TWI591191B - 電子機器用銅合金、電子機器用銅合金的製造方法及電子機器用銅合金輥軋材 - Google Patents
電子機器用銅合金、電子機器用銅合金的製造方法及電子機器用銅合金輥軋材 Download PDFInfo
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- TWI591191B TWI591191B TW100143571A TW100143571A TWI591191B TW I591191 B TWI591191 B TW I591191B TW 100143571 A TW100143571 A TW 100143571A TW 100143571 A TW100143571 A TW 100143571A TW I591191 B TWI591191 B TW I591191B
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- Prior art keywords
- atom
- less
- copper
- copper alloy
- electronic device
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- 229910000881 Cu alloy Inorganic materials 0.000 title claims description 124
- 239000000463 material Substances 0.000 title claims description 72
- 238000004519 manufacturing process Methods 0.000 title claims description 34
- 229910052802 copper Inorganic materials 0.000 claims description 61
- 239000010949 copper Substances 0.000 claims description 61
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 60
- 238000010438 heat treatment Methods 0.000 claims description 42
- 229910000765 intermetallic Inorganic materials 0.000 claims description 42
- 229910052782 aluminium Inorganic materials 0.000 claims description 38
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 38
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 37
- 239000011777 magnesium Substances 0.000 claims description 37
- 229910052749 magnesium Inorganic materials 0.000 claims description 37
- 238000012545 processing Methods 0.000 claims description 36
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 34
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 33
- 238000010791 quenching Methods 0.000 claims description 23
- 230000000171 quenching effect Effects 0.000 claims description 23
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 18
- 238000001816 cooling Methods 0.000 claims description 18
- 238000000034 method Methods 0.000 claims description 18
- 229910052761 rare earth metal Inorganic materials 0.000 claims description 18
- 229910052725 zinc Inorganic materials 0.000 claims description 18
- 239000011701 zinc Substances 0.000 claims description 18
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 17
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims description 17
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 17
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 17
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 17
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 17
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 17
- 229910052796 boron Inorganic materials 0.000 claims description 17
- 229910052791 calcium Inorganic materials 0.000 claims description 17
- 239000011575 calcium Substances 0.000 claims description 17
- 229910052804 chromium Inorganic materials 0.000 claims description 17
- 239000011651 chromium Substances 0.000 claims description 17
- 229910017052 cobalt Inorganic materials 0.000 claims description 17
- 239000010941 cobalt Substances 0.000 claims description 17
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 17
- 239000012535 impurity Substances 0.000 claims description 17
- 229910052742 iron Inorganic materials 0.000 claims description 17
- 239000002245 particle Substances 0.000 claims description 17
- 229910052698 phosphorus Inorganic materials 0.000 claims description 17
- 239000011574 phosphorus Substances 0.000 claims description 17
- 238000005096 rolling process Methods 0.000 claims description 17
- 229910052709 silver Inorganic materials 0.000 claims description 17
- 239000004332 silver Substances 0.000 claims description 17
- 229910052718 tin Inorganic materials 0.000 claims description 17
- 229910052726 zirconium Inorganic materials 0.000 claims description 17
- 229910052759 nickel Inorganic materials 0.000 claims description 16
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 claims description 15
- 230000008569 process Effects 0.000 claims description 10
- 229910052797 bismuth Inorganic materials 0.000 claims description 3
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims description 3
- 229910052738 indium Inorganic materials 0.000 claims description 2
- 150000002910 rare earth metals Chemical class 0.000 claims 1
- 125000004429 atom Chemical group 0.000 description 55
- 229910052787 antimony Inorganic materials 0.000 description 18
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 18
- 230000000694 effects Effects 0.000 description 12
- 229910045601 alloy Inorganic materials 0.000 description 11
- 239000000956 alloy Substances 0.000 description 11
- 238000011156 evaluation Methods 0.000 description 11
- 239000012071 phase Substances 0.000 description 10
- 239000000203 mixture Substances 0.000 description 8
- 238000012360 testing method Methods 0.000 description 8
- 239000012298 atmosphere Substances 0.000 description 7
- 238000001556 precipitation Methods 0.000 description 7
- 239000002994 raw material Substances 0.000 description 7
- 239000011159 matrix material Substances 0.000 description 6
- 238000005482 strain hardening Methods 0.000 description 6
- 229910001152 Bi alloy Inorganic materials 0.000 description 5
- QAAXRTPGRLVPFH-UHFFFAOYSA-N [Bi].[Cu] Chemical class [Bi].[Cu] QAAXRTPGRLVPFH-UHFFFAOYSA-N 0.000 description 5
- 238000005452 bending Methods 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 239000012300 argon atmosphere Substances 0.000 description 4
- 238000005336 cracking Methods 0.000 description 4
- UREBDLICKHMUKA-CXSFZGCWSA-N dexamethasone Chemical compound C1CC2=CC(=O)C=C[C@]2(C)[C@]2(F)[C@@H]1[C@@H]1C[C@@H](C)[C@@](C(=O)CO)(O)[C@@]1(C)C[C@@H]2O UREBDLICKHMUKA-CXSFZGCWSA-N 0.000 description 4
- 229910052746 lanthanum Inorganic materials 0.000 description 4
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 4
- 235000014347 soups Nutrition 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 229910000420 cerium oxide Inorganic materials 0.000 description 3
- 238000005097 cold rolling Methods 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 238000005242 forging Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 238000005098 hot rolling Methods 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 3
- 238000003672 processing method Methods 0.000 description 3
- 238000001953 recrystallisation Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910052684 Cerium Inorganic materials 0.000 description 2
- 229910001096 P alloy Inorganic materials 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 229910000691 Re alloy Inorganic materials 0.000 description 2
- MUYPKJRPXSXUKL-UHFFFAOYSA-N [P].[Mg].[Cu] Chemical compound [P].[Mg].[Cu] MUYPKJRPXSXUKL-UHFFFAOYSA-N 0.000 description 2
- TYYOGQJRDAYPNI-UHFFFAOYSA-N [Re].[Cu] Chemical compound [Re].[Cu] TYYOGQJRDAYPNI-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000009749 continuous casting Methods 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 238000001125 extrusion Methods 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 238000000265 homogenisation Methods 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 238000004881 precipitation hardening Methods 0.000 description 2
- 238000005204 segregation Methods 0.000 description 2
- 241001674044 Blattodea Species 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 229910000858 La alloy Inorganic materials 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- SHSXOJVRHAGLJK-UHFFFAOYSA-N [Ni].[Cu].[La] Chemical compound [Ni].[Cu].[La] SHSXOJVRHAGLJK-UHFFFAOYSA-N 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 150000001879 copper Chemical class 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000013467 fragmentation Methods 0.000 description 1
- 238000006062 fragmentation reaction Methods 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000010309 melting process Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000008520 organization Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 238000009864 tensile test Methods 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/02—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of metals or alloys
- H01B1/026—Alloys based on copper
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C9/00—Alloys based on copper
- C22C9/01—Alloys based on copper with aluminium as the next major constituent
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
- C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
- C22F1/08—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of copper or alloys based thereon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B13/00—Apparatus or processes specially adapted for manufacturing conductors or cables
- H01B13/0016—Apparatus or processes specially adapted for manufacturing conductors or cables for heat treatment
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Conductive Materials (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010270890A JP5712585B2 (ja) | 2010-12-03 | 2010-12-03 | 電子機器用銅合金、電子機器用銅合金の製造方法及び電子機器用銅合金圧延材 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201235484A TW201235484A (en) | 2012-09-01 |
| TWI591191B true TWI591191B (zh) | 2017-07-11 |
Family
ID=46171719
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW100143571A TWI591191B (zh) | 2010-12-03 | 2011-11-28 | 電子機器用銅合金、電子機器用銅合金的製造方法及電子機器用銅合金輥軋材 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20130284327A1 (enExample) |
| JP (1) | JP5712585B2 (enExample) |
| CN (1) | CN103228804B (enExample) |
| TW (1) | TWI591191B (enExample) |
| WO (1) | WO2012073777A1 (enExample) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5045784B2 (ja) * | 2010-05-14 | 2012-10-10 | 三菱マテリアル株式会社 | 電子機器用銅合金、電子機器用銅合金の製造方法及び電子機器用銅合金圧延材 |
| JP5903842B2 (ja) | 2011-11-14 | 2016-04-13 | 三菱マテリアル株式会社 | 銅合金、銅合金塑性加工材及び銅合金塑性加工材の製造方法 |
| CN103388089B (zh) * | 2013-04-25 | 2015-06-17 | 刘春忠 | 电流通、断金属材料及其用途 |
| CN103290254A (zh) * | 2013-05-07 | 2013-09-11 | 锡山区羊尖泓之盛五金厂 | 一种耐高温超导铜线及其制备方法 |
| CN107531527B (zh) * | 2015-05-18 | 2021-04-09 | 三菱电机株式会社 | 水处理系统及水处理方法 |
| JP6736869B2 (ja) * | 2015-11-09 | 2020-08-05 | 三菱マテリアル株式会社 | 銅合金素材 |
| CN106834787A (zh) * | 2015-12-03 | 2017-06-13 | 黄波 | 一种Gu-Pm-Au-B合金导线及其制备方法 |
| CN106834788A (zh) * | 2015-12-03 | 2017-06-13 | 黄波 | 一种含钐元素抗拉伸铜合金导线及其制备方法 |
| CN106834790A (zh) * | 2015-12-03 | 2017-06-13 | 黄波 | 一种Gu-Gd-Au-B合金导线及其制备方法 |
| CN106834789A (zh) * | 2015-12-03 | 2017-06-13 | 黄波 | 一种Gu-Ce-Au-B合金导线及其制备方法 |
| CN108598058B (zh) * | 2017-12-21 | 2020-05-19 | 汕头市骏码凯撒有限公司 | 一种铜合金键合丝及其制造方法 |
| CN108162564A (zh) * | 2018-01-23 | 2018-06-15 | 东北大学 | 用于薄规格电连接器端子的铜钢铜复合材料及其制备方法 |
| CN109022878B (zh) * | 2018-09-11 | 2020-12-22 | 广东美的制冷设备有限公司 | 用于空调消音降噪的泡沫合金及其制备方法和应用 |
| CN111192704A (zh) * | 2019-12-30 | 2020-05-22 | 南通南平电子科技有限公司 | 一种耐弯折的无座板片式电容引线 |
| CN111334729B (zh) * | 2020-02-28 | 2021-09-24 | 交大材料科技(江苏)研究院有限公司 | 一种高密度纳米孪晶高性能镍铝青铜合金板材及其制备方法 |
| CN114951609B (zh) * | 2022-04-13 | 2024-04-19 | 佛山市陶本科技有限公司 | 具有均匀闭孔的泡沫铝板及其制备方法 |
| CN115786764B (zh) * | 2022-11-22 | 2023-12-22 | 广州番禺职业技术学院 | 一种铜镜材料及其制备方法 |
| CN117604321B (zh) * | 2024-01-22 | 2024-03-29 | 西安稀有金属材料研究院有限公司 | 一种完全共格氧化物弥散强化铜基复合材料及其制备方法 |
| CN120452906B (zh) * | 2025-06-16 | 2025-11-07 | 西安中实金属有限公司 | 一种耐腐蚀铜槽线及其防电化学腐蚀工艺 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4715910A (en) * | 1986-07-07 | 1987-12-29 | Olin Corporation | Low cost connector alloy |
| JPH06100983A (ja) * | 1992-09-22 | 1994-04-12 | Nippon Steel Corp | 高ヤング率・高降伏強度を有するｔａｂテープ用金属箔およびその製造方法 |
| JPH06100984A (ja) * | 1992-09-22 | 1994-04-12 | Nippon Steel Corp | バネ限界値と形状凍結性に優れたバネ用材料及びその製造方法 |
| SE525460C2 (sv) * | 2002-02-28 | 2005-02-22 | Sandvik Ab | Användning av en kopparlegering i uppkolande miljöer |
| JP4787986B2 (ja) * | 2002-11-25 | 2011-10-05 | Ｄｏｗａメタルテック株式会社 | 銅合金およびその製造方法 |
| US8715431B2 (en) * | 2004-08-17 | 2014-05-06 | Kobe Steel, Ltd. | Copper alloy plate for electric and electronic parts having bending workability |
| US7628873B2 (en) * | 2005-09-09 | 2009-12-08 | Ngk Insulators, Ltd. | Beryllium copper alloy and method of manufacturing beryllium copper alloy |
| CN101646792B (zh) * | 2007-03-30 | 2012-02-22 | Jx日矿日石金属株式会社 | 电子材料用Cu-Ni-Si系合金 |
| CN101952465B (zh) * | 2008-01-31 | 2012-09-19 | 古河电气工业株式会社 | 电气电子零件用铜合金材料及其制造方法 |
| JP5260992B2 (ja) * | 2008-03-19 | 2013-08-14 | Ｄｏｗａメタルテック株式会社 | 銅合金板材およびその製造方法 |
| JP5420328B2 (ja) * | 2008-08-01 | 2014-02-19 | 三菱マテリアル株式会社 | フラットパネルディスプレイ用配線膜形成用スパッタリングターゲット |
| JP5045784B2 (ja) * | 2010-05-14 | 2012-10-10 | 三菱マテリアル株式会社 | 電子機器用銅合金、電子機器用銅合金の製造方法及び電子機器用銅合金圧延材 |
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2010
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- 2011-11-24 WO PCT/JP2011/077011 patent/WO2012073777A1/ja not_active Ceased
- 2011-11-24 CN CN201180057533.8A patent/CN103228804B/zh not_active Expired - Fee Related
- 2011-11-24 US US13/990,939 patent/US20130284327A1/en not_active Abandoned
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Also Published As
| Publication number | Publication date |
|---|---|
| CN103228804B (zh) | 2016-05-25 |
| JP2012117142A (ja) | 2012-06-21 |
| CN103228804A (zh) | 2013-07-31 |
| JP5712585B2 (ja) | 2015-05-07 |
| WO2012073777A1 (ja) | 2012-06-07 |
| TW201235484A (en) | 2012-09-01 |
| US20130284327A1 (en) | 2013-10-31 |
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