TWI562487B - - Google Patents
Info
- Publication number
- TWI562487B TWI562487B TW103120015A TW103120015A TWI562487B TW I562487 B TWI562487 B TW I562487B TW 103120015 A TW103120015 A TW 103120015A TW 103120015 A TW103120015 A TW 103120015A TW I562487 B TWI562487 B TW I562487B
- Authority
- TW
- Taiwan
Links
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18308—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement
- H01S5/18311—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement using selective oxidation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S2301/00—Functional characteristics
- H01S2301/17—Semiconductor lasers comprising special layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18308—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement
- H01S5/18311—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement using selective oxidation
- H01S5/18313—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement using selective oxidation by oxidizing at least one of the DBR layers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/305—Structure or shape of the active region; Materials used for the active region characterised by the doping materials used in the laser structure
- H01S5/3054—Structure or shape of the active region; Materials used for the active region characterised by the doping materials used in the laser structure p-doping
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013153412 | 2013-07-24 | ||
PCT/JP2014/062679 WO2015011966A1 (fr) | 2013-07-24 | 2014-05-13 | Laser à cavité verticale émettant par la surface et son procédé de fabrication |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201507303A TW201507303A (zh) | 2015-02-16 |
TWI562487B true TWI562487B (fr) | 2016-12-11 |
Family
ID=52393023
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW103120015A TW201507303A (zh) | 2013-07-24 | 2014-06-10 | 垂直諧振器型面發光雷射及其製造方法 |
Country Status (2)
Country | Link |
---|---|
TW (1) | TW201507303A (fr) |
WO (1) | WO2015011966A1 (fr) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA3072760A1 (fr) | 2017-08-14 | 2019-02-21 | Trilumina Corp. | Matrice vcsel compatible avec un montage en surface |
EP3732757A4 (fr) * | 2017-12-28 | 2021-10-13 | Princeton Optronics, Inc. | Sources de semi-conducteur à divergence de faisceau étroite |
WO2021192672A1 (fr) * | 2020-03-27 | 2021-09-30 | ソニーセミコンダクタソリューションズ株式会社 | Laser à émission de surface, réseau de lasers à émission de surface, appareil électronique et procédé de fabrication de laser à émission de surface |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006228959A (ja) * | 2005-02-17 | 2006-08-31 | Sony Corp | 面発光半導体レーザ |
TW201234585A (en) * | 2010-12-21 | 2012-08-16 | Sumitomo Chemical Co | Semiconductor substrate, method for manufacturing semiconductor substrate and vertical resonator surface light-emitting laser |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004146515A (ja) * | 2002-10-23 | 2004-05-20 | Furukawa Electric Co Ltd:The | 半導体レーザ素子 |
JP5272308B2 (ja) * | 2004-09-21 | 2013-08-28 | 日本電気株式会社 | 電流狭窄構造および半導体レーザ |
WO2009078232A1 (fr) * | 2007-12-14 | 2009-06-25 | Nec Corporation | Laser à émission de lumière par la surface |
JP5665504B2 (ja) * | 2010-11-24 | 2015-02-04 | キヤノン株式会社 | 垂直共振器型面発光レーザおよび垂直共振器型面発光レーザアレイ |
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2014
- 2014-05-13 WO PCT/JP2014/062679 patent/WO2015011966A1/fr active Application Filing
- 2014-06-10 TW TW103120015A patent/TW201507303A/zh unknown
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006228959A (ja) * | 2005-02-17 | 2006-08-31 | Sony Corp | 面発光半導体レーザ |
TW201234585A (en) * | 2010-12-21 | 2012-08-16 | Sumitomo Chemical Co | Semiconductor substrate, method for manufacturing semiconductor substrate and vertical resonator surface light-emitting laser |
Also Published As
Publication number | Publication date |
---|---|
WO2015011966A1 (fr) | 2015-01-29 |
TW201507303A (zh) | 2015-02-16 |