TWI580474B - Etching spraying module and wet etching device using the etching spraying module - Google Patents
Etching spraying module and wet etching device using the etching spraying module Download PDFInfo
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- TWI580474B TWI580474B TW105109760A TW105109760A TWI580474B TW I580474 B TWI580474 B TW I580474B TW 105109760 A TW105109760 A TW 105109760A TW 105109760 A TW105109760 A TW 105109760A TW I580474 B TWI580474 B TW I580474B
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Description
本發明關於濕式製程領域,特別是關於一種蝕刻噴灑模組及使用該蝕刻噴灑模組之濕式蝕刻裝置。 The present invention relates to the field of wet processes, and more particularly to an etch spray module and a wet etch apparatus using the etch spray module.
在面板產業中,溼式製程的發展已經相當成熟。然而習知溼式製程機台中,使用上具有維修困難、耗液量大、均勻性不佳、漏夜、及背面髒污等等問題,上述問題在細線寬(fine pitch)的情況下特別嚴重。 In the panel industry, the development of wet processes is quite mature. However, in the conventional wet type processing machine, the use is difficult to maintain, the liquid consumption is large, the uniformity is poor, the night is leaking, and the back surface is dirty, and the like, the above problem is particularly serious in the case of fine pitch.
習知溼式製程機台中的蝕刻噴灑模組包括複數個噴嘴,蝕刻液直接通過噴嘴噴灑於一基板上以對該基板進行蝕刻,然而無論噴嘴的口徑大小,由於並未對蝕刻液進行任何處理,因此蝕刻液噴灑在基板上時,會發生均勻性不佳的問題,進而影響蝕刻效果。 The etching spray module in the conventional wet processing machine includes a plurality of nozzles, and the etching liquid is directly sprayed on a substrate through the nozzle to etch the substrate, but no processing is performed on the etching liquid regardless of the size of the nozzle. Therefore, when the etching liquid is sprayed on the substrate, a problem of poor uniformity occurs, which in turn affects the etching effect.
因此需要針對上述習知技術中蝕刻液噴灑在基板上時均勻性不佳的問題提出解決方法。 Therefore, it is necessary to propose a solution to the problem that the uniformity is poor when the etching liquid is sprayed on the substrate in the above-mentioned prior art.
本發明提供一種蝕刻噴灑模組及使用該蝕刻噴灑模組之濕式蝕刻裝置,其能解決習知技術中蝕刻液噴灑在基板上時均勻性不佳的問題。 The invention provides an etching spray module and a wet etching device using the same, which can solve the problem of poor uniformity when the etching liquid is sprayed on the substrate in the prior art.
本發明之濕式蝕刻裝置包括一腔體以及一蝕刻噴灑模組。該腔體包括一進氣口、一出氣口、以及一蝕刻液入口。該進氣口用於導入一 蝕刻所需氣體。該出氣口用於導出該蝕刻所需氣體。該蝕刻液入口用於導入一蝕刻液。該蝕刻噴灑模組設置於該腔體中以對一基板進行蝕刻。該蝕刻噴灑模組包括一本體以及複數個噴嘴。該本體連接至該進氣口及該蝕刻液入口。該些噴嘴設置於該本體朝向該基板之一表面上。各噴嘴呈一上寬下窄的形狀且包括一第一入口、一第二入口、以及一噴嘴出口。該第一入口用於導入經由該本體之該蝕刻液。該第二入口用於導入經由該本體之該蝕刻所需氣體。該噴嘴出口之一口徑小於該第一入口之一口徑且小於該第二入口之一口徑。 The wet etching apparatus of the present invention comprises a cavity and an etch spray module. The cavity includes an air inlet, an air outlet, and an etchant inlet. The air inlet is used to introduce one Etching the desired gas. The gas outlet is used to derive the gas required for the etching. The etchant inlet is used to introduce an etchant. The etch spray module is disposed in the cavity to etch a substrate. The etch spray module includes a body and a plurality of nozzles. The body is coupled to the air inlet and the etchant inlet. The nozzles are disposed on a surface of the body facing the substrate. Each nozzle has an upper width and a narrow shape and includes a first inlet, a second inlet, and a nozzle outlet. The first inlet is for introducing the etchant liquid through the body. The second inlet is for introducing a gas required for the etching via the body. One of the nozzle outlets has a smaller diameter than one of the first inlets and less than one of the second inlets.
在一較佳實施例中,該濕式蝕刻裝置進一步包括一承載板。該承載板設置於該腔體中並用於承載該基板。 In a preferred embodiment, the wet etching apparatus further includes a carrier plate. The carrier plate is disposed in the cavity and is used to carry the substrate.
在一較佳實施例中,該濕式蝕刻裝置進一步包括一抽風模組。該抽風模組連接至該出氣口且用於將該腔體內部之蝕刻所需氣體從該出氣口抽出。 In a preferred embodiment, the wet etching apparatus further includes an exhaust module. The air extraction module is connected to the air outlet and is used for extracting the gas required for etching inside the cavity from the air outlet.
在一較佳實施例中,該第一入口之該口徑為10公厘至55公厘。 In a preferred embodiment, the first inlet has a diameter of from 10 mm to 55 mm.
在一較佳實施例中,該第二入口之該口徑為10公厘至55公厘。 In a preferred embodiment, the second inlet has a diameter of from 10 mm to 55 mm.
在一較佳實施例中,該噴嘴出口之該口徑為0.5公厘至2公厘。 In a preferred embodiment, the nozzle outlet has a diameter of from 0.5 mm to 2 mm.
在一較佳實施例中,該蝕刻噴灑模組與該基板之間的距離為10公分至25公分。 In a preferred embodiment, the distance between the etched spray module and the substrate is from 10 cm to 25 cm.
本發明之刻噴灑模組用於一濕式蝕刻裝置,該蝕刻噴灑模組包括一本體以及複數個噴嘴。該些噴嘴設置於該本體朝向該基板之一表面上。各噴嘴呈一上寬下窄的形狀且包括一第一入口、一第二入口、以及一噴嘴出口。該第一入口用於導入一蝕刻液。該第二入口用於導入一蝕刻所需氣體。該噴嘴出口之一口徑小於該第一入口之一口徑且小於該第二入口 之一口徑。 The spray module of the present invention is used in a wet etching apparatus, which includes a body and a plurality of nozzles. The nozzles are disposed on a surface of the body facing the substrate. Each nozzle has an upper width and a narrow shape and includes a first inlet, a second inlet, and a nozzle outlet. The first inlet is for introducing an etchant. The second inlet is used to introduce a gas required for etching. One of the nozzle outlets has a smaller diameter than one of the first inlets and is smaller than the second inlet One of the calibers.
在一較佳實施例中,該第一入口之該口徑為10公厘至55公厘。 In a preferred embodiment, the first inlet has a diameter of from 10 mm to 55 mm.
在一較佳實施例中,該第二入口之該口徑為10公厘至55公厘。 In a preferred embodiment, the second inlet has a diameter of from 10 mm to 55 mm.
在一較佳實施例中,該噴嘴出口之該口徑為0.5公厘至2公厘。 In a preferred embodiment, the nozzle outlet has a diameter of from 0.5 mm to 2 mm.
本發明之濕式蝕刻裝置及蝕刻噴灑模組能將蝕刻液均勻地噴灑在基板上。再者,蝕刻所需氣體經由抽風模組抽出後可進一步再生使用,對蝕刻液進行加壓的功能,因此能節省氣體使用量。 The wet etching apparatus and the etching spray module of the present invention can uniformly spray the etching liquid on the substrate. Further, since the gas required for etching can be further regenerated after being extracted by the air suction module, and the function of pressurizing the etching liquid, the gas usage can be saved.
1‧‧‧濕式蝕刻裝置 1‧‧‧ Wet etching device
10‧‧‧蝕刻噴灑模組 10‧‧‧etching spray module
20‧‧‧腔體 20‧‧‧ cavity
30‧‧‧基板 30‧‧‧Substrate
40‧‧‧承載板 40‧‧‧Loading board
50‧‧‧抽風模組 50‧‧‧Exhaust module
100‧‧‧本體 100‧‧‧ body
102‧‧‧噴嘴 102‧‧‧Nozzles
200‧‧‧進氣口 200‧‧‧air inlet
202‧‧‧出氣口 202‧‧‧ outlet
204‧‧‧蝕刻液入口 204‧‧‧etching solution inlet
1020‧‧‧第一入口 1020‧‧‧ first entrance
1022‧‧‧第二入口 1022‧‧‧second entrance
1024‧‧‧噴嘴出口 1024‧‧‧Nozzle exit
第1圖顯示根據本發明一實施例之濕式蝕刻裝置之示意圖;以及第2圖顯示根據本發明一實施例之噴嘴之示意圖。 1 shows a schematic view of a wet etching apparatus according to an embodiment of the present invention; and FIG. 2 shows a schematic view of a nozzle according to an embodiment of the present invention.
請參閱第1圖至第2圖,第1圖顯示根據本發明一實施例之濕式蝕刻裝置1之示意圖,第2圖顯示根據本發明一實施例之噴嘴102之示意圖。 Referring to FIGS. 1 through 2, FIG. 1 is a schematic view showing a wet etching apparatus 1 according to an embodiment of the present invention, and FIG. 2 is a schematic view showing a nozzle 102 according to an embodiment of the present invention.
如第1圖所示,本發明之濕式蝕刻裝置1包括一蝕刻噴灑模組10、一腔體20、一承載板40、以及一抽風模組50。 As shown in FIG. 1, the wet etching apparatus 1 of the present invention comprises an etching spray module 10, a cavity 20, a carrier plate 40, and a ventilation module 50.
該蝕刻噴灑模組10用於該濕式蝕刻裝置1且設置於該腔體20中以對一基板30進行蝕刻,該基板30可以為目前濕式製程中需要進行蝕刻的基板,例如但不限於為一玻璃基板。該承載板40設置於該腔體20中並用於承載該基板30。 The etching spray module 10 is used in the wet etching apparatus 1 and disposed in the cavity 20 to etch a substrate 30. The substrate 30 may be a substrate that needs to be etched in the current wet process, such as but not limited to It is a glass substrate. The carrier plate 40 is disposed in the cavity 20 and is used to carry the substrate 30.
該腔體20主要包括一進氣口200、一出氣口202、以及一蝕刻液入口204。於本實施例中,該進氣口200及該出氣口202分別設置於該腔體 20之兩相對的側壁上,然而本發明並不限於此,該進氣口200及該出氣口202可設置於該腔體20之相同或不同側壁上。 The cavity 20 mainly includes an air inlet 200, an air outlet 202, and an etchant inlet 204. In the embodiment, the air inlet 200 and the air outlet 202 are respectively disposed in the cavity. The two opposite side walls of the 20, however, the present invention is not limited thereto, and the air inlet 200 and the air outlet 202 may be disposed on the same or different side walls of the cavity 20.
該進氣口200用於導入一蝕刻所需氣體,該抽風模組50連接至該出氣口202,該抽風模組50用於將該腔體20內部之蝕刻所需氣體從該出氣口202抽出,抽出之蝕刻所需氣體可以再透過該進氣口200導入,達到再生使用的目的,節省蝕刻所需氣體之使用量。 The air inlet 200 is configured to introduce a gas required for etching, and the air blowing module 50 is connected to the air outlet 202. The air blowing module 50 is configured to extract the gas required for etching inside the cavity 20 from the air outlet 202. The gas required for the extraction etching can be further introduced through the air inlet 200 to achieve the purpose of regeneration, and the amount of gas required for etching is saved.
要說明的是,蝕刻所需氣體為本發明所屬技術領域中具有通常知識者所熟知,此不多加贅述。 It is to be noted that the gas required for etching is well known to those of ordinary skill in the art to which the present invention pertains, and will not be described again.
該蝕刻液入口204用於導入一蝕刻液,該蝕刻液入口204可設置於該腔體20之任一側壁上。 The etchant inlet 204 is used to introduce an etchant, and the etchant inlet 204 can be disposed on any sidewall of the cavity 20.
該蝕刻噴灑模組10設置於該腔體20中對應於該基板30之上方,該蝕刻噴灑模組10包括一本體100以及複數個噴嘴102,該些噴嘴102設置於該本體100朝向該基板30之一表面上。該本體100連接至該進氣口200及該蝕刻液入口204,蝕刻液經由該蝕刻液入口204導入該本體100,再經由該些噴嘴102噴灑於該基板30上以對該基板30進行蝕刻。 The etch spray module 10 is disposed in the cavity 20 corresponding to the substrate 30. The etch spray module 10 includes a body 100 and a plurality of nozzles 102. The nozzles 102 are disposed on the substrate 100 toward the substrate 30. One on the surface. The body 100 is connected to the air inlet 200 and the etching liquid inlet 204. The etching liquid is introduced into the body 100 through the etching liquid inlet 204, and is sprayed on the substrate 30 via the nozzles 102 to etch the substrate 30.
於一較佳實施例中,該蝕刻噴灑模組10與該基板30之間的距離為10公分至25公分。 In a preferred embodiment, the distance between the etch spray module 10 and the substrate 30 is 10 cm to 25 cm.
第2圖所示為第1圖之其中一個噴嘴102的放大示意圖,該噴嘴102包括一第一入口1020、一第二入口1022、以及一噴嘴出口1024。該噴嘴102大致呈一上寬下窄的形狀,該第一入口1020及該第二入口1022設置於較寬的上半部,該噴嘴出口1024設置於較窄的下半部。該第一入口1020用於導入經由該本體100之蝕刻液。該第二入口1022用於導入經由該本體100之蝕刻所需氣體。該噴嘴出口1024之一口徑小於該第一入口1020之一口徑及該第二入口1022之一口徑。 2 is an enlarged schematic view of one of the nozzles 102 of FIG. 1 including a first inlet 1020, a second inlet 1022, and a nozzle outlet 1024. The nozzle 102 is substantially in the shape of a wide upper and lower narrow. The first inlet 1020 and the second inlet 1022 are disposed in a wider upper half, and the nozzle outlet 1024 is disposed in a narrower lower half. The first inlet 1020 is for introducing an etchant liquid through the body 100. The second inlet 1022 is for introducing a gas required for etching through the body 100. One of the nozzle outlets 1024 has a smaller diameter than one of the first inlets 1020 and one of the second inlets 1022.
於一較佳實施例中,該第一入口1020之口徑為10公厘(millimeter;mm)至55公厘,該第二入口1022之口徑為10公厘至55公厘, 該噴嘴出口之口徑為0.5公厘至2公厘。 In a preferred embodiment, the first inlet 1020 has a diameter of 10 mm (millimeter; mm) to 55 mm, and the second inlet 1022 has a diameter of 10 mm to 55 mm. The nozzle outlet has a diameter of from 0.5 mm to 2 mm.
要說明的是,該第一入口1020之口徑、該第二入口1022之口徑、及該噴嘴出口之口徑的範圍為特殊設計,並非僅是本發明所屬技術領域中具有通常知識者可輕易得知的範圍。 It should be noted that the range of the diameter of the first inlet 1020, the diameter of the second inlet 1022, and the diameter of the nozzle outlet are specially designed, and it is not only known to those having ordinary knowledge in the technical field of the present invention. The scope.
本發明之一特點在於噴嘴102的特殊設計,更明確地說,該第二入口1022所導入的蝕刻所需氣體經過加壓後與該第一入口1020所導入的蝕刻液混合後再經由口徑較小的噴嘴出口1024噴灑於該基板30上以對該基板30進行蝕刻,噴灑出的蝕刻液會形成高壓微粒化的液體,因此能均勻的噴灑於該基板30上,蝕刻液噴灑的範圍如虛線所示。 One of the features of the present invention is the special design of the nozzle 102. More specifically, the etching required gas introduced by the second inlet 1022 is pressurized and mixed with the etching liquid introduced by the first inlet 1020, and then the diameter is compared. A small nozzle outlet 1024 is sprayed on the substrate 30 to etch the substrate 30, and the sprayed etching liquid forms a high-pressure atomized liquid, so that it can be uniformly sprayed on the substrate 30, and the range of the etching liquid is sprayed as a dotted line. Shown.
於一較佳實施例中,對該蝕刻所需氣體加壓的範圍為1至7公斤/平方公分。 In a preferred embodiment, the gas pressure required for the etching is in the range of 1 to 7 kg/cm 2 .
此外,第1圖之本體100也包括對應於該第一入口1020及該第二入口1022的孔洞(未圖示)。 In addition, the body 100 of FIG. 1 also includes holes (not shown) corresponding to the first inlet 1020 and the second inlet 1022.
綜上所述,本發明之濕式蝕刻裝置及蝕刻噴灑模組能將蝕刻液均勻地噴灑在基板上。再者,蝕刻所需氣體經由抽風模組抽出後可進一步再生使用,對蝕刻液進行加壓的功能,因此能節省氣體使用量。 In summary, the wet etching apparatus and the etching spray module of the present invention can uniformly spray the etching liquid on the substrate. Further, since the gas required for etching can be further regenerated after being extracted by the air suction module, and the function of pressurizing the etching liquid, the gas usage can be saved.
雖然本發明已用較佳實施例揭露如上,然其並非用以限定本發明,本發明所屬技術領域中具有通常知識者在不脫離本發明之精神和範圍內,當可作各種之更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。 While the invention has been described above by way of a preferred embodiment, the invention is not intended to be limited thereto, and the invention may be modified and modified without departing from the spirit and scope of the invention. Therefore, the scope of the invention is defined by the scope of the appended claims.
1‧‧‧濕式蝕刻裝置 1‧‧‧ Wet etching device
10‧‧‧蝕刻噴灑模組 10‧‧‧etching spray module
20‧‧‧腔體 20‧‧‧ cavity
30‧‧‧基板 30‧‧‧Substrate
40‧‧‧承載板 40‧‧‧Loading board
50‧‧‧抽風模組 50‧‧‧Exhaust module
100‧‧‧本體 100‧‧‧ body
102‧‧‧噴嘴 102‧‧‧Nozzles
200‧‧‧進氣口 200‧‧‧air inlet
202‧‧‧出氣口 202‧‧‧ outlet
204‧‧‧蝕刻液入口 204‧‧‧etching solution inlet
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