TWI562832B - Coating apparatus - Google Patents

Coating apparatus

Info

Publication number
TWI562832B
TWI562832B TW103128003A TW103128003A TWI562832B TW I562832 B TWI562832 B TW I562832B TW 103128003 A TW103128003 A TW 103128003A TW 103128003 A TW103128003 A TW 103128003A TW I562832 B TWI562832 B TW I562832B
Authority
TW
Taiwan
Prior art keywords
coating apparatus
coating
Prior art date
Application number
TW103128003A
Other languages
English (en)
Other versions
TW201511840A (zh
Inventor
Shuichi Sagara
Masatoshi Ueno
Yukihiro Takamura
Muneaki Oe
Original Assignee
Screen Holdings Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Screen Holdings Co Ltd filed Critical Screen Holdings Co Ltd
Publication of TW201511840A publication Critical patent/TW201511840A/zh
Application granted granted Critical
Publication of TWI562832B publication Critical patent/TWI562832B/zh

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/027—Coating heads with several outlets, e.g. aligned transversally to the moving direction of a web to be coated
TW103128003A 2013-09-30 2014-08-15 Coating apparatus TWI562832B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013203387A JP6232239B2 (ja) 2013-09-30 2013-09-30 塗布装置

Publications (2)

Publication Number Publication Date
TW201511840A TW201511840A (zh) 2015-04-01
TWI562832B true TWI562832B (en) 2016-12-21

Family

ID=52787608

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103128003A TWI562832B (en) 2013-09-30 2014-08-15 Coating apparatus

Country Status (4)

Country Link
JP (1) JP6232239B2 (zh)
KR (1) KR101597042B1 (zh)
CN (1) CN104511396B (zh)
TW (1) TWI562832B (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6843676B2 (ja) * 2017-03-30 2021-03-17 日本発條株式会社 剤料供給方法及び対象構造体
CN108269699B (zh) * 2018-03-16 2024-01-30 广州中力自动化设备科技有限公司 一种恒流源赋能机
CN111508874A (zh) * 2020-04-27 2020-08-07 南昌欧菲显示科技有限公司 喷管安装组件及蚀刻装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1611356A (zh) * 2003-10-15 2005-05-04 精工爱普生株式会社 喷出装置、涂布方法、滤色器基板的制造方法
WO2008093701A1 (ja) * 2007-01-30 2008-08-07 Toray Engineering Co., Ltd. 塗布装置
TW200922972A (en) * 2007-09-06 2009-06-01 Seiko Epson Corp Composition for forming alignment film and method for manufacturing liquid crystal device
TW201111047A (en) * 2009-08-26 2011-04-01 Casio Computer Co Ltd Coating device and method for producing a coating layer using the same

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5822266B2 (ja) * 1978-12-19 1983-05-07 富士写真フイルム株式会社 塗布方法
JP2000015162A (ja) * 1998-06-30 2000-01-18 Asmo Co Ltd 自動グリース塗布装置
JP3808728B2 (ja) 2001-06-27 2006-08-16 大日本スクリーン製造株式会社 塗布装置
TW561070B (en) * 2002-10-30 2003-11-11 Ind Tech Res Inst Device and method for image alignment for biochip production jig
JP4679895B2 (ja) * 2003-12-17 2011-05-11 大日本印刷株式会社 パターン形成装置、ヘッドユニット
DE10359280A1 (de) * 2003-12-17 2005-07-21 Itw Gema Ag Sprühbeschichtungsvorrichtung
JP4100354B2 (ja) * 2004-02-19 2008-06-11 セイコーエプソン株式会社 材料塗布方法、カラーフィルタの製造方法、エレクトロルミネッセンス表示装置の製造方法、およびプラズマ表示装置の製造方法。
JP4745727B2 (ja) * 2005-06-16 2011-08-10 芝浦メカトロニクス株式会社 ペースト塗布装置
JP4737685B2 (ja) * 2006-12-25 2011-08-03 大日本スクリーン製造株式会社 塗布装置
JP5037277B2 (ja) * 2007-09-18 2012-09-26 パナソニック株式会社 粘性流体塗布装置
JP5012651B2 (ja) * 2008-05-14 2012-08-29 東京エレクトロン株式会社 塗布装置、塗布方法、塗布、現像装置及び記憶媒体
WO2013183280A1 (ja) * 2012-06-06 2013-12-12 パナソニック株式会社 インクジェット装置および有機ｅｌデバイスの製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1611356A (zh) * 2003-10-15 2005-05-04 精工爱普生株式会社 喷出装置、涂布方法、滤色器基板的制造方法
WO2008093701A1 (ja) * 2007-01-30 2008-08-07 Toray Engineering Co., Ltd. 塗布装置
TW200922972A (en) * 2007-09-06 2009-06-01 Seiko Epson Corp Composition for forming alignment film and method for manufacturing liquid crystal device
TW201111047A (en) * 2009-08-26 2011-04-01 Casio Computer Co Ltd Coating device and method for producing a coating layer using the same

Also Published As

Publication number Publication date
TW201511840A (zh) 2015-04-01
KR20150037502A (ko) 2015-04-08
KR101597042B1 (ko) 2016-02-23
JP6232239B2 (ja) 2017-11-15
CN104511396A (zh) 2015-04-15
CN104511396B (zh) 2017-04-12
JP2015066501A (ja) 2015-04-13

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees