TWI568826B - Adhesive tape and adhesive tape - Google Patents
Adhesive tape and adhesive tape Download PDFInfo
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- TWI568826B TWI568826B TW102106579A TW102106579A TWI568826B TW I568826 B TWI568826 B TW I568826B TW 102106579 A TW102106579 A TW 102106579A TW 102106579 A TW102106579 A TW 102106579A TW I568826 B TWI568826 B TW I568826B
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
- C09J133/04—Homopolymers or copolymers of esters
- C09J133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C09J133/08—Homopolymers or copolymers of acrylic acid esters
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B27/08—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/28—Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42
- B32B27/283—Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42 comprising polysiloxanes
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/30—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
- B32B27/304—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers comprising vinyl halide (co)polymers, e.g. PVC, PVDC, PVF, PVDF
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/30—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
- B32B27/308—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers comprising acrylic (co)polymers
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
- C09J133/04—Homopolymers or copolymers of esters
- C09J133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C09J133/10—Homopolymers or copolymers of methacrylic acid esters
- C09J133/12—Homopolymers or copolymers of methyl methacrylate
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/40—Adhesives in the form of films or foils characterised by release liners
- C09J7/401—Adhesives in the form of films or foils characterised by release liners characterised by the release coating composition
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2405/00—Adhesive articles, e.g. adhesive tapes
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
- C09J2203/326—Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/10—Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet
- C09J2301/12—Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet by the arrangement of layers
- C09J2301/122—Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet by the arrangement of layers the adhesive layer being present only on one side of the carrier, e.g. single-sided adhesive tape
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/30—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
- C09J2301/312—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier parameters being the characterizing feature
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2427/00—Presence of halogenated polymer
- C09J2427/006—Presence of halogenated polymer in the substrate
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2433/00—Presence of (meth)acrylic polymer
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2433/00—Presence of (meth)acrylic polymer
- C09J2433/005—Presence of (meth)acrylic polymer in the release coating
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2483/00—Presence of polysiloxane
- C09J2483/005—Presence of polysiloxane in the release coating
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Adhesive Tapes (AREA)
- Laminated Bodies (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Dicing (AREA)
Description
本發明係關於一種黏著帶用膜及黏著帶。 The present invention relates to a film for an adhesive tape and an adhesive tape.
半導體之切割所使用之黏著帶為了於切割時固定晶圓,而必須將與晶圓密接面相反之面固定於基座上。通常此種固定係藉由真空吸附等之負壓而進行。 In order to fix the wafer during dicing, the adhesive tape used for the dicing of the semiconductor must be fixed to the susceptor on the opposite side of the wafer adhesion surface. Usually, such fixing is carried out by a vacuum such as vacuum adsorption.
於進行此種利用負壓之固定時,存在如下情況:因過度地施加負壓之狀態、或由切割時之發熱引起之黏著帶之熔融,而導致黏著帶與基座過度密接。若發生此種過度密接,則會產生如下問題:解除與基座之固定時之操作性變差,例如包括切割在內之半導體製造步驟無法順利地進行。 When such a fixing using a negative pressure is performed, there is a case where the adhesive tape is excessively adhered to the susceptor due to a state in which a negative pressure is excessively applied or a melting of the adhesive tape due to heat generation during dicing. If such excessive adhesion occurs, there is a problem in that the operability at the time of releasing the fixing to the susceptor is deteriorated, and the semiconductor manufacturing step including the dicing cannot be smoothly performed.
為了消除此種過度密接之問題,現報告有如下技術:於包含基材膜及黏著劑層之兩層之晶圓表面保護帶中,將基材膜之與黏著劑層相反之表面之中心線表面粗糙度Ra控制為特定大小(專利文獻1)。 In order to eliminate the problem of such excessive adhesion, the following technique has been reported: in the wafer surface protection tape comprising two layers of the substrate film and the adhesive layer, the center line of the surface of the substrate film opposite to the adhesive layer The surface roughness Ra is controlled to a specific size (Patent Document 1).
但是,對於半導體之切割所使用之黏著帶之基材膜,要求半導體製造製程特有之延伸(expand)特性及階差追隨特性。即,半導體之切割所使用之黏著帶之基材膜必須於延伸步驟中可良好地延伸,又,必須良好地追隨半導體之階差。作為應對此種要求之基材膜,可選擇包含伸長係數較大之材料之基材膜。然而,關於此種基材膜,其表面狀態容易受溫度影響。因此,如專利文獻1中所報告般,存在如下問題:即便將基材膜之表面之中心線表面粗糙度Ra控制為特定大小,因 氣溫或製程裝置之溫度變化,而導致控制為特定大小之中心線表面粗糙度Ra較大地發生變化,而無法表現出專利文獻1中記載之發明之效果。 However, for the base film of the adhesive tape used for the dicing of semiconductors, the expansion characteristics and the step following characteristics unique to the semiconductor manufacturing process are required. That is, the base film of the adhesive tape used for the dicing of the semiconductor must be well extended in the extending step, and the step of the semiconductor must be satisfactorily followed. As a base film which responds to such a request, a base material film containing a material having a large elongation coefficient can be selected. However, with regard to such a substrate film, the surface state thereof is easily affected by temperature. Therefore, as reported in Patent Document 1, there is a problem that even if the center line surface roughness Ra of the surface of the base film is controlled to a specific size, The temperature of the temperature or the temperature of the process device is changed, and the surface roughness Ra of the center line controlled to a specific size is largely changed, and the effect of the invention described in Patent Document 1 cannot be exhibited.
例如,於切割時,尤其是於雷射切割時,雷射加工之能量會使晶圓發熱。如此,若晶圓發熱,則如專利文獻1中所報告般存在如下問題:即便將基材膜之表面之中心線表面粗糙度Ra控制為特定大小,亦無法消除如上所述之過度密接之問題,反而促進過度密接。 For example, the energy of laser processing can cause the wafer to heat up during cutting, especially during laser cutting. When the wafer is heated, as reported in Patent Document 1, there is a problem that even if the center line surface roughness Ra of the surface of the substrate film is controlled to a specific size, the problem of excessive adhesion as described above cannot be eliminated. Instead, it promotes excessive closeness.
又,近年來,由於半導體之切割所使用之晶圓之尺寸大型化,因此切割之時間變長,結果晶圓之發熱增加,而上述問題變得更明顯。 Further, in recent years, since the size of wafers used for dicing semiconductors has increased in size, the time for dicing has become longer, and as a result, heat generation of wafers has increased, and the above problems have become more apparent.
於半導體之切割中,尤其是於LED切割中,所使用之半導體晶圓由氮化鎵、砷化鎵、碳化矽等非常脆弱之材料構成,因此為了防止該半導體晶圓之破損,而對黏著帶之基材膜要求進一步之延伸(expand)特性及階差追隨特性。因此,對於LED切割所使用之黏著帶,上述問題變得更明顯。 In semiconductor dicing, especially in LED dicing, the semiconductor wafer used is composed of a very fragile material such as gallium nitride, gallium arsenide or tantalum carbide. Therefore, in order to prevent breakage of the semiconductor wafer, adhesion is performed. The substrate film of the tape requires further expansion characteristics and step following characteristics. Therefore, the above problems become more apparent for the adhesive tape used for LED cutting.
另一方面,通常膜表面平滑,若將此種膜加工為輥狀,則會產生膜彼此接觸而密接之現象,即黏連。關於已產生黏連之輥,則有時會產生難以進行將膜回捲之作業等不良情況。尤其是於伸長係數較大之膜中通常添加有塑化劑。此種膜由於藉由於膜表面析出塑化劑,使膜間之微小空隙被填埋,故而由黏連引起之不良影響變得明顯。於在膜表面實施利用黏著劑之黏著加工之情形時,由於該黏著劑本身具有密接性,故而黏連之不良影響越發增大。 On the other hand, in general, the surface of the film is smooth, and when the film is processed into a roll shape, the film is brought into contact with each other and adhered to each other, that is, adhered. Regarding the roll in which the adhesion has occurred, there are cases where it is difficult to perform the work of rewinding the film. In particular, a plasticizer is usually added to a film having a large elongation coefficient. In such a film, since a plasticizer is deposited on the surface of the film to cause a small gap between the films to be filled, the adverse effect caused by the adhesion becomes conspicuous. When the adhesive film is adhered to the surface of the film, since the adhesive itself has adhesiveness, the adverse effect of the adhesion increases.
於將黏連之輥狀膜回捲時,需要用以解除膜彼此之密接之多餘之力。藉由施加此種多餘之力,會使膜延伸而變形,或者即便於膜不會變形之情形時,亦以應力應變之形式蓄積。若將因如上所述之原因而變形之膜應用於黏著帶,則難以追隨被黏著體而貼合。又,若將因 如上所述之原因而蓄積有應力應變之膜應用於黏著帶,則存在如下擔憂:因貼合於被黏著體後產生該應力應變之自然解除,而導致被黏著體破損。 When rewinding the adhered roll film, an extra force for releasing the adhesion of the films to each other is required. By applying such excess force, the film is stretched and deformed, or even when the film is not deformed, it is accumulated in the form of stress strain. When a film deformed as described above is applied to an adhesive tape, it is difficult to adhere to the adherend. Again, if When the film in which the stress strain is accumulated as described above is applied to the adhesive tape, there is a concern that the stress and strain are naturally released after being bonded to the adherend, and the adherend is broken.
於在半導體加工中使用黏著帶之情形時,由於作為被黏著體之半導體晶圓係由脆弱之材料構成,因此較脆弱或易缺損。因此,若將因如上所述之原因而變形之膜應用於黏著帶,則難以追隨半導體晶圓之微細精緻之電路圖案而貼合。又,若將因如上所述之原因而蓄積有應力應變之膜應用於黏著帶,則因於貼合於半導體晶圓後產生該應力應變之自然解除,而導致半導體晶圓容易破損。 In the case where an adhesive tape is used in semiconductor processing, since the semiconductor wafer as the adherend is composed of a fragile material, it is weak or easily damaged. Therefore, when a film deformed as described above is applied to an adhesive tape, it is difficult to adhere to the fine and delicate circuit pattern of the semiconductor wafer. Further, when a film in which stress and strain is accumulated as described above is applied to an adhesive tape, the stress and strain are naturally released after bonding to the semiconductor wafer, and the semiconductor wafer is easily broken.
尤其是LED所使用之晶圓係由氮化鎵、砷化鎵及碳化矽等非常脆弱之材料構成。因此,LED切割等所使用之黏著帶之抗黏連特別重要。 In particular, the wafers used in LEDs are made of very fragile materials such as gallium nitride, gallium arsenide and tantalum carbide. Therefore, the anti-adhesion of the adhesive tape used for LED cutting or the like is particularly important.
作為抗黏連之先前技術,大致可列舉兩項技術。 As a prior art of anti-adhesion, two techniques can be roughly cited.
第一項先前技術可列舉對膜之背面實施壓花加工等物理處理(專利文獻2)。但是,於該技術中,由於形成於膜之背面之凹凸為應力集中結構,因此存在如下問題:於自輥狀之形態回捲時,因回捲之力而以該凹凸為起點,膜破裂或破損。 In the first prior art, physical processing such as embossing is performed on the back surface of the film (Patent Document 2). However, in this technique, since the concavities and convexities formed on the back surface of the film are stress-concentrating structures, there is a problem in that, when rewinding from the form of a roll, the film is broken due to the force of the rewinding, starting from the unevenness or damaged.
另一項先前技術可列舉於膜之背面塗佈聚矽氧脫模劑(專利文獻3)。但是,該技術存在如下問題:聚矽氧脫模劑因其表面張力而與膜背面之化學親合性較低,難以適應膜背面。又,於將在背面塗佈有聚矽氧脫模劑之膜應用於黏著帶之情形時,若進行延伸等黏著帶延伸,則會產生如下問題:存在利用聚矽氧脫模劑之處理層無法追隨延伸之情形,該處理層破碎而成為污染之原因。再者,為了提高聚矽氧脫模劑之與膜背面之化學親合性,亦有塗佈交聯型聚矽氧脫模劑之技術,但由於交聯型聚矽氧通常伸長係數非常小,因此於將於背面塗佈有交聯型聚矽氧脫模劑之膜應用於黏著帶之情形時,若進行延伸等黏著帶 延伸,則存在如下問題:利用交聯型聚矽氧脫模劑之處理層無法追隨延伸,而無法維持抓固性。 Another prior art is exemplified by coating a polyfluorene release agent on the back side of the film (Patent Document 3). However, this technique has a problem in that the polyoxoxime release agent has a low chemical affinity with the back surface of the film due to its surface tension, and it is difficult to adapt to the back surface of the film. Further, when a film having a polyfluorinated release agent coated on the back surface is applied to an adhesive tape, if an adhesive tape is stretched or the like is extended, there is a problem in that a treatment layer using a polyfluorene release agent is present. Unable to follow the extension, the treatment layer is broken and becomes a cause of contamination. Furthermore, in order to improve the chemical affinity of the polyfluorene oxygen release agent to the back side of the film, there is also a technique of coating a crosslinked polyoxylizer release agent, but since the crosslinked polyoxylized oxygen generally has a very small elongation coefficient. Therefore, when a film having a cross-linked polyfluorinated release agent coated on the back side is applied to an adhesive tape, if an adhesive tape is stretched or the like In the case of elongation, there is a problem that the treatment layer using the cross-linked polyoxyl release agent cannot follow the extension and cannot maintain the grip.
專利文獻1:日本專利特開2009-239124號公報 Patent Document 1: Japanese Patent Laid-Open Publication No. 2009-239124
專利文獻2:國際公開第2009/028069號說明書 Patent Document 2: International Publication No. 2009/028069
專利文獻3:日本專利特開2010-201836號公報 Patent Document 3: Japanese Patent Laid-Open Publication No. 2010-201836
本發明之課題在於提供一種黏著帶用膜,其係於基材膜上設置有非黏著層者,並且於藉由負壓而吸附固定於固定用基座上並進行切割等之情形時,可有效地抑制因基座之發熱等而引起過度密接之情況,又,可藉由將非黏著層設置於基材膜上,而有效地抑制輥狀之形態下之黏連,於自輥狀之形態回捲時不會破裂或破損,該非黏著層與該基材膜之適應性良好,對於延伸等變形之追隨性良好。又,本發明提供一種包含此種黏著帶用膜之黏著帶。 An object of the present invention is to provide a film for an adhesive tape which is provided with a non-adhesive layer on a base film and which is adsorbed and fixed to a fixing base by a negative pressure and is cut or the like. It is possible to effectively suppress excessive adhesion due to heat generation of the susceptor, and it is also possible to effectively prevent adhesion in a roll form by providing a non-adhesive layer on the base film. When the form is rewinded, it is not broken or broken, and the non-adhesive layer has good compatibility with the base film, and has good followability for deformation such as elongation. Further, the present invention provides an adhesive tape comprising such a film for an adhesive tape.
本發明之黏著帶用膜 Adhesive tape film of the present invention
係於塑膠膜之單面具備非黏著層者,並且該非黏著層之表面具有凹凸結構, 該非黏著層之表面之凸部分之利用奈米壓痕儀測得之80℃下之壓痕硬度為6.0 MPa以上。 The non-adhesive layer is provided on one side of the plastic film, and the surface of the non-adhesive layer has a concave-convex structure. The indentation hardness at 80 ° C measured by a nanoindenter of the convex portion of the surface of the non-adhesive layer was 6.0 MPa or more.
於較佳之實施形態中,上述非黏著層之算術平均表面粗糙度Ra為0.1 μm以上。 In a preferred embodiment, the non-adhesive layer has an arithmetic mean surface roughness Ra of 0.1 μm or more.
於較佳之實施形態中,上述非黏著層為聚矽氧與(甲基)丙烯酸系聚合物之混合層。 In a preferred embodiment, the non-adhesive layer is a mixed layer of a polyoxymethylene and a (meth)acrylic polymer.
於較佳之實施形態中,上述(甲基)丙烯酸系聚合物之計算Tg為10℃以上。 In a preferred embodiment, the (meth)acrylic polymer has a calculated Tg of 10 ° C or higher.
於較佳之實施形態中,上述(甲基)丙烯酸系聚合物之SP值為9.0(cal/cm3)0.5~12.0(cal/cm3)0.5。 In a preferred embodiment, the (meth)acrylic polymer has an SP value of 9.0 (cal/cm 3 ) of 0.5 to 12.0 (cal/cm 3 ) 0.5 .
於較佳之實施形態中,上述非黏著層中之聚矽氧與(甲基)丙烯酸系聚合物之混合比以重量比計為聚矽氧:(甲基)丙烯酸系聚合物=1:50~50:1。 In a preferred embodiment, the mixing ratio of the polyfluorene oxide to the (meth)acrylic polymer in the non-adhesive layer is polyoxymethylene in a weight ratio: (meth)acrylic polymer = 1:50~ 50:1.
於較佳之實施形態中,上述非黏著層具有相分離結構。 In a preferred embodiment, the non-adhesive layer has a phase separation structure.
於較佳之實施形態中,上述非黏著層之非黏著試驗剝離力未達1.0 N/20 mm。 In a preferred embodiment, the non-adhesive layer has a non-adhesive test peel force of less than 1.0 N/20 mm.
於較佳之實施形態中,上述非黏著層之厚度為0.01 μm~10 μm。 In a preferred embodiment, the non-adhesive layer has a thickness of 0.01 μm to 10 μm.
於較佳之實施形態中,上述塑膠膜之依據JIS-K-7127所測得之最大伸長率為100%以上。 In a preferred embodiment, the plastic film has a maximum elongation of 100% or more as measured according to JIS-K-7127.
於較佳之實施形態中,上述塑膠膜之厚度為20 μm~200 μm。 In a preferred embodiment, the plastic film has a thickness of 20 μm to 200 μm.
於較佳之實施形態中,上述塑膠膜包含聚氯乙烯。 In a preferred embodiment, the plastic film comprises polyvinyl chloride.
於本發明之另一實施形態中係提供一種黏著帶。本發明之黏著帶於本發明之黏著帶用膜中之上述塑膠膜之與上述非黏著層相反的面具備黏著劑層。 In another embodiment of the invention, an adhesive tape is provided. The adhesive tape of the present invention has an adhesive layer on the surface of the plastic film of the adhesive tape of the present invention opposite to the non-adhesive layer.
於較佳之實施形態中,上述黏著劑層包含至少一種(甲基)丙烯酸系聚合物。 In a preferred embodiment, the adhesive layer comprises at least one (meth)acrylic polymer.
於較佳之實施形態中,上述黏著劑層之SP值為9.0(cal/cm3)0.5~12.0(cal/cm3)0.5。 In a preferred embodiment, the adhesive layer has an SP value of 9.0 (cal/cm 3 ) of 0.5 to 12.0 (cal/cm 3 ) 0.5 .
於較佳之實施形態中,於上述黏著劑層之表面具備剝離襯墊。 In a preferred embodiment, a release liner is provided on the surface of the adhesive layer.
於較佳之實施形態中,本發明之黏著帶係用於半導體加工。 In a preferred embodiment, the adhesive tape of the present invention is used in semiconductor processing.
於較佳之實施形態中,本發明之黏著帶係用於LED切割用途。 In a preferred embodiment, the adhesive tape of the present invention is used for LED cutting applications.
根據本發明,可提供一種黏著帶用膜,其係於基材膜上設置有非黏著層者,並且於藉由負壓而吸附固定於固定用基座上並進行切割等之情形時,可有效地抑制因基座之發熱等而引起過度密接之情況,又,可藉由將非黏著層設置於基材膜上,而有效地抑制輥狀之形態下之黏連,於自輥狀之形態回捲時不會破裂或破損,該非黏著層與該基材膜之適應性良好,對於延伸等變形之追隨性良好。又,可提供一種包含此種黏著帶用膜之黏著帶。 According to the present invention, there is provided a film for an adhesive tape which is provided on a substrate film and which is provided with a non-adhesive layer, and which is adsorbed and fixed to a fixing base by a negative pressure and is cut or the like. It is possible to effectively suppress excessive adhesion due to heat generation of the susceptor, and it is also possible to effectively prevent adhesion in a roll form by providing a non-adhesive layer on the base film. When the form is rewinded, it is not broken or broken, and the non-adhesive layer has good compatibility with the base film, and has good followability for deformation such as elongation. Further, an adhesive tape comprising such a film for an adhesive tape can be provided.
圖1係表示本發明之黏著帶用膜中之非黏著層之表面側之狀態的SEM照片圖。 Fig. 1 is a SEM photograph showing the state of the surface side of the non-adhesive layer in the film for an adhesive tape of the present invention.
圖2係表示本發明之黏著帶用膜中之非黏著層之剖面側之狀態的SEM照片圖。 Fig. 2 is a SEM photograph showing a state of a cross-sectional side of a non-adhesive layer in the film for an adhesive tape of the present invention.
圖3係附說明地表示本發明之黏著帶用膜中之非黏著層之剖面側之狀態的SEM照片圖。 Fig. 3 is a SEM photograph showing the state of the cross-sectional side of the non-adhesive layer in the film for an adhesive tape of the present invention.
本發明之黏著帶用膜係於塑膠膜之單面具備非黏著層。 The film for an adhesive tape of the present invention has a non-adhesive layer on one side of the plastic film.
塑膠膜並無特別限定,可包含任意之適當之樹脂材料。作為此種樹脂材料,較佳為例如可列舉:聚氯乙烯、聚烯烴、聚酯、聚醯亞胺、聚醯胺等,更佳為可列舉聚氯乙烯、聚烯烴,進而較佳為可列舉聚氯乙烯。聚氯乙烯由於應力緩和性優異,故而尤其可適宜地用於LED切割等半導體加工所使用之黏著帶中可使用之黏著帶用膜。 The plastic film is not particularly limited and may include any suitable resin material. The resin material is preferably, for example, polyvinyl chloride, polyolefin, polyester, polyimine or polyamine. More preferably, it is polyvinyl chloride or polyolefin, and more preferably List polyvinyl chloride. Polyvinyl chloride is particularly suitable for use in an adhesive tape which can be used in an adhesive tape used for semiconductor processing such as LED dicing because it is excellent in stress relaxation property.
作為塑膠膜中之上述樹脂材料之含有比例,根據目的、用途,可設定任意之適當之含有比例。作為此種含有比例,例如較佳為50重量%~100重量%,更佳為60重量%~100重量%,進而較佳為70重量 %~100重量%。 The content ratio of the above-mentioned resin material in the plastic film can be set to any appropriate content ratio depending on the purpose and use. The content ratio is, for example, preferably 50% by weight to 100% by weight, more preferably 60% by weight to 100% by weight, still more preferably 70% by weight. %~100% by weight.
於塑膠膜中亦可包含塑化劑。塑膠膜中之塑化劑之含有比例相對於該塑膠膜中之上述樹脂材料,較佳為0.5重量%~50重量%,更佳為1.0重量%~40重量%。藉由於塑膠膜中以上述含有比例包含塑化劑,對於延伸等變形之追隨性變得更良好。 A plasticizer may also be included in the plastic film. The content of the plasticizer in the plastic film is preferably from 0.5% by weight to 50% by weight, more preferably from 1.0% by weight to 40% by weight, based on the above-mentioned resin material in the plastic film. Since the plastic film contains the plasticizer in the above-described content ratio, the followability to deformation such as elongation becomes better.
作為上述塑化劑,例如可列舉:鄰苯二甲酸酯系、偏苯三甲酸酯系(大日本油墨(股份有限公司)製造之W-700、偏苯三甲酸三辛酯等)、己二酸酯系(J-PLUS(股份有限公司)製造之D620、己二酸二辛酯、己二酸二異壬酯等)、磷酸酯系(磷酸三甲苯酯等)、己二酸系酯、檸檬酸酯(乙醯檸檬酸三丁酯等)、癸二酸酯、壬二酸酯、順丁烯二酸酯、苯甲酸酯、聚醚系聚酯、環氧系聚酯(環氧化大豆油、環氧化亞麻仁油等)、聚酯(包含羧酸及二醇之低分子聚酯等)等。於本發明中,較佳為使用酯系塑化劑。塑化劑可僅為一種,亦可為兩種以上。 Examples of the plasticizer include a phthalic acid ester type, a trimellitic acid ester type (W-700 manufactured by Dainippon Ink Co., Ltd., trioctyl trimellitate, etc.), and Diacid ester system (D620 manufactured by J-PLUS Co., Ltd., dioctyl adipate, diisononyl adipate, etc.), phosphate ester (such as tricresyl phosphate), adipic acid ester , citrate (acetyl tributyl citrate, etc.), sebacate, sebacate, maleate, benzoate, polyether polyester, epoxy polyester (ring Oxidized soybean oil, epoxidized linseed oil, etc.), polyester (low molecular weight polyester containing carboxylic acid and diol, etc.). In the present invention, an ester-based plasticizer is preferably used. The plasticizer may be used alone or in combination of two or more.
於塑膠膜中,於無損本發明之效果之範圍,亦可包含任意之適當之其他成分。 The plastic film may contain any suitable other components insofar as it does not impair the effects of the present invention.
塑膠膜依據JIS-K-7127所測得之最大伸長率較佳為100%以上,更佳為200%~1000%。可藉由使用顯示此種最大伸長率之塑膠膜,而對本發明之黏著帶用膜賦予適度之伸長率性,例如於將本發明之黏著帶用膜用於黏著帶之情形時,可提高對被黏著體之追隨性。 The maximum elongation of the plastic film measured according to JIS-K-7127 is preferably 100% or more, more preferably 200% to 1000%. The film for an adhesive tape of the present invention can be imparted with a moderate elongation by using a plastic film exhibiting such a maximum elongation, for example, when the film for an adhesive tape of the present invention is used for an adhesive tape, the pair can be improved. Followed by the adhesive.
塑膠膜之厚度較佳為20 μm~200 μm,更佳為40 μm~150 μm,進而較佳為50 μm~100 μm。於塑膠膜之厚度未達20 μm之情形時,有操作性變差之虞,尤其有於構成黏著帶時難以進行貼合作業之虞。若塑膠膜之厚度大於200 μm,則有對於延伸等變形之追隨性變差之虞。 The thickness of the plastic film is preferably from 20 μm to 200 μm, more preferably from 40 μm to 150 μm, and even more preferably from 50 μm to 100 μm. When the thickness of the plastic film is less than 20 μm, there is a problem that the operability is deteriorated, and it is particularly difficult to carry out the bonding work when the adhesive tape is formed. If the thickness of the plastic film is more than 200 μm, there is a problem that the followability to deformation such as elongation is deteriorated.
非黏著層只要為表面具有下述所規定之凹凸結構者,則組成等並無特別限定,作為其一例,為聚矽氧與(甲基)丙烯酸系聚合物之混 合層。藉由使非黏著層為聚矽氧與(甲基)丙烯酸系聚合物之混合層,非黏著層與塑膠膜之適應性變得良好,從而本發明之黏著帶用膜及包含其之黏著帶成為對於延伸等變形之追隨性良好者。 The composition of the non-adhesive layer is not particularly limited as long as it has a concavo-convex structure as defined below. As an example, it is a mixture of polyfluorene oxide and (meth)acrylic polymer. Layered. By making the non-adhesive layer a mixed layer of polyoxymethylene and a (meth)acrylic polymer, the adaptability of the non-adhesive layer and the plastic film becomes good, and the film for an adhesive tape of the present invention and the adhesive tape containing the same It is a good follower for deformation such as extension.
非黏著層之表面具有凹凸結構。關於該凹凸結構,具體而言,非黏著層之算術平均表面粗糙度Ra較佳為0.1 μm以上,更佳為0.1 μm~3.0 μm,進而較佳為0.2 μm~2.0 μm,尤佳為0.3 μm~2.0 μm,最佳為0.5 μm~2.0 μm。可藉由使非黏著層之算術平均表面粗糙度Ra收斂於上述範圍內,而於藉由負壓進行吸附固定之情形時,抑制發生過度密接之情況。 The surface of the non-adhesive layer has a concave-convex structure. With respect to the uneven structure, specifically, the arithmetic mean surface roughness Ra of the non-adhesive layer is preferably 0.1 μm or more, more preferably 0.1 μm to 3.0 μm, still more preferably 0.2 μm to 2.0 μm, and particularly preferably 0.3 μm. ~2.0 μm, preferably 0.5 μm~2.0 μm. When the arithmetic mean surface roughness Ra of the non-adhesive layer converges within the above range, when the adsorption is fixed by the negative pressure, excessive adhesion is suppressed.
關於非黏著層,其表面之凸部分之利用奈米壓痕儀測得之80℃下之壓痕硬度為6.0 MPa以上,較佳為10 MPa以上,更佳為15 MPa以上,進而較佳為18 MPa以上。非黏著層之表面之凸部分之利用奈米壓痕儀測得之80℃下之壓痕硬度的上限無特別限定,較佳為100 MPa以下,更佳為70 MPa以下,進而較佳為50 MPa以下,尤佳為40 MPa以下。只要非黏著層之表面之凸部分之利用奈米壓痕儀測得之80℃下之壓痕硬度收斂於上述範圍內,則於非黏著層之表面之微小之凹凸結構中,尤其是凸部分之硬度即便於高溫下亦適度地變高,因此耐熱性變高,而於本發明之黏著帶用膜中,於藉由負壓而吸附固定於固定用基座上並進行切割等之情形時,可有效地抑制因基座之發熱等而引起過度密接之情況。再者,非黏著層之表面之凸部分之利用奈米壓痕儀測得之80℃下之壓痕硬度的測定方法於下文說明。 Regarding the non-adhesive layer, the indentation hardness at 80 ° C measured by a nanoindenter on the convex portion of the surface is 6.0 MPa or more, preferably 10 MPa or more, more preferably 15 MPa or more, and further preferably 18 MPa or more. The upper limit of the indentation hardness at 80 ° C measured by a nanoindenter on the convex portion of the surface of the non-adhesive layer is not particularly limited, but is preferably 100 MPa or less, more preferably 70 MPa or less, and still more preferably 50. Below MPa, it is preferably 40 MPa or less. As long as the indentation hardness at 80 ° C measured by the nanoindenter of the non-adhesive layer converges within the above range, in the minute concave and convex structure on the surface of the non-adhesive layer, especially the convex portion When the hardness is moderately high even at a high temperature, the heat resistance is increased, and in the film for an adhesive tape of the present invention, when it is adsorbed and fixed to a fixing base by a negative pressure and is cut or the like, It is possible to effectively suppress excessive adhesion due to heat generation of the susceptor or the like. Further, the method of measuring the indentation hardness at 80 ° C measured by a nanoindenter on the convex portion of the surface of the non-adhesive layer is explained below.
於非黏著層為聚矽氧與(甲基)丙烯酸系聚合物之混合層之情形時,關於非黏著層中之(甲基)丙烯酸系聚合物,其計算Tg為10℃以上,較佳為20℃以上,更佳為30℃以上,進而較佳為45℃以上。非黏著層中之(甲基)丙烯酸系聚合物之計算Tg的上限無特別限定,較佳為200℃以下,更佳為150℃以下,進而較佳為100℃以下。藉由使非黏 著層中之(甲基)丙烯酸系聚合物之計算Tg收斂於上述範圍內,非黏著層之表面之微小之凹凸結構中之耐熱性變高,而於本發明之黏著帶用膜中,於藉由負壓而吸附固定於固定用基座上並進行切割等之情形時,可有效地抑制因基座之發熱等而引起過度密接之情況。 In the case where the non-adhesive layer is a mixed layer of a polyoxymethylene and a (meth)acrylic polymer, the (meth)acrylic polymer in the non-adhesive layer has a calculated Tg of 10 ° C or more, preferably 20 ° C or more, more preferably 30 ° C or more, further preferably 45 ° C or more. The upper limit of the calculated Tg of the (meth)acrylic polymer in the non-adhesive layer is not particularly limited, but is preferably 200 ° C or lower, more preferably 150 ° C or lower, and still more preferably 100 ° C or lower. By making non-sticky The calculated Tg of the (meth)acrylic polymer in the layer converges within the above range, and the heat resistance in the minute uneven structure on the surface of the non-adhesive layer becomes high, and in the film for an adhesive tape of the present invention, When it is adsorbed and fixed to the fixing base by the negative pressure and cut or the like, it is possible to effectively suppress excessive adhesion due to heat generation of the susceptor or the like.
於本發明中,共聚物(上述非黏著層中之(甲基)丙烯酸系聚合物等)之「計算Tg」係指關於源自構成共聚物之單體之結構單元之Tg,藉由Fox之計算式而求出之計算玻璃轉移溫度。Fox之式係指如下所示之共聚物之玻璃轉移溫度Tg(℃)與使構成共聚物之單體之各者單獨聚合而成之均聚物之玻璃轉移溫度Tgi(℃)的關係式。再者,於以下Fox之式中,Tg(℃)表示共聚物之玻璃轉移溫度,Wi表示單體i之重量分率,Tgi(℃)表示單體i之均聚物之玻璃轉移溫度。 In the present invention, the "calculated Tg" of the copolymer (the (meth)acrylic polymer in the non-adhesive layer, etc.) means the Tg derived from the structural unit of the monomer constituting the copolymer, by Fox Calculate the glass transition temperature calculated by the calculation formula. The formula of Fox refers to the relationship between the glass transition temperature Tg (° C.) of the copolymer shown below and the glass transition temperature Tg i (° C.) of the homopolymer obtained by separately polymerizing each of the monomers constituting the copolymer. . Further, in the following Fox formula, Tg (°C) represents the glass transition temperature of the copolymer, W i represents the weight fraction of the monomer i, and Tg i (° C) represents the glass transition temperature of the homopolymer of the monomer i. .
1/(273+Tg)=Σ(Wi/(273+Tgi)) 1/(273+Tg)=Σ(W i /(273+Tg i ))
再者,作為均聚物之玻璃轉移溫度Tgi(℃),具體而言,可使用「Polymer Handbook 3rd Edition」(A WILEY-INTERSCIENCE PUBLICATION,1989年)中記載之值。 Further, as the glass transition temperature Tg i (°C) of the homopolymer, specifically, the values described in "Polymer Handbook 3rd Edition" (A WILEY-INTERSCIENCE PUBLICATION, 1989) can be used.
於非黏著層包含(甲基)丙烯酸系聚合物之情形時,關於非黏著層中之(甲基)丙烯酸系聚合物,其SP值較佳為9.0(cal/cm3)0.5~12.0(cal/cm3)0.5,更佳為9.5(cal/cm3)0.5~11.5(cal/cm3)0.5,進而較佳為9.5(cal/cm3)0.5~11.0(cal/cm3)0.5。SP值係藉由Small之式而算出之溶解度參數。SP值之計算可藉由公知之文獻(例如Journal of Applied Chemistry,3,71,1953.等)中記載之方法而進行。 In the case where the non-adhesive layer contains a (meth)acrylic polymer, the SP value of the (meth)acrylic polymer in the non-adhesive layer is preferably 9.0 (cal/cm 3 ) 0.5 to 12.0 (cal /cm 3 ) 0.5 , more preferably 9.5 (cal/cm 3 ) 0.5 to 11.5 (cal/cm 3 ) 0.5 , further preferably 9.5 (cal/cm 3 ) 0.5 to 11.0 (cal/cm 3 ) 0.5 . The SP value is a solubility parameter calculated by the formula of Small. The calculation of the SP value can be carried out by a method described in a well-known literature (for example, Journal of Applied Chemistry, 3, 71, 1953., etc.).
非黏著層較佳為具有相分離結構。可藉由使非黏著層具有相分離結構,而於該非黏著層之表面高效率地形成微小之凹凸結構。推測很可能為:例如若以非黏著層為聚矽氧與(甲基)丙烯酸系聚合物之混合層之情形為例,則因相分離結構生成時之聚矽氧、(甲基)丙烯酸系聚合物之物質移動性之差異而生成凹凸。藉由該凹凸結構之形成,而 於本發明之黏著帶用膜中,於藉由負壓進行吸附固定之情形時,可抑制發生過度密接之情況,並且可有效地抑制輥狀之形態下之黏連,於自輥狀之形態回捲時可抑制破裂或破損。 The non-adhesive layer preferably has a phase separation structure. The minute uneven structure can be efficiently formed on the surface of the non-adhesive layer by providing the non-adhesive layer with a phase-separated structure. It is presumed that, for example, in the case where the non-adhesive layer is a mixed layer of polyoxymethylene and a (meth)acrylic polymer, the poly(oxy)oxy (meth)acrylic acid is formed by the phase separation structure. Concavities and convexities are generated by the difference in the mobility of the substances of the polymer. By the formation of the relief structure, In the film for an adhesive tape of the present invention, when the film is adsorbed and fixed by a negative pressure, excessive adhesion can be suppressed, and adhesion in a roll form can be effectively suppressed. It can suppress cracking or breakage when rewinding.
非黏著層較佳為包含:與(甲基)丙烯酸系聚合物相比含有更多聚矽氧之聚矽氧富集相、及與聚矽氧相比含有更多(甲基)丙烯酸系聚合物之(甲基)丙烯酸系聚合物富集相。更具體而言,非黏著層較佳為以上述聚矽氧富集相及上述(甲基)丙烯酸系聚合物富集相相互獨立之相分離結構而包含,更佳為上述聚矽氧富集相存在於空氣界面側(塑膠膜之相反側),上述(甲基)丙烯酸系聚合物富集相存在於塑膠膜側。藉由具有此種相分離結構,可藉由存在於空氣界面側之聚矽氧富集相而有效地抑制黏連,藉由存在於塑膠膜側之(甲基)丙烯酸系聚合物富集相而非黏著層與塑膠膜之適應性良好,而變形追隨性良好。可藉由如下所述地調整非黏著層中之聚矽氧與(甲基)丙烯酸系聚合物之混合比,而形成此種相分離結構。 The non-adhesive layer preferably comprises: a polyfluorene-rich polyphase containing more polyoxymethylene than the (meth)acrylic polymer, and more (meth)acrylic polymerization than polyfluorene. The (meth)acrylic polymer is enriched in the phase. More specifically, the non-adhesive layer is preferably contained in a phase-separated structure in which the polyfluorene-rich phase and the (meth)acryl-based polymer-rich phase are independent of each other, more preferably the above-mentioned polyfluorene-enriched The phase exists on the air interface side (opposite side of the plastic film), and the above (meth)acrylic polymer-rich phase exists on the plastic film side. By having such a phase separation structure, adhesion can be effectively suppressed by the polyfluorene-rich phase existing on the air interface side, and the (meth)acrylic polymer-rich phase existing on the plastic film side can be obtained. The non-adhesive layer has good adaptability to the plastic film, and the deformation followability is good. Such a phase separation structure can be formed by adjusting the mixing ratio of the polyfluorene oxide and the (meth)acrylic polymer in the non-adhesive layer as follows.
非黏著層具有相分離結構之情況、以及如上所述之包含與(甲基)丙烯酸系聚合物相比含有更多聚矽氧之聚矽氧富集相、及與聚矽氧相比含有更多(甲基)丙烯酸系聚合物之(甲基)丙烯酸系聚合物富集相之情況,可藉由任意之適當之方法而觀察。作為此種觀察方法,例如可列舉使用穿透式電子顯微鏡(TEM,transmission electron microscope)、掃描式電子顯微鏡(SEM,scanning electron microscope)、電解發射式掃描式電子顯微鏡(FE-SEM,field emission scanning electron microscope)等電子顯微鏡對非黏著層剖面進行形態觀察之方法。兩層分離結構可藉由形態觀察像之濃淡而判讀。又,亦可列舉如下方法:一面藉由利用全反射法之紅外線吸收光譜而自非黏著層空氣界面側向內部改變探測光深度,一面觀測組成中所含之矽及碳等之含量之變化,藉此進行觀察。此外,亦可列舉藉由X射線顯微 分析儀或X射線光電子光譜進行觀察之方法。又,亦可適當組合該等方法而進行觀察。 The non-adhesive layer has a phase-separated structure, and as described above, contains a polyfluorene-rich polyphase containing more polyoxymethylene than the (meth)acrylic polymer, and contains more than polyfluorene. The case of enriching the phase of the (meth)acrylic polymer of the poly(meth)acrylic polymer can be observed by any appropriate method. Examples of such an observation method include a transmission electron microscope (TEM), a scanning electron microscope (SEM), and an electron emission scanning electron microscope (FE-SEM). Electron microscope) A method of morphological observation of a non-adhesive layer profile by an electron microscope. The two-layer separation structure can be interpreted by observing the faintness of the morphological image. Further, a method of observing the change in the content of ruthenium and carbon contained in the composition by changing the depth of the probe light from the side of the non-adhesive layer air to the inside by using the infrared absorption spectrum of the total reflection method may be mentioned. Take this observation. X-ray microscopy Method for observation by an analyzer or X-ray photoelectron spectroscopy. Further, these methods can be combined as appropriate to observe.
於非黏著層具有存在於空氣界面側(塑膠膜之相反側)之聚矽氧富集相與存在於塑膠膜側之(甲基)丙烯酸系聚合物富集相的相分離結構之情形時,於藉由負壓而將該非黏著層吸附固定於固定用基座上而進行切割等時,若該固定用基座發熱,則因由該發熱而引起之熱負荷,使該相分離結構之表面結構被破壞,尤其是大多接觸於發熱之該固定用基座之凸部分中之該相分離結構之表面結構被破壞,而引起於該凸部分中之空氣界面側之(甲基)丙烯酸系聚合物富集相露出。但是,本發明之黏著帶用膜由於非黏著層之表面之凸部分之利用奈米壓痕儀測得之80℃下之壓痕硬度收斂於上述範圍內,因此受到熱負荷之凸部分之硬度適度地變高,因此耐熱性變高。因此,於本發明之黏著帶用膜中,於藉由負壓而吸附固定於固定用基座上並進行切割等之情形時,可有效地抑制因基座之發熱等而引起過度密接。 When the non-adhesive layer has a phase separation structure of a polyfluorene-rich phase existing on the air interface side (opposite side of the plastic film) and a (meth)acrylic polymer-rich phase existing on the plastic film side, When the non-adhesive layer is adsorbed and fixed to the fixing base by a negative pressure to perform cutting or the like, if the fixing base generates heat, the surface structure of the phase-separated structure is caused by the heat load caused by the heat generation. Destroyed, in particular, the surface structure of the phase separation structure in the convex portion of the fixing base which is mostly exposed to heat is broken, and the (meth)acrylic polymer on the air interface side in the convex portion is caused. Enrichment is revealed. However, the film for an adhesive tape of the present invention has a hardness of a convex portion subjected to a heat load due to the indentation hardness at 80 ° C measured by a nanoindenter measured by a convex portion of the surface of the non-adhesive layer. It is moderately high, so heat resistance becomes high. Therefore, in the film for an adhesive tape of the present invention, when it is adsorbed and fixed to the fixing base by a negative pressure and is cut or the like, excessive adhesion due to heat generation of the susceptor or the like can be effectively suppressed.
於非黏著層為聚矽氧與(甲基)丙烯酸系聚合物之混合層之情形時,非黏著層中之聚矽氧與(甲基)丙烯酸系聚合物之混合比以重量比計,較佳為聚矽氧:(甲基)丙烯酸系聚合物=1:50~50:1,更佳為聚矽氧:(甲基)丙烯酸系聚合物=1:30~30:1,進而較佳為聚矽氧:(甲基)丙烯酸系聚合物=1:10~10:1,尤佳為聚矽氧:(甲基)丙烯酸系聚合物=1:5~5:1,最佳為聚矽氧:(甲基)丙烯酸系聚合物=1:3~5:1。若非黏著層中之聚矽氧之含有比例過大,則存在與塑膠膜背面之化學親合性降低,而難以適應於塑膠膜背面之虞。又,若非黏著層中之聚矽氧之含有比例過大,則於作為黏著帶用膜或包括其之黏著帶之情形時,存在對於延伸等變形之追隨性變差,而非黏著層破碎而成為污染之原因之虞。若非黏著層中之(甲基)丙烯酸系聚合物之含有比例過大,則存在非黏著層作為丙烯酸系黏著劑而發揮作用之虞,而存在易產生黏連之 虞。 In the case where the non-adhesive layer is a mixed layer of a polyoxymethylene and a (meth)acrylic polymer, the mixing ratio of the polyfluorene oxide to the (meth)acrylic polymer in the non-adhesive layer is Preferably, it is a polyoxymethylene: (meth)acrylic polymer = 1:50 to 50:1, more preferably polyoxyn: (meth)acrylic polymer = 1:30 to 30:1, and further preferably Polyoxyl: (meth)acrylic polymer = 1:10~10:1, especially polyoxyl: (meth)acrylic polymer = 1:5~5:1, the best is poly Oxygen: (meth)acrylic polymer = 1:3 to 5:1. If the proportion of the polyoxyl oxide in the non-adhesive layer is too large, the chemical affinity with the back surface of the plastic film is lowered, and it is difficult to adapt to the back of the plastic film. Further, when the content ratio of the polyfluorene oxide in the non-adhesive layer is too large, when it is used as a film for an adhesive tape or an adhesive tape including the same, the followability to deformation such as elongation is deteriorated, and the non-adhesive layer is broken. The cause of pollution. If the content ratio of the (meth)acrylic polymer in the non-adhesive layer is too large, the non-adhesive layer functions as an acrylic adhesive, and there is a tendency to cause adhesion. Hey.
作為聚矽氧,可採用任意之適當之聚矽氧。作為此種聚矽氧,例如可列舉:加成型聚矽氧,其係將鉑系化合物作為觸媒,並藉由加成反應而使含有烯基之聚二烷基矽氧烷及聚二烷基氫聚矽氧烷硬化而形成剝離性皮膜而獲得;縮合型聚矽氧,其係使利用有錫系觸媒之含有羥甲基之聚二烷基矽氧烷與聚二烷基氫聚矽氧烷進行反應而獲得等。作為加成型聚矽氧之例,例如可列舉Shin-Etsu Silicones製造之「KS-776A」、「KS-839L」等。作為縮合型聚矽氧之例,例如可列舉Shin-Etsu Silicones製造之「KS723A/B」等。再者,於製造聚矽氧時,除鉑系觸媒或錫系觸媒以外,亦可適當使用其他交聯劑、交聯促進劑等。又,作為聚矽氧之性狀,可分類為:溶解於甲苯等有機溶劑之類型;將其等乳液化而成之乳液類型;僅包含聚矽氧之無溶劑類型等。又,除加成型聚矽氧及縮合型聚矽氧以外,可使用聚矽氧/丙烯酸接枝聚合物、聚矽氧/丙烯酸嵌段聚合物等。作為聚矽氧/丙烯酸接枝聚合物,例如可列舉:Symac GS-30、GS101、US-270、US-350、US-380(以上為東亞合成(股份有限公司)製造)等。作為聚矽氧/丙烯酸嵌段聚合物,例如可列舉:MODIPER FS700、FS710、FS720、FS730、FS770(以上為日油(股份有限公司)製造)等。 As the polyoxane, any suitable polyoxane can be used. Examples of such a polyfluorene oxide include addition-formed polyfluorene oxide which uses a platinum-based compound as a catalyst, and an alkenyl group-containing polydialkyloxirane and polydioxane by an addition reaction. The hydrogen hydride is cured to form a detachable film; the condensed polyoxyxene is a polydialkyl oxirane containing a hydroxymethyl group and a polydialkyl hydrogen condensed by a tin-based catalyst. The oxirane is reacted to obtain an equivalent. Examples of the addition polyoxyl oxide include "KS-776A" and "KS-839L" manufactured by Shin-Etsu Silicones. Examples of the condensed polyfluorene oxide include "KS723A/B" manufactured by Shin-Etsu Silicones. Further, in the production of polyfluorene oxide, other crosslinking agents, crosslinking accelerators, and the like may be suitably used in addition to the platinum-based catalyst or the tin-based catalyst. Further, the properties of the polyoxane can be classified into a type in which an organic solvent such as toluene is dissolved, an emulsion type obtained by emulsifying it, and the like, and a solvent-free type including only polyfluorene. Further, in addition to the addition of polyfluorene oxide and condensed polyfluorene oxide, a polyfluorene/acrylic graft polymer, a polyoxyn/acrylic block polymer or the like can be used. Examples of the polyoxymethylene/acrylic acid graft polymer include Symac GS-30, GS101, US-270, US-350, and US-380 (the above is manufactured by Toagosei Co., Ltd.). Examples of the polyoxymethylene/acrylic acid block polymer include MODIPER FS700, FS710, FS720, FS730, and FS770 (above, manufactured by Nippon Oil Co., Ltd.).
作為(甲基)丙烯酸系聚合物,可採用任意之適當之(甲基)丙烯酸系聚合物。再者,於本發明中,「(甲基)丙烯酸」係指「丙烯酸及/或甲基丙烯酸」。 As the (meth)acrylic polymer, any suitable (meth)acrylic polymer can be used. In the present invention, "(meth)acrylic" means "acrylic acid and/or methacrylic acid".
(甲基)丙烯酸系聚合物係包含含有(甲基)丙烯酸系單體作為主單體之單體成分之聚合物。構成上述(甲基)丙烯酸系聚合物之單體成分中之(甲基)丙烯酸系單體之含有比例較佳為50重量%以上,更佳為70重量%~100重量%,進而較佳為90重量~100重量%,尤佳為95重量%~100重量%。上述單體成分中之單體可僅為一種,亦可為兩種以 上。 The (meth)acrylic polymer is a polymer containing a monomer component containing a (meth)acrylic monomer as a main monomer. The content of the (meth)acrylic monomer in the monomer component constituting the (meth)acrylic polymer is preferably 50% by weight or more, more preferably 70% by weight to 100% by weight, still more preferably 90% to 100% by weight, particularly preferably 95% by weight to 100% by weight. The monomer in the above monomer component may be only one type or two types. on.
作為(甲基)丙烯酸系單體,較佳為可列舉(甲基)丙烯酸酯、(甲基)丙烯酸。 The (meth)acrylic monomer is preferably (meth)acrylate or (meth)acrylic acid.
作為(甲基)丙烯酸酯,例如可列舉碳數為1~30之烷基(亦包含環烷基)之(甲基)丙烯酸烷基酯、含有羥基之(甲基)丙烯酸酯等。(甲基)丙烯酸酯可僅為一種,亦可為兩種以上。 Examples of the (meth) acrylate include an alkyl (meth)acrylate having a carbon number of 1 to 30 (including a cycloalkyl group), a (meth)acrylate containing a hydroxyl group, and the like. The (meth) acrylate may be used alone or in combination of two or more.
作為碳數為1~30之烷基(亦包含環烷基)之(甲基)丙烯酸烷基酯,例如可列舉:(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丙酯、(甲基)丙烯酸異丙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第二丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸戊酯、(甲基)丙烯酸戊酯、(甲基)丙烯酸己酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸庚酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸辛酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸壬酯、(甲基)丙烯酸異壬酯、(甲基)丙烯酸癸酯、(甲基)丙烯酸異癸酯、(甲基)丙烯酸十一烷基酯、(甲基)丙烯酸十二烷基酯、(甲基)丙烯酸十三烷基酯、(甲基)丙烯酸十四烷基酯、(甲基)丙烯酸十五烷基酯、(甲基)丙烯酸十八烷基酯、(甲基)丙烯酸十九烷基酯、(甲基)丙烯酸二十烷基酯、(甲基)丙烯酸月桂酯等碳數為1~30之烷基(亦包含環烷基)之(甲基)丙烯酸烷基酯等。於該等(甲基)丙烯酸酯中,較佳為碳數為2~20之烷基(亦包含環烷基)之(甲基)丙烯酸烷基酯,更佳為碳數為4~18之烷基(亦包含環烷基)之(甲基)丙烯酸烷基酯。 Examples of the (meth)acrylic acid alkyl ester having an alkyl group having 1 to 30 carbon atoms (including a cycloalkyl group) include methyl (meth)acrylate, ethyl (meth)acrylate, and (methyl). ) propyl acrylate, isopropyl (meth) acrylate, butyl (meth) acrylate, isobutyl (meth) acrylate, second butyl (meth) acrylate, tert-butyl (meth) acrylate , amyl (meth)acrylate, amyl (meth)acrylate, hexyl (meth)acrylate, cyclohexyl (meth)acrylate, heptyl (meth)acrylate, 2-ethyl (meth)acrylate Hexyl hexyl ester, octyl (meth) acrylate, isooctyl (meth) acrylate, decyl (meth) acrylate, isodecyl (meth) acrylate, decyl (meth) acrylate, (methyl) Isodecyl acrylate, undecyl (meth) acrylate, dodecyl (meth) acrylate, tridecyl (meth) acrylate, tetradecyl (meth) acrylate, ( Pentadecyl methyl methacrylate, octadecyl (meth) acrylate, hexadecyl (meth) acrylate, eicosyl (meth) acrylate, lauryl (meth) acrylate An alkyl group having a carbon number of 1 to 30 (also including a ring) An alkyl (meth) acrylate or the like. Among the (meth) acrylates, an alkyl (meth) acrylate having an alkyl group having 2 to 20 carbon atoms (including a cycloalkyl group) is preferred, and a carbon number of 4 to 18 is more preferred. An alkyl (meth)acrylate of an alkyl group (also containing a cycloalkyl group).
作為含有羥基之(甲基)丙烯酸酯,例如可列舉:(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基丙酯、(甲基)丙烯酸4-羥基丁酯等。 Examples of the hydroxyl group-containing (meth) acrylate include 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, and 4-hydroxybutyl (meth)acrylate.
構成上述(甲基)丙烯酸系聚合物之單體成分為了充分地呈現本發明之效果,亦可含有選自含有羥基之單體、含有羧基之單體之至少一種。 The monomer component constituting the (meth)acrylic polymer may contain at least one selected from the group consisting of a hydroxyl group-containing monomer and a carboxyl group-containing monomer in order to sufficiently exhibit the effects of the present invention.
作為含有羥基之單體,例如可列舉烯丙醇等。含有羥基之單體可僅為一種,亦可為兩種以上。 Examples of the hydroxyl group-containing monomer include allyl alcohol and the like. The monomer having a hydroxyl group may be one type or two or more types.
作為含有羧基之單體,例如可列舉:(甲基)丙烯酸羧基乙酯、(甲基)丙烯酸羧基戊酯、丁烯酸、順丁烯二酸、反丁烯二酸、亞甲基丁二酸等。含有羧基之單體可僅為一種,亦可為兩種以上。 Examples of the carboxyl group-containing monomer include carboxyethyl (meth)acrylate, carboxypentyl (meth)acrylate, crotonic acid, maleic acid, fumaric acid, and methylene butadiene. Acid, etc. The monomer having a carboxyl group may be one type or two or more types.
於非黏著層包含(甲基)丙烯酸系聚合物之情形時,非黏著層中之(甲基)丙烯酸系聚合物較佳為構成其之單體成分中之含有羥基之(甲基)丙烯酸酯的含有比例,相對於除該含有羥基之(甲基)丙烯酸酯以外之單體成分之總量,較佳為2重量%~30重量%,更佳為3重量%~25重量%,尤佳為5重量%~20重量%。於非黏著層包含(甲基)丙烯酸系聚合物之情形時,非黏著層中之構成(甲基)丙烯酸系聚合物之單體成分中之含有羥基之(甲基)丙烯酸酯的含有比例,相對於除該含有羥基之(甲基)丙烯酸酯以外之單體成分之總量,只要收斂於上述範圍內,則可於非黏著層之表面進一步高效率地形成微小之凹凸結構,藉由該凹凸結構之形成,而於本發明之黏著帶用膜中,於藉由負壓進行吸附固定之情形時可進一步抑制發生過度密接之情況,並且可進一步有效地抑制輥狀之形態下之黏連,於自輥狀之形態回捲時可進一步抑制破裂或破損。 When the non-adhesive layer contains a (meth)acrylic polymer, the (meth)acrylic polymer in the non-adhesive layer is preferably a hydroxyl group-containing (meth) acrylate in the monomer component constituting the non-adhesive layer. The content ratio is preferably 2% by weight to 30% by weight, more preferably 3% by weight to 25% by weight, based on the total amount of the monomer components other than the hydroxyl group-containing (meth) acrylate. It is 5% by weight to 20% by weight. When the non-adhesive layer contains a (meth)acrylic polymer, the content ratio of the hydroxyl group-containing (meth) acrylate in the monomer component of the (meth)acrylic polymer in the non-adhesive layer, When the total amount of the monomer components other than the hydroxyl group-containing (meth) acrylate is condensed within the above range, a minute uneven structure can be further efficiently formed on the surface of the non-adhesive layer. In the film for an adhesive tape of the present invention, in the case of adsorption and fixation by a negative pressure, excessive adhesion can be further suppressed, and adhesion in a roll form can be further effectively suppressed. It can further suppress cracking or breakage when rewinding from the roll form.
於非黏著層包含(甲基)丙烯酸系聚合物之情形時,非黏著層中之(甲基)丙烯酸系聚合物係較佳為於構成其之單體成分中之除含有羥基之(甲基)丙烯酸酯以外之單體成分中包含(甲基)丙烯酸及/或(甲基)丙烯酸酯。於該情形時,(甲基)丙烯酸與(甲基)丙烯酸酯之含有比例以重量比計,(甲基)丙烯酸:(甲基)丙烯酸酯較佳為0:100~20:80,更佳為0:100~10:90,進而較佳為0:100~5:95。 When the non-adhesive layer contains a (meth)acrylic polymer, the (meth)acrylic polymer in the non-adhesive layer is preferably one of the monomer components constituting the hydroxyl group (methyl group). The monomer component other than the acrylate contains (meth)acrylic acid and/or (meth)acrylic acid ester. In this case, the ratio of (meth)acrylic acid to (meth) acrylate is in a weight ratio, and (meth)acrylic acid: (meth) acrylate is preferably 0:100 to 20:80, more preferably It is 0:100~10:90, and further preferably 0:100~5:95.
只要(甲基)丙烯酸與(甲基)丙烯酸酯之含有比例收斂於上述範圍內,則於非黏著層之表面進一步高效率地形成微小之凹凸結構,藉由 該凹凸結構之形成,而於本發明之黏著帶用膜中,於藉由負壓進行吸附固定之情形時可進一步抑制發生過度密接之情況,並且可進一步有效地抑制輥狀之形態下之黏連,於自輥狀之形態回捲時可進一步抑制破裂或破損。 As long as the content ratio of the (meth)acrylic acid to the (meth)acrylic acid condenses within the above range, a minute uneven structure is further efficiently formed on the surface of the non-adhesive layer by In the film for an adhesive tape of the present invention, in the case of adsorption and fixation by a negative pressure, excessive adhesion can be further suppressed, and the stickiness in the form of a roll can be further effectively suppressed. Further, cracking or breakage can be further suppressed when rewinding from the form of a roll.
(甲基)丙烯酸系聚合物可藉由任意之適當之聚合方法而製造。 The (meth)acrylic polymer can be produced by any suitable polymerization method.
於非黏著層中,於無損本發明之效果之範圍,亦可包含任意之適當之添加劑。作為此種添加劑,例如可列舉:觸媒、紫外線吸收劑、填充劑、抗老化劑、黏著賦予劑、顏料、染料、矽烷偶合劑等。 In the non-adhesive layer, any suitable additive may be included in the range which does not impair the effects of the present invention. Examples of such an additive include a catalyst, an ultraviolet absorber, a filler, an anti-aging agent, an adhesion-imparting agent, a pigment, a dye, and a decane coupling agent.
關於非黏著層,其非黏著試驗剝離力較佳為未達1.0 N/20 mm,更佳為未達0.5 N/20 mm,進而較佳為未達0.2 N/20 mm。可藉由非黏著層之非黏著試驗剝離力收斂於上述範圍內,而於藉由負壓進行吸附固定之情形時進一步抑制發生過度密接之情況。於本發明中,非黏著層之非黏著試驗剝離力係根據下述方法而測定。 Regarding the non-adhesive layer, the non-adhesive test peeling force is preferably less than 1.0 N/20 mm, more preferably less than 0.5 N/20 mm, and further preferably less than 0.2 N/20 mm. The peeling force by the non-adhesive layer of the non-adhesive layer converges within the above range, and when the adsorption is fixed by the negative pressure, the excessive adhesion is further suppressed. In the present invention, the non-adhesive test peeling force of the non-adhesive layer was measured according to the following method.
非黏著層之厚度較佳為0.01 μm~10 μm,更佳為0.1 μm~5 μm,進而較佳為0.1 μm~2 μm。於非黏著層之厚度未達0.01 μm之情形時,易產生黏連。若非黏著層之厚度大於10 μm,則有對於延伸等變形之追隨性變差之虞。若非黏著層之厚度小於0.01 μm,則存在難以呈現本發明之效果之虞,或者存在難以製造之虞。 The thickness of the non-adhesive layer is preferably from 0.01 μm to 10 μm, more preferably from 0.1 μm to 5 μm, still more preferably from 0.1 μm to 2 μm. When the thickness of the non-adhesive layer is less than 0.01 μm, adhesion is likely to occur. If the thickness of the non-adhesive layer is more than 10 μm, there is a problem that the followability to deformation such as elongation is deteriorated. If the thickness of the non-adhesive layer is less than 0.01 μm, there is a possibility that the effect of the present invention is hard to be exhibited, or there is a flaw in that it is difficult to manufacture.
作為於塑膠膜之單面形成非黏著層之方法,例如可列舉如下方法:藉由於塑膠膜之單面塗佈非黏著層之材料並進行乾燥,而形成非黏著層。作為上述塗佈之方法,例如可列舉使用棒式塗佈機、凹版塗佈機、旋轉塗佈機、輥式塗佈機、刮刀塗佈機及敷料器等之方法。 As a method of forming a non-adhesive layer on one side of a plastic film, for example, a method in which a non-adhesive layer is formed by coating a material of a non-adhesive layer on one side of a plastic film and drying it is exemplified. Examples of the coating method include a bar coater, a gravure coater, a spin coater, a roll coater, a knife coater, and an applicator.
本發明之黏著帶於本發明之黏著帶用膜中之上述塑膠膜之與上述非黏著層相反的面具備黏著劑層。 The adhesive tape of the present invention has an adhesive layer on the surface of the plastic film of the adhesive tape of the present invention opposite to the non-adhesive layer.
黏著劑層之厚度並無特別限定,較佳為1.0 μm~30 μm,更佳為 1.0 μm~20 μm,進而較佳為3.0 μm~15 μm。於黏著劑層之厚度未達1.0 μm之情形時,存在無法呈現充分之黏著力之虞。於黏著劑層之厚度大於30 μm之情形時,存在根據用途黏著力過度變大,而於剝離等時使被黏著體破碎之虞。 The thickness of the adhesive layer is not particularly limited, and is preferably 1.0 μm to 30 μm, more preferably 1.0 μm to 20 μm, and more preferably 3.0 μm to 15 μm. When the thickness of the adhesive layer is less than 1.0 μm, there is a possibility that sufficient adhesion cannot be exhibited. When the thickness of the adhesive layer is more than 30 μm, there is a tendency that the adhesive force is excessively increased according to the use, and the adherend is broken at the time of peeling or the like.
作為上述黏著劑層之材料,於無損本發明之效果之範圍,可採用任意之適當之黏著劑。 As the material of the above adhesive layer, any suitable adhesive can be employed without departing from the effects of the present invention.
作為黏著劑層之材料,例如可列舉:(甲基)丙烯酸系聚合物;天然橡膠;使甲基丙烯酸甲酯等單體接枝而成之特殊天然橡膠;SBS、SBR、SEPS、SIS、SEBS、聚丁烯、聚異丁烯、聚異丁烯、丁基橡膠等合成橡膠等。於該等中,於對剝離後之被黏著體之糊劑殘餘較少,具有高黏聚性,透明性優異之方面,較佳為至少一種(甲基)丙烯酸系聚合物。 Examples of the material of the adhesive layer include a (meth)acrylic polymer; a natural rubber; a special natural rubber obtained by grafting a monomer such as methyl methacrylate; SBS, SBR, SEPS, SIS, SEBS. , synthetic rubber such as polybutene, polyisobutylene, polyisobutylene, butyl rubber, etc. Among these, at least one (meth)acrylic polymer is preferred because it has less residual residue of the adherend after peeling, has high cohesiveness, and is excellent in transparency.
於黏著劑層包含(甲基)丙烯酸系聚合物之情形時,黏著劑層中之(甲基)丙烯酸系聚合物之含有比例可根據目的而適當設定。 In the case where the adhesive layer contains a (meth)acrylic polymer, the content ratio of the (meth)acrylic polymer in the adhesive layer can be appropriately set depending on the purpose.
上述(甲基)丙烯酸系聚合物係包含含有(甲基)丙烯酸系單體作為主單體之單體成分之樹脂。構成上述(甲基)丙烯酸系聚合物之單體成分中之(甲基)丙烯酸系單體之含有比例較佳為50重量%以上,更佳為70重量%~100重量%,進而較佳為90重量%~100重量%,尤佳為95重量%~100重量%。上述單體成分中之單體可僅為一種,亦可為兩種以上。 The (meth)acrylic polymer is a resin containing a monomer component containing a (meth)acrylic monomer as a main monomer. The content of the (meth)acrylic monomer in the monomer component constituting the (meth)acrylic polymer is preferably 50% by weight or more, more preferably 70% by weight to 100% by weight, still more preferably 90% by weight to 100% by weight, particularly preferably 95% by weight to 100% by weight. The monomer in the above monomer component may be one type or two or more types.
作為(甲基)丙烯酸系單體,較佳為可列舉(甲基)丙烯酸酯、(甲基)丙烯酸。 The (meth)acrylic monomer is preferably (meth)acrylate or (meth)acrylic acid.
作為(甲基)丙烯酸酯,例如可列舉碳數為1~30之烷基(亦包含環烷基)之(甲基)丙烯酸烷基酯、含有羥基之(甲基)丙烯酸酯等。(甲基)丙烯酸酯可僅為一種,亦可為兩種以上。 Examples of the (meth) acrylate include an alkyl (meth)acrylate having a carbon number of 1 to 30 (including a cycloalkyl group), a (meth)acrylate containing a hydroxyl group, and the like. The (meth) acrylate may be used alone or in combination of two or more.
作為碳數為1~30之烷基(亦包含環烷基)之(甲基)丙烯酸烷基酯, 例如可列舉:(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丙酯、(甲基)丙烯酸異丙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第二丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸戊酯、(甲基)丙烯酸戊酯、(甲基)丙烯酸己酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸庚酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸辛酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸壬酯、(甲基)丙烯酸異壬酯、(甲基)丙烯酸癸酯、(甲基)丙烯酸異癸酯、(甲基)丙烯酸十一烷基酯、(甲基)丙烯酸十二烷基酯、(甲基)丙烯酸十三烷基酯、(甲基)丙烯酸十四烷基酯、(甲基)丙烯酸十五烷基酯、(甲基)丙烯酸十八烷基酯、(甲基)丙烯酸十九烷基酯、(甲基)丙烯酸二十烷基酯、(甲基)丙烯酸月桂酯等碳數為1~30之烷基(亦包含環烷基)之(甲基)丙烯酸烷基酯等。於該等(甲基)丙烯酸酯中,較佳為碳數為2~20之烷基(亦包含環烷基)之(甲基)丙烯酸烷基酯,更佳為碳數為4~18之烷基(亦包含環烷基)之(甲基)丙烯酸烷基酯。 As an alkyl (meth)acrylate having an alkyl group having 1 to 30 carbon atoms (including a cycloalkyl group), For example, methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, isopropyl (meth)acrylate, butyl (meth)acrylate, (meth)acrylic acid Isobutyl ester, dibutyl (meth)acrylate, tert-butyl (meth)acrylate, amyl (meth)acrylate, amyl (meth)acrylate, hexyl (meth)acrylate, (A) Base) cyclohexyl acrylate, heptyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, octyl (meth) acrylate, isooctyl (meth) acrylate, bismuth (meth) acrylate Esters, isodecyl (meth)acrylate, decyl (meth)acrylate, isodecyl (meth)acrylate, undecyl (meth)acrylate, dodecyl (meth)acrylate, Tridecyl (meth)acrylate, tetradecyl (meth)acrylate, pentadecyl (meth)acrylate, octadecyl (meth)acrylate, (meth)acrylic acid a (meth)acrylic acid alkyl ester having a carbon number of 1 to 30 (including a cycloalkyl group) such as a nonaalkyl ester, an eicosyl (meth)acrylate or a lauryl (meth)acrylate . Among the (meth) acrylates, an alkyl (meth) acrylate having an alkyl group having 2 to 20 carbon atoms (including a cycloalkyl group) is preferred, and a carbon number of 4 to 18 is more preferred. An alkyl (meth)acrylate of an alkyl group (also containing a cycloalkyl group).
作為含有羥基之(甲基)丙烯酸酯,例如可列舉:(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基丙酯、(甲基)丙烯酸4-羥基丁酯等。 Examples of the hydroxyl group-containing (meth) acrylate include 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, and 4-hydroxybutyl (meth)acrylate.
構成上述(甲基)丙烯酸系聚合物之單體成分為了充分地呈現作為黏著劑之效果,較佳為包含選自含有羥基之單體及含有羧基之單體之至少一種。更佳為含有羧基之單體。又,構成上述(甲基)丙烯酸系聚合物之單體成分為了充分地呈現作為黏著劑之效果,可包含丙烯腈。 In order to sufficiently exhibit the effect as an adhesive, the monomer component constituting the (meth)acrylic polymer preferably contains at least one selected from the group consisting of a hydroxyl group-containing monomer and a carboxyl group-containing monomer. More preferably, it is a monomer having a carboxyl group. Further, the monomer component constituting the (meth)acrylic polymer may contain acrylonitrile in order to sufficiently exhibit the effect as an adhesive.
作為含有羥基之單體,例如可列舉:(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基丙酯、(甲基)丙烯酸4-羥基丁酯、烯丙醇等。含有羥基之單體亦可僅為一種,亦可為兩種以上。 Examples of the hydroxyl group-containing monomer include 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, and allyl alcohol. The monomer having a hydroxyl group may be one type or two or more types.
作為含有羧基之單體,例如可列舉:(甲基)丙烯酸、(甲基)丙烯酸羧基乙酯、(甲基)丙烯酸羧基戊酯、丁烯酸、順丁烯二酸、反丁烯二酸、亞甲基丁二酸等。含有羧基之單體可僅為一種,亦可為兩種以 上。 Examples of the carboxyl group-containing monomer include (meth)acrylic acid, carboxyethyl (meth)acrylate, carboxypentyl (meth)acrylate, crotonic acid, maleic acid, and fumaric acid. , methylene succinic acid, and the like. The monomer having a carboxyl group may be one type or two types. on.
於構成上述(甲基)丙烯酸系聚合物之單體成分包含含有羥基之單體之情形時,構成上述(甲基)丙烯酸系聚合物之單體成分中之含有羥基之單體之含有比例較佳為0.1重量%~20重量%,更佳為0.1重量%~10重量%。於構成上述(甲基)丙烯酸系聚合物之單體成分包含含有羧基之單體之情形時,構成上述(甲基)丙烯酸系聚合物之單體成分中之含有羧基之單體之含有比例較佳為0.1重量%~20重量%,更佳為0.1重量%~10重量%。如此,可藉由構成上述(甲基)丙烯酸系聚合物之單體成分包含選自含有羥基之單體及含有羧基之單體之至少一種,而於使用交聯劑之情形時,高效率地產生與該交聯劑之交聯反應,而充分地呈現作為黏著劑之效果。進而,以收斂於上述範圍內之方式,調整構成上述(甲基)丙烯酸系聚合物之單體成分中之含有羥基之單體的含有比例、及構成上述(甲基)丙烯酸系聚合物之單體成分中之含有羧基之單體的含有比例,藉此可有效地防止剝離操作時之被黏著體之破碎。於構成上述(甲基)丙烯酸系聚合物之單體成分中之含有羥基之單體的含有比例、及構成上述(甲基)丙烯酸系聚合物之單體成分中之含有羧基之單體的含有比例較上述範圍過多之情形時,存在黏著力過度變大,而易產生黏連之虞,又,存在於剝離操作時易產生被黏著體之破碎之虞。 When the monomer component constituting the (meth)acrylic polymer contains a monomer having a hydroxyl group, the content ratio of the monomer having a hydroxyl group in the monomer component constituting the (meth)acrylic polymer is higher. It is preferably from 0.1% by weight to 20% by weight, more preferably from 0.1% by weight to 10% by weight. When the monomer component constituting the (meth)acrylic polymer contains a monomer having a carboxyl group, the content ratio of the monomer having a carboxyl group in the monomer component constituting the (meth)acrylic polymer is higher. It is preferably from 0.1% by weight to 20% by weight, more preferably from 0.1% by weight to 10% by weight. In this way, the monomer component constituting the (meth)acrylic polymer may contain at least one selected from the group consisting of a hydroxyl group-containing monomer and a carboxyl group-containing monomer, and when a crosslinking agent is used, it is highly efficient. A crosslinking reaction with the crosslinking agent is generated to sufficiently exhibit the effect as an adhesive. Further, the content ratio of the monomer having a hydroxyl group in the monomer component constituting the (meth)acrylic polymer and the single crystal constituting the (meth)acrylic polymer are adjusted so as to converge within the above range. The content ratio of the carboxyl group-containing monomer in the body component can effectively prevent the adhering body from being broken during the peeling operation. The content ratio of the monomer having a hydroxyl group in the monomer component constituting the (meth)acrylic polymer, and the content of the monomer having a carboxyl group in the monomer component constituting the (meth)acrylic polymer When the ratio is too large in the above range, the adhesion is excessively large, and the adhesion is liable to occur, and the crucible is likely to be broken during the peeling operation.
黏著劑層較佳為包含交聯劑。於黏著劑層包含交聯劑之情形時,黏著劑層中之交聯劑之含有比例可根據目的而適當設定,但較佳為相對於主要之樹脂成分(較佳為(甲基)丙烯酸系聚合物),為0.1重量%~20重量%。可藉由將黏著劑層中之交聯劑之含有比例收斂於上述範圍內,而產生適度之交聯反應,從而可有效地防止剝離操作時之被黏著體之破碎。 The adhesive layer preferably contains a crosslinking agent. In the case where the adhesive layer contains a crosslinking agent, the content ratio of the crosslinking agent in the adhesive layer can be appropriately set depending on the purpose, but is preferably relative to the main resin component (preferably (meth)acrylic acid) The polymer) is from 0.1% by weight to 20% by weight. By appropriately converging the content ratio of the crosslinking agent in the adhesive layer to the above range, a moderate crosslinking reaction can be produced, whereby the breakage of the adherend at the time of the peeling operation can be effectively prevented.
作為交聯劑,例如可列舉:環氧系交聯劑、異氰酸酯系交聯 劑、三聚氰胺系交聯劑、過氧化物系交聯劑、金屬烷氧化物系交聯劑、金屬螯合系交聯劑、金屬鹽系交聯劑、碳二醯亞胺系交聯劑、唑啉系交聯劑、氮丙啶系交聯劑、胺系交聯劑等。於該等交聯劑中,於充分地呈現本發明之效果之方面,較佳為三聚氰胺系交聯劑、環氧系交聯劑、異氰酸酯系交聯劑。又,交聯劑視需要可適當選擇,可僅為一種,亦可為兩種以上之混合系。 Examples of the crosslinking agent include an epoxy crosslinking agent, an isocyanate crosslinking agent, a melamine crosslinking agent, a peroxide crosslinking agent, a metal alkoxide crosslinking agent, and a metal chelate crosslinking. A crosslinking agent, a metal salt crosslinking agent, a carbodiimide crosslinking agent, An oxazoline crosslinking agent, an aziridine crosslinking agent, an amine crosslinking agent, and the like. Among these crosslinking agents, a melamine-based crosslinking agent, an epoxy-based crosslinking agent, and an isocyanate-based crosslinking agent are preferred in that the effects of the present invention are sufficiently exhibited. Further, the crosslinking agent may be appropriately selected as needed, and may be one type or a mixture of two or more types.
黏著劑層亦可包含塑化劑。於黏著劑層包含塑化劑之情形時,黏著劑層中之塑化劑之含有比例可根據目的而適當設定,但較佳為0.1重量%~50重量%。可藉由將黏著劑層中之塑化劑之含有比例收斂於上述範圍內,而更進一步有效地呈現本發明之效果。若黏著劑層中之塑化劑之含有比例大於50重量%,則存在黏著劑層過度地變柔軟,而易產生糊劑殘餘或被黏著體污染之虞。 The adhesive layer may also contain a plasticizer. In the case where the adhesive layer contains a plasticizer, the content ratio of the plasticizer in the adhesive layer can be appropriately set depending on the purpose, but is preferably from 0.1% by weight to 50% by weight. The effect of the present invention can be further effectively exhibited by converging the content ratio of the plasticizer in the adhesive layer to the above range. If the content of the plasticizer in the adhesive layer is more than 50% by weight, the adhesive layer is excessively soft, and it is liable to cause residue of the paste or contamination by the adherend.
作為上述塑化劑,例如可列舉:鄰苯二甲酸酯系、偏苯三甲酸酯系(大日本油墨(股份有限公司)製造之W-700、偏苯三甲酸三辛酯等)、己二酸酯系(J-PLUS(股份有限公司)製造之D620、己二酸二辛酯、己二酸二異壬酯等)、磷酸酯系(磷酸三甲苯酯等)、己二酸系酯、檸檬酸酯(乙醯檸檬酸三丁酯等)、癸二酸酯、壬二酸酯、順丁烯二酸酯、苯甲酸酯、聚醚系聚酯、環氧系聚酯(環氧化大豆油、環氧化亞麻仁油等)、聚酯(包含羧酸及二醇之低分子聚酯等)等。於本發明中,較佳為使用酯系塑化劑。塑化劑可僅為一種,亦可為兩種以上。 Examples of the plasticizer include a phthalic acid ester type, a trimellitic acid ester type (W-700 manufactured by Dainippon Ink Co., Ltd., trioctyl trimellitate, etc.), and Diacid ester system (D620 manufactured by J-PLUS Co., Ltd., dioctyl adipate, diisononyl adipate, etc.), phosphate ester (such as tricresyl phosphate), adipic acid ester , citrate (acetyl tributyl citrate, etc.), sebacate, sebacate, maleate, benzoate, polyether polyester, epoxy polyester (ring Oxidized soybean oil, epoxidized linseed oil, etc.), polyester (low molecular weight polyester containing carboxylic acid and diol, etc.). In the present invention, an ester-based plasticizer is preferably used. The plasticizer may be used alone or in combination of two or more.
黏著劑層為了促進交聯反應等,亦可包含任意之適當之觸媒。於黏著劑層包含觸媒之情形時,黏著劑層中之觸媒之含有比例可根據目的而適當設定,但較佳為0.01重量%~10重量%。可藉由將黏著劑層中之觸媒之含有比例收斂於上述範圍內,而更進一步有效地呈現本發明之效果。 The adhesive layer may contain any appropriate catalyst in order to promote a crosslinking reaction or the like. In the case where the adhesive layer contains a catalyst, the content ratio of the catalyst in the adhesive layer can be appropriately set depending on the purpose, but is preferably 0.01% by weight to 10% by weight. The effect of the present invention can be further effectively exhibited by converging the content ratio of the catalyst in the adhesive layer to the above range.
作為此種觸媒,例如可列舉:鈦酸四異丙酯、鈦酸四正丁酯、 辛酸亞錫、辛酸鉛、辛酸鈷、辛酸鋅、辛酸鈣、環烷酸鉛、環烷酸鈷、二乙酸二丁基錫、二辛酸二丁基錫、二月桂酸二丁基錫、二月桂酸二辛基錫、順丁烯二酸二丁基錫等有機金屬化合物;丁基胺、二丁基胺、己基胺、第三丁基胺、乙二胺、異佛酮二胺、咪唑、氫氧化鋰、氫氧化鉀、甲醇鈉等鹼性化合物;對甲苯磺酸、三氯乙酸、磷酸、磷酸單烷基酯、磷酸二烷基酯、丙烯酸β-羥基乙酯之磷酸酯、亞磷酸單烷基酯、亞磷酸二烷基酯等酸性化合物等。觸媒可僅為一種,亦可為兩種以上。 Examples of such a catalyst include tetraisopropyl titanate and tetra-n-butyl titanate. Stannous octoate, lead octoate, cobalt octoate, zinc octoate, calcium octoate, lead naphthenate, cobalt naphthenate, dibutyltin diacetate, dibutyltin dioctoate, dibutyltin dilaurate, dioctyltin dilaurate, An organometallic compound such as dibutyltin maleate; butylamine, dibutylamine, hexylamine, tert-butylamine, ethylenediamine, isophoronediamine, imidazole, lithium hydroxide, potassium hydroxide, a basic compound such as sodium methoxide; p-toluenesulfonic acid, trichloroacetic acid, phosphoric acid, monoalkyl phosphate, dialkyl phosphate, phosphate of β-hydroxyethyl acrylate, monoalkyl phosphite, phosphorous acid An acidic compound such as an alkyl ester. The catalyst may be one type or two or more types.
黏著劑層為了更進一步呈現本發明之效果,其SP值較佳為9.0(cal/cm3)0.5~12.0(cal/cm3)0.5,更佳為9.5(cal/cm3)0.5~11.0(cal/cm3)0.5。SP值係藉由Small之式而算出之溶解度參數。SP值之計算可藉由公知之文獻(例如Journal of Applied Chemistry,3,71,1953.等)中記載之方法而進行。 In order to further exhibit the effects of the present invention, the adhesive layer preferably has an SP value of 9.0 (cal/cm 3 ) of 0.5 to 12.0 (cal/cm 3 ) 0.5 , more preferably 9.5 (cal/cm 3 ) of 0.5 to 11.0 ( Cal/cm 3 ) 0.5 . The SP value is a solubility parameter calculated by the formula of Small. The calculation of the SP value can be carried out by a method described in a well-known literature (for example, Journal of Applied Chemistry, 3, 71, 1953., etc.).
於黏著劑層中,於無損本發明之效果之範圍內,亦可含有任意之適當之添加劑。作為此種添加劑,例如可列舉:紫外線吸收劑、填充劑、抗老化劑、黏著賦予劑、顏料、染料、矽烷偶合劑等。 Any suitable additive may be contained in the adhesive layer insofar as it does not impair the effects of the present invention. Examples of such an additive include an ultraviolet absorber, a filler, an anti-aging agent, an adhesion-imparting agent, a pigment, a dye, a decane coupling agent, and the like.
本發明之黏著帶亦可於黏著劑層之表面具備剝離襯墊。 The adhesive tape of the present invention may also be provided with a release liner on the surface of the adhesive layer.
作為剝離襯墊,可採用任意之適當之隔片。作為此種剝離襯墊,例如可列舉:具有藉由聚矽氧系、長鏈烷基系、氟系及硫化鉬等剝離劑進行表面處理之塑膠膜及紙等剝離層之基材;包含聚四氟乙烯、聚氯三氟乙烯、聚氟乙烯、聚偏二氟乙烯、四氟乙烯-六氟丙烯共聚物、氯氟乙烯-偏二氟乙烯共聚物等氟系聚合物之低接著性基材;包含烯烴系樹脂(例如聚乙烯、聚丙烯等)等無極性聚合物之低接著性基材等。 As the release liner, any suitable separator can be used. Examples of such a release liner include a substrate having a release layer such as a plastic film or a paper surface-treated with a release agent such as a polyoxymethylene system, a long-chain alkyl group, a fluorine-based or a molybdenum sulfide; Low-adhesion groups of fluorine-based polymers such as tetrafluoroethylene, polychlorotrifluoroethylene, polyvinyl fluoride, polyvinylidene fluoride, tetrafluoroethylene-hexafluoropropylene copolymer, and chlorofluoroethylene-vinylidene fluoride copolymer A low-adhesive substrate containing a nonpolar polymer such as an olefin resin (for example, polyethylene or polypropylene).
本發明之黏著帶可用於任意之適當用途。本發明之黏著帶由於具有本發明之黏著帶用膜,故而如上所述,於藉由負壓而吸附固定於 固定用基座上並進行切割等之情形時,可有效地抑制因基座之發熱等而引起過度密接,又,可有效地抑制輥狀之形態下之黏連,於自輥狀之形態回捲時不會破裂或破損,從而該非黏著層與該塑膠膜之適應性良好,從而對於延伸等變形之追隨性良好。因此,可適宜地用於將由脆弱之材料構成且具有微細精緻之電路圖案之半導體晶圓作為被黏著體之半導體加工。若將本發明之黏著帶用於半導體加工,則於藉由負壓而吸附固定於固定用基座上並進行切割等之情形時,可有效地抑制因基座之發熱等而引起過度密接之情況,因此,可順利地進行包括切割在內之半導體製造步驟。又,若將本發明之黏著帶用於半導體加工,則不會產生以往因黏連而產生之膜變形或應力應變之蓄積,因此可準確地追隨半導體晶圓之微細精緻之電路圖案而貼合,又,不會引起貼合於半導體晶圓後之應力應變之自然解除,因此可有效地防止半導體晶圓破碎。尤其是LED所使用之晶圓係由氮化鎵、砷化鎵、碳化矽等非常脆弱之材料構成,因此本發明之黏著帶非常適合於LED切割等。 The adhesive tape of the present invention can be used for any suitable purpose. Since the adhesive tape of the present invention has the film for an adhesive tape of the present invention, it is adsorbed and fixed by a negative pressure as described above. When the susceptor is fixed on the susceptor, it is possible to effectively suppress excessive adhesion due to heat generation of the susceptor, and it is possible to effectively suppress adhesion in the form of a roll, and return from the form of a roll. The roll is not broken or broken, so that the non-adhesive layer has good adaptability to the plastic film, and the followability to deformation such as elongation is good. Therefore, it can be suitably used for processing a semiconductor wafer which is composed of a fragile material and has a fine and delicate circuit pattern as a semiconductor to be bonded. When the adhesive tape of the present invention is used for semiconductor processing, when it is adsorbed and fixed to a fixing base by a negative pressure and cut or the like, it is possible to effectively suppress excessive adhesion due to heat generation of the susceptor or the like. In this case, therefore, the semiconductor manufacturing steps including the dicing can be performed smoothly. Moreover, when the adhesive tape of the present invention is used for semiconductor processing, film deformation or stress strain which is conventionally caused by adhesion does not occur, so that it can accurately follow the fine and delicate circuit pattern of the semiconductor wafer. Moreover, the natural stress relief of the semiconductor wafer is not caused to be released, so that the semiconductor wafer can be effectively prevented from being broken. In particular, the wafer used in the LED is composed of a very fragile material such as gallium nitride, gallium arsenide or tantalum carbide. Therefore, the adhesive tape of the present invention is very suitable for LED cutting and the like.
以下,根據實施例而具體地對本發明進行說明,但本發明並不限定於該等實施例。份係指重量份。又,溶液中供給之試劑之量係由使溶液揮發而殘留之固形物成分之量(固形物成分換算量)表示。 Hereinafter, the present invention will be specifically described based on examples, but the present invention is not limited to the examples. Parts are parts by weight. Moreover, the amount of the reagent supplied in the solution is represented by the amount of the solid content (the amount of solid content converted) remaining to volatilize the solution.
最大伸長率係依據JIS-K-7127並藉由英斯特朗拉力試驗機(島津製作所製造,自動立體測圖儀)而測定。具體而言,以夾盤間距離50 mm設置寬度20 mm×長度100 mm之樣本之後,以0.3 m/分鐘之拉伸速度進行拉伸,而測定斷裂時之值。 The maximum elongation was measured in accordance with JIS-K-7127 by an Instron tensile tester (manufactured by Shimadzu Corporation, an autostereograph). Specifically, a sample having a width of 20 mm × a length of 100 mm was set at a distance of 50 mm between the chucks, and then stretched at a tensile speed of 0.3 m/min, and the value at the time of the fracture was measured.
彈性模數係依據JIS-K-7127而測定。 The modulus of elasticity was measured in accordance with JIS-K-7127.
以可觀察非黏著層剖面之方式進行加工之後,藉由穿透式電子顯微鏡(SEM)而進行形態觀察。 Morphological observation was carried out by a transmission electron microscope (SEM) after processing the non-adhesive layer profile.
使用紅外線分光光譜儀(Perkinermer製造,Spectrum One),並選擇全反射測定法,為了改變探測光之分析深度,而使用兩種全反射測定用稜鏡(ZnSe45°、Ge45°),而進行非黏著層之ATR-IR測定。 An infrared spectroscopic spectrometer (Perkinermer, Spectrum One) was used, and a total reflection measurement method was selected. In order to change the depth of analysis of the probe light, two kinds of total reflection measurement flaws (ZnSe45°, Ge45°) were used to perform a non-adhesive layer. ATR-IR measurement.
使用OLYMPUS製造之共軛焦雷射顕微鏡「LEXT3000」,並以物鏡20倍於3D模式下測定。3D模式之觀察範圍之決定係藉由如下方式而進行:於使透鏡上下動時將CF圖像(共軛焦圖像)變黑暗之位置及觀察範圍之Top分別設定於Bottom。 A conjugated focal laser micromirror "LEXT3000" manufactured by OLYMPUS was used and measured with an objective lens 20 times in 3D mode. The determination of the observation range of the 3D mode is performed by setting the position where the CF image (conjugated focus image) is dark and the top of the observation range to Bottom when the lens is moved up and down.
3D模式下之取得圖像之方法係以Step方式以0.2 μm間距取得圖像。 The method of acquiring an image in the 3D mode is to obtain an image at a pitch of 0.2 μm in a stepwise manner.
算術平均表面粗糙度Ra之測量係藉由解析模式之粗糙度解析而測量任意之位置之Ra。再者,值係藉由n=5之平均值而求出。 The measurement of the arithmetic mean surface roughness Ra measures Ra at an arbitrary position by the roughness analysis of the analytical mode. Furthermore, the value is obtained by the average of n=5.
於以下條件下對非黏著層進行壓入試驗,並根據其結果求出壓痕硬度。再者,如比較例1般於未具備非黏著層之黏著帶中,對與黏著劑層相反側之最外層表面進行測定。 The non-adhesive layer was subjected to a press-in test under the following conditions, and the indentation hardness was determined based on the results. Further, as in Comparative Example 1, the outermost surface of the adhesive layer having the non-adhesive layer was measured on the side opposite to the adhesive layer.
裝置:Tribo Indenter(Hysitron公司製造) Device: Tribo Indenter (manufactured by Hysitron)
使用之壓頭:Berkovich(三角錐型) Indenter used: Berkovich (triangular cone)
測定方法:單一壓入測定 Determination method: single press-in determination
測定溫度:80℃ Measuring temperature: 80 ° C
壓入深度設定:約100 nm Indentation depth setting: about 100 nm
壓入速度:約10 nm/sec Pressing speed: about 10 nm/sec
測定環境:空氣中 Measuring environment: in the air
使用上述裝置,使其自室溫上升為80℃並保持1小時後,使用三角錐型金剛石製壓頭而測定形狀像。繼而,藉由上述壓頭而將作為凸部而觀察到之部分自表面垂直地壓入至深度100 nm。使用解析軟件「Triboscan Ver.9.2.12.0」,根據於壓入壓頭時所獲得之位移、荷重及理論性地算出之壓痕面積而求出表面之壓痕硬度。又,根據去除壓頭後所獲得之位移、荷重及理論性地算出之壓痕面積,求出彈性模數。 Using the above apparatus, the temperature was raised from room temperature to 80 ° C and held for 1 hour, and then the shape image was measured using a triangular pyramid type diamond indenter. Then, the portion observed as the convex portion by the above-mentioned indenter was vertically pressed from the surface to a depth of 100 nm. Using the analysis software "Triboscan Ver. 9.2.12.0", the indentation hardness of the surface was determined from the displacement, the load, and the theoretically calculated indentation area obtained when the indenter was pressed. Further, the elastic modulus is obtained from the displacement, the load, and the theoretically calculated indentation area obtained after the indenter is removed.
於20 mm(縱)×50 mm(橫)之載玻片上,以背面(於實施例、比較例中,於黏著帶用膜之情形時為非黏著層側之面,於黏著帶之情形時為黏著劑層之相反側之面)成為正面之方式,貼附黏著帶用膜或黏著帶。繼而,於80℃環境下,使上述膠帶貼附載玻片與作為被黏著體之載玻片(青板緣磨品,尺寸:65 mm×165 mm×1.35 mmt)接觸,使上述膠帶貼附載玻片之背面側與上述載玻片之非錫面側接觸,並放置15分鐘後,藉由2 kg輥而使其進行一個往返,而使載玻片與上述膠帶貼附載玻片之背面貼合,並於80℃環境下放置30分鐘。放置後,於常溫下進行冷卻後,藉由英斯特朗拉力試驗機(島津製作所製造,自動立體測圖儀)於拉伸速度0.3m/分鐘下,進行0°剝離。測定此時之剝離力(最大值),並根據下述基準而進行評價。 On the glass slide of 20 mm (vertical) × 50 mm (horizontal), the back side (in the case of the film for the adhesive tape in the embodiment and the comparative example, the surface on the side of the non-adhesive layer, in the case of the adhesive tape) The film on the opposite side of the adhesive layer is a front side, and a film or an adhesive tape for the adhesive tape is attached. Then, in the environment of 80 ° C, the above-mentioned tape-attached slide glass was brought into contact with a slide glass (green plate edge grinding product, size: 65 mm × 165 mm × 1.35 mmt) as an adherend, and the above tape was attached to the glass. The back side of the sheet was in contact with the non-tin side of the slide, and after being left for 15 minutes, it was made to go back and forth by a 2 kg roller, and the slide was attached to the back side of the tape attached to the slide. And placed at 80 ° C for 30 minutes. After standing, the mixture was cooled at room temperature, and subjected to 0° peeling at an elongation speed of 0.3 m/min by an Instron tensile tester (manufactured by Shimadzu Corporation, an autostereograph). The peeling force (maximum value) at this time was measured, and it evaluated based on the following criteria.
○:剝離力未達5.0 N。 ○: The peeling force was less than 5.0 N.
△:剝離力5.0 N以上且未達15.0 N。 △: The peeling force was 5.0 N or more and less than 15.0 N.
×:剝離力15.0 N以上。 ×: The peeling force was 15.0 N or more.
參照JIS-Z-0237,於23℃保存下,將被黏著體及包括非黏著層之黏著帶用膜或黏著帶保持1小時以上,其後以線壓8 kg/m、壓接速度0.3 m/分鐘將非黏著面壓接於SUS430BA上,並以0.3 m/分鐘之拉伸速度、180°剝離對30分鐘後之剝離力進行測定。 According to JIS-Z-0237, the adhesive tape and the adhesive tape including the non-adhesive layer are kept for 1 hour or more at 23 ° C, and then the linear pressure is 8 kg/m, and the crimping speed is 0.3 m. /min The non-adhesive surface was pressure-bonded to SUS430BA, and the peeling force after 30 minutes was measured at a tensile speed of 0.3 m/min and a peeling of 180°.
◎:未達0.5 N/20 mm。 ◎: Not up to 0.5 N/20 mm.
○:0.5 N/20 mm以上且未達1.0 N/20 mm。 ○: 0.5 N/20 mm or more and less than 1.0 N/20 mm.
×:1.0 N/20 mm以上。 ×: 1.0 N/20 mm or more.
以線壓8 Kg/m、壓接速度0.3 m/分鐘,將黏著帶之黏著劑層面壓接於與相同之黏著帶之黏著劑層相反側之最外面(背面層),壓接後以50℃×48 hr進行保存。保存後,以拉伸速度0.3 m/分鐘藉由180°剝離之剝離試驗而進行剝離(依據JIS-Z-0237),而測定黏著劑層面與背面層之黏連(剝離力)。 The adhesive layer of the adhesive tape was crimped to the outermost surface (back layer) on the opposite side of the adhesive layer of the same adhesive tape at a line pressure of 8 Kg/m and a crimping speed of 0.3 m/min. Store at °C × 48 hr. After the storage, the adhesion (peeling force) of the adhesive layer and the back layer was measured by peeling at a tensile speed of 0.3 m/min by a peeling test of 180° peeling (according to JIS-Z-0237).
評價係確認剝離力之測定及剝離時之背面層之脫落、黏著劑層之破壞(因黏聚破壞、抓固破壞而引起之糊劑殘餘)等,而作為綜合評價。 In the evaluation, the peeling force was measured, the peeling of the back layer at the time of peeling, the destruction of the adhesive layer (residue of the paste due to the cohesive failure, the damage of the grip), and the like were evaluated as a comprehensive evaluation.
評價係依據下述基準。 The evaluation is based on the following criteria.
○:剝離力未達3.0 N/20 mm,不存在目視下之脫落、黏著劑層之破壞。 ○: The peeling force was less than 3.0 N/20 mm, and there was no peeling under the visual observation and destruction of the adhesive layer.
×:剝離力為3.0 N/20 mm以上或者存在目視下之脫落、黏著劑層之破壞。 ×: The peeling force was 3.0 N/20 mm or more or there was peeling under visual observation and destruction of the adhesive layer.
藉由拉伸速度0.3 m/分鐘~3 m/分鐘而將黏著帶用膜或黏著帶延伸至200%,藉由目視而對延伸時及延伸後之與黏著帶用膜或黏著帶之 黏著劑層相反側之最外面(背面層)之脫落性進行評價。 The film or adhesive tape for the adhesive tape is extended to 200% by a stretching speed of 0.3 m/min to 3 m/min, and the film or adhesive tape for the adhesive tape is extended and extended by visual inspection. The peeling property of the outermost side (back layer) on the opposite side of the adhesive layer was evaluated.
進行與抓固性確認試驗A相同之延伸後,將日東電工(股份有限公司)製造之「NO.31B」作為背面處理層,藉由2 Kg輥(寬度為25 mm)以0.3 m/分鐘之壓接速度而使其進行一個往返,其後以23℃×50%RH保管1分鐘,並於0.3 m/分鐘~3 m/分鐘之剝離速度下,進行90°剝離,並藉由目視而對背面之脫落性進行評價。 After performing the same extension as the gripping confirmation test A, "NO.31B" manufactured by Nitto Denko Corporation was used as the back treatment layer by a 2 Kg roll (width 25 mm) at 0.3 m/min. Pressing the speed to make a round trip, and then storing it at 23 ° C × 50% RH for 1 minute, and peeling at 90 ° at a peeling speed of 0.3 m / min to 3 m / min, and visually The peeling property of the back surface was evaluated.
綜合性地判斷以上評價,並依據下述基準,而對抓固性進行評價。 The above evaluation was comprehensively judged, and the gripping property was evaluated based on the following criteria.
◎:抓固性確認試驗A及抓固性確認試驗B均無可藉由目視而確認之背面之脫落。 ◎: There was no peeling of the back surface which was confirmed by visual observation in both the gripping property confirmation test A and the gripping property confirmation test B.
○:可藉由目視而確認之背面之脫落於抓固性確認試驗A中不存在,於抓固性確認試驗B中被略微確認(點狀地確認)。 ○: The peeling of the back surface which was confirmed by the visual observation was not observed in the gripping property confirmation test A, and was slightly confirmed in the gripping property confirmation test B (checked in a dotted manner).
×:於抓固性確認試驗A中確認有背面之脫落,或者於抓固性確認試驗B中確認有背面之脫落。 X: It was confirmed in the gripping property confirmation test A that the back surface was peeled off, or the back surface peeling was confirmed in the gripping property confirmation test B.
藉由壓延法而製造相對於聚合度P=1050之聚氯乙烯100重量份,含有DOP塑化劑(鄰苯二甲酸雙(2-乙基己基)酯,J-PLUS製造)27重量份之軟質聚氯乙烯膜。該軟質聚氯乙烯膜之厚度為70 μm,依據JIS-K-7127所測得之彈性模數(MD)為250 MPa,依據JIS-K-7127所測得之最大伸長率(MD)為400%。又,製造後之表面粗糙度(算術平均表面粗糙度Ra)為0.1 μm。 100 parts by weight of polyvinyl chloride having a degree of polymerization of P=1050 was produced by a calendering method, and contained 27 parts by weight of a DOP plasticizer (bis(2-ethylhexyl) phthalate, manufactured by J-PLUS). Soft polyvinyl chloride film. The soft polyvinyl chloride film has a thickness of 70 μm, a modulus of elasticity (MD) measured according to JIS-K-7127 of 250 MPa, and a maximum elongation (MD) of 400 according to JIS-K-7127. %. Further, the surface roughness (arithmetic mean surface roughness Ra) after the production was 0.1 μm.
於溶液狀態下混合如下物質而獲得混合溶液(1):聚矽氧樹脂(KS-723A,信越化學工業製造)60重量份、聚矽氧樹脂(KS-723B,信 越化學工業製造)40重量份、丙烯酸共聚聚合物(甲基丙烯酸甲酯(MMA)/丙烯酸丁酯(BA)/丙烯酸羥基乙酯(HEA)=90/10/10)50重量份、及錫系觸媒(Cat-PS3,信越化學工業製造)10重量份。混合溶液(1)中之聚矽氧與(甲基)丙烯酸系聚合物之混合比以重量比計,為聚矽氧:(甲基)丙烯酸系聚合物=2:1。又,丙烯酸共聚聚合物之計算Tg為67.8℃,SP值為10.7(cal/cm3)0.5。 The mixed solution (1) was obtained by mixing the following materials in a solution state: 60 parts by weight of polyoxyxylene resin (KS-723A, manufactured by Shin-Etsu Chemical Co., Ltd.), 40 parts by weight of polyoxynoxy resin (KS-723B, manufactured by Shin-Etsu Chemical Co., Ltd.) , acrylic acid copolymer (methyl methacrylate (MMA) / butyl acrylate (BA) / hydroxyethyl acrylate (HEA) = 90 / 10/10) 50 parts by weight, and tin-based catalyst (Cat-PS3, 10 parts by weight manufactured by Shin-Etsu Chemical Co., Ltd.). The mixing ratio of the polyfluorene oxide to the (meth)acrylic polymer in the mixed solution (1) is polyoxyn:poly(meth)acrylic polymer=2:1 by weight ratio. Further, the acrylic copolymer polymer had a calculated Tg of 67.8 ° C and an SP value of 10.7 (cal/cm 3 ) 0.5 .
於藉由製造例1而製造之軟質聚氯乙烯膜之單面塗佈上述混合溶液(1),而形成厚度為1.0 μm、算術平均表面粗糙度Ra=0.5 μm之非黏著層。 The mixed solution (1) was applied to one surface of a soft polyvinyl chloride film produced in Production Example 1 to form a non-adhesive layer having a thickness of 1.0 μm and an arithmetic mean surface roughness Ra of 0.5 μm.
如此,獲得黏著帶用膜(1)。 Thus, a film (1) for an adhesive tape was obtained.
將各種評價結果示於表1。 The various evaluation results are shown in Table 1.
又,若藉由SEM而觀察非黏著層,則如圖1、圖2、圖3所示,根據形態觀察像之濃淡,可確認於空氣界面側及塑膠膜側組成不同;觀察到:包含與(甲基)丙烯酸系聚合物相比含有更多聚矽氧之聚矽氧富集相及與聚矽氧相比含有更多(甲基)丙烯酸系聚合物之(甲基)丙烯酸系聚合物富集相,聚矽氧富集相及(甲基)丙烯酸系聚合物富集相具有相互獨立之相分離結構,聚矽氧富集相存在於空氣界面側(塑膠膜之相反側),(甲基)丙烯酸系聚合物富集相存在於塑膠膜側。 Further, when the non-adhesive layer was observed by SEM, as shown in Fig. 1, Fig. 2, and Fig. 3, the composition of the image was observed according to the form, and it was confirmed that the composition was different at the air interface side and the plastic film side; A (meth)acrylic polymer having a poly(xylene oxide)-rich polymer and a (meth)acrylic polymer having a more (meth)acrylic polymer than a polyfluorene-oxygen The enriched phase, the polyfluorene-rich phase and the (meth)acrylic polymer-rich phase have mutually independent phase separation structures, and the polyfluorene-rich phase exists on the air interface side (opposite side of the plastic film), The methylated acrylic polymer-rich phase is present on the plastic film side.
進而,關於非黏著層,進行利用全反射法之赤外分光測定(ATR-IR),結果可知:對(甲基)丙烯酸系聚合物相中之源自Si-CH3之800 cm-1附近的峰值之相對於源自羰基之1725 cm-1附近之峰值的吸光度比進行測定,結果與ZnSe45°相比,於使用Ge45°之稜鏡之情形時800 cm-1附近之峰值變大。因此,可知:與基材側相比,於空氣界面側矽之含有率提高。 Further, the non-adhesive layer was subjected to the external-reflection measurement (ATR-IR) by the total reflection method, and as a result, it was found that the vicinity of 800 cm -1 derived from Si-CH 3 in the (meth)acrylic polymer phase was observed. The peak value of the peak was measured with respect to the absorbance ratio of the peak near the 1725 cm -1 of the carbonyl group, and as a result, the peak near 800 cm -1 was larger in the case of using Ge 45 ° than in the case of ZnSe 45 °. Therefore, it is understood that the content ratio of the enthalpy at the air interface side is higher than that of the substrate side.
又,於非黏著層中聚矽氧富集相存在於空氣界面側(塑膠膜之相反側)之情況於FT-IR中亦可確認。利用FT-IR之測定係使用 Perkinermer製造之「Spectrum One」,並利用分析深度方向不同之兩種稜鏡(ZnSe45°、Ge45°)藉由ATR法(減弱全反射法,attenuated total reflectance method)而對空氣界面側進行測定。確認所獲得之圖表,結果可確認:於使用分析深度方向較淺之Ge45°之稜鏡之情形時,非黏著層之源自(甲基)丙烯酸聚合物之歸屬於C=O之源自Si-CH3之800cm-1附近的峰值之相對於1720 cm-1-1730 cm-1之峰值的吸光度比變大。藉此,可證明於空氣界面側聚矽氧之濃度變得更高。 Further, in the case where the polyfluorene-rich phase in the non-adhesive layer was present on the air interface side (the opposite side of the plastic film), it was confirmed in the FT-IR. The FT-IR measurement method uses "Spectrum One" manufactured by Perkinermer, and uses two kinds of ruthenium (ZnSe45°, Ge45°) having different depth directions to analyze by ATR method (attenuated total reflectance method). The air interface side was measured. By confirming the obtained chart, it was confirmed that the non-adhesive layer derived from the (meth)acrylic polymer originated from C=O was derived from Si when the analysis was carried out in the case where the depth of Ge4 was shallow. the phase peak of 800cm -1 near -CH 3 becomes large absorbance peak 1720 cm -1 -1730 cm -1 ratio. Thereby, it can be confirmed that the concentration of polyoxane at the air interface side becomes higher.
可知:若考慮該等之觀察結果及表面自由能量最小化之原理,則於空氣界面側具有聚矽氧富集相之兩層結構形成於非黏著層。 It can be seen that considering the observation results and the principle of minimizing the surface free energy, a two-layer structure having a polyfluorene-rich phase on the air interface side is formed on the non-adhesive layer.
於實施例1中,於藉由製造例1而製造之軟質聚氯乙烯膜之單面塗佈混合溶液(1),以與實施例1相同之方式進行,而形成厚度為0.7 μm、算術平均表面粗糙度Ra=0.1 μm之非黏著層。 In the first embodiment, the mixed solution (1) of the soft polyvinyl chloride film produced by the production example 1 was applied in the same manner as in the first embodiment to form a thickness of 0.7 μm and an arithmetic mean. Non-adhesive layer with surface roughness Ra = 0.1 μm.
如此,獲得黏著帶用膜(2)。 Thus, a film (2) for an adhesive tape was obtained.
將各種評價結果示於表1。 The various evaluation results are shown in Table 1.
調製包含如下物質之黏著劑之甲苯溶液:包含丙烯酸丁酯(BA)/丙烯腈(AN)/丙烯酸(AA)=85/15/2.5(重量比)之丙烯酸共聚聚合物100重量份、三聚氰胺系交聯劑(丁醇改性三聚氰胺甲醛樹脂,「Super Beckamine J-820-60N」,日本聚胺酯製造)10重量份、及DOP塑化劑(鄰苯二甲酸雙(2-乙基己基)酯,J-PLUS製造)60重量份。 Toluene solution containing an adhesive of the following materials: 100 parts by weight of an acrylic copolymer containing butyl acrylate (BA) / acrylonitrile (AN) / acrylic acid (AA) = 85 / 15 / 2.5 (weight ratio), melamine system Crosslinking agent (butanol modified melamine formaldehyde resin, "Super Beckamine J-820-60N", manufactured by Japan Polyurethane) 10 parts by weight, and DOP plasticizer (bis(2-ethylhexyl) phthalate, Made by J-PLUS) 60 parts by weight.
將該黏著劑溶液塗佈於與藉由實施例1而獲得之黏著帶用膜(1)之非黏著層相反側之面之後,以130℃×90秒進行乾燥,從而於與軟質聚氯乙烯膜之非黏著層相反側之面形成厚度為10 μm之黏著劑層。所形成之黏著劑層之SP值為10.5。 The adhesive solution was applied to the side opposite to the non-adhesive layer of the film for adhesive tape (1) obtained in Example 1, and then dried at 130 ° C for 90 seconds to form a soft polyvinyl chloride. An adhesive layer having a thickness of 10 μm was formed on the opposite side of the non-adhesive layer of the film. The resulting adhesive layer had an SP value of 10.5.
如此,獲得黏著帶(3)。 Thus, the adhesive tape (3) is obtained.
將各種評價結果示於表1。 The various evaluation results are shown in Table 1.
作為非黏著層形成用之丙烯酸共聚聚合物,使用甲基丙烯酸甲酯(MMA)/丙烯酸乙酯(EA)/丙烯酸羥基乙酯(HEA)=90/10/10之丙烯酸共聚聚合物50重量份,除此以外,以與實施例1相同之方式進行,從而獲得黏著帶用膜(4)。使用該黏著帶用膜(4)代替黏著帶用膜(1),除此以外,以與實施例3相同之方式進行,從而獲得黏著帶(4)。 As the acrylic copolymer copolymer for forming a non-adhesive layer, 50 parts by weight of an acrylic copolymer of methyl methacrylate (MMA) / ethyl acrylate (EA) / hydroxyethyl acrylate (HEA) = 90 / 10/10 is used. Except for this, it was carried out in the same manner as in Example 1 to obtain a film (4) for an adhesive tape. An adhesive tape (4) was obtained in the same manner as in Example 3 except that the film for adhesive tape (4) was used instead of the film for adhesive tape (1).
丙烯酸共聚聚合物之計算Tg為74.3℃,SP值為10.3(cal/cm3)0.5。 The acrylic copolymer was calculated to have a Tg of 74.3 ° C and an SP value of 10.3 (cal/cm 3 ) 0.5 .
關於非黏著層,其厚度為1.0 μm,算術平均表面粗糙度Ra=0.5 μm。 Regarding the non-adhesive layer, the thickness is 1.0 μm, and the arithmetic mean surface roughness Ra = 0.5 μm.
將各種評價結果示於表1。 The various evaluation results are shown in Table 1.
作為非黏著層形成用之丙烯酸共聚聚合物,使用甲基丙烯酸甲酯(MMA)/丙烯酸環己酯(CHA)/丙烯酸羥基乙酯(HEA)=90/10/10之丙烯酸共聚聚合物50重量份,除此以外,以與實施例1相同之方式進行,從而獲得黏著帶用膜(5)。使用該黏著帶用膜(5)代替黏著帶用膜(1),除此以外,以與實施例3相同之方式進行,從而獲得黏著帶(5)。 As the acrylic copolymer for non-adhesive layer formation, 50 parts by weight of methyl methacrylate (MMA) / cyclohexyl acrylate (CHA) / hydroxyethyl acrylate (HEA) = 90 / 10/10 acrylic copolymer was used. A film (5) for an adhesive tape was obtained in the same manner as in Example 1 except for the above. An adhesive tape (5) was obtained in the same manner as in Example 3 except that the film for adhesive tape (5) was used instead of the film for adhesive tape (1).
丙烯酸共聚聚合物之計算Tg為80.0℃,SP值為10.4(cal/cm3)0.5。 The acrylic copolymer was calculated to have a Tg of 80.0 ° C and an SP value of 10.4 (cal/cm 3 ) 0.5 .
關於非黏著層,其厚度為1.0 μm,算術平均表面粗糙度Ra=0.5 μm。 Regarding the non-adhesive layer, the thickness is 1.0 μm, and the arithmetic mean surface roughness Ra = 0.5 μm.
將各種評價結果示於表1。 The various evaluation results are shown in Table 1.
作為非黏著層形成用之丙烯酸共聚聚合物,使用甲基丙烯酸甲酯(MMA)/丙烯酸丁酯(BA)/丙烯酸羥基乙酯(HEA)=95/5/15之丙烯酸共聚聚合物50重量份,除此以外以與實施例1相同之方式進行,從而獲得黏著帶用膜(6)。使用該黏著帶用膜(6)代替黏著帶用膜(1),除此以 外,以與實施例3相同之方式進行,從而獲得黏著帶(6)。 As the acrylic copolymer copolymer for forming a non-adhesive layer, 50 parts by weight of an acrylic copolymer of methyl methacrylate (MMA) / butyl acrylate (BA) / hydroxyethyl acrylate (HEA) = 95/5 / 15 was used. Otherwise, it was carried out in the same manner as in Example 1 to obtain a film (6) for an adhesive tape. The film for adhesive tape (6) is used instead of the film for adhesive tape (1), Further, it was carried out in the same manner as in Example 3 to obtain an adhesive tape (6).
丙烯酸共聚聚合物之計算Tg為73.0℃,SP值為10.5(cal/cm3)0.5。 The acrylic copolymer was calculated to have a Tg of 73.0 ° C and an SP value of 10.5 (cal/cm 3 ) 0.5 .
關於非黏著層,其厚度為1.0 μm,算術平均表面粗糙度Ra=1.0 μm。 Regarding the non-adhesive layer, the thickness is 1.0 μm, and the arithmetic mean surface roughness Ra = 1.0 μm.
將各種評價結果示於表1。 The various evaluation results are shown in Table 1.
作為非黏著層形成用之丙烯酸共聚聚合物,使用甲基丙烯酸甲酯(MMA)/丙烯酸丁酯(BA)/丙烯酸羥基乙酯(HEA)=80/20/10之丙烯酸共聚聚合物50重量份,除此以外,以與實施例1相同之方式進行,從而獲得黏著帶用膜(7)。使用該黏著帶用膜(7)代替黏著帶用膜(1),除此以外,以與實施例3相同之方式進行,從而獲得黏著帶(7)。 As the acrylic copolymer copolymer for forming a non-adhesive layer, 50 parts by weight of an acrylic copolymer of methyl methacrylate (MMA) / butyl acrylate (BA) / hydroxyethyl acrylate (HEA) = 80 / 20/10 was used. Except for this, it was carried out in the same manner as in Example 1 to obtain a film (7) for an adhesive tape. An adhesive tape (7) was obtained in the same manner as in Example 3 except that the film for adhesive tape (7) was used instead of the film for adhesive tape (1).
丙烯酸共聚聚合物之計算Tg為48.5℃,SP值為10.1(cal/cm3)0.5。 The acrylic copolymer was calculated to have a Tg of 48.5 ° C and an SP value of 10.1 (cal/cm 3 ) 0.5 .
關於非黏著層,其厚度為1.0 μm,算術平均表面粗糙度Ra=0.2 μm。 Regarding the non-adhesive layer, the thickness is 1.0 μm, and the arithmetic mean surface roughness Ra = 0.2 μm.
將各種評價結果示於表1。 The various evaluation results are shown in Table 1.
作為非黏著層形成用之丙烯酸共聚聚合物,使用甲基丙烯酸甲酯(MMA)/丙烯酸丁酯(BA)/丙烯酸羥基乙酯(HEA)=99/1/5之丙烯酸共聚聚合物50重量份,除此以外,以與實施例1相同之方式進行,從而獲得黏著帶用膜(8)。使用該黏著帶用膜(8)代替黏著帶用膜(1),除此以外,以與實施例3相同之方式進行,從而獲得黏著帶(8)。 As the acrylic copolymer copolymer for forming a non-adhesive layer, 50 parts by weight of an acrylic copolymer of methyl methacrylate (MMA) / butyl acrylate (BA) / hydroxyethyl acrylate (HEA) = 99 / 1 / 5 is used. Except for this, it was carried out in the same manner as in Example 1 to obtain a film (8) for an adhesive tape. An adhesive tape (8) was obtained in the same manner as in Example 3 except that the film for adhesive tape (8) was used instead of the film for adhesive tape (1).
丙烯酸共聚聚合物之計算Tg為94.3℃,SP值為10.1(cal/cm3)0.5。 The acrylic copolymer was calculated to have a Tg of 94.3 ° C and an SP value of 10.1 (cal/cm 3 ) 0.5 .
關於非黏著層,其厚度為1.0 μm,算術平均表面粗糙度Ra=0.5 μm。 Regarding the non-adhesive layer, the thickness is 1.0 μm, and the arithmetic mean surface roughness Ra = 0.5 μm.
將各種評價結果示於表1。 The various evaluation results are shown in Table 1.
於藉由實施例5而獲得之黏著帶(5)之黏著劑層側貼附已實施Si處理之厚度為38 μm之PET襯墊作為剝離襯墊,從而獲得黏著帶(9)。 On the side of the adhesive layer of the adhesive tape (5) obtained in Example 5, a PET liner having a thickness of 38 μm which had been subjected to Si treatment was attached as a release liner, thereby obtaining an adhesive tape (9).
關於非黏著層,其厚度為1.0 μm,算術平均表面粗糙度Ra=0.5 μm。 Regarding the non-adhesive layer, the thickness is 1.0 μm, and the arithmetic mean surface roughness Ra = 0.5 μm.
將各種評價結果示於表1。 The various evaluation results are shown in Table 1.
作為非黏著層形成用之丙烯酸共聚聚合物,使用甲基丙烯酸甲酯(MMA)/丙烯酸丁酯(BA)/丙烯酸羥基乙酯(HEA)=95/5/10之丙烯酸共聚聚合物50重量份,除此以外,以與實施例1相同之方式進行,從而獲得黏著帶用膜(10)。使用該黏著帶用膜(10)代替黏著帶用膜(1),除此以外,以與實施例3相同之方式進行,從而獲得黏著帶(10)。 As the acrylic copolymer copolymer for forming a non-adhesive layer, 50 parts by weight of an acrylic copolymer of methyl methacrylate (MMA) / butyl acrylate (BA) / hydroxyethyl acrylate (HEA) = 95/5/10 is used. Except for this, it was carried out in the same manner as in Example 1 to obtain a film (10) for an adhesive tape. An adhesive tape (10) was obtained in the same manner as in Example 3 except that the film for adhesive tape (10) was used instead of the film for adhesive tape (1).
丙烯酸共聚聚合物之計算Tg為77.2℃,SP值為10.3(cal/cm3)0.5。 The acrylic copolymer was calculated to have a Tg of 77.2 ° C and an SP value of 10.3 (cal/cm 3 ) 0.5 .
關於非黏著層,其厚度為1.0 μm,算術平均表面粗糙度Ra=0.7 μm。 Regarding the non-adhesive layer, the thickness is 1.0 μm, and the arithmetic mean surface roughness Ra = 0.7 μm.
將各種評價結果示於表1。 The various evaluation results are shown in Table 1.
作為非黏著層形成用之丙烯酸共聚聚合物,使用甲基丙烯酸甲酯(MMA)/丙烯酸丁酯(BA)/丙烯酸羥基乙酯(HEA)=70/30/10之丙烯酸共聚聚合物50重量份,除此以外,以與實施例1相同之方式進行,從而獲得黏著帶用膜(11)。使用該黏著帶用膜(11)代替黏著帶用膜(1),除此以外,以與實施例3相同之方式進行,從而獲得黏著帶(11)。 As the acrylic copolymer copolymer for forming a non-adhesive layer, 50 parts by weight of an acrylic copolymer of methyl methacrylate (MMA) / butyl acrylate (BA) / hydroxyethyl acrylate (HEA) = 70 / 30/10 was used. Except for this, it was carried out in the same manner as in Example 1 to obtain a film (11) for an adhesive tape. An adhesive tape (11) was obtained in the same manner as in Example 3 except that the film for adhesive tape (11) was used instead of the film for adhesive tape (1).
丙烯酸共聚聚合物之計算Tg為31.2℃,SP值為10.4(cal/cm3)0.5。 The acrylic copolymer was calculated to have a Tg of 31.2 ° C and an SP value of 10.4 (cal/cm 3 ) 0.5 .
關於非黏著層,其厚度為1.0 μm,算術平均表面粗糙度Ra=0.3 μm。 Regarding the non-adhesive layer, the thickness is 1.0 μm, and the arithmetic mean surface roughness Ra is 0.3 μm.
將各種評價結果示於表1。 The various evaluation results are shown in Table 1.
於實施例3中,未形成非黏著層,除此以外,以與實施例3相同之方式進行,從而獲得黏著帶(C1)。 In the same manner as in Example 3 except that the non-adhesive layer was not formed in Example 3, an adhesive tape (C1) was obtained.
將各種評價結果示於表1。 The various evaluation results are shown in Table 1.
作為非黏著層形成用之丙烯酸共聚聚合物,使用甲基丙烯酸甲酯(MMA)/丙烯酸丁酯(BA)/丙烯酸羥基乙酯(HEA)=55/45/10之丙烯酸共聚聚合物50重量份,除此以外,以與實施例1相同之方式進行,從而獲得黏著帶用膜(C2)。使用該黏著帶用膜(C2)代替黏著帶用膜(1),除此以外,以與實施例3相同之方式進行,從而獲得黏著帶(C2)。 As the acrylic copolymer copolymer for forming a non-adhesive layer, 50 parts by weight of an acrylic copolymer of methyl methacrylate (MMA) / butyl acrylate (BA) / hydroxyethyl acrylate (HEA) = 55 / 45/10 was used. Except for this, it was carried out in the same manner as in Example 1 to obtain a film for an adhesive tape (C2). An adhesive tape (C2) was obtained in the same manner as in Example 3 except that the film for adhesive tape (C2) was used instead of the film for adhesive tape (1).
丙烯酸共聚聚合物之計算Tg為8.6℃,SP值為10.4(cal/cm3)0.5。 The acrylic copolymer was calculated to have a Tg of 8.6 ° C and an SP value of 10.4 (cal/cm 3 ) 0.5 .
關於非黏著層,其厚度為1.0 μm,算術平均表面粗糙度Ra=0.08 μm。 Regarding the non-adhesive layer, the thickness was 1.0 μm, and the arithmetic mean surface roughness Ra was 0.08 μm.
將各種評價結果示於表1。 The various evaluation results are shown in Table 1.
本發明之黏著帶由於具有本發明之黏著帶用膜,故而如上所述,於藉由負壓而吸附固定於固定用基座上並進行切割等之情形時,可有效地抑制因基座之發熱等而引起過度密接之情況,又,可有效地抑制輥狀之形態下之黏連,於自輥狀之形態回捲時不會破裂或破損,該非黏著層與該塑膠膜之適應性良好,對於延伸等變形之追隨性良好。因此,可適宜地用於將由脆弱之材料構成且具有微細精緻之電路圖案之半導體晶圓作為被黏著體之半導體加工。若將本發明之黏著帶用於半導體加工,則於藉由負壓進行吸附固定之情形時,可抑制發生過度密接之情況,因此,可順利地進行包括切割在內之半導體製造步驟。又,若將本發明之黏著帶用於半導體加工,則不會產生先前因黏連而產生之膜變形或應力應變之蓄積,因此可準確地追隨半導體晶圓之微細精緻之電路圖案而貼合,又,不會引起貼合於半導體晶圓後之應力應變之自然解除,因此可有效地防止半導體晶圓破碎。尤其是LED所使用之晶圓係由氮化鎵、砷化鎵、碳化矽等非常脆弱之材料構成,因此本發明之黏著帶非常適合於LED切割等。 Since the adhesive tape of the present invention has the film for an adhesive tape of the present invention, as described above, when it is adsorbed and fixed to the fixing base by a negative pressure and is cut or the like, the susceptor can be effectively suppressed. When the heat is generated and the like is excessively adhered, the adhesion in the form of a roll can be effectively suppressed, and the film is not broken or broken when rewinding from the roll form, and the non-adhesive layer has good compatibility with the plastic film. , good followability for deformation such as extension. Therefore, it can be suitably used for processing a semiconductor wafer which is composed of a fragile material and has a fine and delicate circuit pattern as a semiconductor to be bonded. When the adhesive tape of the present invention is used for semiconductor processing, when it is adsorbed and fixed by a negative pressure, excessive adhesion can be suppressed, and therefore, the semiconductor manufacturing step including dicing can be smoothly performed. Moreover, when the adhesive tape of the present invention is used for semiconductor processing, film deformation or stress strain which was previously caused by adhesion does not occur, so that it can accurately follow the fine and delicate circuit pattern of the semiconductor wafer. Moreover, the natural stress relief of the semiconductor wafer is not caused to be released, so that the semiconductor wafer can be effectively prevented from being broken. In particular, the wafer used in the LED is composed of a very fragile material such as gallium nitride, gallium arsenide or tantalum carbide. Therefore, the adhesive tape of the present invention is very suitable for LED cutting and the like.
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