TWI571183B - A flexible circuit board, and a flexible circuit board - Google Patents

A flexible circuit board, and a flexible circuit board Download PDF

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TWI571183B
TWI571183B TW099145831A TW99145831A TWI571183B TW I571183 B TWI571183 B TW I571183B TW 099145831 A TW099145831 A TW 099145831A TW 99145831 A TW99145831 A TW 99145831A TW I571183 B TWI571183 B TW I571183B
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circuit board
flexible circuit
copper foil
wiring
foil
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TW099145831A
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TW201146101A (en
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服部公一
木村圭一
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新日鐵住金化學股份有限公司
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/09Use of materials for the conductive, e.g. metallic pattern
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C9/00Alloys based on copper
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22FCHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/08Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of copper or alloys based thereon
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/0277Bendability or stretchability details
    • H05K1/028Bending or folding regions of flexible printed circuits
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0393Flexible materials
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/03Conductive materials
    • H05K2201/0332Structure of the conductor
    • H05K2201/0335Layered conductors or foils
    • H05K2201/0355Metal foils

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Thermal Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Structure Of Printed Boards (AREA)
  • Laminated Bodies (AREA)

Description

可撓性電路基板及可撓性電路基板之彎曲部構造Bent structure of flexible circuit board and flexible circuit board

本發明係關於在任一者具有彎曲部所被使用的可撓性電路基板、及可撓性電路基板之彎曲部構造,更詳而言之,係關於對彎曲具備有耐久性,而且彎曲性佳的可撓性電路基板、及可撓性電路基板之彎曲部構造。The present invention relates to a flexible circuit board having a bent portion and a bent portion structure of the flexible circuit board, and more particularly, it has durability and good flexibility for bending. The flexible circuit board and the bent portion structure of the flexible circuit board.

具有樹脂層及由金屬箔所構成的配線而成的可撓性電路基板(可撓性印刷基板)係可折曲使用,因此以硬碟內的可動部、行動電話的鉸鏈部或滑移滑動部、印表機的列印頭部、光拾波器部、筆記型PC的可動部等為首,在各種電子電氣機器中被廣泛使用。而近來尤其伴隨著該等機器的小型化、薄型化、高功能化等,圖求在有限空間將可撓性電路基板折疊為較小來作收納、或與電子機器等的各種動作相對應的彎曲性。因此,為了亦可與彎曲部中的曲率半徑變得更小的折曲、或頻繁反覆折曲之類的動作相對應,必須提升可撓性電路基板的更進一步的強度等機械特性。A flexible circuit board (flexible printed circuit board) having a resin layer and a wiring made of a metal foil is bendable and can be used as a movable portion in a hard disk, a hinge portion of a mobile phone, or a sliding slide. The head, the print head of the printer, the optical pickup unit, and the movable portion of the notebook PC are widely used in various electronic and electrical equipment. In recent years, in particular, miniaturization, thinning, and high functionality of such devices have been made, and it has been proposed to fold the flexible circuit board into a small space for storage in a limited space, or to perform various operations such as an electronic device. Flexibility. Therefore, in order to correspond to an operation such as bending with a smaller radius of curvature in the curved portion or frequent repeated bending, it is necessary to improve mechanical properties such as further strength of the flexible circuit board.

一般而言,與其說是樹脂層,反而是配線是因對於反覆折曲或曲率半徑較小的彎曲,強度較差劣等而成為不良要因,若變得無法承受該等時,會在配線的一部分發生破損或斷裂,而變得無法作為電路基板加以利用。因此,例如為了減小對鉸鏈部中的配線的彎曲應力,形成以相對旋動軸呈傾斜的方式所配線的可撓性電路基板(參照專利文獻1)、或朝鉸鏈部的旋動方向螺旋1匝以上的螺旋部,藉由加多該匝數而減小因開閉動作所造成的螺旋部的直徑的變化而減少損傷的方法(參照專利文獻2)等已被提出。但是,在該等方法中,可撓性電路基板的設計均受到限制。In general, it is not so much a resin layer, but the wiring is a bad cause for bending or bending with a small radius of curvature, and the strength is poor. If it becomes unbearable, it will occur in a part of the wiring. It is broken or broken, and it cannot be utilized as a circuit board. Therefore, for example, in order to reduce the bending stress on the wiring in the hinge portion, a flexible circuit board that is wired so as to be inclined with respect to the rotation axis is formed (see Patent Document 1), or a spiral in the direction of the rotation of the hinge portion. A method of reducing the damage due to a change in the diameter of the spiral portion due to the opening and closing operation by increasing the number of turns of the spiral portion (see Patent Document 2) has been proposed. However, in these methods, the design of the flexible circuit substrate is limited.

另一方面,以壓延銅箔的壓延面的X線繞射(銅箔的厚度方向的X線繞射)所求出的(200)面的強度(I),相對以微粉末銅的X線繞射所求出的(200)面的強度(I0)為I/I0>20時,彎曲性佳己有報告被提出(參照專利文獻3及4)。亦即,屬於銅的再結晶集合組織的立方體方位愈為發達,銅箔的彎曲性愈為提升,因此以上述參數(I/I0)來規定立方體集合組織的發達度之適於作為可撓性電路基板的配線材料的銅箔已為人所知。此外,以固溶於銅的範圍的濃度含有Fe、Ni、Al、Ag等元素,以預定條件進行燒鈍而再結晶化所得的壓延銅合金箔使得沿著滑移面的剪斷變形較為容易而彎曲性佳已有報告被提出(參照專利文獻5)。On the other hand, the intensity (I) of the (200) plane obtained by the X-ray diffraction of the rolled surface of the rolled copper foil (the X-ray diffraction in the thickness direction of the copper foil) is relative to the X-ray of the fine powder copper. When the intensity (I 0 ) of the (200) plane obtained by the diffraction is I/I 0 > 20, the flexibility is reported (refer to Patent Documents 3 and 4). That is, the more the cube orientation of the recrystallized assembly structure belonging to copper is, the more the bendability of the copper foil is improved. Therefore, the above-mentioned parameter (I/I 0 ) is used to specify the degree of development of the cube assembly structure as a flexible A copper foil of a wiring material of a circuit board is known. Further, the rolled copper alloy foil obtained by atomizing and recrystallizing the element in a concentration in the range of solid solution in the range of copper, Fe, Ni, Al, Ag, etc., is easy to be sheared along the slip surface. A good report has been proposed (see Patent Document 5).

此外,在被要求高彎曲特性的可撓性電路基板係有使用含有氧或銀等不純物的銅箔的情形,若以純度而言,為99%~99.9質量%左右的銅箔。在本發明中,只要沒有特別要求,純度係以質量濃度來表記。此外,在試驗層次(level)中,係有使用廣泛作為線材的導體所被使用的純度99.5%左右的精銅或未含有氧化物的無氧銅之例(參照專利文獻3、4)。精銅的不純物係含有數百ppm的氧(大部分作為氧化銅而含有)、銀、鐵、硫磺、磷等。無氧銅通常為純度99.96~99.995%左右的銅,大幅減氧至10ppm以下的銅。在上述專利文獻3、4中已報告出:以無氧銅所製造出的銅箔的彎曲疲勞特性優於精銅箔,依存於有無含有氧化銅。其中,若更加提高該等銅的純度時,必須去除銀、磷、硫磺等不純物。In addition, in the case of using a copper foil containing impurities such as oxygen or silver, the flexible circuit board which is required to have a high bending property is a copper foil having a purity of about 99% to 99.9% by mass. In the present invention, the purity is expressed by mass concentration unless otherwise specified. In addition, in the test level, there is an example in which refined copper having a purity of about 99.5% or oxygen-free copper containing no oxide is used as a conductor widely used as a wire (see Patent Documents 3 and 4). The impure substance of refined copper contains hundreds of ppm of oxygen (mostly contained as copper oxide), silver, iron, sulfur, phosphorus, and the like. The oxygen-free copper is usually copper having a purity of about 99.96 to 99.995%, and copper which is greatly reduced to 10 ppm or less. In the above-mentioned Patent Documents 3 and 4, it has been reported that the copper foil produced by the oxygen-free copper has better bending fatigue characteristics than the fine copper foil, and depends on the presence or absence of copper oxide. Among them, when the purity of the copper is further increased, it is necessary to remove impurities such as silver, phosphorus, and sulfur.

[先前技術文獻][Previous Technical Literature]

[專利文獻][Patent Literature]

[專利文獻1]日本特開2002-171033號公報[Patent Document 1] Japanese Patent Laid-Open Publication No. 2002-171033

[專利文獻2]日本特開2002-300247號公報[Patent Document 2] Japanese Patent Laid-Open Publication No. 2002-300247

[專利文獻3]日本特開2001-58203號公報[Patent Document 3] Japanese Patent Laid-Open Publication No. 2001-58203

[專利文獻4]日本專利第3009383號公報[Patent Document 4] Japanese Patent No. 3009383

[專利文獻5]日本特開2007-107036號公報[Patent Document 5] Japanese Patent Laid-Open Publication No. 2007-107036

根據如上所示之狀況,本發明人等為了獲得在可撓性電路基板的設計方面不會產生制約且對反覆折曲或曲率半徑較小的彎曲亦具備有耐久性的可撓性電路基板,經精心研究的結果,發現藉由使用作高度配向、而且其斷裂伸長較大之具有面心立方晶格系的結晶構造的金屬箔,可得彎曲耐久性或彎曲性佳的可撓性電路基板,而完成本發明。According to the above-described situation, the inventors of the present invention have a durable flexible circuit board that does not have any restriction on the design of the flexible circuit board and that has a bending resistance or a curvature having a small radius of curvature. As a result of careful study, it has been found that a flexible circuit substrate having excellent bending durability or flexibility can be obtained by using a metal foil having a crystal structure of a face-centered cubic lattice system which is highly aligned and has a large elongation at break. The present invention has been completed.

因此,本發明之目的在提供一種耐久性佳的可撓性電路基板,尤其在提供一種即使對如伴隨行動電話或小型電子機器等的鉸鏈部或滑移滑動部等曲率半徑較小的反覆彎曲之類的過於苛刻的使用條件,亦呈現耐久性,且彎曲性佳的可撓性電路基板。SUMMARY OF THE INVENTION Accordingly, it is an object of the present invention to provide a flexible circuit board which is excellent in durability, and in particular to provide a reverse bending of a radius of curvature such as a hinge portion or a sliding sliding portion such as a mobile phone or a small electronic device. A flexible circuit board having excellent durability and excellent flexibility, such as an overly demanding use condition.

此外,本發明之其他目的在提供一種對於行動電話或小型電子機器等的鉸鏈部或滑移滑動部等尤其曲率半徑較小的反覆彎曲部中的過於苛刻的條件具備耐久性、且彎曲性佳的可撓性電路基板之彎曲部構造。Further, another object of the present invention is to provide durability and excellent bending property in an overly harsh condition such as a hinge portion or a sliding sliding portion of a mobile phone or a small electronic device or the like, which is particularly small in a curved portion having a small radius of curvature. The curved portion structure of the flexible circuit board.

本發明為解決上述習知技術的問題而精心研究的結果,將以下構成作為要旨。The present invention has been intensively studied in order to solve the problems of the above-described conventional techniques, and the following constitutions are intended as the gist.

(1)一種可撓性電路基板,係具備有樹脂層、及由金屬箔所形成的配線,在配線的至少一個部位具有彎曲部所使用的可撓性電路基板,其特徵為:金屬箔係由具有面心立方構造的金屬所構成,並且面心立方構造的單位晶格的基本結晶軸<100>相對金屬箔的厚度方向、及存在於箔面內的某一方向的2個正交軸,分別方位差10°以內的優先配向領域以面積率計佔有50%以上,而且相對由彎曲部中的稜線朝金屬箔的厚度方向切開的配線的剖面P的法線方向的金屬箔的斷裂伸長為3.5%以上、20%以下。(1) A flexible circuit board comprising a resin layer and a wiring formed of a metal foil, and a flexible circuit board having a bent portion at least one portion of the wiring, characterized in that the metal foil is It consists of a metal having a face-centered cubic structure, and the basic crystal axis of the unit cell of the face-centered cubic structure <100> is opposite to the thickness direction of the metal foil and two orthogonal axes existing in a certain direction in the foil surface. The preferential alignment field within 10° of the azimuth difference is 50% or more in area ratio, and the elongation at break of the metal foil in the normal direction of the cross section P of the wiring which is cut by the ridge line in the curved portion toward the thickness direction of the metal foil It is 3.5% or more and 20% or less.

(2)如(1)項之可撓性電路基板,其中,金屬箔係由純度99.999質量%以上的銅箔所構成。(2) The flexible circuit board according to (1), wherein the metal foil is made of a copper foil having a purity of 99.999 mass% or more.

(3)如(1)或(2)項之可撓性電路基板,其中,金屬箔為銅箔,由箔面法線方向觀看時的結晶粒徑為25μm以上。(3) The flexible circuit board according to the item (1) or (2), wherein the metal foil is a copper foil, and the crystal grain size when viewed from the normal direction of the foil surface is 25 μm or more.

(4)如(1)至(3)項中任一項之可撓性電路基板,其中,金屬箔的厚度為5μm以上、18μm以下。(4) The flexible circuit board according to any one of (1) to (3), wherein the metal foil has a thickness of 5 μm or more and 18 μm or less.

(5)如(1)至(4)項中任一項之可撓性電路基板,其中,配線的剖面P係在以[001]為晶帶軸而從(100)對(110)的旋轉方向中由(20 1 0)至(1 20 0)的範圍所包含的任何面形成主方位。(5) The flexible circuit board according to any one of (1) to (4) wherein the cross section P of the wiring is rotated from (100) to (110) with [001] as a ribbon axis. Any face included in the range from (20 1 0) to (1 20 0) in the direction forms the principal orientation.

(6)如(5)項之可撓性電路基板,其中,配線的剖面P係在(100)標準投影圖的立體三角形中,位於以表示(20 1 0)的點與表示(110)的點所連結的線段上的任何面。(6) The flexible circuit board of (5), wherein the cross section P of the wiring is in a solid triangle of the (100) standard projection image, and is located at a point (20 1 0) indicating the (20 1 0) Point any face on the connected line segment.

(7)如(1)至(6)項中任一項之可撓性電路基板,其中,沿著相對彎曲部中的稜線呈正交的方向形成有配線。(7) The flexible circuit board according to any one of (1), wherein the wiring is formed in a direction orthogonal to a ridge line in the opposite curved portion.

(8)如(1)至(7)項中任一項之可撓性電路基板,其中,樹脂層由聚醯亞胺所構成。The flexible circuit board of any one of (1) to (7), wherein the resin layer is composed of polyimine.

(9)如(1)至(8)項中任一項之可撓性電路基板,其中,以形成有伴隨選自由滑動彎曲、折曲彎曲、鉸鏈彎曲及滑移彎曲所成群組的任何反覆動作的彎曲部的方式予以使用。The flexible circuit board of any one of (1) to (8), wherein any one selected from the group consisting of sliding bending, bending bending, hinge bending, and slip bending is formed. The method of repeating the bending portion of the action is used.

(10)一種電子機器,其特徵為:裝載有如上述(1)至(9)項中任一項之可撓性電路基板。(10) An electronic device comprising the flexible circuit board according to any one of the above (1) to (9).

(11)一種可撓性電路基板之彎曲部構造,係具備有樹脂層、及由金屬箔所形成的配線,在配線的至少一個部位具有彎曲部所使用的可撓性電路基板之彎曲部構造,其特徵為:金屬箔係由具有面心立方構造的金屬所構成,並且面心立方構造的單位晶格的基本結晶軸<100>相對金屬箔的厚度方向、及存在於箔面內的某一方向的2個正交軸,分別方位差10°以內的優先配向領域以面積率計佔有50%以上,而且相對由彎曲部中的稜線朝金屬箔的厚度方向切開的配線的剖面P的法線方向的金屬箔的斷裂伸長為3.5%以上、20%以下。(11) A curved portion structure of a flexible circuit board, comprising a resin layer and a wiring formed of a metal foil, and a bent portion structure of the flexible circuit board having a bent portion at at least one portion of the wiring The metal foil is composed of a metal having a face-centered cubic structure, and the basic crystal axis of the unit cell of the face-centered cubic structure is <100> with respect to the thickness direction of the metal foil, and some existing in the foil surface. The two orthogonal axes in one direction, the priority alignment field within 10° of the azimuth difference is 50% or more in area ratio, and the cross section P of the wiring which is cut toward the thickness direction of the metal foil by the ridge line in the curved portion The elongation at break of the metal foil in the line direction is 3.5% or more and 20% or less.

藉由本發明,在使可撓性電路基板彎曲時的彎曲部中構成配線的金屬箔不易發生金屬疲勞,且對應力及變形具有優異耐久性。因此,可提供在可撓性電路基板的設計方面不會產生制約,具備有即使對反覆折曲或曲率半徑較小的彎曲亦可承受的強度,且彎曲性佳的可撓性電路基板,且可實現以薄型行動電話、薄型顯示器、硬碟、印表機、DVD裝置等為首,耐久性高的電子機器。According to the present invention, the metal foil constituting the wiring in the bent portion when the flexible circuit board is bent is less likely to cause metal fatigue, and has excellent durability against stress and deformation. Therefore, it is possible to provide a flexible circuit board having excellent strength and excellent bending properties even in the case of bending or bending with a small radius of curvature, without any restriction on the design of the flexible circuit board, and It is an electronic device with high durability, such as a thin mobile phone, a thin display, a hard disk, a printer, or a DVD device.

本發明之可撓性電路基板所具備的配線係藉由由具有面心立方晶格系的結晶構造的金屬所構成的金屬箔所形成。以具有面心立方晶格系的結晶構造的金屬而言,已知有例如銅、鋁、鎳、銀、銠、鈀、鉑、金等,該等可為任一者,但是基於作為金屬箔的利用性,以銅、鋁及鎳較為適合,其中亦以主要作為可撓性電路基板的配線而被使用的銅箔最為一般。The wiring included in the flexible circuit board of the present invention is formed of a metal foil made of a metal having a face-centered cubic lattice crystal structure. For a metal having a crystal structure of a face-centered cubic lattice system, for example, copper, aluminum, nickel, silver, rhodium, palladium, platinum, gold, or the like is known, and these may be any, but based on the metal foil. Copper, aluminum, and nickel are suitable for use, and copper foil which is mainly used as a wiring of a flexible circuit board is most common.

本發明係提供彎曲耐久性或彎曲性佳的可撓性電路基板,尤其係提供在曲率半徑為2mm以下之類的高變形領域具有優異疲勞特性的可撓性電路基板。為了達成該目的,在本發明中,即使施行i)金屬箔作高度配向、及ii)在彎曲部中,金屬箔的主應力方向的斷裂伸長較大之任一者,亦未形成為如本發明所示之高彎曲時耐疲勞破壞的可撓性電路基板。亦即,藉由同時滿足i)與ii)之二者,可得高彎曲時耐疲勞破壞的可撓性電路基板。具體而言,必須為:i)面心立方構造的單位晶格的基本結晶軸<100>相對金屬箔的厚度方向與存在於箔面內的某一方向的2個正交軸,分別方位差10°以內的優先配向領域以面積率計佔有50%以上,而且,ii)相對由彎曲部中的稜線朝金屬箔的厚度方向切開的配線的剖面P的法線方向的金屬箔的斷裂伸長為3.5%以上、20%以下。The present invention provides a flexible circuit board excellent in bending durability or flexibility, and in particular, a flexible circuit board having excellent fatigue characteristics in a high deformation range such as a curvature radius of 2 mm or less. In order to achieve the object, in the present invention, even if i) the metal foil is highly aligned, and ii) in the bent portion, the metal foil has a large elongation at break in the principal stress direction, and is not formed as in this case. A flexible circuit board which is resistant to fatigue damage at the time of high bending as shown in the invention. That is, by satisfying both of i) and ii) at the same time, it is possible to obtain a flexible circuit board which is resistant to fatigue damage at the time of high bending. Specifically, it must be: i) the basic crystal axis of the unit cell of the face-centered cubic structure <100> with respect to the thickness direction of the metal foil and the two orthogonal axes existing in a certain direction in the foil surface, respectively. The area of the preferential alignment within 10° is 50% or more in area ratio, and ii) the elongation at break of the metal foil in the normal direction of the cross section P of the wiring which is cut in the thickness direction of the metal foil by the ridge line in the curved portion is 3.5% or more and 20% or less.

若金屬箔為以一般的電解箔或壓延箔所見到的多結晶體時,可得高斷裂伸長,但是相對在本發明中所求出的高變形疲勞,並不會成為疲勞特性較高的可撓性電路基板。另一方面,若即使集合組織發達、配向度變大,而斷裂伸長較小時,同樣地並無法獲得具有本發明所求特性的可撓性電路基板。When the metal foil is a polycrystalline body as seen in a general electrolytic foil or a rolled foil, high elongation at break can be obtained, but the high deformation fatigue obtained in the present invention does not become a high fatigue property. Circuit board. On the other hand, even if the aggregate structure is developed and the degree of alignment is large and the elongation at break is small, the flexible circuit board having the characteristics obtained by the present invention cannot be obtained in the same manner.

本發明係首次瞭解以集合組織發達、配向度大的金屬箔為條件,尤其求取高彎曲特性的可撓性電路基板內的金屬箔的斷裂伸長為重要因子者。In the present invention, for the first time, it is known that a metal foil having a large aggregate structure and a large degree of alignment is used, and in particular, the elongation at break of the metal foil in the flexible circuit substrate having high bending characteristics is an important factor.

金屬箔可為壓延箔或電解箔的任一者,惟在獲得高配向性方面,較佳為壓延箔。若為面心立方金屬,將壓延條件與熱處理條件加以設計,藉此可製造出具有在壓延方向與箔面法線方向分別具有<100>主方位的高度配向的立方體集合組織的金屬箔。The metal foil may be either a calendered foil or an electrolytic foil, but a rolled foil is preferred in terms of obtaining high alignment. In the case of a face-centered cubic metal, the rolling conditions and the heat treatment conditions are designed, whereby a metal foil having a highly aligned cubic aggregate structure having a <100> main orientation in the rolling direction and the foil surface normal direction can be produced.

不限於可撓性電路基板的用途,具有強立方體方位的金屬箔的機械特性的特徵係在斷裂伸長具有異方性。斷裂伸長係在進行朝<100>方向的拉伸時,取非常小的值。一般而言,配向度愈增加,而且金屬箔的厚度愈小,則朝<100>方向進行拉伸試驗時的斷裂伸長愈小。面心立方構造的單位晶格的基本結晶軸<100>,相對金屬箔的厚度方向(箔面法線方向)與存在於箔面內的某一方向(其一為壓延方向)的2個正交軸,各個方位差10°以內的優先配向領域以面積率計佔有95%以上,而且厚度為18μm以下的一般的壓延銅箔時(以下為方便起見,將其稱為「習知壓延銅箔」),彎曲部中對主應力方向的斷裂伸長並未達到3.5%。在此所稱的斷裂伸長係指使用將寬幅取得充分大於金屬箔的厚度,典型而言在寬幅5~15mm的範圍內任一寬幅的試驗片,至相對長度,以10%/min的變形速度進行拉伸試驗時的斷裂為止的伸展。在本發明中,係設為指藉由以下實施例所示之測定方法,求出金屬箔的斷裂伸長,與樹脂層相層積而獲得可撓性電路基板之後的值者。Not limited to the use of the flexible circuit board, the mechanical properties of the metal foil having a strong cubic orientation are characterized by an anisotropy in elongation at break. The elongation at break takes a very small value when stretching in the <100> direction. In general, the more the degree of alignment increases and the smaller the thickness of the metal foil, the smaller the elongation at break in the tensile test in the <100> direction. The basic crystal axis of the unit cell of the face-centered cubic structure is <100>, and the thickness direction of the metal foil (the normal direction of the foil surface) and the two directions existing in the foil surface (the one is the rolling direction) are positive. When the priority alignment field within 10° of each azimuth difference is 95% or more in area ratio, and the general rolled copper foil having a thickness of 18 μm or less (hereinafter referred to as "conveniently rolled copper" for convenience Foil"), the elongation at break in the direction of the principal stress in the bent portion did not reach 3.5%. The term "elongation at break" as used herein refers to the use of a test piece having a width which is sufficiently larger than the thickness of the metal foil, typically in the range of 5 to 15 mm in width, to a relative length of 10%/min. The deformation speed is stretched until the fracture at the time of the tensile test. In the present invention, it is assumed that the elongation at break of the metal foil is determined by the measurement method shown in the following examples, and the value is obtained by laminating the resin layer to obtain a flexible circuit board.

若為壓延銅箔,再結晶集合組織係壓延方向、亦即金屬箔的長邊方向成為<100>方位。在一般的可撓性電路基板中,由在抽出基板時提高良率的方面來看,取電路的長邊方向與銅箔的長邊方向為相一致。因此,在將電路的長邊方向折曲的一般的利用形態中,由於主應力方向與<100>方向相一致,因此在習知壓延銅箔中,並未獲得對反覆彎曲為較高的疲勞特性。In the case of rolling the copper foil, the direction of rolling of the recrystallized aggregate structure, that is, the longitudinal direction of the metal foil is <100> orientation. In a general flexible circuit board, the longitudinal direction of the circuit is matched with the longitudinal direction of the copper foil from the viewpoint of improving the yield when the substrate is taken out. Therefore, in the general utilization form in which the longitudinal direction of the circuit is bent, since the principal stress direction coincides with the <100> direction, the conventional rolled copper foil is not subjected to fatigue which is highly resistant to repeated bending. characteristic.

以提升以如上所示之方位關係所利用的可撓性電路基板的疲勞特性的方法而言,在本發明中,達成所使用的金屬箔的高純度化。在至今為人所知的高彎曲用途所使用的可撓性電路基板中,係使用意圖性或不可避免的含有氧或銀等不純物的銅箔。此係例如專利文獻5所示,有使沿著滑移面的剪斷變形更為容易、或抑制電阻增加的目的。但是,該等不純物元素係使層積缺陷能量降低。本發明人等即著重在該點。亦即,若層積缺陷能量降低,位錯容易擴張,不易發生交叉滑移,尤其朝<100>方向拉伸時,不易發生伸展。In the method of improving the fatigue characteristics of the flexible circuit board used in the orientation relationship as described above, in the present invention, the purity of the metal foil to be used is improved. In the flexible circuit board used for the high-bending use known to date, a copper foil containing an impurity such as oxygen or silver, which is intentionally or unavoidably used, is used. For example, as disclosed in Patent Document 5, it is possible to make the shear deformation along the slip surface easier or to suppress the increase in resistance. However, these impurity elements reduce the energy of the laminated defects. The present inventors focused on this point. That is, if the delamination defect energy is lowered, the dislocations are easily expanded, and cross slippage is less likely to occur, and particularly when stretching in the <100> direction, stretching is less likely to occur.

因此,在本發明中,係使用顯示以下說明的預定的優先配向性、並且較佳為純度為99.999%以上的金屬箔(較適為銅箔),藉此可將<100>方向的斷裂伸長加大為3.5%以上,結果,提高在高變形領域中施加反覆變形時的疲勞特性。以金屬箔的純度高者為宜,惟若由製造成本方面來看,以使用99.999%或99.9999%者最為適合。此外,即使為純度低於99.999%的銅箔,亦在氧濃度較低的無氧銅箔中,如下述實施例所示,雖為狹小條件,但依壓延與熱處理條件,面心立方構造的基本結晶軸<100>之一、例如[001]軸為相對金屬箔的厚度方向(箔面法線方向)以方位差計在10°以內的領域為98%以上、99.8%以下時,存在有斷裂伸長成為3.5%以上的領域,耐彎曲疲勞性變得良好。關於該理由,在現時點雖不明確,惟在藉由熱處理而獲得預定的集合組織的無氧銅箔中,係推測出因存在適當的大小、對於相對以體積率計為分散的壓延方向為<212>方位的再結晶殘留組織,而加大<100>方向的斷裂伸長者。Therefore, in the present invention, a metal foil (preferably a copper foil) exhibiting a predetermined preferential orientation as described below and preferably having a purity of 99.999% or more is used, whereby elongation at break in the <100> direction can be obtained. The increase is 3.5% or more, and as a result, the fatigue characteristics when the reverse deformation is applied in the high deformation field are improved. It is preferable to use a metal foil having a high purity, but it is most suitable for use in the case of manufacturing cost of 99.999% or 99.9999%. Further, even in the case of a copper foil having a purity of less than 99.999%, in an oxygen-free copper foil having a low oxygen concentration, as shown in the following examples, although it is a narrow condition, it is a face-centered cubic structure depending on rolling and heat treatment conditions. When one of the basic crystal axes <100>, for example, the [001] axis is 98% or more and 99.8% or less in the range of the thickness direction of the metal foil (the normal direction of the foil surface) within 10 degrees of the azimuth difference, there is In the field in which the elongation at break is 3.5% or more, the bending fatigue resistance is improved. For this reason, although the current point is not clear, in the oxygen-free copper foil obtained by heat treatment to obtain a predetermined aggregate structure, it is presumed that there is an appropriate size, and the rolling direction in which the relative volume ratio is dispersed is <212> Azimuth recrystallizes the residual structure and increases the elongation at break in the <100> direction.

在本發明之可撓性電路基板中,對構成其電路的金屬箔的試料座標系,規定出金屬箔的三次元結晶方位,其集合組織的集積度為下列範圍。亦即,面心立方構造的基本結晶軸<100>之一、例如[001]軸係使用呈現相對金屬箔的厚度方向(箔面法線方向)以方位差計在10°以內的領域以面積比計佔有50%以上、較佳為75%以上、更佳為98%以上的優先配向,而且在相對金屬箔的表面呈水平方向的箔面內,由其他基本結晶軸、例如[100]軸以方位差計為10°以內的領域以面積比計佔有50%以上、較佳為85%以上、更佳為99%以上的優先配向者。在本發明中,至少在彎曲部具有如上所述之集合組織的集積度即可,但是若為較適於被層積在樹脂層的金屬箔的全部具有如上所述的集積度的所謂的類單晶的金屬箔,在配線設計中不會受到制約,較為理想。其中,由於將位於優先配向的中心的結晶方位稱為集合組織的主方位,因此在本發明中所使用的金屬可稱為係金屬箔的厚度方向具有<100>的主方位,並且金屬箔的箔面內具有<100>的主方位。In the flexible circuit board of the present invention, the three-dimensional crystal orientation of the metal foil is defined for the sample coordinate system of the metal foil constituting the circuit, and the aggregated degree of the aggregate structure is the following range. That is, one of the basic crystal axes <100> of the face-centered cubic structure, for example, the [001] axis is used in a field in which the thickness direction of the metal foil (the normal direction of the foil surface) is within 10 degrees with respect to the azimuth difference. Preferably, the ratio is 50% or more, preferably 75% or more, more preferably 98% or more, and the other basic crystal axis, for example, the [100] axis, is in a horizontal foil surface on the surface of the metal foil. A preferred alignment of 50% or more, preferably 85% or more, and more preferably 99% or more of the area within 10° of the azimuth difference. In the present invention, the accumulation degree of the aggregate structure as described above may be at least in the curved portion, but the so-called class having the degree of accumulation as described above, which is more suitable for all of the metal foil laminated on the resin layer. The single crystal metal foil is not restricted in the wiring design, and is preferable. Wherein, since the crystal orientation of the center located in the preferential alignment is referred to as the main orientation of the aggregate structure, the metal used in the present invention may be referred to as the main orientation of the metal foil having a thickness direction of <100>, and the metal foil The foil face has a main orientation of <100>.

集合組織的優先配向的優先度、亦即表示配向度或集積度的指標有幾個,可使用根據X線繞射強度、及使用以電子線繞射所得之局部三次元方位資料的統計資料的客觀資料的指標。The priority of the preferential alignment of the collective organization, that is, the index indicating the degree of alignment or the degree of accumulation, may be based on the diffraction intensity of the X-ray and the statistical data of the local three-dimensional orientation data obtained by the diffraction of the electron beam. Indicators of objective data.

例如金屬箔為銅箔時,由以X線繞射所求出之來自與上述晶帶軸呈垂直的(002)的強度(I)(在此,按照X線繞射中的一般標記方法設為(200)面的強度),相對以微粉末銅的X線繞射所求出的(200)面的強度(I0)為I/I0≧25的銅箔,形成具有預定圖案的配線為佳,較佳為I/I0為33~150的範圍,更佳為50~150的範圍。在此,參數I/I0係表示(100)與(110)的晶帶軸、亦即共通軸[001]的配向度者,表示立方體集合組織之發達度的一客觀指標。接著,若金屬箔為壓延銅箔時,將其以一定以上的壓延率進行強加工,之後,加熱而使其再結晶時,將壓延箔面設為(001)主方位、箔面內壓延方向設為(100)主方位的再結晶立方體方位即會發達。屬於銅的再結晶集合組織的立方體方位愈為發達,銅箔的彎曲疲勞壽命愈為提升。在本發明之可撓性電路基板中,若I/I0小於25時,配線的彎曲疲勞壽命的提升未充分符合期望,若I/I0為33以上,彎曲疲勞壽命的提升會變得較為明顯。其中,銅箔的厚度方向的X線繞射係指確認銅箔的表面(若為壓延銅箔則為壓延面)中的配向性者,(200)面的強度(I)係表示以X線繞射所求出的(200)面的強度積分值。此外,強度(I0)係表示微粉末銅(關東化學公司製銅粉末試藥I級、325mesh)的(200)面的強度積分值。For example, when the metal foil is a copper foil, the intensity (I) from the (002) perpendicular to the crystal ribbon axis obtained by X-ray diffraction (here, according to the general marking method in the X-ray diffraction) The strength of the (200) plane), the copper foil having the intensity (I 0 ) of the (200) plane obtained by the X-ray diffraction of the fine powder copper is I/I 0 ≧25, and wiring having a predetermined pattern is formed. Preferably, I/I 0 is in the range of 33 to 150, more preferably in the range of 50 to 150. Here, the parameter I/I 0 indicates the orientation of the crystal axis of (100) and (110), that is, the alignment of the common axis [001], and represents an objective index of the degree of development of the cube assembly. Next, when the metal foil is a rolled copper foil, it is strongly processed at a rolling ratio of a certain value or more, and then heated to recrystallize, the rolled foil surface is set to a (001) main orientation, and the foil surface is rolled in the direction. The orientation of the recrystallized cube set to (100) the main orientation is developed. The more the cube orientation of the recrystallized assembly of copper belongs to, the more the bending fatigue life of the copper foil is improved. In the flexible circuit board of the present invention, when the I/I 0 is less than 25, the improvement of the bending fatigue life of the wiring is not sufficiently satisfactory. If the I/I 0 is 33 or more, the improvement of the bending fatigue life becomes more complicated. obvious. Here, the X-ray diffraction in the thickness direction of the copper foil refers to the alignment in the surface of the copper foil (in the case of a rolled copper foil, the rolling surface), and the strength (I) of the (200) plane is represented by X-ray. The intensity integral value of the (200) plane obtained by diffraction. Further, the strength (I 0 ) indicates the intensity integral value of the (200) plane of the fine powder copper (the copper powder test material of the Kanto Chemical Co., Ltd. grade I, 325 mesh).

為了將I/I0設為25以上,若獲得銅箔的再結晶集合組織即可,關於該手段並未特別限制,但是按照以中間燒鈍條件或冷間壓延加工率為對象的金屬箔的種類或不純物濃度作最適化,藉此可得結晶粒較大的集合組織而且I/I0≧25的壓延銅箔。此外,亦可例如使樹脂層與壓延銅箔相層積而得覆銅層積板後,在銅箔經過300~360℃的溫度以積算時間計為負荷5分以上的加熱條件,藉此獲得銅箔的再結晶集合組織。In order to obtain I/I 0 of 25 or more, it is only necessary to obtain a recrystallized aggregate structure of the copper foil, and the means is not particularly limited, but is a metal foil which is subjected to an intermediate burning condition or a cold rolling processing rate. The type or the concentration of the impurities is optimized, whereby a rolled structure of a large aggregate of crystal grains and a rolled copper foil of I/I 0 ≧25 can be obtained. Further, for example, after the copper layer is laminated on the resin layer and the rolled copper foil, the copper foil may be heated at a temperature of 300 to 360 ° C for a load of 5 minutes or more. Recrystallized assembly of copper foil.

此外,為了以3次元的集積度來規定集合組織,亦可使用相對集合組織的主方位在10°以內的優先配向領域的面積率來加以特定。亦即,關於金屬箔的預定的面具有什麼樣的結晶方位,例如可藉由EBSP(Electron Back Scattering Pattern)法、ECP(Electron Channeling Pattern)法等電子線繞射法或Micro Laue法等X線繞射法等來確認。其中,EBSP法係根據由當對作為測定對象的試料表面照射收斂電子束時所發生的各個結晶面所被繞射之被稱為擬菊池線的繞射像來解析結晶,根據方位資料與測定點的位置資訊來將測定對象的結晶方位分布進行測定的方法,相較於X線繞射法,可解析小(micro)領域的集合組織的結晶方位。例如,可在各個微小領域特定其結晶方位,將該等接在一起來進行映射,將各映射點間的面方位的傾角(方位差)為一定值以下者以同色塗佈區分,使具有大致相同的面方位的領域(結晶粒)的分布顯露,藉此可得方位映射像。此外,亦可包含相對特定的面方位具有預定的角度以內的方位的方位面而規定為其方位,將各面方位的存在比例以面積率計加以抽出。在EBSP法中,為了由某特定方位來展示出位於特定的角度以內的領域的面積率,必須至少在大於本發明之可撓性電路基板中的電路彎曲領域的領域,為了展示出面積率而以成為充分點數的方式詳細掃描電子線,而得其平均資訊,但是在本發明中作為對象的金屬箔中,係由作為對象的電路的大小加以考量,在0.005mm2以上的領域中,若為了展示出平均的面積率,則測定1000點以上即可。Further, in order to define the aggregate organization in terms of the degree of integration of the three dimensions, it is also possible to specify the area ratio of the priority alignment field within 10 degrees with respect to the main orientation of the aggregate organization. In other words, the crystal plane of the predetermined surface of the metal foil may be, for example, an electron beam diffraction method such as an EBSP (Electron Back Scattering Pattern) method or an ECP (Electron Channeling Pattern) method, or an X-ray such as a Micro Laue method. Confirm by the diffraction method or the like. The EBSP method analyzes crystals based on a diffraction image called a pseudo-Kikuchi line, which is diffracted by each crystal plane generated when a convergent electron beam is irradiated onto the surface of the sample to be measured, and is determined based on the orientation data and the measurement. The position information of the point is used to measure the crystal orientation distribution of the measurement object, and the crystal orientation of the aggregate structure in the micro domain can be analyzed compared to the X-ray diffraction method. For example, the crystal orientations can be specified in each of the microscopic fields, and the maps can be mapped together, and the inclination (azimuth difference) of the plane orientation between the map points is equal to or less than a certain value. The distribution of the fields (crystal grains) of the same plane orientation is revealed, whereby the orientation map image can be obtained. Further, the orientation plane having an orientation within a predetermined angle with respect to a specific plane orientation may be included, and the orientation may be defined, and the ratio of the existence of each plane orientation may be extracted by an area ratio. In the EBSP method, in order to exhibit an area ratio of a region within a certain angle from a specific orientation, it is necessary to at least be larger than the field of circuit bending in the flexible circuit substrate of the present invention, in order to exhibit an area ratio. The electronic wire is scanned in detail in a manner that is sufficient to obtain a sufficient number of points. However, in the metal foil to be used in the present invention, the size of the target metal is considered, and in the field of 0.005 mm 2 or more, In order to exhibit an average area ratio, it is sufficient to measure 1000 points or more.

但是,本發明與專利文獻3及4所記載之發明中在組織上的不同之處在於,該等專利文獻之發明之方位規定係僅有以X線所測定出的箔法線方向的規定,相對於此,本發明係以3次元加以規定。為了對彎曲獲得高疲勞特性,尤其使其彎曲時的主變形、主應力方向、亦即箔面內的<100>集積度極為重要。此外,在本發明中,再結晶粒、亦即具有立方體方位的結晶粒的大小係以平均值計為25μm以上為宜。However, the present invention differs from the inventions described in Patent Documents 3 and 4 in that the orientation of the invention of the patent documents is only defined by the normal direction of the foil measured by the X-ray. In contrast, the present invention is defined by a third dimension. In order to obtain high fatigue properties for bending, in particular, the main deformation, the principal stress direction, that is, the <100> accumulation degree in the foil surface, is extremely important. Further, in the present invention, the size of the recrystallized grains, that is, the crystal grains having a cubic orientation is preferably 25 μm or more on the average.

此外,在本發明中,尤其要求高彎曲性時,形成可撓性電路基板的金屬箔係使用厚度5~18μm的壓延銅箔即可,較佳為使用厚度9~12μm的壓延銅箔。若壓延銅箔比18μm為更厚時,則不易獲得在曲率半徑為2mm以下之高變形領域具有優異疲勞特性的可撓性電路基板。此外,若厚度比5μm為更薄時,使金屬箔與樹脂層相層積後的處理較為困難,而難以形成均質的可撓性電路基板。Further, in the present invention, in particular, when high flexibility is required, the metal foil forming the flexible circuit board may be a rolled copper foil having a thickness of 5 to 18 μm, and a rolled copper foil having a thickness of 9 to 12 μm is preferably used. When the rolled copper foil is thicker than 18 μm, it is difficult to obtain a flexible circuit board having excellent fatigue characteristics in a high deformation range having a curvature radius of 2 mm or less. Further, when the thickness is thinner than 5 μm, it is difficult to laminate the metal foil and the resin layer, and it is difficult to form a homogeneous flexible circuit board.

有別於使以上所述之可撓性電路基板之疲勞特性提升的第一方策,在本發明中,以用以提升接近於高度配向的單結晶的面心立方金屬箔的斷裂伸長的第二方策而言,以斷裂伸長較小的<100>方向不會成為主應力方向的方式,有將可撓性電路基板的配線構成加以設計的情形,具體而言列舉下列方法。Different from the first method for improving the fatigue characteristics of the flexible circuit substrate described above, in the present invention, the second elongation at break of the face-centered cubic metal foil for improving the single crystal close to the height alignment In the case of the square policy, the <100> direction in which the elongation at break is small does not become the principal stress direction, and the wiring structure of the flexible circuit board is designed. Specifically, the following methods are listed.

如第一方策中所述,藉由設計壓延及再結晶條件,可製造具有壓延方向與箔面法線方向均具有<100>主方位的高度配向的立方體集合組織的金屬箔。此外,以配線而言,將電路切開的方向從壓延方向、亦即<100>方向以預定角度偏移而斜向抽出電路,藉此可得使其彎曲時在主應力方向,斷裂伸長較大的可撓性電路基板。藉由如上所示之方法,為了使相對由彎曲部中的稜線朝金屬箔的厚度方向切開的配線的剖面P的法線方向(彎曲部中的主應力方向)的金屬箔的斷裂伸長成為3.5%以上,必須使上述剖面P以[001]為晶帶軸而在(20 1 0)至(1 20 0)的範圍內所包含的任何面呈現主方位。在此,將晶帶軸與面方位的關係顯示於第1圖。(20 1 0)與(1 20 0)係處於將[001]作為共通軸、亦即晶帶軸的關係,位於以[001]為軸之由(100)至(110)[由(100)至(010)]的旋轉面內。亦即,若將其顯示於相對剖面P的法線方位的逆極點圖上時,(001)、(20 1 0)、(110)的各面係如第2圖所示。基於對稱性,在逆極點圖上,(1 20 0)係被表示在與(20 1 0)相同的位置。本發明中的金屬箔的金屬為面心立方構造。其單位晶格的結晶軸為[100]、[010]、[001],但在本發明中,若在金屬箔的厚度方向(相對金屬箔表面呈垂直方向)具有<100>優先方位時,將該軸標記為[001],亦即將箔面方位標記為(001),但是即使基於面心立方構造的對稱性而將該等軸作更換亦為等效,當然該等係被包含在本發明中。As described in the first aspect, by designing the rolling and recrystallization conditions, it is possible to produce a metal foil having a highly aligned cubic aggregate structure having a <100> main orientation in both the rolling direction and the normal direction of the foil surface. Further, in terms of wiring, the direction in which the circuit is cut is shifted from the rolling direction, that is, the <100> direction by a predetermined angle, and the circuit is obliquely drawn, whereby the bending elongation is large in the direction of the principal stress. Flexible circuit board. By the method as described above, the elongation at break of the metal foil in the normal direction (the principal stress direction in the curved portion) of the cross section P of the wiring which is cut in the thickness direction of the metal foil by the ridge line in the curved portion is 3.5. Above %, the above-mentioned section P must have a principal orientation in any plane included in the range of (20 1 0) to (1 20 0) with [001] as the ribbon axis. Here, the relationship between the ribbon axis and the plane orientation is shown in Fig. 1. (20 1 0) and (1 20 0) are in the relationship of [001] as the common axis, that is, the ribbon axis, and are located at (001) as the axis (100) to (110) [by (100) To the rotation surface of (010)]. That is, when it is displayed on the inverse pole map of the normal direction of the cross section P, the faces of (001), (20 1 0), and (110) are as shown in Fig. 2 . Based on the symmetry, on the inverse pole map, (1 20 0) is represented at the same position as (20 1 0). The metal of the metal foil in the present invention has a face-centered cubic structure. The crystal axis of the unit cell is [100], [010], [001], but in the present invention, if there is a <100> preferential orientation in the thickness direction of the metal foil (vertical direction with respect to the surface of the metal foil), Marking the axis as [001], that is, marking the orientation of the foil surface as (001), but even if the axis is replaced based on the symmetry of the face-centered cubic structure, it is equivalent to In the invention.

接著,箔面內的主方位必須相對彎曲部的主變形方向、亦即由彎曲部中的稜線朝厚度方向切開時的配線的剖面法線方向(對於相對配線剖面P的垂線)具有2.9°~87.1°[(20 1 0)~(1 20 0)]的角度,較佳為5.7°~84.3°[(10 1 0)~(1 10 0)]的角度,更佳為為11.4°~78.6°[(510)~(150)]的角度,另外更佳為26.6°~63.4°[(210)~(120)]的角度,最為適合係以30°或60°[(40 23 0)或(23 40 0)]為宜。在此,[ ]內係表示與各自的角度相對應的剖面P的面方位。其中,由結晶的對稱性,亦可記述為相對配線剖面P的法線具有與金屬箔面內的基本結晶軸<100>呈2.9~45°的角度。Then, the main direction in the foil surface must be 2.9° to the main direction of the bending portion, that is, the normal direction of the cross section of the wiring when the ridge line in the curved portion is cut in the thickness direction (for the perpendicular line to the wiring cross section P). The angle of 87.1 ° [(20 1 0) to (1 20 0)] is preferably an angle of 5.7 ° to 84.3 ° [(10 1 0) to (1 10 0)], more preferably 11.4 ° to 78.6. The angle of °[(510) to (150)], and more preferably the angle of 26.6° to 63.4° [(210) to (120)], is most suitable for 30° or 60° [(40 23 0) or (23 40 0)] is appropriate. Here, the inside of [ ] indicates the plane orientation of the section P corresponding to the respective angles. However, the symmetry of the crystal may be described as having a normal line with respect to the wiring cross section P at an angle of 2.9 to 45° with respect to the basic crystal axis <100> in the plane of the metal foil.

在此,由彎曲部中的稜線朝厚度方向切開時的配線的剖面P係指例如第3圖所示,若使可撓性電路基板彎曲成U字狀時,在其外側形成有稜線L,由該稜線L朝可撓性電路基板的厚度方向d切開時所得的剖面之中的配線部分者。此外,稜線L係指在使可撓性電路基板彎曲的狀態下,將沿著其折曲方向(第3圖中的粗黑箭號)觀看可撓性電路基板的剖面時所形成的頂點相連結的線。其中,例如後述的滑動彎曲等稜線L在可撓性電路基板移動般的情形亦包含在內。此外,在第3圖中,係表示樹脂層1為外側、配線2朝內側彎曲的狀態(將具有曲率半徑的圓所內接之側設為內側),但是亦可為配線2在外側的折曲方式自不待言。Here, the cross section P of the wiring when the ridge line in the curved portion is cut in the thickness direction is, for example, shown in FIG. 3, and when the flexible circuit board is bent into a U shape, a ridge line L is formed on the outer side thereof. The wiring portion among the cross sections obtained when the ridgeline L is cut toward the thickness direction d of the flexible circuit board. In addition, the ridge line L is a vertex phase formed when the flexible circuit board is bent, and the cross section of the flexible circuit board is viewed along the bending direction (the thick black arrow in FIG. 3). Linked line. Among them, for example, a case where the ridge line L such as a sliding curve to be described later moves on the flexible circuit board is also included. In addition, in the third figure, the resin layer 1 is outside and the wiring 2 is bent inward (the side in which the circle having the radius of curvature is inscribed is inside), but the wiring 2 may be folded outward. The way of music is self-evident.

在各種用途中,當受到某曲率的強制位移時,金屬箔係主要受到拉伸、或壓縮的應力。在受到彎曲的可撓性電路基板之中,哪一個部分會受到拉伸或壓縮雖亦依金屬箔與樹脂的構成而異,但是比拉伸與壓縮的中立軸(或中立面)更為彎曲的外側的最遠部分會因金屬破壞而過於苛刻乃為一般所見,朝向由彎曲部中的稜線朝厚度方向切開時的配線的剖面法線方向的拉伸應力會成為主應力。亦即,彎曲部中的配線的主應力方向係在第3圖中以箭號21所示方向,典型而言,與相對由彎曲部的稜線朝向金屬箔的厚度方向切開的配線剖面P的法線方向相等,與朝金屬箔的厚度方向配向的[001]軸垂直相交的方向。In various applications, the metal foil is primarily subjected to tensile or compressive stresses when subjected to a forced displacement of a certain curvature. Which part of the flexible circuit board subjected to bending is subjected to stretching or compression depending on the composition of the metal foil and the resin, but is more than the neutral axis (or neutral surface) of stretching and compression. The farthest portion of the curved outer side is too severe due to metal damage, and it is generally seen that the tensile stress in the normal direction of the cross section of the wiring when the ridge line in the curved portion is cut in the thickness direction becomes the principal stress. That is, the principal stress direction of the wiring in the bent portion is a direction indicated by an arrow 21 in FIG. 3, and typically a wiring cross section P which is cut toward the thickness direction of the metal foil with respect to the ridge line of the curved portion. The lines are in the same direction and intersect perpendicularly to the [001] axis aligned toward the thickness direction of the metal foil.

考慮到可撓性電路基板內的金屬箔的機械特性時,當朝向第3圖中的箭號21所示主應力方向將金屬箔單純拉伸時的應力變形特性即成為重要的特性。在此,如第4圖(c)及(d)之例所示,假設以形成有相對具有面心立方系的結晶構造的金屬箔的[100]軸呈正交的稜線的方式使其彎曲時,由在彎曲部的稜線朝向可撓性電路基板的厚度方向切開的配線的剖面係成為(100)面,但是由彎曲部中的稜線朝厚度方向切開時的配線的剖面P如第1圖所示,以[001]為晶帶軸而在由(100)至(010)的旋轉方向中的(20 1 0)至(1 20 0)的範圍(圖中的兩箭號)所包含的任何面呈現主方位,則可使斷裂伸長提升。其中,在第1圖中,係顯示(20 1 0)至(1 20 0)的範圍,但是存在有與在面心立方系的結晶構造中該範圍所包含的面為等效的面。因此,關於配線的剖面與(20 1 0)至(1 20 0)的範圍所包含的面為符號不同的等效的面,係包含在本發明中。In consideration of the mechanical properties of the metal foil in the flexible circuit board, the stress-deformation characteristic when the metal foil is simply stretched toward the principal stress direction indicated by the arrow 21 in Fig. 3 is an important characteristic. Here, as shown in the examples of (c) and (d) of FIG. 4, it is assumed that the [100] axis of the metal foil having a crystal structure having a face-centered cubic structure is curved so as to be orthogonal to the ridge line. In the case where the cross section of the wiring which is cut in the thickness direction of the flexible circuit board in the ridge line of the curved portion is the (100) plane, the cross section P of the wiring when the ridge line in the curved portion is cut in the thickness direction is as shown in FIG. 1 . As shown, [001] is the band axis and the range of (20 1 0) to (1 20 0) in the direction of rotation from (100) to (010) (the two arrows in the figure) is included. If any face exhibits a main orientation, the elongation at break can be increased. In the first graph, the range of (20 1 0) to (1 20 0) is shown, but there is a surface equivalent to the surface included in the range in the face-centered cubic crystal structure. Therefore, the equivalent faces of the cross section of the wiring and the range of (20 1 0) to (1 20 0) are different from each other, and are included in the present invention.

在第二方策中,由彎曲部中的稜線朝厚度方向切開時的配線的剖面P在(20 1 0)至(1 20 0)之間的特定方位具有主方位而作優先配向,由此斷裂伸長提升的理由係當對剖面P的法線方向、亦即主應力方向施加拉伸應力時,在具有面心立方構造的金屬中,在屬於滑移面的8個{111}之中,亦由於施密德因子為最大的主滑移面成為4面,因此剪斷滑動變得良好,而不易發生局部加工硬化之故。在一般的壓延銅箔中,通常金屬箔的長邊方向相當於壓延方向,如第4圖(c)或(d)所示,沿著其主方位<100>形成電路。例如,專利文獻5的實施例係相當於第4圖(d)的形態。如上所示,若將由彎曲部中的稜線朝厚度方向切開時的配線的剖面方位設為(100)時,在使其彎曲時,8個滑移面的施密德因子成為等效而使8個滑移系統同時作用,局部性容易蓄積位錯。依與如上所示之習知技術的差異,採用第二方策的可撓性電路基板的耐彎曲特性與在電路的長邊方向折曲的一般利用形態相比為較為優異。In the second aspect, the cross section P of the wiring when the ridge line in the curved portion is cut in the thickness direction has a main orientation in a specific orientation between (20 1 0) and (1 20 0), and is preferentially aligned, thereby being broken. The reason for the elongation rise is that when a tensile stress is applied to the normal direction of the section P, that is, the principal stress direction, among the metals having the face-centered cubic structure, among the eight {111} belonging to the slip surface, Since the Schmid factor has the largest main slip surface as 4 faces, the shear slip becomes good and local work hardening does not occur easily. In a general rolled copper foil, generally, the longitudinal direction of the metal foil corresponds to the rolling direction, and as shown in Fig. 4 (c) or (d), an electric circuit is formed along its main orientation <100>. For example, the embodiment of Patent Document 5 corresponds to the form of Fig. 4(d). As described above, when the cross-sectional orientation of the wiring when the ridge line in the curved portion is cut in the thickness direction is (100), when the bending is performed, the Schmid factor of the eight slip surfaces becomes equivalent. The slip system acts at the same time, and the locality is easy to accumulate dislocations. According to the difference from the conventional technique shown above, the bending resistance of the flexible circuit board using the second method is superior to the general use form in which the longitudinal direction of the circuit is bent.

關於可撓性電路基板中的剖面P,最為理想的方位係相對彎曲部的主變形方向、亦即由彎曲部中的稜線朝厚度方向切開時的配線的剖面法線方向為30°或60°,但是此係為了使應力方向與拉伸的安定方位相一致之故。當考慮到以上機構時,若至少由彎曲部中的稜線朝厚度方向切開時的配線的剖面P以[001]為晶帶軸,在(20 1 0)至(1 20 0)之間的特定方位具有主方位而具有優先配向即可。The most preferable orientation of the cross section P in the flexible circuit board is 30° or 60° with respect to the main deformation direction of the curved portion, that is, the cross-sectional normal direction of the wiring when the ridge line in the curved portion is cut in the thickness direction. However, this is to make the direction of stress coincide with the stable orientation of the stretch. When the above mechanism is considered, if the cross section P of the wiring at least when the ridge line in the curved portion is cut in the thickness direction is [001] as the ribbon axis, the specificity between (20 1 0) and (1 20 0) The orientation has a main orientation and has a priority alignment.

亦即,本發明中的第二方策係金屬箔具有面心立方構造,金屬箔的厚度方向具有<100>的主方位,並且金屬箔的箔面內具有<100>的主方位,而且具備有由彎曲部中的稜線朝厚度方向切開時的配線的剖面P的法線方向在(20 1 0)至(1 20 0)之間的特定方位具有主方位而作優先配向之類的配線。此時,剖面P的法線方向係較佳為在(10 1 0)至(1 10 0)之間的特定方位具有主方位而作優先配向,更佳為在(510)至(110)之間的特定方位具有主方位而作優先配向,更佳為在(210)至(110)之間的特定方位具有主方位而作優先配向,最為適合的係在(40 23 0)附近具有中心方位而作優先配向。若為箔面以(001)為主方位而作優先配向的金屬箔時,例如箔面內的[001]與[100]為等效,本發明中的可撓性電路基板的由彎曲部中的稜線朝厚度方向切開時的配線的剖面P的主方位亦可記述為(1 20 0)至(110)之間的特定方位,較佳為在(120)至(110)之間的特定方位具有主方位而作優先配向,最為適合的是亦可記述為在(23 40 0)附近具有主方位而作優先配向。That is, the second-party metal foil of the present invention has a face-centered cubic structure, the thickness direction of the metal foil has a main orientation of <100>, and the foil surface of the metal foil has a main orientation of <100>, and is provided with The normal direction of the cross section P of the wiring when the ridge line in the curved portion is cut in the thickness direction has a main orientation in a specific orientation between (20 1 0) and (1 20 0), and is preferentially aligned. At this time, the normal direction of the cross section P preferably has a main orientation in a specific orientation between (10 1 0) and (1 10 0) for preferential alignment, and more preferably (510) to (110). The specific orientation between the specific orientations has a principal orientation and is preferentially aligned. More preferably, the specific orientation between the (210) and (110) has a principal orientation for preferential alignment. The most suitable system has a central orientation near (40 23 0). For priority alignment. In the case of a metal foil in which the foil surface is preferentially oriented with (001) as the main orientation, for example, [001] and [100] in the foil surface are equivalent, and the flexible circuit board of the present invention is in the bent portion. The main orientation of the cross section P of the wiring when the ridge line is cut in the thickness direction may also be described as a specific orientation between (1 20 0) and (110), preferably at a specific orientation between (120) and (110). It has a main orientation and is preferentially aligned. It is most suitable to describe that it has a main orientation in the vicinity of (23 40 0) and is preferentially aligned.

此外,金屬箔的厚度方向具有<100>的主方位,並且金屬箔的箔面內具有<100>的主方位,而且由彎曲部中的稜線朝厚度方向切開時的配線的剖面P在(20 1 0)至(1 20 0)之間的特定方位具有主方位,亦可謂為在第2圖所示之(100)標準投影圖的立體三角形(stereo triangle )上作逆極點表示時,由彎曲部中的稜線朝厚度方向切開時的配線的剖面方位為位於以表示(20 1 0)的點與表示(110)的點所連結的線段上的任何面。此外,第二方策中的可撓性電路基板係由金屬箔的厚度方向為[001]軸之3(2)軸配向的材料形成配線,亦可謂為由彎曲部中的稜線朝厚度方向切開時的配線的剖面法線在與箔面內的[100]軸之間具有2.9°至87.1°的範圍的角度者。Further, the thickness direction of the metal foil has a main orientation of <100>, and the metal foil has a main orientation of <100> in the foil surface, and the cross section P of the wiring when the ridge line in the curved portion is cut in the thickness direction is (20) The specific orientation between 1 0) and (1 20 0) has a principal orientation, which can also be said to be an inverse pole representation on the stereo triangle of the (100) standard projection map shown in FIG. The cross-sectional direction of the wiring when the ridge line in the portion is cut in the thickness direction is any surface on the line segment connecting the point indicating (20 1 0) and the point indicating (110). Further, in the flexible circuit board according to the second aspect, the wiring is formed of a material in which the thickness direction of the metal foil is 3 (2) axis of the [001] axis, and it may be said that when the ridge line in the curved portion is cut in the thickness direction The profile normal of the wiring has an angle ranging from 2.9 to 87.1 between the [100] axis in the foil face.

接著,藉由如上所示之第二方策,可得可將彎曲部中的主應力方向的金屬箔的斷裂伸長形成為3.5%以上,不易發生曲率半徑為2mm以下之類的反覆變形、或即使對應力亦不易發生金屬疲勞,且彎曲性高的可撓性電路基板。此外,在本發明中,藉由將上述第一方策與該第二方策加以組合,可更為確實獲得金屬疲勞特性及彎曲性佳的可撓性電路基板,主應力方向的金屬箔的斷裂伸長可形成為3.5%以上、較佳為4%以上、更佳為9%以上。其中,關於斷裂伸長的上限,以面心立方構造的單位晶格的基本結晶軸<100>,相對金屬箔的厚度方向(箔面法線方向)與存在於箔面內的某一方向(其一為壓延方向)的2個正交軸,分別方位差10°以內的優先配向領域以面積率計為50%,而且厚度為18μm之在本發明之範圍內可取得的壓延箔的上限而言,可規定為20%以下,但是若採取銅的單位晶格的基本結晶軸<100>,相對銅箔的厚度方向與存在於箔面內的某一方向的2個正交軸,分別方位差10°以內的優先配向領域以面積率計佔有95%以上、而且厚度為12μm以下之更佳形態時,斷裂伸長的上限為15%以下。Then, by the second method as described above, it is possible to form the elongation at break of the metal foil in the direction of the principal stress in the curved portion to 3.5% or more, and it is less likely to cause a reverse deformation such as a curvature radius of 2 mm or less, or even A flexible circuit board which is less prone to metal fatigue and has high flexibility. Further, in the present invention, by combining the first method and the second method, it is possible to more reliably obtain a flexible circuit board having excellent metal fatigue characteristics and flexibility, and elongation at break of the metal foil in the main stress direction. It can be formed to be 3.5% or more, preferably 4% or more, and more preferably 9% or more. Wherein, the upper limit of the elongation at break, the basic crystal axis of the unit cell of the face-centered cubic structure <100>, the thickness direction of the metal foil (the normal direction of the foil surface) and a direction existing in the foil surface (its The two orthogonal axes of the rolling direction, the preferential alignment field within 10° of the azimuth difference is 50% by area ratio, and the thickness of 18 μm is the upper limit of the rolled foil which can be obtained within the scope of the present invention. It can be specified to be 20% or less, but if the basic crystal axis of the unit crystal lattice of copper is <100>, the orientation direction difference with respect to the thickness direction of the copper foil and the two orthogonal axes existing in a certain direction in the foil surface When the preferential alignment field within 10° accounts for 95% or more of the area ratio and the thickness is 12 μm or less, the upper limit of the elongation at break is 15% or less.

關於本發明中的可撓性電路基板的樹脂層,形成樹脂層的樹脂種類並未特別限制,可列舉在一般的可撓性電路基板中加以使用者,可例示例如聚醯亞胺、聚醯胺、聚酯、液晶聚合物、聚苯硫醚、聚醚醚酮等。其中由於亦在作為電路基板時呈現良好的可撓性,而且耐熱性亦佳,因此以聚醯亞胺或液晶聚合物較為適合。In the resin layer of the flexible circuit board of the present invention, the type of the resin forming the resin layer is not particularly limited, and it can be exemplified by a user in a general flexible circuit board, and examples thereof include polyimine and polyfluorene. Amine, polyester, liquid crystal polymer, polyphenylene sulfide, polyether ether ketone, and the like. Among them, since it exhibits good flexibility as a circuit board and also has excellent heat resistance, it is preferably a polyimine or a liquid crystal polymer.

樹脂層的厚度係可按照可撓性電路基板的用途、形狀等來適當設定,但是由可撓性的觀點來看,以5~75μm的範圍為佳,以9~50μm的範圍為較佳,以10~30μm的範圍為最佳。若樹脂層的厚度未達5μm,有絕緣可靠性降低之虞,相反地,若超過75μm,當裝載在小型機器等時,會有電路基板全體的厚度變得過厚之虞,亦會發生彎曲性降低。The thickness of the resin layer can be appropriately set in accordance with the use, shape, and the like of the flexible circuit board. However, from the viewpoint of flexibility, it is preferably in the range of 5 to 75 μm, and preferably in the range of 9 to 50 μm. The range of 10 to 30 μm is optimal. When the thickness of the resin layer is less than 5 μm, the insulation reliability is lowered. On the other hand, when it is more than 75 μm, the thickness of the entire circuit board may become too thick when it is mounted on a small machine or the like, and bending may occur. Reduced sex.

此外,當將可撓性電路基板適用在行動電話的滑移滑動部等時,係有在由金屬箔所形成的配線上貼合由覆蓋膜(coverlay film)等所構成的覆蓋材來加以使用的情形,惟在該情形下,考慮施加於配線的應力的平衡來設計覆蓋材與樹脂層的構成為佳。根據本發明人等的知見,列舉有:將例如25℃下的拉伸彈性率為4~6GPa,並且厚度為14~17μm的範圍的聚醯亞胺作為樹脂層,具有由厚度8~17μm的熱硬化性樹脂所構成的接著層、與厚度7~13μm的聚醯亞胺層等2層,而且將接著層與聚醯亞胺層全體的拉伸彈性率為2~4GPa的覆蓋膜作為覆蓋材的構成例、或者將25℃下的拉伸彈性率為6~8GPa,並且厚度為12~15μm的範圍的聚醯亞胺作為樹脂層,具有由厚度8~17μm的熱硬化性樹脂所構成的接著層與厚度7~13μm的聚醯亞胺層等2層,而且,以接著層與聚醯亞胺層全體的拉伸彈性率為2~4GPa的覆蓋膜作為覆蓋材的構成例等。In addition, when the flexible circuit board is applied to a sliding sliding portion of a mobile phone or the like, a cover member made of a cover film or the like is bonded to a wiring formed of a metal foil. In this case, in this case, it is preferable to design the cover material and the resin layer in consideration of the balance of the stress applied to the wiring. According to the knowledge of the inventors of the present invention, for example, a polyimide having a tensile modulus of 4 to 6 GPa at 25 ° C and a thickness of 14 to 17 μm is used as the resin layer, and has a thickness of 8 to 17 μm. Two layers of an adhesive layer made of a thermosetting resin and a polyimide layer having a thickness of 7 to 13 μm, and a cover film having a tensile modulus of 2 to 4 GPa of the entire adhesive layer and the polyimide layer as a cover. The composition of the material, or a polyimide having a tensile modulus of 6 to 8 GPa at 25 ° C and a thickness of 12 to 15 μm as a resin layer, and having a thermosetting resin having a thickness of 8 to 17 μm A cover film having a thickness of 7 to 13 μm and a polyimide film having a thickness of 7 to 13 μm is used as a coating material having a tensile modulus of 2 to 4 GPa in the entire layer of the adhesive layer and the polyimide layer.

關於使樹脂層與金屬箔相層積的手段,若例如樹脂層由聚醯亞胺所構成時,可在聚醯亞胺薄膜塗佈或介在熱塑性的聚醯亞胺而將金屬箔作熱疊合(所謂疊合法)。以在疊合法中所使用的聚醯亞胺薄膜而言,可例示例如“Kapton”(東麗杜邦股份有限公司)、“Apical”(鐘淵化學工業股份有限公司)、“Upilex”(宇部興產股份有限公司)等。當將聚醯亞胺薄膜與金屬箔進行加熱壓接時,使示出熱塑性的熱塑性聚醯亞胺樹脂介在其中即可。此外,由易於控制樹脂層的厚度或折曲特性等的觀點來看,亦可在金屬箔塗佈聚醯亞胺前驅物溶液(亦稱為聚醯胺酸溶液)後,使其乾燥、硬化而得層積體(所謂鑄型法)。Regarding the means for laminating the resin layer and the metal foil, for example, when the resin layer is composed of polyimide, the metal foil can be laminated on the polyimide film or the thermoplastic polyimide. Combination (so-called stacking). For the polyimide film to be used in the stacking method, for example, "Kapton" (Toray DuPont Co., Ltd.), "Apical" (Zhongyuan Chemical Industry Co., Ltd.), "Upilex" (Ubehing) Production Co., Ltd.) and so on. When the polyimide film and the metal foil are subjected to heat and pressure bonding, a thermoplastic thermoplastic polyimide resin showing thermoplasticity may be incorporated therein. Further, from the viewpoint of easy control of the thickness of the resin layer, the bending property, and the like, the metal foil may be coated with a polyimide film solution (also referred to as a polyamic acid solution) to be dried and hardened. And the layered body (so-called casting method).

樹脂層可使複數樹脂層積而形成,亦可使例如線膨脹係數等不同的2種以上的聚醯亞胺相層積,但是此時由擔保耐熱性或彎曲性的觀點來看,較佳為無須使用環氧樹脂等來作為接著劑,樹脂層的全部實質上由聚醯亞胺所形成為宜。包括由單獨的聚醯亞胺所構成的情形及由複數聚醯亞胺所構成的情形,樹脂層的拉伸彈性率係以成為4~10GPa為佳,較佳為成為5~8GPa。The resin layer may be formed by laminating a plurality of resins, or may be formed by laminating two or more kinds of polyimine layers having different linear expansion coefficients, etc., but it is preferably from the viewpoint of ensuring heat resistance or flexibility at this time. In order to prevent the epoxy resin or the like from being used as an adhesive, it is preferable that all of the resin layers are substantially formed of polyimide. In the case of a case of a single polyimine and a case of a plurality of polyimine, the tensile modulus of the resin layer is preferably 4 to 10 GPa, more preferably 5 to 8 GPa.

在本發明之可撓性電路基板中,以樹脂層的線膨脹係數為10~30ppm/℃的範圍為佳。若樹脂層由複數樹脂所構成時,若樹脂層全體的線膨脹係數在該範圍內即可。為了滿足如上所示之條件,係由例如線膨脹係數為25ppm/℃以下、較佳為5~20ppm/℃的低線膨脹性聚醯亞胺層、及線膨脹係數為26ppm/℃以上、較佳為30~80ppm/℃的高線膨脹性聚醯亞胺層所構成的樹脂層,藉由調整該等的厚度比,可形成為10~30ppm/℃者。較佳的低線膨脹性聚醯亞胺層與高線膨脹性聚醯亞胺層的厚度的比係70:30~95:5的範圍。此外,低線膨脹性聚醯亞胺層係成為樹脂層的主要樹脂層,高線膨脹性聚醯亞胺層係以與金屬箔相接而設為佳。其中,線膨脹係數係將醯亞胺化反應已充分結束的聚醯亞胺作為試料,使用熱機械性分析儀(TMA)而升溫至250℃後,以10℃/分鐘的速度冷卻,可由240~100℃的範圍中的平均的線膨脹係數求出。In the flexible circuit board of the present invention, the linear expansion coefficient of the resin layer is preferably in the range of 10 to 30 ppm/°C. When the resin layer is composed of a plurality of resins, the coefficient of linear expansion of the entire resin layer may be within this range. In order to satisfy the conditions as described above, for example, a low-expandable polyimine layer having a linear expansion coefficient of 25 ppm/° C. or less, preferably 5 to 20 ppm/° C., and a coefficient of linear expansion of 26 ppm/° C. or more are used. The resin layer composed of a highly linear expandable polyimide layer of preferably 30 to 80 ppm/° C. can be formed to have a thickness ratio of 10 to 30 ppm/° C. by adjusting the thickness ratio. The ratio of the thickness of the preferred low linear expansion polyimide layer to the high linear expansion polyimide layer is in the range of 70:30 to 95:5. Further, the low-expansion polyimine layer is a main resin layer of the resin layer, and the high-expansion polyimine layer is preferably formed in contact with the metal foil. Among them, the coefficient of linear expansion is a sample obtained by using a polyamidimide in which the ruthenium imidization reaction is sufficiently completed, and is heated to 250 ° C using a thermomechanical analyzer (TMA), and then cooled at a rate of 10 ° C / minute. The average linear expansion coefficient in the range of -100 ° C was obtained.

此外,本發明中的可撓性電路基板係具備有:樹脂層、及由金屬箔所形成的配線,在任一者具有彎曲部來加以使用者。亦即,以硬碟內的可動部、行動電話的鉸鏈部或滑移滑動部、印表機的列印頭部、光拾波器部、筆記型PC的可動部等為首,在各種電子電氣機器等被廣泛使用,電路基板本身被折曲、扭彎、或按照所裝載的機器的動作而變形,在任意者形成有彎曲部者。尤其,本發明之可撓性電路基板由於具有彎曲耐久性佳的彎曲部構造,因此適於伴隨著滑動彎曲、折曲彎曲、鉸鏈彎曲、滑移彎曲等反覆動作而頻繁折曲的情形、或為了與所裝載的機器的小型化相對應,曲率半徑以折曲舉動為0.38~2.0mm,以滑動彎曲為1.25~2.0mm,以鉸鏈彎曲為3.0~5.0mm,以滑移彎曲為0.3~2.0mm之類的嚴謹使用條件的情形,在以0.3~1mm的狹窄間隙,彎曲性能的要求嚴謹的滑移用途中尤其發揮效果。Further, the flexible circuit board of the present invention includes a resin layer and a wiring formed of a metal foil, and has a bent portion for any user. In other words, the movable part in the hard disk, the hinge part or the sliding sliding part of the mobile phone, the printing head of the printer, the optical pickup part, the movable part of the notebook PC, etc. A machine or the like is widely used, and the circuit board itself is bent, twisted, or deformed in accordance with the operation of the loaded machine, and a bent portion is formed in any of them. In particular, since the flexible circuit board of the present invention has a curved portion structure excellent in bending durability, it is suitable for frequent bending with repeated operations such as sliding bending, bending bending, hinge bending, and slip bending, or Corresponding to the miniaturization of the loaded machine, the radius of curvature is 0.38 to 2.0 mm for the bending behavior, 1.25 to 2.0 mm for the sliding bending, 3.0 to 5.0 mm for the hinge bending, and 0.3 to 2.0 for the sliding bending. In the case of strict use conditions such as mm, it is particularly effective in sliding applications with a narrow gap of 0.3 to 1 mm and a strict bending performance.

關於本發明中的可撓性電路基板之製造方法,以其一而言,i)獲得呈現[001]軸最終朝箔面法線(相對金屬箔表面的垂線)配向的立方體集合組織的壓延金屬箔與樹脂層在金屬箔的箔面相貼合的複合體,以將設計上的彎曲的主應力方向、亦即由彎曲部中的稜線朝厚度方向切開時的配線的剖面法線方向,相對金屬箔面內的[100]主方位具有2.9°~87.1°的角度而形成有彎曲部的稜線的方式進行配線、或ii)將構成配線的金屬箔形成為純度99.999%以上、或iii)同時採用該等i)與ii)的方法即可。Regarding the manufacturing method of the flexible circuit substrate in the present invention, i) obtains a rolled metal which exhibits a cubic aggregate structure in which the [001] axis is finally aligned toward the foil surface normal (the perpendicular to the surface of the metal foil). The composite in which the foil and the resin layer are bonded to the foil surface of the metal foil, the metal is oriented in the direction of the principal stress of the design, that is, the normal direction of the cross section of the wiring when the ridge line in the curved portion is cut in the thickness direction, and the metal The [100] main orientation in the foil surface has an angle of 2.9° to 87.1°, and the ridge line of the curved portion is formed to be wired, or ii) the metal foil constituting the wiring is formed to have a purity of 99.999% or more, or iii) The methods of i) and ii) are sufficient.

此時,金屬箔並不一定必須由開始即呈現立方體集合組織,亦可藉由熱處理來形成立方體集合組織,例如在可撓性電路基板的製造過程、具體而言為在樹脂層的形成過程中進行熱處理,而形成立方體集合組織。亦即,藉由進行熱處理,以由<100>軸在方位差10°以內的領域佔有面積比50%以上的方式,使單位晶格的基本結晶軸<100>之其一朝金屬箔的厚度方向作優先配向,並且以由<100>軸在方位差10°以內的領域佔有面積比50%以上的方式,使基本結晶軸<100>的另外其一相對金屬箔的表面朝水平方向作優先配向即可。壓延銅箔的再結晶集合組織係一般壓延面方位為{100},壓延方向為<100>。因此,以壓延面方位而言,形成有(001)主方位。此外,若使用純度99.999%以上的金屬箔時,即使在任何方位形成電路而作配線,斷裂伸長均可確保3.5%以上,可形成設計上的適用範圍較大的可撓性電路基板。At this time, the metal foil does not necessarily have to present the cubic aggregate structure from the beginning, and the cubic aggregate structure can also be formed by heat treatment, for example, in the manufacturing process of the flexible circuit substrate, specifically, in the formation of the resin layer. Heat treatment is performed to form a cube assembly. That is, by performing heat treatment, the basic crystal axis of the unit cell is <100> toward the thickness of the metal foil in such a manner that the area of the <100> axis within 10° of the azimuth difference is occupied by 50% or more. The direction is preferentially aligned, and the surface of the basic crystal axis <100> is preferentially oriented horizontally with respect to the surface of the metal foil having an area ratio of less than 10% by the <100> axis. Can be aligned. The recrystallized aggregate structure of the rolled copper foil has a general calender plane orientation of {100} and a calendering direction of <100>. Therefore, the (001) main orientation is formed in terms of the rolling surface orientation. In addition, when a metal foil having a purity of 99.999% or more is used, even if a circuit is formed and wired in any orientation, the elongation at break can be secured by 3.5% or more, and a flexible circuit board having a large design range can be formed.

關於採用第二方策的情形,更詳而言之,如第3圖所示,若使例如可撓性電路基板彎曲成U字狀時,在其外側(形成有具有曲率半徑的內接圓的相反側)形成有稜線L,但是該稜線L若由與形成配線的金屬箔的[100]軸呈正交的狀態在α=2.9~87.1(°)的範圍內具有傾斜即可。將如上所示之狀態之例顯示於第4圖的(a)及(b)。順帶一提,第4圖的(c)及(d)係相對[100]軸,稜線呈正交的狀態(α=0)。在此,若α未達2.9°,在彎曲性中未確認明確的效果。若為α=11.4~78.6(°),彎曲部構造的彎曲耐久性更進一步提升。其中,在本發明中,若為上述α=2.9°的情形,由稜線朝厚度d方向切開時的配線的剖面P係相當於(20 1 0)面,若為α=45的情形,剖面P相當於(110)面,若為α=87.1的情形,剖面P相當於(1 20 0)面。此外,在面心立方構造中,[100]與[010]為等效,因此第4圖(a)及(b)所示之[100]的箔面內正交軸與稜線所成角度α的角度範圍係與[100]與剖面P法線所成角度範圍、及[100]與稜線所成角度範圍相一致。In the case where the second method is used, more specifically, as shown in FIG. 3, when, for example, the flexible circuit board is bent into a U shape, the outer side thereof is formed (inscribed with an inscribed circle having a radius of curvature) The ridgeline L is formed on the opposite side. However, the ridgeline L may have a slope in a range of α=2.9 to 87.1 (°) in a state orthogonal to the [100] axis of the metal foil on which the wiring is formed. An example of the state shown above is shown in (a) and (b) of Fig. 4. Incidentally, (c) and (d) of Fig. 4 are in a state in which the ridge lines are orthogonal to each other with respect to the [100] axis (α = 0). Here, if α is less than 2.9°, a clear effect is not confirmed in the bendability. If α is 11.4 to 78.6 (°), the bending durability of the bent portion structure is further improved. In the present invention, in the case of the above α=2.9°, the cross section P of the wiring when the ridge line is cut in the thickness d direction corresponds to the (20 1 0) plane, and when α=45, the profile P Corresponding to the (110) plane, if α = 87.1, the profile P corresponds to the (1 20 0) plane. Further, in the face-centered cubic structure, [100] and [010] are equivalent, so the orthogonal axis of the foil in-plane of [100] shown in Fig. 4 (a) and (b) forms an angle α with the ridge line. The angular range is consistent with the angular extent of [100] and the normal of the section P, and the angular extent of [100] and the ridgeline.

此外,關於配線的寬幅、形狀、圖案等並未特別限制,可按照可撓性電路基板的用途、所裝載的電子機器等來適當設計即可,但是由於本發明之彎曲部構造的彎曲耐久性佳,因此即使為採用第二方策的情形下,亦不需要必須為了例如減小對配線之彎曲應力而相對鉸鏈部的旋動軸以斜向進行配線,而可進行沿著相對彎曲部中的稜線呈正交的方向的配線、亦即所需最小限度的最短距離下的配線。第4圖(a)及(b)係顯示例如行動電話的鉸鏈部等所使用的可撓性電路基板,具有樹脂層1、由金屬箔所形成的配線2、及連接器的端子3之例。第4圖(a)及(b)的任一者均在中央附近顯示彎曲部中的稜線L的位置,該稜線L係具有相對形成配線2的金屬箔的[100]軸方向為(90+α)°的角度。在此,第4圖(a)係在兩端的連接器端子3的途中、稜線L附近,以斜向形成有配線之例,但是亦可如第4圖(b)所示將連接器端子3間以最短距離進行配線。其中,如折疊式行動電話等般,除了彎曲部中的稜線L的位置被固定的情形以外,亦可為如滑移式行動電話等般彎曲部中的稜線L進行移動般的滑移滑動彎曲(第4圖(b)所記的粗線箭號方向)。其中,本發明中的可撓性電路基板係在樹脂層的至少單面具備有由金屬箔所構成的配線,但是亦可視需要在樹脂層的兩面具備金屬箔。Further, the width, shape, pattern, and the like of the wiring are not particularly limited, and may be appropriately designed according to the use of the flexible circuit board, the mounted electronic device, or the like, but the bending of the curved portion of the present invention is durable. Since it is excellent, even in the case where the second method is employed, it is not necessary to perform diagonal wiring with respect to the rotation axis of the hinge portion for the purpose of, for example, reducing the bending stress on the wiring, and it is possible to perform the diagonally along the opposite bending portion. The ridge lines are in the orthogonal direction of the wiring, that is, the wiring at the minimum required minimum distance. (a) and (b) of FIG. 4 show a flexible circuit board used for, for example, a hinge portion of a mobile phone, and a resin layer 1, a wiring 2 formed of a metal foil, and a terminal 3 of a connector. . In any of (a) and (b) of FIG. 4, the position of the ridge line L in the curved portion is displayed in the vicinity of the center, and the ridge line L has a [100] axis direction with respect to the metal foil forming the wiring 2 (90+). α) ° angle. Here, Fig. 4(a) shows an example in which wiring is formed obliquely in the middle of the connector terminals 3 at both ends and in the vicinity of the ridge line L, but the connector terminal 3 may be formed as shown in Fig. 4(b). Wiring is performed at the shortest distance. In addition, in the case where the position of the ridge line L in the curved portion is fixed as in the case of a folding mobile phone, the ridge line L in the curved portion such as a slide type mobile phone may be moved to slide and slide. (The bold arrow direction in Figure 4 (b)). In the flexible circuit board of the present invention, the wiring layer made of a metal foil is provided on at least one surface of the resin layer. However, if necessary, a metal foil may be provided on both surfaces of the resin layer.

如以上說明所示,在使可撓性電路基板彎曲時的彎曲部構成配線的金屬箔,即使在藉由構成作高度配向並且朝主應力及主變形方向的斷裂伸長為較大的金屬箔,來進行彎曲半徑較小的高彎曲的反覆彎曲時,亦因不易發生因結晶異方性而起的局部性應力集中,而且不易發生位錯集積等2個效果,可提供不易發生金屬疲勞,具有對應力及變形優異的耐久性,在可撓性電路基板的設計不會發生制約,且具備有即使對反覆折曲或曲率半徑較小的彎曲亦得以承受的強度,且彎曲性佳的可撓性電路基板。As described above, the metal foil which constitutes the wiring in the curved portion when the flexible circuit board is bent is a metal foil which is formed to have a high degree of alignment and is elongated in the principal stress and the main deformation direction. When a high-bending reverse bending having a small bending radius is performed, local stress concentration due to crystal anisotropy is less likely to occur, and two effects such as dislocation accumulation are less likely to occur, and metal fatigue is less likely to occur. Durability against stress and deformation is not restricted by the design of the flexible circuit board, and it has strength that can withstand bending even if it is repeatedly bent or has a small radius of curvature, and has excellent flexibility. Circuit board.

[實施例][Examples]

以下根據實施例及比較例,更加具體說明本發明。其中,在實施例等中所使用的銅箔的種類、及聚醯胺酸溶液的合成係如下所示。Hereinafter, the present invention will be more specifically described based on examples and comparative examples. The type of the copper foil used in the examples and the like and the synthesis of the polyaminic acid solution are as follows.

[銅箔A][copper foil A]

市售壓延銅箔、純度99.9%、厚度9μm。Commercially available rolled copper foil, purity 99.9%, thickness 9 μm.

[銅箔B][copper foil B]

市售電解銅箔、純度99.9%、厚度9μm。Commercially available electrolytic copper foil, purity 99.9%, thickness 9 μm.

[銅箔C][copper foil C]

無氧銅箔、純度99.99%、厚度9μm、製程條件A。Oxygen-free copper foil, purity 99.99%, thickness 9μm, process condition A.

不純物(mass ppm)氧:2、銀:18、磷:2.1、硫磺:4、鐵:1.5Mass ppm oxygen: 2, silver: 18, phosphorus: 2.1, sulfur: 4, iron: 1.5

[銅箔D][copper foil D]

精製銅箔、純度99.999%、厚度9μm、製程條件A。Refined copper foil, purity 99.999%, thickness 9μm, process condition A.

不純物(mass ppm)氧:2、銀:5、磷:0.01、硫磺:0.01、鐵0.002Mass ppm oxygen: 2, silver: 5, phosphorus: 0.01, sulfur: 0.01, iron 0.002

[銅箔E][copper foil E]

精製銅箔、純度99.9999%、厚度9μm、製程條件A。Refined copper foil, purity 99.9999%, thickness 9μm, process condition A.

不純物(mass ppm)氧:<1、銀:0.18、磷:<0.005、硫磺:<0.005、鐵:0.002Mass ppm oxygen: <1, silver: 0.18, phosphorus: <0.005, sulfur: <0.005, iron: 0.002

[銅箔F][copper foil F]

精製銅箔、純度99.9999%、厚度9μm、製程條件B。Refined copper foil, purity 99.9999%, thickness 9μm, process condition B.

不純物(mass ppm)氧:<1、銀:0.18、磷:<0.005、硫磺:<0.005、鐵:0.002Mass ppm oxygen: <1, silver: 0.18, phosphorus: <0.005, sulfur: <0.005, iron: 0.002

[銅箔G][copper foil G]

精製銅箔、純度99.9999%、厚度9μm、製程條件C。Refined copper foil, purity 99.9999%, thickness 9μm, process condition C.

不純物(mass ppm)氧:<1、銀:0.18、磷:<0.005、硫磺:<0.005、鐵:0.002Mass ppm oxygen: <1, silver: 0.18, phosphorus: <0.005, sulfur: <0.005, iron: 0.002

[銅箔H][copper foil H]

市售壓延銅箔、純度99.9%、厚度12μm。Commercially available rolled copper foil, purity 99.9%, thickness 12 μm.

[銅箔的製造方法][Manufacturing method of copper foil]

銅箔A與銅箔H為市售的壓延銅箔,銅箔B係以硫酸銅浴所製造出的市售的電解銅箔。該等均作為高彎曲用途品而被市售的銅箔,純度為99.9%,以市售品而言為較高者。銅箔C~銅箔G係由本發明人等所加工者,將預定純度的銅素材在石墨鑄型內鑄造凝固,進行壓延加工而形成為預定厚度者。鑄錠的厚度為10mm,以冷間壓延降低至1mm之後,針對銅箔C、銅箔D、及銅箔E,係在實施300℃、30分鐘的中間燒鈍之後,實施冷間壓延至9μm為止(製程條件A)。此外,銅箔F係未進行中間燒鈍而至9μm為止實施冷間壓延(製程條件B)者。此外,銅箔G係在800℃下進行中間燒鈍溫度,至9μm為止實施冷間壓延(製程條件C)。Copper foil A and copper foil H are commercially available rolled copper foils, and copper foil B is a commercially available electrolytic copper foil produced by a copper sulfate bath. These copper foils which are commercially available as high-bend products have a purity of 99.9%, which is higher in the case of commercial products. The copper foil C to the copper foil G are processed by the inventors of the present invention, and the copper material of a predetermined purity is cast and solidified in a graphite mold, and is subjected to calendering to form a predetermined thickness. The thickness of the ingot was 10 mm, and after rolling down to 1 mm by cold, the copper foil C, the copper foil D, and the copper foil E were calendered to 9 μm after being blunt at 300 ° C for 30 minutes. Until (process condition A). Further, the copper foil F was subjected to cold rolling (process condition B) until the middle was burned to 9 μm. Further, the copper foil G was subjected to inter-cooling at 800 ° C, and cold rolling was carried out until 9 μm (process condition C).

[聚醯胺酸溶液的合成][Synthesis of polyaminic acid solution]

(合成例1)(Synthesis Example 1)

在具備有熱電偶及攪拌機並且可導入氮的反應容器放入N,N-二甲基乙醯胺。在該反應容器,一面將2,2-雙[4-(4-氨基苯氧基)苯基]丙烷(BAPP)在容器中攪拌一面使其溶解。接著,添加苯均四酸二酐(PMDA)。以單體的投入總量為15wt%的方式進行投入。之後,持續攪拌3小時而得聚醯胺酸a的樹脂溶液。該聚醯胺酸a的樹脂溶液的溶液黏度為3,000cps。N,N-dimethylacetamide was placed in a reaction vessel equipped with a thermocouple and a stirrer and capable of introducing nitrogen. In the reaction vessel, 2,2-bis[4-(4-aminophenoxy)phenyl]propane (BAPP) was dissolved while being stirred in a vessel. Next, pyromellitic dianhydride (PMDA) was added. The input was carried out so that the total amount of the monomer input was 15% by weight. Thereafter, stirring was continued for 3 hours to obtain a resin solution of polyamic acid a. The resin solution of the polyamic acid a had a solution viscosity of 3,000 cps.

(合成例2)(Synthesis Example 2)

在具備有熱電偶及攪拌機並且可導入氮的反應容器放入N,N-二甲基乙醯胺。在該反應容器投入2,2’-二甲基-4,4’-二胺基聯苯(m-TB)。接著添加3,3',4,4'-聯苯四酸二酐(BPDA)及苯均四酸二酐(PMDA)。以單體的投入總量為15wt%、各酸酐的莫耳比率(BPDA:PMDA)為20:80的方式進行投入。之後,持續攪拌3小時而得聚醯胺酸b的樹脂溶液。該聚醯胺酸b的樹脂溶液的溶液黏度為20,000cps。N,N-dimethylacetamide was placed in a reaction vessel equipped with a thermocouple and a stirrer and capable of introducing nitrogen. 2,2'-Dimethyl-4,4'-diaminobiphenyl (m-TB) was introduced into the reaction vessel. Next, 3,3',4,4'-biphenyltetracarboxylic dianhydride (BPDA) and pyromellitic dianhydride (PMDA) were added. The total amount of the monomer input was 15% by weight, and the molar ratio (BPDA: PMDA) of each acid anhydride was 20:80. Thereafter, stirring was continued for 3 hours to obtain a resin solution of poly-proline b. The resin solution of the polyaminic acid b had a solution viscosity of 20,000 cps.

[實施例1][Example 1]

在銅箔A至銅箔G之7種銅箔塗佈上述所備妥的聚醯胺酸溶液a,使其乾燥(硬化後形成膜厚2μm的熱塑性聚醯亞胺),在其上塗佈聚醯胺酸b且使其乾燥(硬化後形成膜厚9μm的低熱熱膨脹性聚醯亞胺),另外在其上塗佈聚醯胺酸a且使其乾燥(硬化後形成膜厚2μm的熱塑性聚醯亞胺),經由300~360℃的溫度以積算時間計為負荷5分以上之類的加熱條件,而形成由3層構造所構成的聚醯亞胺層。接著,沿著銅箔的壓延方向(MD方向)長度250mm,以相對壓延方向呈正交的方向(TD方向)成為寬幅150mm之長方形尺寸的方式進行切出,如第5圖所示,取得具有厚度13μm的聚醯亞胺層(樹脂層)1與厚度9μm的銅箔2的單面覆銅層積板4。此時的樹脂層全體的拉伸彈性率為7.5GPa。The above-mentioned prepared polyamic acid solution a was applied to seven types of copper foils of copper foil A to copper foil G, and dried (cured to form a thermoplastic polyimide having a film thickness of 2 μm) and coated thereon. The polyaminic acid b is dried (cured to form a low thermal expansion polyimine having a film thickness of 9 μm), and the polyamic acid a is coated thereon and dried (hardened to form a thermoplastic having a film thickness of 2 μm) The polyimine layer is formed into a polyimine layer composed of a three-layer structure by heating at a temperature of 300 to 360 ° C for a load of 5 minutes or more. Next, the length of the copper foil in the rolling direction (MD direction) was 250 mm, and the direction in which the direction perpendicular to the rolling direction (the TD direction) was a rectangular shape having a width of 150 mm was cut out, as shown in FIG. A single-sided copper-clad laminate 4 having a polyimide layer (resin layer) 1 having a thickness of 13 μm and a copper foil 2 having a thickness of 9 μm. The tensile modulus of the entire resin layer at this time was 7.5 GPa.

關於上述所得之單面覆銅層積板4,對銅箔A至銅箔G之各個銅箔2的壓延面2a使用膠態矽石,在進行機械式、化學式研磨後,以EBSP裝置進行方位解析。所使用的裝置為日立製作所製的FE-SEM(S-4100)、TSL公司製的EBSP裝置、及軟體(OIM Analysis 5.2)。測定領域係約800μm×1600μm的領域,測定時加速電壓20kV、測定階段間隔4μm。配向性的評估係以相對箔的厚度方向、及箔的壓延方向為<100>在10°以內的測定點相對全體的測定點的比例表示。測定數係針對各品種個體不同的5個試料來實施,將百分率的小數點以下作四捨五入。此外,使用所得資料,將相鄰結晶粒的方位差為15°以上者作為結晶粒界來進行結晶粒徑的評估,關於多結晶體係求出平均粒徑。將結果顯示於表1。In the single-sided copper-clad laminate 4 obtained as described above, colloidal vermiculite is used for the rolling surface 2a of each of the copper foils A to the copper foils G, and after mechanical and chemical polishing, the orientation is performed by the EBSP apparatus. Analysis. The apparatus used was FE-SEM (S-4100) manufactured by Hitachi, Ltd., EBSP apparatus manufactured by TSL Corporation, and software (OIM Analysis 5.2). The measurement field is in the field of about 800 μm × 1600 μm, and the acceleration voltage is 20 kV and the measurement phase interval is 4 μm. The evaluation of the alignment is expressed by the ratio of the measurement direction of the thickness direction of the foil and the rolling direction of the foil of <100> within 10° to the total measurement point. The number of measurements was carried out for five different samples of each individual, and the percentage of the decimal point was rounded off. Further, using the obtained data, the crystal grain size was evaluated as a crystal grain boundary when the difference in orientation of adjacent crystal grains was 15 or more, and the average particle diameter was determined for the polycrystalline system. The results are shown in Table 1.

可知除了銅箔B以外的壓延銅箔均形成有立方體集合組織,銅箔面方位、壓延方向均具有{001}<100>的主方位。此係基於經壓延加工的銅箔因聚醯亞胺硬化時的熱而再結晶,而形成有再結晶集合組織之故。但是,其程度係依品種而異,相對銅箔A、C、D、及E的立方體方位的配向性極高。立方體方位的配向度,若為純度為99.9%以上的銅箔,並不依存於其純度,而對銅箔的加工方法的依存性較大。該等銅箔係在800×1600μm的視野中,視野全體以具有立方體方位之粒體所構成,形成為在其內部,方位不同的5μm以下的結晶粒分散為島狀的組織。島狀組織的面積率較小,為2%以下,因此具有立方體方位的再結晶粒係具有相同方位而一體化,再結晶粒的大小係在厚度方向與箔厚同為9μm,在箔面內為800μm以上。此外,具有銅箔F、銅箔G的立方體方位的再結晶粒的面積率不高,因此彼此獨立存在,箔面內的平均粒徑分別為25μm、20μm。另一方面,電解銅箔B係平均粒徑1μm的多結晶體,幾乎未發現配向性。It is understood that the rolled copper foil other than the copper foil B is formed with a cubic aggregate structure, and both the copper foil surface orientation and the rolling direction have a principal orientation of {001}<100>. This is based on the fact that the calendered copper foil is recrystallized by the heat of the polyimine hardening to form a recrystallized aggregate structure. However, the degree varies depending on the type, and the orientation of the cube orientation with respect to the copper foils A, C, D, and E is extremely high. The degree of orientation of the cube orientation is not dependent on the purity of the copper foil having a purity of 99.9% or more, and the dependence on the copper foil processing method is large. These copper foils are formed in a field of view of 800 × 1600 μm, and the entire field of view is composed of granules having a cubic orientation, and is formed into a structure in which crystal grains of 5 μm or less having different orientations are dispersed in an island shape. The area ratio of the island-shaped structure is small, and is 2% or less. Therefore, the recrystallized grains having the cube orientation have the same orientation and are integrated, and the size of the recrystallized grains is 9 μm in the thickness direction and the foil thickness, in the foil surface. It is 800 μm or more. Further, since the area ratio of the recrystallized grains having the cubic orientation of the copper foil F and the copper foil G is not high, they exist independently of each other, and the average particle diameter in the foil surface is 25 μm and 20 μm, respectively. On the other hand, the electrolytic copper foil B was a polycrystalline body having an average particle diameter of 1 μm, and almost no alignment property was observed.

接著,將預定的遮罩被覆在上述所得之單面覆銅層積板4的銅箔2側,使用氯化鐵/氯化銅系溶液進行蝕刻,如第6圖所示(其中,配線方向H與MD方向所成角度為0°),以線寬(1)為150μm的直線狀配線2的配線方向H(H方向)與MD方向(<100>軸)呈平行的方式,而且以空間寬幅(s)為250μm的方式形成配線圖案。接著,以兼作後述耐彎曲試驗用的取樣的方式,依據JIS 6471,獲得沿著電路基板的配線方向H在長邊方向具有150mm、在與配線方向H呈正交的方向具有寬幅15mm的試驗用可撓性電路基板5。Next, a predetermined mask is coated on the copper foil 2 side of the single-sided copper-clad laminate 4 obtained above, and is etched using a ferric chloride/copper chloride-based solution, as shown in Fig. 6 (wherein the wiring direction) The angle between H and the MD direction is 0°), and the wiring direction H (H direction) of the linear wiring 2 having a line width (1) of 150 μm is parallel to the MD direction (<100> axis), and the space is A wiring pattern was formed in such a manner that the wide (s) was 250 μm. Then, according to JIS 6471, a test having a width of 15 mm in the longitudinal direction and a direction perpendicular to the wiring direction H in the wiring direction H of the circuit board is obtained in accordance with JIS 6471. The flexible circuit board 5 is used.

使用上述所得之試驗用可撓性電路基板,依據JIS C5016進行MIT彎曲試驗。將試驗的模式圖顯示於第7圖。裝置係使用東洋精機製作所製(STROGRAPH-R1),將試驗用可撓性電路基板5的長邊方向的一端固定在彎曲試驗裝置的夾持夾具,以重物將另一端固定,以夾持部為中心,一面以振動速度150次/分鐘的條件左右交替旋轉各135±5度,一面以成為曲率半徑0.8mm的方式使其彎曲,求出電路基板5的配線2的導通被遮斷為止的次數作為彎曲次數。Using the test flexible circuit board obtained above, the MIT bending test was performed in accordance with JIS C5016. The mode diagram of the test is shown in Figure 7. The apparatus was manufactured by Toyo Seiki Seisakusho Co., Ltd. (STROGRAPH-R1), and one end of the test flexible circuit board 5 in the longitudinal direction was fixed to a holding jig of the bending test apparatus, and the other end was fixed by a weight to the holding part. In the case where the radiant speed is 150 times/min, the radians are rotated by 135±5 degrees, and the radius of curvature is 0.8 mm, and the conduction of the wiring 2 of the circuit board 5 is blocked. The number of times is the number of bends.

在該試驗條件中,以形成在彎曲部的稜線相對試驗用可撓性電路基板5的配線2的配線方向H呈正交的方式受到彎曲,因此被施加至銅電路的主應力、主變形係成為與壓延方向呈平行的拉伸應力、拉伸變形。若在彎曲試驗後,由銅箔的厚度方向觀察電路時,確認出在彎曲部的稜線附近,與壓延方向大致垂直發生裂痕而形成斷續線。將彎曲壽命的結果顯示於表1。表1的彎曲壽命係按每個銅箔的種類分別準備5個的試驗用可撓性電路基板的結果的平均。In this test condition, since the ridge line formed in the curved portion is curved so as to be orthogonal to the wiring direction H of the wiring 2 of the test flexible circuit board 5, the principal stress and the main deformation system applied to the copper circuit are applied. It is a tensile stress and tensile deformation parallel to the rolling direction. When the circuit was observed from the thickness direction of the copper foil after the bending test, it was confirmed that cracks were formed in the vicinity of the ridge line of the curved portion substantially perpendicularly to the rolling direction to form a broken line. The results of the bending life are shown in Table 1. The bending life of Table 1 is an average of the results of preparing five test flexible circuit boards for each type of copper foil.

由表1所示結果可知,彎曲疲勞壽命係取決於立方體集合組織的集積度,以相同加工方法來製作,配向度亦大致相等的銅箔C、銅箔D、銅箔E的彎曲疲勞壽命係大不相同。As can be seen from the results shown in Table 1, the bending fatigue life is determined by the same processing method, and the bending fatigue life of the copper foil C, the copper foil D, and the copper foil E which are substantially equal in the degree of alignment is determined by the cumulative degree of the cubic aggregate structure. Very different.

接著,為了調查彎曲壽命的支配因子,與彎曲的主應力、主變形方向、亦即壓延方向呈平行地進行拉伸試驗。為了調查銅箔單體的特性,由蝕刻前的單面覆銅層積板4將樹脂層溶解,進行以銅箔單體的拉伸試驗。確認出在將聚醯亞胺溶解的過程中,在銅箔的組織沒有改變。Next, in order to investigate the dominating factor of the bending life, the tensile test was performed in parallel with the principal stress of the bending, the main deformation direction, that is, the rolling direction. In order to investigate the characteristics of the copper foil monomer, the resin layer was dissolved by the single-sided copper-clad laminate 4 before etching, and a tensile test of the copper foil alone was carried out. It was confirmed that the structure of the copper foil did not change during the dissolution of the polyimine.

拉伸試驗係使用朝銅箔的壓延方向(MD方向)切出成長度150mm、在箔面內朝與該壓延方向呈正交的方向切出成寬幅10mm的試料,朝長度方向以標點間距離100mm、拉伸速度10mm/min.進行測定。測定時係按每種銅箔的種類分別準備7個試料,將測定該等所求出的斷裂應力(斷裂強度)、及斷裂伸長的平均值顯示於表1。The tensile test was cut into a length of 150 mm in the rolling direction (MD direction) of the copper foil, and cut into a sample having a width of 10 mm in a direction perpendicular to the rolling direction in the foil surface, and the length direction was between punctuation. The measurement was performed at a distance of 100 mm and a tensile speed of 10 mm/min. In the measurement, seven samples were prepared for each type of copper foil, and the fracture stress (breaking strength) obtained by the measurement and the average value of the elongation at break were shown in Table 1.

結果,在集合組織發達的銅箔中,可知並非為斷裂強度,而是斷裂伸長與彎曲疲勞壽命具有相關。此外,銅箔B係強度、斷裂伸長均大,但是此係反映出為結晶粒的微細的多結晶體。但是,銅箔B由於集合組織不發達,因此疲勞壽命較差劣的結果。此外,若將立方體集合組織的集積度為同等的純度99.99%的銅箔C與純度99.999%的銅箔D相比較,對銅箔D的彎曲的疲勞特性較大,而成為優異的結果。該2個銅箔的氧濃度相同,內部的氧化銅的分散量亦小,由於為同等,並非為因氧化銅所致之差,而是因純度不同而造成斷裂伸長之差所致者。As a result, in the copper foil in which the aggregate structure was developed, it was found that the fracture strength was not related to the fracture strength, but the elongation at break was correlated with the bending fatigue life. Further, the copper foil B has a large strength and a large elongation at break, but this reflects a fine polycrystal which is a crystal grain. However, since the copper foil B is not developed due to the assembly structure, the fatigue life is inferior. In addition, when the copper foil C having an equal accumulation degree of 99.99% of the cubic aggregate structure is compared with the copper foil D having a purity of 99.999%, the bending fatigue property of the copper foil D is large, which is an excellent result. The two copper foils have the same oxygen concentration, and the amount of dispersion of the internal copper oxide is also small. Since they are equivalent, they are not caused by the difference in copper oxide, but are caused by the difference in the elongation at break due to the difference in purity.

以上,由實施例1所示結果可知,為了獲得比一般的高彎曲用銅箔更為良好的特性,必須基本結晶軸<100>相對金屬箔的厚度方向、及存在於箔面內的某一方向的2個正交軸,以各自方位差10°以內的優先配向領域以面積率計佔有50%以上的方式具有主方位,而且,相對由彎曲部中的稜線朝金屬箔的厚度方向切開的配線的剖面P的法線方向的金屬箔的斷裂伸長為3.5%以上。此外,可知純度極高為99.999%以上,而且使立方體方位發達,而形成為斷裂伸長提升,對在其方向施加主應力、主變形的反覆彎曲,疲勞壽命較長的可撓性電路基板。As described above, it is understood from the results shown in the first embodiment that in order to obtain better characteristics than the general high-bending copper foil, it is necessary to have a basic crystal axis <100> in the thickness direction of the metal foil and a certain one existing in the foil surface. The two orthogonal axes of the direction have a main orientation in such a manner that the priority alignment field within 10° of each of the orientation differences accounts for 50% or more in area ratio, and is cut toward the thickness direction of the metal foil by the ridge line in the curved portion. The elongation at break of the metal foil in the normal direction of the cross section P of the wiring is 3.5% or more. In addition, it is known that the purity is extremely high at 99.999% or more, and the orientation of the cube is developed to form a flexible circuit board in which the elongation at break is increased, and the principal stress and the main deformation are applied in the direction, and the fatigue life is long.

[實施例2][Embodiment 2]

接著,關於使用以與實施例1相同的方法所製作的銅箔A與銅箔E的單面覆銅層積板,如第6圖所示,線寬(1)150μm的直線狀的配線2的配線方向H(H方向)相對MD方向([100]軸)具有30°及45°的角度,而且以空間寬幅(s)250μm形成配線圖案。接著,以兼作後述耐彎曲試驗用的取樣的方式,依據JIS 6471,獲得沿著電路基板的配線方向H朝長邊方向具有150mm、朝與配線方向H呈正交的方向具有寬幅15mm的試驗用可撓性電路基板5。第6圖係以試驗用可撓性電路基板5的配線方向H與MD方向所成角度以45°的角度切出時之例。Next, a single-sided copper-clad laminate using the copper foil A and the copper foil E produced in the same manner as in the first embodiment, as shown in Fig. 6, a linear wiring 2 having a line width (1) of 150 μm The wiring direction H (H direction) has an angle of 30° and 45° with respect to the MD direction ([100] axis), and a wiring pattern is formed with a space width (s) of 250 μm. Then, according to JIS 6471, a test having a width of 15 mm in the direction perpendicular to the wiring direction H and 150 mm in the longitudinal direction along the wiring direction H of the circuit board is obtained in accordance with JIS 6471. The flexible circuit board 5 is used. Fig. 6 shows an example in which the angle between the wiring direction H of the test flexible circuit board 5 and the MD direction is cut at an angle of 45°.

針對上述所得之試驗用可撓性電路基板5,以與實施例1相同的條件實施反覆彎曲的疲勞試驗。此外,以試驗用可撓性電路基板5的配線方向H與MD方向所成角度成為相同的方式,由蝕刻前的單面覆銅層積板4將樹脂層溶解,使用以長邊方向相對壓延方向具有30°及45°的角度的方式所切出的150mm×10mm的試料,與實施例1同樣地進行拉伸試驗。亦即,銅箔的疲勞試驗中的主應力、主變形方向係與拉伸試驗的拉伸方向相一致,銅箔A與銅箔E的立方體集合組織均高度發達,因此在疲勞試驗與拉伸試驗中,在相同的結晶方位受到主變形與主應力。將疲勞試驗、拉伸試驗的結果顯示於表2。The fatigue test of the repeated bending was carried out under the same conditions as in Example 1 with respect to the test flexible circuit board 5 obtained above. In addition, the resin layer is dissolved by the single-sided copper-clad laminate 4 before etching in such a manner that the angle between the wiring direction H and the MD direction of the test flexible circuit board 5 is the same, and the calendering is performed in the longitudinal direction. A 150 mm × 10 mm sample cut in a direction having an angle of 30° and 45° was subjected to a tensile test in the same manner as in Example 1. That is, the principal stress and the main deformation direction of the fatigue test of the copper foil are consistent with the tensile direction of the tensile test, and the cubic assembly of the copper foil A and the copper foil E are highly developed, so fatigue test and stretching are performed. In the test, the main deformation and the principal stress were received in the same crystal orientation. The results of the fatigue test and the tensile test are shown in Table 2.

由表2所示之試驗結果,藉由使主應力、主變形方向錯開<100>方位,可得較高疲勞特性。在該等方位中,斷裂伸長亦明顯大於<100>方位,尤其在30°的情形,與斷裂伸長均會疲勞壽命變長。From the test results shown in Table 2, higher fatigue characteristics were obtained by shifting the principal stress and the main deformation direction by <100> orientation. In these orientations, the elongation at break is also significantly greater than the <100> orientation, especially at 30°, and both the elongation at break and the fatigue life become longer.

由以上實施例2的結果可知,在相對高變形的反覆彎曲的可撓性電路基板的疲勞壽命、與構成配線的銅箔的斷裂伸長之間,若銅箔高度配向時,具有高相關。如在實施例1中所見,在多結晶體中,可得更高的強度與延性,但是在高彎曲用途中並非有效。因此,如上所示之疲勞壽命、與具有高度集積的集合組織的條件下的斷裂伸長的關係係由滑移系統擔任重要的角色,並非限於銅,即使為具有相同滑移系統的面心立方方位金屬亦成立者,若為層積缺陷能量不同的金屬,預估斷裂伸長亦取得更大,可期待疲勞壽命亦變大。As a result of the above-described Example 2, it is understood that there is a high correlation between the fatigue life of the relatively high-deformation curved circuit board which is repeatedly bent and the elongation at break of the copper foil constituting the wiring when the copper foil is highly aligned. As seen in Example 1, higher strength and ductility are obtained in polycrystalline bodies, but are not effective in high bending applications. Therefore, the relationship between the fatigue life as shown above and the elongation at break under conditions of a highly concentrated aggregate structure is an important role for the slip system, not limited to copper, even for the face centered cubic orientation with the same slip system. If the metal is also established, if the metal with different delamination energy is different, the estimated elongation at break is also larger, and the fatigue life can be expected to become larger.

[實施例3][Example 3]

在純度99.9mass%、厚度12μm的壓延銅箔H塗佈以與合成例1相同的方法所準備的聚醯胺酸溶液a而使其乾燥(硬化後形成膜厚2μm的熱塑性聚醯亞胺),且在其上塗佈聚醯胺酸b而使其乾燥(硬化後形成膜厚8μm的低熱熱膨脹性聚醯亞胺),另外在其上塗佈聚醯胺酸a而使其乾燥(硬化後形成膜厚2μm的熱塑性聚醯亞胺),如下列條件a~d所示,經由最高溫度180~240℃的溫度以積算時間計為負荷10分的加熱條件而形成聚醯亞胺層(樹脂層)。The polyacrylic acid solution a prepared in the same manner as in Synthesis Example 1 was applied to a rolled copper foil H having a purity of 99.9 mass% and a thickness of 12 μm, and dried (cured to form a thermoplastic polyimide having a film thickness of 2 μm). And coating the polyaminic acid b thereon and drying it (curing to form a low thermal expansion polyimine having a film thickness of 8 μm), and applying polyacrylic acid a thereon to dry (harden) Thereafter, a thermoplastic polyimide having a film thickness of 2 μm was formed, and as shown in the following conditions a to d, a polyimine layer was formed under a heating condition of a load of 10 minutes at a temperature of a maximum temperature of 180 to 240 ° C. Resin layer).

接著,以成為沿著銅箔的壓延方向(MD方向)長度250mm、以相對壓延方向呈正交的方向(TD方向)為寬幅150mm的長方形尺寸的方式切出,而得具有厚度12μm之聚醯亞胺層(樹脂層)1與厚度12μm之銅箔2的實施例3之單面覆銅層積板4。Then, it was cut in such a manner that the length of the copper foil in the rolling direction (MD direction) was 250 mm and the direction perpendicular to the rolling direction (TD direction) was a rectangular shape having a width of 150 mm, and the thickness was 12 μm. A single-sided copper-clad laminate 4 of Example 3 of a bismuth imide layer (resin layer) 1 and a copper foil 2 having a thickness of 12 μm.

在上述所得單面覆銅層積板4的銅箔側覆蓋預定的遮罩,使用氯化鐵/氯化銅系溶液進行蝕刻,根據IPC規格,形成線寬150μm及空間寬幅250μm之具有直線狀配線的低速IPC試驗用配線2。在該製造過程中,將聚醯亞胺層形成時的加熱條件的最高溫度設為180℃(條件a)、200℃(條件b)、220℃(條件c)、及240℃(條件d)等4個水準,此外,以具有直線狀的配線2的配線方向(H方向)相對壓延方向(MD方向)呈0°、2°、2.9°、5.7°、9.5°、11.4°、14°、18.4°、25°、26.6°、30°、40°、45°、55°、60°、63.4°、78.6°、80°、82.9°、87.1°、88°、及90°的22水準的角度的方式,分別形成配線圖案。The copper foil side of the single-sided copper-clad laminate 4 obtained above is covered with a predetermined mask, and is etched using a ferric chloride/copper chloride-based solution, and has a line width of 150 μm and a space width of 250 μm according to the IPC specification. Low-speed IPC test wiring 2 for wiring. In the production process, the maximum temperature of the heating conditions at the time of forming the polyimide layer is 180 ° C (condition a), 200 ° C (condition b), 220 ° C (condition c), and 240 ° C (condition d). In addition, the wiring direction (H direction) of the linear wiring 2 is 0°, 2°, 2.9°, 5.7°, 9.5°, 11.4°, and 14° with respect to the rolling direction (MD direction). 22 level angles of 18.4°, 25°, 26.6°, 30°, 40°, 45°, 55°, 60°, 63.4°, 78.6°, 80°, 82.9°, 87.1°, 88°, and 90° In a manner, wiring patterns are formed separately.

接著,如第8圖(b)所示,在各自的配線圖案側的面,使用環氧系接著劑,層積覆蓋材7(有澤製作所製CVK-0515KA:厚度12.5μm)。由接著劑所構成的接著層6的厚度係在沒有銅箔電路的部分為15μm,在存在銅箔電路的部分為6μm。接著,以沿著配線方向(H方向)在長邊方向成為15cm、在與配線方向呈正交的方向成為寬幅8mm的方式作切出,而獲得用以形成為IPC試驗取樣的試驗用可撓性電路基板。Then, as shown in Fig. 8(b), an epoxy-based adhesive was used on the surface of the wiring pattern side, and a cover material 7 (CVK-0515KA manufactured by Ozawa Seisakusho Co., Ltd.: thickness: 12.5 μm) was laminated. The thickness of the adhesive layer 6 composed of the adhesive was 15 μm in the portion where the copper foil circuit was absent, and 6 μm in the portion where the copper foil circuit was present. Then, it was cut out so as to be 15 cm in the longitudinal direction along the wiring direction (H direction) and 8 mm wide in the direction perpendicular to the wiring direction, thereby obtaining a test for forming an IPC test sample. Flexible circuit board.

另一方面,為了調查銅箔單體的特性,如以下所示進行拉伸試驗。以上述試驗用可撓性電路基板5的配線方向H與MD方向所成角度的關係同為22水準的方式,由蝕刻前的單面覆銅層積板4將樹脂層溶解而形成為銅箔單體,備妥以長邊方向相對壓延方向具有上述22水準的角度的方式所切出的長度150mm×寬幅10mm的矩形試料。此時,確認出在將聚醯亞胺溶解的過程中,在銅箔的組織沒有改變。拉伸試驗係朝長度方向以標點間距離100mm、拉伸速度10mm/min.進行測定。On the other hand, in order to investigate the characteristics of the copper foil monomer, a tensile test was performed as shown below. The angle of the angle between the wiring direction H and the MD direction of the test flexible circuit board 5 is the same as the level of 22, and the resin layer is dissolved by the single-sided copper-clad laminate 4 before etching to form a copper foil. The monomer was prepared into a rectangular sample having a length of 150 mm and a width of 10 mm cut in such a manner that the longitudinal direction was at an angle of 22 degrees with respect to the rolling direction. At this time, it was confirmed that the structure of the copper foil did not change during the dissolution of the polyimine. The tensile test was carried out in the longitudinal direction at a distance between the punctuation of 100 mm and a tensile speed of 10 mm/min.

此外,以用以進行藉由EBSP所為之組織解析的試料而言,針對以條件a~d的熱處理條件所製作的單面覆銅層積板,製作出以相對壓延方向為0°、2.9°、30°、63.4°、及78.6°的5個角度所切出的沒有配線圖案的試料合計20枚。為了備齊IPC試驗取樣與熱履歷,以與電路形成蝕刻相同的條件施加模擬的熱處理,另外以相同的條件層積覆蓋材。但是,對銅箔組織的該等影響輕微,依聚醯亞胺形成時的條件a~d的熱處理條件來決定銅箔組織係在之後判明。Further, in the sample for performing the analysis by the EBSP, the single-sided copper-clad laminate produced by the heat treatment conditions of the conditions a to d was produced to have a relative rolling direction of 0° and 2.9°. A total of 20 samples without a wiring pattern cut at five angles of 30°, 63.4°, and 78.6° were used. In order to prepare the IPC test sample and the heat history, the simulated heat treatment was applied under the same conditions as the circuit formation etching, and the cover material was laminated under the same conditions. However, these effects on the copper foil structure were slight, and the copper foil structure was determined after the heat treatment conditions of the conditions a to d at the time of formation of the polyimide.

接著,將具有如上所述EBSP測定用所製作的4個水準的熱處理條件、及5個水準的角度條件的20枚銅箔H朝基板厚度方向研磨,具有與研磨前的箔面呈水平的面,而使銅箔H的箔面露出。另外使用膠態矽石來進行最後研磨,以EBSP來評估銅箔H的組織。測定領域為0.8mm×1.6mm,測定間隔係設為4μm。亦即,1領域的測定點數為80000點。結果,可知以條件a至條件d的熱處理條件進行熱處理後的試料係均形成有立方體集合組織,朝銅箔面方位、壓延方向具有{001}<100>的主方位。接著,根據所得的結果,相對銅箔的厚度方向與壓延方向,將單位晶格軸<001>成為10°以內的點的數量進行計數,計算出對全體點數的比例,求出平均值。將其結果顯示於表3。相同加熱條件中的試料間的不均為1%以下,以相同的熱處理條件,係可謂為遍及銅箔全面具有表3所示的集積度。可知最高熱處理溫度愈高、熱履歷愈大,再結晶愈會進行,立方體再結晶集合組織的集積度愈高。此外,進行箔面內的方位解析的結果,以相對壓延方向為0°、2.9°、30°、63.4°、及78.6°的5個角度所切出的試料的切出方向的主方位係具有[100]、[20 1 0]、[40 23 0]、[120]、[150],大致如預定所示。另一方面,使用所得的EBSP資料,進行將相鄰結晶粒的方位差為15°以上者解析為結晶粒界之由箔面法線方向觀看時的結晶粒徑的評估,針對多結晶體求出平均粒徑。將結果顯示於表3。Next, 20 copper foils H having the four-level heat treatment conditions and five angular angle conditions produced by the EBSP measurement described above are polished in the thickness direction of the substrate, and have a surface horizontal to the foil surface before polishing. The foil surface of the copper foil H is exposed. In addition, colloidal vermiculite was used for final grinding, and EBSP was used to evaluate the structure of copper foil H. The measurement area was 0.8 mm × 1.6 mm, and the measurement interval was set to 4 μm. That is, the number of measurement points in the 1 field is 80000 points. As a result, it was found that the sample obtained by heat treatment under the heat treatment conditions of the condition a to the condition d was formed with a cubic aggregate structure, and had a principal orientation of {001}<100> toward the copper foil surface orientation and the rolling direction. Then, based on the obtained results, the thickness direction and the rolling direction of the copper foil were counted by the number of points within the unit lattice axis <001> of 10°, and the ratio to the total number of dots was calculated, and the average value was obtained. The results are shown in Table 3. The ratio of the samples in the same heating conditions was not more than 1%, and the same heat treatment conditions were used to provide the total degree of accumulation shown in Table 3 throughout the copper foil. It can be seen that the higher the maximum heat treatment temperature and the higher the heat history, the more the recrystallization proceeds, and the higher the accumulation degree of the cubic recrystallized aggregate structure. Further, as a result of the orientation analysis in the foil surface, the main orientation of the sample cut out at five angles of 0°, 2.9°, 30°, 63.4°, and 78.6° with respect to the rolling direction has [100], [20 1 0], [40 23 0], [120], [150], roughly as indicated. On the other hand, using the obtained EBSP data, the evaluation of the crystal grain size when the orientation difference of the adjacent crystal grains is 15° or more is analyzed as the crystal grain boundary in the normal direction of the foil surface, and the polycrystalline body is obtained. The average particle size. The results are shown in Table 3.

IPC試驗係在第8圖中如其模式圖所示,將屬於行動電話等所使用之彎曲形態之一的滑移彎曲進行模擬後的試驗。IPC試驗係如第8圖所示,以所決定的間隙長8設置彎曲部,以固定部9固定單側,使相反側的滑移運轉部10如圖所示作反覆往返運動的試驗。因此,在按照作往返運動的部分的行程量的領域中,基板係受到反覆的彎曲。在本實施例中,將聚醯亞胺層(樹脂層)1設為外側,將間隙長設為1mm、亦即彎曲半徑設為0.5mm、行程設為38mm而使其作反覆滑移來進行試驗。在試驗中,進行試驗用可撓性電路基板的電路的電阻的測定,以電阻的增加來監測銅箔電路的疲勞裂痕的進展程度。在本實施例中,將電路的電阻達至初期值的2倍的行程次數設為電路斷裂壽命。In the eighth diagram, as shown in the schematic diagram, the IPC test is a test in which the slip of one of the bending forms used in the mobile phone or the like is simulated. In the IPC test system, as shown in Fig. 8, the curved portion is provided at the determined gap length 8, and the one side is fixed by the fixing portion 9, and the sliding operation portion 10 on the opposite side is tested as a reciprocating motion as shown. Therefore, in the field of the stroke amount in the portion to be reciprocated, the substrate is subjected to repeated bending. In the present embodiment, the polyimine layer (resin layer) 1 is set to the outside, and the gap length is set to 1 mm, that is, the bending radius is set to 0.5 mm, and the stroke is set to 38 mm to perform the reverse slip. test. In the test, the measurement of the electric resistance of the circuit of the flexible circuit board for the test was performed, and the degree of progress of the fatigue crack of the copper foil circuit was monitored by the increase in electric resistance. In the present embodiment, the number of strokes in which the resistance of the circuit reaches twice the initial value is taken as the circuit breaking life.

試驗係有關上述的條件a~條件d的4個熱處理條件,針對形成有具有22水準的角度的配線圖案的合計88水準來進行。在各自的試驗水準中,係針對4個試驗片進行測定,求出電路斷裂後的行程次數的平均。針對電路斷裂壽命後的銅箔,若以掃描型電子顯微鏡來觀察與滑移方向呈正交而將銅箔朝厚度方向切開的剖面時,觀察到雖有程度上的差異,但是在樹脂層側及覆蓋材側的各個的銅箔表面係發生裂痕,尤其在相當於彎曲部的外側的樹脂層側的銅箔表面被導入多數個裂痕。In the test, the four heat treatment conditions of the above conditions a to d were carried out for a total of 88 levels of wiring patterns having an angle of 22 levels. In each of the test levels, four test pieces were measured, and the average of the number of strokes after the circuit was broken was obtained. When the copper foil after the rupture life of the circuit is observed by a scanning electron microscope and the copper foil is cut in the thickness direction perpendicular to the sliding direction, a difference in degree is observed, but on the resin layer side. The surface of each of the copper foils on the side of the cover material is cracked, and in particular, a plurality of cracks are introduced into the surface of the copper foil on the resin layer side corresponding to the outer side of the curved portion.

將各水準的電路斷裂壽命的平均值、及拉伸試驗中的斷裂伸長顯示於表4。在表4的角度欄位,關於電路的長度方向(配線方向)、亦即由彎曲部中的稜線朝厚度方向切開時的配線的剖面P,僅在成為低指數方向的情形亦顯示面指數。Table 4 shows the average value of the circuit breaking life at each level and the elongation at break in the tensile test. In the angle column of Table 4, the surface index of the wiring in the longitudinal direction (wiring direction) of the circuit, that is, the cross-section P of the wiring when the ridge line in the curved portion is cut in the thickness direction is displayed only in the case of the low-index direction.

可知IPC試驗中的斷裂壽命(疲勞壽命)係大幅取決於電路長度方向(H方向)與壓延方向(MD方向)所成角度、亦即由彎曲部中的稜線朝厚度方向切開時的配線剖面的法線方向與[100]所成角度。該方位依存性係在條件b、條件c、及條件d下顯現,立方體方位的集積度愈高,對反覆彎曲的疲勞壽命愈大,此外,方位依存性愈大。關於該方位依存性,確認出對金屬箔的厚度方向,以銅的[001]在方位差10°以內的領域藉由EBSP法所為之評估而佔有面積比50%以上的方式,<001>主方位朝金屬箔的厚度方向作優先配向,並且以由銅的[100]軸在方位差10°以內的領域以藉由EBSP法所為之評估而佔有面積比50%以上的方式,[100]主方位在金屬箔面內作優先配向時所顯現。尤其可知,在厚度方向及壓延方向分別表示面積比75%以上、及85%以上而立方體方位的集積度較高的條件c的情形下,疲勞壽命大,而且方位依存性的效果大,而在厚度方向及壓延方向分別表示面積比98%以上、及99%以上而立方體方位的集積度極高的條件d下,疲勞壽命更大、方位依存性的效果更大。It is understood that the fracture life (fatigue life) in the IPC test is largely dependent on the angle formed by the longitudinal direction of the circuit (H direction) and the rolling direction (MD direction), that is, the wiring profile when the ridge line in the curved portion is cut toward the thickness direction. The normal direction is at an angle to [100]. This orientation dependence appears under condition b, condition c, and condition d. The higher the degree of accumulation of the cube orientation, the greater the fatigue life for repeated bending, and the greater the orientation dependence. Regarding the orientation dependence, it was confirmed that the thickness direction of the metal foil was such that the area of the copper [001] within 10 degrees of the azimuth difference was within 50% of the area evaluated by the EBSP method, and the <001> main The orientation is preferentially aligned toward the thickness direction of the metal foil, and the area occupied by the EBSP method is occupied by the EBSP method in a range of 10 degrees or less from the [100] axis of copper, [100] main The orientation appears when the orientation is preferentially aligned in the foil side. In particular, when the thickness direction and the rolling direction indicate the condition c having an area ratio of 75% or more and 85% or more and a cube orientation is high, the fatigue life is large and the effect of the orientation dependency is large. The thickness direction and the rolling direction indicate that the area ratio is 98% or more and 99% or more, and the condition d of the cube orientation is extremely high, and the fatigue life is larger and the effect of orientation dependence is greater.

若詳加檢討條件b、條件c、及條件d的結果時,由彎曲部中的稜線朝厚度方向切開時的配線剖面P的法線方向、亦即主應力方向由銅箔的<100>主方位偏移者,在相對彎曲的電路的疲勞壽命較高。在本實施例之IPC試驗中,看到效果的是相對彎曲部的主變形方向,亦即相對由彎曲部中的稜線朝厚度方向切開時的配線的剖面法線方向,具有2.9°~87.1°的角度的情形時。若以面指數表示之,由彎曲部中的稜線朝厚度方向切開時的配線的剖面P係以[001]為晶帶軸,由(20 1 0)通過(110)而至(1 20 0)的範圍。其中效果較大者係相對彎曲部的主變形方向,亦即相對由彎曲部中的稜線朝厚度方向切開時的配線的剖面法線方向,具有11.4°~78.6°的角度的情形時。若以面指數來表示之,由彎曲部中的稜線朝厚度方向切開時的配線的剖面P係以[001]為晶帶軸,由(510)通過(110)而至(150)的範圍。彎曲特性係另外相對彎曲部的主變形方向,亦即相對由彎曲部中的稜線朝厚度方向切開時的配線的剖面法線方向,具有26.6°~63.4°的角度時會變高,最為優異的是30°與60°的情形時。若以面指數來表示之,剖面P係以[001]為晶帶軸,由(210)通過(110)而至(120)的範圍,最為優異的是位於(40 23 0)及(23 40 0)附近時。When the results of condition b, condition c, and condition d are reviewed in detail, the normal direction of the wiring cross section P when the ridge line in the curved portion is cut in the thickness direction, that is, the principal stress direction is <100> main of the copper foil. The azimuth offset is higher in the fatigue life of the relatively curved circuit. In the IPC test of the present embodiment, it is seen that the main deformation direction of the curved portion, that is, the normal direction of the cross section of the wiring when the ridge line in the curved portion is cut in the thickness direction, has 2.9 to 87.1. The angle of the situation. When the surface line is indicated by the surface index, the cross section P of the wiring when the ridge line in the curved portion is cut in the thickness direction is [001] as the crystal ribbon axis, and (20 1 0) passes through (110) to (1 20 0). The scope. Among them, the larger the effect is the main deformation direction of the curved portion, that is, when the angle is 11.4 to 78.6° with respect to the normal direction of the cross section of the wiring when the ridge line in the curved portion is cut in the thickness direction. The cross section P of the wiring when the ridge line in the curved portion is cut in the thickness direction is expressed by the surface index, and [001] is the crystal ribbon axis, and (510) is passed through the range of (110) to (150). The bending characteristic is the same as the main deformation direction of the curved portion, that is, the normal direction of the cross section of the wiring when the ridge line in the curved portion is cut in the thickness direction, and has an angle of 26.6° to 63.4°, which is the most excellent. When it is 30° and 60°. If expressed by the surface index, the profile P is [001] as the ribbon axis, and (210) is passed from (110) to (120), and the most excellent is located at (40 23 0) and (23 40 0) When nearby.

當將該等結果與斷裂伸長作比較時,可知面心立方構造的單位晶格的基本結晶軸<100>相對金屬箔的厚度方向、及存在於箔面內的某一方向的2個正交軸,各自方位差10°以內的優先配向領域以面積率計佔有50%以上的方式,具有主方位時,若相對由彎曲部中的稜線朝金屬箔的厚度方向切開的配線的剖面P的法線方向的金屬箔的斷裂伸長為3.5%以上,相對在其方位使主應力、主變形發生的彎曲,具有良好的彎曲疲勞特性。另一方面,<100>優先配向領域的面積率為49%以下時,即使顯示其方向的斷裂伸長為3.5%以上的值,亦無法獲得良好的彎曲疲勞特性。When these results are compared with the elongation at break, it is understood that the basic crystal axis <100> of the unit cell of the face-centered cubic structure is orthogonal to the thickness direction of the metal foil and in one direction existing in the foil surface. In the case where the main alignment direction is 50% or more in area ratio, the main alignment direction of the axis is a cross section P of the wiring which is cut toward the thickness direction of the metal foil by the ridge line in the curved portion. The metal foil in the line direction has an elongation at break of 3.5% or more, and has good bending fatigue characteristics with respect to bending caused by principal stress and main deformation in its orientation. On the other hand, when the area ratio of the <100> preferential alignment field is 49% or less, even if the elongation at break in the direction is 3.5% or more, good bending fatigue characteristics cannot be obtained.

[實施例4][Example 4]

在純度99.99%的銅箔C在Ar氣流中以180℃~400℃之5個水準的溫度施加30分鐘的熱處理(預備熱處理),以與實施例1相同的方法塗佈聚醯胺酸溶液a,且使其乾燥(硬化後形成膜厚2μm的熱塑性聚醯亞胺),在其上塗佈聚醯胺酸b,且使其乾燥(硬化後形成膜厚9μm的低熱熱膨脹性聚醯亞胺),另外在其上塗佈聚醯胺酸a,且使其乾燥(硬化後形成膜厚2μm的熱塑性聚醯亞胺),經由300~360℃的溫度以積算時間計為負荷5分以上之類的加熱條件而形成由3層構造所構成的聚醯亞胺層。接著,沿著銅箔的壓延方向(MD方向)成為長度250mm、朝相對壓延方向呈正交的方向(TD方向)成為寬幅150mm的長方形尺寸的方式進行切出,如第5圖所示,獲得具有厚度13μm的聚醯亞胺層(樹脂層)1與厚度9μm的銅箔2的單面覆銅層積板4。此時的樹脂層全體的拉伸彈性率為7.5GPa。The polyacrylic acid solution a was applied in the same manner as in Example 1 except that the copper foil C having a purity of 99.99% was subjected to heat treatment (preheat treatment) at a temperature of 5 ° C to 400 ° C for 30 minutes in an Ar gas flow. And dried (hardened to form a thermoplastic polyimide having a film thickness of 2 μm), coated with polylysine b, and dried (cured to form a low thermal expansion polyimine having a film thickness of 9 μm) Further, the polyamic acid a is coated thereon and dried (cured to form a thermoplastic polyimide having a film thickness of 2 μm), and the load is 5 minutes or more in an integrated time via a temperature of 300 to 360 ° C. A polyimine layer composed of a three-layer structure is formed under heating conditions. Then, the rolling direction (MD direction) of the copper foil is cut to a length of 250 mm, and the direction orthogonal to the rolling direction (TD direction) is a rectangular shape having a width of 150 mm. As shown in FIG. 5, A single-sided copper-clad laminate 4 having a polyimide layer (resin layer) 1 having a thickness of 13 μm and a copper foil 2 having a thickness of 9 μm was obtained. The tensile modulus of the entire resin layer at this time was 7.5 GPa.

關於上述所得之單面覆銅層積板4,對銅箔2的壓延面2a使用膠態矽石,在進行機械式、化學式研磨後,利用EBSP裝置進行方位解析。所使用的裝置為日立製作所製的FE-SEM(S-4100)、TSL公司製的EBSP裝置、及軟體(OIM Analysis 5.2)。測定領域為約800μm×1600μm的領域,測定時加速電壓20kV、測定階段間隔4μm。配向性的評估係相對箔的厚度方向、及箔的壓延方向,以<100>在10°以內的測定點相對全體的測定點的比例來表示。測定數係針對各品種個體不同的5個試料實施,將百分率的小數點第2位以下作四捨五入。此外,使用所得的資料,將相鄰結晶粒的方位為為15°以上者作為結晶粒界來進行結晶粒徑的評估,關於多結晶體求出平均粒徑。將結果顯示於表5。In the single-sided copper-clad laminate 4 obtained as described above, colloidal vermiculite was used for the rolling surface 2a of the copper foil 2, and after mechanical and chemical polishing, the orientation analysis was performed by an EBSP apparatus. The apparatus used was FE-SEM (S-4100) manufactured by Hitachi, Ltd., EBSP apparatus manufactured by TSL Corporation, and software (OIM Analysis 5.2). The measurement field was a field of about 800 μm × 1600 μm, and the acceleration voltage was 20 kV at the time of measurement, and the measurement phase interval was 4 μm. The evaluation of the orientation is expressed by the ratio of the measurement point of <100> within 10° to the measurement point of the whole with respect to the thickness direction of the foil and the rolling direction of the foil. The number of measurements was carried out for five samples of different varieties, and the decimal point of the percentage was rounded off to the second place. Further, using the obtained data, the crystal grain size was evaluated as the crystal grain boundary when the orientation of the adjacent crystal grains was 15 or more, and the average particle diameter was determined for the polycrystalline body. The results are shown in Table 5.

可知銅箔C均形成有立方體集合組織,銅箔面方位、壓延方向均具有{001}<100>的主方位。此係因為經壓延加工的銅箔藉由預備熱處理與聚醯亞胺硬化時的熱而再結晶,而形成有再結晶集合組織之故。在此,預備熱處理溫度愈高,{001}<100>的配向度愈大。此外,<100>方位以外的方位係與上述同樣地經EBSP裝置確認結果,相對壓延方向具有<212>的方位,相當圓的直徑為5μm以下的再結晶殘留方位分散成島狀。但是,在以400℃進行預備熱處理的銅箔中,幾乎沒有發現如上所示之島狀的組織。其中,經確認的島狀組織的面積率較小,為2%以下,因此具有立方體方位的再結晶粒係具有相同的方位而一體化。此外,再結晶粒的大小係在厚度方向與箔厚同為9μm,在箔面內為800μm以上。It can be seen that the copper foil C is formed with a cubic assembly structure, and both the copper foil surface orientation and the rolling direction have a principal orientation of {001}<100>. This is because the calendered copper foil is recrystallized by heat during the preliminary heat treatment and the polyimine hardening to form a recrystallized aggregate structure. Here, the higher the preliminary heat treatment temperature, the larger the degree of alignment of {001}<100>. In addition, the orientation other than the <100> orientation was confirmed by the EBSP apparatus as described above, and the orientation in the rolling direction was <212>, and the recrystallized orientation in which the diameter of the circle was 5 μm or less was dispersed into an island shape. However, in the copper foil which was subjected to preliminary heat treatment at 400 ° C, almost no island-like structure as shown above was observed. Among them, since the area ratio of the confirmed island-like structure is small and is 2% or less, the recrystallized grains having the cubic orientation have the same orientation and are integrated. Further, the size of the recrystallized grains was 9 μm in the thickness direction and the thickness of the foil, and was 800 μm or more in the foil surface.

接著,將預定的遮罩被覆在上述所得之單面覆銅層積板4的銅箔2側,使用氯化鐵/氯化銅系溶液進行蝕刻,如第6圖所示(但是配線方向H與MD方向所成角度為0°),以線寬(1)為150μm的直線狀配線2的配線方向H(H方向)與MD方向(<100>軸)呈平行的方式,而且以空間寬幅(s)為250μm的方式形成配線圖案。接著,以兼作後述耐彎曲試驗用的取樣所示,依據JIS 6471,得到沿著電路基板的配線方向H,朝長邊方向具有150mm、與配線方向H呈正交的方向具有寬幅15mm的試驗用可撓性電路基板5。Next, a predetermined mask is coated on the copper foil 2 side of the single-sided copper-clad laminate 4 obtained above, and is etched using a ferric chloride/copper chloride-based solution, as shown in Fig. 6 (but the wiring direction H) The angle formed by the MD direction is 0°), and the wiring direction H (H direction) of the linear wiring 2 having a line width (1) of 150 μm is parallel to the MD direction (<100> axis), and the space is wide. A wiring pattern was formed in such a manner that the web (s) was 250 μm. Next, a test having a width of 15 mm along the wiring direction H of the circuit board, 150 mm in the longitudinal direction, and a direction perpendicular to the wiring direction H is obtained in accordance with JIS 6471, as shown in the sampling for the bending resistance test described later. The flexible circuit board 5 is used.

使用上述所得之試驗用可撓性電路基板,依據JIS C5016進行MIT彎曲試驗。將試驗的模式圖顯示於第7圖。裝置係使用東洋精機製作所製(STROGRAPH-R1),將試驗用可撓性電路基板5的長邊方向的一端固定在彎曲試驗裝置的夾持夾具,將另一端以重物固定,以夾持部為中心,一面以振動速度150次/分鐘的條件左右交替各旋轉135±5度,一面以成為曲率半徑0.8mm的方式使其彎曲,求出電路基板5的配線2的導通被遮斷為止的次數作為彎曲次數。Using the test flexible circuit board obtained above, the MIT bending test was performed in accordance with JIS C5016. The mode diagram of the test is shown in Figure 7. The apparatus was manufactured by Toyo Seiki Seisakusho Co., Ltd. (STROGRAPH-R1), and one end of the test flexible circuit board 5 in the longitudinal direction was fixed to the holding jig of the bending test apparatus, and the other end was fixed by a weight to the holding part. In the case of the vibration of 150 times/min, the rotation is 135±5 degrees, and the curvature is 0.8 mm, and the conduction of the wiring 2 of the circuit board 5 is blocked. The number of times is the number of bends.

在該試驗條件中,以形成在彎曲部的稜線相對試驗用可撓性電路基板5的配線2的配線方向H呈正交的方式受到彎曲,因此施加於銅電路的主應力、主變形係成為與壓延方向呈平行的拉伸應力、拉伸變形。在彎曲試驗後由銅箔的厚度方向觀察電路時,確認出在彎曲部的稜線附近,以與壓延方向大致垂直發生裂痕而發生斷續線。彎曲壽命的結果顯示於表5。表5的彎曲壽命係按每個銅箔的預備熱處理溫度分別準備5個的試驗用可撓性電路基板的結果的平均。由表5所示結果可知,彎曲疲勞壽命係立方體集合組織的集積度為98.0%以上、99.8%時特別變大。In the test condition, the ridge line formed in the curved portion is curved so as to be orthogonal to the wiring direction H of the wiring 2 of the test flexible circuit board 5, so that the principal stress and the main deformation applied to the copper circuit become Tensile stress and tensile deformation parallel to the rolling direction. When the circuit was observed from the thickness direction of the copper foil after the bending test, it was confirmed that a broken line was generated in the vicinity of the ridge line of the curved portion so as to be substantially perpendicular to the rolling direction. The results of the bending life are shown in Table 5. The bending life of Table 5 is an average of the results of preparing five test flexible circuit boards for each of the preliminary heat treatment temperatures of the copper foils. As is clear from the results shown in Table 5, the bending fatigue life is particularly large when the cumulative degree of the cubic aggregate structure is 98.0% or more and 99.8%.

接著,為了調查彎曲壽命的支配因子,與彎曲的主應力、主變形方向、亦即壓延方向呈平行地進行拉伸試驗。為了調查藉由預備熱處理溫度所得之銅箔單體的特性,由蝕刻前的單面覆銅層積板4將樹脂層溶解,進行以銅箔單體的拉伸試驗。確認出在將聚醯亞胺溶解的過程中,在銅箔的組織沒有產生變化。Next, in order to investigate the dominating factor of the bending life, the tensile test was performed in parallel with the principal stress of the bending, the main deformation direction, that is, the rolling direction. In order to investigate the characteristics of the copper foil monomer obtained by the preliminary heat treatment temperature, the resin layer was dissolved by the single-sided copper-clad laminate 4 before etching, and a tensile test of the copper foil alone was carried out. It was confirmed that there was no change in the structure of the copper foil during the dissolution of the polyimine.

拉伸試驗係使用朝銅箔的壓延方向(MD方向)切出成長度150mm、朝箔面內垂直方向切出成寬幅10mm的試料,以標點間距離100mm、朝長度方向以拉伸速度10mm/min.進行測定。在測定時係按每個銅箔的預備熱處理溫度分別準備7個試料,將測定該等所求出的斷裂應力(斷裂強度)、及斷裂伸長的平均值顯示於表5。The tensile test was carried out by cutting into a length of 150 mm in the rolling direction (MD direction) of the copper foil and cutting into a width of 10 mm in the vertical direction of the foil surface, with a distance between the punctuation of 100 mm and a tensile speed of 10 mm in the longitudinal direction. /min. The measurement was performed. In the measurement, seven samples were prepared for each preliminary heat treatment temperature of each copper foil, and the fracture stress (breaking strength) and the average value of the elongation at break obtained by the measurement were shown in Table 5.

與至此為止的結果相反地,斷裂伸長係在<100>集積度(%)為98.0%以上、99.8%以下的領域中,每當集積度增加即會變大。另一方面,在島狀組織已消失的銅箔中,斷裂伸長變小。此係被推測為滑移面所相關者。由以上確認出斷裂伸長與彎曲疲勞壽命具有強相關。亦即,可知<100>集積度(%)為98.0%以上99.8%以下的集合組織高度發達、而且斷裂伸長為3.5%以上,彎曲疲勞壽命會變大。Contrary to the results so far, the elongation at break is larger in the field where the degree of accumulation (%) of <100> is 98.0% or more and 99.8% or less, and the degree of accumulation increases. On the other hand, in the copper foil in which the island-like structure has disappeared, the elongation at break becomes small. This system is presumed to be related to the slip surface. It has been confirmed from the above that the elongation at break is strongly correlated with the bending fatigue life. In other words, it is known that the aggregated degree (%) is 98.0% or more and 99.8% or less, and the aggregate structure is highly developed, and the elongation at break is 3.5% or more, and the bending fatigue life is increased.

另一方面,利用以相同條件含有氧0.035質量%、純度99.9%的精銅以相同條件製作銅箔而以相同條件實施試驗,結果即使<100>集積度(%)為98.0%以上亦同樣地,斷裂伸長係隨著集積度變大而減少,並未獲得3.5%以上的銅箔,且未獲得1000次以上的疲勞壽命。On the other hand, a copper foil was produced under the same conditions using a fine copper containing 0.035 mass% of oxygen and a purity of 99.9% under the same conditions, and the test was carried out under the same conditions. As a result, even if the <100> accumulation degree (%) was 98.0% or more, the same was The elongation at break decreases as the degree of accumulation increases, and 3.5% or more of the copper foil is not obtained, and the fatigue life of 1000 or more times is not obtained.

[產業上可利用性][Industrial availability]

本發明之可撓性電路基板係可在各種電子電氣機器中被廣泛使用,電路基板本身折曲、或扭彎、或按照所裝載的機器的動作而變形,在任一者均適於具有彎曲部來加以使用。尤其,本發明之可撓性電路基板係具有彎曲耐久性佳的彎曲部構造,因此適於當伴隨著滑動彎曲、折曲彎曲、鉸鏈彎曲、滑移彎曲等反覆動作而頻繁折曲時、或為了與所裝載的機器小型化相對應,而形成圖求曲率半徑極小的彎曲部時。因此,以被要求耐久性的薄型行動電話、薄型顯示器、硬碟、印表機、DVD裝置為首,可適於利用在各種電子機器。The flexible circuit board of the present invention can be widely used in various electronic and electrical equipment, and the circuit board itself is bent, twisted, or deformed in accordance with the operation of the loaded machine, and is suitable for having a bent portion in either case. Come and use it. In particular, since the flexible circuit board of the present invention has a curved portion structure excellent in bending durability, it is suitable for being frequently bent when repeated operations such as sliding bending, bending bending, hinge bending, and sliding bending, or In order to achieve a miniaturization of the loaded machine, a curved portion having a very small radius of curvature is formed. Therefore, it is suitable for use in various electronic devices, such as thin mobile phones, thin displays, hard disks, printers, and DVD devices that require durability.

1...樹脂層1. . . Resin layer

2...配線(金屬箔)2. . . Wiring (metal foil)

2a...壓延面2a. . . Calendering surface

2b...側面2b. . . side

3...連接器端子3. . . Connector terminal

4...單面覆銅層積板4. . . Single-sided copper laminate

5...試驗用可撓性電路基板5. . . Flexible circuit board for testing

6...接著層6. . . Next layer

7...覆蓋材7. . . Covering material

8...間隙長8. . . Long gap

9...固定部9. . . Fixed part

10...滑移運轉部10. . . Slip operation

21...剖面P的法線方向twenty one. . . Normal direction of section P

L...稜線L. . . Ridge line

P...從彎曲部中的稜線朝厚度方向切開時的配線的剖面P. . . Cross section of the wiring when cut from the ridge line in the curved portion in the thickness direction

第1圖係表示立方晶格系的結晶構造中的晶帶軸及以晶帶軸為中心作旋轉所得的面的關係圖。Fig. 1 is a view showing a relationship between a crystal ribbon axis in a crystal structure of a cubic lattice system and a surface rotated about a crystal ribbon axis.

第2圖係(100)標準投影圖的立體三角形。Figure 2 is a solid triangle of the (100) standard projection.

第3圖係顯示使可撓性電路基板彎曲的狀態的剖面說明圖。Fig. 3 is a cross-sectional explanatory view showing a state in which the flexible circuit board is bent.

第4圖係顯示可撓性電路基板中的配線與金屬箔的結晶軸的關係的平面說明圖,(a)及(b)係顯示本發明之可撓性電路基板,(c)及(d)係顯示習知技術之可撓性電路基板。Fig. 4 is a plan explanatory view showing the relationship between the wiring in the flexible circuit board and the crystal axis of the metal foil, and (a) and (b) showing the flexible circuit board of the present invention, (c) and (d) A flexible circuit substrate showing a conventional technique.

第5圖係單面覆銅層積板的斜視說明圖。Fig. 5 is a squint explanatory view of a single-sided copper clad laminate.

第6圖係顯示在本發明之實施例中由單面覆銅層積板獲得試驗用可撓性電路基板的態樣的平面說明圖。Fig. 6 is a plan explanatory view showing a state in which a test flexible circuit substrate is obtained from a single-sided copper-clad laminate in the embodiment of the present invention.

第7圖係MIT彎曲試驗裝置的說明圖。Fig. 7 is an explanatory view of the MIT bending test apparatus.

第8圖(a)係IPC彎曲試驗裝置的說明圖,第8圖(b)係使用在IPC彎曲試驗的試驗用可撓性電路基板的X-X’剖面圖。Fig. 8(a) is an explanatory view of an IPC bending test apparatus, and Fig. 8(b) is a cross-sectional view taken along line X-X' of the test flexible circuit board used in the IPC bending test.

1...樹脂層1. . . Resin layer

2...配線(金屬箔)2. . . Wiring (metal foil)

2a...壓延面2a. . . Calendering surface

2b...側面2b. . . side

4...單面覆銅層積板4. . . Single-sided copper laminate

Claims (9)

一種可撓性電路基板,係具備有樹脂層、及由金屬箔所形成的配線,在配線的至少一個部位具有彎曲部所使用的可撓性電路基板,其特徵為:金屬箔係由純度99.9質量%以上而且厚度為5μm以上、18μm以下的壓延銅箔所構成,前述壓延銅箔係具有面心立方構造,並且面心立方構造的單位晶格的基本結晶軸<100>相對壓延銅箔的厚度方向、及存在於箔面內的某一方向的2個正交軸,分別方位差10°以內的優先配向領域以面積率計佔有50%以上,而且由壓延銅箔的箔面法線方向觀看時的結晶粒徑為25μm以上,此外,相對由彎曲部中的稜線朝壓延銅箔的厚度方向切開的配線的剖面P的法線方向的壓延銅箔的斷裂伸長為3.5%以上、20%以下。 A flexible circuit board comprising a resin layer and a wiring formed of a metal foil, and a flexible circuit board having a bent portion at least one portion of the wiring, wherein the metal foil is made of a purity of 99.9 a rolled copper foil having a thickness of not less than 5 μm and not more than 18 μm, wherein the rolled copper foil has a face-centered cubic structure, and a basic crystal axis of a unit lattice having a face-centered cubic structure is <100> relative to a rolled copper foil. In the thickness direction and the two orthogonal axes existing in one direction in the foil surface, the preferential alignment field within 10° of the azimuth difference is 50% or more in area ratio, and the normal direction of the foil surface of the rolled copper foil The crystal grain size at the time of viewing is 25 μm or more, and the elongation at break of the rolled copper foil in the normal direction of the cross section P of the wiring which is cut in the thickness direction of the rolled copper foil by the ridge line in the curved portion is 3.5% or more and 20%. the following. 如申請專利範圍第1項之可撓性電路基板,其中,金屬箔係由純度99.999質量%以上的壓延銅箔所構成。 The flexible circuit board according to the first aspect of the invention, wherein the metal foil is made of a rolled copper foil having a purity of 99.999 mass% or more. 如申請專利範圍第1項或第2項之可撓性電路基板,其中,配線的剖面P係在以〔001〕為晶帶軸而從(100)對(110)的旋轉方向中由(20 1 0)至(1 20 0)的範圍所包含的任何面形成主方位。 The flexible circuit board according to claim 1 or 2, wherein the cross section P of the wiring is from (100) to the rotation direction of (100) to (110) by (001) Any face included in the range of 1 0) to (1 20 0) forms the principal orientation. 如申請專利範圍第3項之可撓性電路基板,其中,配線的剖面P係在(100)標準投影圖的立體三角形中,位於以表示(20 1 0)的點與表示(110)的點所連結的線 段上的任何面。 The flexible circuit board of claim 3, wherein the cross section P of the wiring is in a solid triangle of the (100) standard projection image, and is located at a point representing (20 1 0) and a point representing (110) Linked line Any face on the segment. 如申請專利範圍第1項或第2項之可撓性電路基板,其中,沿著相對彎曲部中的稜線呈正交的方向形成有配線。 The flexible circuit board according to claim 1 or 2, wherein the wiring is formed in a direction orthogonal to a ridge line in the opposite curved portion. 如申請專利範圍第1項或第2項之可撓性電路基板,其中,樹脂層由聚醯亞胺所構成。 The flexible circuit board of claim 1 or 2, wherein the resin layer is composed of polyimide. 如申請專利範圍第1項或第2項之可撓性電路基板,其中,以形成有伴隨選自由滑動彎曲、折曲彎曲、鉸鏈彎曲及滑移彎曲所成群組的任何反覆動作的彎曲部的方式予以使用。 The flexible circuit board according to claim 1 or 2, wherein the bending portion is formed with any reversing action selected from the group consisting of sliding bending, bending bending, hinge bending, and slip bending. The way to use it. 一種電子機器,其特徵為:裝載有如申請專利範圍第1項至第7項中任一項之可撓性電路基板。 An electronic device characterized by being mounted with a flexible circuit substrate according to any one of claims 1 to 7. 一種可撓性電路基板之彎曲部構造,係具備有樹脂層、及由金屬箔所形成的配線,在配線的至少一個部位具有彎曲部所使用的可撓性電路基板之彎曲部構造,其特徵為:金屬箔係由純度99.9質量%以上而且厚度為5μm以上、18μm以下的壓延銅箔所構成,前述壓延銅箔係具有面心立方構造,並且面心立方構造的單位晶格的基本結晶軸<100>相對壓延銅箔的厚度方向、及存在於箔面內的某一方向的2個正交軸,分別方位差10°以內的優先配向領域以面積率計佔有50%以上,而且由壓延銅箔的箔面法線方向觀看時的結晶粒徑為25μm以上, 此外,相對由彎曲部中的稜線朝壓延銅箔的厚度方向切開的配線的剖面P的法線方向的壓延銅箔的斷裂伸長為3.5%以上、20%以下。 A curved portion structure of a flexible circuit board, comprising a resin layer and a wiring formed of a metal foil, and a curved portion structure of a flexible circuit board having a bent portion at least one portion of the wiring, and characterized in that The metal foil is composed of a rolled copper foil having a purity of 99.9% by mass or more and a thickness of 5 μm or more and 18 μm or less, and the rolled copper foil has a face-centered cubic structure and a basic crystal axis of a unit cell having a face-centered cubic structure. <100> In the thickness direction of the rolled copper foil and the two orthogonal axes existing in one direction in the foil surface, the preferential alignment field within 10 degrees of the azimuth difference is 50% or more in area ratio, and is rolled by When the foil surface of the copper foil is viewed in the normal direction, the crystal grain size is 25 μm or more. In addition, the elongation at break of the rolled copper foil in the normal direction of the cross section P of the wiring which is cut in the thickness direction of the rolled copper foil by the ridge line in the curved portion is 3.5% or more and 20% or less.
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