TWI567154B - Film for pressure-sensitive adhesive tape and pressure-sensitive adhesive tape - Google Patents

Film for pressure-sensitive adhesive tape and pressure-sensitive adhesive tape Download PDF

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TWI567154B
TWI567154B TW101138313A TW101138313A TWI567154B TW I567154 B TWI567154 B TW I567154B TW 101138313 A TW101138313 A TW 101138313A TW 101138313 A TW101138313 A TW 101138313A TW I567154 B TWI567154 B TW I567154B
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meth
adhesive layer
adhesive tape
film
adhesive
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TW101138313A
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TW201333145A (en
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鈴木俊隆
由藤拓三
白井稚人
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日東電工股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • C09J7/22Plastics; Metallised plastics
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04Homopolymers or copolymers of esters
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • C09J7/22Plastics; Metallised plastics
    • C09J7/24Plastics; Metallised plastics based on macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
    • C09J7/245Vinyl resins, e.g. polyvinyl chloride [PVC]
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/30Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38Pressure-sensitive adhesives [PSA]
    • C09J7/381Pressure-sensitive adhesives [PSA] based on macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
    • C09J7/385Acrylic polymers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/40Adhesives in the form of films or foils characterised by release liners
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/40Adhesives in the form of films or foils characterised by release liners
    • C09J7/401Adhesives in the form of films or foils characterised by release liners characterised by the release coating composition
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L21/6836Wafer tapes, e.g. grinding or dicing support tapes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2203/00Applications of adhesives in processes or use of adhesives in the form of films or foils
    • C09J2203/326Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/30Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
    • C09J2301/302Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier the adhesive being pressure-sensitive, i.e. tacky at temperatures inferior to 30°C
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/30Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
    • C09J2301/312Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier parameters being the characterizing feature
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/60Attaching or detaching leads or other conductive members, to be used for carrying current to or from the device in operation
    • H01L2021/60007Attaching or detaching leads or other conductive members, to be used for carrying current to or from the device in operation involving a soldering or an alloying process
    • H01L2021/6027Mounting on semiconductor conductive members

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Adhesive Tapes (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Laminated Bodies (AREA)
  • Dicing (AREA)

Description

黏著帶用膜及黏著帶 Adhesive tape and adhesive tape

本發明係關於一種黏著帶用膜及黏著帶。 The present invention relates to a film for an adhesive tape and an adhesive tape.

半導體切割中所使用之黏著帶於切割時固定晶圓,故必需將與晶圓密接面相反之面固定於基座上。通常,此種固定係藉由真空吸附等負壓而進行。 The adhesive tape used in semiconductor dicing fixes the wafer during dicing, so it is necessary to fix the surface opposite to the wafer adhesion surface to the susceptor. Usually, such fixing is carried out by a vacuum such as vacuum adsorption.

於進行此種利用負壓之固定時,有時會由於過度施加負壓之狀態或切割時之發熱所導致之黏著帶之熔融,而使黏著帶與基座過度密接。若發生此種過度密接,則與基座解除固定時之操作性變差,例如存在包括切割在內之半導體製造步驟無法順利進行之問題。 When such a fixing by the negative pressure is performed, the adhesive tape may be excessively adhered to the base due to the melting of the adhesive tape due to the excessive application of the negative pressure or the heat generated during the cutting. When such excessive adhesion occurs, the operability when the susceptor is unsecured is deteriorated, and for example, there is a problem that the semiconductor manufacturing step including dicing cannot be smoothly performed.

為解決上述過度密接之問題,報告有如下技術:於包含基材膜及黏著劑層2層之晶圓表面保護帶中,將基材膜之與黏著劑層相反之表面之中心線表面粗糙度Ra控制為特定小大(專利文獻1)。 In order to solve the above problem of excessive adhesion, the following technique is reported: the surface line surface roughness of the surface of the substrate film opposite to the adhesive layer in the wafer surface protection tape including the base film and the adhesive layer 2 layers The Ra control is a specific small size (Patent Document 1).

然而,對於半導體切割中所使用之黏著帶之基材膜,要求具有半導體製造製程所特有之擴展(延伸)特性及階差追隨特性。即,半導體切割中所使用之黏著帶之基材膜必需可於擴展步驟中良好地延伸,又,必需良好地追隨半導體之階差。作為滿足此種要求之基材膜,可選擇包含伸長率較大之材料之基材膜。然而,此種基材膜之表面狀態容易受溫度之影響。因此,存在如下問題:即使如專利文獻1所報告般,將基材膜表面之中心線表面粗糙度Ra控制為特 定大小,亦會因氣溫或製程裝置之溫度變化而使控制為特定大小之中心線表面粗糙度Ra發生明顯變化,從而無法表現專利文獻1所記載之發明效果。 However, for the base film of the adhesive tape used in semiconductor dicing, it is required to have the extension (extension) characteristic and the step follow characteristic unique to the semiconductor manufacturing process. That is, the base film of the adhesive tape used in semiconductor dicing must be well extended in the expanding step, and it is necessary to follow the step of the semiconductor well. As the substrate film that satisfies such requirements, a substrate film containing a material having a large elongation can be selected. However, the surface state of such a substrate film is susceptible to temperature. Therefore, there is a problem that the center line surface roughness Ra of the surface of the substrate film is controlled to be special as reported in Patent Document 1. When the temperature is changed by the temperature or the temperature of the process unit, the surface roughness Ra of the center line controlled to a specific size is significantly changed, and the effects of the invention described in Patent Document 1 cannot be expressed.

於半導體切割中、特別是於LED切割中,所使用之半導體晶圓係由氮化鎵、砷化鎵、碳化矽等非常脆之材料構成,因此為防止該半導體晶圓之破損,要求黏著帶之基材膜進一步具有擴展(延伸)特性及階差追隨特性。因此,於LED切割所使用之黏著帶中,上述問題變得明顯。 In semiconductor dicing, especially in LED dicing, the semiconductor wafer used is composed of a very brittle material such as gallium nitride, gallium arsenide or tantalum carbide. Therefore, in order to prevent breakage of the semiconductor wafer, an adhesive tape is required. The base film further has expansion (extension) characteristics and step following characteristics. Therefore, the above problems become apparent in the adhesive tape used for LED cutting.

通常,膜具有平滑表面,若將此種膜加工成輥狀,則發生膜彼此接觸而密接、即黏連之現象。於發生黏連之輥中,有將膜退繞之作業變得困難等不良情形。特別是伸長率較大之膜中通常加入有塑化劑。於此種膜中,由於膜表面析出塑化劑而使膜間之微小空隙被填充,故黏連之不良影響變得明顯。 Usually, the film has a smooth surface, and when such a film is processed into a roll shape, the film comes into contact with each other and adheres to each other, that is, adheres. In the roll in which the adhesion occurs, there is a problem that the work of unwinding the film becomes difficult. In particular, a plasticizer is usually added to a film having a large elongation. In such a film, since a small space between the films is filled due to precipitation of a plasticizer on the surface of the film, the adverse effect of adhesion becomes conspicuous.

於藉由黏著劑對膜表面進行黏著加工之情形時,由於該黏著劑本身具有密接性,故黏連之不良影響愈加明顯。於將發生黏連之輥狀膜退繞之情況下,必需額外之力用以解除膜彼此之密接。藉由施加此種額外之力,會使膜伸長而發生變形,或者即使於膜不發生變形之情形時,該額外之力亦會累積為應力應變。若將由於上述原因而發生變形之膜應用於黏著帶,則難以追隨被黏著體進行貼合。又,若將由於上述原因而累積有應力應變之膜應用於黏著帶,則有於貼合於被黏著體之後,由於該應力應變自然釋放而使被黏著體受到破損之虞。於將黏著帶用於半導體加工之情 形時,由於作為被黏著體之半導體晶圓係由脆性材料構成,故容易脆化或缺損。 In the case where the surface of the film is adhered by an adhesive, since the adhesive itself has adhesiveness, the adverse effect of the adhesion becomes more and more obvious. In the case where the roll film to which the adhesion occurs is unwound, extra force is required to release the adhesion of the films to each other. By applying such additional force, the film is elongated and deformed, or the additional force accumulates as stress strain even when the film is not deformed. When the film deformed by the above reason is applied to the adhesive tape, it is difficult to follow the adherend. Further, when the film in which the stress strain is accumulated due to the above-described causes is applied to the adhesive tape, the adherend is bonded to the adherend, and the stress and strain are naturally released to cause the adherend to be damaged. For the use of adhesive tape for semiconductor processing In the case of a shape, since the semiconductor wafer as the adherend is made of a brittle material, it is easily embrittled or defective.

因此,若將由於上述原因而發生變形之膜應用於黏著帶,則難以追隨半導體晶圓之微細且精緻之電路圖案進行貼合。又,若將由於上述原因而累積有應力應變之膜應用於黏著帶,則於貼合於半導體晶圓之後,由於該應力應變自然釋放而使半導體晶圓容易受到破損。 Therefore, when a film deformed by the above reason is applied to an adhesive tape, it is difficult to follow the fine and delicate circuit pattern of the semiconductor wafer. Further, when a film in which stress strain is accumulated due to the above-described causes is applied to an adhesive tape, the semiconductor wafer is easily bonded to the semiconductor wafer, and the semiconductor wafer is easily damaged.

特別是用於LED之晶圓係由氮化鎵、砷化鎵及碳化矽等非常脆之材料構成。因此,防止用於LED切割等之黏著帶中之黏連變得極其重要。 In particular, wafers for LEDs are composed of very brittle materials such as gallium nitride, gallium arsenide, and tantalum carbide. Therefore, it is extremely important to prevent adhesion in an adhesive tape for LED cutting or the like.

作為防止黏連之先前技術,大致可列舉2種技術。 As a prior art for preventing adhesion, two kinds of techniques can be roughly cited.

作為一種先前技術,可列舉對膜之背面實施壓紋加工等物理處理(專利文獻2)。然而,該技術之問題在於,於膜之背面形成之凹凸成為應力集中結構,故於自輥狀形態進行退繞時,膜因退繞力而以該凹凸為起點開始撕裂或破損。 As a prior art, physical processing such as embossing is performed on the back surface of the film (Patent Document 2). However, this technique has a problem in that the unevenness formed on the back surface of the film serves as a stress concentration structure. Therefore, when unwinding from the roll form, the film starts to be torn or broken by the unevenness as a starting point due to the unwinding force.

作為另一種先前技術,可列舉將聚矽氧脫模劑塗佈於膜之背面上(專利文獻3)。然而,該技術之問題在於,聚矽氧脫模劑由於其表面張力而與膜背面之化學親和性較低,難以與膜背面相容。又,於將背面塗佈有聚矽氧脫模劑之膜應用於黏著帶之情形時,若對黏著帶進行擴展等延伸,則可能產生如下問題:有時利用聚矽氧脫模劑之處理層無法追隨延伸,該處理層發生破碎而導致污染。再者,亦有為提高聚矽氧脫模劑之與膜背面之化學親和性而塗佈交聯型聚矽氧脫模劑之技術,但交聯型聚矽氧通常伸長率非常 小,因此於將背面塗佈有交聯型聚矽氧脫模劑之膜應用於黏著帶之情形時,若對黏著帶進行擴展等延伸,則存在如下問題:利用交聯型聚矽氧脫模劑之處理層無法追隨延伸,從而無法維持固著性。 As another prior art, a polyfluorene oxygen release agent is applied to the back surface of the film (Patent Document 3). However, the problem with this technique is that the polyoxymethylene release agent has a low chemical affinity with the back surface of the film due to its surface tension, and is difficult to be compatible with the back surface of the film. Further, when a film having a polyfluorinated release agent coated on the back surface is applied to an adhesive tape, if the adhesive tape is stretched or the like, the following problems may occur: sometimes treatment with a polyfluorene release agent The layer cannot follow the extension, and the treatment layer is broken to cause contamination. Furthermore, there is also a technique for coating a cross-linked polyfluorinated mold release agent for improving the chemical affinity of the polyfluorene oxygen release agent to the back side of the film, but the crosslinked polyoxymethylene usually has a very high elongation. When the film having the back-coated polyfluorinated release agent coated on the back side is applied to the adhesive tape, if the adhesive tape is extended or the like, there is a problem in that the cross-linked polyfluorene is used. The treatment layer of the molding agent cannot follow the extension, so that the fixing property cannot be maintained.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本專利特開2009-239124號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2009-239124

[專利文獻2]國際公開第2009/028069號說明書 [Patent Document 2] International Publication No. 2009/028069

[專利文獻3]日本專利特開2010-201836號公報 [Patent Document 3] Japanese Patent Laid-Open Publication No. 2010-201836

本發明之課題在於提供一種黏著帶用膜,其係於基材膜上設置有非黏著層者,且於進行利用負壓之吸附固定之情形時可抑制發生過度密接,又,藉由在基材膜上設置非黏著層,可有效地抑制輥狀形態之黏連,於自輥狀形態退繞時不會撕裂或破損,該非黏著層與該基材膜之相容性較佳,對延伸等變形之追隨性良好。又,本發明之課題在於提供一種包含此種黏著帶用膜之黏著帶。 An object of the present invention is to provide a film for an adhesive tape which is provided with a non-adhesive layer on a base film, and which can suppress excessive adhesion when performing adsorption and fixation by a negative pressure, and The non-adhesive layer is disposed on the material film, which can effectively inhibit the adhesion of the roll form, and does not tear or break when unrolling from the roll form, and the non-adhesive layer has better compatibility with the base film, The follow-up of the deformation such as extension is good. Further, an object of the present invention is to provide an adhesive tape comprising such a film for an adhesive tape.

本發明之黏著帶用膜係於依據JIS-K-7127所測定之最大伸長率為100%以上之塑膠膜之單面包含非黏著層者,且該非黏著層之算術平均表面粗糙度Ra為0.1 μm以上。 The film for an adhesive tape of the present invention comprises a non-adhesive layer on one side of a plastic film having a maximum elongation of 100% or more as measured according to JIS-K-7127, and the arithmetic mean surface roughness Ra of the non-adhesive layer is 0.1. More than μm.

於較佳之實施形態中,上述非黏著層之非黏著試驗剝離力未達1.0 N/20 mm。 In a preferred embodiment, the non-adhesive layer has a non-adhesive test peel force of less than 1.0 N/20 mm.

於較佳之實施形態中,上述非黏著層為聚矽氧與(甲基)丙烯酸系聚合物之混合層。 In a preferred embodiment, the non-adhesive layer is a mixed layer of a polyoxymethylene and a (meth)acrylic polymer.

於較佳之實施形態中,上述非黏著層中之聚矽氧與(甲基)丙烯酸系聚合物之混合比以重量比計,為聚矽氧:(甲基)丙烯酸系聚合物=1:50~50:1。 In a preferred embodiment, the mixing ratio of the polyfluorene oxide to the (meth)acrylic polymer in the non-adhesive layer is polyoxyn:poly(meth)acrylic polymer=1:50 by weight ratio. ~50:1.

於較佳之實施形態中,上述非黏著層包含含有聚矽氧多於(甲基)丙烯酸系聚合物之富聚矽氧相、及含有(甲基)丙烯酸系聚合物多於聚矽氧之富(甲基)丙烯酸系聚合物相。 In a preferred embodiment, the non-adhesive layer comprises a polyfluorene-rich phase containing more poly(oxy)oxygen than a (meth)acrylic polymer, and a richer (meth)acrylic polymer than polyoxynium. (Meth)acrylic polymer phase.

於較佳之實施形態中,上述塑膠膜之厚度為20 μm~200 μm。 In a preferred embodiment, the plastic film has a thickness of 20 μm to 200 μm.

於較佳之實施形態中,上述非黏著層之厚度為0.01 μm~10 μm。 In a preferred embodiment, the non-adhesive layer has a thickness of 0.01 μm to 10 μm.

於較佳之實施形態中,上述塑膠膜包含聚氯乙烯。 In a preferred embodiment, the plastic film comprises polyvinyl chloride.

於本發明之另一實施形態中,提供一種黏著帶。本發明之黏著帶於本發明之黏著帶用膜中的上述塑膠膜之與上述非黏著層相反之面上包含黏著劑層。 In another embodiment of the invention, an adhesive tape is provided. The adhesive tape of the present invention comprises an adhesive layer on the opposite side of the non-adhesive layer of the plastic film in the film for an adhesive tape of the present invention.

於較佳之實施形態中,上述黏著劑層包含(甲基)丙烯酸系聚合物。 In a preferred embodiment, the adhesive layer comprises a (meth)acrylic polymer.

於較佳之實施形態中,上述黏著劑層之SP值為9.0(cal/cm3)0.5~12.0(cal/cm3)0.5In a preferred embodiment, the adhesive layer has an SP value of 9.0 (cal/cm 3 ) of 0.5 to 12.0 (cal/cm 3 ) 0.5 .

於較佳之實施形態中,於上述黏著劑層之表面包含剝離襯墊。 In a preferred embodiment, a release liner is included on the surface of the adhesive layer.

於較佳之實施形態中,本發明之黏著帶用於半導體加工。 In a preferred embodiment, the adhesive tape of the present invention is used in semiconductor processing.

於較佳之實施形態中,上述半導體加工為LED切割。 In a preferred embodiment, the semiconductor processing is LED dicing.

根據本發明,可提供一種黏著帶用膜,其係於基材膜上設置有非黏著層者,且於進行利用負壓之吸附固定之情形時可抑制發生過度密接,又,藉由在基材膜上設置非黏著層,可有效地抑制輥狀形態之黏連,於自輥狀形態退繞時不會撕裂或破損,該非黏著層與該基材膜之相容性較佳,對延伸等變形之追隨性良好。又,本發明可提供一種包含此種黏著帶用膜之黏著帶。 According to the present invention, it is possible to provide a film for an adhesive tape which is provided with a non-adhesive layer on a substrate film, and which suppresses excessive adhesion when performing adsorption fixation by a negative pressure, and The non-adhesive layer is disposed on the material film, which can effectively inhibit the adhesion of the roll form, and does not tear or break when unrolling from the roll form, and the non-adhesive layer has better compatibility with the base film, The follow-up of the deformation such as extension is good. Further, the present invention can provide an adhesive tape comprising the film for such an adhesive tape.

<<1.黏著帶用膜>> <<1. Adhesive tape film>>

本發明之黏著帶用膜於塑膠膜之單面包含非黏著層。 The film for an adhesive tape of the present invention comprises a non-adhesive layer on one side of the plastic film.

<1-1.塑膠膜> <1-1. Plastic film>

塑膠膜依據JIS-K-7127所測定之最大伸長率(MD)為100%以上、較佳為200%以上、最佳為300%以上。作為最大伸長率(MD)之上限值,較佳為1000%以下。此種塑膠膜可含有任意適合之樹脂材料。作為此種樹脂材料,較佳為例如列舉聚氯乙烯、聚烯烴、聚酯、聚醯亞胺、聚醯胺等,更佳為列舉聚氯乙烯、聚烯烴,進而較佳為列舉聚氯乙烯。聚氯乙烯由於應力緩和性優異,因此可較佳地用於特別是如下黏著帶用膜,該黏著帶用膜可用於LED切割等半導體加工所使用之黏著帶中。 The maximum elongation (MD) of the plastic film measured in accordance with JIS-K-7127 is 100% or more, preferably 200% or more, and most preferably 300% or more. The upper limit of the maximum elongation (MD) is preferably 1000% or less. Such a plastic film may contain any suitable resin material. As such a resin material, for example, polyvinyl chloride, polyolefin, polyester, polyimide, polyamine or the like is preferable, and polyvinyl chloride, polyolefin, and more preferably polyvinyl chloride are exemplified. . Polyvinyl chloride is excellent in stress relaxation property, and therefore can be preferably used for a film for an adhesive tape which can be used for an adhesive tape used for semiconductor processing such as LED cutting.

作為塑膠膜中之上述樹脂材料之含有比例,可根據目的及用途而設定為任意適合之含有比例。作為此種含有比 例,例如較佳為50重量%~100重量%,更佳為60重量%~100重量%,進而較佳為70重量%~100重量%。 The content ratio of the above-mentioned resin material in the plastic film can be set to any suitable content ratio depending on the purpose and use. As such a content ratio For example, it is preferably 50% by weight to 100% by weight, more preferably 60% by weight to 100% by weight, still more preferably 70% by weight to 100% by weight.

於塑膠膜中亦可含有塑化劑。塑膠膜中之塑化劑之含有比例相對於該塑膠膜中之上述樹脂材料,較佳為0.5重量%~50重量%,更佳為1.0重量%~40重量%。藉由在塑膠膜中以上述含有比例含有塑化劑,可使對延伸等變形之追隨性變得更加良好。 A plasticizer may also be contained in the plastic film. The content of the plasticizer in the plastic film is preferably from 0.5% by weight to 50% by weight, more preferably from 1.0% by weight to 40% by weight, based on the above-mentioned resin material in the plastic film. By including the plasticizer in the above-mentioned content ratio in the plastic film, the followability to deformation such as stretching can be further improved.

作為上述塑化劑,例如可列舉:鄰苯二甲酸酯系、偏苯三甲酸酯系(由大日本油墨股份有限公司製造之W-700及偏苯三甲酸三辛酯等)、己二酸酯系(由J-PLUS股份有限公司製造之D620、己二酸二辛酯及己二酸二異壬酯等)、磷酸酯系(磷酸三甲苯酯等)、己二酸系酯、檸檬酸酯(乙醯基檸檬酸三丁酯等)、癸二酸酯、壬二酸酯、順丁烯二酸酯、苯甲酸酯、聚醚系聚酯、環氧系聚酯(環氧化豆油及環氧化亞麻籽油等)、及聚酯(包含羧酸及二醇之低分子聚酯等)等。於本發明中,較佳為使用酯系塑化劑。塑化劑可僅為1種,亦可為2種以上。 Examples of the plasticizer include a phthalic acid ester type, a trimellitic acid ester type (W-700 manufactured by Dainippon Ink Co., Ltd., and trioctyl trimellitate). Acid ester (D620 manufactured by J-PLUS Co., Ltd., dioctyl adipate and diisononyl adipate), phosphate ester (such as tricresyl phosphate), adipic acid ester, lemon Ester (Ethyl triethyl citrate, etc.), sebacate, sebacate, maleate, benzoate, polyether polyester, epoxy polyester (epoxidation) Soybean oil and epoxidized linseed oil, etc., and polyester (including low molecular weight polyesters of carboxylic acids and diols). In the present invention, an ester-based plasticizer is preferably used. The plasticizer may be used alone or in combination of two or more.

於塑膠膜中,亦可於不損及本發明之效果之範圍內含有任意適合之其他成分。 In the plastic film, any other suitable component may be contained within a range that does not impair the effects of the present invention.

塑膠膜之厚度較佳為20 μm~200 μm、更佳為40 μm~150 μm、進而較佳為50 μm~100 μm。於塑膠膜之厚度未達20 μm之情形時,有操作性變差之虞,特別是於構成黏著帶時,有貼合作業變得困難之虞。若塑膠膜之厚度大於200 μm,則有對延伸等變形之追隨性變差之虞。 The thickness of the plastic film is preferably from 20 μm to 200 μm, more preferably from 40 μm to 150 μm, and even more preferably from 50 μm to 100 μm. When the thickness of the plastic film is less than 20 μm, there is a problem that the workability is deteriorated, and particularly when the adhesive tape is formed, it is difficult to attach the cooperation industry. If the thickness of the plastic film is more than 200 μm, there is a problem that the followability to deformation such as elongation is deteriorated.

<1-2.非黏著層> <1-2. Non-adhesive layer>

非黏著層之算術平均表面粗糙度Ra為0.1 μm以上、較佳為0.1 μm~3.0 μm、更佳為0.2 μm~2.0 μm。藉由將非黏著層之算術平均表面粗糙度Ra控制在上述範圍內,可於進行利用負壓之吸附固定之情形時抑制發生過度密接。於本發明中,非黏著層之算術平均表面粗糙度Ra係基於下述方法而測定。 The arithmetic mean surface roughness Ra of the non-adhesive layer is 0.1 μm or more, preferably 0.1 μm to 3.0 μm, more preferably 0.2 μm to 2.0 μm. By controlling the arithmetic mean surface roughness Ra of the non-adhesive layer within the above range, it is possible to suppress excessive adhesion when the adsorption by the negative pressure is performed. In the present invention, the arithmetic mean surface roughness Ra of the non-adhesive layer is measured based on the following method.

非黏著層之非黏著試驗剝離力較佳為未達1.0 N/20 mm、更佳為未達0.5 N/20 mm、進而較佳為未達0.2 N/20 mm。藉由將非黏著層之非黏著試驗剝離力控制在上述範圍內,可於進行利用負壓之吸附固定之情形時進一步抑制發生過度密接。於本發明中,非黏著層之非黏著試驗剝離力係基於下述方法而測定。 The non-adhesive test peeling force of the non-adhesive layer is preferably less than 1.0 N/20 mm, more preferably less than 0.5 N/20 mm, and even more preferably less than 0.2 N/20 mm. By controlling the non-adhesive test peeling force of the non-adhesive layer to the above range, it is possible to further suppress excessive adhesion when the adsorption by the negative pressure is performed. In the present invention, the non-adhesive test peeling force of the non-adhesive layer was measured based on the following method.

非黏著層較佳為聚矽氧與(甲基)丙烯酸系聚合物之混合層。藉由將非黏著層設為聚矽氧與(甲基)丙烯酸系聚合物之混合層,可使非黏著層與塑膠膜之相容性變得良好,從而使本發明之黏著帶用膜及包含其之黏著帶成為對延伸等變形之追隨性良好者。 The non-adhesive layer is preferably a mixed layer of a polyfluorene oxide and a (meth)acrylic polymer. By using the non-adhesive layer as a mixed layer of polyoxymethylene and (meth)acrylic polymer, the compatibility between the non-adhesive layer and the plastic film can be improved, and the adhesive tape film of the present invention and The adhesive tape including the same has a good followability to deformation such as extension.

非黏著層中之聚矽氧與(甲基)丙烯酸系聚合物之混合比以重量比計,較佳為聚矽氧:(甲基)丙烯酸系聚合物=1:50~50:1,更佳為聚矽氧:(甲基)丙烯酸系聚合物=1:30~30:1,進而較佳為聚矽氧:(甲基)丙烯酸系聚合物=1:10~10:1,尤佳為聚矽氧:(甲基)丙烯酸系聚合物=1:5~5:1,最佳為聚矽氧:(甲基)丙烯酸系聚合物=1:3~5:1。若 非黏著層中之聚矽氧之含有比例過大,則有非黏著層與塑膠膜背面之化學親和性降低,難以與塑膠膜背面相容之虞。又,若非黏著層中之聚矽氧之含有比例過大,則於形成黏著帶用膜或包含其之黏著帶之情形時,有對延伸等變形之追隨性變差,非黏著層發生破裂而導致污染之虞。 The mixing ratio of the polyoxymethylene to the (meth)acrylic polymer in the non-adhesive layer is preferably a polyoxyn: (meth)acrylic polymer = 1:50 to 50:1 by weight ratio. Preferably, the poly(oxymethylene) polymer: (meth)acrylic polymer = 1:30 to 30:1, and more preferably polyfluorene: (meth)acrylic polymer = 1:10 to 10:1, preferably It is a polyoxymethylene: (meth)acrylic polymer = 1:5 to 5:1, and most preferably polyoxyl: (meth)acrylic polymer = 1:3 to 5:1. If When the proportion of the polyoxyl oxide in the non-adhesive layer is too large, the chemical affinity between the non-adhesive layer and the back surface of the plastic film is lowered, and it is difficult to be compatible with the back surface of the plastic film. Further, if the content ratio of the polyfluorene oxide in the non-adhesive layer is too large, when the film for an adhesive tape or the adhesive tape containing the same is formed, the followability to deformation such as elongation is deteriorated, and the non-adhesive layer is broken. The blasphemy of pollution.

若非黏著層中之(甲基)丙烯酸系聚合物之含有比例過大,則有非黏著層作為丙烯酸系黏著劑發揮作用之虞,從而有容易發生黏連之虞。非黏著層較佳為包含含有聚矽氧多於(甲基)丙烯酸系聚合物之富聚矽氧相、及含有(甲基)丙烯酸系聚合物多於聚矽氧之富(甲基)丙烯酸系聚合物相。更具體而言,非黏著層較佳為以彼此獨立之相分離結構含有上述富聚矽氧相及上述富(甲基)丙烯酸系聚合物相,更佳為上述富聚矽氧相存在於空氣界面側(與塑膠膜相反之側),上述富(甲基)丙烯酸系聚合物相存在於塑膠膜側。藉由具有此種相分離結構,可利用存在於空氣界面側之富聚矽氧相有效地抑制黏連,利用存在於塑膠膜側之富(甲基)丙烯酸系聚合物相使非黏著層與塑膠膜之相容性變好,而使變形追隨性變得良好。藉由如上所述般調整非黏著層中之聚矽氧與(甲基)丙烯酸系聚合物之混合比,可形成此種相分離結構。 If the content ratio of the (meth)acrylic polymer in the non-adhesive layer is too large, the non-adhesive layer acts as an acrylic adhesive, and adhesion tends to occur easily. The non-adhesive layer preferably comprises a polyfluorene-rich phase containing more poly(oxy)oxygen than the (meth)acrylic polymer, and a rich (meth)acrylic acid containing more (poly)oxyl (meth)acrylic polymer. It is a polymer phase. More specifically, the non-adhesive layer preferably contains the above-mentioned rich polyoxygen phase and the above-mentioned rich (meth)acrylic polymer phase in a phase separation structure independent of each other, and more preferably the above-mentioned rich polyoxygen phase exists in the air. On the interface side (the side opposite to the plastic film), the above-mentioned rich (meth)acrylic polymer phase is present on the plastic film side. By having such a phase separation structure, the enriched xenon phase existing on the air interface side can be used to effectively inhibit adhesion, and the non-adhesive layer can be made by using the rich (meth)acrylic polymer phase present on the plastic film side. The compatibility of the plastic film is improved, and the deformation followability becomes good. Such a phase separation structure can be formed by adjusting the mixing ratio of the polyfluorene oxide and the (meth)acrylic polymer in the non-adhesive layer as described above.

藉由使非黏著層具有如上所述之相分離結構,較佳為可使該非黏著層之表面形成算術平均表面粗糙度Ra為0.1 μm以上之微小凹凸結構。推測凹凸可能係藉由相分離結構生成時之聚矽氧與(甲基)丙烯酸系聚合物之物質移動性之差 異而生成。藉由形成該凹凸之結構,可使本發明之黏著帶用膜於進行利用負壓之吸附固定之情形時抑制發生過度密接,並且可有效地抑制輥狀形態之黏連,而可抑制自輥狀形態退繞時發生撕裂或破損。 By providing the non-adhesive layer with the phase separation structure as described above, it is preferable that the surface of the non-adhesive layer is formed with a minute uneven structure having an arithmetic mean surface roughness Ra of 0.1 μm or more. It is speculated that the unevenness may be the difference in the mobility of the poly(oxy)oxygen and the (meth)acrylic polymer when the phase separation structure is formed. Generated separately. By forming the structure of the concavities and convexities, the film for an adhesive tape of the present invention can be prevented from being excessively adhered when the film is adsorbed and fixed by a negative pressure, and the adhesion of the roll-like form can be effectively suppressed, and the self-rolling can be suppressed. Tearing or breakage occurs when the shape is unwound.

非黏著層包含如上所述之含有聚矽氧多於(甲基)丙烯酸系聚合物之富聚矽氧相、及含有(甲基)丙烯酸系聚合物多於聚矽氧之富(甲基)丙烯酸系聚合物相可藉由任意適當之方法而觀察到。作為此種方法,例如可列舉使用穿透式電子顯微鏡(TEM)、掃描式電子顯微鏡(SEM)及場發射掃描式電子顯微鏡(FE-SEM)等電子顯微鏡對非黏著層剖面之形態進行觀察之方法。雙層分離結構可根據形態觀察影像之濃淡而辨認。又,亦可列舉藉由如下方式進行觀察之方法:藉由利用全反射法之紅外吸收分光,一面自非黏著層空氣界面側向內部改變探測光深度,一面觀測組成中所含之矽或碳等之含量變化。除此以外,亦可列舉藉由X射線微量分析儀或X射線光電子分光進行觀察之方法。 The non-adhesive layer comprises a polyfluorene-rich phase containing more poly(oxy)oxygen than the (meth)acrylic polymer as described above, and a rich (meth)acrylic polymer containing more polyoxymethylene (methyl) The acrylic polymer phase can be observed by any suitable method. As such a method, for example, an electron microscope such as a transmission electron microscope (TEM), a scanning electron microscope (SEM), or a field emission scanning electron microscope (FE-SEM) can be used to observe the morphology of the non-adhesive layer profile. method. The two-layer separation structure can be identified based on the faintness of the observed image. Further, a method of observing by observing the depth of the probe light from the side of the non-adhesive layer air to the inside while observing the depth of the probe light by the infrared absorption spectroscopy of the total reflection method while observing the ruthenium or carbon contained in the composition Such as the content changes. In addition to this, a method of observation by an X-ray microanalyzer or X-ray photoelectron spectroscopy may be mentioned.

又,亦可適當組合該等方法進行觀察。作為聚矽氧,可採用任意適合之聚矽氧。作為此種聚矽氧,例如可列舉如下等:加成型聚矽氧,其係以鉑系化合物作為觸媒,使含烯基之聚二烷基矽氧烷與聚二烷基氫聚矽氧烷進行加成反應,藉此硬化而形成剝離性皮膜所獲得;及縮合型聚矽氧,其係使用錫系觸媒,使含羥甲基之聚二烷基矽氧烷與聚二烷基氫聚矽氧烷進行反應而獲得。作為加成型聚矽氧之例,例如可列舉由信越有機矽(Shin-Etsu Silicones)製造 之「KS-776A」及「KS-839L」等。作為縮合型聚矽氧之例,例如可列舉由信越有機矽製造之「KS723A/B」等。再者,製造聚矽氧時,除了鉑系觸媒或錫系觸媒以外,亦可適當使用其他交聯劑、交聯促進劑等。又,作為聚矽氧之性狀,可分類為溶解於甲苯等有機溶劑中之類型、將該等乳化而成之乳液型、由聚矽氧構成之非溶劑型等。又,除了加成型聚矽氧或縮合型聚矽氧以外,亦可使用聚矽氧/丙烯酸系接枝聚合物、聚矽氧/丙烯酸系嵌段聚合物等。作為聚矽氧/丙烯酸系接枝聚合物,例如可列舉Symac GS-30、GS101、US-270、US-350及US-380(以上均由日本東亞合成股份有限公司(TOAGOSEI CO.,LTD.)製造)等。作為聚矽氧/丙烯酸系嵌段聚合物,例如可列舉Modiper FS700、FS710、FS720、FS730及FS770(以上均由日油股份有限公司(NOF CORPORATION)製造)等。 Further, these methods can be combined as appropriate for observation. As the polyoxygen oxide, any suitable polyoxane can be used. Examples of such a polyfluorene oxide include, for example, addition of polyfluorene oxide, which is a platinum-based compound as a catalyst, and an alkenyl group-containing polydialkyloxirane and a polydialkylhydrogenpolyoxyl An alkane is subjected to an addition reaction to thereby form a release film by hardening; and a condensation type polyoxane is a tin-based catalyst, and a hydroxymethyl group-containing polydialkyloxirane and a polydialkyl group are used. Hydrogen polyoxyalkylene is obtained by carrying out a reaction. As an example of the addition of polyfluorene oxide, for example, it can be produced by Shin-Etsu Silicones. "KS-776A" and "KS-839L", etc. Examples of the condensed polyfluorene oxide include "KS723A/B" manufactured by Shin-Etsu Chemical Co., Ltd., and the like. Further, in the production of polyfluorene oxide, other crosslinking agents, crosslinking accelerators, and the like may be suitably used in addition to the platinum-based catalyst or the tin-based catalyst. Further, the properties of polyfluorene oxide can be classified into a type dissolved in an organic solvent such as toluene, an emulsion type obtained by emulsifying the same, a non-solvent type composed of polyfluorene oxide, and the like. Further, in addition to the addition of polyfluorene oxide or condensed polyfluorene oxide, a polyfluorene/acrylic graft polymer, a polyfluorene/acrylic block polymer or the like may be used. Examples of the polyoxyn/acrylic graft polymer include Symac GS-30, GS101, US-270, US-350, and US-380 (all of which are by TOAGOSEI CO., LTD.). ) Manufacturing) and so on. Examples of the polyoxyn/acrylic block polymer include Modiper FS700, FS710, FS720, FS730, and FS770 (all of which are manufactured by NOF CORPORATION).

作為(甲基)丙烯酸系聚合物,可採用任意適合之(甲基)丙烯酸系聚合物。再者,於本發明中,「(甲基)丙烯酸系」係指「丙烯酸系及/或甲基丙烯酸系」。 As the (meth)acrylic polymer, any suitable (meth)acrylic polymer can be used. In the present invention, "(meth)acrylic" means "acrylic and/or methacrylic".

上述(甲基)丙烯酸系聚合物為由含有(甲基)丙烯酸系單體作為主要單體之單體成分構成之聚合物。構成上述(甲基)丙烯酸系聚合物之單體成分中的(甲基)丙烯酸系單體之含有比例較佳為50重量%以上,更佳為70重量%~100重量%,進而較佳為90重量%~100重量%,尤佳為95重量%~100重量%。上述單體成分中之單體可僅為1種,亦可為2種以上。 The (meth)acrylic polymer is a polymer composed of a monomer component containing a (meth)acrylic monomer as a main monomer. The content ratio of the (meth)acrylic monomer in the monomer component constituting the (meth)acrylic polymer is preferably 50% by weight or more, more preferably 70% by weight to 100% by weight, still more preferably 90% by weight to 100% by weight, particularly preferably 95% by weight to 100% by weight. The monomer in the monomer component may be one type or two or more types.

作為(甲基)丙烯酸系單體,較佳為列舉(甲基)丙烯酸酯、(甲基)丙烯酸。 The (meth)acrylic monomer is preferably (meth)acrylate or (meth)acrylic acid.

作為(甲基)丙烯酸酯,例如可列舉碳數1~30之烷基(亦包括環烷基)之(甲基)丙烯酸烷基酯、及含羥基之(甲基)丙烯酸酯等。(甲基)丙烯酸酯可僅為1種,亦可為2種以上。 Examples of the (meth) acrylate include an alkyl (meth) acrylate having an alkyl group having 1 to 30 carbon atoms (including a cycloalkyl group), and a hydroxyl group-containing (meth) acrylate. The (meth) acrylate may be used alone or in combination of two or more.

作為碳數1~30之烷基(亦包括環烷基)之(甲基)丙烯酸烷基酯,例如可列舉如下者等:(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丙酯、(甲基)丙烯酸異丙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第二丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸戊酯(pentyl(meth)acrylate)、(甲基)丙烯酸戊酯(amyl(meth)acrylate)、(甲基)丙烯酸己酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸庚酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸辛酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸壬酯、(甲基)丙烯酸異壬酯、(甲基)丙烯酸癸酯、(甲基)丙烯酸異癸酯、(甲基)丙烯酸十一烷基酯、(甲基)丙烯酸十二烷基酯、(甲基)丙烯酸十三烷基酯、(甲基)丙烯酸十四烷基酯、(甲基)丙烯酸十五烷基酯、(甲基)丙烯酸十八烷基酯、(甲基)丙烯酸十九烷基酯、(甲基)丙烯酸二十烷基酯及(甲基)丙烯酸月桂酯等之碳數為1~30之烷基(亦包括環烷基)之(甲基)丙烯酸烷基酯。該等(甲基)丙烯酸酯中,較佳為碳數2~20之烷基(亦包括環烷基)之(甲基)丙烯酸烷基酯,更佳為碳數4~18之烷基(亦包括環烷基)之(甲基)丙烯酸烷基酯。 Examples of the alkyl (meth)acrylate having an alkyl group having 1 to 30 carbon atoms (including a cycloalkyl group) include methyl (meth)acrylate and ethyl (meth)acrylate. Methyl) propyl acrylate, isopropyl (meth) acrylate, butyl (meth) acrylate, isobutyl (meth) acrylate, second butyl (meth) acrylate, third (meth) acrylate Butyl ester, pentyl (meth)acrylate, amyl(meth)acrylate, hexyl (meth)acrylate, cyclohexyl (meth)acrylate, Heptyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, octyl (meth)acrylate, isooctyl (meth)acrylate, decyl (meth)acrylate, (meth)acrylic acid Isodecyl ester, decyl (meth)acrylate, isodecyl (meth)acrylate, undecyl (meth)acrylate, dodecyl (meth)acrylate, thirteen (meth)acrylate Alkyl ester, tetradecyl (meth) acrylate, pentadecyl (meth) acrylate, octadecyl (meth) acrylate, pentadecyl (meth) acrylate, (a) Ethyl acrylate and (meth) acrylate Lauryl acid ester having a carbon number of an alkyl group having 1 to 30 (and also including cycloalkyl) the (meth) acrylate. Among the (meth) acrylates, an alkyl (meth) acrylate having an alkyl group having 2 to 20 carbon atoms (including a cycloalkyl group) is preferred, and an alkyl group having 4 to 18 carbon atoms is more preferred. Also included are alkyl (meth)acrylates of cycloalkyl).

作為含羥基之(甲基)丙烯酸酯,例如可列舉:(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基丙酯及(甲基)丙烯酸4-羥基丁酯。特別是於本發明中,構成剝離層之(甲基)丙烯酸系聚合物較佳為使含羥基之(甲基)丙烯酸酯共聚合而獲得之聚合物。 Examples of the hydroxyl group-containing (meth) acrylate include 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, and 4-hydroxybutyl (meth)acrylate. In particular, in the present invention, the (meth)acrylic polymer constituting the release layer is preferably a polymer obtained by copolymerizing a hydroxyl group-containing (meth) acrylate.

為充分表現本發明之效果,構成上述(甲基)丙烯酸系聚合物之單體成分亦可含有選自含羥基之單體及含羧基之單體中之至少一種。 In order to sufficiently exhibit the effects of the present invention, the monomer component constituting the (meth)acrylic polymer may further contain at least one selected from the group consisting of a hydroxyl group-containing monomer and a carboxyl group-containing monomer.

作為含羥基之單體,例如可列舉烯丙醇等。含羥基之單體可僅為1種,亦可為2種以上。 Examples of the hydroxyl group-containing monomer include allyl alcohol and the like. The hydroxyl group-containing monomer may be used alone or in combination of two or more.

作為含羧基之單體,例如可列舉:(甲基)丙烯酸羧基乙酯、(甲基)丙烯酸羧基戊酯、巴豆酸、順丁烯二酸、反丁烯二酸及伊康酸等。含羧基之單體可僅為1種,亦可為2種以上。 Examples of the carboxyl group-containing monomer include carboxyethyl (meth)acrylate, carboxypentyl (meth)acrylate, crotonic acid, maleic acid, fumaric acid, and itaconic acid. The carboxyl group-containing monomer may be used alone or in combination of two or more.

(甲基)丙烯酸系聚合物可藉由任意適合之聚合方法而製造。 The (meth)acrylic polymer can be produced by any suitable polymerization method.

於非黏著層中,亦可於不損及本發明之效果之範圍內含有任意適合之添加劑。作為此種添加劑,例如可列舉觸媒、紫外線吸收劑、填充劑、抗老化劑、黏著賦予劑、顏料、染料及矽烷偶合劑等。 In the non-adhesive layer, any suitable additive may be contained within a range that does not impair the effects of the present invention. Examples of such an additive include a catalyst, an ultraviolet absorber, a filler, an anti-aging agent, an adhesion-imparting agent, a pigment, a dye, and a decane coupling agent.

非黏著層之厚度較佳為0.01 μm~10 μm、更佳為0.1 μm~5 μm、進而較佳為0.1 μm~2 μm。於非黏著層之厚度未達0.01 μm之情形時,容易發生黏連。若非黏著層之厚度大於10 μm,則有對延伸等變形之追隨性變差之虞。若 非黏著層之厚度小於0.01 μm,則有難以表現本發明之效果之虞,或難以製造之虞。 The thickness of the non-adhesive layer is preferably from 0.01 μm to 10 μm, more preferably from 0.1 μm to 5 μm, still more preferably from 0.1 μm to 2 μm. When the thickness of the non-adhesive layer is less than 0.01 μm, adhesion is likely to occur. If the thickness of the non-adhesive layer is more than 10 μm, there is a problem that the followability to deformation such as elongation is deteriorated. If When the thickness of the non-adhesive layer is less than 0.01 μm, it is difficult to express the effect of the present invention, or it is difficult to manufacture.

作為於塑膠膜之單面上形成非黏著層之方法,例如可列舉藉由在塑膠膜之單面上塗佈非黏著層用材料並加以乾燥而形成非黏著層之方法。作為上述塗佈方法,例如可列舉使用棒式塗佈機、凹版式塗佈機、旋塗機、輥塗機、刮刀塗佈機、塗敷器等之方法。 As a method of forming a non-adhesive layer on one surface of a plastic film, for example, a method of forming a non-adhesive layer by applying a material for a non-adhesive layer on one surface of a plastic film and drying it is exemplified. Examples of the coating method include a bar coater, a gravure coater, a spin coater, a roll coater, a knife coater, and an applicator.

<<2.黏著帶>> <<2. Adhesive tape>>

本發明之黏著帶於本發明之黏著帶用膜中的上述塑膠膜之與上述非黏著層相反之面上包含黏著劑層。 The adhesive tape of the present invention comprises an adhesive layer on the opposite side of the non-adhesive layer of the plastic film in the film for an adhesive tape of the present invention.

黏著劑層之厚度較佳為1.0 μm~30 μm、更佳為1.0 μm~20 μm、進而較佳為3.0 μm~15 μm。於黏著劑層之厚度未達1.0 μm之情形時,有無法表現充分之黏著力之虞。於黏著劑層之厚度大於30 μm之情形時,有根據用途而黏著力變得過大,被黏著體於剝離等時破碎之虞。 The thickness of the adhesive layer is preferably from 1.0 μm to 30 μm, more preferably from 1.0 μm to 20 μm, still more preferably from 3.0 μm to 15 μm. When the thickness of the adhesive layer is less than 1.0 μm, there is a possibility that sufficient adhesion cannot be exhibited. When the thickness of the adhesive layer is more than 30 μm, the adhesive force becomes excessive depending on the application, and the adhesive body is broken when peeled off or the like.

作為上述黏著劑層之材料,可於不損及本發明之效果之範圍內採用任意適合之黏著劑。 As the material of the above adhesive layer, any suitable adhesive can be employed within a range that does not impair the effects of the present invention.

作為黏著劑層之材料,例如可列舉:(甲基)丙烯酸系聚合物;天然橡膠;接枝有甲基丙烯酸甲酯等單體之特殊天然橡膠;及SBS、SBR、SEPS、SIS、SEBS、聚丁烯、聚異丁烯(polyisobutene)、聚異丁烯(polyisobutylene)丁基橡膠等合成橡膠等。該等之中,就剝離後被黏著體上之糊劑殘餘較少、具有高凝聚性、透明性優異之方面而言,較佳為(甲基)丙烯酸系聚合物。 Examples of the material of the adhesive layer include a (meth)acrylic polymer; a natural rubber; a special natural rubber grafted with a monomer such as methyl methacrylate; and SBS, SBR, SEPS, SIS, SEBS, Synthetic rubber such as polybutene, polyisobutene, polyisobutylene butyl rubber, and the like. Among these, a (meth)acrylic polymer is preferred because it has less residual residue on the adherend after peeling, has high cohesiveness, and is excellent in transparency.

於黏著劑層含有(甲基)丙烯酸系聚合物之情形時,黏著劑層中之(甲基)丙烯酸系聚合物之含有比例可根據目的而適當設定。 When the (meth)acrylic polymer is contained in the adhesive layer, the content ratio of the (meth)acrylic polymer in the adhesive layer can be appropriately set depending on the purpose.

上述(甲基)丙烯酸系聚合物為由含有(甲基)丙烯酸系單體作為主要單體之單體成分構成之樹脂。構成上述(甲基)丙烯酸系聚合物之單體成分中的(甲基)丙烯酸系單體之含有比例較佳為50重量%以上,更佳為70重量%~100重量%,進而較佳為90重量%~100重量%,尤佳為95重量%~100重量%。上述單體成分中之單體可僅為1種,亦可為2種以上。 The (meth)acrylic polymer is a resin composed of a monomer component containing a (meth)acrylic monomer as a main monomer. The content ratio of the (meth)acrylic monomer in the monomer component constituting the (meth)acrylic polymer is preferably 50% by weight or more, more preferably 70% by weight to 100% by weight, still more preferably 90% by weight to 100% by weight, particularly preferably 95% by weight to 100% by weight. The monomer in the monomer component may be one type or two or more types.

作為(甲基)丙烯酸系單體,較佳為列舉(甲基)丙烯酸酯、(甲基)丙烯酸。 The (meth)acrylic monomer is preferably (meth)acrylate or (meth)acrylic acid.

作為(甲基)丙烯酸酯,例如可列舉:碳數1~30之烷基(亦包括環烷基)之(甲基)丙烯酸烷基酯、及含羥基之(甲基)丙烯酸酯等。(甲基)丙烯酸酯可僅為1種,亦可為2種以上。 Examples of the (meth) acrylate include an alkyl (meth) acrylate having an alkyl group having 1 to 30 carbon atoms (including a cycloalkyl group), and a hydroxyl group-containing (meth) acrylate. The (meth) acrylate may be used alone or in combination of two or more.

作為碳數1~30之烷基(亦包括環烷基)之(甲基)丙烯酸烷基酯,例如可列舉如下者等:(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丙酯、(甲基)丙烯酸異丙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第二丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸戊酯(pentyl(meth)acrylate)、(甲基)丙烯酸戊酯(amyl(meth)acrylate)、(甲基)丙烯酸己酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸庚酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸辛酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸壬酯、 (甲基)丙烯酸異壬酯、(甲基)丙烯酸癸酯、(甲基)丙烯酸異癸酯、(甲基)丙烯酸十一烷基酯、(甲基)丙烯酸十二烷基酯、(甲基)丙烯酸十三烷基酯、(甲基)丙烯酸十四烷基酯、(甲基)丙烯酸十五烷基酯、(甲基)丙烯酸十八烷基酯、(甲基)丙烯酸十九烷基酯、(甲基)丙烯酸二十烷基酯及(甲基)丙烯酸月桂酯等之碳數為1~30之烷基(亦包括環烷基)之(甲基)丙烯酸烷基酯。於該等(甲基)丙烯酸酯中,較佳為碳數2~20之烷基(亦包括環烷基)之(甲基)丙烯酸烷基酯,更佳為碳數4~18之烷基(亦包括環烷基)之(甲基)丙烯酸烷基酯。 Examples of the alkyl (meth)acrylate having an alkyl group having 1 to 30 carbon atoms (including a cycloalkyl group) include methyl (meth)acrylate and ethyl (meth)acrylate. Methyl) propyl acrylate, isopropyl (meth) acrylate, butyl (meth) acrylate, isobutyl (meth) acrylate, second butyl (meth) acrylate, third (meth) acrylate Butyl ester, pentyl (meth)acrylate, amyl(meth)acrylate, hexyl (meth)acrylate, cyclohexyl (meth)acrylate, Heptyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, octyl (meth)acrylate, isooctyl (meth)acrylate, decyl (meth)acrylate, Isodecyl (meth)acrylate, decyl (meth)acrylate, isodecyl (meth)acrylate, undecyl (meth)acrylate, dodecyl (meth)acrylate, (A) Tridecyl acrylate, tetradecyl (meth) acrylate, pentadecyl (meth) acrylate, octadecyl (meth) acrylate, hexadecane (meth) acrylate A (meth)acrylic acid alkyl ester having a carbon number of 1 to 30 (including a cycloalkyl group) having a carbon number of 1 to 30, such as an alkyl ester of (meth)acrylate and a lauryl (meth)acrylate. Among the (meth) acrylates, an alkyl (meth) acrylate having an alkyl group having 2 to 20 carbon atoms (including a cycloalkyl group) is preferred, and an alkyl group having 4 to 18 carbon atoms is more preferred. (Alkylalkyl) (alkyl) alkyl (meth)acrylate.

作為含羥基之(甲基)丙烯酸酯,列舉可列舉:(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基丙酯及(甲基)丙烯酸4-羥基丁酯等。 Examples of the hydroxyl group-containing (meth) acrylate include 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, and 4-hydroxybutyl (meth)acrylate.

為充分表現作為黏著劑之效果,構成上述(甲基)丙烯酸系聚合物之單體成分較佳為含有選自含羥基之單體及含羧基之單體中之至少一種。更佳為含羧基之單體。又,為充分表現作為黏著劑之效果,構成上述(甲基)丙烯酸系聚合物之單體成分可含有丙烯腈。 In order to sufficiently exhibit the effect as an adhesive, the monomer component constituting the (meth)acrylic polymer preferably contains at least one selected from the group consisting of a hydroxyl group-containing monomer and a carboxyl group-containing monomer. More preferably, it is a monomer having a carboxyl group. Further, in order to sufficiently exhibit the effect as an adhesive, the monomer component constituting the (meth)acrylic polymer may contain acrylonitrile.

作為含羥基之單體,例如可列舉:(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基丙酯、(甲基)丙烯酸4-羥基丁酯及烯丙醇等。含羥基之單體可僅為1種,亦可為2種以上。 Examples of the hydroxyl group-containing monomer include 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, and allyl alcohol. The hydroxyl group-containing monomer may be used alone or in combination of two or more.

作為含羧基之單體,例如可列舉:(甲基)丙烯酸、(甲基)丙烯酸羧基乙酯、(甲基)丙烯酸羧基戊酯、巴豆酸、順丁烯二酸、反丁烯二酸及伊康酸等。含羧基之單體可僅為 1種,亦可為2種以上。 Examples of the carboxyl group-containing monomer include (meth)acrylic acid, carboxyethyl (meth)acrylate, carboxypentyl (meth)acrylate, crotonic acid, maleic acid, and fumaric acid. Ikonic acid and so on. The carboxyl group-containing monomer can only One type may be used in two or more types.

於構成上述(甲基)丙烯酸系聚合物之單體成分含有含羥基之單體之情形時,構成上述(甲基)丙烯酸系聚合物之單體成分中的含羥基之單體之含有比例較佳為0.1重量%~20重量%,更佳為0.1重量%~10重量%。於構成上述(甲基)丙烯酸系聚合物之單體成分含有含羧基之單體之情形時,構成上述(甲基)丙烯酸系聚合物之單體成分中的含羧基之單體之含有比例較佳為0.1重量%~20重量%,更佳為0.1重量%~10重量%。藉由如上述般使構成上述(甲基)丙烯酸系聚合物之單體成分含有選自含羥基之單體及含羧基之單體中之至少一種,於使用交聯劑之情形時,可有效地發生與該交聯劑之交聯反應,從而可充分表現作為黏著劑之效果。進而,藉由將構成上述(甲基)丙烯酸系聚合物之單體成分中的含羥基之單體之含有比例、及構成上述(甲基)丙烯酸系聚合物之單體成分中的含羧基之單體之含有比例調整於上述範圍內,可有效地防止剝離操作時被黏著體發生破碎。於構成上述(甲基)丙烯酸系聚合物之單體成分中的含羥基之單體之含有比例、或構成上述(甲基)丙烯酸系聚合物之單體成分中的含羧基之單體之含有比例相對於上述範圍過大之情形時,有黏著力變得過大,容易發生黏連之虞,又,有剝離操作時容易發生被黏著體之破碎之虞。 When the monomer component constituting the (meth)acrylic polymer contains a hydroxyl group-containing monomer, the content ratio of the hydroxyl group-containing monomer constituting the monomer component of the (meth)acrylic polymer is higher. It is preferably from 0.1% by weight to 20% by weight, more preferably from 0.1% by weight to 10% by weight. When the monomer component constituting the (meth)acrylic polymer contains a carboxyl group-containing monomer, the content ratio of the carboxyl group-containing monomer in the monomer component constituting the (meth)acrylic polymer is higher. It is preferably from 0.1% by weight to 20% by weight, more preferably from 0.1% by weight to 10% by weight. The monomer component constituting the (meth)acrylic polymer described above contains at least one selected from the group consisting of a hydroxyl group-containing monomer and a carboxyl group-containing monomer, and is effective when a crosslinking agent is used. The crosslinking reaction with the crosslinking agent occurs to sufficiently exhibit the effect as an adhesive. Further, the content ratio of the hydroxyl group-containing monomer in the monomer component constituting the (meth)acrylic polymer and the carboxyl group-containing content in the monomer component constituting the (meth)acrylic polymer The content ratio of the monomer is adjusted within the above range, and it is possible to effectively prevent the adhering body from being broken at the time of the peeling operation. The content ratio of the hydroxyl group-containing monomer in the monomer component constituting the (meth)acrylic polymer or the content of the carboxyl group-containing monomer in the monomer component constituting the (meth)acrylic polymer When the ratio is too large relative to the above range, the adhesive force becomes too large, and the adhesion tends to occur, and the peeling operation is likely to occur when the adhesive body is broken.

黏著劑層較佳為含有交聯劑。於黏著劑層含有交聯劑之情形時,黏著劑層中之交聯劑之含有比例可根據目的而適當設定,較佳為相對於主要樹脂成分(較佳為(甲基)丙烯酸 系聚合物),為0.1重量%~20重量%。藉由將黏著劑層中之交聯劑之含有比例控制在上述範圍內,可產生適度之交聯反應,而可有效地防止剝離操作時被黏著體發生破碎。 The adhesive layer preferably contains a crosslinking agent. In the case where the adhesive layer contains a crosslinking agent, the content ratio of the crosslinking agent in the adhesive layer can be appropriately set depending on the purpose, preferably relative to the main resin component (preferably (meth)acrylic acid). The polymer) is from 0.1% by weight to 20% by weight. By controlling the content ratio of the crosslinking agent in the adhesive layer within the above range, a moderate crosslinking reaction can be produced, and the fracture of the adhering body during the peeling operation can be effectively prevented.

作為交聯劑,例如可列舉:環氧系交聯劑、異氰酸酯系交聯劑、三聚氰胺系交聯劑、過氧化物系交聯劑、金屬醇鹽系交聯劑、金屬螯合物系交聯劑、金屬鹽系交聯劑、碳二醯亞胺系交聯劑、唑啉系交聯劑、氮丙啶系交聯劑、及胺系交聯劑等。於該等交聯劑中,就可充分表現本發明之效果之方面而言,較佳為三聚氰胺系交聯劑、環氧系交聯劑及異氰酸酯系交聯劑。又,交聯劑可根據需要適當選擇,可僅為1種,亦可為2種以上之混合系。 Examples of the crosslinking agent include an epoxy crosslinking agent, an isocyanate crosslinking agent, a melamine crosslinking agent, a peroxide crosslinking agent, a metal alkoxide crosslinking agent, and a metal chelate compound. A crosslinking agent, a metal salt crosslinking agent, a carbodiimide crosslinking agent, An oxazoline crosslinking agent, an aziridine crosslinking agent, and an amine crosslinking agent. Among these crosslinking agents, a melamine-based crosslinking agent, an epoxy-based crosslinking agent, and an isocyanate-based crosslinking agent are preferable in terms of sufficiently exhibiting the effects of the present invention. Further, the crosslinking agent may be appropriately selected as needed, and may be one type or a mixture of two or more types.

黏著劑層亦可含有塑化劑。於黏著劑層含有塑化劑之情形時,黏著劑層中之塑化劑之含有比例可根據目的適當設定,較佳為0.1重量%~50重量%。藉由將黏著劑層中之塑化劑之含有比例控制在上述範圍內,可進一步有效地表現本發明之效果。若黏著劑層中之塑化劑之含有比例大於50重量%,則有黏著劑層變得過於柔軟,容易發生糊劑殘餘或被黏著體污染之虞。 The adhesive layer may also contain a plasticizer. In the case where the adhesive layer contains a plasticizer, the content ratio of the plasticizer in the adhesive layer can be appropriately set according to the purpose, and is preferably from 0.1% by weight to 50% by weight. The effect of the present invention can be further effectively exhibited by controlling the content ratio of the plasticizer in the adhesive layer to the above range. If the content of the plasticizer in the adhesive layer is more than 50% by weight, the adhesive layer becomes too soft, and it is liable to cause residue of the paste or contamination by the adherend.

作為上述塑化劑,例如可列舉:鄰苯二甲酸酯系、偏苯三甲酸酯系(由大日本油墨股份有限公司製造之W-700及偏苯三甲酸三辛酯等)、己二酸酯系(由J-PLUS股份有限公司製造之D620、己二酸二辛酯及己二酸二異壬酯等)、磷酸酯系(磷酸三甲苯酯等)、己二酸系酯、檸檬酸酯(乙醯基檸檬酸三丁酯等)、癸二酸酯、壬二酸酯、順丁烯二酸酯、 苯甲酸酯、聚醚系聚酯、環氧系聚酯(環氧化豆油及環氧化亞麻籽油等)、及聚酯(包含羧酸及二醇之低分子聚酯等)等。於本發明中,較佳為使用酯系塑化劑。塑化劑可僅為1種,亦可為2種以上。為促進交聯反應等,黏著劑層亦可含有任意適合之觸媒。 Examples of the plasticizer include a phthalic acid ester type, a trimellitic acid ester type (W-700 manufactured by Dainippon Ink Co., Ltd., and trioctyl trimellitate). Acid ester (D620 manufactured by J-PLUS Co., Ltd., dioctyl adipate and diisononyl adipate), phosphate ester (such as tricresyl phosphate), adipic acid ester, lemon Acid esters (tributyl citrate, etc.), sebacate, sebacate, maleate, Benzoic acid ester, polyether polyester, epoxy polyester (such as epoxidized soybean oil and epoxidized linseed oil), and polyester (such as low molecular weight polyester containing carboxylic acid and diol). In the present invention, an ester-based plasticizer is preferably used. The plasticizer may be used alone or in combination of two or more. In order to promote the crosslinking reaction and the like, the adhesive layer may also contain any suitable catalyst.

於黏著劑層含有觸媒之情形時,黏著劑層中之觸媒之含有比例可根據目的適當設定,較佳為0.01重量%~10重量%。藉由將黏著劑層中之觸媒之含有比例控制在上述範圍內,可進一步有效地表現本發明之效果。 In the case where the adhesive layer contains a catalyst, the content ratio of the catalyst in the adhesive layer can be appropriately set according to the purpose, and is preferably 0.01% by weight to 10% by weight. The effect of the present invention can be further effectively exhibited by controlling the content ratio of the catalyst in the adhesive layer within the above range.

作為此種觸媒,例如可列舉:鈦酸四異丙酯、鈦酸四正丁酯、辛酸錫、辛酸鉛、辛酸鈷、辛酸鋅、辛酸鈣、環烷酸鉛、環烷酸鈷、二乙酸二丁基錫、二辛酸二丁基錫、二月桂酸二丁基錫、二月桂酸二辛基錫及順丁烯二酸二丁基錫等有機金屬化合物;丁胺、二丁胺、己胺、第三丁胺、乙二胺、異佛爾酮二胺、咪唑、氫氧化鋰、氫氧化鉀及甲醇鈉等鹼性化合物;及對甲苯磺酸、三氯乙酸、磷酸、單烷基磷酸、二烷基磷酸、丙烯酸β-羥基乙酯之磷酸酯、單烷基亞磷酸及二烷基亞磷酸等酸性化合物等。觸媒可僅為1種,亦可為2種以上。 Examples of such a catalyst include tetraisopropyl titanate, tetra-n-butyl titanate, tin octylate, lead octoate, cobalt octoate, zinc octoate, calcium octylate, lead naphthenate, cobalt naphthenate, and the like. Organometallic compounds such as dibutyltin acetate, dibutyltin dioctoate, dibutyltin dilaurate, dioctyltin dilaurate and dibutyltin maleate; butylamine, dibutylamine, hexylamine, tert-butylamine, Basic compounds such as ethylenediamine, isophoronediamine, imidazole, lithium hydroxide, potassium hydroxide and sodium methoxide; and p-toluenesulfonic acid, trichloroacetic acid, phosphoric acid, monoalkylphosphoric acid, dialkylphosphoric acid, An acidic compound such as a phosphate of β-hydroxyethyl acrylate, a monoalkylphosphite, or a dialkylphosphoric acid. The catalyst may be used alone or in combination of two or more.

為進一步表現本發明之效果,黏著劑層之SP值較佳為9.0(cal/cm3)0.5~12.0(cal/cm3)0.5、更佳為9.5(cal/cm3)0.5~11.0(cal/cm3)0.5。SP值係根據Small式而算出之溶解度參數。SP值之計算可藉由公知之文獻(例如,Journal of Applied Chemistry,3,71,1953)中記載之方法進行。 In order to further exhibit the effects of the present invention, the SP value of the adhesive layer is preferably 9.0 (cal/cm 3 ) 0.5 to 12.0 (cal/cm 3 ) 0.5 , more preferably 9.5 (cal/cm 3 ) 0.5 to 11.0 (cal /cm 3 ) 0.5 . The SP value is a solubility parameter calculated based on the Small formula. The calculation of the SP value can be carried out by a method described in a well-known literature (for example, Journal of Applied Chemistry, 3, 71, 1953).

於黏著劑層中,亦可於不損及本發明之效果之範圍內含有任意適合之添加劑。作為此種添加劑,例如可列舉:紫外線吸收劑、填充劑、防老化劑、黏著賦予劑、顏料、染料及矽烷偶合劑等。 In the adhesive layer, any suitable additive may be contained within a range that does not impair the effects of the present invention. Examples of such an additive include an ultraviolet absorber, a filler, an anti-aging agent, an adhesion-imparting agent, a pigment, a dye, and a decane coupling agent.

本發明之黏著帶亦可於黏著劑層表面包含剝離襯墊。 The adhesive tape of the present invention may also comprise a release liner on the surface of the adhesive layer.

作為剝離襯墊,可採用任意適合之分隔件。作為此種剝離襯墊,例如可列舉:藉由聚矽氧系、長鏈烷基系、氟系、硫化鉬等剝離劑進行表面處理之塑膠膜或紙等包含剝離層之基材;包含聚四氟乙烯、聚氯三氟乙烯、聚氟乙烯、聚偏二氟乙烯、四氟乙烯-六氟丙烯共聚物、及氯氟乙烯-偏二氟乙烯共聚物等氟系聚合物之低接著性基材;及包含烯烴系樹脂(例如聚乙烯、聚丙烯等)等非極性聚合物之低接著性基材等。本發明之黏著帶可用於任何適合之用途。 As the release liner, any suitable separator can be employed. Examples of such a release liner include a substrate comprising a release layer such as a plastic film or a paper surface-treated with a release agent such as a polyoxymethylene system, a long-chain alkyl group, a fluorine-based or a molybdenum sulfide; Low adhesion of fluorine-based polymers such as tetrafluoroethylene, polychlorotrifluoroethylene, polyvinyl fluoride, polyvinylidene fluoride, tetrafluoroethylene-hexafluoropropylene copolymer, and chlorofluoroethylene-vinylidene fluoride copolymer a substrate; and a low-adhesive substrate comprising a non-polar polymer such as an olefin resin (for example, polyethylene or polypropylene). The adhesive tape of the present invention can be used for any suitable purpose.

本發明之黏著帶包含本發明之黏著帶用膜,因此如上所述,於進行利用負壓之吸附固定之情形時可抑制發生過度密接,又,可有效地抑制輥狀形態之黏連,於自輥狀形態退繞時不會撕裂或破損,該非黏著層與該塑膠膜之相容性較佳,對延伸等變形之追隨性良好。因此,可較佳地用於將由脆性材料構成且可具有微細且精緻之電路圖案之半導體晶圓作為被黏著體之半導體加工。若將本發明之黏著帶用於半導體加工,則於進行利用負壓之吸附固定之情形時可抑制發生過度密接,因此可順利進行包括切割在內之半導體製造步驟。又,若將本發明之黏著帶用於半導體加 工,則不發生先前因黏連而產生之膜變形或應力應變之累積,因此可準確地追隨半導體晶圓之微細且精緻之電路圖案進行貼合,又,貼合於半導體晶圓後未發生應力應變之自然釋放,故可有效地防止半導體晶圓破碎。特別是用於LED之晶圓係由氮化鎵、砷化鎵、碳化矽等非常脆之材料構成,因此本發明之黏著帶非常適合用於LED切割等。 Since the adhesive tape of the present invention comprises the film for an adhesive tape of the present invention, as described above, when the adsorption by the negative pressure is performed, excessive adhesion can be suppressed, and the adhesion of the roll form can be effectively suppressed. The non-adhesive layer has good compatibility with the plastic film and has good followability to deformation such as elongation when it is unwound from the roll form. Therefore, it can be preferably used for processing a semiconductor wafer composed of a brittle material and having a fine and delicate circuit pattern as a semiconductor to be bonded. When the adhesive tape of the present invention is used for semiconductor processing, excessive adhesion can be suppressed when the adsorption by the negative pressure is performed, so that the semiconductor manufacturing step including the dicing can be smoothly performed. Moreover, if the adhesive tape of the present invention is used for semiconductor addition The work does not involve the accumulation of film deformation or stress strain caused by adhesion, so it can accurately follow the fine and delicate circuit pattern of the semiconductor wafer for bonding, and does not occur after bonding to the semiconductor wafer. The natural release of stress and strain can effectively prevent semiconductor wafer breakage. In particular, the wafer for LED is composed of a very brittle material such as gallium nitride, gallium arsenide or tantalum carbide. Therefore, the adhesive tape of the present invention is very suitable for LED cutting and the like.

[實施例] [Examples]

以下,藉由實施例具體說明本發明。然而,本發明不受該等實施例之任何限定。「份」係指「重量份」。又,以溶液形式供給之試劑之量係由使溶液揮發所殘留之固形物成分之量(固形物成分換算量)表示。 Hereinafter, the present invention will be specifically described by way of examples. However, the invention is not limited by the examples. “Parts” means “parts by weight”. Further, the amount of the reagent supplied as a solution is represented by the amount of the solid content (the amount of the solid content converted) remaining in the volatilization of the solution.

<最大伸長率> <maximum elongation>

最大伸長率係依據JIS-K-7127,藉由Instron型拉伸試驗機(由島津製作所製造,Autograph)而測定。具體而言,將寬20 mm×長100 mm之樣品以50 mm之夾具(chuck)間距離設置後,以0.3 m/min之拉伸速度進行拉伸,測定斷裂時之值。 The maximum elongation was measured by an Instron type tensile tester (manufactured by Shimadzu Corporation, Autograph) in accordance with JIS-K-7127. Specifically, a sample having a width of 20 mm and a length of 100 mm was set at a distance of a clamp of 50 mm, and then stretched at a tensile speed of 0.3 m/min, and the value at the time of fracture was measured.

<彈性模數> <Elastic Modulus>

彈性模數係依據JIS-K-7127而測定。 The modulus of elasticity was measured in accordance with JIS-K-7127.

<非黏著層之觀察> <Observation of non-adhesive layer> (利用TEM觀察) (using TEM observation)

以可觀察非黏著層剖面之方式進行加工後,利用穿透式電子顯微鏡(TEM)進行形態觀察。 Morphological observation was performed by a transmission electron microscope (TEM) after processing in a manner in which the non-adhesive layer profile was observed.

(藉由利用全反射法之紅外分光測定(ATR-IR)之觀察) (observed by infrared spectrometry (ATR-IR) using total reflection method)

使用紅外分光光譜儀(由珀金埃爾默公司(PerkinElmer)製造,Spectrum One),選擇全反射測定法,由於改變探測光之分析深度,故使用2種全反射測定用稜鏡(ZnSe45°、Ge45°)對非黏著層進行ATR-IR測定。 Using an infrared spectrometer (manufactured by PerkinElmer, Spectrum One), the total reflection measurement method was selected. Since the analysis depth of the probe light was changed, two types of total reflection measurement were used (ZnSe45°, Ge45). °) ATR-IR measurement was performed on the non-adhesive layer.

<算術平均表面粗糙度Ra> <Arithmetic average surface roughness Ra>

使用由奧林巴斯公司(OLYMPUS)製造之共軛焦雷射顯微鏡「LEXT3000」,利用20倍物鏡,以3D模式測定算術平均表面粗糙度Ra。3D模式之觀察範圍係藉由將上下移動透鏡時CF圖像(共焦圖像)變黑之位置分別設定為觀察範圍之頂部(Top)與底部(Bottom)而決定。 The arithmetic mean surface roughness Ra was measured in a 3D mode using a conjugated focal laser microscope "LEXT3000" manufactured by Olympus Corporation (OLYMPUS) using a 20-fold objective lens. The observation range of the 3D mode is determined by setting the positions where the CF image (confocal image) is blacked when the lens is moved up and down, respectively, to the top (Top) and bottom (Bottom) of the observation range.

3D模式之圖像掃描方法係以分級(Step)方式,以0.2 μm之間距進行圖像掃描。 The image scanning method of the 3D mode performs image scanning at intervals of 0.2 μm in a stepwise manner.

算術平均表面粗糙度Ra之測定係以分析模式之粗糙度分析測定任意部位之Ra。再者,粗糙度之值係以n=5之平均值求出。 The measurement of the arithmetic mean surface roughness Ra is performed by measuring the Ra of an arbitrary part by the roughness analysis of an analysis mode. Further, the value of the roughness is obtained by an average value of n=5.

<吸附試驗> <Adsorption test>

將黏著帶以背面成為外側之方式貼附於尺寸為20 mm(縱)×50 mm(橫)之載玻片上,將貼附有黏著帶之載玻片與成為被黏著體之載玻片(藍板磨邊品,尺寸:65 mm×165 mm×1.35 mmt)於50℃之環境下放置10分鐘,然後藉由2 Kg輥之一次往復運動將載玻片與黏著帶背面貼合,於50℃之環境下放置30分鐘。放置後,利用Instron型拉伸試驗機(由島津製作所製造,Autograph),以0.3 m/min之拉伸速度進行0°剝離。測定此時之剝離力,根據以下基準進行評 價。 Attach the adhesive tape to the glass slide of 20 mm (vertical) × 50 mm (horizontal) with the back side as the outer side, and attach the slide glass with the adhesive tape to the slide glass to be the adhesive body ( Blue plate edging, size: 65 mm × 165 mm × 1.35 mmt) placed in an environment of 50 ° C for 10 minutes, then the slide is attached to the back of the adhesive tape by a reciprocating motion of 2 Kg roller. Leave in a °C environment for 30 minutes. After standing, it was peeled off by 0° at a tensile speed of 0.3 m/min using an Instron type tensile tester (manufactured by Shimadzu Corporation, Autograph). The peeling force at this time was measured and evaluated according to the following criteria. price.

○:剝離力未達5 N。 ○: The peeling force was less than 5 N.

×:剝離力為5 N以上。 ×: The peeling force was 5 N or more.

<非黏著試驗剝離力> <non-adhesive test peeling force>

參考JIS-Z-0237,將被黏著體及包含非黏著層之黏著帶用膜或黏著帶於23℃保存之條件下保持1小時後,將非黏著面以8 kg/m之線壓及0.3 m/min之壓接速度壓接於SUS430BA上,以0.3 m/min之拉伸速度及180°剝離測定30分鐘後之剝離力。 Referring to JIS-Z-0237, the adhesive tape and the adhesive tape containing the non-adhesive layer are kept at 23 ° C for 1 hour, and the non-adhesive surface is pressed at a pressure of 8 kg/m and 0.3. The crimping speed of m/min was pressure-bonded to SUS430BA, and the peeling force after 30 minutes was measured at a tensile speed of 0.3 m/min and a peeling of 180°.

◎:未達0.5 N/20 mm。 ◎: Not up to 0.5 N/20 mm.

○:0.5 N/20 mm以上且未達1.0 N/20 mm。 ○: 0.5 N/20 mm or more and less than 1.0 N/20 mm.

×:1.0 N/20 mm以上。 ×: 1.0 N/20 mm or more.

<黏連試驗> <Adhesion test>

將黏著帶之黏著劑層面以8 Kg/m之線壓及0.3 m/min之壓接速度壓接於相同黏著帶之與黏著劑層為相反側之最外面(背面層),壓接後於50℃×48 hr之條件下進行保存。保存後,藉由180°剝離之剝離試驗,以0.3 m/min之拉伸速度進行剝離(依據JIS-Z-0237),測定黏著劑層面與背面層之黏連(剝離力)。 Adhesive layer of the adhesive tape is crimped at a pressure of 8 Kg/m and a crimping speed of 0.3 m/min to the outermost side (back layer) of the same adhesive tape opposite to the adhesive layer, after crimping Store at 50 ° C × 48 hr. After the storage, the adhesion was carried out at a tensile speed of 0.3 m/min by a peeling test at 180° (in accordance with JIS-Z-0237), and the adhesion (peeling force) between the adhesive layer and the back layer was measured.

評價係進行剝離力之測定,並且確認剝離時之背面層之脫落以及黏著劑層之破壞(由凝聚破壞、固著破壞引起之糊劑殘餘)等而進行綜合評價。評價係根據以下基準進行。 In the evaluation, the peeling force was measured, and the peeling of the back layer and the destruction of the adhesive layer (residue of the paste due to aggregation failure or fixation failure) at the time of peeling were confirmed. The evaluation was carried out based on the following criteria.

◎:剝離力為1.0 N/20 mm以下,且於目視下未觀察到 脫落、黏著劑層之破壞。 ◎: The peeling force was 1.0 N/20 mm or less, and was not observed under visual observation. Shedding, destruction of the adhesive layer.

○:剝離力未達3.0 N/20 mm,且於目視下未觀察到脫落、黏著劑層之破壞。 ○: The peeling force was less than 3.0 N/20 mm, and no peeling or damage of the adhesive layer was observed under visual observation.

×:剝離力為3.0 N/20 mm以上,或於目視下觀察到脫落、黏著劑層之破壞。 ×: The peeling force was 3.0 N/20 mm or more, or the peeling and the destruction of the adhesive layer were observed under visual observation.

<固著性確認試驗> <fixation confirmation test> (固著性確認試驗A) (fixation confirmation test A)

以0.3 m/min~3 m/min之拉伸速度使黏著帶用膜或黏著帶延伸至200%,以目視評價延伸時及延伸後黏著帶用膜或黏著帶之與黏著劑層為相反側之最外面(背面層)之脫落性。 The film or adhesive tape for the adhesive tape was extended to 200% at a stretching speed of 0.3 m/min to 3 m/min to visually evaluate the opposite side of the film or adhesive tape for the adhesive tape and the adhesive tape at the time of extension and extension. The outermost (back layer) is detachable.

(固著性確認試驗B) (fixation confirmation test B)

進行與固著性確認試驗A同樣之延伸後,以日東電工股份有限公司(NITTO DENKO CORPORATION)製造之「NO.31B」作為背面處理層,藉由2 Kg輥(寬25 mm),以0.3 m/min之壓接速度進行一次往復運動,然後於23℃×50% RH之條件下保管1分鐘,利用0.3 m/min~3 m/min之剝離速度進行90°剝離,以目視評價背面之脫落性。 After performing the same extension as the fixing confirmation test A, "NO. 31B" manufactured by NITTO DENKO CORPORATION was used as the back surface treatment layer by a 2 Kg roll (width 25 mm) at 0.3 m. The pressure-receiving speed of /min was reciprocated once, and then stored under conditions of 23 ° C × 50% RH for 1 minute, and 90 ° peeling was performed at a peeling speed of 0.3 m / min to 3 m / min to visually evaluate the peeling of the back surface. Sex.

(評價) (Evaluation)

綜合判斷以上評價,且依據下述基準評價固著性。 The above evaluation was comprehensively judged, and the fixing property was evaluated based on the following criteria.

◎:於固著性確認試驗A及固著性確認試驗B中均無可以目視確認到之背面之脫落。 ◎: There was no peeling of the back surface which can be visually confirmed in the fixation confirmation test A and the fixation confirmation test B.

○:於固著性確認試驗A中無可以目視確認到之背面之脫落,而於固著性確認試驗B中確認到輕微程度之背面脫 落(確認為點狀)。 ○: In the fixation test A, there was no peeling of the back surface which was visually confirmed, and a slight degree of back peeling was confirmed in the fixation test B. Fall (confirmed as a dot).

×:於固著性確認試驗A中確認到背面之脫落,或於固著性確認試驗B中確認到背面之脫落。 X: The peeling of the back surface was confirmed in the fixing property confirmation test A, or the peeling of the back surface was confirmed in the fixing property confirmation test B.

[製造例1]:塑膠膜之製造 [Manufacturing Example 1]: Manufacturing of plastic film

藉由壓延法製造相對於聚合度P=1050之聚氯乙烯100重量份而含有DOP塑化劑(鄰苯二甲酸雙(2-乙基己基)酯,由J-PLUS製造)27重量份之軟質聚氯乙烯膜。該軟質聚氯乙烯膜之厚度為70 μm,依據JIS-K-7127所測定之彈性模數(MD)為250 MPa,依據JIS-K-7127所測定之最大伸長率(MD)為400%。又,剛製造後之表面粗糙度(算術平均表面粗糙度Ra)為0.1 μm。 By the calendering method, the DOP plasticizer (bis(2-ethylhexyl) phthalate, manufactured by J-PLUS) is contained in an amount of 27 parts by weight based on 100 parts by weight of the polyvinyl chloride having a polymerization degree of P=1050. Soft polyvinyl chloride film. The thickness of the soft polyvinyl chloride film was 70 μm, the modulus of elasticity (MD) measured according to JIS-K-7127 was 250 MPa, and the maximum elongation (MD) measured according to JIS-K-7127 was 400%. Further, the surface roughness (arithmetic mean surface roughness Ra) immediately after the production was 0.1 μm.

[實施例1] [Example 1]

將聚矽氧樹脂(KS-723A,由信越化學工業製造)60重量份、聚矽氧樹脂(KS-723B,由信越化學工業製造)40重量份、丙烯酸系共聚物(甲基丙烯酸甲酯(MMA)/丙烯酸丁酯(BA)/丙烯酸羥基乙酯(HEA)=70/30/10)100重量份、錫系觸媒(Cat-PS3,由信越化學工業製造)10重量份、及甲基氫矽氧烷系硬化促進劑X92-122(由信越化學工業製造)1.0重量份以溶液狀態進行混合,獲得混合溶液(1)。混合溶液(1)中之聚矽氧與(甲基)丙烯酸系聚合物之混合比以重量比計為聚矽氧:(甲基)丙烯酸系聚合物=1:1。 60 parts by weight of polyoxyxylene resin (KS-723A, manufactured by Shin-Etsu Chemical Co., Ltd.), polyoxynoxy resin (KS-723B, manufactured by Shin-Etsu Chemical Co., Ltd.), 40 parts by weight, acrylic copolymer (methyl methacrylate ( MMA)/butyl acrylate (BA)/hydroxyethyl acrylate (HEA)=70/30/10) 100 parts by weight, tin-based catalyst (Cat-PS3, manufactured by Shin-Etsu Chemical Co., Ltd.) 10 parts by weight, and methyl group 1.0 parts by weight of a hydroquinone-based hardening accelerator X92-122 (manufactured by Shin-Etsu Chemical Co., Ltd.) was mixed in a solution state to obtain a mixed solution (1). The mixing ratio of the polyfluorene oxide to the (meth)acrylic polymer in the mixed solution (1) is polyoxymethylene in a weight ratio: (meth)acrylic polymer = 1:1.

將上述混合溶液(1)塗佈於製造例1中製造之軟質聚氯乙烯膜之單面上並加以乾燥,形成厚度為1.0 μm、算術平均表面粗糙度Ra為0.3 μm之非黏著層。 The mixed solution (1) was applied onto one surface of a soft polyvinyl chloride film produced in Production Example 1 and dried to form a non-adhesive layer having a thickness of 1.0 μm and an arithmetic mean surface roughness Ra of 0.3 μm.

由此,獲得黏著帶用膜(1)。 Thus, a film (1) for an adhesive tape was obtained.

將各種評價結果示於表1中。 Various evaluation results are shown in Table 1.

又,若藉由TEM觀察非黏著層,則如圖1中所示,根據形態觀察影像之濃淡,可確認空氣界面側與塑膠膜側之組成不同,且觀察到:非黏著層包含含有聚矽氧多於(甲基)丙烯酸系聚合物之富聚矽氧相、及含有(甲基)丙烯酸系聚合物多於聚矽氧之富(甲基)丙烯酸系聚合物相,且形成富聚矽氧相與富(甲基)丙烯酸系聚合物相彼此獨立之相分離結構,富聚矽氧相存在於空氣界面側(與塑膠膜相反之側),富(甲基)丙烯酸系聚合物相存在於塑膠膜側。 Further, when the non-adhesive layer was observed by TEM, as shown in Fig. 1, the shading of the image was observed according to the morphology, and it was confirmed that the composition of the air interface side and the plastic film side were different, and it was observed that the non-adhesive layer contained polyfluorene. More oxygen than the (meth)acrylic polymer-rich polyoxo phase, and the (meth)acrylic polymer containing more polyoxymethylene rich (meth)acrylic polymer phase, and form an enriched fluorene The phase separation structure of the oxygen phase and the rich (meth)acrylic polymer are independent of each other, the rich polyoxygen phase exists on the air interface side (the side opposite to the plastic film), and the rich (meth)acrylic polymer phase exists. On the side of the plastic film.

進而,對非黏著層進行使用全反射法之紅外分光測定(ATR-IR),測定(甲基)丙烯酸系聚合物相中源自Si-CH3之800 cm-1附近之波峰相對於源自羰基之1725 cm-1附近之波峰之吸光度比,結果發現與使用ZnSe45°稜鏡之情形相比,使用Ge45°稜鏡之情形時800 cm-1附近之波峰變大。 Further, the non-adhesive layer was subjected to infrared spectrometry (ATR-IR) using a total reflection method, and the peak near 800 cm -1 derived from Si-CH 3 in the (meth)acrylic polymer phase was measured. The absorbance ratio of the peak near the carbonyl group at 1725 cm -1 was found to be larger at around 800 cm -1 when Ge 45 ° 稜鏡 was used than in the case of using ZnSe 45 ° 。.

因此,可知與基材側相比,空氣界面側之矽含有率較高。若考慮該等觀察結果及表面自由能最小化原理,則可知非黏著層中形成有於空氣界面側具有富聚矽氧相之雙層結構。 Therefore, it is understood that the enthalpy content of the air interface side is higher than that of the substrate side. Considering these observations and the principle of minimizing the surface free energy, it is understood that a two-layer structure having a rich pseudo-oxygen phase on the air interface side is formed in the non-adhesive layer.

[實施例2] [Embodiment 2]

製備包含如下物質之黏著劑之甲苯溶液:由丙烯酸丁酯(BA)/丙烯腈(AN)/丙烯酸(AA)=85/15/2.5(重量比)構成之丙烯酸系共聚物100重量份、三聚氰胺系交聯劑(丁醇改性之三聚氰胺-甲醛樹脂,「SUPER BECKAMINE J-820-60N」, 由日本聚氨酯(Nippon Polyurethane)製造)1重量份、及DOP塑化劑(鄰苯二甲酸雙(2-乙基己基)酯,由J-PLUS製造)60重量份。 Preparation of a toluene solution containing an adhesive of the following materials: 100 parts by weight of an acrylic copolymer composed of butyl acrylate (BA) / acrylonitrile (AN) / acrylic acid (AA) = 85 / 15 / 2.5 (weight ratio), melamine Crosslinking agent (butanol modified melamine-formaldehyde resin, "SUPER BECKAMINE J-820-60N", 1 part by weight of a polyester (Nippon Polyurethane) and 60 parts by weight of a DOP plasticizer (bis(2-ethylhexyl) phthalate, manufactured by J-PLUS).

將該黏著劑溶液塗佈於實施例1中獲得之黏著帶用膜(1)之與非黏著層為相反側之面上,隨後於130℃×90秒之條件下進行乾燥,而於軟質聚氯乙烯膜之與非黏著層為相反側之面上形成厚度10 μm之感壓性黏著劑層。所形成之感壓性黏著劑層之SP值為10.5。 The adhesive solution was applied to the surface of the film for adhesive tape (1) obtained in Example 1 on the opposite side to the non-adhesive layer, and then dried at 130 ° C × 90 seconds for soft polymerization. A pressure-sensitive adhesive layer having a thickness of 10 μm was formed on the opposite side of the vinyl chloride film from the non-adhesive layer. The pressure-sensitive adhesive layer formed had an SP value of 10.5.

由此,獲得黏著帶(2)。 Thereby, the adhesive tape (2) is obtained.

將各種評價結果示於表1中。 Various evaluation results are shown in Table 1.

[實施例3] [Example 3]

於實施例2中,使用丙烯酸乙酯(EA)/丙烯酸丁酯(BA)/丙烯酸羥基乙酯(HEA)=80/10/10之丙烯酸系共聚物100重量份作為非黏著層形成用之丙烯酸系共聚物,除此以外,以與實施例2同樣之方式獲得黏著帶(3)。 In Example 2, 100 parts by weight of an acrylic copolymer of ethyl acrylate (EA) / butyl acrylate (BA) / hydroxyethyl acrylate (HEA) = 80 / 10/10 was used as the acrylic for non-adhesive layer formation. An adhesive tape (3) was obtained in the same manner as in Example 2 except for the copolymer.

非黏著層之厚度為1.0 μm,算術平均表面粗糙度Ra為0.2 μm。 The non-adhesive layer has a thickness of 1.0 μm and an arithmetic mean surface roughness Ra of 0.2 μm.

將各種評價結果示於表1中。 Various evaluation results are shown in Table 1.

[實施例4] [Example 4]

於實施例2中,使用將聚矽氧樹脂(KS-723A,由信越化學工業製造)60重量份、聚矽氧樹脂(KS-723B,由信越化學工業製造)40重量份、丙烯酸系共聚物(甲基丙烯酸甲酯(MMA)/丙烯酸丁酯(BA)/丙烯酸羥基乙酯(HEA)=70/30/10)50重量份、錫系觸媒(Cat-PS3,由信越化學工業製造)10重 量份、及甲基氫矽氧烷系硬化促進劑X92-122(由信越化學工業製造)1.0重量份以溶液狀態進行混合而獲得之混合溶液(4)(混合溶液(4)中之聚矽氧與(甲基)丙烯酸系聚合物之混合比以重量比計為聚矽氧:(甲基)丙烯酸系聚合物=2:1)代替混合溶液(1),除此以外,以與實施例2同樣之方式獲得黏著帶(4)。 In Example 2, 60 parts by weight of polyfluorene oxide resin (KS-723A, manufactured by Shin-Etsu Chemical Co., Ltd.), polyoxynoxy resin (KS-723B, manufactured by Shin-Etsu Chemical Co., Ltd.), 40 parts by weight, acrylic copolymer were used. (Methyl methacrylate (MMA) / butyl acrylate (BA) / hydroxyethyl acrylate (HEA) = 70 / 30/10) 50 parts by weight, tin-based catalyst (Cat-PS3, manufactured by Shin-Etsu Chemical Co., Ltd.) 10 weight A mixed solution (4) obtained by mixing 1.0 part by weight of a methylhydroquinoxane-based hardening accelerator X92-122 (manufactured by Shin-Etsu Chemical Co., Ltd.) (mixed solution (4) The mixing ratio of oxygen to the (meth)acrylic polymer is polyoxyxylene: (meth)acrylic polymer = 2:1) in place of the mixed solution (1), and the examples are the same as the examples. 2 Obtain the adhesive tape (4) in the same way.

非黏著層之厚度為1.0 μm,算術平均表面粗糙度Ra為0.5 μm。 The non-adhesive layer has a thickness of 1.0 μm and an arithmetic mean surface roughness Ra of 0.5 μm.

將各種評價結果示於表1中。 Various evaluation results are shown in Table 1.

[實施例5] [Example 5]

於實施例4中,將非黏著層之厚度變為0.5 μm,除此以外,以與實施例4同樣之方式獲得黏著帶(5)。 In the same manner as in Example 4, the adhesive tape (5) was obtained in the same manner as in Example 4 except that the thickness of the non-adhesive layer was changed to 0.5 μm.

非黏著層之厚度為0.5 μm,算術平均表面粗糙度Ra為0.3 μm。 The non-adhesive layer has a thickness of 0.5 μm and an arithmetic mean surface roughness Ra of 0.3 μm.

將各種評價結果示於表1中。 Various evaluation results are shown in Table 1.

[實施例6] [Embodiment 6]

於實施例2中獲得之黏著帶(2)之感壓性黏著劑層側貼附實施有Si處理之厚度38 μm之PET襯墊作為剝離襯墊,獲得黏著帶(6)。 On the side of the pressure-sensitive adhesive layer of the adhesive tape (2) obtained in Example 2, a PET liner having a thickness of 38 μm which was subjected to Si treatment was attached as a release liner to obtain an adhesive tape (6).

非黏著層之厚度為1.0 μm,算術平均表面粗糙度Ra為0.3 μm。 The non-adhesive layer has a thickness of 1.0 μm and an arithmetic mean surface roughness Ra of 0.3 μm.

將各種評價結果示於表1中。 Various evaluation results are shown in Table 1.

[實施例7] [Embodiment 7]

於實施例2中,使用將聚矽氧樹脂(KS-723A,由信越化 學工業製造)1.2重量份、聚矽氧樹脂(KS-723B,由信越化學工業製造)0.8重量份、丙烯酸系共聚物(甲基丙烯酸甲酯(MMA)/丙烯酸丁酯(BA)/丙烯酸羥基乙酯(HEA)=70/30/10)100重量份、錫系觸媒(Cat-PS3,由信越化學工業製造)0.2重量份、及甲基氫矽氧烷系硬化促進劑X92-122(由信越化學工業製造)0.02重量份以溶液狀態進行混合而獲得之混合溶液(7)(混合溶液(7)中之聚矽氧與(甲基)丙烯酸系聚合物之混合比以重量比計為聚矽氧:(甲基)丙烯酸系聚合物=1:50)代替混合溶液(1),除此以外,以與實施例2同樣之方式獲得黏著帶(7)。 In Example 2, a polyfluorene oxide resin (KS-723A, by Shinhman) was used. Industrial Manufacturing) 1.2 parts by weight, polyoxynoxy resin (KS-723B, manufactured by Shin-Etsu Chemical Co., Ltd.) 0.8 parts by weight, acrylic copolymer (methyl methacrylate (MMA) / butyl acrylate (BA) / acrylic acid hydroxy group Ethyl acetate (HEA) = 70/30/10) 100 parts by weight, tin-based catalyst (Cat-PS3, manufactured by Shin-Etsu Chemical Co., Ltd.) 0.2 parts by weight, and methylhydroquinone-based hardening accelerator X92-122 ( 0.02 parts by weight of a mixed solution obtained by mixing in a solution state (manufactured by Shin-Etsu Chemical Co., Ltd.) (mixing ratio of polyfluorene oxide to (meth)acrylic polymer in the mixed solution (7) is by weight ratio The adhesive tape (7) was obtained in the same manner as in Example 2 except that the polyoxymethylene (meth)acrylic polymer = 1 : 50) was used instead of the mixed solution (1).

非黏著層之厚度為0.5 μm,算術平均表面粗糙度Ra為0.1 μm。 The non-adhesive layer has a thickness of 0.5 μm and an arithmetic mean surface roughness Ra of 0.1 μm.

將各種評價結果示於表1中。 Various evaluation results are shown in Table 1.

[實施例8] [Embodiment 8]

於實施例2中,使用將聚矽氧樹脂(KS-723A,由信越化學工業製造)60重量份、聚矽氧樹脂(KS-723B,由信越化學工業製造)40重量份、丙烯酸系共聚物(甲基丙烯酸甲酯(MMA)/丙烯酸丁酯(BA)/丙烯酸羥基乙酯(HEA)=70/30/10)2重量份、錫系觸媒(Cat-PS3,由信越化學工業製造)10重量份、及甲基氫矽氧烷系硬化促進劑X92-122(由信越化學工業製造)1.0重量份以溶液狀態進行混合而獲得之混合溶液(8)(混合溶液(8)中之聚矽氧與(甲基)丙烯酸系聚合物之混合比以重量比計為聚矽氧:(甲基)丙烯酸系聚合物=50:1)代替混合溶液(1),除此以外,以與實施例2同樣之 方式獲得黏著帶(8)。 In Example 2, 60 parts by weight of polyfluorene oxide resin (KS-723A, manufactured by Shin-Etsu Chemical Co., Ltd.), polyoxynoxy resin (KS-723B, manufactured by Shin-Etsu Chemical Co., Ltd.), 40 parts by weight, acrylic copolymer were used. (Methyl methacrylate (MMA) / butyl acrylate (BA) / hydroxyethyl acrylate (HEA) = 70 / 30/10) 2 parts by weight, tin-based catalyst (Cat-PS3, manufactured by Shin-Etsu Chemical Co., Ltd.) 10 parts by weight, and a methylhydroquinone-based hardening accelerator X92-122 (manufactured by Shin-Etsu Chemical Co., Ltd.) 1.0 part by weight of a mixed solution (8) obtained by mixing in a solution state (polymerization in a mixed solution (8) The mixing ratio of the argon and the (meth)acrylic polymer is polyoxyxylene: (meth)acrylic polymer = 50:1) instead of the mixed solution (1), and Example 2 is the same Way to get the adhesive tape (8).

非黏著層之厚度為0.5 μm,算術平均表面粗糙度Ra為0.1 μm。 The non-adhesive layer has a thickness of 0.5 μm and an arithmetic mean surface roughness Ra of 0.1 μm.

將各種評價結果示於表1中。 Various evaluation results are shown in Table 1.

[實施例9] [Embodiment 9]

製備包含如下物質之黏著劑之甲苯溶液:由丙烯酸丁酯(BA)/丙烯腈(AN)/丙烯酸(AA)=85/15/2.5(重量比)構成之丙烯酸系共聚物100重量份、三聚氰胺系交聯劑(丁醇改性之三聚氰胺-甲醛樹脂,「SUPER BECKAMINE J-820-60N」,由日本聚氨酯製造)10重量份、及DOP塑化劑(鄰苯二甲酸雙(2-乙基己基)酯,由J-PLUS製造)60重量份。 Preparation of a toluene solution containing an adhesive of the following materials: 100 parts by weight of an acrylic copolymer composed of butyl acrylate (BA) / acrylonitrile (AN) / acrylic acid (AA) = 85 / 15 / 2.5 (weight ratio), melamine Crosslinking agent (butanol modified melamine-formaldehyde resin, "SUPER BECKAMINE J-820-60N", made of Japanese polyurethane) 10 parts by weight, and DOP plasticizer (bis(2-ethyl) phthalate Hexyl) ester, manufactured by J-PLUS, 60 parts by weight.

將該黏著劑溶液塗佈於實施例1中獲得之黏著帶用膜(1)之與非黏著層為相反側之面上,隨後於130℃×90秒之條件下進行乾燥,而於軟質聚氯乙烯膜之與非黏著層為相反側之面上形成厚度10 μm之感壓性黏著劑層。所形成之感壓性黏著劑層之SP值為10.5。 The adhesive solution was applied to the surface of the film for adhesive tape (1) obtained in Example 1 on the opposite side to the non-adhesive layer, and then dried at 130 ° C × 90 seconds for soft polymerization. A pressure-sensitive adhesive layer having a thickness of 10 μm was formed on the opposite side of the vinyl chloride film from the non-adhesive layer. The pressure-sensitive adhesive layer formed had an SP value of 10.5.

由此,獲得黏著帶(9)。 Thereby, an adhesive tape (9) is obtained.

將各種評價結果示於表2中。 Various evaluation results are shown in Table 2.

[實施例10] [Embodiment 10]

於實施例9中,使用丙烯酸乙酯(EA)/丙烯酸丁酯(BA)/丙烯酸羥基乙酯(HEA)=80/10/10之丙烯酸系共聚物100重量份作為非黏著層形成用之丙烯酸系共聚物,除此以外,以與實施例9同樣之方式獲得黏著帶(10)。 In Example 9, 100 parts by weight of an acrylic copolymer of ethyl acrylate (EA) / butyl acrylate (BA) / hydroxyethyl acrylate (HEA) = 80 / 10/10 was used as the acrylic for non-adhesive layer formation. An adhesive tape (10) was obtained in the same manner as in Example 9 except that the copolymer was a copolymer.

非黏著層之厚度為1.0 μm,算術平均表面粗糙度Ra為 0.2 μm。 The thickness of the non-adhesive layer is 1.0 μm, and the arithmetic mean surface roughness Ra is 0.2 μm.

將各種評價結果示於表2中。 Various evaluation results are shown in Table 2.

[實施例11] [Example 11]

於實施例9中,使用將聚矽氧樹脂(KS-723A,由信越化學工業製造)60重量份、聚矽氧樹脂(KS-723B,由信越化學工業製造)40重量份、丙烯酸系共聚物(甲基丙烯酸甲酯(MMA)/丙烯酸丁酯(BA)/丙烯酸羥乙酯(HEA)=70/30/10)50重量份、錫系之觸媒(Cat-PS3,由信越化學工業製造)10重量份、及甲基氫矽氧烷系之硬化促進劑X92-122(由信越化學工業製造)1.0重量份以溶液狀態進行混合而獲得之混合溶液(4)(混合溶液(4)中之聚矽氧與(甲基)丙烯酸系聚合物之混合比以重量比計為聚矽氧:(甲基)丙烯酸系聚合物=2:1)代替混合溶液(1),除此以外,以與實施例9同樣之方式獲得黏著帶(11)。 In Example 9, 60 parts by weight of polyfluorene oxide resin (KS-723A, manufactured by Shin-Etsu Chemical Co., Ltd.), polyoxynoxy resin (KS-723B, manufactured by Shin-Etsu Chemical Co., Ltd.), 40 parts by weight, acrylic copolymer were used. (Methyl methacrylate (MMA) / butyl acrylate (BA) / hydroxyethyl acrylate (HEA) = 70 / 30/10) 50 parts by weight, tin-based catalyst (Cat-PS3, manufactured by Shin-Etsu Chemical Co., Ltd. 10 parts by weight, and a methylhydroquinone-based hardening accelerator X92-122 (manufactured by Shin-Etsu Chemical Co., Ltd.) 1.0 part by weight of a mixed solution (4) obtained by mixing in a solution state (mixed solution (4) The mixing ratio of the polyoxymethylene to the (meth)acrylic polymer is polyoxyxylene: (meth)acrylic polymer = 2:1) instead of the mixed solution (1), in addition to An adhesive tape (11) was obtained in the same manner as in Example 9.

非黏著層之厚度為1.0 μm,算術平均表面粗糙度Ra為0.5 μm。 The non-adhesive layer has a thickness of 1.0 μm and an arithmetic mean surface roughness Ra of 0.5 μm.

將各種評價結果示於表2中。 Various evaluation results are shown in Table 2.

[實施例12] [Embodiment 12]

於實施例11中,將非黏著層之厚度變為0.5 μm,除此以外,以與實施例11同樣之方式獲得黏著帶(12)。 In the same manner as in Example 11, except that the thickness of the non-adhesive layer was changed to 0.5 μm, the adhesive tape (12) was obtained.

非黏著層之厚度為0.5 μm,算術平均表面粗糙度Ra為0.3 μm。 The non-adhesive layer has a thickness of 0.5 μm and an arithmetic mean surface roughness Ra of 0.3 μm.

將各種評價結果示於表2中。 Various evaluation results are shown in Table 2.

[實施例13] [Example 13]

於實施例9中獲得之黏著帶(9)之感壓性黏著劑層側貼附實施有Si處理之厚度38 μm之PET襯墊作為剝離襯墊,獲得黏著帶(13)。 On the pressure-sensitive adhesive layer side of the adhesive tape (9) obtained in Example 9, a PET liner having a thickness of 38 μm which was subjected to Si treatment was attached as a release liner to obtain an adhesive tape (13).

非黏著層之厚度為1.0 μm,算術平均表面粗糙度Ra為0.3 μm。 The non-adhesive layer has a thickness of 1.0 μm and an arithmetic mean surface roughness Ra of 0.3 μm.

將各種評價結果示於表2中。 Various evaluation results are shown in Table 2.

[實施例14] [Embodiment 14]

於實施例9中,使用將聚矽氧樹脂(KS-723A,由信越化學工業製造)1.2重量份、聚矽氧樹脂(KS-723B,由信越化學工業製造)0.8重量份、丙烯酸系共聚物(甲基丙烯酸甲酯(MMA)/丙烯酸丁酯(BA)/丙烯酸羥基乙酯(HEA)=70/30/10)100重量份、錫系觸媒(Cat-PS3,由信越化學工業製造)0.2重量份、及甲基氫矽氧烷系硬化促進劑X92-122(由信越化學工業製造)0.02重量份以溶液狀態進行混合而獲得之混合溶液(7)(混合溶液(7)中之聚矽氧與(甲基)丙烯酸系聚合物之混合比以重量比計為聚矽氧:(甲基)丙烯酸系聚合物=1:50)代替混合溶液(1),除此以外,以與實施例9同樣之方式獲得黏著帶(14)。 In Example 9, 1.2 parts by weight of polyfluorene oxide resin (KS-723A, manufactured by Shin-Etsu Chemical Co., Ltd.), polyoxynoxy resin (KS-723B, manufactured by Shin-Etsu Chemical Co., Ltd.), 0.8 parts by weight, acrylic copolymer were used. (Methyl methacrylate (MMA) / butyl acrylate (BA) / hydroxyethyl acrylate (HEA) = 70 / 30/10) 100 parts by weight, tin-based catalyst (Cat-PS3, manufactured by Shin-Etsu Chemical Co., Ltd.) 0.2 parts by weight, and a methylhydroquinone-based hardening accelerator X92-122 (manufactured by Shin-Etsu Chemical Co., Ltd.) 0.02 parts by weight of a mixed solution (7) obtained by mixing in a solution state (polymerization in a mixed solution (7) The mixing ratio of the argon and the (meth)acrylic polymer is polyoxyxylene: (meth)acrylic polymer = 1:50 by weight ratio instead of the mixed solution (1), and Example 9 obtained the adhesive tape (14) in the same manner.

非黏著層之厚度為0.5 μm,算術平均表面粗糙度Ra為0.1 μm。 The non-adhesive layer has a thickness of 0.5 μm and an arithmetic mean surface roughness Ra of 0.1 μm.

將各種評價結果示於表2中。 Various evaluation results are shown in Table 2.

[實施例15] [Example 15]

於實施例9中,使用將聚矽氧樹脂(KS-723A,由信越化學工業製造)60重量份、聚矽氧樹脂(KS-723B,由信越化 學工業製造)40重量份、丙烯酸系共聚物(甲基丙烯酸甲酯(MMA)/丙烯酸丁酯(BA)/丙烯酸羥基乙酯(HEA)=70/30/10)2重量份、錫系觸媒(Cat-PS3,由信越化學工業製造)10重量份、及甲基氫矽氧烷系硬化促進劑X92-122(由信越化學工業製造)1.0重量份以溶液狀態進行混合而獲得之混合溶液(8)(混合溶液(8)中之聚矽氧與(甲基)丙烯酸系聚合物之混合比以重量比計為聚矽氧:(甲基)丙烯酸系聚合物=50:1)代替混合溶液(1),除此以外,以與實施例9同樣之方式獲得黏著帶(15)。 In Example 9, 60 parts by weight of polyfluorene oxide resin (KS-723A, manufactured by Shin-Etsu Chemical Co., Ltd.) and polyoxynoxy resin (KS-723B, by Shin-Etsu Chemical Co., Ltd.) were used. Industrial manufacturing) 40 parts by weight, acrylic copolymer (methyl methacrylate (MMA) / butyl acrylate (BA) / hydroxyethyl acrylate (HEA) = 70 / 30/10) 2 parts by weight, tin-based 10 parts by weight of a medium (Cat-PS3, manufactured by Shin-Etsu Chemical Co., Ltd.) and a methylhydroquinone-based hardening accelerator X92-122 (manufactured by Shin-Etsu Chemical Co., Ltd.) 1.0 part by weight of a mixed solution obtained by mixing in a solution state (8) (The mixing ratio of the polyfluorene oxide to the (meth)acrylic polymer in the mixed solution (8) is polyoxylium by weight: (meth)acrylic polymer = 50:1) instead of mixing An adhesive tape (15) was obtained in the same manner as in Example 9 except for the solution (1).

非黏著層之厚度為0.5 μm,算術平均表面粗糙度Ra為0.1 μm。 The non-adhesive layer has a thickness of 0.5 μm and an arithmetic mean surface roughness Ra of 0.1 μm.

將各種評價結果示於表2中。 Various evaluation results are shown in Table 2.

[比較例1] [Comparative Example 1]

於實施例2中,除未形成非黏著層以外,以與實施例2同樣之方式獲得黏著帶(C1)。 In Example 2, an adhesive tape (C1) was obtained in the same manner as in Example 2 except that the non-adhesive layer was not formed.

將各種評價結果示於表3中。 Various evaluation results are shown in Table 3.

[比較例2] [Comparative Example 2]

於實施例2中,使用將聚矽氧樹脂(KS-723A,由信越化學工業製造)60重量份、聚矽氧樹脂(KS-723B,由信越化學工業製造)40重量份、錫系觸媒(Cat-PS3,由信越化學工業製造)10重量份、及甲基氫矽氧烷系硬化促進劑X92-122(由信越化學工業製造)1.0重量份以溶液狀態進行混合而獲得之混合溶液(C2)代替混合溶液(1),除此以外,以與實施例2同樣之方式獲得黏著帶(C2)。 In Example 2, 60 parts by weight of polyfluorene oxide resin (KS-723A, manufactured by Shin-Etsu Chemical Co., Ltd.), polyoxynoxy resin (KS-723B, manufactured by Shin-Etsu Chemical Co., Ltd.), 40 parts by weight, tin-based catalyst were used. (Cat-PS3, manufactured by Shin-Etsu Chemical Co., Ltd.) 10 parts by weight, and a methylhydroquinone-based hardening accelerator X92-122 (manufactured by Shin-Etsu Chemical Co., Ltd.) 1.0 part by weight of a mixed solution obtained by mixing in a solution state ( C2) An adhesive tape (C2) was obtained in the same manner as in Example 2 except for the mixed solution (1).

非黏著層之厚度為0.5 μm,算術平均表面粗糙度Ra為0.08 μm。 The non-adhesive layer has a thickness of 0.5 μm and an arithmetic mean surface roughness Ra of 0.08 μm.

將各種評價結果示於表3中。 Various evaluation results are shown in Table 3.

[比較例3] [Comparative Example 3]

於實施例2中,非黏著層為丙烯酸系共聚物(甲基丙烯酸甲酯(MMA)/丙烯酸丁酯(BA)/丙烯酸羥基乙酯(HEA)=70/30/10),除此以外,以與實施例2同樣之方式獲得黏著帶(C3)。非黏著層之厚度為0.5 μm,算術平均表面粗糙度Ra為0.05 μm。將各種評價結果示於表3中。 In Example 2, the non-adhesive layer is an acrylic copolymer (methyl methacrylate (MMA) / butyl acrylate (BA) / hydroxyethyl acrylate (HEA) = 70 / 30/10), in addition to An adhesive tape (C3) was obtained in the same manner as in Example 2. The non-adhesive layer has a thickness of 0.5 μm and an arithmetic mean surface roughness Ra of 0.05 μm. Various evaluation results are shown in Table 3.

[產業上之可利用性] [Industrial availability]

本發明之黏著帶包含本發明之黏著帶用膜,因此如上所述,於進行利用負壓之吸附固定之情形時可抑制發生過度密接,又,可有效地抑制輥狀形態之黏連,於自輥狀形態退繞時不會撕裂或破損,該非黏著層與該塑膠膜之相容性較佳,對延伸等變形之追隨性良好。因此,可較佳地用於將由脆性材料構成且可具有微細且精緻之電路圖案之半導體晶圓作為被黏著體之半導體加工。若將本發明之黏著帶用於半導體加工,則於進行利用負壓之吸附固定之情形時 可抑制發生過度密接,因此可順利進行包括切割在內之半導體製造步驟。又,若將本發明之黏著帶用於半導體加工,則不發生先前因黏連而產生之膜變形或應力應變之累積,因此可準確地追隨半導體晶圓之微細且精緻之電路圖案進行貼合,又,貼合於半導體晶圓後未發生應力應變之自然釋放,故可有效地防止半導體晶圓破碎。特別是用於LED之晶圓係由氮化鎵、砷化鎵、碳化矽等非常脆之材料構成,因此本發明之黏著帶非常適合用於LED切割等。 Since the adhesive tape of the present invention comprises the film for an adhesive tape of the present invention, as described above, when the adsorption by the negative pressure is performed, excessive adhesion can be suppressed, and the adhesion of the roll form can be effectively suppressed. The non-adhesive layer has good compatibility with the plastic film and has good followability to deformation such as elongation when it is unwound from the roll form. Therefore, it can be preferably used for processing a semiconductor wafer composed of a brittle material and having a fine and delicate circuit pattern as a semiconductor to be bonded. When the adhesive tape of the present invention is used for semiconductor processing, when the adsorption is fixed by a negative pressure, It is possible to suppress excessive adhesion, so that the semiconductor manufacturing steps including dicing can be performed smoothly. Moreover, when the adhesive tape of the present invention is used for semiconductor processing, film deformation or stress strain which was previously caused by adhesion does not occur, so that it is possible to accurately follow the fine and delicate circuit pattern of the semiconductor wafer. Moreover, since the natural release of stress and strain does not occur after bonding to the semiconductor wafer, the semiconductor wafer can be effectively prevented from being broken. In particular, the wafer for LED is composed of a very brittle material such as gallium nitride, gallium arsenide or tantalum carbide. Therefore, the adhesive tape of the present invention is very suitable for LED cutting and the like.

圖1係表示本發明之黏著帶用膜中的非黏著層之狀態之TEM照片圖。 Fig. 1 is a TEM photograph showing the state of a non-adhesive layer in the film for an adhesive tape of the present invention.

Claims (12)

一種黏著帶用膜,其係於依據JIS-K-7127所測定之最大伸長率為100%以上之塑膠膜之單面上包含非黏著層者,且該非黏著層之算術平均表面粗糙度Ra為0.1μm以上,上述非黏著層為聚矽氧與(甲基)丙烯酸系聚合物之混合層,且上述非黏著層中之聚矽氧與(甲基)丙烯酸系聚合物之混合比以重量比計為聚矽氧:(甲基)丙烯酸系聚合物=1:50~50:1。 A film for an adhesive tape comprising a non-adhesive layer on one side of a plastic film having a maximum elongation of 100% or more as measured according to JIS-K-7127, and an arithmetic mean surface roughness Ra of the non-adhesive layer is 0.1 μm or more, the non-adhesive layer is a mixed layer of polyoxymethylene and a (meth)acrylic polymer, and the mixing ratio of the polyfluorene oxide to the (meth)acrylic polymer in the non-adhesive layer is a weight ratio It is considered to be polyoxyl: (meth)acrylic polymer = 1:50 to 50:1. 如請求項1之黏著帶用膜,其中上述非黏著層之非黏著試驗剝離力未達1.0N/20mm。 The adhesive tape film of claim 1, wherein the non-adhesive layer has a non-adhesive test peeling force of less than 1.0 N/20 mm. 如請求項1之黏著帶用膜,其中上述非黏著層包含含有聚矽氧多於(甲基)丙烯酸系聚合物之富聚矽氧相、及含有(甲基)丙烯酸系聚合物多於聚矽氧之富(甲基)丙烯酸系聚合物相。 The film for an adhesive tape according to claim 1, wherein the non-adhesive layer comprises a polyfluorene-rich phase containing more poly(oxy)oxygen (meth)acrylic polymer, and more than a poly(meth)acrylic polymer An oxygen-rich (meth)acrylic polymer phase. 如請求項1之黏著帶用膜,其中上述塑膠膜之厚度為20μm~200μm。 The film for an adhesive tape according to claim 1, wherein the plastic film has a thickness of 20 μm to 200 μm. 如請求項1之黏著帶用膜,其中上述非黏著層之厚度為0.01μm~10μm。 The film for an adhesive tape according to claim 1, wherein the non-adhesive layer has a thickness of 0.01 μm to 10 μm. 如請求項1之黏著帶用膜,其中上述塑膠膜包含聚氯乙烯。 The film for an adhesive tape according to claim 1, wherein the plastic film comprises polyvinyl chloride. 一種黏著帶,其於如請求項1至6中任一項之黏著帶用膜中的上述塑膠膜之與上述非黏著層相反之面上包含黏著 劑層。 An adhesive tape comprising the adhesive film on the surface of the adhesive film according to any one of claims 1 to 6 on the opposite side of the non-adhesive layer Agent layer. 如請求項7之黏著帶,其中上述黏著劑層包含(甲基)丙烯酸系聚合物。 The adhesive tape of claim 7, wherein the adhesive layer comprises a (meth)acrylic polymer. 如請求項7之黏著帶,其中上述黏著劑層之SP值為9.0(cal/cm3)0.5~12.0(cal/cm3)0.5The adhesive tape of claim 7, wherein the adhesive layer has an SP value of 9.0 (cal/cm 3 ) of 0.5 to 12.0 (cal/cm 3 ) 0.5 . 如請求項7之黏著帶,其於上述黏著劑層之表面包含剝離襯墊。 The adhesive tape of claim 7, which comprises a release liner on the surface of the above adhesive layer. 如請求項7之黏著帶,其用於半導體加工中。 The adhesive tape of claim 7, which is used in semiconductor processing. 如請求項11之黏著帶,其中上述半導體加工為LED切割。 The adhesive tape of claim 11, wherein the semiconductor processing is LED cutting.
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