TWI560418B - Heat treatment furnace and heat treatment apparatus - Google Patents

Heat treatment furnace and heat treatment apparatus

Info

Publication number
TWI560418B
TWI560418B TW101121354A TW101121354A TWI560418B TW I560418 B TWI560418 B TW I560418B TW 101121354 A TW101121354 A TW 101121354A TW 101121354 A TW101121354 A TW 101121354A TW I560418 B TWI560418 B TW I560418B
Authority
TW
Taiwan
Prior art keywords
heat treatment
furnace
treatment apparatus
treatment furnace
heat
Prior art date
Application number
TW101121354A
Other languages
English (en)
Other versions
TW201319498A (zh
Inventor
Makoto Kobayashi
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of TW201319498A publication Critical patent/TW201319498A/zh
Application granted granted Critical
Publication of TWI560418B publication Critical patent/TWI560418B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67103—Apparatus for thermal treatment mainly by conduction
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B17/00—Furnaces of a kind not covered by any preceding group
    • F27B17/0016—Chamber type furnaces
    • F27B17/0025—Especially adapted for treating semiconductor wafers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67109—Apparatus for thermal treatment mainly by convection

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Thermal Insulation (AREA)
  • Chemical Vapour Deposition (AREA)
  • Furnace Housings, Linings, Walls, And Ceilings (AREA)
TW101121354A 2011-06-27 2012-06-14 Heat treatment furnace and heat treatment apparatus TWI560418B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011142102A JP5743746B2 (ja) 2011-06-27 2011-06-27 熱処理炉及び熱処理装置

Publications (2)

Publication Number Publication Date
TW201319498A TW201319498A (zh) 2013-05-16
TWI560418B true TWI560418B (en) 2016-12-01

Family

ID=47360864

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101121354A TWI560418B (en) 2011-06-27 2012-06-14 Heat treatment furnace and heat treatment apparatus

Country Status (5)

Country Link
US (1) US8957352B2 (zh)
JP (1) JP5743746B2 (zh)
KR (1) KR101503976B1 (zh)
CN (1) CN102856231B (zh)
TW (1) TWI560418B (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101497373B1 (ko) * 2013-04-26 2015-03-03 주식회사 케이엔제이 반응가스의 혼합 및 가열수단을 구비한 서셉터 제조장치
KR101511512B1 (ko) * 2013-04-26 2015-04-13 주식회사 케이엔제이 냉각팬을 구비한 서셉터 제조장치
JP6091377B2 (ja) * 2013-08-21 2017-03-08 東京エレクトロン株式会社 断熱壁体の製造方法
TW201531659A (zh) * 2014-02-14 2015-08-16 You-Fu Chen 隧道窯爐氣密裝置
KR101500938B1 (ko) * 2014-10-21 2015-03-12 주식회사 케이엔제이 반응가스의 혼합 및 가열수단을 구비한 서셉터 제조장치
CN105065857A (zh) * 2015-08-24 2015-11-18 许浒 一种用于炉窑的保温绝热外套
JP7055075B2 (ja) * 2018-07-20 2022-04-15 東京エレクトロン株式会社 熱処理装置及び熱処理方法
CN109099708B (zh) * 2018-08-22 2020-08-28 江苏大学 一种带升降装置的试验用立式高温炉

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200914783A (en) * 2007-03-20 2009-04-01 Tokyo Electron Ltd Heat processing furnace and vertical-type heat processing appartus
CN101831712A (zh) * 2009-03-13 2010-09-15 中国科学院福建物质结构研究所 一种生长炉内晶体退火装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2651601B2 (ja) * 1987-07-31 1997-09-10 東京エレクトロン株式会社 加熱炉
JPH04155822A (ja) * 1990-10-18 1992-05-28 Tokyo Electron Sagami Ltd 熱処理装置
JP4355441B2 (ja) * 2000-11-29 2009-11-04 株式会社日立国際電気 熱処理装置及び熱処理方法及び半導体デバイスの製造方法
JP4495498B2 (ja) * 2004-03-29 2010-07-07 株式会社日立国際電気 基板処理装置および半導体装置の製造方法
JP4820137B2 (ja) * 2005-09-26 2011-11-24 株式会社日立国際電気 発熱体の保持構造体
JP5148216B2 (ja) * 2007-09-10 2013-02-20 新日鉄住金エンジニアリング株式会社 帯状体の誘導加熱装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200914783A (en) * 2007-03-20 2009-04-01 Tokyo Electron Ltd Heat processing furnace and vertical-type heat processing appartus
CN101831712A (zh) * 2009-03-13 2010-09-15 中国科学院福建物质结构研究所 一种生长炉内晶体退火装置

Also Published As

Publication number Publication date
CN102856231A (zh) 2013-01-02
KR20130007462A (ko) 2013-01-18
US8957352B2 (en) 2015-02-17
TW201319498A (zh) 2013-05-16
CN102856231B (zh) 2016-03-09
JP5743746B2 (ja) 2015-07-01
US20120325804A1 (en) 2012-12-27
KR101503976B1 (ko) 2015-03-18
JP2013007549A (ja) 2013-01-10

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