TWI563347B - Facet mirror for a projection exposure apparatus - Google Patents

Facet mirror for a projection exposure apparatus

Info

Publication number
TWI563347B
TWI563347B TW103132654A TW103132654A TWI563347B TW I563347 B TWI563347 B TW I563347B TW 103132654 A TW103132654 A TW 103132654A TW 103132654 A TW103132654 A TW 103132654A TW I563347 B TWI563347 B TW I563347B
Authority
TW
Taiwan
Prior art keywords
exposure apparatus
projection exposure
facet mirror
facet
mirror
Prior art date
Application number
TW103132654A
Other languages
English (en)
Other versions
TW201527893A (zh
Inventor
Michael Patra
Original Assignee
Zeiss Carl Smt Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Gmbh filed Critical Zeiss Carl Smt Gmbh
Publication of TW201527893A publication Critical patent/TW201527893A/zh
Application granted granted Critical
Publication of TWI563347B publication Critical patent/TWI563347B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
TW103132654A 2013-09-23 2014-09-22 Facet mirror for a projection exposure apparatus TWI563347B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102013219057.3A DE102013219057A1 (de) 2013-09-23 2013-09-23 Facettenspiegel für eine Projektionsbelichtungsanlage

Publications (2)

Publication Number Publication Date
TW201527893A TW201527893A (zh) 2015-07-16
TWI563347B true TWI563347B (en) 2016-12-21

Family

ID=51589297

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103132654A TWI563347B (en) 2013-09-23 2014-09-22 Facet mirror for a projection exposure apparatus

Country Status (5)

Country Link
US (1) US9823577B2 (zh)
JP (1) JP6423419B2 (zh)
DE (1) DE102013219057A1 (zh)
TW (1) TWI563347B (zh)
WO (1) WO2015040160A1 (zh)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102015209175A1 (de) * 2015-05-20 2016-11-24 Carl Zeiss Smt Gmbh Pupillenfacettenspiegel
TWI581072B (zh) * 2015-11-20 2017-05-01 力晶科技股份有限公司 曝光裝置與曝光方法
DE102017215664A1 (de) 2017-09-06 2019-03-07 Carl Zeiss Smt Gmbh Optisches System für eine Projektionsbelichtungsanlage
US10571683B2 (en) * 2017-11-28 2020-02-25 Aptiv Technologies Limited Multi-faceted MEMS mirror device useful for vehicle LIDAR
CN111142326B (zh) * 2020-01-02 2024-05-17 京东方科技集团股份有限公司 数字曝光机
DE102023202360A1 (de) 2023-03-15 2023-06-01 Carl Zeiss Smt Gmbh Optische Baugruppe für eine Beleuchtungsoptik einer Projektionsbelichtungsanlage

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110063598A1 (en) * 2008-04-30 2011-03-17 Carl Zeiss Smt Gmbh Illumination optics for euv microlithography and related system and apparatus
JP2011228536A (ja) * 2010-04-21 2011-11-10 Nikon Corp 反射光学部材、光学系、露光装置及びデバイスの製造方法
WO2012130768A2 (en) * 2011-03-25 2012-10-04 Carl Zeiss Smt Gmbh Mirror array
US20120287414A1 (en) * 2010-01-29 2012-11-15 Carl Zeiss Smt Gmbh Facet mirror for use in microlithography

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10148167A1 (de) 2001-09-28 2003-04-17 Zeiss Carl Jena Gmbh Beleuchtungsanordnung
US6870554B2 (en) * 2003-01-07 2005-03-22 Anvik Corporation Maskless lithography with multiplexed spatial light modulators
DE10317667A1 (de) 2003-04-17 2004-11-18 Carl Zeiss Smt Ag Optisches Element für ein Beleuchtungssystem
DE10345430A1 (de) 2003-09-30 2005-06-02 Carl Zeiss Sms Gmbh Beleuchtungsvorrichtung
US7113322B2 (en) * 2004-06-23 2006-09-26 Reflectivity, Inc Micromirror having offset addressing electrode
US20060138349A1 (en) * 2004-12-27 2006-06-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP2153282B1 (en) * 2007-06-07 2013-04-03 Carl Zeiss SMT GmbH Catoptric illumination system for microlithography tool
CN103293665B (zh) 2008-02-15 2016-07-06 卡尔蔡司Smt有限责任公司 微光刻的投射曝光设备使用的分面镜
US8903209B2 (en) 2008-06-26 2014-12-02 Northrop Grumman Systems Corporation Spectral beam combining and wavelength multiplexing with an optical redirecting element
DE102009032194A1 (de) * 2008-10-16 2010-04-22 Carl Zeiss Smt Ag Optischer Spiegel mit einer Mehrzahl benachbarter Spiegelelemente und Verfahren zur Herstellung eines derartigen Spiegels
JP5918858B2 (ja) * 2011-11-15 2016-05-18 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置の光変調器及び照明系
DE102013201506A1 (de) * 2012-02-17 2013-08-22 Carl Zeiss Smt Gmbh Optisches Bauelement
CN104246617B (zh) * 2012-03-09 2018-09-25 卡尔蔡司Smt有限责任公司 Euv投射光刻的照明光学单元及包含该照明光学单元的光学系统
DE102012203716A1 (de) 2012-03-09 2013-09-12 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die EUV-Projektionslithografie sowie optisches System mit einer derartigen Beleuchtungsoptik
DE102012207866A1 (de) 2012-05-11 2013-11-14 Carl Zeiss Smt Gmbh Baugruppe für eine Projektionsbelichtungsanlage für die EUV-Projektionslithografie

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110063598A1 (en) * 2008-04-30 2011-03-17 Carl Zeiss Smt Gmbh Illumination optics for euv microlithography and related system and apparatus
US20120287414A1 (en) * 2010-01-29 2012-11-15 Carl Zeiss Smt Gmbh Facet mirror for use in microlithography
JP2011228536A (ja) * 2010-04-21 2011-11-10 Nikon Corp 反射光学部材、光学系、露光装置及びデバイスの製造方法
WO2012130768A2 (en) * 2011-03-25 2012-10-04 Carl Zeiss Smt Gmbh Mirror array

Also Published As

Publication number Publication date
WO2015040160A1 (en) 2015-03-26
US20160170308A1 (en) 2016-06-16
DE102013219057A1 (de) 2015-03-26
JP6423419B2 (ja) 2018-11-14
TW201527893A (zh) 2015-07-16
US9823577B2 (en) 2017-11-21
JP2016533514A (ja) 2016-10-27

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