TWI560527B - Method of slimming radiation-sensitive material lines in lithographic applications - Google Patents
Method of slimming radiation-sensitive material lines in lithographic applicationsInfo
- Publication number
- TWI560527B TWI560527B TW101111550A TW101111550A TWI560527B TW I560527 B TWI560527 B TW I560527B TW 101111550 A TW101111550 A TW 101111550A TW 101111550 A TW101111550 A TW 101111550A TW I560527 B TWI560527 B TW I560527B
- Authority
- TW
- Taiwan
- Prior art keywords
- sensitive material
- material lines
- lithographic applications
- slimming
- radiation
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
- G03F7/2024—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure of the already developed image
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67207—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13/077,833 US8435728B2 (en) | 2010-03-31 | 2011-03-31 | Method of slimming radiation-sensitive material lines in lithographic applications |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201303520A TW201303520A (zh) | 2013-01-16 |
TWI560527B true TWI560527B (en) | 2016-12-01 |
Family
ID=45929039
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW101111550A TWI560527B (en) | 2011-03-31 | 2012-03-30 | Method of slimming radiation-sensitive material lines in lithographic applications |
Country Status (6)
Country | Link |
---|---|
US (1) | US8435728B2 (zh) |
JP (1) | JP5944484B2 (zh) |
KR (1) | KR101938905B1 (zh) |
CN (1) | CN103547968B (zh) |
TW (1) | TWI560527B (zh) |
WO (1) | WO2012134910A1 (zh) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9176377B2 (en) | 2010-06-01 | 2015-11-03 | Inpria Corporation | Patterned inorganic layers, radiation based patterning compositions and corresponding methods |
US8980651B2 (en) | 2011-09-30 | 2015-03-17 | Tokyo Electron Limited | Overlay measurement for a double patterning |
US8647817B2 (en) | 2012-01-03 | 2014-02-11 | Tokyo Electron Limited | Vapor treatment process for pattern smoothing and inline critical dimension slimming |
US9086631B2 (en) | 2012-08-27 | 2015-07-21 | Tokyo Electron Limited | EUV resist sensitivity reduction |
US9147574B2 (en) | 2013-03-14 | 2015-09-29 | Tokyo Electron Limited | Topography minimization of neutral layer overcoats in directed self-assembly applications |
US8975009B2 (en) | 2013-03-14 | 2015-03-10 | Tokyo Electron Limited | Track processing to remove organic films in directed self-assembly chemo-epitaxy applications |
US9310684B2 (en) | 2013-08-22 | 2016-04-12 | Inpria Corporation | Organometallic solution based high resolution patterning compositions |
JP2015082046A (ja) * | 2013-10-23 | 2015-04-27 | 富士フイルム株式会社 | パターン形成方法、電子デバイスの製造方法、及び、電子デバイス |
EP3889159B1 (en) | 2014-10-23 | 2024-06-05 | Inpria Corporation | Organometallic solution based high resolution patterning compositions |
US9612536B2 (en) * | 2015-08-31 | 2017-04-04 | Taiwan Semiconductor Manufacturing Company, Ltd. | Developer for lithography |
EP4089482A1 (en) | 2015-10-13 | 2022-11-16 | Inpria Corporation | Organotin oxide hydroxide patterning compositions, precursors, and patterning |
JP2017068281A (ja) * | 2016-12-27 | 2017-04-06 | Hoya株式会社 | フォトマスクの製造方法、パターン転写方法及び表示装置の製造方法 |
US11586113B2 (en) * | 2018-06-15 | 2023-02-21 | Mattson Technology, Inc | Methods and apparatus for post exposure bake processing of a workpiece |
TW202016279A (zh) | 2018-10-17 | 2020-05-01 | 美商英培雅股份有限公司 | 圖案化有機金屬光阻及圖案化的方法 |
KR20210134072A (ko) * | 2019-04-12 | 2021-11-08 | 인프리아 코포레이션 | 유기금속 포토레지스트 현상제 조성물 및 처리 방법 |
JP2023515693A (ja) | 2020-03-02 | 2023-04-13 | インプリア・コーポレイション | 無機レジストパターニング用のプロセス環境 |
CN113845082B (zh) * | 2021-09-08 | 2022-10-18 | 清华大学 | 辐射热流调控器件及其应用 |
Citations (2)
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TW200839467A (en) * | 2006-12-25 | 2008-10-01 | Fujifilm Corp | Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming metho |
US7829269B1 (en) * | 2009-04-27 | 2010-11-09 | Tokyo Electron Limited | Dual tone development with plural photo-acid generators in lithographic applications |
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JPH07117751B2 (ja) | 1987-12-14 | 1995-12-18 | 株式会社日立製作所 | 感光剤 |
US5741624A (en) | 1996-02-13 | 1998-04-21 | Micron Technology, Inc. | Method for reducing photolithographic steps in a semiconductor interconnect process |
JPH09251210A (ja) | 1996-03-15 | 1997-09-22 | Toshiba Corp | レジストパターンの形成方法 |
US5914202A (en) | 1996-06-10 | 1999-06-22 | Sharp Microeletronics Technology, Inc. | Method for forming a multi-level reticle |
JP2000035672A (ja) * | 1998-03-09 | 2000-02-02 | Mitsubishi Electric Corp | 半導体装置の製造方法及び半導体装置 |
JP4689082B2 (ja) * | 2001-06-06 | 2011-05-25 | 富士通株式会社 | ネガ型レジスト組成物 |
US7364839B2 (en) | 2002-07-24 | 2008-04-29 | Kabushiki Kaisha Toshiba | Method for forming a pattern and substrate-processing apparatus |
JP3927575B2 (ja) * | 2002-07-30 | 2007-06-13 | 株式会社ルネサステクノロジ | 電子装置の製造方法 |
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JP4040515B2 (ja) | 2003-03-26 | 2008-01-30 | 株式会社東芝 | マスクのセット、マスクデータ作成方法及びパターン形成方法 |
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TWI281690B (en) | 2003-05-09 | 2007-05-21 | Toshiba Corp | Pattern forming method, and manufacturing method for semiconductor using the same |
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JP2006351861A (ja) | 2005-06-16 | 2006-12-28 | Toshiba Corp | 半導体装置の製造方法 |
JP4588551B2 (ja) * | 2005-06-16 | 2010-12-01 | 富士通株式会社 | レジスト組成物、レジストパターンの形成方法、半導体装置及びその製造方法 |
CN100427285C (zh) * | 2006-09-11 | 2008-10-22 | 东华大学 | 聚乳酸/ε-聚己内酯嵌段共聚物形成微观结构的方法 |
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-
2011
- 2011-03-31 US US13/077,833 patent/US8435728B2/en active Active
-
2012
- 2012-03-21 CN CN201280024743.1A patent/CN103547968B/zh active Active
- 2012-03-21 WO PCT/US2012/029905 patent/WO2012134910A1/en active Application Filing
- 2012-03-21 JP JP2014502631A patent/JP5944484B2/ja active Active
- 2012-03-21 KR KR1020137028955A patent/KR101938905B1/ko active IP Right Grant
- 2012-03-30 TW TW101111550A patent/TWI560527B/zh active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW200839467A (en) * | 2006-12-25 | 2008-10-01 | Fujifilm Corp | Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming metho |
US7829269B1 (en) * | 2009-04-27 | 2010-11-09 | Tokyo Electron Limited | Dual tone development with plural photo-acid generators in lithographic applications |
Also Published As
Publication number | Publication date |
---|---|
WO2012134910A1 (en) | 2012-10-04 |
CN103547968A (zh) | 2014-01-29 |
TW201303520A (zh) | 2013-01-16 |
US8435728B2 (en) | 2013-05-07 |
KR20140031884A (ko) | 2014-03-13 |
JP2014510954A (ja) | 2014-05-01 |
KR101938905B1 (ko) | 2019-01-15 |
CN103547968B (zh) | 2016-03-23 |
US20110244403A1 (en) | 2011-10-06 |
JP5944484B2 (ja) | 2016-07-05 |
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