TWI576563B - 非接觸式測量表面的方法及設備 - Google Patents

非接觸式測量表面的方法及設備 Download PDF

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Publication number
TWI576563B
TWI576563B TW101117538A TW101117538A TWI576563B TW I576563 B TWI576563 B TW I576563B TW 101117538 A TW101117538 A TW 101117538A TW 101117538 A TW101117538 A TW 101117538A TW I576563 B TWI576563 B TW I576563B
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TW
Taiwan
Prior art keywords
axis
point
light
slit
measurement
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TW101117538A
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English (en)
Chinese (zh)
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TW201303260A (zh
Inventor
貝倫 菲倫 拉格爾塔
菲拉 奧古斯堤 皮拓
普爾薩斯 羅傑 阿爾堤賈斯
艾爾堤格斯 克里斯堤娜 卡迪斐爾
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加泰羅尼亞理工大學
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Publication of TW201303260A publication Critical patent/TW201303260A/zh
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/04—Measuring microscopes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/25—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object
    • G01B11/2518—Projection by scanning of the object
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/25—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/025—Testing optical properties by measuring geometrical properties or aberrations by determining the shape of the object to be tested
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/0004—Microscopes specially adapted for specific applications
    • G02B21/0016—Technical microscopes, e.g. for inspection or measuring in industrial production processes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/06—Means for illuminating specimens

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Geometry (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Optics & Photonics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
TW101117538A 2011-05-20 2012-05-17 非接觸式測量表面的方法及設備 TWI576563B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2011/058281 WO2012159651A1 (en) 2011-05-20 2011-05-20 Method and device for non-contact measuring surfaces

Publications (2)

Publication Number Publication Date
TW201303260A TW201303260A (zh) 2013-01-16
TWI576563B true TWI576563B (zh) 2017-04-01

Family

ID=44119176

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101117538A TWI576563B (zh) 2011-05-20 2012-05-17 非接觸式測量表面的方法及設備

Country Status (7)

Country Link
US (1) US9784568B2 (https=)
EP (1) EP2710330B1 (https=)
JP (1) JP6193218B2 (https=)
KR (1) KR101838329B1 (https=)
CN (1) CN103547883B (https=)
TW (1) TWI576563B (https=)
WO (1) WO2012159651A1 (https=)

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TWI745730B (zh) * 2018-08-10 2021-11-11 英商泰勒何伯森股份有限公司 用於物件的幾何測量的裝置、方法及電腦程式
TWI751184B (zh) * 2016-08-10 2022-01-01 美商科磊股份有限公司 產生一樣本之三維(3-d)資訊之方法及三維(3-d)量測系統

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JP7027422B2 (ja) * 2016-11-18 2022-03-01 ザイゴ コーポレーション 干渉計の光学性能を最適化するための方法及び装置
DE102016014834B3 (de) * 2016-12-14 2018-04-19 Innolite Gmbh Verfahren zur ultrapräzisen Zentrierbearbeitung einer transmittiven oder reflektiven Optik, insbesondere einer Linse mit einer asphärischen oder frei geformten vorderen Linsenfläche
US10295754B2 (en) * 2017-05-11 2019-05-21 Nalux Co., Ltd. Position determination method and element
JP7119085B2 (ja) * 2017-11-30 2022-08-16 ライカ バイオシステムズ イメージング インコーポレイテッド 衝撃再走査システム
WO2019222719A1 (en) * 2018-05-18 2019-11-21 Arizona Board Of Regents On Behalf Of The University Of Arizona Forming a diffractive pattern on a freeform surface
CN110388862A (zh) * 2019-07-22 2019-10-29 上海理工大学 一种简便定位机床转台旋转轴线的方法
JP7630429B2 (ja) * 2019-08-06 2025-02-17 ライカ バイオシステムズ イメージング インコーポレイテッド スライド走査システムにおけるリアルタイム合焦
DE102020101880A1 (de) * 2020-01-27 2021-07-29 Carl Zeiss Meditec Ag Mikroskopieverfahren und Mikroskop zur Erzeugung eines Bilds eines Objekts
CN111397542B (zh) * 2020-03-09 2021-07-06 天地科技股份有限公司 一种基于弱反射光栅的刮板输送机直线度监测系统与方法
CN111735768B (zh) * 2020-07-31 2020-12-08 武汉精立电子技术有限公司 一种Micro LED屏幕的显微成像方法及装置
US12106505B2 (en) 2020-09-02 2024-10-01 International Business Machines Corporation Reflection-based distance perception
TWI764379B (zh) * 2020-11-18 2022-05-11 國立中興大學 光學長度量測裝置
CN113959360B (zh) * 2021-11-25 2023-11-24 成都信息工程大学 基于相移与焦移三维面形垂直测量方法、装置、介质
CN118641148B (zh) * 2024-05-17 2025-09-30 杭州远方光电信息股份有限公司 一种灯具空间光场测量方法及测量系统
CN119935018B (zh) * 2025-01-09 2025-10-10 西安交通大学 一种多角度移轴条纹投影三维测量系统及标定方法

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Publication number Priority date Publication date Assignee Title
TWI751184B (zh) * 2016-08-10 2022-01-01 美商科磊股份有限公司 產生一樣本之三維(3-d)資訊之方法及三維(3-d)量測系統
TWI745730B (zh) * 2018-08-10 2021-11-11 英商泰勒何伯森股份有限公司 用於物件的幾何測量的裝置、方法及電腦程式

Also Published As

Publication number Publication date
JP2014515471A (ja) 2014-06-30
EP2710330A1 (en) 2014-03-26
KR20140031294A (ko) 2014-03-12
EP2710330B1 (en) 2016-02-10
US9784568B2 (en) 2017-10-10
CN103547883B (zh) 2017-06-13
KR101838329B1 (ko) 2018-03-13
JP6193218B2 (ja) 2017-09-06
TW201303260A (zh) 2013-01-16
CN103547883A (zh) 2014-01-29
WO2012159651A1 (en) 2012-11-29
US20140071263A1 (en) 2014-03-13

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