TWI562189B - Power distortion-based servo control systems for frequency tuning rf power sources - Google Patents

Power distortion-based servo control systems for frequency tuning rf power sources

Info

Publication number
TWI562189B
TWI562189B TW101148991A TW101148991A TWI562189B TW I562189 B TWI562189 B TW I562189B TW 101148991 A TW101148991 A TW 101148991A TW 101148991 A TW101148991 A TW 101148991A TW I562189 B TWI562189 B TW I562189B
Authority
TW
Taiwan
Prior art keywords
power
control systems
servo control
frequency tuning
based servo
Prior art date
Application number
TW101148991A
Other languages
English (en)
Other versions
TW201327620A (zh
Inventor
David J Coumou
Original Assignee
Mks Instr Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mks Instr Inc filed Critical Mks Instr Inc
Publication of TW201327620A publication Critical patent/TW201327620A/zh
Application granted granted Critical
Publication of TWI562189B publication Critical patent/TWI562189B/zh

Links

Classifications

    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H7/00—Multiple-port networks comprising only passive electrical elements as network components
    • H03H7/38—Impedance-matching networks
    • H03H7/40—Automatic matching of load impedance to source impedance
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03F—AMPLIFIERS
    • H03F1/00—Details of amplifiers with only discharge tubes, only semiconductor devices or only unspecified devices as amplifying elements
    • H03F1/32—Modifications of amplifiers to reduce non-linear distortion
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03F—AMPLIFIERS
    • H03F1/00—Details of amplifiers with only discharge tubes, only semiconductor devices or only unspecified devices as amplifying elements
    • H03F1/56—Modifications of input or output impedances, not otherwise provided for
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03F—AMPLIFIERS
    • H03F3/00—Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
    • H03F3/189—High-frequency amplifiers, e.g. radio frequency amplifiers
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03F—AMPLIFIERS
    • H03F3/00—Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
    • H03F3/189—High-frequency amplifiers, e.g. radio frequency amplifiers
    • H03F3/19—High-frequency amplifiers, e.g. radio frequency amplifiers with semiconductor devices only
    • H03F3/191—Tuned amplifiers
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/34—Details, e.g. electrodes, nozzles
    • H05H1/36—Circuit arrangements

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Amplifiers (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • Transmitters (AREA)
TW101148991A 2011-12-29 2012-12-21 Power distortion-based servo control systems for frequency tuning rf power sources TWI562189B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US13/339,494 US8576013B2 (en) 2011-12-29 2011-12-29 Power distortion-based servo control systems for frequency tuning RF power sources

Publications (2)

Publication Number Publication Date
TW201327620A TW201327620A (zh) 2013-07-01
TWI562189B true TWI562189B (en) 2016-12-11

Family

ID=47720244

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101148991A TWI562189B (en) 2011-12-29 2012-12-21 Power distortion-based servo control systems for frequency tuning rf power sources

Country Status (7)

Country Link
US (2) US8576013B2 (zh)
EP (1) EP2611029B1 (zh)
JP (1) JP5619864B2 (zh)
KR (1) KR101899006B1 (zh)
CN (2) CN106411272B (zh)
SG (1) SG191538A1 (zh)
TW (1) TWI562189B (zh)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI629875B (zh) * 2017-09-15 2018-07-11 精卡科技股份有限公司 Wireless transmitter with dynamically adjusted impedance matching
TWI705735B (zh) * 2018-09-21 2020-09-21 日商阿德特克等離子技術公司 設於高頻電源系統之阻抗匹配裝置
US10861677B2 (en) 2017-07-07 2020-12-08 Advanced Energy Industries, Inc. Inter-period control system for plasma power delivery system and method of operating the same
US11615943B2 (en) 2017-07-07 2023-03-28 Advanced Energy Industries, Inc. Inter-period control for passive power distribution of multiple electrode inductive plasma source
US11651939B2 (en) 2017-07-07 2023-05-16 Advanced Energy Industries, Inc. Inter-period control system for plasma power delivery system and method of operating same

Families Citing this family (83)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9143172B2 (en) * 2009-06-03 2015-09-22 Qualcomm Incorporated Tunable matching circuits for power amplifiers
US9559639B2 (en) 2009-08-19 2017-01-31 Qualcomm Incorporated Protection circuit for power amplifier
US9761924B2 (en) * 2012-11-29 2017-09-12 Hewlett-Packard Development Company, L.P. Wired connector and antenna
US8781415B1 (en) * 2013-02-07 2014-07-15 Mks Instruments, Inc. Distortion correction based feedforward control systems and methods for radio frequency power sources
US9913679B2 (en) 2013-10-16 2018-03-13 Covidien Lp Electrosurgical systems and methods for monitoring power dosage
US9844127B2 (en) 2014-01-10 2017-12-12 Reno Technologies, Inc. High voltage switching circuit
US10455729B2 (en) 2014-01-10 2019-10-22 Reno Technologies, Inc. Enclosure cooling system
US10679824B2 (en) 2015-06-29 2020-06-09 Reno Technologies, Inc. Capacitance variation
US9865432B1 (en) 2014-01-10 2018-01-09 Reno Technologies, Inc. RF impedance matching network
US10431428B2 (en) 2014-01-10 2019-10-01 Reno Technologies, Inc. System for providing variable capacitance
US9755641B1 (en) 2014-01-10 2017-09-05 Reno Technologies, Inc. High speed high voltage switching circuit
US9697991B2 (en) 2014-01-10 2017-07-04 Reno Technologies, Inc. RF impedance matching network
US9196459B2 (en) 2014-01-10 2015-11-24 Reno Technologies, Inc. RF impedance matching network
US9496122B1 (en) 2014-01-10 2016-11-15 Reno Technologies, Inc. Electronically variable capacitor and RF matching network incorporating same
US10950421B2 (en) * 2014-04-21 2021-03-16 Lam Research Corporation Using modeling for identifying a location of a fault in an RF transmission system for a plasma system
US10048300B2 (en) 2014-04-25 2018-08-14 Qualcomm Technologies, Inc. Detector circuit
DE102014209469A1 (de) * 2014-05-19 2015-11-19 TRUMPF Hüttinger GmbH + Co. KG Regelungsanordnung, Regelsystem und Hochfrequenzleistungserzeugungsvorrichtung
US9634610B2 (en) * 2014-10-03 2017-04-25 Short Circut Technologies LLC 60 GHz wideband class E/F2 power amplifier
US9854659B2 (en) * 2014-10-16 2017-12-26 Advanced Energy Industries, Inc. Noise based frequency tuning and identification of plasma characteristics
US10049857B2 (en) 2014-12-04 2018-08-14 Mks Instruments, Inc. Adaptive periodic waveform controller
US9306533B1 (en) 2015-02-20 2016-04-05 Reno Technologies, Inc. RF impedance matching network
US11017983B2 (en) 2015-02-18 2021-05-25 Reno Technologies, Inc. RF power amplifier
US10340879B2 (en) 2015-02-18 2019-07-02 Reno Technologies, Inc. Switching circuit
US9525412B2 (en) 2015-02-18 2016-12-20 Reno Technologies, Inc. Switching circuit
US9729122B2 (en) 2015-02-18 2017-08-08 Reno Technologies, Inc. Switching circuit
US11342161B2 (en) 2015-06-29 2022-05-24 Reno Technologies, Inc. Switching circuit with voltage bias
US11150283B2 (en) 2015-06-29 2021-10-19 Reno Technologies, Inc. Amplitude and phase detection circuit
US11335540B2 (en) 2015-06-29 2022-05-17 Reno Technologies, Inc. Impedance matching network and method
US10984986B2 (en) 2015-06-29 2021-04-20 Reno Technologies, Inc. Impedance matching network and method
US11342160B2 (en) 2015-06-29 2022-05-24 Reno Technologies, Inc. Filter for impedance matching
US10692699B2 (en) 2015-06-29 2020-06-23 Reno Technologies, Inc. Impedance matching with restricted capacitor switching
US11081316B2 (en) 2015-06-29 2021-08-03 Reno Technologies, Inc. Impedance matching network and method
US9721758B2 (en) * 2015-07-13 2017-08-01 Mks Instruments, Inc. Unified RF power delivery single input, multiple output control for continuous and pulse mode operation
US9876476B2 (en) 2015-08-18 2018-01-23 Mks Instruments, Inc. Supervisory control of radio frequency (RF) impedance tuning operation
TWI551028B (zh) * 2015-12-01 2016-09-21 Shihlin Electric & Eng Corp Servo drive system bandwidth and phase verification of the measurement device
KR20180116225A (ko) 2016-01-22 2018-10-24 에스피피 테크놀로지스 컴퍼니 리미티드 플라즈마 제어 장치
KR20170117311A (ko) * 2016-04-13 2017-10-23 램 리써치 코포레이션 Rf 생성기의 복수의 상태들 동안 단계적 방식으로 임피던스 매칭 네트워크를 튜닝하기 위한 시스템들 및 방법들
US9748076B1 (en) * 2016-04-20 2017-08-29 Advanced Energy Industries, Inc. Apparatus for frequency tuning in a RF generator
US10229816B2 (en) * 2016-05-24 2019-03-12 Mks Instruments, Inc. Solid-state impedance matching systems including a hybrid tuning network with a switchable coarse tuning network and a varactor fine tuning network
JP6157036B1 (ja) * 2016-07-08 2017-07-05 株式会社京三製作所 高周波電源装置、及び高周波電源装置の制御方法
EP3300257A1 (en) * 2016-09-21 2018-03-28 Intel IP Corporation Method and circuit for determining a setting of an impedance matching circuit
US10109460B2 (en) * 2016-11-30 2018-10-23 Lam Research Corporation Universal non-invasive chamber impedance measurement system and associated methods
CN107134399B (zh) * 2017-04-06 2019-06-25 中国电子科技集团公司第四十八研究所 用于高能离子注入机的射频加速调谐装置及控制方法
CN107154788B (zh) * 2017-04-21 2020-07-07 西安电子科技大学 一种射频能量采集电路中的l型阻抗匹配系统及方法
US10546724B2 (en) * 2017-05-10 2020-01-28 Mks Instruments, Inc. Pulsed, bidirectional radio frequency source/load
US10396601B2 (en) * 2017-05-25 2019-08-27 Mks Instruments, Inc. Piecewise RF power systems and methods for supplying pre-distorted RF bias voltage signals to an electrode in a processing chamber
US11393659B2 (en) 2017-07-10 2022-07-19 Reno Technologies, Inc. Impedance matching network and method
US10714314B1 (en) 2017-07-10 2020-07-14 Reno Technologies, Inc. Impedance matching network and method
US10483090B2 (en) 2017-07-10 2019-11-19 Reno Technologies, Inc. Restricted capacitor switching
US11476091B2 (en) 2017-07-10 2022-10-18 Reno Technologies, Inc. Impedance matching network for diagnosing plasma chamber
US11521833B2 (en) 2017-07-10 2022-12-06 Reno Technologies, Inc. Combined RF generator and RF solid-state matching network
US11114280B2 (en) 2017-07-10 2021-09-07 Reno Technologies, Inc. Impedance matching with multi-level power setpoint
US11398370B2 (en) 2017-07-10 2022-07-26 Reno Technologies, Inc. Semiconductor manufacturing using artificial intelligence
US10727029B2 (en) 2017-07-10 2020-07-28 Reno Technologies, Inc Impedance matching using independent capacitance and frequency control
US11289307B2 (en) 2017-07-10 2022-03-29 Reno Technologies, Inc. Impedance matching network and method
US11101110B2 (en) 2017-07-10 2021-08-24 Reno Technologies, Inc. Impedance matching network and method
US11315758B2 (en) 2017-07-10 2022-04-26 Reno Technologies, Inc. Impedance matching using electronically variable capacitance and frequency considerations
US10805130B2 (en) 2017-09-12 2020-10-13 Intel IP Corporation Signal cancellation system and method
CN109510632B (zh) * 2017-09-15 2022-04-15 品佳安科技股份有限公司 具有动态调整阻抗匹配功能的无线发射器
CN107707207A (zh) * 2017-09-21 2018-02-16 深圳市万联航通电子科技有限公司 多频多制式射频功率放大器
US10304669B1 (en) 2018-01-21 2019-05-28 Mks Instruments, Inc. Adaptive counter measure control thwarting IMD jamming impairments for RF plasma systems
JP2019186098A (ja) * 2018-04-12 2019-10-24 東京エレクトロン株式会社 プラズマを生成する方法
CN110504149B (zh) 2018-05-17 2022-04-22 北京北方华创微电子装备有限公司 射频电源的脉冲调制系统及方法
US11042140B2 (en) * 2018-06-26 2021-06-22 Mks Instruments, Inc. Adaptive control for a power generator
KR101934561B1 (ko) * 2018-06-28 2019-03-25 성진엔지니어링(주) 이중배관 구조를 갖는 플라즈마 스크러버 시스템
US11199568B2 (en) * 2018-09-28 2021-12-14 Maury Microwave, Inc. Millimeter wave active load pull using low frequency phase and amplitude tuning
US10910197B2 (en) * 2018-10-19 2021-02-02 Mks Instruments, Inc. Impedance matching network model based correction scheme and performance repeatability
US11515123B2 (en) * 2018-12-21 2022-11-29 Advanced Energy Industries, Inc. Apparatus and system for modulated plasma systems
US11804362B2 (en) 2018-12-21 2023-10-31 Advanced Energy Industries, Inc. Frequency tuning for modulated plasma systems
KR102348338B1 (ko) * 2019-02-07 2022-01-06 엠케이에스코리아 유한회사 펄스형 가변 주파수 rf 발생기의 구동 주파수 제어 방법
US10943770B2 (en) 2019-03-04 2021-03-09 Advanced Energy Industries, Inc. Detection of damage in matching networks
US11521831B2 (en) 2019-05-21 2022-12-06 Reno Technologies, Inc. Impedance matching network and method with reduced memory requirements
US11158488B2 (en) 2019-06-26 2021-10-26 Mks Instruments, Inc. High speed synchronization of plasma source/bias power delivery
US11315757B2 (en) 2019-08-13 2022-04-26 Mks Instruments, Inc. Method and apparatus to enhance sheath formation, evolution and pulse to pulse stability in RF powered plasma applications
US10741363B1 (en) * 2019-10-08 2020-08-11 Mks Instruments, Inc. Extremum seeking control apparatus and method for automatic frequency tuning for RF impedance matching
CN112992636B (zh) * 2019-12-17 2023-09-29 中微半导体设备(上海)股份有限公司 用于等离子体处理设备的射频功率源装置和射频功率分配方法
CN112540204B (zh) * 2020-12-09 2023-09-05 国网四川省电力公司电力科学研究院 一种功率源控制装置
CN113065237B (zh) * 2021-03-19 2022-11-08 四川英杰电气股份有限公司 一种自动设置调频边界的方法和射频电源
US20230080707A1 (en) * 2021-09-13 2023-03-16 Advanced Energy Industries, Inc. Model reference adaptive control with signum projection tensor operations
TWI779965B (zh) * 2021-12-14 2022-10-01 瑞昱半導體股份有限公司 量測系統及相關方法
CN115001414A (zh) * 2022-05-09 2022-09-02 西安北方华创微电子装备有限公司 一种射频电源
CN115206763B (zh) * 2022-06-30 2024-04-09 西安北方华创微电子装备有限公司 一种射频电源和半导体工艺设备
CN117478164B (zh) * 2023-12-22 2024-04-09 深圳市瀚强科技股份有限公司 射频保护电路及相关装置

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW418594B (en) * 1997-09-15 2001-01-11 Eni Tech Inc Fuzzy logic tunning of RF matching network
US6768472B2 (en) * 2001-08-24 2004-07-27 Broadcom Corporation Active impedance matching in communications systems
US6895225B1 (en) * 1999-03-29 2005-05-17 Nokia Mobile Phones, Ltd. System for matching an antenna for a wireless communication device
US20110086601A1 (en) * 2009-10-14 2011-04-14 Research In Motion Limited Dynamic real-time calibration for antenna matching in a radio frequency transmitter system
US7929987B2 (en) * 2006-02-06 2011-04-19 Samsung Electronics Co., Ltd. Apparatus and method for preventing degradation of RF performance due to impedance change of antenna in mobile communication terminal
TW201142912A (en) * 2009-11-18 2011-12-01 Axcelis Tech Inc Tuning hardware for plasma ashing apparatus and methods of use thereof

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR0170387B1 (ko) * 1989-10-03 1999-03-30 제임스 조셉 드롱 고주파 반도체 웨이퍼 가공장치 및 방법
US5223457A (en) 1989-10-03 1993-06-29 Applied Materials, Inc. High-frequency semiconductor wafer processing method using a negative self-bias
US5383019A (en) 1990-03-23 1995-01-17 Fisons Plc Inductively coupled plasma spectrometers and radio-frequency power supply therefor
US5688357A (en) 1995-02-15 1997-11-18 Applied Materials, Inc. Automatic frequency tuning of an RF power source of an inductively coupled plasma reactor
US5892198A (en) 1996-03-29 1999-04-06 Lam Research Corporation Method of and apparatus for electronically controlling r.f. energy supplied to a vacuum plasma processor and memory for same
US5654679A (en) * 1996-06-13 1997-08-05 Rf Power Products, Inc. Apparatus for matching a variable load impedance with an RF power generator impedance
US6020794A (en) 1998-02-09 2000-02-01 Eni Technologies, Inc. Ratiometric autotuning algorithm for RF plasma generator
US6326584B1 (en) 1999-12-31 2001-12-04 Litmas, Inc. Methods and apparatus for RF power delivery
US6392210B1 (en) 1999-12-31 2002-05-21 Russell F. Jewett Methods and apparatus for RF power process operations with automatic input power control
US7084369B2 (en) * 2002-08-20 2006-08-01 Tokyo Electron Limited Harmonic multiplexer
JP4059734B2 (ja) * 2002-08-29 2008-03-12 三菱電機株式会社 数値制御装置
JP2005077248A (ja) * 2003-08-29 2005-03-24 Daihen Corp 高周波電源装置
JP4411282B2 (ja) * 2003-11-27 2010-02-10 株式会社ダイヘン 高周波電力供給システム
JP4739793B2 (ja) * 2005-03-31 2011-08-03 株式会社ダイヘン 高周波電源装置
US7602127B2 (en) 2005-04-18 2009-10-13 Mks Instruments, Inc. Phase and frequency control of a radio frequency generator from an external source
US7477711B2 (en) * 2005-05-19 2009-01-13 Mks Instruments, Inc. Synchronous undersampling for high-frequency voltage and current measurements
CN101297480B (zh) * 2005-10-31 2012-08-08 Mks仪器股份有限公司 用于向动态负载传递功率的系统和方法
US7764140B2 (en) 2005-10-31 2010-07-27 Mks Instruments, Inc. Radio frequency power delivery system
JP4804991B2 (ja) * 2006-03-31 2011-11-02 株式会社ダイヘン インピーダンス整合装置
US7839223B2 (en) 2008-03-23 2010-11-23 Advanced Energy Industries, Inc. Method and apparatus for advanced frequency tuning
US8306494B2 (en) * 2008-08-14 2012-11-06 Broadcom Corporation Method and system for a single-ended input low noise amplifier with differential output
CN101997496A (zh) * 2010-09-15 2011-03-30 爱斯泰克（上海）高频通讯技术有限公司 可重构功率放大器集成电路
US8294514B2 (en) * 2010-09-24 2012-10-23 St-Ericsson Sa Calibrate output matching for correct output power
US8717104B1 (en) * 2011-02-17 2014-05-06 Anadigics, Inc. Vector voltage samplers for RF interface control of power amplifier
US8779868B2 (en) * 2011-03-10 2014-07-15 Harris Corporation Mobile wireless communications device with adjustable impedance matching network and associated methods

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW418594B (en) * 1997-09-15 2001-01-11 Eni Tech Inc Fuzzy logic tunning of RF matching network
US6895225B1 (en) * 1999-03-29 2005-05-17 Nokia Mobile Phones, Ltd. System for matching an antenna for a wireless communication device
US6768472B2 (en) * 2001-08-24 2004-07-27 Broadcom Corporation Active impedance matching in communications systems
US7929987B2 (en) * 2006-02-06 2011-04-19 Samsung Electronics Co., Ltd. Apparatus and method for preventing degradation of RF performance due to impedance change of antenna in mobile communication terminal
US20110086601A1 (en) * 2009-10-14 2011-04-14 Research In Motion Limited Dynamic real-time calibration for antenna matching in a radio frequency transmitter system
TW201142912A (en) * 2009-11-18 2011-12-01 Axcelis Tech Inc Tuning hardware for plasma ashing apparatus and methods of use thereof

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10861677B2 (en) 2017-07-07 2020-12-08 Advanced Energy Industries, Inc. Inter-period control system for plasma power delivery system and method of operating the same
TWI727184B (zh) * 2017-07-07 2021-05-11 新加坡商Ａｅｓ全球公司 用於電漿功率遞送系統的週期間控制系統及其操作的方法
US11450510B2 (en) 2017-07-07 2022-09-20 Advanced Energy Industries, Inc. Inter-period control system for plasma power delivery system and method of operating same
US11610763B2 (en) 2017-07-07 2023-03-21 Advanced Energy Industries, Inc. Inter-period control system for plasma power delivery system and method of operating the same
US11615943B2 (en) 2017-07-07 2023-03-28 Advanced Energy Industries, Inc. Inter-period control for passive power distribution of multiple electrode inductive plasma source
US11651939B2 (en) 2017-07-07 2023-05-16 Advanced Energy Industries, Inc. Inter-period control system for plasma power delivery system and method of operating same
TWI629875B (zh) * 2017-09-15 2018-07-11 精卡科技股份有限公司 Wireless transmitter with dynamically adjusted impedance matching
TWI705735B (zh) * 2018-09-21 2020-09-21 日商阿德特克等離子技術公司 設於高頻電源系統之阻抗匹配裝置
US11651938B2 (en) 2018-09-21 2023-05-16 Adtec Plasma Technology Co., Ltd. Impedance matching device provided in high-frequency power system

Also Published As

Publication number Publication date
JP2013153432A (ja) 2013-08-08
US8576013B2 (en) 2013-11-05
US20130169359A1 (en) 2013-07-04
KR101899006B1 (ko) 2018-09-17
CN106411272A (zh) 2017-02-15
EP2611029B1 (en) 2021-07-21
CN103187968B (zh) 2016-12-07
US9041471B2 (en) 2015-05-26
KR20130077799A (ko) 2013-07-09
EP2611029A2 (en) 2013-07-03
JP5619864B2 (ja) 2014-11-05
CN106411272B (zh) 2019-06-07
EP2611029A3 (en) 2016-08-31
US20140028389A1 (en) 2014-01-30
SG191538A1 (en) 2013-07-31
CN103187968A (zh) 2013-07-03
TW201327620A (zh) 2013-07-01

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