110‧‧‧core reinforcing material
115‧‧‧塗層 115‧‧‧ Coating
120‧‧‧絕緣層 120‧‧‧Insulation
125‧‧‧金屬薄膜 125‧‧‧Metal film
130‧‧‧電路層 130‧‧‧ circuit layer
140‧‧‧電鍍層 140‧‧‧Electroplating
150‧‧‧貫穿孔 150‧‧‧through holes
200‧‧‧印刷電路板 200‧‧‧Printed circuit board
210‧‧‧絕緣層 210‧‧‧Insulation
220‧‧‧芯補強材 220‧‧‧ core reinforcement
230‧‧‧種子層 230‧‧‧ seed layer
230a‧‧‧第一種子層 230a‧‧‧first seed layer
230b‧‧‧第二種子層 230b‧‧‧Second seed layer
240‧‧‧阻鍍層 240‧‧‧resist plating
250‧‧‧貫穿孔 250‧‧‧through holes
260‧‧‧電鍍層 260‧‧‧ plating
270‧‧‧電路層 270‧‧‧ circuit layer
300‧‧‧多層印刷電路板 300‧‧‧Multilayer printed circuit boards
310‧‧‧絕緣層 310‧‧‧Insulation
320‧‧‧電路層 320‧‧‧ circuit layer
330‧‧‧通孔 330‧‧‧through hole
340‧‧‧阻銲層 340‧‧‧solder layer
C‧‧‧芯 C‧‧‧ core
第1圖是根據本發明第一示範實施例之印刷電路板的剖面圖。 Figure 1 is a cross-sectional view of a printed circuit board in accordance with a first exemplary embodiment of the present invention.
第2-5圖是根據本發明第一示範實施例之印刷電路板之製造方法各步驟的剖面圖。 2 to 5 are cross-sectional views showing respective steps of a method of manufacturing a printed circuit board according to a first exemplary embodiment of the present invention.
第2圖是一芯補強材的剖面圖。 Figure 2 is a cross-sectional view of a core reinforcing material.
第3A圖是其中一絕緣層層疊於芯補強材上的結構的剖面圖。 Fig. 3A is a cross-sectional view showing a structure in which an insulating layer is laminated on a core reinforcing material.
第3B圖是其中一塗層插入於芯補強材與絕緣層之間的結構 的剖面圖。 Figure 3B is a structure in which one of the coatings is interposed between the core reinforcing material and the insulating layer Sectional view.
第3C圖是其中一金屬薄膜形成於絕緣層上的結構的剖面圖。 Fig. 3C is a cross-sectional view showing a structure in which a metal thin film is formed on an insulating layer.
第4圖是其中形成有一貫穿孔的結構的剖面圖。 Fig. 4 is a cross-sectional view showing a structure in which a uniform perforation is formed.
第5圖是其中一電路層形成於絕緣層上且一電鍍層形成於貫穿孔中的結構的剖面圖。 Fig. 5 is a cross-sectional view showing a structure in which a circuit layer is formed on an insulating layer and a plating layer is formed in the through hole.
第6圖是根據本發明第二實施例之印刷電路板的剖面圖。 Figure 6 is a cross-sectional view showing a printed circuit board in accordance with a second embodiment of the present invention.
第7-12圖是根據本發明第二示範實施例之印刷電路板製造方法各步驟的剖面圖。 7-12 are cross-sectional views showing respective steps of a method of manufacturing a printed circuit board according to a second exemplary embodiment of the present invention.
第7圖是其中一芯補強材層疊於一絕緣層上的結構的剖面圖。 Figure 7 is a cross-sectional view showing a structure in which a core reinforcing material is laminated on an insulating layer.
第8圖是其中形成有一貫穿孔的結構的剖面圖。 Fig. 8 is a cross-sectional view showing a structure in which a uniform perforation is formed.
第9圖是其中種子層形成於芯補強材之一表面上與貫穿孔之一內壁上的結構的剖面圖。 Fig. 9 is a cross-sectional view showing a structure in which a seed layer is formed on one surface of a core reinforcing material and an inner wall of one of the through holes.
第10圖是其中形成有一阻鍍層的結構的剖面圖。 Fig. 10 is a cross-sectional view showing a structure in which a plating resist is formed.
第11圖是其中形成有一電鍍層的結構的剖面圖。 Figure 11 is a cross-sectional view showing a structure in which a plating layer is formed.
第12圖是其中形成有一電路層的結構的剖面圖。 Figure 12 is a cross-sectional view showing a structure in which a circuit layer is formed.
第13圖是其中根據複數個絕緣層與複數個電路層係建立於根據本發明示範實施例之印刷電路板上的一多層印刷電路板的剖面圖。 Figure 13 is a cross-sectional view of a multilayer printed circuit board in which a plurality of insulating layers and a plurality of circuit layers are formed on a printed circuit board according to an exemplary embodiment of the present invention.
第14圖是根據本發明第一示範實施例之印刷電路板與根據先前技術之印刷電路板的翹曲特性模擬圖。 Figure 14 is a simulation diagram of warpage characteristics of a printed circuit board according to a first exemplary embodiment of the present invention and a printed circuit board according to the prior art.
第15圖是根據本發明第一示範實施例與根據本發明第二示範實施例之印刷電路板的剛性模擬圖。 Figure 15 is a perspective view showing the rigidity of a printed circuit board according to a first exemplary embodiment of the present invention and a second exemplary embodiment of the present invention.
第16圖是根據本發明第一示範實施例之印刷電路板與根據 本發明第二示範實施例之印刷電路板的翹曲特性模擬圖。 Figure 16 is a printed circuit board and according to a first exemplary embodiment of the present invention A simulation diagram of the warpage characteristics of the printed circuit board of the second exemplary embodiment of the present invention.
藉由以下參照所附圖式所敘述之本發明的示範實施例,將可清楚了解與根據本發明之一種印刷電路板及其製造方法之各方面相關的作用效果與技術配置。 The effects and technical configurations associated with aspects of a printed circuit board and method of fabricating the same according to the present invention will be apparent from the following description of the exemplary embodiments of the invention.
此外,當確定與本發明相關之習知技術的詳細描述內容可能會模糊本發明的主旨時,將省略其中詳細說明的部分。在本說明書中,「第一」與「第二」等用語係用來區別一個要件與另一個要件,這些要件不受上述用語限制。 Further, when it is determined that the detailed description of the related art related to the present invention may obscure the gist of the present invention, the portions detailed therein will be omitted. In this specification, terms such as "first" and "second" are used to distinguish one element from another, and these elements are not limited by the above terms.
第一示範實施例:印刷電路板 First exemplary embodiment: printed circuit board
首先,第1圖是根據本發明第一示範實施例之印刷電路板的剖面圖。 First, Fig. 1 is a cross-sectional view of a printed circuit board according to a first exemplary embodiment of the present invention.
如第1圖所示,根據本發明第一示範實施例之印刷電路板100可包括一芯補強材110、一芯C及電路層130,芯C包含形成於芯補強材110之二表面上的絕緣層120,電路層130形成於絕緣層120上。 As shown in FIG. 1, a printed circuit board 100 according to a first exemplary embodiment of the present invention may include a core reinforcing member 110, a core C and a circuit layer 130, and the core C includes a surface formed on the surface of the core reinforcing member 110. The insulating layer 120 and the circuit layer 130 are formed on the insulating layer 120.
在此形態中,提供一貫穿孔150於印刷電路板100中,貫穿孔150同時貫穿芯補強材110與絕緣層120,且電路層130可形成於絕緣層120上,一電鍍層140可形成於貫穿孔150中。 In this embodiment, a uniform through hole 150 is provided in the printed circuit board 100. The through hole 150 penetrates the core reinforcing material 110 and the insulating layer 120 at the same time, and the circuit layer 130 can be formed on the insulating layer 120. A plating layer 140 can be formed through the through hole. Hole 150.
一塗層(未繪示)可進一步地被配置於芯補強材110 與絕緣層120之間,以補強芯補強材110之一表面與絕緣層120之間的黏著力。塗層可藉由在芯補強材110的所述表面上進行電漿處理,增加一游離羥基(ionization-OH group),以提升芯補強材110與絕緣層120間的黏著力,塗層可藉由塗佈一耦合劑和類似物的方式形成,以確保芯補強材110與絕緣層120之間的黏著力。 A coating (not shown) may be further disposed on the core reinforcing material 110 Between the insulating layer 120 and the insulating layer 120, the adhesion between the surface of one of the reinforcing core members 110 and the insulating layer 120 is used. The coating may be subjected to a plasma treatment on the surface of the core reinforcing material 110 to add an ionization-OH group to improve the adhesion between the core reinforcing material 110 and the insulating layer 120. It is formed by coating a coupling agent and the like to ensure adhesion between the core reinforcing member 110 and the insulating layer 120.
在此種情形下,塗層可較佳地以約2微米或更低之一厚度形成。 In this case, the coating layer may preferably be formed to a thickness of about 2 microns or less.
在此,芯補強材110可為玻璃或非導電性高分子材料。若為玻璃時,使用一板狀玻璃並使其形成之厚度相對於印刷電路板的總厚度為約25至200微米。 Here, the core reinforcing material 110 may be a glass or a non-conductive polymer material. In the case of glass, a sheet of glass is used and formed to a thickness of about 25 to 200 microns relative to the total thickness of the printed circuit board.
限制作為芯補強材110的玻璃之厚度為25至200微米的原因,係由於一預定的翹曲情況可能會在印刷電路板的製造期間發生,且當芯補強材的翹曲曲率半徑為10公分或更低時,在芯補強材中玻璃之厚度為25至200微米的情況下,芯補強材可確實地避免損壞。 The reason for limiting the thickness of the glass as the core reinforcing material 110 to 25 to 200 μm may occur during the manufacture of the printed circuit board due to a predetermined warpage, and when the radius of curvature of the core reinforcing material is 10 cm. Or lower, in the case where the thickness of the glass in the core reinforcing material is 25 to 200 μm, the core reinforcing material can surely avoid damage.
當使用玻璃作為芯補強材110時,可較佳地使用一導熱係數為約0.6W/mK的玻璃材料,更佳地,可使用一導熱係數為1.0W/mK或更高的玻璃材料,以避免局部熱應力。 When glass is used as the core reinforcing member 110, a glass material having a thermal conductivity of about 0.6 W/mK can be preferably used, and more preferably, a glass material having a thermal conductivity of 1.0 W/mK or higher can be used. Avoid local thermal stresses.
因此,當使用玻璃材料作為芯補強材110時,因玻璃材料具有50GPa或更高的高彈性模數,從而能避免在製造印刷電路板的過程中發生翹曲現象。 Therefore, when a glass material is used as the core reinforcing member 110, since the glass material has a high elastic modulus of 50 GPa or more, warpage can be prevented from occurring in the process of manufacturing a printed circuit board.
此外,芯補強材110也可以非導電性高分子材料之 薄膜型態形成,來代替玻璃。 In addition, the core reinforcing material 110 can also be a non-conductive polymer material. The film is formed to replace the glass.
形成於芯補強材110之二表面上的絕緣層120可包括數股玻璃纖維組織,以分別維持彈性模數而能夠限制芯補強材110的翹曲。 The insulating layer 120 formed on the surfaces of the core reinforcing members 110 may include a plurality of glass fiber structures to maintain the elastic modulus and to limit the warpage of the core reinforcing members 110, respectively.
因此,絕緣層120可以以包含玻璃纖維組織之薄膜型態或絕緣薄片形成。 Therefore, the insulating layer 120 may be formed in a film type or an insulating sheet containing a glass fiber structure.
當絕緣層120係以絕緣薄片形成時,絕緣薄片層疊於芯補強材110之二表面上,且絕緣薄片可藉由加熱和加壓絕緣薄片的上表面以壓緊絕緣薄片,來接合至芯補強材110的表面。 When the insulating layer 120 is formed of an insulating sheet, the insulating sheet is laminated on both surfaces of the core reinforcing member 110, and the insulating sheet can be bonded to the core reinforcing member by heating and pressing the upper surface of the insulating sheet to press the insulating sheet. The surface of the material 110.
本發明之示範實施例敘述了絕緣層120係形成於芯補強材110的二表面上,但並不以此為限。因此,絕緣層120可僅形成於芯補強材110的一表面上。 The exemplary embodiment of the present invention describes that the insulating layer 120 is formed on both surfaces of the core reinforcing member 110, but is not limited thereto. Therefore, the insulating layer 120 may be formed only on one surface of the core reinforcing material 110.
此外,提供貫穿孔150至形成有絕緣層120的芯補強材110,貫穿孔150貫穿於絕緣層120與芯補強材110,且電鍍層140可形成於貫穿孔150中,電路層130可形成於絕緣層120上。電路層130與電鍍層140可藉由電解鍍銅(electrolytic copper plating)形成,形成於絕緣層120上的電路層130可形成一電路圖案,且形成於貫穿孔150中的電鍍層140可形成為一層間連接層,電性連接形成於絕緣層120上的電路層130。 In addition, the through hole 150 is provided to the core reinforcing material 110 formed with the insulating layer 120. The through hole 150 penetrates through the insulating layer 120 and the core reinforcing material 110, and the plating layer 140 may be formed in the through hole 150, and the circuit layer 130 may be formed on On the insulating layer 120. The circuit layer 130 and the plating layer 140 may be formed by electrolytic copper plating, and the circuit layer 130 formed on the insulating layer 120 may form a circuit pattern, and the plating layer 140 formed in the through hole 150 may be formed as An interlayer connection layer electrically connects the circuit layer 130 formed on the insulating layer 120.
再者,一厚度2微米或更低的薄金屬薄膜(未繪示)可進一步形成於絕緣層120上。金屬薄膜可主要以一銅箔形成,且可在塗佈絕緣層120於芯補強材110上的同時形成。 Further, a thin metal film (not shown) having a thickness of 2 μm or less may be further formed on the insulating layer 120. The metal thin film may be formed mainly of a copper foil, and may be formed while coating the insulating layer 120 on the core reinforcing material 110.
金屬薄膜在進行電解鍍銅以形成電路層130時,用 作為一種子層(seed layer),且金屬薄膜必須以2微米或更低之一厚度形成,才能夠進行雷射處理以形成貫穿絕緣層120與芯補強材110的貫穿孔150。此外,金屬薄膜可以導電碳材料製成。 The metal film is used for electrolytic copper plating to form the circuit layer 130. As a seed layer, and the metal thin film must be formed with a thickness of 2 μm or less, laser processing can be performed to form the through hole 150 penetrating the insulating layer 120 and the core reinforcing material 110. Further, the metal film can be made of a conductive carbon material.
第一示範實施例:印刷電路板的製造方法 First Exemplary Embodiment: Method of Manufacturing Printed Circuit Board
同時,以下將參照第2-5圖,描述根據本發明示範實施例之印刷電路板的製造方法。 Meanwhile, a method of manufacturing a printed circuit board according to an exemplary embodiment of the present invention will be described below with reference to FIGS. 2-5.
首先,如第2圖所示,準備芯補強材110。芯補強材110可為板狀玻璃或是非導電性高分子材料。在非導電性高分子材料的例子中,芯補強材可以薄膜型態形成。 First, as shown in Fig. 2, a core reinforcing material 110 is prepared. The core reinforcing material 110 may be a plate glass or a non-conductive polymer material. In the example of the non-conductive polymer material, the core reinforcing material can be formed in a film form.
在此,在玻璃的例子中,芯補強材110較佳地擁有50GPa或更高的彈性模數,並且芯補強材110係以25至200微米之一厚度形成,當固定芯補強材110之厚度時,在印刷電路板的製造期間,芯補強材可以一預定的曲率半徑變形,而後可在不損壞的情況下回復到原來的狀態。 Here, in the example of the glass, the core reinforcing material 110 preferably has an elastic modulus of 50 GPa or more, and the core reinforcing material 110 is formed with a thickness of one of 25 to 200 μm when the thickness of the reinforcing core reinforcing material 110 is fixed. At the time of manufacture of the printed circuit board, the core reinforcing material can be deformed by a predetermined radius of curvature, and then can be returned to the original state without being damaged.
接著,如第3A圖所示,芯C可藉由形成絕緣層120於芯補強材110之二表面上來製造。絕緣層120係藉由塗佈一絕緣材料於芯補強材110上來形成。舉例來說,一加入玻璃纖維組織材料的絕緣材料也可塗佈於芯補強材110上。 Next, as shown in FIG. 3A, the core C can be fabricated by forming the insulating layer 120 on both surfaces of the core reinforcing member 110. The insulating layer 120 is formed by coating an insulating material on the core reinforcing member 110. For example, an insulating material added to the fiberglass structure material may also be applied to the core reinforcing member 110.
在此種情形下,如第3B圖所示,在形成絕緣層120的步驟前,進一步形成塗層115於芯補強材110之一表面或二表面上。塗層115係為一薄絕緣層,以補強芯補強材110與絕緣層 120之間的黏著力,塗層115主要係塗佈一高分子材料,以改善絕緣層120的黏著表現。塗層115較佳地係以約2微米或更低之一厚度形成,且塗層115可藉由在芯補強材110的表面上進行電漿處理來增加羥基,以提升黏著力。 In this case, as shown in FIG. 3B, before the step of forming the insulating layer 120, the coating layer 115 is further formed on one surface or both surfaces of the core reinforcing member 110. The coating 115 is a thin insulating layer for reinforcing the core reinforcing material 110 and the insulating layer The adhesion between the 120 and the coating 115 is mainly coated with a polymer material to improve the adhesion of the insulating layer 120. The coating 115 is preferably formed to a thickness of about 2 microns or less, and the coating 115 can be increased in viscosity by plasma treatment on the surface of the core reinforcing member 110 to enhance adhesion.
此外,塗層115除了藉由在芯補強材110的表面上進行電漿處理外,還可藉由塗佈一耦合劑和類似物的方式形成。 Further, the coating layer 115 can be formed by coating a coupling agent and the like in addition to the plasma treatment on the surface of the core reinforcing member 110.
接著,如第4圖所示,可形成貫穿芯補強材110與絕緣層120的貫穿孔150。貫穿孔150可主要藉由雷射處理來形成,並使用CO2雷射加以處理。當以絕緣材料製成的芯補強材110與絕緣層120係藉由雷射照射形成時,如同先前技術,不需形成一用以防止層間導電的分離絕緣基板於貫穿孔150的內壁表面上,且由於貫穿孔僅藉由雷射處理形成,因此可處理具有密間距(fine pitch)的貫穿孔150。 Next, as shown in FIG. 4, a through hole 150 penetrating the core reinforcing material 110 and the insulating layer 120 can be formed. The through holes 150 can be formed primarily by laser processing and processed using a CO 2 laser. When the core reinforcing member 110 and the insulating layer 120 made of an insulating material are formed by laser irradiation, as in the prior art, it is not necessary to form a separate insulating substrate for preventing interlayer conduction on the inner wall surface of the through hole 150. And since the through holes are formed only by laser processing, the through holes 150 having a fine pitch can be processed.
同時,如第3C圖所示,在形成貫穿孔於芯補強材110與絕緣層120中的步驟前,厚度約2微米的薄金屬薄膜125可進一步形成於絕緣層120上。金屬薄膜125可主要以一銅箔形成,且由於金屬薄膜125形成的厚度夠厚,足以進行雷射處理(以5微米或更低之厚度來進行CO2雷射加工),因此貫穿孔150可由CO2雷射照射加以處理。 Meanwhile, as shown in FIG. 3C, a thin metal thin film 125 having a thickness of about 2 μm may be further formed on the insulating layer 120 before the step of forming the through holes in the core reinforcing material 110 and the insulating layer 120. The metal film 125 may be mainly formed of a copper foil, and since the metal film 125 is formed thick enough to perform laser processing (CO 2 laser processing at a thickness of 5 μm or less), the through hole 150 may be CO 2 laser irradiation is applied.
在此種情形下,在後續的處理過程中以銅電鍍形成電路層時,形成於絕緣層120上的金屬薄膜125,除了形成貫穿孔150的部分外,還可作為一種子層。 In this case, when the circuit layer is formed by copper plating in the subsequent process, the metal thin film 125 formed on the insulating layer 120 may serve as a sub-layer in addition to the portion forming the through hole 150.
接著,如第5圖所示,電鍍層140可形成於貫穿孔 150中,電路層130可形成於絕緣層120上。在電鍍層140與電路層130當中,形成於絕緣層120上的電路層130可形成一電路圖案,且形成於貫穿孔150中的電鍍層140可形成為一層間連接層,電性連接形成於絕緣層120上形成電路圖案的電路層130。 Next, as shown in FIG. 5, the plating layer 140 may be formed in the through hole In 150, the circuit layer 130 may be formed on the insulating layer 120. In the plating layer 140 and the circuit layer 130, the circuit layer 130 formed on the insulating layer 120 may form a circuit pattern, and the plating layer 140 formed in the through hole 150 may be formed as an interlayer connection layer, and the electrical connection is formed on A circuit layer 130 of a circuit pattern is formed on the insulating layer 120.
電路層130與電鍍層140可藉由電解鍍銅形成,且 可同時地形成於絕緣層120上與貫穿孔150中。 The circuit layer 130 and the plating layer 140 may be formed by electrolytic copper plating, and It can be simultaneously formed on the insulating layer 120 and in the through hole 150.
第二示範實施例:印刷電路板 Second exemplary embodiment: printed circuit board
同時,第6圖是根據本發明第二示範實施例之印刷 電路板的剖面圖。 Meanwhile, FIG. 6 is a printing according to a second exemplary embodiment of the present invention. A cross-sectional view of the board.
如第6圖所示,根據本發明第二示範實施例之印刷 電路板200可包括一絕緣層210、一芯C及一電路層270,芯C包含形成於絕緣層210上的芯補強材220,電路層270形成於芯C上。 As shown in FIG. 6, the printing according to the second exemplary embodiment of the present invention The circuit board 200 can include an insulating layer 210, a core C, and a circuit layer 270. The core C includes a core reinforcing material 220 formed on the insulating layer 210, and the circuit layer 270 is formed on the core C.
在此種情形下,如同上述之塗佈於根據本發明第一 示範實施例之印刷電路板上的絕緣層,絕緣層210可由一包括數股玻璃纖維組織的絕緣材料所製成,並且可以其中混有玻璃纖維組織之薄膜型態或絕緣薄片形成。 In this case, as described above, coated in accordance with the present invention first In the insulating layer on the printed circuit board of the exemplary embodiment, the insulating layer 210 may be made of an insulating material including a plurality of glass fiber structures, and may be formed of a film type or an insulating sheet in which a glass fiber structure is mixed.
如第6圖所示,芯補強材220可接合至絕緣層210 之二表面上,其僅為其中一示範實施例,芯補強材220也可僅接合至絕緣層210的其中一表面上。 As shown in FIG. 6, the core reinforcing material 220 may be bonded to the insulating layer 210 On the second surface, which is only one of the exemplary embodiments, the core reinforcing material 220 may also be bonded only to one surface of the insulating layer 210.
可使用具有約50GPa或更高彈性模數的玻璃作為 芯補強材220,並且薄板狀玻璃可各自層疊於絕緣層210的上及下表面上。此外,芯補強材220可以非導電性高分子材料之薄膜型態形成,來代替玻璃。 A glass having an elastic modulus of about 50 GPa or more can be used as the glass The core reinforcing material 220 and the thin plate glass may be laminated on the upper and lower surfaces of the insulating layer 210, respectively. Further, the core reinforcing material 220 may be formed in a film form of a non-conductive polymer material instead of glass.
如以上所述,當板狀玻璃的芯補強材220形成於絕 緣層210之二表面上時,具有絕緣層210位於其間,位於芯補強材220之間的絕緣層210用於吸收衝擊,從而避免芯補強材220在印刷電路板的製造過程中損壞。 As described above, when the core material 220 of the sheet glass is formed When the surface of the edge layer 210 is on the surface with the insulating layer 210 therebetween, the insulating layer 210 between the core reinforcing members 220 serves to absorb the impact, thereby preventing the core reinforcing material 220 from being damaged during the manufacturing process of the printed circuit board.
在此,第6圖繪示層疊於芯補強材220之間的絕緣 層210係一單層結構,這只是用以描述一示範實施例。因此,絕緣層可以至少兩層之多層結構形成。 Here, FIG. 6 illustrates the insulation laminated between the core reinforcing members 220. Layer 210 is a single layer structure that is only used to describe an exemplary embodiment. Therefore, the insulating layer can be formed in a multilayer structure of at least two layers.
電路層270可以一預定圖案形成於芯補強材220 上,並類似於本發明之第一示範實施例,形成於芯補強材220上的電路層270可藉由填充於貫穿孔250中的電鍍層260來達成層間連接,其中貫穿孔250係藉由貫穿芯補強材220與絕緣層210的方式形成。 The circuit layer 270 may be formed on the core reinforcing material 220 in a predetermined pattern. And similar to the first exemplary embodiment of the present invention, the circuit layer 270 formed on the core reinforcing material 220 can achieve interlayer connection by the plating layer 260 filled in the through hole 250, wherein the through hole 250 is It is formed through the core reinforcing material 220 and the insulating layer 210.
電路層270可藉由電鍍層而形成於芯補強材220上,並且在形成電鍍層以形成電路層270時,先形成種子層230,而後可形成電鍍層,且電路層270可藉由電鍍層的圖案來形成。在此種情形下,種子層230可由一第一種子層230a與一第二種子層230b形成。 The circuit layer 270 may be formed on the core reinforcing material 220 by a plating layer, and when the plating layer is formed to form the circuit layer 270, the seed layer 230 is formed first, and then a plating layer may be formed, and the circuit layer 270 may be formed by plating The pattern to form. In this case, the seed layer 230 may be formed of a first seed layer 230a and a second seed layer 230b.
種子層230包括第一種子層230a與第二種子層230b,種子層230可以選自於由鈦(Ti)、銅(Cu)、鉬(Mo)、鎳(Ni)、 銀(Ag)、鋅(Zn)、及碳(C)、及類似物、或其合金所組成之群組的任一者製成。 The seed layer 230 includes a first seed layer 230a and a second seed layer 230b, and the seed layer 230 may be selected from titanium (Ti), copper (Cu), molybdenum (Mo), nickel (Ni), Any of a group consisting of silver (Ag), zinc (Zn), and carbon (C), and the like, or an alloy thereof.
此外,考量到成本、製程等等上的優點,種子層230 與電路層270可以銅製成。 In addition, taking into account the advantages of cost, process, etc., seed layer 230 The circuit layer 270 can be made of copper.
依照根據本發明之示範實施例所形成的印刷電路板 200,由於位於絕緣層210上的芯補強材220係以板狀玻璃所製成,形成於芯補強材220上的電路層270便形成在一光滑表面,使得位於芯補強材220與電路層270間的表面毫無粗糙度,從而輕易實現具有較少的訊號雜訊與超密間距的電路層270。 Printed circuit board formed in accordance with an exemplary embodiment of the present invention 200, since the core reinforcing material 220 on the insulating layer 210 is made of plate glass, the circuit layer 270 formed on the core reinforcing material 220 is formed on a smooth surface so that the core reinforcing material 220 and the circuit layer 270 are located. The surface between them has no roughness, so that the circuit layer 270 with less signal noise and ultra-fine pitch is easily realized.
由於電路層270具有一光滑表面,也就是說,具有 小的表面粗糙度,形成電路層所需的蝕刻量減少,且在形成電路層時的損失量減少,從而形成超密間距,並明顯地降低了訊號雜訊。 Since the circuit layer 270 has a smooth surface, that is, With a small surface roughness, the amount of etching required to form the circuit layer is reduced, and the amount of loss in forming the circuit layer is reduced, thereby forming an ultra-fine pitch and significantly reducing signal noise.
第二示範實施例:印刷電路板的製造方法 Second Exemplary Embodiment: Method of Manufacturing Printed Circuit Board
接著,第7-12圖是連續根據本發明第二示範實施例之印刷電路板製造方法各步驟的剖面圖。 Next, Fig. 7-12 are cross-sectional views showing respective steps of a method of manufacturing a printed circuit board according to a second exemplary embodiment of the present invention.
首先,如第7圖所示,可藉由接合芯補強材至絕緣層210的上及下表面上來製成芯C。在此種情形下,絕緣層210可以其中浸有玻璃纖維組織之一絕緣材料製成,作為具有耐熱性的高分子材料,並且可以其中混有玻璃纖維組織之薄膜型態或絕緣薄片形成。此外,層疊於芯補強材之間的絕緣層210吸收於製程期間所產生的衝擊,以防止芯補強材220由於衝擊或翹曲而損 壞。 First, as shown in Fig. 7, the core C can be made by bonding the core reinforcing material to the upper and lower surfaces of the insulating layer 210. In this case, the insulating layer 210 may be made of an insulating material in which one of the glass fiber structures is impregnated, as a polymer material having heat resistance, and may be formed of a film type or an insulating sheet in which a glass fiber structure is mixed. In addition, the insulating layer 210 laminated between the core reinforcing materials absorbs the impact generated during the process to prevent the core reinforcing material 220 from being damaged due to impact or warpage. Bad.
芯C的製造更可包括層疊芯補強材220於絕緣層 210之二表面上,依序層疊芯補強材220與絕緣層210,並加熱和加壓芯補強材220與絕緣層210,以接合芯補強材220至絕緣層210之二表面上。 The manufacturing of the core C may further include laminating the core reinforcing material 220 on the insulating layer On the surface of the 210 second, the core reinforcing material 220 and the insulating layer 210 are sequentially laminated, and the core reinforcing material 220 and the insulating layer 210 are heated and pressed to bond the core reinforcing material 220 to the two surfaces of the insulating layer 210.
接著,如第8圖所示,可形成貫穿芯C的貫穿孔 250,其中絕緣層210與芯補強材220層疊於芯C中。貫穿孔250可以由雷射鑽孔形成,代表性的如CO2雷射、亞格雷射(YAG laser)和脈衝紫外準分子雷射(pulse UV excimer laser)等等。 Next, as shown in FIG. 8, a through hole 250 penetrating the core C may be formed, in which the insulating layer 210 and the core reinforcing material 220 are laminated in the core C. The through holes 250 may be formed by laser drilling, such as CO 2 lasers, YAG lasers, pulse UV excimer lasers, and the like.
同時,在形成貫穿孔250於芯C中的步驟後,可進一步清潔形成貫穿孔250的芯C的表面與貫穿孔250的一內壁。在此種情形下,並不限於一特別的製程來清潔芯C的表面與貫穿孔250的內壁,因此可使用乾蝕刻或溼蝕刻,也可使用除膠渣處理(desmear process)。特別是,作為乾蝕刻處理、可使用電漿蝕刻、濺鍍蝕刻和離子蝕刻等等。 Meanwhile, after the step of forming the through hole 250 in the core C, the surface of the core C forming the through hole 250 and an inner wall of the through hole 250 may be further cleaned. In this case, it is not limited to a special process for cleaning the surface of the core C and the inner wall of the through hole 250, so dry etching or wet etching may be used, and a desmear process may also be used. In particular, as the dry etching treatment, plasma etching, sputtering etching, ion etching, or the like can be used.
接著,如第9圖所示,種子層230可形成於芯C的表面上,包括貫穿孔250的內壁。於後續的製程中,在形成電鍍層以形成電路層270時,種子層230係用以促使電鍍層的生長,種子層230主要可以一濺鍍方法來形成。此外,假如有必要的話,種子層230可分為第一種子層230a與第二種子層230b而形成,且其可以選自由鈦(Ti)、銅(Cu)、鉬(Mo)、鎳(Ni)、銀(Ag)、鋅(Zn)及碳(C)、及類似物、或其合金所組成之群組的任一者製成。 Next, as shown in FIG. 9, the seed layer 230 may be formed on the surface of the core C including the inner wall of the through hole 250. In a subsequent process, when a plating layer is formed to form the circuit layer 270, the seed layer 230 is used to promote the growth of the plating layer, and the seed layer 230 can be formed mainly by a sputtering method. In addition, the seed layer 230 may be formed by dividing the first seed layer 230a and the second seed layer 230b, if necessary, and may be selected from the group consisting of titanium (Ti), copper (Cu), molybdenum (Mo), and nickel (Ni). Any of a group consisting of silver (Ag), zinc (Zn), and carbon (C), and the like, or alloys thereof.
接下來,如第10圖所示,可形成一阻鍍層(plating resist layer)240,阻鍍層240具有一開口241,以形成電路於種子層230上。阻鍍層240可以一使用感光性高分子的光阻來形成,用以形成電路的開口241可在塗佈光阻的步驟後,以一遮罩來形成。在此種情形下,用以形成阻鍍層240之電路的開口241可依據電路圖案的設計規範來形成。 Next, as shown in FIG. 10, a plating layer can be formed (plating) Resistor layer 240, the plating resist 240 has an opening 241 to form a circuit on the seed layer 230. The plating resist 240 may be formed using a photoresist of a photosensitive polymer, and the opening 241 for forming a circuit may be formed by a mask after the step of applying the photoresist. In this case, the opening 241 of the circuit for forming the plating resist 240 may be formed in accordance with the design specifications of the circuit pattern.
其後,如第11-12圖所示,形成電鍍層260於形成 有阻鍍層240的芯補強材220上,可除去阻鍍層240以形成電路層270。 Thereafter, as shown in FIGS. 11-12, the formation of the plating layer 260 is formed. On the core reinforcing material 220 having the plating resist 240, the plating resist 240 may be removed to form the circuit layer 270.
在此,形成電鍍層260於芯補強材220上的電鍍處 理可以電鍍(electroplating)來執行,較佳地可以銅所製成。此外,可以一機械剝離處理(mechanical delamination process)及一使用化學溶液的化學剝離處理(chemical delaminating process)來執行阻鍍層240的移除。 Here, the plating layer 260 is formed on the plating place on the core reinforcing material 220. The electroplating can be performed, preferably made of copper. Further, the removal of the plating resist 240 may be performed by a mechanical delamination process and a chemical delaminating process using a chemical solution.
依照根據本發明第一及第二示範實施例所形成的的 印刷電路板100及200,如第13圖所示,芯補強材220係形成於絕緣層210上,或者,可以依序進行連續層疊第二絕緣層310與電路層270於具有芯補強材220層疊於絕緣層210之二表面上的型態的芯C的上和下表面上的建立製程。 According to the first and second exemplary embodiments of the present invention The printed circuit boards 100 and 200, as shown in FIG. 13, the core reinforcing material 220 is formed on the insulating layer 210, or the second insulating layer 310 and the circuit layer 270 may be successively laminated in sequence to be laminated with the core reinforcing material 220. A process is established on the upper and lower surfaces of the core C of the type on the surface of the insulating layer 210.
第13圖是其中複數個絕緣層與複數個電路層建立 於根據本發明示範實施例之印刷電路板上的一多層印刷電路板的剖面圖。 Figure 13 is where a plurality of insulating layers are formed with a plurality of circuit layers A cross-sectional view of a multilayer printed circuit board on a printed circuit board in accordance with an exemplary embodiment of the present invention.
在製造如第1和6圖中所示的印刷電路板的步驟 後,第13圖中所示的多層印刷電路板300可藉由分別層疊以預浸材(prepreg,PPG)所製成之第二絕緣層310於芯C上及下表面上,其中絕緣層210及芯補強材220層疊於芯C中,接著形成電路層320於第二絕緣層310上來製造而成。提供通孔(via hole)330至層疊於芯C上的第二絕緣層310,以導通形成於芯C上的電路層270與形成於第二絕緣層310上的電路層320,從而實現電路層的層間連接,阻銲層(solder resist layer)340係形成於第二絕緣層310上,以保護和暴露第二絕緣層310和電路層320。 Steps in manufacturing a printed circuit board as shown in Figures 1 and 6 Thereafter, the multilayer printed circuit board 300 shown in FIG. 13 can be laminated on the upper and lower surfaces of the core C by a second insulating layer 310 made of a prepreg (PPG), respectively, wherein the insulating layer 210 The core reinforcing material 220 is laminated on the core C, and then the circuit layer 320 is formed on the second insulating layer 310. A via hole 330 is provided to the second insulating layer 310 laminated on the core C to turn on the circuit layer 270 formed on the core C and the circuit layer 320 formed on the second insulating layer 310, thereby implementing the circuit layer An interlayer connection, a solder resist layer 340 is formed on the second insulating layer 310 to protect and expose the second insulating layer 310 and the circuit layer 320.
於各示範實施例之印刷電路板的剛性以及翹曲特性 The rigidity and warpage characteristics of the printed circuit boards of the exemplary embodiments
根據本發明示範實施例所形成的印刷電路板係藉由 以上所提到的製造方法製造,並且,根據先前技術所製造之一般的印刷電路板,也就是說,使用以絕緣材料所製成的絕緣層而無芯補強材所製造出來的印刷電路板,與根據本發明示範實施例之印刷電路板,對其施予一預定熱,接著,以下模擬其彈性模數,如第14圖所示。 A printed circuit board formed in accordance with an exemplary embodiment of the present invention is The above-mentioned manufacturing method is manufactured, and a general printed circuit board manufactured according to the prior art, that is, a printed circuit board manufactured using an insulating layer made of an insulating material and a coreless reinforcing material, With a printed circuit board according to an exemplary embodiment of the present invention, a predetermined heat is applied thereto, and then, the elastic modulus thereof is simulated as shown in Fig. 14.
第14圖是根據本發明第一示範實施例之印刷電路 板與根據先前技術之印刷電路板的翹曲特性模擬圖。如第14圖所示,對於根據先前技術之印刷電路板(其中,將預浸材料插入於絕緣層之間)來說,彈性(其為造成翹曲的力)的一模數隨著溫度的升高而突然提升,但對於根據本發明示範實施例之印刷電路板來說,由於在低溫或是高溫時彈性模數的變化不大,且均維持在一 個較低的水平,因此可以理解在製造此種電路板的期間,翹曲現象的發生係最低化。也就是說,根據本發明示範實施例之印刷電路板具有以玻璃材料所製成的芯補強材形成於絕緣層的表面上以形成芯,或是使芯補強材插入於絕緣層之間以形成芯,使得此種印刷電路板可具有優異的剛性,並且最低化在製造印刷電路板的期間,因所施加的溫度與溼度的變化而發生之翹曲。 Figure 14 is a printed circuit in accordance with a first exemplary embodiment of the present invention The board is simulated with the warpage characteristics of the printed circuit board according to the prior art. As shown in Fig. 14, for a printed circuit board according to the prior art in which a prepreg material is interposed between insulating layers, a modulus (which is a force causing warpage) is a function of temperature. Raising and suddenly increasing, but for a printed circuit board according to an exemplary embodiment of the present invention, since the modulus of elasticity changes little at low or high temperatures, and is maintained at one At a lower level, it is understood that the occurrence of warpage is minimized during the manufacture of such a board. That is, the printed circuit board according to an exemplary embodiment of the present invention has a core reinforcing material made of a glass material formed on a surface of the insulating layer to form a core, or a core reinforcing material interposed between the insulating layers to form The core enables such a printed circuit board to have excellent rigidity and minimize warpage due to changes in applied temperature and humidity during the manufacture of the printed circuit board.
同時,為了使芯相較於根據先前技術之印刷電路板 有更加改善的剛性及翹曲特性,根據本發明示範實施例且擁有上述示範實施例所提到的技術特徵之印刷電路板,較佳地使得芯補強材所佔的一部分相對於由絕緣層與芯補強材所組成之芯的總厚度所佔的比例範圍係從35%到80%。這可應用於如同以上所描述的根據本發明第一示範實施例之印刷電路板(第1圖)與根據本發明第二示範實施例之印刷電路板(第6圖)二者所採取的構成形態上。 At the same time, in order to make the core compared to the printed circuit board according to the prior art With a more improved rigidity and warping characteristics, the printed circuit board according to the exemplary embodiment of the present invention and having the technical features mentioned in the above exemplary embodiments preferably has a portion of the core reinforcing material occupied by the insulating layer The total thickness of the core composed of the core reinforcing material ranges from 35% to 80%. This can be applied to the composition of the printed circuit board (Fig. 1) according to the first exemplary embodiment of the present invention and the printed circuit board (Fig. 6) according to the second exemplary embodiment of the present invention as described above. Morphologically.
此外,當在各示範實施例中構成芯之芯補強材與絕 緣層,其熱膨脹係數與彈性模數滿足以下所示之等式1時,相較於根據先前技術之印刷電路板,芯的翹曲特性能有更進一步的改善。 In addition, when in each of the exemplary embodiments, the core reinforcing material and the core are formed When the thermal expansion coefficient and the elastic modulus of the edge layer satisfy the following Equation 1, the warpage characteristics of the core are further improved as compared with the printed circuit board according to the prior art.
在此,限制芯補強材所佔的一部分相對於芯總厚度 所佔的比例至少為35%的原因,係由於與根據先前技術之電路板上的芯結構相比,當芯補強材所佔的一部分比例為35%或更多時,可改善芯的翹曲特性,限制芯補強材所佔的一部分相對於芯總厚度所佔的比例至80%或更少的原因,係由於芯中,除了芯補強材之外的絕緣層之厚度可製造至達10微米。在此種情形下,當絕緣層的厚度形成得越薄,芯中可能會產生裂紋,且由於裂紋的產生,可能導致芯破裂。 Here, limiting the portion of the core reinforcing material relative to the total thickness of the core The reason why the proportion is at least 35% is that the core warpage can be improved when the proportion of the core reinforcing material is 35% or more as compared with the core structure on the circuit board according to the prior art. Characteristics, limiting the proportion of a portion of the core reinforcing material to the total thickness of the core to 80% or less, because the thickness of the insulating layer other than the core reinforcing material can be made up to 10 micrometers in the core . In this case, when the thickness of the insulating layer is formed thinner, cracks may be generated in the core, and the crack may be caused due to the generation of cracks.
因此,基於上述等式,芯補強材的厚度相對於總厚 度所佔的比例範圍係從35%到80%,且當由許多不同材料的任一絕緣材料所製成的絕緣層,亦即由PPG、ABF、聚醯亞胺(PI)和底漆(primer)所製成的絕緣層,或是其中浸有一玻璃纖維布、一填充材料和類似物之PPG、ABF、PI和底漆中的任一絕緣材料的絕緣層,這些絕緣層的不同變數代入上述等式中,芯補強材和包圍芯補強材的絕緣層滿足6.492×10-8到4.463×10-6/GPa.k的範圍時,可改善芯的翹曲現象。 Therefore, based on the above equation, the ratio of the thickness of the core reinforcing material to the total thickness ranges from 35% to 80%, and when the insulating layer is made of any insulating material of many different materials, An insulating layer made of PPG, ABF, polyimine (PI) and primer, or PPG, ABF, PI and primer in which a glass fiber cloth, a filler material and the like are impregnated The insulating layer of any insulating material, the different variables of these insulating layers are substituted into the above equation, and the core reinforcing material and the insulating layer surrounding the core reinforcing material satisfy 6.492×10 -8 to 4.463×10 -6 /GPa. When the range of k is used, the warpage of the core can be improved.
當芯補強材所佔的部分相對於芯的總厚度以及上述 等式的條件滿足時,如第15或第16圖所示,可滿足芯的剛性與翹曲特性。 When the core reinforcing material occupies a portion relative to the total thickness of the core and the above When the conditions of the equation are satisfied, as shown in Fig. 15 or Fig. 16, the rigidity and warpage characteristics of the core can be satisfied.
第15圖是根據本發明第一示範實施例與根據本發 明第二示範實施例之印刷電路板的剛性模擬圖,第16圖是根據本發明第一示範實施例與根據本發明第二示範實施例之印刷電路板的翹曲特性模擬圖。 Figure 15 is a diagram showing a first exemplary embodiment according to the present invention A rigid simulation diagram of a printed circuit board of a second exemplary embodiment, and Fig. 16 is a simulation diagram of warpage characteristics of a printed circuit board according to a first exemplary embodiment of the present invention and a second exemplary embodiment of the present invention.
檢閱第15及第16圖,如圖所示者,當芯補強材所 佔的部分佔芯總厚度的比例為35%或更多時,與根據相關技術之印刷電路板的芯(主要為銅箔基板)相比,如上所述之根據本發明第一示範實施例與根據本發明第二示範實施例之印刷電路板更可改善印刷電路板的剛性與翹曲特性,並且,可以由各個示範實施例理解,當芯補強材所佔的部分佔芯總厚度的比例為35%或更高時,根據本發明第二示範實施例之印刷電路板具有為根據本發明第一示範實施例之印刷電路板之約2.5倍的剛性,且其相較於根據本發明第一示範實施例之印刷電路板有稍微較優異的翹曲特性。 Review the 15th and 16th figures, as shown in the figure, when the core reinforcement material When the ratio of the portion to the total thickness of the core is 35% or more, compared with the core of the printed circuit board according to the related art (mainly a copper foil substrate), as described above, according to the first exemplary embodiment of the present invention The printed circuit board according to the second exemplary embodiment of the present invention can further improve the rigidity and warpage characteristics of the printed circuit board, and can be understood by the respective exemplary embodiments, when the ratio of the portion occupied by the core reinforcing material to the total thickness of the core is 35% or more, the printed circuit board according to the second exemplary embodiment of the present invention has a rigidity of about 2.5 times that of the printed circuit board according to the first exemplary embodiment of the present invention, and is compared with the first according to the present invention The printed circuit board of the exemplary embodiment has slightly superior warpage characteristics.
如上文所述,根據本發明示範實施例之印刷電路板 及其製造方法,可以藉由插入具有剛性之玻璃的薄膜型態、或非導電性高分子材料的薄膜型態的芯補強材於印刷電路板中來製造印刷電路板,以維持印刷電路板在高溫下的剛性,從而防止電路板在製造期間發生翹曲。 As described above, a printed circuit board according to an exemplary embodiment of the present invention And a manufacturing method thereof, which can manufacture a printed circuit board by inserting a core-type reinforcing material of a film type having a rigid glass or a film type of a non-conductive polymer material in a printed circuit board to maintain the printed circuit board in Rigidity at high temperatures to prevent warpage of the board during manufacturing.
此外,根據本發明的示範實施例,即使是製造薄板 型態的印刷電路板,由於芯補強材能維持剛性,能改善印刷電路板的撓曲以及在垂直方向的散熱特性。 Further, according to an exemplary embodiment of the present invention, even a thin plate is manufactured The type of printed circuit board can improve the deflection of the printed circuit board and the heat dissipation characteristics in the vertical direction because the core reinforcing material can maintain rigidity.
綜上所述,雖然本發明已以示範實施例揭露如上, 然其並非用以限定本發明。本發明所屬技術領域中具有通常知識者,在不脫離本發明之精神和範圍內,當可作各種之更動與潤飾。因此,本發明之保護範圍當視後附之申請專利範圍所界定者為準。 In summary, although the present invention has been disclosed above by way of exemplary embodiments, It is not intended to limit the invention. A person skilled in the art can make various changes and modifications without departing from the spirit and scope of the invention. Therefore, the scope of the invention is defined by the scope of the appended claims.
100‧‧‧印刷電路板 100‧‧‧Printed circuit board
110‧‧‧芯補強材 110‧‧‧core reinforcing material
120‧‧‧絕緣層 120‧‧‧Insulation
130‧‧‧電路層 130‧‧‧ circuit layer
140‧‧‧電鍍層 140‧‧‧Electroplating
150‧‧‧貫穿孔 150‧‧‧through holes
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Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI236324B (en) * | 2004-04-08 | 2005-07-11 | Phoenix Prec Technology Corp | Insulating structure of circuit board and method for fabricating the circuit board by using the insulating structure |
TWI247567B (en) * | 2003-09-09 | 2006-01-11 | Hoya Corp | Method for fabricating a double-sided wiring glass substrate |
TW201121372A (en) * | 2009-09-02 | 2011-06-16 | Panasonic Corp | Printed wiring board, build-up multi-layer board, and production method therefor |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4946165A (en) * | 1972-09-11 | 1974-05-02 | ||
JP3756041B2 (en) * | 1999-05-27 | 2006-03-15 | Hoya株式会社 | Manufacturing method of multilayer printed wiring board |
JP2005159330A (en) * | 2003-11-05 | 2005-06-16 | Hitachi Chem Co Ltd | Method of manufacturing multilayer circuit board and multilayer circuit board manufactured by the same, and board with semiconductor chip mounted thereon and semiconductor package using the same |
JP2006049804A (en) * | 2004-07-07 | 2006-02-16 | Shinko Electric Ind Co Ltd | Manufacturing method of wiring board |
JP4564342B2 (en) * | 2004-11-24 | 2010-10-20 | 大日本印刷株式会社 | Multilayer wiring board and manufacturing method thereof |
-
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Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
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TW201121372A (en) * | 2009-09-02 | 2011-06-16 | Panasonic Corp | Printed wiring board, build-up multi-layer board, and production method therefor |
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JP2015128195A (en) | 2015-07-09 |
JP6342357B2 (en) | 2018-06-13 |
TW201414367A (en) | 2014-04-01 |
KR20140016150A (en) | 2014-02-07 |
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