TW200914783A - Heat processing furnace and vertical-type heat processing appartus - Google Patents

Heat processing furnace and vertical-type heat processing appartus Download PDF

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Publication number
TW200914783A
TW200914783A TW097109508A TW97109508A TW200914783A TW 200914783 A TW200914783 A TW 200914783A TW 097109508 A TW097109508 A TW 097109508A TW 97109508 A TW97109508 A TW 97109508A TW 200914783 A TW200914783 A TW 200914783A
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Taiwan
Prior art keywords
insulating member
heat
heat treatment
heat insulating
heating
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TW097109508A
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Chinese (zh)
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TWI392843B (en
Inventor
Takashi Ichikawa
Makoto Kobayashi
Kenichi Yamaga
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Tokyo Electron Ltd
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Publication of TW200914783A publication Critical patent/TW200914783A/en
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Publication of TWI392843B publication Critical patent/TWI392843B/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67098Apparatus for thermal treatment
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26DRYING
    • F26BDRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B23/00Heating arrangements
    • F26B23/04Heating arrangements using electric heating
    • F26B23/06Heating arrangements using electric heating resistance heating
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27BFURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B17/00Furnaces of a kind not covered by any preceding group
    • F27B17/0016Chamber type furnaces
    • F27B17/0025Especially adapted for treating semiconductor wafers

Abstract

There is provided a heat processing furnace capable of quickly increasing and decreasing a temperature, while achieving improvement in durability. A heat processing furnace 2 comprises: a processing vessel 3 for accommodating an object to be processed w and performing thereto a heat process; and a cylindrical heater 5 disposed to surround an outer circumference of the processing vessel 3, for heating the object to be processed w. The heater 5 includes a cylindrical heat insulating member 16, and heating resistors 18 arranged along an inner circumferential surface of the heat insulating member 16. Each of the heating resistors 18 is formed of a strip-shaped member that is bent into a waveform having peak portions and trough portions. Pin members 20 are arranged in the heat insulating member 16 at suitable intervals therebetween, the pin members 20 holding the heating resistor 18 such that the heating resistor 18 is movable in a radial direction of the heater.

Description

200914783 九、發明說明: 【發明所屬之技術領域】 本發明係關於一種熱處理爐及一種包含該熱處理爐之直 立式熱處理裝置。本申請案係基於並主張2〇〇7年3月2〇曰 提出申凊的先前日本專利申請案第2〇〇7_72477號及年 、 2月5日提出中請的日本專利巾請案第謂8_25 η〗號之優先 , #益’該等申請案之全部内容以引用方式併入本文中。 【先前技術】 C:.在製造—半導體器件時,使用各種熱處理裝置來使一半 導體晶圓(其係—待處理物件)經受若干製程,例如,氧化 製,、擴散製程及CVD(化學氣相沈積)製程 理裝置包含—熱處理爐’其由以下裝置構成、處理容: (反應管),其能夠容納半導 ° 行熱處理…加等半導體晶圓進 理容器之”件)’其經設置以覆蓋該處 .ΓΓΓ 用於對該處理容器中之晶圓進行加熱。 〇 由一支撐構件設置在該敎絕緣構H內加熱電阻器’其藉 . 、s緣構件之内圓周表面上。 在-能夠執行分批製程之熱處理裝置中 用作加教雷p且51沾VL 4 η ^ 存在一 …電阻益的沿該圓柱形熱絕緣構 之螺旋形加熱元件(亦稱作,,加 ^面佈置 加熱元件可將該爐内部加埶…〜熱電阻器")。 胸I可將藉由將熱絕緣材料 一回柱形狀而形成之構件用作熱絕緣構件ρ是:維)燒製成 減少以輕射熱及傳導熱形式損 …、絕緣構件可 、爻熟里以增強加熱效率。 I2909l.doc 200914783 例如,可將一陶究構件用作支擇構件。該陶竟支撐構件可 以預定間距支撐加熱元件,同時允許加熱元件之熱膨服及 熱收縮。 在上述熱爐中,為使力σ數;# μ & , ,、、、70件可熱膨脹及熱收縮,以螺 方式开/成之力熱兀件經支撐以便在加熱元件與熱絕緣構 件之間界定-間隙。然而,因加熱元件係在高溫下使用, 因此該加熱元件遭受潛變應變且其長度會隨時間而緩慢增 加。另外’該加熱元件在加熱操作期間中會熱膨脹。另一 方面’存在一藉由將空氣 、 虱人入加熱凡件以降低溫度而快速 冷卻該加熱元件之裝置。由於溫度反覆地升高及下降,該 加熱元件可能發生變形。變形可在變形的加熱元件之田比鄰 部分之間產生短路’而此可招致斷開。 特別是在-直立式熱處理爐中,加熱元件因溫度升高及 下降所致之反覆熱膨脹及熱收縮而在支樓構件中移動,且 加熱元件因地心引力而略向下移動。然後,移動量累積於 加熱元件之-最低圈處。即,由於加熱元件移動之累積, 故取低圈之捲繞直徑增加。當增加之捲繞直徑之加敎元件 抵達熱絕緣構件之内表面且不可能再向外側膨脹時,加熱 兀在向上及向下方向上變形。因此,在加熱元件的 …請於該部分的另一部分之間存在發生短路之可 能性,從而導致某一斷開。 為解決此等問題,已提出如下結構。即,為防止在長形 加熱几件之-側發生因潛變及熱性膨脹或類似情形所致之 此一累積,藉由銲接將-桿樣形狀之固定構件附接至加孰 I2909I.doc 200914783 元件之一外側部分,且該固定構件之末端經隱埋而固定於 一熱絕緣構件中’以使該固定構件在該爐之徑向方200914783 IX. Description of the Invention: [Technical Field] The present invention relates to a heat treatment furnace and a vertical heat treatment apparatus including the same. This application is based on and claims the Japanese Patent Application No. 2〇〇7_72477 filed on March 2, 2007, and the Japanese patent application filed on February 5, 2005. 8_25 η 〗 〖Priority, #益' The entire contents of these applications are hereby incorporated by reference. [Prior Art] C: In the manufacture of a semiconductor device, various heat treatment devices are used to subject a semiconductor wafer (the system to be processed) to a number of processes, such as oxidation, diffusion, and CVD (chemical vapor phase). The deposition process comprises: a heat treatment furnace, which is composed of the following devices, and has a treatment capacity: (reaction tube) capable of accommodating a semi-conducting heat treatment ... plus a "semiconductor wafer processing container" Covering the place. ΓΓΓ is used to heat the wafer in the processing container. 〇 A heating member is disposed in the crucible insulating structure H by a supporting member, which is on the inner circumferential surface of the s-edge member. A spiral heating element along the cylindrical thermal insulation structure (also referred to as a surface arrangement) in the heat treatment apparatus capable of performing a batch process as a teaching reed and 51 Zn VL 4 η ^ The heating element can be used to twist the inside of the furnace...~Thermal resistor"). The chest I can use the member formed by returning the thermal insulating material back to the column shape as the heat insulating member ρ is: Light and heat Thermal form damage..., insulating members can be used to enhance heating efficiency. I2909l.doc 200914783 For example, a ceramic component can be used as a supporting member. The ceramic supporting member can support the heating element at a predetermined interval while allowing heating. Thermal expansion and heat shrinkage of components. In the above-mentioned hot furnace, in order to make the force σ number; # μ & , , , , 70 pieces can be thermally expanded and heat-shrinked, and the force of the screw is turned on/off. Supporting to define a gap between the heating element and the thermally insulating member. However, since the heating element is used at high temperatures, the heating element suffers from creep strain and its length slowly increases with time. In addition, the heating element is During the heating operation, it will thermally expand. On the other hand, there is a device for rapidly cooling the heating element by lowering the air and heating the workpiece to lower the temperature. The heating element may occur due to the temperature rising and falling repeatedly. Deformation. The deformation can cause a short circuit between the adjacent parts of the deformed heating element and this can cause disconnection. Especially in the - vertical heat treatment furnace, heating The piece moves in the branch member due to the thermal expansion and heat shrinkage caused by the increase and decrease in temperature, and the heating element moves slightly downward due to the gravity of the earth. Then, the amount of movement is accumulated at the lowest circle of the heating element. That is, due to the accumulation of the movement of the heating element, the winding diameter of the lower ring is increased. When the twisting element of the increased winding diameter reaches the inner surface of the heat insulating member and is unlikely to expand outward, the heating 兀 is upward and Deformation in the downward direction. Therefore, there is a possibility that a short circuit occurs between the heating element...and another part of the part, resulting in a certain disconnection. To solve these problems, the following structure has been proposed. This accumulation due to creep and thermal expansion or the like occurs on the side of the elongated heating piece, and the rod-shaped fixing member is attached to the outside of one of the elements by the welding I2909I.doc 200914783 by welding Partially, and the end of the fixing member is fixed in a heat insulating member by being buried] so that the fixing member is in the radial direction of the furnace

V — 1—» | 口J 外伸出(見專利文獻1)。V — 1—» | Outer extension of the mouth J (see Patent Document 1).

[專利文獻 1] JP10-233277A[Patent Document 1] JP10-233277A

L專利文獻 2] JP2005-197074A 然而,在其中固定構件僅藉由銲接連接至加熱元件之外 側部分之上述結構中,所連接部分曝露於高溫。另外,可 考量當加熱電阻器熱膨脹或熱收縮時’應力往往會集中於 所連接部分上,此引起加熱元件之耐久性劣化(壽命減 小此外,由於固定構件具有—棒樣㈣,因此固定構 件可較易地自熱絕緣構件脫落,藉此固定構件難以保 足之固持力。 ° & 此外,當需要快速增加或降低—晶圓之溫度時,在快速 溫度增加操作期間必須向一加熱元件施加大功率 '然而, 一習用普通加熱元件不可能耐受 開。心負载且可易於被斷 I際上不可能施加此-大功率,且因此 降低操作受到限制。儘管使用-财斷開之 成本增加。 難C此因此—加熱元件昂貴而招致 同時,為藉由減小施加至加埶元 件之备人r以&由 牛之負载而延長加熱元 可 耐久性),增加加熱元件之表面積(元件^ 面積)相對於所供應功率之 、(件表 元件表面積增加時,加執 ’的。此乃因當加熱 小加熱元件之負載。出’之表面溫度降低’以由此減 、 於所謂螺旋式加熱元件可高效地佈 129091.doc 200914783 置於一所需空間中,因此可使用此一設計來減少負載。然 而,如圖14中所示,例如,使用一螺旋式加熱元件的加熱 益或熱處理爐傳統上採用一其中將一加熱元件1 8隱埋於一 熱絕緣構件1 6中以便將加熱元件1 8固定在其中之結構。因 此,一欲在一反應器核心中加熱之物件係經由熱絕緣構件 16來加熱,使得該物件之溫度難以快速增加。該物件之溫 度亦難以快速降低,此乃因除熱絕緣構件16所致之熱容量 增加效應之外,加熱元件18還經由熱絕緣構件16來冷卻。L Patent Document 2] JP2005-197074A However, in the above structure in which the fixing member is connected only to the outer side portion of the heating member by welding, the joined portion is exposed to a high temperature. In addition, it is considered that when the heating resistor is thermally expanded or thermally shrunk, 'stress tends to concentrate on the connected portion, which causes deterioration of durability of the heating element (life reduction is further, since the fixing member has a rod-like (four), the fixing member The self-heating insulating member can be easily detached, whereby the fixing member is difficult to maintain the holding force. ° & In addition, when it is required to rapidly increase or decrease the temperature of the wafer, it is necessary to feed a heating element during the rapid temperature increasing operation. Applying high power' However, it is impossible for a conventional heating element to withstand open. The heart load can be easily broken and it is impossible to apply this - high power, and thus the operation is limited. Although the cost of using the financial disconnection This is difficult. Therefore, the heating element is expensive and at the same time, the surface area of the heating element is increased by reducing the durability of the heating element by reducing the load applied to the twisting element. The component ^ area) is relative to the supplied power (when the surface area of the component is increased, it is added). This is because when heating the small heating element The load is reduced by 'the surface temperature' to thereby reduce the so-called spiral heating element, which can be efficiently placed in a required space, so this design can be used to reduce the load. However, as shown in the figure As shown in Fig. 14, for example, a heating or heat treatment furnace using a spiral heating element is conventionally employed in which a heating element 18 is buried in a heat insulating member 16 to fix the heating element 18 therein. Therefore, an article to be heated in a reactor core is heated via the heat insulating member 16, so that the temperature of the article is difficult to increase rapidly. The temperature of the article is also difficult to be rapidly lowered due to the heat insulating member 16 In addition to the resulting thermal capacity increase effect, the heating element 18 is also cooled via the thermal insulation member 16.

此外由於不存在允許加熱元件1 8膨脹之間隙,因此當加 熱元件18膨脹時其自身會承受應力。因此,該加熱元件之 耐久性可能不充足。 已知一加熱元件係藉由將一條形加熱電阻構件形成為一 波形而製造的(專利文獻2)。類似於螺旋式加熱元件,儘管 此類型加熱S件可具有—增加之表面積,但就其在—圓柱 形絕緣構件中安裝方面而言卻有㈣之缺點。 【發明内容】 =在上述情形下製作出本發明。本發明之目標係提供能 =速增加及降低溫度的—種熱處理爐及_種直立式熱處 5、置’同時達成耐久性改良及成本減小。 本發明係—種熱處理爐,纟包括:—處理容器, 谷、、,内—待處理物件及對該待處理物件執行; 圓柱形加熱器’其圍繞該處理:广及- 件,及沿該二構:Γ包含—圓柱形熱絕緣構 …邑緣構件之-内圓周表面佈置之加熱電阻 129091.doc -10- 200914783 器’該等加熱電阻器之每一 部分及波谷部分之、皮; 破号曲成一具有波峰 間相距合適間卩3欲要&斗上 心成且劫構件以其 該加熱電緣構件中,該等銷構件固持 向上移:嶋加熱電阻器可在該加熱器之-徑向方 2明係該熱處理爐’Μ該等鎖構件之每-者形成為 一具有一對用於支撐該加埶電 成為 專個別支腳部分自内側通過該熱絕緣構件至;卜 側通過該熱絕緣構件, 至外 上以計Μ 該4個別支腳部分彎曲於該外侧 上以鎖尺於該熱絕緣構件之—外圓周表面上。 本發明係該熱處理爐,豆中 # 复數個圓周連續凹槽區段以 ”間相距合適間⑮垂直地形成於 ,、、、絶緣構件之内圓周表 面中,且該等加熱電阻器之整 區段中。 刀收谷於該等凹槽 本發明係該熱處理爐,其中複數個強制式冷卻空氣吹風 孔以其間相距合適間隔而以圓周方式形成於該熱絕緣構件 中以在該等垂直田比鄰之加熱電阻器之間的一位置處自内側 至外側地通過該熱絕緣構件。 本發明係該熱處理爐,其令該熱絕緣構件被分割成一右 半部分及一左半部分,在該等部分之間具有縱向延伸分割 表面’該等加熱電阻器之每-者亦被分割成對應於該熱絕 緣構件之一右半部分及-左半部分個加熱電阻器與垂 直她鄰於其之另-加熱電阻器藉由連接板而在端部相互連 接’且該等連接板皆設置在該熱絕緣構件之分割表面部分 129091.doc 200914783 上 本發明係該熱處理爐 ..^ ^ . ^ -由銷形成之固定構件、:等連接板之每—者係藉助 牛而固疋於§亥分割表面部分上。 本發明係該熱處理爐,其中該等連接板 欲鎖定於該埶咆绦棋灿 有具有一 …錢構件之-外圓周表面上之鎖定部分。 發明係該熱處理爐,其中該等連接板之每 被押入該熱絕緣構件中而固❹其中之固^件。 本發明係該熱處理爐,其中該等連接板 固持該加熱電阻器之波峰部分之防落下銷。 有— 本發明係該熱處理表面,其中 該加敎電阻^ η …邑緣構件具有-支揮 板。益之波峰部分之—下部以防止其落下之防落下 本發明係一直立式熱處理,豆. 其包含·· 一 +來卢神六 ,、匕括.一熱處理爐, 兮隹 又^奋器,其用於容納一待處理物件及對 端以界定-爐開口;:一柱=處理容器之-下 器之-外圓周1二 其圍繞該處理容 用於門人用於加熱該待處理物件;蓋構件,1 持件=爐開口;一固持件,其置於該蓋構件上,該固 :=提升及降下該蓋構件以打開及閉合該蓋構件,= 二=Γ=;Τ及自該處理容器卸载該固持 構件::加熱裔包含一圓柱形熱絕緣構件及沿該熱絕緣 之每:内固周表面佈置之加熱電阻器,該等加熱電阻器 母-者皆係由一被彎曲成-具有波峰部分及波谷部分之 I29091.doc •12- 200914783 波形之條形構件所形,、 置於該熱絕緣構件中 M其間相距合適間隔佈 該加熱電阻哭可在,;1構件固持該加熱電阻器以使 Μ “在該加熱器之-徑向方向上移動。 本么明係該直立式熱處理裝 一去梆士 4 ,、甲將遠4銷構件之每 分)之支腳部分之_…以加熱電阻器之波谷部 ^、3 乂 °玄等個別支腳部分係由内側至外側 地通過該熱絕緣構件, 上,m 綺^ #個別支㈣分彎曲於該外側 上乂鎖疋於該熱絕緣構件之一外圓周表面上。 =明係該直立式熱處理裝置,其中複數個圓周連續凹 槽區/又係以其間相距合適間 之該内圓周表面中,且Mm/ 成於该熱絕緣構件 、 面节且該4加熱電阻器之整體或一部分係 被收容於該等凹槽區段中。 、 ^發明係該直立式熱處理裝置’其中複數個強制式冷卻 ^乳吹風孔係以其間相距合適間隔而以圓周方式形成於該 …、、邑緣構件中以在该等垂直®比鄰之加熱電阻器間之一位置 處自内側至外側地通過該熱絕緣構件。 本發明係該直立式熱處理褒置,其中該熱絕緣構件被分 割成-右半部分及-左半部分’在該等部分之間具有縱向 延伸分割表面’該等加熱電阻器之每一者亦分割成對應於 該熱絕緣構件之-右半部分及一左半部分’一個加熱電阻 器與垂直毗鄰於其之另一加熱電阻器係藉由連接板而在端 邛相互連接,且該等連接板係設置於該熱絕緣構件之該分 割表面部分上。 本發明係該直立式熱處理裝置,其中該等連接板之每一 -13· 129091.doc 200914783 上^猎㈤由銷形成之固定構件而固定於該分割表面部分 老:::係該直立式熱處理裝置,其中該等連接板之每一 麵&於該熱絕緣構件之—外圓周表面上之鎖定 邵分。 本m亥直立式熱處理裝置,其中該等連接板之每一 者具有一被押入該熱絕緣構件中而固定於其中之固定件。 本电明係②直立式熱處理裝置,其中該等連接板之每一 具有-固持該加熱電阻器之波峰部分之防落下銷。 一本發明係該直立式熱處理裝置’其中該熱絕緣構件且有 -支樓該加熱電阻器之波峰部分之—下部以防 防落下板。 :據本毛月’ δ亥加熱電阻器(其係藉由使一條形加熱電 阻益形成-波形的方式製造而成)係以一曝露方式沿該孰Furthermore, since there is no gap that allows the heating element 18 to expand, the heating element 18 itself is subjected to stress when it expands. Therefore, the durability of the heating element may be insufficient. It is known that a heating element is manufactured by forming a strip-shaped heating resistor member into a waveform (Patent Document 2). Similar to the spiral heating element, although this type of heating S piece can have an increased surface area, it has the disadvantage of (4) in terms of its mounting in the cylindrical insulating member. SUMMARY OF THE INVENTION The present invention has been made under the above circumstances. SUMMARY OF THE INVENTION The object of the present invention is to provide a heat treatment furnace capable of increasing and decreasing the temperature and a vertical heat treatment, and achieving both durability improvement and cost reduction. The invention relates to a heat treatment furnace, which comprises: a processing container, a valley, an inner-to-be-processed object and an object to be processed; a cylindrical heater' which surrounds the processing: a wide-part, and along the Two structures: Γ — 圆柱形 圆柱形 圆柱形 圆柱形 圆柱形 圆柱形 圆柱形 圆柱形 圆柱形 圆柱形 圆柱形 圆柱形 圆柱形 圆柱形 129 129 129 129 129 129 129 129 129 129 129 129 129 129 129 129 129 129 129 129 129 129 129 129 129 129 129 129 129 129 129 129 129 129 129 129曲成一 has a suitable interval between the peaks 欲3 wants to &; 斗 斗 斗 斗 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上 上To the side of the heat treatment furnace, each of the lock members is formed as a pair having a pair for supporting the twisted electric power to become a dedicated leg portion from the inner side through the heat insulating member; The heat insulating member is externally mounted to the outer side to be bent on the outer side to lock the ruler on the outer circumferential surface of the heat insulating member. The present invention is the heat treatment furnace in which a plurality of circumferential continuous groove segments are formed perpendicularly between the appropriate intervals 15 and the inner circumferential surface of the insulating member, and the entire area of the heating resistors In the present invention, the heat treatment furnace is characterized in that a plurality of forced cooling air blowing holes are circumferentially formed in the heat insulating member at appropriate intervals therebetween to be adjacent to the vertical fields. The heat insulating member is passed from the inside to the outside at a position between the heating resistors. The present invention is the heat treatment furnace which divides the heat insulating member into a right half portion and a left half portion, in the portions There is a longitudinally extending dividing surface between each of the heating resistors is also divided into a right half corresponding to one of the thermal insulating members and a left half of the heating resistor and the other adjacent to it - The heating resistors are connected to each other at the ends by the connecting plates and the connecting plates are disposed on the divided surface portion of the heat insulating member 129091.doc 200914783. The present invention is the heat treating furnace. . ^ ^ . ^ - The fixing member formed by the pin, each of the connecting plates is fixed on the surface portion of the sea by means of a cow. The present invention is the heat treatment furnace in which the connecting plates are intended to be locked The chess piece has a locking portion on the outer circumferential surface of the ... money component. The invention relates to the heat treatment furnace, wherein each of the connecting plates is pressed into the heat insulating member to fix the solid member therein The present invention is the heat treatment furnace, wherein the connecting plates hold the anti-drop pins of the peak portion of the heating resistor. Yes - the present invention is the heat-treated surface, wherein the twisting resistance member has a - branching The plate is in the lower part of the peak of the peak to prevent it from falling. The invention is always a vertical heat treatment, beans. It contains ····································································· And a pair of objects to be processed and a pair of ends to define a furnace opening; a column = a processing container - a lower portion - an outer circumference 1 2 which surrounds the processing for the door person to heat the object to be processed ; cover member, 1 holding member = furnace opening; a holder placed on the cover member, the solid: = lifting and lowering the cover member to open and close the cover member, = two = Γ =; Τ and unloading the holding member from the processing container: a cylindrical thermal insulation member and a heating resistor disposed along each of the thermal insulation: an inner solid peripheral surface, the heating resistors are all bent by a - having a peak portion and a trough portion I29091.doc • 12- 200914783 The strip shape of the waveform is shaped, placed in the thermal insulation member, M is spaced apart from each other, the heating resistor is crying, and the 1 member holds the heating resistor so that “the heater is - Move in the radial direction. This is the vertical heat treatment package of a gentleman 4, a foot of the 4 pin members of each part of the foot part of the _ ... to heat the resistors of the trough part ^, 3 乂 ° Xuan and other individual feet The portion passes through the heat insulating member from the inner side to the outer side, and the upper portion (four) is bent on the outer side to be locked on the outer circumferential surface of one of the heat insulating members. = the vertical heat treatment apparatus, wherein a plurality of circumferential continuous groove regions are further spaced apart from the inner circumferential surface of the appropriate space, and Mm / is formed in the heat insulating member, the noodle and the 4 heating resistor All or part of it is housed in the groove sections. The invention relates to the vertical heat treatment device in which a plurality of forced cooling nozzles are formed in a circumferential manner at appropriate intervals therebetween, and the heating resistors in the vertical members are adjacent to each other. The heat insulating member passes through the inside to the outside at one of the positions. The present invention is the upright heat treatment device, wherein the heat insulating member is divided into a right half portion and a left half portion having a longitudinally extending split surface between the portions, wherein each of the heating resistors is also Divided into a right half portion and a left half portion corresponding to the heat insulating member. A heating resistor and another heating resistor vertically adjacent thereto are connected to each other at the end turns by the connecting plate, and the connections are A plate system is disposed on the divided surface portion of the heat insulating member. The present invention relates to the vertical heat treatment apparatus, wherein each of the connecting plates is fixed to the divided surface portion by a fixed member formed by a pin::: the vertical heat treatment The device, wherein each side of the connecting plates & is locked on the outer circumferential surface of the thermal insulating member. The present invention relates to a vertical heat treatment apparatus of the present invention, wherein each of the connecting plates has a fixing member that is inserted into the heat insulating member and fixed therein. The present invention relates to a two vertical heat treatment apparatus, wherein each of the connection plates has a drop prevention pin that holds a peak portion of the heating resistor. One invention is the vertical heat treatment apparatus 'where the heat insulating member has a lower portion of the peak portion of the heating resistor to prevent the falling plate. : According to Ben Maoyue's δ Hai heating resistor (which is manufactured by making a strip of heating resistors formed into a waveform), along an exposure manner

C ^緣構件之内圓周表面設置。因此,可快速地增加及降低 派度,且可達成耐久性改良及成本減小。 【實施方式】 將參照附圖詳細闡釋實施本發明之最佳模式。圖i係一 示意性顯示本發明之一直立式熱處理裝置之實施例之縱向 剖視圖。圖2係-圖1中之-部分A之放大剖視圖。圖3係一 部分A之放大縱視圖。圖4係一加熱元件之平面圖。圖5係 一加熱元件之側視圖。 圖1顯示一直立式熱處理裝置丨,其係一類半導體製造裝 置,、、、處理裝置1包含一直立式熱處理爐2,其可同時容納 129091.doc •14· 200914783 右干待處理物件(例如,半導體晶圓w)且可對該等待處理 物件執行#製程’例如,一氧化製程、一擴散製程及一 經減小壓力之CVD製程。熱處理爐2包含:一處理容器 3(亦被稱為”反應管”),其用於容納晶圓w及對晶圓w執行 -熱製程;及-圓柱形加熱器5(加熱器件),其圍繞處理容 窃3之一外圓周設置以用於加熱晶圓w。 熱處理裝置1亦包含-基板6,基板6上安裝有加熱器5。 基板6具有一開口 7,處理容器3穿過該開口自下向上插The inner circumferential surface of the C ^ edge member is disposed. Therefore, the degree of dispatch can be quickly increased and decreased, and durability improvement and cost reduction can be achieved. [Embodiment] The best mode for carrying out the invention will be explained in detail with reference to the accompanying drawings. Figure i is a longitudinal cross-sectional view schematically showing an embodiment of the upright heat treatment apparatus of the present invention. Figure 2 is an enlarged cross-sectional view of the portion A of Figure 1. Figure 3 is an enlarged longitudinal view of a portion A. Figure 4 is a plan view of a heating element. Figure 5 is a side view of a heating element. 1 shows a vertical heat treatment apparatus 丨, which is a type of semiconductor manufacturing apparatus, and the processing apparatus 1 includes an upright vertical heat treatment furnace 2, which can simultaneously accommodate 129091.doc •14·200914783 right dry objects to be processed (for example, The semiconductor wafer w) can perform a #process for the waiting for processing object, for example, an oxidation process, a diffusion process, and a reduced pressure CVD process. The heat treatment furnace 2 comprises: a processing vessel 3 (also referred to as a "reaction tube") for accommodating the wafer w and performing a heat process on the wafer w; and - a cylindrical heater 5 (heating device), The outer circumference is disposed around one of the handles 3 for heating the wafer w. The heat treatment apparatus 1 also includes a substrate 6 on which a heater 5 is mounted. The substrate 6 has an opening 7 through which the processing container 3 is inserted from the bottom up

入。開口7配備有一熱絕緣構件(未示出),其堵塞基板6與 處理容器3之間的一間隙。 處理容器3由石英製成且具有長形圓柱形狀。處理容器3 之-上端閉合,而ί丁開處理容器3之一下端以界定一爐開 “。環繞處理容器3之打開端形成一向外凸緣孙。基板6 猎由-凸緣Μ緊構件(未示出)來支撐凸緣儿。在所圖解說 明之處理容器3之一下部+配備有:-弓以土車(入口)8,且 用於將-製程氣體及/或惰性氣體引入至處理容器3中;及 一排放淳(出口 5未示屮、,甘1¾ # u / i 出)其用於排放處理容器3中之氣 體。-氣體供應源連接至引人埠8。連接至該排放璋的係 -具有真空幫浦之排氣系統,該真空幫浦能夠控制處理容 器3中之壓力而減小至(例如)1{)T(m ^i().8T〇rr。 在處理容器3下方,設置有—用於閉合處理容器3之下端 開口(爐開口)3a之蓋構件1〇。蓋構件1〇可藉由一提升機構 來垂直移動。蓋構㈣之—上部上設置有用於爐開口 之熱保持組件(例如’—熱保持管u)。熱保持㈣之一上 129091.doc 15 200914783 部上設置有一作為一固持丰 符件之石央船12,其能夠以晶圓之 間之預定垂直間隔來固持若 苻右干(例如,約100至150個)直种 例如為300 mm之晶圓w。 工 盍構件1 0與一奴轉機構1 3相遠 接’旋轉機構13使船12以i軸為中、 ”种馮中〜方疋轉。船12係藉 構件10之向下移動而自處容 现 奴里谷益3卸载至一下裝載區15。 在置換晶圓w後,藉由4塞Μ 1 Λ / ^盖構件10之向上移動而將船u裝載 至處理容器3中。 戟In. The opening 7 is provided with a heat insulating member (not shown) which blocks a gap between the substrate 6 and the processing container 3. The processing container 3 is made of quartz and has an elongated cylindrical shape. The upper end of the processing container 3 is closed, and the lower end of the processing container 3 is opened to define a furnace opening. The open end of the processing container 3 forms an outward flange. The substrate 6 is hung-flange clamping member ( Not shown) to support the flange. In the lower part + of one of the illustrated processing vessels 3 is equipped with: - bow to earth vehicle (inlet) 8, and is used to introduce - process gas and / or inert gas into the treatment In the container 3; and a discharge port (the outlet 5 is not shown, the product is used to discharge the gas in the treatment container 3) - the gas supply source is connected to the introduction port 8. Connected to the discharge A system of sputum - an evacuation system with a vacuum pump capable of controlling the pressure in the process vessel 3 to be reduced to, for example, 1{) T (m ^i().8T 〇rr. 3, there is provided a cover member 1 for closing the lower end opening (furnace opening) 3a of the processing container 3. The cover member 1A can be vertically moved by a lifting mechanism. The cover member (4) is provided on the upper portion for Heat retaining assembly for furnace opening (eg '-heat holding tube u). Heat holding (4) on one of the 129091.doc 15 20091 The 4783 is provided with a stone ship 12 as a holding member, which is capable of holding a right stem (for example, about 100 to 150) straight seeds, for example, 300 mm, at a predetermined vertical interval between the wafers. Wafer w. The workpiece member 10 is remotely connected to a slave mechanism 13. The rotating mechanism 13 causes the vessel 12 to be centered on the i-axis, and the vessel 12 is rotated by the member. Moving and self-contained, the slaves are unloaded to the lower loading area 15. After the wafer w is replaced, the boat u is loaded into the processing container 3 by the upward movement of the 4 Μ 1 / / cover member 10. halberd

如圖2至5中所示,加熱器5包含··一圓柱形熱絕緣構件 16,稷數個凹槽樣棚架區段17,其以—疊層狀方式轴向 (在圖式中為垂直)形成於熱絕緣構件1 6之一内圓周表面 上’及加熱το件(加熱導 '線、加熱電户且器)18,其沿個別棚 架區段17設置。該熱絕緣構件係由含有例如氧化矽、氧化 銘或石夕酸銘之無機纖維製成。赛於加熱元件之安裝及加熱 器之裝配’較佳之情形係將熱絕緣構件分割成-右半部= 及-左半部分’該等部分之間具有縱向延伸分割表 16a ° 加熱元件18係由一經形成(彎曲)而具有一波形之條形構 件18A製成。波紋(波形)式加熱元件18係由含有例如/鐵 (Fe)、鉻(Cr)及鋁(A1)之合金(所謂康達材料)製成。加熱元 件18厚度約為! _至2 _ ’其寬度約為14 _至a _。 波形之幅值約為11爪爪至^ mm,且其間距p約為“至以 mm。加熱兀件18之波形之頂角θ約為9〇度。頂點部分(亦 稱作"伸出部分”或”波峰部分”)丨8a經受一尺彎曲製程。此允 許加熱元件18在熱絕緣構件16之棚架區段17上進行某一圓 129091.doc -16- 200914783 周移動,且增強彎曲部分之強度。 銷構件以其間相距合適間隔佈置於熱絕緣構件μ卜鎖 構件20固持加熱元件18以使加熱元件18可徑向移動,而同 時防止加熱元件18自棚架區段17掉落或脫離。在圓柱形教 絕緣構们6之-内圓周表面中具有複數個凹槽區段m • #凹槽區段以其間相距狀軸向間距形成為與熱絕緣構件 . 16同…以便於在上凹槽區段21與毗鄰於該上凹槽區段之 下凹槽區&21之間形成圓周連續環形棚架區段η。在凹槽 Γ 段21中之加熱元㈣之上方及下方形成有Μ,且細 槽區段21之後壁21a與加熱元件18之間形成有另一空隙。 此等空隙足以允許加熱元件18之熱膨服、熱收縮及徑向移 動。另外,由於此等空隙,在強制空氣冷卻操作期間所供 應之冷卻空氣可到達並通過加熱元㈣之後側,藉此可有 效地冷卻加熱元件1 8。 銷構件20包含:一近端部分2〇a,其用於將波谷部分⑽ 〇 ^撑於加熱元件18之—内圓周表面之側上;及-對支腳部 ) 刀,2〇b ’其自内側到外側通過熱絕緣材料16。銷構件20經 . ^成而在側視圖中具有一大致U形。該對支腳部分20b之端 邛刀20c在相反方向上彎曲以便鎖定於熱絕緣構件μ之一 . 外圓周表面上。鎖構件20較佳由與加熱元件18材料相同之 材料製成。如圖3 Φ印·- 士 甲所不’較佳之情形係加熱元件丨8容納 於每一凹槽區段21中,以使加熱元件18之徑向外側半部分 收容於凹槽區段2ΐφ 又1中,而其徑向内側半部分曝露在凹槽區 段21之外側。 129091.doc 200914783 如圖2及3中所示,不同於—以 連續方式螺%且垂直延仲 之習用加熱元件,設置於作為—A 乙伸 口丨白之母—棚架區段17上 之加熱元件18端接於每—台階虚 m |白處。因此,可防止加熱元件 18因其自身重量向下移動而堆 w起术此外,如圖5中所 示,加熱元件18結合(連接)於田比鄰之上方台階與下方台階 之間,且在該等台階中每隔複數個台階(圖式中為7個台 串聯連接。此外’對於包含該複數個台階之每一群組,欲 連接至電極之端接板22連接至最低台階之—開始端⑽及As shown in Figures 2 to 5, the heater 5 comprises a cylindrical heat insulating member 16 and a plurality of groove-like scaffolding sections 17 which are axially arranged in a lamination manner (in the drawings Vertically formed on one inner circumferential surface of the heat insulating member 16 and a heating member (heating wire, heating electric heater) 18, which is disposed along the individual scaffolding section 17. The heat insulating member is made of an inorganic fiber containing, for example, cerium oxide, oxidized or lyophilic acid. Installation of the heating element and assembly of the heater 'Better case is to divide the thermal insulation member into - right half = and - left half" with longitudinal extension between the parts. Table 16a ° Heating element 18 A strip member 18A having a wave shape is formed (bent). The corrugated (waveform) heating element 18 is made of an alloy containing, for example, iron (Fe), chromium (Cr), and aluminum (A1) (so-called Coanda material). The thickness of the heating element 18 is approximately! _ to 2 _ ' has a width of approximately 14 _ to a _. The amplitude of the waveform is about 11 claws to ^ mm, and the pitch p is about "to mm. The apex angle θ of the waveform of the heating element 18 is about 9 degrees. The apex portion (also called " The portion "or" peak portion") 8a is subjected to a one-foot bending process. This allows the heating element 18 to move over a certain circle 129091.doc -16 - 200914783 on the scaffolding section 17 of the thermally insulating member 16 and enhance the strength of the curved portion. The pin members are disposed at appropriate intervals from the thermal insulation member to retain the heating element 18 to allow the heating element 18 to move radially while preventing the heating element 18 from falling or disengaging from the scaffolding section 17. Having a plurality of groove segments m in the inner circumferential surface of the cylindrical insulating member 6 • The groove portions are formed with the axial spacing therebetween to be in contact with the heat insulating member. The groove section 21 forms a circumferential continuous annular shelving section n between the groove section & 21 adjacent to the upper groove section. A weir is formed above and below the heating element (4) in the groove 21 section 21, and another gap is formed between the rear wall 21a of the groove section 21 and the heating element 18. These voids are sufficient to allow for thermal expansion, heat shrinkage, and radial movement of the heating element 18. In addition, due to such voids, the cooling air supplied during the forced air cooling operation can reach and pass through the rear side of the heating element (4), whereby the heating element 18 can be effectively cooled. The pin member 20 comprises: a proximal end portion 2a for holding the trough portion (10) on the side of the inner circumferential surface of the heating element 18; and - for the leg portion) a knife, 2〇b ' The heat insulating material 16 is passed from the inside to the outside. The pin member 20 has a substantially U-shape in a side view. The end trowel 20c of the pair of leg portions 20b is bent in the opposite direction so as to be locked to one of the outer circumferential surfaces of the heat insulating member μ. The lock member 20 is preferably made of the same material as the heating element 18. As shown in Fig. 3, the Φ printing--Shijia is not preferred. The heating element 丨8 is accommodated in each groove section 21 so that the radially outer half of the heating element 18 is received in the groove section 2ΐφ 1 and its radially inner half is exposed on the outer side of the groove section 21. 129091.doc 200914783 As shown in Figures 2 and 3, unlike conventional heating elements that are snailed in a continuous manner and vertically extended, are placed on the heating of the scaffolding section 17 as the mother of the -A Element 18 is terminated at each of the steps virtual m | white. Therefore, the heating element 18 can be prevented from moving downward due to its own weight. Further, as shown in FIG. 5, the heating element 18 is coupled (connected) between the upper step and the lower step of the field, and Each of the steps is equal to every other step (7 in the figure is connected in series. In addition, for each group including the plurality of steps, the termination plate 22 to be connected to the electrode is connected to the lowest step - the starting end (10) and

最高台階之-死端18r。因此’加熱器5在熱處理爐2中被 垂直分割成複數個區域,藉此可獨立地控制每一區域之溫 度。 狐 儘管加熱元件18可沿熱絕緣構件16之棚架區段17或凹槽 區段21環形地定位,但如圖4中所示,為易於組裝加熱元 件18,較佳係將加熱元件18形成一等分形狀(半圓形狀)以 對應於沿分割表面16a分割成兩半之熱絕緣構件16。舉例 而言,圖4及5顯示加熱元件18之可能連接(導線連接)圖 案。在此連接圖案中’加熱元件1 8在個別台階處之相對端 18e、18f、18g…及I8r係彎曲成沿徑向向外伸出,且端接 板22及22分別接合至第一台階(最低台階)之開始端(右 端)18e及最高台階之死端(左端)18r。另外,為串聯連接彼 此垂直毗鄰之加熱電阻器1 8,毗鄰加熱電阻器18之端係藉 由連接板23而依序相互連接。即,第一台階之死端18f與 第二台階之開始端18g係藉由連接板23相互連接’且第二 台階之死端1 8h與第三台階之開始端1係藉由另一連接板 129091.doc -18- 200914783 緣構件16之分割表面 2 3相互連接。彳查立1 建接板23係定位於熱絕 1 6a 上。 ’、、、-件1 8之端與連接板23係藉由銲接而相互連接。端 接板22經疋位係沿徑向通過絕緣構件16。為防止連接板23 ......凡件1 8之端間的一銲接部分經受高溫,較佳係將連 接板23隱埋於熱絕緣構件㈣。除上述連接圖案外,亦可 子在力…το件18之其他連接圖案。蓉於防止端接板μ與連 /板1^ °及限制自其熱釋放,端接板22及連接板23較佳 係由與加熱兀件18材料相同之材料製成,且使端接板^及 連接板23形成以具有—帶有預定截面積之板樣形狀。 為維持熱絕緣構件16之形狀及加固熱絕輯件16,如圖 1中所示’熱絕緣構件16之-外圓周表面較佳覆蓋有-由 金屬⑼如,不銹鋼)製成之外殼28。此外,外殼Μ之一外 圓周表面覆蓋有—水冷卻套a 营0以防止熱自加熱器5洩漏至 外側二熱絕緣構件16之頂部覆蓋有_上熱絕緣構件Μ,且The highest step - the dead end 18r. Therefore, the heater 5 is vertically divided into a plurality of regions in the heat treatment furnace 2, whereby the temperature of each region can be independently controlled. Although the heating element 18 can be annularly positioned along the scaffolding section 17 or the groove section 21 of the thermal insulation member 16, as shown in Figure 4, for ease of assembly of the heating element 18, the heating element 18 is preferably formed An aliquot shape (semicircular shape) corresponds to the thermal insulation member 16 divided into two halves along the division surface 16a. For example, Figures 4 and 5 show possible connections (wire connections) of the heating element 18. In this connection pattern, the opposite ends 18e, 18f, 18g, ... and I8r of the heating element 18 at the individual steps are bent to project radially outward, and the termination plates 22 and 22 are respectively joined to the first step ( The lowest end (starting end) (right end) 18e and the highest step dead end (left end) 18r. Further, the heating resistors 18 which are vertically adjacent to each other are connected in series, and the ends adjacent to the heating resistors 18 are sequentially connected to each other by the connecting plate 23. That is, the dead end 18f of the first step and the start end 18g of the second step are connected to each other by the connecting plate 23' and the dead end 18h of the second step and the beginning end 1 of the third step are connected by another connecting plate 129091.doc -18- 200914783 The split surfaces 2 3 of the edge members 16 are connected to each other.彳查立1 The slab 23 is positioned on the heat block 16a. The ends of the ',,, -, members 18 and the connecting plates 23 are connected to each other by soldering. The termination plate 22 passes through the insulating member 16 in the radial direction via the clamp system. In order to prevent the connecting plate 23 from being welded to a portion of the end of the member 18, it is preferable to bury the connecting plate 23 in the heat insulating member (4). In addition to the above-described connection pattern, other connection patterns of the member 18 can also be used. Preferably, the termination plate 22 and the connection plate 22 and the connection plate 23 are made of the same material as the heating element 18, and the termination plate is formed. And the connecting plate 23 is formed to have a plate-like shape with a predetermined sectional area. In order to maintain the shape of the heat insulating member 16 and to reinforce the heat-exclusive member 16, as shown in Fig. 1, the outer circumferential surface of the heat insulating member 16 is preferably covered with a casing 28 made of metal (9) such as stainless steel. Further, the outer circumferential surface of one of the outer casings is covered with a water cooling jacket a battalion 0 to prevent heat from leaking from the heater 5 to the outer portion of the outer two heat insulating members 16 covered with the upper thermal insulating member Μ, and

C 覆盍外设28之頂部(上端部)之不鱗鋼頂板η係設置於上 熱絕緣構件3 1之上部上。 為在一熱製程之後使晶圓夕、w &丨^ 1 便曰曰圓之溫度快速下降以加速製程或 改善通量’加熱器5配備有:_勒^ '、·、排放系統3 5,其係用於 向外排放空氣於加熱器5與處理容器3間之空間Μ中;及— 強制空氣冷卻單元36,1係茲士时 ^ ,、係藉由將—常溫(2〇t至^。(^之 空氣引入空間33中而強制冷卻處理容器3。熱排放系統35 主要由以下各物所構成:出口 37,其形成於…5之一 上部中;及一熱排放管(未示 J -、用於連接出口 37及一 129091.doc -19- 200914783 工廠空氣排放系統(未示出)。該熱排放管具有—空氣排放 鼓風機及一換熱器(未示出)。 二” 強制空氣冷钾單TC36具有:複數個環形路徑“,其在— n度方向上形成於熱絕緣構件16與外殼28之間;及複數 強制式冷卻空氣吹風孔4〇,其形成於熱絕緣構件Μ中,* 氣經由該等孔在一相對於熱絕緣構件16中心、呈傾斜 二 自個別環形路徑38吹人空間33中以在空間33中沿其^ 方向產生旋渦。環形路徑38各可藉由將一條形:環护執: 緣構件41附接至熱絕緣構件丨 ^…、、、' 卜圓周表面,《藉由將執 =冓件16之外圓周表面切割成環形形成。如圖物 ⑻中所示’空氣吹風孔40較佳係形成於熱 ^,以自内側至外側地徑向通過設置於垂直吼鄰加敎元件 心之棚架區段17。由於空氣吹風孔4〇係形成於棚架區段 成干擾因此可將空氣吹入空間33中而不會對加熱元件_ —單個共用供應管道(未示出,1 配至個別環形路徑38中)沿外殼28之—高度方2流體分 外圓周表面上。外殼28具有使該供應管道1個別^於其 38連ϋ夕、金、s π 、”個別裱形路徑 、之連通孔。-冷卻流體供應源(例如 示出)藉由一開關閥連接至供應管 、几機,未 為-冷卻流體吸入—清潔室並芦力田 '"供應源將空氣作 月4至並壓力喂送該冷卻流體。 如上所構造之熱處理爐 理式熱處理裝置1包含·處 谷益3,其用於容納晶圓…及對晶圓w執 圓柱形加熱器5,其圍繞處理Μ '、、、1程;及 处谷益3之固周設置以用於加熱 129091.doc -20- 200914783 晶圓W。加熱器5具有:圓柱形熱絕緣構件16;凹槽樣棚架 區段17,其以疊層狀方式軸向形成於熱絕緣構件16之内圓 周表面上及加熱元件丨8,其沿個別棚架區段丨7設置。藉由 將一條形加熱元件形成為一波紋形狀來製造加熱元件Μ。The non-scale steel top plate η of the top (upper end portion) of the C peripheral member 28 is disposed on the upper portion of the upper heat insulating member 31. In order to accelerate the process or improve the flux of the wafer, the temperature of the w & 丨 ^ 1 will be quickly reduced after a thermal process. The heater 5 is equipped with: _ 勒 ^ ', ·, discharge system 3 5 , which is used to discharge air to the space between the heater 5 and the processing container 3; and - the forced air cooling unit 36, 1 is a time, ^, by - normal temperature (2 〇 t to The air is introduced into the space 33 to forcibly cool the processing container 3. The heat discharging system 35 is mainly composed of the following: an outlet 37 formed in an upper portion of the ... 5; and a heat discharging pipe (not shown) J -, for connecting the outlet 37 and a 129091.doc -19- 200914783 factory air discharge system (not shown). The heat discharge pipe has an air discharge blower and a heat exchanger (not shown). The air-cooled potassium single TC36 has a plurality of annular paths "formed between the heat insulating member 16 and the outer casing 28 in the -n direction; and a plurality of forced cooling air blowing holes 4" formed in the heat insulating member. Medium, the gas flows through the holes at a center relative to the heat insulating member 16 The vortex is generated from the individual annular path 38 in the blowing space 33 to create a vortex in the space 33. The annular path 38 can each be attached to the thermal insulating member by a strip shape: the ring guard 41... , , , ' 'Circumferential surface, 'by forming the outer circumferential surface of the yoke 16 into a ring shape. The air blowing hole 40 is preferably formed in the heat as shown in the figure (8), from the inside to The outer side passes radially through the scaffolding section 17 disposed in the center of the vertical adjacent twisting element. Since the air blowing holes 4 are formed in the scaffolding section to interfere, air can be blown into the space 33 without heating Element_a single shared supply conduit (not shown, 1 is assigned to the individual annular path 38) along the height-to-square 2 fluid-extended circumferential surface of the outer casing 28. The outer casing 28 has the supply conduit 1 individually connected to its 38-connection ϋ 、, gold, s π , "individual 裱-shaped path, the communicating hole. - Cooling fluid supply source (such as shown) connected to the supply pipe, several machines by a switching valve, not - cooling fluid suction - clean room And Lu Litian '" supply source for the air for 4 months and pressure to feed The cooling fluid is sent. The heat treatment furnace heat treatment apparatus 1 configured as described above comprises: Shi Guyi 3, which is used for accommodating a wafer... and a cylindrical heater 5 for the wafer w, which surrounds the treatment 、 ', , 1 step; and the solid setting of the valley 2 for heating 129091.doc -20- 200914783 wafer W. The heater 5 has: a cylindrical thermal insulation member 16; a groove-like scaffolding section 17, which A laminated manner is formed axially on the inner circumferential surface of the heat insulating member 16 and the heating element 丨8, which is disposed along the individual scaffolding section 。 7. The heating element is fabricated by forming a strip-shaped heating element into a corrugated shape. Hey.

銷構件20以其間相距合適間隔佈置於熱絕緣構件“中,銷 構件20固持加熱元件18以使加熱元件18可在加熱器$之徑 向方向上移動,同時防止加熱元件18自棚架區段17上掉 =因此’可將波紋式加熱元件18以-曝露方式設置於棚 十區1 7之每一者上,該等棚架區段形成於熱絕緣構件μ 之内圓周表面上。因此’可快速增加及降低處理容器3中 之溫度’以及可達成耐久性改良及成本減小。在使用波紋 式加熱元件18之情形下,可有效增加元件表面積之比率。 因此’可㈣減小加熱元件上之—負載(其係由加熱器表 面之溫度減小所致)’以由此抑制加熱元件之破損。因 此’可給加熱8施加大功率以快速增加溫度。此外, 由於可抑制斷開’因此可獲得耐久性改良,亦即,獲得一 較長之使用壽命。此外,可使用價格便宜的康達導線來形 成加熱元件18,且因此可達成成本減小。 在熱絕緣構件16巾形成強制式冷卻空氣錢⑽以自内 側至外側地通過設置於垂直批鄰之加熱元件18之間的棚架 區段η。0此,可輕易地自其吹入空氣而不會對加熱元件 1 8形成干擾。熱絕緣構件16沿縱向延伸分割表面—分割 成兩Β ’且加熱疋件此每—者亦對應於熱絕緣構件來 刀割。ϋ此,可容易地將加熱元件與熱絕緣構件組裝在一 129091.doc •21 · 200914783 起,亦即,可改良其裝配。 圖7係一顯示用於在加熱電阻器之端上將連接板固定至 熱絕緣構件之結構之實例之視圖。圖7(a)係該結構之主要 部分放大透視圖,且圖7(b)係該固定狀態之剖視圖。為抑 制或防止連接板23(加熱元件18在此彎曲⑴形回轉》之變 形,藉助一例如銷之固定構件45(圖解說明為一u形銷)), 將連接板23固定至熱絕緣構件16之端(分割表面)丨以上。另 外,連接板23配備有一鎖定部分46以鎖定於熱絕緣構件16 之外圓周表面上。 圖8(a)及8(b)係顯示用於在加熱電阻器之端上將連接板 固定至熱絕緣構件之結構之另一實例之剖視圖。連接板B 係藉助固定構件45而固定至熱絕緣構件16之端上。另外, 一輔助熱絕緣構件47經設置以覆蓋連接板23。輔助熱絕緣 構件47 D又置於熱絕緣構件丨6之端(分割表面)之間的一空間 中,或者填充至該空間中。除銷以外,固定構件45還可係 一管、一圓形棒或一方形棒等。 圖9(a)及9(b)係顯示用於在加熱電阻器之端上將連接板 固疋至熱絕緣構件之結構之再一實例之剖視圖。連接板U 具有一固定件48 ’該固定件被押入熱絕緣構件16或辅助熱 絕緣構件47中以固定在其中。例如,固定件_藉由料 接板23之末端彎曲成一直角而形成^輔助熱絕緣構件叼設 置於熱絕緣構件16之端上以覆蓋連接板23。固定件Μ可押 入至輔助熱絕緣構件47中(見圖9(a))。然而,將固定件Μ 押入至熱絕緣構件丨6中更佳(見圖9(b))。 129091.doc -22- 200914783 圖Η)係一顯干__田# + 伸出部分之二槎 落下銷固持加熱電阻器之 且圖胸 圖。圖叫)係該結構之局部透視圖, 備有:該防落下銷之示意性透視圖。熱_ 洛下銷49,其將加熱元件18帶有 部分_持在熱絕緣構件16之内關表面^的口適伸出 — 圓周表面内側以防止1 洛下:防落下銷49係藉由彎曲—導線桿(例如,鋼桿)而形 二二以㈣分,且將㈣曲之導線桿 I Μ曲成—㈣以提供U形部分。放大一末端彎曲部 /刀以形成一環形或一大致三角形之放大部分術。加熱元 件1 8之伸出部分! 8a收容於防落下銷49之〇形部分桃之内 側中二而下放大部分49a定位於熱絕緣構件16附近,例 如’定位在凹槽區段21或棚架區段17上方。防落下銷49之 上相對端部分49c及伙穿透熱絕緣構件⑽自其外圓周表 面伸出。藉由在左右方向上彎曲相對端部分伙及49c以形 成鎖定部分’可將防落下銷49鎖定在熱絕緣構件16之外圓 周表面上。 藉由以上附接方式,防落下銷49係以其間相距合適間隔 而在熱絕緣構件16之加熱元件18之圓周方向上設置,且在 熱絕緣構件16軸向方向上在其半部分上設置成複數個(例 如,二個)列。由於防落下銷49,可防止加熱元件1 8之落 下及/或下垂,藉此可減小熱絕緣構件16之凹槽區段以之 深度或其棚架區段(遮簷)1 7之伸出量。此外,可消除凹槽 區段2 1及棚架區段17。 圖11 一顯不防落下銷之另一實例之透視圖。防落下銷49 129091.doc •23- 200914783 可猎由以下方式形成:μ 一個導線桿彎曲成㈣(見圖 11(a))或將一個導線桿彎曲成兩個部分且再將經彎曲導線 桿彎曲成一 U形(見圖11 (b)h相對端部分4%及49c經彎曲 以形成鎖定部分。 圖1 2係一顯不一用於藉由一防落下板固持加熱電阻器之 伸出部分之結構之視圖。圖12(a)係該結構之局部透視圖, 且圖12(b)係防落下板之示意性透視圖。熱絕緣構件16配備 有一防落下板50,其將加熱元件18帶有波紋的合適伸出部 分18a之下部支撐於熱絕緣構件16之内圓周表面内側以防 止其落下。較佳地,防落下板5〇由陶瓷矩形板製成,且一 穴頭部分5 0a(其可被播推到熱絕緣構件中以固定在其中)形 成於防落下板50的一個縱向端上。由於防落下板水平地支 撐加熱構件18之伸出部分18a之下部,因此可防止加熱元 件18之翻轉及/或下垂,因此,相似於上述實施例,可消 除凹槽區段21及棚架區段17。 圖1 3係一顯示忒熱絕緣構件另一實例之透視圖。由於熱 膨脹及熱收縮所致之内部應力,存在加熱器5之熱絕緣構 件16之内圓周表面遭受某些破裂之可能性。如圖13中所 不,為避免此破裂,較佳之情形係在内圓周表面中軸向形 成—狹缝42。此外,為順利地組裝加熱器,較佳在個別棚 架區段17之下表面處垂直分割熱絕緣構件16。即,熱絕緣 構件16較佳由複數個經垂直分割之塊16a構成。此結構便 於加熱元件18在個別棚架區段17上之設置。也就是說,首 先將一加熱元件18設置在第一分割塊16a之棚架區段17 12909l.d〇) •24· 200914783 上’然後在其上鋪設第二分割塊16 a,並將一加熱元件i 8 設置在第二分割塊16a之棚架區段17上,以此類推。因 此’可獲得裳配改良。在此情況下,較佳之情形係在彼此 垂直赴鄰的分割塊16a之相對表面中沿圓周形成一凹陷43a 及一伸出部分43b(此二者可相互嚙合以進行定位)。 已參照圖式詳細闡述了本發明之實施例。然而,本發明 並不限於上述相應實施例,且可在不背離本發明之範圍之 情形下做各種修改及改變。例如,連接至處理容器之下端 者可係一由抗熱金屬(例如,不銹鋼)製成之圓柱形歧管, 其具有一入口管部分及一出口管部分。另外,該處理容哭 可係一雙管結構。 °° 【圖式簡單說明】 圖1係一縱向剖視圖,其示意性顯示本發明之一直立 熱處理裝置之一實施例; 圖2係圖1中一部分A之一放大剖視圖; 圖3係圖1中之部分a之一放大縱向剖視圖; 圖4係一加熱元件之平面圖; 囷5係加熱元件之一側視圖; 圖6⑷係-顯示一熱絕緣構件之實例之平面圖, 6(b)係一沿圖6(a)中之線B_B截取之剖視圖;; 圖7⑷係—主要部分放大透視圖,其顯示一用於 熱電阻器之_诚μ脸__、击4立』 刀口 構定至—熱絕緣構件上之結 、'且圖7(b)係該固定狀態之剖視圖; 圖8(a),(b)係一剖視圖,苴顯 ,、.,'貝不用於在加熱電阻器之端 '2909l.doc -25· 200914783 上將連接板固定至熱絕緣構件之結構之另一實例; 圖9(a)及9(b)係剖視圖,苴 ^ 自頒不用於在加熱電阻器 二將連接板固定至熱絕緣構件之結構之再一實例,· ^ ^ 八顯不—用於藉由一防落下銷 之一示意性透視圖; -構,且圖1〇⑻係防落下銷 圖11(a)及11(b)係透視圖,其 實例; ,、各自顯不防落下銷之另一 ® 12⑷係一局部透視圖,其顯示 固持加熱電阻器之伸出部分之結=-防落下板 之—示意性透視圖; 且圖叫)係防落下板 ;13係:顯示熱絕緣構件之另-實例之局部透視圖·及 圓14(a)係一顯示一習 " 1 4(b)係加熱器之内圓周表面之—視圖 1 直立式熱處理裝置 2 直立式熱處理爐 3 處理容器 3a 爐開口 3b 向外凸緣 5 圓柱形加熱器 6 基板 7 基板開口 8 引入埠 ㈨係…f例之剖視圖,且圖 Ο 129091.doc -26- 200914783 ίοThe pin members 20 are disposed in the thermally insulating member "with a suitable spacing therebetween", the pin member 20 holding the heating element 18 to move the heating element 18 in the radial direction of the heater $ while preventing the heating element 18 from the scaffolding section 17 is removed = thus 'corrugated heating elements 18 can be placed in an exposed manner on each of the shed ten zones 17 which are formed on the inner circumferential surface of the thermally insulating member μ. The temperature in the processing vessel 3 can be rapidly increased and decreased, and durability improvement and cost reduction can be achieved. In the case of using the corrugated heating element 18, the ratio of the surface area of the component can be effectively increased. Therefore, the heating element can be reduced. Above - the load (which is caused by a decrease in the temperature of the heater surface) 'to thereby suppress damage of the heating element. Therefore 'a high power can be applied to the heating 8 to rapidly increase the temperature. Further, since the disconnection can be suppressed' Therefore, durability improvement can be obtained, that is, a longer service life can be obtained. Further, inexpensive heating wires can be used to form the heating element 18, and thus cost reduction can be achieved. The heat insulating member 16 forms a forced cooling air money (10) to pass through the scaffolding section η disposed between the vertical adjacent heating elements 18 from the inside to the outside. Thus, air can be easily blown from it. There is no interference with the heating element 18. The thermal insulation member 16 extends the longitudinally-divided surface - into two turns 'and the heating element is also cut corresponding to the thermal insulation member. Thus, it can be easily The heating element and the heat insulating member are assembled at a temperature of 129091.doc • 21 · 200914783, that is, the assembly thereof can be improved. Fig. 7 is a view showing a structure for fixing the connecting plate to the heat insulating member on the end of the heating resistor. Fig. 7(a) is an enlarged perspective view of a main portion of the structure, and Fig. 7(b) is a cross-sectional view of the fixed state. To suppress or prevent the connecting plate 23 (the heating element 18 is bent here (1)) The deformation of the connecting plate 23 is fixed to the end (segmented surface) 丨 of the heat insulating member 16 by means of a fixing member 45 (illustrated as a u-shaped pin) such as a pin. In addition, the connecting plate 23 is provided with a lock. Part 46 to lock On the outer circumferential surface of the heat insulating member 16. Fig. 8(a) and Fig. 8(b) are cross-sectional views showing another example of a structure for fixing the connecting plate to the heat insulating member on the end of the heating resistor. The plate B is fixed to the end of the heat insulating member 16 by means of a fixing member 45. Further, an auxiliary heat insulating member 47 is provided to cover the connecting plate 23. The auxiliary heat insulating member 47D is again placed at the end of the heat insulating member 丨6. In a space between (divided surfaces), or filled into the space. In addition to the pins, the fixing member 45 may be a tube, a round rod or a square rod, etc. Figures 9(a) and 9(b A cross-sectional view showing still another example of a structure for fixing a connecting plate to a heat insulating member on the end of a heating resistor. The connecting plate U has a fixing member 48' which is pushed into the heat insulating member 16 or assists The heat insulating member 47 is fixed in it. For example, the fixing member is formed by bending the end of the material web 23 at a right angle to form an auxiliary heat insulating member disposed on the end of the heat insulating member 16 to cover the connecting plate 23. The fixing member Μ can be inserted into the auxiliary heat insulating member 47 (see Fig. 9(a)). However, it is preferable to push the fixing member 至 into the heat insulating member 丨6 (see Fig. 9(b)). 129091.doc -22- 200914783 Figure Η) is a sensible __田# + 2nd part of the extension. The drop pin holds the heating resistor and the figure is shown. The figure is a partial perspective view of the structure, and is provided with a schematic perspective view of the anti-drop pin. Heat _ Luo down pin 49, which has a heating element 18 with a portion _ held in the inner surface of the thermal insulating member 16 ^ the mouth is extended - inside the circumferential surface to prevent 1 Luo: anti-drop pin 49 is bent - a wire rod (for example, a steel rod) shaped into two (4) points, and the (four) curved wire rod I is twisted into - (iv) to provide a U-shaped portion. The end bend/knife is enlarged to form a circular or a substantially triangular enlarged portion. The protruding portion of the heating element 18! 8a is received in the inner side of the crotch portion of the anti-drop pin 49 and the lower amplifying portion 49a is positioned adjacent to the thermal insulating member 16, for example, 'positioned in the groove section 21 or the scaffolding Above section 17. The upper opposite end portion 49c of the drop prevention pin 49 and the penetrating heat insulating member (10) project from the outer circumferential surface thereof. The drop preventing pin 49 can be locked on the outer circumferential surface of the heat insulating member 16 by bending the opposite end portions and 49c in the left-right direction to form the locking portion'. By the above attachment means, the fall prevention pins 49 are disposed in the circumferential direction of the heating element 18 of the heat insulating member 16 at appropriate intervals therebetween, and are disposed on the half portions thereof in the axial direction of the heat insulating member 16 A plurality of (for example, two) columns. Since the drop pin 49 is prevented, the falling and/or sagging of the heating element 18 can be prevented, whereby the depth of the groove section of the heat insulating member 16 or the extension of the scaffolding section (concealer) can be reduced. The amount. In addition, the groove section 21 and the scaffolding section 17 can be eliminated. Figure 11 is a perspective view of another example of a drop-proof pin. Fall prevention pin 49 129091.doc •23- 200914783 Hunting can be formed by: μ bending a wire rod into (4) (see Figure 11(a)) or bending a wire rod into two parts and then bending the wire rod Bending into a U shape (see Figure 11 (b) h opposite end portions 4% and 49c are bent to form a locking portion. Fig. 1 2 is a display for the extension of the heating resistor by an anti-drop plate Figure 12(a) is a partial perspective view of the structure, and Figure 12(b) is a schematic perspective view of the fall prevention plate. The thermal insulation member 16 is provided with a fall prevention plate 50 that will heat the element 18. The lower portion of the suitable protruding portion 18a having the corrugation is supported inside the inner circumferential surface of the heat insulating member 16 to prevent it from falling. Preferably, the falling prevention plate 5 is made of a ceramic rectangular plate, and a hole portion 50a (which can be pushed into the heat insulating member to be fixed therein) is formed on one longitudinal end of the falling prevention plate 50. Since the falling prevention plate horizontally supports the lower portion of the protruding portion 18a of the heating member 18, heating can be prevented The flipping and/or sagging of the component 18 is therefore similar to In the embodiment, the groove section 21 and the scaffolding section 17 can be eliminated. Fig. 1 is a perspective view showing another example of the heat insulating member. The heater 5 is present due to internal stress caused by thermal expansion and heat shrinkage. The inner circumferential surface of the thermal insulating member 16 is subject to some possibility of cracking. As shown in Fig. 13, in order to avoid such cracking, it is preferable to form the slit 42 in the inner circumferential surface. Further, for smoothness The heater is assembled, preferably vertically dividing the thermal insulation member 16 at the lower surface of the individual scaffolding section 17. That is, the thermal insulation member 16 is preferably formed by a plurality of vertically divided blocks 16a. This structure facilitates the heating element 18. Arranged on the individual scaffolding section 17. That is to say, a heating element 18 is first placed on the scaffolding section 17 12909l.d〇) of the first dividing block 16a • 24· 200914783 'and then laid on it The second dividing block 16a has a heating element i8 disposed on the scaffolding section 17 of the second dividing block 16a, and so on. Therefore, the hairdressing improvement can be obtained. In this case, it is preferable to form a recess 43a and a projecting portion 43b circumferentially in the opposing surfaces of the divided blocks 16a which are perpendicular to each other (the two can be engaged with each other for positioning). Embodiments of the present invention have been described in detail with reference to the drawings. However, the present invention is not limited to the above-described respective embodiments, and various modifications and changes can be made without departing from the scope of the invention. For example, a lower end of the processing vessel may be a cylindrical manifold made of a heat resistant metal (e.g., stainless steel) having an inlet tube portion and an outlet tube portion. In addition, the treatment can be a double tube structure. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a longitudinal cross-sectional view schematically showing an embodiment of an upright heat treatment apparatus of the present invention; FIG. 2 is an enlarged cross-sectional view of a portion A of FIG. 1; 1 is an enlarged longitudinal cross-sectional view; FIG. 4 is a plan view of a heating element; a side view of a 囷5 series heating element; FIG. 6(4) is a plan view showing an example of a thermal insulating member, and 6(b) is a sectional view 6(a) is a cross-sectional view taken at line B_B; Fig. 7(4) is a main part enlarged perspective view showing a _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ The knot on the member, 'and Figure 7 (b) is a cross-sectional view of the fixed state; Figure 8 (a), (b) is a cross-sectional view, 苴,,,, 'Bei is not used at the end of the heating resistor '2909l .doc -25· 200914783 Another example of the structure of the upper connecting plate to the heat insulating member; Fig. 9(a) and 9(b) are sectional views, and the self-issued is not used to fix the connecting plate in the heating resistor 2. A further example of the structure of the thermal insulation member, ^ ^ 八显不 - is used to indicate by one of the anti-drop pins Fig. 1(8) is an anti-drop pin. Figures 11(a) and 11(b) are perspective views, examples thereof; and another 12 (4) part of each of the unobstructed pins is a partial perspective view. , which shows the junction of the extended portion of the holding heating resistor = a schematic perspective view of the anti-drop panel; and the figure is called an anti-drop panel; 13 series: a partial perspective view showing another example of the thermal insulating member. And the circle 14(a) is a view showing the inner circumferential surface of the heater. 1 1(b) is the inner circumferential surface of the heater - view 1 vertical heat treatment device 2 vertical heat treatment furnace 3 processing container 3a furnace opening 3b outward flange 5 Cylindrical heater 6 Substrate 7 Substrate opening 8 is introduced into a cross-sectional view of the f(9) system f example, and Fig. 129091.doc -26- 200914783 ίο

10A 11 12 13 15 16 16a 17 f 18 18A 18a 18b 18e, f, g...r 20 20a / 20b 1, 20c 21 21a 22 23 28 30 蓋構件 提升機構 熱保持管 石英船 旋轉機構 下裝載區 圓柱形熱絕緣構件 分割表面 凹槽樣棚架區段 加熱元件 條形構件 頂點部分 波谷部分 端 銷構件 近端部分 支腳部分 端部 凹槽區段 後壁 端接板 連接板 外殼 水冷卻套 129091.doc -27- 200914783 31 上熱絕緣構件 32 不銹鋼頂板 33 空間 35 熱排放系統 36 強制空氣冷卻單元 37 出口 38 環形路徑 40 強制式冷卻空氣吹風孔 41 r 條形或環形熱絕緣構件 \ 42 狹縫 43a 凹陷 43b 伸出部分 45 固定構件 46 鎖定部分 47 輔助熱絕緣構件 48 固定件 C, 49 防落下銷 49a 放大部分 49b U形部分 49c 相對端部分 50 防落下板 50a 尖頭部分 129091.doc -28-10A 11 12 13 15 16 16a 17 f 18 18A 18a 18b 18e, f, g...r 20 20a / 20b 1, 20c 21 21a 22 23 28 30 Cover member lifting mechanism Heat retaining tube Quartz ship rotating mechanism Lower loading zone cylinder Shaped thermal insulation member split surface groove-like scaffolding section heating element strip member apex part trough part end pin member proximal end part foot part end groove section rear wall end plate connecting plate shell water cooling sleeve 129091. Doc -27- 200914783 31 Upper thermal insulation member 32 Stainless steel top plate 33 Space 35 Heat discharge system 36 Forced air cooling unit 37 Outlet 38 Annular path 40 Forced cooling air blow hole 41 r Strip or ring thermal insulation member \ 42 Slit 43a Recessed portion 43b Projection portion 45 Fixing member 46 Locking portion 47 Auxiliary thermal insulating member 48 Fixing member C, 49 Falling prevention pin 49a Magnifying portion 49b U-shaped portion 49c Opposing end portion 50 Falling prevention plate 50a Tip portion 129091.doc -28-

Claims (1)

200914783 十、_請專利範圍: L 一種熱處理爐,其包括·· 物件用:容納-待處理物件及對該待處理 一圓柱形加熱器,其圍技 處理容器之一外圓周設置 以用於加熱該待處理物件; 其中該加熱器包含_圓飪 圓柱熱緣構件,及沿該熱絕 内圓周表面佈置之加熱電阻器, 4等加熱電阻器之每一者係由一被彎曲成一具有波峰 部分及波谷部分之波狀的條形構件所形成,及 鎖構件係以其間相距合適間隔而佈置於該熱絕緣構件 中,該等銷構件固持該加熱電阻器以使該加熱電阻器可 在該加熱器之一徑向方向上移動。 2. 如請求項1之熱處理爐,其中 該等銷構件之每一者係形成一具有一對用於支揮該加 熱電阻器之該波谷部分之支腳部分之U形, 該等個別支腳部分自内側至外側地通過該熱絕緣構 件,及 、 該等個別支腳部分於該外側上彎曲而被鎖定於該熱絕 緣構件之一外圓周表面上。 3 ·如請求項1之熱處理爐,其中 複數個圓周連續凹槽區段以其間相距合適間隔而垂直 地形成於該熱絕緣構件之該内圓周表面中,且 該等加熱電阻器之整體或一部分被收容於該等凹槽區 129091.doc 200914783 段中。 4. 如請求項1之熱處理爐,其中 複數個強制式冷卻空氣吹風孔以其間相距合適間隔而 以圓周方式形成於該熱絕緣構件中以在該等垂直地田比鄰 之加熱電阻tin位置處自内側至外側地通過該熱 絕緣構件。 5. 如請求項1之熱處理爐,其中 該熱絕緣構件被分割成一右半部分及一左半部分,在 Γ ^ 該等部分之間具有縱向延伸之分割表面, 該等加熱電阻器之每—者亦分割成尉應於該熱絕緣構 件之一右半部分及一左半部分, /:個加熱電阻器與垂直地田比鄰於其之其他加熱電阻器 係藉由連接板而在端部相互連接,及 該等連接板係設置於該熱絕緣構件之該等分割表面部 分上。 6·如請求項5之熱處理爐,其中 '" 專連接板之每一者皆係藉助一由銷所形成之固定構 件而固定於該分割表面部分上。 7. 如請求項5之熱處理爐,其中 忒等連接板之每一者具有一可鎖定於該熱絕緣構件之 一外圓周表面上之鎖定部分。 8. 如請求項5之熱處理爐,其中 «亥等連接板之每一者具有一被押入該熱絕緣構件中而 固定在其中之固定件。 129091.doc 200914783 9-如請求項1之熱處理爐,其中 該等連接板之每一者具有一固持該加熱電阻器之该波 峰部分之防落下銷。 °° 1〇.如請求項1之熱處理表面,其中 11 該熱絕緣構件具有一支揮該加熱電阻器之該波峰部分 之—下部以防止其落下之防落下板。 種直立式熱處理裝置,其包括: ―::處理爐,其包含:-長形處理容器,其用於容納 處:里::物:及對該待處理物件執行-熱製程,其中該 α 下5而被打開以界定一爐開口丨及一圓杜形 ,'、、态,其圍繞該處理容器之一外圓机 該待處理物件; 外囫周-置以用於加熱 蓋構件,其用於閉合該爐開口 ; dl’其設置於該蓋構件上,該固持件以-叠層 狀:式固持複數個待處理物件;及 蓋構ΓΓ:其提升及降下該蓋構件以打開及閉合該 器卸载該_件;冑载至该處理容器及自該處理容 緣構件^ 包含—圓柱形熱絕緣構件,及沿該熱絕 …:内圓周表面佈置之加熱電阻器, 峰部分::皮電阻器之每—者皆係由-被彎曲成-具有波 心=?:之條形構件形成,且 中,該等銷構 二°適間隔而佈置於該熱絕緣構件 持该加熱電阻器以使該加熱電阻器可 129091.doc 200914783 在遠加熱器之一徑向方向上移動。 12.如請求項11之直立式熱處理裝置,其中 §亥荨鎖構件之备—I及π丄、 執電阻琴…對用於支樓該加 /之錢谷部分之支腳部分之u形, 件=個別支腳部分自内側至外側地通過該熱絕緣構 =別支聊部分係於該外側上彎曲定 絕緣構件之—外圓周表面上。 13. 如請求項11之直立式熱處理裝置,其中 複數個圓周i車綠 ^ ψ Λ 9區奴以其間相距合適間隔而垂直 ^ ; μ…、絕緣構件之該内圓周表面中’且 段中等力熱電阻器之整體或一部分被收容於該等凹槽區 14. 如請求項11之直立式熱處理裝置,” 以=:制式冷卻空氣吹風孔以其間相距合適間隔而 加埶電阻^成於該熱絕緣構件中以在該等垂直础鄰之 緣構件。D間的—位置處自内側至外側地通過該熱絕 15. 如請求項U之直立式熱處理裝置,1中 該=:件被分割成-右半部分及-左半部分,在 人 3具有縱向延伸分割表面, :等::電阻器之每一者亦分割成對應於該熱絕緣構 件之一右丰部分及—左半部分, -個加熱電阻器與垂直地B比鄰其之其他加熱電阻器係 129091.doc 200914783 藉由連接板而在端部;|:日r&200914783 X. _Patent scope: L A heat treatment furnace comprising: · Objects: accommodating - to be processed and a cylindrical heater to be treated, one of the outer circumferences of the circumference treatment container is set for heating The object to be processed; wherein the heater comprises a circular cylindrical hot edge member, and a heating resistor disposed along the inner circumferential surface of the heat, each of the heating resistors 4 is bent into a peak portion And a corrugated strip member formed in the trough portion, and the lock members are disposed in the heat insulating member at appropriate intervals therebetween, the pin members holding the heating resistor to enable the heating resistor to be heated One of the devices moves in the radial direction. 2. The heat treatment furnace of claim 1, wherein each of the pin members forms a U-shape having a pair of leg portions for supporting the trough portion of the heating resistor, the individual legs The heat insulating member is partially passed from the inside to the outside, and the individual leg portions are bent on the outer side to be locked to the outer circumferential surface of one of the heat insulating members. 3. The heat treatment furnace according to claim 1, wherein a plurality of circumferential continuous groove segments are vertically formed in the inner circumferential surface of the heat insulating member at an appropriate interval therebetween, and the heating resistors are wholly or partially It is contained in the groove area 129091.doc 200914783. 4. The heat treatment furnace of claim 1, wherein a plurality of forced cooling air blowing holes are circumferentially formed in the heat insulating member at appropriate intervals therebetween to be at a position of the heating resistor tin adjacent to the vertical field The heat insulating member passes through the inside to the outside. 5. The heat treatment furnace according to claim 1, wherein the heat insulating member is divided into a right half portion and a left half portion, and a longitudinally extending dividing surface is provided between the portions, and each of the heating resistors is- Also divided into the right half of one of the thermal insulation members and a left half, /: a heating resistor and the other vertical heating resistors adjacent to the vertical field are connected to each other at the ends by the connecting plates Connecting, and the connecting plates are disposed on the divided surface portions of the heat insulating member. 6. The heat treatment furnace of claim 5, wherein each of the '" special connecting plates is fixed to the divided surface portion by a fixing member formed by a pin. 7. The heat treatment furnace according to claim 5, wherein each of the connecting plates has a locking portion lockable to an outer circumferential surface of the heat insulating member. 8. The heat treatment furnace according to claim 5, wherein each of the connecting plates such as "Hai" has a fixing member fixed in the heat insulating member and fixed therein. A heat treatment furnace according to claim 1, wherein each of the connection plates has a drop prevention pin that holds the peak portion of the heating resistor. The heat-treated surface of claim 1, wherein the heat-insulating member has a lower portion of the peak portion of the heating resistor to prevent it from falling. An upright heat treatment apparatus comprising: a::: a treatment furnace comprising: - an elongated processing vessel for accommodating: 里::物: and performing a heat process on the object to be processed, wherein the α 5 is opened to define a furnace opening 丨 and a round dove, ', state, which surrounds the outer circular machine of the processing container; the outer circumference is placed for heating the cover member, which is used for Closing the furnace opening; dl' is disposed on the cover member, the holding member holds a plurality of objects to be processed in a laminated manner; and a cover structure: lifting and lowering the cover member to open and close the device Unloading the _ piece; carrying the yoke to the processing container and from the processing rim member ^ comprises a cylindrical thermal insulating member, and a heating resistor arranged along the inner circumferential surface of the heat:: a peak portion: a skin resistor Each of which is formed by a strip member that is bent into a wave center =?: and wherein the pin members are disposed at a proper interval and are disposed on the heat insulating member to hold the heating resistor to Heating resistor can be 129091.doc 200914783 in the far heater It moved in a radial direction. 12. The vertical heat treatment apparatus according to claim 11, wherein the § 荨 荨 构件 — I I I 丄 丄 丄 丄 丄 丄 丄 对 对 对 对 对 对 对 对 对 对 对 对 对 对 对 对 对 对 对 对 对 对 对= The individual leg portions pass through the thermal insulation from the inside to the outside. The other part is attached to the outer circumferential surface of the outer insulating member. 13. The vertical heat treatment apparatus according to claim 11, wherein the plurality of circumferences of the vehicle are separated by a suitable interval and are perpendicular to each other; μ..., the inner circumferential surface of the insulating member is medium and strong The whole or a part of the thermal resistor is housed in the recessed area 14. According to the vertical heat treatment apparatus of claim 11, "the cooling air blowing holes of the system are heated at a proper interval therebetween to form a heat resistance". In the insulating member, the heat is passed from the inside to the outside at the position between the adjacent members of the vertical base. The vertical heat treatment device of claim U, wherein the member is divided into - the right half and the left half, where the person 3 has a longitudinally extending split surface, ::: Each of the resistors is also divided into a right-handed portion and a left half of the heat-insulating member, - The heating resistors are adjacent to the other vertical heating resistors 129091.doc 200914783 by the connecting plate at the end; |: day r& 分上。 之該等分割表面部 .如请求項1 5之直立式熱處理袭置,其 ,其中Points. Such divided surface portions. As claimed in claim 15 of the vertical heat treatment, wherein 而固定於該分割表面部分上。 所形成之固定構件 如請求項15之直立式熱處理裝置,其中 可鎖定於該熱絕緣構件 該等連接板之每一者具有一可鎖定 一外圓周表面上之鎖定部分。 18. 如請求項15之直立式熱處理裝置,其中 該等連接板之每一者具有一被押入該熱絕緣構件中而 固定在其中之固定件。 19. 如請求項11之直立式熱處理裝置,其中 該等連接板之每一者具有一固持該加熱電阻器之該波 峰部分之防落下銷。 20. 如請求項1 1之直立式熱處理裝置,其中 該熱絕緣構件具有一支撐該加熱電阻器之該波峰部分 之一下部以防止其落下之防落下板。 129091.docAnd fixed on the divided surface portion. The formed fixing member is the vertical heat treatment device of claim 15, wherein the heat insulating member is lockable to each of the connecting plates to have a locking portion that can lock an outer circumferential surface. 18. The vertical heat treatment apparatus of claim 15, wherein each of the connecting plates has a fixing member that is inserted into the heat insulating member and fixed therein. 19. The vertical heat treatment apparatus of claim 11, wherein each of the connection plates has a drop prevention pin that holds the peak portion of the heating resistor. 20. The vertical heat treatment apparatus of claim 11, wherein the heat insulating member has a fall prevention plate that supports a lower portion of the peak portion of the heating resistor to prevent it from falling. 129091.doc
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TWI392843B (en) 2013-04-11
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KR101117016B1 (en) 2012-03-15
JP5248874B2 (en) 2013-07-31

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